An impact-resistant fast mirror and method of making the same

Abstract

The application discloses an anti-impact fast mirror and a manufacturing method thereof, and relates to the technical field of fast mirrors. The anti-impact fast mirror comprises a mirror surface structure and a substrate, the mirror surface structure is located above the substrate, an upper driving electrode structure and a reflecting layer are further arranged on the mirror surface structure, a lower driving electrode structure is arranged on the substrate, a gap exists between the upper driving electrode structure and the lower driving electrode structure, and a buffer structure is arranged between the lower driving electrode structure and the mirror surface structure. The anti-impact fast mirror and the manufacturing method thereof can improve the anti-impact capability, so that the anti-impact fast mirror can still work efficiently in various severe environments.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of fast steering mirrors, in particular to an impact-resistant fast steering mirror and a manufacturing method thereof. BACKGROUND

[0002] With the development of space exploration and satellite communication technology, space optical communication has received more and more attention as a high data transmission rate and low delay communication method. Compared with traditional radio frequency communication, optical communication has higher bandwidth and longer transmission distance, which can effectively support future communication needs. In the space optical communication system, the fast steering mirror (FSM) as a key component is responsible for quickly and accurately adjusting the direction of the light beam to ensure stable transmission of the light beam.

[0003] The performance of the fast steering mirror directly affects the stability and effectiveness of the communication system. However, in the space environment, the fast steering mirror often faces various impacts and vibrations, such as vibration during launch, microgravity environment changes during satellite operation, etc., which may affect the performance of the fast steering mirror and cause unstable signal transmission. SUMMARY

[0004] The purpose of the present application is to provide an impact-resistant fast steering mirror and a manufacturing method thereof to solve the problems existing in the prior art and improve the impact resistance to ensure efficient operation in various harsh environments.

[0005] To achieve the above purpose, the present application provides the following solutions:

[0006] The present application provides an impact-resistant fast steering mirror, comprising: a mirror structure and a substrate, the mirror structure is located above the substrate, the mirror structure is further provided with an upper driving electrode structure and a reflective layer, the substrate is provided with a lower driving electrode structure, there is a gap between the upper driving electrode structure and the lower driving electrode structure, and a buffer structure is provided between the lower driving electrode structure and the mirror structure.

[0007] Preferably, the mirror structure further comprises a mirror body, a gimbal frame and an outer frame, the mirror body, the gimbal frame and the outer frame are sequentially arranged from inside to outside, the mirror body is provided with the reflective layer, the mirror body and the gimbal frame are connected by two symmetrically arranged first spring beams, the gimbal frame and the outer frame are connected by two symmetrically arranged second spring beams, and the symmetry axes of the two first spring beams and the symmetry axes of the two second spring beams are arranged vertically.

[0008] Preferably, the upper driving electrode structure is arranged on the outer frame, and the upper driving electrode structure is used for grounding.

[0009] Preferably, the edge of the mirror body is further provided with a first buffer tail wing, the position of the first buffer tail wing corresponds to the position of the second spring beam, the first buffer tail wing is located between the mirror body and the gimbal frame, the first buffer tail wing is connected with the mirror body, and there is a gap between the first buffer tail wing and the gimbal frame; the edge of the gimbal frame is further provided with a second buffer tail wing, the position of the second buffer tail wing corresponds to the position of the first spring beam, the second buffer tail wing is located between the gimbal frame and the outer frame, the second buffer tail wing is connected with the gimbal frame, and there is a gap between the second buffer tail wing and the outer frame.

[0010] Preferably, the size of the connecting end of the first buffer tail wing is smaller than the size of the free end of the first buffer tail wing, and the size of the connecting end of the second buffer tail wing is smaller than the size of the free end of the second buffer tail wing.

[0011] Preferably, the buffer structure comprises a first tail wing buffer layer and a second tail wing buffer layer, the first tail wing buffer layer corresponds to the position of the first buffer tail wing, and the second tail wing buffer layer corresponds to the position of the second buffer tail wing.

[0012] Preferably, the lower driving electrode structure comprises two symmetrically arranged inner shaft driving electrodes and two symmetrically arranged outer shaft driving electrodes, and the two inner shaft driving electrodes are located inside the two outer shaft driving electrodes.

[0013] Preferably, the symmetry axes of the two inner shaft driving electrodes and the symmetry axes of the two second spring beams are located in the same vertical plane, and the symmetry axes of the two outer shaft driving electrodes and the symmetry axes of the two first spring beams are located in the same vertical plane.

[0014] Preferably, the buffer structure comprises a center buffer layer, an inner shaft buffer layer and an outer shaft buffer layer, the center buffer layer is located at the center of the lower driving electrode structure, the inner shaft buffer layer is located on the inner shaft driving electrode, and the outer shaft buffer layer is located on the outer shaft driving electrode.

[0015] The application also provides a manufacturing method of the anti-impact fast-response mirror, comprising the following steps:

[0016] Step one, preparing a mirror surface structure base and a substrate;

[0017] Step two, sputtering metal on the front surface of the mirror surface structure base and patterning to form an upper driving electrode structure and a reflecting layer; sputtering metal on the front surface of the substrate and patterning to form a lower driving electrode structure;

[0018] Step three, etching the back of the base of the mirror structure to form cavities and lead grooves; patterning the front of the lower driving electrode structure and the front of the substrate to form a buffer structure;

[0019] Step four, the base of the mirror structure and the substrate are bonded together by anode bonding;

[0020] Step five, etching the front of the bonded mirror structure to form the remaining structures of the mirror structure.

[0021] The present application has the following technical effects relative to the prior art:

[0022] The present application sets a buffer structure between the mirror structure and the lower driving electrode structure, which can effectively absorb the impact force after the mirror structure is contacted, improve the impact resistance of the device, and buffer the vertical piston type and torsional impact force. The present application buffers the impact of the mirror structure through the buffer structure, protects the mirror structure from damage, increases the reliability of the fast mirror and prolongs its service life. BRIEF DESCRIPTION OF DRAWINGS

[0023] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed in the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0024] Figure 1 is an anti-impact fast mirror axial view of the present application (without first and second buffer tail wings);

[0025] Figure 2 is an axial view of the mirror structure of the present application;

[0026] Figure 3 is a top view of the mirror structure of the present application (with first and second buffer tail wings);

[0027] Figure 4 is a schematic diagram of the first and second spring beams of the present application Figure 1 ;

[0028] Figure 5 is a schematic diagram of the first and second spring beams of the present application Figure 2 ;

[0029] Figure 6 is a schematic diagram of the first and second spring beams of the present application Figure 3 ;

[0030] Figure 7 is a schematic diagram of the first and second spring beams of the present application Figure 4 ;

[0031] Figure 8 Schematic diagram of the first and second buffer tail wing of the present application Figure 1 ;

[0032] Figure 9 Schematic diagram of the first and second buffer tail wing of the present application Figure 2 ;

[0033] Figure 10 Schematic diagram of the first and second buffer tail wing of the present application Figure 3 ;

[0034] Figure 11 Schematic diagram of the first and second buffer tail wing of the present application Figure 4 ;

[0035] Figure 12 Top view of the lower driving electrode structure of the present application;

[0036] Figure 13 Top view of the lower driving electrode structure with buffer structure of the present application Figure 1 ;

[0037] Figure 14 Top view of the lower driving electrode structure with buffer structure of the present application Figure 2 ;

[0038] Figure 15 Schematic diagram of the impact-resistant fast mirror section (without the first spring beam, the second spring beam, the first buffer tail wing and the second buffer tail wing) of the present application;

[0039] Figure 16 Schematic diagram of the first step of the manufacturing method of the impact-resistant fast mirror of the present application;

[0040] Figure 17 Schematic diagram of the second step of the manufacturing method of the impact-resistant fast mirror of the present application;

[0041] Figure 18 Schematic diagram of the third step of the manufacturing method of the impact-resistant fast mirror of the present application;

[0042] Figure 19 Schematic diagram of the fourth step of the manufacturing method of the impact-resistant fast mirror of the present application;

[0043] Figure 20 Schematic diagram of the fifth step of the manufacturing method of the impact-resistant fast mirror of the present application;

[0044] In the figure: 1-substrate, 2-upper driving electrode structure, 3-reflective layer, 4-mirror body, 5-universal joint frame, 6-outer frame, 7-first spring beam, 8-second spring beam, 9-first buffer tail fin, 10-second buffer tail fin, 11-first tail fin buffer layer, 12-second tail fin buffer layer, 13-inner axis driving electrode, 14-outer axis driving electrode, 15-pin, 16-center buffer layer, 17-inner axis buffer layer, 18-outer axis buffer layer, 19-substrate of mirror structure, 20-cavity, 21-lead groove. Detailed Implementation

[0045] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0046] The purpose of this invention is to provide an impact-resistant fast-reflecting mirror and its manufacturing method to solve the problems existing in the prior art, improve the impact resistance, and ensure that it can still work efficiently in various harsh environments.

[0047] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0048] Example 1

[0049] like Figures 1 to 15 As shown, this embodiment provides an impact-resistant fast-reflecting mirror, including: a mirror structure and a substrate 1. The mirror structure is located above the substrate 1. An upper driving electrode structure 2 and a reflective layer 3 are also disposed on the mirror structure. The substrate 1 is made of glass. A lower driving electrode structure is disposed on the substrate 1. The upper driving electrode structure 2 and the lower driving electrode structure are respectively connected to pins 15. There is a gap between the upper driving electrode structure 2 and the lower driving electrode structure. A buffer structure is disposed between the lower driving electrode structure and the mirror structure. The buffer structure is used to buffer the impact on the mirror structure, protect the mirror structure from damage, increase the reliability of the fast-reflecting mirror and extend its service life.

[0050] In the embodiment, the mirror structure further comprises a mirror body 4, a gimbal frame 5 and an outer frame 6, the mirror body 4, the gimbal frame 5 and the outer frame 6 are all made of a silicon wafer, preferably a low-resistance silicon wafer, the mirror body 4, the gimbal frame 5 and the outer frame 6 are sequentially arranged from inside to outside, the upper driving electrode structure 2 is arranged on the outer frame 6, the upper driving electrode structure 2 is used for grounding, the mirror body 4 determines the optical aperture of the fast mirror, the mirror body 4 is provided with a reflecting layer 3, the gimbal frame 5 is used for realizing two-axis scanning, the mirror body 4 and the gimbal frame 5 are connected through two symmetrically arranged first spring beams 7 to realize the torsion between the mirror body 4 and the gimbal frame 5, the outer frame 6 is used for supporting and protecting the mirror body 4 and the gimbal frame 5, the gimbal frame 5 and the outer frame 6 are connected through two symmetrically arranged second spring beams 8 to realize the torsion between the gimbal frame 5 and the outer frame 6, the symmetry axes of the two first spring beams 7 and the symmetry axes of the two second spring beams 8 are arranged vertically.

[0051] In the embodiment, the bottom of the outer frame 6 is provided with a cavity 20 for the movement of the mirror body 4 and the gimbal frame 5 and a lead slot 21 for the lead of the lower driving electrode structure to pass through, the outer frame 6 realizes the support of the mirror body 4 and the gimbal frame 5, and the outer frame 6 determines the driving gap between the upper driving electrode structure 2 and the lower driving electrode structure.

[0052] In the embodiment, the edge of the mirror body 4 is further provided with a first buffer tail wing 9, the position of the first buffer tail wing 9 corresponds to the position of the second spring beam 8, the first buffer tail wing 9 is located between the mirror body 4 and the gimbal frame 5, the first buffer tail wing 9 is connected with the mirror body 4, there is a gap between the first buffer tail wing 9 and the gimbal frame 5, the size of the connecting end of the first buffer tail wing 9 is smaller than the size of the free end of the first buffer tail wing 9, and the contact area of the first buffer tail wing 9 is effectively increased; the edge of the gimbal frame 5 is further provided with a second buffer tail wing 10, the position of the second buffer tail wing 10 corresponds to the position of the first spring beam 7, the second buffer tail wing 10 is located between the gimbal frame 5 and the outer frame 6, the second buffer tail wing 10 is connected with the gimbal frame 5, there is a gap between the second buffer tail wing 10 and the outer frame 6, the size of the connecting end of the second buffer tail wing 10 is smaller than the size of the free end of the second buffer tail wing 10, and the contact area of the second buffer tail wing 10 is effectively increased. Under a large torsion impact, the first buffer tail wing 9 and the second buffer tail wing 10 first contact the substrate 1, avoiding the contact between the mirror body 4 and the gimbal frame 5 and the substrate 1, and protecting the mirror body 4 and the gimbal frame 5 from being damaged.

[0053] In the embodiment, the first and second buffer tail wings 9 and 10 adopt a fishtail structure; the size of the connecting end of the first buffer tail wing 9 is smaller than the size of the free end of the first buffer tail wing 9, and the size of the connecting end of the first buffer tail wing 9 and the size of the free end of the first buffer tail wing 9 are both larger than the size of the middle part of the first buffer tail wing 9; the size of the connecting end of the second buffer tail wing 10 is smaller than the size of the free end of the second buffer tail wing 10, and the size of the connecting end of the second buffer tail wing 10 and the size of the free end of the second buffer tail wing 10 are both larger than the size of the middle part of the second buffer tail wing 10, which can effectively reduce the concentrated stress after contact and further improve the impact resistance.

[0054] In the embodiment, the buffer structure includes a first tail wing buffer layer 11 corresponding to the first buffer tail wing 9 and a second tail wing buffer layer 12 corresponding to the second buffer tail wing 10.

[0055] In the embodiment, the lower driving electrode structure includes two symmetrically arranged inner shaft driving electrodes 13 and two symmetrically arranged outer shaft driving electrodes 14, and the two inner shaft driving electrodes 13 are located inside the two outer shaft driving electrodes 14; the symmetry axes of the two inner shaft driving electrodes 13 and the symmetry axes of the two second spring beams 8 are located in the same vertical plane, and the symmetry axes of the two outer shaft driving electrodes 14 and the symmetry axes of the two first spring beams 7 are located in the same vertical plane. After the lower driving electrode structure applies a driving signal, the mirror body 4 and the gimbal frame 5 are twisted.

[0056] In the embodiment, the buffer structure includes a center buffer layer 16, an inner shaft buffer layer 17 and an outer shaft buffer layer 18; the center buffer layer 16 is located at the center of the lower driving electrode structure and is used to buffer the vertical piston impact; the inner shaft buffer layer 17 is located on the inner shaft driving electrode 13 and is used to buffer the impact of the mirror body 4, including the torsional impact and the vertical piston impact; the outer shaft buffer layer 18 is located on the outer shaft driving electrode 14 and is used to buffer the impact of the gimbal frame 5, including the torsional impact and the vertical piston impact.

[0057] In the embodiment, the buffer structure is made of flexible or low Young's modulus materials such as polyimide (PI), which can effectively absorb the impact force after the mirror surface structure contacts, and improve the impact resistance of the device. The buffer structure adopts a distributed design, which can buffer the vertical piston impact and the torsional impact, and can reduce the influence on the driving force between the upper driving electrode structure 2 and the lower driving electrode structure compared with the full coverage design.

[0058] Embodiment Two

[0059] As shown in Figures 16 to 20 The embodiment provides a manufacturing method of the impact-resistant fast-response mirror of embodiment one, which includes the following steps:

[0060] Step one, prepare the base 19 (silicon wafer) and the substrate 1 of the mirror structure;

[0061] Step two, sputter metal on the front side of the base 19 of the mirror structure and pattern to form the upper driving electrode structure 2 and the reflecting layer 3; sputter metal on the front side of the substrate 1 and pattern to form the lower driving electrode structure;

[0062] Step three, etch the back side of the base 19 of the mirror structure to form the cavity 20 and the lead slot 21; pattern the front side of the lower driving electrode structure and the front side of the substrate 1 to form the buffer structure;

[0063] Step four, bond the base 19 of the mirror structure and the substrate 1 together by anode bonding;

[0064] Step five, etch the front side of the bonded base 19 of the mirror structure to form the mirror body 4, the gimbal frame 5, the first spring beam 7, the second spring beam 8, the first buffer tail wing 9 and the second buffer tail wing 10 of the mirror structure.

[0065] The principles and implementation manners of the present application are described by using specific examples in the present application; the above examples are only used to help understand the method of the present application and its core idea; meanwhile, for the person skilled in the art, according to the idea of the present application, the specific implementation manners and application ranges will be changed. In conclusion, the content of the present specification should not be understood as the limitation of the present application.

Claims

1. An impact-resistant fast-reflecting mirror, characterized in that: include: A mirror structure and a substrate, wherein the mirror structure is located above the substrate, and an upper driving electrode structure and a reflective layer are disposed on the mirror structure, and a lower driving electrode structure is disposed on the substrate, wherein there is a gap between the upper driving electrode structure and the lower driving electrode structure, and a buffer structure is disposed between the lower driving electrode structure and the mirror structure; The mirror structure further includes a mirror body, a universal joint frame, and an outer frame. The mirror body, the universal joint frame, and the outer frame are arranged sequentially from the inside to the outside. The mirror body is provided with the reflective layer. The mirror body and the universal joint frame are connected by two symmetrically arranged first spring beams. The universal joint frame and the outer frame are connected by two symmetrically arranged second spring beams. The axes of symmetry of the two first spring beams and the axes of symmetry of the two second spring beams are perpendicular to each other. The edge of the mirror body is also provided with a first buffer tail fin, the position of which corresponds to the position of the second spring beam. The first buffer tail fin is located between the mirror body and the universal joint frame, and is connected to the mirror body. There is a gap between the first buffer tail fin and the universal joint frame. The edge of the universal joint frame is also provided with a second buffer tail fin, the position of which corresponds to the position of the first spring beam. The second buffer tail fin is located between the universal joint frame and the outer frame, and is connected to the universal joint frame. There is a gap between the second buffer tail fin and the outer frame. The size of the connecting end of the first buffer tail fin is smaller than the size of the free end of the first buffer tail fin, and the size of the connecting end of the second buffer tail fin is smaller than the size of the free end of the second buffer tail fin; The buffer structure includes a first tail fin buffer layer and a second tail fin buffer layer, wherein the first tail fin buffer layer corresponds to the position of the first buffer tail fin, and the second tail fin buffer layer corresponds to the position of the second buffer tail fin.

2. The impact-resistant fast-reflecting mirror according to claim 1, characterized in that: The upper driving electrode structure is disposed on the outer frame and is used for grounding.

3. The impact-resistant fast-reflecting mirror according to claim 1, characterized in that: The lower drive electrode structure includes two symmetrically arranged inner shaft drive electrodes and two symmetrically arranged outer shaft drive electrodes, with the two inner shaft drive electrodes located inside the two outer shaft drive electrodes.

4. The impact-resistant fast-reflecting mirror according to claim 3, characterized in that: The axes of symmetry of the two inner shaft drive electrodes and the axes of symmetry of the two second spring beams are located in the same vertical plane, and the axes of symmetry of the two outer shaft drive electrodes and the axes of symmetry of the two first spring beams are located in the same vertical plane.

5. The impact-resistant fast-reflecting mirror according to claim 3, characterized in that: The buffer structure includes a central buffer layer, an inner axis buffer layer, and an outer axis buffer layer. The central buffer layer is located at the center of the lower drive electrode structure, the inner axis buffer layer is located on the inner axis drive electrode, and the outer axis buffer layer is located on the outer axis drive electrode.

6. A method for manufacturing an impact-resistant fast-reflecting mirror according to any one of claims 1-5, characterized in that: Includes the following steps: Step 1: Prepare the substrate and base material for the mirror structure; Step 2: Sputter metal onto the front side of the mirror-structured substrate and pattern it to form the upper driving electrode structure and the reflective layer; Sputter metal onto the front side of the substrate and pattern it to form the lower driving electrode structure; Step 3: The back of the substrate of the mirror structure is etched to form cavities and lead trenches; The front side of the lower driving electrode structure and the front side of the substrate are patterned to form a buffer structure; Step four: The matrix and substrate of the mirror structure are bonded together by anodic bonding. Step 5: The front side of the bonded mirror structure is etched to form the remaining structures of the mirror structure.

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