A method, apparatus, device, and storage medium for pressure control of a process chamber

Abstract

Embodiments of the present application provide a pressure control method, device and storage medium of a process chamber, the method comprising: in the case that the pressure value of the process chamber is in a first interval of a target pressure interval, performing uniform speed pressure reduction, in the case that the pressure value of the process chamber is in a second interval of the target pressure interval, performing uniform deceleration pressure reduction, until the pressure value of the process chamber enters a next target pressure interval, and returning to the step of performing uniform speed pressure reduction in the case that the pressure value of the process chamber is in the first interval of the target pressure interval, stopping the pressure reduction when the pressure value of the process chamber reaches a target pressure value. Thus, the pressure reduction rate is greatly improved without causing large deviation of the wafer in the process chamber, and the production efficiency is further improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor equipment, in particular to a pressure control method of a process chamber, a semiconductor process equipment and a computer readable storage medium. BACKGROUND

[0002] In the process of using the epitaxial chamber, pressure increasing and pressure decreasing are needed. In the process of pressure decreasing, the influence of the pressure decreasing rate on wafer deviation needs to be considered. In order to ensure that the wafer in the epitaxial chamber does not deviate greatly in the process of pressure decreasing, a constant low rate is used for pressure decreasing in the related technology. Although this method can ensure that the wafer in the epitaxial chamber does not deviate greatly, it takes a long time to decrease the pressure to the final pressure, thereby seriously affecting the production efficiency. SUMMARY

[0003] In view of the above problems, the embodiments of the present application are proposed in order to provide a pressure control method of a process chamber, a pressure control device of a process chamber, a semiconductor process equipment and a computer readable storage medium which overcome the above problems or at least partially solve the above problems.

[0004] In order to solve the above problems, the embodiments of the present application disclose a pressure control method of a process chamber, the method comprising:

[0005] In the case that the pressure value of the process chamber is in a first interval of a target pressure interval, uniform speed pressure decreasing is performed;

[0006] In the case that the pressure value of the process chamber is in a second interval of the target pressure interval, uniform deceleration pressure decreasing is performed until the pressure value of the process chamber enters a next target pressure interval, and the step of performing uniform speed pressure decreasing in the case that the pressure value of the process chamber is in a first interval of a target pressure interval is returned to;

[0007] When the pressure value of the process chamber reaches a target pressure value, the pressure decreasing is stopped.

[0008] Optionally, the method further comprises:

[0009] When the process chamber starts to decrease the pressure, a target pressure decreasing rate is determined, and uniform acceleration pressure decreasing is performed according to a first preset pressure decreasing acceleration until the pressure decreasing rate reaches the target pressure decreasing rate, so that the pressure value of the process chamber is in a first interval of an initial pressure interval;

[0010] In the case that the pressure value of the process chamber is in a first interval of an initial pressure interval, uniform speed pressure decreasing is performed according to the target pressure decreasing rate until the pressure value of the process chamber enters a second interval of the initial pressure interval;

[0011] In a case that the pressure value of the process chamber is in a second interval of the initial pressure interval, uniform deceleration pressure reduction is performed until the pressure value of the process chamber enters a target pressure interval.

[0012] Optionally, the determining the target pressure reduction rate comprises:

[0013] obtaining a reference pressure reduction rate in a process recipe;

[0014] obtaining an upper limit value of a pressure reduction rate corresponding to a pressure interval in which the pressure value of the process chamber is located;

[0015] determining whether the reference pressure reduction rate is less than or equal to the upper limit value of the pressure reduction rate;

[0016] if the reference pressure reduction rate is less than or equal to the upper limit value of the pressure reduction rate, determining the reference pressure reduction rate as a target pressure reduction rate;

[0017] if the reference pressure reduction rate is greater than the upper limit value of the pressure reduction rate, determining the upper limit value of the pressure reduction rate as the target pressure reduction rate.

[0018] Optionally, the second interval of the target pressure interval is determined according to the following manner:

[0019] obtaining an upper limit value of a pressure reduction rate, a lower limit value of a pressure reduction rate, a second preset pressure reduction acceleration and a lower limit value of pressure corresponding to a target pressure interval in which the pressure value of the process chamber is located;

[0020] determining, according to the upper limit value of the pressure reduction rate, the lower limit value of the pressure reduction rate, the second preset pressure reduction acceleration and the lower limit value of pressure, a uniform deceleration pressure reduction starting pressure value corresponding to the target pressure interval in which the pressure value of the process chamber is located;

[0021] taking the uniform deceleration pressure reduction starting pressure value as an upper limit value of the second interval and taking the lower limit value of pressure as a lower limit value of the second interval.

[0022] Optionally, the determining, according to the upper limit value of the pressure reduction rate, the lower limit value of the pressure reduction rate, the second preset pressure reduction acceleration and the lower limit value of pressure, a uniform deceleration pressure reduction starting pressure value corresponding to the target pressure interval in which the pressure value of the process chamber is located, comprises:

[0023] calculating a pressure value requiring uniform deceleration pressure reduction according to the target pressure reduction rate, the lower limit value of the pressure reduction rate and the second preset pressure reduction acceleration;

[0024] calculating the uniform deceleration pressure reduction starting pressure value corresponding to the target pressure interval in which the pressure value of the process chamber is located according to the pressure value requiring uniform deceleration pressure reduction and the lower limit value of pressure.

[0025] Optionally, the second preset deceleration is less than or equal to a preset value, and the preset value is calculated according to a starting pressure value, a pressure lower limit value, an upper limit value of a deceleration rate and a lower limit value of the deceleration rate corresponding to a pressure interval in which the pressure value of the process chamber is located.

[0026] Optionally, the upper limit value of the deceleration rate and the lower limit value of the deceleration rate corresponding to the target pressure interval are determined by the following method:

[0027] A plurality of preset pressure intervals of a plurality of connected process chambers are set; the preset pressure intervals correspond to the target pressure interval;

[0028] A plurality of preset deceleration rates are set for each of the target pressure intervals;

[0029] According to the plurality of preset deceleration rates, when the pressure value of the process chamber is in the upper limit value of each of the target pressure intervals, uniform deceleration is performed according to the plurality of preset deceleration rates respectively, until the pressure value of the process chamber is in the lower limit value of each of the target pressure intervals, the deceleration is stopped, and a plurality of test results corresponding to each of the target pressure intervals are obtained;

[0030] A target offset amount in which the wafer offset amount in the process chamber is less than a preset offset amount is determined from the plurality of test results;

[0031] According to the target offset amount, a target preset deceleration rate corresponding to each of the target pressure intervals is determined respectively;

[0032] The target preset deceleration rate is determined as the upper limit value of the deceleration rate of the target pressure interval corresponding to the target preset deceleration rate;

[0033] The upper limit value of the deceleration rate of the next target pressure interval of each of the target pressure intervals is determined as the lower limit value of the deceleration rate of each of the target pressure intervals.

[0034] Optionally, when the pressure value of the process chamber reaches the uniform deceleration starting pressure value, the deceleration rate of the process chamber is calculated according to the pressure value of the process chamber, the lower limit value of the deceleration rate corresponding to the pressure interval in which the pressure value of the process chamber is located, the second preset acceleration and the pressure lower limit value.

[0035] Embodiments of the present application disclose a pressure control device of a process chamber, the device comprising:

[0036] A first deceleration module is configured to perform uniform deceleration when the pressure value of the process chamber is in a first interval of a target pressure interval;

[0037] a second pressure decreasing module, configured to perform uniform deceleration pressure decreasing until the pressure value of the process chamber enters a next target pressure interval, when the pressure value of the process chamber is in a second interval of the target pressure interval, and return to the step of performing uniform pressure decreasing when the pressure value of the process chamber is in a first interval of the target pressure interval;

[0038] a stopping module, configured to stop pressure decreasing when the pressure value of the process chamber reaches a target pressure value.

[0039] Optionally, the apparatus further comprises:

[0040] an accelerating module, configured to determine a target pressure decreasing rate when starting pressure decreasing of the process chamber, and perform uniform acceleration pressure decreasing at a first preset pressure decreasing acceleration until the pressure decreasing rate reaches the target pressure decreasing rate, so that the pressure value of the process chamber is in a first interval of an initial pressure interval;

[0041] a third pressure decreasing module, configured to perform uniform pressure decreasing at the target pressure decreasing rate until the pressure value of the process chamber enters a second interval of the initial pressure interval, when the pressure value of the process chamber is in the first interval of the initial pressure interval;

[0042] a fourth pressure decreasing module, configured to perform uniform deceleration pressure decreasing until the pressure value of the process chamber enters a target pressure interval, when the pressure value of the process chamber is in the second interval of the initial pressure interval.

[0043] Optionally, the accelerating module comprises:

[0044] a first obtaining sub-module, configured to obtain a reference pressure decreasing rate in a process recipe;

[0045] a second obtaining sub-module, configured to obtain an upper limit value of a pressure decreasing rate corresponding to a pressure interval in which the pressure value of the process chamber is located;

[0046] a judging sub-module, configured to judge whether the reference pressure decreasing rate is less than or equal to the upper limit value of the pressure decreasing rate;

[0047] a first determining sub-module, configured to determine the reference pressure decreasing rate as a target pressure decreasing rate, if the reference pressure decreasing rate is less than or equal to the upper limit value of the pressure decreasing rate;

[0048] a second determining sub-module, configured to determine the upper limit value of the pressure decreasing rate as the target pressure decreasing rate, if the reference pressure decreasing rate is greater than the upper limit value of the pressure decreasing rate.

[0049] Optionally, the second interval of the target pressure interval is determined according to the following module:

[0050] The acquisition module is configured to acquire an upper limit value of a pressure decreasing rate, a lower limit value of the pressure decreasing rate, a second preset pressure decreasing acceleration, and a pressure lower limit value corresponding to a target pressure interval of the process chamber;

[0051] The first determination module is configured to determine, according to the upper limit value of the pressure decreasing rate, the lower limit value of the pressure decreasing rate, the second preset pressure decreasing acceleration, and the pressure lower limit value, a uniform deceleration pressure decreasing starting pressure value corresponding to the target pressure interval of the process chamber;

[0052] The second determination module is configured to take the uniform deceleration pressure decreasing starting pressure value as an upper limit value of the second interval and take the pressure lower limit value as a lower limit value of the second interval.

[0053] Optionally, the first determination module comprises:

[0054] The first calculation submodule is configured to calculate, according to the target pressure decreasing rate, the lower limit value of the pressure decreasing rate, and the second preset pressure decreasing acceleration, a pressure value that needs to be subjected to uniform deceleration pressure decreasing.

[0055] The second calculation submodule is configured to calculate, according to the pressure value that needs to be subjected to uniform deceleration pressure decreasing and the pressure lower limit value, a uniform deceleration pressure decreasing starting pressure value corresponding to the target pressure interval of the process chamber.

[0056] Optionally, the second preset pressure decreasing acceleration is less than or equal to a preset value, and the preset value is calculated according to a starting pressure value, a pressure lower limit value, an upper limit value of a pressure decreasing rate, and a lower limit value of the pressure decreasing rate corresponding to a pressure interval in which a pressure value of the process chamber is located.

[0057] Optionally, the upper limit value of the pressure decreasing rate and the lower limit value of the pressure decreasing rate corresponding to the target pressure interval are determined by the following module:

[0058] The first setting module is configured to set preset pressure intervals of a plurality of connected process chambers; the preset pressure intervals correspond to the target pressure intervals.

[0059] The second setting module is configured to set a plurality of preset pressure decreasing rates for each of the target pressure intervals.

[0060] The testing module is configured to, when a pressure value of the process chamber is at an upper limit value of each of the target pressure intervals, respectively perform uniform pressure decreasing according to the plurality of preset pressure decreasing rates until the pressure value of the process chamber is at a lower limit value of each of the target pressure intervals, stop pressure decreasing, and obtain a plurality of test results corresponding to each of the target pressure intervals.

[0061] a third determining module configured to determine a target offset from the wafer offset in the process chamber in the plurality of test results that is less than a preset offset;

[0062] a fourth determining module configured to determine a target preset pressure decreasing rate corresponding to each of the target pressure intervals according to the target offset;

[0063] a fifth determining module configured to determine the target preset pressure decreasing rate as an upper limit of the pressure decreasing rate of the target pressure interval corresponding to the target preset pressure decreasing rate;

[0064] a sixth determining module configured to determine an upper limit of the pressure decreasing rate of a next target pressure interval of each of the target pressure intervals as a lower limit of the pressure decreasing rate of each of the target pressure intervals.

[0065] Optionally, when the pressure value of the process chamber reaches the uniform deceleration pressure decreasing starting pressure value, the pressure decreasing rate of the process chamber is calculated according to the pressure value of the process chamber, the lower limit of the pressure decreasing rate corresponding to the pressure interval in which the pressure value of the process chamber is located, the second preset acceleration and the pressure lower limit value.

[0066] The application further discloses a semiconductor process equipment, including a memory, a processor and a computer program stored on the memory and executable on the processor, and the processor implements the steps of the pressure control method of the process chamber.

[0067] The application further discloses a computer readable storage medium, and the computer readable storage medium stores a computer program, and the computer program is executable on the processor to implement the steps of the pressure control method of the process chamber.

[0068] The application has the following advantages:

[0069] In the embodiment of the application, when the pressure value of the process chamber is in the first interval of the target pressure interval, uniform pressure decreasing is performed, when the pressure value of the process chamber is in the second interval of the target pressure interval, uniform deceleration pressure decreasing is performed, until the pressure value of the process chamber enters a next target pressure interval, and the step of returning to performing uniform pressure decreasing when the pressure value of the process chamber is in the first interval of the target pressure interval is performed, and when the pressure value of the process chamber reaches a target pressure value, pressure decreasing is stopped, so that different pressure decreasing rates and pressure decreasing modes are used in different pressure intervals in the pressure decreasing process, and then a higher pressure decreasing rate can be used for pressure decreasing when the pressure value of the process chamber is higher, and the pressure decreasing rate is gradually reduced with the reduction of the pressure value of the process chamber, so that the pressure decreasing rate is greatly improved under the condition that the wafer in the process chamber does not produce a large offset, and the production efficiency is further improved. BRIEF DESCRIPTION OF DRAWINGS

[0070] Figure 1 is a step flow chart of a pressure control method of a process chamber provided by an embodiment of the present application;

[0071] Figure 2 is a schematic diagram of a relationship between a pressure value and a decompression rate of an industrial chamber provided by an embodiment of the present application;

[0072] Figure 3 is a step flow chart of another pressure control method of a process chamber provided by an embodiment of the present application;

[0073] Figure 4 is a comparison schematic diagram with uniform decompression provided by an embodiment of the present application;

[0074] Figure 5 is a structural block diagram of a pressure control device of a process chamber provided by an embodiment of the present application. DETAILED DESCRIPTION

[0075] In order to make the above-mentioned purposes, features and advantages of the present application more apparent and easy to understand, the present application will be further described in detail below with reference to the drawings and specific embodiments.

[0076] In the related art, a constant lower rate is used for decompression, which can ensure that the wafer does not deviate greatly, but it takes a long time to decompress to the final pressure, thereby seriously affecting the production efficiency. In order to solve the above technical problems, an embodiment of the present application provides a pressure control method of a process chamber, uniform decompression is performed when a pressure value of the process chamber is in a first interval of a target pressure interval, uniform deceleration decompression is performed when the pressure value of the process chamber is in a second interval of the target pressure interval, until the pressure value of the process chamber enters a next target pressure interval, and the step of performing uniform decompression is returned when the pressure value of the process chamber is in the first interval of the target pressure interval, and the decompression is stopped when the pressure value of the process chamber reaches a target pressure value. In this way, different decompression rates and decompression modes are used in different pressure intervals during the decompression process, so that a higher decompression rate can be used when the pressure value of the process chamber is high, and the decompression rate is gradually reduced as the pressure value of the process chamber decreases, thereby greatly improving the decompression rate and further improving the production efficiency while ensuring that the wafer in the process chamber does not deviate greatly.

[0077] Reference Figure 1 , a step flow chart of a pressure control method of a process chamber provided by an embodiment of the present application is shown, which can specifically include the following steps:

[0078] Step 101, when the pressure value of the process chamber is in a first interval of a target pressure interval, uniform pressure reduction is performed.

[0079] In the embodiment of the present application, before the chamber starts to reduce pressure, parameters can be configured in the machine, including: range of pressure interval, acceleration corresponding to pressure interval, upper limit value of pressure reduction rate, lower limit value of pressure reduction rate, and lower limit value of pressure, etc. That is, before the process chamber starts to reduce pressure, a pressure reduction experiment is performed to determine the change relationship between pressure reduction rate and pressure value in the process chamber. When the parameters are configured or the pressure reduction experiment is performed, data of the wafer offset in the chamber less than a preset offset is recorded, and the preset offset can be 1mm.

[0080] In the embodiment of the present application, the configured pressure interval includes the target pressure interval, and the upper limit value and the lower limit value of the pressure reduction rate corresponding to the target pressure interval can be determined by the following method: setting a plurality of preset pressure intervals of the process chamber; the preset pressure interval corresponds to the target pressure interval; setting a plurality of preset pressure reduction rates for each target pressure interval; according to the plurality of preset pressure reduction rates, when the pressure value of the process chamber is in the upper limit value of each target pressure interval, uniform pressure reduction is performed according to the plurality of preset pressure reduction rates, respectively, until the pressure value of the process chamber is in the lower limit value of each target pressure interval, the pressure reduction is stopped, and a plurality of test results corresponding to each target pressure interval are obtained; determining the target offset of the wafer offset in the process chamber less than the preset offset in the plurality of test results; according to the target offset, the target preset pressure reduction rate corresponding to each target pressure interval is determined; the target preset pressure reduction rate is determined as the upper limit value of the pressure reduction rate corresponding to the target preset pressure reduction rate; and the upper limit value of the pressure reduction rate of the next target pressure interval of each target pressure interval is determined as the lower limit value of the pressure reduction rate of each target pressure interval.

[0081] Specifically, multiple target pressure ranges can be set, such as 600-500 Torr, 500-200 Torr, 200-100 Torr, 100-40 Torr, etc. Multiple preset pressure reduction rates are set for each target pressure range; for example, preset pressure reduction rates of 20 Torr / s and 15 Torr / s are set for the 600-500 Torr target pressure range, and preset pressure reduction rates of 13 Torr / s and 12 Torr / s are set for the 500-200 Torr target pressure range, etc. Then, the pressure is reduced uniformly according to the set preset pressure reduction rates until the pressure value in the process chamber is at the lower limit of each target pressure range. Pressure reduction is then stopped, and multiple test results are obtained for each target pressure range. Then, data groups whose offset in the chamber wafer is less than a preset offset are identified from the multiple test results. For example, for the 600-500 Torr target pressure range, using a preset rate of 20 Torr / s for uniform pressure reduction results in an offset in the chamber wafer that is less than the preset offset. Ultimately, experiments determined that a pressure rate of 20 Torr / s can be used in the 600-500 Torr pressure range, 13 Torr / s in the 500-200 Torr pressure range, 4 Torr / s in the 200-100 Torr pressure range, 2 Torr / s in the 100-40 Torr pressure range, and 1.5 Torr / s in the pressure range below 40 Torr. Based on the experimental data, the relationship between the pressure drop rate and the pressure value in the process chamber was also determined. Figure 2 The diagram illustrates the relationship between the pressure reduction rate and the pressure value of the process chamber according to an embodiment of the present invention. Figure 2 The thin solid line curve in the figure represents the relationship between the pressure drop rate and the pressure value of the process chamber obtained from the experimental data. It should be noted that if other pressure values ​​of the process chamber are selected, the relationship between the pressure drop rate and the pressure value of the process chamber can also be determined according to the experimental method of this invention. The specific range of the pressure value of the process chamber selected in the specific experiment can be set according to actual needs, and this invention does not make specific limitations here. According to the experiment, the parameter configuration table in Table (1) can be obtained as follows. Table (1) is a parameter configuration table in which the parameters are configured in the machine tool first:

[0082]

[0083] It should be noted that the upper limit value of the pressure reduction rate of the next target pressure interval of the target pressure interval is determined as the lower limit value of the pressure reduction rate of each target pressure interval, for example: the target pressure interval is 500-200 Torr, the upper limit value of the pressure reduction rate of 500-200 Torr is 13 Torr / s, the next target pressure interval of the target pressure interval is 200-100 Torr, and the upper limit value of the pressure reduction rate of 200-100 Torr is 4 Torr / s. 4 Torr / s can be used as the lower limit value of the pressure reduction rate of the target pressure interval 500-200 Torr.

[0084] In the embodiment of the present application, when the pressure of the process chamber is being reduced, uniform speed reduction is performed when the pressure value of the process chamber is in the first interval of the target pressure interval. In the present application, the target pressure interval can include a first interval and a second interval, the first interval can be a uniform speed reduction interval, and the second interval can be a uniform deceleration reduction interval. The target pressure interval is determined from a plurality of preset pressure intervals according to the pressure of the process chamber.

[0085] For example, when the target pressure interval is 500-200 Torr, and the pressure value of the process chamber is 500 Torr, it indicates that the pressure value of the process chamber is in the first interval of the target pressure interval, and uniform speed reduction can be performed according to the current pressure reduction rate.

[0086] In the embodiment of the present application, the pressure control method of the process chamber can further include: determining a target pressure reduction rate when the process chamber starts to reduce pressure, and performing uniform acceleration reduction at a first preset pressure reduction acceleration until the pressure reduction rate reaches the target pressure reduction rate, so that the pressure value of the process chamber is in the first interval of the initial pressure interval; when the pressure value of the process chamber is in the first interval of the initial pressure interval, uniform speed reduction is performed at the target pressure reduction rate until the pressure value of the process chamber enters the second interval of the initial pressure interval; and when the pressure value of the process chamber is in the second interval of the initial pressure interval, uniform deceleration reduction is performed until the pressure value of the process chamber enters the target pressure interval.

[0087] Specifically, when the pressure value of the process chamber starts to decrease, the pressure value of the process chamber is in an initial pressure interval, that is, the pressure interval corresponding to the pressure value of the process chamber when the pressure starts to decrease is the initial pressure interval. In the initial pressure interval, a uniform acceleration pressure decreasing phase, a uniform speed pressure decreasing phase and a uniform deceleration pressure decreasing phase are passed. It can also be understood that the initial pressure interval includes a uniform acceleration pressure decreasing interval, a first interval and a second interval. The first interval can be a uniform speed pressure decreasing interval, and the second interval can be a uniform deceleration pressure decreasing interval. It should be noted that in the present application, the target pressure interval corresponding to the pressure value of the process chamber when the pressure starts to decrease can be used as the initial pressure interval. For example, when the pressure value of the process chamber is 580 Torr at the beginning of the pressure decrease, the target pressure interval corresponding to 580 Torr is 600-500 Torr, and the target pressure interval corresponding to 600-500 Torr can be used as the initial pressure interval.

[0088] When the pressure of the process chamber starts to decrease, the pressure of the process chamber is first uniformly accelerated to decrease at a first preset acceleration until the pressure decreases.

[0089] In an embodiment, determining the target pressure decreasing rate can include: obtaining a reference pressure decreasing rate in a process recipe; obtaining an upper limit value of the pressure decreasing rate corresponding to the pressure interval in which the pressure value of the process chamber is located; determining whether the reference pressure decreasing rate is less than or equal to the upper limit value of the pressure decreasing rate; if the reference pressure decreasing rate is less than or equal to the upper limit value of the pressure decreasing rate, the reference pressure decreasing rate is determined as the target pressure decreasing rate; if the reference pressure decreasing rate is greater than the upper limit value of the pressure decreasing rate, the upper limit value of the pressure decreasing rate is determined as the target pressure decreasing rate.

[0090] For example, when the pressure of the process chamber starts to decrease, the pressure value of the process chamber is 580 Torr, and the above table (1) or Figure 2 It can be known that the upper limit of the pressure decreasing rate corresponding to the pressure interval of 600-500 Torr corresponding to 580 Torr is 20 Torr / s, the reference pressure decreasing rate obtained in the process recipe is 19 Torr / s, and the target pressure decreasing rate determined is 19 Torr / s. If the reference pressure decreasing rate obtained in the process recipe is 21 Torr / s, the target pressure decreasing rate determined is 20 Torr / s.

[0091] In the present application, after uniform acceleration pressure reduction is performed according to the first preset pressure reduction acceleration until the pressure reduction rate reaches the target pressure reduction rate, the pressure value of the process chamber is in the first interval of the initial pressure interval, or, after uniform acceleration pressure reduction is performed according to the first preset pressure reduction acceleration until the pressure reduction rate reaches the target pressure reduction rate, it is determined that the pressure value of the process chamber is in the first interval of the initial pressure interval. That is, after uniform acceleration pressure reduction is performed according to the first preset pressure reduction acceleration until the pressure reduction rate reaches the target pressure reduction rate, uniform speed pressure reduction is started according to the target pressure reduction rate.

[0092] In the embodiment of the present application, when the process chamber starts to reduce pressure, uniform acceleration pressure reduction can be performed according to the first preset acceleration, such as Figure 2 The bold solid line curve in the figure is a curve diagram of uniform acceleration pressure reduction according to the first preset acceleration. That is, when the process chamber starts to reduce pressure in the present application, it first enters the acceleration stage, and the pressure reduction rate corresponding to each time point can be calculated according to the initial pressure reduction rate and the first preset acceleration. Each time can be determined according to the interval time, for example: the process chamber is uniformly accelerated to reduce pressure for 2 seconds, that is, the current pressure reduction time is 2 seconds, and the current is the second time point according to the interval time. Then the current pressure reduction rate can be calculated according to the formula V=V1+at, where V is the pressure reduction rate, a is the first preset pressure reduction acceleration, t is the time point, and V1 is the starting rate of uniform acceleration pressure reduction. The starting rate of uniform acceleration pressure reduction is generally 0. The present application performs uniform acceleration pressure reduction according to the first preset acceleration, which avoids the problem of particle caused by sudden change of butterfly valve opening.

[0093] In the present application, when starting to reduce pressure, the pressure point at which uniform deceleration pressure reduction starts in the initial pressure interval can be first determined. The pressure point at which uniform deceleration pressure reduction starts in the initial pressure interval is the uniform deceleration pressure reduction starting value corresponding to the initial pressure interval, that is, it is determined when to start uniform deceleration pressure reduction. The pressure point at which uniform deceleration pressure reduction starts is the upper limit value of the second interval. For example, as shown in Figure 2 △P1 in the figure is the uniform deceleration pressure reduction interval of the 600-500 Torr pressure interval. In the present application, the uniform deceleration pressure reduction starting value corresponding to the initial pressure interval can be determined in the following way:

[0094] The upper limit value of the pressure reduction rate, the lower limit value of the pressure reduction rate, the second preset pressure reduction acceleration and the lower limit value of the pressure corresponding to the initial pressure interval of the pressure value of the process chamber are obtained; and the uniform deceleration pressure reduction starting pressure value of the initial pressure interval of the pressure value of the process chamber corresponding to the initial pressure interval is determined according to the upper limit value of the pressure reduction rate, the lower limit value of the pressure reduction rate, the second preset pressure reduction acceleration and the lower limit value of the pressure.

[0095] For example, if the initial pressure interval is 600-500 Torr, then from Table (1), it can be known that the corresponding lower limit of the pressure reduction rate is 13 Torr / s, and the second preset pressure reduction acceleration is 5 Torr / s 2 , the lower limit of the pressure is 500 Torr, and the upper limit of the pressure reduction rate of the initial pressure interval is the determined target pressure reduction rate.

[0096] Specifically, the pressure value that needs to be uniformly decelerated can be calculated according to the target pressure reduction rate, the lower limit of the pressure reduction rate, and the second preset pressure reduction acceleration, that is, the value of ΔP1 in the formula (1) is calculated, and then ΔP1 is added to the lower limit of the pressure corresponding to the initial pressure interval, that is, 500 Torr, so that the initial pressure interval corresponding to the uniformly decelerated pressure reduction starting pressure value can be obtained. Figure 2

[0097] In the present application, the starting pressure value that needs to be uniformly decelerated can be calculated by the following formula (1):

[0098]

[0099] Wherein, ΔP is the starting pressure value that needs to be uniformly decelerated in the initial pressure interval of the pressure value of the process chamber, that is, ΔP is ΔP1, V n is the upper limit of the pressure reduction rate corresponding to the initial pressure interval of the pressure value of the process chamber, that is, the target pressure reduction rate, V n-1 is the lower limit of the pressure reduction rate corresponding to the initial pressure interval of the pressure value of the process chamber, A n is the second preset acceleration corresponding to the initial pressure interval of the pressure value of the process chamber. For example, if the initial pressure interval is 600-500 Torr, the upper limit of the pressure reduction rate of the initial pressure interval is 20 Torr / s, the lower limit of the pressure reduction rate is 13 Torr / s, and the second preset acceleration is 5 Torr / s 2 , then the pressure value that needs to be uniformly decelerated can be calculated according to formula (1) as 23.1 Torr. Then, the pressure value that needs to be uniformly decelerated is added to the lower limit of the pressure, so that the initial pressure interval corresponding to the uniformly decelerated pressure reduction starting pressure value of the pressure value of the process chamber can be obtained. That is, the uniformly decelerated pressure reduction starting pressure is 23.1 Torr+500 Torr=523.1 Torr, which also shows that the uniformly decelerated pressure reduction interval of the initial pressure interval of 600-500 Torr is 523.1-500 Torr. That is, when the pressure of the process chamber reaches 523.1 Torr, the uniformly decelerated pressure reduction can be performed. It should be noted that the second preset pressure reduction acceleration in the present application is less than or equal to the preset value, and the preset value can be calculated according to the starting pressure value corresponding to the pressure interval of the pressure value of the process chamber, the lower limit of the pressure, the upper limit of the pressure reduction rate, and the lower limit of the pressure reduction rate. The preset value can be calculated according to the formula ​The calculation yields, where P n+1 P is the initial pressure value corresponding to the pressure range of the process chamber; n V represents the lower limit of the pressure range corresponding to the pressure value of the process chamber; n The V is the upper limit of the pressure drop rate corresponding to the pressure range of the process chamber; n-1 This is the lower limit of the pressure drop rate corresponding to the pressure range in which the pressure value of the process chamber is located.

[0100] In this invention, during uniform deceleration and pressure reduction in the initial pressure range, the pressure value of the process chamber can be reduced until it enters the target pressure range. After the pressure value of the process chamber enters the target pressure range, the pressure value of the process chamber can be in the first range of the target pressure range. When the pressure value of the process chamber is in the first range of the pressure range, uniform pressure reduction can be performed.

[0101] For example: Figure 2 As shown, 600-500 Torr is the initial pressure range. When the pressure value of the process chamber reaches 500 Torr, it enters the first range of the target pressure range of 500-200 Torr. That is, when the pressure value of the process chamber reaches 500 Torr, it is depressurized at a constant rate of 13 Torr / s.

[0102] Step 102: When the pressure value of the process chamber is in the second range of the target pressure range, perform uniform deceleration to reduce the pressure until the pressure value of the process chamber enters the next target pressure range, and then return to the step of uniform deceleration when the pressure value of the process chamber is in the first range of the target pressure range.

[0103] In this embodiment of the invention, when the pressure in the process chamber is in the first range of the target pressure range, the pressure is reduced at a constant speed until the pressure in the process chamber is in the second range of the target pressure range. When the pressure in the process chamber is in the second range of the target pressure range, the pressure is reduced at a constant speed until the pressure in the process chamber enters the next target pressure range. Then the pressure is reduced at a constant speed until the pressure in the process chamber is in the second range of the target pressure range, and then the pressure is reduced at a constant speed.

[0104] For example: the initial pressure range is 600-500 Torr. When the pressure in the process chamber reaches 500 Torr, it falls within the target pressure range of 500-200 Torr. At this point, the pressure is reduced at a constant rate until it falls within the second range of the target pressure range of 500-200 Torr. Once the pressure is within the second range, the pressure is reduced at a constant rate until it enters the next target pressure range of 200-100 Torr. Then, the pressure is reduced to 200 Torr. This process is repeated until the pressure falls within the second range of the target pressure range of 200-100 Torr. Finally, the pressure is reduced at a constant rate until it enters the next target pressure range of 100-40 Torr. This cycle of pressure reduction continues.

[0105] In this embodiment of the invention, the second interval of the target pressure range can be determined as follows: obtain the upper limit of the decompression rate, the lower limit of the decompression rate, the second preset decompression acceleration, and the lower limit of the pressure corresponding to the target pressure range where the pressure value of the process chamber is located; determine the uniform deceleration decompression starting pressure value corresponding to the target pressure range where the pressure value of the process chamber is located based on the upper limit of the decompression rate, the lower limit of the decompression rate, the second preset decompression acceleration, and the lower limit of the pressure; take the uniform decompression starting pressure value as the upper limit of the second interval and the lower limit of the pressure as the lower limit of the second interval.

[0106] In one embodiment, determining the initial pressure value for uniform deceleration pressure reduction corresponding to the target pressure range where the pressure value of the process chamber is located, based on the upper limit of the deceleration rate, the lower limit of the deceleration rate, the second preset deceleration acceleration, and the lower limit of the pressure, includes: calculating the pressure value that needs to be uniformly decelerated and decelerated based on the target deceleration rate, the lower limit of the deceleration rate, and the second preset deceleration acceleration; and calculating the initial pressure value for uniform deceleration pressure reduction corresponding to the target pressure range where the pressure value of the process chamber is located, based on the pressure value that needs to be uniformly decelerated and decelerated and the lower limit of the pressure.

[0107] In this invention, the method for determining the initial pressure value of uniform deceleration and pressure reduction corresponding to the target pressure range where the pressure value of the process chamber is located is the same as the method for determining the initial pressure value of uniform deceleration and pressure reduction corresponding to the initial pressure range where the pressure value of the process chamber is located, and will not be described in detail here.

[0108] It should be noted that when calculating the pressure value required for uniform deceleration and pressure reduction within the target pressure range, the pressure is obtained using the above formula (1). Formula (1) ΔP represents the initial pressure value required for uniform deceleration and pressure reduction within the target pressure range, i.e., when ΔP is □P2. nV is an upper limit value of a pressure decreasing rate corresponding to a target pressure interval in which the pressure value of the process chamber is located n-1 A is a lower limit value of a pressure decreasing rate corresponding to the target pressure interval in which the pressure value of the process chamber is located n The second preset acceleration corresponding to the target pressure interval in which the pressure value of the process chamber is located. After the starting pressure value of the uniform deceleration pressure reduction required by the target pressure interval is calculated, the starting pressure value of the uniform deceleration pressure reduction can be used as the upper limit value of the second interval of the target pressure interval, and the lower limit value of the pressure of the target pressure interval can be used as the lower limit value of the second interval.

[0109] It should be noted that the pressure value of the process chamber in the present application can be obtained by issuing the pressure value. When the process chamber starts to reduce pressure, it is first in the uniform acceleration pressure reduction interval. The pressure value issued in each time interval after the uniform acceleration pressure reduction interval can be calculated according to the starting pressure value and the first preset acceleration, that is, the pressure value issued after each 1 second. Specifically, it can be calculated by the following formula (2):

[0110]

[0111] Wherein, P1 is the pressure value issued in the uniform acceleration pressure reduction interval, that is, the issued pressure point, P1 corresponds to each time interval, P0 is the starting pressure value, A1 is the first preset acceleration, and t is the pressure reduction time of the uniform acceleration pressure reduction interval. For example: the starting pressure value is 600 Torr, the first issued pressure point is: 600-(5*1 2 / 2), the second issued pressure point is: 600-(5*2 2 / 2), the third issued pressure point is: 600-(5*3 2 / 2), and so on. The pressure reduction rate corresponding to the issued pressure point is A1*t. When the uniform speed pressure reduction is carried out, the subsequent issued pressure point is calculated by the following formula P2=P n -V n *t, wherein P2 is the pressure value issued in the uniform speed pressure reduction interval, that is, the issued pressure point, P n is the current pressure value of the process chamber, V n is an upper limit value of a pressure decreasing rate corresponding to a pressure interval in which the pressure value of the process chamber is located, and when the pressure interval in which the pressure value of the process chamber is located is an initial pressure interval, V n is a target pressure decreasing rate, and t is the pressure reduction time of the uniform speed pressure reduction interval.

[0112] In the present application, when the pressure value of the process chamber reaches the uniform deceleration pressure reduction starting pressure value, the pressure reduction rate of the process chamber is calculated according to the pressure value of the process chamber, the lower limit value of the pressure decreasing rate corresponding to the pressure interval in which the pressure value of the process chamber is located, the second preset acceleration and the lower limit value of the pressure.

[0113] Specifically, when entering the uniform deceleration pressure reduction interval, the corresponding pressure reduction rate of the issued pressure can be calculated according to the following formula (3):

[0114]

[0115] Wherein, V is the pressure reduction rate corresponding to the issued pressure point, that is, the pressure reduction rate of the process chamber, V n-1 is the lower limit value of the pressure reduction rate corresponding to the pressure interval of the pressure value of the process chamber, A n is the second preset acceleration corresponding to the pressure interval in which the pressure value of the process chamber is located, P is the pressure value of the process chamber, P n-1 is the lower limit value of the pressure corresponding to the pressure interval in which the pressure value of the process chamber is located.

[0116] For example: the uniform deceleration pressure reduction starting pressure value corresponding to the pressure interval in which the pressure value of the process chamber is located is 523.1 Torr, and the pressure value of the process chamber is 521, then the formula (3) is used to calculate the pressure reduction rate corresponding to the issued pressure point, that is, the current pressure reduction rate, which is calculated as 19.47 Torr / s, and then the pressure value of the next pressure point is issued as 521-(19.47*1-5*1 2 / 2), the pressure value of the next pressure point is calculated as 504.03 Torr, that is, the pressure value of the process chamber in the next second is 504.03 Torr, which is greater than 500 Torr, that is, the process chamber in the next second is in the uniform deceleration pressure reduction interval, then the formula (3) is used to calculate the pressure reduction rate corresponding to the issued pressure point in the next second, which is calculated as 14.46 Torr / s, and the pressure value of the next pressure point is calculated as 492.07 Torr, which is less than 500 Torr, indicating that the process chamber enters the next pressure interval in the next second, and the pressure reduction is carried out at a uniform speed according to the upper limit value of the pressure reduction rate of the next interval, that is, at a uniform speed of 13 Torr / s 2 .

[0117] Step 103: when the pressure value of the process chamber reaches the target pressure value, stop the pressure reduction.

[0118] In the embodiment of the application, before the process chamber starts to reduce pressure, the target pressure value in the process recipe can be obtained first, and when the pressure value of the process chamber reaches the target pressure value, the pressure reduction is stopped.

[0119] In order to better understand the embodiments of the application, as Figure 3 shown, a step flow chart of another pressure control method of a process chamber provided by an embodiment of the application is shown, and the steps are as follows:

[0120] According to the pressure value of the process chamber, a pressure interval in which the pressure value of the process chamber is located is determined, a configuration value corresponding to the pressure interval is determined, and the configuration value includes: a pressure decreasing rate upper limit value, a pressure decreasing rate lower limit value, a second preset pressure decreasing acceleration, a pressure lower limit value, etc. The uniform acceleration pressure decreasing is performed according to the first preset pressure decreasing acceleration, it is judged whether the reference pressure decreasing rate in the process recipe is less than or equal to the pressure decreasing rate upper limit value, if the reference pressure decreasing rate is less than or equal to the pressure decreasing rate upper limit value, the reference pressure decreasing rate in the process recipe is determined as the target pressure decreasing rate, if the reference pressure decreasing rate is greater than the pressure decreasing rate upper limit value, the pressure decreasing rate upper limit value is determined as the target pressure decreasing rate, after the pressure decreasing rate reaches the target pressure decreasing rate, the uniform speed pressure decreasing is performed according to the target pressure decreasing rate, and a uniform deceleration pressure decreasing starting pressure value corresponding to the pressure interval in which the pressure value of the process chamber is located is determined, it is judged whether the pressure value of the process chamber reaches the uniform deceleration pressure decreasing starting pressure value, if not, the uniform speed pressure decreasing is continued until the pressure decreasing to the pressure value of the process chamber reaches the uniform deceleration pressure decreasing starting pressure value, and the uniform deceleration pressure decreasing is performed, if yes, the uniform deceleration pressure decreasing is performed until the pressure value of the process chamber enters the target pressure interval, when the pressure value of the process chamber enters the target pressure interval, the uniform speed pressure decreasing is performed according to the pressure decreasing rate upper limit value corresponding to the target pressure interval, and it is judged whether the pressure value of the process chamber reaches the starting pressure value of the uniform deceleration pressure decreasing, if not, the uniform speed pressure decreasing is continued until the pressure decreasing to the pressure value of the process chamber reaches the starting pressure value of the uniform deceleration pressure decreasing, and the uniform deceleration pressure decreasing is performed, if yes, the uniform deceleration pressure decreasing is performed until the pressure value of the process chamber enters the next target pressure interval, and the uniform speed pressure decreasing is performed according to the pressure decreasing rate upper limit value corresponding to the target pressure interval, and it is judged whether the pressure value of the process chamber reaches the starting pressure value of the uniform deceleration pressure decreasing, thereby the cycle segmented pressure decreasing is performed.

[0121] It should be noted that during the pressure decreasing process, it is judged in real time whether the pressure value of the process chamber reaches the target pressure value, when the pressure value of the process chamber reaches the target pressure value, the pressure decreasing is stopped, and the pressure decreasing is completed.

[0122] In the embodiment of the present application, when the pressure value of the process chamber is in the first interval of the target pressure interval, uniform speed pressure reduction is performed, when the pressure value of the process chamber is in the second interval of the target pressure interval, uniform deceleration pressure reduction is performed, until the pressure value of the process chamber enters the next target pressure interval, and returns to the step of performing uniform speed pressure reduction when the pressure value of the process chamber is in the first interval of the target pressure interval, and stops pressure reduction when the pressure value of the process chamber reaches the target pressure value, so that different pressure reduction rates and pressure reduction modes are used in different pressure intervals during the pressure reduction process, thereby a higher pressure reduction rate can be used when the pressure value of the process chamber is high, and the pressure reduction rate is gradually reduced as the pressure value of the process chamber decreases, thereby greatly improving the pressure reduction rate and further improving the production efficiency while ensuring that the wafer in the process chamber does not produce large deviation.

[0123] As shown in Figure 4 , a comparison diagram of uniform speed pressure reduction is shown, wherein the solid line is the segmented pressure reduction mode of the present application, and the dashed line is the uniform speed pressure reduction mode, the pressure reduction rate of the uniform speed pressure reduction is 1.5 Torr / s, the wafer deviation of the uniform speed pressure reduction mode is 0.3-0.7 mm, and the total time from 600 Torr to 10 Torr is 397.4 s, and the total time from 600 Torr to 10 Torr is 135.2.4 s by using the pressure reduction mode of the present application, and the wafer deviation is 0.2-0.7 mm. It can be seen that the pressure reduction rate of the pressure reduction mode of the present application is greatly improved, the pressure reduction time is significantly shortened, and the production capacity of the machine can be greatly improved.

[0124] It should be noted that for the method embodiment, in order to simply describe, it is expressed as a series of action combinations, but those skilled in the art should know that the embodiment of the present application is not limited by the described action sequence, because according to the embodiment of the present application, certain steps can be performed in other order or simultaneously. Secondly, those skilled in the art should know that the embodiments described in the specification all belong to preferred embodiments, and the actions involved are not necessarily necessary for the embodiment of the present application.

[0125] Referring to Figure 5 , a structural block diagram of a pressure control device of a process chamber provided by the embodiment of the present application is shown, which can specifically include the following modules:

[0126] The first pressure reduction module 501 is configured to perform uniform speed pressure reduction when the pressure value of the process chamber is in the first interval of the target pressure interval;

[0127] The second pressure reducing module 502 is configured to perform uniform deceleration pressure reduction until the pressure value of the process chamber enters a next target pressure interval when the pressure value of the process chamber is in a second interval of the target pressure interval, and return to the step of performing uniform pressure reduction when the pressure value of the process chamber is in the first interval of the target pressure interval.

[0128] The stopping module 503 is configured to stop pressure reduction when the pressure value of the process chamber reaches a target pressure value.

[0129] Optionally, the device further comprises:

[0130] The acceleration module is configured to determine a target pressure reduction rate when starting pressure reduction on the process chamber, and perform uniform acceleration pressure reduction at a first preset pressure reduction acceleration until the pressure reduction rate reaches the target pressure reduction rate, so that the pressure value of the process chamber is in a first interval of an initial pressure interval.

[0131] The third pressure reducing module is configured to perform uniform pressure reduction at the target pressure reduction rate when the pressure value of the process chamber is in the first interval of the initial pressure interval, until the pressure value of the process chamber enters a second interval of the initial pressure interval.

[0132] The fourth pressure reducing module is configured to perform uniform deceleration pressure reduction when the pressure value of the process chamber is in the second interval of the initial pressure interval, until the pressure value of the process chamber enters a target pressure interval.

[0133] Optionally, the acceleration module comprises:

[0134] The first obtaining sub-module is configured to obtain a reference pressure reduction rate in a process recipe.

[0135] The second obtaining sub-module is configured to obtain an upper limit value of a pressure reduction rate corresponding to a pressure interval in which the pressure value of the process chamber is located.

[0136] The judging sub-module is configured to judge whether the reference pressure reduction rate is less than or equal to the upper limit value of the pressure reduction rate.

[0137] The first determining sub-module is configured to determine the reference pressure reduction rate as a target pressure reduction rate if the reference pressure reduction rate is less than or equal to the upper limit value of the pressure reduction rate.

[0138] The second determining sub-module is configured to determine the upper limit value of the pressure reduction rate as the target pressure reduction rate if the reference pressure reduction rate is greater than the upper limit value of the pressure reduction rate.

[0139] Optionally, the second interval of the target pressure interval is determined according to the following module:

[0140] an acquisition module, configured to acquire an upper limit value of a pressure decreasing rate, a lower limit value of the pressure decreasing rate, a second preset pressure decreasing acceleration and a pressure lower limit value corresponding to a target pressure interval of a pressure value of the process chamber;

[0141] a first determination module, configured to determine, according to the upper limit value of the pressure decreasing rate, the lower limit value of the pressure decreasing rate, the second preset pressure decreasing acceleration and the pressure lower limit value, a uniform deceleration pressure decreasing starting pressure value corresponding to the target pressure interval of the pressure value of the process chamber;

[0142] a second determination module, configured to take the uniform deceleration pressure decreasing starting pressure value as an upper limit value of the second interval and take the pressure lower limit value as a lower limit value of the second interval.

[0143] Optionally, the first determination module comprises:

[0144] a first calculation submodule, configured to calculate a pressure value needing uniform deceleration pressure decreasing according to the target pressure decreasing rate, the lower limit value of the pressure decreasing rate and the second preset pressure decreasing acceleration;

[0145] a second calculation submodule, configured to calculate the uniform deceleration pressure decreasing starting pressure value corresponding to the target pressure interval of the pressure value of the process chamber according to the pressure value needing uniform deceleration pressure decreasing and the pressure lower limit value.

[0146] Optionally, the second preset pressure decreasing acceleration is less than or equal to a preset value, and the preset value is calculated according to a starting pressure value, a pressure lower limit value, an upper limit value of a pressure decreasing rate and a lower limit value of the pressure decreasing rate corresponding to a pressure interval in which the pressure value of the process chamber is located.

[0147] Optionally, the upper limit value of the pressure decreasing rate and the lower limit value of the pressure decreasing rate corresponding to the target pressure interval are determined by a first setting module.

[0148] a first setting module, configured to set preset pressure intervals of a plurality of connected process chambers; the preset pressure intervals correspond to the target pressure intervals;

[0149] a second setting module, configured to set a plurality of preset pressure decreasing rates for each of the target pressure intervals;

[0150] a testing module, configured to, when the pressure value of the process chamber is at an upper limit value of each of the target pressure intervals, respectively perform uniform pressure decreasing according to the plurality of preset pressure decreasing rates until the pressure value of the process chamber is at a lower limit value of each of the target pressure intervals, stop pressure decreasing and obtain a plurality of test results corresponding to each of the target pressure intervals;

[0151] A third determining module is configured to determine a target offset of wafer offset in the process chamber from the plurality of test results, wherein the target offset is less than a preset offset;

[0152] A fourth determining module is configured to determine a target preset pressure decreasing rate corresponding to each target pressure interval according to the target offset;

[0153] A fifth determining module is configured to determine the target preset pressure decreasing rate as an upper limit of the pressure decreasing rate of the target pressure interval corresponding to the target preset pressure decreasing rate;

[0154] A sixth determining module is configured to determine an upper limit of the pressure decreasing rate of a next target pressure interval of each target pressure interval as a lower limit of the pressure decreasing rate of each target pressure interval.

[0155] Optionally, when the pressure value of the process chamber reaches the uniform deceleration pressure decreasing starting pressure value, the pressure decreasing rate of the process chamber is calculated according to the pressure value of the process chamber, the lower limit of the pressure decreasing rate corresponding to the pressure interval where the pressure value of the process chamber is located, the second preset acceleration and the pressure lower limit value.

[0156] In the embodiment of the present application, the first pressure decreasing module is configured to perform uniform speed pressure decreasing when the pressure value of the process chamber is in the first interval of the target pressure interval; the second pressure decreasing module is configured to perform uniform deceleration pressure decreasing when the pressure value of the process chamber is in the second interval of the target pressure interval, until the pressure value of the process chamber enters the next target pressure interval, and returns to the step of performing uniform speed pressure decreasing when the pressure value of the process chamber is in the first interval of the target pressure interval; and the stopping module is configured to stop pressure decreasing when the pressure value of the process chamber reaches the target pressure value. In this way, different pressure decreasing rates and pressure decreasing modes are used in different pressure intervals during the pressure decreasing process, so that a higher pressure decreasing rate can be used when the pressure value of the process chamber is high, and the pressure decreasing rate is gradually reduced as the pressure value of the process chamber decreases, thereby greatly improving the pressure decreasing rate and further improving the production efficiency while ensuring that the wafer in the process chamber does not produce a large offset.

[0157] For the device embodiment, since it is basically similar to the method embodiment, the description is relatively simple, and the related parts refer to the part of the method embodiment.

[0158] The embodiment of the present application further provides a semiconductor process equipment, which comprises:

[0159] The computer program comprises a processor, a memory, and a computer program stored on the memory and capable of running on the processor, which, when executed by the processor, implements each process of the embodiments of the pressure control method of the process chamber and achieves the same technical effects. To avoid repetition, details are not described herein.

[0160] The computer program comprises a processor, a memory, and a computer program stored on the memory and capable of running on the processor, which, when executed by the processor, implements each process of the embodiments of the pressure control method of the process chamber and achieves the same technical effects. To avoid repetition, details are not described herein.

[0161] Each embodiment in the specification is described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between embodiments can be referred to each other.

[0162] Those skilled in the art should understand that the embodiments of the present application can be provided as a method, device, or computer program product. Therefore, the embodiments of the present application can be in the form of a complete hardware embodiment, a complete software embodiment, or an embodiment combining software and hardware aspects. Moreover, the embodiments of the present application can be in the form of a computer program product implemented on one or more computer usable storage media (including but not limited to magnetic disk storage, CD-ROM, optical storage, etc.) containing computer usable program code.

[0163] The embodiments of the present application are described with reference to flowcharts and / or block diagrams according to the method, terminal device (system), and computer program product of the embodiments of the present application. It should be understood that each flow and / or block in the flowcharts and / or block diagrams, and the combination of flows and / or blocks in the flowcharts and / or block diagrams can be implemented by computer program instructions. These computer program instructions can be provided to a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing terminal device to produce a machine, so that the instructions executed by the computer or other programmable data processing terminal device produce a device that implements the functions specified in the flowcharts and / or block diagrams. Figure 1 The device that implements the functions specified in one flow or multiple flows and / or blocks. Figure 1 The device that implements the functions specified in one block or multiple blocks.

[0164] These computer program instructions can also be stored in a computer readable memory that can guide the computer or other programmable data processing terminal device to work in a specific way, so that the instructions stored in the computer readable memory produce a product comprising instruction devices that implement the functions specified in the flowcharts and / or block diagrams. Figure 1 The device that implements the functions specified in one flow or multiple flows and / or blocks. Figure 1 The device that implements the functions specified in one block or multiple blocks.

[0165] These computer program instructions can also be loaded into computer or other programmable data processing devices to cause a series of operational steps to be performed on the computer or other programmable devices to produce a computer implemented process such that the instructions which execute on the computer or other programmable devices provide steps for implementing the functions specified in the flowchart block or blocks. Figure 1 These computer program instructions can also be loaded into computer or other programmable data processing devices to cause a series of operational steps to be performed on the computer or other programmable devices to produce a computer implemented process such that the instructions which execute on the computer or other programmable devices provide steps for implementing the functions specified in the flowchart block or blocks. Figure 1 These computer program instructions can also be loaded into computer or other programmable data processing devices to cause a series of operational steps to be performed on the computer or other programmable devices to produce a computer implemented process such that the instructions which execute on the computer or other programmable devices provide steps for implementing the functions specified in the flowchart block or blocks.

[0166] Although preferred embodiments of the present application have been described, those skilled in the art will be able to make additional changes and modifications to these embodiments once they grasp the fundamental inventive concepts. Therefore, the appended claims are intended to encompass all such changes and modifications within the scope of the embodiments of the present application.

[0167] Finally, it should be noted that the terms "first", "second", and the like, herein do not denote any order, quantity, combination, or importance, but rather are used to distinguish one element from another, and are not intended to denote a relation or order between such elements. Also, the terms "comprises", "comprising", or any other variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can include other elements not expressly listed or inherent to such process, method, article, or apparatus. An element proceeded by "comprises... a" does not, without more constraints, exclude the existence of additional identical elements in the process, method, article, or apparatus that comprises the element.

[0168] The pressure control method of a process chamber, the semiconductor processing apparatus, and the computer readable storage medium provided by the present application are described in detail above, and the principles and implementation manners of the present application are described by using specific examples in the present application. The above description of the embodiments is only used to help understand the method of the present application and its core idea; meanwhile, for those skilled in the art, the specific implementation manners and application ranges can be changed according to the idea of the present application. In conclusion, the content of the present application should not be understood as a limitation of the present application.

Claims

1. A method for pressure control of a process chamber, the method comprising: The method comprises: uniformly reducing pressure at a first interval of a target pressure interval of the pressure value of the process chamber; uniformly decelerating reducing pressure at a second interval of the target pressure interval of the pressure value of the process chamber until the pressure value of the process chamber enters a next target pressure interval, and returning to the step of uniformly reducing pressure at the first interval of the target pressure interval of the pressure value of the process chamber; stopping reducing pressure when the pressure value of the process chamber reaches a target pressure value.

2. The method of pressure control of a process chamber of claim 1, wherein, The method further comprises: determining a target pressure reduction rate when starting to reduce pressure of the process chamber, and uniformly accelerating reducing pressure at a first preset pressure reduction acceleration until the pressure reduction rate reaches the target pressure reduction rate, so that the pressure value of the process chamber is at a first interval of an initial pressure interval; uniformly reducing pressure at the target pressure reduction rate when the pressure value of the process chamber is at the first interval of the initial pressure interval until the pressure value of the process chamber enters a second interval of the initial pressure interval; uniformly decelerating reducing pressure when the pressure value of the process chamber is at the second interval of the initial pressure interval until the pressure value of the process chamber enters a target pressure interval.

3. The method for pressure control of a process chamber according to claim 2, wherein, The determination of the target pressure reduction rate comprises: obtaining a reference pressure reduction rate in a process recipe; obtaining an upper limit value of a pressure reduction rate corresponding to a pressure interval in which the pressure value of the process chamber is located; determining whether the reference pressure reduction rate is less than or equal to the upper limit value of the pressure reduction rate; if the reference pressure reduction rate is less than or equal to the upper limit value of the pressure reduction rate, determining the reference pressure reduction rate as the target pressure reduction rate; if the reference pressure reduction rate is greater than the upper limit value of the pressure reduction rate, determining the upper limit value of the pressure reduction rate as the target pressure reduction rate.

4. The method for pressure control of a process chamber according to claim 1, wherein, The second interval of the target pressure interval is determined in the following manner: obtaining an upper limit value of a pressure reduction rate corresponding to a target pressure interval in which the pressure value of the process chamber is located, a lower limit value of the pressure reduction rate, a second preset pressure reduction acceleration, and a lower limit value of pressure; determining a uniformly decelerating reduction starting pressure value corresponding to the target pressure interval of the process chamber according to the upper limit value of the pressure reduction rate, the lower limit value of the pressure reduction rate, the second preset pressure reduction acceleration, and the lower limit value of pressure; taking the uniformly decelerating reduction starting pressure value as an upper limit value of the second interval, and taking the lower limit value of pressure as a lower limit value of the second interval.

5. The method for pressure control of a process chamber according to claim 4, wherein, The determination of the uniformly decelerating reduction starting pressure value corresponding to the target pressure interval of the process chamber according to the upper limit value of the pressure reduction rate, the lower limit value of the pressure reduction rate, the second preset pressure reduction acceleration, and the lower limit value of pressure comprises: calculating a pressure value requiring uniformly decelerating reduction according to the target pressure reduction rate, the lower limit value of the pressure reduction rate, and the second preset pressure reduction acceleration; calculating the uniformly decelerating reduction starting pressure value corresponding to the target pressure interval of the process chamber according to the pressure value requiring uniformly decelerating reduction and the lower limit value of pressure.

6. The method for pressure control of a process chamber according to claim 4, wherein, The second preset pressure reduction acceleration is less than or equal to a preset value, and the preset value is calculated according to a starting pressure value, a pressure lower limit value, a pressure reduction rate upper limit value and a pressure reduction rate lower limit value corresponding to a pressure interval in which the pressure value of the process chamber is located.

7. The method for pressure control of a process chamber of claim 4, wherein, The pressure reduction rate upper limit value and the pressure reduction rate lower limit value corresponding to the target pressure interval are determined by the following method: A plurality of preset pressure intervals of a plurality of connected process chambers are set; the preset pressure intervals correspond to the target pressure interval; A plurality of preset pressure reduction rates are set for each target pressure interval; According to the plurality of preset pressure reduction rates, when the pressure value of the process chamber is in the upper limit value of each target pressure interval, uniform pressure reduction is performed according to the plurality of preset pressure reduction rates respectively, until the pressure value of the process chamber is in the lower limit value of each target pressure interval, the pressure reduction is stopped, and a plurality of test results corresponding to each target pressure interval are obtained; A target offset amount in which the wafer offset amount in the process chamber is less than a preset offset amount is determined from the plurality of test results; According to the target offset amount, a target preset pressure reduction rate corresponding to each target pressure interval is determined respectively; The target preset pressure reduction rate is determined as the pressure reduction rate upper limit value of the target pressure interval corresponding to the target preset pressure reduction rate; The pressure reduction rate upper limit value of the next target pressure interval of each target pressure interval is determined as the pressure reduction rate lower limit value of each target pressure interval.

8. The pressure control method of the process chamber of claim 5, wherein, When the pressure value of the process chamber reaches the uniform deceleration pressure reduction starting pressure value, the pressure reduction rate of the process chamber is calculated according to the pressure value of the process chamber, the pressure reduction rate lower limit value corresponding to the pressure interval in which the pressure value of the process chamber is located, the second preset pressure reduction acceleration and the pressure lower limit value.

9. A semiconductor process apparatus, characterized by, Comprise: A processor, a memory and a computer program stored on the memory and capable of running on the processor, the computer program being executed by the processor to implement the steps of the pressure control method of the process chamber of any one of claims 1-8.

10. A computer-readable storage medium, characterized in that, The computer program is stored on the computer readable storage medium, and the computer program is executed by the processor to implement the steps of the pressure control method of the process chamber of any one of claims 1-8.

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