Substrate cleaning monitoring device and monitoring method

Abstract

The invention provides a substrate cleaning monitoring device and method, and belongs to the technical field of substrate cleaning, the substrate cleaning monitoring device comprises a control unit, a monitoring unit and an alarm unit, the monitoring unit and the alarm unit are in communication connection with the control unit, the monitoring unit comprises a first detector and a position detector, and the first detector is in communication connection with the alarm unit. The first detector comprises a first image acquisition module and / or a weight detection module and is used for detecting image information and / or weight information of the cleaning table; and the position detector comprises a second image acquisition module and / or a distance detection module and is used for detecting the position information of the substrate on the cleaning table. The invention provides a substrate cleaning monitoring device and a monitoring method, and aims to solve the problem that in the prior art, a substrate cleaning device cannot effectively monitor whether a substrate exists on a cleaning table or not, whether the substrate is complete or not and whether the position of the substrate is accurate or not, so that the substrate cleaning operation is prone to faults.

Description

Technical Field

[0001] The present invention belongs to the technical field of substrate cleaning, and more specifically, relates to a substrate cleaning monitoring device and a monitoring method. Background Art

[0002] The substrate is the basic material for manufacturing PCB. Generally speaking, the substrate is a copper-clad laminate. In the manufacturing of single-sided and double-sided printed circuit boards, hole processing, chemical copper plating, electroplating copper, etching and other processing are selectively performed on the substrate material - copper-clad laminate to obtain the required circuit pattern. After a period of use, the surface of the substrate will deposit a metal layer, oil stains, impurities, etc., which affects the subsequent processing procedures and reduces the performance. Therefore, the substrate needs to be cleaned regularly.

[0003] When cleaning the substrate, the substrate is fixed on the cleaning table, and the cleaning pipe for conveying the cleaning liquid is located above the substrate. The cleaning pipe swings to spray the cleaning liquid evenly onto the substrate to clean the surface of the substrate. If the position of the substrate is deviated when it is fixed, the cleaning liquid will not be able to completely cover the substrate, affecting the effect of the substrate after cleaning. In addition, if the surface of the substrate is damaged or the substrate is not conveyed to the cleaning table, the cleaning pipe will still spray the cleaning liquid normally, which will not only cause a waste of cleaning liquid, but also cause the damaged substrate to flow to the next process, or the robot will not be able to convey the substrate to the next process and cause an operation failure. Therefore, during the substrate cleaning process, real-time monitoring of the substrate to ensure that the substrate on the cleaning table is intact and accurately positioned is a necessary condition for completing basic cleaning. Summary of the invention

[0004] The purpose of the present invention is to provide a substrate cleaning monitoring device and a monitoring method, aiming to solve the problem in the prior art that the substrate cleaning device cannot effectively monitor whether there is a substrate on the cleaning table, whether the substrate is complete, and whether the position is accurate, thereby causing the substrate cleaning operation to be prone to failure.

[0005] To achieve the above object, the technical solution adopted by the present invention is: In a first aspect, a substrate cleaning monitoring device is provided, comprising a control unit, a monitoring unit and an alarm unit, wherein the monitoring unit and the alarm unit are respectively connected to the control unit for communication, and the monitoring unit comprises: A first detector, including a first image acquisition module and / or a weight detection module, for detecting image information and / or weight information of the cleaning table; and The position detector includes a second image acquisition module and / or a distance detection module, and is used to detect the position information of the substrate on the cleaning table.

[0006] In combination with the first aspect, in a possible implementation manner, the substrate cleaning monitoring device further includes a cleaning unit, and the cleaning unit includes: A supporting assembly, comprising a driver and a cleaning table connected to the driver, wherein the driver is located below the cleaning table and controls the cleaning table to rotate around its own axis; and A cleaning assembly, comprising a fixed pipe and a cleaning pipe connected to the fixed pipe, wherein the fixed pipe is arranged on one side of the cleaning table and rotates in an up-down direction and is connected to a liquid storage tank, and the cleaning pipe is located above the cleaning table and is used to spray cleaning liquid onto the substrate, and a switch valve is arranged on the fixed pipe and / or the cleaning pipe; The driver and the switch valve are respectively connected to the control unit for communication.

[0007] In combination with the first aspect, in a possible implementation, the substrate cleaning monitoring device also includes a guide unit arranged around the outer periphery of the cleaning table, the guide unit includes a guide cover arranged outside the cleaning table and a guide pipe connected to the guide cover, and the guide pipe discharges the waste liquid in the guide cover.

[0008] In combination with the first aspect, in a possible implementation, the air guide cover includes a plurality of cover bodies distributed in sequence along the up and down directions, and also includes a lifter connected to the cover bodies one by one, and the lifter controls the cover bodies to move along the up and down directions to form a guide area between two adjacent cover bodies, and each of the guide areas is connected to the corresponding guide pipe.

[0009] In combination with the first aspect, in a possible implementation, the guide unit further includes an enclosure provided below the washing station, wherein the enclosure is provided around the outer periphery of the driver to block the waste liquid outside the driver.

[0010] In combination with the first aspect, in a possible implementation, the substrate cleaning monitoring device also includes a protective cover arranged outside the cleaning unit and the air guide unit, and an air pressure regulating unit connected to the protective cover, and the air pressure regulating unit includes an air supply component and an exhaust component.

[0011] In combination with the first aspect, in a possible implementation manner, the exhaust assembly includes: An exhaust mechanism has a plurality of independent exhaust channels, wherein the air inlet end of the exhaust channel is connected to the protective cover, and the air outlet end of the exhaust channel is connected to the exhaust gas treatment device; a power device, connected to the exhaust mechanism, for conveying the gas in the protective cover along the exhaust passage to a corresponding exhaust gas treatment device; and The switch mechanism is connected to the exhaust passage and is used to control the exhaust passage to be open or closed.

[0012] In combination with the first aspect, in a possible implementation, the exhaust mechanism includes a main pipe and a plurality of branch pipes connected in parallel to an outlet end of the main pipe, the air inlet end of the main pipe is connected to a protective cover, the outlet end of each branch pipe is connected to an exhaust gas treatment device, and each branch pipe is connected to the main pipe to form an exhaust channel.

[0013] In combination with the first aspect, in a possible implementation manner, the switch mechanism includes: a switching member, which rotates around a first axis and is disposed at the connection between the main pipe and the plurality of branch pipes, and separates the main pipe from the plurality of branch pipes, the first axis being parallel to the axis of the main pipe, the switching member is provided with an air guide cavity, and is also provided with an air inlet hole and a switching hole connected to the air guide cavity, the air inlet hole is also connected to the main pipe and is used to introduce the gas in the main pipe into the air guide cavity, the switching member rotates around the first axis so that the switching hole is connected to one of the branch pipes; and A driving member is connected to the switching member and is used to control the switching member to rotate around the first axis.

[0014] The beneficial effect of the substrate cleaning monitoring device provided by the present invention is that: compared with the prior art, the substrate cleaning monitoring device of the present invention detects the image information and / or weight information on the cleaning table through the first detector to determine whether there is a substrate on the cleaning table. If there is no substrate on the cleaning table, the control unit controls the alarm unit to issue a substrate missing alarm. If there is a substrate on the cleaning table, further detect whether the substrate is complete. If the substrate is damaged, the control unit controls the alarm unit to issue a substrate damage alarm. When a complete substrate is placed on the cleaning table, the position detector detects the position information of the substrate to determine whether the substrate is in a specified position. If the substrate position deviates from the specified position, the control unit controls the alarm unit to issue a deviation alarm; if the substrate position is in the specified position, the cleaning operation can be started. The present invention can perform a comprehensive inspection of the substrate on the cleaning table before the cleaning operation starts, which can not only avoid ineffective cleaning, but also avoid damaged substrates from flowing into the next process, affecting the qualified rate of the product, and at the same time reduce the probability of cleaning operation failure. In addition, ensuring that the substrate is located at the specified position on the cleaning table can ensure that the substrate is fully and effectively cleaned, avoiding the existence of cleaning dead corners on the substrate, affecting the cleaning effect.

[0015] In a second aspect, an embodiment of the present invention further provides a substrate cleaning monitoring method, comprising: S100, detecting whether a substrate is placed on the cleaning table, and when there is no substrate on the cleaning table, issuing a first alarm signal; S200, when a substrate is placed on the cleaning table, detecting whether the substrate on the cleaning table is intact, and when it is detected that the substrate is damaged, issuing a second alarm signal; S300, when it is detected that the substrate on the cleaning table is intact, the position of the substrate is detected to determine whether the substrate is located at a designated position of the cleaning table, and when it is detected that the position of the substrate deviates from the designated position, a third alarm signal is issued; S400: When the substrate on the cleaning table is located at a designated position, the cleaning operation starts.

[0016] The beneficial effect of the substrate cleaning monitoring method provided by the present invention is that: compared with the prior art, the substrate cleaning monitoring method of the present invention can perform a comprehensive inspection of the substrate on the cleaning table before the cleaning operation begins, which can not only avoid ineffective cleaning, but also avoid damaged substrates from flowing into the next process, affecting the qualified rate of the product, and at the same time reduce the probability of cleaning operation failure. In addition, ensuring that the substrate is located at a designated position on the cleaning table can ensure that the substrate is fully and effectively cleaned, avoiding the existence of cleaning dead corners on the substrate, which affects the cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0018] Figure 1 A schematic diagram of the structure of a substrate cleaning monitoring device provided by an embodiment of the present invention; Figure 2 Another structural schematic diagram of a substrate cleaning monitoring device provided by an embodiment of the present invention; Figure 3 A schematic diagram of the structure of a support assembly and a base plate used in an embodiment of the present invention; Figure 4 A schematic diagram of the structure of an exhaust assembly used in an embodiment of the present invention; Figure 5 A schematic diagram of the structure of a switching element used in an embodiment of the present invention; Figure 6 This is a schematic structural diagram of a switching element used in another embodiment of the present invention.

[0019] In the figure: 1. Support assembly; 101. Driver; 102. Cleaning table; 2. Cleaning assembly; 201. Fixed pipe; 202. Cleaning pipe; 3. Position detector; 301. Distance detection module; 302. Second image acquisition module; 4. First detector; 401. First image acquisition module; 402. Weight detection module; 5. Air guide cover; 501. Cover body; 502. Lifter; 503. Enclosure; 504. Air guide area; 6. Base plate; 7. Protective cover; 8. Exhaust assembly; 801. Main pipe; 802. Branch pipe; 9. Switch assembly; 901. Switching member; 9011. Air inlet; 9012. Switching hole; 10. Exhaust treatment device; 11. Power device; 12. Control valve. DETAILED DESCRIPTION

[0020] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0021] In the claims, specification and the above drawings of the present invention, unless otherwise clearly defined, the terms "first", "second" or "third" are used to distinguish different objects, rather than to describe a specific order. Unless otherwise specified, other directional words, such as "vertical", "clockwise", "counterclockwise", etc., indicating directions or positional relationships are based on the directions and positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction or be constructed and operated in a specific direction, so it cannot be understood as limiting the specific protection scope of the present invention. In the claims, specification and the above drawings of the present invention, unless otherwise clearly defined, the terms "fixed connection" or "fixed connection" should be understood in a broad sense, that is, any connection method without a displacement relationship and relative rotation relationship between the two, that is, including non-detachable fixed connection, detachable fixed connection, integrated connection and fixed connection through other devices or elements. In the claims, specification and the above drawings of the present invention, the terms "including", "having" and their variations are used, and the intention is to "include but not limited to".

[0022] Please also read Figures 1 to 3, the substrate 6 cleaning monitoring device and monitoring method provided by the present invention are now described. The substrate 6 cleaning monitoring device includes a control unit, a monitoring unit and an alarm unit, the monitoring unit and the alarm unit are respectively connected to the control unit for communication, the monitoring unit includes a first detector 4 and a position detector 3, the first detector 4 includes a first image acquisition module 401 and / or a weight detection module 402, which is used to detect the image information and / or weight information of the cleaning table 102; the position detector 3 includes a second image acquisition module 302 and / or a distance detection module 301, which is used to detect the position information of the substrate 6 on the cleaning table 102.

[0023] Compared with the prior art, the substrate 6 cleaning monitoring device provided by the present invention detects the image information and / or weight information on the cleaning table 102 through the first detector 4 to determine whether there is a substrate 6 on the cleaning table 102. If there is no substrate 6 on the cleaning table, the control unit controls the alarm unit to issue an alarm for the absence of the substrate 6. If there is a substrate 6 on the cleaning table 102, it is further detected whether the substrate 6 is complete. If the substrate 6 is damaged, the control unit controls the alarm unit to issue an alarm for the damage of the substrate 6. When a complete substrate 6 is placed on the cleaning table 102, the position detector 3 detects the position information of the substrate 6 to determine whether the substrate 6 is in a specified position. If the position of the substrate 6 deviates from the specified position, the control unit controls the alarm unit to issue an offset alarm; if the position of the substrate 6 is in the specified position, the cleaning operation can be started. The present invention can perform a comprehensive inspection of the substrate 6 on the cleaning table 102 before the cleaning operation starts, which can not only avoid ineffective cleaning, but also avoid the damaged substrate 6 from flowing into the next process, affecting the qualified rate of the product, and at the same time reduce the probability of failure in the cleaning operation. In addition, ensuring that the substrate 6 is located at a designated position on the cleaning table 102 can ensure comprehensive and effective cleaning of the substrate 6 and avoid cleaning dead corners on the substrate 6 that affect the cleaning effect.

[0024] Testing process: The image acquisition module captures the image information on the cleaning table 102 and transmits the captured image information to the control unit. The control unit compares the image information of the substrate 6 on the cleaning table 102 stored therein with the captured information to determine whether there is a substrate 6 on the cleaning table 102 and whether the substrate 6 is intact. The weight detection module 402 detects the total weight of the cleaning table 102 and transmits the detection result to the control unit. The control unit compares the detected weight information with the weight information of the substrate 6 on the cleaning table 102. When the detection result is greater than or equal to the weight information, it indicates that there is a substrate 6 on the cleaning table 102 and the substrate 6 is intact; if the detected weight information is between the empty weight of the cleaning table 102 and the weight of the complete substrate 6 on the cleaning table 102, it indicates that there is a damaged substrate 6 on the cleaning table 102; if the detection result is consistent with the weight of the cleaning table 102 when it is empty, it indicates that there is no substrate 6 on the cleaning table 102. According to the above comparison result, the control unit controls the alarm unit to send a corresponding alarm signal.

[0025] When the first detector 4 detects that there is a complete substrate 6 on the cleaning table 102, the control unit controls the position detector 3 to turn on according to the detection result, and the first image acquisition module 401 captures the image of the substrate 6 on the cleaning table 102, and transmits the captured image to the control unit, and the control unit compares the captured image with the stored image of the substrate 6 at the specified position. If the comparison result shows that the substrate 6 is at the specified position, the cleaning unit can be started by the control unit, or the cleaning unit can be started manually; if the comparison result shows that the position of the substrate 6 is offset, the control unit controls the alarm to issue a corresponding alarm, and the substrate 6 is adjusted to the specified position manually or by a robot.

[0026] Optionally, the first detector 4 may only use the first image acquisition module 401 or the weight acquisition module for detection, or may use both the first image acquisition module 401 and the weight acquisition module for detection, which can improve the detection accuracy.

[0027] Optionally, the position detector 3 may only use the second image acquisition module 302 or the distance detection module 301 for detection, or may use both the second image acquisition module 302 and the distance detection module 301 for detection, which can improve the detection accuracy.

[0028] Optionally, the first image acquisition module 401 and the second image acquisition module 302 may be video or photographic equipment.

[0029] Optionally, the weight detection module 402 may be a pressure sensor.

[0030] Optionally, the distance detection module 301 is radially located on one side of the cleaning platform 102, and the cleaning platform 102 rotates around its own axis during detection, so that the distance detection module 301 can detect the distance between the outer edge of the substrate 6 and it. The distance detection module 301 can be arranged on one side of the cleaning platform 102 through a telescopic member, and the telescopic member retracts after the detection is completed to avoid interference with other components.

[0031] In some embodiments, see Figure 1 to Figure 2 The substrate 6 cleaning monitoring device also includes a cleaning unit, which includes a supporting component 1 and a cleaning component 2. The supporting component 1 includes a driver 101 and a cleaning table 102 connected to the driver 101. The driver 101 is located below the cleaning table 102 and controls the cleaning table 102 to rotate around its own axis; the cleaning component 2 includes a fixed pipe 201 and a cleaning pipe 202 connected to the fixed pipe 201. The fixed pipe 201 rotates around the up and down directions and is arranged on one side of the cleaning table 102 and is connected to the liquid storage tank. The cleaning pipe 202 is located above the cleaning table 102 and is used to spray cleaning liquid onto the substrate 6. A switch valve is provided on the fixed pipe 201 and / or the cleaning pipe 202; the driver 101 and the switch valve are respectively connected to the control unit for communication.

[0032] When the first detector 4 and the position detector 3 detect that there is a complete substrate 6 on the cleaning table 102, the control unit controls the switch valve to open, and the cleaning liquid flows into the cleaning tube 202 along the fixed tube 201, and flows to the substrate 6 from the liquid outlet of the cleaning tube 202. At the same time, the driver 101 is started to control the cleaning table 102 to rotate around its own axis, so that the cleaning liquid can be evenly distributed at various positions of the substrate 6. In addition, in order to facilitate the placement of the substrate 6, the fixed tube 201 is rotatably arranged on one side of the cleaning table 102. When the fixed tube 201 rotates when placing the substrate 6, the cleaning tube 202 is misaligned with the cleaning table 102, so as to avoid interference between the substrate 6 and the cleaning plate when placing the substrate 6.

[0033] Optionally, the cleaning pipe 202 is a telescopic member that is telescopic in a direction perpendicular to the axis of the cleaning platform 102 .

[0034] In some embodiments, see Figure 1 to Figure 2 The substrate 6 cleaning monitoring device also includes a guide unit arranged around the outer periphery of the cleaning platform 102, the guide unit includes a guide cover 5 arranged outside the cleaning platform 102 and a guide pipe connected to the guide cover 5, and the guide pipe discharges the waste liquid in the guide cover 5.

[0035] During the cleaning process of the substrate 6, the cleaning pipe 202 continuously sprays the cleaning liquid onto the substrate 6. After the cleaning liquid cleans the substrate 6, it mixes with the stains generated by the cleaning to form waste liquid. If the waste liquid is not treated, the splashing of the waste liquid will not only cause the work site to be polluted, but the falling waste liquid may also cause secondary contamination of the substrate 6. Therefore, in this embodiment, the guide cover 5 is arranged outside the cleaning table 102, so that the waste liquid is enclosed in the protective cover 7, and then the waste in the guide cover 5 is discharged through the guide pipe, which ensures the cleanliness of the work site and avoids secondary contamination of the substrate 6. In some embodiments, see Figure 1 to Figure 2 The air guide cover 5 includes a plurality of cover bodies 501 distributed in sequence along the up-down direction, and also includes a lifter 502 connected to the cover bodies 501 in a one-to-one correspondence. The lifter 502 controls the cover bodies 501 to move along the up-down direction so that a guide area 504 is formed between two adjacent cover bodies 501, and each guide area 504 is connected to a corresponding guide pipe.

[0036] When cleaning the substrate 6, the corresponding cleaning liquid will be used according to the actual situation. The cleaning liquid is roughly divided into acidic, alkaline and organic solutions, etc. Different waste liquids require corresponding treatment methods, otherwise direct discharge will affect the ecological environment. In this application, multiple cover bodies 501 distributed in the up and down directions are set. When the cleaning liquid is used to clean the substrate 6, the corresponding cover body 501 is raised under the action of the lifter 502, so that the guide area 504 corresponding to the nature of the cleaning liquid is surrounded by the outer periphery of the cleaning station 102. For example, when the acidic cleaning liquid is used to clean the substrate 6, the two cover bodies 501 forming the acidic guide area 504 are raised and misplaced in the up and down directions, so that the acidic guide area 504 corresponds to the outer periphery of the cleaning station 102. The cost formed after the cleaning liquid completes the cleaning enters the guide area 504, and the waste is transported to the corresponding treatment device through the guide pipe. In this embodiment, the corresponding guide area 504 can be used to collect waste liquid according to the nature of the cleaning liquid to avoid the problem of treatment difficulties caused by the mixing of waste liquids of different properties. In some embodiments, see Figure 1 to Figure 2 The guide unit also includes a baffle 503 disposed below the cleaning station 102 . The baffle 503 is disposed around the outer periphery of the driver 101 to block the waste liquid outside the driver 101 . The enclosure 503 is located inside the deflector 5 to prevent the waste liquid from overflowing or splashing into the bottom of the cleaning table, protecting the driver 101 from being contaminated by the waste liquid. In addition, the enclosure 503 can also be enclosed with the adjacent cover 501 to form a guide area 504, reducing the number of cover 501s, and being applicable to cleaning liquids of more properties.

[0037] In some embodiments, see Figure 1 to Figure 2The substrate 6 cleaning monitoring device also includes a protective cover 7 arranged outside the cleaning unit and the guide unit, and an air pressure regulating unit connected to the protective cover 7, and the air pressure regulating unit includes an air supply component and an exhaust component 8. The protective cover 7 houses the cleaning unit and the guide unit, which improves the cleanliness of the work site during the cleaning process and prevents waste liquid from splashing outward. The exhaust component 8 can discharge the waste gas formed by the mixture of waste liquid and air, and the air supply component sends the external clean air into the protective cover 7 to ensure that the air pressure in the protective cover 7 is stable.

[0038] In some embodiments, see Figure 4 The exhaust assembly 8 includes an exhaust mechanism, a power device 11 and a switch mechanism. The exhaust mechanism has a plurality of independent exhaust channels. The air inlet end of the exhaust channel is connected to the protective cover 7, and the air outlet end is connected to the exhaust gas treatment device 10; the power device 11 is connected to the exhaust mechanism, and is used to transport the gas in the protective cover 7 along the exhaust channel to the corresponding exhaust gas treatment device 10; the switch mechanism is connected to the exhaust channel, and is used to control the conduction or closure of the exhaust channel.

[0039] An exhaust mechanism having multiple independent exhaust channels is connected to the protective cover 7, and each exhaust channel is connected to a corresponding exhaust gas treatment device 10. When cleaning liquids of different properties are used to clean the substrate 6, the switch component 9 controls the corresponding exhaust channel to be turned on, and the other exhaust channels are closed, and the exhaust gas mixed with the cleaning liquid in the protective cover 7 is transported to the corresponding exhaust gas treatment device 10 along the exhaust channel. For example, when the substrate 6 is cleaned with an acidic cleaning liquid, the switch component 9 controls the exhaust channel connected to the exhaust gas treatment device 10 for treating the acidic exhaust gas to be turned on, and the other exhaust channels are closed, and the power device 11 passes the acidic exhaust gas into the corresponding exhaust gas treatment device 10 along the exhaust channel. The present invention can carry out targeted treatment of the exhaust gas generated during the operation of different cleaning liquids, which can not only avoid the problem of environmental pollution caused by direct exhaust gas discharge, but also the targeted treatment method can effectively treat harmful substances in the exhaust gas, which not only avoids the energy waste caused by comprehensive treatment, but also achieves standard emissions. In some embodiments, see Figure 4 The exhaust mechanism includes a main pipe 801 and a plurality of branch pipes 802 connected in parallel to the outlet end of the main pipe 801. The air inlet end of the main pipe 801 is connected to the protective cover 7, and the outlet end of each branch pipe 802 is connected to an exhaust gas treatment device 10. Each branch pipe 802 is connected to the main pipe 801 to form an exhaust channel.

[0040] A solution in which multiple branch pipes 802 are connected in parallel to the main pipe 801, and then the main pipe 801 is connected to the protective cover 7, so that the exhaust gas is discharged into the corresponding exhaust gas treatment device 10 for treatment. Compared with the solution in which each branch pipe 802 is connected to the protective cover 7, the number of holes opened on the protective cover 7 is reduced, which not only reduces the workload and avoids the situation in which the protective cover 7 is damaged during the drilling process, but also improves the sealing of the protective cover 7, and avoids the exhaust gas mixed with the cleaning liquid and the air from leaking out due to too many holes.

[0041] Optionally, the switch assembly 9 includes a plurality of valves, and the valves are arranged in one-to-one correspondence with the exhaust pipes. In some embodiments, see Figures 4 to 6 The switch mechanism includes a switching member 901 and a driving member. The switching member 901 rotates around a first axis and is arranged at the connection between the main pipe 801 and the multiple branch pipes 802, and separates the main pipe 801 from the multiple branch pipes 802. The first axis is parallel to the axis of the main pipe 801. The switching member 901 is provided with an air guide cavity, and is also provided with an air inlet hole 9011 and a switching hole 9012 connected to the air guide cavity. The air inlet hole 9011 is also connected to the main pipe 801, and is used to introduce the gas in the main pipe 801 into the air guide cavity. The switching member 901 rotates around the first axis so that the switching hole 9012 is connected to one of the branch pipes 802; the driving member is connected to the switching member 901, and is used to control the switching member 901 to rotate around the first axis. The switching member 901 is provided at the connection between the main pipe 801 and the plurality of branch pipes 802. The switching member 901 is rotated to connect the switching hole 9012 to the corresponding branch pipe 802. Under the action of the power device 11, the exhaust gas enters the air guide cavity from the main pipe 801 and the air inlet hole 9011, and then enters the corresponding branch pipe 802 from the switching hole 9012, and finally flows into the corresponding exhaust gas treatment device 10. The scheme in this embodiment can realize the conduction of the corresponding exhaust channel and the closing of other exhaust channels by rotating the switching valve, and there is no need to set a switch valve on each branch pipe 802, which not only saves costs, but also avoids closing other switch valves one by one, and simplifies the operation steps.

[0042] In some embodiments, the driving member includes a connection portion connected to the switching member 901 and a driving portion extending out of the main pipe 801 , and the driving portion controls the switching member 901 to rotate around the first axis. The operator can realize that the connection part drives the switching member 901 to rotate by rotating the driving part, which is convenient to operate.

[0043] Optionally, the driving part includes a connecting rod and a hand crank arranged at an angle, the connecting rod and the connecting part are coaxially arranged, and rotating the hand crank can realize the rotation of the connecting rod and the connecting part, thereby achieving the purpose of saving effort. In some embodiments, the driving member also includes a controller and a rotating driver connected to the driving portion, and a solution detector arranged in the protective cover 7, the solution detector is used to detect the composition of the cleaning solution, and the solution detector and the rotating driver are respectively connected to the controller for communication. The solution detector can detect the composition of the cleaning solution used, such as acidic cleaning solution, alkaline cleaning solution or organic cleaning solution, and then generate a corresponding detection signal. The controller controls the rotation driver to start according to the detection signal, drives the driving part to rotate, and makes the switching hole 9012 of the switching member 901 correspond to the corresponding branch pipe 802, so as to open the corresponding exhaust channel and close other exhaust channels. The solution in this embodiment can automatically control the opening of the corresponding exhaust channel without manual operation, thereby simplifying the production process.

[0044] Optionally, the power unit 11 is also connected to the controller for communication. The controller controls the power unit 11 to start according to the detection signal, and transports the exhaust gas to the exhaust treatment device 10 along the corresponding exhaust passage.

[0045] In some embodiments, see Figure 5 The switching member 901 is a cylindrical component with a hollow interior. The hollow portion of the switching member 901 forms an air guide cavity. The axis of the switching member 901 is parallel to the axis of the main pipe 801. The air inlet hole 9011 is opened on one of the end faces of the switching member 901, and the switching hole 9012 is opened on the side wall of the switching member 901.

[0046] When the switching member 901 rotates around its own axis (first axis), the air inlet 9011 is always connected to the main pipe 801, and the switching hole 9012 is connected to the corresponding branch pipe 802 as the switching member 901 rotates. The solution in this embodiment can be connected to multiple branch pipes 802 at the same time, and has a simple structure, which reduces the manufacturing cost.

[0047] In some embodiments, see Figure 6 The switching member 901 is a spherical member with a hollow interior. The hollow portion of the switching member 901 forms an air guide cavity. The axis of the switching member 901 is parallel to the axis of the main pipe 801 , and the air inlet holes 9011 and the switching holes 9012 are distributed in the switching member 901 at intervals. The spherical member can rotate flexibly, and when the switching member 901 rotates around its own axis (first axis), the air inlet 9011 is always connected to the main pipe 801, and the switching hole 9012 is connected to the corresponding branch pipe 802 as the switching member 901 rotates. The solution in this embodiment can be connected to multiple branch pipes 802 at the same time, and has a simple structure, which reduces the manufacturing cost.

[0048] In some embodiments, see Figure 4 The exhaust device for cleaning the substrate 6 further includes a regulating valve 12 connected to the exhaust mechanism, and the regulating valve 12 is used to control the gas flow in the exhaust channel.

[0049] Since the supply amount of cleaning liquid is different and the flow rate of gas introduced into the protective cover 7 by the gas supply device is different, the gas flow rate in the exhaust passage is adjusted by the regulating valve 12 according to the air pressure in the protective cover 7, so that the air pressure in the protective cover 7 can be kept within a preset range. In addition, the gas flow rate in the exhaust passage can also be controlled according to the treatment situation of the exhaust gas treatment device 10 to avoid that the exhaust gas cannot be fully treated.

[0050] Optionally, the regulating valve 12 may be a solenoid valve or other existing valve bodies. Optionally, the regulating valve 12 is provided on the main pipe 801 , or each branch pipe 802 is provided with a regulating valve 12 .

[0051] Based on the same inventive concept, the present invention also provides a substrate 6 cleaning monitoring method. The substrate 6 cleaning monitoring method comprises: S100, detecting whether a substrate 6 is placed on the cleaning table 102, and when there is no substrate 6 on the cleaning table 102, issuing a first alarm signal; S200, when a substrate 6 is placed on the cleaning table 102, detecting whether the substrate 6 on the cleaning table 102 is intact, and when it is detected that the substrate 6 is damaged, issuing a second alarm signal; S300, when it is detected that the substrate 6 on the cleaning table 102 is intact, the position of the substrate 6 is detected to determine whether the substrate 6 is located at the designated position of the cleaning table 102, and when it is detected that the position of the substrate 6 deviates from the designated position, a third alarm signal is issued; S400: When the substrate 6 on the cleaning station 102 is located at a designated position, the cleaning operation starts.

[0052] Compared with the prior art, the cleaning monitoring method of the substrate 6 provided by the present invention can perform a comprehensive inspection of the substrate 6 on the cleaning table 102 before the cleaning operation begins, which can not only avoid ineffective cleaning, but also avoid damaged substrates 6 from flowing into the next process, affecting the qualified rate of the product, and at the same time reduce the probability of cleaning operation failure. In addition, ensuring that the substrate 6 is located at a designated position on the cleaning table 102 can ensure that the substrate 6 is fully and effectively cleaned, avoiding the existence of cleaning dead corners on the substrate 6, which affects the cleaning effect.

[0053] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A substrate cleaning monitoring device, characterized in that: It includes a control unit, a monitoring unit and an alarm unit, wherein the monitoring unit and the alarm unit are respectively connected to the control unit for communication, and the monitoring unit includes: A first detector, including a first image acquisition module and / or a weight detection module, for detecting image information and / or weight information of the cleaning table; and The position detector includes a second image acquisition module and / or a distance detection module, and is used to detect the position information of the substrate on the cleaning table.

2. The substrate cleaning monitoring device according to claim 1, characterized in that: The substrate cleaning monitoring device further includes a cleaning unit, and the cleaning unit includes: A supporting assembly, comprising a driver and a cleaning table connected to the driver, wherein the driver is located below the cleaning table and controls the cleaning table to rotate around its own axis; and A cleaning assembly, comprising a fixed pipe and a cleaning pipe connected to the fixed pipe, wherein the fixed pipe is arranged on one side of the cleaning table and rotates in an up-down direction and is connected to a liquid storage tank, and the cleaning pipe is located above the cleaning table and is used to spray cleaning liquid onto the substrate, and a switch valve is arranged on the fixed pipe and / or the cleaning pipe; The driver and the switch valve are respectively connected to the control unit for communication.

3. The substrate cleaning monitoring device according to claim 2, characterized in that: The substrate cleaning monitoring device further comprises a flow guide unit arranged around the outer periphery of the cleaning platform, wherein the flow guide unit comprises a flow guide cover arranged outside the cleaning platform and a flow guide pipe connected to the flow guide cover, and the flow guide pipe discharges waste liquid in the flow guide cover.

4. The substrate cleaning monitoring device according to claim 3, characterized in that: The deflector includes a plurality of cover bodies distributed in sequence along the up-down direction, and also includes a lifter connected to the cover bodies one-to-one, the lifter controls the cover bodies to move along the up-down direction to form a deflector area between two adjacent cover bodies, and each of the deflector areas is connected to the corresponding deflector pipe.

5. The substrate cleaning monitoring device according to claim 3, characterized in that: The guide unit further comprises a baffle disposed below the cleaning station, wherein the baffle is disposed around the outer periphery of the driver and is used to block the waste liquid outside the driver.

6. The substrate cleaning monitoring device according to claim 3, characterized in that: The substrate cleaning monitoring device further comprises a protective cover arranged outside the cleaning unit and the air guide unit, and an air pressure regulating unit connected to the protective cover, wherein the air pressure regulating unit comprises an air supply component and an exhaust component.

7. The substrate cleaning monitoring device according to claim 6, characterized in that: The exhaust assembly comprises: An exhaust mechanism has a plurality of independent exhaust channels, wherein the air inlet end of the exhaust channel is connected to the protective cover, and the air outlet end of the exhaust channel is connected to the exhaust gas treatment device; a power device, connected to the exhaust mechanism, for conveying the gas in the protective cover along the exhaust passage to a corresponding exhaust gas treatment device; and The switch mechanism is connected to the exhaust passage and is used to control the exhaust passage to be open or closed.

8. The substrate cleaning monitoring device according to claim 7, characterized in that: The exhaust mechanism includes a main pipe and a plurality of branch pipes connected in parallel to the outlet end of the main pipe. The air inlet end of the main pipe is connected to the protective cover, and the outlet end of each branch pipe is connected to an exhaust gas treatment device. Each branch pipe is connected to the main pipe to form an exhaust channel.

9. The substrate cleaning monitoring device according to claim 8, characterized in that: The switch mechanism comprises: a switching member, which rotates around a first axis and is disposed at the connection between the main pipe and the plurality of branch pipes, and separates the main pipe from the plurality of branch pipes, the first axis being parallel to the axis of the main pipe, the switching member is provided with an air guide cavity, and is also provided with an air inlet hole and a switching hole connected to the air guide cavity, the air inlet hole is also connected to the main pipe and is used to introduce the gas in the main pipe into the air guide cavity, the switching member rotates around the first axis so that the switching hole is connected to one of the branch pipes; and A driving member is connected to the switching member and is used to control the switching member to rotate around the first axis.

10. A substrate cleaning monitoring method, characterized in that: include: S100, detecting whether a substrate is placed on the cleaning table, and when there is no substrate on the cleaning table, issuing a first alarm signal; S200, when a substrate is placed on the cleaning table, detecting whether the substrate on the cleaning table is intact, and when it is detected that the substrate is damaged, issuing a second alarm signal; S300, when it is detected that the substrate on the cleaning table is intact, the position of the substrate is detected to determine whether the substrate is located at a designated position of the cleaning table, and when it is detected that the position of the substrate deviates from the designated position, a third alarm signal is issued; S400: When the substrate on the cleaning table is located at a designated position, the cleaning operation starts.

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