Format assembling type stamping equipment
By designing an imprinting mask with irregular outer edges and complementary shapes, and combining a group-type imprinting equipment with displacement mechanisms and coating mechanisms, the problem of obvious unit pattern gaps in existing equipment is solved, and a unit film layer with uniform gaps and difficult to observe with naked eyes is achieved.
Patent Information
- Application Number
- CN202311090819.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-08-28
- Publication Date
- 2025-02-28
AI Technical Summary
When existing imprinting equipment is grouped into patterns, there are often obvious gaps between unit patterns, which affects its subsequent application.
A group-type imprinting device is designed, using an imprinting mask with irregular outer edges and complementary shapes, combined with a displacement mechanism and a coating mechanism to form a unit film layer with uniform gaps and difficult to observe with the naked eye.
It effectively reduces the gap between unit membrane layers, improves the quality and application range of the panel pattern, making the gap difficult to observe through the naked eye.
Smart Images
Figure CN119535883A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to an imprinting device, in particular to a group-type imprinting device. Background Art
[0002] When the existing embossing equipment forms a plate pattern composed of multiple unit patterns on an optical film by embossing, the plate pattern of the optical film often has obvious gaps between two adjacent unit patterns, thus affecting its subsequent application. Therefore, the inventor believes that the above defects can be improved, and has devoted himself to research and applied scientific principles, and finally proposed a reasonable design of the present invention that effectively improves the above defects. Summary of the invention
[0003] The embodiment of the present invention provides a group-type imprinting device, which can effectively improve the defects that may occur in the existing imprinting device.
[0004] The embodiment of the present invention discloses a group type imprinting device, which includes: a workbench for a carrier to be set, and the carrier has a plurality of carrier alignment marks; a displacement mechanism, which is arranged on the workbench, and the displacement mechanism can move relative to the workbench along a height direction, a first direction, and a second direction that are mutually orthogonal; a coating mechanism, which is arranged corresponding to the workbench, and the coating mechanism is used to sequentially form a plurality of adhesive layers that are spaced apart from each other and have uniform thickness on the carrier; an imprinting mask, which is connected to the displacement mechanism, and the imprinting mask includes: a substrate, which has a penetration block, an alignment block that is annular and surrounds the penetration block, and a non-penetration block that is annular and surrounds the alignment block; wherein the substrate is only penetrated by a curing light provided to the penetration block, and the alignment block can allow the alignment light to pass through, and the wavelength of the curing light is different from that of the alignment light. wavelength of the line; a plurality of mask alignment marks, located in the alignment block; and an imprint layer, formed in the penetration block; wherein the imprint layer can allow the curing light to pass through and has a unit pattern on the surface away from the substrate; wherein the unit pattern has a first outer edge and a second outer edge; the first outer edge and the second outer edge are respectively located on opposite sides of the imprint layer, and the first outer edge and the second outer edge are both irregular and complementary in shape; and a camera mechanism, connected to the displacement mechanism and capable of synchronous movement with the imprint mask; wherein the group-type imprinting device can use the camera mechanism to make the plurality of mask alignment marks of the imprint mask align with at least two carrier alignment marks located next to any one glue layer along the height direction, and then drive the imprint mask to be imprinted along the height direction through the displacement mechanism, so that the plurality of glue layers are imprinted in sequence and each forms a unit film layer.
[0005] Optionally, when the coating mechanism forms a plurality of adhesive layers, each adhesive layer is formed within a region surrounded by four carrier alignment marks, and the plurality of carrier alignment marks are not shielded by the plurality of adhesive layers.
[0006] Optionally, a plurality of mask alignment marks are respectively adjacent to two ends of the first outer edge and two ends of the second outer edge.
[0007] Optionally, each unit film layer formed by the group-type imprinting equipment has a first outer edge and a second outer edge respectively located on opposite sides; wherein, among two unit film layers adjacent to each other along the first direction, the first outer edge of one unit film layer is adjacent to the second outer edge of the other unit film layer and is separated by a first gap of no more than 50 microns.
[0008] Optionally, each unit film layer formed by the group-type imprinting device has an upper side edge and a lower side edge respectively located on opposite sides; wherein, among two unit film layers adjacent to each other along the second direction, the upper side edge of one unit film layer is adjacent to the lower side edge of the other unit film layer along the second direction and is separated by a second gap not greater than 50 microns; wherein the multiple carrier alignment marks of the carrier are exposed in the multiple first gaps and the multiple second gaps between the multiple unit film layers.
[0009] Optionally, the unit pattern includes a first pattern and a second pattern that are spaced apart from each other, and the first pattern has a first outer edge and a first inner edge, and the second pattern has a second outer edge and a second inner edge adjacent to the first inner edge; wherein the first inner edge and the second inner edge are both irregular and complementary in shape, and the first inner edge and the second inner edge are spaced apart from each other by a long platemaking gap of no more than 50 micrometers (μm).
[0010] Optionally, the unit pattern includes a plurality of irregularly configured reflective embossed portions having the same shape; each reflective embossed portion has a plurality of reflective embossed areas arranged in a matrix, which can reflect in the same direction, and the reflective directions of the plurality of reflective embossed portions are irregularly configured.
[0011] Optionally, the plate-forming imprinting device further includes a curing light source, which is connected to the displacement mechanism and configured corresponding to the imprinting mask, so that the imprinting mask, the imaging mechanism, and the curing light source can be moved synchronously through the displacement mechanism; wherein the curing light source can be used to emit curing light with a wavelength falling within a preset light curing band, and the curing light source can emit curing light toward the substrate of the imprinted mask to pass through the penetration area and the imprinting layer.
[0012] Optionally, the embossing layer is formed by irradiating an exposure ultraviolet ray onto a photoresist layer via a photomask or interference, and a preset exposure wavelength of the exposure ultraviolet ray falls outside a preset light curing wavelength band of the curing light.
[0013] Optionally, the embossing layer is formed by irradiating an exposure ultraviolet ray onto a photoresist layer via a photomask or interference, and a preset exposure wavelength of the exposure ultraviolet ray falls outside a preset light curing wavelength band of the curing light.
[0014] In summary, the plate-forming imprinting device disclosed in the embodiment of the present invention can form a plurality of the unit film layers through the structure of the imprinting mask (such as: having the first outer edge and the second outer edge which are irregular and complementary in shape) and other matching components, thereby being more conducive to forming a gap between any two adjacent unit film layers which is difficult to be observed by the naked eye.
[0015] To further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention. However, such description and drawings are only used to illustrate the present invention and are not intended to limit the protection scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 It is a three-dimensional schematic diagram of the preparation steps of the method for manufacturing a plate-type optical film (or the method for manufacturing an imprinting mask) according to the first embodiment of the present invention.
[0017] Figure 2 for Figure 1 An enlarged schematic diagram of region II.
[0018] Figure 3 It is a three-dimensional schematic diagram of a plate-forming imprinting device according to the first embodiment of the present invention.
[0019] Figures 4 to 6 It is a schematic plan view of the embossing and curing step of the method for manufacturing a group-type optical film according to the first embodiment of the present invention.
[0020] Figure 7 It is a partial top view schematic diagram of the modular optical film according to the first embodiment of the present invention.
[0021] Figure 8 for Figure 7 Schematic enlargement of region VIII.
[0022] Fig. 9 It is a three-dimensional schematic diagram of the preparation steps of the method for manufacturing a plate-type optical film (or the method for manufacturing an imprinting mask) according to the second embodiment of the present invention.
[0023] Fig.10 It is a partial top view schematic diagram of the modular optical film according to the second embodiment of the present invention. DETAILED DESCRIPTION
[0024] The following is an explanation of the implementation of the "group plate type imprinting device" disclosed in the present invention through specific embodiments. Those skilled in the art can understand the advantages and effects of the present invention from the contents disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and the details in this specification can also be modified and changed based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only simple schematic illustrations and are not depicted according to actual dimensions. It is stated in advance. The following embodiments will further explain the relevant technical contents of the present invention in detail, but the disclosed contents are not intended to limit the scope of protection of the present invention.
[0025] It should be understood that, although the terms "first", "second", "third", etc. may be used herein to describe various components or signals, these components or signals should not be limited by these terms. These terms are mainly used to distinguish one component from another component, or one signal from another signal. In addition, the term "or" used herein may include any one or more combinations of the associated listed items depending on the actual situation.
[0026] [Example 1]
[0027] See also Figures 1 to 8 This embodiment discloses a method for manufacturing a modular optical film, which includes a preparation step S100 and an imprinting and curing step S300. To facilitate understanding of this embodiment, the preparation step S100 and the imprinting and curing step S300 will be described below.
[0028] The preparation step S100: Figure 1 and Figure 2 As shown, an imprint mask 1 is provided. The preparation step S100 in this embodiment can also be regarded as an imprint mask manufacturing method, which includes a pre-step, a mark forming step, and a pattern forming step.
[0029] The pre-processing step is as follows: providing a substrate 11, which is described as a flat plate in this embodiment, but the present invention is not limited thereto. The substrate 11 has a penetration block 111, an alignment block 112 in an annular shape surrounding the penetration block 111, and a non-penetration block 113 in an annular shape surrounding the alignment block 112.
[0030] Furthermore, the substrate 11 is only cured by a curing light L (eg, Figure 5That is, the curing light L cannot pass through the alignment block 112 and the non-penetrating block 113. Furthermore, the alignment block 112 is in a square ring shape in this embodiment and can provide a alignment light IR (such as: Figure 4 The infrared light shown in the figure passes through, the alignment light IR is preferably unable to pass through the non-penetrating block 113, and the wavelength of the curing light L is different from the wavelength of the alignment light IR.
[0031] The mark forming step: forming a plurality of mask alignment marks 12 spaced apart from each other on the alignment block 112 of the substrate 11, and the plurality of mask alignment marks 12 are described in this embodiment as being formed at a plurality of corners of the alignment block 112. Each of the mask alignment marks 12 may be in a cross shape to facilitate alignment in two directions perpendicular to each other, but the present invention is not limited thereto.
[0032] The pattern forming step: forming an imprint layer 13 on the penetration block 111, and the imprint layer 13 can allow the curing light L to pass through and has a unit pattern 130 on the surface away from the substrate 11. In this embodiment, the imprint layer 13 is formed by irradiating a photoresist layer with an exposure ultraviolet UV through a mask M or interference, and the preset exposure wavelength of the exposure ultraviolet UV falls within the curing light L (e.g.: Figure 5 ). For example, the preset exposure wavelength may be 190 nm to 250 nm, and the preset photocuring wavelength differs from the preset exposure wavelength by at least 100 nm (e.g., the preset photocuring wavelength is 350 nm to 410 nm).
[0033] In more detail, the outline of the unit pattern 130 is generally square (e.g., rectangular or square), but the edge of the unit pattern 130 is irregular. The unit pattern 130 has a first outer edge 131 and a second outer edge 132 located on opposite sides, and an upper side edge 133 and a lower side edge 134 located on the other opposite sides. Furthermore, both ends of the first outer edge 131 and both ends of the second outer edge 132 are respectively adjacent to the plurality of mask alignment marks 12. That is, the imprint mask 1 is formed with a plurality of mask alignment marks 12 on the outer side of the imprint layer 13.
[0034] The first outer edge 131 and the second outer edge 132 are located at opposite outer sides of the embossed layer 13 along a first direction D1, and the first outer edge 131 and the second outer edge 132 are both irregular and complementary in shape. Furthermore, the upper edge 133 and the lower edge 134 are located at opposite outer sides of the embossed layer 13 along a second direction D2 perpendicular to the first direction D1, and the upper edge 133 and the lower edge 134 are both irregular and complementary in shape, but not limited thereto. For example, in other embodiments not shown in the present invention, the unit pattern 130 may also adopt the regular upper edge 133 and the lower edge 134 according to needs.
[0035] It should be noted that the unit pattern 130 in this embodiment includes a plurality of irregularly arranged reflective embossed portions 135 having the same shape. Each of the reflective embossed portions 135 has a plurality of reflective embossed areas 1351 arranged in a matrix shape, which can reflect light in the same direction, and the reflective directions of the plurality of reflective embossed portions 135 are irregularly arranged. That is, when the plurality of reflective embossed portions 135 are irradiated by visible light, they can reflect and form a variety of colors.
[0036] Furthermore, each of the reflective embossed portions 135 is circular, and the multiple reflective embossed portions 135 of the unit pattern 130 are overlapped with each other, so that the first outer edge 131, the second outer edge 132, the upper edge 133, and the lower edge 134 are each composed of arc edges of multiple reflective embossed portions 135.
[0037] The above is a description of the technical content of the preparation step S100 (or the imprint mask manufacturing method) in this embodiment; that is, this embodiment is equivalent to disclosing an imprint mask 1 in the above description, which has an irregular structure different from the previous ones. The technical content of the imprint curing step S300 is then introduced.
[0038] The imprint curing step S300: Figures 3 to 6 As shown, a plurality of adhesive layers 3a are formed on a carrier 2 with spaced configurations and uniform thickness, and the plurality of adhesive layers 3a are sequentially embossed and cured by the embossing layer 13 of the embossing mask 1 to form a plurality of unit film layers 3. In this embodiment, the plurality of adhesive layers 3a are illustrated as a plurality of light-cured adhesive layers formed by coating or spraying, which can be cured by the curing light L; the plurality of unit film layers 3 are formed on the carrier 2 at intervals and together form a set of format optical films 200.
[0039] In more detail, the carrier 2 is described as a flat sheet structure in this embodiment, and the carrier 2 has a plurality of carrier alignment marks 21 arranged at intervals, but the present invention is not limited thereto. In the imprint curing step S300, each of the adhesive layers 3a is substantially formed within the area surrounded by the four carrier alignment marks 21 (that is, any one of the unit film layers 3 is disposed within the area surrounded by the four carrier alignment marks 21), and the plurality of carrier alignment marks 21 are not shielded by the plurality of adhesive layers 3a.
[0040] Specifically, in the imprint curing step S300, the imprint mask 1 is aligned with at least two carrier alignment marks 21 located next to any one of the adhesive layers 3a along a height direction H perpendicular to the first direction D1 and the second direction D2 using a plurality of the mask alignment marks 12, and then the imprint layer 13 is subjected to the imprint curing operation along the height direction H, so that the plurality of unit film layers 3 can be precisely formed at default positions while maintaining default intervals and having substantially the same shape.
[0041] In addition, if Figure 1 , Figure 7 ,and Figure 8 As shown, the following will introduce the assembled optical film 200 formed after the assembly optical film manufacturing method of this embodiment is implemented; that is, this embodiment is equivalent to disclosing a assembled optical film 200 in the following description, which has an irregular structure different from the previous one. Among them, the multiple unit film layers 3 of the assembled optical film 200 are described as being arranged in a matrix, but the present invention is not limited to this. For example, in other embodiments not shown in the present invention, the multiple unit film layers 3 can also be arranged in a row along the first direction D1.
[0042] In this embodiment, each of the unit film layers 3 includes a first outer edge 31 and a second outer edge 32 located on opposite sides, which are respectively embossed by the first outer edge 131 and the second outer edge 132 of the unit pattern 130, so that the first outer edge 31 and the second outer edge 32 are both irregular and complementary in shape. Furthermore, each of the unit film layers 3 also has an upper side edge 33 and a lower side edge 34 located on the other opposite sides, which are respectively embossed by the upper side edge 133 and the lower side edge 134 of the unit pattern 130, so that the upper side edge 33 and the lower side edge 34 are both irregular and complementary in shape.
[0043] Furthermore, each of the unit film layers 3 includes a plurality of irregularly arranged reflective portions 35, which are formed by the unit pattern 130 of the embossed layer 13 and have the same shape. That is, in each of the unit film layers 3 of the present embodiment, each of the reflective portions 35 has a plurality of reflective areas 351 arranged in a matrix, which reflect light in the same direction, and the reflective directions of the plurality of reflective portions 35 are irregularly arranged. That is, when the plurality of reflective portions 35 are irradiated by visible light, they can reflect to form a variety of colors.
[0044] Furthermore, each of the reflective portions 35 is circular in the present embodiment, and the multiple reflective portions 35 of each of the unit film layers 3 are overlapped with each other, so that the first outer edge 31, the second outer edge 32, the upper side edge 33, and the lower side edge 34 of each of the unit film layers 3 are each composed of the arc edges of the multiple reflective portions 35.
[0045] From another perspective, among the two unit film layers 3 adjacent to each other along the first direction D1, the first outer edge 31 of one of the unit film layers 3 is adjacent to the second outer edge 32 of the other unit film layer 3 (and have an irregular shape that complements each other), and there is a first gap G1 of no more than 50 microns between them. Furthermore, among the two unit film layers 3 adjacent to each other along the second direction D2, the upper side edge 33 of one of the unit film layers 3 is adjacent to the lower side edge 34 of the other unit film layer 3 along the second direction D2 (and have an irregular shape that complements each other), and there is a second gap G2 of no more than 50 microns between them.
[0046] That is, the plurality of carrier alignment marks 21 are exposed in the plurality of first gaps G1 and the plurality of second gaps G2 between the plurality of unit film layers 3. In the present embodiment, the plurality of first gaps G1 and the plurality of second gaps G2 are interconnected and generally present a chessboard shape, and any one of the first gaps G1 and the second gaps G2 is preferably not greater than 30 microns, but is not limited thereto.
[0047] In addition, if Figure 1 , Figures 3 to 6 As shown, this embodiment also discloses a group plate type imprinting device 100, and the group plate type optical film manufacturing method can be implemented by the group plate type imprinting device 100, but the present invention is not limited thereto. That is to say, the group plate type optical film manufacturing method can also be implemented by other devices. In addition, the group plate type imprinting device 100 in this embodiment is used to manufacture and form the group plate type optical film 200 as described above, so the specific structure of the group plate type optical film 200 will not be repeated in the following description.
[0048] The plate-forming imprinting device 100 in this embodiment comprises a workbench 4, a displacement mechanism 5 disposed on the workbench, a coating mechanism 6 disposed corresponding to the workbench 4, the imprinting mask 1 and a camera mechanism 7 connected to the displacement mechanism 5, and a curing light source 8 connected to the displacement mechanism 5 and disposed corresponding to the imprinting mask 1. In this embodiment, the specific structure of the imprinting mask 1 is as described in the content of the plate-forming optical film manufacturing method described above, so it will not be repeated in the following description.
[0049] It should be noted that the group plate type imprinting device 100 is described in this embodiment by combining the above-mentioned multiple components, but the present invention is not limited thereto. For example, in other embodiments not shown in the present invention, the camera mechanism 7 and / or the curing light source 8 may also be omitted or replaced by other components.
[0050] The workbench 4 is used for placing the carrier 2 , and the specific structure of the carrier 2 is roughly the same as that described in the above-mentioned method for manufacturing the assembly type optical film, so it will not be repeated in the following description.
[0051] The displacement mechanism 5 can move relative to the workbench 4 along the mutually orthogonal height direction H, the first direction D1, and the second direction D2. Furthermore, the coating mechanism 6 is installed on the displacement mechanism 5 in this embodiment, and can be driven by the displacement mechanism 5 to sequentially form a plurality of adhesive layers 3a that are spaced apart from each other and have uniform thickness on the carrier 2, but the present invention is not limited thereto. For example, in other embodiments not shown in the present invention, the operation of the coating mechanism 6 can also be independent of the displacement mechanism 5.
[0052] It should be noted that the coating mechanism 6 accurately forms the multiple glue layers 3a by coating or spraying in a manner different from dispensing, so that each glue layer 3a has a uniform thickness and is formed within the area surrounded by the four carrier alignment marks 21 and does not cover any of the carrier alignment marks 21.
[0053] In addition, the imprint mask 1, the imaging mechanism 7, and the curing light source 8 can be synchronously moved by the displacement mechanism 5. The imprint mask 1 can also be relatively moved along the height direction H relative to the imaging mechanism 7 and the curing light source 8, but the present invention is not limited thereto.
[0054] Accordingly, the group plate type imprinting device 100 can use the camera mechanism 7 to make the multiple mask alignment marks 12 of the imprint mask 1 align with at least two carrier alignment marks 21 located next to any one of the adhesive layers 3a along the height direction H, and then drive the imprint mask 1 to be imprinted along the height direction H through the displacement mechanism 5, so that the multiple adhesive layers 3a are imprinted in sequence and each forms a unit film layer 3. The curing light source 8 can be used to emit the curing light L toward the substrate 11 of the imprinted mask 1 to pass through the penetration block 111 and the imprint layer 13, thereby curing the unit film layer 3.
[0055] According to the above, the method for manufacturing the composite optical film or the composite imprinting device 100 in this embodiment can manufacture the composite optical film 200 through the structure of the imprinting mask 1 (e.g., having the first outer edge 131 and the second outer edge 132 which are irregular and complementary in shape) and other components or steps matched therewith, so that the first gap G1 is formed by the first outer edge 31 and the second outer edge 32 which are irregular and complementary in shape with a specific size (e.g., not more than 50 microns) between any two adjacent unit film layers 3 of the composite optical film 200, thereby making it impossible for a user to observe the first gap G1 with the naked eye. On the other hand, if the gap is defined by two regular edges, the size of the gap needs to be at least less than 5 microns to make it difficult for the naked eye to directly observe it.
[0056] That is to say, Figure 1 , Figure 7 and Figure 8 As shown, the structure of the assembled optical film 200 provided in this embodiment is different from the conventional structure, so that it is more convenient for production and manufacturing, and can effectively improve its application range. In other words, the imprint mask 1 or the manufacturing method thereof provided in this embodiment can form the assembled optical film 200 in which the first gap G1 (and the second gap G2) cannot be observed by naked eyes with a relatively low manufacturing difficulty.
[0057] [Example 2]
[0058] See also Fig. 9 and Fig.10 As shown, it is the second embodiment of the present invention. Since this embodiment is similar to the above-mentioned first embodiment, the similarities between the two embodiments are not repeated here, and the difference between this embodiment and the above-mentioned first embodiment is mainly that the unit pattern 130 of the imprint mask 1 in this embodiment (e.g., in the pattern forming step) is formed with a first pattern 130-1 and a second pattern 130-2 arranged at intervals from each other, so that each of the unit film layers 3 is also correspondingly formed with two sub-blocks 30 arranged at intervals.
[0059] In more detail, the first pattern 130-1 has the first outer edge 131 and a first inner edge 136 located at opposite sides (along the first direction D1), and the second pattern 130-2 has the second outer edge 132 and a second inner edge 137 located at opposite sides (along the first direction D1). The first inner edge 136 and the second inner edge 137 are both irregular and complementary in shape, and the first inner edge 136 and the second inner edge 136 are adjacent to each other and separated by an elongated plate-setting gap S13 of not more than 50 microns along the first direction D1. The elongated plate-setting gap S13 is preferably not more than 30 microns and its long axis direction is not parallel to (e.g., substantially perpendicular to) the first direction D1.
[0060] The first pattern 130-1 has a first upper edge 133-1 and a first lower edge 134-1 located on opposite sides, both of which are irregular and complementary in shape. One end of the first upper edge 133-1 and the first lower edge 134-1 are connected to the two ends of the first inner edge 136, and the other ends of the first upper edge 133-1 and the first lower edge 134-1 are connected to the two ends of the first outer edge 131.
[0061] The second pattern 130-2 has a second upper edge 133-2 and a second lower edge 134-2 located on opposite sides, both of which are irregular and complementary in shape. One end of the second upper edge 133-2 and the second lower edge 134-2 are connected to the two ends of the second inner edge 137, and the other ends of the second upper edge 133-2 and the second lower edge 134-2 are connected to the two ends of the second outer edge 132.
[0062] That is, in this embodiment, the upper edge 133 is divided into the first upper edge 133-1 and the second upper edge 133-2 by the long typesetting slit S13, and the lower edge 134 is divided into the first upper edge 133-1 and the second upper edge 133-2 by the long typesetting slit S13. In addition, in other embodiments not shown in the present invention, the unit pattern 130 can also be divided into more than three patterns according to needs.
[0063] Furthermore, in this embodiment, the first pattern 130-1 and the second pattern 130-2 each include a plurality of reflective embossed portions 135 that are irregularly configured and have the same shape, each of which has a plurality of reflective embossed areas (not shown in the figure) that are arranged in a matrix and reflect in the same direction, and the reflecting directions of the plurality of reflective embossed portions 135 are irregularly configured.
[0064] The above is a description of the differences between the embossing layer 13 of this embodiment and that of the first embodiment. The differences between the assembly type optical film 200 embossed and formed by the embossing layer 13 of this embodiment (through the embossing and curing step S300) and that of the first embodiment will be described below.
[0065] Specifically, each of the unit film layers 3 has a first inner edge 36 and a second inner edge 37 disposed adjacent to each other, the first outer edge 31 and the second outer edge 32 located at opposite sides (along the first direction D1), and an upper side edge 33 and a lower side edge 34 located at the other opposite sides (along the second direction D2). The first inner edge 36 and the second inner edge 37 are both irregular and complementary in shape, the first outer edge 31 and the second outer edge 32 are both irregular and complementary in shape, and the upper side edge 33 and the lower side edge 34 are both irregular and complementary in shape.
[0066] In each of the unit film layers 3, the first inner edge 36 and the second inner edge 37 are respectively formed by embossing the first inner edge 136 and the second inner edge 137 of the unit pattern 130, and are separated from each other by a set of plate gaps S3 not greater than 50 microns. The set of plate gaps S3 is preferably not greater than 30 microns and its long axis direction is not parallel to (e.g., substantially perpendicular to) the first direction D1.
[0067] That is, in this embodiment, the upper side edge 33 and the lower side edge 34 are each divided into two separate sections by the panel gap S3, and are respectively located in two sub-blocks 30, but the present invention is not limited thereto. For example, in other embodiments not shown in the present invention, the unit film layer 3 can also be divided into more than three sub-blocks 30 according to needs.
[0068] In addition, the specific structure of each unit film layer 3 (such as the reflective portion 35 or the plurality of reflective areas contained therein), and the first gap G1 or the second gap G2 formed by any two adjacent unit film layers 3 along the first direction D1 or the second direction D2 are the same as those in the first embodiment and are not described in detail herein. It should be noted that any one of the panel gaps S3 is connected to two of the second gaps G2.
[0069] As described above, the plate-type optical film manufacturing method or the plate-type imprinting device 100 in this embodiment can manufacture the plate-type optical film 200 through the structure of the imprinting mask 1 (such as: having the first inner edge 136 and the second inner edge 137 that are irregular and complementary in shape) and its other matching components or steps, so that any unit film layer 3 of the plate-type optical film 200 is formed with the plate-type gap S3 that cannot be observed by the user with the naked eye, thereby facilitating the production of the imprinting mask 1.
[0070] In other words, the plate-forming optical film 200 provided in this embodiment has a different structure from the conventional one, which is more conducive to the production and manufacturing of the embossed mask 1, and further facilitates its promotion and mass production. Furthermore, the embossed mask 1 or its manufacturing method provided in this embodiment can combine the unit pattern 130 with the elongated plate-forming slit S13, thereby effectively reducing the manufacturing difficulty of the embossed mask 1, and can be used to form the unit film layer 3 in which the plate-forming slit S3 cannot be observed with the naked eye.
[0071] The contents disclosed above are only preferred feasible embodiments of the present invention, and are not intended to limit the patent scope of the present invention. Therefore, all equivalent technical changes made using the contents of the present invention's specification and drawings are included in the patent scope of the present invention.
Claims
1. A group type imprinting device, characterized in that: The group plate type imprinting device comprises: a workbench for a carrier to be set, and the carrier has a plurality of carrier alignment marks; a displacement mechanism, disposed on the workbench, and capable of moving relative to the workbench along a height direction, a first direction, and a second direction that are orthogonal to each other; a coating mechanism, arranged corresponding to the workbench, and used for sequentially forming a plurality of adhesive layers spaced apart from each other and having uniform thickness on the carrier; an imprint mask, connected to the displacement mechanism, and comprising: a substrate, having a penetration block, an alignment block in a ring shape and surrounding the penetration block, and a non-penetration block in a ring shape and surrounding the alignment block; wherein the substrate is penetrated only by a curing light provided to the penetration block, and the alignment block can allow the alignment light to pass through, and the wavelength of the curing light is different from the wavelength of the alignment light; A plurality of mask alignment marks are located in the alignment block; and an imprint layer formed in the penetration block; wherein the imprint layer allows the curing light to pass through and has a unit pattern on a surface away from the substrate; wherein the unit pattern has a first outer edge and a second outer edge; the first outer edge and the second outer edge are respectively located on opposite sides of the imprint layer, and the first outer edge and the second outer edge are both irregular and complementary in shape; and A camera mechanism connected to the displacement mechanism and capable of moving synchronously with the imprint mask; Among them, the group-type imprinting equipment can use the camera mechanism to align the multiple mask alignment marks of the imprinting mask with at least two carrier alignment marks located next to any one of the glue layers along the height direction, and then drive the imprinting mask to be imprinted along the height direction through the displacement mechanism, so that the multiple glue layers are imprinted in sequence and each forms a unit film layer.
2. The group-type imprinting device according to claim 1, characterized in that: When the coating mechanism forms a plurality of the adhesive layers, each of the adhesive layers is formed within a region surrounded by four carrier alignment marks, and the plurality of carrier alignment marks are not shielded by the plurality of adhesive layers.
3. The group-type imprinting device according to claim 1, characterized in that: The plurality of mask alignment marks are respectively adjacent to two ends of the first outer edge and two ends of the second outer edge.
4. The group-type imprinting device according to claim 1, characterized in that: Each of the unit film layers formed by the group plate-type imprinting equipment has a first outer edge and a second outer edge respectively located on opposite sides; wherein, among the two unit film layers adjacent to each other along the first direction, the first outer edge of one of the unit film layers is adjacent to the second outer edge of the other unit film layer and is separated by a first gap of no more than 50 microns.
5. The group-type imprinting device according to claim 4, characterized in that: Each of the unit film layers formed by the group plate-type imprinting equipment has an upper side edge and a lower side edge respectively located on opposite sides; wherein, among the two unit film layers adjacent to each other along the second direction, the upper side edge of one of the unit film layers is adjacent to the lower side edge of the other unit film layer along the second direction and is separated by a second gap not greater than 50 microns; wherein the plurality of carrier alignment marks of the carrier are exposed in the plurality of first gaps and the plurality of second gaps between the plurality of unit film layers.
6. The group-type imprinting device according to claim 1, characterized in that: The unit pattern includes a first pattern and a second pattern arranged at an interval from each other, and the first pattern has the first outer edge and a first inner edge, and the second pattern has the second outer edge and a second inner edge adjacent to the first inner edge; wherein the first inner edge and the second inner edge are both irregular and complementary in shape, and the first inner edge and the second inner edge are spaced apart from each other by a long platemaking gap of no more than 50 microns.
7. The group-type imprinting device according to claim 1, characterized in that: The unit pattern includes a plurality of irregularly arranged reflective embossed portions having the same shape; each of the reflective embossed portions has a plurality of reflective embossed areas arranged in a matrix shape, which can reflect light in the same direction, and the reflective directions of the plurality of reflective embossed portions are irregularly arranged.
8. The group-type imprinting device according to claim 1, characterized in that: The group plate type imprinting device further includes a curing light source, which is connected to the displacement mechanism and configured corresponding to the imprinting mask, so that the imprinting mask, the imaging mechanism, and the curing light source can be synchronously moved through the displacement mechanism; wherein the curing light source can be used to emit the curing light with a wavelength falling within a preset light curing band, and the curing light source can emit the curing light toward the substrate covered by the imprinting mask so as to pass through the penetration area and the imprinting layer.
9. The group-type imprinting device according to claim 8, characterized in that: The embossing layer is formed by irradiating a photoresist layer with an exposure ultraviolet ray through a photomask or interference, and the preset exposure wavelength of the exposure ultraviolet ray falls outside the preset light curing wavelength band of the curing light.
10. The group-type imprinting device according to claim 1, characterized in that: The embossing layer is formed by irradiating a photoresist layer with an exposure ultraviolet ray through a photomask or interference, and the preset exposure wavelength of the exposure ultraviolet ray falls outside the preset light curing wavelength band of the curing light.