Dynamic compensation method of exposure system in photoetching machine, photoetching machine, equipment and medium

Abstract

The invention provides a dynamic compensation method of an exposure system in a photoetching machine, the photoetching machine, equipment and a medium, and relates to the technical field of photoetching machines. The method comprises the following steps: receiving a light intensity signal sensed by a light intensity detector and sent by a front-end module; acquiring compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm, wherein the compensation parameters comprise at least one of the following parameters: a voltage compensation parameter and a time compensation parameter; according to the light intensity signal and the compensation parameter corresponding to the light intensity signal, an adjusting instruction is sent to the front-end module, so that the front-end module adjusts the light source intensity and / or the exposure time of the light source module according to the adjusting instruction, dynamic compensation can be achieved in the exposure system, actual exposure better meets the expected design requirement, and therefore the quality of a final product is improved; and the stability and reliability of the exposure system are improved.

Description

Technical Field

[0001] The present application relates to the technical field of lithography machines, and in particular to a dynamic compensation method for an exposure system in a lithography machine, a lithography machine, a device and a medium. Background Art

[0002] The exposure system in the lithography machine is the core part of the lithography process. Its main function is to accurately transfer the pattern on the mask to the photoresist on the silicon wafer.

[0003] In the prior art, in order to ensure the accuracy and real-time performance of signal transmission between the control board card and the sensor in the exposure system, an offline calibration method is often used for compensation.

[0004] However, since the offline calibration method is relatively simple, it is unable to perform real-time compensation and has poor applicability. Summary of the invention

[0005] The purpose of the present application is to address the deficiencies in the above-mentioned prior art and to provide a dynamic compensation method, lithography machine, equipment and medium for the exposure system in a lithography machine, which can realize dynamic compensation in the exposure system and improve the stability and reliability of the exposure system.

[0006] To achieve the above purpose, the technical solution adopted in the embodiment of the present application is as follows:

[0007] In a first aspect, the present invention provides a dynamic compensation method for an exposure system in a lithography machine, which is applied to an exposure dose control unit, wherein the exposure dose control unit is communicatively connected to a front-end module, the front-end module is communicatively connected to a light source module, and the front-end module is provided with a light intensity detector, and the method comprises:

[0008] Receive the light intensity signal sensed by the light intensity detector sent by the front-end module;

[0009] Acquire compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm, wherein the compensation parameters include at least one of the following: a voltage compensation parameter and a time compensation parameter, wherein the voltage compensation parameter is used to characterize a voltage drop of a transmission line between the exposure dose control unit and the front-end module, and the time compensation parameter is used to characterize a transmission delay of a transmission line between the exposure dose control unit and the front-end module;

[0010] According to the light intensity signal and the compensation parameter corresponding to the light intensity signal, an adjustment instruction is sent to the front-end module, so that the front-end module adjusts the light source intensity and / or exposure time of the light source module according to the adjustment instruction.

[0011] In an optional implementation, sending an adjustment instruction to the front-end module according to the light intensity signal and a compensation parameter corresponding to the light intensity signal includes:

[0012] Calculating a target exposure dose corresponding to the light intensity signal according to the light intensity signal and a compensation parameter corresponding to the light intensity signal;

[0013] An adjustment instruction is sent to the front-end module according to the target exposure dose and the preset exposure dose.

[0014] In an optional embodiment, the compensation parameter includes: a voltage compensation parameter, and the step of obtaining the compensation parameter corresponding to the light intensity signal according to a preset compensation algorithm includes:

[0015] Based on the first detection frequency, sending a first detection voltage signal to the front-end module;

[0016] receiving a second detection voltage signal sent by the front-end module according to the first detection voltage signal;

[0017] A voltage difference between the first detection voltage signal and the second detection voltage signal is calculated as the voltage compensation parameter.

[0018] In an optional implementation, calculating the target exposure dose corresponding to the light intensity signal according to the light intensity signal and the compensation parameter corresponding to the light intensity signal includes:

[0019] Obtaining an initial voltage value corresponding to the light intensity signal;

[0020] Calculating a target voltage value according to the initial voltage value and the voltage compensation parameter;

[0021] The target exposure dose corresponding to the light intensity signal is calculated according to the target voltage value.

[0022] In an optional implementation, the compensation parameter includes: a time compensation parameter, and the step of obtaining the compensation parameter corresponding to the light intensity signal according to a preset compensation algorithm includes:

[0023] Based on the second detection frequency, sending a first detection pulse signal to the front-end module, and recording a first sending time of the first detection pulse signal;

[0024] receiving a second detection pulse signal sent by the front-end module according to the first detection pulse signal, and recording a second receiving time of the second detection pulse signal;

[0025] receiving a light intensity signal sensed by the light intensity detector according to the first detection pulse signal and sent by the front-end module, and recording a third receiving time corresponding to the light intensity signal;

[0026] The time compensation parameter is determined according to the first sending time, the second receiving time, and the third receiving time.

[0027] In an optional implementation manner, determining the time compensation parameter according to the first sending time, the second receiving time, and the third receiving time includes:

[0028] Calculate a first time difference according to the first sending time and the second receiving time;

[0029] Calculate a second time difference according to the second receiving time and the third receiving time;

[0030] The time compensation parameter is determined according to the first time difference and the second time difference.

[0031] In an optional implementation, sending an adjustment instruction to the front-end module according to the light intensity signal and a compensation parameter corresponding to the light intensity signal includes:

[0032] Obtaining an initial exposure dose corresponding to the light intensity signal;

[0033] Calculating a target exposure dose according to the initial exposure dose and the time compensation parameter;

[0034] An adjustment instruction is sent to the front-end module according to the target exposure dose and the preset exposure dose.

[0035] In a second aspect, the present invention provides a photolithography machine, comprising: an exposure dose control unit, a front-end module and a light source module, wherein the exposure dose control unit is communicatively connected to the front-end module, the front-end module is communicatively connected to the light source module, and the front-end module is provided with a light intensity detector;

[0036] The front-end module is used to obtain the light intensity signal sensed by the light intensity detector and send it to the exposure dose control unit;

[0037] The exposure dose control unit is used to obtain compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm based on the light intensity signal, wherein the compensation parameters include at least one of the following: a voltage compensation parameter and a time compensation parameter, wherein the voltage compensation parameter is used to characterize the voltage drop of the transmission line between the exposure dose control unit and the front-end module, and the time compensation parameter is used to characterize the transmission delay of the transmission line between the exposure dose control unit and the front-end module; and send an adjustment instruction to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal;

[0038] The light source module is used to adjust the light source intensity and / or exposure time according to the adjustment instruction.

[0039] In a third aspect, the present invention provides an electronic device, comprising: a processor, a storage medium and a bus, wherein the storage medium stores machine-readable instructions executable by the processor, and when the electronic device is running, the processor communicates with the storage medium through the bus, and the processor executes the machine-readable instructions to perform the steps of the dynamic compensation method of the exposure system in the lithography machine as described in any of the aforementioned embodiments.

[0040] In a fourth aspect, the present invention provides a computer-readable storage medium having a computer program stored thereon, and when the computer program is executed by a processor, the steps of the dynamic compensation method of the exposure system in the lithography machine as described in any of the aforementioned embodiments are executed.

[0041] The beneficial effects of this application are:

[0042] In the dynamic compensation method of the exposure system in the lithography machine provided by the embodiment of the present application, the lithography machine, the device and the medium, the method is applied to the exposure dose control unit, the exposure dose control unit is communicatively connected with the front-end module, the front-end module is communicatively connected with the light source module, and the front-end module is provided with a light intensity detector, the method comprises: receiving a light intensity signal sensed by the light intensity detector and sent by the front-end module; obtaining compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm, the compensation parameters comprising at least one of the following: a voltage compensation parameter and a time compensation parameter, the voltage compensation parameter being used to characterize the voltage drop of the transmission line between the exposure dose control unit and the front-end module, and the time compensation parameter being used to characterize the transmission delay of the transmission line between the exposure dose control unit and the front-end module; sending an adjustment instruction to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal, so that the front-end module adjusts the light source intensity and / or exposure time of the light source module according to the adjustment instruction, and dynamic compensation can be realized in the exposure system, so that the actual exposure is more in line with the expected design requirements, thereby improving the quality of the final product and improving the stability and reliability of the exposure system. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0044] Figure 1 A schematic flow chart of a dynamic compensation method for an exposure system in a lithography machine provided in an embodiment of the present application;

[0045] Figure 2 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application;

[0046] Figure 3 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application;

[0047] Figure 4 A voltage compensation schematic diagram provided in an embodiment of the present application;

[0048] Figure 5 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application;

[0049] Figure 6 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application;

[0050] Figure 7 A schematic diagram of a dynamic detection provided in an embodiment of the present application;

[0051] Figure 8 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application;

[0052] Fig. 9 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application;

[0053] Fig.10 A schematic diagram of the functional modules of a lithography machine provided in an embodiment of the present application;

[0054] Fig.11 A schematic diagram of the structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0055] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations.

[0056] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application for which protection is sought, but merely represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present application.

[0057] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0058] In the prior art, in order to ensure the accuracy and real-time performance of signal transmission between the control board and the sensor in the exposure system, an offline calibration method is often used for compensation. However, since the compensation method is relatively simple and cannot provide a real-time compensation mechanism, the existing compensation method has the problem of poor compensation effect.

[0059] In view of this, an embodiment of the present application provides a dynamic compensation method for an exposure system in a lithography machine. The application of this method can achieve dynamic compensation and improve the stability and reliability of the exposure system.

[0060] Figure 1 The present invention provides a schematic flow chart of a dynamic compensation method for an exposure system in a lithography machine. The method can be applied to an exposure dose control unit in an exposure system, such as Figure 1 As shown, the exposure dose control unit is connected to the front-end module in communication, the front-end module is connected to the light source module in communication, and the front-end module is provided with a light intensity detector. Optionally, the exposure dose control unit can be integrated in an exposure dose control board (EDCB), and of course, the specific form of expression is not limited thereto.

[0061] In order to better understand the present application, the working scenario of the exposure system in the general scenario of the present application is first briefly described.

[0062] In some embodiments, the light source module may be an LED light source, and optionally, it may be an LED array light source, which is not limited here. Of course, the present application does not limit the number of LED array light sources in the exposure system, and may include one or more according to the actual application scenario.

[0063] Optionally, during the operation of the exposure system, generally, the light intensity detector is used to detect the illumination of the light source module, and send the sensed light intensity signal to the exposure dose control unit through the front-end module; the exposure dose control unit can calculate the exposure dose corresponding to the current illumination operation based on the acquired light intensity signal, wherein the exposure dose is the light energy irradiated to the photoresist per unit area; optionally, if the calculated exposure dose does not meet the preset requirements, the exposure dose control unit can send an adjustment instruction to the front-end module to adjust the light source intensity and / or exposure time of the light source module; wherein, the front-end module, after receiving the adjustment instruction, can make adjustments accordingly so that the subsequently calculated exposure dose meets the preset requirements.

[0064] Based on the above description, considering that there may be line loss or interference in the transmission line of the optical intensity signal, and there may be delays in the transmission process that change dynamically with environmental changes or equipment aging, resulting in the above adjustment method being inaccurate. Therefore, optionally, the following method can be used for dynamic compensation.

[0065] like Figure 1 As shown, the method includes:

[0066] Step 101: Receive a light intensity signal sensed by a light intensity detector and sent by a front-end module.

[0067] The light intensity signal sensed by the light intensity detector can be sent to the front-end module. Optionally, in some scenarios, the light intensity detector can be regarded as an integral sensor (Exposure Dose sensor, ED), and the light intensity detector can be a photodiode, a photomultiplier tube, a CCD / CMOS sensor, etc., which is not limited here and can be flexibly selected according to the actual application scenario.

[0068] Step 102: Obtain compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm.

[0069] The compensation parameters include at least one of the following: a voltage compensation parameter and a time compensation parameter. The voltage compensation parameter is used to characterize the voltage drop of the transmission line between the exposure dose control unit and the front-end module, and the time compensation parameter is used to characterize the transmission delay of the transmission line between the exposure dose control unit and the front-end module.

[0070] Among them, the preset compensation algorithm may include a preset voltage compensation algorithm and / or a preset time compensation algorithm. Correspondingly, the compensation parameters may include voltage compensation parameters and / or time compensation parameters. The corresponding compensation algorithm may be flexibly selected according to the actual application scenario.

[0071] Optionally, for the voltage compensation parameter, the voltage compensation parameter corresponding to the light intensity signal can be obtained according to a preset voltage compensation algorithm, and the voltage compensation parameter can be used to characterize the voltage drop of the transmission line between the exposure dose control unit and the front-end module, wherein the voltage drop may be caused by line loss or interference in the transmission line between the exposure dose control unit and the front-end module.

[0072] Optionally, for the time compensation parameter, the time compensation parameter corresponding to the light intensity signal can be obtained according to a preset time compensation algorithm. The time compensation parameter can be used to characterize the transmission delay of the transmission line between the exposure dose control unit and the front-end module. The transmission delay may be caused by changes in the environment where the transmission line is located (for example, changes in temperature and humidity lead to changes in line impedance).

[0073] Step 103: Send an adjustment instruction to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal, so that the front-end module adjusts the light source intensity and / or exposure time of the light source module according to the adjustment instruction.

[0074] Among them, after calculating the above-mentioned compensation parameters, the target exposure dose corresponding to the light intensity signal can be calculated according to the light intensity signal and the compensation parameters corresponding to the light intensity signal; it is judged whether the target exposure dose meets the preset requirements. If not, an adjustment instruction can be sent to the front-end module according to the currently calculated target exposure dose; and then the front-end module can adjust the light source intensity and / or exposure time of the light source module according to the adjustment instruction, and the exposure dose obtained by subsequent calculation is made to meet the preset requirements through adjustment. Compared with the existing offline calibration method, dynamic compensation can be realized in the exposure system, thereby improving the stability and reliability of the exposure system.

[0075] In particular, when voltage compensation parameters and time compensation parameters are used for simultaneous compensation, the limitations of the traditional single compensation method can be overcome, the stability and robustness of the lithography process can be significantly enhanced, and strong technical support can be provided for semiconductor manufacturing.

[0076] In summary, an embodiment of the present application provides a dynamic compensation method for an exposure system in a lithography machine, the method is applied to an exposure dose control unit, the exposure dose control unit is communicatively connected to a front-end module, the front-end module is communicatively connected to a light source module, and the front-end module is provided with a light intensity detector, the method comprising: receiving a light intensity signal sensed by the light intensity detector and sent by the front-end module; obtaining compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm, the compensation parameters comprising at least one of the following: a voltage compensation parameter and a time compensation parameter, the voltage compensation parameter being used to characterize a voltage drop of a transmission line between the exposure dose control unit and the front-end module, and a time compensation parameter being used to characterize a transmission delay of a transmission line between the exposure dose control unit and the front-end module; sending an adjustment instruction to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal, so that the front-end module adjusts the light source intensity and / or exposure time of the light source module according to the adjustment instruction, and dynamic compensation can be realized in the exposure system, so that the actual exposure is more in line with the expected design requirements, thereby improving the quality of the final product and improving the stability and reliability of the exposure system.

[0077] Figure 2 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application. In an optional implementation manner, Figure 2 As shown, the above-mentioned sending of adjustment instructions to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal includes:

[0078] Step 201: Calculate a target exposure dose corresponding to the light intensity signal according to the light intensity signal and the compensation parameter corresponding to the light intensity signal.

[0079] Step 202: Send an adjustment instruction to the front-end module according to the target exposure dose and the preset exposure dose.

[0080] Optionally, when making adjustments, the exposure dose corresponding to the light intensity signal can be compensated and calculated based on the compensation parameters corresponding to the light intensity signal. Through the compensation calculation, the target exposure dose corresponding to the light intensity signal can be calculated, wherein the target exposure dose is the exposure dose after supplementation. It is understandable that since the compensation operation has been performed at this time, the calculated exposure dose is more accurate. Of course, the present application does not limit the compensation method here, and voltage compensation parameters and / or time compensation parameters can be selected for compensation according to the actual application scenario.

[0081] Among them, the preset exposure dose can be a pre-expected exposure dose. Optionally, when making specific adjustments, the size relationship between the target exposure dose and the preset exposure dose can be compared. If the target exposure dose is less than the preset exposure dose, a first adjustment instruction can be sent to the front-end module, and the first adjustment instruction is used to enhance the light source intensity of the light source module and / or increase the exposure time of the light source module; if the target exposure dose is greater than the preset exposure dose, a second adjustment instruction can be sent to the front-end module, and the second adjustment instruction is used to weaken the light source intensity of the light source module and / or reduce the exposure time of the light source module. That is, the selection of the specific adjustment instruction can be flexibly selected according to the relationship between the target exposure dose and the preset exposure dose.

[0082] Figure 3 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application. Figure 4 A voltage compensation schematic diagram provided in an embodiment of the present application. In an optional implementation, the compensation parameters include: voltage compensation parameters. Figure 3 As shown, the above-mentioned method of obtaining the compensation parameters corresponding to the light intensity signal according to the preset compensation algorithm includes:

[0083] Step 301: Send a first detection voltage signal to a front-end module based on a first detection frequency.

[0084] Step 302: Receive a second detection voltage signal sent by the front-end module according to the first detection voltage signal.

[0085] Step 303: Calculate the voltage difference between the first detection voltage signal and the second detection voltage signal as a voltage compensation parameter.

[0086] Optionally, in order to calculate the voltage compensation parameters in real time, the exposure dose control unit may send a first detection voltage signal V1 to the front-end module according to a first detection frequency (for example, once every 1 minute or 5 minutes). After the front-end module receives the first detection voltage signal V1, it may transmit the first detection voltage signal V1 back to the exposure dose control unit, and the exposure dose control unit receives the second detection voltage signal V2 at this time.

[0087] Among them, after receiving the second detection voltage signal V2, the exposure dose control unit can calculate the voltage drop between the first detection voltage signal V1 and the second detection voltage signal V2. It can be understood that if there are line losses or interferences (for example, resistance, capacitance effects, electromagnetic interference) and other factors in the transmission line between the exposure dose control unit and the front-end module, the second detection voltage signal will be smaller than the first detection voltage signal, that is, there is a voltage drop ΔV=V1-V2 between the first detection voltage signal and the second detection voltage signal. At this time, the voltage drop can be used as a voltage compensation parameter corresponding to the light intensity signal, and the exposure dose corresponding to this light intensity signal can be supplemented and calculated subsequently.

[0088] Of course, it should be noted that in some embodiments, a first detection voltage signal can also be sent to the front-end module after each light intensity signal is received. The present application does not limit the timing of sending the first detection voltage signal, and it can be flexibly set according to the application scenario of the timing.

[0089] Figure 5 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application. In an optional implementation manner, Figure 5 As shown, according to the light intensity signal and the compensation parameter corresponding to the light intensity signal, the target exposure dose corresponding to the light intensity signal is calculated, including:

[0090] Step 401: Obtain an initial voltage value corresponding to a light intensity signal.

[0091] Step 402: Calculate the target voltage value according to the initial voltage value and the voltage compensation parameter.

[0092] Step 403: Calculate the target exposure dose corresponding to the light intensity signal according to the target voltage value.

[0093] Optionally, when performing specific calculations, an initial voltage value corresponding to the light intensity signal sensed by the light intensity detector can be obtained based on the mapping relationship between the light intensity signal and the voltage value; the initial voltage value can be compensated using the voltage compensation parameter obtained by the above calculation. Optionally, when performing specific compensation, the initial voltage value and the voltage compensation parameter can be added to obtain a target voltage value; based on the mapping relationship between the voltage value and the exposure dose, the target exposure dose corresponding to the light intensity signal can be calculated. It can be understood that at this time, through this compensation operation, the voltage drop caused by line problems can be effectively offset, so that the target exposure dose finally calculated is more accurate.

[0094] It can be understood that since the voltage compensation parameters are calculated in real time, if the conditions of the transmission line between the exposure dose control unit and the front-end module change (for example, temperature changes cause changes in line impedance), the new voltage compensation parameters can be automatically recalculated and applied to achieve real-time compensation, which can significantly improve the stability and accuracy of the exposure dose control system and thus improve the quality of the overall lithography process.

[0095] Figure 6 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application. Figure 7 A dynamic detection schematic diagram provided in an embodiment of the present application. It is understandable that due to the presence of physical media in the transmission line, there is an inherent signal transmission delay between the exposure dose control unit and the front-end module, and the following method can be used to determine the time compensation parameter.

[0096] In an optional embodiment, the compensation parameters include: time compensation parameters, such as Figure 6 As shown, the above-mentioned method of obtaining the compensation parameters corresponding to the light intensity signal according to the preset compensation algorithm includes:

[0097] Step 501: Send a first detection pulse signal to a front-end module based on a second detection frequency, and record a first sending time of the first detection pulse signal.

[0098] Optionally, the second detection frequency may be the same as or different from the first detection frequency.

[0099] Step 502: Receive a second detection pulse signal sent by the front-end module according to the first detection pulse signal, and record a second receiving time of the second detection pulse signal.

[0100] Step 503: Receive the light intensity signal sensed by the light intensity detector according to the first detection pulse signal sent by the front-end module, and record the third receiving time corresponding to the light intensity signal.

[0101] Step 504: Determine a time compensation parameter according to the first sending time, the second receiving time, and the third receiving time.

[0102] Among them, Figure 7 As shown, the exposure dose control unit can send a first detection pulse signal to the front-end module based on the second detection frequency, and synchronously record the first sending time T1 of the first detection pulse signal; the front-end module can divide the first detection pulse signal CL into two detection paths after receiving it.

[0103] Among them, one CR1 can be sent to the light intensity detector so that the light intensity detector can sense the light intensity signal accordingly; after the light intensity detector senses the light intensity signal accordingly, it can send the light intensity signal to the exposure dose control unit through the front-end module, and at this time, the exposure dose control unit synchronously records the third receiving time of the light intensity signal; the other CR2 can be returned to the exposure dose control unit by the front-end module as a reference signal, that is, the other path can be returned to the exposure dose control unit as the second detection pulse signal C2. It can be understood that due to the existence of the physical medium in the transmission line, the first detection pulse signal CL signal received by the front-end module is actually delayed from the first sending time issued by the exposure dose control unit, and the exposure dose control unit synchronously records the second receiving time T2 of the second detection pulse signal.

[0104] Based on the above description, after respectively obtaining the first sending time, the second receiving time and the third receiving time, a time compensation parameter can be determined accordingly. The time compensation parameter can characterize the additional transmission delay that needs to be adjusted. Based on the time compensation parameter, necessary correction measures can be implemented to ensure the timing accuracy of the entire process.

[0105] In summary, the embodiment of the present application utilizes the difference between the reference signals CR and SL for real-time analysis and adjustment, forming a closed-loop control system, so that any slight time delay can be quickly captured and processed, further enhancing the reliability and robustness of the exposure system.

[0106] Optionally, determining the time compensation parameter according to the first sending time, the second receiving time, and the third receiving time includes:

[0107] Calculate a first time difference according to the first sending time and the second receiving time; calculate a second time difference according to the second receiving time and the third receiving time; and determine a time compensation parameter according to the first time difference and the second time difference.

[0108] Among them, the first time difference can be determined by calculating half of the difference between the first sending time and the second receiving time, which can characterize the transmission delay between the exposure dose control unit and the front-end module. It can be understood that it can be determined by comparing the phase difference or time difference between the original CL signal and the returned CR2 signal; the second time difference can be determined by calculating the time difference between the first sending time and the third receiving time, which can characterize the time required for the front-end module to obtain the light intensity signal. During the specific calculation, it can be determined by comparing the phase difference or time difference between the original CL signal, the returned CR2 signal and the returned light intensity signal.

[0109] Optionally, the first sending time is T1, the second receiving time is T2, the third receiving time is T3, the first time difference is t1, and the second time difference is t2, then t1 = (T2-T1) / 2, t2 = (T3-T1) / 2, further, the time compensation parameter may include: the first time difference, the third time difference, wherein the third time difference may be determined according to the absolute value of the difference between the second time difference and the first time difference, that is, Δt = |t1-t2|. The first time difference may be used to compensate for the transmission delay between the exposure dose control unit and the front-end module; the third time difference may be used to compensate for the time required for the front-end module to obtain the light intensity signal.

[0110] In summary, after the time compensation parameters (the first time difference and the third time difference) are calculated, the exposure dose corresponding to the light intensity signal can be compensated accordingly, so that a more accurate target exposure dose can be obtained by compensation calculation.

[0111] Figure 8 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application. In an optional implementation manner, Figure 8 As shown, the above-mentioned sending of adjustment instructions to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal includes:

[0112] Step 601: Obtain an initial exposure dose corresponding to a light intensity signal.

[0113] Step 602: Calculate the target exposure dose according to the initial exposure dose and the time compensation parameter corresponding to the light intensity signal.

[0114] Step 603: Send an adjustment instruction to the front-end module according to the target exposure dose and the preset exposure dose.

[0115] The preset exposure dose may be a pre-expected exposure dose, an initial exposure dose, that is, a real exposure dose initially calculated, and a target exposure dose, that is, a real exposure dose after compensating for the initial exposure dose.

[0116] Optionally, during the specific calculation, the initial exposure dose Dose1 corresponding to the light intensity signal can be calculated first, wherein, during the specific calculation, the initial exposure dose can be obtained by time-integrating the light intensity signal according to the initial time corresponding to the light intensity signal; then, based on the time compensation parameter, the compensated exposure dose ΔDose is calculated; finally, according to the initial exposure dose Dose1 and the compensated exposure dose ΔDose, the final target exposure dose Dose2 is calculated. It can be understood that the target exposure dose calculated at this time will be more accurate. It can be understood that, according to the subsequent relationship between the target exposure dose and the preset exposure dose, the first adjustment instruction or the second adjustment instruction can be sent to the front-end module to realize flexible adjustment of the light source module, so as to make the actual exposure more in line with the expected design requirements, thereby improving the quality of the final product.

[0117] Fig. 9 A schematic flow chart of another method for dynamic compensation of an exposure system in a lithography machine provided in an embodiment of the present application. In an optional implementation manner, Fig. 9 As shown, the method includes:

[0118] Step 701: Receive a light intensity signal sensed by a light intensity detector sent by a front-end module.

[0119] Step 702: Obtain voltage compensation parameters and time compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm.

[0120] Step 703: Calculate the target exposure dose corresponding to the light intensity signal according to the light intensity signal, the voltage compensation parameter and the time compensation parameter.

[0121] Step 704: Send an adjustment instruction to the front-end module according to the target exposure dose and the preset exposure dose.

[0122] For the description of each step, please refer to the relevant part mentioned above and will not be repeated here.

[0123] By using the embodiments of the present application, comprehensive dynamic compensation can be achieved by real-time monitoring and adjusting the voltage compensation parameters and time compensation parameters, ensuring the accuracy and stability of the signal, and achieving real-time clock synchronization, thereby improving the overall accuracy and reliability of the system. Among them, by performing real-time compensation according to the voltage compensation parameters, the voltage changes in line transmission caused by line loss and other factors can be compensated, while automatically adapting to changes in environmental factors such as temperature and humidity to maintain stable performance, thereby reducing the need for frequent manual calibration, reducing maintenance costs and downtime; in addition, by performing real-time compensation according to the time compensation parameters, the error caused by delay can be reduced, the time consistency between modules can be ensured, and the reliability and stability of the system can be improved, thereby coping with the challenges brought by hardware aging and environmental changes, maintaining the long-term stability of the system, thereby reducing the rework or scrap rate caused by delay problems, and improving production efficiency and product quality.

[0124] Fig.10 A functional module schematic diagram of a photolithography machine provided by the present invention, wherein the photolithography machine comprises: an exposure dose control unit 110, a front-end module 120 and a light source module 130, the exposure dose control unit 110 is communicatively connected with the front-end module 120, the front-end module 120 is communicatively connected with the light source module 130, and the front-end module 120 is provided with a light intensity detector 121;

[0125] The front-end module 120 is used to obtain the light intensity signal sensed by the light intensity detector and send it to the exposure dose control unit;

[0126] The exposure dose control unit 110 is used to obtain compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm based on the light intensity signal, and the compensation parameters include at least one of the following: a voltage compensation parameter and a time compensation parameter. The voltage compensation parameter is used to characterize the voltage drop of the transmission line between the exposure dose control unit and the front-end module, and the time compensation parameter is used to measure the transmission delay of the transmission line between the exposure dose control unit and the front-end module; and send an adjustment instruction to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal;

[0127] The light source module 130 is used to adjust the light source intensity and / or exposure time according to the adjustment instruction.

[0128] It should be noted that the exposure dose control unit can also be used to execute the method steps provided in the above embodiment:

[0129] In an optional implementation, sending an adjustment instruction to the front-end module according to the light intensity signal and a compensation parameter corresponding to the light intensity signal includes:

[0130] Calculating a target exposure dose corresponding to the light intensity signal according to the light intensity signal and a compensation parameter corresponding to the light intensity signal;

[0131] An adjustment instruction is sent to the front-end module according to the target exposure dose and the preset exposure dose.

[0132] In an optional embodiment, the compensation parameter includes: a voltage compensation parameter, and the step of obtaining the compensation parameter corresponding to the light intensity signal according to a preset compensation algorithm includes:

[0133] Based on the first detection frequency, sending a first detection voltage signal to the front-end module;

[0134] receiving a second detection voltage signal sent by the front-end module according to the first detection voltage signal;

[0135] A voltage difference between the first detection voltage signal and the second detection voltage signal is calculated as the voltage compensation parameter.

[0136] In an optional implementation, calculating the target exposure dose corresponding to the light intensity signal according to the light intensity signal and the compensation parameter corresponding to the light intensity signal includes:

[0137] Obtaining an initial voltage value corresponding to the light intensity signal;

[0138] Calculating a target voltage value according to the initial voltage value and the voltage compensation parameter;

[0139] The target exposure dose corresponding to the light intensity signal is calculated according to the target voltage value.

[0140] In an optional implementation, the compensation parameter includes: a time compensation parameter, and the step of obtaining the compensation parameter corresponding to the light intensity signal according to a preset compensation algorithm includes:

[0141] Based on the second detection frequency, sending a first detection pulse signal to the front-end module, and recording a first sending time of the first detection pulse signal;

[0142] receiving a second detection pulse signal sent by the front-end module according to the first detection pulse signal, and recording a second receiving time of the second detection pulse signal;

[0143] receiving a light intensity signal sensed by the light intensity detector according to the first detection pulse signal and sent by the front-end module, and recording a third receiving time corresponding to the light intensity signal;

[0144] The time compensation parameter is determined according to the first sending time, the second receiving time, and the third receiving time.

[0145] In an optional implementation manner, determining the time compensation parameter according to the first sending time, the second receiving time, and the third receiving time includes:

[0146] Calculate a first time difference according to the first sending time and the second receiving time;

[0147] Calculate a second time difference according to the second receiving time and the third receiving time;

[0148] The time compensation parameter is determined according to the first time difference and the second time difference.

[0149] In an optional implementation, sending an adjustment instruction to the front-end module according to the light intensity signal and a compensation parameter corresponding to the light intensity signal includes:

[0150] Obtaining an initial exposure dose corresponding to the light intensity signal;

[0151] Calculating a target exposure dose according to the initial exposure dose and the time compensation parameter;

[0152] An adjustment instruction is sent to the front-end module according to the target exposure dose and the preset exposure dose.

[0153] Among them, the implementation principles and technical effects of the above steps are similar to the above and will not be repeated here.

[0154] The above modules may be one or more integrated circuits configured to implement the above methods, such as one or more application specific integrated circuits (ASICs), or one or more microprocessors, or one or more field programmable gate arrays (FPGAs). For another example, when a module is implemented in the form of a processing element scheduling program code, the processing element may be a general-purpose processor, such as a central processing unit (CPU) or other processor that can call program code. For another example, these modules may be integrated together and implemented in the form of a system-on-a-chip (SOC).

[0155] Fig.11 This is a schematic diagram of the structure of an electronic device provided in an embodiment of the present application, and the electronic device can be integrated into the above-mentioned exposure dose control unit. Fig.11As shown, the electronic device may include: a processor 210, a storage medium 220 and a bus 230, the storage medium 220 stores machine-readable instructions executable by the processor 210, when the electronic device is running, the processor 210 and the storage medium 220 communicate through the bus 230, and the processor 210 executes the machine-readable instructions to perform the steps of the above method embodiment. The specific implementation method and technical effect are similar and will not be repeated here.

[0156] Optionally, the present application further provides a storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the steps of the above method embodiment are executed. The specific implementation method and technical effect are similar and will not be repeated here.

[0157] In the several embodiments provided in the present application, it should be understood that the disclosed devices and methods can be implemented in other ways. For example, the device embodiments described above are only schematic. For example, the division of units is only a logical function division. There may be other division methods in actual implementation, such as multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or units, which can be electrical, mechanical or other forms.

[0158] The units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0159] In addition, each functional unit in each embodiment of the present application may be integrated into one processing unit, or each unit may exist physically separately, or two or more units may be integrated into one unit. The above-mentioned integrated unit may be implemented in the form of hardware or in the form of hardware plus software functional units.

[0160] The above-mentioned integrated unit implemented in the form of a software functional unit can be stored in a computer-readable storage medium. The above-mentioned software functional unit is stored in a storage medium, including a number of instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) or a processor (English: processor) to perform some steps of the methods of each embodiment of the present application. The aforementioned storage medium includes: U disk, mobile hard disk, read-only memory (English: Read-Only Memory, abbreviated: ROM), random access memory (English: Random Access Memory, abbreviated: RAM), disk or optical disk and other media that can store program codes.

[0161] It should be noted that, in this article, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0162] The above are only preferred embodiments of the present application and are not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application shall be included in the scope of protection of the present application. It should be noted that similar numbers and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. The above are only preferred embodiments of the present application and are not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application shall be included in the scope of protection of the present application.

Claims

1. A dynamic compensation method for an exposure system in a lithography machine, characterized in that: Applied to an exposure dose control unit, the exposure dose control unit is communicatively connected to a front-end module, the front-end module is communicatively connected to a light source module, and the front-end module is provided with a light intensity detector, the method comprises: Receive the light intensity signal sensed by the light intensity detector sent by the front-end module; Acquire compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm, wherein the compensation parameters include at least one of the following: a voltage compensation parameter and a time compensation parameter, wherein the voltage compensation parameter is used to characterize a voltage drop of a transmission line between the exposure dose control unit and the front-end module, and the time compensation parameter is used to characterize a transmission delay of a transmission line between the exposure dose control unit and the front-end module; According to the light intensity signal and the compensation parameter corresponding to the light intensity signal, an adjustment instruction is sent to the front-end module, so that the front-end module adjusts the light source intensity and / or exposure time of the light source module according to the adjustment instruction.

2. The method according to claim 1, characterized in that: The step of sending an adjustment instruction to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal comprises: Calculating a target exposure dose corresponding to the light intensity signal according to the light intensity signal and a compensation parameter corresponding to the light intensity signal; An adjustment instruction is sent to the front-end module according to the target exposure dose and the preset exposure dose.

3. The method according to claim 1, characterized in that The compensation parameters include: voltage compensation parameters, and the compensation parameters corresponding to the light intensity signal are obtained according to a preset compensation algorithm, including: Based on the first detection frequency, sending a first detection voltage signal to the front-end module; receiving a second detection voltage signal sent by the front-end module according to the first detection voltage signal; A voltage difference between the first detection voltage signal and the second detection voltage signal is calculated as the voltage compensation parameter.

4. The method according to claim 2, characterized in that: The step of calculating a target exposure dose corresponding to the light intensity signal according to the light intensity signal and a compensation parameter corresponding to the light intensity signal comprises: Obtaining an initial voltage value corresponding to the light intensity signal; Calculating a target voltage value according to the initial voltage value and the voltage compensation parameter; The target exposure dose corresponding to the light intensity signal is calculated according to the target voltage value.

5. The method according to claim 1 or 3, characterized in that: The compensation parameters include: time compensation parameters, and the compensation parameters corresponding to the light intensity signal are obtained according to a preset compensation algorithm, including: Based on the second detection frequency, sending a first detection pulse signal to the front-end module, and recording a first sending time of the first detection pulse signal; receiving a second detection pulse signal sent by the front-end module according to the first detection pulse signal, and recording a second receiving time of the second detection pulse signal; receiving a light intensity signal sensed by the light intensity detector according to the first detection pulse signal and sent by the front-end module, and recording a third receiving time corresponding to the light intensity signal; The time compensation parameter is determined according to the first sending time, the second receiving time, and the third receiving time.

6. The method according to claim 5, characterized in that The determining the time compensation parameter according to the first sending time, the second receiving time, and the third receiving time includes: Calculate a first time difference according to the first sending time and the second receiving time; Calculate a second time difference according to the second receiving time and the third receiving time; The time compensation parameter is determined according to the first time difference and the second time difference.

7. The method according to claim 5, characterized in that The step of sending an adjustment instruction to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal comprises: Obtaining an initial exposure dose corresponding to the light intensity signal; Calculating a target exposure dose according to the initial exposure dose and the time compensation parameter; According to the target exposure dose and the preset exposure dose, an adjustment instruction is sent to the front-end module.

8. A photolithography machine, characterized in that: include: An exposure dose control unit, a front-end module and a light source module, wherein the exposure dose control unit is communicatively connected to the front-end module, the front-end module is communicatively connected to the light source module, and the front-end module is provided with a light intensity detector; The front-end module is used to obtain the light intensity signal sensed by the light intensity detector and send it to the exposure dose control unit; The exposure dose control unit is used to obtain compensation parameters corresponding to the light intensity signal according to a preset compensation algorithm based on the light intensity signal, wherein the compensation parameters include at least one of the following: a voltage compensation parameter and a time compensation parameter, wherein the voltage compensation parameter is used to characterize the voltage drop of the transmission line between the exposure dose control unit and the front-end module, and the time compensation parameter is used to characterize the transmission delay of the transmission line between the exposure dose control unit and the front-end module; and send an adjustment instruction to the front-end module according to the light intensity signal and the compensation parameter corresponding to the light intensity signal; The light source module is used to adjust the light source intensity and / or exposure time according to the adjustment instruction.

9. An electronic device, characterized in that: include: A processor, a storage medium and a bus, wherein the storage medium stores machine-readable instructions executable by the processor. When the electronic device is running, the processor communicates with the storage medium via the bus, and the processor executes the machine-readable instructions to perform the steps of the dynamic compensation method of the exposure system in the lithography machine as described in any one of claims 1-7.

10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps of the dynamic compensation method of the exposure system in the lithography machine as claimed in any one of claims 1 to 7 are executed.

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