Transparent substrate with antireflection film, and image display device

Abstract

The present invention relates to a transparent substrate with an antireflection film, which is provided with: a transparent substrate having two main surfaces; and a diffusion layer and an antireflection film that are provided on one main surface of the transparent substrate in this order from the transparent substrate side. When the reflection of the other main surface of the transparent substrate is removed and the light source is incident on the one main surface side at an incident angle of 45 degrees, a * and b * of diffuse reflection light at angles of-15 degrees, 15 degrees, and 25 degrees with respect to specular reflection light satisfy the following formulae (1) and (2). (1)-5 < = a * < =-1, (2) 0 < = b * < = 9.

Description

Technical Field

[0001] The present invention relates to a transparent substrate with an antireflection film and an image display device having the same. Background Art

[0002] In recent years, from the viewpoint of aesthetics, a method of providing a transparent substrate such as a cover glass in front of an image display device such as a liquid crystal display (LCD) has been adopted. In addition, in order to prevent external light from being reflected into the transparent substrate, a transparent substrate having an anti-reflection film (hereinafter also referred to as a transparent substrate with an anti-reflection film) is known. For example, Patent Document 1 discloses a transparent substrate with an anti-reflection film that has light absorption capability and is insulating.

[0003] In addition, in order to prevent the reflection of external light, it is also known to provide a diffusion layer on a transparent substrate. The diffusion layer suppresses the reflection of external light by diffusing the incident light. However, when the transparent substrate is provided with a diffusion layer, when used in an image display device, the screen when the light is turned off sometimes appears whitish due to the diffused light. Therefore, by further providing an anti-reflection film as described above on the diffusion layer, the reflection of the incident light can be suppressed, thereby suppressing the whitish appearance. As a result, the black texture of the screen when the light is turned off can be improved while appropriately suppressing the reflection.

[0004] However, as an image display device, μ-LED displays using μ-LED elements as light sources have attracted attention in recent years. Among them, large μ-LED displays are manufactured by arranging and connecting (tiling) about 200 small LED panels of A5 size (148mm×210mm) without gaps.

[0005] Prior art literature

[0006] Patent Literature

[0007] Patent Document 1: Japanese Patent Application Publication No. 2018-115105 Summary of the invention

[0008] As disclosed in Patent Document 1, the anti-reflection film utilizes optical interference, so sometimes the optical path length changes according to the incident angle and the emission angle of the light, and the reflected color (hue) changes in various ways. In particular, in the case of a structure with an anti-reflection film on the diffusion layer, light is easily diffusely reflected by the diffusion layer, so the change in hue caused by the angle tends to become more significant. Moreover, in the case of manufacturing a large μ-LED display, when tiling multiple LED panels, if the diffuse reflection color (hue of the diffusely reflected light) of each panel is different, there is a risk that the appearance will become various colors when it is turned off, and the quality will be greatly reduced.

[0009] Therefore, an object of the present invention is to provide a transparent substrate with an antireflection film in which color deviation is not easily noticed when tiling, and an image display device including the same.

[0010] The inventors of the present invention have found through experiments that when light is incident at a predetermined angle on a transparent substrate with an anti-reflection film, the diffuse reflected light at each angle is * and b * The present invention has been completed by satisfying the prescribed requirements and by being able to obtain a transparent substrate with an antireflection film in which color deviation is not easily noticeable when tiling.

[0011] That is, the present invention relates to the following 1 to 14.

[0012] 1. A transparent substrate with an anti-reflection film, comprising: a transparent substrate having two main surfaces, and a diffusion layer and an anti-reflection film provided on one main surface of the transparent substrate in order from the transparent substrate side,

[0013] When the reflection from the other main surface of the transparent substrate is removed and the light source is incident on the one main surface at an incident angle of 45°, the a of the diffuse reflected light at angles of -15°, 15° and 25° relative to the specular reflected light under the D65 light source is * and b * The following equations (1) and (2) are satisfied.

[0014] (1)-5≤a * ≤-1

[0015] (2)0≤b * ≤9

[0016] 2. A transparent substrate with an anti-reflection film, comprising: a transparent substrate having two main surfaces, and a diffusion layer and an anti-reflection film provided on one main surface of the transparent substrate in order from the transparent substrate side,

[0017] When the reflection from the other main surface of the transparent substrate is removed and the light source is incident on the one main surface at an incident angle of 45°, the a-value of the diffusely reflected light under the D65 light source at angles of -15°, 15° and 25° relative to the specular reflected light is obtained. * b * The absolute value of the slope of the approximate straight line calculated by coordinates is 2 or more.

[0018] 3. The transparent substrate with an antireflection film according to 1 or 2 above, wherein the haze value is 30% or more.

[0019] 4. The transparent substrate with an anti-reflection film according to 1 or 2 above, wherein the L of the diffuse reflected light at -15° under a D65 light source is * The L of the diffuse reflected light at 15° is 30 to 60. *is 15 to 35, and the L of the diffuse reflected light at 25° * 5 to 20.

[0020] 5. The transparent substrate with an antireflection film according to 1 or 2 above, wherein the light transmittance (Y) is 20 to 90%.

[0021] 6. The transparent substrate with an anti-reflection film according to 1 or 2 above, wherein the sheet resistance of the anti-reflection film is 10 4 Ω / □ or more.

[0022] 7. The transparent substrate with an anti-reflection film according to 1 or 2 above, wherein the transmission color b under D65 light source is * Is 5 or less.

[0023] 8. A transparent substrate with an anti-reflection film according to 1 or 2 above, wherein the anti-reflection film is a stacked structure formed by stacking at least two dielectric layers having different refractive indices, at least one of the dielectric layers is mainly composed of Si oxide, and at least one other layer of the layers in the stacked structure is mainly composed of a mixed oxide, which is a mixed oxide of at least one oxide selected from Group A consisting of Mo and W and at least one oxide selected from Group B consisting of Si, Nb, Ti, Zr, Ta, Al, Sn and In, and the content of the elements of Group B contained in the mixed oxide is 65% by mass or less relative to the total of the elements of Group A contained in the mixed oxide and the elements of Group B contained in the mixed oxide.

[0024] 9. The transparent substrate with an antireflection film according to 1 or 2 above, further comprising an antifouling film on the antireflection film.

[0025] 10. The transparent substrate with an antireflection film according to 1 or 2 above, wherein the transparent substrate comprises glass.

[0026] 11. The transparent substrate with an antireflection film according to 1 or 2 above, wherein the transparent substrate comprises at least one resin selected from the group consisting of polyethylene terephthalate, polycarbonate, acrylic, silicone, and triacetyl cellulose resin film.

[0027] 12. The transparent substrate with an antireflection film according to 1 or 2 above, wherein the transparent substrate is a laminate of glass and at least one resin selected from the group consisting of polyethylene terephthalate, polycarbonate, acrylic, silicone and triacetyl cellulose resin film.

[0028] 13. The transparent substrate with an antireflection film according to 12 above, wherein the glass is chemically strengthened.

[0029] 14. An image display device comprising the transparent substrate with an antireflection film according to 1 or 2 above.

[0030] According to one embodiment of the present invention, a transparent substrate with an anti-reflection film and an image display device having the same can be provided, wherein the color deviation is not easily noticeable when the substrate is tiled. By making the color deviation not easily noticeable when the substrate is tiled, the quality and appearance of the transparent substrate with an anti-reflection film and the image display device having the same can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 It is a cross-sectional view schematically showing a configuration example of a transparent substrate with an antireflection film according to an embodiment of the present invention.

[0032] Figure 2 is an example of diffuse reflection light at each angle. * and b * Schematic diagram of the assay method.

[0033] Figure 3 This is a diagram showing an example of the result of predicting the angle dependency of specular reflection color using thin film simulation software.

[0034] Figure 4 (a) to (e) show the diffuse reflection light at each angle in each example. * and b * A graph of the measurement results. DETAILED DESCRIPTION

[0035] The present invention is described in detail below, but the present invention is not limited to the following embodiments, and can be arbitrarily deformed and implemented within the scope of not departing from the gist of the present invention. In addition, the " to " representing a numerical range is used to include the numerical values ​​recorded before and after it as the meaning of the lower limit and upper limit.

[0036] It should be noted that in this specification, the presence of another layer, film, etc. on the main surface of a substrate such as a transparent substrate, on a layer such as a diffusion layer, on a film such as an anti-reflection film is not limited to the form in which the other layer, film, etc. is provided in contact with the above-mentioned main surface, layer or film, as long as the layer, film, etc. is provided in the upper direction thereof. For example, the presence of a diffusion layer on the main surface of a transparent substrate may be provided in a manner that the diffusion layer is provided in contact with the main surface of the transparent substrate, or other arbitrary layers, films, etc. may be provided between the transparent substrate and the diffusion layer.

[0037] The transparent substrate with an anti-reflection film according to the first embodiment of the present invention comprises: a transparent substrate having two main surfaces, and a diffusion layer and an anti-reflection film provided on one main surface of the transparent substrate in order from the transparent substrate side, wherein when the reflection of the other main surface of the transparent substrate is removed and the light source is incident on the one main surface side at an incident angle of 45°, the a of the diffuse reflected light under the D65 light source at each angle of -15°, 15° and 25° relative to the specular reflected light is * and b * The following equations (1) and (2) are satisfied.

[0038] (1)-5≤a * ≤-1

[0039] (2)0≤b * ≤9

[0040] The transparent substrate with an anti-reflection film according to the second embodiment of the present invention comprises: a transparent substrate having two main surfaces, and a diffusion layer and an anti-reflection film provided on one main surface of the transparent substrate in order from the transparent substrate side, wherein when the reflection of the other main surface of the transparent substrate is removed and the light source is incident on the one main surface at an incident angle of 45°, the diffuse reflection light under a D65 light source at angles of -15°, 15° and 25° relative to the specular reflection light is incident on the one main surface. * b * The absolute value of the slope of the approximate straight line calculated by coordinates is 2 or more.

[0041] In this specification, the transparent substrate with an anti-reflection film involved in the first embodiment and the transparent substrate with an anti-reflection film involved in the second embodiment are sometimes collectively referred to as "the transparent substrate with an anti-reflection film involved in the embodiment of the present invention" or "the transparent substrate with an anti-reflection film of this embodiment".

[0042] (Transparent substrate with anti-reflection film)

[0043] Figure 1 It is a cross-sectional view schematically showing a configuration example of a transparent substrate with an antireflection film according to an embodiment of the present invention. Figure 1 The illustrated transparent substrate 1 with an antireflection film includes a transparent substrate 10 , a diffusion layer 31 , and an antireflection film 30 . Figure 1 In the embodiment, a diffusion layer 31 is formed on one main surface of a transparent substrate 10, and an antireflection film 30 is formed on the diffusion layer 31. The antireflection film is, for example, a multilayer film having a laminated structure in which at least two dielectric layers having different refractive indices are laminated. Figure 1 In the embodiment, the antireflection film 30 is a multilayer film formed by stacking a first dielectric layer 32 and a second dielectric layer 34. Figure 1In the example, a diffusion layer 31 is further formed on the transparent substrate 10 , but as described later, a diffusion layer may be formed on the surface layer of the transparent substrate itself by a method of surface treating the transparent substrate.

[0044] The transparent substrate with anti-reflection film according to the embodiment of the present invention has a diffusion layer and an anti-reflection film on one main surface of the transparent substrate in order from the transparent substrate side. Thus, a transparent substrate with anti-reflection film having excellent black texture and capable of suppressing reflection of external light and suppressing whitening caused by diffusely reflected light can be obtained.

[0045] In the transparent substrate with an anti-reflection film according to the embodiment of the present invention, when the reflection of the other main surface of the transparent substrate is removed and the light source is incident on one main surface side at an incident angle of 45°, the a of the diffuse reflected light under the D65 light source at each angle of -15°, 15° and 25° relative to the specular reflected light * and b * Satisfy the prescribed requirements.

[0046] In this specification, the "diffuse reflected light at each angle of -15°, 15° and 25°" obtained by the above method is sometimes referred to as "diffuse reflected light at each angle". In addition, when "diffuse reflected light at 15°" is mentioned, it means the diffuse reflected light at 15° among the "diffuse reflected light at each angle", and the same applies even when the angle is different. In addition, unless otherwise specified, the diffuse reflected light a * , b * and L * They refer to the diffuse reflected light under D65 light source. * , b * and L * .

[0047] Figure 2 is an example of diffuse reflection light at each angle. * and b * Schematic diagram of the determination method. Figure 2 In the transparent substrate 1 with an anti-reflection film shown in FIG. 1 , the transparent substrate 10 includes one main surface 11 and another main surface 12. A diffusion layer 31 and an anti-reflection film 30 are formed on the one main surface 11. Figure 2In the illustrated measurement method, the transparent substrate 1 with an anti-reflection film is provided with a black tape 20 attached to the other main surface 12 to remove the reflection of the other main surface. Light is incident from a light source 50 at an incident angle of 45° to one main surface 11 side of the transparent substrate 1 with an anti-reflection film. As the incident light source, a light source that emits light in the entire visible light region is used. As the light source, for example, a white light source such as a high color rendering index white LED is suitable. Taking the mirror reflection light 61 of the incident light 60 as a reference (0°), the diffuse reflection lights 71, 72, and 73 are diffuse reflection lights of -15°, 15°, and 25°, respectively. It should be noted that, here, the mirror reflection light 61 is set to 0°, the direction in which the angle increases on the side where the incident light 60 is located is set to the + direction, and the direction in which the angle increases on the side opposite to the incident light 60 is set to the - direction. For the diffuse reflection light at each of these angles, the reflectivity of the visible light wavelength is measured, and the L under the D65 light source is calculated. * 、a * and b * This measurement can be performed using, for example, CM-M6 manufactured by Konica Minolta Inc.

[0048] As a method of removing the reflection of the other main surface, such as Figure 2 As an example, a method of laminating a black tape on the other main surface can be cited. The black tape is preferably a black tape that does not substantially contain diffuse reflection components. The presence or absence of diffuse reflection components in the black tape can be evaluated, for example, in the following manner: for transparent glass such as float glass and having almost zero diffuse reflection components, a black tape for which the presence or absence of diffuse reflection components is to be evaluated is laminating, and SCE Y as the diffuse reflection component is measured from the glass surface. Here, substantially containing no diffuse reflection components means that the above-mentioned SCE Y is less than 0.02%. The above-mentioned SCE Y can be measured using a spectrophotometer by the method specified in JIS Z 8722 (2009). It should be noted that the calculation of SCE Y requires a specified light source. Since the present invention assumes that the reflection of bright places during the day is suppressed, it is preferred to use a D65 light source for the calculation.

[0049] As a black tape for removing reflection from the other main surface, for example, there is "Kukkiri Mieru" manufactured by Tomogawa Paper Co., Ltd. Since "Kukkiri Mieru" does not substantially contain diffuse reflection components (the diffuse reflectance is almost equivalent to 0.01% in terms of SCE Y under D65 light source), the diffuse reflectance of the black tape itself is low, and has little influence on the diffuse reflectance measurement of the surface of the transparent substrate with the anti-reflection film.

[0050] The inventors conducted in-depth research and found through experiments that the diffuse reflection of light at various angles is * and b *The present invention is completed by satisfying the prescribed requirements and obtaining a transparent substrate with an anti-reflection film in which color deviation is not easily noticeable when tiling. That is, the a of the reflected light at each angle is * and b * Different from each other means that the color tone changes depending on the angle at which the transparent substrate with the anti-reflection film is observed. In this way, the color tone changes depending on the observation angle, which usually becomes the reason why color deviation is easily noticed when tiling. This is because when a display composed of a plurality of panels is observed from a point, for example, the angle between the line of sight and each panel constituting the display is various. The larger the area of ​​the display, the more obvious this tendency will be.

[0051] In contrast, the present invention finds that when the diffuse reflected light at each angle is * and b * When the specified requirements are met, the change in color tone when the angle is changed is not easily noticeable. The reason is presumed to be as follows. That is, when the a of the diffusely reflected light at each angle is * and b * When the above formulas (1) and (2) are satisfied, the hue changes roughly between colorless or light yellow to light green depending on the viewing angle. If it is within these hue ranges, even if a * and b * The difference is not easy to feel due to the angle, so it is estimated that the color deviation is not easy to detect. * and b * The variable region is limited to a limited range, and the magnitude of the change in color tone caused by the angle becomes smaller, so it is considered that the color deviation becomes less noticeable. Furthermore, by satisfying the above formulas (1) and (2), the color difference of the transparent substrates with anti-reflection films on both sides adjacent to each other when tiling is limited, and the effect of making the joints of multiple substrates less noticeable can also be expected.

[0052] In addition, the diffuse reflection light at each angle * b * When the absolute value of the slope of the approximate straight line calculated by the coordinates is greater than 2, even if the hue changes with the angle, a * The changes are also small, mainly b * With this change, the hue can be easily limited to change between colorless and a specified color with the change of angle, for example, and various changes in hue with angle can be suppressed, making it less likely to cause the reflected color to change to green or red, which is uncomfortable for people. * and b * The difference is not easy to feel as the angle changes, and the color deviation is not easy to detect.

[0053] In the first embodiment, the diffuse reflection light at each angle is * -5≤a* ≤-1. From the perspective of improving the black feeling when the display is turned off, a * It is -5 or more, preferably -4 or more, and more preferably -3 or more.

[0054] In the first embodiment, the diffuse reflection light at each angle b * 0≤b * ≤9. From the perspective of improving the black feeling when the display is turned off, b * It is 9 or less, preferably 8 or less, and more preferably 7 or less.

[0055] In the second embodiment, the diffuse reflected light at each angle is * b * The absolute value of the slope of the approximate straight line calculated by the coordinates is 2 or more. From the viewpoint of suppressing the color change from green to red, the absolute value of the slope is preferably 2.5 or more, more preferably 3 or more. There is no particular upper limit on the absolute value of the slope, and the approximate straight line can be a * Become a constant straight line.

[0056] It should be noted that, specifically, the approximate straight line is a * b * The coordinates are calculated by linear approximation. * As the x-axis, b * The xy coordinate plane (a * b * In the coordinate plane, plot the a of diffuse reflected light at -15°, 15°, and 25° respectively. * b * , and the least square method is used to transform y(b * ) is linearly approximated to x(a * ) to find the approximate straight line. For example, the "approximate curve" function of Microsoft Excel (registered trademark), a spreadsheet software of Microsoft Corporation, can be used to perform linear approximation to find the approximate straight line.

[0057] In the second embodiment, the diffuse reflection light at each angle a * Preferably -7≤a * ≤7. From the perspective of improving the black feeling when the display is turned off, a * On the other hand, from the perspective of improving the black feeling when the display is turned off and from the perspective of aesthetics, people tend to like tones with less red feeling. * It is preferably 7 or less, more preferably 6.5 or less, further preferably 6 or less, and further preferably 5.5 or less.

[0058] In the second embodiment, the diffuse reflection light at each angle b * Preferably -10≤b * ≤12. From the perspective of suppressing the blue color when the display is turned off, b * It is preferably -10 or more, more preferably -8 or more, further preferably -7 or more, and further preferably -6 or more. On the other hand, from the viewpoint of suppressing the yellow tint when the display is turned off, b * It is preferably 12 or less, more preferably 10 or less, further preferably 8 or less, and further preferably 7 or less.

[0059] The transparent substrate with an antireflection film according to the embodiment of the present invention may have both the aspect of the transparent substrate with an antireflection film according to the first embodiment and the aspect of the transparent substrate with an antireflection film according to the second embodiment.

[0060] It can be said that the diffuse reflection light at each angle of -15°, 15° and 25° is the diffuse reflection light at an angle closer to the specular reflection light of the incident light. These diffuse reflection lights have a brightness (L) greater than the diffuse reflection light farther from the specular reflection light of the incident light, such as the diffuse reflection light at 45° relative to the specular reflection light of the incident light. * ) is large. Moreover, the color of diffuse reflection light with high brightness is more likely to be strongly felt than the color of diffuse reflection light without such brightness. That is, in the embodiment of the present invention, since the hue of the light at the angle that is more likely to be strongly felt in the diffuse reflection light is appropriately controlled, the color deviation is less likely to be noticed.

[0061] -15° diffuse light under D65 light source L * It is preferably 30 to 60, and more preferably 40 to 55. By making L of the diffuse reflected light at -15° * When the content is within this range, the transparent substrate with an antireflection film can have appropriate light diffusivity (antiglare property) or low reflectivity, and reflection of external light can be appropriately suppressed.

[0062] L under D65 light source with 15° diffuse reflection * It is preferably 15 to 35, and more preferably 20 to 30. By making L of the diffuse reflected light at 15° * When the content is within this range, the transparent substrate with an antireflection film can have appropriate light diffusivity (antiglare property) or low reflectivity, and reflection of external light can be appropriately suppressed.

[0063] L under D65 light source with diffuse reflection at 25° * It is preferably 5 to 20, and more preferably 7 to 15. By making L *When the content is within this range, the transparent substrate with an antireflection film can have appropriate light diffusivity (antiglare property) or low reflectivity, and reflection of external light can be appropriately suppressed.

[0064] In addition, the L under the D65 light source with diffuse reflected light at -15° is preferred. * 30~60, L of diffuse reflected light of 15° * The L of diffuse reflected light at 25° is 15 to 35. * is 5 to 20. This allows the transparent substrate with an anti-reflection film to have more appropriate light diffusivity (anti-glare) or low reflectivity, and can appropriately suppress the reflection of external light. * By with a * and b * The same method is used to perform measurement and calculation using, for example, CM-M6 manufactured by Konica Minolta Inc.

[0065] In the transparent substrate with an antireflection film according to the embodiment of the present invention, from the viewpoint of appropriately preventing reflection, the haze value is preferably 30% or more, more preferably 40% or more, and further preferably 50% or more. From the viewpoint of improving the clarity of an image when used in an image display device, the haze value is preferably, for example, 90% or less.

[0066] A transparent substrate with an anti-reflection film having a relatively high haze value as described above is suitable for use in, for example, large μ-LED displays. The reasons are: first, when the display is large, it is easier for lighting and external light to be reflected, so it is required to prevent reflection more appropriately. And second, in a large μ-LED display, the pixel pitch is relatively large, so even if the haze value is relatively high, it is easy to become a high-definition display. However, in such a transparent substrate with an anti-reflection film having a relatively high haze value, the diffuse reflection component becomes more, so the change in color tone caused by the angle of the diffusely reflected light is likely to become particularly significant. In contrast, according to the present invention, even in the case of a high haze value, the color deviation during tiling can be appropriately suppressed.

[0067] It should be noted that in applications such as LCD displays, for example, a transparent substrate with an antireflection film having a haze value of about 0 to 30% is preferably used. The haze value may be, for example, 30% or less or less depending on the application as long as it is within the range that can achieve the effects of the present invention.

[0068] The haze value can be adjusted by, for example, the surface shape of the diffusion layer. The haze value is measured in accordance with JIS K7136:2000 using a haze meter (HZ-V3 manufactured by Suga Test Instruments Co., Ltd.) or the like.

[0069] (Light transmittance: Y)

[0070] The light transmittance (Y) of the transparent substrate with an anti-reflection film of this embodiment is preferably 20 to 90%. If the light transmittance (Y) is within the above range, it has an appropriate light absorption capacity, so when used as a cover glass of an image display device, it is possible to suppress the reflection of light. As a result, the contrast of the bright area of ​​the image display device is improved. The above light transmittance (Y) is more preferably 50 to 90%, and further preferably 60 to 90%. However, as described later, for example, when it is desired to maintain the high brightness of the display, it is sometimes preferred to use an anti-reflection film with a light transmittance of more than 90% as a transparent substrate with an anti-reflection film that does not have a light absorption capacity or has a high transmittance. The light transmittance (Y) at this time can be 90 to 96%, preferably 93 to 96%.

[0071] In addition, the light transmittance (Y) can be measured by the method prescribed|regulated in JIS Z8701 (1999) as described in the Example mentioned later.

[0072] In the transparent substrate with an anti-reflection film of this embodiment, in order to make the light transmittance (Y) 20 to 90%, for example, it is preferred to mainly use a mixed oxide of at least one oxide selected from the A group consisting of Mo and W and at least one oxide selected from the B group consisting of Si, Nb, Ti, Zr, Ta, Al, Sn and In as the first dielectric layer of the anti-reflection film and adjust the oxidation amount of the film. However, when it is desired to maintain the high brightness of the display, it is sometimes preferred to use an anti-reflection film with a light transmittance of 90% or more as a transparent substrate with an anti-reflection film that has no light absorption ability or has high transmission. In this case, for example, at least one oxide selected from Nb, Ti, Zr, Ta, Al, Sn, Mo, W and In can be used as the first dielectric layer.

[0073] The light transmittance (Y) in the transparent substrate with an anti-reflection film of this embodiment can be adjusted by controlling the irradiation time, irradiation output power, distance from the substrate, and amount of oxidizing gas of the oxidation source when forming the first dielectric layer as a high refractive index layer in the above-mentioned anti-reflection film.

[0074] (Sheet resistance)

[0075] In the transparent substrate with an antireflection film of this embodiment, the sheet resistance of the antireflection film is preferably 10 4 Ω / □ or more. Since the anti-reflection film has an insulating property when the sheet resistance is within the above range, when used as a cover glass of an image display device, even if a touch panel is provided, the change in electrostatic capacitance caused by finger contact required for an electrostatic capacitive touch sensor can be maintained, and the touch panel can function. The above sheet resistance is more preferably 10 6 Ω / □ or more, more preferably 10 8Ω / □ or more, more preferably 10 10 Ω / □ or more.

[0076] In addition, the sheet resistance can be measured by the method specified in JIS K 6911 (2006) as described in Examples below.

[0077] In the transparent substrate with an anti-reflection film of this embodiment, in order to make the sheet resistance of the anti-reflection film 10 4 Ω / □ or more, for example, the metal content in the anti-reflection film, the irradiation time of the oxidation source, the irradiation output power, and the amount of the oxidizing gas are adjusted.

[0078] (b in the transmitted color under D65 light source * value)

[0079] In the transparent substrate with an anti-reflection film of this embodiment, b in the transmission color under D65 light source is * The value is preferably less than 5. * When the value is within the above range, the transmitted light does not have a yellow tint, so it is suitable for use as a cover glass for image display devices. * The value is more preferably 3 or less, and further preferably 2 or less. * The lower limit of the value is preferably -6 or more, more preferably -4 or more. * The value within the above range is preferred because the transmitted light becomes colorless and the transmitted light is not blocked.

[0080] It should be noted that the b in the transmission color under D65 light source * The value can be measured by the method specified in JIS Z 8729 (2004).

[0081] (Transparent substrate)

[0082] The refractive index of the transparent substrate with two main surfaces in this embodiment (hereinafter also referred to as the transparent substrate) is preferably 1.4 to 1.7. If the refractive index of the transparent substrate is in the above range, the reflection of the bonding surface can be fully suppressed when the display, touch panel, etc. are optically bonded. The refractive index is more preferably 1.45 or more, more preferably 1.47 or more, and more preferably 1.65 or less, and more preferably 1.6 or less.

[0083] The transparent substrate preferably comprises at least one of glass and resin. More preferably, the transparent substrate comprises both glass and resin. By comprising glass, the transparent substrate can make the strength, flatness and durability of the transparent substrate with anti-reflection film excellent. In addition, by laminating the laminate formed by the resin substrate-anti-glare layer described later on the glass substrate, it is easy to form a diffusion layer. In the transparent substrate with anti-reflection film formed with a diffusion layer by this method, the transparent substrate comprises both glass and resin.

[0084] When the transparent substrate includes glass, the type of glass is not particularly limited, and glasses having various compositions can be used. Among them, the glass preferably contains sodium, and preferably has a composition that can be molded and strengthened by chemical strengthening treatment. As the glass, specifically, for example, aluminosilicate glass, soda-lime glass, borosilicate glass, lead glass, alkali-barium glass, aluminoborosilicate glass, etc. can be cited.

[0085] In addition, in this specification, when a transparent substrate is made of glass, the transparent substrate is also referred to as a glass substrate.

[0086] The thickness of the glass substrate is not particularly limited, but is preferably 5 mm or less, more preferably 3 mm or less, and further preferably 1.5 mm or less in order to effectively perform chemical strengthening when the glass is subjected to chemical strengthening treatment. In addition, the thickness is, for example, 0.2 mm or more.

[0087] The glass substrate is preferably a chemically strengthened glass that has been chemically strengthened. Thus, the strength of the transparent substrate with an anti-reflection film is improved. It should be noted that when the glass substrate is subjected to the anti-glare treatment described later, the chemical strengthening is preferably performed after the anti-glare treatment and before the anti-reflection film (multilayer film) is formed.

[0088] When the transparent substrate includes resin, the type of resin is not particularly limited, and resins with various compositions can be used. Wherein, the above-mentioned resin is preferably a thermoplastic resin or a thermosetting resin, for example, polyvinyl chloride resin, polyethylene resin, polypropylene resin, polystyrene resin, polyvinyl acetate resin, polyester resin, polyurethane resin, cellulose resin, acrylic resin, AS (acrylonitrile-styrene) resin, ABS (acrylonitrile-butadiene-styrene) resin, fluorine resin, thermoplastic elastomer, polyamide resin, polyimide resin, polyacetal resin, polycarbonate resin, modified polyphenylene ether resin, polyethylene terephthalate resin, polybutylene terephthalate resin, polylactic acid resin, cyclic polyolefin resin, polyphenylene sulfide resin, etc. Among these, preferred cellulose resin, triacetyl cellulose resin, polycarbonate resin, polyethylene terephthalate resin, etc. can be mentioned. These resins can be used alone or in combination of two or more.

[0089] In view of excellent visible light transparency and easy availability, the resin particularly preferably includes at least one resin selected from the group consisting of polyethylene terephthalate, polycarbonate, acrylic, silicone, and triacetyl cellulose.

[0090] In addition, in this specification, when a transparent substrate contains a resin, the transparent substrate is also referred to as a resin substrate.

[0091] The shape of the resin substrate is preferably a film. When the resin substrate is in a film shape, that is, a resin film, its thickness is not particularly limited, but is preferably 20 to 300 μm, and more preferably 30 to 130 μm.

[0092] In the case where the transparent substrate includes both glass and resin, for example, a composite substrate formed by laminating a glass substrate and a resin substrate can be cited. More specifically, the transparent substrate can be, for example, a form in which the resin substrate is provided on the glass substrate. Further specifically, the transparent substrate can be, for example, a form in which at least one resin selected from polyethylene terephthalate, polycarbonate, acrylic acid, silicone, and triacetyl cellulose resin film is provided on the glass substrate.

[0093] (Diffusion layer)

[0094] The diffusion layer in this embodiment is provided on one main surface of the transparent substrate. The diffusion layer is a layer having the function of diffusing specularly reflected light to reduce glare and reflection, and an anti-glare layer is provided in which the function of diffusing specularly reflected light (anti-glare property) is imparted to the hard coat layer.

[0095] The anti-glare layer has a concavo-convex shape on one side, and increases the haze value by external scattering or internal scattering, thereby imparting anti-glare properties. The anti-glare layer is formed by an anti-glare layer composition, which is formed by dispersing a granular substance that at least has anti-glare properties in a solution in which a polymer resin as a binder is dissolved. The anti-glare layer can be formed by coating the anti-glare layer composition on one main surface of a transparent substrate, for example.

[0096] Examples of the above-mentioned granular substances having anti-glare properties include inorganic particles such as silica, clay, talc, calcium carbonate, calcium sulfate, barium sulfate, aluminum silicate, titanium oxide, synthetic zeolite, alumina, and montmorillonite, and organic particles containing styrene resins, polyurethane resins, benzoguanamine resins, silicone resins, acrylic resins, and melamine resins.

[0097] In addition, as the polymer resin of the adhesive of the above-mentioned hard coat layer or the above-mentioned anti-glare layer, for example, a polymer resin containing polyester resin, acrylic resin, acrylic urethane resin, polyester acrylate resin, polyurethane acrylate resin, epoxy acrylate resin, urethane resin, etc. can be used.

[0098] In this mode, the diffusion layer can be directly formed on the transparent substrate, or a laminate composed of a resin substrate-anti-glare layer can be prepared in advance and attached to a glass substrate, thereby obtaining a structure with a diffusion layer on a composite substrate of a glass substrate and a resin substrate. The laminate is preferably formed with a diffusion layer on a film-like resin substrate. According to this method, it is easy to form a diffusion layer more simply.

[0099] As a laminate composed of a resin matrix-antiglare layer, specifically, for example, an antiglare PET film and an antiglare TAC film can be cited. As the antiglare PET film, the products manufactured by HIGASHIYAMA FILM Co., Ltd., the products manufactured by Reiko Co., Ltd., etc. can be cited. In addition, as the antiglare TAC film, an antiglare TAC film (manufactured by TOPPANTOMOEGAWAOPTICALFILM, the product name VZ50) can be used.

[0100] Alternatively, the diffusion layer may be formed on the surface of the transparent substrate itself by subjecting the transparent substrate to surface treatment. For example, when a glass substrate is used, a method of subjecting the main surface of the glass to surface treatment to form desired projections and depressions may be used.

[0101] Specifically, the method of chemically treating the main surface of the glass substrate includes, for example, a method of performing a frosting treatment. The frosting treatment may be performed by immersing the glass substrate as a treatment object in a mixed solution of hydrogen fluoride and ammonium fluoride to perform a chemical surface treatment on the immersed surface.

[0102] In addition, in addition to chemical treatment methods such as frosting, physical treatment methods such as so-called sandblasting, in which crystalline silica powder, silicon carbide powder, etc. are blown onto the surface of the glass substrate with pressurized air, or a brush to which crystalline silica powder, silicon carbide powder, etc. is attached is moistened with water and rubbed.

[0103] The transparent substrate with anti-reflection film having such a diffusion layer has a concavo-convex shape on the surface due to the concavo-convex shape of the diffusion layer. The Sa (arithmetic mean surface roughness) of the transparent substrate with anti-reflection film is preferably 0.05 to 0.6 μm, more preferably 0.05 to 0.55 μm. By Sa being in this range, it is easy to suppress the reflection of the reflected image, so it is preferred. Sa is specified in ISO25178, and can be measured using a laser microscope VK-X3000 made by KEYENCE, for example.

[0104] For the transparent substrate with an antireflection film, the developed area ratio Sdr (hereinafter also referred to as "Sdr") calculated from the surface area obtained by measurement using a laser microscope VK-X3000 manufactured by KEYENCE is preferably 0.001 to 0.4, and more preferably 0.0025 to 0.2. When Sdr is within this range, it is easy to suppress the reflection of the reflected image, so it is preferred.

[0105] Sdr is defined in ISO 25178 and is expressed by the following formula.

[0106] Development area ratio Sdr = {(AB) / B}

[0107] A: Surface area (developed area) reflecting actual concavity and convexity in the measurement area

[0108] B: The area of ​​the flat surface without unevenness in the measurement area

[0109] The Sdq (root mean square slope) of the transparent substrate with an antireflection film is preferably 0.03 to 0.50, and more preferably 0.07 to 0.49. When Sdq is within this range, it is easy to suppress the reflection of the reflected image, so it is preferred. Sdq is specified in ISO25178 and can be measured, for example, using a laser microscope VK-X3000 manufactured by KEYENCE.

[0110] The Spc (average of the principal curvature of the peak apex of the surface) of the transparent substrate with an antireflection film is preferably 150 to 6000 (1 / mm). When Spc is within this range, it is easy to suppress the reflection of the reflected image, so it is preferred. Spc is specified in ISO25178 and can be measured using a laser microscope VK-X3000 manufactured by KEYENCE, for example.

[0111] In addition, the above-mentioned Sa, Sdr, Sdq and Spc are values ​​measured on the main surface of the transparent substrate with an antireflection film on the side provided with the diffusion layer and the antireflection film.

[0112] (Barrier layer)

[0113] In the case where the transparent substrate includes a resin substrate, such as when a diffusion layer is formed by laminating a laminate composed of a resin substrate and an anti-glare layer to a glass substrate, it is preferred to have a barrier layer between the diffusion layer and the anti-reflection film. By providing the barrier layer between the resin transparent substrate and the anti-reflection film, it is preferred because it can suppress the influence of moisture and oxygen that want to penetrate from the resin substrate into the anti-reflection film, and the optical properties become less likely to change. Examples of the barrier layer include metal nitride films, metal oxide films, and more specifically SiN films. x Film, SiO x From the viewpoint of more effectively suppressing changes in optical properties, SiN x Film. From the viewpoint of inhibiting the intrusion of water etc. into the anti-reflection film, the thickness of the barrier layer is preferably 2 nm or more, more preferably 4 nm or more, and particularly preferably 8 nm or more. On the other hand, from the viewpoint of inhibiting the increase in the reflectivity of the transparent substrate with the anti-reflection film, the thickness is preferably 50 nm or less. The barrier layer can be formed by a known film-forming method such as sputtering, vacuum evaporation, coating, etc.

[0114] (Anti-reflective film)

[0115] The antireflection film in this embodiment has a function of suppressing reflection of light, and has, for example, a laminated structure in which at least two dielectric layers having mutually different refractive indices are laminated.

[0116] Figure 1 The anti-reflection film (multilayer film) 30 shown is a laminated structure formed by laminating two layers of a first dielectric layer 32 and a second dielectric layer 34 having different refractive indices. By laminating the first dielectric layer 32 and the second dielectric layer 34 having different refractive indices, reflection of light is suppressed. For example, Figure 1 The first dielectric layer 32 is a high refractive index layer, and the second dielectric layer 34 is a low refractive index layer.

[0117] The antireflection film has a stacked structure in which at least two dielectric layers having different refractive indices are stacked, at least one of the dielectric layers is mainly composed of an oxide of Si, and another at least one layer of the layers of the stacked structure is mainly composed of a mixed oxide, the mixed oxide being a mixed oxide of at least one oxide selected from the group A consisting of Mo and W and at least one oxide selected from the group B consisting of Si, Nb, Ti, Zr, Ta, Al, Sn and In, and the content of the elements of the group B contained in the mixed oxide is preferably 65% ​​by mass or less relative to the total of the elements of the group A contained in the mixed oxide and the elements of the group B contained in the mixed oxide.

[0118] However, when it is desired to maintain high brightness of the display, it is preferred to use an anti-reflection film having a light transmittance of 90% or more as a transparent substrate with an anti-reflection film that has no light absorption ability or has high transmittance. In this case, at least one oxide selected from Nb, Ti, Zr, Ta, Al, Sn, Mo, W and In can be used as a layer not composed of Si oxide. In addition, the layer mainly composed of Si oxide can contain at least one oxide selected from Nb, Ti, Zr, Ta, Al, Sn, W, Mo and In within a range that does not affect the reflectivity. By appropriately selecting the material as the oxide, an anti-reflection film with high hardness and little change in optical properties can be obtained.

[0119] exist Figure 1In the anti-reflection film (multilayer film) 30 shown, when an anti-reflection film having a light transmittance of 90% or less as a transparent substrate with an anti-reflection film is obtained, the first dielectric layer 32 (high refractive index layer) is preferably mainly composed of a mixed oxide, which is a mixed oxide of at least one oxide selected from the group A consisting of Mo and W and at least one oxide selected from the group B consisting of Si, Nb, Ti, Zr, Ta, Al, Sn and In. In addition, in the mixed oxide, the content of the elements of the group B contained in the mixed oxide (hereinafter referred to as the group B content) is preferably 65% ​​by mass or less relative to the total of the elements of the group A contained in the mixed oxide and the elements of the group B contained in the mixed oxide. Here, "mainly" means that the first dielectric layer 32 contains the largest amount of components (based on mass), for example, 70% or more of the components.

[0120] If the content of group B in the first dielectric layer (ABO) 32 composed of a mixed oxide of at least one oxide selected from group A consisting of Mo and W and at least one oxide selected from group B consisting of Si, Nb, Ti, Zr, Ta, Al, Sn and In is less than 65 mass %, the yellowing of the transmitted light can be suppressed.

[0121] As at least one oxide selected from Group A, Mo or Mo and W are preferred, and as at least one oxide selected from Group B, Nb is preferred. That is, the first dielectric layer is preferably a mixed oxide of Mo and Nb or a mixed oxide of Mo, W and Nb, and more preferably a mixed oxide of Mo, W and Nb.

[0122] As described later, the second dielectric layer can be, for example, an oxygen-deficient silicon oxide layer. Here, in the past, the oxygen-deficient silicon oxide layer was yellowish in visible light, but if the first dielectric layer is a mixed oxide of Mo and Nb or a mixed oxide of Mo, W and Nb, the yellowing of the silicon oxide layer can be suppressed, so it is preferred. In addition, in order to improve reliability, the silicon oxide layer can contain at least one oxide selected from Nb, Ti, Zr, Ta, Al, Sn, W, Mo and In, and each oxide can also produce oxygen deficiency. In addition, when the second dielectric layer is formed on a diffusion layer having a higher haze, i.e., a larger surface unevenness as described above, high oxidation stability is required during film formation. If the first dielectric layer is a mixed oxide of Mo, W and Nb, the oxidation stability during film formation is easy to be excellent, which is more preferred.

[0123] From the viewpoint of transmittance with the transparent substrate, the refractive index of the first dielectric layer 32 at a wavelength of 550 nm is preferably 1.8 to 2.5.

[0124] The extinction coefficient of the first dielectric layer 32 is preferably 0.005 to 3, and more preferably 0.04 to 0.38. If the extinction coefficient is 0.005 or more, the desired absorptivity can be achieved with an appropriate number of layers. In addition, if the extinction coefficient is 3 or less, it is easier to achieve a balance between reflective tone and transmittance.

[0125] The second dielectric layer 34 (low refractive index layer) is preferably mainly composed of Si oxide (SiO x Here, "mainly" refers to the component with the largest content (based on mass) in the second dielectric layer 34, for example, it contains 70% by mass or more of this component. The second dielectric layer 34 (low refractive index layer) is mainly composed of Si oxide (SiO x ) structure, the refractive index becomes low, and the reflectivity reduction effect becomes high, so it is preferred. It should be noted that SiO x It can also be fully oxidized silicon oxide (SiO2), but from the perspective of improving optical reliability and scratch resistance, oxygen-deficient silicon oxide is preferred. In addition, in order to improve reliability, the silicon oxide layer can also contain at least one oxide selected from Nb, Ti, Zr, Ta, Al, Sn, W, Mo and In, and each oxide can also produce oxygen deficiency.

[0126] Figure 1 The anti-reflection film (multilayer film) 30 shown is a stacked structure of two layers in total formed by stacking the first dielectric layer 32 and the second dielectric layer 34, but the anti-reflection film (multilayer film) in this mode is not limited to this, and can also be a stacked structure formed by stacking more than three layers of dielectric layers with different refractive indices. In this case, it is not necessary for all dielectric layers to have different refractive indices. For example, in the case of a three-layer stacked structure, it can be a three-layer stacked structure of a low refractive index layer, a high refractive index layer, and a low refractive index layer, or a three-layer stacked structure of a high refractive index layer, a low refractive index layer, and a high refractive index layer. In the former case, there are two layers of low refractive index layers that can have the same refractive index, and in the latter case, there are two layers of high refractive index layers that can have the same refractive index. In the case of a four-layer stacked structure, it can be a four-layer stacked structure of a low refractive index layer, a high refractive index layer, a low refractive index layer, and a high refractive index layer, or a four-layer stacked structure of a high refractive index layer, a low refractive index layer, a high refractive index layer, and a low refractive index layer. In this case, at least one of the two low refractive index layers and the two high refractive index layers may have the same refractive index. The same is true for the case where the number of layers increases, such as a five-layer stacking structure, a six-layer stacking structure, a seven-layer stacking structure, and an eight-layer stacking structure.

[0127] In the case of a stacked structure in which three or more layers having different refractive indices are stacked, the first dielectric layer (ABO) 32 and the second dielectric layer (SiO x) 34. In this case, the first dielectric layer (ABO) 32 and the second dielectric layer (SiO x ) 34, or a three-layer laminated structure of a low refractive index layer, a high refractive index layer, and a low refractive index layer, or a three-layer laminated structure of a high refractive index layer, a low refractive index layer, and a high refractive index layer, or a four-layer laminated structure of a low refractive index layer, a high refractive index layer, a low refractive index layer, and a high refractive index layer, or a four-layer laminated structure of a high refractive index layer, a low refractive index layer, a high refractive index layer, and a low refractive index layer. The same is true when the number of layers increases, such as a five-layer laminated structure, a six-layer laminated structure, a seven-layer laminated structure, and an eight-layer laminated structure.

[0128] Among them, the outermost layer is preferably the second dielectric layer (SiO x )34. In order to obtain low reflectivity, if the outermost layer is the second dielectric layer (SiO x ), it can be made relatively easily. In addition, although the reflectivity may increase slightly sometimes, in order to improve reliability, the second dielectric layer may further contain at least one oxide selected from Nb, Ti, Zr, Ta, Al, Sn, W, Mo and In. In order to suppress the increase in reflectivity, the content of metals other than Si, excluding oxygen, is preferably 30 at% or less, more preferably 20 at% or less, and further preferably 15 at% or less. In addition, when the anti-reflection film 30 forms the anti-fouling film described later, from the viewpoint of bonding related to the durability of the anti-fouling film, the anti-fouling film is preferably formed on the second dielectric layer (SiO x )superior.

[0129] The first dielectric layer (ABO) 32 is preferably amorphous. If it is amorphous, it can be produced at a relatively low temperature, and when the transparent substrate is made of resin, the resin is not damaged by heat, and can be appropriately used.

[0130] The anti-reflection film 30 in this embodiment can be formed on the main surface of the transparent substrate using a known film forming method such as sputtering, vacuum evaporation, coating, etc. That is, the dielectric layers constituting the anti-reflection film 30 are formed on the main surface of the diffusion layer 31 according to their stacking order using a known film forming method such as sputtering, vacuum evaporation, coating, etc.

[0131] Examples of the sputtering method include magnetron sputtering, pulse sputtering, AC sputtering, and digital sputtering.

[0132] For example, magnetron sputtering is a method in which a magnetic field is generated by setting a magnet on the back side of a dielectric material that serves as a matrix, and gas ion atoms collide with the surface of the dielectric material and escape to form a film by sputtering with a thickness of several nanometers. This method can form a continuous film of a dielectric oxide or nitride that is a dielectric material.

[0133] In addition, for example, the digital sputtering method is different from the usual magnetron sputtering method. It is a method of first forming an extremely thin film of metal by sputtering and then oxidizing by irradiating oxygen plasma or oxygen ions or oxygen free radicals, and repeatedly performing such a process in the same chamber to form a thin film of metal oxide. In this case, the film-forming molecules are metal when attached to the substrate, so it is presumed that they have ductility compared to the case of film-forming by metal oxide attachment. Therefore, it is believed that even with the same energy, the rearrangement of the film-forming molecules is easy to occur, and as a result, a dense and smooth film can be formed.

[0134] It should be noted that the above is an example of a preferred structure of the anti-reflection film, but the structure of the anti-reflection film is not limited to this. For example, when it is desired to maintain high brightness of a display, it is sometimes preferable to use an anti-reflection film that has no light absorption ability or has a high transmittance and has a light transmittance of 90% or more as a transparent substrate with an anti-reflection film. Even in such a transparent substrate with an anti-reflection film including a high transmittance anti-reflection film, if the a of the diffusely reflected light at each angle is * and b * Within the above range, the effect of suppressing color deviation during tiling can also be obtained. As the composition of the high-transmittance anti-reflection film, for example, the low-refractive index layer is the same as the second dielectric layer 34, and the high-refractive index layer is a layer that does not have light absorption ability or high transmission. As the high-refractive index layer in this case, for example, a layer mainly composed of Ti oxide (TiO x ) layer, Nb oxide (NbO x ) layer, a layer composed of Ta oxide (TaO x ) is preferably mainly composed of Ti oxide (TiO x In this case, each layer forming the antireflection film can also be formed by a known film-forming method such as sputtering, vacuum evaporation, coating, etc.

[0135] When a highly transmissive antireflection film is provided, the light transmittance (Y) of the transparent substrate with an antireflection film may be, for example, 90 to 96%, and preferably 93 to 96%.

[0136] (Anti-fouling film)

[0137] From the viewpoint of protecting the outermost surface of the anti-reflection film, the transparent substrate with an anti-reflection film of this embodiment may further have an anti-fouling film (also referred to as an "anti-fingerprint (AFP) film") on the above-mentioned anti-reflection film. The anti-fouling film may be composed of, for example, a fluorinated organosilicon compound. As a fluorinated organosilicon compound, as long as it can impart anti-fouling properties, water repellency, and oil repellency, it can be used without particular limitation, for example, a fluorinated organosilicon compound having one or more groups selected from a polyfluoropolyether group, a polyfluoroalkylene group, and a polyfluoroalkyl group. It should be noted that a polyfluoropolyether group refers to a divalent group having a structure formed by alternating bonding of a polyfluoroalkylene group and an etheric oxygen atom.

[0138] In addition, as commercially available fluorine-containing silicone compounds having one or more groups selected from a polyfluoropolyether group, a polyfluoroalkylene group and a polyfluoroalkyl group, KP-801 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), KY178 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), KY-130 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), KY-185 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), OPTOOL (registered trademark) DSX and OPTOOL AES (both trade names, manufactured by Daikin Industries, Ltd.), etc. can be preferably used.

[0139] When the transparent substrate with an anti-reflection film of this mode has an anti-fouling film, the anti-fouling film is arranged on the anti-reflection film. When the anti-reflection film is arranged on both main surface sides of the transparent substrate, the anti-fouling film can be formed on the anti-reflection film on both sides, but it can also be a structure in which the anti-fouling film is laminated only on one main surface side. This is because the anti-fouling film can be arranged at a position that may be touched by a hand or the like, and can be selected according to its use, etc. The film thickness of the anti-fouling film is, for example, preferably 2 to 9 nm, and more preferably 3 to 7 nm.

[0140] (Method for producing a transparent substrate with an anti-reflection film)

[0141] The method for manufacturing the transparent substrate with an anti-reflection film of the present embodiment is not particularly limited, and can be manufactured by, for example, a method comprising sequentially forming a diffusion layer and an anti-reflection film on a transparent substrate, and further comprising forming a barrier layer, an anti-fouling film, etc. as required.

[0142] The method of forming each layer is as described above, but in order to make the diffuse reflection light at each angle a * and b * To meet the above requirements, it is preferred to appropriately adjust the film composition of the anti-reflection film, the light transmittance (Y) of the transparent substrate with the anti-reflection film, etc. In addition, in the case of a transparent substrate with an anti-reflection film of high transmittance, it is difficult to optimize using the transmittance, so it is preferred to more strictly adjust the film thickness of each layer of the anti-reflection film.

[0143] As a specific adjustment method, for example, when obtaining a transparent substrate with an anti-reflection film according to the first embodiment, it is preferred that the specular reflectivity of green light of 500nm to 550nm is higher than that of blue light of 450nm to 500nm and red light of 600nm to 650nm at multiple light incident angles, and it is preferred that the reflectivity of red light is slightly higher than that of blue light. Thus, as a wavelength region with high reflectivity, green>red>blue is formed, and the specular reflection color can be kept as black (colorless) to light yellow-green at multiple light incident angles, and as a result, there is a tendency that the diffuse reflection color at multiple incident angles can also be kept as colorless to light yellow-green. The angular dependence of the specular reflection color can be easily predicted by using thin film simulation software. Figure 3 This is a diagram showing an example of the result of predicting the angle dependency of the specular reflection color using thin film simulation software for the film structure of Example 3 described later. Figure 3 The curves shown are curves showing the reflectivity (R) of each wavelength (λ) at different incident angles. Figure 3 In the results, it was obtained that the wavelength region with high reflectance at multiple light incident angles has a trend of green>red>blue.

[0144] In addition to satisfying (1) and (2), the diffuse reflection angle b * Adjusting the thickness of each layer in a way that minimizes the change in reflected color is also beneficial to reducing the deviation in reflected color.

[0145] In addition, when obtaining the transparent substrate with an anti-reflection film according to the second embodiment, the film thickness can be adjusted in the same manner as in the first embodiment, but the reflected color does not necessarily need to be green. For example, when the green light reflection of 500nm to 550nm is lower than the blue light reflection of 450nm to 500nm or the red light reflection of 600nm to 650nm, it is preferred that the reflected color can be kept as light reddish blue to light reddish orange.

[0146] Furthermore, for example, by satisfying the following conditions, there is a tendency that the transparent substrate with an antireflection film according to the embodiment of the present invention can be easily obtained.

[0147] For example, the total thickness of the antireflection film is preferably 200 nm to 250 nm, more preferably 210 nm to 245 nm. This can suppress the angular dependence of diffuse reflection color, that is, the increase in the change in the color tone of diffuse reflection light caused by angle, and tends to easily satisfy equations (1) and (2).

[0148] The number of layers of the antireflection film is preferably 4 to 8, more preferably 4 to 6. This ensures mass productivity and suppresses an increase in the angular dependency of diffuse reflection color, which tends to make it easier to satisfy equations (1) and (2).

[0149] In addition, the thickness of the first high refractive index layer is the most important for the thickness of each layer, and is preferably 1 to 25 nm, and more preferably 2 to 15 nm. This can suppress the angular dependence of the diffuse reflection color, that is, the increase in the change in the color tone of the diffuse reflection light caused by the angle, and tends to easily satisfy equations (1) and (2).

[0150] (use)

[0151] The transparent substrate with anti-reflection film of this mode can be suitable for the surface material of image display device, especially the surface material of display obtained by tiling a plurality of LED panels, such as a large μ-LED display. Alternatively, the transparent substrate with anti-reflection film of this mode can also be suitable for the situation that the haze required by the transparent substrate with anti-reflection film is high and the color tone tends to become more significant with the change of angle. In addition, in addition to this, the transparent substrate with anti-reflection film of this mode can also be suitable for the surface material of various image display devices such as liquid crystal display, organic EL display, electronic paper display, etc.

[0152] (Image display device)

[0153] The image display device according to the embodiment of the present invention comprises the transparent substrate with the anti-reflection film according to the embodiment of the present invention. As the image display device, there can be cited a method in which a small LED panel used in a tiled manner is provided with the transparent substrate with the anti-reflection film, a method in which the transparent substrate is provided in a tiled manner, and a method in which the transparent substrate is provided in a large-scale display, preferably a large-scale μ-LED display. In addition, there can be cited a method in which the transparent substrate with the anti-reflection film is provided in various displays such as a liquid crystal display, an organic EL display, and an electronic paper display.

[0154] Example

[0155] The present invention is specifically described below with reference to the following examples, but the present invention is not limited thereto. Examples 1 and 2 are comparative examples, and Examples 3 to 5 are examples.

[0156] (evaluate)

[0157] The following evaluations were performed on the transparent substrate with an antireflection film of each example.

[0158] (a of diffuse reflected light at each angle * b * L * )

[0159] A black tape (manufactured by Tomogawa Paper Co., Ltd., kukkiri mieru; diffuse reflectance is approximately 0.01% in terms of SCE Y under D65 light source) was attached to the main surface (the other main surface) of the transparent substrate with anti-reflection film that does not have a diffusion layer and an anti-reflection film. Thus, the reflection of the other main surface was eliminated, and the light source was made to be incident on the main surface (one main surface) with a diffusion layer and an anti-reflection film at an incident angle of 45°. The reflectance of each diffuse reflected light at an angle of -15°, 15°, and 25° relative to the mirror reflected light was measured for the visible light wavelength, and a under D65 light source was calculated. * , b * and L * (Diffuse reflection color). It should be noted that the measurement was performed using CM-M6 manufactured by Konica Minolta. In addition, the a values ​​of the diffuse reflection light at -15°, 15°, and 25° were * b * The coordinates (3 points in total) were linearly approximated by the least squares method to obtain an approximate straight line.

[0160] (Haze)

[0161] The haze value (transmission haze) of the produced transparent substrate with an antireflection film was measured in accordance with JIS K 7136:2000 using a haze meter (HZ-V3 manufactured by Suga Test Instruments).

[0162] (Light transmittance: Y)

[0163] In the transparent substrate with anti-reflection film produced, the light transmittance (Y) of the outermost surface of the anti-reflection film is measured by the method specified in JIS Z8701 (1999). It should be noted that in this specification, the light transmittance (Y) of the outermost surface of the anti-reflection film is taken as the light transmittance (Y) of the transparent substrate with anti-reflection film. Specifically, in a state where a black tape is attached to the other main surface of the main surface on the non-anti-reflection film side of the two main surfaces of the transparent substrate and the back reflection is removed, the spectral transmittance is measured using a spectrophotometer (manufactured by Shimadzu Corporation, trade name: SolidSpec-3700), and the light transmittance (stimulation value Y specified in JIS Z 8701 (1999)) is calculated.

[0164] (Transmittance color of transparent substrate with anti-reflection film under D65 light source (b * value))

[0165] The color index (b) specified in JIS Z 8729 (2004) was determined from the transmission spectrum obtained by measuring the above spectral transmittance. * The light source used is D65 light source.

[0166] (Sheet resistance of anti-reflection film)

[0167] The sheet resistance value was measured using a measuring device (manufactured by Nittoseiko Analytech, device name: Hiresta UP (MCP-HT450 model)) in accordance with JIS K 6911 (2006). The probe was brought into contact with the center of the transparent substrate with the antireflection film and a current of 10 V was applied for 10 seconds for measurement.

[0168] (Color deviation evaluation)

[0169] For each example, 16 transparent substrates with anti-reflection films made under the same conditions were prepared for testing. For example, in the case of Example 1, 16 transparent substrates with anti-reflection films made according to the conditions of Example 1 and slightly changing the film thickness of each layer under the conditions of Example 1 were prepared, and black tape (manufactured by Tomogawa Paper Co., Ltd., kukkiri mieru) was attached to the main surface (the other main surface) without a diffusion layer and an anti-reflection film, and then arranged (tiled) in a vertical 4 × horizontal 4 without gaps. For the transparent substrate with anti-reflection film after tiling, the color deviation was visually evaluated according to the following criteria. The same test was performed for other examples. The evaluation results are shown in Table 1.

[0170] Good: When white LED lighting is reflected on the main surface (one main surface) of the transparent substrate with an anti-reflection film on one side having a diffusion layer and an anti-reflection film and observed from various angles, the white lighting reflected on the transparent substrate with an anti-reflection film appears to be a color close to achromatic, or the change in hue is limited, and the color difference of each substrate is not obvious. In addition, the black sense of the transparent substrate with an anti-reflection film is strong when observed from the front, and very good quality is obtained as a surface material for a display.

[0171] Defective: When white LED lighting is reflected onto the main surface (one main surface) of a transparent substrate with an anti-reflection film on one side having a diffusion layer and an anti-reflection film and observed from various angles, the white lighting reflected onto the transparent substrate with the anti-reflection film appears to be achromatic, red, blue, green and other colors, resulting in obvious color differences among the substrates.

[0172] (Example 1)

[0173] A transparent substrate with an antireflection film was prepared by sequentially forming a diffusion layer and an antireflection film on one main surface of a transparent substrate by the following method. It should be noted that the transparent substrate is a glass substrate with a resin substrate as described later.

[0174] (Formation of Diffusion Layer)

[0175] An anti-glare PET film (manufactured by AGC Co., Ltd., Sa: 0.259 μm, Sdr: 0.0620, Sdq: 0.361, Spc: 1703 (1 / mm), haze value: 60%) was bonded to one main surface of a chemically strengthened glass substrate (Dragontrail: registered trademark, manufactured by AGC Co., Ltd.) with a size of 50 mm in length × 50 mm in width × 1.1 mm in thickness) using an acrylic adhesive (transparent adhesive) to form a laminate (resin film + anti-glare layer), thereby providing a diffusion layer on a transparent substrate. It should be noted that Sa, Sdr, Sdq and Spc herein are values ​​measured in a state where no anti-reflection film is formed on the diffusion layer, but Sa, Sdr, Sdq and Spc of the transparent substrate with an anti-reflection film after the anti-reflection film is formed are less different from the above values ​​and are considered to be within the above preferred range.

[0176] (Film formation of barrier layer)

[0177] Next, a SiN layer as a barrier layer was formed on the diffusion layer to have a film thickness shown in Table 1. For example, in Example 1, the film thickness of the barrier layer was 15 nm.

[0178] The barrier layer is formed by repeatedly performing the following operations at high speed to form a silicon nitride film, forming a silicon nitride (SiN) film of a predetermined thickness. x ) layer: using a digital sputtering method and a silicon target, while maintaining the pressure at 0.2 Pa with argon gas, at a frequency of 100 kHz and a power density of 10.0 W / cm 2 , pulse sputtering was performed under the condition of an inversion pulse width of 3 μsec to form a silicon film with a small film thickness, and then nitridation was immediately performed with nitrogen gas. Here, the nitrogen flow rate during nitridation with nitrogen gas was 800 sccm, and the input power of the nitridation source was 600 W.

[0179] (Formation of anti-reflection film)

[0180] Next, an anti-reflection film having a film structure shown in Table 1 is formed by alternately forming an NMWO layer (high refractive index layer) and an SiO layer (low refractive index layer) on the barrier layer. It should be noted that the NMWO layer refers to a mixed oxide layer of Nb, Mo and W. For example, the film structure of the anti-reflection film of Example 1 in Table 1 refers to forming a 4nm NMWO layer on the barrier layer, followed by forming a 33nm SiO layer, followed by forming a 110nm NMWO layer, and then forming an 81nm SiO layer, thereby forming an anti-reflection film consisting of a four-layer film. The film forming methods of the SiO layer and the NMWO layer are as follows.

[0181] (Film formation of NMWO layer)

[0182] The oxide film is formed by repeatedly performing the following operation at a high speed, thereby forming an NMWO layer of a predetermined film thickness: using a target obtained by mixing niobium, molybdenum and tungsten in a mass ratio of 45:30:25 and sintering, and maintaining the pressure at 0.2 Pa with argon gas at a frequency of 100 kHz and a power density of 10.0 W / cm 2 , pulse sputtering was performed under the conditions of an inversion pulse width of 3μsec to form a metal film of a small film thickness, and then it was immediately oxidized with oxygen. It should be noted that the composition of the NMWO layer formed by this method was measured by depth composition analysis using X-ray photoelectron spectroscopy (XPS) using argon ion sputtering. The results showed that, except for oxygen, Nb was 51.9at%, Mo was 33.5at%, W was 14.6at%, and the content of group B elements was 45% by mass.

[0183] (SiO layer formation)

[0184] The silicon oxide film is formed by repeatedly performing the following operations at a high speed, thereby forming a silicon oxide [silicon oxide (SiO x )] The layer was formed by digital sputtering using a silicon target, with the pressure of argon gas maintained at 0.2 Pa, at a frequency of 100 kHz and a power density of 10.0 W / cm 2 , pulse sputtering was performed under the condition of an inversion pulse width of 3 μsec to form a silicon film of a small film thickness, and then it was immediately oxidized with oxygen. Here, the oxygen flow rate during oxidation with oxygen was 500 sccm, and the input power of the oxidation source was 1000 W.

[0185] (Formation of antifouling film)

[0186] KY-185 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), a fluorine-containing organosilicon compound, was placed in a metal crucible (evaporation source) and heated to evaporate at 230-350°C. The evaporated particles were evaporated and diffused into a vacuum chamber where a substrate was installed and adhered to the surface of the substrate. A 4nm thick antifouling film was formed while monitoring the evaporation rate by controlling the crystal oscillator.

[0187] (Sheet resistance)

[0188] The sheet resistance of the antireflection film was measured by the above method and the result was 1.5×10 9 Ω / □.

[0189] (Example 2)

[0190] A transparent substrate with an antireflection film was obtained in the same manner as in Example 1 except that the film composition of the antireflection film was changed as shown in Table 1 to form an antireflection film composed of 6 layers. The sheet resistance of the antireflection film was measured by the above method and the result was 2×10 9 Ω / □.

[0191] (Example 3)

[0192] A transparent substrate with an antireflection film was obtained in the same manner as in Example 1 except that the film composition of the antireflection film was changed as shown in Table 1 and the high refractive index layer was a Nb2O5 layer to form an antireflection film composed of 6 layers. The sheet resistance of the antireflection film was measured by the above method and the result was 3×10 11 Ω / □.

[0193] The method for forming the Nb2O5 layer is as follows.

[0194] (Film formation of Nb2O5 layer)

[0195] The oxide film is formed by repeatedly performing the following operation at a high speed, thereby forming a layer composed of niobium oxide [niobium oxide (Nb2O5)] of a specified film thickness: using a digital sputtering method and a niobium target, while maintaining the pressure at 0.2 Pa with argon gas, at a frequency of 100 kHz and a power density of 10.0 W / cm 2 The metal film was formed by pulse sputtering with a reverse pulse width of 3 μsec, and then immediately oxidized with oxygen. The oxygen flow rate during oxidation with oxygen was 1000 sccm, and the input power of the oxidation source was 1000 W.

[0196] (Example 4)

[0197] A transparent substrate with an antireflection film was obtained in the same manner as in Example 1 except that the film composition of the antireflection film was changed as shown in Table 1 and the high refractive index layer was a TiO2 layer to form an antireflection film composed of four layers. The sheet resistance of the antireflection film was measured by the above method and the result was 2×10 10 Ω / □.

[0198] The method for forming the TiO2 layer is as follows.

[0199] (Film formation of TiO2 layer)

[0200] The oxide film is formed by repeatedly performing the following operation at high speed, thereby forming a layer of titanium oxide [titanium dioxide (TiO2)] of a specified film thickness: using a digital sputtering method and a titanium target, while maintaining the pressure at 0.2 Pa with argon gas, at a frequency of 100 kHz and a power density of 10.0 W / cm 2, pulse sputtering was performed under the condition of an inversion pulse width of 3 μsec to form a metal film with a small film thickness, and then it was immediately oxidized with oxygen. Here, the oxygen flow rate during oxidation with oxygen was 1000 sccm, and the input power of the oxidation source was 1000W.

[0201] (Example 5)

[0202] A transparent substrate with an antireflection film was obtained in the same manner as in Example 2 except that the film composition of the antireflection film was changed as shown in Table 1. The sheet resistance of the antireflection film was measured by the above method and the result was 3×10 9 Ω / □.

[0203] The results of the above evaluations of the transparent substrates with antireflection films obtained in each example are shown in Table 1. * and b * Shown in Figure 4 (a)~(e). Figure 4 (a) to (e) are graphs showing the diffuse reflection light at various angles in Examples 1 to 5. * and b * In each figure, if the curve is within the area indicated by the dotted line, it means a * and b * Satisfies equations (1) and (2). In addition, Figure 4 The formulas shown in (a) to (e) are respectively obtained by * b * The equation of the approximate straight line calculated from the coordinates of three points. The dot-dash line represents the approximate straight line.

[0204] [Table 1]

[0205]

[0206] The diffuse reflected light at each angle satisfies (1)-5≤a * ≤-1, (2) 0≤b * In Example 3 where ≤9, and Examples 3 to 5 where the absolute value of the slope of the approximate straight line of diffuse reflected light at each angle was 2 or more, it was confirmed from the results in Table 1 that color deviation during tiling could be suppressed.

[0207] As described above, the present specification discloses the following matters.

[0208] 1. A transparent substrate with an anti-reflection film, comprising: a transparent substrate having two main surfaces, and a diffusion layer and an anti-reflection film provided on one main surface of the transparent substrate in order from the transparent substrate side,

[0209] When the reflection from the other main surface of the transparent substrate is removed and the light source is incident on the one main surface at an incident angle of 45°, the a of the diffuse reflected light at angles of -15°, 15° and 25° relative to the specular reflected light under the D65 light source is * and b * The following equations (1) and (2) are satisfied.

[0210] (1)-5≤a * ≤-1

[0211] (2)0≤b * ≤9

[0212] 2. A transparent substrate with an anti-reflection film, comprising: a transparent substrate having two main surfaces, and a diffusion layer and an anti-reflection film provided on one main surface of the transparent substrate in order from the transparent substrate side,

[0213] When the reflection from the other main surface of the transparent substrate is removed and the light source is incident on the one main surface at an incident angle of 45°, the a-value of the diffusely reflected light under the D65 light source at angles of -15°, 15° and 25° relative to the specular reflected light is obtained. * b * The absolute value of the slope of the approximate straight line calculated by coordinates is 2 or more.

[0214] 3. The transparent substrate with an antireflection film according to 1 or 2 above, wherein the haze value is 30% or more.

[0215] 4. The transparent substrate with an antireflection film according to any one of 1 to 3 above, wherein the L value of the diffuse reflected light at -15° under a D65 light source is * The L of the diffuse reflected light at 15° is 30 to 60. * is 15 to 35, and the L of the diffuse reflected light at 25° * 5 to 20.

[0216] 5. The transparent substrate with an antireflection film according to any one of 1 to 4 above, wherein the light transmittance (Y) is 20 to 90%.

[0217] 6. The transparent substrate with an anti-reflection film according to any one of 1 to 5 above, wherein the anti-reflection film has a sheet resistance of 10 4 Ω / □ or more.

[0218] 7. The transparent substrate with an antireflection film according to any one of 1 to 6 above, wherein the transmission color b under D65 light source is * Is 5 or less.

[0219] 8. A transparent substrate with an anti-reflection film according to any one of 1 to 7 above, wherein the anti-reflection film is a stacked structure formed by stacking at least two dielectric layers with different refractive indices, at least one of the dielectric layers is mainly composed of Si oxide, and at least one other layer of the layers of the stacked structure is mainly composed of a mixed oxide, which is a mixed oxide of at least one oxide selected from Group A consisting of Mo and W and at least one oxide selected from Group B consisting of Si, Nb, Ti, Zr, Ta, Al, Sn and In, and the content of the elements of Group B contained in the mixed oxide is 65% by mass or less relative to the total of the elements of Group A contained in the mixed oxide and the elements of Group B contained in the mixed oxide.

[0220] 9. The transparent substrate with an antireflection film according to any one of 1 to 8 above, further comprising an antifouling film on the antireflection film.

[0221] 10. The transparent substrate with an antireflection film according to any one of 1 to 9 above, wherein the transparent substrate comprises glass.

[0222] 11. The transparent substrate with an antireflection film according to any one of 1 to 10 above, wherein the transparent substrate comprises at least one resin selected from the group consisting of polyethylene terephthalate, polycarbonate, acrylic, silicone, and triacetyl cellulose resin film.

[0223] 12. The transparent substrate with an antireflection film according to any one of 1 to 11 above, wherein the transparent substrate is a laminate of glass and at least one resin selected from the group consisting of polyethylene terephthalate, polycarbonate, acrylic, silicone, and triacetyl cellulose resin film.

[0224] 13. The transparent substrate with an antireflection film according to 10 or 12 above, wherein the glass is chemically strengthened.

[0225] 14. An image display device comprising the transparent substrate with an antireflection film according to any one of 1 to 13 above.

[0226] Various embodiments have been described above with reference to the accompanying drawings, but the present invention is certainly not limited to the above examples. Those skilled in the art will appreciate that various variations or modifications can be thought of within the scope of the scope of the patent claims, and will understand that these certainly also belong to the technical scope of the present invention. In addition, the various constituent elements in the above embodiments may be arbitrarily combined without departing from the scope of the gist of the present invention.

[0227] It should be noted that the present application is based on the Japanese patent application (Japanese Patent Application No. 2022-112709) filed on July 13, 2022, and the contents thereof are incorporated herein by reference.

[0228] Explanation of symbols

[0229] 1Transparent substrate with anti-reflection film

[0230] 10 Transparent substrate

[0231] 11 A main surface

[0232] 12 Another main face

[0233] 20 black tape

[0234] 30 Anti-reflective film

[0235] 31 diffusion layer

[0236] 32 first dielectric layer

[0237] 34 Second dielectric layer

[0238] 50 light sources

[0239] 60Incident light

[0240] 61 Specular reflection light

[0241] 71, 72, 73 diffuse reflection light

Claims

1. A transparent substrate with an anti-reflection film, comprising: a transparent substrate having two main surfaces, and a diffusion layer and an anti-reflection film provided on one main surface of the transparent substrate in order from the transparent substrate side, When the reflection from the other main surface of the transparent substrate is removed and the light source is incident on the one main surface at an incident angle of 45°, the a of the diffuse reflected light at angles of -15°, 15° and 25° relative to the specular reflected light under the D65 light source is * and b * Satisfying the following equations (1) and (2), (1)-5≤a * ≤-1 (2)0≤b * ≤9。 2. A transparent substrate with an anti-reflection film, comprising: a transparent substrate having two main surfaces, and a diffusion layer and an anti-reflection film provided in order from the transparent substrate side on one main surface of the transparent substrate, When the reflection from the other main surface of the transparent substrate is removed and the light source is incident on the one main surface at an incident angle of 45°, the a of the diffuse reflected light under the D65 light source at angles of -15°, 15° and 25° relative to the specular reflected light is * b * The absolute value of the slope of the approximate straight line calculated by coordinates is 2 or more.

3. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: The haze value is 30% or more.

4. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: The -15° diffuse reflected light under D65 illuminant L * is 30 to 60, the L of the diffuse reflected light at 15° * is 15 to 35, and the L of the diffuse reflected light at 25° * 5 to 20.

5. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: The light transmittance Y is 20 to 90%.

6. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: The sheet resistance of the anti-reflection film is 10 4 Ω / □ or more.

7. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: b of the transmitted color under D65 light source * Is 5 or less.

8. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: The antireflection film has a stacked structure in which at least two dielectric layers having different refractive indices are stacked, at least one of the dielectric layers is mainly composed of Si oxide, and at least one other layer of the layers of the stacked structure is mainly composed of a mixed oxide, which is a mixed oxide of at least one oxide selected from the A group consisting of Mo and W and at least one oxide selected from the B group consisting of Si, Nb, Ti, Zr, Ta, Al, Sn and In, and the content of the B group elements contained in the mixed oxide is 65 mass % or less relative to the total of the A group elements contained in the mixed oxide and the B group elements contained in the mixed oxide.

9. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: An antifouling film is further provided on the antireflection film.

10. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: The transparent substrate comprises glass.

11. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: The transparent substrate includes at least one resin selected from the group consisting of polyethylene terephthalate, polycarbonate, acrylic, silicone, and triacetyl cellulose resin films.

12. The transparent substrate with an anti-reflection film according to claim 1 or 2, wherein: The transparent substrate is a laminate of glass and at least one resin selected from the group consisting of polyethylene terephthalate, polycarbonate, acrylic, silicone and triacetyl cellulose resin films.

13. The transparent substrate with an anti-reflection film according to claim 12, wherein: The glass is chemically strengthened. 14 . An image display device comprising the transparent substrate with an antireflection film according to claim 1 or 2.

Images