Polishing head and single-side polishing equipment

Abstract

The present invention discloses a polishing press head and a single-sided polishing device, wherein the polishing press head comprises: a support plate, wherein a circular hole is arranged on the support plate; a pressing member, wherein the lower end surface of the pressing member is used to fix a wafer, and the pressing member is connected to the support plate through a flexible connecting member; a torque transmitting member, wherein the torque transmitting member comprises a first connecting portion and a second connecting portion, wherein the second connecting portion is fixedly connected to the pressing member, wherein the annular side surface of the first connecting portion is arranged as a curved surface protruding outward, wherein the curved surface is in gap fit with the circular hole, and the second connecting portion is not in contact with the circular hole; when the support plate transmits torque to the curved surface through the inner wall of the circular hole to drive the pressing member to rotate, the first connecting portion moves up and down in the circular hole so that the lower end surface of the pressing member remains parallel to the polishing end surface. The present invention realizes the technical effects of reducing the contact area and contact position between the torque transmitting member and the circular hole during the polishing process, reducing the movement resistance of the torque transmitting member during the polishing process, and improving the adaptive ability of the polishing press head during the polishing process.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor processing, in particular to a polishing press head and a single-side polishing device. Background Art

[0002] Wafer polishing is an indispensable process in the field of wafer manufacturing. During the polishing process, the wafer to be polished is usually sucked onto the lower part of the support plate, and the polishing surface needs to abut against the rotating lower pressure piece. The support plate rotates together with the lower pressure piece under the drive of the driving component. At the same time, the support plate applies a downward load to the wafer. During polishing, the polishing liquid supply arm of the equipment evenly supplies the polishing liquid on the lower pressure piece, and the wafer is polished under the joint action of mechanical and chemical actions.

[0003] However, during wafer polishing, the polishing end face is easily not parallel to the part of the polishing head that fixes the wafer, resulting in poor morphology of the wafer polished during polishing and poor finished products. Therefore, it is necessary to enable the part of the polishing head that fixes the wafer to be deflected so as to adaptively maintain parallelism with the polishing end face during the polishing process. However, the adaptive adjustment ability of the polishing head in the prior art is poor, and it is difficult to achieve good adaptive adjustment for the condition that the working position is not parallel. Summary of the invention

[0004] The main purpose of the present invention is to provide a polishing head and a single-sided polishing device to solve the problem in the related art that the polishing head has poor adaptive adjustment ability and is difficult to achieve good adaptive adjustment under the condition of non-parallel working positions.

[0005] In order to achieve the above object, the present invention provides a polishing press head, comprising:

[0006] A supporting plate, wherein a circular hole is provided on the supporting plate;

[0007] A pressing member, the lower end surface of which is used to fix the wafer, and the pressing member is connected to the supporting plate via a flexible connecting member;

[0008] A torque transmission member, the torque transmission member includes a first connecting part and a second connecting part, the second connecting part is fixedly connected to the pressing member, the annular side surface of the first connecting part is set as a curved surface protruding outward, the curved surface is gap-matched with the circular hole, and the second connecting part does not contact the circular hole; when the support plate transmits torque to the curved surface through the inner wall of the circular hole to drive the pressing member to rotate, the first connecting part moves up and down in the circular hole to keep the lower end face of the pressing member parallel to the polished end face.

[0009] Furthermore, the first connection portion and the second connection portion are coaxially arranged, and the maximum diameter of the first connection portion is greater than the maximum diameter of the second connection portion.

[0010] Furthermore, the pressing member is configured to be driven to move axially relative to the support disk, a limiting hole is provided on the support disk, and a first limiting portion is provided in the limiting hole;

[0011] The polishing pressure head further comprises a limiting member, a first end of the limiting member is slidably connected with the limiting hole and has a clearance fit, the limiting member has a clearance fit with the first limiting portion, and a second end of the limiting member passes through the limiting hole and is fixedly connected with the lower pressing member;

[0012] The first end of the limiting member is provided with a second limiting portion, and the second limiting portion cooperates with the first limiting portion to limit the maximum sliding stroke of the first end of the limiting member in the limiting hole.

[0013] Furthermore, the matching clearance between the first limiting portion and the limiting member is greater than the matching clearance between the curved surface and the circular hole;

[0014] The matching clearance between the second limiting portion and the limiting hole is greater than the matching clearance between the curved surface and the circular hole.

[0015] Furthermore, the first limiting portion includes a first limiting protrusion disposed in the limiting hole, and an end of the first limiting protrusion is clearance-matched with the limiting member;

[0016] The second limiting portion includes a second limiting protrusion provided on the first end of the limiting member, the first limiting protrusion corresponds to the second limiting protrusion, and cooperates with each other to limit the maximum stroke of the first end of the limiting member in the limiting hole.

[0017] Furthermore, a chamfered structure is provided at the end of the first limiting protrusion.

[0018] Furthermore, the chamfered structure is a rounded corner formed at the end of the first limiting protrusion, the top of the rounded corner is clearance-matched with the outer surface of the limiting member, and the fitting clearance is larger than the fitting clearance between the curved surface and the circular hole.

[0019] Furthermore, the polishing pressure head further comprises a first annular pressure plate, a second annular pressure plate and a third annular pressure plate, and the flexible connecting member comprises an elastic film;

[0020] The inner ring and the outer ring of the elastic rubber film are fixedly connected to the lower end surface of the support plate through the first annular pressing plate and the third annular pressing plate respectively;

[0021] The middle ring of the elastic rubber film is fixedly connected to the upper end of the lower pressing member through the second annular pressing plate.

[0022] Furthermore, two torque transmission members are provided and are symmetrically distributed along the axis of the support plate, and the circular hole corresponds to the torque transmission member.

[0023] Furthermore, two limiting members are provided and are symmetrically distributed along the axis of the support plate, and the limiting holes correspond to the limiting members.

[0024] Furthermore, a plurality of adsorption holes are provided on one end of the lower pressing member away from the supporting plate, and a second air path is provided inside the lower pressing member, and the second air path is communicated with the adsorption holes;

[0025] An air circuit connector is provided on the lower pressure member, a first end of the air circuit connector is fixedly connected to the lower pressure member and communicated with the second air circuit channel, a seal is provided between the air circuit connector and the lower pressure member, and a second end of the air circuit connector slides and extends into the support plate.

[0026] According to another aspect of the present invention, a single-side polishing device is provided, comprising the above-mentioned polishing press head.

[0027] In the embodiment of the present invention, a support plate is provided, a circular hole is provided on the support plate; a pressing piece, the lower end surface of the pressing piece is used to fix the wafer, and the pressing piece is connected to the support plate through a flexible connecting piece; a torque transmission piece, the torque transmission piece includes a first connecting part and a second connecting part, the second connecting part is fixedly connected to the pressing piece, the annular side surface of the first connecting part is provided as a curved surface convex outwardly, the curved surface and the circular hole are gap-matched, and the second connecting part does not contact the circular hole; when the support plate transmits torque to the curved surface through the inner wall of the circular hole to drive the pressing piece to rotate, the first connecting part moves up and down in the circular hole so that the lower end surface of the pressing piece remains parallel to the polishing end surface, and a In one aspect, since the annular side surface of the first connecting part is an outwardly convex curved surface, when the supporting disk transmits torque to the pressing member through the torque transmitting member, only one point of the curved surface on the outer side of the first connecting part of the torque transmitting member contacts the inner wall of the circular hole, so that when the supporting disk transmits torque to the deflected pressing member, the torque transmitting member always generates relative motion with the inner wall of the circular hole in a point contact manner, thereby achieving the technical effect of reducing the contact area and contact position between the torque transmitting member and the circular hole during the polishing process, reducing the movement resistance of the torque transmitting member during the polishing process, and effectively improving the adaptive ability of the polishing pressure head during the polishing process;

[0028] On the other hand, since the outer side surface of the first connecting part is a convex curved surface, when the curved surface contacts the inner wall of the circular hole, the distance between the portion of the curved surface located outside the contact point and the circular hole gradually increases outward, which is conducive to the deflection of the torque transmission component in the circular hole, and then facilitates the deflection of the pressing part relative to the supporting plate to better adapt to the surface morphology of the wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] The accompanying drawings constituting a part of the present invention are used to provide a further understanding of the present invention, so that other features, purposes and advantages of the present invention become more obvious. The accompanying drawings of the exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the accompanying drawings:

[0030] Figure 1 is an isometric structural schematic diagram of a polishing press head according to an embodiment of the present invention;

[0031] Figure 2 is a schematic diagram of a top view of the structure of a polishing press head according to an embodiment of the present invention;

[0032] Figure 3 Figure 2 Schematic diagram of the cross-sectional structure of AA;

[0033] Figure 4 yes Figure 2 Schematic diagram of the cross-sectional structure of the middle BB;

[0034] Figure 5 yes Figure 2 Schematic diagram of the cross-sectional structure of the CC;

[0035] Among them, 1 support plate, 2 pressing member, 20 ceramic panel, 21 pressing head, 22 sealing ring, 3 quick connector, 4 torque transmission member, 40 first connecting part, 400 curved surface, 41 second connecting part, 5 circular hole, 6 air path connecting head, 7 limit member, 70 second limit part, 8 limit hole, 80 first limit part, 9 flexible connecting member, 90 elastic film, 10 second air path channel, 11 adsorption hole, 12 first air path channel, 13 air chamber, 14 first annular pressure plate, 15 second annular pressure plate, 16 third annular pressure plate, 17 retaining ring. DETAILED DESCRIPTION

[0036] In order to enable those skilled in the art to better understand the scheme of the present invention, the technical scheme in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0037] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the numbers used in this way can be interchanged under appropriate circumstances to facilitate the embodiments of the present invention described herein.

[0038] In the present invention, the directions or positional relationships indicated by the terms "upper", "lower", "inner", etc. are based on the directions or positional relationships shown in the drawings. These terms are mainly used to better describe the present invention and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific direction, or to be constructed and operated in a specific direction.

[0039] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those skilled in the art, the specific meanings of these terms in the present invention can be understood according to specific circumstances.

[0040] In addition, the terms "disposed", "provided with", "connected", "fixed" and the like should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements or components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0041] In addition, the term "plurality" shall mean two or more.

[0042] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0043] To solve relevant technical problems, such as Figures 1 to 3 As shown, an embodiment of the present invention provides a polishing press head, comprising:

[0044] A supporting plate 1, wherein a circular hole 5 is provided on the supporting plate 1;

[0045] A lower pressing member 2, the lower end surface of which is used to fix the wafer, and the lower pressing member 2 is connected to the supporting plate 1 via a flexible connecting member 9;

[0046] The torque transmission member 4 includes a first connection portion 40 and a second connection portion 41. The second connection portion 41 is fixedly connected to the pressing member 2. The ring side surface of the first connection portion 40 is configured as a curved surface 400 protruding outward. The curved surface 400 is clearance-matched with the circular hole 5. The second connection portion 41 does not contact the circular hole 5.

[0047] When the support plate 1 transmits torque to the curved surface 400 through the inner wall of the circular hole 5 to drive the pressing piece 2 to rotate, the first connecting portion 40 moves up and down in the circular hole 5 to keep the lower end surface of the pressing piece 2 parallel to the polished end surface.

[0048] In this embodiment, the polishing head mainly includes a support plate 1, a pressing member 2 and a torque transmission member 4, wherein the support plate 1 is used to be fixedly connected to the main shaft, and the main shaft drives the support plate 1 to perform pressing and rotating actions. The support plate 1 and the main shaft can be fixedly connected through a connecting structure. For example, in one embodiment, a connecting groove is provided at the upper end of the support plate 1, and the connecting groove is sleeved with the main shaft, and the support plate 1 and the main shaft are locked by a structure such as a screw. In another embodiment, the support plate 1 is fixedly connected to the main shaft through a quick clamp.

[0049] The pressing member 2 is installed at the lower end of the support plate 1, and a corresponding installation groove can be provided at the lower end of the support plate 1 to accommodate the support plate 1. When the main shaft drives the support plate 1 to rotate, the support plate 1 needs to drive the pressing member 2 to rotate.

[0050] Since the pressing member 2 needs to rotate synchronously with the supporting plate 1, and the pressing member 2 and the supporting plate 1 are connected by a flexible connecting member 9, the pressing member 2 and the supporting plate 1 need to be connected by a rigid torque transmission member 4 for torque transmission. Figure 3 As shown, a circular hole 5 is provided at the lower end of the support plate 1, a first end of the torque transmission member 4 is slidably disposed in the circular hole 5, and a second end is fixedly connected to the pressing member 2. In this embodiment, the torque transmission member 4 is substantially a columnar structure.

[0051] In order to allow the pressing member 2 to have the freedom to deflect at a certain angle relative to the supporting plate 1, the portion of the torque transmission member 4 located at the circular hole 5 in this embodiment needs to be in clearance with the circular hole 5. Specifically, the torque transmission member 4 in this embodiment includes a first connecting portion 40 and a second connecting portion 41, wherein the first connecting portion 40 can slide in the circular hole 5, and the lower end of the second connecting portion 41 passes through the circular hole 5 and is fixedly connected to the pressing member 2. On this basis, the curved surface 400 on the first connecting portion 40 and the second connecting portion 41 are both in clearance with the circular hole 5. When the supporting plate 1 does not transmit torque to the pressing member 2 and the pressing member 2 does not deflect, the curved surface 400 and the second connecting portion 41 are not in contact with the circular hole 5. When the supporting plate 1 transmits torque to the pressing member 2 or the pressing member 2 deflects, the curved surface 400 is in contact with the circular hole 5, and the second connecting portion 41 remains out of contact with the circular hole 5. The deflectable angle of the pressing member 2 is determined by the clearance between the curved surface 400 and the circular hole 5.

[0052] To maintain this contact relationship, in one embodiment, Figure 3 As shown, the first connection part 40 of the torque transmission member 4 is coaxially arranged with the second connection part 41, and the maximum diameter of the first connection part 40 is greater than the maximum diameter of the second connection part 41. Specifically, in this embodiment, the first connection part is a ball head structure, and the second connection part is a cylindrical structure.

[0053] During the polishing process, the lower end face of the pressing member 2 is pressed tightly against the surface of the wafer. According to the morphology of the wafer surface, under the cooperation of the torque transmission member 4 and the circular hole 5, the pressing member 2 will produce a certain angle of deflection to adapt to the morphology of the wafer surface, so that the lower end face of the pressing member 2 is always parallel to the polishing end face. In this state, the support plate 1 needs to transmit the torque to the pressing member 2 through the torque transmission member 4, thereby driving the pressing member 2 to rotate. Since the torque transmission member 4 deflects a certain angle with the pressing member 2, during the rotation process, the torque transmission member 4 will continue to move in the circular hole 5, so that the pressing member 2 can rotate while maintaining the current deflection state.

[0054] In order to improve the adaptive ability of the polishing pressure head and avoid movement jamming during the polishing process, it is necessary to improve the smoothness of the movement of the torque transmission member 4 in the circular hole 5. To this end, in this embodiment, the ring side surface of the first connecting portion 40 is set as a curved surface 400 protruding outward, so that the first connecting portion 40 is a ball-like structure. During the movement of the torque transmission member 4, only one point on the curved surface 400 of the first connecting portion 40 on the torque transmission member 4 contacts the inner wall of the circular hole 5, and other positions on the torque transmission member 4 will not contact the circular hole 5, which not only reduces the contact area between the torque transmission member 4 and the circular hole 5, but also reduces the contact position between the torque transmission member 4 and the circular hole 5, thereby reducing the movement resistance of the torque transmission member 4 during the polishing process, and effectively improving the adaptive ability of the polishing pressure head during the polishing process.

[0055] In addition, since the outer side surface of the first connecting portion 40 is a convex curved surface 400, when the curved surface 400 contacts the inner wall of the circular hole 5, the distance between the portion of the curved surface 400 located outside the contact point and the circular hole 5 gradually increases from the inside to the outside, which is beneficial for the torque transmission member 4 to further deflect in the circular hole 5, and further beneficial for the lower pressure member 2 to deflect relative to the support plate 1 to better adapt to the surface morphology of the wafer.

[0056] In one embodiment, the pressing member 2 needs to be able to move axially relative to the supporting plate 1 to be pressed against the surface of the wafer. In this embodiment, the pressing member 2 is pneumatically moved axially. Specifically, a closed air chamber 13 and a first air path 12 are provided in the supporting plate 1. The first end of the first air path 12 is connected to the air chamber 13, and the second end of the first air path 12 is connected to an external air source, such as an air pump, etc. Pressurized gas can be introduced into the air chamber 13 or the gas in the air chamber 13 can be extracted through the first air path 12. Figure 3 As shown, in order to facilitate the first gas path channel 12 to communicate with the external gas source, a quick-connect connector 3 can be provided in the support plate 1, and the first end of the quick-connect connector 3 is connected to the first gas path channel 12, and the second end is used to connect to the external gas source.

[0057] In this embodiment, the pressing member 2 is driven to move relative to the support plate 1 by pneumatic means, so at least a portion of the support plate 1 in this embodiment needs to correspond to the air chamber 13. When pressurized gas is introduced into the air chamber 13, the pressing member 2 is pushed to move outward relative to the support plate 1. When the gas is extracted from the air chamber 13, in order to facilitate the inward movement of the pressing member 2, in this embodiment, the pressing member 2 and the support plate 1 are connected by a flexible connector 9, which can generate elastic force after being stretched to pull the pressing member 2 to move inward.

[0058] It should be noted that in this embodiment, the air chamber 13 needs to be kept in a sealed state during the process of the down-pressing member 2 moving outward and inward. In one embodiment, a piston head (not shown in the figure) is provided on the support plate 1 at a portion corresponding to the air chamber 13. The piston head is in close contact with the air chamber 13. When the pressurized gas is introduced into the air chamber 13, the piston head can be pushed to move linearly outward in the air chamber 13, and the flexible connector 9 is stretched at the same time. When the gas is extracted from the air chamber 13, the flexible connector 9 can pull the down-pressing member 2 to move inward, thereby pushing the piston head to move linearly inward in the air chamber 13. Since the down-pressing member 2 also needs to have the degree of freedom to deflect at a certain angle relative to the support plate 1, the piston head needs to be able to have the degree of freedom to deflect at a certain angle in the air chamber 13. For example, a number of rubber rings can be provided on the outer ring of the piston head, and the degree of freedom is satisfied by the deformation of the rubber rings, while ensuring the sealing performance. In this embodiment, the flexible connector 9 can be a spring, an elastic band, etc.

[0059] In another embodiment, if Figure 3 As shown, the flexible connector 9 serves as both a structure for pulling back the lower pressing member 2 and a structure for sealing the air chamber 13. For example, the flexible connector 9 is set as an elastic rubber film 90, on this basis, the polishing pressure head also includes a first annular pressure plate 14, a second annular pressure plate 15 and a third annular pressure plate 16, the inner ring and the outer ring of the elastic rubber film 90 are fixedly connected to the lower end surface of the support plate 1 through the first annular pressure plate 14 and the third annular pressure plate 16 respectively; the middle ring of the elastic rubber film 90 is fixedly connected to the upper end of the lower pressing member 2 through the second annular pressure plate 15. In this embodiment, the air chamber 13 is in a sealed state by the elastic rubber film 90, and the middle ring of the elastic rubber film 90 can expand and contract, thereby driving the lower pressing member 2 to move axially.

[0060] Since the pressing member 2 can be driven to move axially relative to the supporting plate 1 to press the wafer during the polishing process, in order to prevent the pressing member 2 from overtravel and causing it to detach from the pressing member 2, the maximum movement stroke of the pressing member 2 needs to be limited.

[0061] For this reason, Figure 3 As shown, in this embodiment, a limiting hole 8 is provided on the support plate 1, and a first limiting portion 80 is provided in the limiting hole 8;

[0062] The polishing pressure head also includes a limiter 7, a first end of the limiter 7 is slidably connected with the limiter hole 8 and has a clearance fit, the limiter 7 has a clearance fit with the first limiter portion 80, and a second end of the limiter 7 passes through the limiter hole 8 and is fixedly connected with the lower pressing member 2;

[0063] The first end of the limiting member 7 is provided with a second limiting portion 70 , and the second limiting portion 70 cooperates with the first limiting portion 80 to limit the maximum sliding stroke of the first end of the limiting member 7 in the limiting hole 8 .

[0064] Specifically, in the present embodiment, the limiting hole 8 is arranged at the lower end of the support plate 1, the limiting member 7 is slidably arranged in the limiting hole 8, and the lower end of the limiting member 7 extends out of the limiting hole 8 and is fixedly connected to the pressing member 2, and during the axial movement of the pressing member 2, the limiting member 7 slides linearly in the limiting hole 8. In order to limit the moving stroke of the pressing member 2, in the present embodiment, a first limiting portion 80 is arranged in the limiting hole 8, and a second limiting portion 70 is arranged on the limiting member 7, and the second limiting portion 70 corresponds to the first limiting portion 80 in upper and lower directions. When the pressing member 2 moves downward, the second limiting portion 70 gradually approaches the first limiting portion 80, and when the second limiting portion 70 abuts against the first limiting portion 80, the further downward movement of the pressing member 2 can be limited.

[0065] Since the pressing member 2 also needs to be able to generate deflection, a clearance fit is required between the limiting member 7 and the limiting hole 8 in this embodiment, and the fitting clearance needs to meet the deflection angle requirement of the pressing member 2 .

[0066] It can be understood that, in the above embodiment, the limiting hole 8 is provided on the support plate 1, the lower end of the limiting member 7 is fixedly connected to the lower pressing member 2, and the upper end is slidably connected to the limiting hole 8. In another embodiment (not shown in the figure), the limiting hole 8 can be provided on the lower pressing member 2, the lower end of the limiting member 7 is slidably connected to the limiting hole 8, and the upper end is fixedly connected to the support plate 1.

[0067] In order to avoid interference between the first limiting portion 80 and the limiting member 7, which may cause obstruction in the deflection of the pressing member 2, in this embodiment, the fitting clearance between the first limiting portion 80 and the limiting member 7 is larger than the fitting clearance between the curved surface 400 and the circular hole 5. At the same time, the fitting clearance between the second limiting portion 70 and the limiting hole 8 is larger than the fitting clearance between the curved surface 400 and the circular hole 5.

[0068] Specifically, in this embodiment, by setting the fitting clearance, during the deflection of the lower pressing member 2, there is a larger deflection margin between the second limiting portion 70 on the limiting member 7 and the circular hole 5, and there is also a larger deflection margin between the limiting hole 8 and the limiting member 7.

[0069] like Figure 3As shown, in one embodiment of the first limiting portion 80 and the second limiting portion 70, the first limiting portion 80 includes a first limiting protrusion disposed in the limiting hole 8, and an end of the first limiting protrusion is clearance-matched with the limiting member 7;

[0070] The second limiting portion 70 includes a second limiting protrusion provided on the first end of the limiting member 7 . The first limiting protrusion corresponds to the second limiting protrusion and cooperates with each other to limit the maximum stroke of the first end of the limiting member 7 in the limiting hole 8 .

[0071] Specifically, in the present embodiment, a first limiting protrusion is provided at the lower part of the limiting hole 8, and the first limiting protrusion protrudes from the inner wall of the limiting hole 8. The first limiting protrusion may be an annular structure, or the first limiting protrusion may be provided in a plurality and distributed at intervals along the circumferential direction. The second limiting protrusion is located at the upper end of the limiting member 7 and protrudes from the side of the limiting member 7. The second limiting protrusion corresponds to the first limiting protrusion up and down, and similarly, the second limiting protrusion may also be provided in an annular structure or provided in a plurality and distributed at intervals along the circumferential direction. When the second limiting protrusion abuts against the first limiting protrusion, the further downward movement of the pressing member 2 can be limited.

[0072] In order to further reduce the interference between the stopper 7 and the first stopper protrusion during the deflection of the lower pressing member 2, a chamfered structure is provided at the end of the first stopper protrusion in this embodiment. By providing the chamfered structure in this embodiment, the contact area between the first stopper protrusion and the stopper 7 can be reduced, thereby reducing the friction between the first stopper protrusion and the stopper 7, and because the chamfered structure is arc-shaped, the resistance encountered by the lower pressing member 2 when it is deflected is also significantly reduced, thereby improving the smoothness of the deflection process.

[0073] In this embodiment, the chamfer structure has at least two forms, one of which is to chamfer only the upper and lower ends of the first limiting protrusion, and the middle part of the first limiting protrusion is still maintained as a plane with a certain length. Another form is to fully chamfer the end of the first limiting protrusion, that is, the chamfer structure is a fillet formed at the end of the first limiting protrusion, and the top of the fillet is gap-matched with the outer surface of the limiting member 7, and the matching gap is greater than the matching gap between the curved surface 400 and the circular hole 5. It can be understood that the second chamfer structure further reduces the contact area between the first limiting protrusion and the limiting member 7 compared with the first chamfer structure.

[0074] In one embodiment of the stopper 7, the stopper 7 is configured as a countersunk screw, and the screw portion of the stopper 7 includes a large diameter section and a small diameter section, wherein the small diameter section is provided with threads and is threadedly connected to the support plate 1. To prevent the stopper 7 from loosening, in this embodiment, a relaxation groove is provided at the upper end of the support plate 1, and a relaxation gasket is arranged in the relaxation groove, and the small diameter section of the stopper 7 passes through the relaxation gasket and is threadedly connected to the support plate 1, while the lower end of the large diameter section is pressed tightly against the relaxation gasket.

[0075] In one embodiment of the torque transmission member 4, the torque transmission member 4 can be provided as one or more. When the torque transmission member 4 is provided as one, the support plate 1 will apply torque to one side of the pressing member 2, which may easily cause uneven force on the pressing member 2. Therefore, in a preferred embodiment, as Figure 4 As shown, two torque transmission members 4 can be provided, and the two torque transmission members 4 are symmetrically distributed along the axis of the support plate 1, and corresponding circular holes 5 are also provided accordingly, so that the force acting on the pressing member 2 is more uniform.

[0076] It is understandable that when the number of torque transmission members 4 is too large, the deflection of the pressing member 2 may be hindered and become stuck.

[0077] In one embodiment, the lower end of the torque transmission member 4 is provided with a thread, the upper end of the support plate 1 is provided with a threaded hole, and the lower end of the torque transmission member 4 is threadedly connected to the threaded hole. For easy installation, the upper end of the torque transmission member 4 can be provided with a countersunk hexagonal hole.

[0078] Similarly, if Figure 5 As shown, in this embodiment, two limiting members 7 are provided and are symmetrically distributed along the axis of the support plate 1 , and the limiting holes 8 correspond to the limiting members 7 .

[0079] like Figure 3 As shown, in order to facilitate fixing the position of the wafer, in this embodiment, a plurality of adsorption holes 11 are provided at the lower end of the lower pressing member 2, and a second air path channel 10 is provided in the lower pressing member 2, and the second air path channel 10 is connected with the adsorption holes 11; an air path connector 6 is provided on the lower pressing member 2, and the first end of the air path connector 6 is fixedly connected to the lower pressing member 2 and is connected with the second air path channel 10, and a seal is provided between the air path connector 6 and the lower pressing member 2, and the second end of the air path connector 6 slides and extends into the support plate 1.

[0080] Specifically, in this embodiment, the gas circuit connector 6 is fixed on the lower pressing member 2, the first end of the gas circuit connector 6 is connected to the second gas circuit channel 10 in the lower pressing member 2, and the second end of the gas circuit connector 6 can be connected to an external gas source, such as an external air pump. Under the action of the external gas source, the adsorption hole 11 is in a negative pressure state, so that the wafer under the lower pressing member 2 is adsorbed and fixed on the surface of the lower pressing member 2.

[0081] Since the pressing member 2 will move linearly axially relative to the support plate 1, the gas circuit connector 6 fixed to the pressing member 2 will also move linearly relative to the support plate 1. In this embodiment, a mounting hole is provided at the lower end of the support plate 1, and the upper end of the gas circuit connector 6 is slidably connected in the mounting hole, and the lower end of the gas circuit connector 6 extends into the pressing member 2 and is fixedly connected. The gas circuit connector 6 and the pressing member 2 can be fixed by threaded connection or by welding, etc. In this embodiment, by fixing the gas circuit connector 6 to the pressing member 2, a clearance fit can be achieved between the gas circuit connector 6 and the support plate 1 while ensuring air tightness, thereby facilitating the deflection of the pressing member 2 relative to the support plate 1.

[0082] In one embodiment, in order to reduce the interference between the gas circuit connector 6 and the support plate 1 during the deflection of the lower pressing member 2 , the gas circuit connector 6 may be located in the middle of the lower pressing member 2 and the support plate 1 .

[0083] In one embodiment, Figure 3 As shown, the lower pressing member 2 includes a ceramic panel 20 and a lower pressing head 21. The ceramic panel 20 is fixed to the lower end surface of the lower pressing head 21 by screws. The upper end surface of the ceramic panel 20 and the lower end surface of the lower pressing head 21 are sealed by a sealing ring 22. The upper end of the ceramic panel 20 is fixedly connected to the middle ring of the elastic film 90 through the second annular pressing plate 15. The inner ring and the outer ring of the elastic film 90 are fixedly connected to the lower end of the support plate 1 through the first annular pressing plate 14 and the third annular pressing plate 16 respectively. The lower end of the torque transmission member 4 is fixedly connected to the lower pressing head 21, the lower end of the limit member 7 is fixedly connected to the lower pressing head 21, and the lower end of the gas path connector 6 is fixedly connected to the lower pressing head 21. The lower end of the ceramic panel 20 is provided with an adsorption hole 11, a part of the second gas path channel 10 is provided on the ceramic panel 20, and the other part is provided on the lower pressing head 21.

[0084] In one embodiment, Figure 1 As shown, the polishing head further includes a retaining ring 17, which is sleeved and fixed on the support plate 1, the lower end of the retaining ring 17 extends out of the lower end of the support plate 1, and a first distance is formed between the lower end surface of the retaining ring 17 and the lower end surface of the support plate 1;

[0085] The upper portion of the pressing member 2 is located in the retaining ring 17 and has a second distance therebetween, and the lower portion of the pressing member 2 extends out of the retaining ring 17;

[0086] The maximum deflection angle of the press-down piece 2 is determined according to the first distance, the second distance, and the diameter of the press-down piece 2 .

[0087] Specifically, in this embodiment, the holding ring 17 is used to hold the pressing member 2 in a set area, i.e., in the area surrounded by the holding ring 17. The lower end surface of the holding ring 17 is located below the support plate 1. The upper portion of the pressing member 2 is located in the holding ring 17, and the lower portion extends out of the lower end surface of the holding ring 17. Therefore, the distance between the lower end surface of the holding ring 17 and the lower end surface of the support plate 1, i.e., the height of the portion where the upper portion of the pressing member 2 overlaps with the holding ring 17, is the first distance in this embodiment. Since the pressing member 2 will deflect at a certain angle in the area surrounded by the holding ring 17, a certain distance, i.e., a second distance, is required between the pressing member 2 and the holding ring 17.

[0088] According to the structure of the polishing head, the first spacing, the second spacing and the diameter of the lower pressing member 2 directly affect the maximum deflection angle of the lower pressing member 2. Therefore, when designing a product, the structure can be designed according to the relationship between the first spacing, the second spacing, the lower pressing member 2 and the maximum deflection angle, so that the final polishing head can meet the use requirements.

[0089] According to another aspect of the present invention, a single-side polishing device is provided, comprising the above-mentioned polishing press head.

[0090] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Within the spirit and principle of the present invention, any modification, equivalent replacement, improvement, etc. made shall be included in the protection scope of the present invention.

Claims

1. A polishing press head, characterized in that: include: A supporting plate, wherein a circular hole is provided on the supporting plate; A pressing member, the lower end surface of which is used to fix the wafer, and the pressing member is connected to the supporting plate via a flexible connecting member; A torque transmission member, the torque transmission member comprises a first connection portion and a second connection portion, the second connection portion is fixedly connected to the pressing member, the annular side surface of the first connection portion is configured as a curved surface convex outward, the curved surface is in clearance fit with the circular hole, and the second connection portion does not contact the circular hole; When the support plate transmits torque to the curved surface through the inner wall of the circular hole to drive the pressing member to rotate, the first connecting portion moves up and down in the circular hole to keep the lower end surface of the pressing member parallel to the polishing end surface.

2. The polishing head according to claim 1, characterized in that: The first connection portion is coaxially arranged with the second connection portion, and a maximum diameter of the first connection portion is greater than a maximum diameter of the second connection portion.

3. The polishing head according to claim 1, characterized in that: The pressing member is configured to be driven to move axially relative to the supporting plate, a limiting hole is provided on the supporting plate, and a first limiting portion is provided in the limiting hole; The polishing pressure head further comprises a limiting member, a first end of the limiting member is slidably connected with the limiting hole and has a clearance fit, the limiting member has a clearance fit with the first limiting portion, and a second end of the limiting member passes through the limiting hole and is fixedly connected with the lower pressing member; The first end of the limiting member is provided with a second limiting portion, and the second limiting portion cooperates with the first limiting portion to limit the maximum outward movement stroke of the first end of the limiting member in the limiting hole.

4. The polishing head according to claim 3, characterized in that: The matching clearance between the first limiting portion and the limiting member is greater than the matching clearance between the curved surface and the circular hole; The matching clearance between the second limiting portion and the limiting hole is greater than the matching clearance between the curved surface and the circular hole.

5. The polishing head according to claim 3, characterized in that: The first limiting portion comprises a first limiting protrusion disposed in the limiting hole, and an end portion of the first limiting protrusion is loosely matched with the limiting member; The second limiting portion includes a second limiting protrusion provided on the first end of the limiting member, the first limiting protrusion corresponds to the second limiting protrusion, and cooperates with each other to limit the maximum stroke of the first end of the limiting member in the limiting hole.

6. The polishing head according to claim 1, characterized in that: The polishing press head further comprises a first annular pressing plate, a second annular pressing plate and a third annular pressing plate, and the flexible connecting member comprises an elastic rubber film; The inner ring and the outer ring of the elastic rubber film are fixedly connected to the lower end surface of the support plate through the first annular pressing plate and the third annular pressing plate respectively; The middle ring of the elastic rubber film is fixedly connected to the upper end of the lower pressing member through the second annular pressing plate.

7. The polishing press head according to claim 1, characterized in that: The number of the torque transmission members is two and they are symmetrically distributed along the axis of the support plate, and the circular holes correspond to the torque transmission members.

8. The polishing head according to claim 3, characterized in that: The number of the limiting members is two and they are symmetrically distributed along the axis of the support plate, and the limiting holes correspond to the limiting members.

9. The polishing press head according to claim 1, characterized in that: A plurality of adsorption holes are arranged on one end of the lower pressing member away from the supporting plate, and a second air path is arranged inside the lower pressing member, and the second air path is communicated with the adsorption holes; An air circuit connector is provided on the lower pressure member, a first end of the air circuit connector is fixedly connected to the lower pressure member and communicated with the second air circuit channel, a seal is provided between the air circuit connector and the lower pressure member, and a second end of the air circuit connector slides and extends into the support plate.

10. A single-sided polishing device, characterized in that: Comprising the polishing press head as described in any one of claims 1 to 9.

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