AG treatment process of glass cover plate

Abstract

The invention relates to the technical field of glass processing technologies, in particular to an AG treatment technology of a glass cover plate, which specifically comprises the following steps: cleaning the surface of the glass cover plate by using a chemical cleaning agent, coating a layer of masking material on the glass cover plate, curing the masking material on the surface of the glass cover plate, and carrying out plasma treatment on the glass cover plate. The glass cover plate is put into etching liquid to be etched, the etching liquid is in a flowing state, nitric acid and sulfuric acid are added into the etching liquid to be used for controlling the etching quality, a uniform microscopic concave-convex structure is formed on the surface of the glass cover plate, and the glass cover plate is cleaned after etching is completed. According to the process, a uniform microscopic concave-convex structure can be formed on the surface of the glass cover plate, and the service life of the glass cover plate is longer.

Description

Technical Field

[0001] The invention relates to the technical field of glass processing technology, in particular to an AG processing technology for a glass cover plate. Background Art

[0002] AG glass, also known as anti-reflective glass and anti-glare glass, is a kind of glass with special processing on the surface. Its characteristic is that it changes the original reflective surface of the glass into a matte non-reflective surface.

[0003] The etching method is a glass AG treatment method with excellent surface strength, long product life, and excellent anti-fingerprint performance, but it also has limitations. The main one is that the glass cover produced by the etching process is uneven.

[0004] Therefore, it is necessary to design a process that can improve the uniformity of the AG processing of the glass cover plate. Summary of the invention

[0005] In order to solve the above problems, the present invention provides an AG processing process for a glass cover plate, which improves the quality of AG processing, increases the strength of the glass, and improves the visual clarity.

[0006] In order to achieve the above object, the present invention adopts the following technical solutions: The AG treatment process of the glass cover plate has the following specific steps: Step S1, cleaning the surface of the glass cover plate using a chemical cleaning agent; Step S2, coating a layer of masking material on the glass cover plate, and curing the masking material on the surface of the glass cover plate; Step S3, performing plasma treatment on the glass cover plate; Step S4, placing the glass cover plate into an etching solution for etching; Step S5, cleaning the glass cover plate after etching is completed; Step S6, performing a second plasma treatment on the glass cover plate; Step S7, cleaning and drying the glass cover plate; Step S8, performing high temperature annealing treatment on the glass cover plate processed in step S7; Step S9, coating a layer of anti-reflection coating on the surface of the glass cover plate.

[0007] Optionally, in one embodiment of the present invention, the etching solution is in a flowing state, and nitric acid and sulfuric acid are added to the etching solution to control the etching quality.

[0008] Optionally, in one embodiment of the present invention, the etching solution is hydrofluoric acid, and the concentration of the hydrofluoric acid is 5%-20%.

[0009] Optionally, in one embodiment of the present invention, the concentration of the nitric acid is 5%-15%, and the concentration of the sulfuric acid is 1%-10%.

[0010] Optionally, in one embodiment of the present invention, the etching treatment time in step S4 is 5 min-2 h.

[0011] Optionally, in one embodiment of the present invention, the masking material is silicon dioxide.

[0012] Optionally, in an embodiment of the present invention, the step S1 uses an ultrasonic cleaning device to clean the glass cover.

[0013] Optionally, in one embodiment of the present invention, the anti-reflective coating in step S9 is any one of silicon dioxide, titanium oxide or magnesium fluoride.

[0014] Beneficial effects of the present invention The AG treatment process of the glass cover plate of the present invention performs plasma treatment on the glass cover plate before etching to enhance the reactivity and adhesion of the surface of the glass cover plate and improve the adhesion of the masking material. During the etching process, nitric acid and sulfuric acid are added to the etching solution to assist the etching solution and achieve better etching quality. After etching, the glass cover plate is subjected to high-temperature annealing to eliminate the stress of the glass cover plate and improve the strength of the glass cover plate. The glass cover plate is subjected to a second plasma treatment to further clean and activate the surface of the glass cover plate. Finally, an anti-reflective coating is coated on the glass cover plate to reduce the reflection of the glass cover plate and improve the visual clarity. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art are briefly introduced below.

[0016] Figure 1 A schematic diagram of the process flow of Example 1 of the present invention; DETAILED DESCRIPTION

[0017] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined invention purpose, the specific implementation mode, structure, characteristics and effects of the present invention are described in detail below in combination with the accompanying drawings and preferred embodiments. Example 1

[0018] In order to improve the quality of AG processing of glass cover, a processing process of AG glass is designed. The specific scheme is as follows: like Figure 1 As shown in the figure, the AG processing process of the glass cover plate has the following specific steps: Step S1, cleaning the surface of the glass cover plate using a chemical cleaning agent; The surface of the glass cover is cleaned thoroughly to remove oil, dust and other impurities. In step S1, an ultrasonic cleaning device is used to clean the glass cover and a blood-activating cleaning agent is added to clean the glass cover.

[0019] Step S2, coating a layer of masking material on the glass cover plate, and curing the masking material on the surface of the glass cover plate; The masking material is silicon dioxide. A layer of silicon dioxide is coated on the parts of the glass cover that do not need to be etched to form a protective layer to prevent excessive etching by the etching solution.

[0020] Step S3, performing plasma treatment on the glass cover plate; In this embodiment, argon gas is used for plasma treatment to protect the glass surface from excessive oxidation and promote surface modification and activation. The discharge power is between 100W and 500W, preferably below 200W. If higher efficiency is required, a power of 250W or more can be selected. The treatment time is between 10min and 30min to ensure sufficient treatment.

[0021] Step S4, placing the glass cover plate into an etching solution for etching; The etching liquid is in a flowing state, and can be put into a stirring flowing state or a circulating flowing state by a stirrer or a water pump to make the etching liquid evenly distributed and reduce the risk of local over-etching. Nitric acid and sulfuric acid are added to the etching liquid to control the etching quality. The etching liquid is hydrofluoric acid, the concentration of hydrofluoric acid is 5%-20%, the concentration of nitric acid is 5%-15%, and the concentration of sulfuric acid is 1%-10%. The etching treatment time of step S4 is 5min-2h.

[0022] In addition to hydrofluoric acid, nitric acid and sulfuric acid, the etching solution also includes corrosion inhibitors and surfactants. In this embodiment, the concentration of hydrofluoric acid is 10%, the concentration of nitric acid is 8%, the concentration of sulfuric acid is 5%, the corrosion inhibitor is urea, the concentration of urea is 0.5%, and the surfactant is polyethylene glycol, the concentration of polyethylene glycol is 0.1%.

[0023] The etching time is 5min-1h, and the etching temperature is 25℃-40℃.

[0024] Step S5, after etching is completed, the glass cover is cleaned; after etching is completed, the glass is taken out and thoroughly rinsed with clean water to remove residual etching solution and impurities.

[0025] Step S6, performing a second plasma treatment on the glass cover plate; In this embodiment, since the glass cover plate has been subjected to the first plasma treatment, the glass cover plate is subjected to the second plasma treatment. Argon gas is used, and nitrogen gas may also be used. The discharge power is preferably between 150W and 400W, and the time is between 5min and 15min.

[0026] Step S7, cleaning and drying the glass cover plate; After etching is complete, remove the glass and rinse thoroughly with clean water to remove any remaining etching solution and impurities.

[0027] Dry the glass surface, usually using compressed air or an oven.

[0028] Step S8, performing high temperature annealing treatment on the glass cover plate processed in step S7; During high-temperature annealing treatment, sufficient gaps are maintained between the glass cover plates. The glass cover plates are sent into the annealing furnace and the temperature in the furnace is gradually increased. The heating speed is relatively slow to prevent the glass cover plates from breaking due to excessive temperature differences.

[0029] When the temperature in the furnace reaches the predetermined annealing temperature, the temperature setting mainly depends on the material of the glass cover. The annealing temperature is maintained for a period of time to release the stress inside the glass cover and make the structure more stable.

[0030] The specific operations are as follows: Step 1: Warm-up phase Place the glass cover plate into the annealing furnace and close the furnace door.

[0031] Set the temperature control program of the annealing furnace and start to gradually increase the temperature in the furnace. The heating speed in the preheating stage is usually slow to prevent the glass from breaking due to excessive temperature differences. The heating process can be divided into several stages, and the heating rate in each stage is different.

[0032] Step 2: High temperature maintenance stage When the temperature in the furnace reaches the predetermined annealing temperature, the temperature is maintained for a period of time. The purpose of this stage is to release the stress inside the glass and make the structure more stable.

[0033] The high temperature holding time is determined according to the thickness of the glass and the required annealing degree, ranging from a few hours to dozens of hours.

[0034] Step 3: Cooling Phase After the high temperature holding stage, the temperature in the furnace begins to slowly decrease. The cooling speed needs to be properly controlled. Too fast cooling may cause new stress or cracks in the glass.

[0035] The cooling stage is usually divided into several cooling intervals, and the cooling rate in each interval can be different. Generally, the cooling rate can be appropriately accelerated when the temperature is below 300°C.

[0036] Step 4: Remove from the oven When the temperature inside the furnace drops to a safe handling temperature (usually below 100°C), the furnace door can be opened and the glass cover can be taken out.

[0037] The glass cover was placed at room temperature and continued to cool to room temperature.

[0038] Step S9, coating a layer of anti-reflection coating on the surface of the glass cover plate.

[0039] The anti-reflection coating in step S9 is any one of silicon dioxide, titanium oxide or magnesium fluoride.

[0040] The AG treatment process of the glass cover plate of this scheme performs plasma treatment on the glass cover plate before etching to enhance the reactivity and adhesion of the surface of the glass cover plate and improve the adhesion of the masking material. During the etching process, nitric acid and sulfuric acid are added to the etching solution to assist the etching solution and achieve better etching quality. The high-temperature annealing treatment can not only eliminate the stress inside the glass and improve the mechanical strength and heat shock resistance of the glass, but also further optimize the optical properties of the glass. The glass cover plate is subjected to a second plasma treatment to further clean and activate the surface of the glass cover plate. Finally, an anti-reflective coating is applied to the glass cover plate to reduce the reflection of the glass cover plate and improve the visual clarity.

[0041] The above are only preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Although the present invention has been disclosed as above in the form of preferred embodiments, it is not intended to limit the present invention. Any technical personnel in the field can make some changes or modify the technical contents disclosed above into equivalent embodiments without departing from the scope of the technical solution of the present invention. However, any brief modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention are still within the scope of the technical solution of the present invention.

Claims

1. AG treatment process of glass cover, characterized by , the specific steps are as follows: Step S1, cleaning the surface of the glass cover plate using a chemical cleaning agent; Step S2, coating a layer of masking material on the glass cover plate, and curing the masking material on the surface of the glass cover plate; Step S3, performing plasma treatment on the glass cover plate; Step S4, placing the glass cover plate into an etching solution for etching; Step S5, cleaning the glass cover plate after etching is completed; Step S6, performing a second plasma treatment on the glass cover plate; Step S7, cleaning and drying the glass cover plate; Step S8, performing high temperature annealing treatment on the glass cover plate processed in step S7; Step S9, coating a layer of anti-reflection coating on the surface of the glass cover plate.

2. The AG treatment process for a glass cover plate according to claim 1, characterized in that: The etching solution is in a flowing state, and nitric acid and sulfuric acid are added to the etching solution to control the etching quality.

3. The AG treatment process for a glass cover plate according to claim 1, characterized in that: The etching solution is hydrofluoric acid, and the concentration of the hydrofluoric acid is 5%-20%.

4. The AG treatment process for a glass cover plate according to claim 2, characterized in that: The concentration of the nitric acid is 5%-15%, and the concentration of the sulfuric acid is 1%-10%.

5. The AG treatment process for a glass cover plate according to claim 1, characterized in that: The etching treatment time in step S4 is 5 min-2 h.

6. The AG treatment process for a glass cover plate according to claim 1, characterized in that: The masking material is silicon dioxide.

7. The AG treatment process for a glass cover plate according to claim 1, characterized in that: In the step S1, ultrasonic cleaning equipment is used to clean the glass cover plate.

8. The AG treatment process for a glass cover plate according to claim 1, characterized in that: The anti-reflection coating in step S9 is any one of silicon dioxide, titanium oxide or magnesium fluoride.

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