Triple electrode device for mixed gas / separated gas fusion device
By designing a triple electrode device including an electrode cover and multiple shower head units, the problem of the need for separate design and verification of existing PECVD and PEALD devices is solved, and the simplification of the equipment fusion and verification process is achieved.
Patent Information
- Application Number
- CN202411161282.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-09-04
- Filing Date
- 2024-08-22
- Publication Date
- 2025-03-04
AI Technical Summary
The existing PECVD and PEALD equipment require separate design and manufacturing due to different deposition methods, which makes the verification process expensive and time-consuming.
A triple electrode device is designed, including an electrode cover, a first showerhead unit, a second showerhead unit and a third showerhead unit, which can provide a fusion device of a mixture and a separation gas in a PECVD or PEALD process.
The integration of PECVD and PEALD devices into one device is achieved, simplifying the equipment design and verification process and reducing costs and time.
Smart Images
Figure CN119553252A_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to a triple electrode device, which can provide a mixed gas / separated gas fusion device in a deposition device using plasma such as a PECVD process or a PEALD process. Background Art
[0002] A plasma enhanced chemical vapor deposition (PECVD) device is a device that uses the energy within a plasma to induce a reaction (Deposition) on the wafer surface at a higher temperature than the existing CVD process.
[0003] The Plasma-Enhanced Atomic Layer Deposition (PALD) device is a technical device that uses electromagnetic fields and plasma to deposit atomic layers layer by layer on a solid surface to form an extremely thin film. This device can achieve the preparation of ultra-thin films at the nanoscale.
[0004] PECVD and PEALD are plasma deposition methods widely used in semiconductor and display manufacturing processes. Specifically, PECVD involves the process of dissociating mixed gases for deposition, while PEALD uses separate precursors and reactive gases for deposition.
[0005] As mentioned above, due to the different deposition methods, PECVD and PEALD are designed and manufactured as equipment with different electrode and showerhead structures, and therefore need to go through a validation process that is both expensive and time-consuming.
[0006]
Related technical literature
[0007] (Patent Document 2) Patent Publication No. 10-2006-0076714 (publication date: 2006.07.04). Summary of the invention
[0008] The present disclosure aims to provide a triple electrode device, which can provide a mixed gas and separated gas fusion device in a deposition device using plasma such as a PECVD process or a PEALD process.
[0009] In order to achieve the objective, according to one embodiment of the present disclosure, a triple electrode device includes: an electrode cover for applying radio frequency power; a first shower head unit, on the top of which the electrode cover is provided, and equipped with a first gas supply unit for inputting a first gas, and a plurality of nozzle rods extending therefrom are provided below, and the first gas diffused in the first gas supply unit is discharged via the nozzle rods; a second shower head unit, located below the first shower head unit and combined with the first shower head unit, provided with a second gas supply unit for inputting a second gas, and formed with a through hole and a plurality of exhaust holes, the through hole being used for each of the nozzle rods to pass through and insert, and the second gas diffused in the second gas supply unit is discharged via the plurality of exhaust holes; and a third shower head unit, selectively installed below the second shower head unit, and used to discharge a mixed gas of the first gas and the second gas.
[0010] Preferably, the second shower head unit comprises a connecting portion formed along an outer circumferential edge of the second shower head unit, and the connecting portion enables the third shower head unit to be snap-fastened.
[0011] Preferably, the electrode cover comprises: a first gas supply port for inputting a first gas; a second gas supply port for inputting a second gas; and a first baffle for diffusing the first gas input through the first gas supply port to the first gas supply unit.
[0012] More preferably, the first gas supply port also serves as a contact point for applying radio frequency power. More preferably, the first baffle is disposed at a central position of the electrode cover.
[0013] Preferably, the first showerhead unit further comprises a second baffle for diffusing the second gas provided through the second gas supply port and supplied to the internal flow path to the second gas supply unit, and more preferably, the second baffle is disposed at a central position of the first showerhead unit.
[0014] In the substrate processing method disclosed in the present invention, the triple electrode device is used to perform deposition or etching on the substrate by using a mixed gas of a first gas and a second gas.
[0015] In addition, in the substrate processing method disclosed in the present invention, the triple electrode device is used to perform deposition or etching on the substrate by using separation gases of the first gas and the second gas.
[0016] The triple electrode device disclosed in the present invention includes: an electrode cover for applying radio frequency power; a first shower head unit, which is provided with the electrode cover at the top and is equipped with a first gas supply unit for inputting a first gas, and a plurality of nozzle rods extending below are provided, and the first gas diffused in the first gas supply unit is discharged through the nozzle rods; a second shower head unit, which is located below the first shower head unit and combined with the first shower head unit, is provided with a second gas supply unit for inputting a second gas, and is formed with a through hole and a plurality of exhaust holes, and the through hole is used for each of the nozzle rods to penetrate and insert, and the second gas diffused in the second gas supply unit is discharged through the plurality of exhaust holes; and a third shower head unit, which is selectively installed below the second shower head unit, and is used to discharge a mixed gas of the first gas and the second gas. The effect of the present invention is that the PECVD device and the PEALD device designed and manufactured separately in the related art can be integrated into one device. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 is a schematic structural diagram of a PECVD device including a triple electrode device according to an embodiment of the present disclosure.
[0018] Figure 2 is an exploded structural diagram of a triple electrode device according to an embodiment of the present disclosure.
[0019] Figure 3 (a) and (b) are bottom views of a first showerhead unit and a second showerhead unit in a triple electrode device according to an embodiment of the present disclosure, respectively.
[0020] Figure 4 is a schematic structural diagram of a PEALD device including a triple electrode device according to an embodiment of the present disclosure.
[0021] Figure 5 is a graph showing a gas supply process in a PEALD device including a triple electrode device according to an embodiment of the present disclosure.
[0022] Description of Reference Numerals 110: electrode cover; 111: first gas supply port; 112: second gas supply port; 113: first baffle; 120: a first shower head unit; 121: a first gas supply unit; 122: nozzle rod; 122a: nozzle hole; 121: first gas supply unit; 130: second shower head unit; 131: second gas supply unit; 132: through hole; 133: exhaust hole; 140: third sprinkler head unit; 141: mixed gas supply unit; 142: mixed gas supply nozzle; 150: edge blocking block; 231: radio frequency power supply unit; 232: impedance matching unit; 241: bias RF power supply unit; 242: Bias impedance matching unit. DETAILED DESCRIPTION
[0023] The description of certain structures or functions proposed in the embodiments of the present disclosure is only used to illustrate the embodiments according to the concepts of the present disclosure, and the embodiments according to the concepts of the present disclosure can be implemented in various forms. In addition, it should not be interpreted as being limited to the embodiments described in this specification, but should be understood to include all modifications, equivalents or substitutions within the scope of the ideas and technologies of the present disclosure.
[0024] On the other hand, in the present disclosure, terms such as "first" and / or "second" may be used to describe various components, but the components are not limited to the terms. The terms are only for the purpose of distinguishing one component from other components. For example, within the scope of the claims that do not depart from the concept of the present disclosure, a first component may be named a second component, and similarly, a second component may also be named a first component.
[0025] When a component is mentioned to be "connected" or "coupled" to another component, it may be directly connected or coupled to the other component, but other components may also exist in between. On the contrary, when a component is mentioned to be "directly connected to" or "directly in contact with" another component, it should be understood that there are no other components in between. Other expressions used to describe the relationship between components, namely, "between" and "just between" or "adjacent to" and "directly adjacent to" should also be interpreted in the same way.
[0026] The terms used in this specification are only used to illustrate specific embodiments, rather than to limit the intention of the present disclosure. Unless the context clearly indicates otherwise, singular expressions in the text should be understood to include plural expressions. The terms "including" or "having" used in this article are intended to indicate the presence of a certain feature, number, step, operation, component, part or combination thereof, and should not be understood to exclude the possibility of the presence or increase of one or more other features, numbers, steps, operations, components, parts or combinations thereof.
[0027] Specific embodiments of the present disclosure are described in detail below with reference to the accompanying drawings.
[0028] Figure 1 is a schematic structural diagram of a PECVD device including a triple electrode device according to an embodiment of the present disclosure, Figure 2 is an exploded structural diagram of a triple electrode device according to an embodiment of the present disclosure, Figure 3(a) and (b) are bottom views of a first showerhead unit and a second showerhead unit in a triple electrode device according to an embodiment of the present disclosure, respectively.
[0029] Reference Figures 1 to 3 According to the present embodiment, the triple electrode device 100 includes an electrode cover 110, a first shower head unit 120 and a second shower head unit 130. According to different processing modes (PECVD / PEALD), a third shower head unit 140 installed on the second shower head unit 130 may be selectively included.
[0030] The electrode cover 110 is a circular conductor plate for applying radio frequency power, and includes a first gas supply port 111 for inputting a first gas, a second gas supply port 112 for inputting a second gas, and a first baffle 113. The function of the first baffle 113 is to diffuse the first gas input through the first gas supply port 111 to the first gas supply unit 121. Each gas supply port 111, 112 is provided with a supply regulating valve V1, V2 for regulating the flow rate of the first gas and the flow rate of the second gas. Preferably, the first baffle 113 is arranged at the center of the electrode cover 110.
[0031] Preferably, the first gas supply port 111 is also used as a power contact point connected to a radio frequency power supply unit 231 for applying radio frequency power. The radio frequency power supply unit 231 may be connected to the first gas supply port 111 via an impedance matching unit 232 .
[0032] The first shower head unit 120 is provided with an electrode cover 110 at the top and is equipped with a first gas supply unit 121 for inputting the first gas. In addition, a plurality of extended nozzle rods 122 are provided, which are used to discharge the first gas diffused through the first gas supply unit 121, and a penetrating nozzle hole 122a is formed on the nozzle rod 122. Preferably, the nozzle rod 122 should be determined to have an appropriate length to ensure that the lower front end of the nozzle rod 122 can be located at the bottom position of the second shower head unit 130 when the first shower head unit 120 and the second shower head unit 130 are assembled.
[0033] The first showerhead unit 120 may include a second baffle 123 for diffusing the second gas provided through the second gas supply port 112 and entering the inner flow path 123 a . Preferably, the second baffle 123 is disposed at a central position of the first showerhead unit 120 .
[0034] The second spray head unit 130 is located below the first spray head unit 120 and is combined with the first spray head unit 120. The second spray head unit 130 is provided with a second gas supply unit 131 for inputting the second gas, and is formed with a through hole 132 and a plurality of exhaust holes 133. The through hole is used for each nozzle rod 122 to be inserted through, and the plurality of exhaust holes are used to discharge the second gas diffused through the second gas supply unit 131.
[0035] In addition, a stepped part 130a is provided on the inner circumferential surface of the second shower head unit 130, the first shower head unit 120 has a predetermined horizontal height difference, the first shower head unit 120 is inserted into the second shower head unit 130, and the second gas supply unit 131 is located between the first shower head unit 120 and the second shower head unit 130. Preferably, the electrode cover 110 and the second shower head unit 130 have the same outer diameter.
[0036] The second spray head unit 130 includes a connecting portion 134 located at the bottom thereof, which enables the third spray head unit 140 to be snap-fitted. In the present embodiment, the connecting portion 134 is provided by a step formed on the outer peripheral surface of the lower end of the second spray head unit 130, and the third spray head unit 140 is snap-fitted to the lower end of the second spray head unit 130 by external insertion.
[0037] The third shower head unit 140 may be selectively installed below the second shower head unit 130 and is provided with a mixed gas supply unit 141 for mixing the first gas and the second gas, and a mixed gas supply nozzle 142 for discharging the mixed gas is also formed.
[0038] Corresponding to the triple electrode device 100 , a bias electrode 210 for placing a substrate (such as a silicon wafer or glass) 1 is provided thereunder. The bias electrode 210 is equipped with a bias impedance matching unit 242 and is connected to a bias RF power supply unit 241 .
[0039] In the PECVD mode of the PECVD device thus constructed, after the first gas is input into the first gas supply unit 121 of the first shower head unit 120 and the second gas is input into the second gas supply unit 131 of the second shower head unit 130, the two gases are mixed in the mixed gas supply unit 141 of the third shower head unit 140 and uniformly supplied into the reaction chamber, the supplied mixed gas is dissociated by plasma, and then a deposition (or etching) process is performed on the substrate 1 through the mixed gas (PECVD) mode.
[0040] Figure 4 is a schematic structural diagram of a PEALD device including a triple electrode device according to an embodiment of the present disclosure, Figure 51 is a graph of a gas supply process in a PEALD device including a triple electrode device according to an embodiment of the present disclosure. The same structures as those in the previous embodiments use the same figure marks and repeated descriptions are omitted.
[0041] Reference Figure 4 According to the present embodiment, the triple electrode device 100 is used for the PEALD process, and like the previous embodiment, includes an electrode cover 110, a first showerhead unit 120 and a second showerhead unit 130. The difference is that in order to provide a mixed gas supply unit, the present embodiment uses an edge barrier block 150 instead of a third showerhead unit.
[0042] The edge blocking block 150 is snap-fastened to the connecting portion 134 of the second shower head unit 130 (see Figure 2 ).
[0043] In the PEALD mode, the PEALD device thus constructed supplies the first gas and the second gas in a time sequence by adjusting the first gas supply regulating valve V1 and the second gas supply regulating valve V2 (see Figure 4 ), here, the first gas and the second gas are directly supplied to the reaction chamber through the first shower head unit 120 and the second shower head unit 130 respectively, and the supplied first gas and the second gas are deposited or etched on the substrate 1 after being excited by plasma.
[0044] As described above, the triple electrode device of the present disclosure integrates the PECVD device and the PEALD device which are traditionally designed and manufactured separately, and achieves the effect of manufacturing these two devices in one device.
[0045] The present disclosure is not limited to the aforementioned embodiments and drawings, and it is obvious to those skilled in the art that various substitutions, deformations, and changes may be made to the present disclosure without departing from the technical concept of the present disclosure.
Claims
1. A triple electrode device, characterized in that: include: an electrode cover for applying radio frequency power; A first shower head unit, provided with the electrode cover at the top, and equipped with a first gas supply unit for inputting the first gas, and provided with a plurality of nozzle rods extending therefrom below, and the first gas diffused in the first gas supply unit is discharged through the nozzle rods; A second shower head unit is located below the first shower head unit and combined with the first shower head unit, and is provided with a second gas supply unit for inputting a second gas, and is formed with a through hole and a plurality of exhaust holes, wherein each of the nozzle rods is inserted through the through hole, and the second gas diffused in the second gas supply unit is discharged through the plurality of exhaust holes; as well as, The third shower head unit is selectively installed below the second shower head unit and is used to discharge a mixed gas of the first gas and the second gas.
2. The triple electrode device according to claim 1, characterized in that: The second shower head unit includes a connection portion formed along an outer circumferential edge of the second shower head unit, and the connection portion enables the third shower head unit to be snap-fastened.
3. The triple electrode device according to claim 1, characterized in that: The electrode cover comprises: A first gas supply port, used for inputting a first gas; A second gas supply port is used to input a second gas; and The first baffle is used to diffuse the first gas input through the first gas supply port to the first gas supply unit.
4. The triple electrode device according to claim 3, characterized in that: The first gas supply port also serves as a contact point for applying radio frequency power.
5. The triple electrode device according to claim 4, characterized in that: The first baffle is arranged at the center of the electrode cover.
6. The triple electrode device according to claim 3, characterized in that: The first shower head unit also includes: A second baffle for diffusing the second gas provided through the second gas supply port and supplied to the internal flow path to the second gas supply unit.
7. The triple electrode device according to claim 6, characterized in that: The second baffle is disposed at a center position of the first shower head unit.
8. A substrate processing method, characterized in that: The triple electrode device according to claim 1 is used to perform deposition or etching on a substrate by using a mixed gas of a first gas and a second gas.
9. A substrate processing method, characterized in that: With the triple electrode device of claim 1, deposition or etching of a substrate is performed by using separate gases of a first gas and a second gas.