Novel coating tool for specific base material in crystalline silicon industry

Abstract

The invention discloses a novel coating tool for a specific base material in the crystalline silicon industry, and relates to the technical field of crystalline silicon solar cells. The device comprises a base table, a fixing frame is fixed to the bottom face in the base table, a movable block is movably arranged in the fixing frame, a base plate is arranged on the upper surface of the movable block, a lifting table top is arranged on the upper surface of the base plate, and silicon wafers can be conveniently placed and fixed; the upper end of the threaded pipe is connected with the lower end face of the movable block, under the threaded fit of the threaded pipe and the lead screw, the movable block can be conveniently adjusted to move up and down, then the lifting table top is driven to move up and down, the device is suitable for silicon wafers with different thicknesses, and the problem that the thickness uniformity difference of each batch of silicon wafers is large is solved. And different gaskets need to be replaced to ensure that the gasket and the silicon wafer are on the same plane, so that the operation is relatively inconvenient.

Description

Technical Field

[0001] The invention belongs to the technical field of crystalline silicon solar cells, and in particular relates to a novel coating tool for a specific substrate in the crystalline silicon industry. Background Art

[0002] During the production and processing of crystalline silicon solar cells, coating tools are required to coat silicon wafers. Existing coating tools have the following disadvantages during use.

[0003] 1. The structural shape design of existing similar products is relatively conservative and simple. Due to the large difference in thickness uniformity of each batch of silicon wafers, different gaskets need to be replaced to ensure that they are on the same plane as the silicon wafers, otherwise it will affect the uniformity of film formation. The operation of repeatedly replacing different gaskets is more troublesome.

[0004] 2. There is a gap between the opening size in the middle of the gasket and the silicon wafer. During the coating process, the solution easily leaks from the gap between the gasket and the silicon wafer onto the sample stage, affecting the overall uniformity of the sample stage.

[0005] To this end, we designed a new coating tool for specific substrates in the crystalline silicon industry to solve the above problems. Summary of the invention

[0006] In order to solve the above technical problems, the present invention is achieved through the following technical solutions:

[0007] The present invention is a new type of coating tool for specific substrates in the crystalline silicon industry, comprising a base, a fixed frame is fixed to the bottom surface of the base, a movable block is movably arranged inside the fixed frame, a pad is arranged on the upper surface of the movable block, a lifting table is arranged on the upper surface of the pad, a through hole is opened on the lower side of the base, a threaded tube is movably arranged inside the through hole, a screw rod is matched with the internal thread of the threaded tube, and the upper end of the threaded tube is connected to the lower end surface of the movable block;

[0008] Combined with the above structure, the threaded tube and the screw rod are matched to facilitate the up and down rotation of the threaded tube, which drives the movable block to move up and down, thereby achieving the purpose of adjusting the up and down movement of the lifting table, and realizing the use of different thicknesses of the same batch of suede silicon wafers, meeting the process requirements of high-precision coating;

[0009] A substrate is arranged inside the base platform, a through groove is provided on the surface of the substrate, the through groove cooperates with the fixing frame, a support frame is provided outside the through groove and the support frame is fixed on the substrate, the fixing frame is arranged on the inner side of the support frame, a baffle is obliquely provided on the circumference of the inner wall of the support frame, a leakage port is provided on the lower side of the right surface of the support frame, the leakage port cooperates with the baffle, wherein under the action of the obliquely provided baffle, it is convenient to shield and guide the solution leaking from the gap between the silicon wafer and the lifting platform, and the leaked solution is collected in combination with the substrate, which effectively solves the problem that during the coating process, the solution is easy to leak from the gap between the gasket and the silicon wafer onto the sample stage, affecting the overall uniformity of the sample stage, and facilitates the implementation of the coating operation.

[0010] Preferably, a stepper motor is arranged on the lower side of the base, and the output shaft of the stepper motor is connected to the lower end of the lead screw.

[0011] Preferably, a mounting frame is fixedly connected to the center position of the lower surface of the base, and the stepping motor is arranged inside the mounting frame.

[0012] Preferably, both left and right surfaces of the movable block are provided with limiting grooves, and both upper sides of the left and right surfaces inside the fixing frame are fixedly connected to limiting plates, and the limiting plates and the limiting grooves cooperate with each other.

[0013] Preferably, a limiting rod is arranged inside the limiting groove, a circular hole is opened on the surface of the limiting plate, the circular hole and the limiting rod cooperate with each other, and the limiting rod passes through the circular hole, and the limiting plate and the limiting rod are slidably matched.

[0014] Preferably, a vacuum adsorption device is provided on the rear side of the base, and the adsorption port of the vacuum adsorption device cooperates with the inner cavity of the substrate.

[0015] Preferably, the minimum resolution of the stepper motor is 2 microns.

[0016] The present invention has the following beneficial effects:

[0017] The invention facilitates the up and down rotation of the threaded tube by cooperating with the thread of the screw rod, drives the up and down movement of the movable block, achieves the purpose of adjusting the up and down movement of the lifting table, realizes the use of the same batch of suede silicon wafers with different thicknesses, meets the process requirements of high-precision coating, and has high compatibility.

[0018] At the same time, under the action of the inclined baffle, it is convenient to block and guide the solution leaking from the gap between the silicon wafer and the lifting table, and collect the leaked solution in combination with the substrate, which effectively solves the problem that during the coating process, the solution easily leaks from the gap between the gasket and the silicon wafer to the sample stage, affecting the overall uniformity of the sample stage, achieving the purpose of solving the problems of seepage and leakage in the coating process, and facilitating the implementation of the coating operation;

[0019] The cooperation of the limit plate, the limit rod and the limit groove effectively limits the movable block, ensuring the stability of the movable block in moving up and down, thereby ensuring the stability of the lifting table in the process of adapting to silicon wafers of different thicknesses and adjusting the up and down movement.

[0020] Of course, any product implementing the present invention does not necessarily need to achieve all of the advantages described above at the same time. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for describing the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying creative work.

[0022] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0023] Figure 2 A top view of the present invention;

[0024] Figure 3 for Figure 2 Structural diagram of the middle section AA;

[0025] Figure 4 for Figure 3 A schematic diagram of the enlarged structure at B in the middle;

[0026] Figure 5 for Figure 3 Schematic diagram of the enlarged structure at C in the middle;

[0027] Figure 6 for Figure 3 Schematic diagram of the enlarged structure at D in the middle.

[0028] In the accompanying drawings, the components represented by the reference numerals are listed as follows:

[0029] 1. Base; 2. Fixed frame; 3. Movable block; 4. Pad; 5. Lifting table; 6. Screw; 7. Threaded tube; 8. Substrate; 9. Support frame; 10. Baffle; 11. Leakage port; 12. Stepper motor; 13. Mounting frame; 14. Limiting groove; 15. Limiting plate; 16. Limiting rod. DETAILED DESCRIPTION

[0030] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0031] In the description of the present invention, it should be understood that the terms "upper", "middle", "outer", "inner" and the like indicating directions or positional relationships are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the components or elements referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as limiting the present invention.

[0032] See also Figure 1-Figure 6 As shown, the present invention is a new type of coating tooling for specific substrates in the crystalline silicon industry, comprising a base 1, a fixing frame 2 is fixed to the bottom surface of the base 1, a movable block 3 is movably arranged inside the fixing frame 2, a pad 4 is arranged on the upper surface of the movable block 3, a lifting table 5 is arranged on the upper surface of the pad 4, a through hole is opened on the lower side of the base 1, a threaded tube 7 is movably arranged inside the through hole, a screw rod 6 is matched with the internal thread of the threaded tube 7, and the upper end of the threaded tube 7 is connected to the lower end surface of the movable block 3;

[0033] Combined with the above structure, through the threaded cooperation between the threaded tube 7 and the screw rod 6, it is convenient to adjust the up and down rotation of the threaded tube 7, drive the up and down movement of the movable block 3, and achieve the purpose of adjusting the up and down movement of the lifting table 5, so as to achieve the use of different thicknesses of the same batch of suede silicon wafers, and meet the process requirements of high-precision coating;

[0034] A substrate 8 is arranged inside the base 1, and a through groove is provided on the surface of the substrate 8, and the through groove cooperates with the fixing frame 2. A support frame 9 is arranged outside the through groove, and the support frame 9 is fixed on the substrate 8, and the fixing frame 2 is arranged on the inner side of the support frame 9. A baffle 10 is obliquely arranged on the inner wall of the support frame 9, and a leakage port 11 is provided on the lower side of the right surface of the support frame 9, and the leakage port 11 cooperates with the baffle 10. Under the action of the obliquely arranged baffle 10, it is convenient to block and guide the solution leaking from the gap between the silicon wafer and the lifting platform 5, and the leaked solution is collected in combination with the substrate 8, which effectively solves the problem that the solution is easy to leak from the gap between the gasket and the silicon wafer onto the sample stage during the coating process, affecting the overall uniformity of the sample stage, and facilitates the implementation of the coating operation.

[0035] A stepper motor 12 is arranged on the lower side of the base 1, and the output shaft of the stepper motor 12 is connected to the lower end of the threaded tube 7. A mounting bracket 13 is fixedly connected to the center position of the lower surface of the base 1. The stepper motor 12 is arranged inside the mounting bracket 13. The minimum resolution of the stepper motor 12 is 2 microns. The stepper motor 12 is convenient for driving the screw rod 6 to rotate. With the cooperation of the threads of the threaded tube 7 and the screw rod 6, the purpose of adjusting the threaded tube 7 to rotate up and down is achieved, thereby achieving the purpose of adjusting the lifting platform 5 to move up and down, adapting to the use of silicon wafers of different thicknesses, achieving the purpose of automatic adjustment, and facilitating use. The mounting bracket 13 ensures the stability of the stepper motor 12, while preventing the stepper motor 12 from being exposed to the outside and colliding with external objects to cause damage, thereby improving the protection of the stepper motor 12.

[0036] Limiting grooves 14 are provided on the left and right surfaces of the movable block 3, and limiting plates 15 are fixedly connected to the upper sides of the left and right surfaces inside the fixed frame 2. The limiting plates 15 cooperate with the limiting grooves 14, and a limiting rod 16 is arranged inside the limiting grooves 14. A circular hole is provided on the surface of the limiting plate 15, and the circular hole cooperates with the limiting rod 16, and the limiting rod 16 passes through the circular hole. The limiting plate 15 and the limiting rod 16 slide in cooperation. Through the mutual cooperation between the limiting plate 15 and the limiting grooves 14, combined with the sliding cooperation between the limiting plate 15 and the limiting rod 16, the movable block 3 is effectively limited, and the movable block 3 is prevented from rotating synchronously with the threaded tube 7 during the rotation of the screw rod 6, thereby ensuring the stability of the up and down movement of the movable block 3, and further ensuring the stability of the up and down movement of the lifting platform 5.

[0037] A vacuum adsorption device is arranged at the rear side of the base 1, and the adsorption port of the vacuum adsorption device cooperates with the inner cavity of the substrate 8. The leaked solution collected inside the substrate 8 can be conveniently extracted through the vacuum adsorption device, which is convenient for use.

[0038] Embodiment: During the use of the present invention, when silicon wafers of different thicknesses are used, the stepper motor 12 is first started, and the stepper motor 12 drives the screw rod 6 to rotate. Under the thread cooperation between the screw rod 6 and the threaded tube 7, the threaded tube 7 is driven to rotate up and down. Combined with the cooperation of the limit plate 15, the limit rod 16 and the limit groove 14, under the action of the movable block 3, the lifting table 5 is driven to move up and down stably to adapt to the use of silicon wafers of different thicknesses, thereby achieving the purpose of being compatible with silicon wafers of different thicknesses. It is not necessary to replace gaskets of different thicknesses to ensure the level between the silicon wafer and the screw rod 6, which is more convenient to use.

[0039] During the coating process, when the solution leaks from the gap between the silicon wafer and the lifting platform 5, the inclination of the baffle 10 facilitates the guidance of the leaked solution, and the solution received on the surface of the baffle 10 is drained into the interior of the substrate 8 in combination with the leakage port 11, so as to achieve the purpose of uniformly collecting the leaked solution. Finally, the solution collected in the interior of the substrate 8 is extracted by the adsorption effect of the vacuum adsorption device, which effectively solves the problem of seepage and leakage during the coating process.

[0040] The present invention controls the operation of the stepper motor 12 inside the tooling through a PLC host, and at the same time a laser is arranged on the top to calibrate the horizontal position between the tooling and the silicon wafer, and cooperates with the bottom stepper motor 12 to perform automatic real-time compensation, thereby achieving the purpose of adjusting silicon wafers of different thicknesses on the same plane without replacing different gaskets, ensuring the uniformity of film formation, and effectively improving the degree of automation of the tooling.

[0041] The present invention is designed for the process requirements of special material substrates in the crystalline silicon industry. Different from the base in the ordinary coating process, it can adjust the substrates of different thicknesses (between 100um-160um) in the same batch, optimize the coating and film-forming process, and is also equipped with a leakage collection design. Since the tooling is an independent individual, it is ensured that there will be no leakage onto the sample table.

[0042] The present invention can customize the size of the lifting platform 5 according to the different sizes of the silicon wafers, such as Figure 1 The lifting table 5 shown is of 210*210mm silicon wafer size, and the overall tooling thickness is 70mm.

[0043] It should be further explained that the installation structure, connection method or setting method of each component in the present invention are all common mechanical methods, and they can be implemented as long as they can achieve their beneficial effects. At the same time, the stepper motor 12 in the present invention is purchased on the market, and technical personnel in this field can install and use it as required.

[0044] In the description of this specification, the description with reference to the terms "one embodiment", "example", "specific example", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0045] The preferred embodiments of the present invention disclosed above are only used to help illustrate the present invention. The preferred embodiments do not describe all the details in detail, nor do they limit the invention to the specific implementation methods described. Obviously, many modifications and changes can be made according to the content of this specification. This specification selects and specifically describes these embodiments in order to better explain the principles and practical applications of the present invention, so that those skilled in the art can understand and use the present invention well. The present invention is limited only by the claims and their full scope and equivalents.

Claims

1. A new coating tool for a specific substrate in the crystalline silicon industry, comprising a base (1), characterized in that: A fixing frame (2) is fixed to the bottom surface of the base (1), a movable block (3) is movably arranged inside the fixing frame (2), a pad (4) is arranged on the upper surface of the movable block (3), a lifting table (5) is arranged on the upper surface of the pad (4), a through hole is opened on the lower side of the base (1), a threaded tube (7) is movably arranged inside the through hole, a screw rod (6) is matched with the internal thread of the threaded tube (7), and the upper end of the threaded tube (7) is connected to the lower end surface of the movable block (3); A substrate (8) is arranged inside the base (1), a through groove is provided on the surface of the substrate (8), the through groove cooperates with the fixing frame (2), a support frame (9) is arranged outside the through groove, and the support frame (9) is fixed on the substrate (8), the fixing frame (2) is arranged on the inner side of the support frame (9), a baffle (10) is obliquely arranged on the circumference of the inner wall of the support frame (9), a liquid leakage port (11) is provided on the lower side of the right surface of the support frame (9), and the liquid leakage port (11) cooperates with the baffle (10).

2. A new coating tool for specific substrates in the crystalline silicon industry according to claim 1, characterized in that: A stepper motor (12) is arranged on the lower side of the base (1), and an output shaft of the stepper motor (12) is connected to the lower end of the lead screw (6).

3. A new coating tool for specific substrates in the crystalline silicon industry according to claim 2, characterized in that: A mounting frame (13) is fixedly connected to the center position of the lower surface of the base (1), and the stepping motor (12) is arranged inside the mounting frame (13).

4. A new coating tool for specific substrates in the crystalline silicon industry according to claim 3, characterized in that: The movable block (3) is provided with limiting grooves (14) on both left and right surfaces, and the upper sides of both left and right surfaces inside the fixed frame (2) are fixedly connected to limiting plates (15), and the limiting plates (15) cooperate with the limiting grooves (14).

5. A new coating tool for specific substrates in the crystalline silicon industry according to claim 4, characterized in that: A limiting rod (16) is arranged inside the limiting groove (14), a circular hole is opened on the surface of the limiting plate (15), the circular hole and the limiting rod (16) cooperate with each other, and the limiting rod (16) passes through the circular hole, and the limiting plate (15) and the limiting rod (16) are slidably matched.

6. A new coating tool for specific substrates in the crystalline silicon industry according to claim 5, characterized in that: A vacuum adsorption device is arranged on the rear side of the base platform (1), and the adsorption port of the vacuum adsorption device cooperates with the inner cavity of the substrate (8).

7. A new coating tool for specific substrates in the crystalline silicon industry according to claim 6, characterized in that: The minimum resolution of the stepper motor (12) is 2 microns.

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