Heat insulation structure and preparation method thereof
By using a layer of inert charged ionic group mixture formed by bombardment by high-energy electrons in the thermal insulation structure and adsorbing the layer through electrodes, the problems of poor insulation effect, poor sound insulation effect, high energy consumption and short service life in the prior art are solved, and more efficient insulation performance and longer service life are achieved.
Patent Information
- Application Number
- CN202411806188.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-10
- Publication Date
- 2025-03-07
AI Technical Summary
In the prior art, the thermal insulation glass has poor insulation effect, poor sound insulation effect, high energy consumption and short service life, mainly due to factors such as structural structure, material selection, manufacturing process and use environment.
A heat-breaking and insulation structure is adopted, which includes a layer structure, an ion layer and an electrode. The ion layer is formed by bombarding the inert charged ionic group mixture layer by high-energy electrons and the sixth sub-main group element element element. The electrode is arranged in the cavity of the layer structure and is continuously energized to adsorb the charged ionic group layer.
This structure can effectively block infrared and ultraviolet rays, reduce heat convection and conduction, significantly improve thermal insulation performance, and extend service life.
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Figure CN119572108A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of thermal insulation of building materials, and in particular to a thermal insulation structure and a preparation method thereof. Background Art
[0002] With the advancement of science and technology, more and more new thermal insulation glasses have been developed. These glasses have effectively improved their thermal insulation performance through special design and material selection. At the same time, the introduction of some advanced production processes and equipment has further improved the quality and performance of glass products. However, the existing problems cannot be ignored. The problems existing in thermal insulation technology mainly include poor thermal insulation effect, unsatisfactory sound insulation effect, high energy consumption and relatively short service life. These problems are mainly caused by factors such as structural construction, material selection, manufacturing process and use environment. Therefore, a new thermal insulation structure is needed to solve the existing problems. Summary of the invention
[0003] The embodiment of the present invention provides a thermal insulation structure and a preparation method thereof to solve one or more technical problems encountered in the prior art.
[0004] In a first aspect, an embodiment of the present invention provides a thermal insulation structure, comprising:
[0005] A layer structure, wherein the layer structure includes at least one layer of cavity between the layers;
[0006] An ion layer, wherein the ion layer is a mixture layer of inert charged ion groups formed by high-energy electron bombardment of a single substance of a zero-group element and a single substance of a sixth sub-main-group element, and the ion layer is filled in a cavity within the layer structure;
[0007] The electrode is arranged in the cavity of the layer structure, and the electrode is continuously energized to adsorb the charged ion group layer.
[0008] In a preferred embodiment, the zero group element single substance includes a gas single substance selected from helium, neon, argon, krypton, xenon, and radon.
[0009] In a preferred embodiment, the sixth sub-main group element single substance includes a metal single substance selected from chromium, molybdenum and tungsten.
[0010] In a preferred embodiment, the light transmittance of the layer structure is above 40%.
[0011] In a second aspect, an embodiment of the present invention provides a method for preparing a thermal insulation structure, comprising:
[0012] preparing a layer structure including at least one layer of cavities;
[0013] A mixture layer of inert charged ion groups formed by high-energy electron bombardment of a single substance of a zero group element and a single substance of a sixth sub-main group element;
[0014] The gas in the cavity is evacuated to form a negative pressure structure;
[0015] Filling the inert charged ion group mixture layer into the cavity of the layer structure and sealing it;
[0016] Electrodes are arranged in the cavities in the layer structure and are continuously energized.
[0017] In a preferred embodiment, the zero group element single substance includes a gas single substance selected from helium, neon, argon, krypton, xenon, and radon.
[0018] In a preferred embodiment, the sixth sub-main group element single substance includes a metal single substance selected from chromium, molybdenum and tungsten.
[0019] In a preferred embodiment, the high energy electron bombardment is ionization using an ultra-high voltage electromagnetic field of 5000V to 7000V.
[0020] One of the above technical solutions has the following advantages or beneficial effects: the inert charged ion group mixture formed by high-energy electron bombardment of the thermal insulation structure can block infrared and ultraviolet rays, and the obtained ions are attracted and adsorbed on the cathode through the electrode, showing their inherent inertness. As long as the electrode voltage continues to be output, it will remain adsorbed in place unchanged, infrared and ultraviolet rays will not form convection and conduction, and the radiation speed inside it is extremely slow.
[0021] The above summary is for illustrative purposes only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments and features described above, further aspects, embodiments and features of the present invention will be readily apparent by reference to the accompanying drawings and the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS
[0022] In the accompanying drawings, unless otherwise specified, the same reference numerals throughout the multiple drawings represent the same or similar parts or elements. These drawings are not necessarily drawn to scale. It should be understood that these drawings only depict some embodiments disclosed in the present invention and should not be regarded as limiting the scope of the present invention.
[0023] Figure 1 A cross-sectional view of a thermal insulation structure according to an embodiment of the present invention is shown. DETAILED DESCRIPTION
[0024] In the following, only some exemplary embodiments are briefly described. As those skilled in the art will appreciate, the described embodiments may be modified in various ways without departing from the spirit or scope of the present invention. Therefore, the drawings and descriptions are considered to be exemplary and non-restrictive in nature.
[0025] The embodiment of the present invention provides a heat insulation structure, see Figure 1 As shown, the thermal insulation junction includes a layer structure 100 , an ion layer and an electrode 300 .
[0026] The layer structure 100 includes at least one layer of cavities 200 therebetween.
[0027] The ion layer is a mixture layer of inert charged ion groups formed by high-energy electron bombardment of a single substance of a zero-group element and a single substance of a sixth sub-main-group element. The ion layer is filled in the cavity 200 in the layer structure 100 .
[0028] The electrode 300 is disposed in the cavity 200 of the layer structure 100, and the electrode 300 is continuously energized to adsorb the charged ion cluster layer.
[0029] Furthermore, the zero group element single substance includes a gas single substance selected from helium, neon, argon, krypton, xenon, and radon.
[0030] Furthermore, the sixth sub-main group element single substance includes a metal single substance selected from chromium, molybdenum and tungsten.
[0031] The thermal insulation structure of this embodiment can block infrared and ultraviolet rays through the inert charged ion group mixture formed by high-energy electron bombardment, and the obtained ions are attracted and adsorbed on the cathode through the electrode, showing their inherent inertness. As long as the electrode voltage continues to be output, it will remain adsorbed in the same place unchanged, and infrared and ultraviolet rays will not form convection and conduction, and the radiation speed inside it is extremely slow.
[0032] In a specific embodiment, the light transmittance of the layer structure is above 40%.
[0033] In a second aspect, an embodiment of the present invention provides a method for preparing a thermal insulation structure. Figure 1 As shown, the preparation method of the thermal insulation structure comprises the following steps:
[0034] S1: preparing a layer structure 100 including at least one layer of cavities 200 .
[0035] S2: A mixture layer of inert charged ion clusters formed by high-energy electron bombardment of a single substance of a zero group element and a single substance of a sixth sub-main group element.
[0036] S3: Evacuate the gas in the cavity 200 to form a negative pressure structure.
[0037] S4: Filling the inert charged ion group mixture layer into the cavity 200 of the layer structure 100 and sealing it.
[0038] S5: An electrode 300 is arranged in the cavity 200 in the layer structure 100 and is continuously energized.
[0039] Furthermore, the zero group element single substance includes a gas single substance selected from helium, neon, argon, krypton, xenon, and radon.
[0040] Furthermore, the sixth sub-main group element single substance includes a metal single substance selected from chromium, molybdenum and tungsten.
[0041] Furthermore, the high energy electron bombardment is ionization using an ultra-high voltage electromagnetic field of 5000V to 7000V.
[0042] The thermal insulation structure of this embodiment can block infrared and ultraviolet rays through the inert charged ion group mixture formed by high-energy electron bombardment, and the obtained ions are attracted and adsorbed on the cathode through the electrode, showing their inherent inertness. As long as the electrode voltage continues to be output, it will remain adsorbed in the same place unchanged, and infrared and ultraviolet rays will not form convection and conduction, and the radiation speed inside it is extremely slow.
[0043] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine different embodiments or examples described in this specification and the features of different embodiments or examples, unless they are contradictory.
[0044] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.
[0045] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art can easily think of various changes or substitutions within the technical scope disclosed by the present invention, which should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.
Claims
1. A thermal insulation structure, characterized in that: include: A layer structure, wherein the layer structure includes at least one layer of cavity between the layers; An ion layer, wherein the ion layer is a mixture layer of inert charged ion groups formed by high-energy electron bombardment of a single substance of a zero-group element and a single substance of a sixth sub-main-group element, and the ion layer is filled in a cavity within the layer structure; The electrode is arranged in the cavity of the layer structure, and the electrode is continuously energized to adsorb the charged ion group layer.
2. The thermal insulation structure according to claim 1, characterized in that: The zero group element single substance includes a gas single substance selected from helium, neon, argon, krypton, xenon and radon.
3. The thermal insulation structure according to claim 1, characterized in that: The sixth sub-main group element single substance includes a metal single substance selected from chromium, molybdenum and tungsten.
4. The thermal insulation structure according to claim 1, characterized in that: The light transmittance of the layer structure is above 40%.
5. A method for preparing a thermal insulation structure, characterized in that: include: preparing a layer structure including at least one layer of cavities; A mixture layer of inert charged ion groups formed by high-energy electron bombardment of a single substance of a zero group element and a single substance of a sixth sub-main group element; The gas in the cavity is evacuated to form a negative pressure structure; Filling the inert charged ion group mixture layer into the cavity of the layer structure and sealing it; Electrodes are arranged in the cavities in the layer structure and are continuously energized.
6. The method for preparing the thermal insulation structure according to claim 5, characterized in that: The zero group element single substance includes a gas single substance selected from helium, neon, argon, krypton, xenon and radon.
7. The method for preparing the thermal insulation structure according to claim 5, characterized in that: The sixth sub-main group element single substance includes a metal single substance selected from chromium, molybdenum and tungsten.
8. The method for preparing a thermal insulation structure according to claim 5, characterized in that: The high energy electron bombardment is ionization using an ultra-high voltage electromagnetic field of 5000V to 7000V.