Anti-reflective film

By designing plasma processing and film forming steps in the antireflection film, controlling the total reflectance and peeling rate of the antireflection layer, the light scattering and peeling problems caused by the concave and convexity of the antireflection layer surface in the existing antireflection film are solved, and efficient reflection suppression and stable film performance are achieved.

CN119604786APending Publication Date: 2025-03-11NITTO DENKO CORP
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Patent Information

Application Number
CN202480003258.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2023-07-11
Filing Date
2024-07-09
Publication Date
2025-03-11

AI Technical Summary

Technical Problem

The conventional anti-reflection film includes a base material film, an adhesive layer and an anti-reflection layer in succession in the thickness direction. However, the surface concave and convexity of the anti-reflection layer causes incident light to scatter, resulting in low anti-reflection properties, and the anti-reflection layer is easily peeled from the base material film.

Method used

An anti-reflection film is designed, which includes a base material film, an adhesion layer and an anti-reflection layer. Through the plasma treatment and film formation process, the total reflectance of the anti-reflection layer is controlled to be less than 0.40%, and the peeling rate of the anti-reflection layer is less than 20% in the weather resistance test.

Benefits of technology

Effective reflection suppression of incident light is achieved, the anti-reflection property of the anti-reflection film is ensured, and the reduction in anti-reflection property caused by peeling of the anti-reflection layer is suppressed in practical applications.

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Abstract

An anti-reflection film (X) according to the present invention is provided with a base film (10), an adhesion layer (21) on the base film (10), and an anti-reflection layer (22) on the adhesion layer (21). For the anti-reflection film (X), the total reflectivity of irradiation light having a wavelength of 380 nm to 780 nm from a standard light source (D65) to the anti-reflection layer (22) side is 0.40% or less. In the anti-reflection film (X), the peeling rate of the anti-reflection layer (22) in a predetermined second test after the predetermined first test is less than 20%.
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Citation Information

Patent Citations

  • Cured coating film, Anti-reflection hard coating film using it, polarization plate and image display device

    JP2008088309A

  • High-frequency antenna unit and plasma processing apparatus

    JP2013258153A

  • Antireflection film and image display unit

    JP2022065437A