Femtosecond laser based precision trimming device and method for hemispherical resonator
By using a femtosecond laser precision adjustment device and method, the problem of adjustment pit depth caused by multiple scans when adjusting a hemispherical resonator with a femtosecond laser was solved, which improved the standing wave stability of the resonator and the accuracy of the gyroscope, and achieved a highly efficient adjustment effect.
Patent Information
- Application Number
- CN202411529228.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-30
- Publication Date
- 2025-11-18
- Estimated Expiration
- 2044-10-30
AI Technical Summary
In existing technologies, femtosecond laser adjustment of hemispherical resonators suffers from problems such as large adjustment pit depths caused by multiple scans, which affect the standing wave stability of the resonator and the accuracy of the gyroscope.
A precision adjustment device based on femtosecond laser is adopted, including a vacuum system, a femtosecond laser adjustment system, a fixture, a workpiece motion system, and a mass imbalance testing system. Through an automatic focusing module and a workpiece rotation mechanism, the laser energy can be quickly adjusted and the resonator can be circumferentially adjusted, reducing the impact of large adjustment pits.
This effectively reduces the impact of adjustment pits on the standing wave stability of the resonator and the accuracy of the gyroscope, thus improving adjustment efficiency and accuracy.
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Figure CN119618258B_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of hemispherical resonator gyroscope technology, and particularly relates to a precision tuning device and method for a hemispherical resonator based on femtosecond laser. Background Technology
[0002] The hemispherical resonant gyroscope is a type of vibrating gyroscope that uses the precession effect of the standing wave on the lip of the hemispherical harmonic oscillator along the circumferential direction to sense the rotation of the base. It has advantages such as high precision, long life, small size and simple structure, and has broad application prospects in both military and civilian fields. It has become a hot topic in inertial technology research and application.
[0003] The realization of a high-precision rate integral hemispherical resonator gyroscope requires the hemispherical resonator to have a highly uniform circumferential mass distribution. In reality, factors such as insufficient processing precision or uneven material density during the molding process can lead to mass imbalance in the resonator, which seriously affects the accuracy and reliability of the gyroscope. Therefore, it is necessary to balance it.
[0004] Current leveling methods are achieved through mass removal, with common methods including chemical etching, picosecond laser etching, ion beam etching, and femtosecond laser etching. Chemical etching, primarily immersion-based, suffers from problems such as a large removal range and low leveling accuracy due to the instability of chemical solutions. Picosecond laser etching has drawbacks including high laser energy, low removal resolution, and significant impact on harmonic oscillator performance parameters. Ion beam etching suffers from low efficiency and thermal accumulation when leveling large unbalanced masses. Femtosecond laser etching, with its advantages of low thermal effect, high precision, and high efficiency, has become a hot topic in rapid leveling research.
[0005] Currently, femtosecond laser trimming uses point (or small-area) mass removal methods. After trimming the unbalanced mass of each harmonic, various sizes of laser trimming pits inevitably exist in the circumferential direction of the resonator. When there is a large unbalanced mass, multiple scans are required in the same area, resulting in a large depth of trimming pits. Furthermore, when the depth exceeds a certain order of magnitude, the trimming amount will have a significant impact on the stability of the resonator standing wave and the accuracy of the gyroscope. Therefore, the existing technology needs to be improved and further optimized. Summary of the Invention
[0006] The present invention aims to solve at least one of the technical problems existing in the prior art.
[0007] According to one aspect of the present invention, a precision adjustment device for a hemispherical resonator based on a femtosecond laser is provided. This device includes: a vacuum system, a femtosecond laser adjustment system, a fixture, a workpiece motion system, and a mass imbalance testing system. The vacuum system provides a vacuum environment for testing the hemispherical resonator. The femtosecond laser adjustment system includes an autofocus module, a laser optical path, a femtosecond laser, a femtosecond laser energy continuous control module, and a femtosecond laser graphical and control system. The femtosecond laser generates a femtosecond laser beam. The femtosecond laser energy continuous control module is connected to the femtosecond laser and is used to adjust the output energy of the femtosecond laser. The laser optical path is connected to the femtosecond laser and is used to adjust the femtosecond laser beam and transmit it to the autofocus module. The autofocus module adjusts the position of the femtosecond laser beam on the hemispherical resonator. The system includes: a focal length for the surface; a femtosecond laser graphics and control system connected to a femtosecond laser energy continuous modulation module for drawing laser processing graphics and setting scanning parameters to control the femtosecond laser processing of the hemispherical resonator; a fixture placed within a vacuum system for fixing the hemispherical resonator; a workpiece motion system within the vacuum system, including a workpiece rotation mechanism and a workpiece translation mechanism, with the fixture mounted on the workpiece rotation mechanism to achieve rotational motion of the fixture and the hemispherical resonator; a workpiece translation mechanism connected to the workpiece rotation mechanism to achieve three-directional translational motion of the hemispherical resonator and the workpiece rotation mechanism; and a mass imbalance testing system comprising a resonator excitation module and a testing module. The resonator excitation module, located within the vacuum system, is used to excite the hemispherical resonator; the testing module is used to detect the vibration of the excited hemispherical resonator.
[0008] Furthermore, the vacuum system includes a vacuum chamber, a composite vacuum gauge, and a dry pump-molecular pump combination system. The dry pump-molecular pump combination system is used to pump the vacuum level in the vacuum chamber to a set vacuum level, and the composite vacuum gauge is used to detect the vacuum level in the vacuum chamber.
[0009] Furthermore, the excitation methods of the resonator excitation module include hammering, piezoelectricity, ultrasound, interdigital electrodes, or capacitance.
[0010] Furthermore, the femtosecond laser-based precision adjustment device for hemispherical resonators also includes a vibration isolation platform. The vacuum system, femtosecond laser adjustment system, fixture, workpiece motion system, and mass imbalance testing system are all located on the vibration isolation platform.
[0011] According to another aspect of the present invention, a method for precise adjustment of a hemispherical harmonic oscillator based on a femtosecond laser is provided. This method uses the femtosecond laser-based hemispherical harmonic oscillator precision adjustment device described above to achieve precise adjustment of the hemispherical harmonic oscillator.
[0012] Furthermore, the femtosecond laser-based method for precise tuning of a hemispherical harmonic oscillator includes:
[0013] S1. Install the hemispherical resonator to be tested and adjusted onto the fixture, and control the vacuum system to the preset vacuum level;
[0014] S2. Obtain the mass parameters and angle parameters of the unbalanced mass of the hemispherical harmonic oscillator through the mass imbalance test system, and calculate the circumferential laser energy adjustment parameters of the harmonic oscillator.
[0015] S3. Start the femtosecond laser, adjust the laser beam path, and set the laser energy according to the circumferential laser energy adjustment parameters of the resonator. The femtosecond laser output energy is rapidly and continuously adjusted and controlled through the femtosecond laser energy continuous control module. The resonator is rotated by controlling the workpiece rotation mechanism. The rotation angle of the resonator corresponds one-to-one with the laser energy parameters to ensure angle synchronization. The focal length of the resonator surface is adjusted through the automatic focusing module and the workpiece translation mechanism. The hemispherical resonator is continuously adjusted circumferentially through the femtosecond laser graphic and control system.
[0016] S4. Repeat S2-S3 until the obtained unbalanced mass parameters meet the adjustment requirements.
[0017] Furthermore, step S2 specifically includes:
[0018] S21. The resonator is excited to the preset amplitude by the resonator excitation module, and the mass parameters and angle parameters of the unbalanced mass of the hemispherical resonator are obtained by the test module.
[0019] S22, according to Calculate the laser energy parameters used for circumferential tuning of the harmonic oscillator, where... For the angle of the lip of the hemispherical harmonic oscillator is Laser energy parameters at that time, This is the angle value of the lip of the hemispherical harmonic oscillator. T0 is the laser energy adjustment cycle; k is the rotation speed set by the workpiece rotation mechanism; m i Let be the mass parameter of the i-th harmonic unbalance mass. denoted as the angular parameter of the unbalanced mass of the i-th harmonic; l is the coefficient between the laser energy and the weight removal mass.
[0020] The present invention provides a precision adjustment device and method for a hemispherical resonator based on a femtosecond laser. The precision adjustment device for a hemispherical resonator based on a femtosecond laser can achieve rapid adjustment of laser energy through a continuous high-speed control module for femtosecond laser energy. It achieves circumferential harmonic adjustment of the resonator by rotating the workpiece, effectively reducing the impact of major adjustment pits on the stability of the resonator standing wave and the accuracy of the gyroscope. Attached Figure Description
[0021] The accompanying drawings, which form part of this specification, are provided to further illustrate embodiments of the invention and, together with the textual description, explain the principles of the invention. It is obvious that the drawings described below are merely some embodiments of the invention, and those skilled in the art can obtain other drawings based on these drawings without any creative effort.
[0022] Figure 1 A schematic diagram of a femtosecond laser-based precision tuning device for a hemispherical resonator, according to a specific embodiment of the present invention, is shown.
[0023] The above figures include the following reference numerals:
[0024] 1. Vacuum chamber; 2. Composite vacuum gauge; 3. Dry pump-molecular pump combined pump system; 4. Automatic focusing module; 5. Laser optical path; 6. Femtosecond laser; 7. Femtosecond laser energy continuous control module; 8. Femtosecond laser graphical control system; 9. Fixture; 10. Hemispherical resonator; 11. Workpiece rotation mechanism; 12. Workpiece translation mechanism; 13. Resonator excitation module; 14. Testing module; 15. Vibration isolation platform. Detailed Implementation
[0025] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of them. The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit the present invention or its application or use. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0026] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the exemplary embodiments according to this application. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.
[0027] Unless otherwise specifically stated, the relative arrangement, numerical expressions, and values of the components and steps described in these embodiments do not limit the scope of the invention. It should also be understood that, for ease of description, the dimensions of the various parts shown in the accompanying drawings are not drawn to actual scale. Techniques, methods, and devices known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and devices should be considered part of the specification. In all examples shown and discussed herein, any specific values should be interpreted as merely exemplary and not as limitations. Therefore, other examples of exemplary embodiments may have different values.
[0028] like Figure 1 As shown, according to a specific embodiment of the present invention, a precision adjustment device for a hemispherical resonator based on a femtosecond laser is provided. The device includes: a vacuum system, a femtosecond laser adjustment system, a fixture 9, a workpiece motion system, and a mass imbalance testing system.
[0029] The vacuum system is used to provide a vacuum environment for testing hemispherical harmonic oscillators;
[0030] The femtosecond laser trimming system includes an autofocus module 4, a laser optical path 5, a femtosecond laser 6, a femtosecond laser energy continuous adjustment module 7, and a femtosecond laser graphics and control system 8. The femtosecond laser 6 generates femtosecond laser light. The femtosecond laser energy continuous adjustment module 7 is connected to the femtosecond laser 6 and is used to adjust the output energy of the femtosecond laser. The laser optical path 5 is connected to the femtosecond laser 6 and is used to adjust the femtosecond laser light and transmit it to the autofocus module 4. The autofocus module 4 is used to adjust the focal length of the femtosecond laser light on the surface of the hemispherical resonator. The femtosecond laser graphics and control system 8 is connected to the femtosecond laser energy continuous adjustment module 7 and is used to draw the laser processing pattern and set the scanning parameters to control the femtosecond laser processing of the hemispherical resonator.
[0031] The clamp 9 is placed inside the vacuum system to fix the hemispherical harmonic oscillator 10;
[0032] The workpiece motion system is set inside the vacuum system and includes a workpiece rotation mechanism 11 and a workpiece translation mechanism 12. The fixture 9 is set on the workpiece rotation mechanism 11. The workpiece rotation mechanism 11 is used to realize the rotational motion of the fixture 9 and the hemispherical resonator 10. The workpiece translation mechanism 12 is connected to the workpiece rotation mechanism 11 and is used to realize the three-way translational motion of the hemispherical resonator 10 and the workpiece rotation mechanism 11.
[0033] The mass imbalance testing system includes a resonator excitation module 13 and a testing module 14; the resonator excitation module 13 is set in a vacuum system and is used to excite the hemispherical resonator 10; the testing module 14 is used to detect the vibration of the excited hemispherical resonator 10.
[0034] This configuration provides a precision adjustment device for a hemispherical resonator based on femtosecond laser. The device can achieve rapid adjustment of laser energy through a continuous high-speed control module for femtosecond laser energy, and achieve circumferential harmonic adjustment of the resonator by workpiece rotation, effectively reducing the impact of major overhauls on the stability of the resonator standing wave and the accuracy of the gyroscope.
[0035] Furthermore, in this invention, the configurable vacuum system includes a vacuum chamber 1, a composite vacuum gauge 2, and a dry pump-molecular pump combination system 3. The dry pump-molecular pump combination system 3 is used to pump the vacuum level in the vacuum chamber to a set vacuum level, and the composite vacuum gauge 2 is used to detect the vacuum level in the vacuum chamber 1.
[0036] As a specific embodiment of the present invention, the configurable laser optical path 5 includes a control switch, a reflector, an optical path parameter adjustment module, and a galvanometer scanning module, etc. The connection of each component can be set in a conventional manner.
[0037] As a specific embodiment of the present invention, the configurable workpiece translation mechanism 12 includes X, Y and Z axis translation structures.
[0038] As a specific embodiment of the present invention, the excitation modes of the resonator excitation module 13 include hammering, piezoelectric, ultrasonic, interdigital electrode or capacitor, etc.
[0039] Furthermore, in this invention, the femtosecond laser-based hemispherical resonator precision adjustment device also includes a vibration isolation platform 15. The vacuum system, femtosecond laser adjustment system, fixture 9, workpiece motion system, and mass imbalance test system are all located on the vibration isolation platform 15, which helps to isolate external vibrations and enable the system to always be in a stable and excellent working state.
[0040] According to another aspect of the present invention, a method for precise adjustment of a hemispherical resonator based on a femtosecond laser is provided. This method employs the femtosecond laser-based hemispherical resonator precision adjustment device described above to achieve precise adjustment of the hemispherical resonator. Specifically, the method includes:
[0041] S1. Install the hemispherical resonator to be tested and repaired onto the fixture 9, and control the vacuum system to the preset vacuum level;
[0042] S2. Obtain the mass parameters and angle parameters of the unbalanced mass of the hemispherical harmonic oscillator through the mass imbalance test system, and calculate the circumferential laser energy adjustment parameters of the harmonic oscillator.
[0043] S3. Start the femtosecond laser 6, adjust the laser beam path 5, set the laser energy according to the circumferential laser energy adjustment parameters of the resonator, and realize the rapid and continuous adjustment and control of the femtosecond laser output energy through the femtosecond laser energy continuous control module 7; realize the rotation of the resonator by controlling the workpiece rotation mechanism 11, and the rotation angle of the resonator corresponds one-to-one with the laser energy parameters to ensure the synchronization of the angle; realize the focal length adjustment of the resonator surface through the automatic focusing module 4 and the workpiece translation mechanism 12, and realize the continuous circumferential adjustment of the hemispherical resonator through the femtosecond laser graphic and control system 8;
[0044] S4. Repeat S2-S3 until the obtained unbalanced mass parameters meet the adjustment requirements.
[0045] Furthermore, in this invention, step S2 specifically includes:
[0046] S21. The resonator is excited to the preset amplitude by the resonator excitation module 13, and the mass parameters and angle parameters of the unbalanced mass of the hemispherical resonator are obtained by the test module 14.
[0047] S22, according to Calculate the laser energy parameters used for circumferential tuning of the harmonic oscillator, where... For the angle of the lip of the hemispherical harmonic oscillator is Laser energy parameters at that time, This is the angle value of the lip of the hemispherical harmonic oscillator. T0 is the laser energy adjustment cycle; k is the rotation speed set by the workpiece rotation mechanism; m i Let be the mass parameter of the i-th harmonic unbalance mass. denoted as the angular parameter of the unbalanced mass of the i-th harmonic; l is the coefficient between the laser energy and the weight removal mass.
[0048] To gain a further understanding of the present invention, the following description is provided in conjunction with... Figure 1 The precision adjustment device for a hemispherical resonator based on a femtosecond laser of the present invention will be described in detail.
[0049] like Figure 1 As shown, according to a specific embodiment of the present invention, a precision adjustment device for a hemispherical resonator based on a femtosecond laser is provided, comprising: a vacuum system, a femtosecond laser adjustment system, a fixture 9, a workpiece motion system, a mass imbalance testing system, and a vibration isolation platform 15.
[0050] The vacuum system includes a vacuum chamber 1, a composite vacuum gauge 2, and a dry pump-molecular pump combination system 3. The dry pump-molecular pump combination system 3 is used to pump the vacuum level in the vacuum chamber to a set vacuum level, and the composite vacuum gauge 2 is used to detect the vacuum level in the vacuum chamber 1.
[0051] The femtosecond laser trimming system includes an autofocus module 4, a laser optical path 5, a femtosecond laser 6, a femtosecond laser energy continuous high-speed control module 7, and a femtosecond laser graphics and control system 8. The femtosecond laser 6 is used to generate femtosecond lasers; the laser optical path 5 includes control switches, reflectors, optical path parameter adjustment modules, galvanometer scanning modules, etc., for adjusting the processing laser; the autofocus module 4, in conjunction with the workpiece translation mechanism 12, realizes the focal length adjustment of the surface of the hemispherical resonator to be tested and trimmed; the femtosecond laser energy continuous high-speed control module 4 is used to realize the rapid and continuous adjustment and control of the femtosecond laser output energy; the femtosecond laser graphics and control system 8 is used to draw the laser processing graphics and set parameters such as scanning speed, scanning path, and number of cycles, and control the femtosecond laser processing of the hemispherical resonator.
[0052] The fixture 9 is set inside the vacuum chamber, and the hemispherical resonator 10 to be tested and adjusted is fixedly set on the fixture.
[0053] The workpiece motion system is set inside the vacuum chamber 1, and includes a workpiece rotation mechanism 11 and a workpiece translation mechanism 12. The fixture 9 is set on the workpiece rotation mechanism 11. The workpiece rotation mechanism 11 is used to realize the rotation of the fixture 9 and the hemispherical resonator 10. The workpiece translation mechanism 12 is connected to the workpiece rotation mechanism 11 and is used to realize the three-way translation of the hemispherical resonator 10 and the workpiece rotation mechanism 11.
[0054] The mass imbalance testing system includes a resonator excitation module 13 and a testing module 14. The resonator excitation module 13, located in the vacuum chamber 1, is used to excite the hemispherical resonator 10 to be tested and adjusted, including excitation methods such as hammering, piezoelectric, ultrasonic, interdigital electrodes, and capacitance. The testing module 14 is used to detect the vibration of the excited hemispherical resonator 10 to obtain the mass parameters and angle parameters of the unbalanced mass of the hemispherical resonator.
[0055] All components are placed on the vibration isolation platform 15, which helps to isolate external vibrations and ensures that the system is always in a stable and excellent working condition.
[0056] For ease of description, spatial relative terms such as "above," "on top of," "on the upper surface of," "above," etc., are used herein to describe the spatial positional relationship of a device or feature as shown in the figures to other devices or features. It should be understood that spatial relative terms are intended to encompass different orientations in use or operation beyond the orientation of the device as described in the figures. For example, if the device in the figures were inverted, a device described as "above" or "on top of" other devices or structures would subsequently be positioned as "below" or "under" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below." The device may also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein will be interpreted accordingly.
[0057] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.
Claims
1. A method for precise tuning of a hemispherical harmonic oscillator based on femtosecond laser, characterized in that, The aforementioned method for precise tuning of a hemispherical harmonic oscillator based on femtosecond lasers includes: S1. Install the hemispherical resonator to be tested and adjusted onto the fixture (9) and control the vacuum system to the preset vacuum level; S2. Obtain the mass parameters and angle parameters of the unbalanced mass of the hemispherical harmonic oscillator through the mass imbalance test system, and calculate the circumferential laser energy adjustment parameters of the harmonic oscillator. S3. Start the femtosecond laser (6), adjust the laser path (5), set the laser energy according to the circumferential laser energy adjustment parameters of the resonator, and realize the rapid and continuous adjustment and control of the femtosecond laser output energy through the femtosecond laser energy continuous control module (7); realize the rotation of the resonator by controlling the workpiece rotation mechanism (11), and the rotation angle of the resonator corresponds one-to-one with the laser energy parameters to ensure the synchronization of the angle; adjust the focal length of the resonator surface through the automatic focusing module (4) and the workpiece translation mechanism (12), and continuously adjust the circumferential of the hemispherical resonator through the femtosecond laser graphics and control system (8); S4. Repeat S2-S3 until the obtained unbalanced mass parameters meet the adjustment requirements. Specifically, step S2 includes: S21. The resonator is excited to the preset amplitude by the resonator excitation module (13), and the mass parameters and angle parameters of the unbalanced mass of the hemispherical resonator are obtained by the test module (14). S22, according to Calculate the laser energy parameters used for circumferential tuning of the harmonic oscillator, where... For the angle of the lip of the hemispherical harmonic oscillator is Laser energy parameters at that time, This is the angle value of the lip of the hemispherical harmonic oscillator. T0 is the laser energy adjustment cycle; k is the rotation speed set by the workpiece rotation mechanism; m i Let be the mass parameter of the i-th harmonic unbalance mass. denoted as the angular parameter of the i-th harmonic unbalanced mass; l is the coefficient between laser energy and deweight removal mass. The femtosecond laser-based hemispherical harmonic oscillator precision adjustment method uses a femtosecond laser-based hemispherical harmonic oscillator precision adjustment device to achieve precision adjustment of the hemispherical harmonic oscillator. The femtosecond laser-based hemispherical harmonic oscillator precision adjustment device includes: a vacuum system, a femtosecond laser adjustment system, a fixture (9), a workpiece motion system, and a mass imbalance test system. The vacuum system is used to provide a vacuum environment for testing the hemispherical harmonic oscillator; The femtosecond laser trimming system includes an autofocus module (4), a laser optical path (5), a femtosecond laser (6), a femtosecond laser energy continuous control module (7), and a femtosecond laser graphics and control system (8). The femtosecond laser (6) is used to generate femtosecond laser; the femtosecond laser energy continuous control module (7) is connected to the femtosecond laser (6) and is used to adjust the output energy of the femtosecond laser; the laser optical path (5) is connected to the femtosecond laser (6) and is used to adjust the femtosecond laser and transmit it to the autofocus module (4); the autofocus module (4) is used to adjust the focal length of the femtosecond laser on the surface of the hemispherical harmonic oscillator; the femtosecond laser graphics and control system (8) is connected to the femtosecond laser energy continuous control module (7) and is used to draw laser processing graphics and set scanning parameters to control the femtosecond laser processing of the hemispherical harmonic oscillator; The clamp (9) is placed inside the vacuum system to fix the hemispherical harmonic oscillator (10); The workpiece motion system is set within the vacuum system and includes a workpiece rotation mechanism (11) and a workpiece translation mechanism (12). The fixture (9) is mounted on the workpiece rotation mechanism (11), which is used to realize the rotation of the fixture (9) and the hemispherical harmonic oscillator (10). The workpiece translation mechanism (12) is connected to the workpiece rotation mechanism (11) and is used to realize the three-directional translation of the hemispherical harmonic oscillator (10) and the workpiece rotation mechanism (11). The mass imbalance test system includes a resonator excitation module (13) and a test module (14); the resonator excitation module (13) is located in the vacuum system and is used to excite the hemispherical resonator (10); The test module (14) is used to detect the vibration of the excited hemispherical harmonic oscillator (10).
2. The method for precise adjustment of a hemispherical harmonic oscillator based on femtosecond laser according to claim 1, characterized in that, The vacuum system includes a vacuum chamber (1), a composite vacuum gauge (2), and a dry pump-molecular pump combination system (3). The dry pump-molecular pump combination system (3) is used to pump the vacuum level in the vacuum chamber to a set vacuum level, and the composite vacuum gauge (2) is used to detect the vacuum level in the vacuum chamber (1).
3. The method for precise adjustment of a hemispherical harmonic oscillator based on femtosecond laser according to claim 1, characterized in that, The excitation methods of the resonator excitation module (13) include hammering, piezoelectricity, ultrasound, interdigital electrodes or capacitors.
4. The method for precise adjustment of a hemispherical harmonic oscillator based on femtosecond laser according to claim 1, characterized in that, The femtosecond laser-based hemispherical resonator precision adjustment device also includes a vibration isolation platform (15), and the vacuum system, the femtosecond laser adjustment system, the fixture (9), the workpiece motion system and the mass imbalance test system are all located on the vibration isolation platform (15).
Citation Information
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