Substrate processing apparatus

Abstract

The invention provides a substrate processing apparatus capable of shortening the time required from replacement of a cleaning tool to restart of cleaning processing using the cleaning tool. The substrate processing apparatus includes a substrate holding device, a brush arm, a plurality of brush devices, a brush storage device, and a brush liquid supply system. The tip of the brush arm is configured as a brush holder so that the brush device can be attached to and detached from the tip of the brush arm. The substrate held by the substrate holding device is cleaned by the brush device. An untreated brush device is stored in the brush storage device. The used brush device is removed from the brush holder. An untreated brush device stored in a brush storage device is attached to the brush holder. The brush storage device is configured such that the cleaning surface of the stored brush device is maintained in a wet state by the processing liquid supplied from the brush liquid supply system.

Description

Technical Field

[0001] The present invention relates to a substrate processing device for cleaning by bringing a cleaning tool into contact with a substrate. Background Art

[0002] A substrate processing apparatus is used to perform various processes on substrates such as semiconductor substrates, substrates for flat panel displays (FPD) such as liquid crystal display devices or organic electroluminescence (EL) display devices, substrates for optical disks, substrates for magnetic disks, substrates for magneto-optical disks, substrates for photomasks, ceramic substrates, or substrates for solar cells.

[0003] As an example of a substrate processing device, Japanese Patent Laid-Open No. 8-318226 describes a scrubber cleaning device that uses a brush to clean a wafer (substrate). The scrubber cleaning device includes a brush and an arm. The top end of the arm is configured to be able to load and unload the brush. The brush mounted on the top end of the arm moves to a cleaning position and slides on the substrate. Thus, the substrate is cleaned.

[0004] The brush used in cleaning is contaminated or worn depending on its use state. A brush in an excessively contaminated or worn state cannot properly clean the substrate. Therefore, in the scrubber cleaning device, a brush holding frame is provided at a retreat position different from the cleaning position.

[0005] The brush holding frame holds a plurality of brushes. Thus, when one brush mounted on the top end of the arm becomes in a state where it should be replaced, the brush is moved to a retreated position and removed from the top end of the arm. In addition, the other brushes held in the brush holding frame are mounted on the top end of the arm. In this way, the brushes used for cleaning the substrate are replaced. Summary of the invention

[0006] Depending on the substrate to be processed, it is necessary to wet the brush used for cleaning in advance. In this case, in the scrubber cleaning device disclosed in Japanese Patent Laid-Open No. 8-318226, after replacing the brush mounted on the top end of the arm, the new brush must be wetted to a degree that it can be used for cleaning. Such pretreatment of the brush reduces the operating efficiency of the scrubber cleaning device.

[0007] An object of the present invention is to provide a substrate processing apparatus capable of shortening the time required from replacing a cleaning tool to restarting a cleaning process using the cleaning tool.

[0008] According to one aspect of the present invention, a substrate processing device comprises: a substrate holding part for holding a substrate; a first cleaning tool and a second cleaning tool, each having a connected part and a cleaning surface; a cleaning tool holding part having a connecting part that can be detachably connected to the connected parts of the first cleaning tool and the second cleaning tool, and the first cleaning tool and the second cleaning tool are respectively held by connecting the connecting part to the connected part; a cleaning tool storage part is arranged at a position away from the substrate held by the substrate holding part, and temporarily stores the second cleaning tool in a state where the first cleaning tool is held in the cleaning tool holding part; a cleaning tool holding part moving device for moving the cleaning tool holding part in such a manner that the cleaning surface of the first cleaning tool or the second cleaning tool held in the cleaning tool holding part contacts the substrate. The cleaning tool holding part is configured to move and move the cleaning tool holding part to the cleaning tool storage part; a processing liquid supplying part supplies a specified processing liquid to the cleaning tool storage part; and a control part, wherein the control part controls the cleaning tool holding part moving device in a state where the cleaning tool holding part holds the first cleaning tool, thereby cleaning the substrate held by the substrate holding part, and after the first cleaning tool used for cleaning the substrate is removed from the cleaning tool holding part, controls the cleaning tool holding part moving device, thereby connecting the connecting part of the cleaning tool holding part to the connected part of the second cleaning tool temporarily stored in the cleaning tool storage part, and the cleaning tool storage part is configured so that the cleaning surface of the temporarily stored second cleaning tool is maintained in a wet state by the processing liquid supplied from the processing liquid supplying part.

[0009] According to the present invention, it is possible to shorten the time required from replacing a cleaning tool to restarting a cleaning process using the cleaning tool. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] Figure 1 It is a schematic plan view of a substrate processing apparatus according to one embodiment of the present invention.

[0011] Figure 2A and Figure 2B It is used to illustrate Figure 1 FIG. 1 is a diagram showing basic operations of a substrate processing apparatus during a cleaning process of a substrate.

[0012] Figure 3A and Figure 3B It is used to illustrate Figure 1 FIG. 1 is a diagram showing basic operations during replacement processing of a brush device of a substrate processing apparatus.

[0013] Figure 4A and Figure 4B It is used to illustrate Figure 1FIG. 1 is a diagram showing basic operations during replacement processing of a brush device of a substrate processing apparatus.

[0014] Figure 5A and Figure 5B It is used to illustrate Figure 1 FIG. 1 is a diagram showing basic operations during replacement processing of a brush device of a substrate processing apparatus.

[0015] Figure 6 It is a perspective view of the appearance of the brush device.

[0016] Figure 7 yes Figure 6 A longitudinal section of a brush device.

[0017] Figure 8 This is a perspective view of the brush device connection portion.

[0018] Fig. 9 yes Figure 8 A longitudinal sectional view of the brush device connection portion.

[0019] Fig. 10A and Fig. 10B This is an external perspective view for explaining the operation when the brush device is held by the brush device connecting portion.

[0020] Fig.11 It is a longitudinal sectional view showing a state where the brush device connecting portion holds the brush device.

[0021] Fig.12 yes Fig.11 AA line cross-section diagram.

[0022] Fig.13A and Fig. 13B This is an external perspective view for explaining the operation when the brush device held by the brush device connecting portion is removed.

[0023] Fig.14 It is a figure for demonstrating the structure of a brush storage device.

[0024] Fig.15 This is a three-dimensional view of the brush storage tank.

[0025] Fig.16A and Fig. 16B yes Fig.15 Schematic plan view and longitudinal section view of the brush storage tank.

[0026] Fig.17 It is a three-dimensional diagram of the appearance of the brush support.

[0027] Fig.18 This is a plan view showing an example of a structure in which a brush support is provided so as to cover a part of the brush storage tank.

[0028] Fig.19A and Fig.19B It means in Fig.18 A schematic plan view and a longitudinal sectional view of a state in which four brush devices are stored in a brush storage groove in a structure.

[0029] Fig. 20 This is a diagram for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device.

[0030] Fig.21 This is a diagram for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device.

[0031] Fig. 22 This is a diagram for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device.

[0032] Fig.23 This is a diagram for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device.

[0033] Fig.24 This is a diagram for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device.

[0034] Fig.25 This is a diagram for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device.

[0035] Fig.26 This is a diagram for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device.

[0036] Fig. 27 Yes means Figure 1 A block diagram of a structure of a control system of a substrate processing apparatus.

[0037] Fig.28 It is a schematic plan view of a substrate processing apparatus according to another embodiment.

[0038] Fig.29 This is a schematic plan view of a substrate processing apparatus according to still another embodiment.

[0039] [Explanation of Symbols]

[0040] 1: Substrate processing equipment

[0041] 10: Substrate holding device

[0042] 11: Rotating base

[0043] 12: Holding pin

[0044] 13: Substrate holding drive unit

[0045] 14: Substrate rotation drive unit

[0046] 20: Cup device

[0047] 21: Cup body

[0048] 22: Cup lifting drive unit

[0049] 30: Nozzle device

[0050] 31: Fluid Nozzle

[0051] 32: Fluid supply system

[0052] 40: Brush arm device

[0053] 41: Brush Arm

[0054] 42: Brush holding part

[0055] 43: Guide rail

[0056] 44: Arm support

[0057] 44S: Rotation axis

[0058] 45: Arm horizontal drive unit

[0059] 46: Arm lifting drive unit

[0060] 47: Arm rotation drive unit

[0061] 48: Arm lifting drive unit

[0062] 49: Standby Box

[0063] 50: Brush device

[0064] 51: Brush

[0065] 51S: Cleaning surface

[0066] 52: Brush support

[0067] 53: Brush installation department

[0068] 53S: Supported surface

[0069] 54: concave part

[0070] 54S: Bottom

[0071] 55: Flange

[0072] 56: Connected column

[0073] 56a: First groove portion

[0074] 56b: Second groove

[0075] 60: Brush waste

[0076] 61: Demolition of structures

[0077] 70: Brush storage device

[0078] 80: Brush liquid supply system

[0079] 81: Piping

[0080] 90: Brush liquid discharge system

[0081] 91: Piping

[0082] 100: Brush storage slot

[0083] 101: Upper surface

[0084] 102: Lower surface

[0085] 103: First side

[0086] 104: Second side

[0087] 105: First end face

[0088] 106: Second end face

[0089] 107a: Liquid inlet

[0090] 107b: Liquid outlet

[0091] 110: Brush storage hole

[0092] 110a: First storage space

[0093] 110b: Second storage space

[0094] 110c: The third storage space

[0095] 110d: The fourth storage space

[0096] 111: Bottom of storage hole

[0097] 112: Brush guide

[0098] 113: Brush the support surface

[0099] 200: Brush support

[0100] 201: Support plate

[0101] 202: First side wall

[0102] 203: Second side wall

[0103] 204: Gap

[0104] 205a: Facing surface

[0105] 205b: Facing surface

[0106] 210: Storage brush horizontal drive unit

[0107] 220: Storage brush lifting drive unit

[0108] 221: Cylinder

[0109] 222: Lifting axis

[0110] 223: Connecting parts

[0111] 400: Brush device connection part

[0112] 410: Shaft component

[0113] 420: Connect the main body

[0114] 421: First barrel

[0115] 421h: Inner opening

[0116] 421i: External opening

[0117] 422: Second barrel

[0118] 431: Pressing member

[0119] 431S: Pressed surface

[0120] 431T: Ball pressing surface

[0121] 432: Spring

[0122] 440: Shell

[0123] 490: Steel Ball

[0124] 510: Slot horizontal drive unit

[0125] 520: Tank lifting drive unit

[0126] 900: Control Department

[0127] 901: CPU / Central Processing Unit

[0128] 902: RAM

[0129] 903: ROM

[0130] 904: Storage device

[0131] 909: CD-ROM

[0132] a1, a2, a11, a12, a13: arrows

[0133] CH: Chamber

[0134] GH: Guide Hole

[0135] L1: Imaginary straight line

[0136] L2: Imaginary arc

[0137] P1: Standby position

[0138] P2: Demolition position

[0139] P3: Installation location

[0140] SC: Rotation Center

[0141] W: substrate

[0142] X, Y, Z: direction DETAILED DESCRIPTION

[0143] Hereinafter, a substrate processing device according to an embodiment of the present invention will be described with reference to the accompanying drawings. In the following description, the so-called substrate refers to a FPD (Flat Panel Display) substrate, a semiconductor substrate, an optical disk substrate, a magnetic disk substrate, an optical magneto-magnetic disk substrate, a photomask substrate, a ceramic substrate, or a solar cell substrate, etc., used in a liquid crystal display device or an organic EL (Electro Luminescence) display device.

[0144] In this embodiment, the substrate has a circular shape except for the portion where the notch is formed when viewed from above. In addition, the substrate has a front surface as a circuit forming surface and a back surface as a surface opposite to the circuit forming surface. In the following description, regardless of the front surface and back surface of the substrate, the surface facing upward of the two surfaces of the substrate is referred to as the upper surface of the substrate, and the surface facing downward of the two surfaces of the substrate is referred to as the lower surface of the substrate.

[0145] The substrate processing apparatus described below performs a cleaning process using a brush on a substrate to be processed. During the cleaning process, a predetermined cleaning liquid is supplied to the upper surface of the substrate while the brush is pushed against the upper surface of the substrate. In addition, in the substrate processing apparatus described below, if the brush used for cleaning the substrate cannot obtain an appropriate cleaning force due to contamination or wear, the brush is replaced.

[0146] 1. Overall structure of substrate processing device

[0147] Figure 1 1 is a schematic plan view of a substrate processing apparatus according to an embodiment of the present invention. Figure 1 and Figure 2A and Figure 2BIn the following drawings, arrows indicating mutually orthogonal X, Y, and Z directions are indicated to clarify the positional relationship. The X and Y directions are mutually orthogonal in the horizontal plane, and the Z direction corresponds to the up-down direction (vertical direction).

[0148] like Figure 1 As shown, the substrate processing apparatus 1 has a structure in which a plurality of components are housed in the chamber CH, including: a substrate holding device 10, a cup device 20, a nozzle device 30, a brush arm device 40, a plurality of brush devices 50, a standby box 49, and a brush disposal unit 60. In addition, the substrate processing apparatus 1 includes: a brush storage device 70, a brush liquid supply system 80, a brush liquid discharge system 90, and a control unit 900.

[0149] The chamber CH has four side surfaces, a top surface, and a bottom surface. A transfer opening (not shown) for transferring a substrate between the inside of the chamber CH and the outside of the chamber CH is formed on one side surface of the chamber CH.

[0150] A substrate holding device 10 is provided at the approximate center of the bottom surface of the chamber CH. The substrate holding device 10 includes a rotating base 11, a plurality of holding pins 12, and a substrate holding driving unit 13 ( Fig. 27 ) and the substrate rotation drive unit 14 ( Fig. 27 The substrate rotation driving unit 14 is, for example, a motor, and is fixed to the bottom surface of the chamber CH with the rotation axis facing upward. A disk-shaped rotation base 11 is mounted on the upper end of the rotation axis.

[0151] The rotating base 11 has an outer diameter larger than that of the substrate W to be processed. A plurality of holding pins 12 are provided on the peripheral edge of the upper surface of the rotating base 11. The plurality of holding pins 12 respectively have an abutment portion. Each holding pin 12 is configured to be able to move between a holding state in which the abutment portion abuts against the outer peripheral end portion of the substrate W and a release state in which the abutment portion is separated from the substrate W when the substrate W is arranged on the rotating base 11. The substrate holding drive unit 13 includes, for example, a magnet, and uses the magnetic force of the magnet to switch each holding pin 12 between a holding state and a release state. The substrate W is held on the rotating base 11 by the abutment portions of the plurality of holding pins 12 in the holding state abutting against a plurality of portions of the outer peripheral end portion of the substrate W. Figure 1 In FIG. 1 , the outer shape of the substrate W held by the substrate holding device 10 is indicated by a dot-dash line.

[0152] The cup device 20 includes a cup body 21 and a cup lifting drive unit 22. The cup body 21 is provided in a substantially cylindrical shape, surrounds the rotating base 11 in a plan view, and extends in the Z direction. In addition, the cup body 21 is provided to be movable in the Z direction.

[0153] The cup body lifting drive unit 22 includes an actuator such as a motor or a cylinder, and moves the cup body main body 21 between a predetermined cup body upper position and a cup body lower position. The cup body upper position is a height position (a position in the vertical direction) at which the upper end of the cup body main body 21 is higher than the substrate W held by the substrate holding device 10. The cup body lower position is a height position at which the upper end of the cup body main body 21 is lower than the substrate W held by the substrate holding device 10.

[0154] The nozzle device 30 includes a fluid nozzle 31 and a fluid supply system 32. The fluid nozzle 31 is arranged at a predetermined position above the substrate holding device 10 and the cup body device 20. The fluid nozzle 31 is fixed in a manner such that its nozzle is oriented toward the rotation center SC of the rotating base 11 of the substrate holding device 10. The fluid supply system 32 supplies cleaning liquid to the fluid nozzle 31 during the cleaning process of the substrate W. Thus, the cleaning liquid is supplied to the upper surface of the substrate W held by the substrate holding device 10. The cleaning liquid is, for example, pure water (deionized water). In addition, the cleaning liquid may also use carbonated water, ozone water, hydrogen water, electrolytic ion water, SC1 (a mixed solution of ammonia and hydrogen peroxide water) or tetramethylammonium hydroxide (TMAH) instead of pure water. In addition, the nozzle device 30 may also be configured to be able to spray gases such as inert gases from the fluid nozzle 31. Furthermore, the nozzle device 30 may also have a plurality of fluid nozzles 31 that can spray or spray different fluids.

[0155] The brush arm device 40 includes a brush arm 41, a guide rail 43, an arm support 44, an arm horizontal drive 45, and an arm lifting drive 46. The guide rail 43 is provided in the chamber CH adjacent to the substrate holding device 10 in the Y direction. The guide rail 43 extends in the X direction.

[0156] The arm support part 44 is provided to be movable in the X direction along the guide rail 43. The arm horizontal driving part 45 is, for example, a motor, and moves the arm support part 44 in the X direction based on the control of the control part 900 described later. The brush arm 41 is supported by the arm support part 44 so as to be movable in the Z direction. The arm lifting driving part 46 includes, for example, an actuator such as a motor or a cylinder, and moves the brush arm 41 in the Z direction based on the control of the control part 900 described later.

[0157] The brush arm 41 has a substantially rectangular parallelepiped shape and is supported so as to extend from the arm support portion 44 toward the substrate holding device 10 in the Y direction. The top end of the brush arm 41 is configured as a brush holding portion 42 so as to be able to hold and remove (load and unload) a brush device 50 used for cleaning the substrate W. The details of the brush device 50 will be described later. Figure 1In the substrate processing apparatus 1 , the brush holding portion 42 is located on a virtual straight line L1 that passes through the rotation center SC of the spin base 11 and extends in the X direction in a plan view.

[0158] In a plan view, on the imaginary straight line L1, in addition to the substrate holding device 10, the standby box 49, the brush discarding portion 60, and the brush storage device 70 are arranged in a row. Specifically, the standby box 49, the substrate holding device 10, the brush discarding portion 60, and the brush storage device 70 are arranged in this order on the imaginary straight line L1.

[0159] The standby box 49 is configured to be able to accommodate and clean the brush device 50 held in the brush holding portion 42 in a cleaned state. The brush discarding portion 60 is configured to have a removal structure 61 (described later) for removing the brush device 50 held in the brush holding portion 42 from the brush holding portion 42. Fig.13A and Fig. 13B ), and can accommodate the removed brush device 50. The brush storage device 70 is configured to store a plurality of unused brush devices 50.

[0160] Here, the brush storage device 70 includes: a brush storage tank 100, a brush support body 200, a storage brush horizontal drive unit 210 and a storage brush lifting drive unit 220. The brush storage tank 100 is configured to store a plurality of unused brush devices 50. A predetermined processing liquid is supplied from the brush liquid supply system 80 to the brush storage tank 100 and stored. The brush device 50 has a cleaning surface for cleaning the substrate W. The processing liquid supplied to the brush storage tank 100 is used to wet the cleaning surface of the unused brush device 50 stored in the brush storage tank 100. In the following description, the processing liquid is referred to as brush liquid. The brush liquid may also be a cleaning liquid used for cleaning the substrate W. In the present embodiment, the brush liquid is pure water. A portion of the brush liquid stored in the brush storage tank 100 is discharged to the outside of the substrate processing device 1 (for example, exhaust equipment, etc.) via the brush liquid discharge system 90.

[0161] The storage brush horizontal driving unit 210 and the storage brush lifting driving unit 220 operate to change the storage position of one or more brush devices 50 stored in the brush storage tank 100. The structure and operation of the storage brush horizontal driving unit 210 and the storage brush lifting driving unit 220 will be described in detail later. The control unit 900 controls the operation of each unit of the substrate processing apparatus 1. The details of the control unit 900 will be described later.

[0162] like Figure 1As shown in the thick dotted line frame, in the substrate processing apparatus 1, a standby position P1 is set at a position overlapping with the standby box 49 when viewed from above. In addition, a removal position P2 is set at a position overlapping with the brush discarding portion 60 when viewed from above. Furthermore, a mounting position P3 is set at a position overlapping with a part of the brush storage tank 100 when viewed from above. The standby position P1, the removal position P2, and the mounting position P3 are arranged on the imaginary straight line L1.

[0163] 2. Various basic operations of substrate processing equipment

[0164] (a) Figure 2A and Figure 2B It is used to illustrate Figure 1 FIG. 1 is a diagram showing basic operations of the substrate processing apparatus 1 during the cleaning process of the substrate W. Figure 2A and Figure 2B in Figure 2A A schematic plan view of a substrate processing apparatus 1 is shown. Figure 2B A schematic side view of the substrate processing apparatus 1 is shown.

[0165] In the initial state of the cleaning process of the substrate W, the brush holding part 42 holding the brush device 50 is located at the standby position P1. The brush device 50 is stored in the standby box 49. In addition, the cup body 21 is located at the cup lower position, and the spraying of the cleaning liquid by the fluid nozzle 31 is stopped.

[0166] When the cleaning process of the substrate W is started, the substrate W carried into the substrate processing apparatus 1 is held by the substrate holding device 10 and rotated at a predetermined rotation speed. In addition, the cup body 21 is held in the cup upper position. Then, the cleaning liquid is sprayed toward the rotating substrate W from the fluid nozzle 31.

[0167] In the above state, by Figure 1 The arm horizontal driving unit 45 and the arm lifting driving unit 46 are operated to move the brush arm 41 in the Z direction and the X direction. As a result, the brush device 50 held by the brush holding unit 42 is lifted from the standby box 49 and pushed onto the upper surface of the rotating substrate W. In the above state, Figure 2A and Figure 2B As indicated by the thick two-dot chain arrows a1 and a2, the brush device 50 moves in the X direction along the imaginary straight line L1 in a plan view. In this way, the upper surface of the substrate W is cleaned.

[0168] When the upper surface of the substrate W is cleaned, the brush device 50 returns to the initial position. In addition, the ejection of the cleaning liquid by the fluid nozzle 31 stops, and the rotation of the substrate W by the substrate holding device 10 stops. Then, the cup body 21 moves from the cup upper position to the cup lower position. Thus, the cleaning process of the substrate W is completed.

[0169] In addition, Figure 2A and Figure 2B In the example of FIG. 1 , the brush device 50 reciprocates between the outer peripheral end of the substrate W and the rotation center SC of the spin base 11, but the substrate W may be cleaned by moving from one end to the other end of the substrate W along the imaginary straight line L1. Alternatively, the brush device 50 may clean the substrate W by moving once between the outer peripheral end of the substrate W and the rotation center SC of the spin base 11.

[0170] (b) As described above, in the substrate processing apparatus 1 of the present embodiment, a brush replacement process is performed for the brush used for cleaning the substrate W. Here, the brush device 50 has a structure in which the brush and a plurality of components attached to the brush are integrally assembled. Therefore, in the substrate processing apparatus 1, as a brush replacement process, a process of replacing the used brush device 50 (old brush device 50) held in the brush holding portion 42 with an unused brush device 50 (new brush device 50) is performed.

[0171] Figure 3A and Figure 3B to Figure 5A and Figure 5B It is used to illustrate Figure 1 FIG. 1 is a diagram showing basic operations during the replacement process of the brush device 50 of the substrate processing apparatus 1. Figure 3A and Figure 3B to Figure 5A and Figure 5B In, with Figure 2A and Figure 2B Similarly, in the example Figure 3A to Figure 5A A schematic plan view of a substrate processing apparatus 1 is shown. Figure 3B to Figure 5B A schematic side view of the substrate processing apparatus 1 is shown.

[0172] In the initial state of the replacement process of the brush device 50, as shown in FIG. Figure 3A and Figure 3B As shown, the brush holding portion 42 holding the old brush device 50 is located at the standby position P1. The brush device 50 is stored in the standby box 49. In addition, the cup body 21 is located at the cup body lower position, and the spraying of the cleaning liquid by the fluid nozzle 31 is stopped. Furthermore, the brush storage groove 100 of the brush storage device 70 stores the unused brush device 50.

[0173] When the replacement process of the brush device 50 is started, Figure 1 The arm horizontal driving unit 45 and the arm lifting driving unit 46 are operated to move the brush arm 41 in the Z direction and the X direction. As a result, the brush device 50 held in the brush holding unit 42 is lifted from the standby box 49. Figure 3A and Figure 3B As indicated by a thick double-dashed line arrow a11 , the brush holding portion 42 moves in the space above the substrate holding device 10 and moves to the removal position P2 .

[0174] At the removal position P2, the used brush device 50 is removed from the brush holding portion 42 and stored in the brush disposal portion 60. Figure 4A and Figure 4B As indicated by a thick double-dashed line arrow a12 , the brush holding portion 42 in a state where the brush device 50 is not held moves from the removal position P2 to the attachment position P3 .

[0175] At the installation position P3, the unused brush device 50 stored in the brush storage tank 100 is held by the brush holding portion 42. In addition, the brush device 50 held by the brush holding portion 42 is lifted from the brush storage tank 100. Figure 5B As indicated by the thick double-dashed arrow a13, the brush holder 42 moves to the standby position P1 through the space above the substrate holder 10. Therefore, the brush device 50 held by the brush holder 42 is stored in the standby box 49. Thus, the replacement process of the brush device 50 is completed.

[0176] 3. Structure of the brush device 50

[0177] Figure 6 is a perspective view of the appearance of the brush device 50, Figure 7 for Figure 6 A longitudinal cross-sectional view of the brush device 50. Figure 6 As shown, the brush device 50 includes: a brush 51, a brush support 52 and a connected column 56. The brush support 52 has a substantially cylindrical shape and has a brush mounting portion 53 at the lower end.

[0178] The brush 51 is formed of, for example, a polyvinyl alcohol (PVA) sponge or a PVA sponge in which abrasive particles are dispersed, and has a circular cleaning surface 51S ( Figure 7 ).like Figure 7 As shown, brush 51 is mounted on brush mounting portion 53 of brush support 52 with cleaning surface 51S facing downward. Brush mounting portion 53 has an annular supported surface 53S that surrounds a portion of brush 51 when brush 51 is mounted and is located slightly above cleaning surface 51S.

[0179] like Figure 6 As shown, a recess 54 is formed at the center of the upper end of the brush support 52. In addition, an annular flange 55 is formed at the upper end of the brush support 52 so as to surround the recess 54 and protrude outwardly by a certain distance over the entire circumference of the brush support 52.

[0180] The recessed portion 54 has a flat bottom surface 54S. A threaded hole is formed in the center of the bottom surface 54S. The connected column 56 is a rod-shaped member having a circular cross-section, and a first groove portion 56a and a second groove portion 56b are formed in the upper half. In addition, an external thread corresponding to the threaded hole of the bottom surface 54S is formed in the lower half of the connected column 56. The lower half of the connected column 56 is installed in the threaded hole of the bottom surface 54S. Thus, the upper half of the connected column 56 is fixed to the brush support body 52 in a state of protruding upward from the bottom surface 54S of the recessed portion 54.

[0181] The upper end of the connected column 56 is formed in a hemispherical shape. The first groove 56a and the second groove 56b are formed at positions away from the upper end of the connected column 56 in the axial direction thereof by a common distance. In addition, the first groove 56a and the second groove 56b are formed at different positions in the circumferential direction of the connected column 56.

[0182] exist Figure 6 , a diagram showing the outer peripheral surface of the upper half of the connected column 56 in the double-dashed line frame is developed along the circumferential direction. In the developed diagram, the angular positions in the circumferential direction based on the central axis of the connected column 56 are marked at intervals of 90° from 0° to 360°. As shown in the developed diagram, the angular range in the circumferential direction where the second groove portion 56b is formed (about 160°) is wider than the angular range in the circumferential direction where the first groove portion 56a is formed (about 45°).

[0183] The first groove portion 56a and the second groove portion 56b are formed to accommodate a steel ball 490 ( Fig. 9 ) and cannot accommodate all of the steel ball 490. Furthermore, the second groove portion 56b allows the steel ball 490 to move in the circumferential direction within a certain angle range while accommodating a portion of the steel ball 490.

[0184] 4. Structure of the brush holding portion 42

[0185] Figure 1 The brush holding portion 42 includes a brush device connecting portion provided at the tip portion of the brush arm 41 so as to extend in the Z direction (extend downward). Figure 8 This is a three-dimensional view of the brush device connection part. Fig. 9 yes Figure 8 A longitudinal cross-sectional view of the brush device connecting portion 400. Figure 8 As shown, the brush device connecting portion 400 includes: an axis member 410, a connecting body 420 and a housing 440. Fig. 9 As shown, the brush device connecting portion 400 further includes: a pressing member 431 , a spring 432 , and a plurality of (three in this example) steel balls 490 .

[0186] The connecting body 420 has a structure in which a first cylinder 421 and a second cylinder 422 having different inner diameters and outer diameters are connected in the axial direction. The first cylinder 421 and the second cylinder 422 are arranged in this order up and down. The inner diameter of the first cylinder 421 is slightly larger than the outer diameter of the connected column 56 of the brush device 50. In addition, the inner diameter of the second cylinder 422 is larger than the inner diameter of the first cylinder 421, and the outer diameter of the second cylinder 422 is larger than the outer diameter of the first cylinder 421.

[0187] The shaft member 410 is held at the top end of the brush arm 41 so as to be rotatable around the axis of the shaft member 410 by a rotation drive mechanism (not shown). The lower end of the shaft member 410 is connected to the upper end of the first cylinder 421 and its vicinity in a state where it is inserted from above into the first cylinder 421. Thus, the connecting body 420 is supported by the shaft member 410.

[0188] A plurality of (three in this example) through holes are formed near the lower end of the first barrel 421 and arranged at equal angles in the circumferential direction. The opening of each through hole formed on the inner circumferential surface of the first barrel 421 is referred to as an inner opening 421h. The opening of each through hole formed on the outer circumferential surface of the first barrel 421 is referred to as an outer opening 421i. Both the inner opening 421h and the outer opening 421i have a circular shape.

[0189] Each through hole contains a portion of the steel ball 490. The thickness of the first cylinder 421 is smaller than the diameter of the steel ball 490. In addition, the inner diameter of the inner opening 421h is smaller than the diameter of the steel ball 490. On the other hand, the inner diameter of the outer opening 421i is larger than the diameter of the steel ball 490. With this structure, the steel ball 490 is partially contained in the through hole of the first cylinder 421, and the remaining portion is located at least one of the outer side of the first cylinder 421 and the inner side of the first cylinder 421.

[0190] A cylindrical pressing member 431 is embedded in the first cylinder 421, and the pressing member 431 has an inner diameter slightly larger than the outer diameter of the first cylinder 421 and an outer diameter smaller than the outer diameter of the second cylinder 422. The lower half of the inner circumferential surface of the pressing member 431 is inclined relative to the axial direction of the pressing member 431 in such a manner that the inner diameter gradually increases as it goes downward. The inclined inner circumferential surface of the pressing member 431 abuts against a part of three steel balls 490 protruding outward from the three through holes of the first cylinder 421 as a ball pressing surface 431T.

[0191] The pressing member 431 has an annular pressed surface 431S facing upward. A spring 432 is provided on the pressed surface 431S. The spring 432 in this example is a coil spring, which surrounds the first barrel 421. A housing 440 is provided around the first barrel 421 in a manner covering the pressing member 431 and the spring 432. The housing 440 is mounted on the connecting body 420 in a manner that the spring 432 is compressed from above toward the pressed surface 431S of the pressing member 431. Thus, a pressing force from the spring 432 to the pressing member 431 acts toward the second barrel 422.

[0192] As described above, the ball pressing surface 431T of the pressing member 431 abuts against a portion of the three steel balls 490 protruding outward from the three through holes of the first cylinder 421. Therefore, the pressing force applied to the pressing member 431 by the spring 432 acts in a manner of pressing the three steel balls 490 toward the axis of the first cylinder 421. That is, the pressing force along the axis of the first cylinder 421 is converted into a pressing force pressing the three steel balls 490 toward the axis of the first cylinder 421.

[0193] Therefore, if Fig. 9 As shown in the upper part of the double-dotted line prompt box, when no force is applied to each steel ball 490 from the inside of the first cylinder 421, a part of the steel ball 490 protrudes from the inner opening 421h into the inside of the first cylinder 421. Fig. 9 As shown in the lower section of the prompt box, it is assumed that a force is applied to each steel ball 490 from the inside of the first cylinder 421 toward the outside of the first cylinder 421. In this case, as shown by the white arrow, when the force from the inside of the first cylinder 421 toward the outside of the first cylinder 421 exceeds the force of pressing the steel ball 490 toward the inside of the first cylinder 421 by the elastic force of the spring 432, the steel ball 490 is pushed out from the internal space of the first cylinder 421.

[0194] 5. Holding and removal of the brush device 50 by the brush device connection portion 400

[0195] Fig. 10A and Fig. 10B 4 is an external perspective view for explaining the operation of holding the brush device 50 by the brush device connecting portion 400. Fig. 10A As shown, when the brush device 50 is held by the brush device connecting portion 400, the second cylinder portion 422 of the brush device connecting portion 400 is pushed into Figure 6 The brush device 50 is placed in the recess 54. Fig. 10B As shown, the brush device 50 is held on the brush device connecting portion 400 .

[0196] During the pushing, the connected column 56 of the brush device 50 is inserted into the first cylinder 421 of the brush device connecting part 400. At this time, inside the first cylinder 421, the part of the three steel balls 490 protruding into the inside of the first cylinder 421 is slowly pushed toward the outside of the first cylinder 421 from the upper end of the connected column 56. Thereafter, the connected column 56 further enters the first cylinder 421, and the lower end of the second cylinder 422 abuts against the bottom surface 54S of the recess 54 of the brush device 50. In the above state, a part of the three steel balls 490 is embedded in the first groove 56a and the second groove 56b of the connected column 56.

[0197] Fig.11 4 is a longitudinal sectional view showing a state where the brush device connecting portion 400 holds the brush device 50. Fig.12 yes Fig.11 AA line profile. Fig.11 and Fig.12 As shown, a part of each steel ball 490 of the brush device connecting part 400 is embedded in any one of the first groove 56a and the second groove 56b of the connected column 56 of the brush device 50. Thus, when the brush device 50 is held in the brush device connecting part 400, the spring 432 ( Fig. 9 )’s elastic force.

[0198] Fig.13A and Fig. 13B 4 is an external perspective view for explaining the operation of removing the brush device 50 held in the brush device connecting portion 400. In order to remove the brush device 50 from the brush device connecting portion 400, the removal structure 61 is required. As described above, the removal structure 61 is provided at Figure 1 The brush waste portion 60.

[0199] like Fig.13A As shown, the removal structure 61 includes, for example, one or more (two in this example) plate-like members, and is configured to be able to abut against the upper surface of the flange portion 55 of the brush device 50. When the brush device 50 is removed from the brush device connecting portion 400, the flange portion 55 of the brush device 50 is arranged below the removal structure 61. Fig. 13B As shown, the brush device connection part 400 is lifted upward by using a force greater than a certain value. At this time, inside the first cylinder part 421 of the brush device connection part 400, the first cylinder part 421 and the connected column 56 move relatively against the engagement force between the three steel balls 490 and the first groove part 56a and the second groove part 56b of the connected column 56. Thus, the brush device 50 is removed from the brush device connection part 400.

[0200] exist Fig.13A and Fig. 13BIn the example of FIG. 5 , the removal structure 61 includes two plate-like members, but the present invention is not limited thereto. The removal structure 61 may be formed of only one plate-like member as long as it is configured to abut against a portion of the upper surface of the flange portion 55 and to fix the brush device 50 when the brush device 50 is removed.

[0201] 6. Structure and Operation of Brush Storage Device 70

[0202] (a) Overview of the Structure of the Brush Storage Device 70

[0203] Fig.14 2 is a diagram for explaining the structure of the brush storage device 70. Fig.14 , the structure of the brush storage device 70 is mainly shown in an external perspective view. As described above, the brush storage device 70 includes: a brush storage tank 100, a brush support body 200, a storage brush horizontal driving unit 210 and a storage brush lifting driving unit 220.

[0204] like Fig.14 As shown, the brush storage tank 100 has a substantially rectangular parallelepiped shape extending in one direction and is configured to extend in the Y direction. In the present embodiment, the brush storage tank 100 is fixed to a predetermined position of the chamber CH. As described above, the brush storage tank 100 is configured to store a plurality of brush devices 50. A pipe 81 is connected to one end of the brush storage tank 100, and a pipe 91 is connected to the other end of the brush storage tank 100. The pipe 81 is configured Figure 1 A part of the brush liquid supply system 80. The pipe 91 constitutes Figure 1 A brush liquid discharge system 90 is provided near one end of the brush storage tank 100. Figure 1 Installation position P3.

[0205] exist Fig.14 In the example of FIG. 1 , the brush support 200 is provided to cover a part of the brush storage tank 100 from above and both sides in the X direction. The brush support 200 has a guide hole GH extending in the Y direction.

[0206] The storage brush lifting drive unit 220 includes a cylinder 221 and a lifting shaft 222. The cylinder 221 is provided, for example, at Figure 1 The lifting shaft 222 is connected to a piston provided inside the cylinder 221, and moves in the Z direction according to the pressure inside the cylinder 221. The cylinder 221 is connected to a pressure regulating device (electro-pneumatic regulator, etc.) not shown in the figure for regulating the pressure inside the cylinder 221.

[0207] Two connecting members 223 are installed at the upper end of the lifting shaft 222. The two connecting members 223 are axial members such as screws, and are inserted into the guide hole GH of the brush support body 200. Thus, the lifting shaft 222 supports the brush support body 200 in a state where the brush support body 200 can move along the direction of the guide hole GH (Y direction). In addition, the lifting shaft 222 adjusts the height position of the brush support body 200 in the Z direction to a desired height position.

[0208] The storage brush horizontal driving unit 210 includes an actuator such as a motor or a cylinder, and moves the brush support 200 supported by the lifting shaft 222 in the Y direction. Thus, the storage brush horizontal driving unit 210 adjusts the position of the brush support 200 in the Y direction to a desired position.

[0209] (b) Structure of the brush storage tank 100

[0210] Fig.15 This is a perspective view of the appearance of the brush storage tank 100. Fig.16A and Fig. 16B yes Fig.15 A schematic plan view and a longitudinal cross-sectional view of the brush storage tank 100 are shown. Fig.16A and Fig. 16B in Fig.16A A schematic plan view of the brush storage tank 100 is shown, and Fig. 16B Show Fig.16A BB line longitudinal section.

[0211] like Fig.15 As shown, the brush storage tank 100 has an upper surface 101, a lower surface 102, a first side surface 103, a second side surface 104, a first end surface 105, and a second end surface 106. In this example, the first side surface 103 and the second side surface 104 are surfaces facing in opposite directions in the X direction. The first end surface 105 and the second end surface 106 are surfaces facing in opposite directions in the Y direction.

[0212] The upper surface 101 is formed with a brush storage hole 110. The brush storage hole 110 is formed to be open upward and to extend from one end of the brush storage tank 100 to the other end. The first end surface 105 is formed with a liquid inlet 107a connected to the inner space of the brush storage hole 110. Fig.14 The second end surface 106 is provided with a liquid outlet 107b connected to the internal space of the brush storage hole 110. Fig.14 Piping 91.

[0213] like Fig.16A As shown, in the brush storage hole 110, there are formed Figure 6The first storage space 110a, the second storage space 110b, the third storage space 110c and the fourth storage space 110d are part of the brush device 50. The first storage space 110a, the second storage space 110b, the third storage space 110c and the fourth storage space 110d are connected to each other and are arranged in this order at equal intervals in the direction from the first end surface 105 toward the second end surface 106.

[0214] A brush storage hole 110 has a storage hole bottom surface 111 extending in the Y direction through the center of the brush storage hole 110. The storage hole bottom surface 111 is a flat strip having a constant width in the X direction when viewed from above and is perpendicular to the Z direction.

[0215] In addition, a pair of brush guides 112 extending in the Y direction are formed inside the brush storage hole 110 so as to sandwich the storage hole bottom surface 111 in the X direction. Fig. 16B As shown, each brush guide 112 is formed so as to protrude upward from the storage hole bottom surface 111 by a certain height.

[0216] In the upper half of the brush guide 112, a plurality of notches having an arc shape (bow shape) in a plan view are formed at the positions where the plurality of storage spaces (110a to 110d) are formed. Figure 6 The curvature radius of the outer peripheral surface of the brush support body 52 of the brush device 50 is formed correspondingly. Thus, the brush can be inserted from above between the mutually facing notches in the pair of brush guides 112. Figure 6 The brush support body 52 is provided.

[0217] The brush support surfaces 113 facing upward are formed at the lower ends of the plurality of notches formed in the brush guides 112. The plurality of brush support surfaces 113 formed in the pair of brush guides 112 are located on a common surface orthogonal to the Z direction. That is, the plurality of brush support surfaces 113 are formed at the same height position.

[0218] exist Fig.16A In order to facilitate understanding of the positional relationship (height position relationship) in the Z direction between the storage hole bottom surface 111, the upper end surface of the brush guide 112, and the plurality of brush support surfaces 113, three dot patterns with different concentrations are marked on each surface. The higher the concentration of the dot pattern, the lower the height position.

[0219] A pair of brush support surfaces 113 formed in a pair of notches facing each other in the X direction are formed in the Figure 6 When the brush support body 52 is inserted into a pair of notches, the supported surface 53S ( Figure 7With such a structure, in the brush storage tank 100, the brush device 50 can be positioned and stored in a predetermined posture in each of the plurality of storage spaces (110a to 110d) of the brush storage hole 110.

[0220] As the dimensions of each part of the brush storage tank 100, the distance between each brush support surface 113 and the storage hole bottom surface 111 in the Z direction is set to be larger than the supported surface 53S ( Figure 7 ) and cleaning surface 51S( Figure 7 ) is greater. In addition, the distance between the upper surface 101 in the Z direction and each brush support surface 113 is set to be greater than the flange portion 55 ( Figure 7 ) and the supported surface 53S( Figure 7 ) is small.

[0221] (c) Structure of brush support 200

[0222] Fig.17 2 is a perspective view of the brush support body 200. Fig.17 As shown, the brush support body 200 includes: a support plate 201, a first side wall 202 and a second side wall 203. The support plate 201 has a substantially rectangular flat plate shape and extends in the Y direction. The length of the support plate 201 in the Y direction is longer than the brush storage tank 100 ( Fig.15 ) is shorter in the Y direction. On the other hand, the length of the support plate 201 in the X direction is shorter than that of the brush storage tank 100 ( Fig.15 ) has a slightly larger length in the X direction.

[0223] The two long sides of the support plate 201 extend in parallel in the Y direction. The first side wall 202 and the second side wall 203 are respectively formed of rectangular plate-shaped members and are formed to extend downward from the two long sides of the support plate 201. The guide hole GH is formed in the second side wall 203.

[0224] The support plate 201 has a notch 204 extending in the Y direction from one end (one of the short sides) in the Y direction to the vicinity of the other end (the other short side). The notch 204 has a pair of facing surfaces 205a and 205b facing each other in the X direction. Fig.17 As shown by the multiple white arrows in the figure, three notches having an arc shape when viewed from above are formed on each of the facing surfaces 205a and 205b. The three notches on one facing surface 205a are respectively opposite to the three notches on the other facing surface 205b. Figure 6 The curvature radius of the outer peripheral surface of the brush support body 52 of the brush device 50 is formed correspondingly. Figure 6 The brush support body 52 is inserted from above between the mutually facing recesses in a pair of facing surfaces 205a and 205b.

[0225] The brush support body 200 is provided, for example, to cover a portion of the upper surface 101 , the first side wall 202 , and the second side wall 203 of the brush storage tank 100 . Fig.18 This is a plan view showing an example of a structure in which the brush support 200 is provided so as to cover a part of the brush storage tank 100 .

[0226] exist Fig.18 In the example, the brush support 200 is arranged at a position offset from the first storage space 110a of the brush storage hole 110 in the Y direction and overlapping with the second storage space 110b to the fourth storage space 110d of the brush storage hole 110 in the Y direction. Thus, the support plate 201 mainly covers the portion from the approximately central portion of the brush storage groove 100 to the second end surface 106 in the Y direction from above.

[0227] In the above state, in the notch 204 of the brush support 200, the three spaces between the three pairs of notches arranged opposite to each other in the X direction overlap with the three storage spaces (110b to 110d) of the brush storage tank 100 in a plan view. Fig.18 In the example, most of the inner edge of the notch 204 of the brush support 200 is located slightly inside the brush storage hole 110 of the brush storage groove 100 relative to the inner edge of the brush storage hole 110 in a plan view.

[0228] Fig.19A and Fig.19B It means in Fig.18 A schematic plan view and a longitudinal sectional view of a state in which four brush devices 50 are stored in a brush storage tank 100 in the structure. Fig.19A and Fig.19B in Fig.19A A schematic plan view of the brush storage tank 100 and the brush support 200 is shown, and Fig.19B Show Fig.19A DD line longitudinal section of. Fig.19A As shown, the outer diameter of the flange portion 55 of each brush device 50 is slightly larger than the width of the brush storage hole 110 in the X direction.

[0229] like Fig.19B As shown, each brush device 50 is supported by the brush support surface 113 of the brush storage hole 110 in each storage space (110a to 110d). As described above, the distance between each brush support surface 113 and the storage hole bottom surface 111 in the Z direction is greater than the supported surface 53S ( Figure 7 ) and cleaning surface 51S( Figure 7 ) is large. Thus, the cleaning surface 51S ( Figure 7) is held at a height position away from the storage hole bottom surface 111. That is, when each brush device 50 is stored in the brush storage tank 100, the supported surface 53S of the brush device 50 does not contact the storage hole bottom surface 111.

[0230] In addition, as described above, the distance between the upper surface 101 and each brush support surface 113 in the Z direction is greater than the flange portion 55 ( Figure 7 ) and the supported surface 53S( Figure 7 ). Thus, when each brush device 50 is stored in the brush storage tank 100, the flange portion 55 located at the upper end of the brush device 50 is maintained at a height position that is a certain distance above the upper surface 101 of the brush storage tank 100. Therefore, a certain gap is formed between the flange portions 55 of the plurality of brush devices 50 and the upper surface 101 of the brush storage tank 100.

[0231] In a state where at least one brush device 50 is stored in the brush storage tank 100, brush liquid is supplied from the pipe 81 into the brush storage tank 100. Thus, a predetermined amount of brush liquid is stored in the brush storage tank 100. In addition, a part of the brush liquid stored in the brush storage tank 100 is discharged from the pipe 91. The supply amount and discharge amount of the brush liquid to the brush storage tank 100 are adjusted so that the liquid level of the brush liquid stored in the brush storage tank 100 is located above the brush 51 of the stored brush device 50. Thus, the brush 51 of the brush device 50 stored in the brush storage tank 100 is immersed in the brush liquid and maintained in a wet state.

[0232] The thickness of the support plate 201 of the brush support body 200 is set to be smaller than the gap formed between the flange portion 55 of the plurality of brush devices 50 and the upper surface 101 of the brush storage tank 100. Fig.19A and Fig.19B In the example, a portion of the support plate 201 is located above the three storage spaces ( 110 b , 110 c , 110 d ) and between the flange portions 55 of the three brush devices 50 and the upper surface 101 of the brush storage tank 100 .

[0233] (d) Basic Operation of the Brush Storage Device 70

[0234] Figure 20 to Figure 26 This is a diagram for explaining the basic operation of the brush storage device 70 accompanying the replacement process of the brush device 50. The operation of each part of the brush storage device 70 is explained below using a longitudinal cross-sectional view of the brush storage tank 100 and the brush support body 200 and a perspective view of the appearance of the brush storage device 70. Figure 20 to Figure 26 In Fig. 20 , Fig. 22 , Fig.24 and Fig.26, showing a longitudinal cross-sectional view of the brush storage tank 100 and the brush support body 200. These longitudinal cross-sectional views are equivalent to Fig.19B In addition, Fig.21 , Fig.23 and Fig.25 , showing the appearance of the brush storage device 70 in a three-dimensional manner. These longitudinal sectional views are equivalent to Fig.14 3D image of the exterior.

[0235] In addition, Fig. 20 , Fig. 22 , Fig.24 and Fig.26 In the longitudinal cross-sectional view of , the liquid level of the brush liquid stored in the brush storage tank 100 is indicated by a double-dotted chain line. Fig.21 , Fig.23 and Fig.25 In order to facilitate understanding of the operation of the brush storage device 70 , illustration of the plurality of brush devices 50 housed in the brush storage tank 100 is omitted.

[0236] First, it is assumed that in the initial state, the brush storage device 70 is in Fig.14 In the four storage spaces (110a to 110d) of the brush storage hole 110, as shown in FIG. Fig.19A and Fig.19B As shown in FIG. 4 , four brush devices 50 are stored. In the above state, the brush device 50 is replaced. Fig. 20 As shown by the white arrow in the middle, the unused brush device 50 stored in the first storage space 110a at the installation position P3 is Figure 1 The brush is held by the brush holding portion 42 and is lifted from the brush storage tank 100.

[0237] In the present embodiment, the mounting position P3 is set in the first storage space 110a of the brush storage tank 100. Therefore, when the brush device 50 is replaced next, it is necessary to store a new unused brush device 50 in the first storage space 110a.

[0238] Therefore, in the brush storage device 70, when an unused brush device 50 is stored in the second storage space 110b of the brush storage tank 100 after the replacement process of the brush device 50, the following series of operations are performed before the next replacement process is performed.

[0239] First, if Fig.21 As shown by the white arrow in the middle, the brush storage lifting driving unit 220 is operated to raise the brush support body 200 to a predetermined height relative to the brush storage tank 100. Fig. 22As shown, the brush support 200 supports the flange 55 of each brush device 50 through a part of the support plate 201, and lifts up all the remaining brush devices 50 stored in the brush storage tank 100 in the initial state. In this example, the three brush devices 50 stored in the second storage space 110b, the third storage space 110c, and the fourth storage space 110d are lifted from the brush storage tank 100.

[0240] Here, the predetermined height to which the brush support 200 rises is set to a degree that the lower end portion (cleaning surface 51S) of the brush device 50 supported by the brush support 200 is at least located above the liquid level of the brush liquid stored in the brush storage tank 100. Alternatively, the predetermined height may be set to a degree that the brush device 50 supported by the brush support 200 is located above the brush storage tank 100.

[0241] Next, if Fig.23 As shown by the white arrow in the middle, the brush storage horizontal driving unit 210 is operated to horizontally move the brush support 200 relative to the brush storage tank 100 by a predetermined length in the Y direction. More specifically, the brush support 200 moves in the Y direction by an amount corresponding to one pitch of the plurality of storage spaces (110a to 110d) arranged in the Y direction so as to approach the first end surface 105 of the brush storage tank 100. Fig.24 As shown, three brush devices 50 supported by the brush support 200 are respectively arranged in the first storage space 110a, the second storage space 110b and the third storage space 110c.

[0242] Next, if Fig.25 As shown by the white arrow in the middle, the brush storage lifting driving unit 220 is operated to lower the brush support body 200 to a predetermined height relative to the brush storage tank 100. Fig.26 As shown, the three brush devices 50 supported by the brush support 200 are accommodated in the brush storage hole 110. Thus, the three brush devices 50 are stored in the first storage space 110a, the second storage space 110b, and the third storage space 110c, respectively. In this state, the brushes 51 of the three brush devices 50 are immersed in the brush liquid stored in the brush storage tank 100.

[0243] As described above, the storage position of one or more brush devices 50 stored in the brush storage tank 100 is changed by moving the brush support 200 in the Z direction and the Y direction relative to the brush storage tank 100. Thereafter, when the brush device 50 stored in the first storage space 110a is taken out from the brush storage tank 100 by the next replacement process of the brush device 50, the process is repeated until the next replacement process is started. Figure 21 to Figure 26 A series of actions.

[0244] In the substrate processing apparatus 1 , when no brush device 50 exists in the brush storage tank 100 , the used brush device 50 in the brush disposal portion 60 is collected and the unused brush device 50 is filled into the brush storage tank 100 .

[0245] 7. Control system of substrate processing equipment

[0246] For the control system of the substrate processing device 1, Figure 1 The structure of the control unit 900 will be described together. Fig. 27 Yes means Figure 1 A block diagram of the structure of a control system of a substrate processing device 1. Fig. 27 As shown, the control unit 900 includes a central processing unit (CPU) 901, a random access memory (RAM) 902, a read only memory (ROM) 903, and a storage device 904. The RAM 902 is used as a work area of ​​the CPU 901. The ROM 903 stores a system program. The storage device 904 includes a storage medium such as a hard disk or a semiconductor memory, and stores a substrate cleaning program for performing a cleaning process of the substrate W and a replacement process program for performing a replacement process of the brush device 50.

[0247] In addition, the substrate cleaning program and the replacement processing program are provided in a state of being stored in a recording medium such as a compact disc read-only memory (CD-ROM) 909, and can also be installed in the ROM 903 or the storage device 904. Alternatively, the substrate cleaning program and the replacement processing program can be transmitted from a server outside the substrate processing apparatus 1 via a communication network and installed in the ROM 903 or the storage device 904.

[0248] The CPU 901 executes the substrate cleaning program and the replacement processing program, thereby controlling the operation of each part of the substrate processing device 1. Specifically, the control unit 900 controls the substrate holding drive unit 13. Thus, the control unit 900 holds the substrate W carried into the substrate processing device 1 on the substrate holding device 10 by changing the state of the plurality of holding pins 12 from the open state to the holding state. In addition, in order to carry out the substrate W from the substrate processing device 1, the control unit 900 changes the state of the plurality of holding pins 12 from the holding state to the released state. Furthermore, the control unit 900 controls the substrate rotation drive unit 14. Thus, the control unit 900 rotates the substrate W held by the substrate holding device 10 at a preset speed.

[0249] In addition, the control unit 900 controls the cup body lifting drive unit 22. Thus, the control unit 900 controls the cup body lifting drive unit 22 during the cleaning process of the substrate W. Figure 1 The cup body 21 moves between the cup upper position and the cup lower position. In addition, the control unit 900 controls the fluid supply system 32. Thus, the control unit 900 controls the substrate W during the cleaning process. Figure 1 The fluid nozzle 31 supplies the cleaning fluid.

[0250] In addition, the control unit 900 controls the arm horizontal driving unit 45 and the arm lifting driving unit 46. Thus, the control unit 900 moves the brush arm 41 in the chamber CH during the cleaning process of the substrate W and the replacement process of the brush device 50.

[0251] The control unit 900 controls the brush liquid supply system 80 and the brush liquid discharge system 90. The control unit 900 adjusts the brush liquid supply amount to the brush storage tank 100 and the brush liquid discharge amount from the brush storage tank 100 so that a predetermined amount of brush liquid is stored in the brush storage tank 100.

[0252] Furthermore, the control unit 900 controls the storage brush horizontal driving unit 210 and the storage brush lifting driving unit 220. Thus, the control unit 900 moves the brush support 200 in the Z direction and the Y direction to perform the above-mentioned replacement process after the replacement process of the brush device 50 and before the next replacement process. Figure 21 to Figure 26 Thus, the unused brush device 50 is stored in the first storage space 110a located below the mounting position P3.

[0253] 8. Effect

[0254] (a) In the substrate processing apparatus 1, one brush device 50 is held by the brush holding portion 42 of the brush arm 41, and the substrate W is cleaned using the brush device 50. At this time, one or more unused brush devices 50 may be temporarily stored in the brush storage tank 100 of the brush storage device 70.

[0255] When one brush device 50 is contaminated or deteriorated to the extent that it needs to be replaced, the brush device 50 is removed from the brush holding portion 42 at the removal position P2 using the brush discarding portion 60. Thereafter, the brush holding portion 42 is moved to the installation position P3, and the brush device connecting portion 400 of the brush holding portion 42 is connected to the connected column 56 of the unused brush device 50 stored in the brush storage device 70. Thus, a new brush device 50 is held in the brush holding portion 42. In this way, the replacement process of the brush device 50 is performed.

[0256] When cleaning the substrate W using the brush device 50, the cleaning surface 51S of the brush 51 needs to be moistened to a certain extent. It takes a certain amount of time (for example, 15 minutes) to moisten the dry cleaning surface 51S to a degree suitable for cleaning the substrate W.

[0257] According to the above configuration, the cleaning surface 51S of the brush device 50 stored in the brush storage tank 100 of the brush storage device 70 is kept wet by the brush liquid supplied and stored in the brush storage tank 100. Therefore, after the replacement process of the brush device 50, it is not necessary to wet the cleaning surface 51S of the brush device 50 before the substrate W is cleaned using the new brush device 50 held in the brush holding portion 42. As a result, the time required from the replacement of the brush device 50 to the restart of the cleaning process using the brush device 50 can be shortened.

[0258] (b) A plurality of storage spaces (110a to 110d) arranged in one direction are formed in the brush storage tank 100. Thus, a plurality of brush devices 50 can be stored in each of the plurality of storage spaces (110a to 110d).

[0259] (c) In the brush storage device 70, an installation position P3 is set above the first storage space 110a. In addition, in the brush storage device 70, the storage brush horizontal driving unit 210 and the storage brush lifting driving unit 220 are operated during the period between the replacement process of one brush device 50 and the next replacement process. As a result, the storage positions of the brush devices 50 stored in the storage spaces (110b, 110c, 110d) other than the first storage space 110a are sequentially changed so as to approach the first storage space 110a. Therefore, the replacement process of the brush device 50 is smoothly performed at the preset installation position P3.

[0260] (d) In the brush storage device 70, the brush device 50 stored in the brush storage tank 100 is lifted to a height position higher than the liquid level of the brush liquid stored in the brush storage tank 100 when the storage position is changed. Then, the brush device 50 moves in the Y direction. In this case, the brush device 50 does not move in the horizontal direction in a state of being in contact with the brush liquid stored in the brush storage tank 100. Therefore, the liquid level of the brush liquid stored in the brush storage tank 100 is less likely to be disturbed. As a result, the brush liquid is prevented from leaking from the brush storage tank 100.

[0261] (e) In the brush storage tank 100, four storage spaces (110a to 110d) are formed from the first end surface 105 toward the second end surface 106 so as to be interconnected and arranged in a row in a horizontal plane. The first end surface 105 is connected to the pipe 81 of the brush liquid supply system 80. The second end surface 106 is connected to the pipe 91 of the brush liquid discharge system 90. As a result, in the brush storage tank 100, the brush liquid supplied from the pipe 81 flows smoothly from one end to the other end of the brush storage tank 100. Therefore, when one or more brush devices 50 are stored in the brush storage tank 100, the cleaning surface 51S of each brush device 50 can be always immersed in the supplied new brush liquid.

[0262] (f) A portion of the brush storage groove 100 (the portion forming the first storage space 110a) overlaps with the imaginary straight line L1 on which the brush holding portion 42 moves when the substrate W is cleaned when viewed from above. In addition, the brush discarding portion 60 also overlaps with the imaginary straight line L1 when viewed from above. Thus, a standby position P1, a removal position P2, and an installation position P3 are set on the imaginary straight line L1. In this case, when the brush device 50 is replaced, the used brush device 50 can be smoothly moved to the removal position P2 after the substrate W is cleaned. In addition, the brush holding portion 42 from which the brush device 50 has been removed can be smoothly moved to the installation position P3.

[0263] (g) The brush device connecting portion 400 includes a spring 432. In the brush device connecting portion 400, when the connected column 56 is inserted into the first barrel 421, an engaging force is generated between the brush device connecting portion 400 and the connected column 56 due to the spring 432. Thus, by inserting the connected column 56 into the first barrel 421 with a pressing force greater than a certain value, the brush device 50 can be easily connected to the brush device connecting portion 400. In addition, by pulling out the connected column 56 inserted into the first barrel 421 with a tensile force greater than a certain value, the brush device 50 connected to the brush device connecting portion 400 can be easily removed. In this way, according to the structure of the brush device connecting portion 400 and the connected column 56 of the brush device 50, the brush device 50 can be loaded and unloaded with respect to the brush device connecting portion 400 by simple actions.

[0264] 9. Other Implementation Methods

[0265] (a) In the brush storage device 70 of the above embodiment, the brush arm 41 holding the brush device 50 moves in the X direction in a plan view. Therefore, in the above embodiment, the standby position P1, the removal position P2, and the mounting position P3 are set on a common virtual straight line L1. However, the present invention is not limited to the above example.

[0266] Fig.28 1 is a schematic plan view of a substrate processing apparatus 1 according to another embodiment. Fig.28 The structure of the brush arm device 40 of the substrate processing device 1 is Figure 1 The substrate processing apparatus 1 is different. Fig.28 The brush arm device 40 includes a brush arm 41 , an arm support portion 44 , an arm rotation driving portion 47 and an arm lifting and lowering driving portion 48 .

[0267] The arm support part 44 of this example is fixed to the bottom surface of the chamber CH at a position on the side of the substrate holding device 10. In addition, the arm support part 44 has a rotation axis extending in the Z direction. The rotation axis 44S is provided to be able to rise and fall in the Z direction and to be able to rotate around the axis of the rotation axis 44S.

[0268] The arm rotation drive unit 47 is, for example, a motor, and rotates the rotation shaft 44S about its axis under the control of the control unit 900. The arm lifting drive unit 48 includes, for example, an actuator such as a cylinder or a motor, and moves the rotation shaft 44S in the Z direction under the control of the control unit 900.

[0269] The brush arm 41 has Figure 1 The brush arm 41 has a structure basically the same as that of the brush arm 41, and one end thereof is mounted on the rotating shaft 44S. The brush arm 41 extends horizontally from the rotating shaft 44S at a position higher than the substrate holding device 10 and the cup body device 20. The other end (top end) of the brush arm 41 is configured as a brush holding portion 42 in a manner that can hold and remove (can be attached and detached) the brush device 50.

[0270] The arm rotation driving unit 47 rotates the rotation shaft 44S, and the brush holding unit 42 moves in a manner that passes through the imaginary arc L2 that passes through the rotation center SC of the rotation base 11 with the axis of the rotation shaft 44S as a reference when viewed from above. Therefore, in this example, the standby box 49, the substrate holding device 10, the brush discarding unit 60, and the brush storage device 70 are arranged in this order on the imaginary arc L2. As a result, in the substrate processing device 1, the standby position P1, the removal position P2, and the installation position P3 are set in a manner that they are arranged on the imaginary arc L2 when viewed from above.

[0271] In this case, when the brush device 50 is replaced after cleaning the substrate W, the used brush device 50 can be smoothly moved to the removal position P2. In addition, the brush holder 42 with the brush device 50 removed can be smoothly moved to the attachment position P3.

[0272] (b) In the brush storage device 70 of the above embodiment, the storage position of the brush device 50 in the brush storage tank 100 is changed by moving the brush support 200 relative to the brush storage tank 100, but the present invention is not limited to this. In the brush storage device 70, the position of the brush device 50 in the brush storage tank 100 may be changed by moving the brush storage tank 100 relative to the brush support 200.

[0273] Fig.29 1 is a schematic plan view of a substrate processing apparatus 1 according to still another embodiment. Fig.29 The structure of the brush storage device 70 of the substrate processing device 1 is Figure 1 The substrate processing apparatus 1 is different. Fig.29 The brush storage device 70 includes a slot horizontal driving unit 510 and a slot lifting driving unit 520 to replace Figure 1 The storage brush horizontal driving unit 210 and the storage brush lifting driving unit 220 are provided.

[0274] The tank horizontal driving unit 510 includes an actuator such as a motor or an air cylinder, and is configured to be able to adjust the horizontal direction (in this example, the Y direction) position of the brush storage tank 100. The tank lifting driving unit 520 includes an actuator such as a motor or an air cylinder, and is configured to be able to adjust the Z direction position of the brush storage tank 100.

[0275] In the substrate processing apparatus 1 of this example, when the brush device 50 stored in the second storage space 110b is pulled out from the second storage space 110b and moved to the first storage space 110a, for example, the brush support 200 is maintained in a stationary state.

[0276] Specifically, in a state where one brush device 50 is stored in the second storage space 110b and supported by the brush support 200, the tank lifting and lowering driving unit 520 moves the brush storage tank 100 downward based on the control of the control unit 900. Thus, in a state where the brush support 200 is stationary, one brush device 50 is pulled out from the second storage space 110b.

[0277] Next, the trough horizontal driving unit 510 moves the brush storage trough 100 in the Y direction based on the control of the control unit 900 so that the first storage space 110 a is located below one brush device 50 held by the brush support 200 .

[0278] Thereafter, the tank lifting drive unit 520 moves the brush storage tank 100 upward based on the control of the control unit 900. Thus, the one brush device 50 held by the brush support 200 is stored in the first storage space 110a. Finally, the tank horizontal drive unit 510 moves the brush storage tank 100 in the Y direction based on the control of the control unit 900 so that the one brush device 50 stored in the first storage space 110a is located below the installation position P3. Thus, similarly to the above-described embodiment, the storage position of the brush device 50 in the brush storage tank 100 can be changed in the brush storage device 70.

[0279] (c) The brush storage tank 100 of the above embodiment is configured to simultaneously hold four brush devices 50, but the present invention is not limited thereto. The brush storage tank 100 may be configured to simultaneously hold only two brush devices 50, or may be configured to simultaneously hold only three brush devices 50, or may be configured to simultaneously hold five or more brush devices 50.

[0280] (d) In the brush storage device 70 of the above embodiment, the brush 51 of the brush device 50 stored in the brush storage tank 100 is maintained in a wet state by storing the brush liquid in the brush storage tank 100, but the present invention is not limited to this. The brush storage device 70 may have a structure in which the brush liquid supplied from the brush liquid supply system 80 is always sprayed toward the brush 51 of the stored brush device 50. Even in such a structure, an unused brush device 50 whose brush 51 is maintained in a wet state may be stored in the chamber CH in advance.

[0281] (e) The storage brush lifting drive unit 220 of the above embodiment is configured to lift the brush support 200 using the cylinder 221, but the present invention is not limited thereto. The storage brush lifting drive unit 220 may also be configured to include other drive sources such as a motor instead of the cylinder 221, and the brush support 200 may be lifted or lowered using the power of the other drive source.

[0282] (f) The brush storage hole 110 of the brush storage tank 100 in the above embodiment is configured to be able to accommodate a portion of the brush device 50 , but the brush storage hole 110 may be configured to be able to accommodate the entire brush device 50 .

[0283] (g) The brush holding portion 42 of the above embodiment is configured to be detachable from the connected column 56 of the brush device 50 by the elastic force of the spring 432 through the brush device connecting portion 400, but the present invention is not limited to this. The brush holding portion 42 may also have an actuator that holds the brush device 50 so that it can be detached. For example, the brush holding portion 42 may also include two or more claws configured to hold and release the connected column 56 of the brush device 50, and a driving source such as a motor that drives these claws instead of the brush device connecting portion 400.

[0284] (h) In the substrate processing apparatus 1 of the embodiment, the substrate holding device 10 has a so-called mechanical chuck structure for holding the substrate W by bringing the plurality of holding pins 12 into contact with the outer peripheral end of the substrate W, but the present invention is not limited thereto. The substrate holding device 10 may also have an adsorption structure for holding the central portion of the lower surface of the substrate W by adsorption.

[0285] (i) The brush support 200 of the above embodiment may be configured to release the support state for the one brush device 50 whenever the storage position of the one brush device 50 is changed from the second storage space 110b to the first storage space 110a. In this case, the storage brush horizontal driving unit 210 and the storage brush lifting driving unit 220 of the brush storage device 70 may return the brush support 200 after releasing the support state for the one brush device 50 to the position before the above operation (original position).

[0286] (j) In the brush storage device 70 of the above embodiment, the installation position P3 is set above the first storage space 110a. However, the present invention is not limited thereto. The installation position P3 may be set at a position other than above the brush storage tank 100. In the above case, the brush storage device 70 may be configured so that the brush device 50 is moved to the installation position P3 by the brush storage tank 100 or the brush support 200.

[0287] (k) The brush device 50 and the brush device connection part 400 of the above embodiment are configured to be connected to each other and to be removable along with movement in the vertical direction. However, the present invention is not limited thereto. The brush device 50 and the brush device connection part 400 may also be configured to be connected to each other and to be removable along with movement in the horizontal direction. In addition, the brush storage tank 100 may also have a structure in which an opening is formed in a part of one of the first side surface 103 or the second side surface 104. The opening provided in one side surface is formed in the upper part of the one side surface so that a certain amount of cleaning liquid can be stored in the brush storage tank 100.

[0288] When the brush device 50, the brush device connection part 400, and the brush storage tank 100 have the above-described structure, the brush device connection part 400 moves toward the installation position P3 during the brush replacement process as follows. First, the brush device connection part 400 is adjusted in the vertical direction by the arm lifting and lowering driving part 46 at a position near the brush storage tank 100, and is arranged to face the opening of one side of the brush storage tank 100 in the horizontal plane. Next, the brush device connection part 400 moves to the installation position P3 in a manner that enters the inside of the brush storage tank 100 through the opening of one side as it moves in the horizontal direction based on the arm horizontal driving part 45. At this time, the brush device connection part 400 contacts a part of the brush device 50 in the brush storage tank 100, thereby connecting the brush device 50 and the brush device connection part 400 to each other.

[0289] Thus, according to the above structure, a certain amount of cleaning liquid can be stored in the brush storage tank 100 , and the brush device connection part 400 and the brush device 50 can be connected to each other through the opening formed on the first side surface 103 or the second side surface 104 .

[0290] 10. Correspondence between each component of the claims and each part of the embodiments

[0291] Hereinafter, examples of correspondence between the components of the claims and the components of the embodiments will be described, but the present invention is not limited to the following examples. As the components of the claims, various other components having the structures or functions described in the claims may also be used.

[0292] In the embodiment, the substrate processing device 1 is an example of a substrate processing device, the substrate holding device 10 is an example of a substrate holding portion, the connected column 56 is an example of a connected portion, the cleaning surface 51S is an example of a cleaning surface, the brush device 50 used in the cleaning process of the substrate W is an example of a first cleaning tool, the brush device 50 stored in the brush storage tank 100 is an example of a second cleaning tool, the brush device connecting portion 400 is an example of a connecting portion, and the brush holding portion 42 is an example of a cleaning tool holding portion.

[0293] In addition, the brush storage device 70 is an example of a cleaning tool storage unit, the arm horizontal driving unit 45, the arm lifting driving unit 46, the arm lifting driving unit 48 and the arm rotation driving unit 47 are examples of a cleaning tool holding unit moving device, the brush liquid supply system 80 is an example of a processing liquid supply unit, the brush liquid is an example of a processing liquid, and the control unit 900 is an example of a control unit.

[0294] In addition, the brush storage tank 100 is an example of a cleaning tool storage tank, the first storage space 110a, the second storage space 110b, the third storage space 110c and the fourth storage space 110d are examples of multiple storage spaces, the first storage space 110a is an example of one storage space, and the brush support 200, the storage brush horizontal drive unit 210, the storage brush lifting drive unit 220, the tank lifting drive unit 520 and the tank horizontal drive unit 510 are examples of a position changing unit.

[0295] In addition, the storage brush horizontal drive unit 210 is an example of a horizontal moving unit, the storage brush lifting drive unit 220 is an example of a lifting moving unit, the liquid inlet 107a is an example of a processing liquid inlet, the liquid outlet 107b is an example of a processing liquid outlet, the imaginary straight line L1 is an example of a straight line, and the imaginary arc L2 is an example of an arc.

[0296] Furthermore, if Fig. 20 As shown, the height position of the brush support body 200 when the support plate 201 is close to the upper surface 101 of the brush storage tank 100 is an example of a lower height position. Fig. 22 As shown, the height position of the brush support body 200 when the support plate 201 is separated from the upper surface 101 of the brush storage tank 100 by a distance greater than the height of the brush device 50 is an example of the upper height position.

[0297] 11. Summary of implementation methods

[0298] (Item 1) The substrate processing apparatus of Item 1 includes:

[0299] A substrate holding portion that holds a substrate;

[0300] The first cleaning tool and the second cleaning tool each have a connected portion and a cleaning surface;

[0301] a cleaning tool holding portion having a connecting portion that can be detachably connected to the connected portions of the first cleaning tool and the second cleaning tool, and holding the first cleaning tool and the second cleaning tool respectively by connecting the connecting portion to the connected portion;

[0302] a cleaning tool storage unit, which is disposed at a position away from the substrate held by the substrate holding unit and temporarily stores the second cleaning tool while the first cleaning tool is held by the cleaning tool holding unit;

[0303] a cleaning tool holding portion moving device for moving the cleaning tool holding portion so that the cleaning surface of the first cleaning tool or the second cleaning tool held in the cleaning tool holding portion contacts the substrate, and for moving the cleaning tool holding portion to the cleaning tool storage portion;

[0304] a processing liquid supply unit for supplying a predetermined processing liquid to the cleaning tool storage unit; and

[0305] Control Department,

[0306] The control unit controls the cleaning tool holding unit moving device in a state where the cleaning tool holding unit holds the first cleaning tool, thereby cleaning the substrate held by the substrate holding unit, and controls the cleaning tool holding unit moving device after the first cleaning tool used for cleaning the substrate is removed from the cleaning tool holding unit, thereby connecting the connecting portion of the cleaning tool holding unit to the connected portion of the second cleaning tool temporarily stored in the cleaning tool storage unit.

[0307] The cleaning tool storage unit is configured such that the cleaning surface of the temporarily stored second cleaning tool is maintained in a wet state by the processing liquid supplied from the processing liquid supply unit.

[0308] In the substrate processing device, the cleaning tool holding part is moved in a state where the first cleaning tool is held in the cleaning tool holding part so that the cleaning surface of the first cleaning tool contacts the substrate held by the substrate holding part. Thus, the substrate is cleaned. At this time, the second cleaning tool is temporarily stored in the cleaning tool storage part.

[0309] When the first cleaning tool is contaminated or deteriorated to the extent that it needs to be replaced, the first cleaning tool is removed from the cleaning tool holding part. Thereafter, the cleaning tool holding part is moved to the cleaning tool storage part, and the connecting part of the cleaning tool holding part is connected to the connected part of the second cleaning tool stored in the cleaning tool storage part. In this way, the cleaning tool held in the cleaning tool holding part is replaced with a new cleaning tool.

[0310] When cleaning a substrate with a cleaning tool, the cleaning surface of the cleaning tool needs to be moistened to a certain extent. In order to moisten the cleaning surface in a dry state to a degree suitable for cleaning the substrate, a certain amount of time (e.g., 15 minutes) is required.

[0311] According to the structure, the cleaning surface of the second cleaning tool stored in the cleaning tool storage unit is kept wet by the processing liquid supplied to the cleaning tool storage unit. Therefore, after the cleaning tool held by the cleaning tool holding unit is replaced from the first cleaning tool to the second cleaning tool, it is not necessary to wet the cleaning surface of the second cleaning tool before the substrate is cleaned using the new second cleaning tool. As a result, the time required from replacing the cleaning tool to restarting the cleaning process using the cleaning tool can be shortened.

[0312] (Second item) According to the substrate processing device described in the first item, it is also possible to

[0313] The cleaning tool storage portion includes a cleaning tool storage tank, wherein the cleaning tool storage tank has a storage space that is open upward and can store the second cleaning tool by accommodating at least a portion of the second cleaning tool including the cleaning surface.

[0314] The cleaning tool storage tank is configured to store the processing liquid supplied from the processing liquid supply unit in the storage space.

[0315] In this case, by storing the second cleaning tool in the storage space of the cleaning tool storage tank, the cleaning surface of the second cleaning tool can be immersed in the processing liquid stored in the storage space. Thus, the cleaning surface of the second cleaning tool stored in the cleaning tool storage portion is maintained in a wet state with a simple structure.

[0316] (Item 3) According to the substrate processing device described in Item 2, it is also possible

[0317] The cleaning tool storage tank is configured to have a plurality of storage spaces, and the connecting portion of the cleaning tool holding portion can be connected to the connected portion of the second cleaning tool when the second cleaning tool is stored in one of the plurality of storage spaces.

[0318] The cleaning tool storage unit also includes a position changing unit.

[0319] The position changing unit changes the positional relationship between the second cleaning tool and the cleaning tool storage tank by moving at least one of the second cleaning tool and the cleaning tool storage tank.

[0320] The control unit controls the position changing unit in a state where the second cleaning tool is stored in another storage space among the plurality of storage spaces, thereby moving the second cleaning tool held in the other storage space from the other storage space to the one storage space.

[0321] In the case, a plurality of cleaning tools including the second cleaning tool can be stored in a plurality of storage spaces. In addition, according to the structure, a position on a storage space of the cleaning tool storage tank can be set as an installation position for installing the second cleaning tool on the cleaning tool holding portion.

[0322] (Item 4) The substrate processing device according to Item 3 may also

[0323] The position changing unit comprises:

[0324] A horizontal moving part, which moves the second cleaning tool in a horizontal direction; and

[0325] The lifting and moving part moves the second cleaning tool in the up-down direction.

[0326] In this case, the second cleaning tool moves in the horizontal direction and the vertical direction between the plurality of storage spaces.

[0327] (Item 5) According to the substrate processing device described in Item 4, it is also possible

[0328] The lifting and moving part is configured to enable the second cleaning tool to move between a lower height position when the second cleaning tool is stored in any one of the plurality of storage spaces and an upper height position when the second cleaning tool is located above the liquid level of the processing liquid stored in the cleaning tool storage tank.

[0329] The control unit controls the horizontal moving unit and the lifting moving unit when moving the second cleaning tool held in the other storage space to the one storage space, thereby raising the second cleaning tool held in the other storage space from the lower height position to the upper height position, moving the second cleaning tool located at the upper height position in the horizontal direction to a position above the one storage space, and lowering the second cleaning tool moved to the position above the storage space from the upper height position to the lower height position.

[0330] In the above case, the second cleaning tool does not move horizontally while being in contact with the treatment liquid stored in the cleaning tool storage tank. Therefore, the liquid level of the treatment liquid stored in the cleaning tool storage tank is not easily disturbed. As a result, the treatment liquid is prevented from leaking from the cleaning tool storage tank.

[0331] (Item 6) The substrate processing device according to any one of Items 3 to 5 may also be

[0332] The plurality of storage spaces are interconnected and arranged in a row in a horizontal plane.

[0333] The cleaning tool storage tank comprises: a treatment liquid inlet for introducing the treatment liquid into a storage space located at one end of the plurality of storage spaces; and

[0334] The processing liquid outlet discharges the processing liquid stored in the plurality of storage spaces from a storage space located at the other end of the plurality of storage spaces.

[0335] In this case, the processing liquid can be smoothly circulated in the plurality of storage spaces. Therefore, the cleaning surface of the second cleaning tool can be always immersed in the supplied new processing liquid while the second cleaning tool is stored in the cleaning tool storage tank.

[0336] (Item 7) The substrate processing device according to any one of Items 3 to 6 may also be

[0337] The cleaning tool holding portion moving device moves the cleaning tool holding portion in a manner that follows a straight line or an arc passing through the center of the substrate when viewed from above when the substrate is cleaned using the first cleaning tool or the second cleaning tool.

[0338] The one storage space of the cleaning tool storage tank overlaps the one straight line or the one circular arc in a plan view.

[0339] In this case, after the substrate is cleaned with the first cleaning tool, the cleaning tool holding portion from which the first cleaning tool is removed can be smoothly moved to one storage space of the cleaning tool storage tank.

Claims

1. A substrate processing device, comprising: A substrate holding portion that holds a substrate; The first cleaning tool and the second cleaning tool each have a connected portion and a cleaning surface; a cleaning tool holding portion having a connecting portion that can be detachably connected to the connected portions of the first cleaning tool and the second cleaning tool, and holding the first cleaning tool and the second cleaning tool respectively by connecting the connecting portion to the connected portion; a cleaning tool storage unit, which is disposed at a position away from the substrate held by the substrate holding unit and temporarily stores the second cleaning tool while the first cleaning tool is held by the cleaning tool holding unit; a cleaning tool holding portion moving device for moving the cleaning tool holding portion so that the cleaning surface of the first cleaning tool or the second cleaning tool held in the cleaning tool holding portion contacts the substrate, and for moving the cleaning tool holding portion to the cleaning tool storage portion; a treatment liquid supply unit for supplying a predetermined treatment liquid to the cleaning tool storage unit; as well as Control Department, The control unit controls the cleaning tool holding unit moving device in a state where the cleaning tool holding unit holds the first cleaning tool, thereby cleaning the substrate held by the substrate holding unit, and controls the cleaning tool holding unit moving device after the first cleaning tool used for cleaning the substrate is removed from the cleaning tool holding unit, thereby connecting the connecting portion of the cleaning tool holding unit to the connected portion of the second cleaning tool temporarily stored in the cleaning tool storage unit. The cleaning tool storage unit is configured such that the cleaning surface of the temporarily stored second cleaning tool is maintained in a wet state by the processing liquid supplied from the processing liquid supply unit.

2. The substrate processing apparatus according to claim 1, wherein the cleaning tool storage portion comprises a cleaning tool storage tank, the cleaning tool storage tank having a storage space open upward and capable of storing the second cleaning tool by accommodating at least a portion of the second cleaning tool including the cleaning surface, The cleaning tool storage tank is configured to store the processing liquid supplied from the processing liquid supply unit in the storage space.

3. The substrate processing apparatus according to claim 2, wherein the cleaning tool storage tank is configured to have a plurality of the storage spaces, and the connecting portion of the cleaning tool holding portion can be connected to the connected portion of the second cleaning tool in a state where the second cleaning tool is stored in one of the plurality of storage spaces. The cleaning tool storage unit also includes a position changing unit. The position changing unit changes the positional relationship between the second cleaning tool and the cleaning tool storage tank by moving at least one of the second cleaning tool and the cleaning tool storage tank. The control unit controls the position changing unit in a state where the second cleaning tool is stored in another storage space among the plurality of storage spaces, thereby moving the second cleaning tool held in the other storage space from the other storage space to the one storage space.

4. The substrate processing apparatus according to claim 3, wherein the position changing unit comprises: A horizontal moving part, which moves the second cleaning tool in a horizontal direction; as well as The lifting and moving part moves the second cleaning tool in the up-down direction.

5. The substrate processing apparatus according to claim 4, wherein the lifting and moving part is configured to enable the second cleaning tool to move between a lower height position when the second cleaning tool is stored in any one of the plurality of storage spaces and an upper height position when the second cleaning tool is located above a liquid level of the processing liquid stored in the cleaning tool storage tank, The control unit controls the horizontal moving unit and the lifting moving unit when moving the second cleaning tool held in the other storage space to the one storage space, thereby raising the second cleaning tool held in the other storage space from the lower height position to the upper height position, moving the second cleaning tool located at the upper height position in the horizontal direction to a position above the one storage space, and lowering the second cleaning tool moved to the position above the storage space from the upper height position to the lower height position.

6. The substrate processing apparatus according to any one of claims 3 to 5, wherein the plurality of storage spaces are formed in a manner of being interconnected and arranged in a row in a horizontal plane, The cleaning tool storage tank comprises: a treatment liquid inlet for introducing the treatment liquid into a storage space located at one end of the plurality of storage spaces; and The processing liquid outlet discharges the processing liquid stored in the plurality of storage spaces from a storage space located at the other end of the plurality of storage spaces.

7. The substrate processing apparatus according to any one of claims 3 to 6, wherein the cleaning tool holding portion moving device moves the cleaning tool holding portion in a manner that follows a straight line or an arc passing through the center of the substrate when viewed from above when the substrate is cleaned using the first cleaning tool or the second cleaning tool, The one storage space of the cleaning tool storage tank overlaps the one straight line or the one circular arc in a plan view.

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