Microchannel plate hydrogen-oriented reduction apparatus and method

Abstract

The present application relates to a kind of microchannel plate hydrogen orientation reduction equipment and method.The equipment includes: microchannel plate hydrogen reduction device, which includes the chamber for microchannel plate placement and hydrogen reduction;First pipeline;Second pipeline, one end is connected with the first pipeline, the other end is connected with the microchannel plate hydrogen reduction device;Flow and pressure measuring system and valve are further provided on the second pipeline;The valve is arranged downstream of flow and pressure measuring system;Exhaust hole is arranged on the microchannel plate hydrogen reduction device;When the valve is closed, the gas in the microchannel plate is only communicated with the outside gas through the exhaust hole.The technical problem solved is how to provide a device and method, so that the bulk resistance of microchannel plate is stable, and the deformation of microchannel plate is reduced or even avoided.

Description

Technical Field

[0001] This invention belongs to the field of optoelectronic technology, and in particular relates to a microchannel plate hydrogen directional reduction device and method. Background Technology

[0002] In recent years, with the development of low-light night vision technology and strong market demand, users have increasingly higher requirements for the resolution of low-light image intensifiers. Correspondingly, the smaller the channel aperture and the shorter the center-to-center distance of the microchannel plate (MCP), the higher the resolution. One problem with miniaturizing the channel aperture is that to achieve the optimal aspect ratio, the MCP substrate for high resolution is thinner, which reduces mechanical strength. This results in poor volume resistivity stability during the MCP manufacturing process and makes it prone to deformation and scrapping.

[0003] In production, the hydrogen reduction process of MCP plays a crucial role in stabilizing its bulk resistivity and reducing its deformation. Current technology employs diffusion hydrogen reduction for MCP processing. Once the material reaches the required temperature, hydrogen gas at a certain pressure and flow rate is injected into the reaction chamber. The hydrogen enters the vacuum furnace cavity through an inlet pipe inserted directly into the furnace body. Once inside the furnace cavity, the hydrogen is adsorbed on the MCP surface and diffuses into the MCP channels, thus reducing the MCP and achieving a specific bulk resistivity. One literature discloses a device and method for microchannel plate pressure-controlled hydrogen reduction. This device uses a pressure control system to regulate the gas pressure within the sealed reaction chamber during hydrogen reduction, ensuring the chamber remains under controllable constant pressure throughout the process. This, to a certain extent, minimizes the difference in bulk resistivity between each MCP after hydrogen reduction. Summary of the Invention

[0004] The objective of this invention and the technical problem it solves are achieved through the following technical solution. A microchannel plate hydrogen-directed reduction device according to this invention comprises:

[0005] A microchannel plate hydrogen reduction device, comprising a chamber for placing the microchannel plate and reducing hydrogen;

[0006] First pipeline;

[0007] The second pipeline is connected at one end to the first pipeline and at the other end to the microchannel plate hydrogen reduction device; the second pipeline is also equipped with a flow and pressure measurement system and a valve; the valve is located downstream of the flow and pressure measurement system.

[0008] An exhaust port is provided on the microchannel plate hydrogen reduction device; when the valve is closed, the gas inside the chamber used for placing the microchannel plate and hydrogen reduction is connected to the outside only through the exhaust port.

[0009] The objectives of this invention and the technical problems it addresses can be further achieved by the following technical measures.

[0010] Preferably, in the aforementioned device, the microchannel plate hydrogen reduction device has 4 to 6 exhaust holes; and the diameter of each exhaust hole is 4 to 6 mm.

[0011] Preferably, in the aforementioned device, the microchannel plate hydrogen reduction device includes a cover and a support; the cover and the support are detachably connected together, and the support is provided with a slot for placing the microchannel plate; the vent is provided on the upper surface of the cover; a protrusion is provided at the bottom of the upper surface of the cover; the protrusion is used to cooperate with the slot to clamp the edge area of ​​the microchannel plate.

[0012] Preferably, in the aforementioned device, the cover and the support are made of copper.

[0013] Preferably, the aforementioned device further includes a housing, the upper surface of which is provided with a groove; the bottom of the groove has a hollow structure; the microchannel plate hydrogen reduction device is connected to the groove; a first inlet is provided on the wall of the housing, and the first inlet is connected to the first pipe.

[0014] Preferably, the aforementioned device includes multiple microchannel plate hydrogen reduction devices.

[0015] Preferably, in the aforementioned equipment, a hydrogen homogenization device is further provided between the first pipeline and the second pipeline; the hydrogen homogenization device includes:

[0016] Homogenization chamber;

[0017] The second inlet is located on the wall of the homogenization chamber;

[0018] A third pipe is arranged in a ring around the inner wall of the homogenization chamber; one end of the third pipe is connected to the first pipe through the second inlet; the third pipe is also provided with a plurality of small holes;

[0019] The outlet is located on the wall of the homogenization chamber away from the second inlet, and the second pipe is connected to the homogenization chamber through the outlet.

[0020] Preferably, in the aforementioned equipment, the hydrogen homogenization device further includes a pressure control system for controlling the gas pressure of the hydrogen homogenization device within a constant range.

[0021] Preferably, the aforementioned device further includes:

[0022] The control system is connected to at least the gas supply system, the flow and pressure measurement system, and the valve, and is capable of regulating the gas flow of the gas supply system, monitoring the gas flow and pressure of the gas branch pipelines in real time, and opening or closing the valve.

[0023] The objective of this invention and the solution to its technical problem are also achieved by the following technical solution. According to the present invention, a microchannel plate directional hydrogen reduction method is proposed, wherein during the reduction reaction process in contact with hydrogen gas, the pressure at the inlet port of the microchannel plate is greater than the pressure at the outlet port of the microchannel plate, thereby driving the hydrogen gas to flow directionally within the microchannel plate.

[0024] By employing the above technical solutions, the microchannel plate hydrogen-directed reduction device and method proposed in this invention have at least the following advantages:

[0025] 1. This invention provides a microchannel plate hydrogen directional reduction device that can force hydrogen to flow directionally through the inside of the MCP channel and then flow out through the MCP channel. The contact degree between hydrogen and various parts of the inner wall of the channel is nearly consistent, thereby ensuring sufficient reduction along the inner wall of the MCP channel and uniform reduction along the axial and radial dimensions of the MCP. This achieves stable MCP volume resistance, reduces process time, effectively controls MCP deformation, and improves the yield rate.

[0026] 2. The present invention provides a microchannel plate hydrogen directional reduction device. Preferably, the device further includes a pressure control system, which can control the hydrogen concentration flowing through the MCP channel within a constant range, making the MCP hydrogen reduction more stable and reducing the bulk resistance.

[0027] 3. The present invention provides a microchannel plate hydrogen directional reduction device. Preferably, the device includes a microchannel plate hydrogen reduction device and a hydrogen homogenization device. The hydrogen is homogenized between entering the microchannel plate hydrogen reduction device to make the hydrogen concentration flowing into different microchannel plate hydrogen reduction devices the same, thereby reducing the volume resistance difference between different microchannel plates, maintaining the volume resistance stability between different microchannel plates, and further reducing microchannel deformation.

[0028] 4. This invention proposes a method for directional hydrogen reduction using microchannel plates. By adjusting and controlling the gas environment pressure at the inlet and outlet ends of the microchannel plate, hydrogen is forced to flow in a direction of decreasing pressure, thereby promoting directional flow of hydrogen within the microchannel plate. This, in turn, keeps the volume resistance within the microchannel plate stable, reducing or even preventing deformation of the microchannel plate.

[0029] The above description is merely an overview of the technical solution of the present invention. In order to better understand the technical means of the present invention and to implement it in accordance with the contents of the specification, the preferred embodiments of the present invention are described in detail below with reference to the accompanying drawings. Attached Figure Description

[0030] Figure 1 A schematic diagram of a microchannel plate hydrogen directional reduction device;

[0031] Figure 2 A schematic diagram of the internal structure of a microchannel plate hydrogen directional reduction device;

[0032] Figure 3 Top view of a microchannel plate hydrogen reduction device;

[0033] Figure 4 A schematic diagram of the structure of a microchannel plate hydrogen reduction device;

[0034] Figure 5 This is a top view of the support section;

[0035] Figure 6 This is a cross-sectional view of a microchannel plate hydrogen reduction device.

[0036] Figure 7 This is a schematic diagram of a hydrogen homogenization device.

[0037] Figure 8 The volume resistance test curves are for the examples and comparative examples. Detailed Implementation

[0038] To further illustrate the technical means and effects adopted by the present invention to achieve the intended purpose, the following, in conjunction with the accompanying drawings and preferred embodiments, details the microchannel plate hydrogen directional reduction device and method proposed according to the present invention. Its specific implementation methods, structure, features, and effects are described in detail below.

[0039] In the following text, microchannel plates may be abbreviated as "MCP".

[0040] With the development of research in the field of optoelectronic technology, the microchannel plates used are becoming thinner and thinner. The bulk resistance of thin microchannel plates prepared by traditional technology is uncontrollable. This not only causes the microchannel plates to deform and reduces the yield rate, but also seriously affects the resolution and other performance of optoelectronic devices prepared using such microchannel plates. Therefore, there is an urgent need in this field for a new equipment and method for preparing microchannel plates that can produce microchannel plates with good bulk resistance stability.

[0041] The inventors discovered that traditional techniques and devices for fabricating microchannel plates (MCPs) generally employ hydrogen reduction via diffusion. However, their research revealed that due to the small pore size of the microchannel plates used in modern optoelectronics, the traditional free diffusion method for hydrogen reduction fails to reach the interior of the channels. This results in more complete reduction at the channel ends with low volume resistivity, while the reduction is weaker at the center with higher volume resistivity, leading to unstable MCP volume resistivity. Furthermore, the uneven uniformity of reduction along the axial and radial dimensions of the MCP makes thinner and larger MCPs more prone to deformation. Existing devices and methods for controlled-pressure hydrogen reduction of microchannel plates can only maintain a constant hydrogen pressure and flow rate within the sealed reaction chamber, failing to guarantee uniform contact between hydrogen and the MCP channels, thus hindering sufficient MCP reduction and control over MCP deformation.

[0042] The purpose of this invention is to provide a microchannel plate hydrogen directional reduction device that makes the pressure at the inlet end of the microchannel plate lower than the pressure at the outlet end, forcing hydrogen to flow through the inside of the MCP channel. The degree of contact between the hydrogen and various parts of the inner wall of the channel is nearly uniform, thereby ensuring sufficient reduction along the inner wall of the MCP channel, uniform reduction along the axial and radial dimensions of the MCP, stabilizing the bulk resistance of the MCP, reducing process time, effectively controlling MCP deformation, and improving the yield.

[0043] Based on the above, the present invention provides a microchannel plate hydrogen directional reduction device and method. The technical problem to be solved is how to provide a microchannel plate hydrogen directional reduction device, through which the bulk resistance formed after the hydrogen reduction reaction of MCP is stabilized and the deformation of MCP is effectively controlled.

[0044] like Figure 1 and Figure 2 As shown, some embodiments of the present invention provide a microchannel plate hydrogen reduction device, the device including a microchannel plate hydrogen reduction unit 1, the interior of which has a chamber for placing the microchannel plate and reducing hydrogen; the device also includes a first pipe 2; a second pipe 3, one end of which is connected to the first pipe and the other end of which is connected to the microchannel plate hydrogen reduction unit; the second pipe is also provided with a flow and pressure measurement system 4 and a valve 5; the valve is located downstream of the flow and pressure measurement system. Preferably, in some embodiments, it is further provided with a housing 6 to protect the internal device, the upper surface of which is provided with a groove 7; the bottom of the groove is a hollow structure; the microchannel plate hydrogen reduction unit is connected to the groove; a first inlet 8 is provided on the wall of the housing, the first inlet being connected to the first pipe.

[0045] Preferably, in some embodiments of the aforementioned technical solution, the shell has multiple first inlets, and the gas enters the first pipe through the first inlets at different locations, which helps to distribute the gas evenly in the first pipe.

[0046] To enhance the sealing and stability of the microchannel plate hydrogen reduction device and the housing, preferably, in some embodiments, the microchannel plate hydrogen reduction device and the groove are provided with a locking structure for engagement; in other embodiments, the microchannel plate hydrogen reduction device and the groove are provided with external threads and internal threads that can be screwed together.

[0047] A top view of the microchannel plate hydrogen reduction device is shown below. Figure 3 As shown, an exhaust port 9 is provided at the top of the device. In the device of the present invention, when the valve is closed, the gas inside the microchannel plate is connected to the external environment only through the exhaust port; when the hydrogen pressure and flow rate in the second pipeline do not reach the preset requirements, the valve is closed, and the hydrogen gas introduced into the device cannot flow into the microchannel plate hydrogen reduction device; when the hydrogen pressure and flow rate in the second pipeline reach the preset requirements, the valve is opened, and the hydrogen gas sequentially enters the microchannel plate hydrogen reduction device through the first pipeline and the second pipeline, reacts with the microchannel plate, and the generated exhaust gas flows out from the exhaust port.

[0048] Because the microchannel plate hydrogen directional reduction device provided by this invention allows hydrogen gas to flow into the microchannel plate hydrogen reduction device through a first pipe and a second pipe, and the top of the microchannel plate hydrogen reduction device is connected to the external environment, the gas pressure at the part of the microchannel plate connected to the second pipe is necessarily higher than that at the part connected to the external environment. Therefore, the hydrogen gas will inevitably flow through the inside of the microchannel plate channel, and the exhaust gas will flow out from the exhaust hole at the top of the microchannel plate hydrogen reduction device. Thus, the device of this invention allows hydrogen gas to flow directionally through the inside of the microchannel plate channel, and the degree of contact between the hydrogen gas and various parts of the channel inner wall is nearly uniform, thereby ensuring sufficient reduction along the inner wall of the MCP channel, uniform reduction along the axial and radial dimensions of the MCP, achieving stable MCP bulk resistance, and effectively controlling MCP deformation.

[0049] To maintain the pressure difference between the inside and outside of the microchannel plate hydrogen reduction device and to ensure the smooth discharge of exhaust gas, thereby ensuring the directional flow of hydrogen from the microchannel plate hydrogen reduction chamber and the smooth progress of the reaction, it is preferable that the microchannel plate hydrogen reduction device has 4 to 6 exhaust holes; and the diameter of each exhaust hole is 4 to 6 mm; more preferably, after the device is placed with the microchannel plate, the distance between the exhaust hole and the microchannel plate is ≥3 cm.

[0050] Preferably, in some embodiments, to facilitate the installation of the microchannel plate, the microchannel plate hydrogen reduction device is configured as follows: Figure 4As shown, the device includes a cover portion 10 and a support portion 11; more preferably, the cover portion and the support portion are detachably connected together. To increase the sealing at the connection between the cover portion and the support portion, and to ensure the directional flow of hydrogen along the internal channels of the microchannel plate, in some embodiments, the cover portion and the support portion are provided with an engaging structure that allows them to engage with each other; in other embodiments, the inner side of the cover portion is provided with internal threads, and the outer side of the support portion is provided with external threads, with the support portion and the cover portion connected by threads. The vent hole is located on the upper surface of the cover portion.

[0051] like Figure 4 and 5 As shown, in some embodiments, the support includes a support column 13 and a platform 14, the support column being fixedly connected to the platform; the external thread is provided on the support column, and the slot 12 is provided on the platform for placing the microchannel plate.

[0052] like Figure 6 As shown, in order to further improve the stability and sealing of the cover and the support, in some embodiments, a groove 15 is provided on the cover and a screw hole 16 corresponding to the cover is provided on the support. The screw passes through the groove of the cover and the screw hole of the support and is screwed in, so that the stability and sealing of the cover and the support are better.

[0053] To prevent the microchannel plate from axially shifting during hydrogen reduction, in some embodiments, the microchannel plate is clamped and fixed by clips at the slot; more preferably, in some embodiments, a protrusion is provided at the bottom of the upper surface of the cover; the protrusion is used to cooperate with the slot to clamp the edge area of ​​the microchannel plate; more preferably, in some embodiments, the cover is formed by a top cover, a side wall, and a hollow annular bottom cover connected to the side wall, and the annular bottom cover, after being combined with the support, cooperates with the support to clamp the edge area of ​​the microchannel plate.

[0054] Preferably, in the aforementioned technical solution, the microchannel plate hydrogen reduction device is made of a material resistant to high temperature and high pressure. More preferably, the cover and support are made of copper, because copper has low hardness and will not damage the MCP, especially when the microchannel plate is clamped and fixed by the cover and support, protecting the MCP from damage. Even more preferably, the clamp is made of brass, which is easy to process and reduces clamp production costs.

[0055] In the aforementioned technical solutions, preferably in some embodiments, the microchannel plate hydrogen directional reduction equipment is equipped with multiple microchannel plate hydrogen reduction devices to improve production efficiency.

[0056] Preferably, in order to ensure that the hydrogen concentration introduced into each microchannel plate hydrogen reduction device is the same, that is, the hydrogen concentration in contact with all microchannel plates during the hydrogen reduction reaction is consistent, so as to reduce the volume resistance between microchannel plates, a hydrogen homogenization device is also provided between the second pipe and the first pipe. Before flowing into the second pipe, the hydrogen is homogenized by the hydrogen homogenization device to ensure that the hydrogen concentration in contact with each microchannel plate is the same.

[0057] like Figure 7 As shown, in some embodiments, the hydrogen homogenization device includes:

[0058] Homogenization chamber 17; in some embodiments, the homogenization chamber is a prism, and in other embodiments, the homogenization chamber is a cylinder.

[0059] The second inlet 18 is disposed on the wall of the homogenization chamber; in some embodiments, the second inlet is disposed on the bottom wall of the homogenization chamber, in some embodiments, the second inlet is disposed on the top wall of the homogenization chamber; in some embodiments, there may be one or more second inlets, and in other embodiments, the second inlet is provided with a valve that can be closed.

[0060] A third conduit 19 is arranged around the homogenization chamber along the inner wall of the homogenization chamber; in some embodiments, the third conduit is arranged around the inner wall of the homogenization chamber to help make the hydrogen gas diffuse more evenly in the homogenization chamber.

[0061] One end of the third pipe is connected to the first pipe through the second inlet; preferably, in some embodiments, the third pipe is also provided with multiple small holes, which helps to improve the diffusion of hydrogen in the homogenization chamber.

[0062] Outlet 20 is located on the wall of the homogenization chamber away from the second inlet; in some embodiments, there are multiple outlets; in other embodiments, the outlet is equipped with a valve (not shown in the figure) that can close the outlet, and the second pipe is detachably or fixedly connected to the outlet.

[0063] During operation, the device described in this invention allows hydrogen to flow through the first and third pipes, exiting from multiple small holes on the surface of the third pipe. This prevents excessive airflow that could lead to an excessively high hydrogen concentration at the top outlet of the homogenization chamber, which is closest to the inlet. The third pipe is arranged around the bottom of the homogenization chamber, ensuring uniform diffusion of hydrogen at the bottom. This uniform diffusion ensures that the hydrogen concentration flowing into each of the second pipes from each outlet at the top of the homogenization chamber remains consistent, thereby maintaining a consistent hydrogen concentration flowing into each microchannel plate hydrogen reduction device, and ensuring that the hydrogen concentration in contact with each microchannel plate remains consistent.

[0064] Preferably, in order to keep the concentration of hydrogen gas in contact with the microchannel plate during the hydrogen reduction reaction within a constant range along the time axis, in some embodiments, the hydrogen homogenization device further includes a pressure control system 21, which can work in conjunction with the gas supply system to control the gas pressure of the hydrogen homogenization device within a constant range.

[0065] Preferably, in some embodiments of the foregoing technical solution, it further includes: a control system (not shown in the figure), which is connected at least to the flow and pressure measurement system and the valve, and is capable of regulating the gas flow rate of the gas supply system, monitoring the gas flow rate and pressure of the gas branch pipeline in real time, and opening or closing the valve. In other embodiments, the control system is also connected to a pressure control system to regulate the pressure of the hydrogen homogenization device to maintain it within a constant range. In still other embodiments, the control system is also connected to the gas supply system.

[0066] Preferably, in some embodiments, the microchannel plate hydrogen reduction device is further provided with a temperature monitoring system for monitoring the reaction temperature inside the device.

[0067] The microchannel plate hydrogen directional reduction device provided by this invention is suitable for MCPs to be reduced with hydrogen in plate thicknesses of 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6mm, and 0.7mm.

[0068] Some embodiments of the present invention provide a microchannel plate hydrogen reduction method for the aforementioned device, comprising the following steps:

[0069] 1) Place the microchannel plate to be reduced in the microchannel plate hydrogen reduction device, place the microchannel plate directional hydrogen reduction device in the vacuum heating device, and connect it to the gas supply system;

[0070] 3) The preset hydrogen reduction temperature of the microchannel plate is 350-450℃, the gas flow rate of the second pipeline is 0.01-0.05L / min and the pressure is 0.01-0.05MPa, and the reduction time is 1.5-3h;

[0071] 4) When the temperature of the microchannel plate directional hydrogen reduction device, the hydrogen pressure and flow rate of the second pipeline reach the preset requirements, open the valve and introduce hydrogen into the microchannel plate hydrogen reduction device, and the microchannel plate begins the hydrogen reduction reaction.

[0072] 5) After the microchannel plate completes the hydrogen reduction reaction according to the preset reduction time, close the valve, cool it, and remove the microchannel plate.

[0073] The present invention also proposes a method for directional hydrogen reduction using microchannel plates, which includes: during the reduction reaction process in contact with hydrogen gas, the gas environment pressure at the inlet port of the microchannel plate is greater than the gas environment pressure at its outlet port, thereby driving the hydrogen gas to flow directionally within the microchannel plate.

[0074] The microchannel plate hydrogen directional reduction device and method provided by this invention can directionally introduce hydrogen into the chamber where the microchannel plate is placed and the hydrogen reduction is performed, and force it to flow through the inside of the MCP channel and then out through the channel. The contact degree between the hydrogen and various parts of the inner wall of the channel is nearly uniform, thereby ensuring sufficient reduction along the inner wall of the MCP channel, uniform reduction along the axial and radial dimensions of the MCP, stabilizing the bulk resistance of the MCP, reducing process time, effectively controlling MCP deformation, and improving the yield rate.

[0075] The present invention will be further described below with reference to specific embodiments, but this should not be construed as a limitation on the scope of protection of the present invention. Some non-essential improvements and adjustments made by those skilled in the art based on the above description of the present invention still fall within the scope of protection of the present invention.

[0076] Unless otherwise specified, all materials and reagents mentioned below are commercially available products well known to those skilled in the art; unless otherwise specified, all methods described are methods known in the art. Unless otherwise defined, the technical or scientific terms used should have the ordinary meaning understood by those skilled in the art to which this invention pertains.

[0077] Example 1

[0078] In this embodiment, a microchannel plate blank with a thickness of 0.2 mm and a diameter of 50 mm is selected for hydrogen reduction. Hydrogen reduction is performed using the microchannel plate hydrogen-directed reduction equipment and method provided by this invention, as detailed below:

[0079] The microchannel plate hydrogen directional reduction device used in this embodiment includes a housing with 10 grooves; the microchannel plate hydrogen reduction device is configured as shown in the attached figure. Figure 4 As shown, the clamp includes a cover and a support. The support has a platform with a slot. The top of the cover has four vent holes with a diameter of 5mm. The distance between the cover and the platform is 3cm. The cover and the support are connected by four screws to improve the stability of the clamp and the sealing of the connection.

[0080] The microchannel plate hydrogen reduction method in this embodiment is as follows:

[0081] 1) Place the microchannel plate to be reduced in the microchannel plate hydrogen reduction device, seal the connection, and then seal the microchannel plate hydrogen reduction device to the groove on the shell.

[0082] 2) Place the assembled microchannel plate hydrogen directional reduction device in the vacuum furnace cavity, ensuring that the area within the vacuum furnace cavity is at an isothermal temperature, and close the furnace door; the valve on the second pipeline is closed, and the gas supply system is connected.

[0083] 3) The MCP hydrogen reduction temperature is preset to 450℃, the gas flow rate of the second pipeline is 0.04L / min and the pressure is 0.03MPa, and the reduction time is 3h by the control system.

[0084] 4) When the temperature of the microchannel plate directional hydrogen reduction device, the hydrogen pressure and flow rate of the second pipeline reach the preset requirements, open the valve and introduce hydrogen into the microchannel plate hydrogen reduction device, and the microchannel plate begins the hydrogen reduction reaction.

[0085] 5) After the microchannel plate completes the hydrogen reduction reaction according to the preset reduction time, close the valve, cool it, and remove the microchannel plate.

[0086] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the testing methods are as follows:

[0087] Deformation detection: Place each microchannel plate after hydrogen reduction in a special container and lay it flat on the clean workbench. Rotate the microchannel plate horizontally for one revolution. During rotation, visually observe whether the image of the linear lamp above the clean workbench is bent. If a bending of the linear image is observed, it is determined to be deformed.

[0088] Bulk resistance testing: Each microchannel plate after hydrogen reduction is coated. After coating, each microchannel plate is mounted on a test fixture and placed in the test equipment to test its bulk resistance value at 500V.

[0089] The test results are shown in Table 1 and 2. Figure 8 .

[0090] Example 2

[0091] Hydrogen reduction was performed using basically the same equipment and method as in Example 1. The difference from Example 1 is that: in this example, a microchannel plate blank with a thickness of 0.3 mm and a diameter of 50 mm was selected for hydrogen reduction. The top of the cover of the microchannel plate hydrogen reduction device has 6 vent holes with a diameter of 5 mm.

[0092] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1. Figure 8 .

[0093] Example 3

[0094] Hydrogen reduction was carried out using basically the same equipment and method as in Example 1. The difference from Example 1 is that in this example, a microchannel plate blank with a thickness of 0.4 mm and a diameter of 50 mm was selected for hydrogen reduction.

[0095] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1. Figure 8 .

[0096] Example 4

[0097] Hydrogen reduction was carried out using basically the same equipment and method as in Example 1. The difference from Example 1 is that in this example, a microchannel plate blank with a thickness of 0.5 mm and a diameter of 50 mm was selected for hydrogen reduction.

[0098] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1. Figure 8 .

[0099] Example 5

[0100] Hydrogen reduction was carried out using basically the same equipment and method as in Example 1. The difference from Example 1 is that in this example, a microchannel plate blank with a thickness of 0.6 mm and a diameter of 50 mm was selected for hydrogen reduction.

[0101] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1. Figure 8 .

[0102] Example 6

[0103] Hydrogen reduction was carried out using basically the same equipment and method as in Example 1. The difference from Example 1 is that in this example, a microchannel plate blank with a plate thickness of 0.7 mm and a plate diameter of 50 mm was selected for hydrogen reduction.

[0104] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1. Figure 8 .

[0105] Example 7

[0106] Hydrogen reduction was performed using essentially the same equipment and method as in Example 1. The difference from Example 1 was that: in this example, a microchannel plate blank with a thickness of 0.2 mm and a diameter of 25 mm was selected for hydrogen reduction; the top of the cover of the microchannel plate hydrogen reduction device had five vent holes with a diameter of 4 mm; and the distance between the cover and the platform was 4 cm. During the hydrogen reduction process of the microchannel plate in this example, the control system preset the MCP hydrogen reduction temperature to 430℃, the gas flow rate of the second pipeline to 0.02 L / min and the pressure to 0.02 MPa, and the reduction time to 1.5 h.

[0107] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1.

[0108] Example 8

[0109] Hydrogen reduction was performed using essentially the same equipment and method as in Example 1. The difference from Example 1 was that: in this example, a microchannel plate blank with a thickness of 0.3 mm and a diameter of 25 mm was selected for hydrogen reduction; the top of the cover of the microchannel plate hydrogen reduction device had four vent holes with a diameter of 5 mm; and the distance between the cover and the platform was 5 cm. During the hydrogen reduction process of the microchannel plate in this example, the control system preset the MCP hydrogen reduction temperature to 430℃, the gas flow rate of the second pipeline to 0.02 L / min and the pressure to 0.02 MPa, and the reduction time to 1.5 h.

[0110] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1.

[0111] Example 9

[0112] The microchannel plate directional hydrogen reduction device used in this embodiment also includes a hydrogen homogenization device (see attached diagram) between the first and second pipes. Figure 7 As shown, the microchannel plate directional hydrogen reduction equipment used in this embodiment has the same structure as in Embodiment 1, and the process steps and methods for hydrogen reduction of the microchannel plate are the same as in Embodiment 1.

[0113] The microchannel plate that underwent hydrogen reduction in this embodiment was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1.

[0114] Comparative Example 1

[0115] This comparative example uses a microchannel plate blank with a thickness of 0.2 mm and a diameter of 50 mm to be reduced by hydrogen. The hydrogen reduction device and method are as follows:

[0116] 1) Place the microchannel plate to be reduced in the quartz boat slot, then place it in the vacuum furnace cavity, ensuring that the area in the vacuum furnace cavity is at the same temperature, and close the furnace door tightly;

[0117] 2) Turn on the gas supply system and directly introduce hydrogen into the vacuum furnace cavity, and make the gas pressure in the vacuum furnace cavity meet the requirements of the hydrogen reduction process.

[0118] 3) The preset MCP hydrogen reduction temperature is 450℃, the gas flow rate of the gas branch pipeline is 0.04L / min and the pressure is 0.03MPa, and the reduction time is 2h;

[0119] The microchannel plate used in this comparative example to complete hydrogen reduction was subjected to deformation testing and volume resistance testing; the test results are shown in Table 1 and 2. Figure 8 .

[0120] Comparative Example 2

[0121] This comparative example is basically the same as Comparative Example 1, except that a microchannel plate blank with a plate thickness of 0.3 mm and a plate diameter of 50 mm was selected for hydrogen reduction.

[0122] The microchannel plate used in this comparative example to complete hydrogen reduction was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1 and 2. Figure 8 .

[0123] Comparative Example 3

[0124] This comparative example is basically the same as Comparative Example 1, except that a microchannel plate blank with a plate thickness of 0.3 mm and a plate diameter of 50 mm was selected for hydrogen reduction.

[0125] The microchannel plate used in this comparative example to complete hydrogen reduction was subjected to deformation testing and volume resistance testing; the test results are shown in Table 1 and 2. Figure 8 .

[0126] Comparative Example 4

[0127] This comparative example is basically the same as Comparative Example 1, except that a microchannel plate blank with a plate thickness of 0.3 mm and a plate diameter of 50 mm was selected for hydrogen reduction.

[0128] The microchannel plate used in this comparative example to complete hydrogen reduction was subjected to deformation testing and volume resistance testing; the test results are shown in Table 1 and 2. Figure 8 .

[0129] Comparative Example 5

[0130] This comparative example is basically the same as Comparative Example 1, except that a microchannel plate blank with a plate thickness of 0.3 mm and a plate diameter of 50 mm was selected for hydrogen reduction.

[0131] The microchannel plate used in this comparative example to complete hydrogen reduction was subjected to deformation testing and volume resistance testing; the test results are shown in Table 1 and 2. Figure 8 .

[0132] Comparative Example 6

[0133] This comparative example is basically the same as Comparative Example 1, except that a microchannel plate blank with a plate thickness of 0.3 mm and a plate diameter of 50 mm was selected for hydrogen reduction.

[0134] The microchannel plate used in this comparative example to complete hydrogen reduction was subjected to deformation detection and volume resistance testing; the test results are shown in Table 1 and 2. Figure 8 .

[0135] Table 1. Test results of various indicators of microchannel plates in each embodiment and comparative example.

[0136]

[0137] As can be seen from the examples and comparative examples, the microchannel plate hydrogen directional reduction equipment and method provided by the present invention are applicable to hydrogen reduction reactions of microchannel plates of different specifications.

[0138] Furthermore, such as Figure 8 As shown in Table 1, compared with the comparative example, the volume resistance of the microchannel plate hydrogen directional reduction device and method of the present invention is significantly reduced, and the resistance is approximately linearly related to the plate thickness, with the volume resistance being approximately the same. This indicates that the reduction of the microchannel plate in this embodiment is relatively uniform and consistent. The reason for this is that the comparative example uses diffusion-through hydrogen reduction of MCP, and the amount of hydrogen entering the microchannel plate is uncontrollable. The microchannel plate hydrogen directional reduction device and method used in this embodiment can directionally introduce hydrogen into the chamber where the microchannel plate is placed and the hydrogen reduction is performed. Since the gas environment pressure at the inlet port of the microchannel plate is greater than that at the outlet port of the microchannel plate, the hydrogen is driven to flow directionally within the microchannel plate. The contact degree between the hydrogen and various parts of the inner wall of the channel is approximately consistent, the reduction degree along the axial direction of the MCP channel is comparable, the volume resistance is approximately the same, and the reduction is relatively uniform and consistent, which can ensure the stability of the MCP volume resistance. Furthermore, the hot hydrogen gas flow along the path through each microchannel effectively improves the uniformity of axial and radial reduction of large-size MCPs, thereby reducing phase transformation stress and structural stress. This allows for better control of deformation in thinner MCP structures, and the shortened hydrogen flow time directly reduces the probability of deformation in thinner microchannel plates, improving product quality, reducing MCP loss during the reduction process, and increasing product qualification rate.

[0139] The technical features in the claims and / or specification of this invention can be combined, and the combination is not limited to the combinations obtained through reference in the claims. Technical solutions obtained by combining the technical features in the claims and / or specification are also within the scope of protection of this invention.

[0140] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of the present invention shall still fall within the scope of the technical solution of the present invention.

Claims

1. A microchannel plate hydrogen directional reduction device, characterized in that, It includes: A microchannel plate hydrogen reduction device, comprising a chamber for placing the microchannel plate and reducing hydrogen; The first pipeline connects to the gas supply system; The second pipeline is connected at one end to the first pipeline and at the other end to the microchannel plate hydrogen reduction device; the second pipeline is also equipped with a flow and pressure measurement system and a valve; the valve is located downstream of the flow and pressure measurement system. An exhaust port is provided on the microchannel plate hydrogen reduction device; when the valve is closed, the gas inside the chamber used for placing the microchannel plate and hydrogen reduction is only connected to the outside through the exhaust port. The housing has a groove on its upper surface; the bottom of the groove has a hollow structure; the microchannel plate hydrogen reduction device is connected to the groove; a first inlet is provided on the wall of the housing, and the first inlet is connected to the first pipe. A hydrogen homogenization device is disposed between the first pipeline and the second pipeline; the hydrogen homogenization device includes: Homogenization chamber; The second inlet is located on the wall of the homogenization chamber; A third pipe is arranged in a ring around the inner wall of the homogenization chamber; one end of the third pipe is connected to the first pipe through the second inlet; the third pipe is also provided with a plurality of small holes; The outlet is located on the wall of the homogenization chamber away from the second inlet, and the second pipe is connected to the homogenization chamber through the outlet.

2. The device according to claim 1, characterized in that, The microchannel plate hydrogen reduction device has 4 to 6 exhaust holes, and the diameter of each exhaust hole is 4 to 6 mm.

3. The device according to claim 1, characterized in that, The microchannel plate hydrogen reduction device includes a cover and a support; the cover and the support are detachably connected together, and the support is provided with a slot for placing the microchannel plate; the exhaust port is provided on the upper surface of the cover; a protrusion is provided at the bottom of the upper surface of the cover; the protrusion is used to cooperate with the slot to clamp the edge area of ​​the microchannel plate.

4. The device according to claim 3, characterized in that, The cover and the support are made of copper.

5. The device according to claim 1, characterized in that, It includes multiple microchannel plate hydrogen reduction devices.

6. The device according to claim 1, characterized in that, The hydrogen homogenization device also includes a pressure control system for controlling the gas pressure of the hydrogen homogenization device within a constant range.

7. The device according to claim 1, characterized in that, It also includes: The control system is connected to at least the gas supply system, the flow and pressure measurement system, and the valve, and is capable of regulating the gas flow of the gas supply system, monitoring the gas flow and pressure of the gas branch pipelines in real time, and opening or closing the valve.

8. A method for directional hydrogen reduction using a microchannel plate, implemented using the apparatus described in any one of claims 1 to 7, characterized in that, During the reduction reaction when the microchannel plate comes into contact with hydrogen, the gas environment pressure at the inlet port of the microchannel plate is greater than that at the outlet port of the microchannel plate, which drives the hydrogen to flow directionally within the microchannel plate.

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