Dust-free photomask laser processing device

Abstract

The invention relates to the technical field of laser processing, in particular to a dust-free photomask laser processing device which comprises a mounting base, annular sliding rails are fixedly connected to the two sides of the top of the mounting base, a plurality of strip-shaped frames are arranged between the two annular sliding rails, and clamping blocks are fixedly connected to the strip-shaped frames. The two ends of the strip-shaped frame are fixedly connected with sliding seats, and the sliding seats are slidably connected to the corresponding annular sliding rails; dust generated at an etching position is inversely separated through overturning of the photomask, dust generated during surface processing of the photomask can be fully cleaned, the use effect of the photomask after processing is guaranteed, the multiple clamping blocks synchronously move and pause along the track of the annular sliding rail, and the working efficiency of the photomask is improved. The influence of preparatory work on photomask processing is reduced, and the continuous processing efficiency of the photomask is effectively improved.

Description

Technical Field

[0001] The invention relates to the technical field of laser processing, and in particular to a dust-free photomask laser processing device. Background Art

[0002] The photomask is a graphic master used in the photolithography process commonly used in micro-nano processing technology. The mask graphic structure is formed on a transparent substrate by an opaque light-shielding film, and the graphic information is then transferred to the product substrate through an exposure process.

[0003] The patent document with publication number CN114178718A discloses a dust-free laser processing device and processing method for a photomask, including a processing platform, on which a processing workpiece is placed, and a laser processing head is also provided on the processing platform, which processes the processing workpiece, and a dual-channel fixture is provided on the processing platform to separate the laser cutting path channel and the mask core area channel. The dual-channel fixture includes a fixture plate, on which a group of adsorption channels are provided, and the adsorption channels are the laser cutting path channel and the mask core area channel, and the laser cutting path channel and the mask core area channel are connected to the dust collection system.

[0004] In the prior art, when processing and manufacturing a photomask, a photolithography machine is usually used to etch the light-shielding film on the surface of the photomask to form a mask pattern structure. During the continuous processing of the photomask, the staff needs to take the photomask out of the fixture and clamp the new photomask to be processed only after the photomask processing is completed, which affects the continuous processing efficiency of the photomask. In addition, during the etching process of the photomask, it is difficult to fully clean the dust generated at the etching position only by adsorption and collection, which easily reduces the subsequent use effect of the photomask. Summary of the invention

[0005] The purpose of the present invention is to solve the shortcomings of the prior art and to propose a dust-free photomask laser processing device.

[0006] To achieve the above purpose, the technical solution adopted by the present invention is: a dust-free photomask laser processing device, comprising a mounting base, annular slide rails are fixedly connected to both sides of the top of the mounting base, a plurality of strip frames are arranged between two of the annular slide rails, clamping blocks are fixedly connected to the strip frames, slide seats are fixedly connected to both ends of the strip frames, the slide seats are slidably connected to the corresponding annular slide rails, and the clamping blocks are connected to limited clamping mechanisms;

[0007] A photolithography head is arranged above the two annular slide rails, and a horizontal movement mechanism and a processing dust removal mechanism are connected to the photolithography head. A liquid storage tank body is fixedly connected to the top of the mounting base, and the liquid storage tank body is located below between the two annular slide rails. A circulating flow mechanism is connected to the liquid storage tank body.

[0008] Preferably, the limit clamping mechanism includes two slide grooves, both of which are opened on the clamping block, and the interior of the slide grooves is slidably connected with a sliding block, and the end of the sliding block away from the annular slide rail is fixedly connected with a U-shaped clamping strip, and the side of the U-shaped clamping strip away from the clamping block is fixedly connected with two corner baffles, and the sliding block is connected with a movable mechanism.

[0009] Preferably, the movable mechanism includes two annular groove rails, both of which are fixedly connected to the top of the mounting base and located between the two annular slide rails, the annular groove rails include a clamping section and a separation section, and one end of the sliding block close to the annular slide rail is fixedly connected with a circular pin, and one end of the circular pin is located inside the corresponding annular groove rail.

[0010] Preferably, the horizontal moving mechanism includes a mounting frame, the mounting frame is fixedly connected to the top of the mounting base, the photolithography head is located inside the mounting frame, two transverse slide rails are fixedly connected to the mounting frame, transverse slide rails are slidably connected to each other with a transverse sleeve, a longitudinal slide rail is fixedly connected between the two transverse sleeves, the longitudinal slide rail is slidably connected to a longitudinal sleeve, and the longitudinal sleeve is fixedly connected to the top of the photolithography head.

[0011] Preferably, the processing dust removal mechanism includes a fan and a vacuum cleaner, the fan is fixedly mounted on the photolithography head, the air outlet end of the fan is fixedly connected to an inclined air duct, the bottom end of the inclined air duct is inclined toward the photolithography head, the vacuum cleaner is fixedly connected to the mounting frame, the suction end of the vacuum cleaner is fixedly connected to an L-shaped pipe, one end of the L-shaped pipe is fixedly connected to a collection shell, and the photolithography head is located between the vacuum cleaner and the fan.

[0012] Preferably, the circulating flow mechanism includes a liquid pump, which is fixedly mounted on the liquid storage tank body, the liquid inlet end of the liquid pump is fixedly connected to a liquid inlet pipe, one end of the liquid inlet pipe is fixedly connected to one end of the liquid storage tank body, the liquid discharge end of the liquid pump is fixedly connected to a liquid discharge pipe, one end of the liquid discharge pipe is fixedly connected to the other end of the liquid storage tank body.

[0013] Preferably, two L-shaped baffles are fixedly connected to one end of the liquid storage tank body, a filter plate is arranged between the two L-shaped baffles, and the filter plate is located at the connection point between the liquid storage tank body and the liquid inlet pipe.

[0014] Preferably, a curved shell is fixedly connected to the top of the mounting base, the curved shell is located between one end of the two annular slide rails, the curved shell is located above the connection point between the liquid storage tank body and the drainage pipe, and a dryer is fixedly installed on the curved shell.

[0015] Compared with the prior art, the present invention has the following beneficial effects:

[0016] 1. By flipping the photomask, the dust generated at the etching position is inverted and separated, which is conducive to fully cleaning the dust generated by the surface processing of the photomask, ensuring the use effect of the photomask after processing, and by multiple clamping blocks moving and pausing synchronously along the track of the annular slide rail, the etching processing, immersion cleaning and processing replacement of multiple photomasks can be carried out synchronously, reducing the impact of preparation work on the photomask processing, and effectively improving the continuous processing efficiency of the photomask.

[0017] 2. The corner baffle is used to limit the photomask and prevent it from falling off between the two U-shaped clamping bars after it is flipped over and inverted. After the photomask continues to move to the initial position along the track of the annular slide rail, the two U-shaped clamping bars move away from each other through the action of the movable mechanism, thereby releasing the clamping position of the photomask, making it easier for the staff to replace the photomask.

[0018] 3. The circular pin moves from the separation section to the clamping section, so that under the guiding and limiting action of the clamping section, the U-shaped clamping bars on both sides of the photomask are close to each other and clamp the photomask. When the clamping block moves one circle along the track of the annular slide rail and returns to the initial position, the circular pin returns to the separation section, so that the two U-shaped clamping bars move away from each other and release the clamping of the photomask.

[0019] 4. By tilting the air duct toward the photolithography head, the bottom end of the inclined air duct continuously blows concentrated air to the etching position on the surface of the photomask, so that the dust generated on the surface of the etching position is quickly blown away, reducing the impact of dust accumulation at the etching position on the etching accuracy. In the process of the inclined air duct blowing away the dust at the etching position, the suction end of the vacuum cleaner generates negative pressure, so that the collection shell absorbs the dust blown from the direction of the inclined air duct, and absorbs it into the vacuum cleaner along the L-shaped pipe for collection, reducing the scattering of etching dust, and reducing the dust accumulation at the etching position through the concentrated wind force of the inclined air duct, thereby improving the processing effect of the photolithography head on the photomask.

[0020] 5. Through the action of the liquid pump, the cleaning liquid inside the liquid storage tank body flows along one end of the liquid storage tank body to the liquid inlet pipe, and is transported to the liquid discharge pipe after entering the liquid pump, and finally moves along the discharge pipe to the other end of the liquid storage tank body and re-enters the liquid storage tank body, so that the cleaning liquid inside the liquid storage tank body flows in one direction. The flow direction of the cleaning liquid inside the liquid storage tank body is opposite to the movement direction of the photomask after entering the liquid storage tank body, so that the cleaning liquid is in full contact with the surface of the photomask during the flow process, and the cleaning effect on the surface of the photomask is improved during the flow process. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a first structural schematic diagram of the present invention;

[0022] Figure 2 For the present invention Figure 1 A schematic diagram of the structure enlargement at point A;

[0023] Figure 3 For the present invention Figure 1 A schematic diagram of the structure at B in FIG.

[0024] Figure 4 It is a second structural schematic diagram of the present invention;

[0025] Figure 5 For the present invention Figure 4 A schematic diagram of the structure at position C in FIG.

[0026] Figure 6 It is a schematic diagram of the coordination structure of the liquid storage tank body, the liquid pump and the filter plate of the present invention;

[0027] Figure 7 For the present invention Figure 6 Schematic diagram of the enlarged structure at D in the figure.

[0028] In the figure: 1. mounting base; 2. annular slide rail; 3. strip frame; 4. clamping block; 5. slide seat; 6. photolithography head; 7. liquid storage tank body; 8. slide groove; 9. sliding block; 10. U-shaped clamping strip; 11. corner baffle plate; 12. annular groove rail; 1201. clamping section; 1202. separation section; 13. round pin; 14. mounting frame; 15. horizontal slide rail; 16. horizontal slide sleeve; 17. longitudinal slide rail; 18. longitudinal slide sleeve; 19. fan; 20. vacuum cleaner; 21. inclined air duct; 22. L-shaped pipeline; 23. collection shell; 24. liquid pump; 25. liquid inlet pipeline; 26. liquid discharge pipeline; 27. L-shaped baffle; 28. filter plate; 29. ​​arc shell; 30. dryer. DETAILED DESCRIPTION

[0029] The following description is used to disclose the present invention so that those skilled in the art can implement the present invention. The preferred embodiments described below are only examples, and those skilled in the art may think of other obvious variations.

[0030] like Figures 1 to 7 A dust-free photomask laser processing device shown in the figure comprises a mounting base 1, annular slide rails 2 are fixedly connected to both sides of the top of the mounting base 1, a plurality of strip frames 3 are arranged between the two annular slide rails 2, clamping blocks 4 are fixedly connected to the strip frames 3, slide seats 5 are fixedly connected to both ends of the strip frames 3, the slide seats 5 are slidably connected to the corresponding annular slide rails 2, and the clamping blocks 4 are connected to limited position clamping mechanisms;

[0031] A photolithography head 6 is arranged above the two annular slide rails 2, and a horizontal moving mechanism and a processing dust removal mechanism are connected to the photolithography head 6. A liquid storage tank body 7 is fixedly connected to the top of the mounting base 1. The liquid storage tank body 7 is located below between the two annular slide rails 2, and a circulating flow mechanism is connected to the liquid storage tank body 7. When working, in the prior art, when processing and manufacturing a photomask, a photolithography machine is usually used to etch a light-shielding film on the surface of the photomask to form a mask pattern structure. In the continuous processing of the photomask, the staff needs to take the photomask out of the fixture and place a new photomask to be processed after the photomask processing is completed. The film plate is clamped, thereby affecting the continuous processing efficiency of the photomask plate, and in the process of etching the photomask plate, it is difficult to fully clean the dust generated at the etching position only by adsorption and collection, which is easy to reduce the subsequent use effect of the photomask plate; the technical solution can solve the above problems, and the specific working method is as follows: the photomask plate to be processed is placed on the surface of the clamping block 4, and the photomask plate is clamped by the action of the limit clamping mechanism, and then the corresponding two slide seats 5 slide on the annular slide rail 2 to move the corresponding strip frame 3, thereby driving the corresponding clamping block 4 to synchronize with the photomask plate to be processed After the photomask moves to the bottom of the photolithography head 6, the corresponding slide 5 stops moving, and the photolithography head 6 is moved horizontally through the action of the horizontal moving mechanism to etch the light-shielding film on the surface of the photomask, thereby forming a mask pattern structure. When the photolithography head 6 etches the photomask, the dust generated by etching on the surface of the photomask is preliminarily cleaned and collected through the processing dust removal mechanism, thereby reducing the impact of the dust generated by etching on the photolithography process, and after the etching is completed, the etched photomask is moved downward between the two annular slide rails 2 through the sliding of the slide 5, and the photomask is etched. After the surface is flipped over, it is immersed in the cleaning liquid inside the liquid storage tank 7, so that the cleaning liquid is used to immerse and clean the surface of the etched photomask, and the dust generated at the etching position is inverted and separated by flipping the photomask, which is beneficial to fully clean the dust generated by the surface processing of the photomask, ensuring the use effect of the photomask after processing, and through multiple clamping blocks 4, they are synchronously moved and paused along the trajectory of the annular slide rail 2, so that the etching processing, immersion cleaning and processing replacement of multiple photomasks can be carried out synchronously, reducing the influence of preparation work on the photomask processing, and effectively improving the continuous processing efficiency of the photomask.

[0032] As a further implementation scheme of the present invention, the limit clamping mechanism includes two slide grooves 8, both of which are opened on the clamping block 4, and the interior of the slide grooves 8 is slidably connected with a sliding block 9, and the end of the sliding block 9 away from the annular slide rail 2 is fixedly connected with a U-shaped clamping bar 10, and the side of the U-shaped clamping bar 10 away from the clamping block 4 is fixedly connected with two corner baffles 11, and the sliding block 9 is connected with a movable mechanism; when working, the photomask is placed between the two U-shaped clamping bars 10 and located on the top of the corresponding clamping block 4, and the clamping block 4 is moved along the trajectory of the annular slide rail 2 toward the photolithography head 6 by sliding the slide seat 5 on the annular slide rail 2, and in the process of moving, the movable mechanism is used to The two sliding blocks 9 are made to slide in the corresponding slide grooves 8, so that the two U-shaped clamping bars 10 are close to each other and clamp the photomask, so that the photomask is located under the photolithography head 6 for clamping and fixing before etching, and continues to flip and move along the track of the annular slide rail 2 to the liquid storage tank body 7 after etching. The corner baffle plate 11 is used to limit the blocking to prevent the photomask from falling off from between the two U-shaped clamping bars 10 after flipping and turning upside down, and after the photomask continues to move along the track of the annular slide rail 2 to the initial position, the two U-shaped clamping bars 10 are moved away from each other by the action of the movable mechanism, thereby releasing the clamping and positioning of the photomask, making it convenient for the staff to replace the photomask.

[0033] As a further embodiment of the present invention, the movable mechanism includes two annular groove rails 12, both of which are fixedly connected to the top of the mounting base 1 and are located between the two annular slide rails 2, the annular groove rails 12 include a clamping section 1201 and a separation section 1202, and the ends of the sliding blocks 9 close to the annular slide rails 2 are fixedly connected with round pins 13, and one end of the round pins 13 is located inside the corresponding annular groove rails 12; when working, when the two round pins 13 are located in the separation section 1202 of the corresponding annular groove rails 12, the two sliding blocks 9 move away from each other so that the two U-shaped clamping bars 10 move away from each other, It enables the staff to pick up and place the photomask, and when the clamping block 4 moves along the track of the annular slide rail 2 toward the photolithography head 6, the circular pin 13 moves from the separation section 1202 to the clamping section 1201, so that under the guiding and limiting action of the clamping section 1201, the U-shaped clamping bars 10 on both sides of the photomask are close to each other and clamp the photomask. When the clamping block 4 moves one circle along the track of the annular slide rail 2 and returns to the initial position, the circular pin 13 returns to the separation section 1202, so that the two U-shaped clamping bars 10 move away from each other, and the clamping of the photomask is released.

[0034] As a further implementation scheme of the present invention, the horizontal movement mechanism includes a mounting frame 14, which is fixedly connected to the top of the mounting base 1, and the lithography head 6 is located inside the mounting frame 14. Two transverse slide rails 15 are fixedly connected to the mounting frame 14, and transverse slide sleeves 16 are slidably connected to the transverse slide rails 15. A longitudinal slide rail 17 is fixedly connected between the two transverse slide sleeves 16, and a longitudinal slide sleeve 18 is slidably connected to the longitudinal slide rail 17. The longitudinal slide sleeve 18 is fixedly connected to the top of the lithography head 6; when working, the longitudinal slide sleeve 18 slides along the longitudinal slide rail 17, thereby driving the lithography head 6 to move longitudinally, and the two transverse slide sleeves 16 slide synchronously along the corresponding transverse slide rails 15, thereby driving the longitudinal slide rail 17 to move laterally, so that the lithography head 6 moves laterally, and through the coordination of the transverse movement and the longitudinal movement, the lithography head 6 moves in the horizontal direction to a corresponding horizontal track.

[0035] As a further implementation scheme of the present invention, the processing dust removal mechanism includes a fan 19 and a dust collector 20, the fan 19 is fixedly mounted on the photolithography head 6, the air outlet end of the fan 19 is fixedly connected to an inclined air duct 21, the bottom end of the inclined air duct 21 is inclined toward the photolithography head 6, the dust collector 20 is fixedly connected to the mounting frame 14, the dust collection end of the dust collector 20 is fixedly connected to an L-shaped pipe 22, one end of the L-shaped pipe 22 is fixedly connected to a collecting shell 23, and the photolithography head 6 is located between the dust collector 20 and the fan 19; during operation, when the clamping block 4 moves to the bottom of the photolithography head 6 and the photomask is located between the corresponding clamping block 4 and the photolithography head 6, the collecting shell 23 is located on one side of the photomask, and the photolithography head 6 etches the light-shielding film on the surface of the photomask, and during the etching process, through The fan 19 causes the bottom end of the inclined air duct 21 to continuously exhaust air outwards, and the inclined air duct 21 is tilted toward the direction of the photolithography head 6, so that the bottom end of the inclined air duct 21 continuously blows concentrated air to the etching position on the surface of the photomask, so that the dust generated on the surface of the etching position is quickly blown away, reducing the impact of dust accumulation at the etching position on the etching accuracy. In the process of the inclined air duct 21 blowing away the dust at the etching position, the suction end of the vacuum cleaner 20 generates negative pressure, so that the collection shell 23 absorbs the dust blown in from the direction of the inclined air duct 21, and absorbs it into the inside of the vacuum cleaner 20 along the L-shaped pipe 22 for collection, reducing the scattering of etching dust, and reducing the dust accumulation at the etching position through the concentrated wind force of the inclined air duct 21, thereby improving the processing effect of the photolithography head 6 on the photomask.

[0036] As a further embodiment of the present invention, the circulating flow mechanism includes a liquid pump 24, which is fixedly mounted on the liquid storage tank body 7, and the liquid inlet end of the liquid pump 24 is fixedly connected to a liquid inlet pipe 25, one end of which is fixedly connected to one end of the liquid storage tank body 7, and the liquid discharge end of the liquid pump 24 is fixedly connected to a liquid discharge pipe 26, one end of which is fixedly connected to the other end of the liquid storage tank body 7; when working, the cleaning liquid inside the liquid storage tank body 7 is moved along one end of the liquid storage tank body 7 to the inlet through the action of the liquid pump 24. The cleaning liquid flows in the liquid pipe 25, and is transported to the discharge pipe 26 after entering the liquid pump 24, and finally moves along the discharge pipe 26 to the other end of the liquid storage tank body 7 and re-enters the liquid storage tank body 7, so that the cleaning liquid inside the liquid storage tank body 7 flows in one direction, and the flow direction of the cleaning liquid inside the liquid storage tank body 7 is opposite to the movement direction of the photomask after entering the liquid storage tank body 7, so that the cleaning liquid is in full contact with the surface of the photomask during the flow process, and the cleaning effect on the surface of the photomask is improved during the flow process.

[0037] As a further embodiment of the present invention, one end of the interior of the liquid storage tank body 7 is fixedly connected with two L-shaped baffles 27 (such as Figure 7 As shown in the figure, a filter plate 28 is arranged between the two L-shaped baffles 27, and the filter plate 28 is located at the connection point between the liquid storage tank body 7 and the liquid inlet pipe 25; when working, by arranging the filter plate 28 at the connection point between the liquid storage tank body 7 and the liquid inlet pipe 25, the dust in the cleaning liquid is reduced from entering the liquid pump 24 along the flow direction, thereby reducing the impact on the operation of the liquid pump 24, and the dust is filtered and blocked on one side of the filter plate 28 through the flow of the cleaning liquid, which is beneficial for the staff to centrally clean the dust, and the filter plate 28 is limited and clamped by the L-shaped baffle 27, so that the filter plate 28 can be conveniently taken out and maintained and replaced.

[0038] As a further embodiment of the present invention, the top of the mounting base 1 is fixedly connected to a curved shell 29 (such as Figure 1 As shown in the figure, the arc shell 29 is located between one end of the two annular slide rails 2, the arc shell 29 is located above the connection point between the liquid storage tank body 7 and the discharge pipe 26, and a dryer 30 is fixedly installed on the arc shell 29; during operation, when the photomask is cleaned inside the liquid storage tank body 7 and the corresponding clamping block 4 returns to the initial position, the photomask and the corresponding clamping block 4 pass through the arc opening of the arc shell 29, and the surface of the photomask and the corresponding clamping block 4 are dried by the action of the dryer 30, thereby reducing the influence of the droplets remaining on the surface of the clamping block 4 on the subsequent photomask processing.

[0039] Working principle of the present invention:

[0040] The photomask to be processed is placed on the surface of the clamping block 4, and the photomask is clamped by the limit clamping mechanism, and then the corresponding two slides 5 slide on the annular slide rail 2 to move the corresponding strip frame 3, thereby driving the corresponding clamping block 4 to move synchronously with the photomask to be processed. After the photomask moves to the bottom of the lithography head 6, the corresponding slide 5 stops moving, and the lithography head 6 is moved horizontally by the horizontal moving mechanism to etch the light-shielding film on the surface of the photomask, thereby forming a mask pattern structure. When the lithography head 6 etches the photomask, the dust generated by etching on the surface of the photomask is preliminarily cleaned and collected by the processing dust removal mechanism, thereby reducing the influence of the dust generated by etching on the photolithography process, and After completion, the slide 5 continues to slide to move the etched photomask downward between the two annular slide rails 2, and the etched surface of the photomask is turned over and immersed in the cleaning liquid inside the liquid storage tank 7, so that the cleaning liquid is used to immerse and clean the surface of the etched photomask, and the dust generated at the etching position is inverted and separated by flipping the photomask, which is beneficial to fully clean the dust generated by the surface processing of the photomask, ensuring the use effect of the photomask after processing, and through multiple clamping blocks 4, they are synchronously moved and paused along the trajectory of the annular slide rail 2, so that the etching processing, immersion cleaning and processing replacement of multiple photomasks can be carried out simultaneously, reducing the influence of preparation work on the photomask processing, and effectively improving the continuous processing efficiency of the photomask.

[0041] The above shows and describes the basic principles, main features and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments, and the above embodiments and descriptions only describe the principles of the present invention. The present invention may have various changes and improvements without departing from the spirit and scope of the present invention, and these changes and improvements fall within the scope of the present invention to be protected, and the scope of protection claimed by the present invention is defined by the attached claims and their equivalents.

Claims

1. A dust-free photomask laser processing device, comprising a mounting base (1), characterized in that: Both sides of the top of the mounting base (1) are fixedly connected with annular slide rails (2), a plurality of strip frames (3) are arranged between the two annular slide rails (2), the strip frames (3) are fixedly connected with clamping blocks (4), both ends of the strip frames (3) are fixedly connected with slide seats (5), the slide seats (5) are slidably connected to the corresponding annular slide rails (2), and the clamping blocks (4) are connected with limited clamping mechanisms; A photolithography head (6) is arranged above the two annular slide rails (2), and a horizontal movement mechanism and a processing dust removal mechanism are connected to the photolithography head (6). A liquid storage tank body (7) is fixedly connected to the top of the mounting base (1), and the liquid storage tank body (7) is located below between the two annular slide rails (2). A circulating flow mechanism is connected to the liquid storage tank body (7).

2. The dust-free photomask laser processing device according to claim 1, characterized in that: The position limiting clamping mechanism comprises two slide grooves (8), both of which are arranged on the clamping block (4), the interior of each of the slide grooves (8) is slidably connected with a sliding block (9), one end of each of the sliding blocks (9) away from the annular slide rail (2) is fixedly connected with a U-shaped clamping strip (10), and the side of the U-shaped clamping strip (10) away from the clamping block (4) is fixedly connected with two corner baffles (11), and a movable mechanism is connected to the sliding block (9).

3. The dust-free photomask laser processing device according to claim 2, characterized in that: The movable mechanism comprises two annular groove rails (12), the two annular groove rails (12) are fixedly connected to the top of the mounting base (1) and are located between the two annular slide rails (2), the annular groove rails (12) comprise a clamping section (1201) and a separation section (1202), one end of the sliding block (9) close to the annular slide rail (2) is fixedly connected to a circular pin (13), and one end of the circular pin (13) is located inside the corresponding annular groove rail (12).

4. The dust-free photomask laser processing device according to claim 1, characterized in that: The horizontal movement mechanism comprises a mounting frame (14), the mounting frame (14) is fixedly connected to the top of the mounting base (1), the photolithography head (6) is located inside the mounting frame (14), two transverse slide rails (15) are fixedly connected to the mounting frame (14), each of the transverse slide rails (15) is slidably connected to a transverse slide sleeve (16), a longitudinal slide rail (17) is fixedly connected between the two transverse slide sleeves (16), a longitudinal slide rail (18) is slidably connected to the longitudinal slide rail (17), and the longitudinal slide sleeve (18) is fixedly connected to the top of the photolithography head (6).

5. The dust-free photomask laser processing device according to claim 4, characterized in that: The processing dust removal mechanism comprises a fan (19) and a dust collector (20); the fan (19) is fixedly mounted on the photolithography head (6); the air outlet end of the fan (19) is fixedly connected to an inclined air duct (21); the bottom end of the inclined air duct (21) is inclined toward the photolithography head (6); the dust collector (20) is fixedly connected to the mounting frame (14); the dust collection end of the dust collector (20) is fixedly connected to an L-shaped pipe (22); one end of the L-shaped pipe (22) is fixedly connected to a collection shell (23); and the photolithography head (6) is located between the dust collector (20) and the fan (19).

6. The dust-free photomask laser processing device according to claim 1, characterized in that: The circulation flow mechanism comprises a liquid pump (24), the liquid pump (24) is fixedly mounted on the liquid storage tank body (7), the liquid inlet end of the liquid pump (24) is fixedly connected to a liquid inlet pipe (25), one end of the liquid inlet pipe (25) is fixedly connected to one end of the liquid storage tank body (7), the liquid discharge end of the liquid pump (24) is fixedly connected to a liquid discharge pipe (26), one end of the liquid discharge pipe (26) is fixedly connected to the other end of the liquid storage tank body (7).

7. The dust-free photomask laser processing device according to claim 6, characterized in that: Two L-shaped baffles (27) are fixedly connected to one end of the liquid storage tank body (7), a filter plate (28) is arranged between the two L-shaped baffles (27), and the filter plate (28) is located at the connection point between the liquid storage tank body (7) and the liquid inlet pipe (25).

8. The dust-free photomask laser processing device according to claim 6, characterized in that: A curved shell (29) is fixedly connected to the top of the mounting base (1), the curved shell (29) is located between one end of the two annular slide rails (2), the curved shell (29) is located above the connection point between the liquid storage tank body (7) and the liquid discharge pipe (26), and a dryer (30) is fixedly installed on the curved shell (29).

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