A water vapor barrier film with temperature sensitivity and preparation method thereof

Abstract

The present invention relates to a water vapor barrier film with temperature sensitivity and a preparation method thereof, and belongs to the technical field of water vapor barrier films. The water vapor barrier film of the present invention comprises a substrate layer, a coating layer, a temperature sensitive layer and a water vapor barrier layer sequentially arranged on the substrate layer; the temperature sensitive layer comprises, by weight, 80 parts to 100 parts of a temperature sensitive resin, 1 parts to 10 parts of a first curing agent, 1 parts to 10 parts of a first auxiliary agent, and 20 parts to 50 parts of a first solvent; the water vapor barrier layer comprises, by weight, 90 parts to 100 parts of a silicon-based material, 1 parts to 10 parts of a second curing agent, 0 parts to 10 parts of a second auxiliary agent, and 20 parts to 50 parts of a second solvent. The water vapor barrier film with temperature sensitivity of the present invention can timely block water and discharge acid in an external environment, and has the advantages of fast temperature-sensitive response, high sensitivity, and a wide temperature adjustment range.

Description

Technical Field

[0001] The invention belongs to the technical field of water vapor barrier films, and in particular relates to a water vapor barrier film with temperature sensitivity and a preparation method thereof. Background Art

[0002] Photovoltaic power generation is an important part of my country's "dual carbon policy". At present, the main device for photovoltaic power generation is photovoltaic modules, and the packaging of photovoltaic modules is very sensitive to water vapor. In the study, it was found that when photovoltaic modules are working during the day, the module temperature is high and the internal air pressure is high, and water vapor is mainly discharged. At this time, the packaging material needs to have a weaker water vapor barrier performance; when the photovoltaic modules are not working at night, the module temperature is low and the internal air pressure is low, and water vapor is mainly absorbed. At this time, the packaging material needs to have a stronger water vapor barrier performance. This requires a material whose water vapor barrier performance can change with the ambient temperature. However, traditional water vapor barrier films often lack this temperature sensitivity and cannot automatically adjust the water vapor barrier performance according to changes in ambient temperature.

[0003] The prior art has conducted a lot of exploration on water vapor barrier films. For example, Chinese invention patent CN 116284938 A discloses a method for preparing a high-efficiency water vapor barrier film, which comprises applying a coating liquid containing acrylate monomers and acrylate prepolymers as main agents on one side of a polyethylene terephthalate base film, and forming a back coating layer after photocuring. Then, a coating liquid containing acrylate monomers and acrylate prepolymers as main agents with different mass fractions is applied on the other side of the polyethylene terephthalate, and forming a flat layer after photocuring. Finally, a barrier film is formed on the surface of the flat layer by physical vapor deposition. However, the water vapor barrier film is not temperature sensitive.

[0004] Therefore, developing a temperature-sensitive water vapor barrier film still has important practical significance. Summary of the invention

[0005] In order to solve the above technical problems, the present invention provides a temperature-sensitive water vapor barrier film and a preparation method thereof. By using a temperature-sensitive resin, designing a structure and optimizing a process, the water vapor barrier film is made responsive to temperature changes in the external environment, thereby adjusting the barrier performance to water vapor. The temperature-sensitive water vapor barrier film of the present invention can block water and discharge acid in time under the external environment, and has the advantages of fast temperature-sensitive response, high sensitivity and a wide temperature adjustment range.

[0006] The first object of the present invention is to provide a water vapor barrier film with temperature sensitivity, comprising a substrate layer, a coating layer, a temperature sensitive layer and a water vapor barrier layer sequentially arranged on the substrate layer;

[0007] The temperature sensitive layer comprises, by mass, 80-100 parts of a temperature sensitive resin, 1-10 parts of a first curing agent, 1-10 parts of a first auxiliary agent, and 20-50 parts of a first solvent; the temperature sensitive resin is selected from one or more of a modified polyacrylamide resin, a modified polyurethane resin, a modified polyacrylamide resin, and a modified chitosan; wherein the modification is selected from one or more of N-isopropyl modification, amino modification, and carboxyl modification;

[0008] The water vapor barrier layer comprises, by mass, 90-100 parts of silicon-based material, 1-10 parts of a second curing agent, 0-10 parts of a second auxiliary agent, and 20-50 parts of a second solvent; the silicon-based material is selected from one or more of modified silane, modified silicate, modified siloxane, and modified silica sol; wherein the modification is selected from one or more of alkyl modification, alkoxy modification, amino modification, and carboxyl modification.

[0009] Furthermore, the modified polyacrylamide resin is poly (N-isopropylacrylamide) (PNIPaAm), which has a lower critical solution temperature (LCST). Below the LCST, PNIPaAm is hydrophilic; above the LCST, it becomes hydrophobic. This property makes PNIPaAm an ideal material for preparing temperature-sensitive water vapor barrier films.

[0010] Furthermore, the modified polysiloxane is polydimethylsiloxane, which has the characteristics of high transparency, heat resistance, cold resistance, and viscosity that changes with temperature; light transmittance is 100%, and it also has excellent physical properties.

[0011] In one embodiment of the present invention, the first curing agent is selected from thioglycolic acid curing agents; the second curing agent is selected from one or more of water, amide curing agents, peroxide curing agents, organic acid curing agents and alkyl silicate curing agents.

[0012] Furthermore, the thioglycolic acid curing agent is thioglycolic acid.

[0013] In one embodiment of the present invention, the first auxiliary agent and the second auxiliary agent are independently selected from one or more of a stabilizer, a hydrolysis resistance auxiliary agent, a leveling agent, a surfactant, a catalyst, a stabilizer and a UV absorber.

[0014] Furthermore, the stabilizer is selected from silane stabilizers; the hydrolysis resistance aid is selected from carbodiimide and / or polycarbodiimide; the leveling agent is an acrylic leveling agent; the surfactant is polyoxyethylene fatty acid ester; the stabilizer is poloxamer; and the ultraviolet absorber is 2-hydroxybenzophenone.

[0015] In one embodiment of the present invention, the first solvent and the second solvent are independently selected from alcohol solvents and / or ketone solvents.

[0016] In one embodiment of the present invention, the material of the coating is selected from one or more of aluminum oxide, silicon oxide and silicon-aluminum composite oxide; the water vapor barrier rate of the coating is 0.01 g / m 2 .d -1 -2.0g / m 2 .d -1 , for example, it can be 0.01 g / m 2 .d -1 , 0.1g / m 2 .d -1 , 0.2g / m 2 .d -1 , 0.3g / m 2 .d -1 , 0.4g / m 2 .d -1 , 0.5g / m 2 .d -1 , 0.6g / m 2 .d -1 , 0.7g / m 2 .d -1 , 0.8g / m 2 .d -1 , 0.9g / m 2 .d -1 1.0g / m 2 .d -1 , 1.1g / m 2 .d -1 , 1.2g / m 2 .d -1 , 1.3g / m 2 .d -1 , 1.4g / m 2 .d -1 , 1.5g / m 2 .d -1 , 1.6g / m 2 .d -1 , 1.7g / m 2 .d -1 , 1.8g / m 2 .d -1 , 1.9g / m 2 .d -1 , 2.0g / m 2 .d -1The thickness is 3nm-300nm, for example, it can be 3nm, 10nm, 20nm, 30nm, 40nm, 50nm, 60nm, 70nm, 80nm, 90nm, 100nm, 110nm, 120nm, 130nm, 140nm, 150nm, 160nm, 170nm, 180nm, 190nm, 200nm, 210nm, 220nm, 230nm, 240nm, 250nm, 260nm, 270nm, 280nm, 290nm, 300nm, etc.

[0017] Furthermore, the material of the coating is selected from silicon oxide and / or silicon-aluminum composite oxide. The molecular structure of silicon oxide determines that it has better moisture and heat tolerance and relatively excellent weather resistance; the water vapor barrier rate of the coating is 0.01g / m 2 .d -1 -1.0g / m 2 .d -1 In this water vapor barrier rate range, photovoltaic modules have the best breathing performance outdoors.

[0018] In one embodiment of the present invention, the material of the substrate layer is selected from one or more of polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene, polypropylene, polyamide, polylactic acid and polycaprolactam; the transmittance of the substrate layer is 60%-95%, for example, it can be 60%, 65%, 70%, 75%, 80%, 85%, 90%, 95%, etc.; the thickness is 5μm-500μm, for example, it can be 5μm, 10μm, 20μm, 30μm, 40μm, 50μm, 60μm, 70μm, 80μm, 90μm, 100μm, 110μm, 120μm, 130 μm, 140μm, 150μm, 160μm, 170μm, 180μm, 190μm, 200μm, 210μm, 220μm, 230μm, 240μm, 250μm, 260μm, 270μm, 280μm, 290μm, 300μm, 310μm, 32 0μm, 330μm, 340μm, 350μm, 360μm, 370μm, 380μm, 390μm, 400μm, 410μm, 420μm, 430μm, 440μm, 450μm, 460μm, 470μm, 480μm, 490μm, 500μm, etc.

[0019] The second object of the present invention is to provide a method for preparing the temperature-sensitive water vapor barrier film, comprising the following steps:

[0020] S1, preparing a coating on one side of the substrate layer by using a vacuum coating technology;

[0021] S2, coating the surface of the coating with a temperature-sensitive mixed liquid, and drying to form a temperature-sensitive layer; the temperature-sensitive mixed liquid is obtained by adding a temperature-sensitive resin, a first curing agent, and a first auxiliary agent into a first solvent and mixing them uniformly;

[0022] S3, coating a water vapor barrier mixture on the surface of the temperature sensitive layer, and drying to form a water vapor barrier layer, thereby obtaining the temperature-sensitive water vapor barrier film; the water vapor barrier mixture is obtained by adding a silicon-based material, a second curing agent, and a second auxiliary agent into a second solvent and mixing them evenly.

[0023] In one embodiment of the present invention, in S1, the vacuum coating method is selected from vacuum evaporation coating and / or vacuum sputtering coating; the process parameters of the vacuum evaporation coating are: the vacuum degree is 1Pa-10Pa, for example, it can be 1Pa, 2Pa, 3Pa, 4Pa, 5Pa, 6Pa, 7Pa, 8Pa, 9Pa, 10Pa, etc.; the bombardment voltage is 0.2kV-1kV negative high voltage, for example, it can be 0.2kV, 0.3kV, 0.4kV, 0.5kV, 0.6kV, 0.7kV, 0.8kV, 0.9kV, 1kV, etc.; the bombardment time is 5min-10min, for example, it can be 5min, 6min, 7min, 8min, 9min, 10min, etc.; the process parameters of the vacuum sputtering coating are: the vacuum degree is 1Pa-10 Pa, for example, it can be 1Pa, 2Pa, 3Pa, 4Pa, 5Pa, 6Pa, 7Pa, 8Pa, 9Pa, 10Pa, etc.; the deposition rate is 0.1μm / min-5μm / min, and the sputtering rate is 0.01μm / min-0.5μm / min, for example, it can be 0.1μm / min, 0.5μm / min, 1μm / min, 1.5μm / min, 2μm / min, 2.5μm / min, 3μm / min, 3.5μm / min, 4μm / min, 4.5μm / min, 5μm / min, etc., which can greatly reduce production costs and improve production efficiency; the advantages of vacuum evaporation coating are simple production process, relatively low cost and high production efficiency; the advantages of vacuum sputtering coating are high coating purity, good film uniformity and good bonding with substrate.

[0024] Furthermore, in S1, the vacuum coating method is vacuum evaporation coating, which can optimally balance the barrier rate and production efficiency.

[0025] In one embodiment of the present invention, in S2 and S3, the coating method is independently selected from one or more of micro-gap coating, slit coating and screen printing.

[0026] In one embodiment of the present invention, in S2 and S3, the drying temperature is independently 50°C-180°C, for example, it can be 50°C, 60°C, 70°C, 80°C, 90°C, 100°C, 110°C, 120°C, 130°C, 140°C, 150°C, 160°C, 170°C, 180°C, etc.

[0027] In one embodiment of the present invention, after S3, a aging step is also included; the aging temperature is 40°C-80°C, for example, it can be 40°C, 50°C, 60°C, 70°C, 80°C, etc.; the time is 12h-96h, for example, it can be 12h, 16h, 20h, 24h, 28h, 32h, 36h, 40h, 44h, 48h, 52h, 56h, 60h, 64h, 68h, 72h, 76h, 80h, etc.

[0028] In one embodiment of the present invention, after S3, a post-processing step is also included; the post-processing includes heat treatment and ultraviolet irradiation.

[0029] The technical solution of the present invention has the following advantages over the prior art:

[0030] (1) The water vapor barrier film of the present invention is temperature sensitive and can automatically adjust the water vapor permeability at different temperatures, which is particularly important in certain scenarios where precise control of environmental humidity is required. The water vapor barrier film adopts a special temperature-sensitive resin. The use of the temperature-sensitive resin makes the water vapor barrier film have the characteristic of changing with temperature, and can change the water vapor permeability at a specific temperature, thereby realizing intelligent regulation. The mechanism is that the molecular structure of the temperature-sensitive resin contains hydrophilic groups and hydrophobic groups. When the temperature is lower than the LCST, the hydrophilic groups form hydrogen bonds with water molecules, making the material hydrophilic, which means that the interaction between the material and the water molecules is strong, making it difficult for water vapor molecules to pass through the film layer, and the water vapor permeability is relatively low, showing good water vapor barrier performance; when the temperature is higher than the LCST, the hydrogen bonds are broken, the interaction between the hydrophobic groups is enhanced, the material becomes hydrophobic, and water vapor molecules are more likely to pass through the film layer, the water vapor permeability will increase, and the water vapor barrier performance will decrease within a certain range.

[0031] (2) The water vapor barrier film described in the present invention has excellent water vapor barrier properties. Through the use of a coating and a water vapor barrier layer, it can effectively prevent water vapor penetration and protect internal components or products from moisture damage; the coating uses oxides such as silicon aluminum to form a dense structure and low porosity, making it difficult for water vapor molecules to pass through, and the water vapor molecules are blocked outside the film through physical and chemical effects, thereby achieving a water vapor barrier effect; and the water vapor barrier layer always maintains excellent water vapor barrier properties, and the two interact with each other.

[0032] (3) The water vapor barrier film described in the present invention is a composite water vapor barrier film with comprehensive properties formed by stacking and compounding various layers in sequence. The temperature sensitive layer changes the water vapor permeability at a specific temperature, while the coating layer and the water vapor barrier layer always maintain excellent water vapor barrier properties. The multi-layer structure interacts with each other, so that the water vapor barrier film has the characteristic of changing with temperature while maintaining the water vapor barrier properties. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to make the content of the present invention more clearly understood, the present invention is further described in detail below according to specific embodiments of the present invention in conjunction with the accompanying drawings, wherein:

[0034] Figure 1 It is a schematic structural diagram of the temperature-sensitive water vapor barrier film of the present invention;

[0035] Explanation of reference numerals: 1 - substrate layer, 2 - coating layer, 3 - temperature sensitive layer, 4 - water vapor barrier layer. DETAILED DESCRIPTION

[0036] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments so that those skilled in the art can better understand the present invention and implement it. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. It should be understood that the specific embodiments are only used to explain the present invention, but the embodiments are not intended to limit the present invention.

[0037] In the present invention, unless otherwise defined, technical and scientific terms used in the present invention have the same meanings as commonly understood by those skilled in the art to which the present invention belongs.

[0038] In the present invention, unless otherwise stated, the term "and / or" used in the present invention includes any and all combinations of one or more of the associated listed items.

[0039] In the present invention, unless otherwise stated, the experimental methods used in the embodiments of the present invention are conventional methods unless otherwise stated, and the materials, reagents, etc. used are all commercially available unless otherwise stated.

[0040] In the present invention, unless otherwise stated, when the terms "comprise" and / or "include" are used in the specification of the present invention, it indicates the existence of the described features, integers, steps, operations, raw materials or components, but does not exclude the existence or addition of one or more other features, integers, steps, operations, raw materials, components or their combinations.

[0041] In the present invention, unless otherwise specified, the raw materials used can be commercially available products.

[0042] The commercial information of some materials involved in the following examples and comparative examples is as follows:

[0043] Polyethylene terephthalate was purchased from DuPont, USA, model 415hP;

[0044] Poly (N-isopropylacrylamide) was purchased from Xi'an Qiyue Biological Technology Co., Ltd., model number: Q-0066340;

[0045] Polydimethylsiloxane was purchased from Wuhan Profo, model number 9016-00-6;

[0046] Polyethylene was purchased from Daqing Petrochemical, model 5200B.

[0047] Example 1

[0048] Reference Figure 1 As shown, the temperature-sensitive water vapor barrier film of this embodiment includes a substrate layer 1, a coating layer 2, a temperature-sensitive layer 3 and a water vapor barrier layer 4 which are stacked in sequence from top to bottom.

[0049] Wherein, the material of the substrate layer is polyethylene terephthalate;

[0050] The material of the coating is silicon oxide;

[0051] The temperature sensitive layer is composed of the following components in parts by weight: 100 parts of temperature sensitive resin poly N-isopropylacrylamide, 10 parts of curing agent thioglycolic acid, 10 parts of auxiliary agent poloxamer and 40 parts of solvent ethanol;

[0052] The water vapor barrier layer is composed of the following components in parts by weight: 100 parts of silicon-based material polydimethylsiloxane, 10 parts of curing agent diphenyl butyl carbamate, and 40 parts of solvent isopropyl alcohol.

[0053] The preparation of the temperature-sensitive water vapor barrier film specifically includes the following steps:

[0054] S1. Preparation of substrate layer: using a biaxial stretching process to prepare polyethylene terephthalate into a transparent film with a thickness of 50 μm and a transmittance of 80%, to obtain a substrate layer;

[0055] S2. Preparation of coating: After corona treatment on one side of the substrate layer, a layer with a thickness of 30nm and a water vapor barrier rate of 1.0g / m is coated by vacuum evaporation. 2 .d -1 The silicon oxide layer is formed to obtain a coating; wherein the process parameters of the vacuum evaporation coating are: vacuum degree is 5Pa, bombardment voltage is 0.6kV negative high voltage, and bombardment time is 8min;

[0056] S3, preparation of temperature sensitive layer: firstly, dissolving temperature sensitive resin poly N-isopropylacrylamide in solvent ethanol and stirring and mixing well, then adding curing agent thioglycolic acid and stirring and mixing well, then adding auxiliary agent poloxamer and stirring and mixing well to prepare temperature sensitive mixed solution; then coating the temperature sensitive mixed solution on the coating layer by micro-concave coating, and drying in a 50° C. oven to obtain the temperature sensitive layer;

[0057] S3. Preparation of water vapor barrier layer: firstly, dissolve the silicon-based material polydimethylsiloxane in the solvent isopropyl alcohol and stir well to mix evenly, then add the curing agent diphenylcarbamate butyl and stir well to mix evenly to form a water vapor barrier mixture; then, the water vapor barrier mixture is coated on the temperature sensitive layer by micro-concave coating, and after initial drying at 50°C, it is aged at 50°C for 48h to obtain the water vapor barrier layer.

[0058] S4. Preparation of a temperature-sensitive water vapor barrier film: The prepared material is irradiated under ultraviolet light for 30 minutes to improve its stability, thereby obtaining a temperature-sensitive water vapor barrier film.

[0059] Example 2

[0060] The method is basically the same as Example 1, except that the material of the substrate layer is replaced with polyethylene.

[0061] Example 3

[0062] The method is basically the same as Example 1, except that the method of preparing the coating is replaced by vacuum sputtering coating. The process parameters of the vacuum sputtering coating are as follows: vacuum degree is 5 Pa, deposition rate is 2.5 μm / min, and sputtering rate is 2.5 μm / min.

[0063] Example 4

[0064] The method is basically the same as Example 1, except that the temperature sensitive layer is composed of the following components in parts by weight: 80 parts of temperature sensitive resin poly (N-isopropylacrylamide), 10 parts of curing agent thioglycolic acid, 10 parts of auxiliary agent poloxamer and 30 parts of solvent ethanol.

[0065] Example 5

[0066] The method is basically the same as Example 1, except that the water vapor barrier layer is composed of the following components in parts by weight: 90 parts of silicon-based material polydimethylsiloxane, 8 parts of curing agent diphenylbutyl carbamate, and 30 parts of solvent isopropyl alcohol.

[0067] Comparative Example 1

[0068] The method is basically the same as Example 1, except that no coating is provided.

[0069] Comparative Example 2

[0070] The method is basically the same as the first embodiment, except that no temperature sensitive layer is provided.

[0071] Comparative Example 3

[0072] The method is basically the same as Example 1, except that no water vapor barrier layer is provided.

[0073] Comparative Example 4

[0074] The method is basically the same as Example 1, except that the temperature-sensitive resin poly (N-isopropylacrylamide) is replaced by polyacrylamide.

[0075] Comparative Example 5

[0076] The method is basically the same as Example 1, except that the silicon-based material polydimethylsiloxane is replaced by polysiloxane.

[0077] Test Case

[0078] The light transmittance and other properties of the water vapor barrier films prepared in Examples 1-5 and Comparative Examples 1-5 were tested:

[0079] Light transmittance: The average light transmittance in the visible and near-infrared regions of 380nm-1280nm is selected;

[0080] Water vapor transmission rate: sampler cutting; place sample; set sample name, temperature to 38℃, humidity to 90%; start test; save data;

[0081] Table 1 shows the relevant properties of the water vapor barrier film finally measured:

[0082] Table 1

[0083]

[0084] It can be seen from Table 1 that the water vapor barrier film of the embodiment has excellent temperature sensitivity and water vapor barrier properties, the water vapor permeability is adjusted at a specific temperature by the temperature sensitive layer, and a high barrier effect is achieved by the inorganic oxide coating. In addition, the performance of the water vapor barrier film is further improved by optimizing the process, so that the water vapor barrier film has a wide range of application prospects in the fields of food packaging, photovoltaic plug-ins, smart devices, etc.

[0085] By comparing Example 1 and Comparative Example 1, it can be seen that the light transmittance is reduced and the water vapor transmittance is greatly increased without the coating.

[0086] By comparing Example 1 and Comparative Example 2, it can be seen that without providing a temperature sensitive layer, the water vapor transmission rate does not change much at the three temperatures.

[0087] By comparing Example 1 and Comparative Example 3, it can be seen that without providing a water vapor barrier layer, the water vapor transmission rate is greatly increased.

[0088] By comparing Example 1 and Comparative Example 4, it can be seen that when the temperature-sensitive resin poly (N-isopropylacrylamide) is replaced with unmodified one, the water vapor transmission rate does not change much at the three temperatures.

[0089] By comparing Example 1 and Comparative Example 5, it can be seen that when the silicon-based material polydimethylsiloxane is replaced with unmodified one, the water vapor transmission rate is also increased.

[0090] In conclusion, the water vapor barrier film of the embodiment realizes adaptive adjustment of water vapor barrier performance by introducing a temperature sensitive layer, etc., and has good application prospects. In addition, the preparation method is simple and easy, which is conducive to industrial production and popularization and application.

[0091] Obviously, the above embodiments are merely examples for clear explanation and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived from these are still within the protection scope of the invention.

Claims

1. A temperature-sensitive water vapor barrier film, characterized in that: It comprises a substrate layer, a coating layer, a temperature sensitive layer and a water vapor barrier layer sequentially arranged on the substrate layer; The temperature sensitive layer comprises, by mass, 80-100 parts of a temperature sensitive resin, 1-10 parts of a first curing agent, 1-10 parts of a first auxiliary agent, and 20-50 parts of a first solvent; the temperature sensitive resin is selected from one or more of a modified polyacrylamide resin, a modified polyurethane resin, a modified polyacrylamide resin, and a modified chitosan; wherein the modification is selected from one or more of N-isopropyl modification, amino modification, and carboxyl modification; The water vapor barrier layer comprises, by mass, 90-100 parts of silicon-based material, 1-10 parts of a second curing agent, 0-10 parts of a second auxiliary agent, and 20-50 parts of a second solvent; the silicon-based material is selected from one or more of modified silane, modified silicate, modified siloxane, and modified silica sol; wherein the modification is selected from one or more of alkyl modification, alkoxy modification, amino modification, and carboxyl modification.

2. The temperature-sensitive water vapor barrier film according to claim 1, characterized in that: The first curing agent is selected from thioglycolic acid curing agents; the second curing agent is selected from one or more of water, amide curing agents, peroxide curing agents, organic acid curing agents and alkyl silicate curing agents.

3. The temperature-sensitive water vapor barrier film according to claim 1, characterized in that: The first auxiliary agent and the second auxiliary agent are independently selected from one or more of a stabilizer, a hydrolysis resistance auxiliary agent, a leveling agent, a surfactant, a catalyst, a stabilizer and a UV absorber.

4. The temperature-sensitive water vapor barrier film according to claim 1, characterized in that: The first solvent and the second solvent are independently selected from alcohol solvents and / or ketone solvents.

5. The temperature-sensitive water vapor barrier film according to claim 1, characterized in that: The material of the coating is selected from one or more of aluminum oxide, silicon oxide and silicon-aluminum composite oxide; the water vapor barrier rate of the coating is 0.01g / m 2 .d -1 -2.0g / m 2 .d -1 , thickness is 3nm-300nm.

6. The temperature-sensitive water vapor barrier film according to claim 1, characterized in that: The material of the substrate layer is selected from one or more of polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene, polypropylene, polyamide, polylactic acid and polycaprolactam; the transmittance of the substrate layer is 60%-95%, and the thickness is 5μm-500μm.

7. A method for preparing a temperature-sensitive water vapor barrier film according to any one of claims 1 to 6, characterized in that: The following steps are involved: S1, preparing a coating on one side of the substrate layer by using a vacuum coating technology; S2, coating the temperature sensitive mixed liquid on the surface of the coating, and forming a temperature sensitive layer after drying; The temperature sensitive mixed liquid is obtained by adding a temperature sensitive resin, a first curing agent and a first auxiliary agent into a first solvent and mixing them uniformly; S3, coating a water vapor barrier mixture on the surface of the temperature sensitive layer, and drying to form a water vapor barrier layer, thereby obtaining the temperature-sensitive water vapor barrier film; the water vapor barrier mixture is obtained by adding a silicon-based material, a second curing agent, and a second auxiliary agent into a second solvent and mixing them evenly.

8. The method for preparing a temperature-sensitive water vapor barrier film according to claim 7, characterized in that: In S1, the vacuum coating method is selected from vacuum evaporation coating and / or vacuum sputtering coating; the process parameters of the vacuum evaporation coating are: vacuum degree is 1Pa-10 Pa, bombardment voltage is 0.2kV-1kV negative high voltage, and bombardment time is 5min-10min; the process parameters of the vacuum sputtering coating are: vacuum degree is 1Pa-10 Pa, deposition rate is 0.1μm / min-5μm / min, and sputtering rate is 0.01μm / min-0.5μm / min.

9. The method for preparing a temperature-sensitive water vapor barrier film according to claim 7, characterized in that: In S2 and S3, the coating method is independently selected from one or more of micro-gap coating, slit coating and screen printing.

10. The method for preparing a temperature-sensitive water vapor barrier film according to claim 7, characterized in that: In S2 and S3, the drying temperature is independently 50°C to 180°C.

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