Pressurizing system

Abstract

The invention provides a pressurization system which can shorten the interval time of pressurization processing and can execute related processing of the pressurization processing. A pressurization system (1), (1B)-(1D) according to the present invention executes a pressurization process and a related process of a workpiece (W). The pressurization system has a plurality of execution regions (A2) for executing any one of a plurality of processes, and a chamber unit (20) for accommodating a workpiece and transporting the workpiece between the execution regions. The execution areas are configured according to the execution processing sequence. The chamber unit is provided with: a ceiling part (26) that is disposed above the workpiece and functions as an upper pressurizing unit (6U) that pressurizes the workpiece from above during the pressurizing process; a floor section (21) that is disposed below the workpiece and functions as a lower pressurizing means (6D) that pressurizes the workpiece from below during the pressurizing process; and a peripheral wall section (27) which is disposed so as to surround the entire periphery of the workpiece in the horizontal direction, and which, together with the ceiling section and the floor section, defines a housing chamber (20R) for housing the workpiece.

Description

Technical Field

[0001] The present invention relates to a pressurizing system. Background Art

[0002] In the past, a pressurizing device was used to pressurize a pressurized object (for example, electronic parts, etc.). For example, the pressurizing device disclosed in Patent Document 1 includes an upper pressurizing unit and a lower pressurizing unit, and the pressurized object is clamped and pressurized by the upper pressurizing unit and the lower pressurizing unit, and the pressurized object is heated by a thermal energy unit of the lower pressurizing unit. In this pressurizing device, after the pressurization and heating of the pressurized object are completed, the pressurized state is maintained, the workpiece is cooled, and the pressurized object is taken out after cooling. In this pressurizing device, the pressurized object is heated and cooled by one thermal energy unit. Therefore, it takes time to switch between heating and cooling of the thermal energy unit, which prolongs the processing time of each pressurization process.

[0003] In the pressurizing device disclosed in Patent Document 2, the lower pressurizing unit is provided with a preheated heating unit and a precooled cooling unit. The heating unit and the cooling unit are configured to be movable relative to the upper pressurizing unit holding the pressurized object, and can be appropriately switched according to the progress of the pressurizing process. Therefore, the switching time of heating and cooling of the lower pressurizing unit can be shortened, and the processing time can also be shortened.

[0004] Prior art literature

[0005] Patent Literature:

[0006] Patent Document 1: Japanese Patent Application Publication No. 2007-896.

[0007] Patent document 2: Japanese Patent Application Publication No. 2017-199812. Summary of the invention

[0008] Problem that the invention aims to solve

[0009] However, in the pressurizing devices disclosed in Patent Documents 1 and 2, the pressurized object is clamped by the upper pressurizing unit and the lower pressurizing unit during the execution of each treatment (heating, pressurizing, cooling) on ​​the pressurized object. Therefore, from the start to the end of each treatment, the pressurizing device becomes a dedicated device that only handles the pressurized object being treated. As a result, during the pressurizing treatment, the pressurized object for the next pressurizing treatment cannot be placed in the pressurizing device. That is, it takes a long time between the pressurizing treatment and the next pressurizing treatment.

[0010] Here, by performing a preheating treatment on the pressurized object as a pretreatment of the pressurized treatment, it is expected to shorten the treatment time. In addition, by separating the cooling treatment from the pressurized treatment and performing the cooling treatment on the pressurized object as a post-treatment of the pressurized treatment, it is also expected to shorten the treatment time. In this way, by being able to use a pressurizing device to perform a treatment related to the pressurized treatment (hereinafter referred to as "related treatment"), not only the treatment time of the pressurizing device can be shortened, but also the time between pressurized treatments can be shortened. However, it is not easy to perform the related treatment in the pressurizing device. In addition, even if the related treatment can be performed, since the pressurized object is sealed only during the pressurized treatment in the pressurizing device, the pressurized object in the related treatment may be exposed to the atmosphere and the pressurized object may be oxidized. Therefore, a chamber for the related treatment and a large amount of inert gas (for example, nitrogen) filling the chamber are required.

[0011] An object of the present invention is to provide a pressurizing system capable of shortening the interval time of pressurizing treatment and performing related treatments of pressurizing treatment.

[0012] Solutions for solving problems

[0013] One scheme of the present invention is a pressurizing system, which performs pressurizing treatment of a workpiece and related treatments related to the pressurizing treatment, wherein the pressurizing system comprises: a plurality of execution areas, in which any one of a plurality of treatments including the pressurizing treatment and the related treatments is performed; and a chamber unit, which accommodates the workpiece and is transported between the plurality of execution areas, the plurality of execution areas being arranged in the order in which the treatments are performed, the chamber unit comprising: a ceiling portion, which is arranged above the workpiece and functions as an upper pressurizing unit for pressurizing the workpiece from above during the pressurizing treatment; a floor portion, which is arranged below the workpiece and functions as a lower pressurizing unit for pressurizing the workpiece from below during the pressurizing treatment; and a peripheral wall portion, which is arranged to surround the entire circumference of the workpiece in a horizontal direction and, together with the ceiling portion and the floor portion, divide a receiving chamber for accommodating the workpiece.

[0014] Effects of the Invention

[0015] According to the present invention, it is possible to provide a pressurizing system capable of shortening the time interval between pressurizing treatments and performing processes related to the pressurizing treatments. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic perspective view showing an embodiment of the pressurizing system of the present invention.

[0017] Figure 2 yes Figure 1 Functional block diagram of the pressurization system.

[0018] Figure 3 It is shown Figure 1 A schematic cross-sectional view of the main structure of each device configured in each execution area of ​​the pressurization system.

[0019] Figure 4 yes Figure 1 Schematic top view of the pressurization system.

[0020] Figure 5 yes Figure 1 A schematic top view of a chamber unit provided in a pressurization system.

[0021] Figure 6 It is shown Figure 1 A flow chart of an example of the operation of the pressurization system.

[0022] Figure 7 It is shown Figure 1 A schematic cross-sectional view of a state in which a mounting table provided in a pressurizing system is carried into a storage device provided in the pressurizing system.

[0023] Figure 8 It is shown Figure 7 The mounting platform and Figure 5 A schematic cross-sectional view showing a state in which an upper unit of a chamber unit is in contact with each other.

[0024] Fig. 9 It shows that the workpiece is accommodated in Figure 5 A schematic cross-sectional view of the state of the chamber unit.

[0025] Fig.10 It is shown Figure 5 A schematic cross-sectional view of a state in which a chamber unit is transported to an execution area where a preheating process is performed.

[0026] Fig.11 It shows that the preheating process is being performed. Figure 5 Schematic cross-sectional view of a chamber unit.

[0027] Fig.12 It is shown Figure 5 A schematic cross-sectional view of a state in which a chamber unit is transported to an execution area where a pressurization process is performed.

[0028] Fig.13 This indicates that the pressurization process is being performed. Figure 5 Schematic cross-sectional view of a chamber unit.

[0029] Fig.14 It is shown Figure 5 A schematic cross-sectional view of a state in which a chamber unit is transported to an execution area where a primary cooling process is performed.

[0030] Fig.15 It shows that a cooling process is being performed. Figure 5 Schematic cross-sectional view of a chamber unit.

[0031] Fig.16 It is shown Figure 5 A schematic cross-sectional view of a state in which a chamber unit is transported to an execution area where a secondary cooling process is performed.

[0032] Fig.17 It shows the secondary cooling process. Figure 5 Schematic cross-sectional view of a chamber unit.

[0033] Fig.18 It is shown from Figure 8 Remove the upper unit Figure 8 A schematic cross-sectional view of the state of the mounting table.

[0034] Fig.19 It is shown Fig.18 A schematic cross-sectional view showing a state in which the upper unit is transported to an execution area where maintenance processing can be performed.

[0035] Fig. 20 Show multiple Figure 5 A schematic top view of the location of the chamber unit, Fig. 20 (a) shows the position at time "T1", Fig. 20 (b) shows the position at time "T2", Fig. 20 (c) shows the position at time "T3", Fig. 20 (d) shows the position at time "T4", Fig. 20 (e) shows the position at time "T5", Fig. 20 (f) shows the position at time "T6".

[0036] Fig.21 It is a schematic cross-sectional view of the chamber unit according to the first modification.

[0037] Fig. 22 (a) is a schematic top view of a pressurizing system of a second modified example, Fig. 22 (b) is a schematic top view of the pressurization system of the third modification example, Fig. 22 (c) is a schematic top view of the pressurization system of the fourth variant.

[0038] Description of Reference Numerals

[0039] 1: Pressurization system

[0040] 20: Chamber unit

[0041] 20R: Containment Chamber

[0042] 21: Loading table (floor part)

[0043] 24: Upper mold

[0044] 26: Pressure pad (ceiling)

[0045] 26a: Soft layer

[0046] 27: Side member (peripheral wall)

[0047] 51: Preheating unit

[0048] 61: Thermal energy unit (pressing unit, heating unit)

[0049] 71: Primary cooling unit (cooling unit)

[0050] 81: Secondary cooling unit (cooling unit)

[0051] 91~94: Rotation mechanism (conversion mechanism)

[0052] A21: Execution Area (Containment Area, Conversion Area)

[0053] A22: Execution area (preheating area, conversion area)

[0054] A23: Execution area (pressurized area)

[0055] A24: Execution area (cooling area, conversion area)

[0056] A25: Execution area (cooling area, take-out area, conversion area)

[0057] Cp: ​​Mobile Connector

[0058] Cs1~Cs5:Fixed connector

[0059] Lp: Pressure reducing line

[0060] Lg: Gas pipeline DETAILED DESCRIPTION

[0061] The following is a description of an implementation of the pressurization system of the present invention (hereinafter referred to as "the present system"). In the following description, appropriate reference is made to the drawings. In the drawings, the same parts and elements are marked with the same figure marks, and repeated descriptions are omitted. In addition, for the convenience of explanation, the size ratios of the elements may be exaggerated, and are not limited to the ratios shown in the drawings.

[0062] In the following description and drawings, unless otherwise emphasized, when the three axes that are orthogonal to each other in space are the X-axis, Y-axis, and Z-axis, the "X-axis direction" refers to the direction along the X-axis, for example, the left-right direction. The "Y-axis direction" refers to the direction along the Y-axis, for example, the front-back direction. The "Z-axis direction" refers to the direction along the Z-axis, which is the up-down direction. In addition, the "+X-axis direction" refers to the left, the "-X-axis direction" refers to the right, the "+Y-axis direction" refers to the front, the "-Y-axis direction" refers to the back, the "+Z-axis direction" refers to the top, and the "-Z-axis direction" refers to the bottom. In the following description, the determination of directions other than the up-down direction mainly adopts the X-axis direction (+X-axis direction, -X-axis direction) and the Y-axis direction (+Y-axis direction, -Y-axis direction).

[0063] In the present invention, the function of performing processing related to the pressurization treatment (hereinafter referred to as "related processing") is added to the pressurization device, thereby constituting the present system that performs multiple processing including the pressurization treatment. In addition, a chamber unit for accommodating the workpiece is formed by a part of the upper pressurization unit and a part of the lower pressurization unit that pressurize the workpiece during the pressurization treatment. The chamber unit moves between multiple execution areas arranged in the present system, and performs processing corresponding to each execution area on the workpiece. As a result, in the present invention, multiple related processing on the workpiece can be performed by moving the chamber unit. In addition, in the present invention, by moving the chamber unit after performing the pressurization treatment, the time interval between pressurization treatments can be shortened. For the description of each term and the specific structure of each element, please refer to the following content.

[0064] “Pressure treatment” is a treatment in which pressure is applied to a workpiece from the top and bottom to perform a predetermined process (for example, compression, pressure bonding, sintering, etc.) on the workpiece. The pressure treatment includes a treatment in which only pressure is applied and a treatment in which pressure and heating are applied.

[0065] The "workpiece" is an object to be pressurized in this system (ie, a pressurized object), for example, a sheet-like substrate (ceramic green sheet, etc.), an electronic component, a substrate on which a circuit is mounted, etc.

[0066] "Related processing" is processing related to pressurized processing in this system, including necessary pre-processing of the workpiece for performing pressurized processing (for example, assembly of the chamber unit, storage of the workpiece in the chamber unit, pre-heating of the workpiece, etc.), and necessary post-processing of the workpiece after performing pressurized processing (for example, cooling of the workpiece, taking out the workpiece from the chamber unit, etc.). In this embodiment, in the related processing, the pre-processing for pressurized processing includes storage processing and pre-heating processing, and the post-processing for pressurized processing includes primary cooling processing, secondary cooling processing, and taking out processing. In addition, since the state of the chamber unit is related to whether the pressurized processing is performed, the maintenance processing of the chamber unit (the upper unit described later) is also included in the related processing.

[0067] Pressurized system

[0068] Structure of the pressurized system

[0069] Figure 1 It is a schematic perspective view showing an embodiment of the present system 1 .

[0070] Figure 2 This is a functional block diagram of this system 1.

[0071] Figure 1 In FIG. 1 , the boundaries of the regions described later are indicated by bold single-dot chain lines.

[0072] The system 1 performs pressurization and related processing on the workpiece W. The system 1 includes: a housing 2, a control device 3, a storage device 4, a preheating device 5, a pressurizing device 6, a primary cooling device 7, a take-out device 8, a conveying device 9, an atmosphere adjustment device 10, a carry-in device 11, a carry-out device 12, and a plurality of (five in this embodiment) chamber units 20.

[0073] The shell 2 accommodates a control device 3, a accommodating device 4, a preheating device 5, a pressurizing device 6, a primary cooling device 7, a taking-out device 8, a conveying device 9, an atmosphere adjusting device 10, a loading device 11, a loading device 12, and a chamber unit 20. When viewed from above, the shape of the shell 2 is a rectangle along the X-axis direction and the Y-axis direction (hereinafter referred to as the "XY-axis direction"), and is a hollow cuboid. The shell 2 is arranged on a horizontal floor surface. In the following description, the "horizontal direction" refers to a direction parallel to the floor surface, which is a direction parallel to the XY-axis direction. In addition, the horizontal direction includes not only a completely horizontal direction, but also a slight tilt of the floor surface, and errors (slight tilts) caused by manufacturing tolerances and assembly tolerances of the various components constituting the system 1.

[0074] When viewed from above, the space inside the housing 2 is divided into a carry-in area A1, a plurality of execution areas A2, and a carry-out area A3. In other words, the system 1 has a carry-in area A1, a plurality of execution areas A2, and a carry-out area A3. In this specification, when the carry-in area A1, the plurality of execution areas A2, and the carry-out area A3 are not specifically distinguished, they are simply referred to as "areas".

[0075] The “carry-in area A1” is an area where a process of carrying the workpiece W into the execution area A2 is performed.

[0076] The "execution area A2" is an area where any one of the pressurization process and the related process is executed. The execution area A2 includes a plurality of execution areas A21 to A26 corresponding to the pressurization process and the related process, respectively.

[0077] “Execution area A21” is an area where a containment process is performed, and is an example of a containment area of ​​the present invention. “Execution area A22” is an area where a preheating process is performed, and is an example of a preheating area of ​​the present invention. “Execution area A23” is an area where a pressurization process is performed, and is an example of a pressurization area of ​​the present invention. “Execution area A24” is an area where a primary cooling process is performed, and is an example of a cooling area of ​​the present invention. “Execution area A25” is an area where a secondary cooling process and a take-out process are performed, and is an example of a cooling area and a take-out area of ​​the present invention. “Execution area A26” is an area where a maintenance process is performed, and is an example of a maintenance area of ​​the present invention.

[0078] The “carry-out area A3” is an area where a carry-out process is performed to carry the workpiece W out of the execution area after the pressurization process is performed.

[0079] When viewed from above, the execution area A2 is arranged between the carrying-in area A1 and the carrying-out area A3. Each of the execution areas A21 to A26 is arranged according to the workpiece W and the upper unit 22 (see Figure 5 . The same below) is arranged in a rectangular ring shape in the clockwise direction when viewed from above in the order of each process performed. Specifically, the execution area A21 is arranged adjacent to the +X axis direction side of the carrying-in area A1, the execution area A22 is arranged adjacent to the +Y axis direction side of the execution area A21, the execution area A23 is arranged adjacent to the +X axis direction side of the execution area A22, the execution area A24 is arranged adjacent to the +X axis direction side of the execution area A23, the execution area A25 is arranged adjacent to the -Y axis direction side of the execution area A24, the execution area A26 is arranged adjacent to the -X axis direction side of the execution area A25 and the +X axis direction side of the execution area A21, and the carrying-out area A3 is arranged adjacent to the +X axis direction side of the execution area A25. That is, in the X-axis direction, the execution area A23 is arranged between the execution areas A22 and A24, and the execution area A26 is arranged between the execution areas A21 and A25.

[0080] The control device 3 controls the overall operation of the present system 1. The control device 3 includes, for example, a processor such as a CPU (Central Processing Unit) 3a, a volatile memory such as a RAM (Random Access Memory) 3b that functions as a work area of ​​the CPU 3a, and a non-volatile memory such as a ROM (Read Only Memory) 3c that stores various information such as a control program.

[0081] Figure 3 It is a schematic cross-sectional view showing the main structure of each device arranged in each execution area A21 to A26.

[0082] This figure shows a schematic cross-sectional view of each device when viewed from a direction (X-axis direction or Y-axis direction) in which rail members R1 to R16 described later and arranged in the respective execution areas A21 to A26 face.

[0083] The storage device 4 assembles the chamber unit 20 by mounting the stage 21 on which the workpiece W is mounted on the upper unit 22, and stores the workpiece W in the chamber unit 20. The storage device 4 includes a workbench 40 and a lifting device 41. The storage device 4 is arranged in the execution area A21. For details of the stage 21 and the upper unit 22, refer to the following content.

[0084] The table 40 is a table on which the mounting table 21 is mounted. The table 40 is, for example, a rectangular plate-shaped shape along the XY axis direction when viewed from above. The upper surface 40a of the table 40 is a flat surface parallel to the horizontal direction.

[0085] The lifting device 41 lifts and lowers the table 40. The lifting device 41 is, for example, a known cylinder.

[0086] The preheating device 5 heats the workpiece W accommodated in the chamber unit 20 to a preheating temperature described later. The preheating device 5 includes a stage 50, a preheating unit 51, and a lifting device 52. The preheating device 5 is disposed in the execution area A22.

[0087] The stage 50 is a stage on which the preheating unit 51 is placed. The shape of the stage 50 is, for example, a rectangular shape along the XY axis direction when viewed from above, and is a plate shape.

[0088] The preheating unit 51 is arranged above the workbench 50 and installed on the workbench 50. The preheating unit 51 includes a main body 51a, a heat insulating component 51b, and a plurality of heaters H1. The main body 51a protects the heater H1. The main body 51a is made of, for example, a metal having high thermal conductivity (for example, a copper alloy). The shape of the main body 51a is, for example, a rectangular shape along the XY axis direction when viewed from above, and is a rectangular parallelepiped. The heat insulating component 51b covers the periphery of the main body 51a (the entire periphery in the horizontal direction and the downward direction. The same applies hereinafter) to suppress the heat of the heater H1 from leaking to the surroundings. The heater H1 is arranged inside the main body 51a. The upper surface 51c of the preheating unit 51 is a plane parallel to the horizontal direction.

[0089] The lifting device 52 lifts and lowers the work table 50 and the preheating unit 51. The lifting device 52 is, for example, a known cylinder.

[0090] The pressurizing device 6 presses the workpiece W accommodated in the chamber unit 20. The pressurizing device 6 includes a lower base member 60, a thermal energy unit 61, and a lifting device 62. The pressurizing device 6 is disposed in the execution area A23.

[0091] The lower base member 60 supports the thermal unit 61. The lower base member 60 is made of, for example, a metal having high rigidity (for example, stainless steel). The shape of the lower base member 60 is, for example, a rectangular shape along the XY axis direction when viewed from the top and bottom, and is a cuboid shape.

[0092] The thermal energy unit 61 is arranged above the lower base member 60 and mounted on the lower base member 60. The thermal energy unit 61 includes a main body 61a, a heat insulating member 61b, a plurality of heaters H2, and a plurality of refrigerant flow channels C1. The main body 61a protects the heater H2 and the refrigerant flow channels C1. The main body 61a is made of, for example, a metal having high rigidity (for example, carbon steel). The shape of the main body 61a is a rectangular shape along the XY axis direction when viewed in the up and down direction, and is a rectangular parallelepiped. The heat insulating member 61b is arranged to cover the periphery of the main body 61a and divide the main body 61a into two upper and lower parts. The heat insulating member 61b suppresses the heat leakage of the heater H2 to the surroundings and the condensation of the main body 61a. The heater H2 heats the workpiece W when the workpiece W is pressurized. The heater H2 is arranged in the upper half of the main body 61a. The refrigerant flow channel C1 is a flow channel for the refrigerant (not shown in the figure. The same below) for cooling the lower half of the main body 61a. The refrigerant is cooled by a cooling device (not shown in the figure. The same below) and circulates between the refrigerant flow channel C1 and the cooling device. The refrigerant flow channel C1 is arranged in the lower half of the main body 61a. The thermal energy unit 61 is installed on the lower base member 60. The thermal energy unit 61 is an example of a pressing unit and a heating unit of the present invention. The upper surface 61c of the thermal energy unit 61 is a plane parallel to the horizontal direction.

[0093] The lifting device 62 lifts and lowers the lower foundation member 60 and the thermal energy unit 61. The lifting device 62 is, for example, a known hydraulic cylinder.

[0094] The primary cooling device 7 cools the heated workpiece W accommodated in the chamber unit 20. The primary cooling device 7 includes a stage 70, a primary cooling unit 71, and a lifting device 72. The primary cooling device 7 is disposed in the execution area A24.

[0095] The stage 70 is a stage on which the primary cooling unit 71 is placed. The shape of the stage 70 is, for example, a rectangular shape along the XY axis direction when viewed from above, and is a plate shape.

[0096] The primary cooling unit 71 is arranged above the workbench 70 and installed on the workbench 70. The primary cooling unit 71 includes a main body 71a, a heat insulating component 71b, and a plurality of refrigerant flow channels C2. The main body 71a protects the refrigerant flow channels C2. The main body 71a is made of, for example, a metal having high thermal conductivity (for example, a copper alloy). The shape of the main body 71a is, for example, a rectangular shape along the XY axis direction when viewed from above, and is a rectangular parallelepiped. The heat insulating component 71b covers the periphery of the main body 71a to suppress condensation on the main body 71a. The refrigerant flow channel C2 is a flow channel for the refrigerant to flow. The refrigerant is cooled by the cooling device and circulates between the refrigerant flow channel C2 and the cooling device. The upper surface 71c of the primary cooling unit 71 is a plane parallel to the horizontal direction. The primary cooling unit 71 is an example of a cooling unit of the present invention.

[0097] The lifting device 72 lifts and lowers the table 70 and the primary cooling unit 71. The lifting device 72 is, for example, a known cylinder.

[0098] The take-out device 8 cools the workpiece W accommodated in the chamber unit 20 and takes the workpiece W out of the chamber unit 20. The take-out device 8 includes a work table 80, a secondary cooling unit 81, and a lifting device 82. The take-out device 8 is disposed in the execution area A25.

[0099] The table 80 is a table on which the secondary cooling unit 81 is placed. The shape of the table 80 is, for example, a rectangular shape along the XY axis direction when viewed from above, and is a plate shape.

[0100] The secondary cooling unit 81 is arranged above the workbench 80 and installed on the workbench 80. The secondary cooling unit 81 includes a main body 81a, a heat insulating component 82b, and a plurality of refrigerant flow channels C3. The main body 81a protects the refrigerant flow channels C3. The main body 81a is made of, for example, a metal having high thermal conductivity (for example, a copper alloy). The shape of the main body 81a is, for example, a rectangular shape along the XY axis direction when viewed from above, and is a rectangular parallelepiped. The heat insulating component 81b covers the periphery of the main body 81a to suppress condensation on the main body 81a. The refrigerant flow channel C3 is a flow channel for the refrigerant to flow. The refrigerant is cooled by the cooling device and circulates between the refrigerant flow channel C3 and the cooling device. The upper surface 81c of the secondary cooling unit 81 is a plane parallel to the horizontal direction. The secondary cooling unit 81 is an example of a cooling unit of the present invention.

[0101] The lifting device 82 lifts and lowers the worktable 80 and the secondary cooling unit 81. The lifting device 82 is, for example, a known cylinder.

[0102] Figure 4 It is a schematic top view of the system 1.

[0103] In this figure, for the sake of convenience, the transport device 9, the loading device 11, and the unloading device 12 are mainly shown. In addition, in this figure, the base components B1 to B8 described later are shown in a semi-transparent state, and the chamber unit 20 is shown by a two-dot chain line. Figure 1 to Figure 3 .

[0104] The transport device 9 transports the chamber unit 20 and the upper unit 22. The transport device 9 includes a plurality of (16 in this embodiment) rail members R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, R16, a plurality of (8 in this embodiment) base members B1, B2, B3, B4, B5, B6, B7, B8, a plurality of rollers Ro, a drive device 90, and four rotating mechanisms 91, 92, 93, 94. The rotating mechanisms 91 to 94 are an example of the conversion mechanism of the present invention.

[0105] The rail components R1 to R16 support the chamber unit 20 in such a manner that the chamber unit 20 can move in the horizontal direction (X-axis direction or Y-axis direction). The shape of the rail components R1 to R16 is, for example, a long strip along the X-axis direction or the Y-axis direction. In addition, the lower end of the rail components R1 to R16 protrudes to one side in the short side direction, and when viewed along the long side direction of the rail components R1 to R16, the shape of the rail components R1 to R16 is an "L" shape. The rail components R1 to R16 are designed to have the strength to support a heavy object, namely the chamber unit 20. In the following description, when the rail components R1 to R16 are not specifically distinguished, the rail components R1 to R16 are referred to as "rail components R". In addition, when the long side direction of the rail component R is along the X-axis direction, the rail component R faces the X-axis direction, and when the long side direction is along the Y-axis direction, the rail component R faces the Y-axis direction.

[0106] The base components B1 to B8 support the corresponding rail components R1 to R16. The base components B1 to B8 are rectangular along the XY axis when viewed from above, and are cuboid. The rail components R1 to R16 are mounted on the lower surface of each of two parallel sides of the four sides of the corresponding base components B1 to B8 in a manner that the protrusions face each other.

[0107] The base member B1 supports the rail members R1 and R2 and is disposed above the workbench 40 in the execution area A21, that is, in the upper space in the execution area A21. The base member B1 is mounted on the ceiling of the housing 2 via a rotating mechanism 91 (not shown).

[0108] The base member B2 supports the rail members R3 and R4. The base member B2 is disposed above the preheating unit 51 in the execution area A22, that is, in the upper space in the execution area A22. The base member B2 is mounted on the ceiling of the housing 2 via a rotating mechanism 92.

[0109] The base member B3 supports the rail members R5 and R6. The base member B3 is disposed above the primary cooling unit 71 in the execution area A24, that is, in the upper space in the execution area A24. The base member B3 is mounted on the ceiling of the housing 2 via a rotating mechanism 93.

[0110] The base member B4 supports the rail members R7 and R8 . The base member B4 is disposed above the secondary cooling unit 81 in the execution area A25 , that is, in the upper space in the execution area A25 . The base member B4 is mounted on the ceiling of the housing 2 via a rotating mechanism 94 .

[0111] The foundation component B5 supports the rail components R9 and R10. In the execution areas A21 and A22, the foundation component B5 is disposed between the foundation components B1 and B2. That is, the foundation component B5 is disposed in the upper space in the execution areas A21 and A22. The foundation component B5 is installed on the ceiling of the housing 2.

[0112] The base component B6 supports the rail components R11 and R12. The base component B6 is arranged above the thermal energy unit 61 in the execution area A23, that is, in the upper space in the execution area A23. The base component B6 is installed on the ceiling of the shell 2. As described later, since a predetermined pressure is applied to the base component B6 during the pressurization process, the base component B6 is designed to have a strength that can withstand the pressure. During the pressurization process, the base component B6 and a part of the upper unit 22 together constitute the upper pressurization unit 6U (see Fig.13 . The same below).

[0113] The foundation component B7 supports the rail components R13 and R14. In the execution areas A24 and A25, the foundation component B7 is disposed between the foundation components B3 and B4. That is, the foundation component B7 is disposed in the upper space in the execution areas A24 and A25. The foundation component B7 is installed on the ceiling of the housing 2.

[0114] The foundation component B8 supports the rail components R15 and R16. In the execution area A26, the foundation component B8 is disposed between the foundation components B1 and B4. That is, the foundation component B8 is disposed in the upper space in the execution area A26. The foundation component B8 is installed on the ceiling of the housing 2.

[0115] The driving device 90 generates power for conveying the chamber unit 20 and transmits it to the roller Ro. The driving device 90 includes, for example, one or more power sources (for example, a motor) and a plurality of power transmission mechanisms (for example, gears, ball screws, etc.).

[0116] The rotating mechanisms 91 to 94 rotate the corresponding base members B1 to B4. The rotating mechanisms 91 to 94 include, for example, a motor and a plurality of gears, and are configured to be rotatable about the Z axis as a rotation axis.

[0117] The rotating mechanism 91 is disposed between the ceiling of the housing 2 and the base member B1. The rotating mechanism 91 rotates the base member B1 so that the orientation of the rail members R1 and R2 is oriented in either the X-axis direction or the Y-axis direction. In other words, the rotating mechanism 91 switches the movement direction of the chamber unit 20 guided by the rail members R1 and R2 between the X-axis direction and the Y-axis direction.

[0118] The rotating mechanism 92 is disposed between the ceiling of the housing 2 and the base member B1. The rotating mechanism 92 rotates the base member B2 so that the orientation of the rail members R3 and R4 is oriented in either the X-axis direction or the Y-axis direction. In other words, the rotating mechanism 92 switches the movement direction of the chamber unit 20 guided by the rail members R3 and R4 between the X-axis direction and the Y-axis direction.

[0119] The rotating mechanism 93 is disposed between the ceiling of the housing 2 and the base member B3. The rotating mechanism 93 rotates the base member B3 so that the orientation of the rail members R5 and R6 is oriented in either the X-axis direction or the Y-axis direction. In other words, the rotating mechanism 93 switches the movement direction of the chamber unit 20 guided by the rail members R5 and R6 between the X-axis direction and the Y-axis direction.

[0120] The rotating mechanism 94 is disposed between the ceiling of the housing 2 and the base member B4. The rotating mechanism 94 rotates the base member B4 so that the orientation of the rail members R7 and R8 is oriented in either the X-axis direction or the Y-axis direction. In other words, the rotating mechanism 94 switches the movement direction of the chamber unit 20 guided by the rail members R7 and R8 between the X-axis direction and the Y-axis direction.

[0121] As described above, the base members B1 to B4 are rotating base members that can rotate about the Z axis, while the base members B5 to B8 are non-rotatable fixed base members.

[0122] It should be noted that in the present invention, the structure of the transport device 9 can be any structure as long as it can transport the chamber unit 20 and the upper unit 22 between the execution areas A21 to A26, and is not limited to the present embodiment.

[0123] The atmosphere adjustment device 10 adjusts the atmosphere of the storage chamber 20R described later. The atmosphere adjustment device 10 includes a vacuum pump P, a decompression line Lp, a gas line Lg, a plurality of (five in this embodiment) valves V1, V2, V3, V4, V5, and a plurality of (five in this embodiment) fixed connectors Cs1, Cs2, Cs3, Cs4, Cs5. The atmosphere adjustment device 10 is configured to adjust the atmosphere of the storage chamber 20R to a decompression atmosphere (vacuum atmosphere) or an inert gas atmosphere.

[0124] The vacuum pump P adjusts the atmosphere in the storage chamber 20R to a reduced pressure atmosphere (vacuum atmosphere). The vacuum pump P is a known vacuum pump. The vacuum pump P is connected to the fixed connectors Cs1 to Cs5 via the reduced pressure line Lp and the valves V1 to V5.

[0125] The pressure reducing line Lp is a line connected to the vacuum pump P. The gas line Lg is a line connected to a supply line (not shown in the figure, the same below) of an inert gas (e.g., nitrogen). The pressure reducing line Lp and the gas line Lg are branched into a plurality of (at least 5 in the present embodiment) branch pipes, each of which is connected to a corresponding fixed connector Cs1 to Cs5 via a corresponding valve V1 to V5. The valves V1 to V5 are known solenoid valves that switch the connection between the pressure reducing line Lp and the gas line Lg and the fixed connectors Cs1 to Cs5.

[0126] The fixed connectors Cs1 to Cs5 are joints for pipes connected to the mobile connector Cp described later. The fixed connectors Cs1 to Cs5 are, for example, known pipe joints of couplings with check valves. The fixed connector Cs1 is arranged in the execution area A21, the fixed connector Cs2 is arranged in the execution area A22, the fixed connector Cs3 is arranged in the execution area A23, the fixed connector Cs4 is arranged in the execution area A24, and the fixed connector Cs5 is arranged in the execution area A25. The fixed connectors Cs1 to Cs5 are configured to remain closed even in a reduced pressure atmosphere when the connection with the mobile connector Cp is released.

[0127] It should be noted that, in the present invention, the fixed connectors Cs1 to Cs5 may be arranged in the execution areas A21 to A25 via a mechanism (e.g., a floating mechanism) that absorbs and mitigates the impact from the movable connector Cp accompanying the transportation of the chamber unit 20. In addition, the fixed connectors Cs1 to Cs5 may be arranged in the execution areas A21 to A25 in such a manner that they can move forward and backward toward the movable connector Cp after the transportation of the chamber unit 20 is completed.

[0128] The carrying-in device 11 carries the mounting table 21 on which the workpiece W is mounted, into the storage device 4 (the work table 40 ) in the execution area A21 . The carrying-in device 11 includes, for example, a slide rail and a motor for operating the slide rail.

[0129] The unloading device 12 unloads the mounting table 21 on which the pressurized workpiece W is mounted from the unloading device 8 (secondary cooling unit 81) of the execution area A25. The unloading device 12 includes, for example, a slide rail and a motor for operating the slide rail.

[0130] Chamber unit structure

[0131] Figure 5 is a schematic cross-sectional view of the chamber unit 20 .

[0132] The chamber unit 20 accommodates the workpiece W and transports the workpiece W between the execution areas A21 to A25. The chamber unit 20 includes a mounting table 21, an upper unit 22, and a storage chamber 20R.

[0133] The mounting table 21 transports the workpiece W and defines the storage chamber 20R. As described later, the mounting table 21 functions as a transport plate for the workpiece W and as a lower pressurizing unit 6D (see FIG. 6D ) when the workpiece W is pressurized. Fig.13 . The same below) plays a role. The mounting table 21 is made of, for example, a metal with high thermal conductivity (for example, a copper alloy). The shape of the mounting table 21 is a rectangular shape along the XY axis direction when viewed from above, and is a plate-like shape. The mounting table 21 has a strength that can withstand the force applied during the operation of the present system 1 described later, and has a thickness that reduces the heat capacity of the mounting table 21 during heating / cooling of the workpiece W. The shapes of the upper surface 21a and the lower surface 21b of the mounting table 21 are planes parallel to the horizontal direction. The mounting table 21 is configured to be mountable on or detachable from the upper unit 22 (side component 27).

[0134] The upper unit 22 covers the workpiece W from above. The upper unit 22 includes a base member 23, an upper die 24, a frame member 25, a pressure pad 26, a side member 27, a first spring member 28, a second spring member 29, two sealing members 30 and 31, and a movable connector Cp. As described later, the base member 23, the upper die 24, and the pressure pad 26 function as an upper pressurizing unit 6U when the workpiece W is pressurized.

[0135] The base member 23 supports the upper mold 24, the first spring member 28, and the second spring member 29. The base member 23 is made of, for example, a metal having high rigidity (for example, stainless steel). The base member 23 is in a rectangular shape along the XY axis direction when viewed from above, and is in a rectangular parallelepiped shape flattened in the vertical direction.

[0136] The upper die 24 presses the workpiece W from above via the pressure pad 26. The upper die 24 is made of, for example, a metal having high rigidity (for example, stainless steel). The upper die 24 is arranged below the base member 23 and is mounted on the lower surface 23a of the base member 23. The shape of the upper die 24 is a rectangular parallelepiped that is smaller than the base member 23 and is along the XY axis direction when viewed from below. The lower surface 24a of the upper die 24 is a plane parallel to the horizontal direction.

[0137] It should be noted that, in the present invention, the upper mold 24 and the base component 23 may also be formed as one piece.

[0138] The frame member 25 holds the pressure pad 26. The frame member 25 is made of, for example, a metal having high rigidity (for example, stainless steel). When viewed from below, the shape of the frame member 25 is a rectangular shape along the XY axis direction, and is frame-shaped. That is, when viewed from below, a rectangular internal space is formed in the center of the frame member 25. The frame member 25 is configured to surround the upper mold 24 in the horizontal direction. That is, the upper mold 24 is arranged in the internal space. In the up-down direction, the lower end portion 25a of the frame member 25 is located at a position lower than the lower surface 24a of the upper mold 24. The frame member 25 is supported on the base member 23 via the first spring member 28 so as to be relatively movable in the up-down direction relative to the upper mold 24. The frame member 25 has a groove portion 25c formed to surround the outer peripheral surface 25b of the frame member 25.

[0139] When the workpiece W is pressurized, the pressure pad 26 deforms following the shape of the surface of the workpiece W, uniformly pressurizes the workpiece W, and defines the accommodation chamber 20R. The pressure pad 26 is held by the lower end 25a of the frame member 25 and is disposed below the upper mold 24. The pressure pad 26 includes a soft layer 26a and a heat insulating layer 26b.

[0140] The soft layer 26a uniformly transmits the pressure from the upper mold 24 to the workpiece W when the workpiece W is pressurized. The soft layer 26a is made of, for example, a known elastic material having high fluidity and low rebound rate. The soft layer 26a is, for example, filled between two film members (not shown. Same below) arranged above and below the soft layer 26a. The outer edge of the film member is held by the lower end 25a of the frame member 25 throughout the entire circumference, so that the soft layer 26a is surrounded by the lower end 25a of the frame member 25 in the horizontal direction.

[0141] When the workpiece W is pressurized, the heat insulating layer 26b uniformly transfers the pressure from the upper mold 24 to the workpiece W, and inhibits the heat from the thermal energy unit 61 from being transferred to the soft layer 26a. The heat insulating layer 26b is made of, for example, a known fiber material with high flexibility and low thermal conductivity. The heat insulating layer 26b is arranged adjacent to the soft layer 26a below the soft layer 26a. The heat insulating layer 26b is filled between, for example, two film members (not shown. Same below) arranged above and below the heat insulating layer 26b. The outer edge of the film member is held by the lower end 25a of the frame member 25 throughout the entire circumference, and the heat insulating layer 26b is surrounded by the lower end 25a of the frame member 25 in the horizontal direction.

[0142] In addition, in the present invention, when the temperature of the main heating described later is lower than the heat resistance temperature of the soft layer 26a, the pressure pad 26 may not include the heat insulating layer 26b.

[0143] The side member 27 divides the storage chamber 20R. The side member 27 is made of, for example, a metal having high rigidity (for example, stainless steel). When viewed from below, the shape of the side member 27 is a rectangular shape along the XY axis direction, and is frame-shaped. That is, when viewed from below, a rectangular internal space is formed in the center of the side member 27. The side member 27 is configured to surround the frame member 25 in the horizontal direction. That is, the frame member 25 (upper mold 24, pressure pad 26) is arranged in the internal space. The side member 27 is supported on the base member 23 via the second spring member 29 in a manner that it can move relative to the upper mold 24 and the frame member 25 in the up and down directions. The side member 27 has a groove portion 27b formed on the lower surface 27a of the side member 27, and a through hole 27c opened on the inner surface and the outer surface of the side member 27. The through hole 27c is an example of a connecting path in the present invention.

[0144] The first spring member 28 supports the frame member 25 so that the frame member 25 can move vertically relative to the upper mold 24. The first spring member 28 is disposed between the base member 23 and the frame member 25 and is attached to the lower surface 23a of the base member 23 and the upper surface 25d of the frame member 25.

[0145] The second spring member 29 supports the side member 27 so that the side member 27 can move relative to the upper mold 24 and the frame member 25 in the vertical direction. The second spring member 29 is arranged between the base member 23 and the side member 27, and is attached to the lower surface 23a of the base member 23 and the upper surface 27d of the side member 27.

[0146] The sealing members 30 and 31 hermetically seal between the frame member 25 and the side member 27, and between the mounting table 21 and the side member 27. The sealing members 30 and 31 are, for example, known O-rings. The sealing member 30 is disposed in the groove 25c and abuts against the frame member 25 and the side member 27. The sealing member 31 is disposed in the groove 27b and abuts against the mounting table 21 and the side member 27.

[0147] The mobile connector Cp is a joint for a pipe connected to the fixed connectors Cs1 to Cs5. The mobile connector Cp is, for example, a pipe joint of a coupling with a known check valve. The mobile connector Cp is mounted on, for example, the outer surface of the side member 27 in a manner communicating with the through hole 27c. The mobile connector Cp is configured to be attachable to or detachable from the fixed connectors Cs1 to Cs5. The check valve of the mobile connector Cp is configured to remain closed when the connection with the fixed connectors Cs1 to Cs5 is released even if the storage chamber 20R is in a reduced pressure atmosphere.

[0148] The storage chamber 20R is a space for storing the workpiece W formed in the chamber unit 20. The storage chamber 20R is a closed space divided by the mounting table 21, the frame part 25, the pressure pad 26, the side part 27, and the sealing parts 30 and 31. The storage chamber 20R is connected to the movable connector Cp via the through hole 27c. The mounting table 21 functions as a floor portion that divides the storage chamber 20R, the pressure pad 26 functions as a ceiling portion that divides the storage chamber 20R, and the side part 27 functions as a peripheral wall portion that divides the storage chamber 20R. That is, the mounting table 21 is an example of a floor portion in the present invention, the pressure pad 26 is an example of a ceiling portion in the present invention, and the side part 27 is an example of a peripheral wall portion in the present invention.

[0149] The chamber unit 20 constructed in this way is transported between the execution areas A21 to A25 by the transport device 9. At this time, the outer peripheral edge of the base component 23 is placed on the track components R1 to R16, and the roller Ro contacts the outer peripheral surface 23b of the base component 23. As the roller Ro rotates, the base component 23 slides on the track components R1 to R16, and the chamber unit 20 is transported. As described above, since the base components B1 to B8 are installed on the ceiling of the shell 2, the chamber unit 20 is transported (moved) between the execution areas A21 to A25 by passing through the upper space in the execution areas A21 to A25.

[0150] Operation of the pressurized system

[0151] Next, the operation of the system 1 will be described below, taking the conveyance of a workpiece W as an example. Figure 1 to Figure 5 .

[0152] Figure 6This is a flowchart showing an example of the operation of the present system 1 .

[0153] This figure shows the operation of this system for one workpiece W.

[0154] First, prepare the workpiece W (ST1). The workpiece W is placed on the corresponding stage 21 by, for example, a device such as a robot arm or a user of the system 1. A plurality of stages 21 are housed in, for example, a storage container such as a card box (not shown in the figure. Same below), and one stage 21 is transported from the storage container to the loading device 11. At this time, a release sheet (not shown in the figure. Same below) is covered on top of the workpiece W. The release sheet is a sheet that prevents the workpiece W from sticking to the pressure pad 26 after the heat treatment. The release sheet is, for example, a sheet made of a synthetic resin (for example, PTFE (polytetrafluoroethylene)) that has heat resistance to the temperature of formal heating as described later.

[0155] Figure 7 It is a schematic cross-sectional view showing a state in which the mounting table 21 is carried into the storage device 4 .

[0156] This figure shows a schematic cross section of each device in the execution area A21 when viewed along the direction in which the rail members R1 and R2 are facing. In addition, this figure also shows a part of the atmosphere adjustment device 10. Figure 8 and Fig. 9 The same is true.

[0157] Then, the control device 3 controls the action of the loading device 11 so that it loads the loading table 21 carrying the workpiece W from the loading area A1 to the execution area A21 (ST2). Specifically, the loading device 11 loads the loading table 21 carrying the workpiece W onto the workbench 40. At this time, the loading table 21 functions as a conveying pallet for conveying (loading) the workpiece W to the execution area A21. The upper unit 22 is supported by rail components R1 and R2 facing the X-axis direction and is arranged above the loading table 21 (workbench 40). The movable connector Cp is connected to the fixed connector Cs1. In the up and down direction, the lower end portion 27e of the side component 27 is located at a position lower than the pressure pad 26 due to the elastic force of the second spring component 29.

[0158] Figure 8 It is a schematic cross-sectional view showing a state in which the mounting table 21 and the upper unit 22 are in contact with each other.

[0159] Fig. 9 2 is a schematic cross-sectional view showing a state where the workpiece W is accommodated in the chamber unit 20 .

[0160] Then, the control device 3 controls the operations of the storage device 4 and the atmosphere adjustment device 10 to store the workpieces W in the chamber unit 20 (ST3). That is, the storage process is performed.

[0161] The “housing process” is a process of assembling the chamber unit 20 and housing the workpiece W in the chamber unit 20. Since the pressurization process is performed on the workpiece W housed in the chamber unit 20, the housing process is a process for preparing for the pressurization process, that is, a pre-process for the pressurization process.

[0162] Specifically, the lifting device 41 raises the workbench 40 until the stage 21 on which the workpiece W is placed is closely attached to the upper unit 22 (sealing member 31). At this time, a receiving chamber 20R is formed between the stage 21 and the upper unit 22, and the workpiece W is contained in the receiving chamber 20R. Then, the atmosphere adjustment device 10 operates the vacuum pump P and the valve V1, and replaces the atmosphere in the receiving chamber 20R with an inert gas, so that the atmosphere in the receiving chamber 20R becomes a decompression atmosphere. At this time, the stage 21 is closely attached (mounted) to the side member 27 by the vacuum pressure (the pressure difference between the receiving chamber 20R and the external space of the chamber unit 20), the second spring member 29 contracts, and the stage 21 and the side member 27 rise. That is, in the up and down direction, the frame member 25 and the pressure pad 26 approach the stage 21 (workpiece W). In other words, the frame member 25 and the pressure pad 26 are relatively lowered relative to the stage 21. Then, the pressure pad 26 finally contacts the workpiece W, and the workpiece W is pre-pressurized by a pressure corresponding to the vacuum pressure. In addition, the frame part 25 abuts against the mounting table 21. Through pre-pressurization, the pressure pad 26 is deformed according to the shape of the surface of the workpiece W, and the workpiece W is held by the mounting table 21 and the pressure pad 26. Here, the pressure applied to the workpiece W during the pre-pressurization is much smaller than the pressure applied to the workpiece W during the pressurization process. Then, the lifting device 41 lowers the workbench 40. As described above, in the execution area A21, the chamber unit 20 is assembled by mounting the mounting table 21 to the upper unit 22, and the workpiece W is accommodated in the chamber unit 20 (performing the accommodation process). When the chamber unit 20 is assembled, the mounting table 21 is arranged below the workpiece W, the pressure pad 26 is arranged above the workpiece W, and the side part 27 is arranged to surround the entire circumference of the workpiece W in the horizontal direction.

[0163] Then, the control device 3 controls the action of the conveying device 9 so that it moves the chamber unit 20 from the execution area A21 to the execution area A22 (ST4). Specifically, the rotating mechanism 91 rotates the base component B1 90° in the clockwise direction when viewed from above. At this time, the orientation of the track components R1 and R2 is converted from the X-axis direction to the Y-axis direction. That is, the moving direction of the chamber unit 20 is converted from the X-axis direction to the Y-axis direction. That is, the execution area A21 also functions as a conversion area in the present invention. Then, by rotating the rollers Ro corresponding to the track components R1 to R4, R9, and R10, the chamber unit 20 is conveyed to the execution area A22 via the track components R9 and R10. At this time, the orientation of the track components R3 and R4 is toward the Y-axis direction. Then, the rotating mechanism 92 rotates the base component B2 90° in the clockwise direction when viewed from above. At this time, the orientation of the track components R3 and R4 is converted from the Y-axis direction to the X-axis direction. That is, the moving direction of the chamber unit 20 is changed from the Y-axis direction to the X-axis direction. That is, the execution area A22 also functions as a changeover area in the present invention. Then, the rotation mechanism 91 rotates the base member B1 by 90° in the counterclockwise direction when viewed from above.

[0164] When the chamber unit 20 moves from the execution area A21, the connection between the movable connector Cp and the fixed connector Cs1 is released. At this time, since the check valve of the movable connector Cp is closed, the storage chamber 20R is sealed and the reduced pressure atmosphere of the storage chamber 20R is maintained.

[0165] Fig.10 1 is a schematic cross-sectional view showing a state in which the chamber unit 20 is conveyed to the execution area A22 where the preliminary heating process is executed.

[0166] Fig.11 2 is a schematic cross-sectional view showing the chamber unit 20 in which the preliminary heating process is being performed.

[0167] These drawings show schematic cross sections of the devices in the execution area A22 when viewed in the direction in which the rail members R3 and R4 face. In addition, these drawings show a part of the atmosphere adjustment device 10.

[0168] Then, the control device 3 controls the operation of the preheating device 5 to perform a preheating process on the workpiece W (ST5).

[0169] The "preheating treatment" is a treatment for preheating the workpiece W to a predetermined preheating temperature before the pressurization treatment. The preheating treatment is a pretreatment performed before the pressurization treatment in order to shorten the heating time of the workpiece W during the pressurization treatment. The preheating temperature is a temperature lower than the main heating temperature described later (for example, about 200°C).

[0170] Specifically, the lifting device 52 raises the workbench 50 and the preheating unit 51 until the upper surface 51c of the preheating unit 51 abuts against the chamber unit 20 (the lower surface 21b of the mounting table 21). Then, the lifting device 52 maintains the state in which the preheating unit 51 abuts against the mounting table 21 for a predetermined time. Here, the preheating unit 51 has been preheated to a predetermined preheating temperature. Therefore, the heat from the preheating unit 51 is transferred to the workpiece W via the mounting table 21. After the predetermined time, the lifting device 52 lowers the workbench 50 to end the preheating process.

[0171] Here, when the chamber unit 20 is located in the execution area A22, the movable connector Cp is connected to the fixed connector Cs2. Then, the atmosphere adjustment device 10 operates the vacuum pump P and the valve V2 to maintain the atmosphere of the storage room 20R at the decompression atmosphere in the execution area A22.

[0172] Then, the control device 3 controls the operation of the transport device 9 to move the chamber unit 20 from the execution area A22 to the execution area A23 (ST6). Specifically, the rollers Ro corresponding to the rail members R3, R4, R11, and R12 rotate, thereby transporting the chamber unit 20 to the execution area A23. Then, the rotation mechanism 92 rotates the base member B2 by 90° in the counterclockwise direction when viewed from above.

[0173] When the chamber unit 20 moves from the execution area A22, the connection between the movable connector Cp and the fixed connector Cs2 is released. At this time, the check valve of the movable connector Cp is closed, thereby sealing the storage chamber 20R and maintaining the reduced pressure atmosphere of the storage chamber 20R.

[0174] Fig.12 1 is a schematic cross-sectional view showing a state in which the chamber unit 20 is transported to the execution area A23 where the pressurization process is performed.

[0175] Fig.13 2 is a schematic cross-sectional view showing the chamber unit 20 in which a pressurization process is being performed.

[0176] These figures show schematic cross sections of the devices in the execution area A23 when viewed in the direction in which the rail members R11 and R12 face. In addition, these figures also show a part of the atmosphere adjustment device 10.

[0177] Then, the control device 3 controls the operation of the pressurizing device 6 to perform a pressurizing process on the workpiece W (ST7).

[0178] Specifically, the lifting device 62 raises the lower base component 60 and the thermal energy unit 61 until the upper surface 61c of the thermal energy unit 61 abuts against the chamber unit 20 (the lower surface 21b of the mounting table 21). Next, the lifting device 62 raises the lower base component 60 and the thermal energy unit 61 until a predetermined pressure (hereinafter referred to as "formal pressure") is applied to the workpiece W. At this time, the mounting table 21 rises together with the frame component 25 and the side component 27, and the upper mold 24 descends relative to the frame component 25 and the side component 27. Therefore, the upper mold 24 presses the pressure pad 26 downward, and the pressure pad 26 deforms in a manner that follows the shape of the surface of the workpiece W, and uniformly pressurizes the workpiece W. As a result, the workpiece W is pressed from below by the mounting table 21 and from above by the pressure pad 26 (upper mold 24).

[0179] When the workpiece W is pressurized, the base component 23 is lifted from the rail components R11 and R12 by the lifting device 62 and abuts against the base component B6. That is, the base component B6 restricts the upward movement of the chamber unit 20, and the chamber unit 20 is clamped by the thermal energy unit 61 and the base component B6. At this time, the base component B6 and the lower base component 60 act as a so-called pad that bears the formal pressure of the lifting device 62. As a result, the formal pressure is applied to the workpiece W, and the formal pressure applied to the workpiece W remains stable. As described above, by having the two base components 23 and B6 bear the formal pressure in the pressurization process instead of the base component 23 alone, the thickness of the base component 23 can be designed to be thinner than when the base component 23 bears the formal pressure alone. Therefore, the weight of the chamber unit 20 and the upper unit 22 can be reduced, and the power required for transporting them can be controlled. Furthermore, since the actual pressing force is not applied to the rail members R11 and R12 , no load based on the actual pressing force is applied to the rail members R11 and R12 .

[0180] Then, the lifting device 62 maintains the state of applying formal pressure to the workpiece W for a specified time. Here, the upper half of the thermal energy unit 61 is preheated to a predetermined heating temperature (hereinafter referred to as the "formal pressurizing temperature". For example, about 300°C). Therefore, the heat from the thermal energy unit 61 is transferred to the workpiece W via the mounting table 21. At this time, the heat from the thermal energy unit 61 is also transferred to the pressurizing pad 26 via the frame component 25 and the workpiece W. As mentioned above, since the heat insulating layer 26b is arranged below the soft layer 26a, the heat from the thermal energy unit 61 is difficult to be transferred to the soft layer 26a due to the heat insulating layer 26b. That is, the soft layer 26a is thermally protected by the heat insulating layer 26b. After a specified time, the lifting device 62 lowers the lower base component 60 and the thermal energy unit 61 to end the pressurization process. At this time, the chamber unit 20 is supported by the rail components R11 and R12.

[0181] Here, when the chamber unit 20 is located in the execution area A23, the movable connector Cp is connected to the fixed connector Cs3. Then, the atmosphere adjustment device 10 operates the vacuum pump P and the valve V3 to maintain the atmosphere of the receiving chamber 20R in the execution area A23 as a reduced pressure atmosphere. Therefore, the workpiece W in the pressurized treatment is not exposed to the outside air and is not oxidized.

[0182] As described above, during the pressurization process, the base member 23, the upper mold 24, and the pressurization pad 26 in the chamber unit 20, together with the base member B6, function as an upper pressurization unit 6U for pressurizing the workpiece W from above. In addition, the mounting table 21 in the chamber unit 20, together with the lower base member 60 and the thermal energy unit 61, function as a lower pressurization unit 6D for pressurizing the workpiece W from below.

[0183] Then, the control device 3 controls the action of the conveying device 9 so that it moves the chamber unit 20 from the execution area A23 to the execution area A24 (ST8). Specifically, the rollers Ro corresponding to the track components R5, R6, R11, and R12 are rotated, so that the chamber unit 20 is conveyed to the execution area A24. At this time, the orientation of the track components R5 and R6 is toward the X-axis direction. Then, the rotating mechanism 93 rotates the base component B3 90° in a clockwise direction when viewed from above. At this time, the orientation of the track components R5 and R6 is converted from the X-axis direction to the Y-axis direction. That is, the moving direction of the chamber unit 20 is converted from the X-axis direction to the Y-axis direction. That is, the execution area A24 also functions as a conversion area in the present invention.

[0184] When the chamber unit 20 moves from the execution area A23, the connection between the movable connector Cp and the fixed connector Cs3 is released. At this time, the check valve of the movable connector Cp is closed, thereby sealing the storage chamber 20R and maintaining the reduced pressure atmosphere of the storage chamber 20R.

[0185] Fig.14 1 is a schematic cross-sectional view showing a state in which the chamber unit 20 is conveyed to the execution area A24 where the primary cooling process is performed.

[0186] Fig.15 2 is a schematic cross-sectional view showing the chamber unit 20 performing a primary cooling process.

[0187] These figures show schematic cross sections of the devices in the execution area A24 when viewed in the direction in which the rail members R5 and R6 face. In addition, these figures also show a part of the atmosphere adjustment device 10.

[0188] Then, the control device 3 controls the operation of the primary cooling device 7 to perform the primary cooling process on the workpiece W after the pressurizing process (ST9).

[0189] "Primary cooling treatment" refers to the treatment of cooling the workpiece W after the pressurization treatment to a specified temperature (for example, about 100°C). The primary cooling treatment is a post-pressurization treatment performed after the heating treatment in order to cool the workpiece W after the pressurization treatment. During the pressurization treatment, not only the workpiece W is heated, but also the chamber unit 20 (the mounting table 21, the frame part 25, and the side part 27) is heated. Since these have a large heat capacity, it takes time to complete the cooling of the workpiece W. In particular, the temperature drop rate will slow down at a specified temperature (for example, about 100°C). Therefore, in this system 1, in order to shorten the cooling time, the cooling treatment of the workpiece W will be performed in two stages, namely, primary cooling treatment and secondary cooling treatment, based on the specified temperature.

[0190] Specifically, the lifting device 72 raises the workbench 70 and the primary cooling unit 71 until the upper surface 71c of the primary cooling unit 71 abuts against the chamber unit 20 (the lower surface 21b of the mounting table 21). Then, the lifting device 72 maintains the abutment state of the primary cooling unit 71 and the mounting table 21 for a predetermined time. Here, the primary cooling unit 71 is pre-cooled to a predetermined primary cooling temperature (for example, about 20°C). Therefore, the workpiece W is cooled to a predetermined temperature (for example, about 100°C) by the primary cooling unit 71 via the mounting table 21. After the predetermined time, the lifting device 72 lowers the workbench 70 to end the primary cooling process.

[0191] Here, when the chamber unit 20 is located in the execution area A24, the movable connector Cp is connected to the fixed connector Cs4. Then, the atmosphere adjustment device 10 operates the vacuum pump P and the valve V4 to maintain the atmosphere in the storage chamber 20R during the primary cooling process as a reduced pressure atmosphere. Therefore, the workpiece W during the primary cooling process is not exposed to the outside air and is not oxidized.

[0192] Then, the control device 3 controls the action of the conveying device 9 so that it moves the chamber unit 20 from the execution area A24 to the execution area A25 (ST10). Specifically, by rotating the rollers Ro corresponding to the track components R5 to R8, R13, and R14, the chamber unit 20 is conveyed to the execution area A24 via the track components R13 and R14. At this time, the orientation of the track components R7 and R8 is toward the Y-axis direction. Then, the rotating mechanism 94 rotates the base component B4 90° in the clockwise direction when viewed from above. At this time, the orientation of the track components R7 and R8 is converted from the Y-axis direction to the X-axis direction. That is, the moving direction of the chamber unit 20 is converted from the Y-axis direction to the X-axis direction. That is, the execution area A25 also functions as a conversion area in the present invention. Then, the rotating mechanism 93 rotates the base component B3 90° in the counterclockwise direction when viewed from above.

[0193] When the chamber unit 20 moves from the execution area A24, the connection between the movable connector Cp and the fixed connector Cs4 is released. At this time, the check valve of the movable connector Cp is closed, thereby sealing the storage chamber 20R and maintaining the reduced pressure atmosphere of the storage chamber 20R.

[0194] Fig.16 1 is a schematic cross-sectional view showing a state in which the chamber unit 20 is conveyed to the execution area A25 where the secondary cooling process is performed.

[0195] Fig.17 1 is a schematic cross-sectional view showing the chamber unit 20 after the secondary cooling process is completed.

[0196] These figures show schematic cross-sections of the devices in the execution area A25 when viewed in the direction in which the rail members R7 and R8 are facing. In addition, these figures also show a portion of the atmosphere adjustment device 10. Fig.18 The same is true.

[0197] Then, the control device 3 controls the operations of the take-out device 8 and the atmosphere adjustment device 10 to perform a secondary cooling process on the workpiece W ( ST11 ), and then performs a take-out process for the workpiece W.

[0198] The "secondary cooling process" is a process for cooling the workpiece W after the primary cooling process to a temperature at which it can be taken out (for example, about 60° C. or less). The secondary cooling process is a post-pressing process performed after the heating process in order to cool the workpiece W after the pressurizing process together with the primary cooling process.

[0199] The “removal process” refers to the process of disassembling the chamber unit 20 (removing the mounting table 21 from the upper unit 22) and removing the workpiece W from the chamber unit 20. After the workpiece W is removed from the chamber unit 20, a series of processes on the workpiece W are completed, so the removal process is a post-processing of the pressurization process.

[0200] Specifically, the lifting device 82 raises the workbench 80 and the secondary cooling unit 81 until the upper surface 81c of the secondary cooling unit 81 abuts against the chamber unit 20 (the lower surface 21b of the mounting table 21). Then, the lifting device 82 maintains the abutment state of the secondary cooling unit 81 and the mounting table 21 for a predetermined time. Here, the secondary cooling unit 81 has been pre-cooled to a predetermined secondary cooling temperature (for example, about 20°C). Therefore, the workpiece W is cooled to a predetermined temperature (for example, below about 60°C) by the secondary cooling unit 81 via the mounting table 21. After the predetermined time, the secondary cooling process is completed.

[0201] Here, when the chamber unit 20 is located in the execution area A25, the movable connector Cp is connected to the fixed connector Cs5. Then, the atmosphere adjustment device 10 operates the vacuum pump P and the valve V5 to maintain the atmosphere of the storage chamber 20R in the execution area A25 as a reduced pressure atmosphere. Therefore, the workpiece W in the secondary cooling is not exposed to the outside air and is not oxidized.

[0202] Fig.18 It is a schematic cross-sectional view showing a state where the mounting table 21 is detached from the upper unit 22 .

[0203] Then, the atmosphere adjustment device 10 operates the vacuum pump P and the valve V5, purifies the atmosphere in the storage chamber 20R with an inert gas, and makes the atmosphere in the storage chamber 20R an inert gas atmosphere (atmospheric pressure). At this time, the vacuum pressure disappears, the second spring member 29 extends, and the stage 21 and the side member 27 descend. That is, in the vertical direction, the frame member 25 and the pressure pad 26 are separated from the stage 21. In other words, the frame member 25 and the pressure pad 26 rise relative to the stage 21. And the stage 21 can be removed from the upper unit 22. Then, the lifting device 82 lowers the workbench 80 and the secondary cooling unit 81, removes the stage 21 from the upper unit 22, and removes the workpiece W from the chamber unit 20 (ST12). As described above, in the execution area A25, by removing the stage 21 from the upper unit 22, the assembly of the chamber unit 20 is released, and the workpiece W is taken out of the chamber unit 20 (the removal process is performed).

[0204] It should be noted that, in the present invention, the storage chamber 20R may be purified by air.

[0205] Then, the control device 3 controls the operation of the unloading device 12 so that the loading platform 21 carrying the workpiece W after the secondary cooling process is unloaded from the execution area A25 to the unloading area A3 (ST13). Specifically, the unloading device 12 unloads the loading platform 21 carrying the workpiece W from the secondary cooling unit 81 to the unloading position of the unloading area A3. That is, the loading platform 21 functions as a transport tray for transporting (unloading) the pressurized workpiece W from the execution area A25 to the unloading area A3.

[0206] Then, the control device 3 controls the operation of the transport device 9 to move the upper unit 22 (in other words, the chamber unit 20 after the mounting table 21 is removed) from the execution area A25 to the execution area A26, and then from the execution area A26 to the execution area A21 (ST14). Specifically, the rollers Ro corresponding to the rail members R7, R8, R15, and R16 rotate, so that the upper unit 22 is transported to the execution area A26. Then, the rotating mechanism 94 rotates the base member B4 by 90 degrees in the counterclockwise direction when viewed from above.

[0207] Fig.19 1 is a schematic cross-sectional view showing a state in which the upper unit 22 is conveyed to the execution area A26 where the maintenance process can be executed.

[0208] This figure is a schematic cross-sectional view of each device in the execution area A26 when viewed along the direction in which the rail members R15 and R16 are facing.

[0209] The "maintenance process" is, for example, a process in which the user of the system 1 performs maintenance on the upper unit 22 (in other words, the chamber unit 20 after the stage 21 is removed) (for example, checking the status of the pressure pad 26 and the sealing members 30 and 31, replacing the pressure pad 26, etc.). The maintenance process is not directly related to the pressure process, but is indirectly related to the pressure process. Therefore, in this embodiment, the maintenance process is an example of related processing.

[0210] As described above, the operation area A26 is not provided with the lifting devices 41, 52, 62, 72, 82 as in the other operation areas A21 to A25. That is, when the upper unit 22 is located in the operation area A26, a relatively large space (hereinafter referred to as "maintenance space MR") is maintained below the upper unit 22 for maintenance of the upper unit 22 compared to the other operation areas A21 to A25. The user of the present system 1 performs maintenance processing of the upper unit 22 as needed.

[0211] It should be noted that in the present invention, part or all of the maintenance process may be performed automatically. That is, for example, a camera that takes a picture of the upper unit 22 from below may be disposed in the execution area A26, and the state of the pressure pad 26 may be automatically determined based on the image. In addition, for example, a device (mechanism) for replacing the pressure pad 26 may be disposed in the execution area A26, and the pressure pad 26 may be replaced automatically.

[0212] Then, the rollers Ro corresponding to the rail members R1, R2, R15, and R16 rotate, so that the upper unit 22 is conveyed to the execution area A21. At this time, the rail members R1 and R2 are oriented in the X-axis direction.

[0213] As described above, the chamber unit 20 is transported between the execution areas A21 to A25, and the upper unit 22 (the chamber unit 20 after the stage 21 is removed) is transported between the execution areas A25, A26, and A21. That is, the upper unit 22 makes a circuit between the execution areas A21 to A26. Then, in the execution area A21, the next stage 21 is installed on the upper unit 22, and the chamber unit 20 containing the next workpiece W is assembled and transported again between the execution areas A21 to A25. In other words, in the present system 1, the chamber unit 20 is formally (on the surface) transported between the execution areas A21 to A25. And, each time the chamber unit 20 makes a circuit, a pressurization process and related processes are sequentially performed on one workpiece W. In this structure, after the corresponding process is completed in a certain execution area A21 to A25, the chamber unit 20 is transported to the execution area A21 to A25 where the next process is performed. Therefore, as described below, in the execution areas A21 to A25 where the processing has been completed, the same processing can be executed on other chamber units 20 .

[0214] Next, the operation of the system 1 will be described below, taking the conveyance of a plurality of workpieces W (that is, a plurality of chamber units 20) as an example. Figures 1 to 18 .

[0215] Fig. 20 2 is a schematic plan view showing the positions of a plurality of chamber units 20 (part of which is the upper unit 22) in chronological order. Fig. 20 (a) shows the position at time "T1", Fig. 20 (b) shows the position at time "T2", Fig. 20 (c) shows the position at time "T3", Fig. 20 (d) shows the position at time "T4", Fig. 20 (e) shows the position at time "T5", Fig. 20 (f) shows the position at time "T6".

[0216] Here, in chronological order, time passes in the order of "T1", "T2", "T3", "T4", "T5", and "T6". For ease of explanation, the figure only shows the execution areas A21 to A26 (single-dash lines) and the chamber unit 20 (solid line). The black circle in the figure shows the direction of the chamber unit 20 (upper unit 22), and the gray circle in the figure shows the direction of the chamber unit 20 just after the containment process is completed. In the figure, in order to distinguish between the five chamber units 20, for ease of explanation, the chamber unit 20 and the upper unit 22 are marked with (A) to (E).

[0217] At time "T1", chamber unit 20 (A) is located in execution area A25, chamber unit 20 (B) is located in execution area A24, chamber unit 20 (C) is located in execution area A23, chamber unit 20 (D) is located in execution area A22, and chamber unit 20 (E) is located in execution area A21. The corresponding processing is performed on the workpiece W accommodated in each chamber unit 20 (A to E).

[0218] At time "T2", the upper unit 22 (A) is located in the execution area A26, the chamber unit 20 (B) is located in the execution area A25, the chamber unit 20 (C) is located in the execution area A24, the chamber unit 20 (D) is located in the execution area A23, and the chamber unit 20 (E) is located in the execution area A22. The corresponding processing is performed on the workpiece W accommodated in each chamber unit 20 (B to E). In addition, the upper unit 22 (A) is maintained.

[0219] At time "T3", the chamber unit 20 (A) is located in the execution area A21, the upper unit 22 (B) is located in the execution area A26, the chamber unit 20 (C) is located in the execution area A25, the chamber unit 20 (D) is located in the execution area A24, and the chamber unit 20 (E) is located in the execution area A23. The corresponding processing is performed on the workpiece W accommodated in each chamber unit 20 (A, C to E). In addition, the maintenance processing is performed on the upper unit 22 (B).

[0220] At time "T4", the chamber unit 20 (A) is located in the execution area A22, the chamber unit 20 (B) is located in the execution area A21, the upper unit 22 (C) is located in the execution area A26, the chamber unit 20 (D) is located in the execution area A25, and the chamber unit 20 (E) is located in the execution area A24. The corresponding processing is performed on the workpiece W accommodated in each chamber unit 20 (A, B, D, E). In addition, the maintenance processing is performed on the upper unit 22 (C).

[0221] At time "T5", the chamber unit 20 (A) is located in the execution area A23, the chamber unit 20 (B) is located in the execution area A22, the chamber unit 20 (C) is located in the execution area A21, the upper unit 22 (D) is located in the execution area A26, and the chamber unit 20 (E) is located in the execution area A25. The corresponding processing is performed on the workpiece W accommodated in each chamber unit 20 (A to C, E). In addition, the maintenance processing is performed on the upper unit 22 (D).

[0222] At time "T6", the chamber unit 20 (A) is located in the execution area A24, the chamber unit 20 (B) is located in the execution area A23, the chamber unit 20 (C) is located in the execution area A22, the chamber unit 20 (D) is located in the execution area A26, and the upper unit 22 (E) is located in the execution area A26. The corresponding processing is performed on the workpiece W accommodated in each chamber unit 20 (A to D). In addition, the maintenance processing is performed on the upper unit 22 (E).

[0223] Here, the transport of the chamber units 20 (A to E) is performed based on the completion of the process (in this embodiment, the pressurization process) with the longest processing time. That is, for example, when the transport of the chamber units 20 (A to E) located in the execution area A24 to the execution area A25 is completed, the pressurization process in the execution area A23 is completed, and the transport of the chamber units 20 (A to E) is performed based on the completion of the pressurization process in the execution area A23.

[0224] In addition, in the present embodiment, the execution areas A21, A22, A24, and A25 in the execution areas A21 to A26 also function as transition areas. In this structure, since it is not necessary to configure a transition area separately from the execution areas A21 to A26, and the execution areas A21 to A26 do not need to be configured on a straight line, the floor space of the housing 2 can be reduced. In the transition area, the orientation of the track components R1 to R8 cannot be changed unless the chamber unit 20 or the upper unit 22 is moved out of the transition area. Therefore, the transport device 9 cannot transport all the chamber units 20 and the upper units 22 at the same time, and must transport them sequentially. Therefore, the total number of chamber units 20 and upper units 22 is set to be at least "1" less than the number of execution areas A21 to A26.

[0225] It should be noted that in the present invention, when the execution areas A21 to A26 are configured to not include a conversion area (for example, the second to fourth variations described later), or when a standby area for the chamber units 20 or the upper units 22 to wait is arranged between the execution areas A21 to A26, the total number of chamber units 20 and upper units 22 may also be the same as the number of execution areas A21 to A26.

[0226] As described above, the chamber unit 20 (A to E) formally circulates around the execution area A21 to A25 by moving to the execution area A26 as the upper unit 22 (A to E). Therefore, the present system 1 can perform different processes on multiple chamber units 20 (A to E) simultaneously and in parallel. As a result, in the present system 1, the time required between the pressurization process of a certain workpiece W and the pressurization process of the next workpiece W (the time between pressurization processes) is significantly shortened compared to the time in the existing pressurization device. In addition, in the present system 1, while performing the pressurization process, the pre-processing and post-processing (related processes) of the pressurization process can also be performed.

[0227] In addition, the workpiece W is transported to the execution areas A21 to A25 while being contained in the sealed containment chamber 20R (chamber unit 20) in a reduced pressure atmosphere, and undergoes a series of various processes (preheating process, pressurization process, primary cooling process, and secondary cooling process). That is, the workpiece W is not exposed to the outside air between the various processes in the series. Therefore, during each process, the workpiece W can be prevented from being oxidized by heat and external air, and the risk of contamination of the workpiece W by foreign matter (e.g., dust, dirt, etc.) from outside the chamber unit 20 is reduced.

[0228] Furthermore, the system 1 performs a preheating process as a pre-process for the pressurization process. Therefore, the pressurization process in the system 1 can be performed in a shorter time than the pressurization process in the conventional pressurization device which cannot perform the preheating process.

[0229] Furthermore, the pressurization process and the cooling process are separated in the present system 1. Therefore, the pressurization process in the present system 1 can be performed in a shorter time than the pressurization process in the conventional pressurization device in which the pressurization process and the cooling process cannot be separated.

[0230] In addition, in the present system 1, the cooling process is divided into a primary cooling process and a secondary cooling process. Therefore, in the present system 1, the workpiece W can be efficiently cooled. In addition, in the present system 1, the cooling time of each workpiece W can be shortened compared to the existing pressurizing device that cannot perform the cooling process separately.

[0231] As described above, the system 1 can perform the preheating process, the primary cooling process, and the secondary cooling process as related processes. Therefore, the system 1 can shorten the total time required from the loading and unloading of the workpiece W compared to the total time required by the conventional pressurizing device. That is, the system 1 can shorten the time by performing a plurality of related processes compared to the time between pressurizing processes in the conventional pressurizing device that cannot perform related processes.

[0232] In addition, between the execution areas A21 to A25, the chamber unit 20 is rotated 90° in the same direction (clockwise when viewed from above in this embodiment) four times in the execution areas A21, A22, A24, and A25 (conversion areas). As a result, the orientation of the chamber unit 20 relative to the moving direction of the chamber unit 20 is always the same. In this structure, the orientation of the workpiece W when it is located in the carry-in area A1 is the same as the orientation of the workpiece W when it is located in the carry-out area A3. That is, the orientation of the workpiece W is the same in the pre-processing and post-processing of the present system 1.

[0233] Moreover, in the present system 1, when the chamber unit 20 is located in the execution area A21-A25, the movable connector Cp is connected to the fixed connectors Cs1-Cs5, and the receiving chamber 20R can be connected to the decompression pipeline Lp or the gas pipeline Lg via the through hole 27c, the movable connector Cp, the fixed connectors Cs1-Cs5, and the valves V1-V5. When the chamber unit 20 is transported, the check valve of the movable connector Cp is closed and the receiving chamber 20R is sealed. In this structure, during the transportation of the chamber unit 20, even if the vacuum degree of the receiving chamber 20R decreases, the decompression atmosphere of the receiving chamber 20R can be maintained in each execution area A21-A25. Therefore, it is possible to prevent the workpiece W from being oxidized due to heat and external air.

[0234] Furthermore, in the present system 1, the chamber unit 20 has components (a mounting table 21, a base component 23, an upper mold 24, and a pressure pad 26) that function as upper and lower pressurizing units 6U and 6D, and are transported between the execution areas A21 to A25. In addition, the base component 23, the upper mold 24, and the pressure pad 26 among the components are transported between the execution areas A21 to A26. That is, these components are not fixed in the execution area A23, but are also transported to other execution areas A21, A22, A24 to A26. Therefore, in the other execution areas A21, A22, A24 to A26, the chamber unit 20 and the upper unit 22 can be maintained, and their maintainability can be improved.

[0235] In addition, in the present system 1, each process is performed in a state where one (one set) of workpieces W is stored in one chamber unit 20 (storage chamber 20R). That is, one (one set) of workpieces W is associated with one chamber unit 20. That is, one (one set) of mounting table 21 and pressure pad 26 is associated with one (one set) of workpieces W. Therefore, for each workpiece W, it is possible to track the mounting table 21 and pressure pad 26 used when performing each process.

[0236] In addition, the system 1 includes a plurality of chamber units 20, each of which includes components that function as upper and lower pressurizing units 6U and 6D. Therefore, even if these components fail, various processes on other workpieces W can be continued simply by removing (or replacing) the chamber unit 20.

[0237] In addition, the system 1 has an execution area A26 for maintenance processing in addition to the execution area A23. Therefore, no space for maintenance (mainly replacement of parts) is required in the execution area A23. Therefore, the height of the execution area A23 (housing 2) can be reduced.

[0238] Summarize

[0239] According to the embodiment described above, the system 1 has a plurality of execution areas A21 to A26 and a chamber unit 20. The execution areas A21 to A26 are arranged in the order in which each process is performed. The chamber unit 20 accommodates the workpiece W and is transported between the execution areas A21 to A25. The chamber unit 20 includes a mounting table 21, a pressure pad 26, and a side member 27. The mounting table 21 is arranged below the workpiece W and functions as a lower pressure unit 6D. The pressure pad 26 is arranged above the workpiece W and functions as an upper pressure unit 6U. The side member 27 is arranged to surround the entire circumference of the workpiece W in the horizontal direction, and divides the storage chamber 20R together with the mounting table 21 and the pressure pad 26. According to this structure, the same process can be performed on other chamber units 20 in the execution areas A21 to A25 where the process is completed. That is, in the system 1, the time interval between pressurization processes can be shortened. In addition, in the present system 1, the stage 21 functions as the lower pressurizing unit 6D, and the pressurizing pad 26 functions as the upper pressurizing unit 6U. Therefore, it is possible to perform pressurizing treatment on the workpiece W accommodated in the chamber unit 20 (accommodating chamber 20R). Moreover, the chamber unit 20, which functions as the upper and lower pressurizing units 6U and 6D, is not fixed in the execution area A23 for performing pressurizing treatment, but is transported to other execution areas A21, A22, A24 to A26. Therefore, in the present system 1, the maintainability of the pressurizing pad 26 can be improved. In addition, in the present system 1, it is possible to track the stage 21 and the pressurizing pad 26 used when performing each treatment for each workpiece W. In addition, in the present system 1, by transporting the chamber unit 20 between the execution areas A21 to A25, multiple related treatments can be performed. In addition, it is possible to reduce the risk of contamination of the workpiece W by foreign matter (for example, dust, dirt, etc.) from the outside of the chamber unit 20.

[0240] In addition, according to the above-described embodiment, the chamber unit 20 is transported between the execution areas A21 to A25 by passing through the upper space of the execution areas A21 to A26. In this structure, each process can be easily performed in each execution area A21 to A25 by raising the components required for each process from below.

[0241] Furthermore, according to the above-described embodiment, the pressure pad 26 can be relatively moved in the vertical direction relative to the mounting table 21. That is, the pressure pad 26 that partitions the storage chamber 20R of the chamber unit 20 can be relatively moved relative to the mounting table 21. According to this structure, the workpiece W accommodated in the chamber unit 20 (accommodation chamber 20R) can be reliably pressurized.

[0242] Furthermore, according to the embodiment described above, the pressure pad 26 has a soft layer 26a, and the soft layer 26a deforms following the shape of the surface of the workpiece W during the pressurization process. The chamber unit 20 has an upper mold 24, which is arranged above the pressure pad 26, and functions as an upper pressurization unit 6U by pressing the pressure pad 26 downward during the pressurization process. According to this structure, the pressure pad 26 of each chamber unit 20 does not need to be aligned with the upper mold 24 during the pressurization process. In addition, the upper mold 24 and the pressure pad 26 do not need to be aligned with the workpiece W. Moreover, most of the upper pressurization unit 6U is transported as the chamber unit 20. Therefore, it becomes easy to transport the chamber unit 20 to the execution area A23, and the number of components that function as the upper pressurization unit 6U arranged in the upper space of the execution area A23 is also reduced.

[0243] Furthermore, according to the above-described embodiment, the pressurizing device 6 includes a thermal energy unit 61, which rises from the bottom of the chamber unit 20 and contacts the mounting table 21 during the pressurizing process, thereby functioning as a lower pressurizing unit 6D. In this structure, the upper space of the execution area A23 can be used only for the transportation of the chamber unit 20, and the component structure in the upper space can be simplified. In addition, since most of the mechanism for applying the actual pressurizing force to the workpiece W (especially the lifting device 62) is arranged below the chamber unit 20, the height of the housing 2 can be suppressed.

[0244] Furthermore, according to the above-described embodiment, the atmosphere of the storage chamber 20R is a decompression atmosphere in which the internal pressure of the storage chamber 20R is lower than the external pressure of the external space of the chamber unit 20. The mounting table 21 is arranged below the side member 27 and is mounted on the side member 27 using the pressure difference. According to this structure, a separate component for mounting the mounting table 21 on the side member 27 is no longer required. That is, the number of parts of the chamber unit 20 is reduced. In addition, during each process, the workpiece W is not exposed to the outside air. Therefore, it is possible to prevent the workpiece W from being oxidized due to heat and the outside air.

[0245] According to the above-described embodiment, the stage 21 functions as a transport pallet for carrying the workpiece W into the execution area A21 and carrying the pressurized workpiece W out of the execution area A25. According to this structure, various processes from carrying in to carrying out the workpiece W in the system 1 can be completed on one stage 21.

[0246] Furthermore, according to the above-described embodiment, the system 1 has the execution area A26. According to this configuration, the upper unit 22 can be maintained even during a series of processes such as pressurization and related processes. In addition, the height of the execution area A23 (housing 2) can be lowered.

[0247] In addition, according to the embodiment described above, the system 1 includes a preheating unit 51, a thermal energy unit 61, a primary cooling unit 71, and a secondary cooling unit 81. When the preheating treatment is performed in the execution area A22, the preheating unit 51 rises from the bottom of the chamber unit 20 and abuts against the mounting table 21 to preheat the workpiece W. When the primary cooling treatment is performed in the execution area A24, the primary cooling unit 71 rises from the bottom of the chamber unit 20 and abuts against the mounting table 21 to cool the workpiece W. When the secondary cooling treatment is performed in the execution area A25, the secondary cooling unit 81 rises from the bottom of the chamber unit 20 and abuts against the mounting table 21 to cool the workpiece W. According to this structure, the pressurization treatment can be performed in a short time. Therefore, the time of the pressurization treatment interval can be shortened.

[0248] In addition, according to the embodiment described above, the system 1 has a plurality of chamber units 20. The number of chamber units 20 is less than the number of execution areas A21 to A26. According to this structure, not only the pressurization treatment interval can be shortened, but also the time between related treatments can be shortened. In addition, since it is not necessary to transport all chamber units 20 at the same time, the transportation of chamber units 20 (A to E) can be performed based on the completion of the treatment with the longest processing time.

[0249] In addition, according to the embodiment described above, the execution areas A21 to A26 are arranged in a ring shape according to the order in which each process is performed. The chamber unit 20 and the upper unit 22 are respectively transported between the execution areas A21 to A26. According to this structure, the system 1 can continuously input workpieces W, can continuously perform various processes on each input workpiece W, and can simultaneously perform different processes on different workpieces W. As a result, continuous processing of multiple workpieces W can be performed efficiently.

[0250] Furthermore, according to the above-described embodiment, the system 1 includes the rotation mechanisms 91 to 94 that change the moving direction so that the orientation of the chamber unit 20 in the moving direction of the chamber unit 20 is always the same. The execution areas A21 to A26 include the changeover areas where the rotation mechanisms 91 to 94 are arranged. According to this structure, the orientation of the workpiece W can be adjusted in the pre-processing and post-processing of the system 1. In addition, the floor space of the housing 2 can be reduced.

[0251] In addition, according to the embodiment described above, the system 1 is provided with an atmosphere adjusting device 10. The atmosphere adjusting device 10 includes a vacuum pump P, a decompression line Lp, a gas line Lg, and fixed connectors Cs1 to Cs5. The chamber unit 20 includes a movable connector Cp and a through hole 27c. When the chamber unit 20 is located in an execution area A21 to A25 where fixed connectors Cs1 to Cs5 are arranged, the movable connector Cp is connected to the fixed connectors Cs1 to Cs5, and the receiving chamber 20R can be connected to the decompression line Lp or the gas line Lg. When the chamber unit 20 is transported, the receiving chamber 20R is sealed. According to this structure, during the transportation of the chamber unit 20, even if the vacuum degree of the receiving chamber 20R decreases, the decompression atmosphere of the receiving chamber 20R can be maintained in each execution area A21 to A25.

[0252] Modifications

[0253] Next, a modified example of the present system 1 is described below, focusing on the differences from the previously described embodiment (hereinafter referred to as the "first embodiment"). In the following modified examples, for the sake of convenience, the same reference numerals as those in the first embodiment are given to the same components and components having the same functions as those in the first embodiment. Figure 1 to Figure 5 .

[0254] First Modification

[0255] In the first modification, the structure of the chamber unit and the atmosphere of the storage chamber are different from those of the first embodiment.

[0256] Fig.21 It is a schematic cross-sectional view showing a chamber unit 20A in a first modification.

[0257] The chamber unit 20A includes a mounting table 21, an upper unit 22A, and a storage chamber 20R. The upper unit 22A includes a base member 23, an upper mold 24, a frame member 25, a pressure pad 26, a side member 27, a first spring member 28, a second spring member 29, two sealing members 30 and 31, a plurality of fixing members 32, and a movable connector Cp.

[0258] The fixing member 32 fixes the mounting platform 21 to the side member 27 (upper unit 22A). The fixing member 32 is mounted on the outer peripheral surface 27f of the lower part of the side member 27. The fixing member 32 includes, for example, a support portion 32a, a main body portion 32b, and a known ratchet mechanism (not shown. Same below). The support portion 32a supports the main body portion 32b in such a manner that the main body portion 32b can rotate between a fixed position and a released position. The shape of the main body portion 32b is, for example, an L-shape when viewed from the side. The main body portion 32b can rotate toward the release position side but cannot rotate toward the fixed position side, for example, through a ratchet mechanism, and can rotate toward the fixed position when the ratchet mechanism is released. When the main body portion 32b is located at the fixed position, a portion of the main body portion 32b is located below the mounting platform 21 and the side member 27, and can support the mounting platform 21. When the main body portion 32b is located at the released position, a portion of the main body portion 32b is located to the side of the side member 27, and cannot support the mounting platform 21.

[0259] When the workpiece W is accommodated in the chamber unit 20A, the atmosphere of the accommodation chamber 20R is adjusted to an inert gas atmosphere by the atmosphere adjusting device 10. That is, the accommodation chamber 20R is filled with an inert gas so that the internal pressure of the accommodation chamber 20R is the same as the external pressure (atmospheric pressure). In this case, since no vacuum pressure is generated, the mounting table 21 is fixed to the side part 27 (upper unit 22A) by the fixing part 32 that is rotated to a fixed position. As mentioned above, the movable connector Cp is connected to each of the fixed connectors Cs1 to Cs5, and the atmosphere of the accommodation chamber 20R can be maintained in each execution area A21 to A25. Therefore, even if a small gap is generated between the mounting table 21 and the sealing part 31, there is no problem.

[0260] In this structure, since the atmosphere of the receiving chamber 20R is an inert gas atmosphere, the workpiece W is not exposed to the outside air during the preheating process, the pressurizing process, and the primary cooling process, and is not oxidized. In addition, the amount of inert gas required can be controlled to be the volume of the receiving chamber 20R (when multiple replacements are performed, the amount is obtained by multiplying the volume by the number of replacements).

[0261] It should be noted that, in the first modification, when the workpiece W is made of a non-oxidizable (not easily oxidizable) material, the accommodation chamber 20R may be filled with air.

[0262] In addition, in the first variant, the structure of the fixing member 32 is not limited to the support portion 32a, the main body portion 32b, and the known ratchet mechanism. That is, for example, the fixing member 32 may also be a rectangular "C" shape when viewed from the side. In this case, for example, a concave portion or a convex portion for the fixing member 32 to be embedded is formed on the outer peripheral surface 27f of the lower end portion 27e of the side member 27, and the fixing member 32 clamps the lower end portion 27e of the side member 27 and the outer edge portion of the mounting table 21. In addition, for example, the fixing member 32 may also be a bolt that fastens the outer edge portion of the mounting table 21 and the side member 27. The storage device 4 may also include a mounting mechanism for the fixing member 32, and the removal device 8 may also include a disassembly mechanism for the fixing member 32.

[0263] Second to fourth modifications

[0264] In the second to fourth modified examples, the arrangement of the execution area and the structure of the transport device are different from those in the first embodiment.

[0265] Fig. 22 (a) is a schematic top view showing a pressurizing system 1B according to a second modification (hereinafter referred to as “this system 1B”). Fig. 22 (b) is a schematic top view showing a pressurizing system 1C according to a third modified example (hereinafter referred to as “this system 1C”). Fig. 22 (c) is a schematic plan view showing a pressurizing system 1D according to a fourth modified example (hereinafter referred to as “this system 1D”).

[0266] For the sake of convenience, the figure shows only the execution areas A21 to A25 (A26) with a single-dot chain line. The figure shows the transport path of the chamber unit 20 or the upper unit 22 with arrows. Fig. 22 For components not shown in the figure, refer to Figure 1 to Figure 5 .

[0267] like Fig. 22As shown in (a), in the present system 1B, the execution areas A21 to A25 are arranged in a straight line, and the execution area A26 is arranged on the side of the execution areas A21 to A25. The conveying device 9B has the second rail components R21 to R24, and does not have the rotating mechanisms 91 to 94. The second rail components R21 and R22 are arranged in the execution areas A21 and A26, and the second rail components R23 and R24 are arranged in the execution areas A25 and A26. The base component B1 is supported by the second rail components R21 and R22, and is configured to be able to move in parallel between the execution areas A21 and A26. The base component B4 is supported by the second rail components R23 and R24, and is configured to be able to move in parallel between the execution areas A25 and A26. In this structure, the conveying device 9B may not have the rotating mechanisms 91 to 94, and the orientation of the workpiece W is the same in the pre-processing and post-processing of the present system 1B. In addition, in this configuration, since a plurality of upper units 22 can be stored in the execution area A26, the total number of the chamber units 20 and the upper units 22 can be set to be equal to or greater than the number of the execution areas A21 to A26.

[0268] It should be noted that, in the second modification, the execution area A26 may be arranged above the execution areas A21 to A25. That is, for example, the execution areas A21 to A26 may be arranged in a three-dimensional shape like a crawler.

[0269] like Fig. 22 As shown in (b), in the present system 1C, the execution areas A21 to A26 are arranged in a circular ring shape. The conveying device 9C does not have the rotating mechanisms 91 to 94. When viewed from above, the track components R1 to R16 are arranged in a circular ring shape. In this structure, even if the conveying device 9C does not have the rotating mechanisms 91 to 94, the orientation of the workpiece W will be the same in the pre- and post-processing of the present system 1C. In addition, in this structure, a standby area for the chamber unit 20 can be arranged between the execution areas A21 to A26. Therefore, the total number of chamber units 20 and upper units 22 can be set to be greater than the number of execution areas A21 to A26.

[0270] like Fig. 22 As shown in (c), in the present system 1D, the execution areas A21 to A25 are arranged in a straight line. In the execution area A21, for example, the upper unit 22 is set on the track components R1 and R2 by the user. In addition, in the execution area A25, for example, the upper unit 22 is disassembled from the track components R7 and R8 by the user of the present system 1D. The disassembled upper unit 22 is transported to the vicinity of the execution area A21 by the user or a transport robot. In this structure, the entire surroundings of the execution areas A21 to A25 can function as a maintenance area (execution area A26).

[0271] Other Implementations

[0272] It should be noted that, in the present invention, the number of execution areas A2 can be multiple, and the type of execution area A2 can be set according to the type of related processing, and the number and type of execution area A2 are not limited to the first embodiment. That is, for example, the number of execution areas A2 can be "2" or more. Specifically, for example, when the preheating process is not performed in the present system 1, the present system 1 may not have the execution area A22 and the preheating device 5. In addition, for example, when the cooling process is not divided into two stages in the present system 1, the present system 1 may not have the execution area A24 and the primary cooling device 7. Moreover, for example, multiple processes (for example, storage processing and preheating processing, removal processing and maintenance processing, etc.) can also be performed in the same execution area A2. In addition, for example, the storage process and / or removal process can also be performed outside the present system 1, and the chamber unit 20 can be moved in / out of the present system 1. In addition, the execution area A2 may also include a conveying path (the aforementioned standby area) that can configure one or more chamber units 20 between the execution areas A21 to A26.

[0273] In addition, in the present invention, as exemplified in the second to fourth modified examples, the arrangement of the execution area A2 is not limited to that in the first embodiment.

[0274] Moreover, in the present invention, it is also possible to only move the workpiece W into / out of the system 1. That is, for example, in the execution area A25, it is also possible to only move the workpiece W out, install the stage 21 without the workpiece W on it on the upper unit 22 to assemble the chamber unit 20, and move the chamber unit 20 to the execution area A21. In this case, in the execution area A21, the stage 21 is disassembled from the upper unit 22, and only the workpiece W is moved into the stage. In addition, in this example, it is also possible that the stage 21 of the execution area A25 is moved to the execution area A21 via a path different from the upper unit 22, and the upper unit 22 is moved to the execution area A21 via the execution area A26. Moreover, in this example, the system 1 may not have the moving-in area A1 and the moving-out area A3.

[0275] In addition, in the present invention, as described above, the system 1 may not include the preheating device 5 and / or the primary cooling device 7 (and / or the secondary cooling unit 81). Specifically, for example, the cooling process may be performed during the pressurization process. Even in this case, the receiving process, the taking-out process, and the maintenance process may be performed in parallel with the pressurization process, and the processing time between pressurization processes may be shortened compared to the conventional pressurization device.

[0276] Furthermore, in the present invention, the pressurizing device 6 may not include the thermal energy unit 61 .

[0277] Furthermore, in the present invention, the structure of the transport device 9 is not limited to the first embodiment as long as it is configured to transport the chamber unit 20 and the upper unit 22 in the upper space of each execution area A21 to A26. That is, for example, the chamber unit 20 (upper unit 22) may also include a power source and a driving wheel that can rotate on the track components R1 to R16. In addition, for example, a plurality of rollers that can abut against the lower surface 23a of the base component 23 may also be installed on the track components R1 to R16. Moreover, for example, the transport device 9 may also include a locking component that can be installed on or removed from the base component 23, and a moving mechanism that moves the locking component between adjacent execution areas A21 to A26.

[0278] In addition, in the present invention, the number of chamber units 20 is preferably equal to or less than the number of execution areas A2, and is not limited to "5". That is, for example, in the present invention, the number of chamber units 20 may be "1". In this case, although there is no significant effect as in the first embodiment, the total time from carrying in to carrying out can be shortened compared to the existing pressurizing device that performs from heating to cooling in a single pressurizing process. Therefore, the time between pressurizing processes can be shortened compared to the existing pressurizing device.

[0279] In addition, in the present invention, the number of the rotating mechanisms 91 to 94 and the direction of rotation are not limited to the first embodiment. That is, for example, in the pre-processing and post-processing of the present system 1, when the orientation of the workpiece W may be different, part or all of the rotating mechanisms 91 to 94 may be rotated 90° in the counterclockwise direction when viewed from above.

[0280] Furthermore, in the present invention, in order to reduce the risk of the chamber unit 20 (upper unit 22) falling off during rotation, the rail members R1 to R8 may be arranged to be able to enter and exit only from one side in the longitudinal direction.

[0281] Furthermore, in the present invention, the system 1 may not include a part or all of the fixed connectors Cs2 to Cs5.

[0282] In addition, in the present invention, the system 1 may not include the fixed connectors Cs1 to Cs5 and the movable connector Cp. In this case, the storage chamber 20R is filled with the external air (air) of the chamber unit 20 .

[0283] Furthermore, in the present invention, the workpiece W may not be covered with a release sheet.

[0284] In addition, for the sake of convenience of explanation, the shape of the workpiece W accommodated in the chamber unit 20 is shown as a flat plate in each drawing, but the present invention is not limited thereto. That is, for example, a set of workpieces W consisting of a plurality of pressurized objects may be accommodated in the chamber unit 20. In addition, for example, the shapes of the pressurized objects constituting the set of workpieces W may be the same or different.

[0285] Embodiments of the present invention

[0286] Next, the terms and symbols described in each embodiment are cited, and the embodiments of the present invention understood from the embodiments described above are described as follows.

[0287] The first embodiment of the present invention is a pressurizing system (for example, pressurizing system 1, 1B to 1D), which performs pressurizing treatment of a workpiece (for example, workpiece W) and related treatments related to the pressurizing treatment, wherein the pressurizing system has: a plurality of execution areas (for example, execution areas A21 to A26), in which any one of a plurality of treatments including the pressurizing treatment and the related treatments is performed in the plurality of execution areas; and a chamber unit (for example, chamber unit 20, 20A), which accommodates the workpiece and is transported between the plurality of execution areas, the plurality of execution areas being arranged in the order in which the treatments are performed, and the chamber unit having : a ceiling portion (e.g., a pressure pad 26), which is arranged above the workpiece and functions as an upper pressure unit (e.g., an upper pressure unit 6U) for pressurizing the workpiece from above during the pressurizing process; a floor portion (e.g., a mounting table 21), which is arranged below the workpiece and functions as a lower pressure unit (e.g., a lower pressure unit 6D) for pressurizing the workpiece from below during the pressurizing process; and a peripheral wall portion (e.g., a side member 27), which is arranged to surround the entire circumference of the workpiece in the horizontal direction and, together with the ceiling portion and the floor portion, divide a receiving chamber (e.g., a receiving chamber 20R) for receiving the workpiece.

[0288] According to this configuration, the time interval between pressurization treatments can be shortened, and the processes related to the pressurization treatments can be performed.

[0289] A second aspect of the present invention is the pressurizing system according to the first aspect, wherein the chamber unit is transported between the execution areas so as to pass through an upper space in the execution area.

[0290] According to this structure, each process can be easily executed.

[0291] A third aspect of the present invention is the pressurizing system according to the first aspect, wherein the ceiling portion is relatively movable in a vertical direction with respect to the floor portion.

[0292] According to this configuration, the workpiece accommodated in the chamber unit (accommodation chamber) can be reliably pressurized.

[0293] The fourth embodiment of the present invention is a pressurizing system according to the third embodiment, wherein the ceiling portion includes a pressurizing pad (for example, the pressurizing pad 26), the pressurizing pad includes a soft layer (for example, the soft layer 26a) that deforms to follow the shape of the surface of the workpiece during the pressurizing process, and the chamber unit includes an upper mold (for example, the upper mold 24), the upper mold is arranged above the pressurizing pad, and during the pressurizing process, the pressurizing pad is pressed downward to act as the upper pressurizing unit.

[0294] According to this structure, it becomes easy to carry the chamber unit to the execution area (pressurizing area), and the number of components functioning as the upper pressurizing unit arranged in the upper space of the execution area can also be reduced.

[0295] The fifth embodiment of the present invention is a pressurizing system according to the first embodiment, wherein the pressurizing system has a pressurizing device (for example, the pressurizing device 6), the pressurizing device is arranged in a pressurizing area (for example, the execution area A23) where the pressurizing treatment is performed, the pressurizing treatment is performed, the execution area includes the pressurizing area, the pressurizing device has a pressing unit (for example, the thermal energy unit 61), and during the pressurizing treatment, the pressing unit rises from the bottom of the chamber unit and abuts against the floor portion, thereby acting as the lower pressurizing unit.

[0296] According to this structure, the component structure in the upper space of the execution area (pressurization area) can be simplified. In addition, the height of the housing can be suppressed.

[0297] The sixth embodiment of the present invention is a pressurization system according to the first embodiment, wherein the atmosphere of the containment chamber is a reduced-pressure atmosphere in which the internal pressure of the containment chamber is lower than the external pressure of the external space of the chamber unit, and the floor portion is arranged below the surrounding wall portion and is installed on the surrounding wall portion by utilizing the pressure difference between the internal pressure and the external pressure.

[0298] According to this structure, the workpiece is not exposed to the outside air during each process.

[0299] The seventh embodiment of the present invention is a pressurization system according to the first embodiment, wherein the atmosphere of the containment chamber is a gas atmosphere filled with gas so that the internal pressure of the containment chamber is the same as the external pressure of the external space of the chamber unit, and the chamber unit (for example, chamber unit 20A) has a fixing component (for example, fixing component 32), which fixes the floor portion to the surrounding wall portion.

[0300] According to this configuration, by using an inert gas as the gas, the workpiece is not exposed to the outside air during each process.

[0301] The eighth embodiment of the present invention is a pressurization system according to the first embodiment, wherein the floor portion can be installed on or removed from the surrounding wall portion, and the plurality of execution areas include: a receiving area (for example, an execution area A21), in which the floor portion carrying the workpiece is installed on the surrounding wall portion, thereby performing a receiving process of storing the workpiece in the chamber unit as the related process; and a taking-out area (for example, an execution area A25), in which the floor portion carrying the pressurized workpiece is removed from the surrounding wall portion, thereby performing a taking-out process of taking the workpiece out of the chamber unit as the related process, and the floor portion acts as a conveying pallet for moving the workpiece into the receiving area and moving the pressurized workpiece out of the taking-out area.

[0302] According to this configuration, various processes from loading to unloading of workpieces in this system can be completed on one mounting table.

[0303] The 9th embodiment of the present invention is a pressurization system according to the 8th embodiment, wherein the pressurization system has a maintenance area (for example, execution area A26), which is arranged between the receiving area and the taking-out area, and maintenance processing of the chamber unit (for example, the upper unit 22) with the floor portion removed is performed in the maintenance area.

[0304] According to this structure, maintenance of the upper unit can be performed, and the height of the maintenance area (pressurization area) can be lowered.

[0305] The tenth embodiment of the present invention is a pressurizing system according to the first embodiment, wherein the pressurizing system comprises: a heating unit (e.g., a thermal energy unit 61), which is arranged in a pressurizing area where the pressurizing treatment is performed to heat the workpiece; and a preheating unit (e.g., a preheating unit 51) and / or a cooling unit (e.g., a primary cooling unit 71, a secondary cooling unit 81), wherein the preheating unit preheats the workpiece, and the cooling unit cools the workpiece after pressurization, wherein the plurality of execution areas include a preheating area (e.g., an execution area A22), and / or a cooling unit. The preheating area (for example, execution area A24, A25) is provided with the preheating unit, and preheating treatment of the workpiece is performed as the related treatment; the cooling unit is provided with the cooling area, and cooling treatment of the workpiece after pressurization is performed as the related treatment; when the preheating treatment is performed in the preheating area, the preheating unit abuts against the floor portion by rising from the bottom of the chamber unit, and / or when the cooling treatment is performed in the cooling area, the cooling unit abuts against the floor portion by rising from the bottom of the chamber unit.

[0306] According to this configuration, the time interval between pressurization treatments can be shortened.

[0307] The eleventh embodiment of the present invention is a pressurizing system according to any one of the first to tenth embodiments, wherein the pressurizing system has a plurality of the chamber units, and the number of the plurality of chamber units is less than or equal to the number of the plurality of execution areas.

[0308] According to this structure, in addition to the pressurization treatment interval, the time between the related treatments can be shortened.

[0309] The twelfth embodiment of the present invention is the pressurizing system according to the eleventh embodiment, wherein the plurality of execution areas are arranged in a ring shape in the order in which the processes are executed, and the plurality of chamber units are respectively transported cyclically between the plurality of execution areas.

[0310] According to this configuration, it is possible to efficiently execute continuous processing on a plurality of workpieces.

[0311] The 13th embodiment of the present invention is a pressurizing system (for example, pressurizing system 1) according to the 12th embodiment, wherein the pressurizing system has a conversion mechanism (for example, rotating mechanisms 91 to 94), which converts the moving direction of the chamber unit in such a manner that the orientation of the chamber unit in the moving direction of the chamber unit remains the same, and the plurality of execution areas include a conversion area (for example, execution areas A21, A22, A24, A25) in which the conversion mechanism is configured.

[0312] According to this structure, the orientation of the workpiece can be adjusted in the pre-processing and post-processing of the system. In addition, the floor space of the housing can be reduced.

[0313] The 14th embodiment of the present invention is a pressurizing system according to any one of the 6th embodiment or the 7th embodiment, wherein the pressurizing system has: a vacuum pump (for example, a vacuum pump P); a decompression line (for example, a decompression line Lp) connected to the vacuum pump; a gas line (for example, a gas line Lg) connected to the line of the inert gas supply system; and a plurality of fixed connectors (for example, fixed connectors Cs1 to Cs5) respectively arranged in two or more of the plurality of execution areas, connected to the decompression line and the gas line, and the chamber unit has: a mobile connector (for example, a mobile connector Cp) that can be installed on or removed from the fixed connector; and a communication path (for example, a through hole 27c) that connects the accommodation chamber and the mobile connector, and when the chamber unit is located in the execution area where the fixed connector is arranged, the mobile connector is connected to the fixed connector, the accommodation chamber can be connected to the decompression line or the gas line, and when the chamber unit is transported, the accommodation chamber is sealed.

[0314] According to this configuration, the reduced pressure atmosphere of the storage room can be maintained in each execution area.

Claims

1. A pressurizing system for performing a pressurizing treatment of a workpiece and related treatments related to the pressurizing treatment, wherein: The pressurizing system has: a plurality of execution areas, in which any one of a plurality of processes including the pressurization process and the correlation process is executed; as well as a chamber unit that receives the workpiece and is transported between the plurality of execution areas; The plurality of execution areas are arranged in the order of executing the processing, The chamber unit comprises: a ceiling portion disposed above the workpiece and functioning as an upper pressurizing unit for pressurizing the workpiece from above during the pressurizing process; a floor portion disposed below the workpiece and functioning as a lower pressurizing unit for pressurizing the workpiece from below during the pressurizing process; as well as The peripheral wall portion is arranged to surround the entire circumference of the workpiece in the horizontal direction, and defines a storage chamber for storing the workpiece together with the ceiling portion and the floor portion.

2. The pressurized system according to claim 1, wherein: The chamber unit is transported between the execution areas in a manner that passes through an upper space in the execution area.

3. The pressurized system according to claim 1, wherein: The ceiling portion is movable relative to the floor portion in a vertical direction.

4. The pressurized system according to claim 3, wherein: The ceiling portion includes a pressure pad, and the pressure pad includes a soft layer that deforms to follow the shape of the surface of the workpiece during the pressurization process. The chamber unit includes an upper mold disposed above the pressure pad, and the upper mold presses the pressure pad downward during the pressurization process, thereby functioning as the upper pressurization unit.

5. The pressurized system according to claim 1, wherein: The pressurizing system includes a pressurizing device, which is disposed in a pressurizing area where the pressurizing treatment is performed, and performs the pressurizing treatment. The execution area includes the pressurized area, The pressurizing device includes a pressing unit that functions as the lower pressurizing unit by rising from below the chamber unit and coming into contact with the floor portion during the pressurizing process.

6. The pressurized system according to claim 1, wherein: The atmosphere of the storage chamber is a reduced pressure atmosphere in which the internal pressure of the storage chamber is lower than the external pressure of the external space of the chamber unit. The floor portion is disposed below the peripheral wall portion and is attached to the peripheral wall portion using a pressure difference between the internal pressure and the external pressure.

7. The pressurized system according to claim 1, wherein: The atmosphere of the storage chamber is a gas atmosphere filled with gas so that the internal pressure of the storage chamber is equal to the external pressure of the external space of the chamber unit. The chamber unit includes a fixing member that fixes the floor portion to the peripheral wall portion.

8. The pressurized system according to claim 1, wherein: The floor portion can be mounted on or removed from the peripheral wall portion. The plurality of execution areas include: a storage area in which a storage process of storing the workpiece in the chamber unit is performed as the related process by attaching the floor portion on which the workpiece is placed to the peripheral wall portion; and a take-out area in which a take-out process of taking the work-piece out of the chamber unit is performed as the related process by removing the floor portion on which the pressurized work-piece is placed from the peripheral wall portion, The floor portion functions as a transport tray for carrying the workpiece into the storage area and carrying the pressurized workpiece out of the take-out area.

9. The pressurized system according to claim 8, wherein: The pressurizing system includes a maintenance area disposed between the storage area and the extraction area, and a maintenance process is performed on the chamber unit after the floor portion is removed in the maintenance area.

10. The pressurized system of claim 1, wherein: The pressurizing system has: a heating unit, which is disposed in a pressurizing area where the pressurizing treatment is performed, and heats the workpiece; and a preheating unit and / or a cooling unit, wherein the preheating unit preheats the workpiece, and the cooling unit cools the pressurized workpiece, The plurality of execution areas include a preheating area and / or a cooling area, wherein the preheating unit is disposed in the preheating area to perform a preheating process on the workpiece as the related process, and the cooling unit is disposed in the cooling area to perform a cooling process on the pressurized workpiece as the related process. In the preheating area, when the preheating process is performed, the preheating unit rises from below the chamber unit to abut against the floor portion, and / or When the cooling process is performed in the cooling area, the cooling unit rises from below the chamber unit to come into contact with the floor portion.

11. A pressurized system according to any one of claims 1 to 10, wherein: The pressurizing system has a plurality of chamber units. The number of the plurality of chamber units is less than the number of the plurality of execution areas.

12. The pressurized system according to claim 11, wherein: The plurality of execution areas are arranged in a ring shape in the order of executing the processing. The plurality of chamber units are respectively transported and circulated among the plurality of execution areas.

13. The pressurized system of claim 12, wherein: The pressurizing system includes a conversion mechanism that converts the movement direction of the chamber unit so that the orientation of the chamber unit in the movement direction of the chamber unit is always the same. The plurality of execution areas include a conversion area in which the conversion mechanism is configured.

14. A pressurized system according to any one of claims 6 or 7, wherein: The pressurizing system has: Vacuum pump; a pressure reducing pipeline connected to the vacuum pump; a gas pipeline connected to a pipeline of an inert gas supply system; and A plurality of fixed connectors, which are respectively arranged in two or more of the plurality of execution areas, and connected to the pressure reducing pipeline and the gas pipeline, The chamber unit comprises: a mobile connector that can be mounted on or removed from the fixed connector; and a communication path connecting the receiving chamber and the movable connector, When the chamber unit is located in the execution area where the fixed connector is arranged, the movable connector is connected to the fixed connector, and the receiving chamber can be communicated with the decompression pipeline or the gas pipeline. When the chamber unit is transported, the storage chamber is sealed.

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