Cleaning device

Abstract

The invention relates to the field of cleaning, in particular to a cleaning device which comprises a container, an atomic hydrogen generator and a conveying pipeline. The container comprises a containing cavity in a vacuum environment, and the containing cavity is used for containing a to-be-cleaned piece. The atomic hydrogen generator is used for generating atomic hydrogen. The conveying pipeline is made of quartz, a first protective layer is arranged on the inner wall of the conveying pipeline, and the first protective layer is made of Teflon; the first end of the conveying pipeline is connected to the atomic hydrogen generator, and the second end of the conveying pipeline extends into the containing cavity and is used for conveying atomic hydrogen to the to-be-cleaned part. The composite rate of the atomic hydrogen in the conveying process of the conveying pipeline can be reduced, and therefore the conveying efficiency of the atomic hydrogen is improved.

Description

Technical Field

[0001] The invention belongs to the field of cleaning, and in particular relates to a cleaning device. Background Art

[0002] In the semiconductor industry, extreme ultraviolet lithography is the mainstream lithography technology below the 7nm node, and EUV light source is one of its important components. Among them, the LPP-EUV light source can use a high-power carbon dioxide laser to bombard tin droplets to form a high-temperature plasma to radiate ultraviolet rays. The Mo / Si multilayer film collector can collect the radiated ultraviolet rays and obtain EUV light in the required band. However, in the process of bombarding the tin droplets, tin plasma, atoms and neutral fragment clusters will be generated, which will diffuse to the surface of the collector mirror, causing contamination on the surface of the collector mirror, reducing the service life of the collector mirror, and causing the lithography machine to fail to work properly. Therefore, studying methods to inhibit and alleviate tin contamination is crucial to extending the service life of the collector mirror.

[0003] At present, the tin contamination problem on the surface of the collector mirror can be mainly prevented and controlled through two aspects: tin debris suppression and tin pollution online cleaning. Studies have shown that even with the use of tin debris suppression technology, the prevention and control effect of tin pollution is poor. Therefore, online cleaning has become a key means to extend the service life of the collector mirror. Among them, atomic hydrogen can effectively remove tin contamination on the surface of the collector mirror, and it has reducing properties, avoiding the risk of secondary damage such as oxidation of the collector mirror during the cleaning process. However, atomic hydrogen is very easy to recombine to form hydrogen during transmission, resulting in a significant reduction in concentration when it reaches the surface of the collector mirror, resulting in low cleaning efficiency. Summary of the invention

[0004] In view of this, the present invention aims to provide a cleaning device that can improve the transport efficiency of atomic hydrogen.

[0005] To achieve the above object, the technical solution created by the present invention is implemented as follows:

[0006] A cleaning device, comprising:

[0007] The container comprises a containing cavity in a vacuum environment, wherein the containing cavity is used to contain the object to be cleaned;

[0008] Atomic hydrogen generator for generating atomic hydrogen; and

[0009] The delivery pipeline is made of quartz, and the inner wall of the delivery pipeline is provided with a first protective layer, and the material of the first protective layer is Teflon; the first end of the delivery pipeline is connected to the atomic hydrogen generator, and the second end extends into the accommodating cavity, for delivering atomic hydrogen to the part to be cleaned.

[0010] Furthermore, the thickness of the first protective layer is 2 nm; and / or

[0011] The delivery pipeline comprises a first pipe wall and a second pipe wall, and the first pipe wall and the second pipe wall are detachably connected along the axial direction of the delivery pipeline to be assembled to form the delivery pipeline.

[0012] Furthermore, the cleaning device also includes a reflective structure, which includes an arc-shaped reflective surface; the delivery pipeline is located between the reflective structure and the workpiece to be cleaned, and the second end of the delivery pipeline has an output port for outputting atomic hydrogen, and the output port is arranged toward the reflective surface; the reflective structure is used to reflect the atomic hydrogen output from the output port so as to transport the atomic hydrogen vertically to the surface of the workpiece to be cleaned.

[0013] Furthermore, the distance between the two ends of the arc-shaped reflecting surface and the output port along the vertical direction is smaller than the distance between the arc-shaped top end of the reflecting surface and the output port along the vertical direction.

[0014] Furthermore, the distance between the output port and the arc-shaped top end of the reflecting surface is half of the curvature radius of the reflecting surface.

[0015] Furthermore, the range of the curvature radius is between 50 mm and 300 mm.

[0016] Furthermore, the output port is arranged opposite to the center of the reflection surface; and / or

[0017] The reflective surface is made of quartz; and / or

[0018] A second protective layer is provided on the surface of the reflective surface, and the material of the second protective layer is Teflon.

[0019] Furthermore, the cleaning device also includes a telescopic component, which is telescopically arranged outside the container, the first end of the telescopic component is connected to the first end of the delivery pipe, and the second end of the telescopic component is connected to the container, so that the second end of the delivery pipe can be movably located in the accommodating cavity.

[0020] Furthermore, the telescopic assembly includes a first flange group, a second flange group and a telescopic bellows, the first end of the delivery pipe is connected to the first end of the bellows through the first flange group, and extends in the bellows until the second end of the delivery pipe extends into the accommodating cavity; the second end of the bellows is connected to the container through the second flange group.

[0021] Furthermore, the cleaning device also includes a vacuum pump group and a sensor. The vacuum pump group is connected to the container and is used to evacuate the containing chamber; the sensor is located in the containing chamber and is used to detect the vacuum degree of the containing chamber.

[0022] Compared with the prior art, the invention can achieve the following beneficial effects: the cleaning device of the invention comprises a conveying pipe, the material of the conveying pipe is quartz, and the inner wall is provided with a first protective layer, the material of the first protective layer is Teflon, so that the characteristic of the low atomic hydrogen recombination rate of Teflon material can be utilized to reduce the recombination rate of atomic hydrogen during the conveying process, thereby improving the conveying efficiency of atomic hydrogen. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The drawings constituting part of the present invention are used to provide a further understanding of the present invention. The exemplary embodiments and descriptions of the present invention are used to explain the present invention and do not constitute an improper limitation on the present invention. In the drawings:

[0024] Figure 1 A plan view of a cleaning device according to an embodiment of the present invention.

[0025] Description of reference numerals:

[0026] Cleaning device 10; container 11; atomic hydrogen generator 12; delivery pipeline 13; accommodating chamber 14; sample stage 15; part to be cleaned 16; reflection structure 17; reflection surface 18; output port 19; telescopic component 20; first flange group 21; second flange group 22; bellows 23; vacuum pump group 24. DETAILED DESCRIPTION

[0027] In order to make the purpose, technical scheme and advantages of the invention clearer, the invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only used to explain the invention and do not constitute a limitation to the invention. Similar components in different embodiments use associated similar component numbers. In the following embodiments, many detailed descriptions are to enable the invention to be better understood. However, those skilled in the art can easily recognize that some of the features can be omitted in different situations, or can be replaced by other components, materials, and methods. In some cases, some operations related to the invention are not shown or described in the specification, in order to avoid the core part of the invention being overwhelmed by too much description, and for those skilled in the art, it is not necessary to describe these related operations in detail, and they can fully understand the related operations according to the description in the specification and the general technical knowledge in the art.

[0028] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other to form various implementation methods. At the same time, the steps or actions in the method description can also be interchanged or adjusted in a manner that is obvious to those skilled in the art. Therefore, the various sequences in the specification and the drawings are only for the purpose of clearly describing a certain embodiment and are not meant to be a necessary sequence, unless otherwise specified that a certain sequence must be followed.

[0029] In the description of the invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the invention, unless otherwise specified, the meaning of "multiple" is two or more.

[0030] In the description of the invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the invention can be understood according to specific circumstances.

[0031] The present invention will be described in detail below with reference to the accompanying drawings and in combination with embodiments.

[0032] See also Figure 1 As shown, the present invention provides a cleaning device 10 , which includes a container 11 , an atomic hydrogen generator 12 and a delivery pipeline 13 .

[0033] The container 11 includes a receiving chamber 14 in a vacuum environment, and the receiving chamber 14 is used to receive a piece to be cleaned 16. In one embodiment, the cleaning device 10 further includes a liftable sample stage 15, and the piece to be cleaned 16 is placed on the sample stage 15. The piece to be cleaned 16 can be clamped on the sample stage 15, which is more stable. When the cleaning device 10 is applied to the semiconductor industry, the piece to be cleaned 16 can refer to a collecting mirror used to collect ultraviolet rays in extreme ultraviolet lithography technology.

[0034] The atomic hydrogen generator 12 is used to generate atomic hydrogen, which can clean the contamination on the surface of the cleaning object 16 through physical and chemical effects. Atomic hydrogen has reducing properties, which can avoid the risk of secondary damage such as oxidation of the cleaning object 16 during the cleaning process.

[0035] The material of the delivery pipe 13 is quartz, and the inner wall of the delivery pipe 13 is provided with a first protective layer, and the material of the first protective layer is Teflon. The inner wall of the delivery pipe 13 can be plated with the first protective layer. In one embodiment, the thickness of the first protective layer is 2nm. The first end of the delivery pipe 13 is connected to the atomic hydrogen generator 12, and the second end extends into the accommodating chamber 14, which is used to transport atomic hydrogen to the part to be cleaned 16. Among them, the delivery pipe 13 and the atomic hydrogen generator 12 are docked in a vacuum environment, so that the generated atomic hydrogen is transported through the delivery pipe 13. The atomic hydrogen generated by the atomic hydrogen generator 12 can be transported to the accommodating chamber 14 through the delivery pipe 13 provided with the first protective layer to clean the part to be cleaned 16, wherein the material of the first protective layer is Teflon, and the characteristic of the low atomic hydrogen recombination rate of Teflon material can be used to reduce the recombination rate of atomic hydrogen during the transportation process, thereby improving the atomic hydrogen transportation efficiency, which is conducive to the efficient cleaning of the part to be cleaned 16.

[0036] In one embodiment, the delivery pipe 13 includes a first pipe wall and a second pipe wall, and the first pipe wall and the second pipe wall are detachably connected along the axial direction of the delivery pipe 13 to be assembled to form the delivery pipe 13. The first pipe wall and the second pipe wall can be detachably connected by bolts, which facilitates the plating of the first protective layer.

[0037] In one embodiment, the cleaning device 10 further includes a reflective structure 17, and the reflective structure 17 includes an arc-shaped reflective surface 18. In one embodiment, the reflective surface 18 is made of quartz, thereby reducing the loss of atomic hydrogen due to recombination during the reflection process and improving the transportation efficiency of atomic hydrogen. In one embodiment, the surface of the reflective surface 18 is provided with a second protective layer, and the material of the second protective layer is Teflon, wherein the second protective layer can be plated on the surface of the reflective surface 18, thereby further reducing the loss of atomic hydrogen during the reflection process. The delivery pipeline 13 is located between the reflective structure 17 and the part to be cleaned 16. Figure 1In the embodiment shown in , the delivery pipe 13 is located below the reflective structure 17, and the part to be cleaned 16 is located below the delivery pipe 13. The second end of the delivery pipe 13 has an output port 19 for outputting atomic hydrogen, and the output port 19 is arranged toward the reflective surface 18. The reflective structure 17 is used to reflect the atomic hydrogen outputted from the output port 19, so as to vertically transport the atomic hydrogen to the surface of the part to be cleaned 16. In one embodiment, the output port 19 is arranged exactly opposite to the center of the reflective surface 18, so as to ensure that the atomic hydrogen outputted from the output port 19 can be vertically transported to the surface of the part to be cleaned 16 through the reflective surface 18. Among them, the output port 19 of the delivery pipe 13 outputs atomic hydrogen to the arc-shaped reflective surface 18 of the reflective structure 17, and the arc-shaped reflective surface 18 can reflect the atomic hydrogen and make it vertically transported to the surface of the part to be cleaned 16. While improving the delivery efficiency of atomic hydrogen, the surface of the part to be cleaned 16 can be cleaned more evenly and with strong operability by setting the reflective structure 17.

[0038] In one embodiment, the distance between the two ends of the arc-shaped reflecting surface 18 and the output port 19 along the vertical direction is smaller than the distance between the arc-shaped top of the reflecting surface 18 and the output port 19 along the vertical direction. In this way, the atomic hydrogen reflected by the arc-shaped reflecting surface 18 can be vertically transported to the surface of the workpiece 16 to be cleaned, and the arrangement is simple.

[0039] In one embodiment, the distance between the output port 19 and the arc-shaped top of the reflective surface 18 is half of the curvature radius of the reflective surface 18, so that the atomic hydrogen output from the output port 19 can be transported to various places on the surface of the to-be-cleaned part 16 after being reflected by the reflective surface 18, and the transportation efficiency is high. In this embodiment, the distance between the output port 19 and the arc-shaped top of the reflective surface 18 is 50 mm.

[0040] In one embodiment, the curvature radius ranges from 50 mm to 300 mm, so that the curvature of the arc-shaped reflection surface 18 is appropriate, which is conducive to the full reflection of atomic hydrogen. In this embodiment, the curvature radius is 100 mm.

[0041] In one embodiment, the arc length of the arc-shaped reflecting surface 18 ranges from 100 mm to 300 mm. In this embodiment, the arc length is 157 mm.

[0042] In one embodiment, the cleaning device 10 further includes a telescopic assembly 20, which is telescopically arranged outside the container 11, and the first end of the telescopic assembly 20 is connected to the first end of the delivery pipe 13, and the second end of the telescopic assembly 20 is connected to the container 11, so that the second end of the delivery pipe 13 can be movably located in the accommodating chamber 14. The first end of the telescopic assembly 20 can also be connected to the atomic hydrogen generator 12. Under the action of external force, the telescopic assembly 20 can drive the first end of the delivery pipe 13 to move in the horizontal direction by telescoping, so that the second end of the delivery pipe 13 can be movably located in the accommodating chamber 14 in the horizontal direction, thereby realizing the position adjustment of the delivery pipe 13.

[0043] In one embodiment, the telescopic assembly 20 includes a first flange group 21, a second flange group 22 and a telescopic bellows 23. The first flange group 21 and the second flange group 22 can use CF35 type sealing flanges, which can be sealed with copper rings, so that the vacuum degree of the accommodating chamber 14 can be ensured. The first end of the delivery pipe 13 is connected to the first end of the bellows 23 through the first flange group 21, and extends in the bellows 23 until the second end of the delivery pipe 13 extends into the accommodating chamber 14. The second end of the bellows 23 is connected to the container 11 through the second flange group 22, and the bellows 23 can be fixed to the container 11 through the second flange group 22. The bellows 23 is telescopic, so that the delivery pipe 13 can be driven to move in the horizontal direction, with a simple structure and strong operability.

[0044] In one embodiment, the cleaning device 10 further includes a vacuum pump group 24 and a sensor (not shown in the drawings). The vacuum pump group 24 is connected to the container 11 and is used to evacuate the receiving chamber 14. The sensor is located in the receiving chamber 14 and is used to detect the vacuum degree of the receiving chamber 14. The sensor can be a vacuum gauge. In this way, the receiving chamber 14 can be ensured to be in a vacuum environment, so as to ensure that the vacuum degree of the cleaning device 10 in the initial state of use is less than 1×10 -6 Pa. Ensure that the vacuum degree of the cleaning device 10 is less than 1×10 -4 Pa.

[0045] It should be understood that the various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps described in the disclosure of the present invention can be performed in parallel, sequentially or in different orders, as long as the desired results of the technical solution disclosed in the present invention can be achieved, and this document does not limit this.

[0046] The above specific implementations do not constitute a limitation on the protection scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A cleaning device, characterized in that: include: The container comprises a containing cavity in a vacuum environment, wherein the containing cavity is used to contain the object to be cleaned; Atomic hydrogen generator for generating atomic hydrogen; and The delivery pipeline is made of quartz, and the inner wall of the delivery pipeline is provided with a first protective layer, and the material of the first protective layer is Teflon; the first end of the delivery pipeline is connected to the atomic hydrogen generator, and the second end extends into the accommodating cavity, for delivering atomic hydrogen to the part to be cleaned.

2. The cleaning device according to claim 1, characterized in that: The thickness of the first protective layer is 2 nm; and / or The delivery pipeline comprises a first pipe wall and a second pipe wall, and the first pipe wall and the second pipe wall are detachably connected along the axial direction of the delivery pipeline to be assembled to form the delivery pipeline.

3. The cleaning device according to claim 1, characterized in that: The cleaning device further comprises a reflection structure, wherein the reflection structure comprises an arc-shaped reflection surface; The delivery pipeline is located between the reflective structure and the workpiece to be cleaned, and the second end of the delivery pipeline has an output port for outputting atomic hydrogen, and the output port is arranged toward the reflective surface; the reflective structure is used to reflect the atomic hydrogen output from the output port to vertically transport the atomic hydrogen to the surface of the workpiece to be cleaned.

4. The cleaning device according to claim 3, characterized in that: The distance between the two ends of the arc-shaped reflecting surface and the output port along the vertical direction is smaller than the distance between the arc-shaped top end of the reflecting surface and the output port along the vertical direction.

5. The cleaning device according to claim 3, characterized in that: The distance between the output port and the arc-shaped top end of the reflecting surface is half of the curvature radius of the reflecting surface.

6. The cleaning device according to claim 5, characterized in that: The range of the curvature radius is between 50 mm and 300 mm.

7. The cleaning device according to claim 3, characterized in that: The output port is arranged opposite to the center of the reflecting surface; and / or The reflective surface is made of quartz; and / or A second protective layer is provided on the surface of the reflective surface, and the material of the second protective layer is Teflon.

8. The cleaning device according to claim 1, characterized in that: The cleaning device also includes a telescopic component, which is telescopically arranged outside the container, a first end of the telescopic component is connected to the first end of the delivery pipe, and a second end of the telescopic component is connected to the container, so that the second end of the delivery pipe can be movably located in the accommodating cavity.

9. The cleaning device according to claim 8, characterized in that: The telescopic assembly includes a first flange group, a second flange group and a telescopic bellows. The first end of the delivery pipe is connected to the first end of the bellows through the first flange group and extends in the bellows until the second end of the delivery pipe extends into the accommodating cavity; the second end of the bellows is connected to the container through the second flange group.

10. The cleaning device according to claim 1, characterized in that: The cleaning device also includes a vacuum pump group and a sensor. The vacuum pump group is connected to the container and is used to evacuate the accommodating chamber. The sensor is located in the accommodating chamber and is used to detect the vacuum degree of the accommodating chamber.

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