Mask structure and manufacturing method thereof

Abstract

The invention relates to a mask structure and a manufacturing method thereof. The mask structure comprises a frame; the two ends of each supporting piece are fixedly connected to the frame, the multiple supporting pieces comprise the multiple first supporting pieces arranged at intervals in the first direction and the multiple second supporting pieces arranged at intervals in the second direction, the first direction intersects with the second direction, and at least two evaporation areas are defined by the multiple first supporting pieces and the multiple second supporting pieces; the at least one mask unit extends in the second direction, the two ends, in the second direction, of the mask unit are fixed to the frame, the mask unit comprises at least one grid area, and the grid area corresponds to the at least one evaporation area; wherein the mask structure comprises at least one first part located at the overlapping position of the supporting piece and the mask unit, and the mask unit is fixedly connected with the second supporting piece at the first part. The performance of the mask structure can be improved, and the display quality of the display panel can be improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a mask structure and a manufacturing method thereof. Background Art

[0002] OLED (Organic Light Emitting Diode) display panel is one of the hot spots in the current display panel research field. OLED display panel has the advantages of low energy consumption, low cost, self-luminescence, wide viewing angle and fast response speed. In OLED manufacturing technology, the mask structure used for vacuum evaporation is one of the most important components. The general mask structure includes a frame, a support and a mask unit. The combination of these three determines the display effect of the display panel after vacuum evaporation.

[0003] However, the performance of the current mask structure needs to be improved to enhance the display effect of the display panel. Summary of the invention

[0004] Based on this, it is necessary to provide a mask structure and a manufacturing method thereof in order to improve the performance of the mask structure.

[0005] According to a first aspect of the present application, a mask structure is provided, comprising:

[0006] frame;

[0007] A plurality of support members, both ends of each of the support members are fixedly connected to the frame, the plurality of support members include a plurality of first support members arranged at intervals along a first direction and a plurality of second support members arranged at intervals along a second direction, the first direction intersects with the second direction, and the plurality of first support members and the plurality of second support members define at least two vapor deposition areas;

[0008] at least one mask unit, extending along the second direction, and two ends of the mask unit along the second direction are fixed on the frame, the mask unit includes at least one grid area, and the grid area corresponds to at least one of the evaporation areas;

[0009] Wherein, the mask structure comprises at least one first portion located at the overlapped position of the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

[0010] In some embodiments, the mask unit is rigidly fixedly connected to the second support member at the first portion;

[0011] Optionally, the mask unit is connected to the second support member by welding.

[0012] In some embodiments, the mask unit is elastically fixedly connected to the second support member at the first portion;

[0013] Optionally, the mask structure further includes an elastic connector, and the mask unit and the second support member are connected via the elastic connector;

[0014] Optionally, the material of the elastic connecting piece includes heat-sensitive adhesive.

[0015] In some embodiments, the mask structure includes at least three first portions, and the at least three first portions include a first sub-portion and two second sub-portions located at ends of the first sub-portion close to the mask unit along the second direction;

[0016] The mask unit is elastically and fixedly connected to the second support member at the second sub-position;

[0017] The mask unit is rigidly fixedly connected to the second support member at the first sub-position.

[0018] In some embodiments, the grid area includes a plurality of evaporation openings;

[0019] The first portion is located between at least two adjacent evaporation openings, and in a direction perpendicular to the plane where the evaporation region is located, the thickness of the mask unit at the first portion is greater than 0 and less than the maximum thickness of the mask unit;

[0020] Optionally, the mask unit includes a plurality of grid areas, and the grid areas correspond to the evaporation areas one by one.

[0021] In some embodiments, in a direction perpendicular to the plane where the evaporation region is located, a thickness of the mask unit at the first portion is equal to a maximum thickness of the mask unit.

[0022] In some embodiments, the mask structure includes a plurality of first portions;

[0023] The plurality of first portions are symmetrically arranged relative to a first center line of the mask unit extending along the first direction.

[0024] In some embodiments, the mask structure includes a plurality of first portions;

[0025] The density of the first parts per unit length gradually increases from the end of the mask unit to the first center line of the mask unit extending along the first direction.

[0026] In some embodiments, the frame includes a second center line extending along the second direction, and a third center line extending along the first direction, the mask unit includes a first end and a second end in the second direction, and the at least one grid area includes a plurality of evaporation openings;

[0027] In at least one of the mask units located on one side of the second center line, the plurality of evaporation openings include a first edge opening close to the first end and close to the second center line, and the plurality of evaporation openings also include a second edge opening close to the first end and away from the second center line;

[0028] In at least one of the mask units located on one side of the second center line, the plurality of evaporation openings further include a third edge opening close to the second end and close to the second center line, and the plurality of evaporation openings further include a fourth edge opening close to the second end and away from the second center line;

[0029] The distance from the first edge opening to the third center line is greater than the distance from the second edge opening to the third center line, and the distance from the third edge opening to the third center line is greater than the distance from the fourth edge opening to the third center line;

[0030] Optionally, the first edge opening and the third edge opening are symmetrically arranged with respect to the third center line, and the second edge opening and the fourth edge opening are symmetrically arranged with respect to the third center line.

[0031] According to a second aspect of the present application, a method for manufacturing a mask structure is provided, comprising:

[0032] Provide a framework;

[0033] Providing a plurality of support members, and fixing both ends of each of the support members to the frame, wherein the plurality of support members include a plurality of first support members arranged at intervals along a first direction and a plurality of second support members arranged at intervals along a second direction, wherein the first direction intersects with the second direction, and the plurality of first support members and the plurality of second support members define at least two vapor deposition areas;

[0034] Providing at least one mask unit, extending the mask unit along the second direction, and fixing two ends of the mask unit along the second direction to the frame, wherein the mask unit includes at least one grid area, and the grid area corresponds to at least one of the evaporation areas;

[0035] Wherein, the mask structure comprises at least one first portion located at the overlapped position of the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

[0036] In an embodiment of the present application, the mask structure includes at least one first portion located at the intersection of the support member and the mask unit, and the mask unit is fixedly connected to the second support member at the first portion. The first portion serves to fix the mask unit, thereby increasing the stability and rigidity of the mask structure, thereby resisting the influence of external forces, thereby improving or avoiding the displacement or deformation of the mask unit, thereby improving or avoiding poor color mixing of the display panel caused by evaporation. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] In order to more clearly illustrate the technical solutions in the embodiments or exemplary embodiments of the present application, the drawings required for use in the description of the embodiments or exemplary embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0038] Figure 1 Schematic diagram of a top view of a mask structure in the related art.

[0039] Figure 2 A schematic top view of a mask structure provided in an embodiment of the present application.

[0040] Figure 3 A schematic diagram of a first partial cross-sectional structure of a mask structure provided in an embodiment of the present application.

[0041] Figure 4 A schematic diagram of a second partial cross-sectional structure of a mask structure provided in an embodiment of the present application.

[0042] Figure 5 A schematic diagram of a third partial cross-sectional structure of a mask structure provided in an embodiment of the present application.

[0043] Figure 6 A first schematic top view of a mask unit of a mask structure provided in an embodiment of the present application.

[0044] Figure 7 A second schematic top view of a mask unit of a mask structure provided in an embodiment of the present application.

[0045] Figure 8 A first enlarged top view schematic diagram of a mask unit of a mask structure provided in an embodiment of the present application.

[0046] Fig. 9 A second enlarged top view schematically showing a mask unit of the mask structure provided in an embodiment of the present application.

[0047] Fig.10A schematic diagram of the process steps of a method for manufacturing a mask structure provided in an embodiment of the present application.

[0048] Reference numerals:

[0049] Mask structure 100; frame 10; support member 20; mask unit 30; first support member 21; second support member 22; evaporation region 20z; grid region 32;

[0050] first direction X; second direction Y; first center line D1; second center line D2; third center line D3; first end 30a; first edge opening 30k1; second edge opening 30k2; second end 30b; third edge opening 30k3; fourth edge opening 30k4; bracket shape 101C; third direction Z; first mask unit 301; second mask unit 302;

[0051] first portion 101; evaporation opening 30k; frame body 11; hollow space 12; mask unit body 31; connector 101L; first sub-portion 1011; second sub-portion 1012; large groove 101a; small groove 101b. DETAILED DESCRIPTION

[0052] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0053] In the description of the present application, it should be understood that if the terms "center", "longitudinal", "lateral", "length", "size", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or position relationship indicated by these terms is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0054] In addition, if the terms "first" or "second" appear, these terms are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the description of this application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0055] In the present application, unless otherwise clearly specified and limited, if there is a description that a first feature is "above" or "below" a second feature, etc., or similar descriptions appear, it may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "above" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0056] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. If an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are for illustrative purposes only and do not represent the only implementation method.

[0057] In the related technology, the frame, support and mask unit (Sheet) work together to determine the display effect of the display panel after vacuum evaporation. The performance of the current mask structure needs to be improved to improve the display effect of the display panel. Figure 1 FIG. 1 is a top view schematic diagram of a mask structure in the related art. Figure 1 The mask structure 100 includes a frame 10, a support member 20 and a mask unit 30. The inventors found that during the evaporation process, after the mask structure is attached to the substrate, the mask unit 30 is offset or deformed in a bracket shape 101C due to the effects of temperature, external force, etc., resulting in poor color mixing on the display panel. The inventors also found that the mask unit 30 extends along the second direction Y, and the first center line D1 is the center line of the mask unit 30 perpendicular to the second direction Y. The closer the mask unit 30 is to the first center line D1, the greater the offset or deformation.

[0058] In order to improve the display quality of a display panel, the present application designs a mask structure and a manufacturing method thereof, aiming to improve the performance of the mask structure, thereby improving the display quality of the display panel.

[0059] See also Figures 2 to 9 . Figure 2 A schematic top view of a mask structure provided in an embodiment of the present application. Figure 3 A schematic diagram of a first partial cross-sectional structure of a mask structure provided in an embodiment of the present application. Figure 4 A schematic diagram of a second partial cross-sectional structure of a mask structure provided in an embodiment of the present application. Figure 5 A schematic diagram of a third partial cross-sectional structure of a mask structure provided in an embodiment of the present application. Figures 3 to 5 for Figure 2 Schematic diagram of the cross section at the dashed line C1-C1.

[0060] Figure 6 A first schematic top view of a mask unit of a mask structure provided in an embodiment of the present application. Figure 7 A second schematic top view of a mask unit of a mask structure provided in an embodiment of the present application.

[0061] Figure 8 A first enlarged top view schematic diagram of a mask unit of a mask structure provided in an embodiment of the present application. Fig. 9 A second enlarged top view schematic diagram of a mask unit of the mask structure provided in an embodiment of the present application. Figure 6 and Figure 7 , Figure 8 and Fig. 9 The evaporation openings in the mask unit are shown schematically. Figure 8 for Figure 2 FIG. 3 is an enlarged schematic diagram of the first mask unit 301, Fig. 9 for Figure 2 FIG. 1 is an enlarged schematic diagram of the second mask unit 302 in FIG.

[0062] The present application provides a mask structure 100, which includes a frame 10, a plurality of support members 20 and at least one mask unit 30. Both ends of each support member 20 are fixedly connected to the frame 10, and the plurality of support members 20 include a plurality of first support members 21 arranged at intervals along a first direction X and a plurality of second support members 22 arranged at intervals along a second direction Y. The first direction X intersects with the second direction Y, and the plurality of first support members 21 and the plurality of second support members 22 define at least two evaporation regions 20z; the mask unit 30 is extended along the second direction Y, and both ends of the mask unit 30 along the second direction Y are fixed to the frame 10, and the mask unit 30 includes at least one grid region 32, and the grid region 32 corresponds to the at least one evaporation region 20z; wherein the mask structure 100 includes at least one first portion 101 located at the overlap of the support member 20 and the mask unit 30, and the mask unit 30 is fixedly connected to the second support member 22 at the first portion 101.

[0063] For example, the mask structure 100 provided in the embodiment of the present application may be used in an evaporation process, and the mask structure 100 may be a precision metal mask (FMM).

[0064] For example, the mask unit 30 includes at least one grid area 32, the grid area 32 corresponds to at least one evaporation area 20z, and the orthographic projection of the grid area 32 on the plane where the evaporation area 20z is located at least partially overlaps with the corresponding evaporation area 20z.

[0065] For example, in some embodiments, the mask structure 100 can be used to form a display motherboard (or display large panel) on a substrate. After the display motherboard is manufactured, the display motherboard can be cut to obtain multiple display panels, wherein a vapor deposition area 20z of the mask structure 100 can correspond to an effective display area of ​​a display panel, and the grid area 32 includes a plurality of vapor deposition openings 30k. During the vapor deposition process, the vapor deposited material can pass through the vapor deposition openings 30k to be formed on the substrate. For example, an vapor deposition opening 30k can correspond to a sub-pixel opening in the effective display area.

[0066] For example, the first direction X and the second direction Y may be perpendicular to each other, but the present invention is not limited thereto.

[0067] Illustratively, the frame 10 includes a frame body 11 and a hollow space 12 surrounded by the frame body 11 .

[0068] By way of example, the mask unit 30 includes a mask unit body 31 and a grid region 32 disposed on the mask unit body 31 .

[0069] For example, in some embodiments, the distance from the first portion 101 to the portion of the grid area 32 corresponding to the effective display area of ​​the display panel is greater than or equal to 3 mm, reducing or avoiding the influence of the first portion 101 on the evaporation opening 30k of the effective display area.

[0070] For example, in a plane parallel to the evaporation region 20z, the first portion 101 (or the first position) is located at one side of the evaporation opening 30k, and the first portion 101 does not interfere with the passage of material in the evaporation opening 30k during evaporation.

[0071] In the embodiment of the present application, the mask structure 100 includes at least one first portion 101 located at the intersection of the support member 20 and the mask unit 30. The mask unit 30 is fixedly connected to the second support member 22 at the first portion 101. The first portion 101 serves to fix the mask unit 30, thereby increasing the stability and rigidity of the mask structure 100, thereby resisting the influence of external forces, thereby improving or avoiding the displacement or deformation of the mask unit 30, thereby improving or avoiding poor color mixing of the display panel caused by evaporation.

[0072] In some embodiments, Figures 3 to 5 As shown, the mask unit 30 is rigidly fixedly connected to the second support member 22 at the first portion 101 .

[0073] Optionally, in some embodiments, Figures 3 to 5 As shown, the mask unit 30 is connected to the second support member 22 by welding.

[0074] For example, the mask unit 30 and the second support member 22 can be rigidly fixedly connected by welding or other connection methods, thereby increasing the stability and rigidity of the mask structure 100, thereby resisting the influence of external forces, thereby improving or avoiding the displacement or deformation of the mask unit 30.

[0075] For example, Figure 3 As shown, the mask unit 30 is connected to the second support member 22 by welding, and a connector 101L may be provided between the mask unit 30 and the second support member 22 at the first portion 101 . The material of the connector 101L may be bonding metal such as solder.

[0076] In some embodiments, Figure 4 As shown, the mask unit 30 is elastically fixedly connected to the second support member 22 at the first portion 101 .

[0077] For example, the mask unit 30 and the second support member 22 are elastically fixedly connected at the first portion 101, which can tolerate a slight offset or slight deformation of the mask unit 30 to adapt to the external force applied to the mask unit 30, improve the toughness of the mask structure 100, and avoid the risk of the mask unit 30 breaking. For example, in the mask structure 100 used for evaporation of a large-size display panel, the mask unit 30 is subjected to a relatively strong external force. At this time, an elastically fixed connection can play a buffering role and avoid the risk of the mask unit 30 breaking.

[0078] For example, the mask unit 30 is elastically fixedly connected to the second support member 22 at the first portion 101 , and at this time, a buffering effect is provided for the external force applied to the mask unit 30 , thereby preventing the mask unit 30 from being damaged.

[0079] Optionally, the mask structure 100 further includes an elastic connector, and the mask unit 30 is connected to the second support member 22 via the elastic connector.

[0080] For example, Figure 4 As shown, a connecting member 101L is provided between the mask unit 30 and the second supporting member 22 at the first portion 101 , and the connecting member 101L is an elastic connecting member (the connecting member 101L includes an elastic material).

[0081] Optionally, the material of the elastic connecting piece includes heat-sensitive adhesive.

[0082] For example, the material of the elastic connector includes thermosensitive glue, which has a certain elasticity and can buffer external forces. When heated to a certain degree of high temperature, the thermosensitive glue turns into liquid, which has the characteristic of low viscosity, making it easy to rework and repair the mask structure 100 and avoid damaging the mask structure 100 during rework and repair.

[0083] In some embodiments, Figure 6 and Figure 7 As shown, the mask structure 100 includes at least three first parts 101, and the at least three first parts 101 include a first sub-part 1011, and two second sub-parts 1012 located at the ends of the first sub-part 1011 close to the mask unit 30 along the second direction Y; the mask unit 30 and the second support member 22 are elastically fixedly connected in the second sub-part 1012; the mask unit 30 and the second support member 22 are rigidly fixedly connected in the first sub-part 1011.

[0084] For example, the closer the mask unit 30 is to the first center line D1, the greater the offset or deformation, the first sub-portion 1011 is closer to the first center line D1, and the second sub-portion 1012 is closer to the end of the mask unit 30. The offset and deformation of the mask unit 30 in the first sub-portion 1011 are greater. The rigid fixed connection between the mask unit 30 and the second support member 22 in the first sub-portion 1011 can better improve the offset and deformation of the mask unit 30. The elastic fixed connection between the mask unit 30 and the second support member 22 in the second sub-portion 1012 can buffer the external force. At this time, both the reduction of the deformation of the mask unit 30 and the improvement of the buffering capacity of the mask unit 30 are taken into account.

[0085] It should be noted that Figure 6 Schematically, the mask unit 30 includes a plurality of grid areas 32 , and one grid area 32 may correspond to one display panel, but is not limited thereto.

[0086] It should be noted that Figure 7 Schematically, the mask unit 30 includes a grid area 32 , and one grid area 32 may correspond to a plurality of display panels, but is not limited thereto.

[0087] In some embodiments, Figure 3 and Figure 5 As shown, the grid area 32 includes a plurality of evaporation openings 30k; the first portion 101 is located between at least two adjacent evaporation openings 30k, and in a direction perpendicular to the plane where the evaporation area 20z is located, the thickness of the mask unit 30 at the first portion 101 is greater than 0 and less than the maximum thickness of the mask unit 30.

[0088] For example, please combine Figure 2 ,as well as Figure 3 and Figure 5 As shown, the third direction Z is a direction perpendicular to the plane where the evaporation area 20z is located. Figure 2 The direction perpendicular to the table or paper surface.

[0089] For example, Figure 3 and Figure 5 As shown, the first portion 101 is located between at least two adjacent evaporation openings 30k. In the direction perpendicular to the plane where the evaporation region 20z is located, the thickness of the mask unit 30 in the first portion 101 is greater than 0 and less than the maximum thickness of the mask unit 30, that is, no evaporation opening 30k is provided in the first portion 101, so as to improve the stability and mechanical strength of the connection between the mask unit 30 and the second support member 22 in the first portion 101. At the same time, in the first portion 101, Figure 3 The example shows that the mask unit 30 is provided with a large groove 101a. Figure 5The mask unit 30 shown in the example is provided with a plurality of small grooves 101b, so that the mask unit 30 is a half-engraved area in the first portion 101 to reduce the thickness of the mask unit 30 in the first portion 101, so that the stress of the mask unit 30 in the first portion 101 is as uniform as possible with the surrounding area where the evaporation opening 30k is provided.

[0090] For example, in some embodiments, Figure 5 As shown, the plurality of small grooves 101b may be distributed in a grid pattern, so that the distribution of the plurality of small grooves 101b imitates the distribution of the evaporation openings 30k, so that the stress of the first portion 101 and the surrounding area where the evaporation openings 30k are arranged are as uniform as possible.

[0091] For example, in some embodiments, the mask unit 30 is a half-engraved area around the first portion 101, and the first portion 101 is a full-thickness area. In the third direction Z, the thickness of the half-engraved area is less than the thickness of the full-thickness area.

[0092] For example, in some embodiments, at least one first groove (not shown) is disposed on the surface of the support member 20 facing the mask unit 30 in the first portion 101 , and the first groove can accommodate the connector 101L.

[0093] For example, in some embodiments, at the first portion 101, at least one first groove (not shown in the figure) is provided on the surface of the support member 20 facing the mask unit 30, and at least one second groove (not shown in the figure) is provided on the surface of the mask unit 30 facing the support member 20, and the first groove and the second groove together accommodate the connector 101L.

[0094] Optionally, in some embodiments, the mask unit 30 includes a plurality of grid regions 32 , and the grid regions 32 correspond to the evaporation regions 20 z one by one.

[0095] In some embodiments, Figure 4 As shown, in a direction perpendicular to the plane where the evaporation region 20 z is located, the thickness of the mask unit 30 at the first portion 101 is equal to the maximum thickness of the mask unit 30 .

[0096] For example, Figure 4 As shown, in the direction perpendicular to the plane where the evaporation area 20z is located, the thickness of the mask unit 30 in the first portion 101 is equal to the maximum thickness of the mask unit 30, that is, the evaporation opening 30k is no longer set in the first portion 101 area, and the mask unit 30 in the first portion 101 is a full-thickness area to enhance the stability and mechanical strength of the connection between the mask unit 30 and the second support member 22 in the first portion 101.

[0097] In some embodiments, Figure 6As shown, the mask structure 100 includes a plurality of first portions 101 ; the plurality of first portions 101 are symmetrically arranged relative to a first center line D1 extending along a first direction X of the mask unit 30 .

[0098] For example, Figure 6 As shown, the length extension direction of the mask unit 30 is the second direction Y, and the first center line D1 is the center line of the mask unit 30 along the first direction X.

[0099] For example, please combine Figure 1 and Figure 6 The inventors found that the deformation of the mask unit 30 is symmetrical about the first center line D1, and the multiple first portions 101 are symmetrically arranged relative to the first center line D1, so that the arrangement of the multiple first portions 101 is symmetrically matched with the deformation of the mask unit 30 about the first center line D1, which can uniformly reduce the occurrence of deformation at various portions of the mask unit 30 to improve the display quality of the display panel.

[0100] In some embodiments, Figure 6 As shown, the mask structure 100 includes a plurality of first portions 101 ; the density of the plurality of first portions 101 per unit length gradually increases from the end of the mask unit 30 to the first center line D1 extending along the first direction X of the mask unit 30 .

[0101] For example, please combine Figure 1 and Figure 6 The closer the mask unit 30 is to the first center line D1, the greater the offset or deformation; the closer the density of the first portion 101 per unit length is to the first center line D1, the greater the density; this can better match the greater deformation of the mask unit 30 as it is closer to the first center line D1, and can evenly reduce the occurrence of deformation at various portions of the mask unit 30.

[0102] In some embodiments, Figure 2 , Figure 8 and Fig. 9 As shown, the frame 10 includes a second center line D2 extending along the second direction Y and a third center line D3 extending along the first direction X, the mask unit 30 includes a first end 30a and a second end 30b in the second direction Y, and at least one grid area 32 includes a plurality of evaporation openings 30k.

[0103] In at least one mask unit 30 located on one side of the second center line D2, the plurality of evaporation openings 30k include a first edge opening 30k1 close to the first end 30a and close to the second center line D2, and the plurality of evaporation openings 30k also include a second edge opening 30k2 close to the first end 30a and away from the second center line D2.

[0104] In at least one mask unit 30 located on one side of the second center line D2, the multiple evaporation openings 30k also include a third edge opening 30k3 close to the second end 30b and close to the second center line D2, and the multiple evaporation openings 30k also include a fourth edge opening 30k4 close to the second end 30b and away from the second center line D2.

[0105] The distance from the first edge opening 30k1 to the third center line D3 is greater than the distance from the second edge opening 30k2 to the third center line D3, and the distance from the third edge opening 30k3 to the third center line D3 is greater than the distance from the fourth edge opening 30k4 to the third center line D3.

[0106] For example, Figure 2 , Figure 8 and Fig. 9 As shown, Figure 8 Indicated Figure 2 A mask unit 30 on the left side of the second center line D2, Fig. 9 Indicated Figure 2 A mask unit 30 on the right side of the second center line D2.

[0107] For example, please combine Figure 1 ,as well as Figure 8 and Fig. 9 The inventors found that during the evaporation process, after the mask structure 100 is attached to the substrate, the mask unit 30 is offset or deformed in a bracket shape 101C due to the effects of temperature, external force, etc. Therefore, the distance from the first edge opening 30k1 to the third center line D3 is set to be greater than the distance from the second edge opening 30k2 to the third center line D3, and the distance from the third edge opening 30k3 to the third center line D3 is greater than the distance from the fourth edge opening 30k4 to the third center line D3, so that the setting of the evaporation opening 30k is reversely compensated for the deformation of the mask unit 30. After these compensations, after the mask unit 30 is offset or deformed in the bracket shape 101C, each evaporation opening 30k can be located at a preset position, and the shape of each evaporation opening 30k is a preset shape, thereby compensating for the deformation or offset of the mask unit 30 well.

[0108] For example, Figure 8 As shown, for Figure 2 The mask unit 30 on the left side of the second center line D2 satisfies that the distance from the first edge opening 30k1 to the third center line D3 is greater than the distance from the second edge opening 30k2 to the third center line D3, and the distance from the third edge opening 30k3 to the third center line D3 is greater than the distance from the fourth edge opening 30k4 to the third center line D3.

[0109] For example, Fig. 9 As shown, for Figure 2The mask unit 30 on the right side of the second center line D2 satisfies that the distance from the first edge opening 30k1 to the third center line D3 is greater than the distance from the second edge opening 30k2 to the third center line D3, and the distance from the third edge opening 30k3 to the third center line D3 is greater than the distance from the fourth edge opening 30k4 to the third center line D3.

[0110] For example, the distances from the first edge opening 30k1 , the second edge opening 30k2 , the third edge opening 30k3 , and the fourth edge opening 30k4 to the third center line D3 may be set according to simulation results or product measurement results.

[0111] By way of example, the first edge opening 30k1 , the second edge opening 30k2 , the third edge opening 30k3 , and the fourth edge opening 30k4 are all the evaporation openings 30k at the outermost edges of the mask unit 30 .

[0112] For example, the distribution of the evaporation openings 30k between the first edge opening 30k1 and the second edge opening 30k2 and the distribution of the evaporation openings 30k between the third edge opening 30k3 and the fourth edge opening 30k4 can be set according to simulation results or product measurement results.

[0113] Optionally, in some embodiments, the first edge opening 30k1 and the third edge opening 30k3 are symmetrically arranged about the third center line D3, and the second edge opening 30k2 and the fourth edge opening 30k4 are symmetrically arranged about the third center line D3.

[0114] For example, Figure 8 or Fig. 9 As shown, the deformation of the mask unit 30 is symmetrical about the first center line D1, the first edge opening 30k1 and the third edge opening 30k3 are symmetrically arranged about the third center line D3, and the second edge opening 30k2 and the fourth edge opening 30k4 are symmetrically arranged about the third center line D3, so that the arrangement of the multiple evaporation openings 30k is symmetrically matched with the deformation of the mask unit 30 about the first center line D1, which can uniformly reduce the occurrence of deformation in various parts of the mask unit 30.

[0115] See also Fig.10 , Fig.10 A schematic diagram of the process steps of a method for manufacturing a mask structure provided in an embodiment of the present application.

[0116] The present application also provides a method for manufacturing a mask structure, and the mask structure 100 in any of the above embodiments can be manufactured using the method for manufacturing a mask structure. The method for manufacturing a mask structure includes: step S100, step S200, and step S300.

[0117] Step S100, providing a framework.

[0118] Step S200, provide a plurality of support members, and fix both ends of each of the support members to the frame, wherein the plurality of support members include a plurality of first support members arranged at intervals along a first direction and a plurality of second support members arranged at intervals along a second direction, the first direction intersects with the second direction, and the plurality of first support members and the plurality of second support members define at least two evaporation areas.

[0119] For example, please combine Figure 2 A plurality of support members 20 are provided, and both ends of each support member 20 are fixedly connected to the frame 10. The plurality of support members 20 include a plurality of first support members 21 arranged at intervals along a first direction X and a plurality of second support members 22 arranged at intervals along a second direction Y. The first direction X intersects with the second direction Y. The plurality of first support members 21 and the plurality of second support members 22 define at least two evaporation areas 20z.

[0120] Step S300, providing at least one mask unit, extending the mask unit along the second direction, and fixing both ends of the mask unit along the second direction to the frame, wherein the mask unit includes at least one grid area corresponding to at least one of the evaporation areas.

[0121] Wherein, the mask structure comprises at least one first portion located at the overlapped position of the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

[0122] For example, please combine Figure 2 , providing at least one mask unit 30, extending the mask unit 30 along the second direction Y, and fixing both ends of the mask unit 30 along the second direction Y on the frame 10, the mask unit 30 includes at least one grid area 32, and the grid area 32 corresponds to at least one evaporation area 20z;

[0123] The mask structure 100 includes at least one first portion 101 located at the overlapped position of the support member 20 and the mask unit 30 , and the mask unit 30 is fixedly connected to the second support member 22 at the first portion 101 .

[0124] For example, the mask structure manufactured by adopting the manufacturing method of the mask structure has the same or similar features and effects as the mask structure 100 in the above embodiment, which will not be described in detail herein.

[0125] The present application also provides a display panel, which can be manufactured using any of the mask structures 100 described above.

[0126] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0127] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. A mask structure, characterized in that: include: frame; A plurality of support members, both ends of each of the support members are fixedly connected to the frame, the plurality of support members include a plurality of first support members arranged at intervals along a first direction and a plurality of second support members arranged at intervals along a second direction, the first direction intersects with the second direction, and the plurality of first support members and the plurality of second support members define at least two vapor deposition areas; at least one mask unit, extending along the second direction, and two ends of the mask unit along the second direction are fixed on the frame, the mask unit includes at least one grid area, and the grid area corresponds to at least one of the evaporation areas; Wherein, the mask structure comprises at least one first portion located at the overlapped position of the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

2. The mask structure according to claim 1, characterized in that: The mask unit is rigidly fixedly connected to the second support member at the first position; Optionally, the mask unit is connected to the second support member by welding.

3. The mask structure according to claim 1, characterized in that: The mask unit is elastically and fixedly connected to the second support member at the first position; Optionally, the mask structure further includes an elastic connector, and the mask unit and the second support member are connected via the elastic connector; Optionally, the material of the elastic connecting piece includes heat-sensitive adhesive.

4. The mask structure according to claim 1, characterized in that: The mask structure comprises at least three first portions, wherein the at least three first portions comprise a first sub-portion and two second sub-portions located at ends of the first sub-portion close to the mask unit along a second direction; The mask unit is elastically and fixedly connected to the second support member at the second sub-position; The mask unit is rigidly fixedly connected to the second support member at the first sub-position.

5. The mask structure according to claim 1, characterized in that: The grid area includes a plurality of evaporation openings; The first portion is located between at least two adjacent evaporation openings, and in a direction perpendicular to the plane where the evaporation region is located, the thickness of the mask unit at the first portion is greater than 0 and less than the maximum thickness of the mask unit; Optionally, the mask unit includes a plurality of the grid areas, and the grid areas correspond to the evaporation areas one by one.

6. The mask structure according to claim 1, characterized in that: In a direction perpendicular to the plane where the evaporation region is located, the thickness of the mask unit at the first portion is equal to the maximum thickness of the mask unit.

7. The mask structure according to claim 1, characterized in that: The mask structure includes a plurality of first portions; The plurality of first portions are symmetrically arranged relative to a first center line of the mask unit extending along the first direction.

8. The mask structure according to claim 1, characterized in that: The mask structure includes a plurality of first portions; The density of the first parts per unit length gradually increases from the end of the mask unit to the first center line of the mask unit extending along the first direction.

9. The mask structure according to claim 1, characterized in that: The frame includes a second center line extending along the second direction, and a third center line extending along the first direction, the mask unit includes a first end and a second end in the second direction, and the at least one grid area includes a plurality of evaporation openings; In at least one of the mask units located on one side of the second center line, the plurality of evaporation openings include a first edge opening close to the first end and close to the second center line, and the plurality of evaporation openings also include a second edge opening close to the first end and away from the second center line; In at least one of the mask units located on one side of the second center line, the plurality of evaporation openings further include a third edge opening close to the second end and close to the second center line, and the plurality of evaporation openings further include a fourth edge opening close to the second end and away from the second center line; The distance from the first edge opening to the third center line is greater than the distance from the second edge opening to the third center line, and the distance from the third edge opening to the third center line is greater than the distance from the fourth edge opening to the third center line; Optionally, the first edge opening and the third edge opening are symmetrically arranged with respect to the third center line, and the second edge opening and the fourth edge opening are symmetrically arranged with respect to the third center line.

10. A method for manufacturing a mask structure, characterized in that: include: Provide a framework; Providing a plurality of support members, and fixing both ends of each of the support members to the frame, wherein the plurality of support members include a plurality of first support members arranged at intervals along a first direction and a plurality of second support members arranged at intervals along a second direction, wherein the first direction intersects with the second direction, and the plurality of first support members and the plurality of second support members define at least two vapor deposition areas; Providing at least one mask unit, extending the mask unit along the second direction, and fixing two ends of the mask unit along the second direction to the frame, wherein the mask unit includes at least one grid area, and the grid area corresponds to at least one of the evaporation areas; Wherein, the mask structure comprises at least one first portion located at the overlapped position of the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

Images