Surface oxidation device and method capable of improving sputtering efficiency
By designing angle adjustment components and sputtering mechanisms in magnetron sputtering coating technology, the radius of the target and the argon intake angle are monitored and adjusted in real time, the problem of the sputtering efficiency decrease after target consumption is solved, and an efficient sputtering coating process is achieved.
Patent Information
- Application Number
- CN202510293614.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-13
- Publication Date
- 2025-04-15
- Estimated Expiration
- 2045-03-13
AI Technical Summary
In the existing magnetron sputtering coating technology, the angle of incident particles will change after the target material is consumed, resulting in a decrease in sputtering efficiency.
A surface oxidation device is designed to control the radius of the cylindrical target by rotating the coating assembly and the sputtering mechanism, and the angle adjustment assembly is used to monitor the radius of the cylindrical target in real time, and adjust the air outlet angle of the inflatable tube according to the radius, ensuring that the angle of the argon ion impact remains constant, thereby improving the sputtering efficiency.
By adjusting the argon intake angle in real time, the sputtering efficiency of the cylindrical target can be maintained, the efficiency decrease caused by target consumption can be avoided, and the sputtering efficiency can be further improved through the gas collection and air flow acceleration of the gas collection box.
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Figure CN119824381A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of magnetron sputtering coating, and in particular to a surface oxidation device and method capable of improving sputtering efficiency. Background Art
[0002] Magnetron sputtering coating is a physical vapor deposition (PVD) technology, and its working principle is based on the process of ions bombarding the target and depositing on the substrate to form a thin film. Magnetron sputtering coating introduces a magnetic field, causing electrons to move along a spiral orbit in the magnetic field, increasing the probability of collision with gas molecules, thereby improving plasma density and sputtering efficiency.
[0003] Influencing factors include target atomic number, incident ion type, ion incident angle, target temperature, etc. For example, the sputtering yield increases periodically with the increase of target atomic number, and increases with the increase of incident ion angle, reaching the maximum at 70 to 80 degrees. If the angle continues to increase, the sputtering yield will decrease sharply. The existing target will be gradually consumed during the coating process, but the argon gas incident angle is unchanged, which leads to the fact that the incident ion angle cannot be guaranteed to be continuously in the optimal state. Summary of the invention
[0004] In view of the above-mentioned shortcomings of the prior art, the present invention provides a surface oxidation device and method that can improve the sputtering efficiency, which can effectively solve the problem in the prior art that the angle of incident particles changes after the target material is consumed.
[0005] To achieve the above objectives, the present invention is implemented through the following technical solutions: The present invention provides a surface oxidation device capable of improving sputtering efficiency, comprising a control box and a coating box installed on the control box, and further comprising: The rotary coating assembly includes a placement rack rotatably mounted at the center of the coating box, and a plurality of substrates are placed on the placement rack at equal angles; The sputtering mechanism comprises a sputtering box fixedly mounted on both sides of the coating box, a cylindrical target material is rotatably mounted in the sputtering box, two gas-filled tubes are rotatably mounted in the sputtering box, and the gas-filled tubes are symmetrically arranged on both sides of the cylindrical target material, and the sputtering mechanism also comprises an angle adjustment component, which is used to detect the radius of the cylindrical target material and adjust the gas outlet angle of the gas-filled tube according to the measured radius; A fixing rod is fixedly installed in the sputtering box, and both ends of the fixing rod are slidably installed with limit frames, and the cylindrical target is clamped between the two limit frames; A gear is fixedly connected to the bottom of the inflation tube, and a rack matched with the gear is slidably installed in the sputtering box, and the angle of the inflation tube can be changed by sliding the rack; A second piston tube is fixedly installed in the sputtering box, and a second piston rod is movably inserted in the second piston tube, the rack and the second piston rod are fixedly connected, a first piston tube is fixedly installed on the fixed rod, a first piston rod is movably inserted on the first piston tube, a rotating frame is provided on the first piston rod, a detection roller is rotatably installed on the rotating frame, and the detection roller is in full contact with the cylindrical target material, a first connecting tube is connected between the first piston tube and the second piston tube, and a return spring is sleeved on the first piston rod; Wherein, a transmission assembly for synchronous driving is provided between the placement rack and the cylindrical target.
[0006] Furthermore, a receiving groove is provided on the outer wall of the two limiting frames on the adjacent side, and elastic rods are installed in the two receiving grooves, and clamping plates are installed at the ends of the elastic rods.
[0007] Furthermore, two shunt tubes are inserted into the top wall of the sputtering box, and the two shunt tubes are connected to the two inflation tubes one by one. The two shunt tubes on the same sputtering box are commonly connected to the main gas pipe, and the main gas pipe is externally connected to an argon gas supply assembly.
[0008] Furthermore, the transmission assembly includes a driving motor fixedly installed in the control box, a main shaft is fixedly installed on the output shaft of the driving motor, the top of the main shaft passes through the coating box and is fixedly connected to the bottom wall of the placement rack, the bottom of the limit frame located at the bottom of the sputtering box is fixedly connected to a transmission shaft, and the transmission shafts pass through the outer walls of the sputtering box and the control box respectively, and a second transmission disk is respectively provided on the two transmission shafts, and two first transmission disks are installed on the main shaft, and the two first transmission disks are aligned one by one with the two second transmission disks in horizontal position, and a transmission belt is sleeved between the first transmission disk and the second transmission disk that are aligned in horizontal position.
[0009] Furthermore, an air charging box is provided on the outer wall of the sputtering box, an air collecting box is fixedly installed on the control box, the air collecting box and the air charging box are connected, and a pressure relief valve is provided at the connecting point, a cam is provided on the transmission shaft, a third piston tube is fixedly installed in the control box, a third piston rod is movably inserted into one end of the third piston tube near the cam, and a transmission plate is fixedly installed on the end of the third piston rod, the transmission plate and the cam are slidably connected, an air outlet pipe is connected between the third piston tube and the air collecting box, an air intake pipe is connected between the third piston tube and the coating box, and both the air intake pipe and the air outlet pipe are provided with one-way valves.
[0010] Furthermore, an oxidation device is provided on one side of the coating box, an upper cover is movably installed on the top of the coating box, and a vacuum device is connected to one side of the coating box.
[0011] A method for improving sputtering efficiency of a surface oxidation device comprises the following steps: S1: preheat the substrate, place the substrate on the placement rack after preheating, install the cylindrical target in the sputtering box, and start the vacuum device to extract the vacuum inside the coating box; S2: Start the driving motor, and make the placement rack and the cylindrical target rotate simultaneously through the transmission assembly. At this time, argon is added to the sputtering box through the argon gas supply assembly, and the oxidation device is started; S3: The driving motor drives the cam to rotate, and drives the third piston rod to slide back and forth in the third piston tube through the transmission plate. The argon gas in the coating box is extracted and sent to the gas collecting box by utilizing the change of air pressure until the pressure relief valve is broken. The argon gas in the gas collecting box is filled into the sputtering box from the gas charging box, and the sputtering speed of the substrate particles is accelerated by utilizing the air flow; S4: The cylindrical target is gradually consumed, and the detection roller is always pressed against the outer wall of the cylindrical target under the action of the reset spring. When the size of the cylindrical target gradually becomes smaller, the first piston rod gradually extends out of the first piston tube, thereby utilizing the pneumatic transmission to drive the gear to rotate, thereby driving the inflation tube to rotate, so as to adjust the angle at which the argon gas impacts the cylindrical target.
[0012] Compared with the known prior art, the technical solution provided by the present invention has the following beneficial effects: The real-time radius of the cylindrical target is monitored by the angle adjustment component, and the angle of the gas filling tube is adjusted according to the radius, so that the angle of the argon ion impact on the cylindrical target is maintained at a certain angle, thereby improving the sputtering efficiency of the cylindrical target. In addition, a gas collecting box is used to collect gas, and the airflow is used to accelerate the target particles to further improve the sputtering efficiency. BRIEF DESCRIPTION OF THE DRAWINGS
[0013] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the prior art descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention, and for ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
[0014] Figure 1 It is an overall schematic diagram of the present invention; Figure 2 for Figure 1 A cross-sectional view of Figure 3 It is a structural schematic diagram of the coating box part; Figure 4 It is a structural schematic diagram of the transmission component part; Figure 5 It is a structural schematic diagram of the sputtering mechanism part; Figure 6 for Figure 5 A magnified view of the structure of part B; Figure 7 It is a structural schematic diagram of the angle adjustment component; Figure 8 for Figure 7 A magnified view of the structure of part A; Fig. 9 is a state diagram when the third piston rod moves toward the inside of the third piston tube; Fig.10 A state diagram of the third piston rod moving toward the outside of the third piston tube; Fig.11 This is a diagram of the motion states of the first piston rod, the second piston rod, the gear and the rack when the cylindrical target becomes thinner.
[0015] The numbers in the figure represent respectively: 1. control box; 2. coating box; 201. placement rack; 202. substrate; 3. upper cover; 4. oxidation device; 5. sputtering box; 6. cylindrical target; 7. inflation tube; 8. shunt tube; 9. main gas tube; 10. limit rack; 11. clamp; 12. elastic rod; 13. main shaft; 14. transmission shaft; 15. first transmission disk; 16. second transmission disk; 17. driving motor; 18. fixing rod; 19. first piston tube; 20. first piston rod; 21. detection roller; 22. second piston tube; 23. second piston rod; 24. rack; 25. gear; 26. first connecting tube; 27. gas collecting box; 28. inflation box; 29. cam; 30. third piston tube; 31. transmission plate; 32. suction pipe; 33. exhaust pipe; 34. vacuum device. DETAILED DESCRIPTION
[0016] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0017] The present invention will be further described below in conjunction with the embodiments.
[0018] Example: Reference Figure 1-Figure 3A surface oxidation device and method for improving sputtering efficiency includes a control box 1 and a coating box 2 installed on the control box 1, and also includes a rotary coating assembly, including a placement rack 201 rotatably installed at the center of the coating box 2, multiple substrates 202 are placed at equal angles on the placement rack 201, an oxidation device 4 is provided on one side of the coating box 2, an upper cover 3 is movably installed on the top of the coating box 2, and a vacuum device 34 is connected to one side of the coating box 2. The placement rack 201 is provided with a positive current, and the subsequent cylindrical target 6 position is overlapped with a negative current, as well as the setting of a magnetic field, which are all conventional settings of existing sputtering coating machines and will not be described in detail here.
[0019] refer to Figure 4-Figure 8 The efficiency of sputtering is improved by adjusting the angle of argon gas inlet in real time. For this purpose, a sputtering mechanism is provided, including a sputtering box 5 fixedly installed on both sides of the coating box 2, a cylindrical target 6 is rotatably installed in the sputtering box 5, a fixed rod 18 is fixedly installed in the sputtering box 5, and both ends of the fixed rod 18 are slidably installed with a limit frame 10, such as Figure 7 As shown, the fixing rod 18 is in an I-shape, and its upper and lower ends are installed with the side walls of the limit frame 10 by means of sliders and slide grooves, so that the limit frame 10 can rotate, and the cylindrical target 6 is clamped between the two limit frames 10. The two limit frames 10 are provided with storage grooves on the outer walls on the side close to each other, and elastic rods 12 are installed in the two storage grooves. Clamps 11 are installed at the ends of the elastic rods 12. Two inflation tubes 7 are rotatably installed in the sputtering box 5, and the inflation tubes 7 are symmetrically arranged on both sides of the cylindrical target 6. Two shunt tubes 8 are inserted and connected to the top wall of the sputtering box 5. The two shunt tubes 8 are connected to the two inflation tubes 7 one by one. The two shunt tubes 8 located on the same sputtering box 5 are commonly connected to the main gas pipe 9, and the main gas pipe 9 is externally connected to an argon gas supply component. The sputtering mechanism also includes an angle adjustment component, which is used to detect the cylindrical The radius of the target material 6 is determined and the air outlet angle of the inflation tube 7 is adjusted according to the detection radius. A gear 25 is fixedly connected to the bottom of the inflation tube 7. A rack 24 that is compatible with the gear 25 is slidably installed in the sputtering box 5. The angle of the inflation tube 7 is changed by sliding the rack 24. A second piston tube 22 is fixedly installed in the sputtering box 5, and a second piston rod 23 is movably inserted in the second piston tube 22. The rack 24 and the second piston rod 23 are fixedly connected. A first piston tube 19 is fixedly installed on the fixed rod 18, and a first piston rod 20 is movably inserted on the first piston tube 19. A rotating frame is provided on the first piston rod 20, and a detection roller 21 is rotatably installed on the rotating frame, and the detection roller 21 is fully in contact with the cylindrical target material 6. A first connecting tube 26 is connected between the first piston tube 19 and the second piston tube 22, and a return spring is sleeved on the first piston rod 20.
[0020] The target material in this solution is cylindrical, and two gas-filled tubes 7 are symmetrically arranged to impact the cylindrical target material 6 from two complementary angles, thereby improving the efficiency of sputtering. In addition, as the cylindrical target material 6 is continuously consumed and gradually becomes thinner (smaller in size), a detection roller 21 is arranged in order to monitor the size of the cylindrical target material 6 in real time. Figure 7 As shown, the detection roller 21 is rotatably mounted on the end of the first piston rod 20. Under the elastic force of the return spring, the detection roller 21 can fully contact the cylindrical target 6 without affecting the normal rotation of the cylindrical target 6. When the cylindrical target 6 gradually becomes thinner, the first piston rod 20 gradually moves to the outside of the first piston tube 19. During the movement, the air pressure inside the first piston tube 19 will change. When the cylindrical target 6 becomes thinner, the first piston rod 20 moves to the outside of the first piston tube 19. Figure 7 and Fig.11 As shown, at this time, the first piston tube 19 will extract the air in the two second piston tubes 22 through the first connecting tube 26, so that the second piston rod 23 moves into the second piston tube 22, thereby driving the second piston rod 23 to move toward the second piston tube 22. Fig.11 The rack 24 slides, driving the gear 25 to rotate. The rotation directions of the two gears 25 are as follows: Fig.11 As shown, the gas filling tube 7 is driven to rotate, thereby changing the gas outlet angle of the gas filling tube 7, that is, the angle of the incident ions, so as to control the incident ions at the best angle ( Fig.11 The angle marked in the figure is the angle of incidence).
[0021] It is worth noting that the transmission ratio between the gear 25 and the rack 24 and the displacement ratio between the first piston rod 20 and the second piston rod 23 can be adjusted to control the adjustment accuracy.
[0022] like Figure 4 , Fig. 9 and Fig.10As shown, a transmission assembly for synchronous driving is provided between the placement rack 201 and the cylindrical target 6, and the transmission assembly includes a driving motor 17 fixedly installed in the control box 1, and a main shaft 13 is fixedly installed on the output shaft of the driving motor 17. The top of the main shaft 13 passes through the coating box 2 and is fixedly connected to the bottom wall of the placement rack 201. The bottom of the limit rack 10 located at the bottom end of the sputtering box 5 is fixedly connected to a transmission shaft 14, and the transmission shaft 14 passes through the outer walls of the sputtering box 5 and the control box 1 respectively. Second transmission disks 16 are respectively provided on the two transmission shafts 14, and two first transmission disks 15 are installed on the main shaft 13. The two first transmission disks 15 are flush with the two second transmission disks 16 in horizontal position one by one, and the first transmission disks 15 and the second transmission disks 16 in horizontal position are flush with each other. A transmission belt is sleeved between the moving disk 15 and the second transmission disk 16, an air charging box 28 is provided on the outer wall of the sputtering box 5, an air collecting box 27 is fixedly installed on the control box 1, the air collecting box 27 and the air charging box 28 are connected, and a pressure relief valve is provided at the connecting point, a cam 29 is provided on the transmission shaft 14, a third piston tube 30 is fixedly installed in the control box 1, a third piston rod is movably inserted at one end of the third piston tube 30 near the cam 29, and a transmission plate 31 is fixedly installed on the end of the third piston rod, the transmission plate 31 and the cam 29 are slidably connected, an air outlet pipe 33 is connected between the third piston tube 30 and the air collecting box 27, an air intake pipe 32 is connected between the third piston tube 30 and the coating box 2, and both the air intake pipe 32 and the air outlet pipe 33 are provided with a one-way valve.
[0023] like Figure 4 As shown, the main shaft 13 is driven to rotate by the driving motor 17, and the main shaft 13 drives the two transmission shafts 14 to rotate through the transmission action between the two sets of first transmission plates 15 and the second transmission plates 16, so as to realize the synchronous rotation of the substrate 202 and the cylindrical target 6 on the placement rack 201.
[0024] At the same time Figure 5 and Figure 6 As shown, when the transmission shaft 14 rotates, the cam 29 is driven to rotate. When the cam 29 rotates, it pushes and pulls the transmission plate 31 back and forth. The transmission plate 31 drives the third piston rod to reciprocate linearly. Fig. 9 and Fig.10As shown, when the third piston rod moves into the third piston tube 30, the third piston tube 30 will extract the gas in the coating box 2 through the suction pipe 32, and when the third piston rod moves to the outside of the third piston tube 30, the gas in the third piston tube 30 will enter the gas collecting box 27 through the outlet pipe 33. As the gas in the gas collecting box 27 continues to increase, the internal pressure continues to increase. After breaking through the pressure relief valve, the gas quickly enters the charging box 28. The charging box 28 is connected to the sputtering box 5. The accumulated gas rushes into the sputtering box 5. The airflow guides the free target particles to the substrate 202, thereby improving the sputtering efficiency. It is worth noting that a slide groove is provided on the side wall of the cam 29, and a slider matched with the slide groove is provided on the transmission plate 31, that is, a sliding connection is adopted between the cam 29 and the transmission plate 31. When the cam 29 rotates, the reciprocating linear motion of the transmission plate 31 is realized.
[0025] A method for improving sputtering efficiency of a surface oxidation device comprises the following steps: S1: preheating the substrate 202, placing the substrate 202 on the placement rack 201 after preheating, installing the cylindrical target 6 in the sputtering box 5, and starting the vacuum device 34 to extract the vacuum inside the coating box 2; S2: Start the driving motor 17, and make the placement rack 201 and the cylindrical target 6 rotate simultaneously through the transmission assembly. At this time, argon gas is added to the sputtering box 5 through the argon gas supply assembly, and the oxidation device 4 is started; S3: The driving motor 17 drives the cam 29 to rotate, and drives the third piston rod to slide back and forth in the third piston tube 30 through the transmission plate 31. The argon gas in the coating box 2 is extracted and sent to the gas collecting box 27 by utilizing the change of air pressure until the pressure relief valve is broken. The argon gas in the gas collecting box 27 is filled into the sputtering box 5 from the gas charging box 28, and the sputtering speed of the substrate particles is accelerated by utilizing the air flow; S4: The cylindrical target 6 is gradually consumed, and the detection roller 21 is always pressed against the outer wall of the cylindrical target 6 under the action of the reset spring. When the size of the cylindrical target 6 gradually becomes smaller, the first piston rod 20 gradually extends out of the first piston tube 19, thereby utilizing the pneumatic transmission to drive the gear 25 to rotate, thereby driving the inflation tube 7 to rotate, so as to adjust the angle at which the argon gas impacts the cylindrical target 6.
[0026] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements will not cause the essence of the corresponding technical solutions to deviate from the protection scope of the technical solutions of the embodiments of the present invention.
Claims
1. A surface oxidation device capable of improving sputtering efficiency, comprising a control box (1) and a coating box (2) mounted on the control box (1), characterized in that: Also includes: A rotary coating assembly, comprising a placement rack (201) rotatably mounted at the center of a coating box (2), wherein a plurality of substrates (202) are placed at equal angles on the placement rack (201); A sputtering mechanism, comprising a sputtering box (5) fixedly mounted on both sides of a coating box (2), a cylindrical target (6) being rotatably mounted in the sputtering box (5), two gas charging tubes (7) being rotatably mounted in the sputtering box (5), and the gas charging tubes (7) being symmetrically arranged on both sides of the cylindrical target (6), and the sputtering mechanism further comprising an angle adjustment component, which is used to detect the radius of the cylindrical target (6) and adjust the gas outlet angle of the gas charging tube (7) according to the measured radius; A fixing rod (18) is fixedly installed in the sputtering box (5), and limiting frames (10) are slidably installed at both ends of the fixing rod (18), and the cylindrical target material (6) is clamped between the two limiting frames (10); A gear (25) is fixedly connected to the bottom of the inflation tube (7), and a rack (24) adapted to the gear (25) is slidably mounted in the sputtering box (5), so that the angle of the inflation tube (7) can be changed by sliding the rack (24); A second piston tube (22) is fixedly installed in the sputtering box (5), and a second piston rod (23) is movably inserted in the second piston tube (22); the rack (24) and the second piston rod (23) are fixedly connected; a first piston tube (19) is fixedly installed on the fixed rod (18); a first piston rod (20) is movably inserted in the first piston tube (19); a rotating frame is provided on the first piston rod (20); a detection roller (21) is rotatably installed on the rotating frame, and the detection roller (21) is in full contact with the cylindrical target material (6); a first connecting tube (26) is connected between the first piston tube (19) and the second piston tube (22); and a return spring is sleeved on the first piston rod (20); Wherein, a transmission component for synchronous driving is provided between the placement rack (201) and the cylindrical target material (6).
2. A surface oxidation device capable of improving sputtering efficiency according to claim 1, characterized in that: A receiving groove is provided on the outer wall of the two limiting frames (10) on the adjacent side, and an elastic rod (12) is installed in each of the two receiving grooves, and a clamping plate (11) is installed at the end of the elastic rod (12).
3. A surface oxidation device capable of improving sputtering efficiency according to claim 2, characterized in that: The top wall of the sputtering box (5) is provided with two shunt pipes (8) connected thereto, the two shunt pipes (8) being connected to the two gas charging pipes (7) in a one-to-one correspondence, the two shunt pipes (8) located on the same sputtering box (5) being commonly connected to a main gas pipe (9), the main gas pipe (9) being externally connected to an argon gas supply assembly.
4. A surface oxidation device capable of improving sputtering efficiency according to claim 3, characterized in that: The transmission assembly comprises a driving motor (17) fixedly mounted in the control box (1), a main shaft (13) fixedly mounted on the output shaft of the driving motor (17), the top of the main shaft (13) passing through the coating box (2) and fixedly connected to the bottom wall of the placement frame (201), a transmission shaft (14) fixedly connected to the bottom of the limiting frame (10) located at the bottom end of the sputtering box (5), and the transmission shaft (14) respectively passes through the outer walls of the sputtering box (5) and the control box (1), two second transmission disks (16) are respectively provided on the two transmission shafts (14), two first transmission disks (15) are installed on the main shaft (13), the two first transmission disks (15) and the two second transmission disks (16) are aligned one by one in horizontal position, and a transmission belt is sleeved between the first transmission disks (15) and the second transmission disks (16) aligned in horizontal position.
5. A surface oxidation device capable of improving sputtering efficiency according to claim 4, characterized in that: An air charging box (28) is provided on the outer wall of the sputtering box (5), an air collecting box (27) is fixedly installed on the control box (1), the air collecting box (27) and the air charging box (28) are connected, and a pressure relief valve is provided at the connecting point, a cam (29) is provided on the transmission shaft (14), a third piston tube (30) is fixedly installed in the control box (1), a third piston rod is movably inserted at one end of the third piston tube (30) close to the cam (29), and a transmission plate (31) is fixedly installed at the end of the third piston rod, the transmission plate (31) and the cam (29) are slidably connected, an air outlet pipe (33) is connected between the third piston tube (30) and the air collecting box (27), an air intake pipe (32) is connected between the third piston tube (30) and the coating box (2), and both the air intake pipe (32) and the air outlet pipe (33) are provided with a one-way valve.
6. A surface oxidation device capable of improving sputtering efficiency according to claim 5, characterized in that: An oxidation device (4) is provided on one side of the coating box (2), an upper cover (3) is movably mounted on the top of the coating box (2), and a vacuum device (34) is connected to one side of the coating box (2).
7. A method for a surface oxidation device capable of improving sputtering efficiency as claimed in claim 6, characterized in that: The following steps are involved: S1: preheating the substrate (202), placing the substrate (202) on a placement rack (201) after preheating, installing a cylindrical target (6) in a sputtering box (5), and starting a vacuum device (34) to draw a vacuum inside the coating box (2); S2: starting the driving motor (17), causing the placement rack (201) and the cylindrical target (6) to rotate simultaneously through the transmission assembly, at which time argon is added to the sputtering box (5) through the argon gas supply assembly, and the oxidation device (4) is started; S3: The driving motor (17) drives the cam (29) to rotate, and drives the third piston rod to slide back and forth in the third piston tube (30) through the transmission plate (31). The argon gas in the coating box (2) is extracted and sent to the gas collecting box (27) by utilizing the change in air pressure until the pressure relief valve is broken. The argon gas in the gas collecting box (27) is charged into the sputtering box (5) from the gas charging box (28), and the sputtering speed of the substrate particles is accelerated by utilizing the air flow; S4: The cylindrical target (6) is gradually consumed, and the detection roller (21) is always pressed against the outer wall of the cylindrical target (6) under the action of the return spring. When the size of the cylindrical target (6) gradually decreases, the first piston rod (20) gradually extends out of the first piston tube (19), thereby utilizing the pneumatic transmission to drive the gear (25) to rotate, thereby driving the inflation tube (7) to rotate, thereby adjusting the angle at which the argon gas impacts the cylindrical target (6).
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