Control method and device of EFEM equipment, storage medium and electronic equipment

Abstract

The invention provides a control method and device of EFEM equipment, a storage medium and electronic equipment, and relates to the technical field of electronics. The control method of the EFEM equipment comprises the steps of obtaining a first instruction based on first system response, wherein an execution process indicated by the first instruction relates to a first control authority for the EFEM equipment; obtaining a controllable time sequence of the EFEM equipment, wherein the controllable time sequence represents a time window capable of executing remote control in a process stage and a space state of the EFEM equipment; adjusting the first instruction into a second instruction based on the controllable time sequence, wherein the second control authority of the second instruction is smaller than or equal to the first control authority; the second system responds to the second instruction, the control level of the first system is higher than that of the second system, and the control time sequence of the first system and the control time sequence of the second system are mutually isolated.

Description

Technical Field

[0001] The present application relates to the field of electronic technology, and in particular to a control method, device, storage medium and electronic device of an EFEM device. Background Art

[0002] In the semiconductor manufacturing process, the Equipment Front End Module (EFEM) device is mainly responsible for key operations such as wafer transmission, alignment and loading. To improve the efficiency of equipment maintenance, the EFEM device supports remote operations by remote engineers. In actual applications, local engineers may be performing key process operations such as wafer loading and alignment, while remote engineers need to adjust equipment parameters or diagnose faults at the same time, which causes conflicts between local and remote operations. Summary of the invention

[0003] In view of this, the present application provides a control method, device, storage medium and electronic device for an EFEM device.

[0004] A first aspect of the present application provides a control method for an EFEM device, comprising: obtaining a first instruction based on the first system response, wherein the execution process indicated by the first instruction involves a first control authority over the EFEM device; Acquire a controllable timing sequence of the EFEM device, wherein the controllable timing sequence represents a time window in which remote control can be performed under a process stage and a spatial state of the EFEM device; Adjusting the first instruction to a second instruction based on the controllable timing, wherein a second control authority of the second instruction is less than or equal to the first control authority; Based on the second system responding to the second instruction, the control level of the first system is higher than the control level of the second system, and the control timings of the first system and the second system are isolated from each other.

[0005] According to the embodiment of the present application, different first instructions indicate different execution processes, and different execution processes involve at least one type of EFEM equipment. Different types of EFEM equipment are in different process stages and spatial states.

[0006] According to an embodiment of the present application, obtaining the controllable timing of the EFEM device includes: obtaining a process stage, wherein the process stage characterizes one of the stages of the EFEM device in the wafer transmission process; obtaining the position and relative coordinates of the EFEM device; based on the position and relative coordinates of the EFEM device, determining the relative area in which the EFEM device is located when it is operating, and obtaining a spatial state; and determining the controllable timing based on the process stage and the spatial state.

[0007] According to an embodiment of the present application, determining a controllable timing based on the process stage and the spatial state includes: determining a first timing and a second timing based on the process stage and the spatial state; eliminating the second timing based on the first timing to determine a controllable timing; wherein the first timing is the maximum duration for which remote control can be executed, and the second timing is the risk duration for executing remote control, and the risk duration is determined by the relative position of at least one of the EFEM devices and the wafer.

[0008] According to an embodiment of the present application, adjusting the first instruction to a second instruction based on the controllable timing includes: determining an original timing of the first instruction, wherein the original timing is determined by the start time and duration of the execution process indicated by the first instruction; and reconstructing the original timing in the first instruction based on the controllable timing to obtain a second instruction.

[0009] According to an embodiment of the present application, the original timing in the first instruction is reconstructed based on the controllable timing to obtain a second instruction, including: when the time window of the controllable timing is greater than or equal to the time window of the original timing, the execution process indicated by the first instruction is timing shifted to obtain the second instruction; when the time window of the controllable timing is less than the time window of the original timing, the execution process indicated by the first instruction is split into multiple sub-processes within the controllable timing to obtain the second instruction.

[0010] According to an embodiment of the present application, the control method of the EFEM device also includes: when the execution process indicated by the first instruction involves a first control authority over at least two EFEM devices, determining the execution priority of the first instruction on each of the EFEM devices according to the controllable timing of each of the EFEM devices.

[0011] Another aspect of the present application provides a control device for an EFEM device, comprising: A first instruction obtaining module, configured to obtain a first instruction based on a first system response, wherein the execution process indicated by the first instruction involves a first control authority over the EFEM device; A controllable timing acquisition module, used to obtain the controllable timing of the EFEM device, wherein the controllable timing represents a time window in which remote control can be performed under the process stage and spatial state of the EFEM device; A second instruction obtaining module, configured to adjust the first instruction to a second instruction based on the controllable timing, wherein a second control authority of the second instruction is less than or equal to the first control authority; The second instruction response module is used to respond to the second instruction based on the second system, the control level of the first system is higher than the control level of the second system, and the control timings of the first system and the second system are isolated from each other.

[0012] Another aspect of the present application provides an electronic device, comprising: one or more processors; a memory for storing one or more programs, When the one or more programs are executed by the one or more processors, the one or more processors implement the control method of the EFEM device as described above.

[0013] Another aspect of the present application provides a computer-readable storage medium storing computer-executable instructions, which are used to implement the control method of the EFEM device as described above when executed.

[0014] According to the embodiment of the present application, the controllable timing is determined by obtaining the process stage and spatial state of the EFEM equipment, and the remote instructions are dynamically adjusted based on the controllable timing, so that the remote operation is only performed within the appropriate time window. At the same time, the control timing of the first system and the second system is isolated from each other, which further guarantees the priority of the local operation and avoids the conflict between the remote instruction and the local operation.

[0015] It should be understood that the content described in this section is not intended to identify the key or important features of the embodiments of the present application, nor is it intended to limit the scope of the present application. Other features of the present application will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The above and other objects, features and advantages of the present application will become more apparent through the following description of the embodiments of the present application with reference to the accompanying drawings.

[0017] Figure 1 A flow chart schematically shows a control method of an EFEM device provided by the present application; Figure 2 A block diagram schematically shows a control device for an EFEM device provided by the present application; Figure 3 The structural block diagram of an electronic device provided by the present application is schematically shown. DETAILED DESCRIPTION

[0018] Below, embodiments of the present application will be described with reference to the accompanying drawings. However, it should be understood that these descriptions are exemplary only and are not intended to limit the scope of the present application. In the following detailed description, for ease of explanation, many specific details are set forth to provide a comprehensive understanding of the embodiments of the present application. However, it is apparent that one or more embodiments may also be implemented without these specific details. In addition, in the following description, descriptions of known structures and technologies are omitted to avoid unnecessary confusion of the concepts of the present application.

[0019] The terms used herein are only for describing specific embodiments and are not intended to limit the present application. The terms "include", "comprising", etc. used herein indicate the existence of the features, steps, operations and / or components, but do not exclude the existence or addition of one or more other features, steps, operations or components.

[0020] All terms (including technical and scientific terms) used herein have the meanings commonly understood by those skilled in the art unless otherwise defined. It should be noted that the terms used herein should be interpreted as having a meaning consistent with the context of this specification and should not be interpreted in an idealized or overly rigid manner.

[0021] When using expressions such as "at least one of A, B, and C, etc.", they should generally be interpreted according to the meaning of the expression commonly understood by those skilled in the art (for example, "a system having at least one of A, B, and C" should include but is not limited to a system having A alone, B alone, C alone, A and B, A and C, B and C, and / or A, B, C, etc.).

[0022] Figure 1 A flow chart of a method for detecting cracks in a pump casing of a single-casing slurry pump according to an embodiment of the present application is schematically shown.

[0023] like Figure 1 As shown, the method includes steps 101 to 104.

[0024] Step 101, obtaining a first instruction based on a response of a first system, wherein the execution process indicated by the first instruction involves a first control authority over an EFEM device, a control level of the first system is higher than a control level of a second system, and control timings of the first system and the second system are isolated from each other.

[0025] The first system refers to a local operating system with the highest control priority, which can be understood as an industrial control terminal directly physically connected to the EFEM device in the embodiment of the present application, and is used to perform key operation control during wafer transmission. The first system establishes a real-time communication connection with the EFEM device via industrial Ethernet or field bus, and is equipped with a touch screen or a dedicated control panel, allowing operators to perform direct operations next to the device.

[0026] Correspondingly, the second system refers to a remote operating system with secondary control priority, which can be understood as a remote maintenance terminal that accesses the EFEM device through a network connection in the embodiment of the present application, and is used to perform non-critical operation tasks such as device status monitoring, parameter adjustment, and fault diagnosis. Specifically, the second system establishes a remote connection with the EFEM device through an encrypted VPN channel to provide remote access capabilities for the technical support personnel or remote engineers of the equipment manufacturer.

[0027] There is a clear control hierarchy relationship and timing isolation mechanism between the first system and the second system. At the control level, the first system, as a local operating system, has the highest control priority, and the control instructions it issues have the highest execution authority. For example, when the first system performs a wafer loading operation, even if the second system has previously sent a parameter adjustment instruction, the system will give priority to responding to the control request of the first system to ensure the immediacy and continuity of local operations.

[0028] The first instruction refers to the original control instruction set sent by the first system, which can be understood as an operation instruction sequence containing complete execution process information in the embodiment of the present application, which is used to implement a specific wafer processing task. These instruction sequences contain key information such as execution time, operation parameters, and control authority, which directly determine the specific actions and operating status of the EFEM equipment.

[0029] Taking the wafer loading process as an example, a typical first instruction may include the following execution process: first control the robot arm to move to the FOUP wafer pickup position (duration=2s, authority=L1). This combination of operation parameters indicates that the operation requires 2 seconds of execution time and must have L1 level control authority to perform this operation, where duration indicates duration and authority indicates authorized control authority; then start the vacuum adsorption system (duration=0.5s, authority=L0), then perform wafer pre-alignment (duration=3s, authority=L0), and finally transfer the wafer to the target position (duration=3s, authority=L0). Each operation in the above execution process has its specific timing requirements and control authority, and the system needs to arrange a suitable execution time window accordingly.

[0030] Furthermore, the first control authority refers to the operation authorization level required during the execution of the first instruction, which can be understood as a multi-level authority system in the embodiment of the present application, for accurately controlling the access and operation authority of each functional module of the EFEM device. The above authority system ensures the security and controllability of device operation through authorizations at different levels.

[0031] Based on the above embodiment, as an optional embodiment, different first instructions indicate different execution processes, different execution processes involve at least one type of EFEM equipment, and different types of EFEM equipment are in different process stages and spatial states.

[0032] In actual application scenarios, EFEM equipment usually needs to process many different types of remote control instructions, which may involve different operation objectives such as equipment status monitoring, parameter adjustment, fault diagnosis, etc. Different types of remote control instructions often correspond to different execution processes, which may act on different types of EFEM equipment, such as robotic arms, vacuum adsorption systems, or alignment platforms. Since different types of EFEM equipment play different functional roles in the process, their process stages and spatial states are also significantly different.

[0033] Specifically, the system first needs to identify the type of execution process corresponding to the first instruction. By parsing the operating parameters and control targets in the first instruction, the system can determine which type of EFEM equipment the instruction is for. For example, when the first instruction involves wafer position adjustment, the system will identify it as an execution process related to the alignment platform; when the instruction includes vacuum pressure parameter adjustment, it is classified as a control process of the vacuum adsorption system. This process classification method based on instruction features enables the system to accurately grasp the operational requirements of different remote control tasks.

[0034] After determining the execution process type, the system needs to further evaluate the current process stage and spatial status of the relevant EFEM equipment. Since different types of EFEM equipment participate in different stages of the wafer processing process, their process status will also show different characteristics. For example, the robot arm may be in the critical stage of wafer transfer, while the vacuum adsorption system may be in standby mode. At the same time, there are also differences in the spatial status of different equipment, which is reflected in their relative position relationship with other equipment or wafers. The system provides a basis for subsequent permission control and timing management by monitoring these status information in real time.

[0035] By accurately identifying different execution processes and equipment states, the system can develop the best execution strategy for each remote control instruction. This differentiated control scheme not only improves the accuracy of remote operation, but also ensures the safe operation of different types of EFEM equipment in their respective process stages. For example, the system may allow parameter adjustments for equipment in standby mode, while applying stricter authority control to equipment that is executing critical processes. This dynamic management mechanism based on equipment type and status not only meets the diverse needs of remote maintenance, but also ensures the stability of the overall process.

[0036] Step 102 , obtaining a controllable timing sequence of the EFEM device, where the controllable timing sequence represents a time window in which the remote control can be performed under the process stage and spatial state of the EFEM device.

[0037] Among them, controllable timing refers to the set of time constraints that can be used to execute remote control of the equipment under specific process stages and spatial states. In the embodiment of the present application, it can be understood as a safe operation time window dynamically calculated based on the current operating state of the EFEM equipment, which is used to ensure that remote control instructions are safely executed without affecting local operations.

[0038] In order to accurately obtain controllable timing, the system needs to consider both the process stage and spatial state of the EFEM device. The process stage of the EFEM device refers to a specific stage in the sequence of operating states of the device during wafer transfer, which can be understood as a series of atomic operating units and their corresponding device state combinations in the embodiment of the present application, which is used to accurately describe the task progress and control requirements of the EFEM device during wafer transfer.

[0039] Exemplarily, a complete wafer transfer process includes multiple continuous operation stages. For example, in the process of loading wafers into the lithography machine, the equipment sequentially performs operations such as FOUP opening, wafer pre-alignment, robotic arm grabbing, path planning, and precise docking. The system determines the current specific process stage by real-time monitoring of equipment status parameters. Each process stage has its specific control characteristics and risk levels. For example, in the precise docking stage, since the robotic arm is performing sub-millimeter position adjustment, the control authority at this time is configured as follows: local authority maintains full control, while remote authority is limited to only allowing sensor data reading. This dynamic authority management mechanism based on process stages ensures that remote operations do not interfere with the execution of key actions of the equipment.

[0040] At the same time, the spatial state of the EFEM device refers to the real-time position information of each moving part of the device and its relative spatial relationship with the surrounding equipment. In the embodiment of the present application, it can be understood as a dynamic state description in a three-dimensional coordinate system established based on the EFEM device, which is used to evaluate the safety boundary and control authority range of the EFEM device operation in real time. By combining the process stage information with the spatial state information, the system can calculate the optimal controllable timing in real time, thereby realizing precise control of remote operation.

[0041] Based on the above embodiment, as an optional embodiment, step 102 may further include the following steps: Step 201: Acquire a process stage, where the process stage represents one of the stages of the EFEM device during the wafer transfer process.

[0042] Specifically, it is necessary to obtain the process stage of the EFEM equipment, which characterizes the specific operation stage of the equipment during the wafer transmission process. By obtaining the process stage information, the system can accurately determine the current operation status of the equipment, thereby providing a basic basis for the subsequent remote control authority allocation.

[0043] Specifically, state recognition can be performed based on a predefined set of process stages. The process stage set includes all key operation stages in the wafer transfer process, such as FOUP opening, wafer pre-alignment, robot grabbing, path planning, and precise docking. Each process stage has its own specific operation characteristics and state parameters. The system determines the current specific stage by collecting these characteristic parameters in real time.

[0044] For example, it is assumed that the EFEM equipment includes multiple process stages S during the wafer transfer process, and each stage Have different permission control requirements. Definition: ,in, represents the i-th process stage.

[0045] The current process stage of the equipment s(t): ; In the formula, Indicates that the device is in stage probability.

[0046] set up For stage The duration of the process stage satisfies: ; Step 202: Obtain the position and relative coordinates of the EFEM device.

[0047] Specifically, the system needs to obtain the position and relative coordinates of the EFEM device. By establishing a complete spatial state description, the system can monitor the device movement in real time, thereby providing precise spatial constraints for remote control.

[0048] Specifically, when the EFEM device corresponds to a robotic arm, the system first needs to obtain the real-time position coordinates of the end of the robotic arm. This is achieved by using a high-precision position sensor to collect the coordinate information of the robotic arm in three-dimensional space in real time. The robotic arm position information reflects the real-time spatial state of the actuator and is the core parameter for evaluating operational safety.

[0049] At the same time, the system also needs to obtain the real-time position coordinates of the wafer to be processed. The wafer position information is obtained through a combination of a visual system and a position sensor, and these data are used to calculate the relative position relationship between the robot arm and the wafer.

[0050] In addition, the system also needs to obtain the fixed coordinates of the equipment reference point. The equipment reference point is usually selected at the base position of the EFEM equipment to establish a unified spatial coordinate system. This reference coordinate system provides a stable benchmark for all spatial position calculations.

[0051] For example, when the EFEM device corresponds to a robotic arm, the spatial state of the device is defined as , including the robot arm position and device relative coordinates: Robotic arm position: ; Wafer location: ; Equipment reference point: .

[0052] Step 203: Based on the position and relative coordinates of the EFEM device, determine the relative area where the EFEM device is located during operation to obtain the spatial state.

[0053] Specifically, the system first needs to calculate the spatial distance between the robot arm and the wafer based on the acquired coordinates of the robot arm and the wafer. This distance is calculated by the Euclidean distance between two points in three-dimensional space, taking into account the horizontal and vertical position deviations. By calculating this spatial distance in real time, the system can dynamically monitor the proximity between the robot arm and the wafer.

[0054] For example, the system predefines a safe area radius, which is determined based on the equipment's operating characteristics and safety requirements. By comparing the real-time calculated spatial distance with the safe area radius, the system can determine whether the equipment has entered a critical operating area. When the spatial distance is less than the safe area radius, it indicates that the robot has entered a critical area that requires special control, and the system needs to adjust the control strategy accordingly.

[0055] Assuming the radius of the safety area is R, whether the device is in the critical area can be determined by the following: .

[0056] Step 204: Determine the controllable timing based on the process stage and the space state.

[0057] Specifically, the system needs to comprehensively determine the controllable timing of EFEM equipment based on the acquired process stage and spatial status information. By organically combining the information of the two dimensions of process progress and spatial position, the optimal execution time window for remote control operations can be determined, ensuring that remote maintenance activities can be carried out in a safe time period without affecting local operations.

[0058] The system first needs to analyze the timing characteristics of the current process stage. Each process stage has its standard execution time and key moments. For example, in the wafer pre-alignment stage, the system divides the stage into preparation period, core operation period and closing period. This timing division is based on process requirements and operation risk levels, providing basic constraints in the time dimension for remote control allocation.

[0059] At the same time, the system also needs to dynamically adjust the timing constraints based on the spatial state information. When the equipment is in a critical area, the system will tighten the range of controllable timing accordingly. For example, when the robot enters the safety area around the wafer, the remote operation authority within the current time window will be restricted, and only the necessary monitoring functions will be retained. This timing adjustment based on spatial state ensures that remote operation does not interfere with the precision positioning process.

[0060] Based on the above embodiment, as an optional embodiment, step 204 may further include the following steps: Step 301: Determine a first timing and a second timing based on a process stage and a spatial state, wherein the first timing is a maximum duration for which remote control can be performed, and the second timing is a risk duration for performing remote control, and the risk duration is determined by the relative position of at least one EFEM device and a wafer.

[0061] Among them, the first timing refers to the maximum allowed execution time of the remote control operation determined based on the characteristics of the current process stage. In the embodiment of the present application, it can be understood as the standard operation time interval divided according to the process flow of the EFEM equipment, which is used to limit the maximum duration of the remote control instruction in different process stages.

[0062] Correspondingly, the second timing refers to the potential risk duration obtained based on the equipment motion state assessment. In the embodiment of the present application, it can be understood as the safety protection time period obtained by real-time calculation of the relative position relationship between the EFEM equipment and the wafer, which is used to deduct the time interval where there may be operational risks from the maximum allowable execution time to ensure that remote control is executed within a safe time window.

[0063] Specifically, the system first calculates the safety control window based on the operating characteristics of the equipment in the process stage and spatial state. The window is obtained by subtracting the risk time from the maximum allowed execution time to ensure that the calculation result is always non-negative. Among them, the calculation of risk time needs to comprehensively consider two key factors: one is the probability of collision between the robot arm and the wafer, and the other is the probability of execution failure in the current process stage. These two probability values ​​are weighted and combined by different weight coefficients to obtain the final risk time assessment value.

[0064] When calculating the probability of collision, the system uses an exponential decay model based on spatial distance. The core of this mathematical model is that the closer the distance between the robot arm and the wafer, the probability of collision increases exponentially. This calculation method can accurately reflect the risk level of the equipment in different position states. At the same time, the probability of execution failure is predicted by analyzing historical operation data and using a machine learning model. This evaluation method based on empirical data can effectively capture potential risks at different process stages.

[0065] After obtaining the safety control window, the system needs to further determine the remote controllable timing. The safety control window can be compared with the preset minimum safety execution time. When the safety control window is greater than the minimum safety execution time, the system allows remote control within the time window; otherwise, remote operation is temporarily prohibited to ensure the safety of the equipment.

[0066] For example, The safety control window of the equipment in process stage S and space state X is defined as: ; In the formula, is the maximum allowed execution time, is the risk time, calculated according to the current process stage and space status: ; In the formula, The probability of the robot colliding with the wafer is calculated based on the position: ; In the formula, The probability of execution failure in the current stage is obtained based on the model trained based on historical data.

[0067] Set remote controllable timing : , ; in, is the minimum safe execution time of remote control, if If the value is less than this threshold, remote control is not allowed.

[0068] Step 302: Eliminate the second timing sequence based on the first timing sequence to determine a controllable timing sequence.

[0069] Specifically, the system first needs to build an initial time interval framework based on the first timing. This framework represents the theoretical executable time range of remote control operations under the current process stage. Then, the system removes the risk time corresponding to the second timing from this initial framework. This removal process needs to consider the continuity of time and the integrity of the operation. For example, when the risk time period overlaps with the original execution time, the system will give priority to ensuring the continuity of local operations and avoid high-risk periods by adjusting the execution timing of remote control.

[0070] Step 103: adjusting the first instruction to a second instruction based on the controllable timing, wherein the second control authority of the second instruction is less than or equal to the first control authority.

[0071] Among them, the second instruction refers to a set of remote control instructions that have undergone controllable timing constraints and authority adjustments. In the embodiment of the present application, it can be understood as an optimized instruction sequence reconstructed based on the first instruction that meets the requirements of the current process stage and spatial state, which is used to ensure that the remote operation is performed within a safe time window and avoid interference with local critical operations of the EFEM equipment.

[0072] Specifically, after obtaining a controllable timing sequence, the system needs to dynamically adjust the first instruction to generate a second instruction that adapts to the current operating environment, thereby ensuring that the remote control instruction can be executed within a safe time window and that the control authority does not exceed the range allowed by the system.

[0073] Specifically, the system first needs to analyze the execution characteristics of the first instruction, including its original execution timing and control authority requirements. For the adjustment of the execution timing, the system will map the execution time of the first instruction to the determined controllable timing range. When the original execution time of the instruction exceeds the controllable timing range, the system will adopt corresponding adjustment strategies, such as splitting the execution process into multiple subtasks, or rearranging the execution timing to ensure that each operation can be completed within a safe time window.

[0074] Based on the above embodiment, as an optional embodiment, step 103 may further include the following steps: Step 401: Determine an original timing of a first instruction, where the original timing is determined by the execution flow start time and duration indicated by the first instruction.

[0075] Among them, the original timing refers to the time execution plan contained in the first instruction before the system is adjusted. In the embodiment of the present application, it can be understood as the initial time interval composed of the start time point and the corresponding duration in the remote control instruction of the EFEM device, which is used to describe the expected execution timing of the remote operation task and provide a benchmark for subsequent dynamic adjustments.

[0076] Specifically, the system first needs to parse the timing parameter information from the first instruction. By identifying the start time mark in the instruction, the system determines the expected start time of the remote control operation. At the same time, the system also needs to extract the duration information, which indicates the time span required to complete the entire execution process.

[0077] Exemplarily, the time parameter of the first instruction is parsed to extract the instruction start time and duration ; The time window corresponding to the original timing of the first instruction The time window corresponding to the controllable timing corresponding to the current process stage and space state Make a comparison.

[0078] Step 402: reconstruct the original timing in the first instruction based on the controllable timing to obtain a second instruction.

[0079] Specifically, the system first needs to analyze the matching relationship between the original timing and the controllable timing. By comparing the execution time requirement of the first instruction with the current controllable timing window, the system can determine whether there is a timing conflict. When the original timing falls completely within the controllable timing range, the system can keep the timing arrangement of the first instruction unchanged. However, in most cases, the system needs to adjust the original timing, which includes both overall time shifting and splitting the continuous execution process into multiple independent operation units. For example, when remote control involves wafer loading tasks, the system may need to decompose the original continuous operation sequence into several subtasks and rearrange these subtasks to be executed within different controllable timing windows.

[0080] Exemplarily, if the time window corresponding to the original timing is completely included in the time window corresponding to the controllable timing, the first instruction is retained unchanged; if there is a time overlap conflict, the overlap interval is calculated to .

[0081] Based on the above embodiment, as an optional embodiment, step 402 may further include the following steps: Step 501: When the time window of the controllable timing is greater than or equal to the time window of the original timing, the execution process indicated by the first instruction is time-shifted to obtain a second instruction.

[0082] Specifically, when the safe time window provided by the controllable timing can fully accommodate the original timing, the system will preferentially use the timing shift strategy to adjust the first instruction. In this way, the entire operation sequence is transferred to a safer time interval for execution while maintaining the integrity of the original execution process. By shifting the entire operation rather than splitting and reconstructing it, the system can maximize the execution continuity and operational efficiency of the remote control instructions.

[0083] Specifically, the system first needs to determine the target position of the timing shift. By analyzing the start time and end time of the controllable timing window, the system selects an optimal time starting point so that the execution process after the shift can fall completely within the safe time range. When performing timing shifts, the system will keep the relative time intervals between each operation link in the original timing unchanged, and only shift the overall execution time. For example, when the first instruction includes continuous operations such as wafer pre-alignment and robot arm movement, the system will shift the entire operation sequence as a whole to the safe time window defined by the current controllable timing, while ensuring that the timing relationship between the operations remains unchanged.

[0084] Example, overall translation strategy: when When the first instruction is delayed as a whole to the nearest available time window, the adjusted time parameters are: .

[0085] Step 502: When the time window of the controllable timing is smaller than the time window of the original timing, the execution process indicated by the first instruction is split into multiple sub-processes within the controllable timing to obtain a second instruction.

[0086] Specifically, when the safe time window provided by the controllable timing cannot fully accommodate the original timing, the system needs to use a process splitting strategy to reconstruct the first instruction. In this way, the remote control operations that exceed a single controllable timing window can be reasonably allocated to multiple different safe time intervals for execution. By decomposing the continuous execution process into multiple relatively independent subtasks, the system can still complete all remote control requirements under limited controllable timing constraints.

[0087] Specifically, the system first needs to analyze the dependencies of each operation link in the first instruction. By evaluating the degree of correlation between different operation units in the execution process, the system determines the appropriate split boundary. When splitting the process, the system will give priority to ensuring the logical integrity of the operation and divide the operations with high correlation into the same sub-process. For example, when the first instruction contains operations such as wafer inspection and position adjustment, the system may schedule the inspection operation to be executed within the first available time window, and postpone the subsequent adjustment operation to the next safe time interval. At the same time, the system also needs to add necessary status checks and connection logic to these split sub-processes to ensure a smooth transition between each sub-process.

[0088] Exemplary, segmented execution strategy: when the controllable timing window length is insufficient, the first instruction is split into multiple sub-instructions ,satisfy: ,and, .

[0089] Step 104: respond to the second instruction based on the second system.

[0090] Specifically, after the generation of the second instruction is completed, the system needs to execute these optimized remote control instructions through the second system. Because the second system, as the execution subject of the remote operation, needs to accurately complete various control tasks under the premise of strictly following the controllable timing and authority constraints.

[0091] Specifically, the second system first needs to verify the legitimacy of the received second instruction. By checking the timing characteristics and permission levels of the instructions, it ensures that these instructions comply with the operating constraints of the current EFEM equipment. For example, the system verifies whether the execution time of the instruction falls within the predetermined controllable timing range, and whether the control authority required by the instruction does not exceed the range allowed by the system. This pre-execution verification mechanism can detect potential safety hazards before the instruction is actually executed.

[0092] After verification, the second system will implement remote control according to the timing arrangement in the second instruction and the predetermined execution process. For instructions that have undergone timing shifts, the system will fully execute the relevant operations within the adjusted time window; and for instructions that are split into multiple sub-processes, the system will execute each subtask in turn within different controllable timing intervals. During the execution process, the second system will continuously monitor the operating status of the EFEM equipment to ensure that remote operations do not interfere with the normal operation of the equipment. For example, when a local operation request is detected, the system will reasonably schedule the execution order of the remote control instructions according to the preset priority rules.

[0093] Through the response mechanism of the second system, remote control instructions can be effectively executed under the premise of ensuring safety. This execution method based on system response not only realizes the precise control of remote maintenance activities, but also establishes effective isolation between local operations and remote control. For example, when a remote control task is divided into multiple sub-processes, the second system can ensure that each sub-process is executed within the appropriate time window to avoid timing conflicts with local operations. This refined execution control mechanism ultimately achieves the unity of remote maintenance efficiency and equipment operation safety.

[0094] Based on the above embodiment, as an optional embodiment, when the execution process indicated by the first instruction involves the first control authority for at least two EFEM devices, the execution priority of the first instruction on each EFEM device is determined according to the controllable timing of each EFEM device.

[0095] Specifically, during the remote control process, when the first instruction needs to operate multiple EFEM devices at the same time, the system needs to determine the execution priority based on the controllable timing characteristics of each device, so as to reasonably coordinate the remote control sequence between multiple devices and avoid control failure due to timing conflicts between devices. By analyzing the controllable timing characteristics of each EFEM device, the system can formulate the optimal device control strategy to ensure the effective execution of remote operation in a multi-device environment.

[0096] Specifically, the system first needs to obtain the controllable timing information of all EFEM devices involved. By comparing the current working status and available time window of each device, the system evaluates the urgency and feasibility of each device to execute the remote control instructions. When determining the execution priority, the system will comprehensively consider multiple factors, including the idle time distribution of the equipment, the urgency of the process task, and the operational dependencies between the equipment. For example, when the remote control task involves the transmission of wafers between multiple EFEM devices, the system will give priority to the equipment with a shorter controllable timing window to perform related operations to avoid missing critical operation opportunities. At the same time, the system also needs to consider the spatial position relationship between the equipment and the material flow requirements to ensure that the allocation of priorities can support a continuous process flow.

[0097] Through the reasonable allocation of equipment priority, the system can better coordinate the remote control activities of multiple EFEM equipment. This priority scheduling mechanism based on controllable timing not only ensures the execution effect of each equipment control instruction, but also maintains the continuity of the overall process flow. For example, the system may adjust the multi-equipment linkage operation that originally needs to be executed simultaneously to a method of executing in sequence according to the priority order based on the controllable timing characteristics of each equipment, thereby avoiding mutual interference between equipment.

[0098] Figure 2The structural block diagram of a control device of an EFEM device provided by the present application is schematically shown, which may include: A first instruction obtaining module, configured to obtain a first instruction based on a first system response, wherein the execution process indicated by the first instruction involves a first control authority over the EFEM device; A controllable timing acquisition module, used to obtain the controllable timing of the EFEM device, wherein the controllable timing represents a time window in which remote control can be performed under the process stage and spatial state of the EFEM device; A second instruction obtaining module, configured to adjust the first instruction to a second instruction based on the controllable timing, wherein a second control authority of the second instruction is less than or equal to the first control authority; The second instruction response module is used to respond to the second instruction based on the second system, the control level of the first system is higher than the control level of the second system, and the control timings of the first system and the second system are isolated from each other.

[0099] Based on the above embodiment, as an optional embodiment, different first instructions indicate different execution processes, different execution processes involve at least one type of EFEM equipment, and different types of EFEM equipment are in different process stages and spatial states.

[0100] Based on the above embodiments, as an optional embodiment, the controllable timing acquisition module is also used to obtain a process stage, wherein the process stage represents one of the stages of the EFEM device in the wafer transmission process; obtain the position and relative coordinates of the EFEM device; based on the position and relative coordinates of the EFEM device, determine the relative area where the EFEM device is located during operation to obtain a spatial state; and determine the controllable timing based on the process stage and the spatial state.

[0101] On the basis of the above embodiment, as an optional embodiment, the controllable timing acquisition module is also used to determine the first timing and the second timing based on the process stage and the spatial state; the second timing is eliminated based on the first timing to determine the controllable timing; wherein the first timing is the maximum duration for which remote control can be executed, and the second timing is the risk duration for executing remote control, and the risk duration is determined by the relative position of at least one of the EFEM devices and the wafer.

[0102] Based on the above embodiment, as an optional embodiment, the second instruction acquisition module is also used to determine the original timing of the first instruction, and the original timing is determined by the start time and duration of the execution process indicated by the first instruction; based on the controllable timing, the original timing in the first instruction is reconstructed to obtain the second instruction.

[0103] On the basis of the above embodiments, as an optional embodiment, the second instruction acquisition module is also used to, when the time window of the controllable timing is greater than or equal to the time window of the original timing, perform timing shift on the execution process indicated by the first instruction to obtain the second instruction; when the time window of the controllable timing is less than the time window of the original timing, split the execution process indicated by the first instruction into multiple sub-processes within the controllable timing to obtain the second instruction.

[0104] Based on the above embodiment, as an optional embodiment, the first instruction obtaining module is further used to determine the execution priority of the first instruction on each EFEM device according to the controllable timing of each EFEM device when the execution process indicated by the first instruction involves the first control authority for at least two EFEM devices.

[0105] It should be noted that the control device part of the EFEM device in the embodiment of the present application corresponds to the control method part of the EFEM device in the embodiment of the present application. The description of the data processing system part specifically refers to the data processing method part, which will not be repeated here.

[0106] Figure 3 The structural block diagram of an electronic device suitable for implementing the method described above according to an embodiment of the present application is schematically shown. Figure 3 The electronic device shown is merely an example and should not bring any limitation to the functions and scope of use of the embodiments of the present application.

[0107] like Figure 3 As shown, the electronic device 300 according to an embodiment of the present application includes a processor 301, which can perform various appropriate actions and processes according to a program stored in a read-only memory (ROM) 302 or a program loaded from a storage part 308 to a random access memory (RAM) 303. The processor 301 may include, for example, a general-purpose microprocessor (such as a CPU), an instruction set processor and / or a related chipset and / or a dedicated microprocessor (for example, an application-specific integrated circuit (ASIC)), etc. The processor 301 may also include an onboard memory for caching purposes. The processor 301 may include a single processing unit or multiple processing units for performing different actions of the method flow according to an embodiment of the present application.

[0108] In RAM 303, various programs and data required for the operation of electronic device 300 are stored. Processor 301, ROM 302 and RAM 303 are connected to each other via bus 304. Processor 301 performs various operations of the method flow according to the embodiment of the present application by executing the program in ROM 302 and / or RAM 303. It should be noted that the program can also be stored in one or more memories other than ROM 302 and RAM 303. Processor 301 can also perform various operations of the method flow according to the embodiment of the present application by executing the program stored in the one or more memories.

[0109] According to an embodiment of the present application, the electronic device 300 may further include an input / output (I / O) interface 305, which is also connected to the bus 304. The system 300 may further include one or more of the following components connected to the input / output (I / O) interface 305: an input portion 306 including a keyboard, a mouse, etc.; an output portion 307 including a cathode ray tube (CRT), a liquid crystal display (LCD), etc., and a speaker, etc.; a storage portion 308 including a hard disk, etc.; and a communication portion 309 including a network interface card such as a LAN card, a modem, etc. The communication portion 309 performs communication processing via a network such as the Internet. A drive 310 is also connected to the input / output (I / O) interface 305 as needed. A removable medium 311, such as a magnetic disk, an optical disk, a magneto-optical disk, a semiconductor memory, etc., is installed on the drive 310 as needed, so that a computer program read therefrom is installed into the storage portion 308 as needed.

[0110] According to an embodiment of the present application, the method flow according to the embodiment of the present application can be implemented as a computer software program. For example, an embodiment of the present application includes a computer program product, which includes a computer program carried on a computer-readable storage medium, and the computer program includes a program code for executing the method shown in the flowchart. In such an embodiment, the computer program can be downloaded and installed from the network through the communication part 309, and / or installed from the removable medium 311. When the computer program is executed by the processor 301, the above-mentioned functions defined in the system of the embodiment of the present application are executed. According to an embodiment of the present application, the system, equipment, device, module, unit, etc. described above can be implemented by a computer program module.

[0111] The present application also provides a computer-readable storage medium, which may be included in the device / apparatus / system described in the above embodiments; or may exist independently without being assembled into the device / apparatus / system. The above computer-readable storage medium carries one or more programs, and when the above one or more programs are executed, the method according to the embodiment of the present application is implemented.

[0112] According to an embodiment of the present application, the computer-readable storage medium may be a non-volatile computer-readable storage medium. For example, it may include, but is not limited to: a portable computer disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination thereof. In the present application, a computer-readable storage medium may be any tangible medium containing or storing a program that may be used by or in combination with an instruction execution system, apparatus, or device.

[0113] For example, according to an embodiment of the present application, the computer-readable storage medium may include the ROM 302 and / or the RAM 303 described above and / or one or more memories other than the ROM 302 and the RAM 303 .

[0114] An embodiment of the present application also includes a computer program product, which includes a computer program, which contains program code for executing the method provided by the embodiment of the present application. When the computer program product runs on an electronic device, the program code is used to enable the electronic device to implement the method provided by the embodiment of the present application.

[0115] When the computer program is executed by the processor 301, the above functions defined in the system / device of the embodiment of the present application are executed. According to the embodiment of the present application, the system, device, module, unit, etc. described above can be implemented by a computer program module.

[0116] In one embodiment, the computer program may rely on tangible storage media such as optical storage devices, magnetic storage devices, etc. In another embodiment, the computer program may also be transmitted and distributed in the form of signals on a network medium, and downloaded and installed through the communication part 309, and / or installed from the removable medium 311. The program code contained in the computer program may be transmitted using any appropriate network medium, including but not limited to: wireless, wired, etc., or any suitable combination of the above.

[0117] According to an embodiment of the present application, the program code for executing the computer program provided by the embodiment of the present application can be written in any combination of one or more programming languages, and specifically, these computing programs can be implemented using high-level process and / or object-oriented programming languages, and / or assembly / machine languages. Programming languages ​​include, but are not limited to, such as Java, C++, python, "C" language or similar programming languages. The program code can be executed entirely on the user computing device, partially on the user device, partially on the remote computing device, or completely on the remote computing device or server. In the case of a remote computing device, the remote computing device can be connected to the user computing device through any type of network, including a local area network (LAN) or a wide area network (WAN), or can be connected to an external computing device (e.g., using an Internet service provider to connect through the Internet).

[0118] The flowcharts and block diagrams in the accompanying drawings illustrate the possible implementation architecture, functions and operations of the systems, methods and computer program products according to various embodiments of the present application. In this regard, each box in the flowchart or block diagram may represent a module, a program segment, or a part of a code, and the above-mentioned module, program segment, or a part of the code contains one or more executable instructions for implementing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the box may also occur in an order different from that marked in the accompanying drawings. For example, two boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, depending on the functions involved. It should also be noted that each box in the block diagram or flowchart, and the combination of boxes in the block diagram or flowchart, can be implemented with a dedicated hardware-based system that performs a specified function or operation, or can be implemented with a combination of dedicated hardware and computer instructions. It can be understood by those skilled in the art that the features recorded in the various embodiments and / or claims of the present application can be combined and / or combined in a variety of ways, even if such a combination or combination is not explicitly recorded in the present application. In particular, without departing from the spirit and teachings of the present application, the features described in the various embodiments and / or claims of the present application may be combined and / or coupled in a variety of ways. All of these combinations and / or couplings fall within the scope of the present application.

[0119] The embodiments of the present application are described above. However, these embodiments are only for the purpose of illustration, and are not intended to limit the scope of the present application. Although the embodiments are described above, this does not mean that the measures in the various embodiments cannot be used in combination. The scope of the present application is limited by the attached claims and their equivalents. Without departing from the scope of the present application, those skilled in the art may make various substitutions and modifications, which should all fall within the scope of the present application.

Claims

1. A control method for an EFEM device, characterized in that: include: obtaining a first instruction based on the first system response, wherein the execution process indicated by the first instruction involves a first control authority over the EFEM device; Acquire a controllable timing sequence of the EFEM device, wherein the controllable timing sequence represents a time window in which remote control can be performed under a process stage and a spatial state of the EFEM device; Adjusting the first instruction to a second instruction based on the controllable timing, wherein a second control authority of the second instruction is less than or equal to the first control authority; Based on the second system responding to the second instruction, the control level of the first system is higher than the control level of the second system, and the control timings of the first system and the second system are isolated from each other.

2. The control method of the EFEM device according to claim 1, characterized in that: Different first instructions indicate different execution processes, and different execution processes involve at least one type of EFEM equipment. Different types of EFEM equipment are in different process stages and spatial states.

3. The control method of the EFEM device according to claim 2, characterized in that: The obtaining of the controllable timing of the EFEM device comprises: Acquire a process stage, wherein the process stage represents one of the stages of the EFEM device during the wafer transfer process; Obtaining the position and relative coordinates of the EFEM device; Based on the position and relative coordinates of the EFEM device, determine the relative area where the EFEM device is running to obtain a spatial state; Based on the process stage and the spatial state, a controllable timing is determined.

4. The control method of the EFEM device according to claim 3, characterized in that: The determining of the controllable timing based on the process stage and the space state comprises: determining a first timing and a second timing based on the process stage and the spatial state; Taking the first time sequence as a reference, eliminating the second time sequence to determine a controllable time sequence; The first timing is the maximum duration for which remote control can be performed, and the second timing is the risk duration for performing remote control, wherein the risk duration is determined by the relative position of at least one of the EFEM devices and the wafer.

5. The control method of the EFEM device according to claim 2, characterized in that: The adjusting the first instruction to the second instruction based on the controllable timing comprises: Determine an original timing of the first instruction, wherein the original timing is determined by a start time and a duration of an execution process indicated by the first instruction; The original timing in the first instruction is reconstructed based on the controllable timing to obtain a second instruction.

6. The control method of the EFEM device according to claim 5, characterized in that: The reconstructing the original timing in the first instruction based on the controllable timing to obtain the second instruction comprises: When the time window of the controllable timing is greater than or equal to the time window of the original timing, performing timing shift on the execution process indicated by the first instruction to obtain a second instruction; In the case where the time window of the controllable timing is smaller than the time window of the original timing, the execution process indicated by the first instruction is split into multiple sub-processes within the controllable timing to obtain a second instruction.

7. The control method of the EFEM device according to claim 2, characterized in that: Also includes: When the execution process indicated by the first instruction involves first control rights over at least two EFEM devices, the execution priority of the first instruction over each of the EFEM devices is determined according to the controllable timing of each of the EFEM devices.

8. A control device for EFEM equipment, characterized in that: include: A first instruction obtaining module, configured to obtain a first instruction based on a first system response, wherein the execution process indicated by the first instruction involves a first control authority over the EFEM device; A controllable timing acquisition module, used to obtain the controllable timing of the EFEM device, wherein the controllable timing represents a time window in which remote control can be performed under the process stage and spatial state of the EFEM device; A second instruction obtaining module, configured to adjust the first instruction to a second instruction based on the controllable timing, wherein a second control authority of the second instruction is less than or equal to the first control authority; The second instruction response module is used to respond to the second instruction based on the second system, the control level of the first system is higher than the control level of the second system, and the control timings of the first system and the second system are isolated from each other.

9. An electronic device, characterized in that: include: one or more processors; a memory for storing one or more programs, When the one or more programs are executed by the one or more processors, the one or more processors implement the control method of the EFEM device according to any one of claims 1 to 7.

10. A computer-readable storage medium having executable instructions stored thereon, which, when executed by a processor, enables the processor to implement the control method of the EFEM device according to any one of claims 1 to 7.

Images