A jet structure and plasma etching machine

Abstract

The application discloses a kind of jet structure and plasma etching machine.The jet structure includes air inlet pipe cover, can be communicated with gas source;Jet member is detachably connected with air inlet pipe cover, and jet member and air inlet pipe cover form accommodating space after being connected;Gas path switching member is movably arranged in accommodating space;Wherein, gas path switching member is provided with gas through hole group, jet member is provided with jet hole group, the number of gas through hole group and jet hole group is multiple group, and each group of jet hole group corresponds a group of gas through hole group, the jet direction of each group of jet hole group is different, based on the movable setting of gas path switching member, the conduction of jet hole group and its corresponding gas through hole group can be switched to the conduction of another jet hole group and another gas through hole group.The jet structure can realize multiple direction jet, with the continuity movement of gas path switching member, the jet structure can also realize the periodic jet of multiple directions, improve plasma concentration uniformity, so that the uniformity of plasma etching is improved.

Description

Technical Field

[0001] This invention relates to the field of jet structure technology, and more particularly to a jet structure and a plasma etching machine. Background Technology

[0002] Plasma etching machines, also known as plasma planar etching machines, plasma etching machines, or plasma surface treatment instruments, are used in the semiconductor industry. Inductively Coupled Plasma (ICP) etching is the result of a combination of chemical and physical processes. The basic principle is that under low vacuum and pressure, the radio frequency output generated by the ICP power supply (ICP stands for Inductively Coupled Plasma) is sent to a ring coupling coil. A certain proportion of mixed etching gas is coupled through glow discharge to generate high-density plasma. Under the action of the RF (Radio Frequency) at the lower electrode, this plasma bombards the substrate surface, breaking the chemical bonds of the semiconductors in the patterned areas of the substrate. This breaks the chemical bonds and generates volatile substances with the etching gas, which then detach from the substrate in gaseous form and are extracted from the vacuum line.

[0003] The jet structure used in existing plasma etching machines can only achieve air intake in one direction, which is relatively simple. Moreover, the uniformity of plasma concentration in the chamber is poor, resulting in poor etching uniformity.

[0004] Therefore, how to broaden the functionality of the jet structure and improve the uniformity of plasma etching are technical problems that need to be solved by those skilled in the art. Summary of the Invention

[0005] In view of this, the object of the present invention is to provide a jet structure to broaden the functionality of the jet structure and improve the uniformity of plasma etching.

[0006] To achieve the above objectives, the present invention provides the following technical solution:

[0007] A jet structure, comprising:

[0008] The intake manifold sleeve allows it to communicate with the air source;

[0009] The jet component is detachably connected to the intake pipe sleeve, and the jet component forms a receiving space after being connected to the intake pipe sleeve;

[0010] The air circuit switching component is movably disposed within the accommodating space;

[0011] The gas path switching component is provided with a gas through-hole group, and the jet component is provided with a jet hole group. There are multiple groups of gas through-hole groups and jet hole groups, and each group of jet hole groups corresponds to a group of gas through-hole groups. The jet direction of each group of jet hole groups is different. Based on the movable setting of the gas path switching component, the connection between the jet hole group and its corresponding gas through-hole group can be switched to the connection between another jet hole group and another gas through-hole group.

[0012] Optionally, in the above-described jet structure, the air path switching component is rotatably disposed within the accommodating space.

[0013] Optionally, in the above-described jet structure, the gas path switching component includes a switching shaft and a gas path switching disk, the axis of the switching shaft is perpendicular to the gas path switching disk, and the gas through-hole group is disposed on the gas path switching disk.

[0014] Optionally, in the above-mentioned jet structure, the number of jet hole groups is three, namely a first jet hole group, a second jet hole group, and a third jet hole group;

[0015] The number of gas through-hole groups is three, namely the first gas through-hole group, the second gas through-hole group and the third gas through-hole group, which correspond to the first jet hole group, the second jet hole group and the third jet hole group, respectively.

[0016] When the gas path switching component rotates to the first preset position, the first gas through hole group and the first jet hole group are connected; when the gas path switching component rotates to the second preset position, the second gas through hole group and the second jet hole group are connected; when the gas path switching component rotates to the third preset position, the third gas through hole group and the third jet hole group are connected.

[0017] Optionally, in the above-described jet structure, the jet direction of the first jet hole group is vertically downward, the jet direction of the second jet hole group is inclined downward in the vertical direction, and the jet direction of the third jet hole group is perpendicular to the vertical direction.

[0018] Optionally, in the above-described jet structure, the first jet hole group is disposed on the side of the second jet hole group closer to the center of the jet member, and the third jet hole group is disposed on the side of the second jet hole group away from the center of the jet member.

[0019] The first gas through-hole group is located on the side of the second gas through-hole group close to the center of the gas passage switching disk, and the third gas through-hole group is located on the side of the second gas through-hole group away from the center of the gas passage switching disk.

[0020] Optionally, in the above-mentioned jet structure, the first jet hole group includes a plurality of downward jet holes, the second jet hole group includes a plurality of downward angled jet holes, and the third jet hole group includes a plurality of side jet holes, wherein the number of downward jet holes, downward angled jet holes, and side jet holes are all equal, and the plurality of downward jet holes, downward angled jet holes, and side jet holes are all arranged in a circular array with the center of the jet component as the array center;

[0021] The first gas through-hole group includes multiple downward gas through-holes, the second gas through-hole group includes multiple downward oblique gas through-holes, and the third gas through-hole group includes multiple side gas through-holes. The number of downward gas through-holes, downward oblique gas through-holes, and side gas through-holes are all equal, and the multiple downward gas through-holes, downward oblique gas through-holes, and side gas through-holes are arranged in a circular array with the center of the gas channel switching disk as the array center.

[0022] Optionally, in the above-mentioned jet structure, the centers of the corresponding downward jet hole, the oblique downward jet hole, and the lateral jet hole are all located on the same radial straight line of the jet component, and the corresponding downward gas through hole, the oblique downward gas through hole, and the lateral gas through hole are all offset from each other in the circumferential direction of the air passage switching disk.

[0023] Optionally, in the above-described jet structure, the corresponding downward jet hole, oblique jet hole, and lateral jet hole are offset from each other in the circumferential direction of the jet component, and the centers of the corresponding downward gas passage, oblique gas passage, and lateral gas passage are all located on the same radial straight line of the airway switching disk.

[0024] Optionally, in the above-described jet structure, the axis of the downward jet hole is parallel to the vertical direction, the axis of the downward oblique jet hole is inclined to the vertical direction, and the axis of the lateral jet hole includes a first axis portion parallel to the vertical direction and a second axis portion perpendicular to the first axis portion.

[0025] Optionally, in the above-mentioned jet structure, the airway switching disk is provided with a combined airway groove, which is formed by extending radially along the airway switching disk. Each downward jet hole has an oblique downward jet hole and a lateral jet hole arranged on the same radial straight line as its center.

[0026] Wherein, when the air path switching component moves to the fourth preset position, the combined air passage groove is simultaneously connected to the first jet hole group and the second jet hole group; or, when the air path switching component moves to the fourth preset position, the combined air passage groove is simultaneously connected to the first jet hole group, the second jet hole group, and the third jet hole group; or, when the air path switching component moves to the fourth preset position, the combined air passage groove is simultaneously connected to the second jet hole group and the third jet hole group; or, when the air path switching component moves to the fourth preset position, the combined air passage groove is simultaneously connected to the first jet hole group and the third jet hole group.

[0027] Optionally, in the above-described jet structure, the length of the combined air passage slot is greater than the radial distance between the downward jet hole and the oblique jet hole;

[0028] Alternatively, the length of the combined air passageway is greater than the distance between the downward jet port and the side jet port;

[0029] Alternatively, the length of the combined air passageway is greater than the distance between the downward-sloping jet orifice and the lateral jet orifice;

[0030] Alternatively, in the circumferential direction of the jet, the corresponding downward jet, oblique jet, and lateral jet are all offset from each other, the length of the combined air passage groove is greater than the radial distance between the downward jet and the lateral jet, and the combined air passage groove extends along the line connecting the centers of the downward jet and the lateral jet.

[0031] Optionally, in the above-mentioned jet structure, the air path switching component further includes an air distribution disk disposed on the switching shaft, wherein a plurality of air distribution holes are evenly distributed on the air distribution disk, and the shape and size of the plurality of air distribution holes are all equal.

[0032] Optionally, in the above-described jet structure, the jet structure further includes a rotary drive for driving the air path switching component to rotate, and the air path switching component is connected to the rotation output shaft of the rotary drive component via a coupling.

[0033] Optionally, in the above-mentioned jet structure, the air intake sleeve is provided with an air intake pipe that can communicate with the air source.

[0034] Optionally, the above-described jet structure further includes a controller electrically connected to the rotary drive to control the jet hole group to perform periodic pulse jetting in multiple directions.

[0035] Optionally, in the above-described jet structure, the air path switching component and the air intake sleeve are sealed with a magnetohydrodynamic seal or a sealing ring.

[0036] A plasma etching machine, comprising the jet structure described above.

[0037] Optionally, the plasma etching machine described above also includes a plasma reaction chamber, a vacuum pump, a pressure control valve, an excitation radio frequency power supply, a plasma coupling coil, a bias radio frequency power supply, and a bias electrode.

[0038] The vacuum pump is connected to the plasma reaction chamber, the pressure control valve is located on the connecting pipe between the plasma reaction chamber and the vacuum pump, the plasma coupling coil is electrically connected to the excitation radio frequency power supply, the bias radio frequency power supply is electrically connected to the bias electrode, and the plasma coupling coil and the bias electrode are located in the plasma reaction chamber.

[0039] Optionally, the plasma etching machine described above also includes a ceramic dielectric window and a shielding cover;

[0040] The ceramic dielectric window is disposed in the plasma reaction chamber, the jet structure is disposed in the ceramic dielectric window, and the shield is disposed on the outside of the plasma reaction chamber.

[0041] Optionally, in the plasma etching machine described above, a magnetohydrodynamic seal or a sealing ring seal is used between the jet structure and the ceramic dielectric window.

[0042] When using the jet structure provided by this invention, since the jet component and the intake pipe sleeve are detachably connected, and the connection between the jet component and the intake pipe sleeve forms a receiving space, the gas path switching component is movably disposed within the receiving space. The gas path switching component is provided with a group of gas through holes, and the jet component is provided with a group of jet holes. Based on the movable arrangement of the gas path switching component, the connection between the jet hole group and its corresponding gas through hole group can be switched to the connection between another jet hole group and another gas through hole group. Therefore, the intake pipe sleeve is connected to the air source, and the airflow flows sequentially through the receiving space, the gas through hole group, and the jet hole group, achieving air intake through the jet hole group. Since there are multiple groups of gas through holes and jet hole groups, and each group of jet hole groups corresponds to a group of gas through holes, Each group of jet nozzles has a different jet direction. Based on the movable arrangement of the gas path switching component, the connection between a jet nozzle group and its corresponding gas through-hole group can be switched to the connection between another jet nozzle group and another gas through-hole group. Therefore, this jet structure can achieve jetting in multiple directions and, based on the movable arrangement of the gas path switching component, can achieve switching between multiple jet directions. For example, in a specific embodiment of the present invention, three groups of jet nozzles are set up: a first jet nozzle group, a second jet nozzle group, and a third jet nozzle group. The jetting directions of the first, second, and third jet nozzle groups are vertically downward, inclined downward, and perpendicular to the vertical direction, respectively. Three groups of gas through-holes are also set up, and the three groups of gas through-holes... The orifice groups are a first gas through-hole group, a second gas through-hole group, and a third gas through-hole group, which correspond to the first jet orifice group, the second jet orifice group, and the third jet orifice group, respectively. Based on the movable arrangement of the gas path switching component, when the gas path switching component moves to the first preset position, the first gas through-hole group and the first jet orifice group are connected, and the airflow direction of the jet structure is vertically downward. When the gas path switching component moves to the second preset position, the second gas through-hole group and the second jet orifice group are connected, and the airflow direction of the jet structure is inclined downward. When the gas path switching component moves to the third preset position, the third gas through-hole group and the third jet orifice group are connected. The airflow direction of this jet structure is perpendicular to the vertical direction. Therefore, applying this jet structure to a plasma etching machine can not only meet the downward jetting requirements of the etching process, but also meet the requirements of lateral or inclined downward air intake during plasma cleaning of the chamber, thus broadening the functionality of the jet structure. At the same time, based on the movable setting of the gas path switching component, the connection between the jet hole group and its corresponding gas through hole group can be switched to the connection between another jet hole group and another gas through hole group. Therefore, with the continuous movement of the gas path switching component, this jet structure can also achieve periodic jetting in multiple directions, improving the uniformity of plasma concentration in the chamber and thus improving the uniformity of plasma etching. Attached Figure Description

[0043] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0044] Figure 1 This is a cross-sectional view of a first jet hole group and a first gas through hole group aligned and connected according to an embodiment of the present invention.

[0045] Figure 2 This is a cross-sectional view of a second jet hole group and a second gas through hole group when aligned and connected, as provided in an embodiment of the present invention.

[0046] Figure 3 This is a cross-sectional view of a third jet hole group and a third gas through hole group aligned and connected according to an embodiment of the present invention.

[0047] Figure 4 This is a cross-sectional view of a combined air passageway that is simultaneously connected to a first jet hole group and a second jet hole group, as provided in an embodiment of the present invention.

[0048] Figure 5 This is a top view of a jet component provided in an embodiment of the present invention;

[0049] Figure 6 This is a schematic diagram of the structure of a gas path switching component provided in an embodiment of the present invention;

[0050] Figure 7 This is a schematic diagram of the hole layout on an air jet component provided in an embodiment of the present invention;

[0051] Figure 8 This is a schematic diagram of the hole layout on an airway switching disc provided in an embodiment of the present invention;

[0052] Figure 9 This is a top view of a first jet hole group and a first gas through hole group aligned and connected according to an embodiment of the present invention.

[0053] Figure 10 This is a top view of the structure of a second jet hole group and a second gas through hole group when they are aligned and connected, as provided in an embodiment of the present invention.

[0054] Figure 11 A top view of the structure when the third jet hole group and the third gas through hole group are aligned and connected according to an embodiment of the present invention;

[0055] Figure 12This is a top view of a combined air passageway that is simultaneously connected to a first jet hole group and a second jet hole group, as provided in an embodiment of the present invention.

[0056] Figure 13 A schematic diagram of the periodic pulse jet flow rate of a jet structure switching between a first jet hole group and a second jet hole group, provided in an embodiment of the present invention.

[0057] Figure 14 This is a schematic diagram of the periodic pulse jet flow rate of a jet structure switching between a first jet hole group, a second jet hole group, and a third jet hole group, provided in an embodiment of the present invention.

[0058] Figure 15 This is a schematic diagram of the periodic jet flow rate of a jet structure provided in an embodiment of the present invention, which involves jetting from a first jet hole group, a second jet hole group, and a third jet hole group, as well as the simultaneous jetting from the first jet hole group and the second jet hole group.

[0059] Figure 16 This is a schematic diagram of the working process of a jet structure provided in an embodiment of the present invention;

[0060] Figure 17 This is a schematic diagram of a jet structure applied to a plasma etching machine, as provided in an embodiment of the present invention.

[0061] Among them, 100 is the air inlet sleeve, 101 is the first sealing ring, 102 is the air inlet pipe, 200 is the jet component, 201 is the first jet hole group, 202 is the second jet hole group, 203 is the third jet hole group, 300 is the gas path switching component, 301 is the switching shaft, 302 is the gas passage switching plate, 3021 is the first gas through hole group, 3022 is the second gas through hole group, 3023 is the third gas through hole group, 3024 is the combined gas passage groove, 303 is the gas equalization plate, 400 is the rotary drive component, 401 is the coupling, 500 is the plasma reaction chamber, 501 is the plasma coupling coil, 502 is the bias electrode, 503 is the ceramic dielectric window, 5031 is the second sealing ring, 504 is the shielding cover, 600 is the vacuum pump, 700 is the pressure control valve, 800 is the excitation radio frequency power supply, and 900 is the bias radio frequency power supply. Detailed Implementation

[0062] In view of this, the core of the present invention lies in providing a jet structure to broaden the functionality of the jet structure and improve the uniformity of plasma etching.

[0063] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0064] like Figures 1 to 17 As shown in the figure, an embodiment of the present invention discloses a jet structure, characterized in that it includes an intake pipe sleeve 100, a jet component 200, and an air path switching component 300.

[0065] The intake manifold 100 is connected to an air source; the jet component 200 is detachably connected to the intake manifold 100, and the connection between the jet component 200 and the intake manifold 100 forms a receiving space; the air path switching component 300 is movably disposed within the receiving space; the air path switching component 300 is provided with a group of gas through holes, and the jet component 200 is provided with a group of jet holes. The number of both the gas through hole group and the jet hole group is multiple, and each group of jet holes corresponds to a group of gas through holes. The jet direction of each group of jet holes is different. Based on the movable arrangement of the air path switching component 300, the connection between the jet hole group and its corresponding gas through hole group can be switched to the connection between another jet hole group and another gas through hole group.

[0066] When using the jet structure provided by this invention, since the jet component 200 is detachably connected to the intake pipe sleeve 100, and the jet component 200 and the intake pipe sleeve 100 form a receiving space after connection, the air path switching component 300 is movably disposed within the receiving space. The air path switching component 300 is provided with a gas through-hole group, and the jet component 200 is provided with a jet hole group. Based on the movable arrangement of the air path switching component 300, the connection between the jet hole group and its corresponding gas through-hole group can be switched to the connection between another jet hole group and another gas through-hole group. Therefore, the intake pipe sleeve 100 is connected to the air source, and the airflow flows sequentially through the receiving space, the gas through-hole group, and the jet hole group, achieving air intake through the jet hole group; since the gas through-hole group and the jet hole group are connected to the intake pipe sleeve 100, the airflow flows sequentially through the receiving space, the gas through-hole group, and the jet hole group. The number of air vent groups is multiple, and each group of air vent groups corresponds to a group of gas through holes. The injection direction of each group of air vent groups is different. Based on the movable setting of the air path switching component 300, the connection between the air vent group and its corresponding gas through hole group can be switched to the connection between another air vent group and another gas through hole group. Therefore, this injection structure can realize injection in multiple directions and realize the switching of multiple injection directions based on the movable setting of the air path switching component 300. For example, in a specific embodiment of the present invention, the air vent groups are set to three groups, namely the first air vent group 201, the second air vent group 202 and the third air vent group 203. The first air vent group 201, the second air vent group 202, the third air vent group 203, the first air vent group 202, the second air vent group 203, the third air vent group 202, the third ...2, the third air vent group 203, the third air vent group 202, the third air vent group 202, the third air vent group 203, the third air vent group 202, the third air vent group 202, the third air vent group 202, the third air vent group 202, the third air vent group 202, the third air vent group 202, the third air vent group 202, the third air vent group 202, the third air vent group 20 The injection directions of group 202 and the third jet hole group 203 are vertically downward, inclined downward, and perpendicular to the vertical direction, respectively. There are three gas through-hole groups: a first gas through-hole group 3021, a second gas through-hole group 3022, and a third gas through-hole group 3023. These groups correspond to the first jet hole group 201, the second jet hole group 202, and the third jet hole group 203, respectively. Based on the movable configuration of the gas path switching component 300, when the gas path switching component 300 can move to the first preset position, the first gas through-hole group 3021 and the first jet hole group 201... The airflow jetting direction of this jetting structure is vertically downward. When the gas path switching component 300 moves to the second preset position, the second gas through hole group 3022 and the second jet hole group 202 are connected, and the airflow jetting direction of this jetting structure is inclined downward. When the gas path switching component 300 moves to the third preset position, the third gas through hole group 3023 and the third jet hole group 203 are connected, and the airflow jetting direction of this jetting structure is perpendicular to the vertical direction. Therefore, applying this jetting structure to a plasma etching machine can not only meet the downward jetting requirements of the etching process, but also meet the lateral or inclined downward air intake requirements during plasma cleaning of the chamber, thus broadening the function of the jetting structure.Meanwhile, based on the movable arrangement of the gas path switching component 300, the connection between the jet nozzle group and its corresponding gas through-hole group can be switched to the connection between another jet nozzle group and another gas through-hole group. Therefore, with the continuous movement of the gas path switching component 300, this jet structure can also achieve periodic jetting in multiple directions, improving the uniformity of plasma concentration in the chamber and thus improving the uniformity of plasma etching.

[0067] It should be noted that the above-mentioned gas path switching component 300 can move by reciprocating linear motion or rotation, and any type of motion that can meet the usage requirements is within the protection scope of this invention; Optionally, in a specific embodiment of this invention, the gas path switching component 300 is rotatably disposed in the accommodating space so that the gas path switching component 300 can switch multiple gas injection directions by rotating.

[0068] like Figure 6 As shown, the gas path switching component 300 includes a switching shaft 301 and a gas path switching disk 302. The axis of the switching shaft 301 is perpendicular to the gas path switching disk 302. A gas through-hole group is disposed on the gas path switching disk 302 so that the gas path switching disk 302 rotates with the switching shaft 301. Based on the rotation of the gas path switching disk 302, the gas through-hole group on the gas path switching disk 302 also rotates accordingly, thereby realizing the switching of multiple gas injection directions.

[0069] This invention does not impose specific limitations on the number and arrangement of the above-mentioned jet hole groups and gas through hole groups. Any number and arrangement that can meet the usage requirements are within the scope of protection of this invention.

[0070] Optionally, the embodiments of the present invention provide three sets of jet hole groups, namely a first jet hole group 201, a second jet hole group 202, and a third jet hole group 203, and three sets of gas through hole groups, namely a first gas through hole group 3021, a second gas through hole group 3022, and a third gas through hole group 3023, wherein the first gas through hole group 3021, the second gas through hole group 3022, and the third gas through hole group 3023 correspond to the first jet hole group 201, the second jet hole group 202, and the third jet hole group 203, respectively; wherein, the gas path switching component 3 When the gas path switching component 300 rotates to the first preset position, the first gas through-hole group 3021 and the first jet hole group 201 are connected; when the gas path switching component 300 rotates to the second preset position, the second gas through-hole group 3022 and the second jet hole group 202 are connected; when the gas path switching component 300 rotates to the third preset position, the third gas through-hole group 3023 and the third jet hole group 203 are connected. Based on the continuous rotation of the gas path switching component 300, the jet structure can switch between jetting from the first jet hole group 201, jetting from the second jet hole group 202, and jetting from the third jet hole group 203.

[0071] It should be understood that the present invention does not limit the specific spray direction of each of the above-mentioned jet hole groups. In practical applications, the spray direction of the jet hole group can be adaptively adjusted according to the actual spray requirements. Any spray direction that can meet the usage requirements is within the protection scope of the present invention.

[0072] Optionally, in this embodiment of the invention, the first jet nozzle group 201 has a jet direction that is vertically downward, the second jet nozzle group 202 has a jet direction that is inclined downward in the vertical direction, and the third jet nozzle group 203 has a jet direction that is perpendicular to the vertical direction. This facilitates the application of the jet structure to a plasma etching machine, enabling switching between three air intake modes: direct downward air intake, oblique downward air intake, and lateral air intake. Based on the continuous rotation of the air path switching component 300, the jet structure achieves the following... Figure 14 The pulse jet is shown switching sequentially in three directions: directly downward, obliquely downward, and laterally.

[0073] Furthermore, the first jet hole group 201 is located on the side of the second jet hole group 202 close to the center of the jet element 200, and the third jet hole group 203 is located on the side of the second jet hole group 202 away from the center of the jet element 200; the first gas through hole group 3021 is located on the side of the second gas through hole group 3022 close to the center of the air passage switching disk 302, and the third gas through hole group 3023 is located on the side of the second gas through hole group 3022 away from the center of the air passage switching disk 302. That is, the first jet hole group 201 is located inside the second jet hole group 202, and the third jet hole group 203 is located outside the second jet hole group 202. This facilitates the first jet hole group 201 to spray gas vertically downward, the second jet hole group 202 to spray gas obliquely downward, and the third jet hole group 203 to spray gas laterally. Even if the three gases are sprayed simultaneously, there will be no interference between the various spray gas paths.

[0074] The first jet hole group 201 includes multiple downward jet holes, the second jet hole group 202 includes multiple downward angled jet holes, and the third jet hole group 203 includes multiple side jet holes, wherein the number of downward jet holes, downward angled jet holes, and side jet holes are all equal; the first gas through hole group 3021 includes multiple downward gas through holes, the second gas through hole group 3022 includes multiple downward angled gas through holes, and the third gas through hole group 3023 includes multiple side gas through holes, wherein the number of downward gas through holes, downward angled gas through holes, and side gas through holes are all equal, so that each downward jet hole corresponds to one downward gas through hole, each downward angled jet hole corresponds to one downward angled gas through hole, and each side jet hole corresponds to one side gas through hole.

[0075] It should be understood that the aforementioned multiple downward jet holes, multiple downward angled jet holes, and multiple side jet holes can all be distributed equidistantly or in an arithmetic sequence manner in the circumferential direction of the jet component 200. The aforementioned multiple downward gas passages, downward angled gas passages, and side gas passages can all be distributed equidistantly or in an arithmetic sequence manner in the circumferential direction of the air passage switching disk 302. In practical applications, the number and distribution of downward jet holes, downward angled jet holes, and side jet holes, as well as the number and distribution of downward gas passages, downward angled gas passages, and side gas passages, can be adaptively adjusted according to actual needs.

[0076] Optionally, the multiple downward jet holes, multiple downward oblique jet holes, and multiple side jet holes provided in the embodiments of the present invention are all arranged in a circular array with the center of the jet component 200 as the array center; the multiple downward gas through holes, downward oblique gas through holes, and side gas through holes are all arranged in a circular array with the center of the airway switching disk 302 as the array center, so that the jet structure can perform periodic airflow direction switching based on the rotation of the airway switching component 300.

[0077] For example, in one specific embodiment of the present invention, there are six downward jet holes, six oblique jet holes, and six lateral jet holes, and the included angles between adjacent downward jet holes, adjacent oblique jet holes, and adjacent lateral jet holes are all 60°; there are also six downward gas passage holes, six oblique gas passage holes, and six lateral gas passage holes, and the included angles between adjacent downward gas passage holes, adjacent oblique gas passage holes, and adjacent lateral gas passage holes are all 60°.

[0078] Furthermore, the centers of the corresponding downward jet holes, oblique jet holes, and lateral jet holes are all located on the same radial straight line of the jet component 200. In the circumferential direction of the airway switching disk 302, the corresponding downward gas passages, oblique gas passages, and lateral gas passages are offset from each other. This ensures that when the downward gas passage and the downward jet hole are aligned and connected, the oblique jet hole and its corresponding oblique gas passage will not be connected, and the lateral jet hole and its corresponding lateral gas passage will not be connected. The jet structure only sprays airflow in the downward direction. When the jet orifices are aligned and connected, the downward jet orifice and its corresponding downward gas passage will not be connected, and neither will the lateral jet orifice and its corresponding lateral gas passage. The jet structure only jets airflow in the downward direction. When the downward gas passage and the downward jet orifice are aligned and connected, the downward jet orifice and its corresponding downward gas passage will not be connected, and neither will the lateral jet orifice and its corresponding lateral gas passage. The jet structure only jets airflow in the downward direction, thereby enabling the jet structure to switch jets in three directions based on the rotation of the air path switching component 300.

[0079] Of course, the corresponding downward jet hole, oblique jet hole and side jet hole can also be offset from each other in the circumferential direction of the jet component 200. The centers of the corresponding downward gas passage, oblique gas passage and side gas passage are all located on the same radial straight line of the air passage switching disk 302. This also enables the jet structure to achieve jet switching in three directions based on the rotation of the air passage switching component 300.

[0080] The axis of the downward jet orifice provided by this invention can be a straight line or a combination of curves and straight lines, as long as it is a structure that can spray air vertically downwards. Optionally, the axis of the downward jet orifice provided in the embodiments of this invention is parallel to the vertical direction, that is, the downward jet orifice is a straight orifice, in order to reduce airflow resistance and facilitate downward jetting. Similarly, the axes of the downward-sloping jet orifice and the side jet orifice can be straight lines or a combination of curves and straight lines, as long as the jetting direction of the downward-sloping jet orifice is inclined to the vertical direction and the jetting direction of the side jet orifice is perpendicular to the vertical direction. Optionally, the axis of the downward-sloping jet orifice is inclined to the vertical direction, that is, the downward-sloping jet orifice is a straight orifice inclined to the vertical direction, and the axis of the side jet orifice includes a first axis portion parallel to the vertical direction and a second axis portion perpendicular to the first axis portion, that is, the axis of the side jet orifice is L-shaped, in order to reduce airflow loss and facilitate gas jetting.

[0081] In addition, the aforementioned airway switching disk 302 is provided with a combined airway groove 3024, which extends radially along the airway switching disk 302. Each downward jet hole has an oblique downward jet hole and a lateral jet hole whose centers are arranged on the same radial line. That is, the centers of the corresponding downward jet hole, oblique downward jet hole, and lateral jet hole are all arranged along a certain radial line of the jet member 200. The extension trajectory of the combined airway groove 3024 is also along the radial direction of the airway switching disk 302. The jet member 200 and the airway switching disk 302 are coaxially arranged. When the air path switching component 300 moves to the fourth preset position, the combined air passage groove 3024 can simultaneously connect with the first jet hole group 201 and the second jet hole group 202 to achieve combined jetting in the downward and oblique directions; or, the length of the combined air passage groove 3024 is long enough that when the air path switching component 300 moves to the fourth preset position, the combined air passage groove 3024 simultaneously connects with the first jet hole group 201, the second jet hole group 202 and the third jet hole group 203 to achieve combined jetting in the downward, oblique and combined directions.

[0082] Specifically, the length of the combined air passage 3024 is greater than the radial distance between the downward jet hole and the oblique jet hole, so that the combined air passage 3024 can simultaneously communicate with the first jet hole group 201 and the second jet hole group 202 to achieve combined jetting in the downward and oblique directions; or, the length of the combined air passage 3024 is greater than the distance between the downward jet hole and the lateral jet hole, so that the combined air passage 3024 can simultaneously communicate with the first jet hole group 201, the second jet hole group 202 and the third jet hole group 203 to achieve combined jetting in the downward, oblique and combined directions.

[0083] It should be noted that the combined air passage groove 3024 is not limited to the above two forms. It can also be moved radially toward the side away from the center, so that the length of the combined air passage groove 3024 is greater than the radial distance between the downward jet hole and the side jet hole. The combined air passage groove 3024 is simultaneously connected with the second jet hole group 202 and the third jet hole group 203, so that the second jet hole group 202 and the third jet hole group 203 can spray air simultaneously. Alternatively, in the circumferential direction of the jet component, the corresponding downward jet hole, downward jet hole and side jet hole are all offset from each other. The length of the combined air passage groove is greater than the radial distance between the downward jet hole and the side jet hole, and the combined air passage groove extends on the line connecting the centers of the downward jet hole and the side jet hole, so that the combined air passage groove 3024 connects the first jet hole group 201 and the third jet hole group 203, so that the first jet hole group 201 and the third jet hole group 203 can spray air simultaneously.

[0084] Furthermore, the gas path switching component 300 also includes a gas equalization disk 303 disposed on the switching shaft 301. Multiple gas equalization holes are evenly distributed on the gas equalization disk 303. The multiple gas equalization holes are all of equal shape and size, so as to make the airflow pass through the gas equalization disk 303 evenly, improve the uniformity of plasma concentration in the plasma etching chamber, and further improve the uniformity of plasma etching.

[0085] In addition, the above-mentioned jet structure also includes a rotary drive 400 for driving the air path switching component 300 to rotate. The air path switching component 300 is connected to the rotation output shaft of the rotary drive 400 via a coupling 401, so that the rotary drive 400 drives the air path switching component 300 to rotate.

[0086] When the rotary drive 400 drives the gas path switching component 300 to swing slightly within the angle range between the directly downward gas through-hole and the obliquely downward gas through-hole, and the combined gas passage groove 3024 is located outside this angle range, the jet structure can achieve the following: Figure 13The diagram shows periodic pulse jets in the direct downward and oblique downward directions. When the rotary drive 400 drives the gas path switching component 300 to oscillate within the maximum angle range formed by the direct downward gas through-hole, the oblique downward gas through-hole, and the lateral gas through-hole, and the combined gas passage slot 3024 is located outside this maximum angle range, the jet structure can achieve the following: Figure 14 The diagram shows periodic pulse jets in the downward, oblique, and lateral directions. Alternatively, the downward, oblique, and lateral gas passages can be provided only on the airway switching disc 302, without the combined airway groove 3024. When the rotary drive 400 drives the airway switching component 300 to rotate continuously, this jet structure can also achieve the same effect. Figure 14 The diagram shows a periodic pulse jet that switches sequentially between the downward, oblique, and lateral directions. Furthermore, when the airway switching disk 302 is simultaneously equipped with a downward gas passage, an oblique gas passage, a lateral gas passage, and a combined airway groove 3024, the jet structure can achieve the following as the rotary drive 400 drives the airway switching component 300 to rotate continuously: Figure 15 The diagram shows a periodic pulse jet that alternates between jetting in the following directions: directly downward, diagonally downward, laterally, and simultaneously in both directions.

[0087] The air intake sleeve 100 provided by the present invention is provided with an air intake pipe 102 that can communicate with an air source, so as to introduce an air source into the jet structure through the air intake pipe 102 to realize jetting.

[0088] Furthermore, the aforementioned jet structure also includes a controller electrically connected to the rotary drive 400, which controls the jet orifice group to perform periodic pulse jets in multiple directions, and selects a suitable jet mode based on the relationship between the rotation angle and the jet type pre-recorded in the controller.

[0089] The gas path switching component 300 and the air intake pipe sleeve 100 are sealed by magnetic fluid sealing or sealing ring sealing, etc. Any sealing method that can meet the sealing requirements is within the protection scope of this invention; Optionally, a first sealing ring 101 is provided between the gas path switching component 300 and the air intake pipe sleeve 100 provided in this embodiment of the invention for sealing.

[0090] In addition, the present invention also discloses a plasma etching machine, which includes the jet structure described above, and thus has all the technical effects of the aforementioned jet structure, which will not be elaborated here.

[0091] Furthermore, the aforementioned plasma etching machine also includes a plasma reaction chamber 500, a vacuum pump 600, a pressure control valve 700, an excitation radio frequency power supply 800, a plasma coupling coil 501, a bias radio frequency power supply 900, and a bias electrode 502; wherein, the vacuum pump 600 is connected to the plasma reaction chamber 500, the pressure control valve 700 is disposed on the connecting pipe between the plasma reaction chamber 500 and the vacuum pump 600, the plasma coupling coil 501 is electrically connected to the excitation radio frequency power supply 800, the bias radio frequency power supply 900 is electrically connected to the bias electrode 502, and the plasma coupling coil and the bias electrode 502 are electrically connected. 2 is located in the plasma reaction chamber. The plasma reaction chamber 500 is evacuated by the vacuum pump 600. Process gas is injected into the plasma reaction chamber 500 through the jet structure. Under the low vacuum pressure, the radio frequency output generated by the bias radio frequency power supply 900 is sent to the ring plasma coupling coil 501. Plasma is generated under the action of the plasma coupling coil 501. The bias electrode 502 provides bias voltage to accelerate the plasma to bombard the substrate, breaking the chemical bonds of the semiconductor in the patterned area of ​​the substrate. The chemical bonds are generated with the etching gas to form volatile substances, which are separated from the substrate in gaseous form and extracted from the vacuum pipeline.

[0092] In addition, the plasma etching machine also includes a ceramic dielectric window 503 and a shield 504. The ceramic dielectric window 503 is disposed in the plasma reaction chamber, and the jet structure is disposed in the ceramic dielectric window 503 so that the ceramic dielectric window 503 can be reused to support the jet structure. No additional support is required, which reduces the number of parts and lowers the cost. The shield 504 is disposed on the outside of the plasma reaction chamber to provide shielding.

[0093] The above-mentioned jet structure and ceramic medium window 503 can also be sealed by magnetic fluid sealing or sealing ring sealing. Any sealing method that can meet the usage requirements is within the protection scope of this invention. Optionally, a second sealing ring 5031 is provided between the jet structure and ceramic medium window 503 provided in the embodiment of this invention for sealing.

[0094] The terms "first" and "second," etc., in the specification, claims, and accompanying drawings of this invention are used to distinguish different objects, not to describe a specific order. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or apparatus that includes a series of steps or units may include steps or units not listed, but rather steps or units not listed.

[0095] The above description of the disclosed embodiments enables those skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A jet-powered structure, characterized in that, include: The intake manifold sleeve allows it to communicate with the air source; The jet component is detachably connected to the intake pipe sleeve, and the jet component forms a receiving space after being connected to the intake pipe sleeve; The air circuit switching component is movably disposed within the accommodating space; The gas path switching component is provided with a gas through hole group, and the jet component is provided with a jet hole group. There are multiple groups of gas through holes and jet holes, and each group of jet holes corresponds to a group of gas through holes. The jet direction of each group of jet holes is different. Based on the movable setting of the gas path switching component, the connection between the jet hole group and its corresponding gas through hole group can be switched to the connection between another jet hole group and another gas through hole group. The air path switching component is rotatably disposed within the accommodating space; The gas path switching component includes a switching shaft and a gas passage switching disk. The axis of the switching shaft is perpendicular to the gas passage switching disk, and the gas through hole group is disposed on the gas passage switching disk. The number of jet hole groups is three, namely the first jet hole group, the second jet hole group and the third jet hole group; The number of gas through-hole groups is three, namely the first gas through-hole group, the second gas through-hole group and the third gas through-hole group, which correspond to the first jet hole group, the second jet hole group and the third jet hole group, respectively. When the gas path switching component rotates to the first preset position, the first gas through hole group and the first jet hole group are connected; when the gas path switching component rotates to the second preset position, the second gas through hole group and the second jet hole group are connected; when the gas path switching component rotates to the third preset position, the third gas through hole group and the third jet hole group are connected.

2. The jet structure according to claim 1, characterized in that, The first jet nozzle group sprays vertically downwards, the second jet nozzle group sprays downwards at an angle to the vertical direction, and the third jet nozzle group sprays perpendicular to the vertical direction.

3. The jet structure according to claim 2, characterized in that, The first jet hole group is disposed on the side of the second jet hole group closer to the center of the jet component, and the third jet hole group is disposed on the side of the second jet hole group away from the center of the jet component; The first gas through-hole group is located on the side of the second gas through-hole group close to the center of the gas passage switching disk, and the third gas through-hole group is located on the side of the second gas through-hole group away from the center of the gas passage switching disk.

4. The jet structure according to claim 2, characterized in that, The first jet hole group includes multiple downward jet holes, the second jet hole group includes multiple downward angled jet holes, and the third jet hole group includes multiple side jet holes. The number of downward jet holes, downward angled jet holes, and side jet holes are all equal, and the multiple downward jet holes, downward angled jet holes, and side jet holes are all arranged in a circular array with the center of the jet component as the array center. The first gas through-hole group includes multiple downward gas through-holes, the second gas through-hole group includes multiple downward oblique gas through-holes, and the third gas through-hole group includes multiple side gas through-holes. The number of downward gas through-holes, downward oblique gas through-holes, and side gas through-holes are all equal, and the multiple downward gas through-holes, downward oblique gas through-holes, and side gas through-holes are arranged in a circular array with the center of the gas channel switching disk as the array center.

5. The jet structure according to claim 4, characterized in that, The centers of the corresponding downward jet, downward angled jet, and side jet are all located on the same radial straight line of the jet component. In the circumferential direction of the air passage switching disk, the corresponding downward gas passage, downward angled gas passage, and side gas passage are all offset from each other.

6. The jet structure according to claim 4, characterized in that, In the circumferential direction of the jet component, the corresponding downward jet hole, oblique jet hole and lateral jet hole are all offset from each other, and the centers of the corresponding downward gas passage, oblique gas passage and lateral gas passage are all located on the same radial straight line of the air passage switching disk.

7. The jet structure according to claim 4, characterized in that, The axis of the downward jet orifice is parallel to the vertical direction, the axis of the downward oblique jet orifice is inclined to the vertical direction, and the axis of the lateral jet orifice includes a first axis portion parallel to the vertical direction and a second axis portion perpendicular to the first axis portion.

8. The jet structure according to claim 4, characterized in that, The airway switching disk is provided with a combined airway groove, which extends radially along the airway switching disk. Each downward jet hole has an oblique downward jet hole and a side jet hole arranged on the same radial line as its center. Wherein, when the air path switching component moves to the fourth preset position, the combined air passage groove is simultaneously connected to the first jet hole group and the second jet hole group; or, when the air path switching component moves to the fourth preset position, the combined air passage groove is simultaneously connected to the first jet hole group, the second jet hole group, and the third jet hole group; or, when the air path switching component moves to the fourth preset position, the combined air passage groove is simultaneously connected to the second jet hole group and the third jet hole group; or, when the air path switching component moves to the fourth preset position, the combined air passage groove is simultaneously connected to the first jet hole group and the third jet hole group.

9. The jet structure according to claim 8, characterized in that, The length of the combined air passage is greater than the radial distance between the downward jet orifice and the downward angled jet orifice; Alternatively, the length of the combined air passageway is greater than the distance between the downward jet port and the side jet port; Alternatively, the length of the combined air passageway is greater than the distance between the downward-sloping jet orifice and the lateral jet orifice; Alternatively, in the circumferential direction of the jet, the corresponding downward jet, oblique jet, and lateral jet are all offset from each other, the length of the combined air passage groove is greater than the radial distance between the downward jet and the lateral jet, and the combined air passage groove extends along the line connecting the centers of the downward jet and the lateral jet.

10. The jet structure according to claim 1, characterized in that, The gas path switching component also includes a gas equalization disk disposed on the switching shaft, wherein a plurality of gas equalization holes are evenly distributed on the gas equalization disk, and the shape and size of the plurality of gas equalization holes are equal.

11. The jet structure according to claim 1, characterized in that, The jet structure also includes a rotary drive for driving the air path switching component to rotate, and the air path switching component is connected to the rotation output shaft of the rotary drive component via a coupling.

12. The jet structure according to claim 1, characterized in that, The air intake sleeve is equipped with an air intake pipe that can communicate with the air source.

13. The jet structure according to claim 11, characterized in that, It also includes a controller electrically connected to the rotary drive to control the jet hole assembly to perform periodic pulse jetting in multiple directions.

14. The jet structure according to claim 1, characterized in that, The gas path switching component and the air intake pipe sleeve are sealed with a magnetic fluid seal or a sealing ring.

15. A plasma etching machine, characterized in that, Includes the jet structure as described in any one of claims 1 to 14.

16. The plasma etching machine according to claim 15, characterized in that, It also includes a plasma reaction chamber, a vacuum pump, a pressure control valve, an excitation radio frequency power supply, a plasma coupling coil, a bias radio frequency power supply, and bias electrodes; The vacuum pump is connected to the plasma reaction chamber, the pressure control valve is located on the connecting pipe between the plasma reaction chamber and the vacuum pump, the plasma coupling coil is electrically connected to the excitation radio frequency power supply, the bias radio frequency power supply is electrically connected to the bias electrode, and the plasma coupling coil and the bias electrode are located in the plasma reaction chamber.

17. The plasma etching machine according to claim 16, characterized in that, It also includes ceramic dielectric windows and shielding covers; The ceramic dielectric window is disposed in the plasma reaction chamber, the jet structure is disposed in the ceramic dielectric window, and the shield is disposed on the outside of the plasma reaction chamber.

18. The plasma etching machine according to claim 17, characterized in that, The jet structure and the ceramic medium window are sealed using a magnetohydrodynamic seal or a sealing ring.

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