Nozzle cleaning device and cleaning method

Abstract

The invention provides a nozzle cleaning device and a cleaning method. The nozzle cleaning device comprises a first mounting pipeline provided with a plurality of cleaning parts and a second mounting pipeline provided with a plurality of containing and fixing parts, the containing and fixing parts correspond to the cleaning parts one to one, and containing cavities of the containing and fixing parts are used for containing nozzles to be cleaned. And fluid ejected from the fluid ejection port of the cleaning part is used for cleaning the to-be-cleaned nozzle. According to the nozzle cleaning device, a plurality of nozzles to be cleaned can be cleaned at the same time, the cleaning time can be greatly saved, and the cleaning efficiency is improved; the nozzle cleaning device is used for cleaning the nozzle, manual operation errors can be reduced, and the damage risk of the to-be-cleaned nozzle in the cleaning process is reduced; meanwhile, as the cleaning efficiency is improved, the downtime of equipment can be shortened, the actual running time of the equipment is increased, and the production efficiency is improved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing equipment, and in particular to a nozzle cleaning device and a cleaning method. Background Art

[0002] In the field of semiconductor manufacturing, Chemical Vapor Deposition (CVD) technology is one of the key process steps to achieve wafer production. CVD technology forms the required thin film layer on the surface of the wafer by precisely controlling the injection of reactive gases and reaction conditions to meet the specific needs of electronic device manufacturing. In the CVD system, the nozzle, as an important component of the reaction chamber, is responsible for injecting the reactive gases into the reaction chamber efficiently and accurately, which is crucial to ensuring product quality and production efficiency.

[0003] As the production cycle continues, the reaction chamber and its key components, including the nozzle, will inevitably accumulate certain residues and contaminants. If these contaminants are not removed in time, they will seriously affect the efficiency of the CVD reaction and the quality of the product. As the number of particles in the reaction chamber increases, the yield and reliability of the final product will be affected. Therefore, regular maintenance of the reaction chamber and its components is an essential link.

[0004] However, the existing technology lacks professional cleaning equipment for nozzles, and the entire cleaning process relies entirely on the manual operation of engineers. This not only requires engineers to have high professional skills and experience to ensure the cleaning effect and safety of operation, but also makes the cleaning quality and efficiency extremely vulnerable to human factors. For example, incomplete cleaning may lead to rework, increase working time and cost; while excessive cleaning or improper operation may damage the nozzle, further exacerbating economic losses. Especially when the reaction chamber is equipped with a large number of ceramic nozzles, due to the brittleness of the ceramic material, it is very easy to cause accidents such as bumps and drops during manual cleaning, resulting in nozzle damage, which not only increases maintenance costs, but may also cause greater production losses due to equipment downtime.

[0005] Therefore, in order to solve the problem of low nozzle cleaning efficiency, the present application provides a nozzle cleaning device and a cleaning method. Summary of the invention

[0006] In view of the defects and shortcomings of nozzle cleaning in the prior art, the present application provides a nozzle cleaning device and a cleaning method. The nozzle cleaning device is provided with a first installation pipe equipped with multiple cleaning parts and a second installation pipe equipped with multiple accommodating fixing parts, so as to clean multiple nozzles to be cleaned at the same time and improve the cleaning efficiency.

[0007] An embodiment of the present application provides a nozzle cleaning device, comprising:

[0008] An accommodating and fixing portion, wherein the accommodating and fixing portion is provided with an accommodating cavity, and the accommodating cavity is used to place the nozzle to be cleaned;

[0009] A cleaning part, the cleaning part comprising a fluid ejection port, the fluid ejected from the fluid ejection port is used to clean the nozzle to be cleaned placed in the accommodating chamber;

[0010] a first installation pipe, wherein a plurality of the cleaning parts are arranged at intervals from each other on the first installation pipe;

[0011] A second installation pipe, a plurality of the accommodating and fixing parts are arranged on the second installation pipe at intervals, and the positions of the accommodating and fixing parts on the second installation pipe correspond one to one with the positions of the cleaning parts on the first installation pipe.

[0012] As an embodiment, the fluid ejection port of the cleaning portion is in communication with the flow channel of the nozzle to be cleaned; at least part of the accommodating cavity is in communication with the flow channel of the nozzle to be cleaned;

[0013] The fixed accommodation portion includes a discharge port, and the discharge port is communicated with the accommodation cavity.

[0014] As an implementation manner, at least a portion of the fluid ejection port is inserted into the flow channel of the nozzle to be cleaned, and a first elastic buffer layer is provided at a contact point between the fluid ejection port and the flow channel of the nozzle to be cleaned.

[0015] As an implementation manner, a second elastic buffer layer is provided at the contact point between the accommodating cavity and the nozzle to be cleaned.

[0016] As an embodiment, the fluid ejection port of the cleaning portion is in communication with the first fluid passage of the first mounting conduit;

[0017] The discharge port of the accommodating fixing portion is in communication with the second fluid passage of the second mounting conduit.

[0018] As an embodiment, the first fluid channel of the first installation pipeline is connected to the first main pipeline through a first branch pipeline, and the inlet of the first main pipeline is connected to the gas pipeline and the liquid pipeline respectively;

[0019] The second fluid channel of the second installation pipeline is communicated with the second main pipeline through a second branch pipeline, and the outlet of the second main pipeline is connected to the particle size detector.

[0020] As an implementation mode, a first valve is provided on the gas pipeline;

[0021] A second valve is arranged on the liquid pipeline;

[0022] A third valve is arranged on the first branch pipeline;

[0023] The fluid ejection outlet of the cleaning portion is provided with a fourth valve.

[0024] As an implementation manner, a controller is further included, and the first valve, the second valve, the third valve, the fourth valve, and the particle size detector are respectively connected to the controller.

[0025] As an embodiment, it also includes a support frame and a guide rail arranged on the support frame;

[0026] The first installation pipe is connected to the guide rail via a first slider, and a first locking member is provided between the first slider and the guide rail; and / or,

[0027] The second installation pipe is connected to the guide rail via a second slider, and a second locking member is provided between the second slider and the guide rail.

[0028] According to another embodiment of the present application, a nozzle cleaning method is provided, comprising the following steps:

[0029] A plurality of cleaning parts spaced apart from each other are arranged on the first installation pipe, and a plurality of accommodating and fixing parts spaced apart from each other are arranged on the second installation pipe, wherein the cleaning parts correspond to the accommodating and fixing parts one by one;

[0030] Placing the nozzle to be cleaned in the accommodating cavity of the accommodating and fixing portion, and aligning the fluid ejection port of the cleaning portion with the nozzle to be cleaned;

[0031] A liquid is introduced into the cleaning portion, and the liquid is ejected through the fluid ejection port to clean the nozzle to be cleaned;

[0032] After cleaning with the liquid, if the nozzle to be cleaned is cleaned to a qualified standard, gas is introduced into the cleaning part, and the gas is ejected through the fluid outlet to dry the nozzle to be cleaned; if the nozzle to be cleaned is not cleaned to a qualified standard, liquid is continued to be introduced into the cleaning part to clean the nozzle to be cleaned until it is cleaned to a qualified standard.

[0033] As described above, the nozzle cleaning device and cleaning method of the present application have the following beneficial effects:

[0034] The nozzle cleaning device of the present application is provided with a first installation pipe equipped with multiple cleaning parts and a second installation pipe equipped with multiple accommodating and fixing parts. The accommodating cavity of the accommodating and fixing parts is used to place the nozzles to be cleaned, and the fluid sprayed from the fluid spray outlet of the cleaning part is used to clean the nozzles to be cleaned. It is possible to clean multiple nozzles at the same time, which can significantly save cleaning time and improve cleaning efficiency. Using the nozzle cleaning device to clean the nozzle can reduce human operating errors and reduce the risk of damage to the nozzles to be cleaned during the cleaning process. Due to the improvement in cleaning efficiency, the equipment downtime can be reduced, the actual operation time of the equipment can be increased, and the production efficiency can be improved.

[0035] The nozzle cleaning method of the present application is simple to operate, has a convenient operation process, can clean multiple nozzles at the same time, and improves cleaning efficiency; by controlling the cleaning steps, it can ensure that each nozzle meets the qualified cleaning standards, reducing rework and related costs caused by incomplete cleaning. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 Shown is a schematic diagram of the structure of the nozzle cleaning device provided in Example 1 of the present application.

[0037] Figure 2 Shown is a schematic structural diagram of the nozzle cleaning device provided in the first embodiment of the present application from another perspective.

[0038] Figure 3 Shown is a schematic structural diagram of the cleaning portion of the nozzle cleaning device provided in Example 1 of the present application.

[0039] Figure 4 Shown is a schematic structural diagram of the accommodating fixing portion in the nozzle cleaning device provided in the first embodiment of the present application.

[0040] Figure 5 Shown is a flow chart of the nozzle cleaning method provided in the second embodiment of the present application.

[0041] Figure 6 Shown is a flow chart of the automatic mode in the nozzle cleaning method provided in the second embodiment of the present application.

[0042] Figure 7 Shown is a flow chart of the manual mode in the nozzle cleaning method provided in the second embodiment of the present application.

[0043] Component number description

[0044] 100, first installation pipeline; 110, cleaning part; 111, fluid spray outlet; 112, fourth valve; 200, second installation pipeline; 210, accommodating fixing part; 211, accommodating chamber; 212, discharge port; 300, first main pipeline; 310, first branch pipeline; 311, third valve; 320, first valve; 400, gas pipeline; 410, first valve; 500, liquid pipeline; 510, second valve; 600, second main pipeline; 610, second branch pipeline; 700, support frame; 710, guide rail; 720, first slider; 730, first locking member. DETAILED DESCRIPTION

[0045] The following describes the embodiments of the present invention through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention.

[0046] See also Figures 1 to 7 It should be noted that the illustrations provided in this embodiment are only used to illustrate the basic concept of the present invention in a schematic manner, and the illustrations only show the components related to the present invention rather than the number, shape and size of the components in the actual embodiment. In actual implementation, the type, quantity and proportion of each component may be changed arbitrarily, and the component layout may also be more complicated.

[0047] In the field of semiconductor manufacturing, Chemical Vapor Deposition (CVD) technology is one of the key processes for thin film deposition. The nozzle in the CVD reaction chamber is the core component for the injection of reactive gases. Its cleanliness directly affects the number of particles in the reaction chamber, which in turn affects the quality and uniformity of the film. Therefore, regular cleaning of the nozzle is a necessary step to ensure the normal operation of the CVD equipment and improve the product yield.

[0048] In the prior art, nozzle cleaning mainly relies on engineers to do it manually, including steps such as disassembly, cleaning and drying. This process is time-consuming and labor-intensive, especially when the CVD reaction chamber contains multiple nozzles, such as the 36 ceramic nozzles in the UltimaX CVD reaction chamber, the cleaning workload is huge. During the manual cleaning process, since the nozzles are usually made of fragile ceramic materials, they are prone to accidents such as bumps and drops, resulting in nozzle damage, resulting in economic losses and increased production costs.

[0049] In view of the above defects, the present application provides a nozzle cleaning device and a cleaning method, which are now described in detail through the following embodiments.

[0050] Embodiment 1

[0051] This embodiment provides a nozzle cleaning device, such as Figure 1 and Figure 2 As shown, the nozzle cleaning device includes a first installation pipe 100 , a second installation pipe 200 , a cleaning portion 110 and an accommodating and fixing portion 210 .

[0052] like Figure 1 and Figure 2 As shown, multiple cleaning parts 110 are arranged on the first installation pipe 100 at intervals, and multiple accommodating and fixing parts 210 are arranged on the second installation pipe 200 at intervals. The positions of the multiple cleaning parts 110 on the first installation pipe 100 correspond one-to-one to the positions of the multiple accommodating and fixing parts 210 on the second installation pipe 200.

[0053] like Figure 3 As shown, the cleaning part 110 includes a fluid ejection port 111 for ejecting fluid, which may be liquid or gas. The fluid ejected from the fluid ejection port 111 is used to clean the nozzle to be cleaned placed in the accommodating and fixing part 210 .

[0054] like Figure 4 As shown, the accommodating and fixing portion 210 includes an accommodating cavity 211, and the accommodating cavity 211 is used to place the nozzle to be cleaned.

[0055] The nozzle cleaning device of this embodiment can clean multiple nozzles to be cleaned at the same time by setting a first installation pipe 100 and a second installation pipe 200, and setting multiple cleaning parts 110 on the first installation pipe 100, and setting multiple accommodating and fixing parts 210 on the second installation pipe 200, which significantly improves the efficiency of cleaning work. This parallel processing method greatly reduces the total time required for cleaning, making the maintenance of the CVD reaction chamber faster and more efficient; using the nozzle cleaning device instead of the manual cleaning method in the prior art can effectively avoid accidents such as bumps and drops that may occur during manual disassembly, cleaning and drying. The nozzle cleaning device of this embodiment reduces risks, is conducive to protecting the integrity of the nozzle, and reduces economic losses. By improving cleaning efficiency and reducing nozzle damage, it helps to reduce overall production costs.

[0056] In an optional embodiment, if Figure 1As shown, when cleaning the nozzle to be cleaned, the fluid ejection port 111 of the cleaning portion 110 is connected to the flow channel of the nozzle to be cleaned, so that the fluid ejected from the fluid ejection port 111 cleans the nozzle to be cleaned. At least part of the accommodating cavity 211 is connected to the flow channel of the nozzle to be cleaned, so that the used cleaning fluid can be discharged from the flow channel of the nozzle to be cleaned. The accommodating fixed portion 210 includes a discharge port 212, which is connected to the accommodating cavity 211 to further discharge the used cleaning fluid from the accommodating cavity 211. The accommodating cavity 211 of the accommodating fixed portion 210 matches the shape and size of the nozzle to be cleaned.

[0057] In an optional embodiment, if Figure 1 As shown, when cleaning the nozzle to be cleaned, at least part of the fluid ejection port 111 is inserted into the flow channel of the nozzle to be cleaned, so as to accurately clean the flow channel that needs to be cleaned in the nozzle to be cleaned. A first elastic buffer layer is provided at the contact point between the fluid ejection port 111 and the flow channel of the nozzle to be cleaned, that is, a first elastic buffer layer is provided on the outer surface of the fluid ejection port 111, so as to protect the nozzle to be cleaned. The first elastic buffer layer is elastic and can play a buffering role to prevent the fluid ejection port 111 from causing damage to the nozzle to be cleaned during the cleaning process. The material of the first elastic buffer layer can be, for example, rubber.

[0058] In an optional embodiment, a second elastic buffer layer is provided at the contact point between the accommodating cavity 211 and the nozzle to be cleaned, that is, a second elastic buffer layer is provided on the surface of the accommodating cavity 211. The second elastic buffer layer is elastic and can play a buffering role, so as to prevent the accommodating cavity 211 from causing damage to the nozzle to be cleaned during the cleaning process. The material of the second elastic buffer layer can be, for example, rubber.

[0059] In an optional embodiment, the fluid ejection port 111 of the cleaning portion 110 is in communication with the first fluid channel of the first installation pipe 100 , so that the cleaning fluid is provided to the cleaning portion 110 through the first fluid channel.

[0060] In an optional embodiment, the discharge port 212 of the accommodating fixing portion 210 is connected to the second fluid channel of the second installation pipe 200, so that the used cleaning fluid in the accommodating cavity 211 of the accommodating fixing portion 210 flows out from the discharge port 212 and is discharged through the second fluid channel.

[0061] In an optional embodiment, if Figure 1 and Figure 2As shown, the first fluid channel of the first installation pipeline 100 is connected to the first main pipeline 300 through the first branch pipeline 310, and the inlet of the first main pipeline 300 is respectively connected to the gas pipeline 400 and the liquid pipeline 500. The liquid pipeline 500 is connected to the liquid source, and the liquid passes through the first main pipeline 300, the first branch pipeline 310, the first fluid channel and the cleaning part 110 in sequence, and is ejected from the fluid ejection port 111 to clean the nozzle to be cleaned. The liquid provided in the liquid source can be pure water, or other liquids according to actual needs. The gas pipeline 400 is connected to the gas source, and the gas passes through the first main pipeline 300, the first branch pipeline 310, the first fluid channel and the cleaning part 110 in sequence, and is ejected from the fluid ejection port 111 to dry the nozzle to be cleaned. The gas provided by the gas source can be an inert gas that is not easy to react chemically, such as nitrogen, or other gases according to actual needs.

[0062] In an optional embodiment, if Figure 1 and Figure 2 As shown, the second fluid channel of the second installation pipeline 200 is connected to the second main pipeline 600 through the second branch pipeline 610, and the fluid is discharged after passing through the accommodating chamber 211, the discharge port 212, the second fluid channel, the second branch pipeline 610, and the second main pipeline 600 in sequence. The outlet of the second main pipeline 600 can be connected to a particle size detector, so that the cleaning of the nozzle to be cleaned can be detected based on the discharged fluid to facilitate the selection of the next step.

[0063] In an optional embodiment, if Figure 1 As shown, a first valve 410 is provided on the gas pipeline 400, and a second valve 510 is provided on the liquid pipeline 500. By closing the first valve 410 and the second valve 510, the nozzle cleaning device can be in a liquid cleaning mode or a gas drying mode.

[0064] The first branch pipeline 310 is provided with a third valve 311, and the fluid ejection port 111 of the cleaning unit 110 is provided with a fourth valve 112. On the one hand, by controlling the third valve 311 and the fourth valve 112, different numbers of nozzles can be cleaned; on the other hand, the nozzles that fail to meet the cleaning requirements can be found in cooperation with the particle size detector, so as to focus on cleaning the unqualified nozzles.

[0065] In an optional embodiment, the nozzle cleaning device further includes a controller, and the first valve 410, the second valve 510, the third valve 311, the fourth valve 112, and the particle size detector are respectively connected to the controller.

[0066] In an optional embodiment, if Figure 1 and Figure 2As shown, the nozzle cleaning device further includes a support frame 700, on which a guide rail 710 is disposed, the first installation pipe 100 is connected to the guide rail 710 via a first slider 720, and a first locking member 730 is disposed between the first slider 720 and the guide rail 710; and / or, the second installation pipe 200 is connected to the guide rail 710 via a second slider, and a second locking member is disposed between the second slider and the guide rail 710. The first slider 720 and the second slider can respectively adjust the positions of the first installation pipe 100 and the second installation pipe 200 on the support frame 700, so that the distance between the first installation pipe 100 and the second installation pipe 200 can be adjusted, that is, the distance between the cleaning portion 110 and the accommodating fixing portion 210 can also be adjusted. When the nozzle to be cleaned needs to be cleaned and the nozzle to be cleaned is placed in the accommodating cavity 211 of the accommodating and fixing part 210, or when the nozzle is cleaned and the cleaned nozzle needs to be taken out of the accommodating cavity 211 of the accommodating and fixing part 210, the first installation pipe 100 and the second installation pipe 200 are adjusted to a larger distance; when the nozzle to be cleaned is in the cleaning process, the fluid ejection port 111 of the cleaning part 110 needs to be aligned with the nozzle to be cleaned, and the first installation pipe 100 and the second installation pipe 200 are adjusted to a suitable distance. The first locking member 730 is used to fix the relative position of the first slider 720 and the guide rail 710, and the second locking member is used to fix the relative position of the second slider and the guide rail 710. In this way, the distance between the first installation pipe 100 and the second installation pipe 200 is fixed, that is, the distance between the cleaning part 110 and the accommodating and fixing part 210 is fixed. The material of the support frame 700 can be stainless steel, which can maintain the stability of the structure on the one hand, and keep the support frame 700 clean on the other hand, and avoid rusting due to long-term contact with water.

[0067] Specifically, Figure 1 and Figure 2 Three groups of first installation pipes 100 and second installation pipes 200 are arranged on the support frame 700, and 12 cleaning parts 110 and 12 accommodating fixing parts 210 are arranged on each group of first installation pipes 100 and second installation pipes 200, respectively. The inlets of three first branch pipes 310 are connected to the first main pipe 300, and the outlets of three second branch pipes 610 are connected to the second main pipe 600. The first installation pipe 100 in each group is slidably connected to the guide rail 710 through the first slider 720, and the second installation pipe 200 is fixedly connected to the support frame 700. The distance between the first installation pipe 100 and the second installation pipe 200 is adjusted by adjusting the position of the first installation pipe 100. It should be noted that the number of groups of the first installation pipe 100 and the second installation pipe 200, the number of cleaning parts 110 arranged on the first installation pipe 100, and the number of accommodating fixing parts 210 arranged on the second installation pipe 200 can be determined according to the number of nozzles that actually need to be cleaned.

[0068] Embodiment 2

[0069] This embodiment provides a nozzle cleaning method, such as Figure 5 As shown, the following steps are included:

[0070] S100, a plurality of cleaning parts 110 arranged at intervals from each other are provided on the first installation pipe 100, and a plurality of accommodating and fixing parts 210 arranged at intervals from each other are provided on the second installation pipe 200, wherein the cleaning parts 110 correspond to the accommodating and fixing parts 210 one by one;

[0071] S200, placing the nozzle to be cleaned in the accommodating cavity 211 of the accommodating fixing portion 210, and aligning the fluid ejection port 111 of the cleaning portion 110 with the nozzle to be cleaned;

[0072] S300, liquid is introduced into the cleaning part 110, and the liquid is ejected through the fluid ejection port 111 to clean the nozzle to be cleaned;

[0073] S400, after liquid cleaning, if the nozzle to be cleaned passes the cleaning, gas is introduced into the cleaning part 110, the gas is ejected through the fluid outlet 111 and blows the nozzle to be cleaned dry; if the nozzle to be cleaned fails to pass the cleaning, liquid is continued to be introduced into the cleaning part 110 to clean the nozzle to be cleaned until it passes the cleaning.

[0074] The fluid introduced into the cleaning part 110 is supplied sequentially through the first main pipeline 300, the first branch pipeline 310, and the first fluid channel in the first installation pipeline 100. The fluid after cleaning the nozzle is discharged sequentially through the accommodating cavity 211, the discharge port 212, the second fluid channel in the second installation pipeline 200, the second branch pipeline 610, and the second main pipeline 600. The fluid discharged through the second main pipeline 600 can be sampled and tested by a particle size detector. The controller can judge whether the cleaning of the nozzle is qualified according to the test data. Compared with manual judgment, the cleaning nozzle is cleaner when judged by the instrument.

[0075] When using the nozzle cleaning device to clean the nozzle, there are two operation modes, one is automatic (Auto) operation mode, and the other is manual (Manual) operation mode.

[0076] Automatic operation modes include, for example Figure 6As shown, the cleaning time is set in the controller (for example, it can be 1 hour), and the controller sends an open signal to the second valve 510, the third valve 311 and the fourth valve 112 to enter the liquid (for example, pure water) cleaning mode; after 1 hour of cleaning, the controller sends a signal to the particle size detector, and the particle size detector samples and detects the liquid discharged from the second main pipeline 600, and sends the detection data to the controller. The controller determines whether the cleaning is qualified according to a preset threshold value. If the cleaning is unqualified, the cleaning and detection are continued until the cleaning is qualified. If the cleaning is qualified, the controller sends a closing signal to the second valve 510 and an opening signal to the first valve 320 to enter the gas (for example, nitrogen) drying mode. After the nozzle is dried, the cleaning process ends.

[0077] Manual operation modes include, for example Figure 7 As shown, the cleaning time is set in the controller (for example, it can be 1 hour), and the second valve 510, the third valve 311 and the fourth valve 112 are manually opened to enter the liquid (for example, pure water) cleaning mode; after 1 hour of cleaning, the controller sends a signal to the particle size detector, and the particle size detector samples and detects the liquid discharged from the second main pipeline 600, and sends the detection data to the controller. The controller determines whether the cleaning is qualified according to a preset threshold value. Regardless of whether the cleaning is qualified, the controller will send a closing signal to the second valve 510, the third valve 311 and the fourth valve 112. After the second valve 510, the third valve 311 and the fourth valve 112 are closed, wait for the engineer to manually operate. The engineer operates according to the result of whether the cleaning is qualified determined by the controller. If the cleaning is unqualified, the multi-stage valve is manually controlled to switch, and graded cleaning sampling and detection are performed to accurately locate the nozzle that fails to clean and process it; if the cleaning is qualified, the first valve 320, the third valve 311 and the fourth valve 112 are manually opened to enter the gas (for example, nitrogen) drying mode. After the nozzle is dried, the cleaning process ends.

[0078] The nozzle cleaning device of this embodiment can clean multiple nozzles at the same time and ensure that the cleaning results are qualified, which can save a lot of time and reduce the workload of operators; and it has high cleaning efficiency, reduces the loss of nozzles, and improves economic benefits. The nozzle cleaning method of this embodiment is simple to operate, has high cleaning efficiency, and low loss.

[0079] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed by the present invention shall still be covered by the claims of the present invention.

Claims

1. A nozzle cleaning device, characterized in that: include: An accommodating and fixing portion, wherein the accommodating and fixing portion is provided with an accommodating cavity, and the accommodating cavity is used to place the nozzle to be cleaned; A cleaning part, the cleaning part comprising a fluid ejection port, the fluid ejected from the fluid ejection port is used to clean the nozzle to be cleaned placed in the accommodating chamber; A first installation pipe, wherein a plurality of cleaning parts are arranged in an interval with each other and are arranged on the first installation pipe; A second installation pipe, a plurality of the accommodating and fixing parts are arranged on the second installation pipe at intervals, and the positions of the accommodating and fixing parts on the second installation pipe correspond one to one with the positions of the cleaning parts on the first installation pipe.

2. The nozzle cleaning device according to claim 1, characterized in that: The fluid ejection port of the cleaning portion is in communication with the flow channel of the nozzle to be cleaned; at least a portion of the accommodating cavity is in communication with the flow channel of the nozzle to be cleaned; The fixed accommodation portion includes a discharge port, and the discharge port is communicated with the accommodation cavity.

3. The nozzle cleaning device according to claim 2, characterized in that: At least a portion of the fluid ejection port is inserted into the flow channel of the nozzle to be cleaned, and a first elastic buffer layer is provided at a contact point between the fluid ejection port and the flow channel of the nozzle to be cleaned.

4. The nozzle cleaning device according to claim 1 or 2, characterized in that: A second elastic buffer layer is provided at the contact point between the accommodating cavity and the nozzle to be cleaned.

5. The nozzle cleaning device according to claim 1 or 2, characterized in that: The fluid ejection port of the cleaning portion is in communication with the first fluid passage of the first installation conduit; The discharge port of the accommodating fixing portion is in communication with the second fluid passage of the second mounting conduit.

6. The nozzle cleaning device according to claim 5, characterized in that: The first fluid channel of the first installation pipeline is connected to the first main pipeline through a first branch pipeline, and the inlet of the first main pipeline is connected to the gas pipeline and the liquid pipeline respectively; The second fluid channel of the second installation pipeline is communicated with the second main pipeline through a second branch pipeline, and the outlet of the second main pipeline is connected to the particle size detector.

7. The nozzle cleaning device according to claim 6, characterized in that: A first valve is arranged on the gas pipeline; A second valve is arranged on the liquid pipeline; A third valve is arranged on the first branch pipeline; The fluid ejection outlet of the cleaning portion is provided with a fourth valve.

8. The nozzle cleaning device according to claim 7, characterized in that: It also includes a controller, and the first valve, the second valve, the third valve, the fourth valve, and the particle size detector are respectively connected to the controller.

9. The nozzle cleaning device according to claim 1, characterized in that: Also includes a support frame and a guide rail disposed on the support frame; The first installation pipe is connected to the guide rail via a first slider, and a first locking member is provided between the first slider and the guide rail; and / or, The second installation pipe is connected to the guide rail via a second slider, and a second locking member is provided between the second slider and the guide rail.

10. A nozzle cleaning method, characterized in that: The following steps are involved: A plurality of cleaning parts arranged at intervals from each other are arranged on the first installation pipe, and a plurality of accommodating and fixing parts arranged at intervals from each other are arranged on the second installation pipe, wherein the cleaning parts correspond to the accommodating and fixing parts one by one; Placing the nozzle to be cleaned in the accommodating cavity of the accommodating and fixing portion, and aligning the fluid ejection port of the cleaning portion with the nozzle to be cleaned; A liquid is introduced into the cleaning portion, and the liquid is ejected through the fluid ejection port to clean the nozzle to be cleaned; After cleaning with the liquid, if the nozzle to be cleaned is qualified, gas is introduced into the cleaning part, and the gas is ejected through the fluid ejection port to dry the nozzle to be cleaned; If the cleaning of the nozzle to be cleaned fails, liquid continues to be introduced into the cleaning part to clean the nozzle to be cleaned until the cleaning passes.

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