A polishing device for the inner wall of a reactor

Abstract

The present invention discloses a polishing device for the inner wall of a reaction kettle, belonging to the technical field of machining, which includes a base and a mounting plate; hydraulic cylinders are evenly and horizontally fixedly installed on the top wall of the mounting plate, a clamping plate is fixedly installed on the output end of the hydraulic cylinder, a baffle plate is fixedly installed on the side wall of the clamping plate close to the hydraulic cylinder, a first electric telescopic rod is vertically rotatably installed on the bottom wall of the mounting plate, and the output end of the first electric telescopic rod is fixedly connected to the base; it can timely purify the air containing dust generated during the polishing process, and the elastic film covers the upper end face of the kettle body. Therefore, at the beginning of polishing, the kettle body is only connected to the outside through the gap between the bottom wall of the elastic film and the bottom wall of the baffle plate, effectively reducing the area of connection between the kettle body and the outside, thereby reducing the amount of dust diffused to the outside. When the base moves downward, the polishing part of the kettle body is separated from the outside through the elastic film, which can prevent the dust-containing gas from being emitted to the outside.

Description

Technical Field

[0001] The present invention relates to the technical field of machining, and more particularly to a polishing device for the inner wall of a reaction kettle. Background Art

[0002] A reaction kettle is a common device in chemical production, widely used in petroleum, chemical industry, rubber, pesticides, dyes, pharmaceuticals, food, and is a pressure vessel used to complete processes such as vulcanization, nitration, hydrogenation, alkylation, polymerization, and condensation.

[0003] As the core device in chemical production, the surface quality of the inner wall of the reaction kettle has a direct impact on the contact effect of the reaction materials and the reaction efficiency. To ensure the uniformity and high efficiency of the reaction process, it is necessary to perform fine polishing on its inner wall during manufacturing and maintenance. This process can not only effectively reduce material residue, improve mass transfer and heat transfer efficiency, but also extend the service life of the device.

[0004] A reaction kettle generally includes a kettle body and a kettle cover, and the kettle cover is used to seal the kettle body; for a reaction kettle with a large volume and difficult to handle, when polishing the inner wall of the reaction kettle, the kettle cover is usually removed, and then the staff enters the kettle body to perform manual polishing. Since the air flow inside the reaction kettle is poor, the dust generated by polishing is difficult to be transferred in time. Even if the air flow inside the reaction kettle is blown by a fan, it is difficult to completely blow out the dust, which poses a threat to the health of the staff.

[0005] Therefore, a polishing device for the inner wall of a reaction kettle is proposed. Summary of the Invention

[0006] Aiming at the problems existing in the prior art, the purpose of the present invention is to provide a polishing device for the inner wall of a reaction kettle, which can automatically polish the inner wall of a reaction kettle that is difficult to handle without the need for staff to enter it.

[0007] To solve the above problems, the present invention adopts the following technical solutions.

[0008] A polishing device for the inner wall of a reaction kettle includes a base and a mounting plate;

[0009] Hydraulic cylinders are evenly and horizontally fixedly installed on the top wall of the mounting plate. A clamping plate is fixedly installed at the output end of the hydraulic cylinder. A baffle is fixedly installed on the side wall of the clamping plate close to the hydraulic cylinder. A first electric telescopic rod is vertically rotatably installed on the bottom wall of the mounting plate, and the output end of the first electric telescopic rod is fixedly connected to the base;

[0010] A second electric telescopic rod is horizontally arranged on the base. A first motor is arranged at the output end of the second electric telescopic rod. A polishing head is installed at the output end of the first motor;

[0011] A blower is fixedly installed on the top wall of the base. An air suction pipe is fixedly installed on the input end of the blower. One end of the air suction pipe away from the blower extends below the base. A filter box is fixedly installed on the base. The output end of the blower extends into the filter box. A pressure relief valve with its output end communicating with the outside is embedded in the top wall of the filter box. And a sealing mechanism is provided on the base, and the sealing mechanism is used to limit the diffusion range of dust generated during the processing;

[0012] An adjustment mechanism for driving the base to move is provided on the mounting plate.

[0013] Further, the sealing mechanism includes an annular plate fixedly installed on the top wall of the base. An annular groove is formed on the side wall of the annular plate. An elastic membrane is fixedly installed in the annular groove. A protection mechanism cooperating with the elastic membrane is provided on the base. And a connecting pipe is fixedly inserted on the side wall of the filter box, and one end of the connecting pipe away from the filter box extends into the annular groove.

[0014] Further, the adjustment mechanism includes a stepper motor fixedly installed on the top wall of the mounting plate. The output end of the stepper motor is fixedly connected to the top wall of the first electric telescopic rod.

[0015] Further, the protection mechanism includes insertion holes formed on the side wall of the base. The insertion holes correspond to the clamping plates one by one. A plug rod is slidably installed in the insertion hole. An elastic rope is jointly installed between the plug rod and the side wall of the insertion hole. A ball is movably embedded in the end face of the plug rod away from the insertion hole. And a driving mechanism for driving the plug rod to extend out of the insertion hole is provided on the base.

[0016] Further, the driving mechanism includes a diversion cavity formed on the base. The diversion cavity is annular. A conduit is fixedly installed on the base. The two ends of the conduit are respectively communicated with the diversion cavity and the annular groove. The insertion holes are evenly distributed on the side wall of the diversion cavity in a circumferential manner, and the insertion holes are communicated with the diversion cavity.

[0017] Further, a sponge is installed in the filter box, and the output end of the blower penetrates through the sponge.

[0018] Further, an annular cavity is formed on the base. Drainage holes are evenly formed on the side wall of the cavity. The drainage holes are inclined, and one end of the drainage hole away from the cavity is inclined upward. Therefore, the water discharged from the drainage hole has an upward impact force. A water supply mechanism for lubricating the elastic membrane is provided on the base.

[0019] Further, the water supply mechanism includes an extension pipe fixedly installed on the output end of the pressure relief valve. The extension pipe extends into the cavity;

[0020] The sponge is slidably installed in the filter box, and the output end of the blower is slidably inserted on the sponge. A pressing plate is fixedly installed on the bottom wall of the sponge.

[0021] Further, the pressing mechanism includes a magnet fixedly installed on the mounting plate. The pressing plate is made of a magnetic material and is attracted to the magnet, and the side wall of the filter box fits against the inner side wall of the annular plate.

[0022] Further, a storage box with an open top is fixedly installed on the top wall of the sponge, and through holes are formed at the top of the side wall of the storage box.

[0023] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0024] (1) Through the mutual cooperation of the blower, the filter box, the elastic membrane, and the protection mechanism, the air containing dust generated during the polishing process can be purified in a timely manner. Moreover, the elastic membrane covers the upper end face of the kettle body. Therefore, at the beginning of polishing, the kettle body is only connected to the outside through the gap between the bottom wall of the elastic membrane and the bottom wall of the baffle, effectively reducing the area of connection between the kettle body and the outside, thereby reducing the amount of dust diffused to the outside. When the base moves downward, the elastic membrane cuts off the connection between the polished part of the kettle body and the outside, preventing the dust-containing gas from being emitted to the outside. Therefore, during the entire polishing process, the dust generated by polishing can be purified in a timely manner, improving the environmental protection effect.

[0025] (2) Through the mutual cooperation of the sponge, the pressing plate, and the magnet, when the gas containing dust is in water, it will float upward in the form of bubbles. The bubbles gradually pass through the sponge, and the sponge breaks the larger bubbles into smaller bubbles, increasing the contact probability between the dust suspended in the bubbles and the water, improving the purification effect. At the same time, the porous structure of the sponge itself can limit the movement range of the dust precipitated in the water, preventing the dust from flowing to the liquid surface and preventing the bubbles emerging from the water from carrying the dust and floating into the air again.

[0026] (3) Through the mutual cooperation of the drain hole, the sponge, the pressing plate, and the magnet, the drain hole can drain water towards the surface of the elastic membrane, reducing the friction between the elastic membrane and the inner wall of the reaction kettle. And under the action of the air flow impact force, the water on the bottom wall of the elastic membrane is evenly diffused until it diffuses into the gap between the elastic membrane and the inner side wall of the kettle body. Furthermore, during the process of the base driving the elastic membrane to move downward, the friction force received by the elastic membrane can be reduced, protecting the elastic membrane and playing a role in ensuring the sealing effect of the elastic membrane. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 is a schematic diagram of the overall structure of the present invention;

[0028] Figure 2 is a schematic top view structure of the present invention;

[0029] Figure 3 is a schematic combined structure diagram of the mounting plate and the mounting ring of the present invention;

[0030] Figure 4It is a bottom view structural schematic diagram of the present invention;

[0031] Figure 5 It is a schematic diagram of the combined structure of the fan and the base of the present invention;

[0032] Figure 6 It is a schematic diagram of a top cross-sectional structure of the annular plate of the present invention;

[0033] Figure 7 It is a schematic diagram of the combined cross-sectional structure of the base and the annular plate of the present invention;

[0034] Figure 8 It is a cross-sectional structural schematic diagram of the filter box of the present invention;

[0035] Figure 9 For the present invention Figure 7 Schematic diagram of the AA structure;

[0036] Figure 10 For the present invention Figure 7 Schematic diagram of the BB structure.

[0037] Description of the numbers in the figure:

[0038] 1. Base; 2. Mounting plate; 3. Hydraulic cylinder; 4. Card plate; 5. Baffle; 6. First electric telescopic rod; 7. Second electric telescopic rod; 8. First motor; 9. Polishing head; 10. Fan; 11. Intake pipe; 12. Filter box; 13. Pressure relief valve; 14. Annular plate; 15. Annular groove; 16. Elastic membrane; 17. Connecting pipe; 18. Stepper motor; 19. Insert rod; 20. Elastic rope; 21. Ball; 22. Diversion chamber; 23. Catheter; 24. Sponge; 25. Cavity; 26. Drain hole; 27. Extension tube; 28. Press plate; 29. Magnet; 30. Storage box; 31. Through hole. DETAILED DESCRIPTION

[0039] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention; it is obvious that the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments, and all other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making creative work are within the scope of protection of the present invention. Embodiment 1:

[0040] See also Figures 1 to 10 , a reactor inner wall polishing device, comprising a base 1 and a mounting plate 2;

[0041] On the top wall of the mounting plate 2, hydraulic cylinders 3 are evenly and horizontally fixedly installed. A plurality of hydraulic cylinders 3 are circumferentially distributed. On the output end of the hydraulic cylinder 3, a clamping plate 4 is vertically and fixedly installed. On the side wall of the clamping plate 4 close to the hydraulic cylinder 3, a baffle 5 is horizontally and fixedly installed. On the bottom wall of the mounting plate 2, a longitudinally telescopic first electric telescopic rod 6 is vertically rotatably installed. The output end of the first electric telescopic rod 6 is fixedly connected to the base 1;

[0042] On the bottom wall of the base 1, a laterally telescopic second electric telescopic rod 7 is horizontally provided. On the output end of the second electric telescopic rod 7, a first motor 8 is provided. On the output end of the first motor 8, a polishing head 9 is fixedly installed. The base 1 is semi-circular, and the straight line where the output end of the second electric telescopic rod 7 is located and the center of the base 1 are on the same straight line. When the second electric telescopic rod 7 is fully retracted, the polishing head 9 and the second electric telescopic rod 7 are both on the same side of the center of the base 1. Therefore, the second electric telescopic rod 7 can drive the polishing head 9 to contact any position on the inner bottom wall of the kettle body;

[0043] On the top wall of the base 1, a blower 10 is fixedly installed. On the input end of the blower 10, an air suction pipe 11 is fixedly installed. One end of the air suction pipe 11 far from the blower 10 extends below the base 1, and one end of the air suction pipe 11 far from the blower 10 extends to the surface of the polishing head 9. A filter box 12 is fixedly installed on the base 1. The filter box 12 is filled with clear water. The output end of the blower 10 extends into the filter box 12, and the output end of the blower 10 penetrates the top wall of the filter box 12 and extends below the liquid level. A pressure relief valve 13 with the output end communicating with the outside is embedded on the top wall of the filter box 12, and a sealing mechanism is provided on the base 1. The sealing mechanism is used to limit the diffusion range of the dust generated during the processing;

[0044] An adjusting mechanism for driving the base 1 to move is provided on the mounting plate 2.

[0045] Among them, making the polishing head 9 contact the part to be polished and driving the polishing head 9 to rotate for polishing by the first motor 8 are prior arts and will not be elaborated; the blower 10 is a centrifugal blower 10, which is a prior art and will not be elaborated.

[0046] The sealing mechanism includes an annular plate 14 fixedly installed on the top wall of the base 1. An annular groove 15 is formed on the outer side wall of the annular plate 14. An elastic membrane 16 is fixedly installed in the annular groove 15. A protection mechanism cooperating with the elastic membrane 16 is provided on the base 1, and a communicating pipe 17 is fixedly inserted on the side wall of the filter box 12. One end of the communicating pipe 17 far from the filter box 12 extends into the annular groove 15.

[0047] The adjusting mechanism includes a stepping motor 18 fixedly installed on the top wall of the mounting plate 2. The output end of the stepping motor 18 penetrates through the mounting plate 2, and the output end of the stepping motor 18 is fixedly connected to the top wall of the first electric telescopic rod 6. Therefore, the output end of the stepping motor 18 can drive the first electric telescopic rod 6 to rotate, and at the same time, the first electric telescopic rod 6 can drive the base 1 to move up and down. And during installation, when the first electric telescopic rod 6 is fully retracted, the baffle 5 is located below the polishing head 9. Therefore, the polishing head 9 can contact any position on the inner side wall of the reaction kettle.

[0048] The protection mechanism includes insertion holes opened on the side wall of the base 1. The insertion holes correspond to the clamping plates 4 one by one, and the thickness of the baffle 5 is the same as the thickness of the kettle body. Therefore, when the first electric telescopic rod 6 is in a contracted state, the insertion rod 19 is perpendicular to the side wall of the baffle 5. An insertion rod 19 is slidably installed in the insertion hole, and an elastic cord 20 is jointly installed between the insertion rod 19 and the side wall of the insertion hole. The elastic coefficient of the elastic cord 20 is smaller than the elastic coefficient of the elastic film 16. Therefore, when subjected to the same magnitude of pressure, the elastic cord 20 is more likely to deform. A ball 21 is movably embedded in the end face of the insertion rod 19 away from the insertion hole, and a driving mechanism for driving the insertion rod 19 to extend out of the insertion hole is provided on the base 1.

[0049] The driving mechanism includes a diversion cavity 22 opened on the base 1. The diversion cavity 22 is annular. A conduit 23 is fixedly installed on the base 1. The two ends of the conduit 23 are respectively communicated with the diversion cavity 22 and the annular groove 15. The insertion holes are evenly distributed on the side wall of the diversion cavity 22 in a circumferential manner, and the insertion holes are communicated with the diversion cavity 22.

[0050] First, remove the kettle cover of the reaction kettle, then place the mounting plate 2 above the kettle body and start the hydraulic cylinder 3 to make the output end of the hydraulic cylinder 3 extend to the maximum extent. At this time, the clamping plates 4 on the output end of the hydraulic cylinder 3 located on the same straight line can surround the kettle body. Then, contract the hydraulic cylinder 3, so as to drive the clamping plates 4 to approach the hydraulic rod until the clamping plates 4 contact the side wall of the kettle body. At this time, the baffle 5 contacts the top wall of the kettle body, so as to fixedly connect the mounting plate 2 and the kettle body, facilitating subsequent polishing.

[0051] After the mounting plate 2 is fixed, start the fan 10 and the second electric telescopic rod 7 in sequence. The output end of the second electric telescopic rod 7 extends and moves towards the inner side wall of the kettle body. When the polishing head 9 contacts the inner wall of the kettle body, start the first motor 8, so as to drive the polishing head 9 to rotate through the first motor 8. At this time, the inner wall of the kettle body can be polished by the polishing head 9; and start the stepping motor 18 to drive the base 1 to rotate, and drive the base 1 to move up and down through the first electric telescopic rod 6, so as to change the polishing position of the polishing head 9 and polish all parts of the inner wall of the kettle body.

[0052] When the fan 10 is working, the fan 10 sucks air around the polishing head 9 through the suction pipe 11. Therefore, the dust generated during the polishing process will be sucked into the suction pipe 11, and then the mixture of dust and gas will be transported to the liquid surface below in the filter box 12 through the output end of the fan 10, and then float in the water in the form of bubbles. When the dust in the bubbles comes into contact with the water, the dust precipitates in the water. Therefore, the gas discharged from the filter box 12 through the pressure relief valve 13 is clean gas, which plays a role in preventing the staff from inhaling a large amount of dust.

[0053] Meanwhile, part of the gas in the filter box 12 is discharged into the annular groove 15 through the connecting pipe 17. At this time, the gas in the annular groove 15 flows along the conduit 23 into the annular cavity and then enters the jack.

[0054] As the working time of the fan 10 increases, the air pressures in the jack and the annular groove 15 gradually increase. Since the elastic coefficient of the elastic rope 20 is less than that of the elastic membrane 16, the push rod 19 is gradually pushed out of the jack by the air pressure until the ball 21 contacts the side wall of the baffle 5. At this time, the push rod 19 is in the state of being maximally extended from the jack.

[0055] Then the elastic membrane 16 begins to expand, and the expanding elastic membrane 16 gradually contacts the baffle 5. At this time, the elastic membrane 16 covers the upper end face of the kettle body. Therefore, the kettle body is only connected to the outside through the gap between the bottom wall of the elastic membrane 16 and the bottom wall of the baffle 5, effectively reducing the area of the kettle body connected to the outside, thereby reducing the amount of dust diffused to the outside; and under the action of the push rod 19, it can prevent the elastic membrane 16 from expanding towards the inside of the kettle body before starting polishing, and prevent the polishing head 9 from grinding on the surface of the elastic membrane 16, playing a role in protecting the elastic membrane 16.

[0056] During the process of the push rod 19 moving along the inner side wall of the kettle body, by setting the ball 21, the friction force on the inner side wall of the kettle body is reduced, which can protect the inner side wall of the kettle body and play a role in preventing the inner side wall of the kettle body from being scratched.

[0057] As the first electric telescopic rod 6 extends, the push rod 19 and the elastic membrane 16 move down with the base 1. When the side wall of the elastic membrane 16 contacts the inner wall of the kettle body, the elastic membrane 16 completely seals the kettle body. At this time, it can prevent the dust generated by polishing from diffusing to the outside. With the cooperation of the fan 10 and the filter box 12, the filtering effect of the dust is improved.

[0058] As Figure 8 shown, a sponge 24 is installed in the filter box 12, and the output end of the fan 10 penetrates through the sponge 24.

[0059] When the gas containing dust is in water, it will float upward in the form of bubbles. During this process, the bubbles gradually pass through the sponge 24. Since the sponge 24 has a porous structure, it can break the larger bubbles into smaller bubbles through the sponge 24, increasing the contact probability between the dust suspended in the bubbles and the water, improving the purification effect. At the same time, the porous structure of the sponge 24 itself can limit the activity range of the dust precipitated in the water, prevent the dust from flowing to the liquid surface, and play a role in preventing the bubbles emerging from the water from carrying the dust and floating into the air again.

[0060] As Figure 7 , Figure 9 shown, a circular cavity 25 is formed on the base 1, and drain holes 26 are evenly formed on the side wall of the cavity 25. The drain holes 26 are inclined, and the end of the drain hole 26 away from the cavity 25 is inclined upward. Therefore, the water discharged from the drain holes 26 has an upward impact force, and a water supply mechanism for lubricating the elastic membrane 16 is provided on the base 1.

[0061] As Figure 5 , Figure 9 shown, the water supply mechanism includes an extension pipe 27 fixedly installed at the output end of the pressure relief valve 13, and the extension pipe 27 extends into the cavity 25;

[0062] The sponge 24 is slidably installed in the filter box 12, and the output end of the fan 10 is slidably inserted into the sponge 24. A pressing plate 28 is fixedly installed on the bottom wall of the sponge 24. The pressing plate 28 is of a hollow structure, enabling the gas to normally pass through the pressing plate 28 and the sponge 24, and an extrusion mechanism for extruding the sponge 24 is provided on the mounting plate 2.

[0063] The extrusion mechanism includes a magnet 29 fixedly installed on the mounting plate 2. The pressing plate 28 is made of a magnetic material, and the pressing plate 28 and the magnet 29 attract each other. The magnet 29 is located at the inner side wall of the circle formed by the projection of the annular plate 14 on the surface of the mounting plate 2, and the side wall of the filter box 12 is in contact with the inner side wall of the annular plate 14. Therefore, during the rotation of the base 1, the filter box 12 drives the pressing plate 28 to intermittently rotate below the magnet 29.

[0064] When the pressing plate 28 moves directly below the magnet 29, under the action of the attraction force, the pressing plate 28 moves upward to drive the sponge 24 to move to the surface of the input end of the pressure relief valve 13 and squeeze the sponge 24. At this time, the sponge 24 is separated from the water surface and the water in the sponge 24 gathers together to form water droplets.

[0065] During the process of air flow entering the pressure relief valve 13, an impact force can be exerted on the formed water droplets, causing the water droplets to enter the pressure relief valve 13 together with the air flow. The gas containing water droplets in the pressure relief valve 13 is discharged along the extension pipe 27, and the water droplets discharged from the extension pipe 27 gather in the cavity 25. Finally, the water in the cavity 25 flows out through the drain hole 26 due to the impact force of the air flow discharged from the drain hole 26.

[0066] The water discharged from the drain hole 26 is evenly smeared on the bottom wall of the elastic membrane 16. Under the action of the air flow impact force, the water on the bottom wall of the elastic membrane 16 diffuses evenly until it diffuses into the gap between the elastic membrane 16 and the inner side wall of the kettle body. Thus, the friction force on the elastic membrane 16 can be reduced during the process of the base 1 driving the elastic membrane 16 to move downward, playing a role in protecting the elastic membrane 16.

[0067] And during the process of the sponge 24 being squeezed, only a small part of the water flows into the pressure relief valve 13, and the rest of the water will drip downward. During the dripping process, it can reverse-scour the sponge 24, impact and drop the dust accumulated in the sponge 24, keeping the sponge 24 clean and playing a role in automatically cleaning the sponge 24.

[0068] As Figure 8 shown, a storage box 30 with an open top is fixedly installed on the top wall of the sponge 24, and a through hole 31 is opened at the top of the side wall of the storage box 30.

[0069] When the sponge 24 is separated from contact with the water surface, the inside of the storage box 30 is already filled with water. As the sponge 24 is pushed upward, the bottom end of the pressure relief valve 13 gradually inserts into the storage box 30.

[0070] When the sponge 24 is squeezed, the input end of the pressure relief valve 13 is below the liquid level of the storage box 30, and the gas in the filter box 12 enters the storage box 30 through the through hole 31, and the gas exerts pressure on the liquid level in the storage box 30. In this process, the water in the storage box 30 is squeezed into the pressure relief valve 13, thereby increasing the amount of water delivered into the cavity 25 and further improving the lubrication effect on the elastic membrane 16.

[0071] The above is only a preferred specific embodiment of the present invention; however, the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention, according to the technical solution of the present invention and its improved concept, makes equivalent replacements or changes, and should be covered by the protection scope of the present invention.

Claims

1. A polishing device for the inner wall of a reaction kettle, comprising a base (1) and a mounting plate (2); It is characterized in that: Hydraulic cylinders (3) are evenly and horizontally fixedly installed on the top wall of the mounting plate (2). A clamping plate (4) is fixedly installed at the output end of the hydraulic cylinder (3). A baffle (5) is fixedly installed on the side wall of the clamping plate (4) close to the hydraulic cylinder (3). A first electric telescopic rod (6) is vertically rotatably installed on the bottom wall of the mounting plate (2). The output end of the first electric telescopic rod (6) is fixedly connected to the base (1); A second electric telescopic rod (7) is horizontally arranged on the base (1). A first motor (8) is arranged at the output end of the second electric telescopic rod (7). A polishing head (9) is installed at the output end of the first motor (8); A blower (10) is fixedly installed on the top wall of the base (1). An air suction pipe (11) is fixedly installed at the input end of the blower (10). One end of the air suction pipe (11) away from the blower (10) extends below the base (1). A filter box (12) is fixedly installed on the base (1). The output end of the blower (10) extends into the filter box (12). A pressure relief valve (13) with an output end communicating with the outside is embedded in the top wall of the filter box (12). And a sealing mechanism is arranged on the base (1). The sealing mechanism is used to limit the diffusion range of dust generated during the processing; The sealing mechanism includes an annular plate (14) fixedly installed on the top wall of the base (1). An annular groove (15) is formed in the side wall of the annular plate (14). An elastic film (16) is fixedly installed in the annular groove (15). A protection mechanism matching with the elastic film (16) is arranged on the base (1). And a connecting pipe (17) is fixedly inserted on the side wall of the filter box (12). One end of the connecting pipe (17) away from the filter box (12) extends into the annular groove (15); The protection mechanism includes insertion holes formed in the side wall of the base (1). The insertion holes correspond to the clamping plates (4) one by one. A plug rod (19) is slidably installed in the insertion holes. An elastic cord (20) is jointly installed between the plug rod (19) and the side wall of the insertion holes. A ball (21) is movably embedded in the end face of the plug rod (19) away from the insertion holes. And a driving mechanism for driving the plug rod (19) to extend out of the insertion holes is arranged on the base (1); The driving mechanism includes a diversion cavity (22) formed in the base (1). The diversion cavity (22) is annular. A conduit (23) is fixedly installed on the base (1). The two ends of the conduit (23) are respectively communicated with the diversion cavity (22) and the annular groove (15). The insertion holes are evenly distributed in a circumferential manner on the side wall of the diversion cavity (22). And the insertion holes are communicated with the diversion cavity (22); An adjusting mechanism for driving the base (1) to move is arranged on the mounting plate (2).

2. The inner wall polishing device of a reaction kettle according to claim 1, characterized in that: The adjusting mechanism includes a stepping motor (18) fixedly installed on the top wall of the mounting plate (2). The output end of the stepping motor (18) is fixedly connected to the top wall of the first electric telescopic rod (6).

3. The inner wall polishing device of a reaction kettle according to claim 2, wherein: A sponge (24) is installed inside the filter box (12), and the output end of the fan (10) penetrates through the sponge (24).

4. A polishing device for the inner wall of a reaction kettle according to claim 3, characterized in that: An annular cavity (25) is formed on the base (1). Drainage holes (26) are evenly formed in the side wall of the cavity (25). The drainage holes (26) are inclined, and the end of each drainage hole (26) away from the cavity (25) is inclined upward. Therefore, the water discharged from the drainage holes (26) has an upward impact force. A water supply mechanism for lubricating the elastic membrane (16) is provided on the base (1).

5. The inner wall polishing device of a reactor according to claim 4, characterized in that: The water supply mechanism includes an extension pipe (27) fixedly installed at the output end of the pressure relief valve (13), and the extension pipe (27) extends into the cavity (25). The sponge (24) is slidably installed inside the filter box (12), and the output end of the fan (10) is slidably inserted into the sponge (24). A pressing plate (28) is fixedly installed on the bottom wall of the sponge (24), and a pressing mechanism for pressing the sponge (24) is provided on the mounting plate (2).

6. The inner wall polishing device of a reactor according to claim 5, characterized in that: The pressing mechanism includes a magnet (29) fixedly installed on the mounting plate (2). The pressing plate (28) is made of a magnetic material, and the pressing plate (28) and the magnet (29) attract each other. The side wall of the filter box (12) is in contact with the inner side wall of the annular plate (14).

7. The inner wall polishing device of a reactor according to claim 6, wherein: A storage box (30) with an open top is fixedly installed on the top wall of the sponge (24), and through holes (31) are formed at the top of the side wall of the storage box (30).

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