Textile brightness measuring system

Abstract

An apparatus (100) for measuring not only reflected radiation of a textile sample (106) but also fluorescence emission comprises a display subsystem (102) having a viewing window (108). The radiation subsystem (114) has an adjustable radiation source (120) for directing desired radiation (122) having a wavelength range and intensity through the viewing window (108) toward the sample (106), thereby causing the sample (106) to produce fluorescence (124). The sensing subsystem (126) has an imager (130) for capturing reflected radiation and fluorescence (124) in the array of pixels.

Description

[0001] This application is a divisional application of a patent application with an application date of May 2, 2019, application number 201980030097.1, and invention name “Textile Brightness Measurement System”. Technical Field

[0002] The present invention relates to the field of textile property measurement. More specifically, the present invention relates to the measurement of brightness (fluorescence and reflected light) properties of textiles for both online and offline applications. Background Art

[0003] Textiles are woven or knitted fabrics made from yarns, but they also include fibers (natural, artificial and blended), yarns or any other products made from a combination of these. The visual perception of the final fabric is very important to the end user. Visual perception includes, but is not limited to, pattern, color and brightness. Brightness is generally defined as the property of visual perception in which a light source appears to be radiating or reflecting light. For textiles, brightness is a function of reflected light and fluorescent emission. Fluorescent pigments are a way to increase the brightness of fabrics. Fluorescent materials are defined as materials that, after absorbing light or other electromagnetic radiation, emit optical radiation, usually at a longer wavelength than the wavelength of the absorbed electromagnetic radiation. Therefore, fluorescent materials not only reflect the incident light, but also emit additional light of longer wavelengths. In particular, if the absorbed electromagnetic radiation is in the ultraviolet (UV) range and the emitted light is visible, then the fluorescent material appears brighter.

[0004] Fluorescent pigments have at least three major categories: inorganic fluorescent agents, optical brighteners, and daylight fluorescent agents. They are mainly distinguished by their chemical composition and optical properties, as well as their applications. For example, inorganic fluorescent agents are usually activated by light radiation in the range of ultraviolet (UV) to visible light (300-420nm), while optical brighteners are activated in the near-ultraviolet (340-400nm) range, and daylight fluorescent agents are activated and emit in the visible light (400-700nm) range.

[0005] Fluorescent properties can be imparted to textiles in a variety of ways, such as, but not limited to, (a) coating fabrics with fluorescent materials in a resin mixture, (b) introducing fluorescent materials into fibers during the spinning stage, (c) coating fibers, and (d) textile finishing or home washing with fluorescent materials.

[0006] The quality and application of fluorescent pigments are important parameters to maintain, monitor and control optimal topographical properties during textile processes. Although these methods have been available for many years, the formulation and quality control of fluorescent material applications have always been challenging, mainly due to the lack of appropriate measurement instrumentation and a lack of understanding of fluorescent materials.

[0007] Therefore, there is a need for a system for measuring not only reflected radiation but also fluorescent emission (total brightness) that would at least partially tend to alleviate problems such as those described above. Summary of the invention

[0008] The above and other needs are met by an apparatus for measuring reflected radiation and fluorescence of a textile sample, the apparatus comprising a display subsystem having an observation window. A radiation subsystem having an adjustable radiation source for directing a desired radiation having a wavelength range and intensity toward the sample through the observation window and thereby causing the sample to produce both reflected radiation and fluorescence emissions. A sensing subsystem having an imager for capturing the reflected radiation and fluorescence in an array of pixels, wherein each pixel records the intensity of the reflected radiation and fluorescence at the pixel location. A control subsystem having a processor for controlling the display subsystem, the radiation subsystem, and the sensing subsystem, and producing a reflected radiation and fluorescence image containing spectral information and spatial information about the sample.

[0009] In some embodiments according to this aspect of the invention, the display subsystem further comprises a sample press for pressing the sample against the observation window. In some embodiments, the display subsystem further comprises a calibration sheet for generating fluorescent and reflected radiation having known characteristics in response to radiation having known characteristics. In some embodiments, the radiation subsystem further comprises an optical device for shaping and filtering radiation from the adjustable radiation source before the radiation reaches the sample. In some embodiments, the radiation subsystem further comprises a detector for detecting the characteristics of the radiation.

[0010] In some embodiments, the adjustable radiation source further comprises a source capable of producing two or more discrete radiation ranges. In some embodiments, the adjustable radiation source further comprises a radiation source capable of producing radiation at a desired intensity. In some embodiments, the sensing subsystem further comprises an imager for capturing reflected radiation and fluorescence in a two-dimensional array of pixels. In some embodiments, the sensing subsystem further comprises a variable filter for selectively prohibiting portions of the reflected radiation and fluorescence from reaching the imager. In some embodiments, the sensing subsystem further comprises an imager for capturing reflected radiation in a two-dimensional array of pixels. In certain embodiments, the control subsystem further comprises a machine interface for receiving commands from another instrument and sending information to another instrument. In some embodiments, the control subsystem further comprises a human-machine interface for receiving commands from a user and sending information to a user.

[0011] In some embodiments, the control subsystem further classifies the patterns in the reflected radiation and the fluorescent image, including the percentage of the reflected radiation and the fluorescent image represented by each of the patterns, respectively. In some embodiments, the control subsystem further classifies the patterns in the reflected radiation and the fluorescent image, including the orientation of each of the patterns, wherein the orientation is at least one of horizontal, vertical, and disordered.

[0012] In some embodiments, the control subsystem further combines the fluorescent image and the reflected light image. In some embodiments, the control subsystem further classifies the combined image, including an orientation of each of the patterns, wherein the orientation is at least one of horizontal, vertical, and disordered.

[0013] According to another aspect of the invention, a method for measuring fluorescence of a textile sample is described. The sample is displayed on an observation window by a display subsystem, and a desired radiation having a wavelength range and intensity is directed from a radiation source through the observation window toward the sample, thereby causing the sample to produce fluorescence. The reflected radiation and the fluorescence are captured by a sensing subsystem, which includes an imager in a pixel array, wherein each pixel records the intensity of the reflected radiation and the fluorescence at the pixel location. A processor is used to control the display subsystem, the radiation subsystem, and the sensing subsystem, and to generate a reflected radiation and fluorescence image containing spectral information and spatial information about the reflected radiation and the fluorescence of the sample.

[0014] Some embodiments according to this aspect of the invention include pressing the sample against the observation window with a press. Some embodiments include shaping and filtering the radiation from the radiation source with an optical device before the radiation reaches the sample. Some embodiments include detecting the characteristics of the radiation with a detector. Some embodiments include generating two or more discrete radiation ranges at desired intensities. Some embodiments include selectively prohibiting some reflected radiation and fluorescence from reaching the imager. Some embodiments include classifying patterns in the reflected radiation and fluorescence images, including the percentage of the reflected radiation and fluorescence image represented by each pattern in the pattern. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Other advantages of the present invention will become apparent when considered in conjunction with the accompanying drawings and detailed description, which are not drawn to scale to more clearly show details, wherein like reference numerals represent like elements throughout the several views, and wherein:

[0016] Figure 1 is a functional block diagram of a measuring device according to an embodiment of the present invention.

[0017] FIG. 2A to FIG. 2D is a graph of radiation source wavelength versus output level for selecting a radiation profile according to various embodiments of the present invention.

[0018] Figure 3A is a fluorescence graph of radiation levels versus fluorescence levels for three different materials according to one embodiment of the present invention.

[0019] Figure 3B is a fluorescence graph of radiation levels versus fluorescence levels for three different radiation wavelengths according to one embodiment of the present invention.

[0020] Figure 3C is a fluorescence graph of radiation level versus fluorescence level for three different fluorescence wavelengths according to one embodiment of the present invention.

[0021] Figure 4 is an example of a fluorescent pattern according to an embodiment of the present invention. DETAILED DESCRIPTION

[0022] Reference now Figure 1 , shows a reflected radiation and fluorescence (total brightness) measurement system 100, which can be used for offline and online measurements. System 100 includes a sample display subsystem 102, a radiation subsystem 114, a sensing subsystem 126, and a control subsystem 132, each of which will be explained in more detail below.

[0023] Figure 1 Other aspects of the reflected radiation and fluorescence measurement system 100 are also shown, including a sample material 106 to be measured, a sample press 104, a sample window 108, a reference phosphor 109, a radiation source 120, radiation shaping and filtering optics 118, a radiation measurement radiometer 116, a variable optical filter 128, an imager 130, a signal processor 136, a user interface 138 and a machine interface 134, which will be described in more detail below in all relevant subsystems.

[0024] Sample display subsystem

[0025] The sample display subsystem 102 displays the sample fluorescent material 106 to the measurement system 100. The sample 106 can be any form of textile, including but not limited to, fiber, cotton strips or fabrics. Some embodiments include two display goals. One is to display as many samples 106 as possible to the measurement system 100, and the other is to display consistent sample angles. One method of achieving these goals is to use a press 104 to press the sample 106 onto the sample window 108 using a constant pressure.

[0026] The sample display subsystem 102 also includes a reference phosphor patch 109, whose reflected radiation and fluorescence characteristics are known. The purpose of the reference phosphor patch 109 is to allow the measurement system 100 to self-calibrate to known reference reflected radiation and fluorescence levels. In addition, it serves as a self-test, where the measurement system 100 can automatically detect a fault condition due to a component failure, etc. When the system 100 is measuring the sample 106, the reference phosphor patch 109 can be shielded from the radiation 122 so that they do not reflect / fluoresce, or the reflection / fluorescence they produce can be shielded from the imager 130 in some way so that they do not confound the fluorescence reading from the sample 106.

[0027] Radiation Subsystem

[0028] The radiation subsystem 114 is responsible for irradiating and exciting the fluorescent sample 106 with radiation 122, which has a desired distribution in terms of component wavelengths and their associated energies. In particular, the goal is to control and ensure a known radiation 122 distribution (radiation profile) on the sample 106. The desired radiation 122 distribution depends at least in part on the characteristics of the sample 106 and the properties of the sample 106 to be measured. The desired radiation 122 characteristics are controlled as described below. Some parameters of the radiation 122 include, but are not limited to, wavelength, power, beam uniformity, and beam angle 110, which is the angle between the radiation source 120 and the plane of the sample window 108. For example, in one embodiment, when the sample 106 contains an optical brightener material, the radiation source 120 operates in the near ultraviolet (340-400nm) range and the beam angle 110 is set to 45 degrees, such as Figure 1 In yet another embodiment, the radiation source 120 operates in the visible light range (400-700 nm), and the beam angle 110 is set to 45 degrees, as shown in FIG. Figure 1 shown.

[0029] The radiation subsystem 114 may include a plurality of radiation sources 120 arranged in different configurations. For example, in one embodiment, Figure 1 As shown, the configuration may incorporate two oppositely directed radiation sources 120. In yet another embodiment, the configuration may incorporate four radiation sources 120, wherein the sample 106 is irradiated from four different directions.

[0030] In some embodiments, the radiation source 120 can be moved within the system 100. For example, in some embodiments, the source 120 can be moved to provide different angles of incidence of the radiation 122 on the sample window 108. In some embodiments, the source 120 can be moved so that they have different proximity to the sample window 108, or have different radial angles.

[0031] Examples of radiation sources 120 may include, but are not limited to, one or more of light emitting diodes (LEDs), halogen lamps, mercury vapor lamps, incandescent lamps, deuterium lamps, fluorescent lamps, and xenon lamps. In addition, each radiation source 120 may incorporate one or more of the aforementioned lamps. For example, one embodiment may include multiple groups of visible and ultraviolet LEDs, wherein each LED group operates at a different wavelength. In such an embodiment, each LED group may be controlled by processor 136 separately from the other groups.

[0032] In one embodiment, sample 106 is illuminated with visible light and color measurements are taken in the CIELAB color space for sample 106. The color image of sample 106 is processed in the same manner as described below for all other images.

[0033] Thus, the output level and spectral characteristics of radiation source 120 can be customized for a given fluorescence application and measurement, such as Figure 2A-2D 2, wherein curve 200 depicts the wavelength of radiation 122 on the x-axis 204 and the output level of radiation 122 on the y-axis 202. In these examples, there are two sets of ultraviolet LEDs operating at 360 nm and 380 nm in various combinations and at various intensities.

[0034] exist Figure 2A In curve 200a, the 360nm LED group can be operated at its full output level as shown in spectrum 212a. Figure 2B In curve 200b, as shown in spectrum 212b, the 360nm LED group operates at 50% output level. Figure 2A and Figure 2B In the example, the 380nm LED group is completely turned off. Figure 2C Example 200c is depicted where the 380nm LED group is operating at its full output level, but the 360nm LED group is completely off. Figure 2D Yet another example 200d is shown where both LED groups are operated at an output level of 50%.Other combinations of wavelength and output level are also contemplated herein.

[0035] One design goal is to maintain uniformity and stability of radiation 122 in the area of ​​sample window 108 and / or in the area of ​​sample 106. One approach is to use radiation 122 shaping and filtering optics 118 to fine tune radiation 122 to a desired wavelength range. And to shape radiation 122 for uniformity, directionality, and coverage. In some embodiments, radiation 122 is monitored and regulated by closed-loop feedback control via radiation 122 detector 116.

[0036] Sensing subsystem

[0037] The sensing subsystem 126 is responsible for sensing and measuring the reflected radiation and fluorescence 124 characteristics of the sample 106 when it is irradiated. One goal is to spectrally separate the reflected radiation from the emitted fluorescence signal. One way to achieve this goal is to use a variable optical filter 128. For example, in one embodiment in which the sample 106 includes an optical brightener, the radiation source 120 is set to operate in the ultraviolet spectral range of 340-400nm, and the fluorescence emission is in the spectral range of 420-470nm. In this case, the variable optical filter 128 filters out any spectral signal in the range of 340-400nm and only allows radiation in the range of 420-470nm to pass. Alternatively, for another application, the variable optical filter 128 filters out one range and allows another range to pass, as shown in a given application. A method of implementing a variable optical filter 128 is to combine a filter wheel with several bandpass filters, wherein the processor 136 controls the filter wheel and selects the appropriate bandpass filter for a given application.

[0038] The actual fluorescence sensing and measurement is performed by the imager 130. The imager 130 measures not only the amount of fluorescence emission and reflected radiation, but also the distribution and spatial characteristics of the fluorescence emission and reflected radiation within the field of view. In one embodiment, the imager 130 can be a focal plane two-dimensional array device that is sensitive within the desired fluorescence emission and reflected radiation spectral range. In another embodiment, the imager 130 can be a line scan array that is scanned across the field of view to create a two-dimensional image. The scanning can be accomplished by mechanical movement of the imager 130 or by mechanical movement of a mirror on a fixed imager 130. In yet another embodiment, the imager 130 can be a hyperspectral imaging device. Regardless of which specific imaging method is used, the measurement of a given sample 106 includes fluorescence levels, spectral responses, and spatial information. For the remainder of this article, we refer to this output of the imager 130 as a fluorescence image.

[0039] Online sensing can be performed in a static mode or a dynamic mode. In the static mode, the sample 106 is brought into the field of view of the imager 130 on the sample window 108 and stopped for measurement. In the dynamic mode, the sample 106 moves through the sample window 108, and the radiation subsystem 114 and the sensing subsystem 126 operate at a sufficiently fast speed related to the speed of the sample movement. In the offline mode, the sample 106 can be manually placed on the sample 106 as needed.

[0040] Control subsystem

[0041] The control subsystem 132 is responsible for the control, processing and interface functions of the system 100. This is done under the control of the processor 136. The control functions include, but are not limited to, controlling the operation of the other subsystems in a manner generally described elsewhere herein. It also processes the image through the selected measurement method. The results of the measurement method are transmitted to the user interface 138 and / or the machine interface 134. The machine interface 134 may include, but is not limited to, an electronic interface to a textile machine or an information system.

[0042] Measurement method

[0043] The measurement method is based on processing of a reflected radiation image and a fluorescent emission image, which can be a one-dimensional or two-dimensional image, in which each pixel 408 (a picture element, such as Figure 4 ) represents the brightness level at a specific location on the sample 106. The measurements may include, but are not limited to, two categories, namely (a) statistical analysis and (b) pattern analysis.

[0044] Statistical analysis

[0045] The first measurement category is based on statistical analysis that provides a basic statistical assessment of brightness levels, which may include (a) average brightness level, (b) minimum brightness level and its location, (c) maximum brightness level and its location, (d) uniformity of brightness levels, and (e) graphs of brightness.

[0046] Thus, for a given brightness sample 106 irradiated with an appropriate irradiation subsystem 114, the brightness image may be represented as:

[0047] in

[0048] a(λ j ) is the weighting factor of the fluorescence image of wavelength,

[0049] where λ min <λ j <λ max , j = 1, 2, ..., k,

[0050] b(λ j ) is the weighting factor of the reflected radiation image of wavelength,

[0051] where λ min <λ j <λ max , j = 1, 2, ..., k

[0052] BI(λ j ) is a brightness image of the sample 106 in one or more wavelength ranges, where λ min <λj<λ max,j=1,2,...,k,

[0053] FI(λ j ) is a fluorescence image of the sample 106 in one or more wavelength ranges, where λ min <λj<λ max ,j=1,2,...,k,

[0054] LI(λ j ) is the reflected radiation image of the sample 106 in one or more wavelength ranges, where λ min <λ j <λ max ,j=1,2,...,k,

[0055] n is the number of spatial points of the image in the horizontal direction,

[0056] m is the number of spatial points in the image in the vertical direction, and

[0057] i xy is the x and y coordinate position of the sample at wavelength λ j energy level.

[0058] A statistical evaluation of the brightness level of sample 106 can be calculated as:

[0059]

[0060] in

[0061] Avg(λ j ) is the overall brightness level of the sample 106 in a single wavelength range or multiple wavelength ranges, where λ min <λ j <λ max ,i=1,2,...,n,

[0062] Min(λ j ) is the minimum brightness level of the sample 106 in a single wavelength range or multiple wavelength ranges, where λ min <λ j <λ max ,i=1,2,...,n,

[0063] Max(λ j ) is the maximum brightness level of the sample 106 in a single wavelength range or multiple wavelength ranges, where λ min <λ j <λ max ,i=1,2,...,n,

[0064] Unif(λ j) is the uniformity of the brightness level of the sample 106 at a single wavelength or multiple wavelengths, where λ min <λ j <λ max ,i=1,2,...,n,

[0065] n is the number of spatial points of the image in the horizontal direction,

[0066] m is the number of spatial points in the image in the vertical direction, and

[0067] i xy is the x and y coordinate position of the sample 106 at wavelength λ j The combined incident radiation and fluorescence emission level at .

[0068] We also define the term fluorescence diagram, which shows the emitted fluorescence level of the sample 106 to different radiation 122 parameters and incidence. The purpose of the fluorescence diagram is to enable easier and better characterization of the fluorescence of the sample 106. This may also be beneficial during the formulation of the fluorescent pigment process.

[0069] As previously described, the radiation subsystem 114 may be controlled by the processor 136 for different levels and spectral characteristics of the radiation 122. In addition, the sensing subsystem 126 may also be controlled by the processor 136 for spectral sensing of the emitted fluorescent signal.

[0070] Figure 3A-3C Depicted are examples of how various samples 106a-106c respond to various levels of radiation 122. This feature quantifies the optimal radiation 122 level required for a given fluorescence application.

[0071] Figure 3A An example 300a is depicted where three different fluorescent pigment samples 106a-106c are exposed to varying levels of radiation 122 and plotted as the fluorescence level of each sample 106a-106c on the y-axis 302 versus the radiation 122 level on the x-axis 304. This enables quantitative comparison and selection of the best sample of fluorescent pigment for a given application.

[0072] Figure 3B An example 300b is shown in which one sample 106 of fluorescent pigment is exposed to three different radiations 306, 308 and 310 having different spectral characteristics. Figure 3C Example 300c is shown where a sample 106 of fluorescent pigment is exposed to a radiation having different spectral characteristics and produces fluorescence at three wavelengths 312, 314, and 316. These graphs can help understand and select the best radiation source and emission output based on the application.

[0073] Pattern analysis

[0074] The second category of measurements is based on pattern analysis, which provides information about the pattern once it is discovered. The main difference between statistical analysis and pattern analysis is the inclusion of spatial information. In pattern analysis, the positions and relationships between all pixels in the image are considered, while in statistical analysis, spatial information is not considered.

[0075] Pattern analysis can include (a) the number of patterns found in the fluorescence image, (b) the total area of ​​all patterns in the fluorescence image, (c) the average size of all patterns, (d) the percentage of patterns with a horizontal orientation; (e) the percentage of patterns with a vertical orientation, and (f) the percentage of patterns with irregular or random orientation.

[0076] We define the pattern set:

[0077] P(λ j )={p1,p2,.....,p l}, (6)

[0078] Where P(λ j ) is a set of fluorescent patterns p1 to pl that exist in the fluorescent image FI(λ j ), where λ min <λ j <λ max ,j=1,2,...,k.

[0079] Each pattern p1 contains a set of pixels i in a cluster with clustering requirement xy The clustering requirements may vary from application to application. An example is when all neighboring i xy When it has a value greater than a statically or dynamically calculated threshold.

[0080] exist Figure 4 An example of fluorescent patterns 402, 404, and 406 is shown in pattern diagram 400 of FIG. In this example, there are three fluorescent patterns 402, 404, and 406, wherein each pattern 402, 404, and 406 has a different orientation and size as shown. For example, pattern 402 is a substantially horizontal pattern, while pattern 404 is a substantially vertical pattern. Pattern 406 is a non-vertical or random pattern.

[0081] In addition to classifying the orientation of patterns 402, 404, and 406, the size of each pattern 402, 404, and 406 is calculated. In the illustrated example 400, pattern 402 is approximately 5.2% of the total field of view, pattern 404 is approximately 2.1% of the total field of view, and pattern 406 is approximately 11.2% of the total field of view.

[0082] Thus, various embodiments of the apparatus and methods described herein provide for a more thorough analysis of textile fluorescence by providing fluorescence data at a highly selectable distribution of radiation 122 and providing the fluorescence data in a two-dimensional image of the sample 106, and also provide the other benefits described herein.

[0083] The above description of the preferred embodiments of the present invention has been given for the purpose of description and illustration. It is not intended to be exhaustive or to limit the present invention to the precise form disclosed. Obvious modifications or variations are possible in light of the above teachings. The embodiments selected and described are used to provide the best illustration of the principles of the present invention and its practical application, thereby enabling one of ordinary skill in the art to use the present invention in various embodiments, with various modifications suitable for the particular use contemplated. All such modifications and variations are within the scope of the present invention as determined by the appended claims when interpreted by the scope fairly, legally and equitably assigned.

Claims

1. A device (100) for measuring reflected radiation and fluorescence of a textile sample (106), the device (100) comprising: a display subsystem (102) comprising a sample window (108), a radiation subsystem (114) comprising an adjustable radiation source (120) for directing a desired radiation (122) having a wavelength range and intensity toward the sample (106) through the sample window (108), a sensing subsystem (126) comprising an imager (130) for capturing reflected radiation and fluorescent light (124) in an array of pixels (408), and Control subsystem (132), It is characterized in that The desired radiation (122) causes the sample (106) to produce reflected radiation and fluorescent light (124), Each pixel (408) of the imager (130) records the intensity of the reflected radiation and the fluorescent light (124) at the pixel location, The control subsystem (132) includes a processor (136) for controlling the display subsystem (102), the radiation subsystem (114), and the sensing subsystem (126) to generate a reflected radiation image and a fluorescent image (400) containing both spectral information and spatial information about the reflected radiation and fluorescent light (124) of the sample (106), and The control subsystem (132) is configured to perform pattern analysis on the reflected radiation and the fluorescent image (400). The pattern analysis includes: (a) the number of patterns found in the fluorescence image, (b) the total area of ​​all patterns in the fluorescence image, (c) the average size of all patterns, (d) the percentage of patterns with a horizontal orientation; (e) the percentage of patterns with a vertical orientation, and / or (f) the percentage of patterns with irregular or random orientation.

2. The apparatus according to claim 1, wherein the display subsystem (102) further comprises a press (104) for pressing the sample (106) onto the sample window (108).

3. The apparatus of claim 1, wherein the display subsystem (102) further comprises a calibration patch (109) for generating reflected radiation and fluorescent light (124) having known characteristics in response to radiation (122) having known characteristics.

4. The apparatus of claim 1, wherein the radiation subsystem (114) further comprises an optical device (118) for shaping and filtering radiation (122) from the adjustable radiation source (120) before the radiation (122) reaches the sample (106).

5. The apparatus of claim 1, wherein the radiation subsystem (114) further comprises a detector (116) for detecting a characteristic of the radiation (122).

6. The apparatus of claim 1, wherein the adjustable radiation source (120) further comprises a source capable of producing two or more discrete radiation ranges.

7. The apparatus of claim 1, wherein the adjustable radiation source (120) further comprises a radiation source capable of generating radiation (122) at a desired intensity.

8. The apparatus of claim 1, wherein the radiation source (120) further comprises a source capable of producing two or more discrete radiation ranges, and further capable of independently producing each of the two or more radiation ranges at different desired intensities.

9. The apparatus of claim 1, wherein the sensing subsystem (126) further comprises an imager (130) for capturing reflected radiation and fluorescent light (124) in a two-dimensional array of pixels (408).

10. The apparatus of claim 1, wherein the sensing subsystem (126) further comprises a variable filter (128) for selectively inhibiting a portion of the reflected radiation and fluorescent light (124) from reaching the imager (130).

11. The apparatus of claim 1, wherein the control subsystem (132) further comprises a machine interface (134) for receiving commands from another instrument and sending information to another instrument.

12. The apparatus of claim 1, wherein the control subsystem (132) further comprises a human-machine interface (138) for receiving commands from a user and sending information to a user.

13. The apparatus of claim 1, wherein the control subsystem (132) is configured to classify patterns (402, 404, 406) in the reflected radiation and fluorescent image (400), including a percentage of the reflected radiation and fluorescent image (400) represented by each of the patterns (402, 404, 406), respectively.

14. The apparatus of any one of claims 1-13, wherein the control subsystem (132) is configured to classify patterns (402, 404, 406) in the reflected radiation and fluorescent images (400), including an orientation of each of the patterns (402, 404, 406), wherein the orientation is at least one of a horizontal, vertical, and disordered orientation.

15. A method for measuring reflected radiation and fluorescence (124) of a textile sample (106), the method comprising the steps of: The sample (106) is displayed on the sample window (108) by using the display subsystem (102), directing a desired radiation (122) having a wavelength range and intensity from a radiation source (120) through a sample window (108) toward a sample (106), and capturing the reflected radiation and the fluorescent light (124) with a sensing subsystem (126) including an imager (130) having an array of pixels (408), It is characterized in that The desired radiation (122) causes the sample (106) to produce reflected radiation and fluorescent light (124), Each pixel (408) of the imager (130) records the intensity of the reflected radiation and the fluorescent light (124) at the pixel location, and Using a processor (136), the display subsystem (102), the radiation subsystem (114), and the sensing subsystem (126) are controlled so that a reflected radiation image and a fluorescent image (400) containing spectral information and spatial information related to the reflected radiation and fluorescent light (124) of the sample (106) are generated, and performing pattern analysis on the reflected radiation and the fluorescent image (400) using a processor (136), The pattern analysis includes: (a) the number of patterns found in the fluorescence image, (b) the total area of ​​all patterns in the fluorescence image, (c) the average size of all patterns, (d) the percentage of patterns with a horizontal orientation; (e) the percentage of patterns with a vertical orientation, and / or (f) the percentage of patterns with irregular or random orientation.

16. The method of claim 15, further comprising pressing the sample (106) against the sample window (108) with a press (104).

17. The method of claim 15, further comprising shaping and filtering radiation (122) from the radiation source (120) with optics (118) before the radiation (122) reaches the sample (106).

18. The method of claim 15, further comprising detecting a characteristic of the radiation (122) with a detector (116).

19. The method of claim 15, further comprising generating two or more discrete radiation ranges at desired intensities.

20. The method of claim 15, further comprising selectively inhibiting a portion of the reflected radiation and fluorescent light (124) from reaching the imager (130).

21. The method of any one of claims 15 to 20, further comprising classifying patterns (402, 404, 406) in the reflected radiation and fluorescent image (400), including the percentage of the reflected radiation and fluorescent image (400) represented by each of the patterns (402, 404, 406), respectively.

Images