Deep ultraviolet aluminum nitride sewage treatment device and treatment method

Abstract

The invention relates to the field of sewage treatment, in particular to a deep ultraviolet aluminum nitride sewage treatment device and method.The deep ultraviolet aluminum nitride sewage treatment device comprises a pretreatment unit and a deep treatment unit, the pretreatment unit comprises two water inlet bins used for storing sewage, and the deep treatment unit is arranged between the two water inlet bins; filtering equipment for filtering large-particle impurities and suspended solids in sewage is arranged in the water inlet bin, the deep treatment unit comprises a plurality of treatment assemblies, disinfection structures for deeply disinfecting the sewage are arranged in the treatment assemblies, ozone aeration pipes are arranged on the two sides of the treatment assemblies, and the ozone aeration pipes are communicated with the sewage. The ozone aeration pipe is used for guiding the circulation of the sewage and disinfecting the sewage; compared with a chemical disinfection mode, deep ultraviolet disinfection has the characteristics of short disinfection time, high efficiency, wide bactericidal spectrum, simple structure, small occupied area, simplicity and convenience in operation and maintenance, no secondary pollution and the like in the aspects of disinfection effect, use cost and safety.

Description

Technical Field

[0001] The invention relates to the field of sewage treatment, and in particular to a deep ultraviolet aluminum nitride sewage treatment device and a treatment method. Background Art

[0002] Medical wastewater refers to wastewater generated by medical facilities such as operating rooms, wards, clinics, pharmacies, and pathology departments. This wastewater contains a large number of bacteria and viruses, which have a great impact on the environment and human body. The current common method for treating medical wastewater is chemical treatment. The chemicals used in the chemical treatment process may produce by-products or residues, leading to the generation of new pollutants. At the same time, there are also problems such as large land occupation and high maintenance difficulty. Summary of the invention

[0003] In view of the shortcomings of the prior art, the present invention provides a deep ultraviolet aluminum nitride wastewater treatment device and a treatment method, which solves the technical problem that secondary pollution may be generated by chemical treatment in the prior art.

[0004] To achieve the above object, the present invention provides the following technical solutions:

[0005] A deep ultraviolet aluminum nitride sewage treatment device comprises a pretreatment unit and a deep treatment unit, wherein the pretreatment unit comprises two water inlet tanks for storing sewage, the deep treatment unit is arranged between the two water inlet tanks, the interior of the water inlet tanks is provided with a filtering device for filtering large particle impurities and suspended matter in the sewage, the deep treatment unit comprises a plurality of treatment components, the interior of the treatment components is provided with a disinfection structure for deeply disinfecting the sewage, ozone aeration pipes are arranged on both sides of the treatment components, and the ozone aeration pipes are used to guide the circulation of sewage and disinfect the sewage.

[0006] Furthermore, the disinfection structure includes a plurality of quartz tubes, and the plurality of quartz tubes are fixedly arranged inside the processing component. A substrate is provided inside the quartz tube, and deep ultraviolet LED light strips are fixedly connected to both sides of the substrate.

[0007] Furthermore, a circulation pipe is provided between the two water inlet bins, and the circulation pipe is used to connect the sewage in the two water inlet bins. The treatment component is arranged at an angle to increase the time the sewage stays in the treatment component.

[0008] Furthermore, a water inlet pipe is provided on one side of one of the water inlet bins, and a water inlet valve is provided at one end of the water inlet pipe close to the water inlet bin; a drain pipe is provided on one side of the other water inlet bin, and an internal circulation drain valve is provided at one end of the drain pipe close to the water inlet bin.

[0009] Furthermore, a sewage pipe is provided on one side of the water inlet bin, and the sewage pipe is used to discharge large particle impurities and suspended matter filtered out by the filtering equipment.

[0010] Furthermore, a tap water pipe is provided at the bottom of the processing component, and the tap water pipe is used to guide clean water to clean the inside of the processing component.

[0011] A deep ultraviolet aluminum nitride wastewater treatment method comprises the following steps:

[0012] S1. Real-time acquisition of a first water quality parameter for indicating the water quality of sewage in each treatment component;

[0013] S2. Calculating a second water quality parameter for representing the water quality of all sewage according to the change of the first water quality parameter of the sewage in each treatment component;

[0014] S3, defining a standard water quality parameter that meets the minimum sewage treatment standard, and determining whether the second water quality parameter is higher than the standard water quality parameter;

[0015] If yes, proceed to step S4;

[0016] If not, return to step S1 and continue to treat the sewage;

[0017] S4. Discharge the sewage through the drain pipe.

[0018] Furthermore, the first water quality parameter includes chemical oxygen demand, nitrate, nitrite and phenol content in the sewage.

[0019] Furthermore, in step S2, the following steps are specifically included:

[0020] S21. Calculate the removal rate R of each impurity in the sewage by each treatment component at each time point ijt , and its calculation formula is:

[0021]

[0022] In the formula, C (i，j-1，t) and C ijt They represent the concentration of the i-th pollutant in the sewage in the j-1th and jth treatment components at the current time point t, respectively;

[0023] S22, based on the removal rate R at the current time point t and the previous time point t-1 ijt Calculate the removal change rate ΔR ijt , and its calculation formula is:

[0024] ΔR ijt =R ijt -R ij(t-1)

[0025] In the formula, R ijt and R ij(t-1)They represent the removal rate of the jth pollutant by the ith treatment component at time point t and time point t-1 respectively;

[0026] S23. Calculate the average removal rate R of each pollutant i , and its calculation formula is:

[0027]

[0028] In the formula, n represents the total number of treatment components; T represents the total time from the beginning of sewage treatment to the present; α represents the impact weight;

[0029] S24, according to the average removal rate R i Calculate the final concentration C of each pollutant if And use it as the second water quality parameter, and its calculation formula is:

[0030]

[0031] In the formula, C i0 It indicates the first water quality parameter obtained when sewage treatment is just started.

[0032] Compared with the prior art, the present invention provides a deep ultraviolet aluminum nitride sewage treatment device and treatment method, which has the following beneficial effects:

[0033] 1. Compared with chemical disinfection methods, deep ultraviolet disinfection of the present invention has the characteristics of short disinfection time, high efficiency, wide bactericidal spectrum, simple structure, small footprint, simple operation and maintenance, and no secondary pollution in terms of disinfection effect, use cost and safety.

[0034] 2. Compared with other calculation methods, it is not limited to the data obtained by the data acquisition equipment. It comprehensively considers the performance differences of each treatment component and the changing trend of the overall sewage pollutant concentration, and calculates the final concentration of each pollutant based on this. It can effectively improve the calculation accuracy and facilitate the judgment of whether the sewage meets the treatment standards. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The drawings described herein are used to provide a further understanding of the present application and constitute a part of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings:

[0036] Figure 1 It is a structural schematic diagram of a deep ultraviolet aluminum nitride wastewater treatment device of the present invention;

[0037] Figure 2 is a cross-sectional view of a processing assembly of the present invention;

[0038] Figure 3is a cross-sectional view of a quartz tube of the present invention;

[0039] Figure 4 A flowchart of a deep ultraviolet aluminum nitride wastewater treatment method of the present invention;

[0040] Figure 5 is a schematic diagram of the decomposable chemical substance of the present invention;

[0041] Figure 6 This is a comparison diagram of COD concentration before and after sewage treatment according to the present invention;

[0042] Figure 7 is a curve diagram of the sulfide decomposition ability under ultraviolet light irradiation of the present invention;

[0043] Figure 8 It is a schematic diagram of the spatial trigonal crystal structure of the β-Al2O3 crystal of the present invention.

[0044] Reference numerals:

[0045] 1. Water inlet tank; 2. Water inlet valve; 3. Water inlet pipe; 4. Circulation pipe; 5. Ozone aeration pipe; 6. Internal circulation drain valve; 7. Drain pipe; 8. Tap water pipe; 9. Drain pipe; 10. Processing component; 11. Quartz tube; 12. Substrate. DETAILED DESCRIPTION

[0046] In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific implementation methods, so that the implementation process of how the present application uses technical means to solve technical problems and achieve technical effects can be fully understood and implemented accordingly.

[0047] Medical wastewater refers to wastewater generated by medical facilities such as operating rooms, wards, clinics, pharmacies, and pathology departments. This wastewater contains a large number of bacteria and viruses, which have a great impact on the environment and human body. The protection of water resources and wastewater treatment have become important global issues. The common treatment method is chemical disinfection, which takes a lot of time and is not efficient. It also causes secondary pollution. Therefore, Figure 1As shown, in the first embodiment of the present invention, a deep ultraviolet aluminum nitride sewage treatment device is proposed, including a pretreatment unit and a deep treatment unit, the pretreatment unit includes two water inlet tanks 1 for storing sewage, the deep treatment unit is arranged between the two water inlet tanks 1, the interior of the water inlet tank 1 is provided with a filtering device for filtering large particle impurities and suspended matter in the sewage, the deep treatment unit includes a plurality of treatment components 10, and the interior of the treatment component 10 is provided with a disinfection structure for deeply disinfecting the sewage; specifically, since deep ultraviolet disinfection has the characteristics of short disinfection time, high efficiency, wide bactericidal spectrum, simple structure, small footprint, simple operation and maintenance, and no secondary pollution in terms of disinfection effect, use cost and safety, the disinfection structure adopts ultraviolet disinfection to disinfect the sewage in the treatment component 10, therefore, as Figure 2-3 As shown, the disinfection structure includes a plurality of quartz tubes 11, which are fixedly arranged inside the processing component 10. A substrate 12 is provided inside the quartz tube 11, and deep ultraviolet LED light strips are fixedly connected to both sides of the substrate 12. Specifically, the substrate 12 not only fixes the deep ultraviolet LED light strips, but also realizes the functions of conduction and heat dissipation. In the present invention, the substrate 12 can be set to copper material, which has higher thermal conductivity efficiency.

[0048] Ozone aeration pipes 5 are provided on both sides of the treatment component 10, and the ozone aeration pipes 5 are used to guide the flow of sewage and disinfect the sewage; specifically, the ozone aeration pipes 5 contain ozone, which is a strong oxidant that can effectively kill bacteria, viruses, fungi and other microorganisms in water, and is widely used in drinking water treatment, swimming pool water purification and other fields; and ozone can decompose organic pollutants in water, and help remove odorous substances in water and improve water quality; in addition, ozone can also oxidize some heavy metal ions into insoluble forms, which is convenient for subsequent precipitation and filtration removal.

[0049] It should be noted that the ozone aeration pipe 5 belongs to the prior art, and its working principle will not be described in detail here.

[0050] Since deep ultraviolet disinfection and chemical disinfection are different in method, ultraviolet rays are required to irradiate the sewage for a long time, so the sewage needs to be repeatedly disinfected in the treatment component 10 and the ozone aeration pipe 5. Therefore, a circulation pipe 4 is provided between the two water inlet tanks 1, and the circulation pipe 4 is used to connect the sewage in the two water inlet tanks 1. The treatment component 10 is tilted to increase the time the sewage stays in the treatment component 10; specifically, the two water inlet tanks 1, a plurality of treatment components 10, a plurality of ozone aeration pipes 5 and the circulation pipe 4 constitute a structure in which the sewage can circulate, and the sewage is pumped by an internal water pump so that the sewage is repeatedly disinfected by passing through the treatment component 10 and the ozone aeration pipe 5, and the treatment component 10 is tilted, such as Figure 1 As shown, the time that the sewage stays in the treatment assembly 10 is increased to improve the disinfection effect.

[0051] A water inlet pipe 3 is provided on one side of one of the water inlet bins 1, and a water inlet valve 2 is provided at one end of the water inlet pipe 3 close to the water inlet bin 1; a drain pipe 7 is provided on one side of the other water inlet bin 1, and an internal circulation drain valve 6 is provided at one end of the drain pipe 7 close to the water inlet bin 1; specifically, the water inlet pipe 3 is used to guide sewage into the water inlet bin 1, the water inlet valve 2 is used to control the circulation of the water inlet pipe 3, the drain pipe 7 is used to discharge the disinfected sewage, and the internal circulation drain valve 6 is used for the internal circulation of the system and for regular removal of dirt, sediment and other impurities accumulated at the bottom of the pipe or equipment. It should be noted that the internal circulation drain valve 6 belongs to the prior art and will not be elaborated here.

[0052] In addition, after the filtering equipment filters the large particle impurities and suspended matter in the water inlet tank 1, the large particle impurities and suspended matter are still in the water inlet tank 1 and need to be discharged. Therefore, a drain pipe 9 is provided on one side of the water inlet tank 1, and the drain pipe 9 is used to discharge the large particle impurities and suspended matter filtered out by the filtering equipment.

[0053] A tap water pipe 8 is provided at the bottom of the treatment component 10, and the tap water pipe 8 is used to guide clean water to clean the inside of the treatment component 10; specifically, after completing the treatment of the sewage, it is necessary to clean the inside of the treatment component 10, the ozone aeration pipe 5 and the water inlet tank 1 to facilitate the next sewage treatment, and after the clean water enters the treatment component 10, it enters the water inlet tank 1 through the ozone aeration pipe 5 to complete the cleaning of the treatment component 10, the ozone aeration pipe 5 and the water inlet tank 1, and finally discharges the large particles of impurities and suspended matter in the water inlet tank 1 from the sewage pipe 9.

[0054] It should be noted that deep ultraviolet disinfection is a physical disinfection method. Its mechanism of action is to use deep ultraviolet radiation to cause chemical damage to the genetic material DNA and RNA of microorganisms, thereby preventing genetic material replication, transcription and protein synthesis, and ultimately causing the death of microorganisms to achieve the purpose of disinfection. Compared with chemical disinfection methods, deep ultraviolet disinfection has the advantages of short disinfection time, high efficiency, and a wide bactericidal spectrum (such as Figure 5 As shown), it has the characteristics of simple structure, small footprint, easy operation and maintenance, and no secondary pollution.

[0055] When the sewage is recycled, it is necessary to detect the water quality of the sewage in real time so that the treated sewage can be discharged in time when the sewage reaches the treatment expectation, so as to improve the sewage treatment efficiency. The parameters detected by the water quality detection equipment set in each treatment component 10 may be different, and there may be differences in the sewage in the treatment component 10, the ozone aeration pipe 5 and the water inlet tank 1. Therefore, it is necessary to evaluate the overall treatment effect of the sewage to avoid the situation where the sewage treatment effect does not meet the standard. Therefore, if Figure 4As shown, the second embodiment of the present invention provides a deep ultraviolet aluminum nitride wastewater treatment method, comprising the following steps:

[0056] S1. Real-time acquisition of a first water quality parameter for indicating the sewage quality in each treatment component 10; specifically, the first water quality parameter includes the contents of chemical oxygen demand, nitrate, nitrite and phenols in the sewage; wherein, the chemical oxygen demand COD is obtained by real-time measurement by an online COD analyzer; nitrate is obtained by real-time measurement by an online nitrate analyzer; nitrite is obtained by real-time measurement by an online nitrite analyzer; phenol compounds are obtained by real-time measurement by an online phenol analyzer; it should be noted that the online COD analyzer, the online nitrate analyzer, the online nitrite analyzer and the online phenol analyzer are all prior arts and will not be described in detail herein.

[0057] S2. Calculate a second water quality parameter for representing the water quality of all sewage according to the change of the first water quality parameter of the sewage in each treatment component 10; specifically, when calculating the treatment effect of the overall sewage according to the first water quality parameter, it is impossible to directly calculate whether the chemical oxygen demand, nitrate, nitrite and phenol content of the overall sewage meet the standards, so it is necessary to calculate whether the sewage meets the standards as a whole according to the change of the first water quality parameter of the sewage in each treatment component 10. Therefore, in step S2, the following steps are specifically included:

[0058] S21, calculate the removal rate R of each impurity in the sewage by each treatment component 10 at each time point ijt , and its calculation formula is:

[0059]

[0060] In the formula, C (i，j-1，t) and C ijt represent respectively the concentration of the i-th pollutant in the sewage in the j-1-th and j-th treatment components 10 at the current time point t;

[0061] S22, based on the removal rate R at the current time point t and the previous time point t-1 ijt Calculate the removal change rate ΔR ijt , and its calculation formula is:

[0062] ΔR ijt =R ijt -R ij(t-1)

[0063] In the formula, R ijt and R ij(t-1) They represent the removal rate of the jth pollutant by the i-th processing component 10 at time point t and time point t-1 respectively;

[0064] S23. Calculate the average removal rate R of each pollutant i , and its calculation formula is:

[0065]

[0066] Wherein, n represents the total number of treatment components 10; T represents the total time from the beginning of sewage treatment to the present; α represents the influence degree weight; in the present invention, the first water quality parameter is obtained once per second, so the time interval between time point t and time point t-1 is 1 second; α is 0.25;

[0067] S24, according to the average removal rate R i Calculate the final concentration C of each pollutant if And use it as the second water quality parameter, and its calculation formula is:

[0068]

[0069] In the formula, C i0 It indicates the first water quality parameter obtained when sewage treatment is just started.

[0070] In step S2 of the present invention, considering that the sewage quality detection equipment set in the treatment component 10 cannot effectively and accurately evaluate the sewage quality at all locations of the entire system, and the treatment effect of each treatment component 10 on different pollutants in the sewage may be different, the removal rate R of each treatment component 10 is first calculated. ijt , then calculate the removal change rate ΔR ijt , to represent the concentration change trend of each pollutant in the sewage in each treatment component 10, which can be used to more accurately evaluate the concentration change trend of each pollutant in the entire system, and finally calculate the final concentration C of each pollutant based on it. if , which can effectively improve the calculation accuracy of the concentration of each pollutant in the entire system; compared with other calculation methods, it is not limited to the data obtained by the data acquisition device, but comprehensively considers the performance differences of each treatment component 10 and the overall trend of changes in the concentration of sewage pollutants, and calculates the final concentration of each pollutant based on this, which can effectively improve the calculation accuracy and facilitate the judgment of whether the sewage meets the treatment standards.

[0071] S3, defining a standard water quality parameter that meets the minimum sewage treatment standard, and determining whether the second water quality parameter is higher than the standard water quality parameter;

[0072] If yes, proceed to step S4;

[0073] If not, return to step S1 and continue to treat the sewage; specifically, set standard water quality parameters according to industry standards, including the chemical oxygen demand, nitrate, nitrite, ammonia nitrogen and phenol content in the sewage meeting the minimum parameters of the treatment standards. If the second water quality parameters are all higher than the standard water quality parameters, it means that the sewage meets the treatment standards (that is, the second water quality parameters are higher than the standard water quality parameters).

[0074] S4. The sewage is discharged through the drain pipe 7. Specifically, after the sewage meets the treatment standard, it can be discharged through the drain pipe 7 so as to carry out the next sewage treatment.

[0075] It should be noted that the chemical process of ultraviolet water treatment in the present invention includes:

[0076] (1) Ultraviolet light degrades organic matter in COD, and its chemical formula is:

[0077] ROOH+hv→CO2+H2O

[0078] ROOH represents any organic compound, hv represents a photon

[0079] Take methanol as an example:

[0080] CH3OH+hv→CO2+2H2O

[0081] The degradation process of phenols by ultraviolet light is more complicated:

[0082] ① Initial excitation:

[0083] Ultraviolet light (HV) triggers absorption in molecules, causing changes in their electronic structure, such as:

[0084] hv+C6H5OH→·(C6H5OH)

[0085] ② Free radical excitation:

[0086] The excited state (·) breaks into free radicals, initiating the chain reaction:

[0087] ·C6H5OH→·+R

[0088] Wherein, R represents a free radical;

[0089] ③Diffusion and decomposition:

[0090] The free radicals diffuse along the benzene ring and cause partial or complete breakage of the molecular chain, releasing gases (such as nitric oxide and oxygen) and generating new free radicals, such as:

[0091] Diffusion of intermediate radicals may lead to the breakage of the ring structure:

[0092] ·C6H5OH+·hv→C2H5OH+(product)

[0093] ④ Final reaction:

[0094] The resulting free radicals interact with molecules to form simpler fragments or break down into other substances:

[0095]

[0096] ⑤ Comprehensive complete equation:

[0097] After integrating the above steps, the overall reaction equation for the decomposition of phenols under deep ultraviolet light can be expressed as follows:

[0098] 2hv+C6H5OH+4e - →HOC6H5+3hv

[0099] Or simplified to:

[0100] C6H5OH+2hv→C6H5O·+H +

[0101] C6H5O·+·OH→C6H5OH2 +

[0102] C6H5OH2 + →C6H5O + +H +

[0103] C6H5O + + ·OH→CO2+H2O

[0104] (2) Ultraviolet light degrades nitrate / nitrite in COD:

[0105] Nitrosamine compounds (NAs) are the main type of pollutants among N-nitroso compounds. The World Health Organization (WHO), the United States Environmental Protection Agency (USEPA) and my country's national standards all stipulate that the concentration of N-nitroso compounds in discharged water shall not exceed 10 mg / L (GB / T5750.5-2006). More than 90% of N-nitroso compounds have been proven to be carcinogenic. The International Agency for Research on Cancer (IARC) classified NAs as strong carcinogens in 1987.

[0106] UV degradation technology is one of the main ways to degrade N-nitroso compounds. UV degradation technology does not require the use of toxic and harmful chemical reagents, has simple equipment, easy operation, low cost and is not affected by by-products.

[0107] Under irradiation with deep ultraviolet light (UV-C), nitrates (e.g. wastewater containing nitrate ions) are decomposed into nitrogen oxides or simpler products through photochemical reactions.

[0108] After UV degradation, the NN bond of N-nitroso compounds (NDMA) is homogeneously cleaved into [(CH3)2·N(+)H] and ·NO free radicals:

[0109] NDMA+hv→[(CH3)2·N(+)H]+·NO

[0110] When dissolved oxygen (DO) in water and ultraviolet light degrade aqueous solutions, superoxide anion free radicals (·O2 - ), whose expression is:

[0111] NDMA+DO+hv→[(CH3)2·N(+)H]+·NO+·O2 -

[0112] OH - +hv+H2O→·O2 -

[0113] ·NO free radical and superoxide anion free radical·O2 - Combination can generate the key intermediate ONOO - ;ONOO - Singlet oxygen is generated under the action of hydroxyl radical OH 1 O2.

[0114] The above comprehensive reaction equation is:

[0115] 2NO3 - +hv→2NO2 - +O2

[0116] 2NO2 - +hv→N2+2O2

[0117] (3) Analysis of UVC's ability to degrade proteins and amino acids:

[0118] Deep ultraviolet light (UV-C) is a highly efficient photochemical decomposition technology that can decompose organic compounds, including proteins and amino acids, by exciting molecular structures and initiating free radical breakage. The main reason why UVC can cause protein denaturation is that ultraviolet rays have enough energy to excite electrons within protein molecules and cause them to undergo chemical reactions. In protein molecules, ultraviolet rays can interact with conjugated double bonds in aromatic amino acids (such as phenylalanine, tyrosine, etc.), causing them to oxidize, break or cross-link, thereby changing the structure and function of the protein. In addition, ultraviolet rays can also react with covalent bonds such as disulfide bonds and amide bonds in proteins, causing protein breakage and cross-linking. These reactions may cause changes in the three-dimensional structure of the protein, causing it to lose its normal function and even cause it to form irreversible precipitation and aggregates.

[0119] Phenylpyruvic acid, tyrosine and tryptophan in the amino acids that make up proteins contain conjugated double bonds in the benzene ring, among which: the maximum absorption wavelength of phenylalanine is at 259, the maximum absorption wavelength of tyrosine is at 278, and the maximum absorption wavelength of tryptophan is at 279. Therefore, irradiation with ultraviolet light at 260nm will quickly and effectively destroy proteins.

[0120] Generally speaking, proteins and amino acids are organic molecules composed of carbon-oxygen (CO) bonds, which are decomposed by excited state generation, free radical formation and chain breakage under light. The following is a simplified decomposition process:

[0121] ① Initial irradiation:

[0122] Single photon energy absorption:

[0123] hv→E excited

[0124] When a protein or amino acid molecule absorbs a photon, the molecule breaks in an excited state and generates free radicals.

[0125] ②Free radical diffusion and chain breakage:

[0126] The free radical diffuses within the molecule and causes the breaking of the carbon-oxygen bond. The overall reaction equation is:

[0127] [C x H y O z N m ] · →[C x-1 H y O z N m - ]+H ·

[0128] In the above reaction: [C x H y O z N m ] is the original molecule; [C x H y O z N m ] · It is an excited state that absorbs the energy of a single photon; the free radical H · This causes the carbon-oxygen bond to break, generating a new molecule [C x-1 H y O z N m - ] and hydrogen radicals H · .

[0129] ③Final product generation:

[0130] releasing simple molecules or further breaking down into water or other simpler substances.

[0131] ④Protein decomposition reaction:

[0132] Assume that a protein (composed of carbon chains, oxygen and nitrogen atoms) absorbs multiple single photon energies and breaks, which may eventually generate amino acids (such as α-cysteine), thiols (such as γ-hemithiols) and water.

[0133] Its overall equation (simplified form):

[0134] 2hv+protein→α-cysteine+γ-hemithiols+H2O

[0135] ⑤ Decomposition reaction of amino acids:

[0136] Amino acids are smaller molecules and are more easily broken down by a single photon of energy.

[0137] The overall equation (simplified form):

[0138] hv+Amino Acid→[Simple molecule]

[0139] For example: glycine decomposes into CO and H2; alanine decomposes into CO, NH3 and other small molecules.

[0140] These equations are simplified general formulas. Actual reactions may involve multiple intermediate steps and complex decomposition pathways. Factors such as experimental conditions, light intensity, and medium will affect the type and amount of the final product.

[0141] (4) Ultraviolet light degrades ammonia nitrogen:

[0142] NH3+4H2O+5hv→NO2 -+9H +

[0143] Under the irradiation of deep ultraviolet light (UV-C), ammonia nitrogen in water bodies undergoes a free radical chain reaction mechanism.

[0144] is decomposed into nitrogen and hydrogen. The overall chemical equation for the reaction is:

[0145]

[0146] This reaction describes the process by which an NH3 molecule decomposes into half a nitrogen molecule and six hydrogen molecules under the irradiation of four single photons of energy (hv).

[0147] The specific reaction mechanism includes the following steps:

[0148] ① Initial irradiation excitation:

[0149] Hv irradiates NH3 molecules, causing them to absorb light energy and ionize or break up, for example:

[0150] hv+NH3→ · (NH3)

[0151] ② Free radical excitation:

[0152] The first free radical is generated, which initiates the chain reaction:

[0153] · (NH3) → NH3 ··

[0154] ③Free radical diffusion and breakage:

[0155] Free radical molecules diffuse within the molecule, resulting in the breaking of molecular chains. For example, part of NH3 decomposes into nitrogen and hydrogen:

[0156] NH3+4hv→N2↑+H2↑

[0157] ④Final simplification:

[0158] Free radicals interact with environmental substances to generate stable products. For example, half of nitrogen and hydrogen are generated:

[0159]

[0160] This decomposition reaction is a basic radiation molecular electron excitation process and is based on the photochemical kinetic mechanism.

[0161] (5) Analysis of UVC’s ability to degrade sulfides:

[0162] The comprehensive pollutants include highly toxic sulfur compounds. Through ultraviolet light irradiation, the sulfides can be decomposed and non-toxic solid sulfur can be obtained. Figure 7 It can be seen that the best wavelength for decomposing sulfides is deep ultraviolet light of about 225nm.

[0163] Deep ultraviolet light (UV-C) is an efficient decomposition of sulfur compounds (such as H2S, SO4 2- , HS - The decomposition is achieved by exciting molecules and initiating a free radical reaction mechanism. The following is a simplified decomposition process:

[0164] The decomposition steps of H2S are as follows:

[0165] ① Initial irradiation (absorbing single or multiple single photon energy):

[0166] H2S molecules absorb a single photon of energy (about 257nm) to form excited state molecules:

[0167] H2S+hv→[HS]

[0168] Here, [HS]· is the excited state of H2S.

[0169] ② Free radical generation:

[0170] The excited state molecule decomposes into free radicals of sulfur and hydrogen atoms:

[0171] [HS] →H+S

[0172] ③Further decomposition:

[0173] Hydrogen radicals may participate in oxidation reactions or other cleavage reactions. For example, in the presence of water, the final products may be sulfur, hydrogen, and other simple compounds.

[0174] The complete total decomposition equation can be expressed as:

[0175] 2H2S+2hv→4HS - (Decomposed into HS - and then further) or more complex decomposition products (such as S, H2SO4, etc.).

[0176] SO4 2- The steps of decomposition are as follows:

[0177] ① Initial irradiation:

[0178] Sulfate ion molecules absorb single or multiple single photon energy to form excited states:

[0179] SO4 2- +hv→[SO4]

[0180] Among them, [SO4]· is SO4 2- excited state.

[0181] ② Free radical generation:

[0182] The excited state molecules decompose into smaller fragments, usually including products such as S and O2:

[0183] [SO4] → S + 2O2

[0184] Among them, oxygen may be generated by the oxidation of S.

[0185] ③Further reaction:

[0186] The reaction of sulfur with the surrounding medium (such as acidic solution):

[0187] S+H + →H2S

[0188] O2 can combine with other molecules, for example under acidic conditions:

[0189] H + +O2→NO x or other oxidation products.

[0190] The complete total decomposition equation can be expressed as:

[0191] SO4 2- +2hv→S(solid)+4H + →H2S (under acidic conditions)

[0192] HS - The steps of decomposition are as follows:

[0193] ① Initial irradiation:

[0194] The bisulfite ion molecule forms an excited state by absorbing single or multiple single photon energy:

[0195] HS - +hv→[HS - ]·

[0196] Among them, [HS - ]·HS - excited state.

[0197] ② Free radical generation:

[0198] The excited state molecule decomposes into free radicals of S and H atoms:

[0199] [HS - ]·→S+H

[0200] ③Further reaction:

[0201] Hydrogen atoms may participate in oxidation or reduction reactions. For example, under acidic conditions, H + Combine to form more complex decomposition products.

[0202] The complete total decomposition equation can be expressed as:

[0203] HS - +2hv→S(solid)+H +

[0204] Comprehensive decomposition of three sulfur-containing compounds (overall reaction formula):

[0205] In the presence of H2S, SO4 2- and HS - In mixed pollution systems, UV-C light usually decomposes H2S first and then gradually decomposes SO4 2- and HS - , the overall decomposition process can be expressed as:

[0206] 2H2S+SO4 2- +2hv→3S(solid state)+4H +

[0207] Where: H + In acidic solutions, it mainly comes from the release of decomposition products; the final solid sulfur (S) is an important solid pollutant.

[0208] Reaction mechanism summary:

[0209] Combining the above processes, we can derive an overall reaction formula suitable for treating mixed sulfur-containing pollution systems:

[0210] 2H2S+SO4 2- +3hv→3S(solid state)+4H +

[0211] The above equation is a simplified form, and the specific decomposition products may vary depending on external conditions (such as pH, temperature, etc.).

[0212] (6) Deep ultraviolet light activated β-AL2O3 crystals:

[0213] When deep ultraviolet light of the corresponding wavelength is irradiated onto the C surface of the β-AL2O3 crystal, oxygen vacancies and hydroxide ion active sites will be formed on the C surface of the crystal, generating chemical reaction activity.

[0214] The use of high temperatures above 380 degrees or ultraviolet rays below 362nm for irradiation can make β-AL2O3 crystals chemically reactive. For β-AL2O3 crystals in radioactively contaminated water environments, ultraviolet irradiation is the best active catalytic method.

[0215] β-AL2O3 crystal has a spatial trigonal structure and a density of 3.9-4.1 g / cm 3 , hardness is 9, melting point is 2000±15℃, and it has ion conductivity, such as Figure 8 shown.

[0216] In the "4-Properties of Atoms, Radicals, and Bonds" section of JADean's "Lange's Handbook of Chemistry" (15th edition), it is mentioned that the bond energy of Al-O is 186 kj / mol. When a photon with a bond energy greater than this is irradiated on the molecular bond, it will cause the electrons on the molecular bond to transition, reducing the interatomic attraction. Under the action of water molecules, oxygen vacancies and hydroxide ion pairs are formed, greatly improving the active adsorption of radioactive elements in water.

[0217] The principle of photon excitation is analyzed as follows:

[0218] The calculation formula for the photon energy range corresponding to 200nm to 280nm is:

[0219] (Unit: eV)

[0220] 200nm: E = 6.2eV

[0221] 232nm: E=5.34eV

[0222] 265nm: E = 4.6eV

[0223] 280nm: E = 4.43eV

[0224] Therefore, under UVC ultraviolet light, the calculation method for the electron energy level transition path is:

[0225] ① Ground State to First Excited State.

[0226] ② The Al-O bond energy corresponding to the photon energy of 186 kJ / mol. The unit needs to be converted from kJ / mol to eV, using the Avogadro constant NA = 6.022×1023mol-1:

[0227]

[0228] (Here it is assumed that the bond energy of Al-O bond is the average value)

[0229] ③ Excited state (First Excited State): Photon incidence causes electrons to transition from the ground state to the first excited state.

[0230] ④ Oxygen vacancies (O-Hole) and hydroxide ions (OH - ): When the photon energy is greater than 186 kJ / mol, it not only triggers the transition from the ground state to the excited state, but also forms oxygen vacancies and hydroxide ions under the action of water molecules.

[0231] Through calculation, we know that when the photon energy E≥E 键能 When the AO bond is decomposed, the molecular bond can be decomposed, and the photon wavelength corresponding to the decomposition of the AO bond is λ = 362nm. That is, when ultraviolet light less than 362nm irradiates the β-AL2O3 crystal, the crystal surface will be activated, thus having a strong ion adsorption capacity for radioactive substances and ions.

[0232] The records of treatment of chemical oxygen demand, nitrate, nitrite, ammonia nitrogen and phenols in medical wastewater are shown in Table 1.

[0233] Table 1 Treatment results record in sewage

[0234]

[0235] The treatment effect of COD in medical sewage is as follows Figure 6 As shown, compared with chemical disinfection methods, deep ultraviolet disinfection has the characteristics of short disinfection time, high efficiency, wide bactericidal spectrum, simple structure, small footprint, easy operation and maintenance, and no secondary pollution in terms of disinfection effect, use cost and safety.

[0236] The above implementation methods have been described in detail. Specific examples are used herein to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. At the same time, for those skilled in the art, according to the idea of ​​the present invention, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as a limitation on the present invention.

Claims

1. A deep ultraviolet aluminum nitride wastewater treatment device, characterized in that: The invention comprises a pretreatment unit and a deep treatment unit, wherein the pretreatment unit comprises two water inlet tanks (1) for storing sewage, the deep treatment unit is arranged between the two water inlet tanks (1), a filtering device for filtering large particle impurities and suspended matter in the sewage is arranged inside the water inlet tank (1), the deep treatment unit comprises a plurality of treatment components (10), a disinfection structure for deeply disinfecting the sewage is arranged inside the treatment component (10), ozone aeration pipes (5) are arranged on both sides of the treatment component (10), and the ozone aeration pipes (5) are used to guide the circulation of sewage and disinfect the sewage.

2. The sewage treatment device according to claim 1, characterized in that: The disinfection structure comprises a plurality of quartz tubes (11), wherein the plurality of quartz tubes (11) are fixedly arranged inside the processing assembly (10), a substrate (12) is arranged inside the quartz tubes (11), and deep ultraviolet LED light strips are fixedly connected to both sides of the substrate (12).

3. The sewage treatment device according to claim 1, characterized in that: A circulation pipe (4) is provided between the two water inlet bins (1), and the circulation pipe (4) is used to connect the sewage in the two water inlet bins (1). The treatment component (10) is arranged at an angle to increase the time the sewage stays in the treatment component (10).

4. The sewage treatment device according to claim 1, characterized in that: A water inlet pipe (3) is provided on one side of one of the water inlet bins (1), and a water inlet valve (2) is provided at one end of the water inlet pipe (3) close to the water inlet bin (1); a drainage pipe (7) is provided on one side of the other water inlet bin (1), and an internal circulation drain valve (6) is provided at one end of the drainage pipe (7) close to the water inlet bin (1).

5. The sewage treatment device according to claim 1, characterized in that: A sewage discharge pipe (9) is provided on one side of the water inlet bin (1), and the sewage discharge pipe (9) is used to discharge large particle impurities and suspended matter filtered out by the filtering equipment.

6. The sewage treatment device according to claim 1, characterized in that: A tap water pipe (8) is provided at the bottom of the treatment component (10), and the tap water pipe (8) is used to guide clean water to clean the interior of the treatment component (10).

7. A treatment method applied to the sewage treatment device according to any one of claims 1 to 6, characterized in that: The following steps are involved: S1. Real-time acquisition of a first water quality parameter for indicating the water quality of sewage in each treatment component; S2. Calculating a second water quality parameter for representing the water quality of all sewage according to the change of the first water quality parameter of the sewage in each treatment component; S3, defining a standard water quality parameter that meets the minimum sewage treatment standard, and determining whether the second water quality parameter is higher than the standard water quality parameter; If yes, proceed to step S4; If not, return to step S1 and continue to treat the sewage; S4. Discharge the sewage through the drain pipe.

8. The processing method according to claim 7, characterized in that: The first water quality parameter includes chemical oxygen demand, nitrate, nitrite and phenol content in sewage.

9. The processing method according to claim 7, characterized in that: In step S2, the following steps are specifically included: S21. Calculate the removal rate R of each impurity in the sewage by each treatment component at each time point ijt , and its calculation formula is: In the formula, C (i，j-1，t) and C ijt They represent the concentration of the i-th pollutant in the sewage in the j-1th and jth treatment components at the current time point t, respectively; S22, based on the removal rate R at the current time point t and the previous time point t-1 ijt Calculate the removal change rate ΔR ijt , and its calculation formula is: ΔR ijt =R ijt -R ij(t-1) In the formula, R ijt and R ij(t-1) They represent the removal rate of the jth pollutant by the ith treatment component at time point t and time point t-1 respectively; S23. Calculate the average removal rate R of each pollutant i , and its calculation formula is: In the formula, n represents the total number of treatment components; T represents the total time from the beginning of sewage treatment to the present; α represents the impact weight; S24, according to the average removal rate R i Calculate the final concentration C of each pollutant if And use it as the second water quality parameter, and its calculation formula is: In the formula, C i0 It indicates the first water quality parameter obtained when sewage treatment is just started.

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