Method and device for detecting acid etching rate of core glass

Abstract

The invention discloses a method and a device for detecting the acid etching rate of core glass. The method comprises the following steps: acquiring an initial end face image and an acid etching end face image sequence corresponding to a sample micro-channel plate blank; a plurality of target micropores are selected from the initial end face image, a micropore acid etching image sequence corresponding to each target micropore is intercepted from the acid etching end face images according to the position coordinates corresponding to each target micropore, and the micropore acid etching image sequence corresponding to each target micropore comprises a plurality of micropore acid etching images corresponding to the target micropore; determining a plurality of total optical flow motion fields corresponding to each target micropore based on a preset optical flow algorithm and the plurality of micropore acid etching images corresponding to each target micropore; determining the maximum motion rate value in the plurality of total optical flow motion fields as a target motion rate value corresponding to the sample micro-channel plate blank; and determining the core glass acid etching rate corresponding to the sample micro-channel plate blank according to the target movement rate value and a preset data table.

Description

Technical Field

[0001] The present application relates to the technical field of microchannel plate performance detection, and in particular to a method and device for detecting the acid etching rate of core glass. Background Art

[0002] The microchannel plate is an electron multiplying device composed of tens of millions of micropores with an inner diameter of 5-7 microns. It has the advantages of small size, light weight, good resolution, high gain, low noise, and low voltage. When an electron is injected into a micropore contained in the microchannel plate, the electron can be multiplied into hundreds of thousands of electrons after colliding with the inner wall of the micropore and ejected from the other end of the micropore. The microchannel plate with this characteristic has become the core component for realizing the photoelectric multiplication function in low-light night vision devices, medical imaging equipment and other equipment.

[0003] The preparation process of the microchannel plate is relatively complicated: first, the skin glass tube and the core glass rod made of two different glass materials are nested together and drawn into micron-sized filaments; second, a large number of micron-sized filaments are arranged into an array and then hot-pressed to synthesize a rod bundle composed of multiple filaments; third, the rod bundle is cut into thin slices with a thickness of about 0.8 mm to obtain the blank of the microchannel plate; then, the microchannel plate blank is immersed in an acid solution. Since the core glass is easily corroded by the acid solution, while the skin glass has a strong tolerance to the acid solution, the acid solution can corrode the core glass in the microchannel plate blank, while the skin glass is retained, thereby forming a large number of micropores; finally, the corroded microchannel plate blank is subjected to hydrogen reduction, hot and cold processing and other operations to prepare the finished microchannel plate.

[0004] The skin glass of each micropore in the microchannel plate has the function of electron multiplication. Therefore, when preparing the microchannel plate, the core glass needs to be completely corroded and the skin glass needs to be completely retained so that the microchannel plate can have the best electron multiplication effect. However, although the skin glass has a strong tolerance to acid solution, if the microchannel plate blank is immersed in the acid solution for a long time, the acid solution will also corrode part of the skin glass. Therefore, when preparing the finished microchannel plate based on multiple microchannel plate blanks, it is necessary to first select a sample microchannel plate blank from multiple microchannel plate blanks, and detect the acid etching rate of the sample microchannel plate blank (that is, the rate at which the acid solution corrodes the core glass). In the subsequent process of preparing the finished microchannel plate, the time for each microchannel plate blank to be immersed in the acid solution is determined based on the acid etching rate corresponding to the sample microchannel plate blank.

[0005] At present, the weighing method is usually used to detect the acid etching rate of the sample microchannel plate blank, that is, first use an electronic scale to measure the weight of the sample microchannel plate blank, then immerse the sample microchannel plate blank in an acid solution, take out the sample microchannel plate blank after a preset time, and use an electronic scale to measure the weight of the sample microchannel plate blank again, and finally, calculate the acid etching rate of the sample microchannel plate blank based on the weight obtained from the two measurements, the preset time and the end surface area of ​​the sample microchannel plate blank. However, when the measurement accuracy of the electronic scale used is low, or the detection staff is inexperienced and improperly operated, the weight of the sample microchannel plate blank cannot be accurately measured, which will cause the detected acid etching rate of the sample microchannel plate blank to be inaccurate. Summary of the invention

[0006] The embodiments of the present application provide a method and device for detecting the acid etching rate of core glass, the main purpose of which is to improve the accuracy of detecting the acid etching rate of a sample microchannel plate blank.

[0007] In order to solve the above technical problems, the embodiments of the present application provide the following technical solutions:

[0008] In a first aspect, the present application provides a method for detecting the acid etching rate of core glass, the method comprising:

[0009] Acquire an initial end face image and an acid-etched end face image sequence corresponding to the sample microchannel plate blank, wherein the initial end face image is an image obtained by photographing the target area of ​​the sample microchannel plate blank by a photographing device before the target area is acid-etched with an acid solution, and the acid-etched end face image sequence includes a plurality of acid-etched end face images, and the plurality of acid-etched end face images are a plurality of images in a continuous shooting order obtained by photographing the target area by the photographing device after the target area is acid-etched with an acid solution;

[0010] Selecting a plurality of target micropores in the initial end face image, and intercepting a micropore acid etching image sequence corresponding to each target micropore in the plurality of acid etching end face images according to the position coordinates corresponding to each target micropore, wherein the position coordinates corresponding to the target micropore are used to indicate the position of the target micropore in the initial end face image, and the micropore acid etching image sequence corresponding to the target micropore includes a plurality of micropore acid etching images corresponding to the target micropore;

[0011] Determine a plurality of total optical flow motion fields corresponding to each of the target micropores based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each of the target micropores;

[0012] Determine the maximum motion rate value in the plurality of the total optical flow motion fields as the target motion rate value corresponding to the sample microchannel plate blank;

[0013] The core glass etching rate corresponding to the sample microchannel plate blank is determined according to the target movement rate value and a preset data table, wherein the preset data table includes a plurality of preset movement rate intervals and a core glass etching rate corresponding to each preset movement rate interval.

[0014] In a second aspect, the present application further provides a device for detecting the acid etching rate of core glass, the device comprising:

[0015] An acquisition unit is used to acquire an initial end face image and an acid-etched end face image sequence corresponding to the sample microchannel plate blank, wherein the initial end face image is an image obtained by photographing the target area of ​​the sample microchannel plate blank by a photographing device before the target area is acid-etched with an acid solution, and the acid-etched end face image sequence includes a plurality of acid-etched end face images, and the plurality of acid-etched end face images are a plurality of images in a continuous shooting order obtained by photographing the target area by the photographing device after the target area is acid-etched with an acid solution;

[0016] A capture unit, used for selecting a plurality of target micropores in the initial end face image, and capturing a micropore acid etching image sequence corresponding to each target micropore in the plurality of acid etching end face images according to the position coordinates corresponding to each target micropore, wherein the position coordinates corresponding to the target micropore are used to indicate the position of the target micropore in the initial end face image, and the micropore acid etching image sequence corresponding to the target micropore includes a plurality of micropore acid etching images corresponding to the target micropore;

[0017] A first determining unit is used to determine a plurality of total optical flow motion fields corresponding to each of the target micropores based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each of the target micropores;

[0018] A second determining unit is used to determine the maximum motion rate value in the plurality of the total optical flow motion fields as the target motion rate value corresponding to the sample microchannel slab blank;

[0019] The third determination unit is used to determine the core glass etching rate corresponding to the sample microchannel plate blank according to the target movement rate value and a preset data table, wherein the preset data table includes multiple preset movement rate intervals and the core glass etching rate corresponding to each preset movement rate interval.

[0020] In a third aspect, an embodiment of the present application provides a storage medium, wherein the storage medium includes a stored program, wherein when the program is running, the device where the storage medium is located is controlled to execute the method for detecting the core glass acid etching rate described in the first aspect.

[0021] In a fourth aspect, an embodiment of the present application provides a device for detecting the acid etching rate of core glass, the device comprising a storage medium; and one or more processors, the storage medium being coupled to the processor, the processor being configured to execute program instructions stored in the storage medium; when the program instructions are executed, the method for detecting the acid etching rate of core glass described in the first aspect is executed.

[0022] By means of the above technical solution, the technical solution provided by this application has at least the following advantages:

[0023] The present application provides a method and device for detecting the acid etching rate of core glass. The present application can enable the detection staff to obtain the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank through a shooting device, and store the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank in the local storage space of the target terminal device. Then, the acid etching rate detection application obtains the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank in the local storage space of the target terminal device, and randomly selects N acid etching end face images with continuous shooting order from the multiple acid etching end face images to form an acid etching end face image sequence corresponding to the sample microchannel slab blank. Column; secondly, the etching rate detection application selects multiple target micropores in the initial end face image, and intercepts the micropore etching image sequence corresponding to each target micropore in the multiple etching end face images according to the position coordinates corresponding to each target micropore, and determines the multiple total optical flow motion fields corresponding to each target micropore based on the preset optical flow algorithm and the multiple micropore etching images contained in the micropore etching image sequence corresponding to each target micropore, and determines the maximum motion rate value in the multiple total optical flow motion fields as the target motion rate value corresponding to the sample microchannel slab blank, and determines the core glass etching rate corresponding to the sample microchannel slab blank according to the target motion rate value corresponding to the sample microchannel slab blank and the preset data table. Because, in this application, the etching rate detection application can determine the core glass etching rate corresponding to the sample microchannel slab blank only by the detection staff taking the initial end face image and multiple etching end face images corresponding to the sample microchannel slab blank through the shooting device, and the detection staff does not need to intervene in the whole process, and the electronic scale will not be used, so as to ensure the accuracy of the etching rate detection of the sample microchannel slab blank.

[0024] The above description is only an overview of the technical solution of the present application. In order to more clearly understand the technical means of the present application, it can be implemented in accordance with the contents of the specification. In order to make the above and other purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are listed below. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] By reading the detailed description below with reference to the accompanying drawings, the above and other purposes, features and advantages of the exemplary embodiments of the present application will become easy to understand. In the accompanying drawings, several embodiments of the present application are shown in an exemplary and non-limiting manner, and the same or corresponding reference numerals represent the same or corresponding parts, wherein:

[0026] Figure 1 A flow chart of a method for detecting the acid etching rate of core glass provided in an embodiment of the present application is shown;

[0027] Figure 2 A flow chart of another method for detecting the acid etching rate of core glass provided in an embodiment of the present application is shown;

[0028] Figure 3 A block diagram showing a core glass acid etching rate detection device provided in an embodiment of the present application is shown;

[0029] Figure 4 A block diagram showing the composition of another core glass acid etching rate detection device provided in an embodiment of the present application is shown. DETAILED DESCRIPTION

[0030] The exemplary embodiments of the present application will be described in more detail below with reference to the accompanying drawings. Although the exemplary embodiments of the present application are shown in the accompanying drawings, it should be understood that the present application can be implemented in various forms and should not be limited by the embodiments described herein. On the contrary, these embodiments are provided in order to enable a more thorough understanding of the present application and to fully convey the scope of the present application to those skilled in the art.

[0031] In addition, the words “first”, “second” and the like used in the present application do not indicate any order, quantity or importance, but are only used to distinguish different parts.

[0032] It should be noted that, unless otherwise specified, the technical terms or scientific terms used in this application should have the common meanings understood by technicians in the field to which this application belongs.

[0033] At present, the weighing method is usually used to detect the acid etching rate of the sample microchannel plate blank, that is, first use an electronic scale to measure the weight of the sample microchannel plate blank, then immerse the sample microchannel plate blank in an acid solution, take out the sample microchannel plate blank after a preset time, and use an electronic scale to measure the weight of the sample microchannel plate blank again, and finally, calculate the acid etching rate of the sample microchannel plate blank based on the weight obtained from the two measurements, the preset time and the end surface area of ​​the sample microchannel plate blank. However, when the measurement accuracy of the electronic scale used is low, or the detection staff is inexperienced and improperly operated, the weight of the sample microchannel plate blank cannot be accurately measured, which will cause the detected acid etching rate of the sample microchannel plate blank to be inaccurate.

[0034] Therefore, in order to improve the accuracy of detecting the acid etching rate of the sample microchannel plate blank, the embodiment of the present application provides a method for detecting the acid etching rate of the core glass, such as Figure 1 As shown, the method at least includes 101-105.

[0035] 101. Obtain an initial end face image and an acid-etched end face image sequence corresponding to the sample microchannel plate blank.

[0036] Among them, the initial end face image is an image obtained by photographing the target area by a photographing device before etching the target area of ​​the sample microchannel plate blank with an acid solution, and the acid-etched end face image sequence includes multiple acid-etched end face images. The multiple acid-etched end face images are multiple images in a continuous shooting order obtained by photographing the target area by a photographing device after etching the target area with an acid solution.

[0037] In the embodiment of the present application, the executor in each step is an acid etching rate detection application running in a target terminal device, wherein the target terminal device may be, but is not limited to, a computer, a tablet computer, a laptop computer, and the like.

[0038] Among them, after placing the sample microchannel plate blank on the loading platform, the inspection staff uses a shooting device to shoot the target area of ​​the sample microchannel plate blank to obtain the initial end face image corresponding to the sample microchannel plate blank; after using an acid solution to acid-etch the target area (i.e., dripping the acid solution on the target area), and waiting for 10 seconds, the target area is continuously shot by the shooting device at a shooting time interval of 0.001 seconds to obtain multiple acid-etched end face images corresponding to the sample microchannel plate blank, wherein the acid solution used can be but is not limited to nitric acid with a concentration of 65%; wherein the shooting device is electrically connected to the target terminal device, and after the shooting device obtains the initial end face image and multiple acid-etched end face images corresponding to the sample microchannel plate blank, the initial end face image and multiple acid-etched end face images corresponding to the sample microchannel plate blank can be sent to the target terminal device, and the target terminal device can store the initial end face image and multiple acid-etched end face images corresponding to the sample microchannel plate blank in the local storage space. When it is necessary to detect the etching rate of the sample microchannel plate blank, the etching rate detection application can obtain the initial end face image and multiple etching end face images corresponding to the sample microchannel plate blank in the local storage space of the target terminal device, and randomly select N etching end face images with continuous shooting order from the multiple etching end face images to form an etching end face image sequence corresponding to the sample microchannel plate blank, where N can be but is not limited to 10, 15, 20, etc.

[0039] It should be noted that the optical flow algorithm is suitable for sub-pixel level motion detection. When the motion distance of the same pixel in two images is less than one pixel, the detection effect is better. When the shooting time interval is 0.001s, the motion distance of the same pixel in two adjacent acid-etched end surface images is within 10 -2 pixels to 10 -5 pixels, thus ensuring a better detection effect.

[0040] It should be noted that the photographing device includes an industrial camera and a microscope, and the magnification of the microscope can be but is not limited to 20 times, 30 times, 40 times or 50 times, etc.; wherein the camera chip size and pixel size of the industrial camera are determined according to the inner diameter of the micropores corresponding to the sample microchannel plate blank, the magnification of the microscope and the preset rules. For example, the preset rules are: (1) the inner diameter of each micropore contained in the sample microchannel plate blank occupies at least 30 pixels in the end face image, (2) the larger the field of view of the photographing device, the better, (3) the budget cost of the photographing device is A, the magnification of the microscope is 20 times, and the inner diameter of the micropores corresponding to the sample microchannel plate blank is 6 microns, so the end face image is The size (side length) of each pixel in the face image must be less than 0.2 microns (6 microns divided by 30), and the size (side length) of each pixel in the end face image is the pixel size of the industrial camera divided by the magnification. Therefore, the pixel size of the industrial camera needs to be less than 4 microns, and the field of view of the shooting device is equal to the camera chip size of the industrial camera divided by the magnification of the microscope. The magnification of the microscope is fixed, so the larger the camera chip size of the industrial camera, the larger the field of view of the shooting device. However, the larger the camera chip size of the industrial camera, the higher the cost. Therefore, it is necessary to select a larger camera chip while ensuring that the budget cost of the shooting device is less than or equal to A.

[0041] 102. Select multiple target micropores in the initial end face image, and intercept a micropore acid etching image sequence corresponding to each target micropore in the multiple acid etching end face images according to the position coordinates corresponding to each target micropore.

[0042] Among them, for any target micropore, the position coordinates corresponding to the target micropore are used to indicate the position of the target micropore in the initial end face image. The position coordinates corresponding to the target micropore can specifically be the position coordinates of the center of the target micropore in the initial end face image. The micropore acid etching image sequence corresponding to the target micropore includes multiple micropore acid etching images corresponding to the target micropore.

[0043] Since the positions of some micropores in the acid-etched end face image are difficult to determine, and for the same micropore, its position in the initial end face image and each acid-etched end face image is fixed, the acid-etching rate detection application can select multiple target micropores in the initial end face image after obtaining the initial end face image and the acid-etched end face image sequence corresponding to the sample microchannel plate blank, and determine the position coordinates of each target micropore in the initial end face image, and then find the position of each target micropore in each acid-etched end face image according to the position coordinates of each target micropore in the initial end face image, and intercept the micropore acid-etched image corresponding to each target micropore in each acid-etched end face image to obtain multiple micropore acid-etched images corresponding to each target micropore, thereby forming a micropore acid-etched image sequence corresponding to each target micropore.

[0044] Among them, for any target micropore, after finding the position of the target micropore in a certain acid-etched end face image according to the position coordinates of the target micropore in the initial end face image, the micropore acid-etched image corresponding to the target micropore is intercepted with the center of the target micropore as the center, that is, the center of the intercepted micropore acid-etched image is the center of the target micropore.

[0045] 103. Determine multiple total optical flow motion fields corresponding to each target micropore based on a preset optical flow algorithm and multiple micropore acid etching images corresponding to each target micropore.

[0046] Among them, the preset optical flow algorithm can be but is not limited to the HS optical flow algorithm, the LK optical flow algorithm, the Brox optical flow algorithm, etc., and the embodiments of the present application do not make specific limitations on this.

[0047] After intercepting the micropore etching image sequence corresponding to each target micropore, the etching rate detection application can determine multiple total optical flow motion fields corresponding to each target micropore based on a preset optical flow algorithm and multiple micropore etching images corresponding to each target micropore.

[0048] 104. Determine the maximum motion rate value in the plurality of total optical flow motion fields as the target motion rate value corresponding to the sample microchannel slab.

[0049] After determining a plurality of total optical flow motion fields corresponding to each target micro-hole, the etching rate detection application can determine the maximum motion rate value among the plurality of total optical flow motion fields as the target motion rate value corresponding to the sample micro-channel plate blank.

[0050] 105. Determine the core glass acid etching rate corresponding to the sample microchannel slab according to the target motion rate value and the preset data table.

[0051] Among them, the preset data table contains multiple preset movement rate intervals and the core glass etching rate corresponding to each preset movement rate interval; among them, the testing staff with rich work experience will use an electronic scale with high measurement accuracy to test the core glass etching rate of different batches of sample microchannel slabs in advance to obtain the core glass etching rate corresponding to each batch of sample microchannel slabs, and use the methods described in 101-104 above to detect the target movement rate values ​​corresponding to different batches of sample microchannel slabs, and then count the different target movement rate values ​​corresponding to the same core glass etching rate, and determine the movement rate interval corresponding to each core glass etching rate according to the different target movement rate values ​​corresponding to each core glass etching rate, so as to obtain multiple preset movement rate intervals and the core glass etching rate corresponding to each preset movement rate interval, that is, the preset data table.

[0052] After determining the target movement rate value corresponding to the sample microchannel slab blank, the etching rate detection application can determine the core glass etching rate corresponding to the sample microchannel slab blank according to the target movement rate value corresponding to the sample microchannel slab blank and a preset data table.

[0053] The embodiment of the present application provides a method for detecting the acid etching rate of core glass. The embodiment of the present application can enable the detection staff to obtain the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank through a shooting device, and store the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank in the local storage space of the target terminal device. Then, the acid etching rate detection application obtains the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank in the local storage space of the target terminal device, and randomly selects N acid etching end face images with continuous shooting order from the multiple acid etching end face images to form the acid etching end face image corresponding to the sample microchannel slab blank. sequence; secondly, the etching rate detection application selects multiple target micropores in the initial end face image, and intercepts the micropore etching image sequence corresponding to each target micropore in the multiple etching end face images according to the position coordinates corresponding to each target micropore, and determines the multiple total optical flow motion fields corresponding to each target micropore based on the preset optical flow algorithm and the multiple micropore etching images contained in the micropore etching image sequence corresponding to each target micropore, and determines the maximum motion rate value in the multiple total optical flow motion fields as the target motion rate value corresponding to the sample microchannel slab blank, and determines the core glass etching rate corresponding to the sample microchannel slab blank according to the target motion rate value corresponding to the sample microchannel slab blank and the preset data table. Because, in the embodiment of the present application, the detection staff only needs to shoot the initial end face image and multiple etching end face images corresponding to the sample microchannel slab blank through the shooting device, and the etching rate detection application can determine the core glass etching rate corresponding to the sample microchannel slab blank, and the detection staff does not need to intervene in the whole process, and the electronic scale will not be used, so as to ensure the accuracy of the etching rate detection of the sample microchannel slab blank.

[0054] To explain in more detail below, the present application provides another method for detecting the acid etching rate of the core glass, as follows: Figure 2 As shown, the method includes at least 201-206.

[0055] 201. Obtain an initial end face image and an acid-etched end face image sequence corresponding to a sample microchannel plate blank.

[0056] Regarding step 201, obtaining the initial end face image and the acid-etched end face image sequence corresponding to the sample microchannel plate blank, reference may be made to Figure 1 The description of the corresponding parts will not be repeated here in the embodiments of the present application.

[0057] 202. Generate an edge enhancement image corresponding to each acid-etched end surface image.

[0058] After obtaining the initial end face image and the acid-etched end face image sequence corresponding to the sample microchannel plate blank, the acid-etched rate detection application needs to perform noise reduction and edge enhancement processing on each acid-etched end face image to generate an edge-enhanced image corresponding to each acid-etched end face image. The specific process is as follows:

[0059] (1) Generate target denoising matrices and target edge enhancement matrices corresponding to multiple acid-etched end face images.

[0060] First, according to the micropore inner diameter corresponding to the sample microchannel plate blank and the pixel size corresponding to the acid-etched end face image, the number of pixels occupied by the micropore inner diameter is calculated, that is, the micropore inner diameter corresponding to the sample microchannel plate blank is divided by the pixel size corresponding to the acid-etched end face image (that is, the side length of the pixel), and the calculation result is determined as the number of pixels occupied by the micropore inner diameter, wherein the number of pixels occupied by the micropore inner diameter is the number of pixels occupied by the micropore inner diameter in the acid-etched end face image.

[0061] Secondly, the target noise reduction matrix is ​​generated according to the number of pixels occupied corresponding to the inner diameter of the micropore.

[0062] Among them, when the number of pixels occupied by the micropore inner diameter is an odd number, the generated target noise reduction matrix is ​​specifically:

[0063]

[0064] Among them, the target noise reduction matrix is ​​a k*k matrix, the target noise reduction matrix is ​​centered on n1, the elements surrounding n1 are all n3, the elements surrounding multiple n3 are n5...the outermost circle elements are nk, and k is the number of pixels corresponding to the inner diameter of the micropore; among them, the sum of the multiple elements contained in the target noise reduction matrix is ​​equal to 1;

[0065] Where n1 = 2 / (k+1), i=3, 5, 7…k.

[0066] Among them, when the number of pixels occupied by the micropore inner diameter is an even number, the generated target noise reduction matrix is ​​specifically:

[0067]

[0068] Among them, the target noise reduction matrix is ​​a k*k matrix, the target noise reduction matrix is ​​centered on the 2*2 matrix, each element in the 2*2 matrix is ​​n2, a circle of elements surrounding the 2*2 matrix is ​​n4, a circle of elements surrounding multiple n4 is n6… The outermost circle of elements is nk, and k is the number of pixels corresponding to the inner diameter of the micropore; Among them, the sum of multiple elements contained in the target noise reduction matrix is ​​equal to 1;

[0069] in, i=2, 4, 6…k.

[0070] Finally, the target edge enhancement matrix is ​​generated according to the number of pixels occupied by the inner diameter of the micropore.

[0071] Among them, when the number of pixels occupied by the micropore inner diameter is an odd number, the generated target edge enhancement matrix is ​​specifically:

[0072]

[0073] The target edge enhancement matrix is ​​a k*k matrix, the central element of the target speckle enhancement matrix is ​​1, the outermost circle element is n2, and the remaining elements in the target edge enhancement matrix are all n1; the sum of the multiple elements contained in the target edge enhancement matrix is ​​equal to 1;

[0074] in, k is the number of pixels occupied by the inner diameter of the micropore.

[0075] Among them, when the number of pixels occupied by the micropore inner diameter is an even number, the generated target edge enhancement matrix is ​​specifically:

[0076]

[0077] The target edge enhancement matrix is ​​a k*k matrix, the target edge enhancement matrix is ​​centered on the 2*2 matrix, each element in the 2*2 matrix is ​​1 / 4, the outermost circle element is n4, and the remaining elements in the target edge enhancement matrix are n3; the sum of multiple elements contained in the target edge enhancement matrix is ​​equal to 1;

[0078] in, k is the number of pixels occupied by the inner diameter of the micropore.

[0079] (2) performing a convolution operation on each acid-etched end face image using the target denoising matrix to obtain a denoised image corresponding to each acid-etched end face image;

[0080] The type of convolution operation may specifically be the same convolution operation, that is, for any acid-etched end face image, the target denoising matrix is ​​used to perform the same convolution operation on the acid-etched end face image to obtain a denoised image corresponding to the acid-etched end face image.

[0081] Among them, the target noise reduction matrix is ​​used to perform convolution operation on the acid-etched end face image, which can suppress the noise points in the acid-etched end face image.

[0082] (3) performing convolution budget processing on each denoised image using the target edge enhancement matrix to obtain an edge enhanced image corresponding to each acid-etched end surface image;

[0083] The type of convolution operation may specifically be the same convolution operation, that is, for any denoised image, the denoised image is processed by the same convolution operation using the target edge enhancement matrix to obtain the edge enhancement matrix corresponding to the denoised image.

[0084] Among them, the use of the target edge enhancement matrix to perform convolution operation on the denoised image can effectively control the blurring of micropore boundaries caused by acid etching.

[0085] 203. Select multiple target micropores in the initial end surface image, and intercept a micropore acid etching image sequence corresponding to each target micropore in the multiple edge enhanced images according to the position coordinates corresponding to each target micropore.

[0086] Among them, regarding 203, selecting multiple target micropores in the initial end face image, and intercepting the micropore acid etching image sequence corresponding to each target micropore in the multiple edge enhanced images according to the position coordinates corresponding to each target micropore, you can refer to the relevant description of the above-mentioned step 102, and the embodiment of the present application will not be repeated here.

[0087] 204. Determine a plurality of total optical flow motion fields corresponding to each target micropore based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each target micropore.

[0088] After intercepting the micropore acid etching image sequence corresponding to each target micropore, the acid etching rate detection application can determine the multiple total optical flow motion fields corresponding to each target micropore based on the preset optical flow algorithm and the multiple micropore acid etching images corresponding to each target micropore. The following will explain in detail how the acid etching rate detection application determines the multiple total optical flow motion fields corresponding to each target micropore based on the preset optical flow algorithm and the multiple micropore acid etching images corresponding to each target micropore:

[0089] For any target micropore, firstly, a plurality of micropore acid-etched images are grouped and processed according to the shooting order of each micropore acid-etched image corresponding to the target micropore to obtain a plurality of image groups, wherein, for any micropore acid-etched image, the shooting order corresponding to the micropore acid-etched image is the shooting order corresponding to the acid-etched end surface image to which the micropore acid-etched image belongs, and each image group contains two micropore acid-etched images with adjacent shooting orders; secondly, the lateral optical flow motion field and the longitudinal optical flow motion field corresponding to each image group are extracted based on a preset optical flow algorithm; finally, the lateral optical flow motion field and the longitudinal optical flow motion field corresponding to each image group are merged to obtain a plurality of total optical flow motion fields corresponding to the target micropore.

[0090] The specific process of extracting the lateral optical flow motion field and the longitudinal optical flow motion field corresponding to each image group based on the preset optical flow algorithm is as follows: first, obtain the preset limiting conditions; second, extract the lateral optical flow motion field and the longitudinal optical flow motion field corresponding to each image group based on the preset optical flow algorithm and the preset limiting conditions. The preset limiting conditions are to draw a circle with the center of the micropore acid-etched image as the center and the number of pixels occupied by the inner diameter of the micropores corresponding to the sample microchannel plate blank as the diameter, set the area inside the circle as the first area, and the area outside the circle as the second area, and require that the image gradient change between the pixel points at the edge position of the first area and the pixel points at the edge position of the second area is the maximum.

[0091] 205. Determine the maximum motion rate value in the plurality of total optical flow motion fields as the target motion rate value corresponding to the sample microchannel slab.

[0092] Among them, regarding step 205, determining the maximum motion rate value in the plurality of total optical flow motion fields as the target motion rate value corresponding to the sample microchannel plate blank, reference can be made to Figure 1 The description of the corresponding parts will not be repeated here in the embodiments of the present application.

[0093] 206. Determine the core glass acid etching rate corresponding to the sample microchannel slab according to the target motion rate value and the preset data table.

[0094] After determining the target movement rate value corresponding to the sample microchannel slab blank, the etching rate detection application can determine the core glass etching rate corresponding to the sample microchannel slab blank according to the target movement rate value corresponding to the sample microchannel slab blank and a preset data table.

[0095] Specifically, in this step, the specific process of the acid etching rate detection application determining the core glass acid etching rate corresponding to the sample microchannel slab blank according to the target motion rate value and the preset data table is as follows:

[0096] First, the target motion rate value is matched with a plurality of preset motion rate intervals; secondly, the core glass acid etching rate corresponding to the successfully matched preset motion rate interval is determined as the core glass acid etching rate corresponding to the sample microchannel plate blank.

[0097] Furthermore, as a response to the above Figure 1 and Figure 2 In order to realize the method shown in the figure, another embodiment of the present application also provides a device for detecting the acid etching rate of the core glass. This device embodiment corresponds to the aforementioned method embodiment. For ease of reading, this device embodiment will not repeat the details of the aforementioned method embodiment one by one, but it should be clear that the device in this embodiment can correspond to all the contents of the aforementioned method embodiment. This device is used to improve the accuracy of detecting the acid etching rate of the sample microchannel plate blank, specifically as follows Figure 3 As shown, the device comprises:

[0098] An acquisition unit 31 is used to acquire an initial end face image and an acid-etched end face image sequence corresponding to the sample microchannel plate blank, wherein the initial end face image is an image obtained by photographing the target area of ​​the sample microchannel plate blank by a photographing device before the target area is acid-etched with an acid solution, and the acid-etched end face image sequence includes a plurality of acid-etched end face images, and the plurality of acid-etched end face images are a plurality of images in a continuous shooting order obtained by photographing the target area by the photographing device after the target area is acid-etched with an acid solution;

[0099] A capture unit 32 is used to select a plurality of target micropores in the initial end face image, and capture a micropore acid etching image sequence corresponding to each target micropore in the plurality of acid etching end face images according to the position coordinates corresponding to each target micropore, wherein the position coordinates corresponding to the target micropore are used to indicate the position of the target micropore in the initial end face image, and the micropore acid etching image sequence corresponding to the target micropore includes a plurality of micropore acid etching images corresponding to the target micropore;

[0100] A first determining unit 33 is used to determine a plurality of total optical flow motion fields corresponding to each of the target micropores based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each of the target micropores;

[0101] A second determining unit 34 is used to determine the maximum motion rate value in the plurality of the total optical flow motion fields as the target motion rate value corresponding to the sample microchannel slab;

[0102] The third determination unit 35 is used to determine the core glass etching rate corresponding to the sample microchannel plate blank according to the target movement rate value and a preset data table, wherein the preset data table includes multiple preset movement rate intervals and the core glass etching rate corresponding to each preset movement rate interval.

[0103] Further, such as Figure 4 As shown, the device also includes:

[0104] The processing unit 36 ​​is used to generate a plurality of target noise reduction matrices and target edge enhancement matrices corresponding to the acid-etched end face images after the acquisition unit 31 acquires the initial end face image and the acid-etched end face image sequence corresponding to the sample microchannel plate blank; perform convolution operation processing on each of the acid-etched end face images using the target noise reduction matrix to obtain a noise reduction image corresponding to each of the acid-etched end face images; perform convolution budget processing on each of the noise reduction images using the target edge enhancement matrix to obtain an edge enhancement image corresponding to each of the acid-etched end face images;

[0105] The interception unit 32 is specifically configured to intercept a micropore acid etching image sequence corresponding to each target micropore in the plurality of edge enhanced images according to the position coordinates corresponding to each target micropore.

[0106] Further, such as Figure 4 As shown, the processing unit 36 ​​is specifically used to calculate the number of pixels occupied corresponding to the micropore inner diameter according to the micropore inner diameter corresponding to the sample microchannel plate blank and the pixel size corresponding to the acid-etched end face image; generate the target noise reduction matrix according to the number of pixels occupied corresponding to the micropore inner diameter; generate the target edge enhancement matrix according to the number of pixels occupied corresponding to the micropore inner diameter.

[0107] Further, such as Figure 4 As shown, the first determination unit 33 is specifically used to group the multiple micropore acid etching images according to the shooting order of each micropore acid etching image corresponding to the target micropore to obtain multiple image groups, wherein each image group contains two micropore acid etching images that are adjacent in shooting order; extract the lateral optical flow motion field and the longitudinal optical flow motion field corresponding to each image group based on the preset optical flow algorithm; merge the lateral optical flow motion field and the longitudinal optical flow motion field corresponding to each image group to obtain multiple total optical flow motion fields corresponding to the target micropore.

[0108] Further, such as Figure 4 As shown, the first determination unit 33 is specifically used to obtain a preset limiting condition; and extract the horizontal optical flow motion field and the vertical optical flow motion field corresponding to each of the image groups based on the preset optical flow algorithm and the preset limiting condition.

[0109] Further, such as Figure 4 As shown, the preset limiting condition is to draw a circle with the center of the micropore acid etching image as the center and the number of pixels occupied by the inner diameter of the micropores corresponding to the sample microchannel plate blank as the diameter, set the area inside the circle as the first area, and the area outside the circle as the second area, and require that the image gradient change between the pixel points at the edge position of the first area and the pixel points at the edge position of the second area be the maximum.

[0110] Further, such as Figure 4 As shown, the third determination unit 35 is specifically used to match the target motion rate value with multiple preset motion rate intervals; and determine the core glass acid etching rate corresponding to the successfully matched preset motion rate interval as the core glass acid etching rate corresponding to the sample microchannel plate blank.

[0111] The embodiment of the present application provides a method and device for detecting the acid etching rate of core glass. The embodiment of the present application can, after the detection staff obtains the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank through a shooting device, and stores the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank in the local storage space of the target terminal device, the acid etching rate detection application obtains the initial end face image and multiple acid etching end face images corresponding to the sample microchannel slab blank in the local storage space of the target terminal device, and randomly selects N acid etching end face images with continuous shooting order from the multiple acid etching end face images to form the acid etching end face corresponding to the sample microchannel slab blank. Image sequence; secondly, the etching rate detection application selects multiple target micropores in the initial end face image, and intercepts the micropore etching image sequence corresponding to each target micropore in the multiple etching end face images according to the position coordinates corresponding to each target micropore, and determines the multiple total optical flow motion fields corresponding to each target micropore based on the preset optical flow algorithm and the multiple micropore etching images contained in the micropore etching image sequence corresponding to each target micropore, and determines the maximum motion rate value in the multiple total optical flow motion fields as the target motion rate value corresponding to the sample microchannel slab blank, and determines the core glass etching rate corresponding to the sample microchannel slab blank according to the target motion rate value corresponding to the sample microchannel slab blank and the preset data table. Because, in the embodiment of the present application, the detection staff only needs to shoot the initial end face image and multiple etching end face images corresponding to the sample microchannel slab blank through the shooting device, and the etching rate detection application can determine the core glass etching rate corresponding to the sample microchannel slab blank, and the detection staff does not need to intervene in the whole process, and the electronic scale will not be used, so as to ensure the accuracy of the etching rate detection of the sample microchannel slab blank.

[0112] An embodiment of the present application provides a storage medium, which includes a stored program, wherein when the program is executed, a device where the storage medium is located is controlled to execute the above-mentioned method for detecting the acid etching rate of core glass.

[0113] The storage medium may include non-permanent memory in a computer-readable medium, random access memory (RAM) and / or non-volatile memory in the form of read-only memory (ROM) or flash RAM, and the memory includes at least one storage chip.

[0114] An embodiment of the present application also provides a device for detecting the acid etching rate of core glass, the device comprising a storage medium; and one or more processors, the storage medium is coupled to the processor, and the processor is configured to execute program instructions stored in the storage medium; when the program instructions are executed, the above-mentioned method for detecting the acid etching rate of core glass is executed.

[0115] The embodiment of the present application provides a device, which includes a processor, a memory, and a program stored in the memory and executable on the processor. When the processor executes the program, the following steps are implemented:

[0116] Acquire an initial end face image and an acid-etched end face image sequence corresponding to the sample microchannel plate blank, wherein the initial end face image is an image obtained by photographing the target area of ​​the sample microchannel plate blank by a photographing device before the target area is acid-etched with an acid solution, and the acid-etched end face image sequence includes a plurality of acid-etched end face images, and the plurality of acid-etched end face images are a plurality of images in a continuous shooting order obtained by photographing the target area by the photographing device after the target area is acid-etched with an acid solution;

[0117] Selecting a plurality of target micropores in the initial end face image, and intercepting a micropore acid etching image sequence corresponding to each target micropore in the plurality of acid etching end face images according to the position coordinates corresponding to each target micropore, wherein the position coordinates corresponding to the target micropore are used to indicate the position of the target micropore in the initial end face image, and the micropore acid etching image sequence corresponding to the target micropore includes a plurality of micropore acid etching images corresponding to the target micropore;

[0118] Determine a plurality of total optical flow motion fields corresponding to each of the target micropores based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each of the target micropores;

[0119] Determine the maximum motion rate value in the plurality of the total optical flow motion fields as the target motion rate value corresponding to the sample microchannel plate blank;

[0120] The core glass etching rate corresponding to the sample microchannel plate blank is determined according to the target movement rate value and a preset data table, wherein the preset data table includes a plurality of preset movement rate intervals and a core glass etching rate corresponding to each preset movement rate interval.

[0121] Furthermore, after obtaining the initial end surface image and the acid-etched end surface image sequence corresponding to the sample microchannel plate blank, the method further includes:

[0122] Generate a target noise reduction matrix and a target edge enhancement matrix corresponding to a plurality of the acid-etched end surface images;

[0123] Using the target noise reduction matrix, a convolution operation is performed on each of the acid-etched end surface images to obtain a noise reduction image corresponding to each of the acid-etched end surface images;

[0124] Using the target edge enhancement matrix, performing convolution budget processing on each of the noise reduction images to obtain an edge enhanced image corresponding to each of the acid-etched end surface images;

[0125] The method of intercepting a micropore acid-etched image sequence corresponding to each target micropore from the plurality of acid-etched end surface images according to the position coordinates corresponding to each target micropore comprises:

[0126] A micropore acid etching image sequence corresponding to each target micropore is intercepted from the plurality of edge enhanced images according to the position coordinates corresponding to each target micropore.

[0127] Furthermore, the generating of a target noise reduction matrix and a target edge enhancement matrix corresponding to a plurality of the acid-etched end surface images includes:

[0128] According to the micropore inner diameter corresponding to the sample microchannel plate blank and the pixel point size corresponding to the acid-etched end surface image, the number of pixels occupied corresponding to the micropore inner diameter is calculated;

[0129] Generate the target noise reduction matrix according to the number of pixels occupied by the inner diameter of the micropore;

[0130] The target edge enhancement matrix is ​​generated according to the number of pixels occupied by the inner diameter of the micropores.

[0131] Further, the method of determining a plurality of total optical flow motion fields corresponding to each of the target micropores based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each of the target micropores includes:

[0132] Grouping the plurality of micropore acid etching images according to the shooting order of each micropore acid etching image corresponding to the target micropore to obtain a plurality of image groups, wherein each of the image groups includes two micropore acid etching images that are adjacent in shooting order;

[0133] Extracting the horizontal optical flow motion field and the vertical optical flow motion field corresponding to each of the image groups based on the preset optical flow algorithm;

[0134] The lateral optical flow motion field and the longitudinal optical flow motion field corresponding to each of the image groups are merged to obtain a plurality of total optical flow motion fields corresponding to the target micropores.

[0135] Furthermore, the step of extracting the horizontal optical flow motion field and the vertical optical flow motion field corresponding to each of the image groups based on the preset optical flow algorithm includes:

[0136] Get preset limiting conditions;

[0137] The horizontal optical flow motion field and the vertical optical flow motion field corresponding to each of the image groups are extracted based on the preset optical flow algorithm and the preset limiting conditions.

[0138] Furthermore, the preset limiting condition is to draw a circle with the center of the micropore acid etching image as the center and the number of pixels occupied by the inner diameter of the micropores corresponding to the sample microchannel plate as the diameter, and set the area inside the circle as the first area and the area outside the circle as the second area, and require that the image gradient change between the pixel points at the edge position of the first area and the pixel points at the edge position of the second area be the maximum.

[0139] Further, the determining the core glass acid etching rate corresponding to the sample microchannel plate blank according to the target movement rate value and a preset data table includes:

[0140] Matching the target motion rate value with a plurality of the preset motion rate intervals;

[0141] The core glass acid etching rate corresponding to the successfully matched preset motion rate interval is determined as the core glass acid etching rate corresponding to the sample microchannel plate blank.

[0142] The present application also provides a computer program product, which, when executed on a data processing device, is suitable for executing a program code for initializing the following method steps: obtaining an initial end face image and an acid-etched end face image sequence corresponding to a sample microchannel plate blank, wherein the initial end face image is an image obtained by photographing a target area of ​​the sample microchannel plate blank by a photographing device before the target area is acid-etched with an acid solution, and the acid-etched end face image sequence includes a plurality of acid-etched end face images, and the plurality of acid-etched end face images are a plurality of images in a continuous shooting order obtained by photographing the target area by the photographing device after the target area is acid-etched with an acid solution; selecting a plurality of target micropores in the initial end face image, and intercepting each of the target micropores in the plurality of acid-etched end face images according to the position coordinates corresponding to each of the target micropores; A micropore acid etching image sequence corresponding to a target micropore, wherein the position coordinates corresponding to the target micropore are used to indicate the position of the target micropore in the initial end face image, and the micropore acid etching image sequence corresponding to the target micropore includes multiple micropore acid etching images corresponding to the target micropore; based on a preset optical flow algorithm and multiple micropore acid etching images corresponding to each target micropore, multiple total optical flow motion fields corresponding to each target micropore are determined; the maximum motion rate value in the multiple total optical flow motion fields is determined as the target motion rate value corresponding to the sample microchannel plate blank; the core glass acid etching rate corresponding to the sample microchannel plate blank is determined according to the target motion rate value and a preset data table, wherein the preset data table includes multiple preset motion rate intervals and a core glass acid etching rate corresponding to each of the preset motion rate intervals.

[0143] Those skilled in the art will appreciate that the embodiments of the present application may be provided as methods, systems, or computer program products. Therefore, the present application may adopt the form of a complete hardware embodiment, a complete software embodiment, or an embodiment in combination with software and hardware. Moreover, the present application may adopt the form of a computer program product implemented in one or more computer-usable storage media (including but not limited to disk storage, CD-ROM, optical storage, etc.) that include computer-usable program code.

[0144] The present application is described with reference to the flowcharts and / or block diagrams of the methods, devices (systems), and computer program products according to the embodiments of the present application. It should be understood that each process and / or box in the flowchart and / or block diagram, as well as the combination of the processes and / or boxes in the flowchart and / or block diagram, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing device to generate a machine, so that the instructions executed by the processor of the computer or other programmable data processing device generate instructions for implementing the processes in the flowchart and / or block diagram. Figure 1 A process or multiple processes and / or boxes Figure 1 A device that provides the functions specified in a block or multiple blocks.

[0145] These computer program instructions may also be stored in a computer-readable memory capable of directing a computer or other programmable data processing device to operate in a specific manner, so that the instructions stored in the computer-readable memory produce an article of manufacture comprising an instruction device, which implements the process Figure 1 A process or multiple processes and / or boxes Figure 1 A function specified in one or more boxes.

[0146] These computer program instructions can also be loaded onto a computer or other programmable data processing device so that a series of operating steps are executed on the computer or other programmable device to produce a computer-implemented process, thereby providing instructions for implementing the process in the computer or other programmable device. Figure 1 A process or multiple processes and / or boxes Figure 1 The steps for the functions specified in one or more boxes.

[0147] In a typical configuration, a computing device includes one or more processors (CPU), input / output interfaces, network interfaces, and memory.

[0148] The memory may include non-permanent memory in a computer-readable medium, random access memory (RAM) and / or non-volatile memory in the form of read-only memory (ROM) or flash RAM. The memory is an example of a computer-readable medium.

[0149] Computer readable media include permanent and non-permanent, removable and non-removable media that can be implemented by any method or technology to store information. Information can be computer readable instructions, data structures, program modules or other data. Examples of computer storage media include, but are not limited to, phase change memory (PRAM), static random access memory (SRAM), dynamic random access memory (DRAM), other types of random access memory (RAM), read-only memory (ROM), electrically erasable programmable read-only memory (EEPROM), flash memory or other memory technology, compact disk read-only memory (CD-ROM), digital versatile disk (DVD) or other optical storage, magnetic cassettes, magnetic tape magnetic disk storage or other magnetic storage devices or any other non-transmission media that can be used to store information that can be accessed by a computing device. As defined herein, computer readable media does not include temporary computer readable media (transitory media), such as modulated data signals and carrier waves.

[0150] It should also be noted that the terms "include", "comprises" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, commodity or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, commodity or device. In the absence of more restrictions, the elements defined by the sentence "comprises a ..." do not exclude the existence of other identical elements in the process, method, commodity or device including the elements.

[0151] Those skilled in the art will appreciate that the embodiments of the present application may be provided as methods, systems or computer program products. Therefore, the present application may adopt the form of a complete hardware embodiment, a complete software embodiment or an embodiment in combination with software and hardware. Moreover, the present application may adopt the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to disk storage, CD-ROM, optical storage, etc.) that contain computer-usable program code.

[0152] The above are only embodiments of the present application and are not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included within the scope of the claims of the present application.

Claims

1. A method for detecting the acid etching rate of core glass, characterized in that: The method comprises: Acquire an initial end face image and an acid-etched end face image sequence corresponding to the sample microchannel plate blank, wherein the initial end face image is an image obtained by photographing the target area of ​​the sample microchannel plate blank by a photographing device before the target area is acid-etched with an acid solution, and the acid-etched end face image sequence includes a plurality of acid-etched end face images, and the plurality of acid-etched end face images are a plurality of images in a continuous shooting order obtained by photographing the target area by the photographing device after the target area is acid-etched with an acid solution; Selecting a plurality of target micropores in the initial end face image, and intercepting a micropore acid etching image sequence corresponding to each target micropore in the plurality of acid etching end face images according to the position coordinates corresponding to each target micropore, wherein the position coordinates corresponding to the target micropore are used to indicate the position of the target micropore in the initial end face image, and the micropore acid etching image sequence corresponding to the target micropore includes a plurality of micropore acid etching images corresponding to the target micropore; Determine a plurality of total optical flow motion fields corresponding to each of the target micropores based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each of the target micropores; Determine the maximum motion rate value in the plurality of the total optical flow motion fields as the target motion rate value corresponding to the sample microchannel plate blank; The core glass etching rate corresponding to the sample microchannel plate blank is determined according to the target movement rate value and a preset data table, wherein the preset data table includes a plurality of preset movement rate intervals and a core glass etching rate corresponding to each preset movement rate interval.

2. The method according to claim 1, characterized in that: After obtaining the initial end surface image and the acid-etched end surface image sequence corresponding to the sample microchannel plate blank, the method further includes: Generate a target noise reduction matrix and a target edge enhancement matrix corresponding to a plurality of the acid-etched end surface images; Using the target noise reduction matrix, performing a convolution operation on each of the acid-etched end surface images to obtain a noise reduction image corresponding to each of the acid-etched end surface images; Using the target edge enhancement matrix, performing convolution budget processing on each of the noise reduction images to obtain an edge enhanced image corresponding to each of the acid-etched end surface images; The method of intercepting a micropore acid-etched image sequence corresponding to each target micropore from the plurality of acid-etched end surface images according to the position coordinates corresponding to each target micropore comprises: A micropore acid etching image sequence corresponding to each target micropore is intercepted from the plurality of edge enhanced images according to the position coordinates corresponding to each target micropore.

3. The method according to claim 2, characterized in that The generating of a target noise reduction matrix and a target edge enhancement matrix corresponding to a plurality of the acid-etched end surface images comprises: Calculate the number of pixels corresponding to the micropore inner diameter according to the micropore inner diameter corresponding to the sample microchannel plate blank and the pixel size corresponding to the acid-etched end surface image; Generate the target noise reduction matrix according to the number of pixels occupied by the inner diameter of the micropore; The target edge enhancement matrix is ​​generated according to the number of pixels occupied by the inner diameter of the micropore.

4. The method according to claim 1, characterized in that: The method of determining a plurality of total optical flow motion fields corresponding to each of the target micropores based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each of the target micropores comprises: Grouping the plurality of micropore acid etching images according to the shooting order of each micropore acid etching image corresponding to the target micropore to obtain a plurality of image groups, wherein each of the image groups includes two micropore acid etching images that are adjacent in shooting order; Extracting the horizontal optical flow motion field and the vertical optical flow motion field corresponding to each of the image groups based on the preset optical flow algorithm; The lateral optical flow motion field and the longitudinal optical flow motion field corresponding to each of the image groups are merged to obtain a plurality of total optical flow motion fields corresponding to the target micropores.

5. The method according to claim 4, characterized in that The extracting the horizontal optical flow motion field and the vertical optical flow motion field corresponding to each of the image groups based on the preset optical flow algorithm includes: Get preset limiting conditions; The horizontal optical flow motion field and the vertical optical flow motion field corresponding to each of the image groups are extracted based on the preset optical flow algorithm and the preset limiting conditions.

6. The method according to claim 5, characterized in that The preset limiting condition is to draw a circle with the center of the micropore acid etching image as the center and the number of pixels occupied by the inner diameter of the micropores corresponding to the sample microchannel plate blank as the diameter, set the area inside the circle as the first area, and the area outside the circle as the second area, and require that the image gradient change between the pixel points at the edge position of the first area and the pixel points at the edge position of the second area be the largest.

7. The method according to claim 1, characterized in that The step of determining the core glass acid etching rate corresponding to the sample microchannel plate blank according to the target movement rate value and a preset data table includes: Matching the target motion rate value with a plurality of the preset motion rate intervals; The core glass acid etching rate corresponding to the successfully matched preset motion rate interval is determined as the core glass acid etching rate corresponding to the sample microchannel plate blank.

8. A device for detecting the acid etching rate of core glass, characterized in that: The device comprises: An acquisition unit is used to acquire an initial end face image and an acid-etched end face image sequence corresponding to the sample microchannel plate blank, wherein the initial end face image is an image obtained by photographing the target area of ​​the sample microchannel plate blank by a photographing device before the target area is acid-etched with an acid solution, and the acid-etched end face image sequence includes a plurality of acid-etched end face images, and the plurality of acid-etched end face images are a plurality of images in a continuous shooting order obtained by photographing the target area by the photographing device after the target area is acid-etched with an acid solution; A capture unit, used for selecting a plurality of target micropores in the initial end face image, and capturing a micropore acid etching image sequence corresponding to each target micropore in the plurality of acid etching end face images according to the position coordinates corresponding to each target micropore, wherein the position coordinates corresponding to the target micropore are used to indicate the position of the target micropore in the initial end face image, and the micropore acid etching image sequence corresponding to the target micropore includes a plurality of micropore acid etching images corresponding to the target micropore; A first determining unit is used to determine a plurality of total optical flow motion fields corresponding to each of the target micropores based on a preset optical flow algorithm and a plurality of micropore acid etching images corresponding to each of the target micropores; A second determining unit is used to determine the maximum motion rate value in the plurality of the total optical flow motion fields as the target motion rate value corresponding to the sample microchannel slab blank; The third determination unit is used to determine the core glass etching rate corresponding to the sample microchannel plate blank according to the target movement rate value and a preset data table, wherein the preset data table includes multiple preset movement rate intervals and the core glass etching rate corresponding to each preset movement rate interval.

9. A storage medium, characterized in that: The storage medium includes a stored program, wherein when the program is executed, the device where the storage medium is located is controlled to execute the method for detecting the acid etching rate of the core glass according to any one of claims 1 to 7.

10. A device for detecting the acid etching rate of core glass, characterized in that: The device includes a storage medium; and one or more processors, wherein the storage medium is coupled to the processor, and the processor is configured to execute program instructions stored in the storage medium; when the program instructions are executed, the method for detecting the core glass acid etching rate according to any one of claims 1 to 7 is executed.

Images