Equipment cleaning system, control method and device thereof, equipment and medium
By setting up multiple recycling tanks in the CIP system and using the recycled liquid for flushing, the problems of low water utilization and large water consumption in the CIP system are solved, and the reuse of water resources and the improvement of equipment cleaning efficiency are achieved.
Patent Information
- Application Number
- CN202311428221.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-10-30
- Publication Date
- 2025-05-02
- Estimated Expiration
- 2043-10-30
AI Technical Summary
During the cleaning process of equipment, the CIP system has low water utilization rate and high water consumption.
A equipment cleaning system is designed, including multiple recycling tanks. By recycling intermediate water in multiple steps, rinsing with the recovered alkaline and acidic liquids, omitting the clean water flushing step to improve cleaning efficiency.
By recycling and rinsing with recycled liquids multiple times, water resource consumption is significantly saved and equipment cleaning efficiency and production efficiency are improved.
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Figure CN119909962A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of equipment cleaning, and in particular to an equipment cleaning system and a control method, device, equipment and medium thereof. Background Art
[0002] In the industrial production process of fluid food, the Cleaning in Place (CIP) system is usually used for on-site cleaning, especially in the production and processing of foods with a high degree of automation such as dairy products, beverages, juices, and jams. Therefore, the design of the CIP system directly affects the production efficiency and energy consumption of the entire production system and is an important part of the production system.
[0003] At present, the CIP system usually adopts a 5-tank system, namely an acid tank, an alkali tank, a hot water tank, a clean water tank, and a recovery tank. Equipment cleaning requires multiple cleaning processes such as the first water flush, alkali cleaning, intermediate water flush, acid cleaning, final water flush, and hot water cleaning. Among them, the intermediate water flush and the final water flush require the cleaning tank to clean each cleaning step, and the water is recycled to the recovery tank after flushing, resulting in low water resource utilization and high water consumption. Summary of the invention
[0004] In view of this, the present invention provides an equipment cleaning system and a control method, device, equipment, and medium thereof to solve the problems of low water resource utilization and high water consumption in the CIP system during equipment cleaning in the related art.
[0005] In a first aspect, the present invention provides an equipment cleaning system, comprising: an acid tank, an alkali tank, a clean water tank, and a hot water tank, and the equipment cleaning system further comprises: a first recovery tank, a second recovery tank, and a third recovery tank, wherein:
[0006] The first recovery tank is used to perform a first flush on the target cleaning equipment;
[0007] The second recovery tank is used to perform a second rinse on the target cleaning device after the first rinse is completed, and the liquid after the second rinse is recovered into the first recovery tank;
[0008] The alkali tank is used to rinse the target cleaning equipment for a third time after the second rinse, and the liquid after the third rinse is recovered to the second recovery tank, and the target cleaning equipment is rinsed for a fourth time after the third rinse, and the liquid after the fourth rinse is recovered to the alkali tank;
[0009] The third recovery tank is used to perform a fifth rinse on the target cleaning equipment after the fourth rinse is completed, and the liquid after the fifth rinse is recovered to the alkali tank or the second recovery tank, and the target cleaning equipment is rinsed for the sixth time after the fifth rinse is completed, and the liquid after the sixth rinse is recovered to the second recovery tank;
[0010] The acid tank is used to rinse the target cleaning equipment for a seventh time after the sixth rinse is completed, and the liquid after the seventh rinse is recovered to the third recovery tank, and the target cleaning equipment is rinsed for an eighth time after the seventh rinse is completed, and the liquid after the eighth rinse is recovered to the acid tank;
[0011] The clean water tank is used to rinse the target cleaning equipment for the ninth time after the eighth rinse is completed, and the liquid after the ninth rinse is recovered to the acid tank or the third recovery tank;
[0012] The hot water tank is used to rinse the target cleaning device for the tenth time after the ninth rinse is completed, and the liquid after the tenth rinse is recovered to the hot water tank or the third recovery tank.
[0013] Therefore, by setting up three recovery tanks, the intermediate water in the equipment cleaning process is recovered in steps and multiple times, so that water resources can be reused multiple times, saving water resource consumption, and by using the alkaline liquid recovered in the second recovery tank and the acidic liquid recovered in the third recovery tank to rinse the equipment before alkali washing and acid washing, the step of rinsing with clean water before alkali washing and acid washing in the related technology is omitted to avoid waste of water resources, and the residual liquid in the equipment can be maintained in alkaline or acid washing before alkali washing and acid washing, thereby further improving the cleaning efficiency of alkali washing or acid washing. In addition, the liquid after acid washing and alkali washing is recovered through different recovery tanks, and the problem of directly recovering to the acid tank and alkali tank affecting the concentration of the cleaning liquid in the acid tank and alkali tank is avoided, further ensuring the cleaning efficiency of subsequent alkali washing or acid washing of other equipment, shortening the equipment cleaning time, and improving the production efficiency of the equipment.
[0014] In an optional embodiment, the equipment cleaning system further comprises:
[0015] The cleaning system is used to filter the liquid recovered each time, and replenish the filtered liquid to the acid tank, the alkali tank, the hot water tank, the first recovery tank, the second recovery tank and the third recovery tank accordingly.
[0016] Therefore, by setting up a cleaning system to filter the liquid after each flushing, the residual production product residues, impurities, etc. in the flushing liquid can be filtered out, ensuring that the liquid recovered to the acid tank, alkali tank, hot water tank, first recovery tank, second recovery tank and third recovery tank is clean and safe, further ensuring the cleaning effect of subsequent equipment.
[0017] In an optional embodiment, the equipment cleaning system further comprises: a water replenishment pipeline and a cleaning pipeline;
[0018] The water replenishment pipeline is connected to the water inlets of the acid tank, alkali tank, hot water tank and clean water tank respectively, and is used to replenish water into the acid tank, alkali tank, hot water tank and clean water tank;
[0019] The input end of the cleaning pipeline is respectively connected to the output ends of the acid tank, alkali tank, hot water tank, clean water tank, first recovery tank, second recovery tank and third recovery tank, and the output end is connected to the target cleaning equipment for conveying flushing liquid to the target cleaning equipment.
[0020] Therefore, by setting up a water replenishment pipeline to provide water source for the equipment cleaning system to realize unified and automatic water replenishment, and by setting up a cleaning pipeline to uniformly provide flushing liquid to the equipment, it is avoided that the equipment and multiple tanks of the equipment cleaning system are connected separately, thereby improving the transportation efficiency of the flushing liquid.
[0021] In an optional embodiment, the equipment cleaning system further comprises: a heating system and / or a cleaning liquid replenishing pipeline, wherein:
[0022] The heating system is used to heat various components of the equipment cleaning system;
[0023] The cleaning liquid replenishing pipeline is connected to the liquid replenishing ports of the acid tank and the alkali tank respectively, and is used to replenish the acid cleaning liquid into the acid tank and replenish the alkaline cleaning liquid into the alkali tank.
[0024] Therefore, by setting up a heating system to heat each component of the entire equipment cleaning system, heating control of different system structures can be achieved. The heating process is more flexible and the heating efficiency is high. The temperature redundancy of the traditional CIP system can be effectively reduced. By heating the flushing liquid, the cleaning efficiency of the equipment is improved.
[0025] In a second aspect, an embodiment of the present invention provides a control method for an equipment cleaning system, wherein the equipment cleaning system is an equipment cleaning system in the first aspect and any optional embodiment thereof, and the method comprises:
[0026] Upon receiving a cleaning instruction from a target cleaning device, controlling the first recovery tank to perform a first flush on the target cleaning device;
[0027] After the first flushing is completed, controlling the second recovery tank to flush the target cleaning device for the second time, and recovering the liquid after the second flushing to the first recovery tank;
[0028] After the second rinse is completed, the alkali tank is controlled to rinse the target cleaning equipment for the third time, and the liquid after the third rinse is recovered to the second recovery tank, and after the third rinse is completed, the alkali tank is controlled to rinse the target cleaning equipment for the fourth time, and the liquid after the fourth rinse is recovered to the alkali tank;
[0029] After the fourth rinse is completed, the third recovery tank is controlled to perform a fifth rinse on the target cleaning equipment, and the liquid after the fifth rinse is recovered to the alkali tank or the second recovery tank, and after the fifth rinse is completed, the third recovery tank is controlled to perform a sixth rinse on the target cleaning equipment, and the liquid after the sixth rinse is recovered to the second recovery tank;
[0030] After the sixth flushing is completed, the acid tank is controlled to flush the target cleaning equipment for the seventh time, and the liquid after the seventh flushing is recovered to the third recovery tank; and after the seventh flushing is completed, the acid tank is controlled to flush the target cleaning equipment for the eighth time, and the liquid after the eighth flushing is recovered to the acid tank;
[0031] After the eighth flushing is completed, controlling the clean water tank to flush the target cleaning equipment for the ninth time, and recovering the liquid after the ninth flushing to the acid tank or the third recovery tank;
[0032] After the ninth flushing is completed, the hot water tank is controlled to flush the target cleaning device for the tenth time, and the liquid after the tenth flushing is recovered to the hot water tank or the third recovery tank.
[0033] Therefore, by utilizing the alkaline liquid recovered in the second recovery tank and the acidic liquid recovered in the third recovery tank to rinse the equipment before alkali washing and acid washing, the step of rinsing with clean water before alkali washing and acid washing in the related technology is omitted, thereby avoiding waste of water resources, and the residual liquid in the equipment can be maintained in an alkaline or acid state before alkali washing and acid washing, thereby further improving the cleaning efficiency of alkali washing or acid washing. In addition, the liquid after acid washing and alkali washing is recovered through different recovery tanks, thereby avoiding the problem of directly recovering the liquid to the acid tank and alkali tank to affect the concentration of the cleaning liquid in the acid tank and alkali tank, further ensuring the cleaning efficiency of subsequent alkali washing or acid washing of other equipment, shortening the equipment cleaning time, improving the production efficiency of the equipment, allowing water resources to be reused many times, and saving the consumption of water resources.
[0034] In an optional embodiment, the step of recovering the liquid after the fifth flushing to the alkali tank or the second recovery tank comprises:
[0035] Testing the conductivity of the liquid after the fifth flushing;
[0036] When it is detected that the conductivity is less than a first preset conductivity threshold, the liquid after the fifth flushing is recovered to the second recovery tank;
[0037] When it is detected that the conductivity is not less than a first preset conductivity threshold, the liquid after the fifth flushing is recovered to the alkali tank;
[0038] And / or, the liquid after the ninth flushing is recovered to the acid tank or the third recovery tank, comprising:
[0039] Testing the conductivity of the liquid after the ninth flushing;
[0040] When it is detected that the conductivity is less than the second preset conductivity threshold, the liquid after the ninth flushing is recovered to the third recovery tank;
[0041] When it is detected that the conductivity is not less than a second preset conductivity threshold, the liquid flushed for the ninth time is recovered to the acid tank;
[0042] And / or, the step of recovering the liquid after the tenth flushing to the hot water tank or the third recovery tank comprises:
[0043] Testing the temperature of the liquid after the tenth flushing;
[0044] When it is detected that the temperature is greater than a preset temperature threshold, the liquid after the tenth flushing is recovered to the hot water tank;
[0045] When it is detected that the temperature is not greater than the preset temperature threshold, the liquid after the tenth flushing is recovered to the third recovery tank.
[0046] Therefore, by detecting the conductivity and / or temperature of the intermediate liquid in the equipment flushing process, accurate recovery of the intermediate liquid in the flushing process can be achieved, thereby reducing the impact of the recovered liquid on the concentration of the cleaning liquid in the acid tank and the alkali tank and the impact on the water temperature of the hot water tank, further ensuring the cleaning efficiency of the equipment.
[0047] In an optional embodiment, the method further includes:
[0048] Utilize a cleaning system to filter each recovered liquid;
[0049] Detecting the pH value and temperature of the liquid filtered by the cleaning system;
[0050] Based on the detection results, the liquid filtered by the cleaning system is replenished to the acid tank, the alkali tank, the hot water tank, the first recovery tank, the second recovery tank and the third recovery tank accordingly.
[0051] Therefore, by filtering and detecting the pH value and temperature of the recovered liquid through the cleaning system each time, accurate recovery can be achieved while ensuring the cleanliness and safety of the recovered liquid, thereby ensuring the cleaning efficiency of the entire equipment cleaning system.
[0052] In a third aspect, the present invention provides a control device for an equipment cleaning system, wherein the equipment cleaning system is the equipment cleaning system of the first aspect or any embodiment thereof, and the device comprises:
[0053] A first processing module, configured to control the first recovery tank to perform a first flushing of the target cleaning equipment upon receiving a cleaning instruction of the target cleaning equipment;
[0054] A second processing module is used to control the second recovery tank to perform a second rinse on the target cleaning device after the first rinse is completed, and to recover the liquid after the second rinse to the first recovery tank;
[0055] A third processing module is used to control the alkali tank to rinse the target cleaning equipment for a third time after the second rinse is completed, and to recover the liquid after the third rinse to the second recovery tank, and to control the alkali tank to rinse the target cleaning equipment for a fourth time after the third rinse is completed, and to recover the liquid after the fourth rinse to the alkali tank;
[0056] a fourth processing module, for controlling the third recovery tank to perform a fifth rinse on the target cleaning device after the fourth rinse is completed, and recovering the liquid after the fifth rinse to the alkali tank or the second recovery tank, and controlling the third recovery tank to perform a sixth rinse on the target cleaning device after the fifth rinse is completed, and recovering the liquid after the sixth rinse to the second recovery tank;
[0057] a fifth processing module, for controlling the acid tank to perform a seventh rinse on the target cleaning device after the sixth rinse is completed, and recovering the liquid after the seventh rinse to the third recovery tank; and for controlling the acid tank to perform an eighth rinse on the target cleaning device after the seventh rinse is completed, and recovering the liquid after the eighth rinse to the acid tank;
[0058] A sixth processing module, used for controlling the clean water tank to perform a ninth rinse on the target cleaning device after the eighth rinse is completed, and recovering the liquid after the ninth rinse to the acid tank or the third recovery tank;
[0059] The seventh processing module is used to control the hot water tank to rinse the target cleaning equipment for the tenth time after the ninth rinse is completed, and recover the liquid after the tenth rinse to the hot water tank or the third recovery tank.
[0060] In a fourth aspect, the present invention provides a cleaning device, comprising: a controller and a device cleaning system according to the first aspect or any one of its embodiments, wherein:
[0061] The controller includes: a memory and a processor, the memory and the processor are communicatively connected to each other, the memory stores computer instructions, and the processor executes the control method of the equipment cleaning system of the above-mentioned second aspect or any corresponding embodiment thereof by executing the computer instructions.
[0062] In a fifth aspect, the present invention provides a computer-readable storage medium having computer instructions stored thereon, the computer instructions being used to enable a computer to execute the control method for an equipment cleaning system according to the second aspect or any corresponding embodiment thereof. BRIEF DESCRIPTION OF THE DRAWINGS
[0063] In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0064] Figure 1 is a schematic structural diagram of an equipment cleaning system according to an embodiment of the present invention;
[0065] Figure 2 is a flow chart of a control method of an equipment cleaning system according to an embodiment of the present invention;
[0066] Figure 3 is a schematic diagram of a control working process of an equipment cleaning system according to an embodiment of the present invention;
[0067] Figure 4 is a structural block diagram of a control device for an equipment cleaning system according to an embodiment of the present invention;
[0068] Figure 5 is a structural block diagram of a cleaning device according to an embodiment of the present invention;
[0069] Figure 6 It is a schematic diagram of the hardware structure of the controller in the cleaning device according to the embodiment of the present invention. DETAILED DESCRIPTION
[0070] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present invention.
[0071] The CIP system in the prior art uses clean water to clean the cleaning steps such as acid cleaning, alkali cleaning, and thermal disinfection during the cleaning process. The clean water enters the recovery tank after flushing and is used for flushing before CIP cleaning of the equipment. When the recovery tank reaches a high liquid level, the water is discharged to the ground, resulting in a waste of water resources.
[0072] Based on the above problems, an equipment cleaning system is provided in an embodiment of the present invention, such as Figure 1 As shown, the equipment cleaning system includes: an acid tank 101, an alkali tank 102, a clean water tank 103, and a hot water tank 104. The equipment cleaning system also includes: a first recovery tank 105, a second recovery tank 106, and a third recovery tank 107, wherein:
[0073] The first recovery tank 105 is used to perform a first flush on the target cleaning device 112;
[0074] The second recovery tank 106 is used to perform a second rinse on the target cleaning device 112 after the first rinse is completed, and the liquid after the second rinse is recovered to the first recovery tank 105;
[0075] The alkali tank 102 is used to perform a third rinse on the target cleaning device 112 after the second rinse, and the liquid after the third rinse is recovered to the second recovery tank 106, and the target cleaning device 112 is rinsed for the fourth time after the third rinse, and the liquid after the fourth rinse is recovered to the alkali tank 102;
[0076] The third recovery tank 107 is used to perform a fifth rinse on the target cleaning device 112 after the fourth rinse is completed, and the liquid after the fifth rinse is recovered to the alkali tank 102 or the second recovery tank 106, and the target cleaning device 112 is rinsed for the sixth time after the fifth rinse is completed, and the liquid after the sixth rinse is recovered to the second recovery tank 106;
[0077] The acid tank 101 is used to rinse the target cleaning device 112 for the seventh time after the sixth rinse, and the liquid after the seventh rinse is recovered to the third recovery tank 107, and the target cleaning device 112 is rinsed for the eighth time after the seventh rinse, and the liquid after the eighth rinse is recovered to the acid tank 101;
[0078] The clean water tank 103 is used to rinse the target cleaning device 112 for the ninth time after the eighth rinse, and the liquid after the ninth rinse is recovered to the acid tank 101 or the third recovery tank 107;
[0079] The hot water tank 104 is used to rinse the target cleaning device 112 for the tenth time after the ninth rinse is completed, and the liquid after the tenth rinse is recovered to the hot water tank 104 or the third recovery tank 107.
[0080] Therefore, by setting up three recovery tanks, the intermediate water in the equipment cleaning process is recovered in steps and multiple times, so that water resources can be reused multiple times, saving water resource consumption, and by using the alkaline liquid recovered in the second recovery tank 106 and the acidic liquid recovered in the third recovery tank to rinse the equipment before alkali washing and acid washing, it is not only omitted in the related technology that the step of flushing with clean water before alkali washing and acid washing is omitted, avoiding the waste of water resources, but also can maintain the residual liquid in the equipment to be alkaline or acid washing before alkali washing and acid washing, thereby further improving the cleaning efficiency of alkali washing or acid washing. In addition, the liquid after acid washing and alkali washing is recovered through different recovery tanks, and the problem of directly recovering to the acid tank and alkali tank affecting the concentration of the cleaning liquid in the acid tank and alkali tank is avoided, further ensuring the cleaning efficiency of subsequent alkali washing or acid washing of other equipment, shortening the equipment cleaning time, and improving the production efficiency of the equipment.
[0081] Specifically, the acid tank 101, alkali tank 102, hot water tank 104 and clean water tank 103 are similar in composition to the existing CIP system, wherein the acid tank 101 is used to store acid cleaning solution, the alkali tank 102 is used to store alkaline cleaning solution, the hot water tank 104 is used to store hot water for high-temperature disinfection, and the clean water tank 103 is used to store clean water.
[0082] In some optional embodiments, such as Figure 1 As shown, the above equipment cleaning system also includes:
[0083] The cleaning system 108 is used to filter the liquid recovered each time, and replenish the filtered liquid to the acid tank 101, the alkali tank 102, the hot water tank 104, the first recovery tank 105, the second recovery tank 106 and the third recovery tank 107 accordingly.
[0084] Exemplarily, the cleaning system 108 can be configured as a satellite cleaning system. When the satellite cleaning system needs to be cleaned, the required cleaning fluid is pumped into each tank in the above-mentioned equipment cleaning system. After cleaning by the satellite cleaning system, the cleaning fluid is pumped back to the equipment cleaning system through a circulation line. The satellite cleaning system uses bag filters or RO membrane filtration and other technologies to filter impurities and residues in the liquid flowing into the satellite cleaning system, thereby ensuring the cleanliness and safety of the recovered acid, alkali, hot water and other cleaning fluids.
[0085] Therefore, by setting up a cleaning system 108 to filter the liquid after each flushing, the residues of the production products and impurities remaining in the flushing liquid can be filtered out, ensuring that the liquid recovered to the acid tank 101, the alkali tank 102, the hot water tank 104, the first recovery tank 105, the second recovery tank 106 and the third recovery tank 107 are clean and safe, further ensuring the cleaning effect of subsequent equipment.
[0086] In some optional embodiments, the equipment cleaning system also includes: a water replenishment pipeline 109 and a cleaning pipeline 110; the water replenishment pipeline 109 is respectively connected to the water inlets of the acid tank 101, the alkali tank 102, the hot water tank 104 and the clean water tank 103, and is used to replenish water into the acid tank 101, the alkali tank 102, the hot water tank 104 and the clean water tank 103; the input end of the cleaning pipeline 110 is respectively connected to the output ends of the acid tank 101, the alkali tank 102, the hot water tank 104, the clean water tank 103, the first recovery tank 105, the second recovery tank 106 and the third recovery tank 107, and the output end is connected to the target cleaning equipment 112, and is used to transport flushing liquid to the target cleaning equipment 112.
[0087] Specifically, the water replenishment pipeline 109 replenishes soft water to each tank body, and the cleaning pipeline 110 transports different flushing liquids to the target cleaning equipment 112 in different cleaning links, such as transporting the acid cleaning liquid in the acid tank 101 in the pickling stage, and transporting the alkaline cleaning liquid in the alkali tank 102 in the alkaline washing stage, etc. The specific materials of the water replenishment pipeline 109 and the cleaning pipeline 110 can be selected according to actual needs. Usually, the cleaning pipeline 110 needs to select a pipe that is resistant to acid and alkali corrosion and high temperature.
[0088] Therefore, by setting up a water replenishment pipeline 109 to provide a water source for the equipment cleaning system to achieve unified and automatic water replenishment, and by setting up a cleaning pipeline 110 to uniformly provide flushing liquid to the equipment, it is avoided that the equipment and multiple tanks of the equipment cleaning system are connected separately, thereby improving the transportation efficiency of the flushing liquid.
[0089] In some optional embodiments, such as Figure 1 As shown, the equipment cleaning system also includes: a heating system ( Figure 1 ) and a cleaning fluid replenishment line 111, wherein:
[0090] The heating system is used to heat the various components of the equipment cleaning system;
[0091] The cleaning liquid replenishing pipeline 111 is connected to the liquid replenishing ports of the acid tank 101 and the alkali tank 102 respectively, and is used to replenish the acid cleaning liquid into the acid tank 101 and replenish the alkaline cleaning liquid into the alkali tank 102.
[0092] The specific material of the cleaning liquid replenishing pipeline 111 can be selected according to actual needs. Usually, the cleaning pipeline 110 needs to be a pipeline resistant to acid and alkali corrosion. It should be noted that the cleaning liquid replenishing pipeline 111 and the heating system are optional parts of the equipment cleaning system. One of them can be set separately, or both can be set. In the embodiment of the present invention, the description is made by taking both as an example to improve the automation degree and cleaning efficiency of the whole system.
[0093] Specifically, the above-mentioned heating system can be composed of multiple heating components, and each heating component is set in a one-to-one correspondence with each component of the equipment cleaning system. For example, by configuring heating devices at five locations such as the alkali tank 102, the acid tank 101, the hot water tank 104, the cleaning pipeline 110, and the cleaning system 108 to heat the cleaning liquid, the large heating system set on the centralized cleaning pressure line of the CIP system in the related technology is changed to a small flexible heating system such as the self-circulating heating of the tank body, the heating system of the cleaning pipeline 110, and the heating system of the cleaning system 108, so that the heating process is more flexible and the heating efficiency is higher, which effectively reduces the temperature redundancy of the CIP system and improves the cleaning efficiency. In addition, each heating system can be designed in a modular way, and the cleaning liquid heating method can be dynamically switched according to the energy cost such as steam, electricity, natural gas, etc., to achieve the optimal energy cost.
[0094] Therefore, by setting up a heating system to heat each component of the entire equipment cleaning system, heating control of different system structures can be achieved. The heating process is more flexible and the heating efficiency is high. The temperature redundancy of the traditional CIP system can be effectively reduced. By heating the flushing liquid, the cleaning efficiency of the equipment is improved.
[0095] In addition, in actual applications, a certain amount of nitric acid can be added to the hot water tank 104 to make the hot water tank 104 have a certain weak acidity, which can not only inhibit the growth of microorganisms, but also after hot water disinfection, there will be a certain acidity on the surface of the cleaned equipment, which inhibits the growth of microorganisms on the surface of the equipment and increases the standby time of the equipment before use. When the equipment is used, it is rinsed with sterile water before production, which greatly reduces the cleaning cost of the production system.
[0096] According to an embodiment of the present invention, an embodiment of a control method for an equipment cleaning system is provided. It should be noted that the steps shown in the flowchart of the accompanying drawings can be executed in a computer system such as a set of computer executable instructions, and although a logical order is shown in the flowchart, in some cases, the steps shown or described can be executed in an order different from that shown here.
[0097] In this embodiment, a control method for a device cleaning system is provided. The control method for a device cleaning system can be used as follows: Figure 1 The cleaning system of the equipment shown, Figure 2 is a flow chart of a control method of an equipment cleaning system according to an embodiment of the present invention. Figure 2 As shown, the process includes the following steps:
[0098] Step S201, when receiving a cleaning instruction of a target cleaning device, controlling a first recovery tank to perform a first flushing on the target cleaning device.
[0099] Specifically, taking dairy production as an example, after the production line is completed, a cleaning instruction will be sent to the equipment cleaning system. After receiving the instruction, the equipment cleaning system will control the outlet valve of the first recovery tank to open and perform the first flushing of the entire production line according to the set flow rate. Figure 3 The post-production water flushing shown and the direct discharge of the flushing liquid after cleaning is also called the end discharge.
[0100] Step S202, after the first flushing is completed, the second recovery tank is controlled to flush the target cleaning equipment for the second time, and the liquid after the second flushing is recovered to the first recovery tank.
[0101] Specifically, after the post-production water flushing, the outlet valve of the second recovery tank is controlled to open, and the entire production line is flushed for the second time according to the set flow rate. Figure 3 The first cleaning is shown, and then the valve between the production line and the first recovery tank is opened to recover the rinse liquid after cleaning to the first recovery tank for post-production water flushing of the next production line.
[0102] Step S203, after the second rinse is completed, control the alkali tank to rinse the target cleaning equipment for the third time, recover the liquid after the third rinse to the second recovery tank, and control the alkali tank to rinse the target cleaning equipment for the fourth time after the third rinse is completed, and recover the liquid after the fourth rinse to the alkali tank.
[0103] Specifically, after the first cleaning, the outlet valve of the alkali tank is controlled to open, and the entire production line is flushed for the third time according to the set flow rate. Figure 3 The alkali pushes water as shown, and then the valve between the production line and the second recovery tank is opened to recycle the rinse liquid after cleaning to the second recovery tank for the first cleaning of the next production line, thus realizing the reuse of water resources. After the alkali pushes water, the outlet valve of the alkali tank is controlled to open again, and the entire production line is rinsed for the fourth time according to the set flow rate. Figure 3 Perform alkali cleaning as shown, then open the valve between the production line and the alkali tank to recover the rinse liquid after cleaning to the alkali tank.
[0104] Step S204, after the fourth rinse is completed, control the third recovery tank to rinse the target cleaning equipment for the fifth time, and recover the liquid after the fifth rinse to the alkali tank or the second recovery tank, and after the fifth rinse is completed, control the third recovery tank to rinse the target cleaning equipment for the sixth time, and recover the liquid after the sixth rinse to the second recovery tank.
[0105] It should be noted that before the entire equipment cleaning system is used for the first time, a certain amount of clean water is injected into the first recovery tank, the second recovery tank and the third recovery tank, and the liquid volume in each recovery tank is monitored during the cleaning process. If it is monitored that the liquid in each recovery tank is lower than the amount of liquid required for flushing, clean water will be added to meet the needs of subsequent cleaning.
[0106] Specifically, after the alkali cleaning, the outlet valve of the third recovery tank is controlled to open, and the entire production line is flushed for the fifth time according to the set flow rate. Figure 3 The water pushes alkali as shown, and then the valve between the production line and the second recovery tank is opened to recycle the rinse liquid after cleaning to the second recovery tank for the first cleaning of the next production line, or the valve between the production line and the alkali tank is opened to recycle the rinse liquid after cleaning to the alkali tank to achieve the reuse of water resources. After the water pushes alkali, the outlet valve of the third recovery tank is controlled to open again, and the entire production line is rinsed for the sixth time according to the set flow rate. Figure 3 The intermediate water flush is shown, and then the valve between the production line and the second recovery tank is opened to recover the rinse liquid after cleaning to the second recovery tank for the next first cleaning of the production line.
[0107] Therefore, by utilizing the weak alkalinity of the liquid in the secondary recovery tank, the residual pickling liquid in the production line can be neutralized during the first cleaning of the next production line, and the effect of alkaline cleaning can be ensured by flushing the alkaline tank twice. In addition, the flushing liquid after the two flushings of the alkaline tank is recovered to the second recovery tank and the alkaline tank respectively to maintain the concentration of the cleaning liquid in the alkaline tank, thereby further ensuring the efficiency of alkaline washing. Maintaining alkalinity and a certain temperature by the second recovery tank can not only inhibit the growth of microorganisms, but also maintain the weak alkalinity of the equipment and a certain preheating temperature during the second water flushing, thereby improving the cleaning efficiency of alkaline washing and saving the cost of alkaline washing.
[0108] Step S205, after the sixth rinse is completed, control the acid tank to rinse the target cleaning equipment for the seventh time, and recover the liquid after the seventh rinse to the third recovery tank; and after the seventh rinse is completed, control the acid tank to rinse the target cleaning equipment for the eighth time, and recover the liquid after the eighth rinse to the acid tank.
[0109] Specifically, after the intermediate water flushing, the outlet valve of the acid tank is controlled to open, and the entire production line is flushed for the seventh time according to the set flow rate. Figure 3 The acid pushes water as shown, and then the valve between the production line and the third recovery tank is opened to recycle the rinse liquid after cleaning to the third recovery tank for the next production line to carry out raw intermediate water flushing or water push alkali, so as to realize the reuse of water resources. After the acid pushes water, the outlet valve of the acid tank is controlled to open again, and the entire production line is flushed for the eighth time according to the set flow rate. Figure 3The acid cleaning is performed as shown, and then the valve between the production line and the acid tank is opened to recover the rinse liquid after cleaning to the acid tank for the next acid push or acid cleaning of the production line.
[0110] Therefore, by taking advantage of the fact that the liquid recovered in the third recovery tank is pickling, it is used in the process of water-pushing alkali and intermediate water flushing to neutralize the alkaline liquid on the production line after alkali cleaning, and the effect of acid cleaning is ensured by two flushings in the acid tank. In addition, by respectively recovering the flushing liquid after two flushings in the acid tank to the third recovery tank and the acid tank, the concentration of the cleaning liquid in the acid tank is maintained, further ensuring the pickling efficiency. By keeping the third recovery tank acidic and at a certain temperature, it can not only inhibit the growth of microorganisms, but also keep the equipment weakly acidic and at a certain preheating temperature during the next water flushing, thereby improving the pickling cleaning efficiency and saving pickling costs.
[0111] Step S206, after the eighth flushing is completed, control the clean water tank to flush the target cleaning equipment for the ninth time, and recover the liquid after the ninth flushing to the acid tank or the third recovery tank.
[0112] Specifically, after acid cleaning, the outlet valve of the clean water tank is controlled to open, and the entire production line is flushed for the ninth time according to the set flow rate. Figure 3 The last water flush is shown, and then the valve between the production line and the third recovery tank is opened to recover the flushing liquid after cleaning to the third recovery tank for the next production line to carry out intermediate water flushing or water-pushing alkali to achieve the reuse of water resources, or the valve between the production line and the acid tank is opened to recover the flushing liquid after cleaning to the acid tank for the next acid cleaning or acid-pushing water.
[0113] Step S207, after the ninth flushing is completed, control the hot water tank to flush the target cleaning equipment for the tenth time, and recover the liquid after the tenth flushing to the hot water tank or the third recovery tank.
[0114] Specifically, after the last water flush, the outlet valve of the hot water tank is controlled to open, and the entire production line is flushed for the tenth time according to the set flow rate. Figure 3 The hot disinfection shown in the figure, and then open the valve between the production line and the third recovery tank, and recycle the rinse liquid after cleaning to the third recovery tank, which is used for raw intermediate water flushing or water-pushing alkali for the next production line to achieve the reuse of water resources, or open the valve between the production line and the hot water tank, and recycle the rinse liquid after cleaning to the hot water tank for hot disinfection of the next production line.
[0115] Therefore, by utilizing the alkaline liquid recovered in the second recovery tank and the acidic liquid recovered in the third recovery tank to rinse the equipment before alkali washing and acid washing, the step of rinsing with clean water before alkali washing and acid washing in the related technology is omitted, thereby avoiding waste of water resources, and the residual liquid in the equipment can be maintained in an alkaline or acid state before alkali washing and acid washing, thereby further improving the cleaning efficiency of alkali washing or acid washing. In addition, the liquid after acid washing and alkali washing is recovered through different recovery tanks, thereby avoiding the problem of directly recovering the liquid to the acid tank and alkali tank to affect the concentration of the cleaning liquid in the acid tank and alkali tank, further ensuring the cleaning efficiency of subsequent alkali washing or acid washing of other equipment, shortening the equipment cleaning time, improving the production efficiency of the equipment, allowing water resources to be reused many times, and saving the consumption of water resources.
[0116] In some optional embodiments, in the above step S204, the liquid after the fifth flushing is recovered to the alkali tank or the second recovery tank, specifically comprising:
[0117] Step S2041, detecting the conductivity of the liquid after the fifth flushing.
[0118] Step S2042: When it is detected that the conductivity is less than the first preset conductivity threshold, the liquid after the fifth flushing is recovered to the second recovery tank.
[0119] Step S2043, when it is detected that the conductivity is not less than the first preset conductivity threshold, the liquid after the fifth flushing is recovered to the alkali tank.
[0120] Specifically, since the stronger the alkalinity of the solution, that is, the larger the pH value, the greater the conductivity, it is possible to determine whether the conductivity requirement corresponding to the pH value of the alkaline cleaning liquid in the alkali tank is met by detecting the conductivity of the liquid flushed in the production line. The first preset conductivity threshold can be set according to the alkaline cleaning requirements of the target cleaning equipment. Exemplarily, the first preset conductivity threshold can be 50S / m. This is just an example, and the present invention is not limited to this.
[0121] In some optional embodiments, in the above step S206, the liquid after the ninth flushing is recovered to the acid tank or the third recovery tank, specifically comprising:
[0122] Step S2061, detecting the conductivity of the liquid after the ninth flushing.
[0123] Step S2062: When it is detected that the conductivity is less than the second preset conductivity threshold, the liquid after the ninth flushing is recovered to the third recovery tank.
[0124] Step S2063, when it is detected that the conductivity is not less than the second preset conductivity threshold, the liquid after the ninth flushing is recovered into the acid tank.
[0125] Specifically, since the stronger the acidity of the solution, that is, the smaller the pH value, the greater the conductivity, it is possible to determine whether the conductivity requirement corresponding to the pH value of the acidic cleaning liquid in the acid tank is met by detecting the conductivity of the liquid flushed in the production line. The second preset conductivity threshold can be set according to the acid cleaning requirements of the target cleaning equipment. Exemplarily, the second preset conductivity threshold can be 20S / m. This is just an example, and the present invention is not limited to this.
[0126] In some optional embodiments, in the above step S207, the liquid after the tenth flushing is recovered to the hot water tank or the third recovery tank, specifically comprising:
[0127] Step S2071, detecting the temperature of the liquid after the tenth flushing.
[0128] Step S2072, when it is detected that the temperature is greater than the preset temperature threshold, the liquid after the tenth flushing is recovered into the hot water tank.
[0129] Step S2073, when it is detected that the temperature is not greater than the preset temperature threshold, the liquid after the tenth flushing is recovered to the third recovery tank.
[0130] Specifically, the preset temperature threshold may be set according to the thermal disinfection requirements of the target cleaning equipment. Exemplarily, the preset temperature threshold may be 80° C. This is only an example, and the present invention is not limited thereto.
[0131] Therefore, by detecting the conductivity and / or temperature of the intermediate liquid in the equipment flushing process, accurate recovery of the intermediate liquid in the flushing process can be achieved, thereby reducing the impact of the recovered liquid on the concentration of the cleaning liquid in the acid tank and the alkali tank and the impact on the water temperature of the hot water tank, further ensuring the cleaning efficiency of the equipment.
[0132] In some optional implementations, the above method further includes:
[0133] Step S208, using the cleaning system to filter the liquid recovered each time.
[0134] Step S209, detecting the pH value and temperature of the liquid filtered by the cleaning system.
[0135] Step S210, based on the detection result, the liquid filtered by the cleaning system is added to the acid tank, the alkali tank, the hot water tank, the first recovery tank, the second recovery tank and the third recovery tank accordingly.
[0136] Specifically, before each recycling of the liquid, the valve between the production line and the input end of the cleaning system is opened to allow the liquid to be recycled to pass through the filtration of the cleaning system, and then the conductivity and temperature of the filtered liquid are tested to determine which tank the test results meet the relevant requirements of, and the liquid to be recycled is then input into that tank. For example, if the conductivity of the liquid to be recycled meets the requirements of the acid tank, it is recycled to the acid tank, etc., and the present invention is not limited to this. Thus, the water resources are reused repeatedly, and the system's detailed optimization control is realized, the cleaning efficiency is improved, and the cleaning cost is reduced.
[0137] Therefore, by filtering and detecting the pH value and temperature of the recovered liquid through the cleaning system each time, accurate recovery can be achieved while ensuring the cleanliness and safety of the recovered liquid, thereby ensuring the cleaning efficiency of the entire equipment cleaning system.
[0138] The specific control process of the equipment cleaning system provided by the embodiment of the present invention will be described in detail below in conjunction with specific application examples.
[0139] like Figure 3 As shown, the equipment cleaning system provided by the embodiment of the present invention adopts an 8-tank system, namely, an acid tank, an alkali tank, a hot water tank, a clean water tank, a primary recovery tank, namely the third recovery tank mentioned above, a secondary recovery tank, namely the second recovery tank mentioned above, a tertiary recovery tank, namely the first recovery tank mentioned above, and a satellite cleaning tank, namely the cleaning system mentioned above. The equipment cleaning goes through multiple cleaning processes such as the first water flushing, alkali cleaning, intermediate water flushing, acid cleaning, final water flushing, and thermal disinfection. During cleaning, according to program control, the clean water is reused four times, and the primary recovery tank maintains weak acidity and a certain temperature, the secondary recovery tank maintains weak alkalinity and a certain temperature, and the hot water tank maintains a certain acidity, which can effectively improve the cleaning efficiency and reduce cleaning losses.
[0140] Heating devices are installed at five locations, including the alkali tank, acid tank, hot water tank, cleaning pipeline, and cleaning system, to heat the cleaning liquid. The previous large heating system concentrated on the cleaning pipeline is changed to a small flexible heating system such as tank self-circulation heating, making the heating process more flexible and the heating efficiency higher, effectively reducing the temperature redundancy of the CIP system and improving the cleaning efficiency.
[0141] Figure 3The acid pushes water, alkali pushes water, and water pushes acid in the process. This means that after the alkali wash and acid wash cycle, for example, after the alkali cycle wash, the equipment and pipelines are filled with alkali. At this time, water is needed as a power to push the alkali in the equipment and pipelines clean. This is water pushing alkali. When the water fills the equipment, if acid cycle wash is required, acid is needed as a power to push the water in the equipment and pipelines clean. Then, acid cycle wash is performed to ensure that the temperature and concentration of the acid wash meet the cleaning requirements, reduce the amount of water directly entering the acid tank, and reduce the acid concentration and temperature in the tank. Thus, through the reuse of water resources and the detailed control of the system, the cleaning efficiency is improved, the cleaning cost is reduced, and the cleaning waste is saved.
[0142] In this embodiment, a control device for an equipment cleaning system is also provided, which is used to implement the above-mentioned embodiments and preferred embodiments, and will not be repeated hereafter. As used below, the term "module" can implement a combination of software and / or hardware of a predetermined function. Although the devices described in the following embodiments are preferably implemented in software, the implementation of hardware, or a combination of software and hardware, is also possible and conceivable.
[0143] This embodiment provides a control device for an equipment cleaning system, which is applied to Figure 1 The equipment cleaning system shown, such as Figure 4 As shown, including:
[0144] The first processing module 401 is used to control the first recovery tank to perform a first flush on the target cleaning equipment upon receiving a cleaning instruction of the target cleaning equipment;
[0145] The second processing module 402 is used to control the second recovery tank to perform a second rinse on the target cleaning device after the first rinse is completed, and to recover the liquid after the second rinse to the first recovery tank;
[0146] The third processing module 403 is used to control the alkali tank to rinse the target cleaning equipment for the third time after the second rinse is completed, and recycle the liquid after the third rinse to the second recovery tank, and control the alkali tank to rinse the target cleaning equipment for the fourth time after the third rinse is completed, and recycle the liquid after the fourth rinse to the alkali tank;
[0147] The fourth processing module 404 is used to control the third recovery tank to perform a fifth rinse on the target cleaning equipment after the fourth rinse is completed, and recover the liquid after the fifth rinse to the alkali tank or the second recovery tank, and control the third recovery tank to perform a sixth rinse on the target cleaning equipment after the fifth rinse is completed, and recover the liquid after the sixth rinse to the second recovery tank;
[0148] The fifth processing module 405 is used to control the acid tank to perform a seventh rinse on the target cleaning equipment after the sixth rinse is completed, and recycle the liquid after the seventh rinse to the third recovery tank; and after the seventh rinse is completed, control the acid tank to perform an eighth rinse on the target cleaning equipment, and recycle the liquid after the eighth rinse to the acid tank;
[0149] The sixth processing module 406 is used to control the clean water tank to perform a ninth rinse on the target cleaning equipment after the eighth rinse is completed, and recover the liquid after the ninth rinse to the acid tank or the third recovery tank;
[0150] The seventh processing module 407 is used to control the hot water tank to rinse the target cleaning equipment for the tenth time after the ninth rinse is completed, and recover the liquid after the tenth rinse to the hot water tank or the third recovery tank.
[0151] In some optional implementations, the fourth processing module 404 includes:
[0152] A first processing unit is used to detect the conductivity of the liquid after the fifth flushing;
[0153] a second processing unit, for recovering the liquid after the fifth flushing to a second recovery tank when it is detected that the conductivity is less than a first preset conductivity threshold;
[0154] The third processing unit is used to recycle the liquid after the fifth flushing into the alkali tank when it is detected that the conductivity is not less than the first preset conductivity threshold.
[0155] In some optional implementations, the sixth processing module 406 includes:
[0156] a fourth processing unit, used for detecting the conductivity of the liquid after the ninth flushing;
[0157] a fifth processing unit, configured to recycle the liquid after the ninth flushing into a third recovery tank when the conductivity is detected to be less than a second preset conductivity threshold;
[0158] The sixth processing unit is used to recycle the liquid after the ninth flushing into the acid tank when it is detected that the conductivity is not less than the second preset conductivity threshold.
[0159] In some optional implementations, the seventh processing module 407 includes:
[0160] a seventh processing unit, for detecting the temperature of the liquid after the tenth flushing;
[0161] An eighth processing unit is used to recycle the liquid after the tenth flushing into the hot water tank when the temperature is detected to be greater than a preset temperature threshold;
[0162] The ninth processing unit is used to recover the liquid after the tenth flushing to the third recovery tank when it is detected that the temperature is not greater than a preset temperature threshold.
[0163] In some optional embodiments, the above device further includes:
[0164] an eighth processing module, for filtering each recovered liquid using a cleaning system;
[0165] The ninth processing module is used to detect the pH value and temperature of the liquid after being filtered by the cleaning system;
[0166] The tenth processing module is used to replenish the liquid filtered by the cleaning system to the acid tank, the alkali tank, the hot water tank, the first recovery tank, the second recovery tank and the third recovery tank accordingly based on the detection result.
[0167] The further functional description of each of the above modules and units is the same as that of the above corresponding embodiments and will not be repeated here.
[0168] The control device of the equipment cleaning system in this embodiment is presented in the form of a functional unit, where the unit refers to an ASIC (Application Specific Integrated Circuit) circuit, a processor and memory that executes one or more software or fixed programs, and / or other devices that can provide the above functions.
[0169] The embodiment of the present invention also provides a cleaning device, such as Figure 5 As shown, the cleaning device includes a controller 501 and Figure 1 The device cleaning system 502 is shown. For the detailed description of the device cleaning system 502, please refer to the relevant description of the above embodiment, which will not be repeated here.
[0170] See also Figure 6 , Figure 6 is a schematic diagram of the structure of the controller 501 in the above-mentioned cleaning device provided in an optional embodiment of the present invention, such as Figure 6As shown, the controller 501 includes: one or more processors 10, a memory 20, and an interface for connecting various components, including a high-speed interface and a low-speed interface. Each component utilizes different buses to communicate with each other, and can be installed on a common mainboard or installed in other ways as needed. The processor can process the instructions executed in the computer device, including instructions stored in or on the memory to display the graphical information of the GUI on an external input / output device (such as, a display device coupled to the interface). In some optional embodiments, if necessary, multiple processors and / or multiple buses can be used together with multiple memories and multiple memories. Similarly, multiple computer devices can be connected, and each device provides some necessary operations (for example, as a server array, a group of blade servers, or a multi-processor system). Figure 6 A processor 10 is taken as an example.
[0171] The processor 10 may be a central processing unit, a network processor or a combination thereof. The processor 10 may further include a hardware chip. The hardware chip may be a dedicated integrated circuit, a programmable logic device or a combination thereof. The programmable logic device may be a complex programmable logic device, a field programmable gate array, a general purpose array logic or any combination thereof.
[0172] The memory 20 stores instructions executable by at least one processor 10, so that at least one processor 10 executes the method shown in the above embodiment.
[0173] The memory 20 may include a program storage area and a data storage area, wherein the program storage area may store an operating system, an application required for at least one function; the data storage area may store data created according to the use of the computer device, etc. In addition, the memory 20 may include a high-speed random access memory, and may also include a non-transient memory, such as at least one disk storage device, a flash memory device, or other non-transient solid-state storage device. In some optional embodiments, the memory 20 may optionally include a memory remotely arranged relative to the processor 10, and these remote memories may be connected to the computer device via a network. Examples of the above-mentioned network include, but are not limited to, the Internet, an intranet, a local area network, a mobile communication network, and combinations thereof.
[0174] The memory 20 may include a volatile memory, such as a random access memory; the memory may also include a non-volatile memory, such as a flash memory, a hard disk or a solid state drive; the memory 20 may also include a combination of the above types of memory.
[0175] The controller 501 further includes a communication interface 30 for the controller to communicate with other devices or a communication network.
[0176] The embodiment of the present invention also provides a computer-readable storage medium. The method according to the embodiment of the present invention can be implemented in hardware, firmware, or can be implemented as a computer code that can be recorded in a storage medium, or can be implemented as a computer code that is originally stored in a remote storage medium or a non-temporary machine-readable storage medium and will be stored in a local storage medium through a network download, so that the method described herein can be stored in such software processing on a storage medium using a general-purpose computer, a dedicated processor, or programmable or dedicated hardware. Among them, the storage medium can be a magnetic disk, an optical disk, a read-only storage memory, a random access memory, a flash memory, a hard disk or a solid-state hard disk, etc.; further, the storage medium can also include a combination of the above types of memories. It can be understood that a computer, a processor, a microprocessor controller, or programmable hardware includes a storage component that can store or receive software or computer code. When the software or computer code is accessed and executed by a computer, a processor, or hardware, the method shown in the above embodiment is implemented.
[0177] Although the embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art may make various modifications and variations without departing from the spirit and scope of the present invention, and such modifications and variations are all within the scope defined by the appended claims.
Claims
1. An equipment cleaning system, comprising: Acid tank, alkali tank, clean water tank, hot water tank, characterized in that the equipment cleaning system also includes: a first recovery tank, a second recovery tank and a third recovery tank, wherein, The first recovery tank is used to perform a first flush on the target cleaning equipment; The second recovery tank is used to perform a second rinse on the target cleaning device after the first rinse is completed, and the liquid after the second rinse is recovered into the first recovery tank; The alkali tank is used to rinse the target cleaning equipment for a third time after the second rinse, and the liquid after the third rinse is recovered to the second recovery tank, and the target cleaning equipment is rinsed for a fourth time after the third rinse, and the liquid after the fourth rinse is recovered to the alkali tank; The third recovery tank is used to perform a fifth rinse on the target cleaning equipment after the fourth rinse is completed, and the liquid after the fifth rinse is recovered to the alkali tank or the second recovery tank, and the target cleaning equipment is rinsed for the sixth time after the fifth rinse is completed, and the liquid after the sixth rinse is recovered to the second recovery tank; The acid tank is used to rinse the target cleaning equipment for a seventh time after the sixth rinse is completed, and the liquid after the seventh rinse is recovered to the third recovery tank, and the target cleaning equipment is rinsed for an eighth time after the seventh rinse is completed, and the liquid after the eighth rinse is recovered to the acid tank; The clean water tank is used to rinse the target cleaning equipment for the ninth time after the eighth rinse is completed, and the liquid after the ninth rinse is recovered to the acid tank or the third recovery tank; The hot water tank is used to rinse the target cleaning device for the tenth time after the ninth rinse is completed, and the liquid after the tenth rinse is recovered to the hot water tank or the third recovery tank.
2. The equipment cleaning system according to claim 1, characterized in that: Also includes: The cleaning system is used to filter the liquid recovered each time, and replenish the filtered liquid to the acid tank, the alkali tank, the hot water tank, the first recovery tank, the second recovery tank and the third recovery tank accordingly.
3. The equipment cleaning system according to claim 1, characterized in that: Also includes: Water replenishment pipeline and cleaning pipeline; The water replenishment pipeline is connected to the water inlets of the acid tank, alkali tank, hot water tank and clean water tank respectively, and is used to replenish water into the acid tank, alkali tank, hot water tank and clean water tank; The input end of the cleaning pipeline is respectively connected to the output ends of the acid tank, alkali tank, hot water tank, clean water tank, first recovery tank, second recovery tank and third recovery tank, and the output end is connected to the target cleaning equipment for conveying flushing liquid to the target cleaning equipment.
4. The equipment cleaning system according to any one of claims 1 to 3, characterized in that: Also includes: Heating system and / or cleaning fluid replenishment line, wherein: The heating system is used to heat various components of the equipment cleaning system; The cleaning liquid replenishing pipeline is connected to the liquid replenishing ports of the acid tank and the alkali tank respectively, and is used to replenish the acid cleaning liquid into the acid tank and replenish the alkaline cleaning liquid into the alkali tank.
5. A control method for an equipment cleaning system, characterized in that: The equipment cleaning system is the equipment cleaning system according to any one of claims 1 to 4, and the method comprises: Upon receiving a cleaning instruction from a target cleaning device, controlling the first recovery tank to perform a first flush on the target cleaning device; After the first flushing is completed, controlling the second recovery tank to flush the target cleaning device for the second time, and recovering the liquid after the second flushing to the first recovery tank; After the second rinse is completed, the alkali tank is controlled to rinse the target cleaning equipment for the third time, and the liquid after the third rinse is recovered to the second recovery tank, and after the third rinse is completed, the alkali tank is controlled to rinse the target cleaning equipment for the fourth time, and the liquid after the fourth rinse is recovered to the alkali tank; After the fourth rinse is completed, the third recovery tank is controlled to perform a fifth rinse on the target cleaning equipment, and the liquid after the fifth rinse is recovered to the alkali tank or the second recovery tank, and after the fifth rinse is completed, the third recovery tank is controlled to perform a sixth rinse on the target cleaning equipment, and the liquid after the sixth rinse is recovered to the second recovery tank; After the sixth flushing is completed, the acid tank is controlled to flush the target cleaning equipment for the seventh time, and the liquid after the seventh flushing is recovered to the third recovery tank; and after the seventh flushing is completed, the acid tank is controlled to flush the target cleaning equipment for the eighth time, and the liquid after the eighth flushing is recovered to the acid tank; After the eighth flushing is completed, controlling the clean water tank to flush the target cleaning equipment for the ninth time, and recovering the liquid after the ninth flushing to the acid tank or the third recovery tank; After the ninth flushing is completed, the hot water tank is controlled to flush the target cleaning device for the tenth time, and the liquid after the tenth flushing is recovered to the hot water tank or the third recovery tank.
6. The method according to claim 5, characterized in that The step of recovering the liquid after the fifth flushing to the alkali tank or the second recovery tank comprises: Testing the conductivity of the liquid after the fifth flushing; When it is detected that the conductivity is less than a first preset conductivity threshold, the liquid after the fifth flushing is recovered to the second recovery tank; When it is detected that the conductivity is not less than a first preset conductivity threshold, the liquid after the fifth flushing is recovered to the alkali tank; And / or, the liquid after the ninth flushing is recovered to the acid tank or the third recovery tank, comprising: Testing the conductivity of the liquid after the ninth flushing; When it is detected that the conductivity is less than the second preset conductivity threshold, the liquid after the ninth flushing is recovered to the third recovery tank; When it is detected that the conductivity is not less than a second preset conductivity threshold, the liquid flushed for the ninth time is recovered to the acid tank; And / or, the step of recovering the liquid after the tenth flushing to the hot water tank or the third recovery tank comprises: Testing the temperature of the liquid after the tenth flushing; When it is detected that the temperature is greater than a preset temperature threshold, the liquid after the tenth flushing is recovered to the hot water tank; When it is detected that the temperature is not greater than the preset temperature threshold, the liquid after the tenth flushing is recovered to the third recovery tank.
7. The method according to claim 5 or 6, characterized in that: Also includes: Utilize a cleaning system to filter each recovered liquid; Detecting the pH value and temperature of the liquid filtered by the cleaning system; Based on the detection results, the liquid filtered by the cleaning system is replenished to the acid tank, the alkali tank, the hot water tank, the first recovery tank, the second recovery tank and the third recovery tank accordingly.
8. A control device for an equipment cleaning system, characterized in that: The equipment cleaning system is an equipment cleaning system according to any one of claims 1 to 4, and the device comprises: A first processing module, configured to control the first recovery tank to perform a first flushing of the target cleaning equipment upon receiving a cleaning instruction of the target cleaning equipment; A second processing module is used to control the second recovery tank to perform a second rinse on the target cleaning device after the first rinse is completed, and to recover the liquid after the second rinse to the first recovery tank; A third processing module is used to control the alkali tank to rinse the target cleaning equipment for a third time after the second rinse is completed, and to recover the liquid after the third rinse to the second recovery tank, and to control the alkali tank to rinse the target cleaning equipment for a fourth time after the third rinse is completed, and to recover the liquid after the fourth rinse to the alkali tank; a fourth processing module, for controlling the third recovery tank to perform a fifth rinse on the target cleaning device after the fourth rinse is completed, and recovering the liquid after the fifth rinse to the alkali tank or the second recovery tank, and controlling the third recovery tank to perform a sixth rinse on the target cleaning device after the fifth rinse is completed, and recovering the liquid after the sixth rinse to the second recovery tank; a fifth processing module, for controlling the acid tank to perform a seventh rinse on the target cleaning device after the sixth rinse is completed, and recovering the liquid after the seventh rinse to the third recovery tank; and for controlling the acid tank to perform an eighth rinse on the target cleaning device after the seventh rinse is completed, and recovering the liquid after the eighth rinse to the acid tank; A sixth processing module, used for controlling the clean water tank to perform a ninth rinse on the target cleaning device after the eighth rinse is completed, and recovering the liquid after the ninth rinse to the acid tank or the third recovery tank; The seventh processing module is used to control the hot water tank to rinse the target cleaning equipment for the tenth time after the ninth rinse is completed, and recover the liquid after the tenth rinse to the hot water tank or the third recovery tank.
9. A cleaning device, characterized in that: include: A controller and an equipment cleaning system as claimed in any one of claims 1 to 4, wherein: The controller includes: a memory and a processor, the memory and the processor are communicatively connected to each other, the memory stores computer instructions, and the processor executes the method according to any one of claims 5 to 7 by executing the computer instructions.
10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer instructions, and the computer instructions are used to enable a computer to execute the method according to any one of claims 5 to 7.
Citation Information
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