Air inlet system for plasma processing equipment

Abstract

The invention relates to the technical field of plasma processing, and provides an air inlet system for plasma processing equipment, which comprises a first input pipeline and a second input pipeline, which are used for inputting a liquid mixed material and a to-be-mixed material; the mixing cavity is used for mixing the mixture to be mixed and the mixture to be mixed into azeotrope and outputting the azeotrope; wherein the boiling point of the mixed solution is lower than that of the mixed solution, and an azeotrope can be formed; the heater is arranged corresponding to the mixing cavity and is used for heating the azeotrope in the mixing cavity until the azeotrope is boiled to form mixed steam; and the separation unit is used for separating the mixed steam and the to-be-mixed steam in the mixed steam, and outputting the mixed steam to a reaction cavity of the plasma processing equipment from the first gas inlet pipeline. Therefore, according to the scheme of the invention, only heating is needed to reach the heating temperature meeting the reduced boiling point, and compared with high temperature heating in related technologies, the temperature is greatly reduced, and energy conservation and consumption reduction are realized.

Description

Technical Field

[0001] The present disclosure relates to the field of plasma processing technology, and in particular to an air intake system for a plasma processing device. Background Art

[0002] In the wafer manufacturing process, the photolithography process accounts for about 35% of the total wafer manufacturing cost and 40-50% of the total wafer process time. It is the most core process in semiconductor manufacturing. An indispensable step in the photolithography process is wafer stripping. After the photoresist completes the pattern replication and transfer function, the remaining photoresist on the wafer surface needs to be completely removed through the stripping process. Plasma dry stripping uses high-energy plasma to treat the photoresist surface. The stripping is thorough and fast, and does not require the introduction of chemical substances, which reduces corrosion and damage to wafer materials. It is the best method among the existing stripping processes.

[0003] Due to process requirements, water vapor is introduced into the gas to assist the third-generation semiconductor dry stripping operation. The introduction of water can help control the chemical reactions in the plasma. Especially when using oxygen plasma for stripping, the presence of water vapor can promote the decomposition of photoresist and the generation of gaseous products, thereby improving the stripping efficiency.

[0004] However, in the related art, the method used to generate water vapor by heating water to 150°C through a steam generator, and wrapping a heating belt around the periphery of the gas pipeline to maintain the temperature of the water vapor and prevent the water vapor from condensing in the pipeline, causing process failure. This high-temperature processing method has high losses, and the water vapor is greatly affected by temperature fluctuations. The gas pipeline is generally arranged outside the machine, and the ambient temperature is too high, making it difficult for people to approach the operation. Summary of the invention

[0005] In view of the above-mentioned shortcomings of the prior art, an object of the present disclosure is to provide an air intake system for a plasma processing device to solve the problems in the related art.

[0006] The first aspect of the present disclosure provides an air intake system for a plasma processing device, comprising: a first input pipeline having a first input port for inputting a liquid mixed material; a second input pipeline having a second input port for inputting a liquid to be mixed material; a mixing chamber connected to the first input pipeline and the second input pipeline in an on / off manner, and used to mix the mixed material and the to-be-mixed material into a mixed liquid; wherein the boiling point of the mixed liquid is lower than the boiling point of the mixed material, and when the ratio of the mixed material to the to-be-mixed material satisfies a specific ratio, the mixed liquid can be made into an azeotrope with a common boiling point; a heater arranged corresponding to the mixing chamber, heating the mixed liquid in the mixing chamber to boiling to form mixed steam; and a separation unit, the pipeline of which is connected to the mixing chamber, used to separate the mixed material vapor and the to-be-mixed material in the mixed steam, and output the mixed material vapor to the reaction chamber of the plasma processing device through the first air intake pipeline.

[0007] In an embodiment of the first aspect, the separation unit is connected to a recovery pipeline, and the recovery pipeline can be connected to the second input pipeline in an on / off manner to output the mixture to be mixed to the second input pipeline for recycling.

[0008] In an embodiment of the first aspect, a first controllable valve and a first flow meter are arranged in the first input pipeline; a second controllable valve and a second flow meter are arranged in the second input pipeline; a first control unit is communicatively connected to the first controllable valve and the second controllable valve, and is used to adjust the opening of the first controllable valve and the second controllable valve when the recovery pipeline is disconnected from the second input pipeline, so that the flow information monitored by the first flow meter and the second flow meter indicates that the volume ratio of the mixed mixture and the mixed mixture flowing into the mixing chamber approaches the specific ratio to reach the preset ratio.

[0009] In an embodiment of the first aspect, the air intake system includes: a liquid level sensor and a pressure sensor, which are arranged in the mixing chamber and are used to detect liquid level information and pressure information respectively; a first controllable valve, which is arranged in the first input pipeline; a second controllable valve, which is arranged in the second input pipeline; a second control unit, which is communicatively connected to the liquid level sensor, the pressure sensor, the first controllable valve and the second controllable valve, and is used to use a liquid pressure algorithm to determine the density and volume of the mixed liquid according to the liquid level information and the pressure information; and use a mass density formula to determine the volume ratio of the mixed material to the mixed material in the mixing chamber according to the density and volume of the mixed liquid, the density of the mixed material and the density of the mixed material, so as to control the opening of the first controllable valve and the second controllable valve so that the volume ratio approaches the specific ratio to reach a preset ratio.

[0010] In an embodiment of the first aspect, the recovery pipeline is provided with a third controllable valve, a recovery buffer portion and at least one one-way valve.

[0011] In an embodiment of the first aspect, the recovery pipeline passes through a separation and purification device for purifying the mixture to be treated.

[0012] In an embodiment of the first aspect, the separation unit includes a semipermeable membrane; and / or the reaction chamber is connected to a vacuum device for setting an air pressure environment of the reaction chamber to meet a preset pressure condition, and the preset pressure condition includes: a pressure condition that makes the mixture in the reaction chamber in a gaseous state.

[0013] In an embodiment of the first aspect, the azeotrope has a azeotropic point in the range of 30°C to 40°C, 40°C to 50°C, 50°C to 60°C, 60°C to 70°C or 70°C to 80°C.

[0014] In an embodiment of the first aspect, the mixture is composed of esters, ethers or ketones determined based on one or more of the lower azeotropic point, lower material toxicity and lower preparation difficulty / cost.

[0015] In an embodiment of the first aspect, the mixture is composed of esters, ethers or ketones determined based on one or more of the lower azeotropic point, lower material toxicity and lower preparation difficulty / cost; and / or the mixture includes water, and the mixture is selected from at least one of the following: diethyl ether, ethyl acetate, ethanol.

[0016] In an embodiment of the first aspect, a fourth controllable valve, a pressure regulating valve and a mass flow controller are further provided in the pipeline between the mixing chamber and the separation unit.

[0017] In an embodiment of the first aspect, the air intake system further includes: at least one reaction gas input pipeline connected to the reaction chamber for inputting the reaction gas.

[0018] As described above, the present disclosure relates to the field of plasma processing technology, and provides an air intake system for plasma processing equipment, including: a first input pipeline and a second input pipeline, for inputting liquid mixed material and to-be-mixed material; a mixing chamber, for mixing the mixed material and to-be-mixed material into an azeotrope and outputting it; wherein the boiling point of the mixed liquid is lower than the boiling point of the mixed material, and can form an azeotrope; a heater, corresponding to the mixing chamber, heats the azeotrope in the mixing chamber to boiling to form a mixed steam; a separation unit, for separating the mixed material steam and the to-be-mixed material in the mixed steam, and outputting the mixed material steam to the reaction chamber of the plasma processing equipment through the first air intake pipeline. Therefore, through the disclosed solution, it is only necessary to heat to a heating temperature that meets the reduced boiling point, which greatly reduces the temperature compared to the high temperature heating in the related art, saving energy and reducing consumption. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1A schematic diagram of the piping structure of an air intake system for plasma processing equipment in one embodiment of the present disclosure is shown.

[0020] Figure 2 A table showing information about the azeotropes that form with different types of mixtures.

[0021] Figure 3 A schematic diagram of a module for controlling the flow of a mixture and a to-be-mixed mixture in an embodiment of the present disclosure is shown.

[0022] Figure 4 A schematic diagram of a module for controlling the flow of a substance to be mixed and a substance to be mixed in another embodiment of the present disclosure is shown.

[0023] Figure 5 A schematic diagram showing the structure of a liquid level sensor and a pressure sensor disposed in a mixing chamber in one embodiment of the present disclosure.

[0024] Figure 6 Schematic diagram showing the relationship between the boiling point of water and the ambient air pressure.

[0025] Figure 7 A flow chart showing a flow control method in an embodiment of the present disclosure.

[0026] Figure 8 A flow chart showing a flow control method in another embodiment of the present disclosure.

[0027] Fig. 9 A schematic diagram showing the structure of a computer device in an embodiment of the present disclosure is shown. DETAILED DESCRIPTION

[0028] The following is an explanation of the embodiments of the present disclosure by specific examples, and those skilled in the art can easily understand other advantages and effects of the present disclosure from the information disclosed by the present disclosure. The present disclosure can also be implemented or applied through other different specific embodiments, and the details in the present disclosure can also be modified or changed in various ways according to different viewpoints and application modules without departing from the spirit of the present disclosure. It should be noted that the embodiments in the present disclosure and the features in the embodiments can be combined with each other without conflict.

[0029] The following is a detailed description of the embodiments of the present disclosure with reference to the accompanying drawings so that those skilled in the art can easily implement the present disclosure. The present disclosure can be embodied in many different forms and is not limited to the embodiments described herein.

[0030] In the representations of the present disclosure, the reference terms "one embodiment", "some embodiments", "examples", "specific examples", or "some examples" and the like mean that the specific features, structures, materials or characteristics represented in conjunction with the embodiment or example are included in at least one embodiment or example of the present disclosure. Moreover, the specific features, structures, materials or characteristics represented may be combined in any one or a group of embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine different embodiments or examples represented in the present disclosure and the features of different embodiments or examples, unless they are mutually contradictory.

[0031] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the representation of the present disclosure, "a group" means two or more, unless otherwise clearly and specifically defined.

[0032] In order to clearly describe the present disclosure, components not related to the description are omitted, and the same reference numerals are given to the same or similar components throughout the specification.

[0033] Throughout the specification, when a device is said to be "connected" to another device, this includes not only the case of "direct connection" but also the case of "indirect connection" by placing other elements therebetween. In addition, when a device is said to "include" a certain component, unless otherwise stated, it does not exclude other components, but means that other components may be included.

[0034] Although the terms first, second, etc. are used to represent various elements in this article in some examples, these elements should not be limited by these terms. These terms are only used to distinguish one element from another element. For example, the first interface and the second interface, etc. are represented. Moreover, as used in this article, the singular forms "one", "one" and "the" are intended to also include plural forms, unless there is an opposite indication in the context. It should be further understood that the terms "comprising" and "including" indicate that there are the described features, steps, operations, elements, modules, projects, kinds, and / or groups, but do not exclude the existence, occurrence or addition of one or a group of other features, steps, operations, elements, modules, projects, kinds, and / or groups. The terms "or" and "and / or" used herein are interpreted as inclusive, or mean any one or any combination. Therefore, "A, B or C" or "A, B and / or C" means "any of the following: A; B; C; A and B; A and C; B and C; A, B and C". Only when the combination of elements, functions, steps or operations is inherently mutually exclusive in some way, will there be an exception to this definition.

[0035] The technical terms used herein are only used to refer to specific embodiments and are not intended to limit the present disclosure. The singular form used herein also includes the plural form unless the sentence clearly indicates the contrary meaning. The meaning of "including" used in the specification is to specify specific characteristics, regions, integers, steps, operations, elements and / or components, and does not exclude the existence or addition of other characteristics, regions, integers, steps, operations, elements and / or components.

[0036] Although not defined differently, all terms, including technical and scientific terms used herein, have the same meaning as those generally understood by those skilled in the art to which the present disclosure belongs. Terms defined in commonly used dictionaries are additionally interpreted as having meanings consistent with relevant technical literature and the message of the present disclosure, and shall not be overly interpreted as ideal or very formal meanings unless defined.

[0037] At present, due to the process requirements, the third-generation semiconductor dry stripping requires the introduction of mixed gas vapor into the gas to assist the operation. The introduction of the mixed gas can help control the chemical reactions in the plasma, especially when using oxygen plasma for stripping. The presence of mixed gas vapor can promote the decomposition of the photoresist and the generation of gaseous products, thereby improving the stripping efficiency.

[0038] However, in the related art, the method used to heat the mixture to generate steam is to heat the mixture to 150°C through a steam generator and wrap a heating belt around the periphery of the gas pipeline to maintain the temperature of the mixture steam and prevent the mixture steam from condensing in the pipeline, causing process failure. This high-temperature treatment method has high losses, and the mixture steam is greatly affected by temperature fluctuations. The gas pipeline is generally arranged outside the machine, and the ambient temperature is too high, making it difficult for people to approach for construction.

[0039] In view of this, an air intake system for plasma processing equipment is provided in an embodiment of the present disclosure. By mixing the mixed substance with the mixed substance to lower the boiling point, a mixed gas containing the vapor of the mixed substance can be obtained at a lower heating temperature, and then the vapor of the mixed substance can be obtained by separating the mixed gas. The heating temperature is effectively lowered to solve the problems in the related art. It should be noted that the plasma processing equipment in the embodiment of the present disclosure can be a degumming equipment, and the addition of the vapor of the mixed substance can significantly improve the degumming effect. Alternatively, it can also be equipment for other processes, such as etching / deposition processes, which may also require the injection of the vapor of the mixed substance into the plasma to improve the stability of the plasma and increase the output.

[0040] like Figure 1 As shown, a schematic diagram of the pipeline structure of the air intake system for plasma processing equipment in one embodiment of the present disclosure is shown.

[0041] The air intake system 100 includes: a first input pipeline 101 , a second input pipeline 102 , a mixing chamber 103 , a heater 104 and a separation unit 105 .

[0042] The first input pipeline 101 has a first input port for inputting a liquid mixture, such as water (H 2 O). The first input pipeline 101 can be connected to an inlet of the mixing chamber 103 in an on / off manner. In some embodiments, a first controllable valve 106 is provided in the first input pipeline 101 to control the on / off between the first input pipeline 101 and the mixing chamber 103. As an example, the first controllable valve 106 can be a valve that can be opened / closed and adjust the flow rate, and can be a manual valve or a program-controlled valve. In some optional embodiments, for example Figure 1 In the example, a first flow meter 107 may be further provided in the first input pipeline 101 , and the first flow meter 107 may be used to detect the flow rate of the mixed substance in the first input pipeline 101 , so as to determine the volume of the mixed substance flowing into the mixing chamber 103 .

[0043] The second input pipeline 102 has a second input port for inputting the object to be mixed. The second input pipeline 102 can be connected to another inlet of the mixing chamber 103 in an on / off manner. In some embodiments, a second controllable valve 108 is provided in the second input pipeline 102 to control the on / off between the second input pipeline 102 and the mixing chamber 103. As an example, the second controllable valve 108 can be a valve that can be opened / closed and adjust the flow rate, and can be a manual valve or a programmable valve. In some optional embodiments, for example Figure 1 In the example, a second flow meter 109 may be further provided in the second input pipeline 102 , and the second flow meter 109 may be used to detect the flow rate of the object to be mixed in the second input pipeline 102 , so as to determine the volume of the object to be mixed flowing into the mixing chamber 103 .

[0044] The mixing chamber 103 is connected to the first input pipeline 101 and the second input pipeline 102 in an on / off manner, and is used to mix the mixture and the to-be-mixed mixture into a mixed liquid. The heater 104 is arranged corresponding to the mixing chamber 103, and heats the mixed liquid in the mixing chamber 103 to boiling to form a mixed vapor. Among them, the boiling point of the mixed liquid is lower than the boiling point of the mixture. By selecting a suitable type of the to-be-mixed object, mixing with the mixture can reduce the boiling point of the mixed liquid. The main reason is that the interaction force between the components in the mixed liquid reduces the vapor pressure of the mixed liquid, thereby causing the boiling point to decrease; conversely, if the components in the mixed liquid repel each other, the vapor pressure will increase, and the boiling point will be higher than the boiling point of each component. What is needed in the embodiment of the present disclosure is the situation where the boiling point of the former mixed liquid is lower than the boiling point of the mixture. Specifically explain its principle. According to Raoult's law, the vapor pressure of the mixed liquid is equal to the simple addition of the vapor pressures of the components, but due to the interaction between the components, the vapor pressure of the mixed liquid may be lower than the simple addition of the vapor pressures of the components, so the boiling point will also decrease. For example, the mixture and ethanol are selected to be mixed, and the boiling point of the mixed solution of the mixture and ethanol is lower than the boiling point of the mixture. Further, the mixed solution formed by the mixture and some types of mixed substances under a specific ratio will become an azeotrope with a azeotropic point, that is, the mixture will boil together with the mixed substance at the azeotropic point under a fixed pressure. The azeotropic point of the mixed solution will be lower than the boiling point of each component in the mixed solution, that is, it will be at least lower than the boiling point of the mixture and the mixed substance. For example, water and ethanol are mixed in a ratio of 5:95 at normal pressure, and the azeotropic point is 78.15°C. Since the boiling point of water is 100°C and the boiling point of ethanol is 78.5°C, it can be seen that the azeotropic point of the water-ethanol azeotrope is lower than the boiling point of water and ethanol.

[0045] The principle of selecting the mixture to be mixed is specifically described. In some embodiments, the mixture to be mixed can be an ester, an ether or a ketone. Further exemplary, the mixture to be mixed can be determined based on one or more of the following goals: the azeotropic point tends to be lower, the material toxicity tends to be lower, and the difficulty / cost of preparation tends to be lower.

[0046] Let’s take an example to illustrate this. Figure 2 As shown, an information table showing the formation of azeotropes between water and different types of mixed materials is shown. In this information table, the boiling points, preset ratios, and other information of ethanol, n-propanol, isopropanol, n-butanol, isobutanol, tert-butanol, isoamyl alcohol, n-pentanol, chloroethanol, ether, acetonitrile, acrylonitrile, formic acid, propionic acid, ethyl acetate, dioxane, chloroform, carbon tetrachloride, ethylene dichloride, benzene, etc. when forming azeotropes with water are listed.

[0047] Regarding the condition of "lower azeotropic point", it is expected that the azeotropic point of the azeotrope formed by the mixture and water is as low as possible. For example, the temperature at which people feel that the water temperature begins to become hot is about 43°C, because the human body's pain receptors will be activated at this temperature. The specific feeling varies from person to person, and the sensitivity of the skin in different parts to temperature is also different. Generally speaking - from the perspective of comfort, water temperatures of 30°C to 35°C give people a cool to warm feeling, while around 40°C begins to approach human body temperature and feels relatively warm. At a water temperature of around 45°C, people will obviously feel hot when serving dishes, but they can still tolerate it for a short time. For most people, water at 50°C will have a noticeable sense of heat when touched, but short-term contact will not cause burns. Water temperatures above 60°C generally make people feel very hot, and prolonged or rapid contact may cause skin burns, especially oral mucosa, which may cause burns if it exceeds 65°C. Water temperatures of 70°C and above will have an immediate burning sensation after contact, and there is an immediate risk of burns. Thus, in some embodiments of the present disclosure, the azeotropic point of the azeotrope can be selected in the range of 30°C to 40°C, 40°C to 50°C, 50°C to 60°C, 60°C to 70°C or 70°C to 80°C, preferably 30°C to 40°C, and less preferably 40°C to 50°C. Therefore, in the above information table, according to the azeotropic point conditions, ether with an azeotropic point of 34°C with water can be preferably used as the mixture to be mixed; less preferably, chloroform can also be selected as the mixture to be mixed; more preferably, carbon tetrachloride, benzene, ethyl acetate, etc. can be selected as the mixture to be mixed.

[0048] Regarding the condition of "lower material toxicity", while considering lowering the heating temperature as much as possible, it is also necessary to consider the toxicity to the human body. Among the above substances, benzene is a carcinogen, acetonitrile, acrylonitrile, chloroform, carbon tetrachloride, etc. are all highly toxic. In comparison, ether has only a certain anesthetic toxicity and is relatively low, and the required sealing / ventilation protection level is much lower than the above substances. Choosing ether can take into account the conditions of lower heating temperature and low toxicity. Therefore, benzene, acetonitrile, acrylonitrile, chloroform, carbon tetrachloride, etc. may not be preferred as the mixture to be mixed, but ether may be selected as the mixture to be mixed. Of course, when the protection and environmental protection configuration meets the safety requirements (such as airtightness to prevent gas leakage), it can also be used.

[0049] In some embodiments, it is also necessary to balance the amount of the mixture to be mixed and the boiling point of the mixture to be achieved. Taking ether as an example, at standard atmospheric pressure, when the ether content is about 99%, an azeotropic composition is achieved, and the azeotropic point is 34°C. If the ether content is gradually reduced, when the ether content is 90%, the boiling point is about 37°C; when the ether content is 80%, the boiling point is about 40°C; when the ether content is 70%, the boiling point is about 43°C; when the ether content is 60%, the boiling point is about 46°C;

[0050] When the ether content is 50%, the boiling point is about 49°C. On this basis, when the volume ratio of ether to water is 20% to 80%, the boiling point of the mixture is 60°C~70°C. Preferably, the volume ratio of ether to water can be selected to satisfy the boiling point of the mixed solution at 50°C~60°C. According to the above analysis, it can be seen that the boiling point of the original water is effectively reduced, and the amount of the mixed substance is effectively reduced, effectively reducing the toxicity risk / cost. In addition, since the amount of water vapor used is generally very small, the flow rate is roughly around 1g / min, and accordingly, the flow rate of the mixed substance is also small, which can also effectively reduce the toxicity risk / cost.

[0051] Others, such as ethanol, n-propanol, isopropanol, n-butanol, isobutanol, tert-butanol, isopentanol, and n-pentanol: These alcohols are irritating to a certain extent, but their toxicity is relatively low. However, their azeotropic points with water are between 78°C and 98°C, and the cooling effect is not ideal. Therefore, in some embodiments, the boiling point can be lowered by reducing the ambient pressure for use.

[0052] Regarding the condition of "preparation difficulty / cost is low", the industrial preparation of alcohol and ether CHO combinations is not difficult. However, the process of doping halogen elements or organic ring structures is relatively complicated and may require catalysts. For example, the preparation of dioxane requires the addition of metal catalysts, and its azeotropic point is 87.8°C. Therefore, considering the preparation difficulty / cost and the cooling effect achieved, dioxane may not be used as a mixed compound.

[0053] Based on comprehensive consideration of the above conditions, preferably, one of ether, ethyl acetate and ethanol can be selected as the mixed material.

[0054] It can be understood that by selecting the type of the mixture to be mixed, a boiling point of the mixed liquid as much as possible lower than the boiling point of the mixture can be obtained (it can also have the characteristics of low toxicity, difficulty in preparation / low cost, etc.), and an azeotrope can be formed at a predetermined ratio, thereby obtaining a lower azeotropic point. Thus, when the mixed liquid is heated to boil to form steam, the heating temperature can be greatly reduced, thereby achieving energy saving and avoiding the problem of high temperature burns. It should be noted that when controlling the mixing ratio of the mixture to be mixed and the mixture in the mixing chamber 103, it is not necessarily necessary to meet the preset ratio of the azeotrope. If it is possible to reduce the boiling point of the mixed liquid to the required temperature without reaching azeotropy, it is also possible not to mix according to the preset ratio. Of course, in the preferred case, an azeotrope is formed to obtain an azeotropic point with the lowest temperature as much as possible.

[0055] Therefore, the heating temperature of the heater 104 can be greatly reduced. For example, when ether is selected as the mixture to be mixed, after mixing in the required ratio, such as 8:2 of water to ether, the mixture only needs to be heated to 60°C to 70°C to boil, which is much lower than the boiling point of water. Even if the temperature is increased for heating efficiency, it is still much lower than the original 150°C heating temperature for generating water vapor, thereby effectively reducing costs.

[0056] Since the mixture to be mixed and the mixed substance are mixed, after the mixed vapor of the mixed liquid is generated, the mixed substance vapor needs to be separated out for use as the gas intake of the reaction chamber of the plasma processing equipment.

[0057] The separation unit 105 pipeline is connected to the mixing chamber 103. The separation unit 105 is used to separate the mixed steam and the to-be-mixed mixture in the mixed steam, and output the mixed steam to the reaction chamber 200 of the plasma treatment equipment through the first air inlet pipeline 110. As an optional example, a fourth controllable valve 126, a pressure regulating valve 112 and a mass flow controller 113 (MFC) are also provided in the pipeline between the mixing chamber 103 and the separation unit 105. Further exemplarily, the fourth controllable valve 126 is mainly used for on / off and opening control of the pipeline between the mixing chamber 103 and the separation unit 105. The pressure regulating valve 112 is used to adjust the pipeline pressure of the pipeline between the mixing chamber 103 and the separation unit 105, and the mass flow controller 113 is used to set the flow rate of the mixed steam between the mixing chamber 103 and the separation unit 105.

[0058] In some embodiments, the separation unit 105 includes a semipermeable membrane, and a membrane separation method is used to separate the mixed vapor and the mixed vapor in the mixed vapor. The membrane separation method uses a special semipermeable membrane to separate according to the size and diffusion rate of gas molecules. These membranes are usually made of special polymers or ceramic materials, which selectively allow certain gas molecules to pass through and block other molecules. As an example, a semipermeable membrane can be used to achieve separation by using the size and diffusion rate of gas molecules. Taking ether as an example, the molecular weight of ether (C2H5OC2H5) is 74.12, and that of water (H2O) is 18.02. If the pore size of the semipermeable membrane is smaller than the size of ether molecules (about 0.4 nanometers) and allows water molecules (0.3 nanometers) to pass through, the effect of ether retention and water molecule penetration can be achieved. It can be understood that as the type of the mixed substance changes, the pore size of the semipermeable membrane may also change accordingly to achieve the separation purpose of retention and penetration respectively.

[0059] In some embodiments, the separation unit 105 can be connected to a recovery line 114, and the recovery line 114 can be connected to the second input line 102 in an on / off manner to output the mixture to be mixed to the second input line 102 for recycling. Optionally, the recovery line 114 is provided with a third controllable valve 122, a recovery buffer 115 and at least one one-way valve 116. As an example, in Figure 1 In the embodiment, there are two one-way valves 116, which are respectively arranged near the second input pipeline 102 and the separation unit 105, and the third controllable valve 122 and the recovery buffer 115 are arranged between the two one-way valves 116. It can be understood that the conduction direction of the one-way valve 116 is one-way conduction from the separation unit 105 to the second input pipeline 102. The recovery buffer 115 is used to temporarily store the recovered mixed material to be sent back to the second input pipeline 102 at a selected time. In some embodiments, the gaseous mixed material can be changed into a liquid state in advance in the recovery buffer 115 by condensation or the like, so as to be used in the second input pipeline 102. Alternatively, the pressure or temperature that can keep the mixed material in a liquid state can also be maintained in the second input pipeline 102, so that the gaseous mixed material sent from the recovery pipeline 114 can be converted into a liquid state. In some optional embodiments, since the recovered mixed substance may still contain mixed substance vapor, a separation and purification device for purifying the mixed substance (i.e., removing the mixed substance) may be provided in the recovery pipeline 114, and the separation and purification device may be located in the front stage of the recovery buffer 115 in the conduction direction, or in the rear stage of the recovery buffer 115. In some embodiments, taking water as an example, the separation and purification device may include a desiccant (such as anhydrous calcium chloride, anhydrous magnesium sulfate, sodium, etc.) for absorbing water. Alternatively, the water in the mixed substance may be removed by a method such as rotary evaporation to remove water.

[0060] In some embodiments, the air intake system 100 may further include at least one reaction gas input pipeline connected to the reaction chamber 200 for inputting reaction gas. The reaction gas includes but is not limited to oxygen, nitrogen, argon, etc. As an example, Figure 1 , it is shown that the air intake system 100 may include a second air intake pipeline 117 and a third air intake pipeline 118. The second air intake pipeline 117 is connected to the reaction chamber 200 for inputting nitrogen. The third air intake pipeline 118 is connected to the reaction chamber 200 for inputting process gas such as oxygen. Further, a fifth controllable valve 119 and a sixth controllable valve 120 may be respectively provided in the second air intake pipeline 117 and the third air intake pipeline 118.

[0061] In some embodiments, the reaction chamber 200 is connected to a vacuum device for setting a gas pressure environment of the reaction chamber 200 to meet a preset pressure condition, and the preset pressure condition includes: a pressure condition that makes the mixture in the reaction chamber 200 in a gaseous state. That is, the gas pressure of the reaction chamber 200 is set by the vacuum device, such as reducing the pressure to reduce the boiling point of the mixture, so that the vapor of the mixture can still remain in a gaseous state after entering. As an example, you can refer to Figure 6 As shown, a curve showing the relationship between the boiling point of water and the ambient air pressure is shown. When the vacuum degree is higher, such as when the pressure is 1000 Pa, the boiling point of water is only 6.9696°C, and it is very easy to maintain it in a gaseous state. In some embodiments, the vacuum device may include one or more of a dry pump 300 (Dry Pump), a molecular pump 400 (Molecular PUMP), etc. The dry pump 300 refers to a dry vacuum pump, which can set the reaction chamber 200 to a certain vacuum degree, while the molecular pump 400 can set the reaction chamber 200 to a higher vacuum degree.

[0062] based on Figure 1 In order to make the mixture and the mixture to be mixed in the mixing chamber 103 reach a preset ratio of forming an azeotrope, reference may be made to Figure 3 FIG. 1 is a block diagram showing flow control of the mixture and the to-be-mixed mixture in an embodiment of the present disclosure. In this embodiment, the first controllable valve 106 and the second controllable valve 108 are program-controlled valves with adjustable openings.

[0063] exist Figure 3In the embodiment, the intake system 100 further includes a first control unit 121. The first control unit 121 is communicatively connected to the first controllable valve 106 and the second controllable valve 108, and is used to adjust the opening of the first controllable valve 106 and the second controllable valve 108 based on the flow information monitored by the first flow meter 107 and the second flow meter 109 indicating that the volume ratio of the mixed substance and the mixed substance flowing into the mixing chamber 103 approaches the specific ratio to reach the preset ratio when the second input pipeline 102 does not input the mixed substance recovered from the separation unit 105. Specifically, there are two situations in which the second input pipeline 102 does not input the recovered mixed substance, one is that the recovery pipeline 114 is not provided in the intake system 100, and the other is that the recovery pipeline 114 is disconnected (for example, the fourth controllable valve 126 is closed). At this time, since the recycled mixed material that may be doped with the mixed material is not used, and only the mixed material from the supply source is used, the flow information passed by the second flow meter 109 is the accurate flow rate of the mixed material. Since the volume can be obtained based on the flow rate and time, the accurate volume of the mixed material entering the mixing chamber 103 can be obtained by reading the flow information of the second flow meter 109. The volume ratio of the mixed material and the mixed material entering the mixing chamber 103 can be accurately determined based on the flow information of the first flow meter 107 and the second flow meter 109, thereby further determining that the volume ratio of the mixed material and the mixed material in the mixing chamber 103 meets the preset ratio for constituting an azeotrope. For example, when the volume of the mixed material flowing into the mixing chamber 103 is determined to be V1 according to the flow information of the first flow meter 107, and the volume of the to-be-mixed material flowing into the mixing chamber 103 is determined to be V2 according to the flow information of the second flow meter 109, assuming that the preset ratio of the mixed material and the to-be-mixed material is 8:2, when V1:V2 is greater than 8 / 2, V2 is increased by increasing the flow rate of the to-be-mixed material, thereby reducing V1:V2 to 8:2.

[0064] Of course, if the second input pipeline 102 receives the recovered mixed material containing the mixed substance, the flow information of the second flow meter 109 cannot accurately reflect the volume of the mixed material entering the mixing chamber 103. In this case, the volume ratio between the mixed substance and the mixed material in the mixed liquid in the mixing chamber 103 can be detected to determine the control of the opening of the first controllable valve 106 and the second controllable valve 108.

[0065] Optionally, when a recovery line 114 is provided, the first control unit 121 can also be communicatively connected to the third controllable valve 122, so that when it is necessary to determine the volume ratio of the mixed substance and the mixed substance in the mixing chamber 103 based on the flow information of the first flow meter 107 and the second flow meter 109, the recovery line 114 can be disconnected by controlling the third controllable valve 122.

[0066] like Figure 4, which shows a schematic diagram of a module for controlling the flow of a mixture and a to-be-mixed mixture in another embodiment of the present disclosure.

[0067] Different from Figure 3 In the embodiment, the first control unit 121 is used to control the first controllable valve 106 and the second controllable valve 108. In this embodiment, the intake system 100 includes a liquid level sensor 123, a pressure sensor 124 and a second control unit 125. Figure 5 As shown, the liquid level sensor 123 and the pressure sensor 124 are arranged in the mixing chamber 103, and are used to detect the liquid level information and the pressure information respectively. As an example, the liquid level sensor 123 and the pressure sensor 124 can be arranged on the inner wall of the mixing chamber 103. The pressure sensor 124 is immersed in the liquid in the mixing chamber 103, and can be arranged on the side wall or the bottom wall of the mixing chamber 103. The liquid level sensor 123 can be arranged on the side wall or the bottom wall of the mixing chamber 103. In some embodiments, the liquid level sensor 123 can be implemented as a liquid level sensor based on buoyancy, pressure, capacitance, ultrasonic or electromagnetic wave principles, such as a float type liquid level sensor (using the change in buoyancy of the float in the liquid to detect the liquid level), a capacitive liquid level sensor (using the change in capacitance to measure the liquid level), an ultrasonic liquid level sensor (by transmitting and receiving ultrasonic signals, calculating the liquid level according to the propagation time of the sound wave), a radar liquid level sensor (using electromagnetic waves to calculate the liquid level by measuring the propagation time of the electromagnetic wave), a magnetic flap liquid level gauge (using the buoyancy principle and magnetic coupling, the permanent magnet in the float is transmitted to the magnetic flip column indicator panel through magnetic coupling to display the liquid level), a magnetostrictive liquid level gauge (using the magnetostrictive effect, determining the liquid level by measuring the time difference between the pulse current and the torsion wave), a static pressure liquid level sensor (based on the principle that the static pressure of the liquid is proportional to the liquid level height, the static pressure is converted into an electrical signal) or a pressure liquid level transmitter, etc. In some embodiments, the pressure sensor 124‌ converts the pressure into an electrical signal for output. The pressure sensor 124 measures changes in pressure and converts them into electrical signals. Depending on the principle, the pressure sensor 124 may be implemented as a piezoresistive, piezoelectric, capacitive, or inductive sensor.

[0068] The second control unit 125 is communicatively connected to the liquid level sensor 123, the pressure sensor 124, the first controllable valve 106 and the second controllable valve 108, and is used to determine the density and volume of the mixed liquid according to the liquid level information and the pressure information using a liquid pressure algorithm. Also, the volume ratio of the mixed liquid to the mixed liquid in the mixing chamber 103 is determined according to the density and volume of the mixed liquid, the density of the mixed liquid and the density of the mixed liquid using the mass density formula, so as to control the opening of the first controllable valve 106 and the second controllable valve 108 so that the volume ratio approaches the specific ratio until it reaches the preset ratio. As an example, the liquid pressure algorithm is a method for calculating the liquid pressure, and the calculation formula for the liquid pressure at a point in the liquid is as shown below:

[0069] p = ρgh (1)

[0070] Among them, ρ: represents the density of the liquid; g: represents the acceleration due to gravity; h: represents the vertical distance from the point to the liquid surface, that is, the depth.

[0071] Based on the mass density formula, the following formula can be obtained:

[0072] ρ 1 V 1 +ρ 2 V 2 =ρ(V 1 +V 2 ) (2)

[0073] Among them, ρ 1 is the density of the mixture, V 1 is the volume of the mixed substance in the mixing chamber 103; 2 is the density of the mixture, V 2 is the volume of the mixed liquid in the mixing chamber 103; ρ is the density of the mixed liquid.

[0074] According to formula (2), it can be converted into V 1 / V 2 =(ρ-ρ 2 ) / (ρ 1 -ρ) (3)

[0075] According to the pressure information detected by the pressure sensor 124, i.e., p in the formula (1), and the liquid level information detected by the liquid level sensor 123, i.e., h in the formula (1), the density ρ of the mixed liquid in the mixing chamber 103 can be calculated, and then the volume ratio of the mixed substance and the to-be-mixed substance in the mixed liquid in the mixing chamber 103 can be calculated according to the formula (3), and then the openings of the first controllable valve 106 and the second controllable valve 108 can be adjusted according to the volume ratio so that the volume ratio approaches the specific ratio to reach the preset ratio. For example, when the volume of the mixed substance or the to-be-mixed substance is low and cannot reach the preset ratio, the volume of the mixed substance or the to-be-mixed substance is increased by increasing the flow rate to achieve the preset ratio.

[0076] Therefore, in this embodiment, regardless of whether the second pipeline inputs the recovered mixed material through the recovery pipeline 114, the valve control action can be implemented according to the volume ratio calculated by the detection information of the pressure sensor 124 and the liquid level sensor 123, so it is not necessary to set the first flow meter 107 and the second flow meter 109. Of course, since only the volume ratio can be calculated but not the specific volume of each, the first flow meter 107 and the second flow meter 109 can also be retained to obtain the specific flow information of each input pipeline. In addition, the flow of the two input pipelines is used as a reference, such as judging whether the flow is normal to judge whether the pipeline has a fault such as blockage, or by comparison to estimate whether the volume ratio obtained according to the pressure sensor 124 and the liquid level sensor 123 is reliable, so as to diagnose whether the pressure sensor 124, the liquid level sensor 123, the mixing chamber 103 or the front-stage pipeline of the mixing chamber 103 has an abnormality, such as blockage, leakage, etc.

[0077] like Figure 7 As shown, a flow chart of a flow control method in an embodiment of the present disclosure is shown. Figure 7 The method in the embodiment can be performed by Figure 3 The first control unit 121 in is executed.

[0078] exist Figure 7 The methods include:

[0079] Step S701: Acquire flow information monitored by the first flow meter 107 and the second flow meter 109;

[0080] Step S702: Based on the flow information monitored by the first flowmeter 107 and the second flowmeter 109 indicating that the volume ratio of the mixed substance and the to-be-mixed substance flowing into the mixing chamber 103 approaches the specific ratio to reach the preset ratio, the opening of the first controllable valve 106 and the second controllable valve 108 is adjusted.

[0081] like Figure 8 As shown, a flow chart of a flow control method in another embodiment of the present disclosure is shown. Figure 8 The method in the embodiment can be performed by Figure 4 The second control unit 125 in is executed.

[0082] exist Figure 8 The methods include:

[0083] Step S801: obtaining the liquid level information and pressure information detected by the liquid level sensor 123 and the pressure sensor 124 respectively;

[0084] Step S802: Using a liquid pressure algorithm, determine the density and volume of the mixed liquid according to the liquid level information and the pressure information; and using a mass density formula, determine the volume ratio of the mixed liquid to the mixed liquid in the mixing chamber 103 according to the density and volume of the mixed liquid, the density of the mixed liquid and the density of the mixed liquid, so as to control the opening of the first controllable valve 106 and the second controllable valve 108 so that the volume ratio approaches the specific ratio to reach a preset ratio.

[0085] It should be particularly noted that the process or method represented by the flowchart of the above embodiment of the present disclosure can be understood as representing a module, fragment or part of a code including one or more sets of executable instructions configured to implement the steps of a specific logical function or process. And the scope of the preferred embodiment of the present disclosure includes other implementations, in which the functions may not be performed in the order shown or discussed, including performing the functions in a substantially simultaneous manner or in a reverse order according to the functions involved.

[0086] For example, Figures 7 and 8 The order of the steps in the method embodiment may be changed in a specific scenario and is not limited to the above.

[0087] like Fig. 9 , which shows a schematic diagram of the structure of a computer device in an embodiment of the present disclosure. The first control unit 121 and the second control unit 125 in the previous embodiments can be implemented based on the computer device in this embodiment.

[0088] The computer device 900 includes a bus 901, a processor 902, and a memory 903. The processor 902 and the memory 903 can communicate with each other through the bus 901. The memory 903 may store program instructions. The processor 902 implements the functions or methods of the control unit in the previous embodiment by running the program instructions in the memory 903, for example Figure 7 and Figure 8 Steps in any method.

[0089] The bus 901 may be a Peripheral Component Interconnect (PCI) bus or an Extended Industry Standard Architecture (EISA) bus, etc. The bus may be divided into an address bus, a data bus, a control bus, etc. For ease of representation, although only one thick line is used in the figure, it does not mean that there is only one bus or one type of bus.

[0090] In some embodiments, the processor 902 may be implemented as a central processing unit (CPU), a microprocessing unit (MCU), a system on chip (System On Chip), or a field programmable logic array (FPGA). The memory 903 may include a volatile memory (Volatile Memory) for temporary storage of data when running a program, such as a random access memory (Random Access Memory, RAM).

[0091] The memory 903 may also include a non-volatile memory (non-volatile memory) for data storage, such as a read-only memory (ROM), a flash memory, a hard disk drive (HDD), or a solid-state disk (SSD).

[0092] In some embodiments, the computer device 900 may further include a communicator 904. The communicator 904 is used to communicate with the outside. In a specific example, the communicator 904 may include one or a group of wired and / or wireless communication circuit modules. For example, the communicator 904 may include one or more of a wired network card, a USB module, a serial interface module, etc. The wireless communication protocols followed by the wireless communication module include: for example, near field communication (NFC) technology, infrared (IR) technology, Global System for Mobile communications (GSM), General Packet Radio Service (GPRS), Code Division Multiple Access (CDMA), Wideband Code Division Multiple Access (WCDMA), Time-Division Code Division Multiple Access (TD-SCDMA), Long Term Evolution (LTE), Bluetooth (BT), Global Navigation Satellite System (GNSS), etc. One or more.

[0093] In an embodiment of the present disclosure, a computer-readable storage medium may also be provided, storing program instructions, which are executed to implement the functions or methods of the control unit in the previous embodiment, such as Figure 7 and Figure 8 Steps in any method.

[0094] That is, the method steps in the above embodiments are implemented as software or computer code that can be stored in a recording medium (such as a CD ROM, RAM, floppy disk, hard disk or magneto-optical disk), or are implemented as computer code originally stored in a remote recording medium or a non-temporary machine-readable medium downloaded via a network and to be stored in a local recording medium, so that the method represented herein can be stored in such software processing on a recording medium using a general-purpose computer, a dedicated processor, or programmable or dedicated hardware (such as an ASIC or FPGA).

[0095] In summary, the present disclosure relates to the field of plasma processing technology, and provides an air intake system for plasma processing equipment, including: a first input pipeline and a second input pipeline, for inputting liquid mixed material and to-be-mixed material; a mixing chamber, for mixing the mixed material and to-be-mixed material into an azeotrope and outputting it; wherein the boiling point of the mixed liquid is lower than the boiling point of the mixed material, and can form an azeotrope; a heater, corresponding to the mixing chamber, heats the azeotrope in the mixing chamber to boiling to form a mixed steam; a separation unit, for separating the mixed material steam and the to-be-mixed material in the mixed steam, and outputting the mixed material steam to the reaction chamber of the plasma processing equipment through the first air intake pipeline. Therefore, through the scheme disclosed in the present disclosure, it is only necessary to heat to a heating temperature that meets the reduced boiling point, which greatly reduces the temperature compared to the high temperature heating in the related art, saving energy and reducing consumption.

[0096] The above embodiments are merely illustrative of the principles and effects of the present disclosure, and are not intended to limit the present disclosure. Anyone familiar with the technology may modify or change the above embodiments without violating the spirit and scope of the present disclosure. Therefore, all equivalent modifications or changes made by those with ordinary knowledge in the technical field without departing from the spirit and technical ideas disclosed in the present disclosure shall still be covered by the protection scope of the present disclosure.

Claims

1. An air intake system for a plasma processing device, characterized in that: include: A first input pipeline having a first input port for inputting a liquid mixture; A second input pipeline having a second input port for inputting a liquid mixture; a mixing chamber, connected to the first input pipeline and the second input pipeline in an on / off manner, for mixing the mixture and the to-be-mixed material into a mixed liquid; wherein the boiling point of the mixed liquid is lower than the boiling point of the mixture, and when the ratio of the mixture and the to-be-mixed material meets a specific ratio, the mixed liquid can become an azeotrope with a common boiling point; A heater is provided corresponding to the mixing chamber and heats the mixed liquid in the mixing chamber to boiling to form mixed steam; A separation unit, whose pipeline is connected to the mixing chamber, is used to separate the mixed steam and the to-be-mixed mixture in the mixed steam, and output the mixed steam to the reaction chamber of the plasma processing equipment through the first air inlet pipeline.

2. The air intake system according to claim 1, characterized in that: The separation unit is connected to a recovery pipeline, and the recovery pipeline can be connected to the second input pipeline in an on / off manner to output the mixture to be mixed to the second input pipeline for recycling.

3. The air intake system according to claim 1 or 2, characterized in that: include: A first controllable valve and a first flow meter are provided in the first input pipeline; A second controllable valve and a second flow meter are provided in the second input pipeline; A first control unit is communicatively connected to the first controllable valve and the second controllable valve, and is used to adjust the opening of the first controllable valve and the second controllable valve when the second input pipeline does not input the mixed material recovered from the separation unit, based on the flow information monitored by the first flow meter and the second flow meter to indicate that the volume ratio of the mixed material and the mixed material flowing into the mixing chamber approaches the specific ratio to reach a preset ratio.

4. The air intake system according to claim 1 or 2, characterized in that: include: A liquid level sensor and a pressure sensor are arranged in the mixing chamber and are used to detect liquid level information and pressure information respectively; A first controllable valve, disposed in the first input pipeline; A second controllable valve, disposed in the second input pipeline; A second control unit is communicatively connected to the liquid level sensor, the pressure sensor, the first controllable valve and the second controllable valve, and is used to use a liquid pressure algorithm to determine the density and volume of the mixed liquid according to the liquid level information and the pressure information; and use a mass density formula to determine the volume ratio of the mixed material to the mixed material in the mixing chamber according to the density and volume of the mixed liquid, the density of the mixed material and the density of the mixed material, so as to control the opening of the first controllable valve and the second controllable valve so that the volume ratio approaches the specific ratio to reach a preset ratio.

5. The air intake system according to claim 2, characterized in that: The recovery pipeline is provided with a third controllable valve, a recovery buffer and at least one one-way valve; and / or the recovery pipeline passes through a separation and purification device for purifying the mixed material and removing the mixed material.

6. The air intake system according to claim 1, characterized in that: The separation unit includes a semipermeable membrane; and / or the reaction chamber is connected to a vacuum device for setting a gas pressure environment of the reaction chamber to meet a preset pressure condition, and the preset pressure condition includes: a pressure condition that makes the mixture in the reaction chamber in a gaseous state.

7. The air intake system according to claim 1, characterized in that: The azeotrope has a azeotropic point in the range of 30°C to 40°C, 40°C to 50°C, 50°C to 60°C, 60°C to 70°C or 70°C to 80°C.

8. The air intake system according to claim 1 or 7, characterized in that: The mixture is composed of esters, ethers or ketones determined based on one or more of the objectives of lower azeotropic point, lower material toxicity and lower preparation difficulty / cost; and / or, the mixture includes water, and the mixture is selected from at least one of the following: diethyl ether, ethyl acetate, ethanol.

9. The air intake system according to claim 1, characterized in that: A fourth controllable valve, a pressure regulating valve and a mass flow controller are also arranged in the pipeline between the mixing chamber and the separation unit.

10. The air intake system according to claim 1, characterized in that: Also includes: At least one reaction gas input pipeline is connected to the reaction chamber and is used for inputting reaction gas.

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