Preparation method of band-gap-adjustable photo-thermal-electric-thermal anti-icing and deicing coating

Abstract

The invention discloses a preparation method of a band-gap-adjustable photo-thermal-electric-thermal anti-icing and deicing coating, and belongs to the field of preparation of anti-icing coatings. The invention aims to solve the problems of low thermal efficiency, high energy consumption and complex preparation technology of the traditional anti-icing coating. The method comprises the following steps: 1, preparing titanium-doped cubic boron phosphide; 2, preparing a photo-thermal electric heating anti-icing and deicing coating solution; and 3, preparing the band-gap-adjustable photo-thermal-electric-thermal anti-icing and deicing coating. The added titanium-doped cubic boron phosphide can narrow a band gap, can absorb photons with lower energy, has high photothermal conversion efficiency, and has a synergistic effect with graphene to improve stability and optimize photothermal response; the polydimethylsiloxane and the tetramethyldisiloxane can form a micro-nano multilayer structure on the surfaces of the conductive carbon black and the graphene, so that the air capturing capability is improved, and the hydrophobic capability of the coating is improved; dimethyl biphenyl diisocyanate and carboxymethyl cellulose generate carbamate bonds and amido bonds, so that the wear resistance of the coating can be improved.

Description

Technical Field

[0001] The present invention belongs to the field of anti-icing coating preparation, and specifically relates to a method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable band gap. Background Art

[0002] During the operation of electrical equipment, once it encounters ice cover, it will inevitably cause a series of mechanical failures, and in severe cases may even cause large-scale power outages. With the increasing expansion of power grid construction, more and more electrical equipment is deployed in areas with harsh environments such as mountains and canyons. The icing of electrical equipment has become a problem that cannot be ignored. However, traditional deicing methods, including mechanical deicing methods, generally have the problem of low efficiency, heating methods are accompanied by significant energy consumption, and chemical treatment methods have the risk of secondary pollution to the environment. Therefore, an effective and energy-saving material should be developed to solve the icing problem. In recent years, researchers have been continuously committed to the design and preparation of biomimetic functional surfaces for passive anti-icing applications, such as superhydrophobic surfaces (SHSs), liquid-infused smooth porous surfaces (SLISS), electrolyte brushes, low elastic modulus surfaces, and low interface toughness surfaces. Among them, SHSs and SLIP surfaces have become research hotspots due to their excellent performance. The reason why SHSs can be used as effective anti-icing / deicing materials is due to their ability to capture cavitation at the micro-nano scale. These air pockets can significantly reduce the actual contact area between water droplets and the surface and the heat transfer rate, thereby promoting the rapid removal of water droplets and reducing ice adhesion. However, in environments with high humidity and extreme freezing conditions, it is difficult to ensure long-term effective anti-icing / de-icing performance.

[0003] Therefore, combining passive anti-icing materials with active photothermal and electrothermal deicing materials is considered to be a feasible method. This new method combines the advantages of passive anti-icing materials and active deicing materials. It can melt ice through the photothermal effect under sunlight, and form a stable water film on the coating surface through an external electric field force in rainy days or at night. It can easily fall off under the action of gravity or a slight natural wind, thereby achieving the anti-icing / de-icing performance of electrical equipment. However, current research shows that the realization of multi-functions usually relies on complex preparation technology, and there are problems of high energy consumption and low thermal efficiency, which limit their practical application. Therefore, it is crucial to develop anti-icing and deicing coatings with both high photothermal conversion efficiency and superhydrophobic properties.

[0004] The present invention aims to solve the problems of low thermal efficiency, high energy consumption and complex preparation technology of current anti-icing materials. It combines active and passive anti-icing strategies to construct a photothermal and electrothermal anti-icing and deicing coating with adjustable band gap and micro-nano multi-layer structure. Summary of the invention

[0005] The purpose of the present invention is to solve the problems of low thermal efficiency, high energy consumption and complex preparation technology of traditional anti-icing coatings, and to provide a method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable band gap.

[0006] A method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap is specifically completed in the following steps:

[0007] 1. Preparation of titanium-doped cubic boron phosphide:

[0008] ① Start the chemical vapor deposition system and evacuate to a vacuum degree of 1×10 -3 Pa, hydrogen is introduced into the chemical vapor deposition system as a carrier gas, the temperature of the reaction chamber is controlled to be 900°C to 1100°C, and then phosphine and boron tribromide are introduced and deposited for a period of time to obtain cubic boron phosphide;

[0009] ②, heating to 1200℃~1250℃, mixing TiCl4 and cubic boron phosphide evenly, reacting at 1200℃~1250℃ for a period of time, after the reaction is completed, stopping the introduction of hydrogen, and naturally cooling to room temperature to obtain cubic boron phosphide-titanium;

[0010] ③, transfer the cubic boron phosphide-titanium to an annealing furnace, keep it at 700℃~800℃ for a period of time, and then cool it to room temperature to obtain titanium-doped cubic boron phosphide;

[0011] 2. Preparation of photothermal and electrothermal anti-icing and deicing coating solution:

[0012] ① Dissolve conductive carbon black and graphene in distilled water and ultrasonicate for a period of time to obtain a coating slurry;

[0013] ②, heating the coating slurry in a water bath for a period of time, then adding titanium-doped cubic boron phosphide, stirring and reacting for a period of time, adding polydimethylsiloxane, magnetically stirring and reacting for a period of time, adding tetramethyldisiloxane, magnetically stirring and reacting for a period of time, then adding carboxymethyl cellulose aqueous solution, magnetically stirring for a period of time, and finally adding dimethylbiphenyl diisocyanate, magnetically stirring for a period of time, to obtain a photothermal and electrothermal anti-icing and deicing coating solution;

[0014] 3. Preparation of photothermal and electrothermal anti-icing and deicing coatings with adjustable band gap:

[0015] The photothermal and electrothermal anti-icing and deicing coating solution is coated on an aluminum substrate using a coating machine, and then placed in an oven to dry for a period of time to obtain a photothermal and electrothermal anti-icing and deicing coating with adjustable band gap on the aluminum substrate.

[0016] The main principles of the present invention:

[0017] The titanium-doped cubic boron phosphide added in the present invention can narrow the band gap, absorb photons with lower energy, and has high photothermal conversion efficiency. Doping with titanium can also improve the electrothermal effect; it works synergistically with graphene to improve stability and optimize photothermal response; adding dimethyl diphenyl diisocyanate and carboxymethyl cellulose to generate carbamate bonds and amide bonds helps to improve the wear resistance of the coating; polydimethylsiloxane and tetramethyl disiloxane can form a micro-nano multilayer structure on the surface of conductive carbon black and graphene, which can increase the surface roughness; thereby providing an excellent hydrophobic coating with photothermal and electrothermal effects, which can make full use of solar energy and electrical energy to heat the coating for deicing, thereby enhancing the anti-icing / deicing efficiency of the coating.

[0018] Beneficial effects of the present invention:

[0019] 1. The titanium-doped cubic boron phosphide added in the present invention can narrow the band gap, absorb photons with lower energy, and have high photothermal conversion efficiency. Doping with titanium can also improve the electrothermal effect and work synergistically with graphene to improve stability and optimize photothermal response.

[0020] 2. Polydimethylsiloxane and tetramethyldisiloxane can form a micro-nano multilayer structure on the surface of conductive carbon black and graphene, which can increase the surface roughness and improve the ability to capture air, thereby improving the hydrophobicity of the coating;

[0021] 3. The urethane bonds and amide bonds generated by dimethyl biphenyl diisocyanate and carboxymethyl cellulose help to improve the wear resistance and environmental adaptability of the coating;

[0022] 4. In view of the problems of high energy consumption and low efficiency of traditional anti-icing coatings, the present invention adopts a photothermal, electrothermal and super-hydrophobic collaborative anti-icing / de-icing method, which can make full use of solar energy and electrical energy to achieve efficient anti-icing / de-icing. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 This is a scanning electron microscope image of the photothermal and electrothermal anti-icing and deicing coating with adjustable band gap prepared in Example 1;

[0024] Figure 2 This is a water contact angle diagram of the photothermal and electrothermal anti-icing and deicing coating with adjustable band gap prepared in Example 1;

[0025] Figure 3 This is a light absorptivity diagram of the photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap prepared in Example 1;

[0026] Figure 4 This is an infrared thermal imaging image of the photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap prepared in Example 1 at -20°C;

[0027] Figure 5This is an infrared thermal image of the photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap prepared in Example 1 after being irradiated by a 300W xenon lamp for 8 minutes at -20°C.

[0028] Figure 6 This is a graph showing the change in water contact angle of the photothermal and electrothermal anti-icing and deicing coating with adjustable band gap prepared in Example 1 after multiple tape stripping;

[0029] Figure 7 The bandgap adjustable photothermal and electrothermal anti-icing and deicing coating prepared in Example 1 and the coating prepared in Comparative Example 4 are 1 W / cm 2 Surface temperature curve under +1V voltage. DETAILED DESCRIPTION

[0030] Specific implementation method 1: This implementation method is a method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap, which is specifically completed in the following steps:

[0031] 1. Preparation of titanium-doped cubic boron phosphide:

[0032] ① Start the chemical vapor deposition system and evacuate to a vacuum degree of 1×10 -3 Pa, hydrogen is introduced into the chemical vapor deposition system as a carrier gas, the temperature of the reaction chamber is controlled to be 900°C to 1100°C, and then phosphine and boron tribromide are introduced and deposited for a period of time to obtain cubic boron phosphide;

[0033] ②, heating to 1200℃~1250℃, mixing TiCl4 and cubic boron phosphide evenly, reacting at 1200℃~1250℃ for a period of time, after the reaction is completed, stopping the introduction of hydrogen, and naturally cooling to room temperature to obtain cubic boron phosphide-titanium;

[0034] ③, transfer the cubic boron phosphide-titanium to an annealing furnace, keep it at 700℃~800℃ for a period of time, and then cool it to room temperature to obtain titanium-doped cubic boron phosphide;

[0035] 2. Preparation of photothermal and electrothermal anti-icing and deicing coating solution:

[0036] ① Dissolve conductive carbon black and graphene in distilled water and ultrasonicate for a period of time to obtain a coating slurry;

[0037] ②, heating the coating slurry in a water bath for a period of time, then adding titanium-doped cubic boron phosphide, stirring and reacting for a period of time, adding polydimethylsiloxane, magnetically stirring and reacting for a period of time, adding tetramethyldisiloxane, magnetically stirring and reacting for a period of time, then adding carboxymethyl cellulose aqueous solution, magnetically stirring for a period of time, and finally adding dimethylbiphenyl diisocyanate, magnetically stirring for a period of time, to obtain a photothermal and electrothermal anti-icing and deicing coating solution;

[0038] 3. Preparation of photothermal and electrothermal anti-icing and deicing coatings with adjustable band gap:

[0039] The photothermal and electrothermal anti-icing and deicing coating solution is coated on an aluminum substrate using a coating machine, and then placed in an oven to dry for a period of time to obtain a photothermal and electrothermal anti-icing and deicing coating with adjustable band gap on the aluminum substrate.

[0040] Specific implementation method 2: This implementation method is different from specific implementation method 1 in that: the gas flow rate of hydrogen described in step 1① is 500mL / min; the volume flow rate of phosphine described in step 1① is 50mL / min. The other steps are the same as those in specific implementation method 1.

[0041] Specific implementation method 3: This implementation method is different from specific implementation method 1 or 2 in that: the volume flow rate of boron tribromide in step 1① is 5 mL / min; the deposition time in step 1① is 40 min to 60 min. The other steps are the same as specific implementation method 1 or 2.

[0042] Specific embodiment 4: This embodiment differs from specific embodiments 1 to 3 in that: the reaction time at 1200°C to 1250°C in step 1② is 0.5h to 1h; the mass ratio of TiCl4 to cubic boron phosphide in step 1② is 1:(9 to 10). The other steps are the same as those of specific embodiments 1 to 3.

[0043] Specific embodiment 5: This embodiment differs from specific embodiments 1 to 4 in that: the time of maintaining at 700°C to 800°C in step 1 ③ is 1h to 1.5h; the mass ratio of the conductive carbon black to the graphene in step 2 ① is (1.5 to 2): 1. The other steps are the same as those in specific embodiments 1 to 4.

[0044] Specific implementation method 6: This implementation method is different from specific implementation methods 1 to 5 in that the ultrasonic time in step 2① is 30min to 40min, and the mass fraction of the coating slurry in step 2① is 20% to 25%. The other steps are the same as those in specific implementation methods 1 to 5.

[0045] Specific embodiment 7: The difference between this embodiment and specific embodiments 1 to 6 is that the mass ratio of titanium-doped cubic boron phosphide, polydimethylsiloxane and tetramethyldisiloxane described in step 2② is (3-5): (2-3): (0.5-1.5); the mass ratio of titanium-doped cubic boron phosphide, carboxymethyl cellulose aqueous solution and dimethylbiphenyl diisocyanate described in step 2② is (3-5): (4-6): (7-9). The other steps are the same as specific embodiments 1 to 6.

[0046] Specific embodiment 8: This embodiment differs from specific embodiments 1 to 7 in that: the water bath heating temperature in step 2② is 65℃~70℃, and the water bath heating time is 20min~30min; the mass ratio of the titanium-doped cubic boron phosphide in step 2② to the volume ratio of the coating slurry is (3g~5g):(60mL~100mL). The other steps are the same as specific embodiments 1 to 7.

[0047] Specific embodiment 9: This embodiment differs from specific embodiments 1 to 8 in that: the speed of the magnetic stirring reaction in step 2 ② is 500 rpm to 1000 rpm, and the time is 10 min to 60 min; the mass fraction of the carboxymethyl cellulose aqueous solution in step 2 ② is 10% to 15%. The other steps are the same as those in specific embodiments 1 to 8.

[0048] Specific embodiment 10: This embodiment differs from specific embodiments 1 to 9 in that: the aluminum substrate described in step 3 is an aluminum sheet; the drying temperature described in step 3 is 60°C to 70°C, and the drying time is 2h to 3h; the thickness of the photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap described in step 3 is 0.3mm to 0.5mm. The other steps are the same as specific embodiments 1 to 9.

[0049] The following examples are used to verify the beneficial effects of the present invention:

[0050] Example 1: A method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap, which is specifically completed in the following steps:

[0051] 1. Preparation of titanium-doped cubic boron phosphide:

[0052] ① Start the chemical vapor deposition system and evacuate to a vacuum degree of 1×10 -3 Pa, hydrogen was introduced into the chemical vapor deposition system as a carrier gas, the temperature of the reaction chamber was controlled to be 1000°C, and then phosphine and boron tribromide were introduced and deposited for 40 minutes to obtain cubic boron phosphide;

[0053] The gas flow rate of hydrogen described in step 1① is 500mL / min;

[0054] The volume flow rate of phosphine described in step 1① is 50mL / min;

[0055] The volume flow rate of boron tribromide described in step 1① is 5 mL / min;

[0056] ②, heat to 1200℃, mix 4g TiCl4 and 40g cubic boron phosphide evenly, react at 1200℃ for 0.5h, after the reaction is completed, stop introducing hydrogen, cool naturally to room temperature, and obtain cubic boron phosphide-titanium;

[0057] ③, transfer the cubic boron phosphide-titanium to an annealing furnace, keep it at 800°C for 1 hour, and then cool it to room temperature to obtain titanium-doped cubic boron phosphide;

[0058] 2. Preparation of photothermal and electrothermal anti-icing and deicing coating solution:

[0059] ① Dissolve conductive carbon black and graphene in distilled water and ultrasonicate for 30 minutes to obtain a coating slurry;

[0060] The mass ratio of the conductive carbon black and graphene described in step 2① is 2:1;

[0061] The mass fraction of the coating slurry described in step 2① is 20%;

[0062] ②, heat the coating slurry in a water bath at 65°C for 20 minutes, add 4g of titanium-doped cubic boron phosphide, react with magnetic stirring at 600rpm for 10min, add 2.5g of polydimethylsiloxane, react with magnetic stirring at 600rpm for 10min, add 1g of tetramethyldisiloxane, react with magnetic stirring at 600rpm for 10min, add 5g of carboxymethyl cellulose aqueous solution, react with magnetic stirring at 500rpm for 1h, finally add 8g of dimethylbiphenyl diisocyanate, react with magnetic stirring at 600rpm for 30min, and obtain a photothermal and electrothermal anti-icing and deicing coating solution;

[0063] The mass ratio of the titanium-doped cubic boron phosphide described in step 2② to the volume ratio of the coating slurry is 4g:80mL;

[0064] The mass fraction of the carboxymethyl cellulose aqueous solution described in step 2② is 10%;

[0065] 3. Preparation of photothermal and electrothermal anti-icing and deicing coatings with adjustable band gap:

[0066] The photothermal and electrothermal anti-icing and deicing coating solution was coated on the aluminum substrate by using a coating machine, and then placed in an oven at a temperature of 60°C for drying for 2 hours, thereby obtaining a photothermal and electrothermal anti-icing and deicing coating with adjustable band gap on the aluminum substrate;

[0067] The aluminum substrate described in step 3 is a smooth aluminum sheet;

[0068] The thickness of the bandgap adjustable photothermal and electrothermal anti-icing and deicing coating described in step three is 0.3 mm.

[0069] Comparative Example 1: The difference between this example and Example 1 is that the addition of 8 g of dimethylbiphenyl diisocyanate is omitted in step 2②. The other steps and parameters are the same as those in Example 1.

[0070] Wear resistance test: After 15 tape peeling cycles, the water contact angle of the coating prepared in Comparative Example 1 dropped to 122°±1°.

[0071] Comparative Example 2: The difference between this example and Example 1 is that the addition of 5 g of carboxymethyl cellulose aqueous solution is omitted in step 2②. The other steps and parameters are the same as those in Example 1.

[0072] Abrasion resistance test: After 15 tape peeling cycles, the water contact angle of the coating prepared in Comparative Example 2 dropped to 131±1°.

[0073] Comparative Example 3: The difference between this embodiment and embodiment 1 is that the mass ratio of the conductive carbon black and graphene in step 2① is 1:1. The other steps and parameters are the same as those in embodiment 1.

[0074] The water contact angle of the coating prepared in Comparative Example 3 is 140±1°.

[0075] Comparative Example 4: The difference between this embodiment and embodiment 1 is that the mass ratio of the conductive carbon black and graphene in step 2① is 3:1. The other steps and parameters are the same as those in embodiment 1.

[0076] The water contact angle of the coating prepared in Comparative Example 4 is 149±1°.

[0077] Comparative Example 5: The difference between this example and Example 1 is that the amount of polydimethylsiloxane used in step 2① is 1.5 g. The other steps and parameters are the same as those in Example 1.

[0078] The water contact angle of the coating prepared in Comparative Example 5 is 142±1°

[0079] Figure 1 This is a scanning electron microscope image of the photothermal and electrothermal anti-icing and deicing coating with adjustable band gap prepared in Example 1;

[0080] from Figure 1 It can be seen that the bandgap-adjustable photothermal and electrothermal anti-icing and deicing coating has a multi-layer micro-nano structure, which can better capture air, significantly reduce the adhesion of the ice layer, and is beneficial to improving the water contact angle of the coating.

[0081] Figure 2 This is a water contact angle diagram of the photothermal and electrothermal anti-icing and deicing coating with adjustable band gap prepared in Example 1;

[0082] from Figure 2 It can be seen that the water contact angle of the bandgap adjustable photothermal and electrothermal anti-icing and deicing coating is 150°, indicating that the coating has low ice adhesion and excellent anti-icing ability.

[0083] Figure 3This is a light absorptivity diagram of the photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap prepared in Example 1;

[0084] from Figure 3 It can be seen that the light absorption rate of the bandgap adjustable photothermal and electrothermal anti-icing and deicing coating is as high as 98%. The coating exhibits excellent light absorption ability and shows excellent photothermal performance in the anti-icing and deicing coating.

[0085] Figure 4 This is an infrared thermal imaging image of the photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap prepared in Example 1 at -20°C;

[0086] from Figure 4 It can be seen that the surface temperature of the bandgap adjustable photothermal and electrothermal anti-icing and deicing coating is -19.3℃ at -20℃ without applying light energy and electrical energy.

[0087] Figure 5 This is an infrared thermal image of the photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap prepared in Example 1 after being irradiated by a 300W xenon lamp for 8 minutes at -20°C.

[0088] from Figure 5 It can be seen that: under a -20℃ environment, after irradiation with a 300W xenon lamp for 8 minutes, the surface temperature of the bandgap adjustable photothermal and electrothermal anti-icing and deicing coating reaches 17.5℃, which is above the freezing point, indicating that the coating has excellent photothermal anti-icing and deicing performance.

[0089] Figure 6 This is a graph showing the change in water contact angle of the photothermal and electrothermal anti-icing and deicing coating with adjustable band gap prepared in Example 1 after multiple tape stripping;

[0090] from Figure 6 It can be seen that: the coating was subjected to 15 tape stripping tests, and the water contact angle of the coating was measured using a contact angle meter after each three strippings. The water contact angle remained basically unchanged, indicating that the photothermal and electrothermal anti-icing and deicing coating with adjustable band gap has good wear resistance.

[0091] Figure 7 The bandgap adjustable photothermal and electrothermal anti-icing and deicing coating prepared in Example 1 and the coating prepared in Comparative Example 4 are 1 W / cm 2 Surface temperature curve under +1V voltage.

[0092] Figure 7 Note: At 1W / cm 2 Under +1V voltage, when the mass ratio of conductive carbon black and graphene is 2:1, the maximum surface temperature is 40℃, compared with 36℃ at 3:1. The coating surface can reach a higher temperature and has more significant anti-icing and de-icing performance.

Claims

1. A method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap, characterized in that The preparation method is specifically completed according to the following steps:

1. Preparation of titanium-doped cubic boron phosphide: ① Start the chemical vapor deposition system and evacuate to a vacuum degree of 1×10 -3 Pa, hydrogen is introduced into the chemical vapor deposition system as a carrier gas, the temperature of the reaction chamber is controlled to be 900°C to 1100°C, and then phosphine and boron tribromide are introduced and deposited for a period of time to obtain cubic boron phosphide; ②, heating to 1200℃~1250℃, mixing TiCl4 and cubic boron phosphide evenly, reacting at 1200℃~1250℃ for a period of time, after the reaction is completed, stopping the introduction of hydrogen, and naturally cooling to room temperature to obtain cubic boron phosphide-titanium; ③, transfer the cubic boron phosphide-titanium to an annealing furnace, keep it at 700℃~800℃ for a period of time, and then cool it to room temperature to obtain titanium-doped cubic boron phosphide; 2. Preparation of photothermal and electrothermal anti-icing and deicing coating solution: ① Dissolve conductive carbon black and graphene in distilled water and ultrasonicate for a period of time to obtain a coating slurry; ②, heating the coating slurry in a water bath for a period of time, then adding titanium-doped cubic boron phosphide, stirring and reacting for a period of time, adding polydimethylsiloxane, magnetically stirring and reacting for a period of time, adding tetramethyldisiloxane, magnetically stirring and reacting for a period of time, then adding carboxymethyl cellulose aqueous solution, magnetically stirring for a period of time, and finally adding dimethylbiphenyl diisocyanate, magnetically stirring for a period of time, to obtain a photothermal and electrothermal anti-icing and deicing coating solution; 3. Preparation of photothermal and electrothermal anti-icing and deicing coatings with adjustable band gap: The photothermal and electrothermal anti-icing and deicing coating solution is coated on an aluminum substrate using a coating machine, and then placed in an oven to dry for a period of time to obtain a photothermal and electrothermal anti-icing and deicing coating with adjustable band gap on the aluminum substrate.

2. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The gas flow rate of hydrogen described in step 1① is 500mL / min; the volume flow rate of phosphine described in step 1① is 50mL / min.

3. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The volume flow rate of boron tribromide described in step 1① is 5 mL / min; the deposition time described in step 1① is 40 min to 60 min.

4. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The reaction time at 1200°C to 1250°C in step 1② is 0.5h to 1h; the mass ratio of TiCl4 to cubic boron phosphide in step 1② is 1:(9 to 10).

5. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The time of maintaining at 700°C to 800°C in step 1③ is 1h to 1.5h; the mass ratio of the conductive carbon black and graphene described in step 2① is (1.5 to 2):

1.

6. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The ultrasonic time described in step 2① is 30min to 40min; the mass fraction of the coating slurry described in step 2① is 20% to 25%.

7. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The mass ratio of titanium-doped cubic boron phosphide, polydimethylsiloxane and tetramethyldisiloxane described in step 2② is (3-5):(2-3):(0.5-1.5); the mass ratio of titanium-doped cubic boron phosphide, carboxymethyl cellulose aqueous solution and dimethylbiphenyl diisocyanate described in step 2② is (3-5):(4-6):(7-9).

8. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The water bath heating temperature described in step 2② is 65℃~70℃, and the water bath heating time is 20min~30min; the volume ratio of the mass of titanium-doped cubic boron phosphide described in step 2② to the coating slurry is (3g~5g):(60mL~100mL).

9. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The speed of the magnetic stirring reaction in step 2② is 500rpm~1000rpm, and the time is 10min~60min; The mass fraction of the carboxymethyl cellulose aqueous solution in step 2② is 10%~15%.

10. The method for preparing a photothermal and electrothermal anti-icing and deicing coating with adjustable bandgap according to claim 1, characterized in that The aluminum substrate described in step three is an aluminum sheet; the drying temperature described in step three is 60°C to 70°C, and the drying time is 2h to 3h; the thickness of the bandgap adjustable photothermal and electrothermal anti-icing and deicing coating described in step three is 0.3mm to 0.5mm.

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