Growth source pipeline system and epitaxial growth equipment

Abstract

The invention discloses a growth source pipeline system and epitaxial growth equipment. The growth source pipeline system comprises a carrier gas supply pipe, a discharge pipe, a plurality of growth source conveying pipes and a plurality of growth source gas supply pipes, one end of the discharge pipe is connected with the carrier gas supply pipe, and a discharge port is formed in the other end of the discharge pipe; one end of each growth source conveying pipe is connected with the carrier gas supply pipe, and the other end of each growth source conveying pipe is used for being connected with the reaction cavity; the growth source air supply pipes and the growth source conveying pipes are the same in number and are in one-to-one correspondence, each growth source air supply pipe is connected with the corresponding growth source conveying pipe, and each growth source air supply pipe is connected with the same discharge pipe. According to the growth source pipeline system disclosed by the embodiment of the invention, each growth source air supply pipe is connected with the same discharge pipe, so that the number of pipelines is reduced, the pipeline arrangement is simpler, the occupied space of the growth source pipeline system is smaller, and the space is saved; and moreover, the use amount of carrier gas can be reduced, and the cost is reduced.

Description

Technical Field

[0001] The invention relates to the field of epitaxial growth manufacturing, and in particular to a growth source pipeline system and epitaxial growth equipment. Background Art

[0002] Before the growth source is introduced into the epitaxial growth reaction device, it is usually necessary to ensure that the flow rate of the growth source is stable so that the epitaxial layer grows uniformly. In the related art, the growth source pipeline system used for the epitaxial growth device usually corresponds each growth source delivery pipe to a discharge pipe. Before the growth source is introduced into the growth source delivery pipe, it is first introduced into the corresponding discharge pipe. After the growth source flow rate is stable, the valve is switched to introduce the growth source into the growth source delivery pipe.

[0003] Generally, the growth of thin films requires the reaction of multiple growth source gases. The growth source pipeline system needs to include multiple growth source delivery pipes to deliver multiple growth source gases respectively. Each growth source gas is provided with a separate discharge pipe, resulting in a large number of pipelines and a complex pipeline system. In addition, each growth source delivery pipe and each discharge pipe need to be introduced with carrier gas. Due to the large number of pipelines, the amount of carrier gas used is large, resulting in a waste of carrier gas. Therefore, improvement is needed. Summary of the invention

[0004] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, one purpose of the present invention is to provide a growth source pipeline system, which includes a carrier gas supply pipe, an exhaust pipe and a plurality of growth source delivery pipes. By connecting each growth source supply pipe to the same exhaust pipe, the number of pipes is reduced, the pipe arrangement is simpler, the growth source pipeline system occupies a smaller space, and saves space; and by reducing the number of pipes, the use of carrier gas can be reduced, reducing costs.

[0005] The present invention also proposes an epitaxial growth device comprising the above growth source pipeline system.

[0006] A carrier gas supply pipe for conveying carrier gas; an exhaust pipe, one end of the exhaust pipe is connected to the carrier gas supply pipe, and the other end of the exhaust pipe is formed as an exhaust port; a plurality of growth source delivery pipes, one end of each of the growth source delivery pipes is connected to the carrier gas supply pipe, and the other end of each of the growth source delivery pipes is used to be connected to a reaction chamber; a plurality of growth source supply pipes, the plurality of growth source supply pipes are the same in number and correspond one to one to the plurality of growth source delivery pipes, each of the growth source supply pipes is connected to the corresponding growth source delivery pipe, and each of the growth source supply pipes is connected to the same exhaust pipe.

[0007] According to the embodiment of the present invention, the growth source pipeline system includes a carrier gas supply pipe, an exhaust pipe and multiple growth source delivery pipes. By connecting each growth source supply pipe to the same exhaust pipe, the number of pipelines is reduced, the pipeline arrangement is simpler, the growth source pipeline system occupies less space, and saves space; and by reducing the number of pipelines, the use of carrier gas can be reduced, thereby reducing costs.

[0008] According to some embodiments of the present invention, each of the growth source gas supply pipes includes a main gas supply pipe, a first gas supply branch pipe, a second gas supply branch pipe and a three-way valve, the three-way valve having an inlet, a first outlet and a second outlet, the main gas supply pipe is connected to the inlet, one end of the first gas supply branch pipe is connected to the first outlet, the other end of the first gas supply branch pipe is connected to the corresponding growth source delivery pipe, one end of the second gas supply branch pipe is connected to the second outlet, and the other end of the second gas supply branch pipe is connected to the discharge pipe.

[0009] According to some embodiments of the present invention, the three-way valve is a three-way diaphragm valve; and / or the gas supply main pipe of each growth source gas supply pipe is provided with a fourth mass flow controller, and the fourth mass flow controller is located on the upstream side of the corresponding three-way valve.

[0010] According to some embodiments of the present invention, each of the growth source delivery pipes is provided with a first mass flow controller, the connection position between the growth source gas supply pipe and the corresponding growth source delivery pipe is a delivery connection position, and in the flow direction of the gas in the growth source delivery pipe, the first mass flow controller is located at the upstream side of the delivery connection position;

[0011] The discharge pipe is provided with a second mass flow controller, and the connection position between the growth source gas supply pipe and the discharge pipe is the discharge connection position. In the flow direction of the gas in the discharge pipe, the second mass flow controller is located on the upstream side of all the discharge connection positions.

[0012] According to some embodiments of the present invention, each of the growth source delivery pipes is provided with a third mass flow controller, the connection position between the growth source gas supply pipe and the corresponding growth source delivery pipe is a delivery connection position, and in the flow direction of the gas in the growth source delivery pipe, the third mass flow controller is located on the downstream side of the delivery connection position; and / or each of the growth source gas supply pipes is provided with a fourth mass flow controller.

[0013] According to some embodiments of the present invention, each of the growth source delivery pipes is provided with a first pressure controller, the connection position between the growth source gas supply pipe and the corresponding growth source delivery pipe is a delivery connection position, and in the flow direction of the gas in the growth source delivery pipe, the first pressure controller is located at the downstream side of the delivery connection position;

[0014] The discharge pipe is provided with a second pressure controller, and the connection position between the growth source gas supply pipe and the discharge pipe is the discharge connection position. In the flow direction of the gas in the discharge pipe, the second pressure controller is located on the downstream side of all the discharge connection positions.

[0015] According to some embodiments of the present invention, each of the growth source delivery pipes is provided with a third mass flow controller, and in the flow direction of the gas in the growth source delivery pipe, the third mass flow controller is located on the downstream side of the pressure controller.

[0016] According to some embodiments of the present invention, the plurality of growth source delivery pipes are arranged along a first direction, the discharge pipe is located on one side of the plurality of growth source delivery pipes along the first direction, the growth source delivery pipe and the discharge pipe both extend along a second direction, the second direction intersects with the first direction, and the carrier gas delivery pipe and the reaction chamber are located on both sides of the growth source delivery pipe along the second direction.

[0017] According to some embodiments of the present invention, a plurality of the growth source gas supply pipes are arranged along the second direction.

[0018] The epitaxial growth equipment according to the second embodiment of the present invention includes: the growth source pipeline system according to the first embodiment of the present invention.

[0019] According to the epitaxial growth equipment of the embodiment of the present invention, by including the growth source pipeline system according to the embodiment of the first aspect of the present invention, the number of pipelines of the growth source pipeline system is reduced, the pipeline system is simpler, and space is saved; and the use of carrier gas can be reduced to reduce costs.

[0020] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0022] Figure 1 is a schematic diagram of a growth source piping system according to some embodiments of the present invention;

[0023] Figure 2 It is a schematic diagram of the growth source piping system in the traditional technology.

[0024] Reference numerals:

[0025] 100. Growth source pipeline system;

[0026] 10. Carrier gas supply pipe;

[0027] 20. discharge pipe; 21. discharge port; 22. discharge connection position; 23. second mass flow controller; 24. second pressure controller;

[0028] 30. Growth source delivery pipe; 31. Delivery connection position; 32. First mass flow controller; 33. Third mass flow controller; 34. First pressure controller;

[0029] 40. Growth source gas supply pipe; 41. Gas supply main pipe; 42. First gas supply branch pipe; 43. Second gas supply branch pipe; 44. Fourth mass flow controller;

[0030] 50, three-way valve; 51, inlet; 52, first outlet; 53, second outlet;

[0031] 60. Reaction chamber. DETAILED DESCRIPTION

[0032] Embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0033] Reference below Figure 1 A growth source piping system according to an embodiment of the present invention is described.

[0034] Reference Figure 1 According to the first aspect of the present invention, a growth source pipeline system 100 is used for epitaxial growth equipment, including: a carrier gas supply pipe 10, an exhaust pipe 20, a plurality of growth source delivery pipes 30 and a plurality of growth source supply pipes 40.

[0035] The carrier gas supply pipe 10 is used to transport the carrier gas, which can be used as a protective gas and can also be used to ensure that the flow of the pipeline containing the growth source gas is sufficiently stable when the flow of the required growth source gas is small, so that the flow of the pipeline into the reaction chamber 60 is sufficiently stable to ensure uniform reaction.

[0036] One end of the exhaust pipe 20 is connected to the carrier gas supply pipe 10, and the other end of the exhaust pipe 20 is formed as an exhaust port 21. Optionally, the exhaust port 21 can be connected to a gas collecting device, and the gas discharged from the exhaust port 21 is collected by the gas collecting device. Since the flow rate of the growth source gas is not stable enough at the initial stage of opening the gas supply valve, if it is directly introduced into the reaction chamber 60, the supply of the growth source gas in the reaction chamber 60 may be not stable enough, and the reaction may not be uniform enough. By making the growth source pipeline system 100 include the exhaust pipe 20, the growth source gas can be introduced into the exhaust pipe 20 at the initial stage of opening the gas supply valve and before being introduced into the reaction chamber 60, and discharged through the exhaust port 21, and then introduced into the reaction chamber 60 after the flow rate of the growth source gas is stable, so that the flow rate of the gas introduced into the reaction chamber 60 can be stabilized, and the reaction can be more uniform.

[0037] One end of each growth source delivery pipe 30 is connected to the carrier gas supply pipe 10, and the other end of each growth source delivery pipe 30 is used to connect to the reaction chamber 60. The number of the plurality of growth source supply pipes 40 is the same as that of the plurality of growth source delivery pipes 30 and they correspond one to one, each growth source supply pipe 40 is connected to the corresponding growth source delivery pipe 30, and each growth source supply pipe 40 is connected to the same exhaust pipe 20. By making the number of the plurality of growth source supply pipes 40 the same as that of the plurality of growth source delivery pipes 30 and they correspond one to one, each growth source delivery pipe 30 can correspond to only the same growth source gas, so as to control the ratio of different growth source gases required by controlling the flow rate of the gas in different growth source delivery pipes 30. Since the temperature, pressure, etc. in the discharge pipe 20 do not reach the conditions for the growth source gases to react with each other, by connecting each growth source gas supply pipe 40 to the same discharge pipe 20, the number of pipelines can be reduced without causing the gases to react with each other, thereby making the pipeline arrangement of the entire growth source pipeline system 100 simpler, and the growth source pipeline system 100 occupies a smaller space, saving more space. By reducing the number of pipelines, the number of pipelines that the carrier gas needs to pass through can be reduced, thereby reducing the amount of carrier gas used and reducing costs.

[0038] According to the embodiment of the present invention, the growth source pipeline system 100 includes a carrier gas supply pipe 10, an exhaust pipe 20 and a plurality of growth source delivery pipes 30. By connecting each growth source supply pipe 40 to the same exhaust pipe 20, the number of pipelines is reduced, the pipeline arrangement is simpler, the growth source pipeline system 100 occupies a smaller space, and saves space; and by reducing the number of pipelines, the use of carrier gas can be reduced, thereby reducing costs.

[0039] According to some embodiments of the present invention, referring to Figure 1Each growth source gas supply pipe 40 includes a gas supply main pipe 41, a first gas supply branch pipe 42, a second gas supply branch pipe 43 and a three-way valve 50. The three-way valve 50 has an inlet 51, a first outlet 52 and a second outlet 53. The gas supply main pipe 41 is connected to the inlet 51, one end of the first gas supply branch pipe 42 is connected to the first outlet 52, the other end of the first gas supply branch pipe 42 is connected to the corresponding growth source conveying pipe 30, one end of the second gas supply branch pipe 43 is connected to the second outlet 53, and the other end of the second gas supply branch pipe 43 is connected to the discharge pipe 20. By providing a three-way valve 50 in the growth source gas supply pipe 40, and connecting one end of the first gas supply branch pipe 42 to the first outlet 52, the other end of the first gas supply branch pipe 42 to the corresponding growth source delivery pipe 30, and one end of the second gas supply branch pipe 43 to the second outlet 53, the growth source gas flowing in from the gas supply main pipe 41 can flow into the first gas supply branch pipe 42 through the three-way valve 50 and then into the growth source delivery pipe 30, and the growth source gas flowing in the gas supply main pipe 41 can also flow into the second gas supply branch pipe 43 through the three-way valve 50 and then into the exhaust pipe 20, thereby realizing the connection between the gas supply main pipe 41 and the growth source delivery pipe 30, the gas supply main pipe 41 and the exhaust pipe 20, and the switching can be achieved.

[0040] See also Figure 2In the conventional technology, in order to switch the growth source gas from flowing to the exhaust pipe 20' to flowing to the growth source delivery pipe 30', a three-way pipe 60' is usually used in combination with two one-way diaphragm valves 61'. When one of the one-way diaphragm valves 61' is opened and the other one-way diaphragm valve 61' is closed, the growth source gas flowing from the gas supply main pipe 41' can flow through the three-way pipe 60' into the first gas supply branch pipe 42' and then into the growth source delivery pipe 30', or the growth source gas flowing into the gas supply main pipe 41' can flow through the three-way pipe 60' into the second gas supply branch pipe 43' and then into the exhaust pipe 20'. When it is necessary to switch the growth source gas flowing into the discharge pipe 20' in the gas supply main pipe 41' to flow into the growth source delivery pipe 30', it is necessary to open the one-way diaphragm valve 61' on the three-way pipe 60' connected to the growth source delivery pipe 30', and close the one-way diaphragm valve 61' on the three-way pipe 60' connected to the discharge pipe 20'. At this time, the three-way pipe 60' branches off and flows to the one-way diaphragm valve 61' on the three-way pipe 60' connected to the discharge pipe 20', and there is still growth source gas in one section of the pipe. The growth source gas in this section of the pipe will escape to the other branched pipe of the three-way pipe 60', that is, flow to the one-way diaphragm valve 61' on the three-way pipe 60' connected to the growth source delivery pipe 30', and finally flow to the growth source delivery pipe 30' through the opened one-way diaphragm valve 61'. When one of the outlets is closed and the other outlet is opened, gas is accumulated in the pipeline near the closed outlet, and this part of the pipeline is a dead zone 62', that is, the gas in the dead zone 62' may escape to the opened outlet, causing the flow rate to fluctuate. According to some embodiments of the present invention, the gas supply main pipe 41 is connected to the first gas supply branch pipe 42 and the second gas supply branch pipe 43 respectively through the three-way valve 50, and the design of replacing the two one-way diaphragm valves can reduce the dead zone and ensure the stability of the growth source gas flow entering the growth source delivery pipe 30 or the discharge pipe 20. For example, there is no pipeline between the first outlet 52 and the second outlet 53. When switching between the first outlet 52 and the second outlet 53, since there is no dead zone in the first outlet 52 and the second outlet 53, there will be no phenomenon of residual gas in the pipeline, so that the growth source gas flow entering the growth source delivery pipe 30 or the discharge pipe 20 can be stabilized. It can be understood that in some embodiments, the three-way valve 50 is a three-way diaphragm valve.

[0041] According to some embodiments of the present invention, the gas supply main pipe 41 of each growth source gas supply pipe 40 is provided with a fourth mass flow controller 44, and the fourth mass flow controller 44 is located on the upstream side of the corresponding three-way valve 50. By providing the fourth mass flow controller 44 on the gas supply main pipe 41 and locating the fourth mass flow controller 44 on the upstream side of the corresponding three-way valve 50, the fourth mass flow controller 44 can detect and adjust the flow rate of the growth source gas, thereby facilitating the control of the ratio of different growth source gases required by controlling the flow rate of the gas in different growth source delivery pipes 30.

[0042] According to some embodiments of the present invention, referring to Figure 1 Each growth source delivery pipe 30 is provided with a first mass flow controller 32, and the connection position between the growth source gas supply pipe 40 and the corresponding growth source delivery pipe 30 is a delivery connection position 31. In the flow direction of the gas in the growth source delivery pipe 30, the first mass flow controller 32 is located at the upstream side of the delivery connection position 31. By arranging the first mass flow controller 32 at the upstream side of the delivery connection position 31 of the growth source delivery pipe 30, the first mass flow controller 32 can measure and adjust the flow rate of the carrier gas, so that the flow rate of the carrier gas is stable, which is convenient for the subsequent mixing with the growth source gas to uniformly and stably deliver the growth source gas to the reaction chamber 60.

[0043] The discharge pipe 20 is provided with a second mass flow controller 23, referring to Figure 1 , the connection position between the growth source gas supply pipe 40 and the discharge pipe 20 is the discharge connection position 22, and in the flow direction of the gas in the discharge pipe 20, the second mass flow controller 23 is located at the upstream side of all the discharge connection positions 22. By arranging the second mass flow controller 23 at the upstream side of all the discharge connection positions 22 of the discharge pipe 20, the second mass flow controller 23 can measure and adjust the flow rate of the carrier gas, so that the flow rate of the carrier gas is stable, which is convenient for judging whether the flow rate of the growth source in the discharge pipe 20 is stable; at the same time, it can also avoid waste caused by excessive introduction of carrier gas.

[0044] According to some embodiments of the present invention, referring to Figure 1 , each growth source delivery pipe 30 is provided with a third mass flow controller 33, the connection position between the growth source gas supply pipe 40 and the corresponding growth source delivery pipe 30 is the delivery connection position 31, and in the flow direction of the gas in the growth source delivery pipe 30, the third mass flow controller 33 is located at the downstream side of the delivery connection position 31. By arranging the third mass flow controller 33 at the downstream side of the delivery connection position 31, the third mass flow controller 33 can detect and control the flow rate of the gas from the multiple growth source delivery pipes 30 into the reaction chamber 60. For example, by adjusting the third mass flow controller 33, the flow rate of the gas from the multiple growth source delivery pipes 30 into the reaction chamber 60 is equal, so that the pressure in the reaction chamber 60 can be stabilized, and the epitaxial growth is stable during the reaction.

[0045] According to some embodiments of the present invention, each growth source gas supply pipe 40 is provided with a fourth mass flow controller 44. By providing the fourth mass flow controller 44 on each growth source gas supply pipe 40, the fourth mass flow controller 44 can detect and adjust the flow rate of the growth source gas, thereby facilitating controlling the ratio of different growth source gases required by controlling the flow rate of the gas in different growth source delivery pipes 30.

[0046] For example, each growth source delivery pipe 30 is provided with a first mass flow controller 32, and the connection position between the growth source gas supply pipe 40 and the corresponding growth source delivery pipe 30 is the delivery connection position 31. In the flow direction of the gas in the growth source delivery pipe 30, the first mass flow controller 32 is located on the upstream side of the delivery connection position 31; each growth source delivery pipe 30 is provided with a third mass flow controller 33, and the connection position between the growth source gas supply pipe 40 and the corresponding growth source delivery pipe 30 is the delivery connection position 31. In the flow direction of the gas in the growth source delivery pipe 30, the third mass flow controller 33 is located on the downstream side of the delivery connection position 31; each growth source gas supply pipe 40 is provided with a fourth mass flow controller 44, and the connection position between the growth source gas supply pipe 40 and the corresponding growth source delivery pipe 30 is the delivery connection position 31. In the flow direction of the gas in the growth source gas supply pipe 40, the fourth mass flow controller 44 is located on the upstream side of the delivery connection position 31. The fourth mass flow controller 44 can be made to detect and adjust the flow rate of the growth source gas, so as to facilitate controlling the ratio of different growth source gases required by controlling the flow rate of the gas in different growth source delivery pipes 30. In addition, relevant personnel can adjust the first mass flow controller 32, the third mass flow controller 33 and the fourth mass flow controller 44 so that the reading of the third mass flow controller 33 in the growth source delivery pipe 30 and the growth source gas supply pipe 40 corresponding to a single type of growth source gas is the sum of the reading of the first mass flow controller 32 and the fourth mass flow controller 44, and the readings of the third mass flow controller 33 on the growth source delivery pipe 30 corresponding to different types of growth source gases are the same. That is, the flow rate of the growth source gas in the growth source gas supply pipe 40 is adjusted accordingly according to the reaction ratio, and the flow rate of the carrier gas is used as a supplement to the total flow rate, so that the flow rates of the gases in the multiple growth source delivery pipes 30 entering the reaction chamber 60 are equal.

[0047] According to some embodiments of the present invention, referring to Figure 1 Each growth source delivery pipe 30 is provided with a first pressure controller 34, and the connection position between the growth source gas supply pipe 40 and the corresponding growth source delivery pipe 30 is a delivery connection position 31. In the flow direction of the gas in the growth source delivery pipe 30, the first pressure controller 34 is located at the downstream side of the delivery connection position 31;

[0048] The discharge pipe 20 is provided with a second pressure controller 24, referring to Figure 1, the connection position between the growth source gas supply pipe 40 and the discharge pipe 20 is the discharge connection position 22, and in the flow direction of the gas in the discharge pipe 20, the second pressure controller 24 is located at the downstream side of all the discharge connection positions 22. By providing the first pressure controller 34 at the downstream side of the delivery connection position 31 of the growth source delivery pipe 30, the first pressure controller 34 can detect and adjust the pressure in the pipeline of the growth source delivery pipe 30 after the growth source gas and the carrier gas are mixed. By providing the second pressure controller 24 at the downstream side of all the discharge connection positions 22 in the discharge pipe 20, the second pressure controller 24 can detect and adjust the pressure in the pipeline of all the growth source gases in the discharge pipe 20 after the growth source gases and the carrier gas are mixed. Relevant personnel can adjust the first pressure controller 34 and the second pressure controller 24 to make the pressure in the pipeline after all the growth source gases and the carrier gas are mixed in the discharge pipe 20 equal to the pressure in the pipeline after the growth source gases and the carrier gas are mixed in the growth source delivery pipe 30. This can avoid the pressure difference between the discharge pipe 20 and the growth source delivery pipe 30 causing the gas to flow from the upstream of the pipeline with higher pressure into the pipeline with lower pressure, causing gas pollution; it can also make the proportion and flow rate of the growth source gas before entering the reaction chamber more precise, avoiding affecting the growth reaction in the reaction chamber 60.

[0049] For example, the first pressure controller 34 and the second pressure controller 24 include solenoid valves, which can adjust the pressure in the pipeline by adjusting the cross-sectional area of ​​the pipeline that can flow there. The solenoid valves can also be electronic pressure controllers, Electronic Pressure Control, referred to as EPC.

[0050] For example, the control range of the pressure controller is 50mbar to 2000mbar, which makes the pressure control range of the pressure controller larger and can increase or decrease the gas at the same time in a very short time to achieve pressure balance.

[0051] According to some embodiments of the present invention, referring to Figure 1 Each growth source delivery pipe 30 is provided with a third mass flow controller 33, and the third mass flow controller 33 is located on the downstream side of the pressure controller in the flow direction of the gas in the growth source delivery pipe 30. By locating the third mass flow controller 33 on the downstream side of the pressure controller, the third mass flow meter can be closer to the reaction chamber 60, and the measurement and control of the flow of the growth source gas before entering the reaction chamber can be more accurate.

[0052] The mass flow controller described in the embodiment of the present invention, Mass Flow Controller, referred to as MFC, has the main function of controlling instantaneous flow, that is, setting the desired flow value and measuring the actual instantaneous flow value after control, and can also provide cumulative flow.

[0053] According to some embodiments of the present invention, referring to Figure 1 , multiple growth source delivery pipes 30 are arranged along a first direction (for example, direction e1 in the figure), the discharge pipe 20 is located on one side of the multiple growth source delivery pipes 30 along the first direction, the growth source delivery pipes 30 and the discharge pipe 20 both extend along a second direction (for example, direction e2 in the figure), the second direction intersects with the first direction, and the carrier gas delivery pipe and the reaction chamber 60 are located on both sides of the growth source delivery pipe 30 along the second direction. By arranging multiple growth source delivery pipes 30 along the first direction, the discharge pipe 20 is located on one side of the multiple growth source delivery pipes 30 along the first direction, and the growth source delivery pipes 30 and the discharge pipe 20 both extend along the second direction, the pipeline distribution of the growth source pipeline system 100 can be simplified, which is convenient for the repair and maintenance of relevant personnel.

[0054] According to some embodiments of the present invention, referring to Figure 1 , multiple growth source air supply pipes 40 are arranged along the second direction. By arranging multiple growth source air supply pipes 40 along the second direction, the pipeline distribution of the growth source pipeline system 100 can be simplified, which is convenient for maintenance and control by relevant personnel.

[0055] The epitaxial growth device according to the second embodiment of the present invention includes: the growth source pipeline system 100 according to the first embodiment of the present invention.

[0056] According to the epitaxial growth equipment of the embodiment of the present invention, by including the growth source pipeline system 100 according to the embodiment of the first aspect of the present invention, the number of pipelines of the growth source pipeline system 100 is reduced, the pipeline system is simpler, and space is saved; and the use of carrier gas can be reduced to reduce costs.

[0057] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0058] In the description of the present invention, "first feature" or "second feature" may include one or more of the features.

[0059] In the description of the present invention, "plurality" means two or more.

[0060] In the description of the present invention, a first feature being “on” or “under” a second feature may include that the first and second features are directly in contact with each other, or may include that the first and second features are not in direct contact with each other but are in contact with each other via another feature therebetween.

[0061] In the description of the present invention, "above", "over" and "on" a first feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature.

[0062] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0063] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A growth source pipeline system for epitaxial growth equipment, characterized in that: include: A carrier gas supply pipe, used for conveying carrier gas; A discharge pipe, one end of which is connected to the carrier gas supply pipe, and the other end of which is formed as a discharge port; A plurality of growth source delivery tubes, one end of each of the growth source delivery tubes is connected to the carrier gas supply tube, and the other end of each of the growth source delivery tubes is used to be connected to the reaction chamber; There are multiple growth source air supply pipes, the number of the multiple growth source air supply pipes is the same as the number of the multiple growth source delivery pipes and they correspond one to one, each of the growth source air supply pipes is connected to the corresponding growth source delivery pipe, and each of the growth source air supply pipes is connected to the same discharge pipe.

2. The growth source pipeline system according to claim 1, characterized in that: Each of the growth source gas supply pipes includes a main gas supply pipe, a first gas supply branch pipe, a second gas supply branch pipe and a three-way valve, wherein the three-way valve has an inlet, a first outlet and a second outlet, the main gas supply pipe is connected to the inlet, one end of the first gas supply branch pipe is connected to the first outlet, the other end of the first gas supply branch pipe is connected to the corresponding growth source delivery pipe, one end of the second gas supply branch pipe is connected to the second outlet, and the other end of the second gas supply branch pipe is connected to the discharge pipe.

3. The growth source pipeline system according to claim 2, characterized in that: The three-way valve is a three-way diaphragm valve; and / or, the gas supply main pipe of each growth source gas supply pipe is provided with a fourth mass flow controller, and the fourth mass flow controller is located at the upstream side of the corresponding three-way valve.

4. The growth source pipeline system according to claim 1, characterized in that: Each of the growth source delivery pipes is provided with a first mass flow controller, the connection position between the growth source gas supply pipe and the corresponding growth source delivery pipe is a delivery connection position, and in the flow direction of the gas in the growth source delivery pipe, the first mass flow controller is located at the upstream side of the delivery connection position; The discharge pipe is provided with a second mass flow controller, and the connection position between the growth source gas supply pipe and the discharge pipe is the discharge connection position. In the flow direction of the gas in the discharge pipe, the second mass flow controller is located on the upstream side of all the discharge connection positions.

5. The growth source pipeline system according to claim 1, characterized in that: Each of the growth source delivery pipes is provided with a third mass flow controller, the connection position between the growth source gas supply pipe and the corresponding growth source delivery pipe is the delivery connection position, and in the flow direction of the gas in the growth source delivery pipe, the third mass flow controller is located on the downstream side of the delivery connection position; and / or, each of the growth source gas supply pipes is provided with a fourth mass flow controller.

6. The growth source pipeline system according to claim 1, characterized in that: Each of the growth source delivery pipes is provided with a first pressure controller, the connection position between the growth source gas supply pipe and the corresponding growth source delivery pipe is a delivery connection position, and in the flow direction of the gas in the growth source delivery pipe, the first pressure controller is located at the downstream side of the delivery connection position; The discharge pipe is provided with a second pressure controller, and the connection position between the growth source gas supply pipe and the discharge pipe is the discharge connection position. In the flow direction of the gas in the discharge pipe, the second pressure controller is located on the downstream side of all the discharge connection positions.

7. The growth source pipeline system according to claim 6, characterized in that: Each of the growth source delivery pipes is provided with a third mass flow controller. In the flow direction of the gas in the growth source delivery pipe, the third mass flow controller is located on the downstream side of the pressure controller.

8. The growth source pipeline system according to any one of claims 1 to 7, characterized in that: The multiple growth source delivery pipes are arranged along a first direction, the exhaust pipe is located on one side of the multiple growth source delivery pipes along the first direction, the growth source delivery pipes and the exhaust pipe both extend along a second direction, the second direction intersects with the first direction, and the carrier gas delivery pipe and the reaction chamber are located on both sides of the growth source delivery pipe along the second direction.

9. The growth source pipeline system according to claim 8, characterized in that: A plurality of the growth source gas supply pipes are arranged along the second direction.

10. An epitaxial growth device, characterized in that: include: A growth source piping system according to any one of claims 1 to 9.

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