Drum-type vacuum plasma cleaning device

Abstract

A drum type vacuum plasma cleaning device comprises a cleaning body, the cleaning body is provided with a rack and a drum device, drum fixing parts are arranged on the two sides of the rack, the drum device comprises a cylindrical vacuum cavity, and fixing shafts on the two sides of the drum device are fixed in the fixing parts; a roller is arranged in the cavity, a rotary connecting structure is arranged at the bottom of the roller, and the rotary connecting structure and the cylindrical bottom surface of the vacuum cavity can be fixed together in a relatively rotating manner; the fixed part of the rotary connecting structure is provided with an electrode mounting hole, a vacuum air hole and a process air hole which are communicated with the outside, the electrode mounting hole is provided with an electrode bar, and the vacuum air hole is connected with a vacuum pump; the rotating part is in linkage connection with a roller variable frequency motor arranged outside the vacuum cavity and drives the roller to rotate; a lifting mechanism is arranged on one side below the vacuum cavity; by means of the roller mode, the number of plasma cleaning treatment of a single product material is doubled, the treatment quality is improved, and the treatment efficiency is improved.

Description

Technical Field

[0001] The invention relates to a plasma technology, in particular to a drum type vacuum plasma cleaning device. Background Art

[0002] Vacuum plasma cleaning technology is widely used in material surface modification, etching and cleaning, plasma chemical vapor deposition, sputtering, etc. It is also used in key processes for processing silicon, quartz, niobium lithium compounds and other special materials such as ceramics or glass. The vacuum plasma cleaning chamber is mainly used for surface treatment of plastics, new materials, particles, etc.

[0003] Vacuum plasma cleaning is usually introduced in the following links: material surface energy improvement, before bonding and coating, and before screen printing. After plasma cleaning, the product can obtain better surface properties.

[0004] 1. After all-round cleaning of the paint on the surface of plastic parts with plasma, the adhesion of the paint can be improved, inorganic matter on the surface of the material can be removed, the connection between the ink and the carrier can be improved, the peeling phenomenon can be reduced, and the heat dissipation performance can be improved;

[0005] 2. Widely used in new materials industry, such as surface treatment of granular materials, surface treatment of irregular materials, and powder materials;

[0006] 3. Application in the toy industry: plasma treatment is used before toy coloring to avoid paint and color loss after coloring and to improve the adhesion of paint and ink;

[0007] At present, the existing online vacuum plasma equipment on the market is mainly composed of a vacuum system, a control system, a plasma source and a vacuum chamber. The more common vacuum plasma equipment is often layer processing. Each treatment can only be placed between layers, and the operation is cumbersome. They need to be placed one by one on the tray fixture. After processing, they need to be collected separately. If you want to increase production, you need to order multiple units or increase the chamber to increase production, but this will lead to a significant increase in costs and the need for related personnel. Summary of the invention

[0008] The technical problem solved by the present invention is to provide a drum-type vacuum plasma cleaning device, which doubles the number of plasma cleaning treatments of a single product material through a roller method, improves the treatment quality, and enhances the treatment efficiency.

[0009] The technical solution of the present invention is:

[0010] A drum type vacuum plasma cleaning device, wherein it comprises a control cabinet and a cleaning body, wherein the control cabinet is provided with a control host and a power supply, wherein the cleaning body is provided with a frame and a drum device, wherein the frame is a vertical U-shaped frame, and drum fixing parts are provided at the upper parts of both sides thereof, wherein the drum device comprises a horizontally placed cylindrical vacuum chamber, and fixed shafts are provided at both sides thereof, and the fixed shafts can be rotatably fixed in the fixing parts; a chamber door is provided at the front end of the vacuum chamber, and after the chamber door is closed, a sealed space is formed in the vacuum chamber; a drum coaxially arranged with the vacuum chamber is provided in the chamber, and a rotating connection structure is provided at the bottom of the drum, and the rotating connection structure and the cylindrical bottom surface of the vacuum chamber can be relatively rotatably fixed together;

[0011] The rotating connection structure includes a fixed part and a rotating part, the fixed part is provided with an electrode mounting hole, a vacuum air hole and a process air hole connected to the outside, an electrode rod is sealed and inserted in the electrode mounting hole, the electrode rod is electrically connected to the power supply, the process air hole is connected to a process gas source device, and the vacuum air hole is connected to a vacuum pump; the rotating part is linked to a drum frequency conversion motor arranged outside the vacuum chamber to drive the drum to rotate; a lifting mechanism is provided on one side below the vacuum chamber to push the vacuum chamber to rotate around the fixed axis; the control host is electrically connected to and controls the power supply, lifting mechanism, vacuum pump, process gas source device and drum frequency conversion motor.

[0012] The drum-type vacuum plasma cleaning device as described above, wherein the drum fixing portion is provided with a drum rotation connection mechanism, the drum rotation connection mechanism is provided with a fixed shaft base and a fixed bearing assembly, the fixed shaft base protrudes outwardly to fix the fixed shaft, the other side of the fixed shaft base is fixed to an arc surface connection seat, the inner side of the arc surface connection seat is an arc surface that fits the outer surface of the vacuum chamber, and the arc surface connection seat is fixed to the outer surface of the vacuum chamber; the fixed bearing assembly includes an Ω-shaped bearing seat sleeve, a rotating bearing is arranged in the bearing seat sleeve, and the fixed shaft is inserted into the rotating bearing and fixed; a connecting seat plate is provided between the bottom of the bearing seat sleeve and the top of the frame.

[0013] The drum type vacuum plasma cleaning device as described above, wherein the drum rotation connection mechanism is provided with a positioning device, the positioning device includes a positioning point plate arranged on the fixed shaft base, and a detection point plate arranged on the connecting seat plate; the positioning point plate is provided with at least three positioning nail holes at a position away from the fixed shaft at a specified distance, along different angles around the fixed shaft, and a positioning head is fixed on the positioning nail hole protruding outward; the detection point plate is an L-shaped plate fixed on the connecting seat plate and bent upward, and detection holes with the same number as the positioning heads are opened at the specified positions of its upward vertical part, and detection sensors are respectively installed on the detection holes, each of the detection sensors is arranged opposite to one side of the positioning head, and the positioning point plate rotates within a set angle range as the fixed shaft rotates, and within the angle range, each of the positioning heads will only coincide with the center of a corresponding detection sensor once.

[0014] The drum-type vacuum plasma cleaning device as described above, wherein a rotating connection structure is provided between the drum bottom and the corresponding bottom surface of the vacuum chamber, the rotating connection structure comprises a fixed part of a central disk and a rotating part of a drum bottom ring, the central disk is fixed to the inner side of the bottom surface of the vacuum chamber and is arranged concentrically with the bottom surface of the vacuum chamber, a rotating wheel is provided on the outer peripheral side surface of the central disk at a fixed angle, and the rotating wheel protrudes from the outer peripheral surface of the central disk; the drum bottom is a circular ring structure, the circular ring The inner diameter of the ring matches the outer diameter of the center disk, the thickness of the center disk is greater than the thickness of the cylinder bottom ring, the cylinder bottom ring is sleeved on the outer circumference of the center disk, and the inner side of the ring is directly in contact with the rotating wheel; a rotating transmission track is provided on the side of the cylinder bottom ring facing the bottom surface of the vacuum chamber, and the output end of a sealed coupling passes through the transmission hole on the bottom surface of the vacuum chamber and is linked to the rotating transmission track, the sealed coupling is fixed to the outer side of the bottom surface of the vacuum chamber, and the drum frequency conversion motor is connected to the coupling.

[0015] The drum-type vacuum plasma cleaning device as described above, wherein the rotating wheel is a metal bearing, and the rotating wheel is installed in a roller circular groove opened in the periphery of the center disk, and the roller circular groove is provided with an opening on the outer peripheral surface of the center disk, and the outer peripheral edge of the bearing protrudes from the opening and can rollably contact the inner peripheral surface of the cylinder bottom ring; the roller circular groove is provided with connected locking screw hole grooves on both sides, and the roller circular groove and the locking screw hole groove are covered with a groove cover plate, and the groove cover plate is locked to the screw hole of the locking screw hole groove by bolts, and the outer side surface of the groove cover plate is flush with the surface of the center disk; the rotating transmission track is a groove with meshing teeth on the side of the track, and the side of the terminal end of the output end of the sealing coupling is provided with meshing teeth matching the meshing teeth, and the output end of the sealing coupling rotates to drive the cylinder bottom circle to rotate around the center disk.

[0016] As described above, the drum-type vacuum plasma cleaning device, wherein the electrode rod is mounted on the electrode mounting hole of the center disk, and the electrode mounting hole is arranged at the center of the center disk, or when the center disk is arranged vertically, is located at a position inside the center disk at a set distance upwardly away from the center.

[0017] As described above, the drum-type vacuum plasma cleaning device, wherein the electrode rod is sealed and passes through the electrode mounting hole and is insulated from the electrode mounting hole, and the inner end of the main body portion extends to a set distance inside the drum; the outer end portion protrudes outside the bottom surface of the vacuum chamber and is electrically connected to one pole of a plasma RF power supply; the other pole of the plasma RF power supply is electrically connected to the drum, and the electrode rod and the drum wall form two poles for discharging and ionizing process gas.

[0018] As described above, a drum-type vacuum plasma cleaning device, wherein a cooling water channel is provided in the electrode rod, the cooling water channel comprises a water inlet channel and a drainage channel, the water inlet channel extends from a water inlet at the end of the outer end of the electrode rod to the inner end of the electrode rod, the drainage channel is connected with the water inlet channel at the end of the inner end of the electrode rod, is arranged in parallel with the water inlet channel, and extends to the drainage port at the outer end of the electrode rod, the water inlet and the drainage port are respectively connected to a chiller via a hose bundle.

[0019] In the drum-type vacuum plasma cleaning device as described above, the water inlet channel is arranged on the central axis of the electrode rod, and the drainage channel is an annular channel sleeved around the outside of the water inlet channel; a shielding cover is provided on the outside of the outer end of the electrode rod.

[0020] The drum-type vacuum plasma cleaning device as described above, wherein a matcher connecting a plasma radio frequency power supply and an electrode rod is provided on the top of the vacuum chamber; a vacuum valve and a vacuum gauge are provided outside the vacuum air hole, a vacuum breaking valve hole is provided on the central disk, and the vacuum breaking valve hole is sealed and connected to a vacuum breaking valve outside the vacuum chamber; a support bar extending along the length direction of the drum is provided on the inner side surface of the drum, and inclined surfaces are provided on both sides of the support bar, and an arc chamfer is provided on the top; a rotating support structure is provided on the inner side surface of the vacuum chamber to keep the axis of the drum coaxial with the vacuum chamber; a visual window is provided on the chamber door; and a sensor is provided on the door lock of the chamber door;

[0021] Also includes plasma cleaning steps for product materials:

[0022] Open the chamber door, and lift the opening end of the vacuum chamber by controlling the lifting mechanism through the host, keep the vacuum chamber in an upward state, and pour the material to be cleaned into it; then control the lifting mechanism to return the vacuum chamber to a horizontal state, and close the chamber door;

[0023] Start the vacuum pump, open the vacuum valve, and start the vacuum pump to evacuate the inside of the vacuum chamber; when the vacuum degree reaches 50pa, start the drum variable frequency motor to drive the drum to rotate, and the speed of the drum is 8rpm;

[0024] When the vacuum degree in the vacuum chamber reaches 30pa, process gas is filled in. When the argon flow rate reaches 100sccm, the plasma RF power supply is started to output energy between the electrode rod and the roller, and plasma is generated and filled in the vacuum chamber; the chiller is started, the temperature is set to 28℃, the power is 800 watts, and the material is plasma cleaned for 50 seconds;

[0025] The process gas argon is filled in with a flow rate of 80 sccm, the drum speed is maintained at 8 rpm, and the material is plasma cleaned for 50 seconds;

[0026] The process gas argon was filled in with a flow rate of 50 sccm, the drum speed was kept at 5 rpm, and the material was plasma cleaned for 200 seconds;

[0027] After repeating the above-mentioned gas cleaning process 5 times, the treatment is completed, the plasma RF power supply is turned off, the process gas source is turned off, the vacuum pump and the vacuum valve are turned off, the air breaking valve is opened, the pressure in the vacuum chamber returns to the standard atmospheric pressure value, and the vacuum breaking action is completed; the chamber door is opened, the cavity mouth of the vacuum chamber is controlled to tilt downward, and the cleaned product material is poured out.

[0028] Stop the rotation of the drum and the input of process gas, close the energy output of the electrode rod, and automatically start the air-breaking valve;

[0029] The chamber door is opened, and the vacuum chamber opening is controlled to tilt downward to pour out the processed material.

[0030] From the above description, it can be seen that the present invention has the following advantages:

[0031] The drum-type vacuum plasma cleaning device of the present invention, by cleverly using the structure of the drum, completely changes the general cleaning method of placing products for spraying. In particular, it can be used for small products, or even for products with complex structures that are not on a single plane, to simultaneously perform large-scale single cleaning operations; there is no need to fix the cleaning products, and the drum tumbling method is adopted to achieve comprehensive cleaning of the product surface state in all directions, which not only doubles the number of products cleaned in a single time, but also can achieve a good cleaning effect, greatly improving the processing efficiency; further, the drum cleaning method changes the conventional loading and unloading methods in the past, reduces the complexity and number of manual operations, reduces the production cost of users for product cleaning and processing, and is more competitive in the market for surface treatment of large quantities of small materials. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 It is a schematic diagram of the overall structure of a preferred embodiment of the present invention;

[0033] Figure 2 It is a schematic diagram of the back structure of an embodiment of the present invention;

[0034] Figure 3 It is a schematic diagram of the front structure of the vacuum chamber of a preferred embodiment of the present invention;

[0035] Figure 4 It is a structural schematic diagram of a vacuum chamber of a preferred embodiment of the present invention;

[0036] Figure 5 It is a structural schematic diagram of a roller rotation connection mechanism of a preferred embodiment of the present invention;

[0037] Figure 6 is a schematic cross-sectional structure diagram of a vacuum chamber of a preferred embodiment of the present invention;

[0038] Figure 7 It is a schematic structural diagram of the center disk of a preferred embodiment of the present invention. DETAILED DESCRIPTION

[0039] In order to have a clearer understanding of the technical features, purposes and effects of the present invention, specific embodiments of the present invention are now described with reference to the accompanying drawings.

[0040] The present invention proposes a drum-type vacuum plasma cleaning device, which cleverly utilizes the drum-type method and combines high-energy excited plasma to perform immersion and tumbling cleaning, so that product materials, especially small product materials, can be cleaned in large quantities in a single time, and can achieve excellent cleaning effects. The cleaning efficiency is 2-5 times higher than that of conventional static cleaning.

[0041] See also Figure 1As shown, in a preferred embodiment of the present invention, the drum type vacuum plasma cleaning device comprises a control cabinet 1 and a cleaning body, wherein the control cabinet 1 is provided with a control host and a power supply, and the cleaning body is provided with a frame 8 and a drum device, wherein the frame 8 is a vertical U-shaped frame, and drum fixing parts are provided on the upper parts of both sides thereof, and the drum device comprises a horizontally placed cylindrical vacuum chamber 9, and fixed shafts 27 are provided on both sides thereof, and the fixed shaft 27 can be rotatably fixed in the fixed part, thereby, the vacuum chamber 9 can be supported by the fixed shaft 27, and after rotation, different openings such as upward tilt, horizontal tilt or downward tilt are formed. state; a cavity door 28 is provided at the front end of the vacuum cavity 9, and after the cavity door 28 is closed, a sealed space is formed in the vacuum cavity 9; a roller 29 is provided in the vacuum cavity, which is coaxial with the vacuum cavity 9, and a rotating connection structure is provided at the bottom of the roller 29, and the rotating connection structure and the cylindrical bottom surface of the vacuum cavity 9 can be fixed together so as to rotate relatively; the roller 29 in the vacuum cavity 9 can rotate, and the product material transferred in the roller 29 will continuously roll in the lower half of the roller, so that it can fully contact with the plasma gas in the vacuum cavity 9, thereby achieving an all-round cleaning effect.

[0042] The rotating connection structure includes a fixed part and a rotating part. The fixed part is provided with an electrode mounting hole 40, a vacuum air hole and a process air hole connected to the outside. Preferably, these process air holes are all provided with sealing and insulating structures. After the corresponding structures are inserted and installed, the air tightness in the vacuum chamber can be ensured. At the same time, when no conductive connection is required, the insulation state between the vacuum chamber and the vacuum chamber can also be ensured. An electrode rod 26 is sealed and inserted in the electrode mounting hole 40. The electrode rod 26 is electrically connected to the power supply 2. Preferably, the power supply 2 is mainly a plasma radio frequency power supply. The process air hole is connected to a process gas source device to provide the process gas required for exciting plasma gas in the vacuum chamber 9. The vacuum air hole is connected to a vacuum pump 12. Through the vacuum pump 12 vacuum control, the vacuum chamber 9 can be vacuumed before the cleaning operation to ensure the conditions for exciting plasma cleaning gas. The rotating part is linked to a drum variable frequency motor 15 arranged outside the vacuum chamber to drive the drum 29 to rotate. After the drum 29 rotates, it can drive The product material in the drum 29 rolls, so that it can better contact and mix with the plasma gas, thereby achieving a better cleaning effect; a lifting mechanism 13 is provided on one side below the vacuum chamber 9 to push the vacuum chamber to rotate around the fixed axis 27, and the lifting mechanism 13 is driven to realize the operation of the opening end of the vacuum chamber in different states of upward, horizontal and downward tilt; the control host is electrically connected to and controls the power supply, lifting mechanism, vacuum pump, process gas source device and drum variable frequency motor; each electrical component of the present invention is electrically connected to the control system in the control host, and through the setting control of the control system, all parts are linked and arranged to realize the whole process of automatic cleaning.

[0043] The drum type vacuum plasma cleaning device of the present invention as described above, in its preferred embodiment, please refer to Figure 5 As shown, the roller fixing part is provided with a roller rotation connection mechanism, and the roller rotation connection mechanism is provided with a fixed shaft base 31 and a fixed bearing assembly, the fixed shaft base 31 protrudes outwardly and is fixed with the fixed shaft 27, and the other side of the fixed shaft base 31 is fixed on an arc surface connection seat, the inner side of the arc surface connection seat 32 is an arc surface that fits the outer surface of the vacuum chamber 9, and the arc surface connection seat 32 is fixed on the outer surface of the vacuum chamber 9; preferably, it is installed in the middle position in the vertical direction of the side of the vacuum chamber 9, so that the vacuum chamber 9 can maintain horizontal balance; the fixed bearing assembly includes an Ω-shaped bearing seat sleeve 34, a rotating bearing is arranged in the bearing seat sleeve 34, and the fixed shaft 27 is inserted into the rotating bearing and fixed; a connecting seat plate 35 is provided between the bottom of the bearing seat sleeve 34 and the top of the frame 8. Preferably, the protrusions on both sides of the bearing seat sleeve 34 are fixed to the frame by bolts, and the vacuum chamber can be stably hung on the frame by fixing the bearing seat sleeve.

[0044] As described above, in a preferred embodiment of the drum type vacuum plasma cleaning device of the present invention, the drum rotation connection mechanism is provided with a positioning device, the positioning device includes a positioning point plate 33 arranged on the fixed shaft base 31, and a detection point plate 36 arranged on the connecting seat plate 35; the positioning point plate 33 is provided with at least three positioning pin holes at a position away from the fixed shaft 27 at a specified distance, along different angles around the fixed shaft 27, and a positioning head 37 is fixed on the positioning pin hole protruding outward; the detection point plate 36 is an L-shaped plate fixed on the connecting seat plate 35 and bent upward, and a detection hole having the same number as the positioning head 37 is opened at a specified position of the upward vertical part thereof, and detection sensors 38 are respectively installed on the detection holes, each of which is arranged opposite to one side of the positioning head 37, and the positioning point plate 33 rotates within a set angle range as the fixed shaft 27 rotates, and within the angle range, each of the positioning heads 37 will only overlap with the center of a corresponding detection sensor 38 once. Preferably, the size of the positioning head 37 is just matched with the probe of the detection sensor 38. When the vacuum chamber swings up and down and rotates, the positioning point plate 33 also rotates around the fixed axis. The moving track of the positioning head 37 is a circular arc curve. It is set that there is only one detection sensor 38 that appears on the circular arc curve track of one positioning head. Of course, the radial distance between each positioning head 37 and the axis of the fixed axis 27 can be set to be different. At this time, within the range of rotation of the vacuum chamber 9, a positioning point facing each positioning head 37 and the detection sensor 38 is configured. Then, the detection point facing each positioning head and the detection sensor can be used as a positioning point, thereby providing a positioning signal for the rotation and locking of the roller 29. For example, the positioning signal of the positioning point is used to control the action of the lifting mechanism 13, so that the vacuum chamber 9 can obtain three rotation positioning states of upward, horizontal and downward tilt. Furthermore, the positioning pin hole may be a long arc-shaped hole, which can facilitate adjustment of the fixed position of the positioning head 37, thereby adjusting more different positioning positions within the pitch range of the vacuum chamber and providing more operational variations.

[0045] The drum type vacuum plasma cleaning device of the present invention as described above, in its preferred embodiment, please refer to Figure 6 to Figure 7As shown, a rotating connection structure is provided between the bottom of the drum and the corresponding bottom surface of the vacuum chamber, and the rotating connection structure includes a fixed part of a center disk 39 and a rotating part of a bottom ring 43. The center disk 39 is fixed to the inner side of the bottom surface of the vacuum chamber 9 and is concentrically arranged with the bottom surface of the vacuum chamber 9. A rotating wheel is provided on the outer peripheral side surface of the center disk 39 at a fixed angle distance, and the rotating wheel protrudes from the outer peripheral surface of the center disk 39; the bottom of the drum is a circular ring structure, the inner diameter of the bottom ring 43 matches the outer diameter of the center disk 39, the thickness of the center disk 39 is greater than the thickness of the bottom ring 43, the bottom ring 43 is sleeved on the outer periphery of the center disk 39, and the inner side surface of the ring is arranged facing and contacting the rotating wheel; preferably, the bottom ring 43 is in close contact with the rotating wheel on the outer peripheral side of the center disk 39, so that the bottom ring 43 is rotatably fixed by being sleeved on the periphery of the center disk 39. The drum bottom ring 43 is provided with a rotating transmission track 46 on the side facing the bottom surface of the vacuum chamber 9, and an output end 45 of a sealed coupling passes through the transmission hole on the bottom surface of the vacuum chamber and is linked to the rotating transmission track 46. The sealed coupling is fixed to the outside of the bottom surface of the vacuum chamber, and the drum variable frequency motor is connected to the coupling. Thus, the drum bottom ring 43 is driven by the drum variable frequency motor to rotate around the center disk 39, thereby driving the entire drum to rotate, realizing the function of rolling the product material during drum cleaning.

[0046] In the preferred embodiment of the drum-type vacuum plasma cleaning device of the present invention as described above, the rotating wheel is a metal bearing 42, and the rotating wheel is installed in a roller groove opened in the periphery of the center disk, and the roller groove is provided with an opening on the outer peripheral surface of the center disk, and the outer peripheral edge of the bearing protrudes from the opening so as to be in rolling contact with the inner peripheral surface of the cylinder bottom ring 43; the roller groove is provided with connected locking screw hole grooves on both sides, and the roller groove and the locking screw hole groove are covered with a groove cover plate 41, and the groove cover plate 41 is locked to the screw hole of the locking screw hole groove by bolts, and the outer side surface of the groove cover plate 41 is flush with the surface of the center disk 39; the rotating transmission track 46 is a groove with meshing teeth on the side of the track, and the side surface of the terminal part of the output end 45 of the sealing coupling is provided with meshing teeth matching the meshing teeth, and the output end of the sealing coupling rotates to drive the cylinder bottom ring 43 to rotate around the center disk. The present invention is cleverly designed to use bearings as the supporting structure for rolling contact with the cylinder bottom ring, rather than conventional iron ball supports or ordinary roller supports. As a result, a sufficiently dense plurality of bearing wheels are provided on the outer circumferential surface of the center disk, which can ensure that the cylinder bottom ring and the center disk maintain a more accurate and stable coaxiality in the dynamic motion state, thereby avoiding abnormal problems such as vibration or deformation of the drum due to tilt of the center of gravity.

[0047] As described above, in a preferred embodiment of the drum-type vacuum plasma cleaning device of the present invention, the electrode rod is mounted on the electrode mounting hole 40 of the center disk, and the electrode mounting hole 40 is arranged at the center of the center disk 39, or when the center disk 39 is arranged vertically, it is located at a position inside the center disk 39 that is upwardly away from the center of the circle by a set distance. In a conventional embodiment, the electrode rod mounting hole is opened at the center of the center disk. In a more preferred embodiment, the electrode rod mounting hole 40 is opened at a position slightly above the center of the center disk 39. Through such an arrangement, when the drum is loaded with a large amount of product materials, the distance between the electrode rod 26 and the lower surface of the drum is increased, the loading space of the product materials is increased, and the situation that the product materials are easily hit by the electrode rod during rolling is avoided.

[0048] The drum type vacuum plasma cleaning device of the present invention as described above, in its preferred embodiment, please refer to Figure 6 As shown, the electrode rod is sealed and passes through the electrode mounting hole 40 and is insulated from the electrode mounting hole 40, and the inner end of the main body portion extends to a set distance inside the roller 29; the outer end portion protrudes outside the bottom surface of the vacuum chamber 9 and is electrically connected to one pole of the plasma RF power supply; the other pole of the plasma RF power supply is electrically connected to the roller, and the electrode rod 26 and the cylinder wall of the roller 29 form two poles for discharging and ionizing the process gas; the electrode rod 26 extends into the interior of the roller 29 to form two electrodes for exciting the plasma gas between the roller and the roller. This design enables the roller 29 to be more fully filled with plasma gas.

[0049] The drum type vacuum plasma cleaning device of the present invention as described above, in its preferred embodiment, please refer to Figure 6 As shown, a cooling water channel is provided in the electrode rod, and the cooling water channel includes a water inlet channel and a drainage channel. The water inlet channel extends from the water inlet at the end of the outer end of the electrode rod 26 to the inner end of the electrode rod 26. The drainage channel is connected with the water inlet channel at the end of the inner end of the electrode rod 26, and is arranged in parallel with the water inlet channel, extending to the drainage port at the outer end of the electrode rod. The water inlet and the drainage port are respectively connected to a chiller 3 via a hose bundle. In a preferred embodiment, the cold water channel is injected with cooling water through an external chiller 3, flows into the electrode rod 26, and then flows out to cool the electrode rod, so as to ensure that the electrode rod works at an optimal temperature state. In a general embodiment, the clean water channel and the drainage channel can be realized by two channels arranged in parallel, and the two channels are connected at the inner end of the electrode rod 26, that is, the pipeline turns around, so that the cooling water can enter the outer end of the electrode rod and flow back and drain, forming a cooling water cycle.

[0050] In the preferred embodiment of the drum-type vacuum plasma cleaning device of the present invention as described above, the water inlet channel is arranged at the central axis of the electrode rod 26, and the drainage channel is an annular channel sleeved around the outside of the water inlet channel; a shielding cover is arranged outside the outer end of the electrode rod 26. Preferably, the water inlet channel in the electrode rod is a channel located at the central axis of the electrode rod, and the drainage channel is an annular channel dispersed after the water inlet channel reaches the inner end, returns to the outer end of the electrode rod 26, and discharges the heated cooling water outward; thereby, the low-temperature cooling water can enter the interior of the electrode rod as much as possible, and after entering the annular drainage channel closer to the surface of the electrode rod, it can effectively expand the heat conduction contact area, and play a better cooling effect on the electrode rod.

[0051] The drum type vacuum plasma cleaning device of the present invention as described above, in its preferred embodiment, please refer to Figures 1 to 4 The top of the vacuum chamber 9 is provided with a matcher 10 connecting the plasma RF power supply and the electrode rod 26; the outside of the vacuum air hole is provided with a vacuum valve 16 and a vacuum gauge 19, and the central disk 39 is provided with a vacuum breaking valve hole, and the vacuum breaking valve hole is sealed and connected to the outside of the vacuum chamber 9 with a breaking valve 20; the inner side surface of the roller 26 is provided with a support bar 30 extending along the length direction of the roller, and the support bar 30 is provided with inclined surfaces on both sides, and a circular chamfer is provided on the top; the inner side surface of the vacuum chamber is provided with a rotating support structure for keeping the axis of the roller coaxial with the vacuum chamber 9; the chamber door 28 is provided with a visual window; the door lock of the chamber door 28 is provided with a sensor.

[0052] In this preferred embodiment, as shown in the figure, the control cabinet has multiple functional devices arranged inside the cabinet, which is connected to the roller device through the rear harness tube 18 to control the overall operation of the equipment. The power supply 2 is a plasma radio frequency power supply, and a visual window is provided to timely observe the working status of the power supply. The chiller 3 is connected to the electrode in the shielding cover 21 through the harness tube 18 to achieve the purpose of cooling the electrode rod. The touch-screen operation panel 4 controls the equipment through the control system, and all operating steps and process parameters are set accordingly. The button operation area 5 is provided with a key switch, an emergency stop button, and three upper, middle and lower position buttons (upward, horizontal and downward) in this area, through which the equipment can be manually operated. The status indicator 6 can display the working status of the equipment in real time. The rack 8, the vacuum chamber is fixed above this rack. The cylindrical vacuum chamber 9, this vacuum chamber controls the lifting mechanism 13 to swing up or down through the program button operation, for example, when the equipment is loaded, it is tilted up, and when it is unloaded, it is tilted down. Matcher 10, this part is fixed above the vacuum chamber and moves synchronously with the chamber. A motion mechanism is provided in the chamber of the vacuum chamber. When plasma is generated, it is unstable due to the movement. The matcher is used to match the load in the vacuum chamber to achieve a stable plasma output state. Hopper 11, after the material is processed, the vacuum chamber is tilted downward by controlling the lifting mechanism 13, and the chamber door 26 is opened, and the material is poured into the receiving box below to prevent the material from being damaged due to the high distance when pouring. Vacuum pump 12, connected to the internal chamber of the vacuum chamber through vacuum hose 22, controls the required vacuum degree in the vacuum chamber. Lifting mechanism 13, lifts and drags the vacuum chamber to move through the pull rod mechanism. Visual observation window 14, the operation inside the chamber can be observed. Integrated casters can be used to easily move the equipment. Vacuum valve 16, when the control system gives a signal, the valve is opened, the vacuum chamber begins to be emptied, and the standard atmospheric pressure state is restored. Shielding covers 17, 21, are used to isolate radio frequency 13.56Mhz electromagnetic waves. Wire harness tube 18, the pipe connecting the control cabinet and the vacuum chamber circuit. Vacuum gauge 19, detects the vacuum degree in the vacuum chamber, which is controlled and displayed on the touch display panel of the equipment through the control system, and the preferred display range is 1-103000pa. Hole-breaking valve 20, after the equipment process steps are completed, the valve is opened through program control to break the vacuum, so that the vacuum chamber is restored to the standard atmospheric pressure state. Vacuum hose 22, the pipe connecting the vacuum pump to the vacuum chamber, is used to extract the air in the chamber. The pipe is made of flexible material and can be deformed with the movement of the vacuum chamber. Cabinet exhaust fan 23, multiple exhaust fans are set on the cabinet to dissipate heat from the components inside the cabinet. Equipment process board 24, access to the power supply, gas source, external signals, etc. required for the operation of the equipment. The rear door panel 25 of the cabinet is facing the built-in RF 13.56Mhz power supply. The power supply is a high-voltage output. This door panel is set to be locked and must be opened by removing the screws to ensure the safe and normal operation of the plasma RF power supply.Electrode rod 26, plasma radio frequency power source generates plasma in the cavity through this device, and when heat is generated, it is cooled by chiller 3. Fixed shaft 27 of vacuum cavity, this shaft is installed in the bearing on the frame to achieve the purpose of cavity movement. Cavity door 28, the door panel is opened and closed manually, and a sensor structure is provided on the cavity door, and the open or closed state of the door is fed back by the sensor. Drum 29, the drum is controlled to rotate by the drum variable frequency motor 15, and the speed can be set through the operation panel. Drum support bar 30, there will be stress difference when the drum rotates, and deformation of the cavity can be avoided by this device.

[0053] In a preferred embodiment of the present invention, the specified cleaning method steps are adopted to achieve better cleaning effects, adopt the optimal cleaning time, reduce the production cost of users, and effectively improve the competitiveness of products. Preferably, the plasma cleaning steps of product materials are as follows:

[0054] Open the chamber door, and lift the opening end of the vacuum chamber by controlling the lifting mechanism through the host, keep the vacuum chamber in an upward state, and pour the material to be cleaned into it; then control the lifting mechanism to return the vacuum chamber to a horizontal state, and close the chamber door;

[0055] Start the vacuum pump, open the vacuum valve, and start the vacuum pump to evacuate the inside of the vacuum chamber; when the vacuum degree reaches 50pa, start the drum variable frequency motor to drive the drum to rotate, and the speed of the drum is 8rpm;

[0056] When the vacuum degree in the vacuum chamber reaches 30pa, process gas is filled in. When the argon flow rate reaches 100sccm, the plasma RF power supply is started to output energy between the electrode rod and the roller, and plasma is generated and filled in the vacuum chamber; the chiller is started, the temperature is set to 28℃, the power is 800 watts, and the material is plasma cleaned for 50 seconds;

[0057] The process gas argon is filled in with a flow rate of 80 sccm, the drum speed is maintained at 8 rpm, and the material is plasma cleaned for 50 seconds;

[0058] The process gas argon was filled in with a flow rate of 50 sccm, the drum speed was kept at 5 rpm, and the material was plasma cleaned for 200 seconds;

[0059] After repeating the above-mentioned gas cleaning process 5 times, the treatment is completed, the plasma RF power supply is turned off, the process gas source is turned off, the vacuum pump and the vacuum valve are turned off, the air breaking valve is opened, the pressure in the vacuum chamber returns to the standard atmospheric pressure value, and the vacuum breaking action is completed; the chamber door is opened, the cavity mouth of the vacuum chamber is controlled to tilt downward, and the cleaned product material is poured out.

[0060] Stop the rotation of the drum and the input of process gas, close the energy output of the electrode rod, and automatically start the air-breaking valve;

[0061] The chamber door is opened, and the vacuum chamber opening is controlled to tilt downward to pour out the processed material.

[0062] The drum-type vacuum plasma cleaning device of the present invention adopts the above-mentioned preferred cleaning step method to achieve a better cleaning effect. It can not only realize high-quality cleaning of large quantities of small product materials, but also effectively reduce the user's cleaning time and reduce cleaning costs.

[0063] The drum-type vacuum plasma cleaning device of the present invention, by cleverly using the structure of the drum, completely changes the general cleaning method of placing products for spraying. In particular, it can be used for small products, or even for products with complex structures that are not on a single plane, to simultaneously perform large-scale single cleaning operations; there is no need to fix the cleaning products, and the drum tumbling method is adopted to achieve comprehensive cleaning of the product surface state in all directions, which not only doubles the number of products cleaned in a single time, but also can achieve a good cleaning effect, greatly improving the processing efficiency; further, the drum cleaning method changes the conventional loading and unloading methods in the past, reduces the complexity and number of manual operations, reduces the production cost of users for product cleaning and processing, and is more competitive in the market for surface treatment of large quantities of small materials.

[0064] The above description is only an illustrative embodiment of the present invention and is not intended to limit the scope of the present invention. Any equivalent changes and modifications made by any person skilled in the art without departing from the concept and principle of the present invention shall fall within the scope of protection of the present invention.

Claims

1. A drum type vacuum plasma cleaning device, characterized in that: It comprises a control cabinet and a cleaning body, wherein a control host and a power supply are arranged in the control cabinet, and the cleaning body is provided with a frame and a roller device, wherein the frame is a vertical U-shaped frame, and roller fixing parts are arranged on the upper parts of both sides thereof, and the roller device comprises a horizontally placed cylindrical vacuum chamber, and fixed shafts are arranged on both sides thereof, and the fixed shafts can be rotatably fixed in the fixing parts; a chamber door is arranged at the front end of the vacuum chamber, and after the chamber door is closed, a sealed space is formed in the vacuum chamber; a roller coaxially arranged with the vacuum chamber is arranged in the chamber, and a rotating connection structure is arranged at the bottom of the roller, and the rotating connection structure and the cylindrical bottom surface of the vacuum chamber can be relatively rotatably fixed together; The rotating connection structure includes a fixed part and a rotating part, the fixed part is provided with an electrode mounting hole, a vacuum air hole and a process air hole connected to the outside, an electrode rod is sealed and inserted in the electrode mounting hole, the electrode rod is electrically connected to the power supply, the process air hole is connected to a process gas source device, and the vacuum air hole is connected to a vacuum pump; the rotating part is linked to a drum frequency conversion motor arranged outside the vacuum chamber to drive the drum to rotate; a lifting mechanism is provided on one side below the vacuum chamber to push the vacuum chamber to rotate around the fixed axis; the control host is electrically connected to and controls the power supply, lifting mechanism, vacuum pump, process gas source device and drum frequency conversion motor.

2. The drum type vacuum plasma cleaning device according to claim 1, characterized in that: The roller fixing part is provided with a roller rotation connection mechanism, and the roller rotation connection mechanism is provided with a fixed shaft base and a fixed bearing assembly, the fixed shaft base protrudes outward to fix the fixed shaft, and the other side of the fixed shaft base is fixed to an arc surface connection seat, the inner side of the arc surface connection seat is an arc surface that fits the outer surface of the vacuum chamber, and the arc surface connection seat is fixed on the outer surface of the vacuum chamber; the fixed bearing assembly includes an Ω-shaped bearing seat sleeve, a rotating bearing is arranged in the bearing seat sleeve, and the fixed shaft is inserted into the rotating bearing and fixed; a connecting seat plate is provided between the bottom of the bearing seat sleeve and the top of the frame.

3. The drum type vacuum plasma cleaning device according to claim 2, characterized in that: The roller rotation connection mechanism is provided with a positioning device, which includes a positioning point plate arranged on the fixed shaft base, and a detection point plate arranged on the connecting seat plate; the positioning point plate is provided with at least three positioning nail holes at a position away from the fixed shaft at a specified distance, and at different angles around the fixed shaft, and a positioning head is fixed on the positioning nail hole protruding outward; the detection point plate is an L-shaped plate fixed on the connecting seat plate and bent upward, and detection holes with the same number as the positioning heads are opened at the specified positions of the upward vertical part thereof, and detection sensors are respectively installed on the detection holes, and each of the detection sensors is arranged opposite to one side of the positioning head, and the positioning point plate rotates within a set angle range as the fixed shaft rotates, and within the angle range, each of the positioning heads will only coincide with the center of a corresponding detection sensor once.

4. The drum type vacuum plasma cleaning device according to claim 1, characterized in that: A rotating connection structure is provided between the bottom of the drum and the corresponding bottom surface of the vacuum chamber, and the rotating connection structure includes a fixed part of a center disk and a rotating part of a bottom ring. The center disk is fixed to the inner side of the bottom surface of the vacuum chamber and is concentrically arranged with the bottom surface of the vacuum chamber. A rotating wheel is provided on the outer peripheral side surface of the center disk at a fixed angle distance, and the rotating wheel protrudes from the outer peripheral surface of the center disk. The bottom of the drum is a circular ring structure, the inner diameter of the circular ring matches the outer diameter of the center disk, the thickness of the center disk is greater than the thickness of the bottom ring, the bottom ring is sleeved on the outer periphery of the center disk, and the inner side surface of the circular ring is directly facing and contacting the rotating wheel. A rotating transmission track is provided on the side of the bottom ring facing the bottom surface of the vacuum chamber, and the output end of a sealed coupling passes through the transmission hole on the bottom surface of the vacuum chamber and is linked to the rotating transmission track. The sealed coupling is fixed to the outer side of the bottom surface of the vacuum chamber, and the coupling is connected with the drum frequency conversion motor.

5. The drum type vacuum plasma cleaning device according to claim 4, characterized in that: The rotating wheel is a metal bearing, which is installed in a roller groove opened in the periphery of the center disk. The roller groove is provided with an opening on the outer peripheral surface of the center disk, and the outer peripheral edge of the bearing protrudes from the opening and can rollably contact the inner peripheral surface of the cylinder bottom ring; the roller groove is provided with connected locking screw hole grooves on both sides, and the roller groove and the locking screw hole groove are covered with a groove cover plate, which is locked to the screw holes of the locking screw hole groove by bolts, and the outer side surface of the groove cover plate is flush with the surface of the center disk; the rotating transmission track is a groove with meshing teeth on the side of the track, and the side of the terminal end of the output end of the sealing coupling is provided with meshing teeth matching the meshing teeth, and the output end of the sealing coupling rotates to drive the cylinder bottom circle to rotate around the center disk.

6. The drum type vacuum plasma cleaning device as claimed in claim 5, characterized in that: The electrode rod is installed on the electrode mounting hole of the central disk. The electrode mounting hole is arranged at the center of the central disk, or when the central disk is arranged vertically, is located at a position inside the central disk away from the center by a set distance.

7. The drum type vacuum plasma cleaning device according to claim 1 or 6, characterized in that: The electrode rod is sealed and passes through the electrode mounting hole and is insulated from the electrode mounting hole. The inner end of the main body portion extends to a set distance inside the roller; the outer end portion protrudes outside the bottom surface of the vacuum chamber and is electrically connected to one pole of a plasma RF power supply; the other pole of the plasma RF power supply is electrically connected to the roller, and the electrode rod and the cylinder wall of the roller form two poles of the discharge power process gas.

8. The drum type vacuum plasma cleaning device according to claim 7, characterized in that: A cooling water channel is provided in the electrode rod, and the cooling water channel includes a water inlet channel and a drainage channel. The water inlet channel extends from the water inlet at the end of the outer end of the electrode rod to the inner end of the electrode rod. The drainage channel is connected with the water inlet channel at the end of the inner end of the electrode rod, and is arranged in parallel with the water inlet channel, extending to the drainage port at the outer end of the electrode rod. The water inlet and the drainage port are respectively connected to a chiller via a hose bundle.

9. The drum type vacuum plasma cleaning device according to claim 8, characterized in that: The water inlet channel is arranged at the central axis of the electrode rod, and the drainage channel is an annular channel sleeved around the outside of the water inlet channel; a shielding cover is arranged on the outside of the outer end of the electrode rod.

10. The drum type vacuum plasma cleaning device according to claim 1 or 9, characterized in that: A matcher connecting a plasma radio frequency power supply and an electrode rod is provided on the top of the vacuum chamber; a vacuum valve and a vacuum gauge are provided outside the vacuum air hole, a vacuum breaking valve hole is provided on the central disc, and the vacuum breaking valve hole is sealed and connected to a vacuum breaking valve outside the vacuum chamber; a support bar extending along the length direction of the roller is provided on the inner side of the roller, and inclined surfaces are provided on both sides of the support bar, and an arc chamfer is provided on the top; a rotating support structure is provided on the inner side of the vacuum chamber to keep the axis of the roller coaxial with the vacuum chamber; a visual window is provided on the chamber door; and a sensor is provided on the door lock of the chamber door; Also includes plasma cleaning steps for product materials: Open the chamber door, and lift the opening end of the vacuum chamber by controlling the lifting mechanism through the host, keep the vacuum chamber in an upward state, and pour the material to be cleaned into it; then control the lifting mechanism to return the vacuum chamber to a horizontal state, and close the chamber door; Start the vacuum pump, open the vacuum valve, and start the vacuum pump to evacuate the inside of the vacuum chamber; when the vacuum degree reaches 50pa, start the drum variable frequency motor to drive the drum to rotate, and the speed of the drum is 8rpm; When the vacuum degree in the vacuum chamber reaches 30 Pa, process gas is filled in. When the argon gas flow rate reaches 100 sccm, the plasma RF power supply is started to output energy between the electrode rod and the roller, and plasma is generated and filled in the vacuum chamber. Start the chiller, set the temperature to 28°C and the power to 800 watts, and perform plasma cleaning on the material for 50 seconds; The process gas argon is filled in with a flow rate of 80 sccm, the drum speed is maintained at 8 rpm, and the material is plasma cleaned for 50 seconds; The process gas argon was filled in with a flow rate of 50 sccm, the drum speed was kept at 5 rpm, and the material was plasma cleaned for 200 seconds; After repeating the above-mentioned gas cleaning process 5 times, the treatment is completed, the plasma RF power supply is turned off, the process gas source is turned off, the vacuum pump and the vacuum valve are turned off, the air breaking valve is opened, the pressure in the vacuum chamber returns to the standard atmospheric pressure value, and the vacuum breaking action is completed; the chamber door is opened, the cavity mouth of the vacuum chamber is controlled to tilt downward, and the cleaned product material is poured out. Stop the rotation of the drum and the input of process gas, close the energy output of the electrode rod, and automatically start the air-breaking valve; The chamber door is opened, and the vacuum chamber opening is controlled to tilt downward to pour out the processed material.

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