Co-production system and method for preparing quartz and nano silicon dioxide powder

Abstract

The invention discloses a co-production system and method for preparing quartz and nano silicon dioxide powder, and relates to the technical field of quartz material preparation, and the co-production system for preparing quartz and nano silicon dioxide powder comprises deposition equipment, a powder collector and sintering equipment. The deposition equipment is used for performing a vapor deposition process to deposit silicon dioxide powder on the target rod to form a quartz rod loose body; a powder outlet is formed in the deposition equipment; the powder collector is communicated with the powder outlet; and the sintering equipment is used for sintering the quartz rod loose body to obtain the quartz rod. The method can improve the efficiency and reduce the cost.

Description

Technical Field

[0001] The invention relates to the technical field of quartz material preparation, and in particular to a co-production system and method for preparing quartz and nano silicon dioxide powder. Background Art

[0002] The current mainstream two-step synthesis process of quartz materials mainly uses vapor axial deposition or external vapor deposition as the core preparation technology. This process system mainly includes two key stages: first, a porous quartz silicon dioxide powder preform is constructed on the surface of a rotating target rod through a precisely controlled chemical vapor deposition process, and then a vitrification sintering process is performed under high temperature vacuum or specific protective atmosphere conditions to finally obtain a high-purity quartz material with a specific crystal structure.

[0003] During the implementation of the two deposition processes, in order to maintain an ideal gas phase transport dynamics environment and accurately control the deposition rate, the system needs to continuously perform gas suction to maintain the dynamic balance in the reaction chamber. This process characteristic directly leads to a large amount of ineffectively deposited raw gas precursors being discharged from the reaction system with the gas flow, resulting in significant raw material loss problems. Specifically, due to the geometric limitations of axial deposition, the raw material utilization rate of the axial method is maintained at about 45%; and although the radial deposition mode external vapor deposition method increases the raw material utilization rate to 55% by optimizing the flow field distribution, there is still a lot of room for improvement overall. This process loss not only directly pushes up the raw material cost, but also increases the load on the exhaust gas treatment system, which ultimately leads to the high comprehensive production cost of synthetic quartz materials, becoming a key factor restricting the large-scale development of the industry. Summary of the invention

[0004] The purpose of the present invention is to provide a system and method for preparing quartz and nano-silicon dioxide powder, so as to solve the problems existing in the above-mentioned prior art, improve efficiency and reduce cost.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] The present invention provides a co-production system for preparing quartz and nano-silicon dioxide powder, comprising: a deposition device, a powder collector and a sintering device. The deposition device is used for performing a vapor deposition process to deposit silicon dioxide powder on a target rod to form a quartz rod loose body; the deposition device is configured with a powder outlet; the powder collector is connected to the powder outlet; and the sintering device is used for sintering the quartz rod loose body to obtain a quartz rod.

[0007] Preferably, the powder collector is connected to the powder outlet via a conveying pipe, and the conveying pipe is made of quartz.

[0008] Preferably, a reaction chamber is constructed in the deposition equipment, the vapor deposition process is carried out in the reaction chamber, a vacuum hood is arranged on the top of the reaction chamber, the powder outlet is arranged on the vacuum hood, and the vacuum hood is made of quartz material.

[0009] Preferably, it also includes an exhaust system and a waste gas treatment system, the inlet of the exhaust system is connected to the powder collector, the outlet of the exhaust system is connected to the waste gas treatment system, and the exhaust system is used to extract the powder not collected by the powder collector into the waste gas treatment system.

[0010] Preferably, the deposition equipment is used to perform an external vapor deposition process.

[0011] Preferably, the blowtorch group in the deposition device includes a plurality of blowtorches, which are arranged in a row in sequence along a direction parallel to the target rod, and the blowtorch group is arranged on a translation device, which can drive the blowtorch group to reciprocate along a direction parallel to the target rod.

[0012] Preferably, the blowtorch assembly is disposed directly below or to the lower side of the target rod.

[0013] Preferably, it also includes a lifting device for driving the blowtorch group to rise and fall, and a detection device for detecting the diameter of the loose body of the quartz rod. When the detection device detects that the diameter of the loose body of the quartz rod reaches a set value, the lifting device is controlled to drive the blowtorch group to descend to ensure that the distance between the blowtorch group and the target rod is within the set range.

[0014] Preferably, the powder collector includes a first collecting structure and a second collecting structure, the first collecting structure is provided with an inlet and an exhaust port, the inlet is connected with the powder outlet, the exhaust port is connected with the inlet of the exhaust system, a collecting assembly is provided in the collecting chamber of the first collecting structure, the collecting assembly can swing, and a storage chamber is constructed in the second collecting structure, the storage chamber is located below the first collecting structure and is connected with the collecting chamber.

[0015] The present invention also provides a method for preparing quartz and nano-silicon dioxide powder by co-production, comprising:

[0016] While preparing the quartz rod loose body by using the vapor deposition process, the undeposited powder is collected to obtain the nano silicon dioxide powder;

[0017] The quartz rod loose body is sintered by a sintering process to obtain a quartz rod.

[0018] Compared with the prior art, the present invention has achieved the following technical effects:

[0019] The device and method provided by the present invention can simultaneously produce a quartz rod loose body and high-purity nano-silicon dioxide powder, and then the quartz rod loose body can be made into a quartz rod product after being treated by a vacuum sintering process; this achieves the purpose of simultaneously preparing the quartz rod and the high-purity nano-silicon dioxide powder, and improves production efficiency. In addition, since the raw material of the high-purity nano-silicon dioxide powder comes from the silicon dioxide powder that is not deposited on the surface of the target rod in the vapor deposition process, the purpose of waste recycling is achieved, raw materials are saved, and the preparation cost is reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0021] Figure 1 A schematic diagram of the structure of a deposition device and a powder collector in a co-production system for preparing quartz and nano-silicon dioxide powder provided by the present invention;

[0022] Figure 2 A schematic diagram of the structure of a sintering device in a co-production system for preparing quartz and nano-silicon dioxide powder provided by the present invention;

[0023] Figure 3 is an axonometric view of the powder collector in the first mode;

[0024] Figure 4 It is a front view of the powder collector in the first mode;

[0025] Figure 5 is a cross-sectional view of a powder collector in the first embodiment;

[0026] Figure 6 It is a schematic diagram of the collecting sheet, rotating shaft and driving structure of the powder collector in the first mode;

[0027] Figure 7 is an axonometric view of a powder collector in the second embodiment;

[0028] Figure 8 is a front view of the powder collector in the second embodiment;

[0029] Fig. 9 is a cross-sectional view of a powder collector in the second embodiment;

[0030] Fig.10 A schematic diagram of a collecting sheet and a rotating shaft of a powder collector in the second embodiment;

[0031] Fig.11 A schematic diagram of the location of the pressure sensor when using the pressure sensor to detect the change in the loose weight of the quartz rod;

[0032] In the figure:

[0033] 100-powder collector; 200-deposition equipment; 300-sintering equipment; 1-first collecting structure; 2-collecting upper cavity; 3-collecting lower cavity; 4-collecting sheet; 5-valve; 6-second collecting structure; 7-exhaust baffle; 8-inlet; 9-exhaust port; 10-rotating shaft; 11-connecting rod; 12-rocker; 13-exhaust hood; 14-conveying pipeline; 15-blowtorch; 16-reaction cavity; 17-translation equipment; 18-quartz rod loose body; 19-working head; 20-support plate; 21-support body; 22-pressure sensor; 23-driving assembly. DETAILED DESCRIPTION

[0034] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0035] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0036] In the existing quartz rod preparation process, the excess silicon dioxide powder produced will be contaminated after being treated by environmental protection equipment, and it will not be able to achieve the high purity required by the corresponding application. The existing high-purity nano-silicon dioxide market is out of touch with the traditional production process. Based on this, the present application provides a co-production system and method for preparing quartz and nano-silicon dioxide powder to produce high-purity quartz while collecting pure nano-silicon dioxide powder, solving the common problems of the existing technology of "single product, high cost, and low efficiency".

[0037] Combine the following Figures 1 to 11 , describing an embodiment of the present invention.

[0038] Embodiment 1

[0039] The present invention provides a co-production system for preparing quartz and nano-silicon dioxide powder, comprising: a deposition device 200, a powder collector 100 and a sintering device 300. The deposition device 200 is used to perform a vapor deposition process to deposit silicon dioxide powder on a target rod to form a quartz rod loose body 18; the deposition device 200 is configured with a powder outlet; the powder collector 100 is connected to the powder outlet; and the sintering device 300 is used to sinter the quartz rod loose body 18 to obtain a quartz rod, preferably vacuum sintering.

[0040] The device provided by the present invention can simultaneously produce a quartz rod loose body 18 and high-purity nano-silicon dioxide powder, and then the quartz rod loose body 18 can be made into a quartz rod product after being treated by a vacuum sintering process; this achieves the purpose of simultaneously preparing the quartz rod and the high-purity nano-silicon dioxide powder, and improves production efficiency. In addition, since the raw material of the high-purity nano-silicon dioxide powder comes from the silicon dioxide powder that is not deposited on the surface of the target rod in the vapor deposition process, the purpose of waste recycling is achieved, raw materials are saved, and the preparation cost is reduced.

[0041] In some embodiments, the powder collector 100 is connected to the powder outlet through the delivery pipe 14, and the delivery pipe 14 is made of quartz. In the existing metal pipes, HCL and H2O are produced during the hydrolysis reaction of the deposition. The combination of the two is hydrochloric acid, which will corrode the metal material, causing impurities such as rust to be mixed into the collected silica powder, affecting the purity. The delivery pipe 14 in this embodiment is made of quartz, which will not be corroded by silica powder. Compared with the metal pipe, this embodiment can avoid silica corroding the metal and contaminating the collected product.

[0042] In some embodiments, a reaction chamber 16 is constructed in the deposition equipment 200, and the vapor deposition process is carried out in the reaction chamber 16. A vacuum hood 13 is arranged on the top of the reaction chamber 16, and a powder outlet is arranged on the vacuum hood 13. The vacuum hood 13 is made of quartz material.

[0043] The area of ​​the air inlet of the exhaust hood 13 provided in this embodiment is much larger than the cross-sectional area of ​​the delivery pipe 14, which enables the gas in the reaction chamber 16 to be more evenly sucked into the exhaust hood 13, thereby making the airflow in the area where the target rod is located more uniform, thereby improving the uniformity of deposition.

[0044] In some embodiments, the embodiments of the present invention also include an exhaust system and an exhaust gas treatment system, the inlet of the exhaust system is connected to the powder collector 100, and the outlet of the exhaust system is connected to the exhaust gas treatment system, and the exhaust system is used to extract the powder not collected by the powder collector 100 into the exhaust gas treatment system.

[0045] The exhaust system in this embodiment can be used as a power source for suction of the deposition device 200 to achieve the desired negative pressure state in the reaction chamber 16. For example, the negative pressure value is usually maintained between -20Pa and -5Pa. This can also ensure the purity of the silicon dioxide powder sucked into the powder collector 100 and prevent it from contacting metal components.

[0046] In some embodiments, the deposition apparatus 200 is used to perform an external vapor deposition process, such as Figure 1 As shown, horizontal external gas phase equipment.

[0047] The deposition device 200 in this embodiment uses an oxyhydrogen flame, a methane flame, etc. as a stable heat source. When the device is running, gaseous halides (typical substances such as silicon tetrachloride SiCl4) are accurately carried and transported to the flame area. The gaseous halides rapidly undergo a hydrolysis reaction under the high temperature of the flame to generate quartz (SiO2) particle dust. Under the synergistic effect of the thermophoresis effect and various other physical effects, a portion of these dusts will gradually deposit on the outer surface of the "mother rod" layer by layer in an extremely slow and orderly manner. The "mother rod" is the target rod in the above embodiment. In this way, after a repeated deposition process, the deposition operation is officially terminated until the quartz deposited on the outer surface of the "mother rod" reaches a preset size specification.

[0048] In some embodiments, the blowtorch group in the deposition device 200 includes a plurality of blowtorches 15, which are arranged in a row in a direction parallel to the target rod. The blowtorch group is arranged on a translation device 17, and the translation device 17 can drive the blowtorch group to move back and forth in a direction parallel to the target rod.

[0049] This embodiment is to ensure full and even coverage of the deposition area.

[0050] The target rod in the deposition device 200 is firmly fixed on two synchronously rotating work heads 19 through a dedicated high-precision tooling. The two work heads 19, driven by a high-performance drive device, can achieve highly synchronized rotational motion, thereby driving the target rod to rotate stably and at a uniform speed. With the continuous rotation of the target rod and the reciprocating motion of the blowtorch 15, the generated powder can be evenly and accurately deposited on the surface of the target rod.

[0051] In some embodiments, the blowtorch group is arranged directly below or to the lower side of the target rod. It is worth mentioning that, no matter whether the blowtorch group is directly below or to the lower side of the target rod, the spray direction of the blowtorch group is aimed at the target rod. For example, the blowtorch group can be arranged to the lower side, and in this state, the maximum angle between the spray direction of the blowtorch group and the vertical plane passing through the center of the target rod is 30°.

[0052] In some embodiments, the embodiments of the present invention also include a lifting device for driving the blowtorch group to lift and lower, and a detection device for detecting the diameter of the quartz rod loose body 18. When the detection device detects that the diameter of the quartz rod loose body 18 reaches a set value, the lifting device is controlled to drive the blowtorch group to descend to ensure that the distance between the blowtorch group and the target rod is within the set range.

[0053] The torch 15 in this embodiment has a flexible lifting function. As the deposition process continues, the diameter of the quartz rod loose body 18 gradually increases, and the torch 15 will gradually descend accordingly according to the preset algorithm and sensor feedback, so as to always maintain the optimal distance between the torch 15 and the target rod (this distance can be dynamically and accurately adjusted according to actual process requirements).

[0054] In some examples, a sensor can be used to detect the diameter of the quartz rod loose body 18, generally a pressure sensor 22 is used. As the deposition proceeds, the weight of the quartz rod loose body 18 gradually increases. Combined with the density of the quartz rod loose body 18, the real-time diameter of the rod can be calculated, and the height of the blowtorch 15 can be controlled by this. Generally, it is deposited after descending a certain distance, rather than continuously descending. The specific descending rule is set according to the process conditions.

[0055] Specifically, Fig.11 As shown, the target rod and a driving assembly 23 for driving the target rod to rotate are arranged on a support frame or a support plate 20, the support frame or the support plate 20 is in a horizontal state, one side of the support frame or the support plate 20 is hingedly connected to a support body 21 so as to be rotatable around a horizontal axis, and a pressure sensor 22 is arranged below the support frame or the support plate 20, and the pressure is transmitted through the force transmission rod and the support frame or the support plate 20, thereby, the pressure sensor 22 can sense the change of gravity of the quartz rod loose body 18 on the target rod, and then calculate the real-time diameter.

[0056] Of course, in some examples, a visual sensor, i.e., a camera, can be used to capture the relative position relationship between the quartz rod loose body 18 and the blowtorch 15, and then a preset algorithm is used to obtain the spacing between the quartz rod loose body 18 and the blowtorch 15, and then the up and down movement of the blowtorch 15 is controlled based on the comparison between the actual spacing information and the required spacing.

[0057] The entire deposition reaction in the present invention is carried out in a closed reaction chamber 16. The cavity wall is generally designed with a high-strength, corrosion-resistant solid metal structure to ensure good sealing and excellent mechanical strength. The reaction chamber 16 is also equipped with an efficient air supply system that can purify the air. The system cooperates with the exhaust system and cooperates accurately to maintain a stable negative pressure environment inside the cavity, and the negative pressure value is usually maintained between -20Pa and -5Pa. The exhaust cavity is formed in the exhaust hood and is arranged directly above the target rod, and the air supply system is reasonably arranged on the side and below the target rod. By cleverly setting the wind direction baffle, the air around the target rod can be effectively guided to flow in a vertical upward direction, and the air flow rate can be strictly controlled within a small range, generally not exceeding 1m / s. This is because excessive air flow rate will significantly interfere with the shape of the deposition flame, thereby seriously affecting the quality and effect of the deposition.

[0058] Specifically, the wind direction baffle includes a plurality of vertically arranged baffles with air holes arranged on one side of the air supply outlet (horizontal air supply) of the air supply system, and a plurality of horizontal baffles arranged above the vertical baffles. The horizontal baffles are arranged in multiple layers, and the vertical baffles can be arranged in multiple layers. It should be noted that the air holes on two adjacent baffles need to be staggered.

[0059] In some embodiments, the powder collector 100 includes a first collecting structure 1 and a second collecting structure 6. The first collecting structure 1 is provided with an inlet and an exhaust port. The inlet is connected to the powder outlet, and the exhaust port is connected to the inlet of the exhaust system. A collecting component is provided in the collecting chamber of the first collecting structure 1, and the collecting component can swing. A storage chamber is constructed in the second collecting structure 6, and the storage chamber is located below the first collecting structure 1 and is connected to the collecting chamber.

[0060] There are two specific implementations of the powder collector 100, wherein the first implementation is as follows:

[0061] like Figure 3 to Figure 6 As shown, the powder collector 100 includes a first collecting structure 1 and a second collecting structure 6. The first collecting structure 1 is provided with an inlet 8 and an air outlet 9. The inlet 8 is used to connect with the conveying pipeline 14. A collecting assembly is provided in the collecting chamber of the first collecting structure 1, and the collecting assembly can swing. The air outlet 9 of the first collecting structure 1 is connected to the air exhaust system, so that the gas containing the silicon dioxide powder can enter the first collecting structure 1 through the inlet 8 and form a gas flow. The gas containing the silicon dioxide powder enters the first collecting structure 1 and contacts with the collecting assembly. The silicon dioxide powder is deposited on the collecting assembly. When the silicon dioxide powder reaches a certain amount, the silicon dioxide powder falls into the second collecting structure 6.

[0062] Specifically, in this embodiment, the first collecting structure 1 is made of quartz or metal material, and the collecting chamber in the first collecting structure 1 is divided into an upper collecting chamber 2 and a lower collecting chamber 3. The upper collecting chamber 2 is located above the lower collecting chamber 3, and the inlet 8 is located at the top of the upper collecting chamber 2. The exhaust port 9 is located in the lower collecting chamber 3 and on the corresponding side wall of the lower collecting chamber 3.

[0063] In this embodiment, the collection assembly includes a plurality of collection sheets 4, which are flat plate structures. The plurality of collection sheets 4 are arranged in parallel in a natural state. The natural state of the collection sheet 4 refers to a state without external force. The center line of the inlet 8 is parallel to the plane where the collection sheet 4 is located in the natural state. The upper end of the collection sheet 4 is connected to the first collection structure 1 through a rotating shaft 10, and the rotating shaft 10 is rotatably connected to the first collection structure 1. The collection sheet 4 and the rotating shaft 10 are both made of quartz. The silicon dioxide powder enters the collection upper cavity 2 from the inlet 8 and contacts the collection sheet 4. The silicon dioxide powder in the gas is slowly deposited on the collection sheet 4. The collection sheet 4 is used to perform preliminary deposition and collection of the silicon dioxide powder.

[0064] This embodiment also includes a driving structure, which is used to drive the collection assembly to swing. The driving structure includes a power structure, a swing rod 12 and a connecting rod 11. The power structure is a structure that can achieve linear drive, such as a cylinder, a hydraulic cylinder or an electric telescopic rod. The power output end of the power structure is hinged to the swing rod 12, one end of the connecting rod 11 is hinged to the swing rod 12, and the other end of the connecting rod 11 is connected to the rotating shaft 10. The power structure drives the swing rod 12 to move, and drives the collection sheet 4 to swing back and forth through the connecting rod 11 and the rotating shaft 10.

[0065] In the present embodiment, an exhaust baffle 7 is provided in the first collecting structure 1, and the exhaust baffle 7 is located at the exhaust port 9. One end of the exhaust baffle 7 is hinged to the first collecting structure 1, and the exhaust baffle 7 is used to prevent the falling silica powder from being directly drawn away from the exhaust port 9 during exhaust. In the present embodiment, an elastic retaining structure is provided between the exhaust baffle 7 and the first collecting structure 1, and the elastic retaining structure is a spring.

[0066] In this embodiment, the second collection structure 6 is located below the first collection structure 1. The second collection structure 6 is used to finally collect and store the silicon dioxide powder. A valve 5 is provided between the first collection structure 1 and the second collection structure 6. The valve 5 is used to seal and store the collected silicon dioxide powder. When the second collection structure 6 is filled with silicon dioxide powder, the valve 5 can be closed and the second collection structure 6 can be replaced to achieve uninterrupted collection.

[0067] In this embodiment, the inlet 8 is used to connect with the conveying pipe 14. After the excess high-temperature nano-silicon dioxide powder is discharged from the outlet of the conveying pipe 14, it enters the upper collecting cavity 2 through the inlet 8. A swingable collecting sheet 4 is arranged inside the first collecting structure 1. The collecting sheet 4 is connected to the external swing rod 12 through the rotating shaft 10. The swing rod 12 moves after applying external force through the driving structure, so that the dust on the collecting sheet 4 falls to the bottom through swinging, and enters the second collecting structure 6 through the collecting lower cavity 3 to complete the collection. The collecting lower cavity 3 is provided with an exhaust port 9, which is used to connect with the exhaust system. When the exhaust system is running, a low-speed air flow can be formed in the first collecting structure 1, driving the dust flow to complete the deposition on the collecting sheet 4. The front end of the exhaust port 9 is provided with an exhaust baffle 7 that forms an angle with the end face of the exhaust port 9, which is used to prevent the dust from being directly sucked away when it falls from the collecting sheet 4. The exhaust baffle 7 can swing, and through the elastic holding structure, the angle can be changed according to the amount of dust on the exhaust baffle 7. A valve 5 is provided between the collecting lower cavity 3 and the second collecting structure 6. When the dust in the second collecting structure 6 is collected to a certain extent, the valve 5 is closed to replace the second collecting structure 6. After the replacement, the valve 5 is opened to continue collecting into the second collecting structure 6, so as to realize continuous collection. Similarly, the second collecting structure 6 itself is also provided with a valve.

[0068] When the powder collector 100 of this embodiment is in operation, the exhaust port 9 is connected to the exhaust system, forming a low-speed air flow in the first collecting structure 1 and forming suction at the inlet 8, so that the air containing the high-temperature nano-silicon dioxide powder is drawn out from the preparation structure into the upper collecting cavity 2, and the air contacts the collecting sheet 4 which forms a certain angle (generally 5° to 30°) with the exhaust direction, and the high-temperature dust in the air will be deposited on the collecting sheet 4, which is in a swinging state. When a certain amount of dust is deposited, it will fall with the swinging, and after falling, it will enter the second collecting structure 6 through the collecting lower cavity 3. During the falling process, some dust may directly enter the exhaust system with the air and be sucked away, affecting the collection efficiency. Therefore, an exhaust baffle 7 is provided at the exhaust port 9. The exhaust baffle 7 maintains a certain angle with the end face of the exhaust port 9 through an elastic retaining structure. As the dust increases, the angle between the exhaust baffle 7 and the end face of the exhaust port 9 becomes smaller and smaller. Therefore, the dust on the exhaust baffle 7 will fall downward into the second collecting structure 6. At the same time, as the angle becomes smaller, the air flow rate through the exhaust baffle 7 becomes faster, and the dust on the exhaust baffle 7 is more likely to fall from the exhaust baffle 7 to the second collecting structure 6. When enough dust falls, the exhaust baffle 7 slowly rebounds, the flow rate decreases, and the dust falling from the upper cavity 2 continues to be deposited on the exhaust baffle 7, and this cycle is repeated to form continuous dust collection.

[0069] The second way is as follows:

[0070] like Figures 7 to 10As shown, the difference between this embodiment and the first embodiment is that this embodiment does not require a driving structure. In this embodiment, the center line of the inlet 8 is at an angle to the plane where the collecting sheet 4 is located in a natural state, that is, the flow direction of the air containing silica powder at the inlet 8 is at an angle to the plane where the collecting sheet 4 is located in a natural state. The air containing silica powder is blown toward the collecting sheet 4 at a low flow rate. Under the action of the air, the collecting sheet 4 can swing without external force to collect the silica powder, and the collected silica powder falls into the second collecting structure 6 as the collecting sheet 4 swings.

[0071] Embodiment 2

[0072] The present invention also provides a method for preparing quartz and nano-silicon dioxide powder by co-production, comprising:

[0073] While preparing the quartz rod loose body 18 by using the vapor deposition process, the undeposited powder is collected to obtain the nano silicon dioxide powder;

[0074] The quartz rod soot body 18 is sintered by a sintering process to obtain a quartz rod.

[0075] The device provided by the present invention can simultaneously produce a quartz rod loose body 18 and high-purity nano-silicon dioxide powder, and then the quartz rod loose body 18 can be made into a quartz rod product after being treated by a vacuum sintering process; this achieves the purpose of simultaneously preparing the quartz rod and the high-purity nano-silicon dioxide powder, and improves production efficiency. In addition, since the raw material of the high-purity nano-silicon dioxide powder comes from the silicon dioxide powder that is not deposited on the surface of the target rod in the vapor deposition process, the purpose of waste recycling is achieved, raw materials are saved, and the preparation cost is reduced.

[0076] In addition, this embodiment utilizes the co-production system for preparing quartz and nano-silicon dioxide powder provided in the above embodiment to co-produce quartz and nano-silicon dioxide powder. Therefore, this embodiment has all the advantages of the above embodiment, which will not be described in detail here.

[0077] The present invention uses specific examples to illustrate the principles and implementation methods of the present invention. The above examples are only used to help understand the method and core ideas of the present invention. At the same time, for those skilled in the art, according to the ideas of the present invention, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting the present invention.

Claims

1. A co-production system for preparing quartz and nano-silicon dioxide powder, characterized in that: include: A deposition device is used for performing a vapor deposition process to deposit silicon dioxide powder on a target rod to form a quartz rod loose body; the deposition device is configured with a powder outlet; a powder collector, the powder collector being in communication with the powder outlet; The sintering equipment is used for sintering the quartz rod loose body to obtain the quartz rod.

2. The co-production system for preparing quartz and nano-silicon dioxide powder according to claim 1, characterized in that: The powder collector is connected to the powder outlet through a conveying pipe, and the conveying pipe is made of quartz material.

3. The co-production system for preparing quartz and nano-silicon dioxide powder according to claim 1, characterized in that: A reaction chamber is constructed in the deposition equipment, and the vapor deposition process is carried out in the reaction chamber. A vacuum hood is arranged on the top of the reaction chamber, and the powder outlet is arranged on the vacuum hood. The vacuum hood is made of quartz material.

4. The co-production system for preparing quartz and nano-silicon dioxide powder according to claim 1, characterized in that: It also includes an exhaust system and an exhaust gas treatment system, the inlet of the exhaust system is connected to the powder collector, the outlet of the exhaust system is connected to the exhaust gas treatment system, and the exhaust system is used to extract powder not collected by the powder collector into the exhaust gas treatment system.

5. The co-production system for preparing quartz and nano-silicon dioxide powder according to claim 1, characterized in that: The deposition device is used for performing an external vapor deposition process.

6. The co-production system for preparing quartz and nano-silicon dioxide powder according to claim 1, characterized in that: The blowtorch group in the deposition device includes a plurality of blowtorches, which are arranged in a row in sequence along a direction parallel to the target rod. The blowtorch group is arranged on a translation device, and the translation device can drive the blowtorch group to reciprocate along a direction parallel to the target rod.

7. The co-production system for preparing quartz and nano-silicon dioxide powder according to claim 6, characterized in that: The blowtorch group is arranged directly below or to the lower side of the target rod.

8. The co-production system for preparing quartz and nano-silicon dioxide powder according to claim 6, characterized in that: It also includes a lifting device for driving the blowtorch group to rise and fall, and a detection device for detecting the diameter of the loose body of the quartz rod. When the detection device detects that the diameter of the loose body of the quartz rod reaches a set value, the lifting device is controlled to drive the blowtorch group to descend to ensure that the distance between the blowtorch group and the target rod is within the set range.

9. The co-production system for preparing quartz and nano-silicon dioxide powder according to claim 4, characterized in that: The powder collector includes a first collecting structure and a second collecting structure, the first collecting structure is provided with an inlet and an exhaust port, the inlet is connected with the powder outlet, the exhaust port is connected with the inlet of the exhaust system, a collecting assembly is provided in the collecting chamber of the first collecting structure, the collecting assembly can swing, and a storage chamber is constructed in the second collecting structure, the storage chamber is located below the first collecting structure and is connected with the collecting chamber.

10. A method for preparing quartz and nano-silicon dioxide powder, characterized in that: include: While preparing the quartz rod loose body by using the vapor deposition process, the undeposited powder is collected to obtain the nano silicon dioxide powder; The quartz rod loose body is sintered by a sintering process to obtain a quartz rod.

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