Photoresist etching device

Abstract

The invention provides a photoresist etching device, and relates to the technical field of photoresist etching, the photoresist etching device comprises a plurality of double-side pipes installed on a receiving disc along the axis, each double-side pipe is provided with an auxiliary suction cup, a partition plate is installed in each double-side pipe, a sealing block is slidably connected between each double-side pipe and the corresponding partition plate in a limiting mode, and the sealing blocks are connected with the corresponding double-side pipes in a limiting mode. An outer pipe is installed on the double-side pipe close to one side of the sealing block in a communicating mode, an adjusting pipe is slidably connected into the outer pipe, a sliding groove is formed in the adjusting pipe, a piston disc is slidably connected into the sliding groove in a sealed mode, a middle rod is coaxially slidably connected into the piston disc, and a one-way disc is installed on the middle rod. The piston disc is provided with a one-way groove, the one-way disc is attached to the one-way groove, a double-fixing mechanism is adopted, the stability of a wafer is improved through the synergistic effect of the fixing suction cup and the auxiliary suction cup, the fixing suction cup provides initial fixing force, and the auxiliary suction cup provides additional fixing force along with increase of the rotating speed.

Description

Technical Field

[0001] The present invention relates to the technical field of photoresist etching, and more specifically, to a photoresist etching device. Background Art

[0002] In the semiconductor manufacturing industry, photoresist etching is a key step in the wafer processing process. This process has extremely high requirements for precision and stability because it directly affects the performance and yield of the final chip. Before photoresist etching, it is crucial to firmly fix the wafer in the appropriate position. Traditionally, this step is achieved by mounting the wafer on a special suction cup. The suction cup uses the principle of vacuum adsorption to create negative pressure at the bottom of the wafer, thereby firmly adsorbing the wafer on the workbench. This method has been widely used in the past many years because it is relatively simple and direct and can provide sufficient stability in most cases.

[0003] However, with the continuous advancement of semiconductor technology, the existing single suction cup fixing method has gradually revealed its limitations. This method that relies solely on single fixing can no longer fully meet the process requirements when faced with higher precision requirements and more complex processing environments. Especially when performing high-precision etching or processing large-size wafers, a single fixing point may cause the wafer to move or deform during the processing. These slight deviations may cause inaccurate etching patterns, thereby affecting the performance and reliability of the chip. In addition, in some extreme cases, such as sudden vibration of the equipment or momentary failure of the vacuum system, a single fixing method may not provide sufficient safety protection, increasing the risk of wafer damage or processing failure. Summary of the invention

[0004] 1. Technical issues to be solved

[0005] In view of the problems existing in the prior art, the present invention provides a photoresist etching device to solve the technical problems mentioned in the background technology.

[0006] (II) Technical solution

[0007] To achieve the above object, the present invention provides the following technical solution: a photoresist etching device, comprising a fixedly installed reducer and a receiving plate connected to the extended end of the reducer, wherein a motor is mounted on the reducer;

[0008] The auxiliary mechanism comprises a plurality of double-sided tubes installed on the receiving plate along the axis, each of the double-sided tubes is respectively installed with an auxiliary suction cup, a partition is installed in the double-sided tube, a sealing block is slidably connected between the double-sided tube and the partition, an external tube is connected and installed on the double-sided tube close to the sealing block, an adjusting tube is slidably connected in the external tube, a sliding groove is provided in the adjusting tube, a piston disk is sealingly slidably connected in the sliding groove, an intermediate rod is slidably connected in the piston disk coaxially, a one-way disk is installed on the intermediate rod, a one-way groove is provided on the piston disk, and the one-way disk is attached to the one-way groove; and

[0009] The fixing mechanism comprises an adjusting disk sealingly and slidably connected in the double-sided tubes, a fixing suction cup is installed on the double-sided tubes, and a plurality of stop rods are installed at equal intervals on the auxiliary suction cup and the fixing suction cup, and the upper ends of the stop rods are made of rubber.

[0010] Preferably, the auxiliary mechanism also includes a lateral disk coaxially installed in the external tube, the lateral disk is fitted with a sealing disk, and a rubber tube is installed in communication between the adjusting tube and the sealing disk. This design achieves effective sealing between the external tube and the adjusting tube through the cooperation of the lateral disk and the sealing disk, while the use of the rubber tube provides the necessary elastic connection, thereby ensuring the sealing performance during the adjustment process.

[0011] Preferably, a plurality of sealing springs are installed on the adjusting tube at equal intervals along the axis, the other ends of the plurality of sealing springs are connected to the sealing disk, a plurality of guide strips are installed on the side wall of the adjusting tube at equal intervals, and the plurality of guide strips are respectively slidably connected in the external tube. This design ensures continuous sealing between the adjusting tube and the external tube through the synergistic effect of the sealing springs and the sealing disk, while the setting of the guide strips ensures smooth sliding of the adjusting tube in the external tube.

[0012] Preferably, a push plate is coaxially mounted on the outer wall of the adjusting tube, a rotating sleeve is slidably mounted on the adjusting tube, the rotating sleeve fits on the push plate, and the rotating sleeve is threadedly connected to the external tube. This design achieves adjustment of the position of the adjusting tube through the cooperation of the push plate, the rotating sleeve and the threaded connection, thereby providing convenience for fine-tuning of the dynamic balance.

[0013] Preferably, a plurality of support rods are installed at equal intervals on the upper end of the intermediate rod, and a plurality of long holes and short holes are opened at equal intervals on the upper end surface of the piston disc, the same number as the support rods. When the one-way disc is fitted on the one-way groove, the support rods are inserted into the long holes. This design realizes flexible adjustment and locking of the position of the piston disc through the cooperation of the support rods, long holes and short holes, and effectively prevents accidental movement during high-speed rotation.

[0014] Preferably, a pull block is installed at one end of the intermediate rod, and a plurality of springs are installed at the other end of the intermediate rod, and the plurality of springs are in contact with the piston disk. This design achieves precise control and automatic return of the position of the intermediate rod through the cooperation of the pull block and the spring, which not only simplifies the operation process, but also enhances the flexibility and reliability of the entire mechanism, and provides convenience for the position adjustment of the piston disk.

[0015] Preferably, a plurality of side grooves are provided at equal intervals on the side wall of the intermediate rod, and when the one-way disc is released from the seal between the one-way grooves, the plurality of side grooves are connected to both sides of the piston disc. This design facilitates the adjustment of the position of the piston disc through the provision of the side grooves.

[0016] Preferably, the fixing mechanism also includes a guide block fixedly mounted on the double-sided tubes, a pull rod is mounted on the adjustment disk, and the pull rod is slidably connected in the guide block. This design achieves control of the position of the adjustment disk through the cooperation of the guide block and the pull rod.

[0017] Preferably, a transverse rod is slidably connected to the side wall of the guide block, a return spring is installed on the transverse rod, the other end of the return spring is connected to the side wall of the guide block, and transverse holes with the same diameter as the transverse rod are evenly spaced on the pull rod. When the transverse rod is not subject to force, the transverse rod is inserted into the transverse hole. This design achieves rapid locking and release of the pull rod position through the cooperation of the transverse rod, return spring and transverse hole, simplifies the operation process, and facilitates the rapid fixing and release of the wafer.

[0018] (III) Beneficial effects

[0019] Compared with the prior art, the present invention provides a photoresist etching device, which has the following beneficial effects:

[0020] First of all, the device adopts a dual fixing mechanism. Through the synergistic effect of the fixed suction cup and the auxiliary suction cup, the stability of the wafer during the etching process is effectively improved. The fixed suction cup provides the initial fixing force, while the auxiliary suction cup provides additional fixing force as the rotation speed increases. This dynamically adjusted fixing method not only enhances the stability of the wafer, but also can adapt to the working requirements at different speeds, significantly improving the accuracy and reliability of the etching process. It utilizes the principle of centrifugal force. As the rotation speed of the receiving plate increases, a greater negative pressure will be generated inside the auxiliary suction cup, thereby providing a stronger fixing force. This adaptive fixing force adjustment mechanism ensures that the wafer can remain stable during high-speed rotation, effectively prevents wafer displacement or deformation caused by centrifugal force, and further improves the etching accuracy.

[0021] In addition, the device is also equipped with a dynamic balance adjustment function. Dynamic balance adjustment can be achieved by adjusting the position of the adjustment tube in the external tube. This function effectively reduces the vibration that may be generated during high-speed rotation, which not only improves the etching accuracy, but also extends the service life of the equipment and reduces maintenance costs. The operator can adjust the position of the piston disk without changing the internal air pressure. This design increases the flexibility of the device.

[0022] In general, this photoresist etching device significantly improves the stability and safety of the wafer etching process through its innovative dual fixing mechanism, adaptive pressure regulation, dynamic balance adjustment and flexible position adjustment functions. It not only meets the needs of high-precision etching, but also has good adaptability and ease of operation, providing a more reliable, efficient and flexible solution for semiconductor manufacturing. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the overall structure of a photoresist etching device in the present invention;

[0024] Figure 2 It is a schematic diagram of the structure of the double-side pipe in the present invention;

[0025] Figure 3 For the present invention Figure 2 A schematic cross-sectional structure diagram of;

[0026] Figure 4 It is a structural schematic diagram of the transverse rod in the present invention;

[0027] Figure 5 It is a cross-sectional structural schematic diagram of the rotating sleeve in the present invention;

[0028] Figure 6 It is a schematic diagram of the cross-sectional structure of the regulating tube in the present invention;

[0029] Figure 7 It is a schematic cross-sectional structural diagram of the piston disc in the present invention;

[0030] Figure 8 It is a structural schematic diagram of the piston disc in the present invention;

[0031] Fig. 9 It is a schematic structural diagram of the middle rod in the present invention.

[0032] In the figure: 11, reducer; 12, receiving plate; 13, motor; 21, double-side pipes; 22, auxiliary suction cup; 23, partition; 24, sealing block; 25, external pipe; 26, adjusting pipe; 27, sliding groove; 28, piston plate; 29, intermediate rod; 31, adjusting plate; 32, fixed suction cup; 33, stop rod; 34, guide block; 35, pull rod; 36, transverse rod; 37, return spring; 38, transverse hole; 210, one-way plate; 211, one-way groove; 212, lateral plate; 213, sealing plate; 214, rubber tube; 215, sealing spring; 216, guide strip; 217, push plate; 218, rotating sleeve; 219, support rod; 220, long hole; 221, short hole; 222, pull block; 223, spring; 224, side groove. DETAILED DESCRIPTION

[0033] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0034] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meanings as commonly understood by ordinary technicians in the technical field to which this application belongs.

[0035] In the present invention, unless otherwise specified, the directions used, such as "up" and "down", usually refer to the directions shown in the drawings, or to the vertical, perpendicular or gravity directions; similarly, for ease of understanding and description, "left" and "right" usually refer to the left and right shown in the drawings; "inside" and "outside" refer to the inside and outside relative to the outline of each component itself, but the above-mentioned directions are not used to limit the present invention.

[0036] See also Figures 1 to 9A photoresist etching device comprises a fixedly mounted reducer 11 and a receiving plate 12 connected to the extended end of the reducer 11, a motor 13 is mounted on the reducer 11, and an auxiliary mechanism comprises a plurality of double-sided tubes 21 mounted on the receiving plate 12 along the axis, each double-sided tube 21 is respectively mounted with an auxiliary suction cup 22, a partition 23 is mounted inside the double-sided tube 21, a sealing block 24 is limitedly slidably connected between the double-sided tube 21 and the partition 23, an external tube 25 is connected and mounted on the double-sided tube 21 near the sealing block 24, and an adjusting tube is slidably connected inside the external tube 25 26, a sliding groove 27 is provided in the adjusting tube 26, a piston disc 28 is sealingly and slidingly connected in the sliding groove 27, an intermediate rod 29 is coaxially and slidably connected in the piston disc 28, a one-way disc 210 is installed on the intermediate rod 29, a one-way groove 211 is provided on the piston disc 28, the one-way disc 210 is fitted on the one-way groove 211, the auxiliary mechanism also includes a lateral disc 212 coaxially installed in the external tube 25, a sealing disc 213 is fitted on the lateral disc 212, a rubber tube 214 is connected and installed between the adjusting tube 26 and the sealing disc 213, and a rubber tube 214 is installed on the adjusting tube 26 along the axis. A plurality of sealing springs 215 are installed at equal intervals, and the other ends of the plurality of sealing springs 215 are connected to the sealing disk 213. A plurality of guide strips 216 are installed at equal intervals on the side wall of the adjusting tube 26, and the plurality of guide strips 216 are respectively slidably connected in the external tube 25. A push plate 217 is coaxially installed on the outer wall of the adjusting tube 26. A rotating sleeve 218 is slidably installed on the adjusting tube 26, and the rotating sleeve 218 is fitted on the push plate 217. The rotating sleeve 218 is threadedly connected to the external tube 25. A plurality of support rods 219 are installed at equal intervals on the upper end of the intermediate rod 29. The upper end of the piston disk 28 A plurality of long holes 220 and short holes 221 having the same number as the support rod 219 are provided on the surface at equal intervals. When the one-way disk 210 is fitted on the one-way groove 211, the support rod 219 is inserted into the long hole 220. A pull block 222 is installed at one end of the intermediate rod 29, and a plurality of springs 223 are installed at the other end of the intermediate rod 29. The plurality of springs 223 abut against the piston disk 28. A plurality of side grooves 224 are provided on the side wall of the intermediate rod 29 at equal intervals. When the one-way disk 210 releases the seal between the one-way groove 211, the plurality of side grooves 224 are connected on both sides of the piston disk 28.

[0037] See also Figure 1 and Figure 2When etching the wafer with photoresist, first put the corresponding wafer into the receiving tray 12, then make the wafer fit on multiple auxiliary suction cups 22 and fixed suction cups 32, then operate the fixed suction cup 32 to make the fixed suction cup 32 adsorb on the wafer, and then make the wafer contact with multiple stop rods 33. At this time, it needs to be rotated when etching the photoresist. The receiving tray 12 will be driven to rotate under the action of the motor 13 and the reducer 11. After the wafer rotates, the auxiliary suction cup 22 will be started due to the centrifugal force. The faster the receiving tray 12 rotates, the greater the fixing force of the auxiliary suction cup 22, thereby ensuring the stability of the wafer when the photoresist is etching.

[0038] When the receiving plate 12 rotates, see Figure 6 Since the adjusting tube 26 rotates with the rotation of the receiving plate 12, the adjusting tube 26 and the piston plate 28 will generate centrifugal force, so that the piston plate 28 is pulled outward to increase the internal volume, and then negative pressure will be generated. Please refer to Figure 3 Since the sealing block 24 and the double-sided tube 21 are sealed and slidable, the sealing block 24 will be driven to slide downward. At this time, the wafer is attached to the auxiliary suction cup 22, so that negative pressure is generated in the auxiliary suction cup 22, and then the stability of wafer fixation is guaranteed. The faster the receiving plate 12 rotates, the greater the centrifugal force, and then the greater the negative pressure generated. Therefore, the faster the rotation, the greater the fixing force, which ensures the stability of use.

[0039] Since the adjustment tubes 26 are slidably connected to the inner parts of the plurality of external tubes 25, dynamic balance needs to be adjusted during rotation. Figure 2 and Figure 5 Since the rotating sleeve 218 is threadedly connected to the external tube 25 and the rotating sleeve 218 abuts against the push plate 217, it will drive the adjusting tube 26 to slide inward, and the sealing plate 213 is sealed against the lateral plate 212. As the pressure of the threaded adjustment sealing spring 215 increases, the sealing effect is ensured, and the expansion and contraction amount is compensated by the rubber tube 214, and multiple rotating sleeves 218 are adjusted, thereby completing the dynamic balance adjustment.

[0040] When it is necessary to change the position of the piston plate 28 without changing the internal air pressure, refer to Figure 6 and Figure 7First, by pulling the pull block 222, the intermediate rod 29 can be driven to slide in the piston disc 28, and then the support rod 219 is disengaged from the long hole 220, and then the pull block 222 is rotated to make the support rod 219 press against the short hole 221. At this time, the one-way disc 210 and the one-way groove 211 are in an untied state, and the two sides of the piston disc 28 can be connected through multiple side grooves 224. At this time, the position can be adjusted. After the adjustment is completed, the support rod 219 is inserted into the long hole 220 to ensure the sealing of the one-way disc 210 and the one-way groove 211. When subjected to centrifugal force, due to the reverse movement, the one-way disc 210 will not disengage the seal with the one-way groove 211, thereby ensuring the stability of use.

[0041] The faster the receiving plate 12 rotates, the greater the centrifugal force is, thus increasing the fixing force between the auxiliary suction cup 22 and the wafer, thereby ensuring stability and safety in use.

[0042] See also Figures 1 to 4 The fixing mechanism includes an adjusting disk 31 which is sealingly and slidably connected in the double-sided tube 21, a fixed suction cup 32 is installed on the double-sided tube 21, and a plurality of stop rods 33 are installed at equal intervals on the auxiliary suction cup 22 and the fixed suction cup 32, and the upper end of the stop rod 33 is made of rubber. The fixing mechanism also includes a guide block 34 fixedly installed on the double-sided tube 21, a pull rod 35 is installed on the adjusting disk 31, and the pull rod 35 is slidably connected in the guide block 34. A transverse rod 36 is slidably connected on the side wall of the guide block 34, and a return spring 37 is installed on the transverse rod 36. The other end of the return spring 37 is connected to the side wall of the guide block 34. Transverse holes 38 with the same diameter as the transverse rod 36 are opened at equal intervals on the pull rod 35. When the transverse rod 36 is not subjected to force, the transverse rod 36 is inserted into the transverse hole 38.

[0043] When the wafer requires initial fixation, refer to Figure 3 and Figure 4 First, place the wafer in the receiving tray 12 so that the wafer is pressed on multiple auxiliary suction cups 22 and fixed suction cups 32, then pull the transverse rod 36 to release the connection between the transverse rod 36 and the transverse hole 38, then pull the pull rod 35 downward and then adjust the disk 31 to slide downward in a sealed manner. At this time, the internal air pressure will be reduced, and then it is ensured that the fixed suction cup 32 will be adsorbed on the wafer to provide an initial fixing force, and then the transverse rod 36 is released. Under the action of the return spring 37, the transverse rod 36 is inserted into the transverse hole 38, thereby ensuring the limit of the pull rod 35 and the stability of the fixation. At this time, the wafer will be given an initial fixing force, and as the wafer rotates, the auxiliary suction cup 22 will also provide additional fixing force, thereby ensuring the stability of the fixation.

[0044] In all the schemes mentioned above, the connection between two parts can be selected according to actual conditions by welding, bolt and nut matching connection, bolt or screw connection or other well-known connection methods, which will not be described one by one here. In the above, all fixed connections are preferably welded. Although the embodiments of the present invention have been shown and described, it can be understood by ordinary technicians in this field that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principle and spirit of the present invention. The scope of the present invention is defined by the attached claims and their equivalents.

Claims

1. A photoresist etching device, comprising a fixedly mounted reducer (11) and a receiving plate (12) connected to the protruding end of the reducer (11), wherein a motor (13) is mounted on the reducer (11); Its characteristics are: The auxiliary mechanism comprises a plurality of double-sided tubes (21) mounted on a receiving plate (12) along an axis, each of the double-sided tubes (21) being respectively mounted with an auxiliary suction cup (22), a partition plate (23) being mounted inside the double-sided tubes (21), a sealing block (24) being limitedly slidably connected between the double-sided tubes (21) and the partition plate (23), an external tube (25) being connected and mounted on the double-sided tubes (21) on a side close to the sealing block (24), and the external tube (25) ) is slidably connected with an adjusting tube (26), a sliding groove (27) is provided in the adjusting tube (26), a piston disc (28) is sealingly slidably connected in the sliding groove (27), an intermediate rod (29) is coaxially slidably connected in the piston disc (28), a one-way disc (210) is installed on the intermediate rod (29), a one-way groove (211) is provided on the piston disc (28), and the one-way disc (210) is attached to the one-way groove (211); as well as The fixing mechanism comprises an adjusting plate (31) sealingly and slidably connected in the double-sided tube (21), a fixing suction cup (32) is installed on the double-sided tube (21), and a plurality of stop rods (33) are respectively installed at equal intervals on the auxiliary suction cup (22) and the fixing suction cup (32), and the upper ends of the stop rods (33) are made of rubber material.

2. A photoresist etching device according to claim 1, characterized in that: The auxiliary mechanism also includes a lateral disc (212) coaxially mounted inside the external tube (25), a sealing disc (213) being fitted on the lateral disc (212), and a rubber tube (214) being connected and mounted between the regulating tube (26) and the sealing disc (213).

3. A photoresist etching device according to claim 2, characterized in that: A plurality of sealing springs (215) are installed at equal intervals along the axis of the adjusting tube (26); the other ends of the plurality of sealing springs (215) are connected to the sealing disk (213); a plurality of guide strips (216) are installed at equal intervals on the side wall of the adjusting tube (26); the plurality of guide strips (216) are respectively slidably connected in the outer tube (25).

4. A photoresist etching device according to claim 3, characterized in that: A push plate (217) is coaxially mounted on the outer wall of the adjusting tube (26), a rotating sleeve (218) is slidably mounted on the adjusting tube (26), the rotating sleeve (218) is fitted on the push plate (217), and the rotating sleeve (218) is threadedly connected to the external tube (25).

5. A photoresist etching device according to claim 4, characterized in that: A plurality of support rods (219) are installed at equal intervals on the upper end of the intermediate rod (29); a plurality of long holes (220) and short holes (221) are opened at equal intervals on the upper end surface of the piston disc (28), the number of which is the same as the number of the support rods (219); when the one-way disc (210) is attached to the one-way groove (211), the support rods (219) are inserted into the long holes (220).

6. A photoresist etching device according to claim 5, characterized in that: A pull block (222) is installed at one end of the intermediate rod (29), and a plurality of springs (223) are installed at the other end of the intermediate rod (29), and the plurality of springs (223) abut against the piston disc (28).

7. A photoresist etching device according to claim 6, characterized in that: A plurality of side grooves (224) are evenly spaced on the side wall of the intermediate rod (29); when the one-way disc (210) releases the seal between the one-way groove (211), the plurality of side grooves (224) are connected to both sides of the piston disc (28).

8. A photoresist etching device according to claim 1, characterized in that: The fixing mechanism also includes a guide block (34) fixedly mounted on the double-side tubes (21); a pull rod (35) is mounted on the adjustment disk (31); and the pull rod (35) is slidably connected in the guide block (34).

9. A photoresist etching device according to claim 8, characterized in that: A transverse rod (36) is slidably connected to the side wall of the guide block (34), a return spring (37) is installed on the transverse rod (36), the other end of the return spring (37) is connected to the side wall of the guide block (34), and transverse holes (38) with the same diameter as the transverse rod (36) are evenly spaced on the pull rod (35). When the transverse rod (36) is not subjected to force, the transverse rod (36) is inserted into the transverse hole (38).

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