Positioning method and conveying control method of substrate cleaning device

Abstract

The invention provides a positioning method and a conveying control method of a substrate cleaning device. The present invention relates to a positioning method for positioning conveyance rollers (11) in a substrate cleaning apparatus (100) provided with a plurality of conveyance rollers (11) for conveying a glass plate (G) along a path line (PL), in which a positioning substrate (GA) is erected between a reference conveyance roller (11A) and a positioning target conveyance roller (11B), the inclination angle (theta) of the positioning substrate (GA) is measured, and the inclination angle (theta) of the positioning substrate (GA) is measured. The height difference ([delta] H) is calculated from the inclination angle ([theta]) and the pitch dimension (P) between the conveyance roller (11A) as a reference and the conveyance roller (11B) to be positioned, and the height of the conveyance roller (11B) to be positioned is adjusted so that the height difference ([delta] H) is equal to or less than a preset reference value.

Description

Technical Field

[0001] The present invention relates to a positioning method and a conveyance control method for a substrate cleaning apparatus. Background Art

[0002] For example, the surface of a glass plate for a flat panel display (FPD) such as an LCD (Liquid Crystal Display) or an OLED (Organic Light-Emitting Diode) is cleaned by a cleaning apparatus.

[0003] A cleaning apparatus for cleaning a glass plate includes various units such as a unit that cleans by supplying a detergent and pure water to the surface of the glass plate for rinsing, and a unit that cleans the glass plate with a brush that rotates while contacting the surface of the glass plate (for example, refer to Patent Document 1).

[0004] Prior Art Documents

[0005] Patent Documents

[0006] Patent Document 1: Japanese Patent Application Laid-Open No. 2017-14060 Summary of the Invention

[0007] Problems to be Solved by the Invention

[0008] However, a unit that performs various processes on a glass plate includes a conveyance unit composed of a plurality of conveyance rollers that convey the glass plate. That is, the cleaning apparatus has a structure in which the conveyance units of the respective units driven by separate drive motors are connected, and while conveying the glass plate in one direction by the conveyance units of the respective units, various cleaning processes are performed on the glass plate by the respective units.

[0009] Therefore, for example, between the respective units, if there are deviations in the position and speed of the conveyance rollers of the conveyance unit, there is a possibility that conveyance failures such as meandering of the conveyed glass plate may occur, and the glass plate may be damaged.

[0010] Therefore, an object of the present invention is to provide a positioning method and a conveyance control method for a substrate cleaning apparatus that accurately position the conveyance unit and control the speed difference so that the glass plate can be smoothly conveyed and can be cleaned well.

[0011] Means for Solving the Problems

[0012] The present invention is configured as follows.

[0013] (1) A positioning method for a substrate cleaning device, for positioning the conveying rollers in the substrate cleaning device. The substrate cleaning device includes a plurality of the conveying rollers for conveying a glass plate along a conveying path. Among them,

[0014] A positioning substrate is erected between the reference conveying roller and the conveying roller to be positioned.

[0015] Measure the inclination angle of the positioning substrate.

[0016] Calculate the height difference based on the inclination angle and the distance dimension between the reference conveying roller and the conveying roller to be positioned, and

[0017] Adjust the height of the conveying roller to be positioned so that the height difference is below a preset reference value.

[0018] (2) A positioning method for a substrate cleaning device, which is a positioning method for guide rollers in the substrate cleaning device. The substrate cleaning device has a plurality of the guide rollers that are arranged on at least one side of the conveying portion for conveying the glass plate along the conveying path, and are in contact with the side edge of the glass plate to guide the glass plate, both upstream and downstream of the conveying path. Among them,

[0019] Take the plurality of guide rollers at the upstream end as reference guide rollers, and configure the positioning substrate so that its side edge is in contact with these guide rollers, and

[0020] Move the positioning substrate downstream, and sequentially arrange the guide rollers on the downstream side at positions where they are in contact with the side edge of the positioning substrate.

[0021] (3) A conveying control method for a substrate cleaning device, which is a conveying control method in a substrate cleaning device with a plurality of processing units arranged continuously. The plurality of processing units perform cleaning processing while conveying the glass plate along the conveying path by using a plurality of conveying rollers rotated by a driving motor. Among them,

[0022] Calculate the conveying speed of the conveying rollers of each processing unit for the glass plate, and

[0023] Control the driving motor of the processing unit so that the difference in conveying speed is below a preset threshold value.

[0024] Advantageous Effects of the Invention

[0025] According to the present invention, a positioning method and a conveying control method for a substrate cleaning device can be provided, which can accurately position the conveying portion and control the speed difference, so that the glass plate can be smoothly conveyed and can be in a state where it can be well cleaned. Description of the Drawings

[0026] Figure 1It is a schematic structural diagram of the overall structure of the substrate cleaning device as viewed from above.

[0027] Figure 2 It is a schematic top view of the conveying section that constitutes the processing unit of the substrate cleaning device.

[0028] Figure 3 It is a schematic side view of the conveying section that constitutes the processing unit of the substrate cleaning device.

[0029] Figure 4 It is Figure 2 a cross-sectional view taken along line IV-IV in

[0030] Figure 5 It is a schematic top view of the conveying section for explaining the positioning process of the conveying roller.

[0031] Figure 6 It is a schematic side view of the conveying section for explaining the positioning process of the conveying roller.

[0032] Figure 7 It is a schematic diagram for explaining the positioning process of the guide roller.

[0033] Figure 8 It is a schematic diagram for explaining the positioning process of the guide roller.

[0034] Figure 9 It is a schematic diagram for explaining the positioning process of the guide roller. Detailed implementation manners

[0035] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0036] Figure 1 It is a schematic structural diagram of the overall structure of the substrate cleaning device 100 as viewed from above.

[0037] As Figure 1 shown, the substrate cleaning device 100 is a device that cleans the rectangular glass plate G while sequentially conveying it in the conveying direction X from the upstream side to the downstream side.

[0038] The glass plate G to be cleaned is made of, for example, an alkali-free glass material for flat panel displays (FPD) such as LCD (Liquid Crystal Display) and OLED (Organic Light-Emitting Diode). The glass plate G is, for example, a large-sized glass plate with a fifth-generation size (long side 1,300 mm, short side 1,000 mm) to an eleventh-generation size (long side 3,320 mm, short side 3,000 mm).

[0039] The substrate cleaning apparatus 100 includes a plurality of processing units 10 surrounded by a wall. These processing units 10 are continuously arranged from the upstream side to the downstream side along the conveying direction X, and various cleaning processes are performed on the conveyed glass plate G in each processing unit 10. In this substrate cleaning apparatus 100, the glass plate G is carried into the processing unit 10 at the upstream end in the conveying direction X, and the glass plate G is carried out from the processing unit 10 at the downstream end in the conveying direction X.

[0040] As the cleaning processes in these processing units 10, for example, there are a slurry cleaning process of spraying slurry onto the glass plate G and cleaning the glass plate G with a roller brush or a disk brush, a detergent cleaning process of spraying an alkaline or acidic detergent onto the glass plate G and cleaning the glass plate G with a roller brush or a disk brush, a pure water cleaning process of spraying pure water or the like as cleaning water onto the glass plate G and cleaning the glass plate G with a roller brush or a disk brush, a high-pressure spraying process of spraying pure water onto the glass plate G at high pressure to rinse the main surface of the glass plate G, a drying process of spraying air onto the glass plate to remove the liquid adhering to the main surface of the glass plate G and drying it, etc.

[0041] Figure 2 It is a schematic plan view of the conveying part 12 of the processing unit 10 constituting the substrate cleaning apparatus 100. Figure 3 It is a schematic side view of the conveying part 12 of the processing unit 10 constituting the substrate cleaning apparatus 100. Figure 4 is Figure 2 a cross-sectional view taken along line IV-IV in

[0042] As Figures 2 to 4 shown, each processing unit 10 includes a conveying part 12 having a plurality of conveying rollers 11. The conveying part 12 conveys the glass plate G along the path line PL, which is a horizontal conveying path, in one conveying direction X by the plurality of conveying rollers 11 (refer to Figure 3 ). In addition, in Figures 2 to 4 , cleaning mechanisms such as roller brushes, disk brushes, nozzles, and air knives used for performing the cleaning processes in each processing unit 10 are omitted from the illustration.

[0043] Each conveying roller 11 is arranged along the path width direction PW orthogonal to the path line PL, and the plurality of conveying rollers 11 are arranged at intervals along the path line PL. And the plane at the upper end position of these conveying rollers 11 becomes the reference position of the substrate cleaning apparatus 100, that is, the path line PL.

[0044] The conveying roller 11 has a rotating shaft 21 and a plurality of roller parts 23 provided on the rotating shaft 21. The conveying part 12 includes a drive motor 25, and the driving force of the drive motor 25 is transmitted to the rotating shafts 21 of the respective conveying rollers 11 in a linked manner through a transmission mechanism composed of gears 27 and 29 (refer to Figure 4) Thus, in each processing unit 10, the conveying rollers 11 of the conveying unit 12 are synchronously rotated in the same rotational direction by the respective drive motors 25. Therefore, the glass plate G is conveyed in the conveying direction X along the path line PL by the rotating conveying rollers 11.

[0045] In addition, the conveying unit 12 of each processing unit 10 includes a plurality of guide rollers 31 disposed at intervals along the path line PL on both sides in the path width direction PW of the conveying path of the glass plate G. These guide rollers 31 are formed of a resin material such as polyetheretherketone (PEEK) and are formed in a cylindrical shape. A bearing (not shown) is provided at the center of the guide roller 31, and the guide roller 31 is rotatably supported by the bearing with respect to the support shaft 33 in the vertical direction. The interval in the path width direction PW between the guide rollers 31 disposed on both sides in the path width direction PW of the conveying path of the glass plate G in the conveying unit 12 is set to be slightly larger than the width dimension of the glass plate G. For example, in the case of horizontal conveyance, the interval between the guide rollers 31 on both sides is set to be a large interval with a margin (play amount) of about 1.0 mm (0.5 mm on each side of the glass plate G) with respect to the width dimension of the glass plate G. And, both side edges of the glass plate G conveyed in the conveying direction X by the conveying rollers 11 of the conveying unit 12 are guided by the guide rollers 31 disposed on both sides in the path width direction PW.

[0046] In addition, the substrate cleaning device 100 includes a control unit 40, and a drive motor 25 (see Figure 2 ) that rotates the conveying rollers 11 of each processing unit 10 is connected to the control unit 40. And, the control unit 40 controls the driving of the drive motor 25 of each processing unit 10 respectively.

[0047] In the substrate cleaning device 100 in which the processing units 10 are continuously arranged, the conveying units 12 having a plurality of conveying rollers 11 are arranged in each processing unit 10 to be connected. Thus, the glass plate G conveyed by the conveying units 12 of each processing unit 10 is conveyed in the conveying direction X from the upstream side to the downstream side along the path line PL continuous with each other among the processing units 10. And, when the glass plate G conveyed along the path line PL passes through each processing unit 10, various cleaning processes are performed by the cleaning mechanism of each processing unit 10 to clean the glass plate G.

[0048] In addition, the substrate cleaning device 100 is inclined by about 5° in the entire length in the conveying direction X, for example, in the path width direction PW. Thus, by inclining the substrate cleaning device 100, among the glass plates G conveyed by the conveying units 12 of each processing unit 10, the glass plate G carried in in a horizontal posture is conveyed slightly inclined by the conveying units 12 of each processing unit 10. And, after the cleaning process in each processing unit 10, the glass plate G conveyed inclined is restored to a horizontal posture and carried out.

[0049] The glass plate G obliquely conveyed by the conveying unit 12 of each processing unit 10 contacts the guide roller 31 on the side of the lower side of the inclination and is guided, whereby the meandering of the glass plate G during conveyance is suppressed. Moreover, by inclining the substrate cleaning device 100, the liquid such as the cleaning liquid sprayed onto the glass plate G in each processing unit 10 flows down along the main surface of the glass plate G from the side edge on the lower side of the inclination. Thereby, the liquid cutoff property of the glass plate G can be improved. In addition, in each processing unit 10, the liquid such as the cleaning liquid sprayed onto the glass plate G flows toward the lower side of the inclination, so the liquid drainage property in each processing unit 10 can also be improved.

[0050] However, if the conveying roller 11 of the conveying unit 12 is displaced in the height direction, there is a possibility of occurrence of a conveying failure and damage to the glass plate G. For example, at the joints between the respective processing units 10, if there is a large level difference between the conveying rollers 11 of the conveying units 12 of the respective processing units 10, the contact force of the conveying rollers 11 on the glass plate G deviates between the processing units 10. Then, there is a possibility of occurrence of conveying failures such as traces of the roller portion 23 adhering to the main surface on the back side of the glass plate G or the conveyed glass plate G meandering, causing damage to the glass plate G.

[0051] Moreover, if the guide roller 31 that guides the glass plate G in the conveying direction X is displaced, there is a possibility that the side edge of the glass plate G comes into strong contact with the guide roller 31 and the guide roller 31 is locally worn. Then, when the side edge of the glass plate G conveyed later contacts the worn portion of the guide roller 31, there is a possibility of generating stress on the side edge of the glass plate G, which becomes a cause of breakage.

[0052] In addition, in the processing unit 10, for example, in the processing unit 10 that sprays pure water and air, compared with the processing unit 10 that performs brush cleaning in which the brush contacts the glass plate G for cleaning, the conveying speed of the glass plate G is reduced due to the contact resistance when the brush contacts. Therefore, even if there is no large level difference between the conveying rollers 11 of the conveying units 12 of the respective processing units 10, if the conveying speed difference of the glass plate G between the respective processing units 10 is large, there is a possibility of occurrence of conveying failures such as traces of the roller portion 23 adhering to the main surface on the back side of the glass plate G or the conveyed glass plate G meandering, causing damage to the glass plate G.

[0053] Therefore, in the present embodiment, in order to convey the glass plate G without damage and perform cleaning well and smoothly, the positioning of the conveying roller 11 and the guide roller 31 is performed, and the conveyance of the glass plate G by the conveying unit 12 is controlled. Hereinafter, the positioning method of the conveying roller 11, the positioning method of the guide roller 31, and the conveyance control method will be described.

[0054] (Positioning method of the conveying roller 11)

[0055] Figure 5It is a schematic top view of the conveying unit 12 that illustrates the positioning process of the conveying roller 11. Figure 6 It is a schematic side view of the conveying unit 12 that illustrates the positioning process of the conveying roller 11.

[0056] As Figure 5 and Figure 6 shown, a positioning substrate GA for performing a positioning operation is prepared, and the positioning substrate GA is mounted on the reference conveying roller 11A and the conveying roller 11B to be positioned. As the positioning substrate GA, a glass plate smaller than the glass plate G to be cleaned and sized to be mounted on adjacent conveying rollers 11 is used.

[0057] Next, a digital angle gauge DR is placed on the upper surface of the positioning substrate GA mounted on the conveying rollers 11A and 11B, and the tilt angle θ of the positioning substrate GA is measured. At this time, the digital angle gauge DR is arranged on the straight line at the upper end, i.e., the top, of the roller portion 23 passing between the conveying rollers 11A and 11B. Thereby, measurement errors caused by deformation in the width direction of the positioning substrate GA can be suppressed.

[0058] Furthermore, the distance dimension P between the rotation axes 21 of the conveying rollers 11A and 11B is measured, and based on this distance dimension P and the tilt angle θ measured by the digital angle gauge DR, the height difference, i.e., the level difference ΔH (Psinθ), of the conveying roller 11B to be positioned relative to the reference conveying roller 11A is calculated. Then, the height of the conveying roller 11B is adjusted so that this level difference ΔH becomes below a preset specified value.

[0059] In addition, as the positioning substrate GA, a resin plate, a metal plate, etc. having the same thickness as the glass plate G to be cleaned can also be used. In addition, a plurality of positioning substrates GA can be arranged in the path width direction PW, and the level difference ΔH of the conveying rollers 11A and 11B can be obtained for each positioning substrate GA. In this way, if the level difference ΔH is obtained using a plurality of positioning substrates GA arranged in the path width direction PW, the level difference ΔH of the conveying rollers 11A and 11B can be calculated in detail in the path width direction PW, and the height adjustment of the conveying roller 11B can be performed with higher accuracy.

[0060] In addition, the processing unit 10 sometimes has auxiliary conveying rollers outside the conveying roller 11. For example, in the processing unit 10 for cleaning the glass plate G using a disk brush or a roller brush, it has the following structure: at positions adjacent to the brush on the upstream and downstream sides, an auxiliary conveying roller is provided between the conveying roller 11 and the brush to smoothly guide the glass plate G. Such an auxiliary conveying roller can also be positioned through the above positioning process. Specifically, a positioning substrate GA is installed on the reference conveying roller 11 and the auxiliary conveying roller, and the inclination angle θ of the positioning substrate GA is measured. Then, the horizontal difference ΔH (Psinθ) is calculated based on the inclination angle θ and the spacing dimension P between the conveying roller 11 and the auxiliary conveying roller, and the height of the auxiliary conveying roller is adjusted so that the horizontal difference ΔH is below a preset specified value.

[0061] According to this positioning method, the height of the conveying roller 11 for conveying the glass plate G can be easily and highly accurately positioned. Thus, in the substrate cleaning device 100, the glass plate G can be smoothly conveyed without conveying failures such as meandering and can be well cleaned. In particular, even in a place where it is difficult to perform height adjustment using a measuring instrument such as a laser due to the presence of a partition wall between regions where different cleaning processes are performed, the positioning can be smoothly carried out.

[0062] (Positioning method of the guide roller 31)

[0063] Figures 7 to 9 is a schematic diagram for explaining the positioning process of the guide roller 31. Figure 8 is a schematic diagram for explaining the positioning process of the guide roller 31.

[0064] As Figure 7 shown, a rectangular positioning substrate GB for performing the positioning operation is prepared, and the positioning substrate GB is arranged at the upstream end where the glass plate G is carried into the substrate cleaning device 100. Then, taking the plurality of (four in this example) upstream guide rollers 31 on the side to be positioned as a reference, one side edge GBs of the positioning substrate GB is brought into contact with these guide rollers 31. In addition, the plurality of reference guide rollers 31 are pre-positioned on the same straight line along the conveying direction X.

[0065] Next, as Figure 8As shown, the positioning substrate GB is moved in the conveying direction X until a part thereof reaches the position of the downstream guide roller 31. At this time, when the downstream guide roller 31 has a positional deviation, a gap is formed between the side edge GBs of the positioning substrate GB and the downstream guide roller 31, or the front edge GBf of the positioning substrate GB abuts against the downstream guide roller 31. Thus, when the downstream guide roller 31 has a positional deviation, the position of the downstream guide roller 31 is adjusted to a position where it does not abut against the front edge GBf of the positioning substrate GB and is in contact with the side edge GBs of the positioning substrate GB.

[0066] As Figure 9 shown, the movement of the positioning substrate GB downstream and the position adjustment of the downstream guide roller 31 are sequentially performed until the downstream end where the glass plate G is carried out. Then, after positioning one of the guide rollers 31 on one side of the substrate cleaning device 100, the guide roller 31 on the other side of the substrate cleaning device 100 is positioned by the above positioning process.

[0067] According to this method of positioning the guide roller 31, it is possible to easily and highly accurately position the guide rollers 31 provided at intervals in the upstream and downstream. Thus, in the substrate cleaning device 100, the glass plate G can be smoothly guided without conveyance failures such as meandering and can be cleaned well. In particular, even in a place where it is difficult to perform centering using a linear body such as a wire due to a partition wall between regions where different cleaning processes are performed, positioning can be smoothly and accurately performed.

[0068] In addition, in the above positioning method, it is important that the positioning substrate GB moves in the conveying direction X without meandering, and that the guide roller 31 to be positioned contacts the side edge GBs of the positioning substrate GB without a gap.

[0069] (Conveying control method)

[0070] First, one of the conveying rollers 11 that rotates by driving the motor 25 is selected in each processing unit 10. And, for example, the time T when the conveying roller 11 rotates 20 turns is measured multiple times (for example, five times) using a stopwatch or the like. Then, the average time Tave of the time T when the conveying roller 11 rotates 20 turns is calculated, and the conveying speed V of the glass plate G is calculated based on the average time Tave.

[0071] Specifically, according to the diameter D of the roller portion 23 of the conveying roller 11, the conveying distance L when the conveying roller 11 rotates 20 turns is calculated based on Equation (1), and further, based on the conveying distance L and the average time Tave, the conveying speed V is calculated based on Equation (2).

[0072] L = 20πD…(1)

[0073] V = L / Tave…(2)

[0074] After calculating the conveyance speed V in each processing unit 10, the control unit 40 controls the driving of the drive motor 25 so that the difference ΔV in the conveyance speed V of these processing units 10 becomes equal to or less than a preset threshold value.

[0075] According to this conveyance control method, it is possible to suppress the difference ΔV in the conveyance speed V of the glass plate G for each processing unit 10. As a result, in the substrate cleaning apparatus 100, the glass plate G can be smoothly conveyed without conveyance failures such as the adhesion of marks of the conveyance rollers 11 due to the difference ΔV in the conveyance speed V and meandering, and can be cleaned well.

[0076] As described above, the present invention is not limited to the above-described embodiments, and combinations of the structures of the embodiments, changes and applications made by those skilled in the art based on the description of the specification and well-known techniques are also within the scope of the present invention and are included in the scope of protection claimed.

[0077] As described above, the following matters are disclosed in the present specification.

[0078] (1) A positioning method for a substrate cleaning apparatus, which performs positioning of conveyance rollers in a substrate cleaning apparatus, the substrate cleaning apparatus including a plurality of the conveyance rollers that convey a glass plate along a conveyance path, wherein

[0079] A positioning substrate is installed between the conveyance roller as a reference and the conveyance roller as a positioning target.

[0080] The tilt angle of the positioning substrate is measured.

[0081] A height difference is calculated based on the tilt angle and the distance dimension between the conveyance roller as a reference and the conveyance roller as a positioning target, and

[0082] The height of the conveyance roller as a positioning target is adjusted so that the height difference becomes equal to or less than a preset reference value.

[0083] According to this positioning method for a substrate cleaning apparatus, it is possible to easily and highly accurately position the height of the conveyance rollers that convey the glass plate. As a result, in the substrate cleaning apparatus, the glass plate can be smoothly conveyed without conveyance failures such as meandering and can be cleaned well. In particular, even in a place where it is difficult to adjust the height using a measuring instrument such as a laser due to a partition wall or the like between regions where different cleaning processes are performed, positioning can be smoothly performed.

[0084] (2) A positioning method for a substrate cleaning device, which is a positioning method for guide rollers in the substrate cleaning device. On at least one side of the conveying section of the substrate cleaning device that conveys a glass plate along a conveying path, a plurality of the guide rollers that contact the side edge of the glass plate to guide the glass plate are provided upstream and downstream of the conveying path. Among them,

[0085] Regarding the plurality of guide rollers at the upstream end as reference guide rollers, and arranging a positioning substrate so that its side edge contacts these guide rollers, and

[0086] Moving the positioning substrate toward the downstream side, and sequentially arranging the guide rollers on the downstream side at positions where they contact the side edge of the positioning substrate.

[0087] According to this positioning method for the substrate cleaning device, it is possible to easily and highly accurately position the guide rollers provided at intervals upstream and downstream. Thereby, in the substrate cleaning device, it is possible to smoothly guide the glass plate without conveyance failures such as meandering and perform cleaning well. In particular, even in a place where it is difficult to perform positioning by centering using a linear body such as a wire due to the presence of a partition wall between regions where different cleaning processes are performed, it is possible to perform positioning smoothly and accurately.

[0088] (3) A conveyance control method for a substrate cleaning device, which is a conveyance control method in a substrate cleaning device in which a plurality of processing units are continuously provided. The plurality of processing units perform cleaning processing while conveying a glass plate along a conveying path by a plurality of conveying rollers rotated by a drive motor. Among them,

[0089] Calculate the conveyance speed of the glass plate by the conveying rollers for each of the processing units, and

[0090] Control the drive motor of the processing unit so that the difference in the conveyance speeds becomes equal to or less than a preset threshold value.

[0091] According to this conveyance control method for the substrate cleaning device, it is possible to suppress the difference in the conveyance speeds of the glass plate for each processing unit. Thereby, in the substrate cleaning device, it is possible to smoothly convey the glass plate without conveyance failures such as the adhesion of marks of the conveying rollers to the glass plate and meandering due to the difference in the conveyance speeds and perform cleaning well.

[0092] This application is based on Japanese Patent Application No. 2023-195976 filed on November 17, 2023, the content of which is incorporated herein by reference.

[0093] Reference Numeral Explanation

[0094] 10 Processing unit;

[0095] 11 Conveying roller;

[0096] 11A Conveyor roller as a reference;

[0097] 11B Conveyor roller as an object to be positioned;

[0098] 25 Driving motor;

[0099] 31 Guide roller;

[0100] 100 Substrate cleaning device;

[0101] G Glass plate;

[0102] GA Substrate for positioning;

[0103] GB Substrate for positioning;

[0104] GBs Side edge;

[0105] P Pitch dimension;

[0106] PL Path line (conveyor path);

[0107] V Conveyor speed;

[0108] θ Tilt angle;

[0109] ΔH Height difference;

[0110] ΔV Conveyor speed difference.

Claims

1. A method for positioning a substrate cleaning device, for positioning a conveying roller in the substrate cleaning device, wherein the substrate cleaning device is provided with a plurality of conveying rollers for conveying a glass plate along a conveying path, wherein: A positioning substrate is set between the conveyor roller as a reference and the conveyor roller frame as a positioning object. measuring the tilt angle of the positioning substrate, The height difference is calculated based on the inclination angle and the distance between the conveying roller as the reference and the conveying roller as the positioning object, and The height of the transport roller to be positioned is adjusted so that the height difference becomes equal to or less than a preset reference value.

2. A method for positioning a substrate cleaning device, which is a method for positioning a guide roller in a substrate cleaning device, wherein the substrate cleaning device is provided with a plurality of guide rollers contacting with the side edge of the glass plate and guiding the glass plate at the upstream and downstream of the conveying path on at least one side of a conveying portion for conveying a glass plate along a conveying path, wherein: The plurality of guide rollers at the upstream end are used as reference guide rollers, and the positioning substrate is arranged so that the side edges are in contact with these guide rollers, and The positioning substrate is moved to the downstream side, and the guide rollers on the downstream side are sequentially arranged at positions in contact with the side edges of the positioning substrate.

3. A conveying control method for a substrate cleaning device, which is a conveying control method in a substrate cleaning device having a plurality of processing units arranged in series, wherein the plurality of processing units perform cleaning processing while conveying a glass plate along a conveying path using a plurality of conveying rollers rotated by a driving motor, wherein: calculating the conveying speed of the conveying roller of each of the processing units to the glass sheet, and The driving motor of the processing unit is controlled so that the difference in the conveying speed becomes equal to or less than a preset threshold value.

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