Semiconductor photoetching machine equipment environment purification detection device

Abstract

The invention discloses a semiconductor photoetching machine equipment environment purification detection device, and relates to the field of photoetching machine application, the semiconductor photoetching machine equipment environment purification detection device comprises a second box body, an air inlet pipeline and an air outlet pipeline are arranged in the second box body, and outer convex rings, movable joints and first springs are arranged outside the air inlet pipeline and the air outlet pipeline; the interior of the second box body is rotatably connected with a positive and negative threaded rod, the positive and negative threaded rod is in threaded connection with the movable joint, the interior of the first box body is rotatably connected with a filter element replacement assembly by arranging a mounting frame, and a plurality of groups of ULPA filters are mounted in the filter element replacement assembly; and the filter element replacement assembly is in transmission connection with the right-hand and left-hand threaded rod through a transmission assembly. The ULPA filter element can be rapidly replaced by arranging the filter element replacing assembly, the filter element replacing assembly is provided with a plurality of silos for containing the ULPA filter element, an old ULPA filter element can be disassembled by pushing a rotary knob of the filter element replacing assembly, and then a new ULPA filter element can be installed by rotating the rotary knob.

Description

Technical Field

[0001] The present invention relates to the application field of photolithography machines, and in particular to an environmental purification detection device for semiconductor photolithography equipment. Background Art

[0002] A photolithography machine is a device used in semiconductor manufacturing, mainly used for transferring circuit patterns onto silicon wafers. It is one of the key equipment in semiconductor production. The photolithography machine plays a vital role in the chip production process and requires a high-precision environment to ensure the accuracy of imaging. During the photolithography process, the stability of the light source, the coating of the photoresist, the exposure and development steps all require an extremely clean environment. In a dust-free workshop, through an efficient air circulation system, the particles in the air are continuously filtered to ensure that the photolithography machine will not be contaminated during operation, thereby ensuring the clarity and accuracy of the photolithography pattern.

[0003] The interior of the lithography machine is also equipped with an air circulation system to ensure the cleanliness of key areas of the lithography machine. It mainly includes dust control, using HEPA (high-efficiency particulate air) and ULPA (ultra-high-efficiency particulate air) filters to capture particles with a diameter of 0.3 microns or even smaller, so that the air maintains a certain flow rate and flows in a specific vertical direction to ensure that the air continues to flow and carries away small suspended particles. The temperature is controlled at 20-23°C and the humidity is maintained between 40% and 60%. Usually, the interior of the lithography machine will maintain a negative pressure state, so that the air in the dust-free workshop must enter the interior of the lithography machine through the air inlet of the lithography machine to prevent the air outside the lithography machine from entering the interior through the equipment gaps of the lithography machine.

[0004] The air circulation system of the lithography machine is a very critical component in the lithography process. Through effective pollution control and temperature and humidity control, the high precision and high quality of chip production can be guaranteed. The cleanliness of suspended matter in the lithography machine mainly relies on HEPA filters and ULPA filters to filter the incoming air. HEPA filters and ULPA filters are consumables and need to be cleaned and maintained regularly to ensure that the air system does not have poor air flow or weakened filtering effect. The maintenance and inspection of the filters are inevitably accompanied by equipment shutdown, which causes interruptions in chip lithography production and thus affects the overall efficiency of chip manufacturing. Summary of the Invention

[0005] Based on this, the purpose of the present invention is to provide a semiconductor lithography equipment environment purification detection device to solve the technical problems mentioned in the above background.

[0006] To achieve the above-mentioned objectives, the present invention provides the following technical solutions: a semiconductor lithography equipment environmental purification detection device, comprising a second box body, an air inlet duct and an air outlet duct are arranged inside the second box body, and the outside of the air inlet duct and the air outlet duct are provided with an outer convex ring, a movable joint and a first spring, the interior of the second box body is rotatably connected with a forward and reverse threaded rod, and the forward and reverse threaded rod and the movable joint are threadedly connected, the interior of the second box body is rotatably connected with a filter element replacement assembly by setting a mounting frame, and the interior of the filter element replacement assembly is installed with multiple groups of ULPA filters, and the filter element replacement assembly and the forward and reverse threaded rod are connected by a transmission assembly.

[0007] By adopting the above technical solution, the ULPA filter element can be quickly replaced by setting up a filter element replacement assembly. The filter element replacement assembly is provided with multiple groups of silos for accommodating ULPA filter elements. The old ULPA filter element can be removed by pushing the knob of the filter element replacement assembly, and then the new ULPA filter element can be installed by turning the knob.

[0008] The present invention is further configured such that the movable joint includes a sleeve sleeved on the outside of the air inlet duct, and two groups of blocking rings are provided on the outside of the sleeve, and a movable ring is movably installed on the outside of the sleeve between the two groups of blocking rings, and the movable ring is threadedly connected to the forward and reverse threaded rods.

[0009] Preferably, a movable joint is provided to connect the filter element replacement assembly so that the air inlet duct, the air outlet duct and the silo of the disc can be connected as a whole, thereby achieving the purpose of conveying air. The movable ring of the movable joint is movably installed between the two sets of blocking rings, and then the movable joint as a whole is adjusted to the appropriate position by rotating the forward and reverse threaded rods. The sleeve of the movable joint can be pushed by the first spring, so that the sleeve and the silo of the disc are more tightly connected, reducing air leakage.

[0010] The present invention is further configured such that the filter element replacement assembly includes a disc rotatably connected to the mounting frame, and a silo matching the ULPA filter is provided on the inner side of the disc, sealing rings are provided at both ends of the silo, and both ends of the silo are configured as oblique conical surfaces, and a dust cover is movably installed on the side of the disc at the position of the silo by providing an annular groove.

[0011] Preferably, a silo matching the ULPA filter is opened on the disc, and the ULPA filter can be replaced by rotating the disc. A sealing ring can improve the sealing between the silo and the air inlet and outlet ducts, reducing air leakage. A dust cover can prevent unused ULPA filters from contacting the air.

[0012] The present invention is further configured such that the silos are arranged in a plurality of groups in the disc, and the plurality of groups of silos are evenly distributed in the disc.

[0013] Preferably, multiple groups of ULPA filters can be installed by providing multiple groups of silos, so that the filter element replacement assembly can quickly replace the ULPA filters.

[0014] The present invention is further configured such that a knob is movably installed inside the disc, a limiting groove is provided on the side of the knob, and a limiting block matching the limiting groove is provided inside the disc.

[0015] Preferably, by providing a limiting groove and a limiting block, pressing the knob can engage the knob and the disc, so that rotating the knob can drive the disc to rotate.

[0016] The present invention is further configured such that a fixing rod is provided on one side of the knob, and the end of the fixing rod is rotatably connected to a sleeve, and a rack is provided on the outside of the sleeve, and a strip rod is movably installed on the inside of the sleeve by providing a second spring, and the other end of the strip rod is fixedly connected to the inside of the second box.

[0017] Preferably, by arranging a fixing rod, a sleeve, a second spring and a strip rod, pressing the knob can push the rack and the spur gear to engage, and rotating the knob will not drive the sleeve to rotate.

[0018] The present invention is further configured such that the transmission assembly includes a spur gear rotatably connected to the inside of the second housing, and the spur gear and the rack are engaged with each other, and a first bevel gear is provided on one side of the spur gear, the transmission assembly also includes a second bevel gear rotatably connected to the inside of the second housing, and the second bevel gear and the first bevel gear are engaged with each other, and the second bevel gear is connected for transmission by providing a first pulley assembly, a second pulley assembly and forward and reverse threaded rods.

[0019] Preferably, a transmission assembly is provided so that the pressing knob can drive the forward and reverse threaded rods to rotate, thereby achieving the purpose of controlling the two sets of movable joints to move closer or farther away.

[0020] The present invention is further configured such that the side of the second box is connected to the first box, and an air inlet is provided on one side of the first box, and a fan, a hot coil and a cold coil are provided inside the first box, and a return air duct is provided on the top of the first box.

[0021] Preferably, a fan is provided to draw air from outside the lithography machine into the inside of the lithography machine, a hot coil and a cold coil are provided to adjust the temperature of the air, and a return air duct is provided so that the air inside the lithography machine and harmful gases that may be generated during operation can be filtered before being discharged to avoid polluting the external environment.

[0022] The present invention is further configured such that a first chamber and a second chamber are provided inside the first box body, an electrostatic dust removal device is installed inside the first chamber, and a HEPA filter is installed inside the second chamber, and a partition for sealing the second chamber and the HEPA filter is rotatably connected inside the first box body.

[0023] Preferably, by setting up HEPA filters and electrostatic dust removal equipment for alternating use, it is possible to ensure that the lithography machine operates without stopping, thereby improving chip production efficiency.

[0024] In summary, the present invention mainly has the following beneficial effects:

[0025] 1. The present invention can quickly replace the ULPA filter element by providing a filter element replacement assembly. The filter element replacement assembly is provided with multiple groups of silos for accommodating ULPA filter elements. The old ULPA filter element can be removed by pushing the knob of the filter element replacement assembly, and then the new ULPA filter element can be installed by turning the knob. Traditional ULPA filter elements are often installed using brackets and screws. The brackets are pulled out, the fixing screws are removed, and the old ULPA filter element is taken out. The direction of the ULPA filter element is checked to be consistent with the direction of air flow. This series of steps is relatively cumbersome, which makes the replacement time of the ULPA filter element longer. Furthermore, in the prior art, the replacement of the ULPA filter element requires cutting off the power supply and shutting down the air circulation system to avoid long-term replacement of the filter element and some impurities entering the interior of the equipment. In the present application, the filter element replacement assembly is provided to make the replacement of the ULPA filter element convenient and quick. The new ULPA filter element is pre-installed in the silo in advance. During actual maintenance and replacement, the lithography equipment does not need to be shut down. The ULPA filter element can be replaced by quickly pushing and turning the knob.

[0026] 2. The present invention arranges for alternating use of electrostatic dust removal equipment and HEPA filter elements, which not only allows the lithography equipment to be maintained and replaced without shutting down the filter element, but also extends the service life of the HEPA filter element. The HEPA filter element is a consumable and has a high cost. Since the lithography equipment is used in a dust-free workshop, the air cleanliness in the dust-free workshop is relatively high, so the air entering the lithography equipment already has a high degree of cleanliness. Therefore, for the air circulation system of the lithography equipment, the ULPA filter element is used as a high-efficiency filter, and the electrostatic dust removal equipment is used as a primary filter. The electrostatic dust removal equipment can not only remove fine suspended particles, but also has a good capture effect on charged particles in the air. The electrostatic dust removal is maintained by cleaning electrodes, which has a lower cost. When the electrostatic dust removal equipment needs to be cleaned and maintained, the electrostatic dust removal equipment and the HEPA filter element of the air circulation system are switched, and the HEPA filter element is temporarily used instead of the electrostatic dust removal equipment. This not only ensures the continuous operation of the lithography machine, but also reduces the use of HEPA filter elements, reduces the cost of consumables, and extends the service life of a single HEPA filter element. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0028] Figure 2 This is a schematic diagram of a partition shielding a HEPA filter according to the present invention;

[0029] Figure 3 This is a schematic diagram of a partition shielding electrostatic dust removal device according to the present invention;

[0030] Figure 4 This is a schematic diagram of the distribution of the first chamber and the second chamber of the present invention;

[0031] Figure 5 This is a schematic diagram of the internal structure of the first box body of the present invention;

[0032] Figure 6 This is a schematic diagram of the internal structure of the second box body of the present invention;

[0033] Figure 7 This is a schematic diagram of the installation of the air inlet duct, the air outlet duct, the outer convex ring, the first spring, the movable joint and the forward and reverse threaded rods of the present invention;

[0034] Figure 8 This is a schematic diagram of the movable joint structure of the present invention;

[0035] Figure 9 This is a schematic structural diagram of the filter element replacement assembly of the present invention;

[0036] Figure 10 Schematic diagram of the internal structure of the disc of the present invention;

[0037] Figure 11 This is a schematic diagram of the installation of the knob, fixing rod, sleeve, rack, second spring and bar rod of the present invention;

[0038] Figure 12 For the present invention Figure 6 A in the enlarged view.

[0039] Description of reference numerals:

[0040] 1. First housing; 2. Air inlet; 3. First chamber; 4. Second chamber; 5. Electrostatic dust removal device; 6. HEPA filter; 7. Partition; 8. Fan; 9. Hot coil; 10. Cold coil; 11. Return air duct; 12. Second housing; 13. Air inlet duct; 14. Air outlet duct; 15. External convex ring; 16. Flexible joint; 1601. Sleeve; 1602. Blocking ring; 1603. Flexible ring; 17. First spring; 18. Threaded rod; 19. Filter element replacement assembly; 1901. Disc; 1902. Silo; 190 3. Sealing ring; 1904. Beveled conical surface; 1905. Annular groove; 1906. Dust cover; 1907. Knob; 1908. Limiting groove; 1909. Limiting block; 1910. Fixing rod; 1911. Sleeve; 1912. Rack; 1913. Second spring; 1914. Strip rod; 20. Transmission assembly; 2001. Spur gear; 2002. First bevel gear; 2003. Second bevel gear; 2004. First pulley assembly; 2005. Second pulley assembly; 21. ULPA filter; 22. Mounting bracket. DETAILED DESCRIPTION

[0041] The following will be combined with the accompanying drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be understood as limiting the present invention.

[0042] The following describes an embodiment of the present invention based on its overall structure.

[0043] See also Figure 1 - Figure 12, a semiconductor lithography equipment environment purification detection device, including a second box 12, the interior of the second box 12 is provided with an air inlet duct 13 and an air outlet duct 14, the air enters from the air inlet duct 13, is filtered by the ULPA filter 21, and then is discharged from the air outlet duct 14 to the interior of the lithography machine, the air outlet duct 14 is connected to multiple groups of pipes distributed in the key working area of ​​the lithography machine, and the outside of the air inlet duct 13 and the air outlet duct 14 are provided with an outer convex ring 15, a movable joint 16 and a first spring 17, the first spring 17 can push the movable joint 16 to clamp, and the interior of the second box 12 is rotatably connected to the positive The reverse threaded rod 18 is threadedly connected to the forward and reverse threaded rod 18 and the movable joint 16. Rotating the forward and reverse threaded rod 18 is used to drive the two sets of movable joints 16 distributed outside the air inlet duct 13 and the air outlet duct 14 to move closer to or away from each other. The interior of the second box 12 is rotatably connected to the filter element replacement assembly 19 by setting a mounting bracket 22, and the interior of the filter element replacement assembly 19 is equipped with multiple groups of ULPA filters 21, and the filter element replacement assembly 19 and the forward and reverse threaded rod 18 are connected by a transmission assembly 20. By rotating the filter element replacement assembly 19, the ULPA filter can be quickly replaced.

[0044] In the above embodiment, please refer to Figure 8 The movable joint 16 includes a sleeve 1601 that is sleeved on the outside of the air inlet duct 13, and two groups of blocking rings 1602 are provided on the outside of the sleeve 1601, and a movable ring 1603 is movably installed on the outside of the sleeve 1601 between the two groups of blocking rings 1602. The movable ring 1603 is threadedly connected to the positive and negative threaded rods 18. By setting the movable joint 16 to connect the filter element replacement assembly 19, the air inlet duct 13, the air outlet duct 14 and the silo 1902 of the disc 1901 can be connected as a whole, thereby achieving the purpose of conveying air. The movable ring 1603 of the movable joint 16 is movably installed between the two groups of blocking rings 1602, and then after the movable joint 16 as a whole is adjusted to the appropriate position by rotating the positive and negative threaded rods 18, the sleeve 1601 of the movable joint 16 can be pushed by the first spring 17, so that the sleeve 1601 and the silo 1902 of the disc 1901 are more tightly connected, reducing air leakage.

[0045] In the above embodiment, please refer to Figure 9 and Figure 10The filter element replacement assembly 19 includes a disc 1901 rotatably connected to the mounting frame 22, and a silo 1902 matching the ULPA filter 21 is provided on the inner side of the disc 1901, and sealing rings 1903 are provided at both ends of the silo 1902, and both ends of the silo 1902 are provided with oblique cone surfaces 1904. The side of the disc 1901 is located at the position of the silo 1902 and a dust cover 1906 is movably installed by providing an annular groove 1905. By providing a silo 1902 matching the ULPA filter 21 on the disc 1901 and then rotating the disc 1901, the ULPA filter 21 can be replaced. The provision of the sealing ring 1903 can improve the sealing between the silo 1902 and the air inlet duct 13 and the air outlet duct 14, and reduce air leakage. The provision of the dust cover 1906 can prevent unused ULPA filters 21 from contacting the air.

[0046] In the above embodiment, please refer to Figure 8 There are multiple groups of silos 1902 located in the disc 1901, and the multiple groups of silos 1902 are evenly distributed. By setting up multiple groups of silos 1902, multiple groups of ULPA filters 21 can be installed, so that the filter element replacement assembly 19 can quickly replace the ULPA filter 21.

[0047] In the above embodiment, please refer to Figure 10 A knob 1907 is movably installed inside the disk 1901, and a limiting groove 1908 is provided on the side of the knob 1907, and a limiting block 1909 is provided inside the disk 1901 to match the limiting groove 1908. By setting the limiting groove 1908 and the limiting block 1909, pressing the knob 1907 can engage the knob 1907 and the disk 1901, so that turning the knob 1907 can drive the disk 1901 to rotate.

[0048] In the above embodiment, please refer to Figure 11 A fixing rod 1910 is provided on one side of the knob 1907, and the end of the fixing rod 1910 is rotatably connected to a sleeve 1911, and a rack 1912 is provided on the outside of the sleeve 1911. The interior of the sleeve 1911 is movably installed with a strip rod 1914 by setting a second spring 1913, and the other end of the strip rod 1914 is fixedly connected to the interior of the second box body 12. By setting the fixing rod 1910, the sleeve 1911, the second spring 1913 and the strip rod 1914, pressing the knob 1907 can push the rack 1912 and the spur gear 2001 to engage, and rotating the knob 1907 will not drive the sleeve 1911 to rotate.

[0049] In the above embodiment, please refer to Figure 12The transmission assembly 20 includes a spur gear 2001 rotatably connected to the inside of the second box body 12, and the spur gear 2001 and the rack 1912 are engaged with each other, and a first bevel gear 2002 is provided on one side of the spur gear 2001. The transmission assembly 20 also includes a second bevel gear 2003 rotatably connected to the inside of the second box body 12, and the second bevel gear 2003 and the first bevel gear 2002 are engaged with each other, and the second bevel gear 2003 is connected to the forward and reverse threaded rod 18 by setting a first pulley assembly 2004, a second pulley assembly 2005 and a forward and reverse threaded rod 18. By setting the transmission assembly 20, pressing the knob 1907 can drive the forward and reverse threaded rod 18 to rotate, thereby achieving the purpose of controlling the two sets of movable joints 16 to move closer or farther away.

[0050] In the above embodiment, please refer to Figure 2 - Figure 5 The side of the second box body 12 is connected to the first box body 1, and an air inlet 2 is provided on one side of the first box body 1, and a fan 8, a hot coil 9 and a cold coil 10 are provided inside the first box body 1. A return air duct 11 is provided on the top of the first box body 1. By setting the fan 8, the air outside the lithography machine can be sucked into the inside of the lithography machine. The hot coil 9 and the cold coil 10 can be set to adjust the temperature of the air. The return air duct 11 is set so that the air in the lithography machine and the harmful gases that may be generated during work can be filtered before being discharged to avoid polluting the external environment.

[0051] In the above embodiment, please refer to Figure 2 - Figure 4 The first box body 1 is provided with a first chamber 3 and a second chamber 4, and an electrostatic dust removal device 5 is installed inside the first chamber 3, and a HEPA filter 6 is installed inside the second chamber 4. A partition 7 for sealing the second chamber 4 and the HEPA filter 6 is rotatably connected to the interior of the first box body 1. By arranging the HEPA filter 6 and the electrostatic dust removal device 5 for alternating use, it can be ensured that the lithography machine works without stopping, thereby improving the chip production efficiency.

[0052] When the present invention is working specifically: first, when the air circulation system is working, the fan 8 works, and the air enters the interior of the first box 1 through the air inlet 2, and the air passes through the electrostatic dust removal device 5. The electrodes of the electrostatic dust removal device 5 adsorb fine particles and charged particles in the air, and then the air that has been preliminarily filtered passes through the hot coil 9 and the cold coil 10. The interior of the lithography machine equipment is equipped with a variety of sensors for detecting air cleanliness, such as: particle counters, temperature and humidity meters, and pressure difference detection, etc. The sensors monitor the data of the air in the working area of ​​the lithography machine to control the electrical signal feedback control air circulation system. The hot coil 9 and the cold coil 10 work to adjust the temperature of the air, and then the air enters the air inlet duct 13, and the air passes through the ULPA filter 21. The ULPA filter 21 will further filter the air. The filtered air enters the interior of the lithography machine through the outlet duct 14. The outlet duct 14 connects multiple groups of pipes distributed at key positions in the lithography machine, and the air in the lithography machine and the harmful gases generated during operation enter the first box 1 through the return air duct 11 for re-filtration and use.

[0053] When the air circulation system needs to maintain the electrostatic dust removal device 5, the partition 7 is rotated so that the partition 7 is flipped 180° to block the electrostatic dust removal device 5, and then the air will pass through the HEPA filter 6 for filtration. At this time, the electrostatic dust removal device 5 can be disassembled for maintenance and cleaning.

[0054] When the ULPA filter 21 of the air circulation system needs to be maintained and replaced, the dust cover 1906 of the ULPA filter 21 to be installed is removed, and the knob 1907 is pressed to engage the limit groove 1908 and the limit block 1909, and the fixing rod 1910 will push the sleeve 1911 to move, so that the second spring 1913 is compressed, and the rack 1912 moves to drive the spur gear 2001 to rotate, and the spur gear 2001 drives the first bevel gear 2002 to rotate, and the first bevel gear 2002 drives the second bevel gear 2003 to rotate, and the second bevel gear 2003 drives the first pulley assembly 2004 to work, and the first pulley assembly 2004 drives the second pulley assembly 2005 to work, and the second pulley assembly 2005 drives the forward and reverse threaded rods 18 to rotate, so that the two sets of movable joints 16 compress the first spring 17 and move away from each other, and then the two sets of movable joints 16 move away from the filter element replacement assembly 19.

[0055] Keep the knob 1907 of the filter element replacement assembly 19 in the pressed rotation and rotate the knob 1907. Since the knob 1907 is engaged with the disc 1901 through the limit groove 1908 and the limit block 1909, the knob 1907 is rotated to drive the disc 1901 to rotate 90°, so that the old ULPA filter 21 in the disc 1901 is rotated out, and the new ULPA filter 21 in the disc 1901 is rotated to between the two sets of movable joints 16. When the knob 1907 is released, under the resetting action of the second spring 1913, the transmission assembly 20 will work in reverse so that the two sets of movable joints 16 are close to each other to clamp the silo 1902 of the filter element replacement assembly 19. The movable ring 1603 of the movable joint 16 is movably installed between the two sets of blocking rings 1602, and after shortening the distance between the two sets of movable rings 1603, the sleeve 1601 can be pushed and clamped by the first spring 17.

[0056] After the ULPA filter 21 is replaced, the old ULPA filter 21 is taken out and the silo 1902 is cleaned. The other empty silos 1902 are re-installed with a new second box 12 after confirming the direction and the dust cover 1906 is sealed.

[0057] Although an embodiment of the present invention has been shown and described, this specific embodiment is merely an explanation of the present invention and is not a limitation of the invention. The specific features, structures, materials or characteristics described may be combined in an appropriate manner in any one or more embodiments or examples. After reading this specification, those skilled in the art may make modifications, substitutions and variations to the embodiment without creative contribution as needed without departing from the principles and purpose of the present invention. However, as long as they are within the scope of the claims of the present invention, they are protected by patent law.

Claims

1. A semiconductor lithography equipment environment purification detection device, comprising a second box (12), characterized in that: An air inlet duct (13) and an air outlet duct (14) are arranged inside the second housing (12), and the outsides of the air inlet duct (13) and the air outlet duct (14) are both provided with an outer convex ring (15), a movable joint (16) and a first spring (17); a forward and reverse threaded rod (18) is rotatably connected inside the second housing (12), and the forward and reverse threaded rod (18) and the movable joint (16) are threadedly connected; a filter element replacement assembly (19) is rotatably connected inside the second housing (12) via a mounting frame (22), and a plurality of groups of ULPA filters (21) are installed inside the filter element replacement assembly (19), and the filter element replacement assembly (19) and the forward and reverse threaded rod (18) are transmission-connected via a transmission assembly (20).

2. A semiconductor lithography equipment environment purification detection device according to claim 1, characterized in that: The movable joint (16) comprises a sleeve (1601) sleeved on the outside of the air inlet duct (13), and two groups of blocking rings (1602) are arranged on the outside of the sleeve (1601), and a movable ring (1603) is movably installed on the outside of the sleeve (1601) between the two groups of blocking rings (1602), and the movable ring (1603) is threadedly connected to the forward and reverse threaded rod (18).

3. A semiconductor lithography equipment environment purification detection device according to claim 1, characterized in that: The filter element replacement assembly (19) comprises a disc (1901) rotatably connected to a mounting frame (22), and a silo (1902) matching the ULPA filter (21) is provided on the inner side of the disc (1901), sealing rings (1903) are provided at both ends of the silo (1902), and both ends of the silo (1902) are provided with oblique conical surfaces (1904), and a dust cover (1906) is movably installed on the side of the disc (1901) located at the position of the silo (1902) by providing an annular groove (1905).

4. A semiconductor lithography equipment environment purification detection device according to claim 3, characterized in that: The silos (1902) are located in a plurality of groups in the disc (1901), and the plurality of groups of silos (1902) are evenly distributed.

5. A semiconductor lithography equipment environment purification detection device according to claim 4, characterized in that: A knob (1907) is movably mounted inside the circular disk (1901), a limiting groove (1908) is provided on the side of the knob (1907), and a limiting block (1909) matching the limiting groove (1908) is provided inside the circular disk (1901).

6. A semiconductor lithography equipment environment purification detection device according to claim 5, characterized in that: A fixing rod (1910) is provided on one side of the knob (1907), and the end of the fixing rod (1910) is rotatably connected to a sleeve (1911), and a rack (1912) is provided on the outside of the sleeve (1911), and a strip rod (1914) is movably mounted on the inside of the sleeve (1911) by means of a second spring (1913), and the other end of the strip rod (1914) is fixedly connected to the inside of the second box (12).

7. A semiconductor lithography equipment environment purification detection device according to claim 6, characterized in that: The transmission assembly (20) comprises a spur gear (2001) rotatably connected to the interior of the second housing (12), the spur gear (2001) and the rack (1912) meshing with each other, and a first bevel gear (2002) is provided on one side of the spur gear (2001). The transmission assembly (20) further comprises a second bevel gear (2003) rotatably connected to the interior of the second housing (12), the second bevel gear (2003) and the first bevel gear (2002) meshing with each other, and the second bevel gear (2003) is transmission-connected by providing a first pulley assembly (2004), a second pulley assembly (2005) and a forward and reverse threaded rod (18).

8. The semiconductor lithography equipment environment purification detection device according to claim 1, characterized in that: The side of the second box (12) is connected to the first box (1), and an air inlet (2) is provided on one side of the first box (1), and a fan (8), a hot coil (9) and a cold coil (10) are provided inside the first box (1), and a return air duct (11) is provided on the top of the first box (1).

9. A semiconductor lithography equipment environment purification detection device according to claim 8, characterized in that: A first chamber (3) and a second chamber (4) are arranged inside the first housing (1), an electrostatic dust removal device (5) is installed inside the first chamber (3), and a HEPA filter (6) is installed inside the second chamber (4), and a partition (7) for sealing the second chamber (4) and the HEPA filter (6) is rotatably connected inside the first housing (1).

Images