Developing method and device
By using a combination method of a developer containing sodium carbonate and a mineral liquid cleaning solution, the problem of photosensitive adhesive residue in the existing development process is solved, effectively removing and cleaning the opening of the battery cell, and improving the yield rate of the battery cell.
Patent Information
- Application Number
- CN202510334351.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2024-03-20
- Filing Date
- 2025-03-20
- Publication Date
- 2025-05-30
AI Technical Summary
The existing development process cannot effectively remove the photosensitive adhesive in the exposed or non-exposed regions of the cell, resulting in residual photosensitive adhesive in the opening, affecting the subsequent electroplating preparation of the grid lines and reducing the yield of the cell.
The cell precursor was treated with a developer formed by a drug solution containing sodium carbonate and microbubbles, and the photosensitive glue was removed, and the residual photosensitive glue after development was removed using a cleaning solution formed by a mineral liquid and microbubbles.
Through the treatment of the developer, the photosensitive adhesive on the surface of the battery is effectively removed to form an opening with a preset pattern; by the treatment of the cleaning solution, the photosensitive adhesive remaining in the opening is removed, ensuring that the battery cell meets the standards for subsequent processing after cleaning, and improving the yield rate of the battery cell.
Smart Images

Figure CN120065656A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of photovoltaics, and particularly to a developing method and device. Background Art
[0002] The developing process is a key step in the production process of solar cells (hereinafter referred to as cells). In the preparation process of the grid lines of the cells, it is necessary to first coat a photosensitive resin on the cell substrate, and then use the exposure process to expose a part of the photosensitive resin coated on the cell substrate to form an exposed area, and then remove the photosensitive resin in the exposed area or the non-exposed area through the developing process to obtain an opening required for subsequent electroplating to prepare the grid lines.
[0003] However, the existing developing process cannot effectively remove the photosensitive resin in the exposed area or the non-exposed area, resulting in partial photosensitive resin remaining in the opening, affecting the subsequent electroplating to prepare the grid lines, and further reducing the yield of the cells. Summary of the Invention
[0004] The purpose of the present application is to provide a developing method and device, which treat the cell precursor with a developing solution formed by a liquid medicine containing sodium carbonate and microbubbles to effectively remove the photosensitive resin; and use a cleaning solution formed by a mineral liquid and microbubbles to treat the first treated sheet after being treated with the developing solution to remove the photosensitive resin remaining in the opening.
[0005] To achieve the above purpose, the present application provides a developing method, including: treating a cell precursor with a developing solution to form a first treated sheet; treating the first treated sheet with a cleaning solution to form a second treated sheet; wherein, the developing solution includes a liquid medicine and microbubbles, the liquid medicine is an alkaline solution, the cleaning solution includes a mineral liquid and microbubbles, and the mineral liquid contains calcium ions or magnesium ions or calcium and magnesium ions. The semi-finished cell after the cell substrate coated with the photosensitive resin undergoes the exposure process is called the cell precursor. The cell substrate is a semi-finished cell with a transparent conductive layer or a seed layer.
[0006] As a further improvement of the above technical solution: the liquid medicine contains at least one of sodium carbonate, potassium carbonate, TMAH or TBAH.
[0007] As a further improvement of the above technical solution: the liquid medicine contains sodium carbonate, and the concentration of the sodium carbonate is 0.05%-2%.
[0008] As a further improvement of the above technical solution: the method of treating the cell precursor with the developing solution includes: spraying the developing solution on the surface of the cell precursor by using a nozzle, or soaking the cell precursor with the developing solution, or spraying the developing solution on the surface of the cell precursor by using a nozzle when soaking the cell precursor with the developing solution.
[0009] As a further improvement of the above technical solution: when the developing method includes soaking the battery precursor in a developer, the battery precursor is soaked in the developer at 10-45°C for 0.5-4 minutes;
[0010] When the developing method includes spraying the developer on the surface of the battery precursor with a spray head, the spray pressure of the spray head is 0.5-3 kg / cm 2 , the spraying angle is 50-90°, the droplet diameter is 5-500 μm, and preferably the droplet diameter is 20-280 μm.
[0011] As a further improvement of the above technical solution: the mineral liquid contains a preset concentration of calcium ions and / or a preset concentration of magnesium ions, and the preset concentration ≤ 300 mg / L.
[0012] As a further improvement of the above technical solution: the method of treating the first treated sheet with the cleaning liquid includes: spraying the cleaning liquid on the surface of the first treated sheet with a spray head, or soaking the first treated sheet in the cleaning liquid, or spraying the cleaning liquid on the surface of the first treated sheet with a spray head when soaking the first treated sheet in the cleaning liquid.
[0013] As a further improvement of the above technical solution: when the developing method includes soaking the first treated sheet in the cleaning liquid, the first treated sheet is soaked in the cleaning liquid for 0.5-3 minutes.
[0014] When the developing method includes spraying the cleaning liquid on the surface of the first treated sheet with a spray head, the spray pressure of the spray head is 0.5-3 kg / cm 2 , the spraying angle is 50-90°, the droplet diameter is 5-500 μm, and preferably the droplet diameter is 20-280 μm.
[0015] As a further improvement of the above technical solution: the microbubbles in the developer are formed by introducing gas into the liquid medicine and pressurizing the gas-liquid mixture;
[0016] And / or, the microbubbles in the cleaning liquid are formed by introducing gas into the mineral liquid and pressurizing the gas-liquid mixture.
[0017] On the other hand, the present application also provides a developing device that uses the aforementioned developing method, including a developing tank, a cleaning tank, a developing solution preparation component, a cleaning solution preparation component, and a transfer component; wherein, the developing solution preparation component is used to prepare a developing solution and convey the developing solution to the developing tank; the cleaning solution preparation component is used to prepare a cleaning solution and convey the cleaning solution to the cleaning tank; the transfer component is used to transfer the semi-finished battery wafers along the transfer direction, and the developing tank and the cleaning tank are sequentially arranged in the transfer direction. Among them, the battery wafer substrate, the battery wafer precursor, the first processed wafer, and the second processed wafer are all semi-finished battery wafers.
[0018] As a further improvement of the above technical solution: the developing solution preparation component includes a developing liquid supply pipeline and a developing gas supply pipeline, and the structure of the developing solution preparation component can be any one of the following: (1) both the developing liquid supply pipeline and the developing gas supply pipeline are connected to the developing tank; (2) both the developing liquid supply pipeline and the developing gas supply pipeline are connected to a pressure dissolved air tank, and the pressure dissolved air tank conveys the developing solution to the developing tank through a main developing liquid supply pipe.
[0019] As a further improvement of the above technical solution: the cleaning solution preparation component includes a cleaning liquid supply pipeline and a cleaning gas supply pipeline, and the structure of the cleaning solution preparation component can be any one of the following: (1) both the cleaning liquid supply pipeline and the cleaning gas supply pipeline are connected to the cleaning tank; (2) both the cleaning liquid supply pipeline and the cleaning gas supply pipeline are connected to a pressure dissolved air tank, and the pressure dissolved air tank conveys the cleaning solution to the cleaning tank through a main cleaning liquid supply pipe.
[0020] As a further improvement of the above technical solution: spray heads are provided on both the developing tank and the cleaning tank. The spray head located in the developing tank is connected to the developing solution preparation component, and the spray head located in the cleaning tank is connected to the cleaning solution preparation component; wherein, the spray heads are arranged facing the transfer component.
[0021] It can be seen that in the developing method provided by the present application, the battery wafer precursor is processed by a developing solution formed by a chemical solution containing sodium carbonate and microbubbles, which can effectively remove the photosensitive resin on the exposed area of the surface of the battery wafer precursor, form an opening with a preset pattern, and use a cleaning solution formed by a mineral liquid and microbubbles to process the first processed wafer obtained after development. Since the mineral ions in the mineral liquid will react with the photosensitive resin remaining in the exposed area, the photosensitive resin remaining in the opening can be removed, and the reaction between the photosensitive resin and other components can be prevented, so that the second processed wafer obtained after cleaning can meet the standards for subsequent processing.
[0022] The developing device provided by the present application includes all the technical solutions of the developing method, so it also has all the technical advantages of the developing method. Description of the Drawings
[0023] To more clearly illustrate the technical solutions in the embodiments of the present application, the following will briefly introduce the accompanying drawings required for the description of the embodiments. Obviously, the accompanying drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, without creative efforts, other accompanying drawings can be obtained based on these drawings.
[0024] Figure 1 is a flowchart of a development method in an implementation manner provided by the present application;
[0025] Figure 2 is the first scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 1 of the present application;
[0026] Figure 3 is the second scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 1 of the present application;
[0027] Figure 4 is the third scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 1 of the present application;
[0028] Figure 5 is the fourth scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 1 of the present application;
[0029] Figure 6 is the first scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 2 of the present application;
[0030] Figure 7 is the second scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 2 of the present application;
[0031] Figure 8 is the third scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 2 of the present application;
[0032] Figure 9 is the fourth scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 2 of the present application;
[0033] Figure 10 is the first scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 3 of the present application;
[0034] Figure 11 is the second scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 3 of the present application;
[0035] Figure 12 is the third scanning electron microscope image of the opening cross-section of the first processing sheet provided in Embodiment 3 of the present application;
[0036] Figure 13It is the fourth scanning electron microscope image of the opening cross-section of the first processing chip provided in Embodiment 3 of the present application;
[0037] Figure 14 It is the first scanning electron microscope image of the opening cross-section of the first processing chip provided in the comparative example of the present application;
[0038] Figure 15 It is the second scanning electron microscope image of the opening cross-section of the first processing chip provided in the comparative example of the present application;
[0039] Figure 16 It is the third scanning electron microscope image of the opening cross-section of the first processing chip provided in the comparative example of the present application;
[0040] Figure 17 It is the fourth scanning electron microscope image of the opening cross-section of the first processing chip provided in the comparative example of the present application;
[0041] Figure 18 It is a schematic structural diagram of a developing device in an implementation manner provided by the present application.
[0042] Reference numerals:
[0043] 10 - Developing tank;
[0044] 20 - Cleaning tank;
[0045] 30 - Transmission component;
[0046] 40 - Developing solution preparation component;
[0047] 50 - Cleaning solution preparation component;
[0048] 60 - Nozzle. Detailed implementation manners
[0049] To make the objectives, technical solutions, and advantages of the present application clearer, the following will further describe the implementation manners of the present application in detail with reference to the accompanying drawings. Terms such as "upper", "above", "lower", "below", "first end", "second end", "one end", "the other end", etc., which represent relative spatial positions used in the present application, are for the purpose of facilitating description of the relationship between one unit or feature and another unit or feature as shown in the accompanying drawings. The terms of relative spatial positions may be intended to include different orientations of the device in use or operation other than the orientations shown in the figures. For example, if the device in the figure is flipped, the unit described as being "below" or "beneath" other units or features will be located "above" other units or features. Therefore, the exemplary term "below" can encompass both the upper and lower orientations. The device may be oriented in other ways (rotated 90 degrees or other orientations), and the spatially related descriptive terms used herein will be interpreted accordingly.
[0050] In addition, the terms "installed", "set up", "equipped with", "connected", "slidably connected", "fixed", "socketed" should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral structure; it can be directly connected, or indirectly connected through an intermediate medium, or there is internal communication between two devices, components or parts. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.
[0051] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings. Obviously, the described embodiments of the present application are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative efforts belong to the scope of protection of the present application.
[0052] The present application discloses a development method. Please refer to Figure 1 , the development method includes:
[0053] S1. Treat the battery wafer precursor with a developer to form a first treated wafer.
[0054] Among them, the developer is prepared by a liquid medicine and microbubbles. Microbubbles are distributed in the liquid medicine, and the liquid medicine is an alkaline solution. In an implementable embodiment, the liquid medicine contains at least one of sodium carbonate, potassium carbonate, TMAH (tetramethylammonium hydroxide) or TBAH (tetrabutylammonium hydroxide).
[0055] Preferably, the liquid medicine contains sodium carbonate. Treating the battery wafer precursor with a developer containing sodium carbonate and microbubbles, the developer will quickly dissolve the exposed photosensitive resin, thereby forming a first treated wafer.
[0056] Furthermore, the present application does not limit the concentration of sodium carbonate in the liquid medicine. Relevant personnel can make corresponding adjustments according to needs on the basis of increasing the reaction rate between the liquid medicine and the photosensitive resin and reducing the damage to the semi-finished battery wafer.
[0057] In an implementable embodiment, the battery wafer precursor can be treated with a developer containing 0.05%-2% sodium carbonate.
[0058] Exemplarily, the concentration of sodium carbonate in the developer for treating the battery wafer can be one of 0.05%, 0.25%, 0.5%, 0.75%, 1%, 1.25%, 1.5%, 1.75% or 2% or the range between any two of them.
[0059] Exemplarily, the developer contains 0.75% sodium carbonate.
[0060] The present application does not limit the way of microbubble formation, including forced mixing and dissolution of gas and liquid medicine through a pressure air dissolving tank, formation by a bubble generator, formation by ultrasonic waves, etc. Relevant personnel can make corresponding selections according to process requirements. If the method of forming microbubbles by pressurization is adopted, during the process of contact and dissolution between gas molecules and liquid molecules, it will cause the ionization of water molecules, generate dissolved electrolytes, and the electrolyte ions adsorb on the surface of the microbubbles to form a charged surface layer, that is, microbubbles with surface charges are formed.
[0061] Specifically, in the method of treating the battery precursor with the developer, there are at least three treatment methods. The first treatment method is to soak the battery precursor with the developer; the second treatment method is to spray the developer on the surface of the battery by the spray head 60; the third treatment method is to spray the developer on the surface of the battery by the spray head 60 while soaking the battery precursor with the developer.
[0062] Furthermore, in the first treatment method, the present application does not limit the specific time and soaking temperature for soaking the battery in the developer.
[0063] In an implementable embodiment, the battery can be soaked in the developer at 10 - 45 °C for 0.5 - 4 min.
[0064] Exemplarily, the soaking time for soaking the battery in the developer can be one of 0.5 min, 0.7 min, 1 min, 1.5 min, 2 min, 2.5 min, 3 min, 3.5 min or 4 min or within the range between any two of them.
[0065] Exemplarily, the soaking temperature for soaking the battery in the developer can be one of 10 °C, 15 °C, 20 °C, 25 °C, 30 °C, 35 °C, 40 °C or 45 °C or within the range between any two of them.
[0066] In an implementable embodiment, the photosensitive glue on the surface of the battery is removed directly by spraying the developer on the surface of the battery by the spray head 60, that is, the above-mentioned second method.
[0067] Furthermore, the spray pressure of the spray head 60 is within the range of 0.5 - 3 kg / cm 2 range.
[0068] Exemplarily, the spray pressure of the spray head 60 for spraying the developer on the battery can be 0.5 kg / cm 2 、1 kg / cm 2 、1.5 kg / cm 2 、2 kg / cm 2 、2.5 kg / cm 2 or 3.5 kg / cm 2The range between one or any two of them.
[0069] Further, the spraying angle of the nozzle 60 is 50 - 90°.
[0070] Exemplarily, the spraying angle of the nozzle 60 when spraying the developing solution on the battery cell is within the range of one of 50°, 60°, 70°, 80°, or 90° or any two of them.
[0071] Exemplarily, the spraying angle of the nozzle 60 when spraying the developing solution on the battery cell is 50°.
[0072] Further, the droplet diameter of the nozzle 60 when spraying the developing solution on the battery cell is 5 - 500 μm, preferably 20 - 280 μm. Among them, when there is only the liquid medicine in the developing solution, the droplet diameter is 20 - 100 μm, and when the developing solution includes the liquid medicine and microbubbles, the droplet diameter is 170 - 280 μm.
[0073] In order to improve the removal integrity and efficiency of the photosensitive resin, in an implementable embodiment, during the process of immersing the battery cell precursor in the developing solution, the developing solution is sprayed on the surface of the battery cell precursor through the nozzle 60, that is, the above - mentioned third method. Specifically, the developing solution is placed in the developing tank 10, the developing tank 10 is connected to the developing solution preparation assembly 40, the nozzle 60 is arranged on the developing tank 10 and is communicated with the developing tank 10 through a pipeline. Among them, the process parameters of the nozzle 60 during spraying are the same as those of the second method.
[0074] Please continue to refer to Figure 1 , the developing method provided by this application further includes:
[0075] S2. Treat the first treated sheet with a cleaning solution to form a second treated sheet.
[0076] Among them, the cleaning solution is prepared by a mineral liquid and microbubbles, and the microbubbles are distributed in the mineral liquid. Preferably, the mineral ions in the mineral liquid are calcium ions or magnesium ions, or calcium - magnesium ions; for example, an aqueous solution containing calcium - magnesium ions. Treating the first treated sheet with the cleaning solution containing calcium - magnesium ions and microbubbles, the calcium - magnesium ions react with the photosensitive resin remaining in the exposed area, and the reaction products are easily detached from the surface of the first treated sheet, thereby removing the remaining photosensitive resin and preventing the photosensitive resin from reacting with other components, and finally forming a second treated sheet.
[0077] It should be noted that the battery cell substrate coated with the photosensitive resin forms a battery cell precursor after the exposure process. The battery cell substrate is a semi - finished battery cell with a transparent conductive layer or a seed layer. The battery cell precursor, the first treated sheet, and the second treated sheet are all semi - finished battery cells.
[0078] Furthermore, the present application does not limit the content of calcium ions and / or magnesium ions in the mineral liquid. Relevant personnel can make corresponding adjustments according to needs on the basis of increasing the reaction rate between calcium and magnesium ions and the photosensitive resin and reducing the damage to the first processing sheet.
[0079] In an implementable embodiment, the first processing sheet can be treated with a mineral liquid in which both calcium ions and / or magnesium ions have a preset content. Among them, the preset content of calcium ions and / or magnesium ions is not higher than 10 - 300 mg / L, and is not lower than the content of calcium ions and / or magnesium ions in the solvent used in the mineral liquid.
[0080] Exemplarily, the content of calcium ions and / or magnesium ions in the mineral liquid for treating the first processing sheet can be one of 10 mg / L, 50 mg / L, 100 mg / L, 150 mg / L, 200 mg / L, 250 mg / L or 300 mg / L, or within the range between any two of them.
[0081] Exemplarily, the content of calcium ions in the mineral liquid is not higher than 100 mg / L and not lower than 0 mg / L, and the content of magnesium ions is not higher than 50 mg / L and not lower than 0 mg / L.
[0082] Specifically, in the method of treating the first processing sheet with the cleaning liquid, there are at least three treatment methods. The first treatment method is to soak the first processing sheet with the cleaning liquid; the second treatment method is to spray the cleaning liquid on the surface of the first processing sheet using the nozzle 60; the third treatment method is to spray the cleaning liquid on the surface of the first processing sheet using the nozzle 60 while soaking the first processing sheet with the cleaning liquid.
[0083] Furthermore, in the first treatment method, the present application does not limit the specific time for soaking the first processing sheet in the developing solution.
[0084] In an implementable embodiment, the first processing sheet can be soaked in the cleaning liquid for 0.5 - 3 min.
[0085] Exemplarily, the soaking time for soaking the first processing sheet in the cleaning liquid can be one of 0.5 min, 1 min, 1.5 min, 2 min, 2.5 min or 3 min, or within the range between any two of them.
[0086] In an implementable embodiment, the residual photosensitive resin in the opening of the first processing sheet is removed directly by spraying the cleaning liquid on the surface of the first processing sheet using the nozzle 60, that is, the above-mentioned second method.
[0087] Furthermore, the spraying pressure of the nozzle 60 is within the range of 0.5 - 3 kg / cm 2 range.
[0088] Exemplarily, the spraying pressure of the cleaning liquid sprayed by the spray head 60 on the battery cell can be 0.5 kg / cm 2 、1 kg / cm 2 、1.5 kg / cm 2 、2 kg / cm 2 、2.5 kg / cm 2 or 3.5 kg / cm 2 or within the range between any two of them.
[0089] Furthermore, the spraying angle of the spray head 60 is 50 - 90°.
[0090] Exemplarily, the spraying angle of the cleaning liquid sprayed by the spray head 60 on the battery cell is one of 50°, 60°, 70°, 80° or 90° or within the range between any two of them.
[0091] Furthermore, the spraying angle of the cleaning liquid sprayed by the spray head 60 on the battery cell is 90°.
[0092] In an implementable embodiment, the droplet diameter of the cleaning liquid sprayed by the spray head 60 on the battery cell is 5 - 500 μm, preferably 20 - 280 μm. Among them, when there is only mineral liquid in the cleaning liquid, the droplet diameter is 20 - 100 μm, and when the developing solution includes mineral liquid and microbubbles, the droplet diameter is 170 - 280 μm.
[0093] In order to improve the water washing efficiency and cleaning ability of the first processed sheet, in an implementable embodiment, during the process of the first processed sheet being immersed in the cleaning liquid, the cleaning liquid is sprayed on the surface of the first processed sheet through the spray head 60, which is the above-mentioned third method. Specifically, the cleaning liquid is placed in a water washing tank, the water washing tank is connected to the cleaning liquid preparation assembly 50, the spray head 60 is arranged on the water washing tank and is communicated with the water washing tank through a pipeline. Among them, the process parameters of the spray head 60 during spraying are the same as those of the second method.
[0094] The following further describes in detail the developing method provided by the examples of the present application in combination with the embodiments.
[0095] Example 1
[0096] Example 1 provides a developing method, including:
[0097] Immerse the battery cell precursor in the developing solution at 15°C for 1 min to obtain a first processed sheet. Among them, the developing solution includes 0.75% sodium carbonate and microbubbles.
[0098] Perform a morphological analysis on the first processed sheet obtained in Example 1. The scanning electron microscope image of the opening cross-section of the first processed sheet is as Figure 2 、 Figure 3 、 Figure 4 andFigure 5 as shown
[0099] Example 2
[0100] Example 2 provides a developing method, including:
[0101] immersing a battery wafer precursor in a developer at 15°C for 1.5 min to obtain a first processed wafer. The developer includes 0.75% sodium carbonate and microbubbles.
[0102] Performing a morphology analysis on the first processed wafer obtained in Example 2, the scanning electron microscope images of the opening cross-section of the first processed wafer are as Figure 6 , Figure 7 , Figure 8 and Figure 9 as shown
[0103] Example 3
[0104] Example 3 provides a developing method, including:
[0105] immersing a battery wafer precursor in a developer at 15°C for 3 min to obtain a first processed wafer. The developer includes 0.75% sodium carbonate and microbubbles.
[0106] Performing a morphology analysis on the first processed wafer obtained in Example 3, the scanning electron microscope images of the opening cross-section of the first processed wafer are as Figure 10 , Figure 11 , Figure 12 and Figure 13 as shown
[0107] Comparative Example
[0108] This comparative example provides a developing method, which is different from the foregoing examples in that: the developer in the embodiments of the present application is not used to develop the battery wafer precursor.
[0109] The scanning electron microscope images of the opening cross-section of the obtained first processed wafer are as Figure 14 , Figure 15 , Figure 16 and Figure 17 as shown
[0110] After comparing that of Example 1 Figures 2 - 5 and that of the comparative example Figures 14 - 17 it can be found that: the opening formed by developing the battery wafer precursor with the developer in the comparative example is smaller than the opening formed by developing the battery wafer precursor with the developer in Example 1. There is less residual glue or no residual glue at the bottom of the opening in Example 1, while there is more residual glue at the bottom of the opening in the comparative example.
[0111] After comparing that of Example 2 Figures 6 - 9 and that of the comparative example Figures 14 - 17It can be found after comparison that the opening formed by developing the battery precursor with the developer of the comparative example is smaller than the opening formed by developing the battery precursor with the developer in Example 2, and the upper opening formed in Example 2 is slightly larger than the upper opening formed in the comparative example. There is only less residual glue or no residual glue at the bottom of the opening in Example 2, while there is more residual glue at the bottom of the opening in the comparative example.
[0112] For Example 3 Figures 10 - 13 and the comparative example Figures 14 - 17 It can be found after comparison that the opening formed by developing the battery precursor with the developer of the comparative example is smaller than the opening formed by developing the battery precursor with the developer in Example 3, and the upper opening formed in Example 3 is significantly larger than the upper opening formed in the comparative example. There is only less residual glue or no residual glue at the bottom of the opening in Example 3, while there is more residual glue at the bottom of the opening in the comparative example.
[0113] It can be seen from this that in the developing method provided in the embodiments of the present application, by using a developer formed by a liquid medicine containing sodium carbonate and microbubbles to process the battery precursor, the photosensitive glue in the exposed area on the surface of the battery precursor can be effectively removed, and an opening with a preset pattern is formed.
[0114] In an embodiment disclosed in the present application, a developing device is further provided, which can use the above-mentioned developing method.
[0115] As Figure 18 shown, the developing device at least includes a developing tank 10, a cleaning tank 20, a developer preparation component 40, a cleaning liquid preparation component 50, and a transmission component 30. Among them, the developer preparation component 40 is used to prepare a developer and convey the developer to the developing tank 10; the cleaning liquid preparation component 50 is used to prepare a cleaning liquid and convey the cleaning liquid to the cleaning tank 20; the transmission component 30 is used to convey the semi-finished battery sheet along the transmission direction, and the developing tank 10 and the cleaning tank 20 are sequentially arranged in the transmission direction. That is to say, the semi-finished battery sheet moves through the developing tank 10 and the cleaning tank 20 in sequence. When the semi-finished battery sheet (battery precursor) is located in the developing tank 10, the developer contacts the surface of the semi-finished battery sheet and processes it. The processed semi-finished battery sheet is called the first processed sheet. When the semi-finished battery sheet (the first processed sheet) is located in the cleaning tank 20, the cleaning liquid contacts the surface of the semi-finished battery sheet and processes it. The processed semi-finished battery sheet is called the second processed sheet.
[0116] In this embodiment, the developer preparation component 40 includes a developer supply pipeline and a developer gas supply pipeline. Both the developer supply pipeline and the developer gas supply pipeline are connected to the developing tank 10. The cleaning liquid preparation component 50 includes a cleaning supply pipeline and a cleaning gas supply pipeline.
[0117] In an implementable embodiment, the structure of the developer preparation component 40 can be any of the following:
[0118] (1) Both the developer supply pipeline and the developer gas supply pipeline are connected to the developer tank 10; in this solution, the developer tank 10 is filled with the developer, and after the gas enters the developer tank 10 through the developer gas supply pipeline, microbubbles are formed, and at least one side of the semi-finished battery cell is immersed in the developer.
[0119] (2) Both the developer supply pipeline and the developer gas supply pipeline are connected to the pressure dissolution gas tank, and the pressure dissolution gas tank transports the developer to the developer tank 10 through the main developer supply pipeline; in this solution, the gas and the liquid are mixed in the pressure dissolution gas tank, and the pressure dissolution gas tank applies pressure to the gas-liquid mixture to fully dissolve the gas in the liquid. Thus, the developer flowing out of the main developer supply pipeline contains microbubbles.
[0120] In an implementable embodiment, the structure of the cleaning solution preparation component 50 can be any of the following:
[0121] (1) Both the cleaning solution supply pipeline and the cleaning gas supply pipeline are connected to the cleaning tank 20; in this solution, the cleaning tank 20 is filled with the cleaning solution, and after the gas enters the cleaning tank 20 through the cleaning gas supply pipeline, microbubbles are formed, and at least one side of the semi-finished battery cell is immersed in the cleaning solution.
[0122] (2) Both the cleaning solution supply pipeline and the cleaning gas supply pipeline are connected to the pressure dissolution gas tank, and the pressure dissolution gas tank transports the cleaning solution to the cleaning tank 20 through the main cleaning solution supply pipeline; in this solution, the gas and the liquid are mixed in the pressure dissolution gas tank, and the pressure dissolution gas tank applies pressure to the gas-liquid mixture to fully dissolve the gas in the liquid. Thus, the cleaning solution flowing out of the main cleaning solution supply pipeline contains microbubbles.
[0123] In an implementable embodiment, spray heads 60 are provided on both the developing tank 10 and the cleaning tank 20. The spray heads 60 are connected to the main developing liquid supply pipe and the main cleaning liquid supply pipe. The spray head 60 located in the developing tank 10 is connected to the developing liquid preparation assembly 40, and the spray head 60 located in the cleaning tank 20 is connected to the cleaning liquid preparation assembly 50. Among them, the nozzles of the spray heads 60 face the transmission assembly 30, so that the developing liquid and the cleaning liquid with microbubbles can be directly sprayed onto the surface of the semi-finished battery cell. If the semi-finished battery cell is to be processed on one side, the spray head 60 is arranged on one of the upper and lower ends of the transmission assembly 30. If the semi-finished battery cell is to be processed on both sides, spray heads 60 are correspondingly arranged at both the upper and lower ends of the transmission assembly 30. In practical applications, the transmission assembly 30 adopts a roller structure so that both sides of the semi-finished battery cell can be sprayed. Preferably, there are multiple spray heads 60, and the multiple spray heads 60 are arranged at intervals along the lengths of the developing tank 10 and the cleaning tank 20. In this solution, a manifold can be provided on the developing tank 10 and the cleaning tank 20 respectively. The main developing liquid supply pipe and the main cleaning liquid supply pipe are both connected to the manifold, and the multiple spray heads 60 are all communicated with the manifold.
[0124] Thus, the present application also provides a developing device, which uses a developing liquid and a cleaning liquid with microbubbles to develop and clean the semi-finished battery cell in sequence, and can effectively remove the photosensitive glue in the exposed area of the semi-finished battery cell.
[0125] The above are only the preferred embodiments of the present application, and are not intended to limit the present application. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims
1. A developing method, characterized in that: include: Treating the cell precursor with a developer to form a first treated cell; Treating the first treated sheet with a cleaning solution to form a second treated sheet; The developer solution includes a chemical solution and microbubbles, the chemical solution is an alkaline solution, the cleaning solution includes a mineral liquid and microbubbles, and the mineral liquid contains calcium ions or magnesium ions or calcium-magnesium ions.
2. The developing method according to claim 1, characterized in that: The drug solution contains at least one of sodium carbonate, potassium carbonate, TMAH or TBAH.
3. The developing method according to claim 1, characterized in that: The drug solution contains sodium carbonate, and the concentration of the sodium carbonate is 0.05%-2%.
4. The developing method according to claim 1, characterized in that: The method of treating a cell precursor with a developer comprises: spraying the developer on the surface of the cell precursor with a nozzle, or soaking the cell precursor with the developer, or while soaking the cell precursor with the developer, spraying the developer on the surface of the cell precursor with the nozzle.
5. The developing method according to claim 3, characterized in that: When the developing method comprises soaking the cell precursor in a developer, the cell precursor is soaked in the developer at 10-45° C. for 0.5-4 minutes; When the developing method includes spraying the developing solution on the surface of the cell precursor using a nozzle, the spray pressure of the nozzle is 0.5-3 kg / cm 2 , the spraying angle is 50-90°, the droplet diameter is 5-500 μm, and the droplet diameter is preferably 20-280 μm.
6. The developing method according to claim 1, characterized in that: The mineral liquid contains a preset concentration of calcium ions and / or a preset concentration of magnesium ions, and the preset concentration is ≤300 mg / L.
7. The developing method according to claim 1, characterized in that: The method of treating the first treatment sheet with cleaning liquid comprises: spraying the cleaning liquid on the surface of the first treatment sheet with a nozzle, or soaking the first treatment sheet with the cleaning liquid, or while soaking the first treatment sheet with the cleaning liquid, spraying the cleaning liquid on the surface of the first treatment sheet with the nozzle.
8. The developing method according to claim 7, characterized in that: When the developing method includes soaking the first processing sheet in a cleaning solution, soaking the first processing sheet in the cleaning solution for 0.5-3 minutes; When the developing method includes spraying a cleaning liquid on the surface of the first processing sheet using a nozzle, the spray pressure of the nozzle is 0.5-3 kg / cm 2 , the spraying angle is 50-90°, the droplet diameter is 5-500 μm, and preferably the droplet diameter is 20-280 μm.
9. The developing method according to claim 1, characterized in that: The microbubbles in the developer are formed by introducing gas into the solution and pressurizing the gas-liquid mixture; And / or, the microbubbles in the cleaning liquid are formed by introducing gas into the mineral liquid and pressurizing the gas-liquid mixture.
10. A developing device using the developing method according to any one of claims 1 to 9, characterized in that: It includes a developing tank, a cleaning tank, a developing solution preparation component, a cleaning solution preparation component and a transmission component; Wherein, the developer preparation component is used to prepare the developer and transport the developer to the developer tank; The cleaning liquid preparation component is used to prepare the cleaning liquid and transport the cleaning liquid to the cleaning tank; The transmission component is used to transmit semi-finished battery cells along a transmission direction, and the developing tank and the cleaning tank are sequentially arranged in the transmission direction.
11. The developing device according to claim 10, characterized in that: The developer preparation component includes a developer liquid supply pipeline and a developer air supply pipeline. The structure of the developer preparation component can be any one of the following: (1) The developer liquid supply pipeline and the developer air supply pipeline are both connected to the developer tank; (2) The developer liquid supply pipeline and the developer air supply pipeline are both connected to a pressure dissolved air tank, and the pressure dissolved air tank transports the developer liquid to the developer tank through the developer liquid supply main pipe; The cleaning liquid preparation component includes a cleaning liquid supply pipeline and a cleaning gas supply pipeline. The structure of the cleaning liquid preparation component can be any one of the following: (1) The cleaning liquid supply pipeline and the cleaning air supply pipeline are both connected to the cleaning tank; (2) The cleaning liquid supply pipeline and the cleaning air supply pipeline are both connected to a pressure dissolved air tank, and the pressure dissolved air tank transports the cleaning liquid to the cleaning tank through the cleaning liquid supply main pipe.
12. The developing device according to claim 10, characterized in that: The developing tank and the cleaning tank are both provided with nozzles, the nozzle located in the developing tank is connected to the developer solution preparation component, and the nozzle located in the cleaning tank is connected to the cleaning solution preparation component; Wherein, the nozzle is arranged toward the conveying component.