Calibration method for synchrotron radiation microfocusing experimental apparatus

Abstract

This invention relates to a calibration method for a synchrotron radiation microfocusing experimental apparatus, comprising: removing a filter device; placing a fluorescent sheet downstream of a reflecting device; and turning on an X-ray source so that X-rays pass sequentially through the focusing device and the reflecting device before irradiating the fluorescent sheet; determining the magnification center of the microscope; adjusting the position of the microscope so that the X-ray position coincides with the magnification center of the microscope; turning off the X-ray source and installing the filter device onto the reflecting device, and turning on a visible light source; adjusting the X-axis and Y-axis positions of the filter aperture so that the visible light on the fluorescent sheet moves to the magnification center of the microscope; turning off the visible light source and turning on the X-ray source, and finely adjusting the position of the filter aperture to ensure that the X-ray shape on the fluorescent sheet is not obstructed. This calibration method for a synchrotron radiation microfocusing experimental apparatus ensures that the filter aperture coincides with the magnification center of the microscope, guaranteeing image clarity and magnification effect.

Description

Technical Field

[0001] This invention relates to the field of synchrotron radiation microfocusing experimental technology, and more specifically to a calibration method for a synchrotron radiation microfocusing experimental apparatus. Background Technology

[0002] like Figure 1 As shown, the existing synchrotron radiation microfocusing experimental setup includes a focusing device 10, a filtering device 20, a reflecting device 30, and a microscope 40. The focusing device 10, the filtering device 20, and the reflecting device 30 are arranged sequentially along a first axis L1 parallel to the Z-direction. The microscope 40 is offset from the first axis L1 along the Y-direction, and the optical axis L2 of the microscope 40 is parallel to the Y-direction and perpendicular to the first axis L1. The reflecting device 30 includes a housing 31 and a reflecting mirror 32. The reflecting mirror 32 is fixed inside the housing 31, and the housing 31 is fixed at the lens of the microscope 40. The filtering device 20 is provided with a filter hole 21, and the housing 31 is provided with a first light-transmitting hole 31. The first light-transmitting aperture 31b and the second light-transmitting aperture 32a are provided on the reflector 32. The filter aperture 21, the first light-transmitting aperture 31a, the third light-transmitting aperture 32a and the second light-transmitting aperture 31b are arranged sequentially along the first axis L1. Synchrotron radiation X-rays are transmitted along the first axis L1 and pass through the focusing device 10, the filter aperture 21, the first light-transmitting aperture 31a, the third light-transmitting aperture 32a and the second light-transmitting aperture 31b in sequence before irradiating the sample 50. The sample 50 is located on the first axis L1. The X-rays reflected by the sample 50 are reflected again by the reflector 32 and enter the microscope 40, so that the front of the sample 50 can be observed through the microscope 40. The filter device 20 is used to block stray light in the environment and correct the shape of the incident light to optimize the experimental results.

[0003] During calibration, existing synchrotron radiation microfocusing experimental setups require a displacement drive mechanism to drive the filter device 20 in three-dimensional motion in the X, Y, and Z directions, and another displacement drive mechanism to drive the microscope 40 in three-dimensional motion in the X, Y, and Z directions. This is to ensure that the filter aperture 21 of the filter device 20 coincides with the magnification center of the microscope 40, so that the light passing through the filter aperture 21 can be accurately focused on the magnification center of the microscope 40, thus guaranteeing image clarity and magnification effect.

[0004] However, due to the limited space between the focusing device 10 and the sample 50, it is impossible to simultaneously meet the assembly accuracy requirements of the filter device 20, the microscope 40, and their respective displacement drive mechanisms, making it impossible to guarantee that the filter aperture 21 coincides with the magnification center of the microscope 40. Summary of the Invention

[0005] The purpose of this invention is to provide a calibration method for a synchrotron radiation microfocusing experimental device, so as to make the filter aperture coincide with the magnification center of the microscope, thereby ensuring image clarity and magnification effect.

[0006] To achieve the above objectives, the present invention provides a calibration method for a synchrotron radiation microfocusing experimental apparatus. The synchrotron radiation microfocusing experimental apparatus includes a focusing device, a filtering device, a reflecting device, and a microscope. The focusing device, the filtering device, and the reflecting device are sequentially arranged along a first axis parallel to the Z-direction. The microscope is offset from the first axis along the Y-direction, and the optical axis of the microscope is parallel to the Y-direction. The reflecting device is fixed to the lens of the microscope. The filtering device is detachably fixed to the reflecting device. The filtering device has a filter aperture, and the position of the filter aperture relative to the microscope is adjustable. The calibration method includes the following steps:

[0007] S1000: Remove the filter from the reflector, place a fluorescent sheet downstream of the reflector, and turn on the X-ray source so that the X-rays emitted by the X-ray source pass through the focusing device and the reflector in sequence and then irradiate the fluorescent sheet.

[0008] S2000: The magnification center of the microscope is determined by adjusting the X-axis position, Y-axis position and changing the magnification of the microscope;

[0009] S3000: Adjust the position of the microscope so that the X-ray position coincides with the magnification center of the microscope;

[0010] S4000: Turn off the X-ray source, install the filter device onto the reflector, and then turn on the visible light source to emit visible light;

[0011] S5000: Adjust the X-axis and Y-axis positions of the filter aperture of the filter device so that the visible light can pass through the filter aperture and the reflective device and illuminate the fluorescent sheet, and move the visible light on the fluorescent sheet to the magnification center of the microscope;

[0012] S6000: Turn off the visible light source and turn on the X-ray source. Determine whether the X-ray shape on the fluorescent sheet observed by the microscope is obstructed. If so, adjust the position of the filter hole to ensure that the X-ray shape on the fluorescent sheet is not obstructed.

[0013] Furthermore, step S2000 specifically includes the following steps:

[0014] S2100: The microscope is moved multiple times along the X and Y directions to position the microscope in multiple different locations;

[0015] S2200: When the microscope is in each position, acquire the image of the microscope at different magnifications and the pixel coordinates of the X-ray position;

[0016] S2300: In the same rectangular coordinate system, the pixel coordinates of the X-ray position of the microscope at different magnifications at each position are fitted to obtain the fitted straight line at that position;

[0017] S2400: Determine the magnification center of the microscope based on each fitted straight line.

[0018] Furthermore, step S2200 specifically includes the following steps:

[0019] S2210: When the microscope is in each position, change the magnification of the microscope so that the microscope has different magnifications;

[0020] S2220: At each magnification of the microscope, the microscope is moved along the Z-axis so that the fluorescent sheet falls on the focal plane of the microscope, and then an image of the microscope at that magnification is captured, and the pixel coordinates of the X-ray position of the microscope at that magnification are obtained.

[0021] Furthermore, the filtering device includes a substrate layer, a Y-axis adjustment layer, and an X-axis adjustment layer. The Y-axis adjustment layer is fixed on the substrate layer, the X-axis adjustment layer is fixed on the Y-axis adjustment layer, the filter aperture is disposed on the X-axis adjustment layer, the substrate layer is fixed on the reflecting device, the Y-axis adjustment layer is used to adjust the Y-axis position of the X-axis adjustment layer, and the X-axis adjustment layer is used to adjust the X-axis position of the filter aperture.

[0022] Furthermore, the Y-axis adjustment layer includes a raised plate and an adjustment plate. The raised plate is fixed on the base layer. The adjustment plate includes two first fixed parts and a Y-axis moving part. The two first fixed parts are arranged opposite to each other along the X-axis and fixed on the raised plate. The two ends of the Y-axis moving part in the X-axis direction are respectively connected to the two first fixed parts through their respective first flexible components, so that the Y-axis moving part can move relative to the two first fixed parts in the Y-axis direction. The X-axis adjustment layer is fixed on the Y-axis moving part.

[0023] Furthermore, each of the first flexible components includes a plurality of first weakening structures arranged sequentially along the Y direction. The first weakening structures are configured to deform when subjected to external force, so that the Y-direction moving part moves relative to the first fixed part along the Y direction.

[0024] Furthermore, the raised plate is provided with two first brackets facing each other along the Y direction. Each first bracket is equipped with a first set screw. The first set screw is threadedly connected to the first bracket and is detachably connected to the Y-direction moving part. The first set screw is configured to contact the Y-direction moving part by screwing and push the Y-direction moving part to move along the Y direction.

[0025] Furthermore, the X-axis adjustment layer includes a second fixing part and an X-axis moving part. The second fixing part defines a mounting groove, and the X-axis moving part is located in the mounting groove. The Y-axis ends of the X-axis moving part are respectively connected to the Y-axis ends of the second fixing part through their respective second flexible components, so that the X-axis moving part can move relative to the second fixing part in the X-axis direction. The filter hole is provided on the X-axis moving part.

[0026] Furthermore, each of the second flexible components includes a plurality of second weakening structures arranged sequentially along the X direction. The second weakening structures are configured to deform under the action of an external force, so that the X-direction moving part moves relative to the second fixed part along the X direction.

[0027] Furthermore, each of the two ends of the second fixing part in the X direction is provided with a second set screw. The second set screw is threadedly connected to the second fixing part and is detachably connected to the X-direction moving part. The second set screw is configured to contact the X-direction moving part by screwing and push the X-direction moving part to move in the X direction.

[0028] The calibration method of the synchrotron radiation microfocusing device of the present invention has a filter device fixed on a reflective device, and the position of the filter aperture of the filter device relative to the reflective device and the microscope is adjustable. There is no need to set up an additional displacement drive mechanism for the filter device. The displacement drive mechanism of the microscope can be precisely assembled in the limited space between the focusing device and the sample, so that the position of the microscope and the position of the filter aperture can be precisely adjusted so that the filter aperture can coincide with the magnification center of the microscope. Attached Figure Description

[0029] Figure 1 A top view of an existing synchrotron radiation microfocusing experimental setup;

[0030] Figure 2 This is a top view of the synchrotron radiation microfocusing experimental apparatus according to an embodiment of the present invention;

[0031] Figure 3 This is a schematic diagram of the structure of the synchrotron radiation microfocusing experimental apparatus according to an embodiment of the present invention, when the reflection device is fixed together with the microscope;

[0032] Figure 4 This is a schematic diagram of the structure of the synchrotron radiation microfocusing experimental apparatus according to an embodiment of the present invention, showing the filter device, the reflection device, and the microscope fixed together.

[0033] Figure 5 This is a schematic diagram of the structure of the filter device of the synchrotron radiation microfocusing experimental apparatus according to an embodiment of the present invention;

[0034] Figure 6This is a schematic diagram of the substrate layer of the filter device in the synchrotron radiation microfocusing experimental apparatus according to an embodiment of the present invention;

[0035] Figure 7 This is a schematic diagram of the Y-axis adjustment layer of the filter device of the synchrotron radiation microfocusing experimental apparatus according to an embodiment of the present invention;

[0036] Figure 8 This is a schematic diagram of the X-axis adjustment layer of the filter device of the synchrotron radiation microfocusing experimental apparatus according to an embodiment of the present invention;

[0037] Figure 9 This is a flowchart of a calibration method for a synchrotron radiation microfocusing experimental apparatus according to an embodiment of the present invention. Detailed Implementation

[0038] The preferred embodiments of the present invention are given below with reference to the accompanying drawings and described in detail.

[0039] like Figure 2As shown, this embodiment of the invention provides a synchrotron radiation micro-focusing experimental apparatus, including a focusing device 100, a filtering device 200, a reflecting device 300, and a microscope 400. The focusing device 100, the filtering device 200, and the reflecting device 300 are sequentially arranged along a first axis L1 parallel to the Z-direction. The microscope 400 is offset from the first axis L1 along the Y-direction, and the optical axis L2 of the microscope 400 is parallel to the Y-direction and perpendicular to the first axis L1. The reflecting device 300 is fixed at the lens of the microscope 400, and the filtering device 200 is fixed on the reflecting device 300. The filtering device 200 has a filter aperture 210, and the position of the filter aperture 210 relative to the reflecting device 300 and the microscope 400 is adjustable. The sample 500 can be placed on the first axis L1 and located downstream of the reflecting device 300. The focusing device 100 is used to focus the synchrotron radiation transmitted to the focusing device 100 along the first axis L1. The X-rays are focused to form a smaller, more precise spot. The focused X-rays pass through a filter aperture 210 and a filter device 200, which is used to block stray light from the environment and correct the shape of the X-rays. After passing through the filter device 200, the X-rays then pass through a reflector 300 and irradiate the sample 500. They are then reflected by the sample and transmitted to the reflector 300, where they are reflected into the microscope 400. This allows the microscope 400 to observe the frontal structure of the sample 500 (the side facing the reflector 300). In other words, the reflector 300 can be used to allow incident X-rays to pass through and to reflect X-rays reflected by the sample 500 into the microscope 400. This allows the microscope 400, which is located on the side, to also observe the frontal structure of the sample 500, thus saving space. The microscope 400 can be placed on a displacement driving mechanism (not shown in the figure). The displacement driving mechanism enables the microscope 400 to perform three-dimensional motion, that is, to move along the X, Y and Z directions. When performing synchrotron radiation micro-focusing experiments, the displacement driving mechanism can adjust the X, Y and Z positions of the microscope 400 and the reflecting device 300, thereby positioning the sample 500 so that the sample 500 is located at the imaging center of the microscope 400. At the same time, by adjusting the position of the filter aperture 210 relative to the reflecting device 300 and the microscope 400, it can be adapted to the X-ray focusing beam, thereby ensuring the straightness of the microscope zoom center and the filter aperture 210 and improving the experimental effect.

[0040] In some embodiments, the reflecting device 300 may include a housing 310 and a reflecting mirror 320. The reflecting mirror 320 is fixed inside the housing 310, and the housing 310 is fixed at the lens of the microscope 400. The filtering device 200 is fixed on the housing 310. The housing 310 is provided with a first light-transmitting hole 311 and a second light-transmitting hole 312, and the reflecting mirror 320 is provided with a third light-transmitting hole 321. The filtering hole 210, the first light-transmitting hole 311, the third light-transmitting hole 321, and the second light-transmitting hole 312 are aligned sequentially along the first axis L1, so that the focused X-rays can pass through the filtering hole 210, the first light-transmitting hole 311, the third light-transmitting hole 321, and the second light-transmitting hole 312 in sequence and irradiate the sample 500. The X-rays reflected by the sample 500 can enter the housing 310 through the second light-transmitting hole 312 and be reflected into the microscope 400 by the reflecting mirror 320, so that the microscope 400 can observe the front structure of the sample 500. The reflector 320 is tilted inside the housing 310, meaning it forms a certain angle, for example, 45 degrees, with both the first axis L1 and the optical axis L2 of the microscope 400. The third light-transmitting aperture 321 of the reflector 320 is not on the focal plane of the microscope 400, thus allowing the reflected light from the sample 500 to be successfully imaged on the microscope 400 without being affected.

[0041] like Figure 3 As shown, the housing 310 may include a first part 313 and a second part 314, which are detachably connected. A reflector 320 is sandwiched between the first part 313 and the second part 314. A first light-transmitting hole 311 is provided on the first part 313, and a second light-transmitting hole 312 is provided on the second part 314. The first part 313 may have multiple (e.g., four) first mounting holes 315 for mounting the filter device 200 thereon. The structure of the filter device 200 after being fixed to the first part 313 is as follows. Figure 4 As shown.

[0042] like Figure 5 As shown, the filter device 200 includes a base layer 220, a Y-axis adjustment layer 230, and an X-axis adjustment layer 240. The Y-axis adjustment layer 230 is fixed on the base layer 220, and the X-axis adjustment layer 240 is fixed on the Y-axis adjustment layer 230. The filter aperture 210 is disposed on the X-axis adjustment layer 240. The base layer 220 is fixed on the housing 310 of the reflector 300, serving as a mounting base and stabilizing the structure. The Y-axis adjustment layer 230 is used to adjust the Y-axis position of the X-axis adjustment layer 240, thereby adjusting the Y-axis position of the filter aperture 210. The X-axis adjustment layer 240 is used to adjust the X-axis position of the filter aperture 210. Therefore, the Y-axis position and X-axis position of the filter aperture 210 can be adjusted through the Y-axis adjustment layer 230 and the X-axis adjustment layer 240. In this way, there is no need to set up an additional displacement drive mechanism for the filter device 200, thereby saving space.

[0043] like Figure 6 As shown, the base layer 220 is provided with a fourth light-transmitting hole 221 and a plurality of second mounting holes 222. Each second mounting hole 222 corresponds to each first mounting hole 315. During installation, the second mounting holes 222 are aligned with the corresponding first mounting holes 315, and bolts can pass through the second mounting holes 222 and the corresponding first mounting holes 315 in sequence to fix the base layer 220 to the first part 314 of the housing 310.

[0044] like Figure 7 As shown, the Y-axis adjustment layer 230 includes a riser plate 231 and an adjustment plate 232. The riser plate 231 is fixed on the base layer 220. The adjustment plate 232 includes two first fixing parts 2321 and a Y-axis moving part 2322. The two first fixing parts 2321 are arranged opposite to each other along the X-axis and fixed on the riser plate 231. The two ends of the Y-axis moving part 2322 in the X-axis direction are respectively connected to the two first fixing parts 2321 through their respective first flexible components, so that the Y-axis moving part 2322 can move relative to the two first fixing parts 2321 in the Y-axis direction. The X-axis adjustment layer 240 is fixed on the Y-axis moving part 2322. In this way, the Y-axis position of the X-axis adjustment layer 240 can be adjusted by the movement of the Y-axis moving part 2322 in the Y-axis direction.

[0045] In some embodiments, each first flexible component includes a plurality of first weakening structures 2323 arranged sequentially along the Y direction. The strength of the first weakening structure 2323 is weaker than that of the first fixing part 2321 and the Y-direction moving part 2322. Thus, when a Y-direction force is applied to the Y-direction moving part 2322, the first weakening structure 2323 will deform, thereby allowing the Y-direction moving part 2322 to move relative to the first fixing part 2321 along the Y direction. The first weakening structure 2323 can be formed by opening first weakening holes in the adjusting plate 232. For example, the adjusting plate 232 can be a single plate, in which case the first fixing part 2321 and the Y-direction moving part 2322 have the same strength and are a whole. Then, a plurality of first weakening holes 2324 arranged sequentially along the Y direction can be opened between them, so that the first fixing part 2321 and the Y-direction moving part 2322 are connected only through the thinner first weakening structure 2323, thereby allowing the Y-direction moving part 2322 to move along the Y direction under the action of external force. For example, each first flexible component includes four first weakening structures 2323 formed by a plurality of first weakening holes 2324. The radius of the first weakening hole 2324 is 1.25 mm, the distance between the centers of any two adjacent first weakening holes 2324 is 2.7 mm, the X-direction length of the Y-direction moving part 2322 is 11.4 mm, the Y-direction length of the adjusting plate 232 is 20.4 mm, and the Y-direction movement stroke of the Y-direction moving part 2322 is ±100 micrometers.

[0046] In some embodiments, the raised plate 231 may be provided with two first supports 234 facing each other along the Y direction. Each first support 234 is equipped with a first set screw 233. The first set screw 233 is threadedly connected to the first support 234 and is detachably connected to the Y-direction moving part 2322. By turning the first set screw 233, the first set screw 233 can approach and abut against the Y-direction moving part 2322, thereby pushing the Y-direction moving part 2322 to move along the Y direction. The two first set screws 233 respectively cooperate with the two ends of the Y-direction moving part 2322 in the Y direction, and can make the Y-direction moving part 2322 move in opposite directions, so that the Y-direction moving part 2322 can move back and forth in the Y direction.

[0047] The raised plate 231 is provided with a fifth light-transmitting hole 2311, and the Y-axis moving part 2322 is provided with a sixth light-transmitting hole 2325. The fourth light-transmitting hole 221, the fifth light-transmitting hole 2311, the sixth light-transmitting hole 2325 and the filter hole 210 are arranged sequentially along the first axis L1 so that X-rays can pass through.

[0048] like Figure 8 As shown, in some embodiments, the X-axis adjustment layer 240 includes a second fixing part 241 and an X-axis moving part 242. The second fixing part 241 defines a mounting groove 2411. The X-axis moving part 242 is located in the mounting groove 2411, and the two ends of the X-axis moving part 242 in the Y direction are respectively connected to the two ends of the second fixing part 241 in the Y direction through their respective second flexible components, so that the X-axis moving part 242 can move relative to the second fixing part 241 in the X direction. A filter hole 210 is provided on the X-axis moving part 242. The X-axis moving part 242 covers the sixth light-transmitting hole 2325 so that light can only pass through the filter hole 210 to achieve a light filtering effect.

[0049] In some embodiments, each second flexible component includes a plurality of second weakening structures 243 arranged sequentially along the X-direction. The strength of the second weakening structures 243 is weaker than that of the second fixing portion 241 and the X-direction moving portion 242. Thus, when an X-direction force is applied to the X-direction moving portion 242, the second weakening structures 243 deform, thereby allowing the X-direction moving portion 242 to move relative to the second fixing portion 241 along the X-direction. The second weakening structures 243 can be formed by opening second weakening holes in the X-direction adjusting layer 240. For example, the second fixing portion 241 and the X-direction moving portion 242 can be a continuous whole, and then a plurality of second weakening holes 244 are opened at the connection between the second fixing portion 241 and the X-direction moving portion 242, so that the second fixing portion 241 and the X-direction moving portion 242 are connected only by the thinner second weakening structures 243, thereby allowing the X-direction moving portion 242 to move along the X-direction under the action of external force. For example, each second flexible component includes two second weakening structures 243, which are formed by three second weakening holes, wherein the middle second weakening hole 244 is circular and the other two second weakening holes 244 are semi-circular. The radius of the second weakening hole 244 is 1.25 mm, the distance between any two adjacent second weakening holes 244 is 2.7 mm, the X-axis movement stroke of the X-axis moving part 242 is ±100 micrometers, and the diameter of the filter hole 210 is 20-100 micrometers.

[0050] In some embodiments, a second setter screw 245 is provided at each of the two ends of the second fixing part 241 in the X direction. The second setter screw 245 is threadedly connected to the second fixing part 241 and is detachably connected to the X-direction moving part 242. By turning the second setter screw 245, the second setter screw 245 can approach and abut against the X-direction moving part 242, thereby pushing the X-direction moving part 242 to move in the X direction. The two second setter screws 245 respectively cooperate with the two ends of the X-direction moving part 242 in the X direction, and can make the X-direction moving part 242 move in opposite directions, so that the X-direction moving part 242 can move back and forth in the X direction.

[0051] In some embodiments, the filter device 200 may be made of a flexible metal material, such as 316L stainless steel. The filter device 200 may be formed by an integral molding process, that is, the base layer 220, the Y-axis adjustment layer 230 and the X-axis adjustment layer 240 are formed as one piece.

[0052] In one exemplary embodiment, the thickness of the base layer 220 is 1 mm, the thickness of the shim plate 231 is 0.5 mm, the thickness of the adjustment plate 232 is 1 mm, and the thickness of the X-axis adjustment layer 240 is 1 mm.

[0053] In some embodiments, the synchrotron radiation microfocusing experimental apparatus may further include a sample stage (not shown in the figure), on which the sample 500 is placed to support the sample.

[0054] like Figure 9 As shown, this embodiment of the invention also provides a calibration method for a synchrotron radiation microfocusing experimental apparatus as described in the above embodiments, which includes the following steps S1000-S6000:

[0055] S1000: Remove the filter device 200 from the reflector 300, place a fluorescent sheet downstream of the reflector 300, and turn on the X-ray source so that the X-rays emitted by the X-ray source pass through the focusing device 100 and the reflector 300 in sequence and then irradiate the fluorescent sheet. The X-rays irradiating the fluorescent sheet will produce bright light, which can be observed by the microscope 400.

[0056] During calibration, the magnification center of microscope 400 needs to be located first, and the X-ray needs to be aligned with the magnification center of microscope 400. During this process, the filter device 200 is not needed, so the filter device 200 needs to be removed first. Since X-rays are invisible light, they need to be irradiated onto the fluorescent sheet to make them visible.

[0057] S2000: The magnification center of microscope 400 is determined by adjusting the X-axis position and Y-axis position of microscope 400 and changing the magnification of microscope 400.

[0058] In some embodiments, step S2000 specifically includes steps S2100-S2400:

[0059] S2100: Make the microscope 400 move along the X and Y directions multiple times so that the microscope 400 is in multiple different positions.

[0060] The microscope 400 can be moved in the X and Y directions using a displacement adjustment mechanism. Before using the displacement adjustment mechanism, it needs to be calibrated so that one of its adjustment dimensions is strictly parallel to the Z direction. After calibration, the microscope 400 can be moved in three dimensions (X, Y, and Z) using the displacement adjustment mechanism. Each time the microscope 400 moves in the X and Y directions, its X and Y positions will change, thus placing the microscope 400 in multiple different positions.

[0061] S2200: When the microscope 400 is in each position, acquire the image and pixel coordinates of the X-ray position of the microscope 400 at different magnifications.

[0062] In some embodiments, step S2200 specifically includes the following steps S2210-S2220:

[0063] S2210: When the microscope 400 is in each position, change the magnification of the microscope 400 so that the microscope 400 has different magnifications;

[0064] S2220: At each magnification of the microscope 400, move the microscope 400 along the Z direction so that the fluorescent sheet falls on the focal plane of the microscope 400, then take an image of the microscope 400 at that magnification, and obtain the pixel coordinates of the X-ray position of the microscope 400 at that magnification.

[0065] The image from microscope 400 is a frontal image of the fluorescent slide, on which there is a spot formed by X-rays shining on the fluorescent slide. The pixel coordinates of the spot on the image are the pixel coordinates of the X-ray position. By using images from microscope 400 at different magnifications, the pixel coordinates of the X-ray position of microscope 400 at different magnifications can be obtained.

[0066] Through steps S2100 and S2200, the pixel coordinates of the X-ray position at different magnifications when the microscope 400 is in different positions can be obtained. For example, assuming the microscope 400 has four different positions, denoted as A, B, C, and D, and each position has n different magnifications, then at position A, the magnification of the microscope 400 can be adjusted according to a preset rule. For example, the microscope 400 can first be set to the first magnification, and then the Z-axis position of the microscope 400 can be adjusted to place the fluorescent sheet on the focal plane of the microscope 400, and the pixel coordinates of the X-ray position at the first magnification can be obtained, denoted as (XA1, YA1); then the microscope 400 can be set to the second magnification, and the Z-axis position of the microscope 400 can be adjusted to place the fluorescent sheet on the focal plane of the microscope 400. The pixel coordinates of the X-ray position at the first magnification are obtained, denoted as (XA2, YA2); and so on, the pixel coordinates of the X-ray position at the nth magnification are obtained, denoted as (XAn, YAn). That is, at position A, a set of pixel coordinates (XA1, YA1), (XA2, YA2)...(XAn, YAn) can be obtained; similarly, at position B, a set of pixel coordinates (XB1, YB1), (XB2, YB2)...(XBn, YBn) can be obtained; at position C, a set of pixel coordinates (XC1, YC1), (XC2, YC2)...(XCn, YCn) can be obtained; and at position D, a set of pixel coordinates (XD1, YD1), (XD2, YD2)...(XDn, YDn) can be obtained.

[0067] S2300: In the same rectangular coordinate system, the pixel coordinates of the X-ray position at different magnifications at each position of the microscope 400 are fitted to obtain the fitted straight line at that position.

[0068] For example, a straight line LA can be fitted using (XA1, YA1), (XA2, YA2)...(XAn, YAn), a straight line LB can be fitted using (XB1, YB1), (XB2, YB2)...(XBn, YBn), a straight line LC can be fitted using (XC1, YC1), (XC2, YC2)...(XCn, YCn), and a straight line LD can be fitted using (XD1, YD1), (XD2, YD2)...(XDn, YDn).

[0069] S2400: Determine the magnification center of microscope 400 based on each fitted straight line.

[0070] When each fitted line is drawn in the same rectangular coordinate system, the fitted lines will intersect and the intersection point will circle a small area. The center of this small area is the magnification center of the microscope 400, denoted as point O. The pixel coordinates of point O can be obtained in the rectangular coordinate system, thereby determining the position of the magnification center of the microscope 400.

[0071] S3000: Adjust the position of microscope 400 so that the X-ray position coincides with the magnification center of microscope 400.

[0072] After step S2000, the X-ray position may not be at the magnification center of the microscope 400. Therefore, the position of the microscope 400 needs to be adjusted by the displacement adjustment mechanism so that the pixel coordinates of the X-ray position on the image of the microscope 400 are the pixel coordinates of point O. Thus, the X-ray position coincides with the magnification center of the microscope 400.

[0073] S4000: Turn off the X-ray source, install the filter device 200 onto the reflector 300, and then turn on the visible light source to emit visible light.

[0074] Because the size of the filter aperture 210 is very small (20-100 micrometers), it can only be adjusted into the optical path using visible light-assisted calibration. The visible light source can be a laser source.

[0075] S5000: Adjust the X and Y positions of the filter aperture 210 of the filter device 200 so that visible light can pass through the filter aperture 210 and the reflector 300 and illuminate the fluorescent sheet, and move the visible light on the fluorescent sheet to the magnification center of the microscope 400.

[0076] By adjusting the X-axis and Y-axis positions of the filter aperture 210, it can be aligned with the optical path, allowing visible light to pass sequentially through the focusing device 100, the filter aperture 210, and the reflecting device 300, illuminating the fluorescent sheet. The image in the microscope 400 then displays the position of the visible light. Further adjustment of the X-axis and Y-axis positions of the filter aperture 210 can move the visible light to the magnification center of the microscope 400. The method for adjusting the X-axis and Y-axis positions of the filter aperture 210 can be found in the description of the device embodiment, and will not be repeated here.

[0077] S6000: Turn off the visible light source and turn on the X-ray source. Determine whether the X-ray shape on the fluorescent sheet observed by the microscope 400 is obstructed. If so, adjust the position of the filter aperture 210 to ensure that the X-ray shape on the fluorescent sheet is not obstructed.

[0078] Because the spot size of visible light (typically 2-3 mm) is much larger than that of X-rays (typically 2-3 micrometers), even though the filter aperture 210 is aligned with the optical path using visible light, it may still obstruct X-rays. If the X-ray shape is obstructed, the image on the microscope 400 will be incomplete, with a missing portion. In this case, the X-axis and / or Y-axis positions of the filter aperture 210 can be fine-tuned to ensure the X-ray shape is complete and unobstructed. This aligns the filter aperture 210 with the magnification center of the microscope 400, completing the calibration of the synchrotron radiation microfocusing experimental setup. The calibrated synchrotron radiation microfocusing experimental setup can then be used to conduct synchrotron radiation microfocusing experiments and obtain accurate experimental results.

[0079] In the calibration method of the synchrotron radiation microfocusing device of this invention, the filter device 200 is fixed on the reflector 300, and the position of the filter aperture 210 of the filter device 200 relative to the reflector 300 and the microscope 400 is adjustable. There is no need to set an additional displacement drive mechanism for the filter device 200. The displacement drive mechanism of the microscope 400 can be precisely assembled in the limited space between the focusing device 100 and the sample 500, so that the position of the microscope 400 and the position of the filter aperture 210 can be precisely adjusted so that the filter aperture 210 can coincide with the magnification center of the microscope 400.

[0080] The above description is merely a preferred embodiment of the present invention and is not intended to limit the scope of the invention. Various variations can be made to the above embodiments of the present invention. That is, all simple and equivalent changes and modifications made based on the claims and description of this invention fall within the protection scope of the claims of this patent. All aspects not described in detail in this invention are conventional technical content.

Claims

1. A calibration method for a synchrotron radiation microfocusing experimental apparatus, characterized in that, The synchrotron radiation microfocusing experimental apparatus includes a focusing device, a filtering device, a reflecting device, and a microscope. The focusing device, the filtering device, and the reflecting device are arranged sequentially along a first axis parallel to the Z-direction. The microscope is offset from the first axis along the Y-direction, and the optical axis of the microscope is parallel to the Y-direction. The reflecting device is fixed at the lens of the microscope. The filtering device is detachably fixed to the reflecting device. The filtering device has a filter aperture, and the position of the filter aperture relative to the microscope is adjustable. The calibration method includes the following steps: S1000: Remove the filter from the reflector, place a fluorescent sheet downstream of the reflector, and turn on the X-ray source so that the X-rays emitted by the X-ray source pass through the focusing device and the reflector in sequence and then irradiate the fluorescent sheet. S2000: The magnification center of the microscope is determined by adjusting the X-axis position, Y-axis position and changing the magnification of the microscope; S3000: Adjust the position of the microscope so that the X-ray position coincides with the magnification center of the microscope; S4000: Turn off the X-ray source, install the filter device onto the reflector, and then turn on the visible light source to emit visible light; S5000: Adjust the X-axis and Y-axis positions of the filter aperture of the filter device so that the visible light can pass through the filter aperture and the reflection device and illuminate the fluorescent sheet, and move the visible light on the fluorescent sheet to the magnification center of the microscope; S6000: Turn off the visible light source and turn on the X-ray source. Determine whether the X-ray shape on the fluorescent sheet observed by the microscope is blocked. If so, adjust the position of the filter hole to ensure that the X-ray shape on the fluorescent sheet is not blocked. Step S2000 specifically includes the following steps: S2100: The microscope is moved multiple times along the X and Y directions to position the microscope in multiple different locations; S2200: When the microscope is in each position, acquire the image of the microscope at different magnifications and the pixel coordinates of the X-ray position; S2300: In the same rectangular coordinate system, the pixel coordinates of the X-ray position of the microscope at different magnifications at each position are fitted to obtain the fitted straight line at that position; S2400: Determine the magnification center of the microscope based on each fitted straight line.

2. The calibration method for the synchrotron radiation microfocusing experimental apparatus according to claim 1, characterized in that, Step S2200 specifically includes the following steps: S2210: When the microscope is in each position, change the magnification of the microscope so that the microscope has different magnifications; S2220: At each magnification of the microscope, the microscope is moved along the Z-axis so that the fluorescent sheet falls on the focal plane of the microscope, and then an image of the microscope at that magnification is captured, and the pixel coordinates of the X-ray position of the microscope at that magnification are obtained.

3. The calibration method for the synchrotron radiation microfocusing experimental apparatus according to claim 1, characterized in that, The filtering device includes a substrate layer, a Y-axis adjustment layer, and an X-axis adjustment layer. The Y-axis adjustment layer is fixed on the substrate layer, and the X-axis adjustment layer is fixed on the Y-axis adjustment layer. The filter aperture is disposed on the X-axis adjustment layer. The substrate layer is fixed on the reflecting device. The Y-axis adjustment layer is used to adjust the Y-axis position of the X-axis adjustment layer, and the X-axis adjustment layer is used to adjust the X-axis position of the filter aperture.

4. The calibration method for the synchrotron radiation microfocusing experimental apparatus according to claim 3, characterized in that, The Y-axis adjustment layer includes a raised plate and an adjustment plate. The raised plate is fixed on the base layer. The adjustment plate includes two first fixed parts and a Y-axis moving part. The two first fixed parts are arranged opposite to each other along the X-axis and fixed on the raised plate. The two ends of the Y-axis moving part are respectively connected to the two first fixed parts through their respective first flexible components, so that the Y-axis moving part can move relative to the two first fixed parts along the Y-axis. The X-axis adjustment layer is fixed on the Y-axis moving part.

5. The calibration method for the synchrotron radiation microfocusing experimental apparatus according to claim 4, characterized in that, Each of the first flexible components includes a plurality of first weakening structures arranged sequentially along the Y direction. The first weakening structures are configured to deform when subjected to an external force, so that the Y-direction moving part moves relative to the first fixed part along the Y direction.

6. The calibration method for the synchrotron radiation microfocusing experimental apparatus according to claim 4, characterized in that, The raised plate is provided with two first brackets facing each other along the Y direction. Each first bracket is equipped with a first set screw. The first set screw is threadedly connected to the first bracket and is detachably connected to the Y-direction moving part. The first set screw is configured to contact the Y-direction moving part by screwing and push the Y-direction moving part to move along the Y direction.

7. The calibration method for the synchrotron radiation microfocusing experimental apparatus according to claim 4, characterized in that, The X-axis adjustment layer includes a second fixed part and an X-axis moving part. The second fixed part defines a mounting groove, and the X-axis moving part is located in the mounting groove. The Y-axis ends of the X-axis moving part are respectively connected to the Y-axis ends of the second fixed part through their respective second flexible components, so that the X-axis moving part can move relative to the second fixed part in the X-axis direction. The filter hole is provided on the X-axis moving part.

8. The calibration method for the synchrotron radiation microfocusing experimental apparatus according to claim 7, characterized in that, Each of the second flexible components includes a plurality of second weakening structures arranged sequentially along the X direction. The second weakening structures are configured to deform under the action of an external force, so that the X-direction moving part moves relative to the second fixed part along the X direction.

9. The calibration method for the synchrotron radiation microfocusing experimental apparatus according to claim 7, characterized in that, Each of the two ends of the second fixing part in the X direction is provided with a second set screw. The second set screw is threadedly connected to the second fixing part and is detachably connected to the X-direction moving part. The second set screw is configured to contact the X-direction moving part by turning and push the X-direction moving part to move in the X direction.

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