Mass production device of excimer laser discharge area and control method
By designing a mass production device for the discharge area of the excimer laser, and using baffles and barriers to adjust the surface morphology of the electrode, the problems of uneven laser energy and high production costs are solved, and the spot uniformity adjustment and production costs are achieved.
Patent Information
- Application Number
- CN202510404308.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-01
- Publication Date
- 2025-06-06
AI Technical Summary
The surface morphology of the discharge area of existing excimer lasers is single, resulting in uneven laser energy, insufficient spot uniformity, low applicability, difficult to achieve standardized mass production, and high production costs.
A mass production device for excimer laser discharge area is designed, including a fixed seat, a baffle and a baffle. The morphology of the electrode surface is adjusted through the baffle movable plate adjustment assembly and the baffle movable plate adjustment assembly, so as to realize multiple rounds of surface treatment and adjust the uniformity of the spot.
By adjusting the surface morphology of the discharge electrode, changing the energy density of the laser, free adjustment of spot uniformity, improving the utilization rate of spot, simplifying the structure, reducing production costs, and suitable for standard modular mass production.
Smart Images
Figure CN120109622A_ABST
Abstract
Description
[Technical field]
[0001] The invention relates to a mass production device and a control method for a discharge region of an excimer laser. [Background Technology]
[0002] Excimer laser technology is widely used in the medical, industrial and scientific research fields. In the medical field, it is mainly used for corneal refractive correction, vitiligo treatment and thrombus ablation. In the industrial field, it is mainly used for semiconductor lithography, flat panel display manufacturing and micro-processing. In the scientific research field, it is mainly used in materials science, environmental science, spectroscopy and chemistry. However, no matter which field, there are requirements for the uniformity of the spot of the excimer laser, and the requirements are not the same. The uniformity of the spot is related to the energy density of the laser, which is related to the secondary emission of electrons, and the secondary electron emission is related to the surface morphology of the object.
[0003] Existing excimer lasers have a single surface morphology in the discharge area, which leads to uneven laser energy, insufficient spot uniformity, small available range and low spot utilization. At the same time, the discharge area has low applicability, and the surface morphology is difficult to adjust, making it difficult to achieve standardized mass production and resulting in high production costs. [Summary of the invention]
[0004] The present invention overcomes the shortcomings of the prior art and provides a mass production device and a control method for the discharge region of an excimer laser.
[0005] To achieve the above object, the present invention adopts the following technical solutions:
[0006] A mass production device for the discharge area of an excimer laser, characterized in that: it includes a fixed seat, a baffle and a baffle strip, the baffle strip is arranged on the top surface of the fixed seat, a fixed seat groove for fixing an electrode is arranged on the top surface of the fixed seat, a baffle groove is arranged on the bottom surface of the baffle, the fixed seat groove and the baffle groove form a accommodating cavity for accommodating the electrode, a baffle opening connected to the baffle groove is arranged on the top surface of the baffle groove, baffle movable plates that can move laterally are respectively arranged on both sides of the baffle groove, a baffle movable plate adjustment component for adjusting the position of the baffle movable plate so as to adjust the size of the baffle opening is arranged between the baffle and the baffle movable plates, the baffle strip is arranged on the top surface of the baffle, baffle movable plates arranged along the length direction and inserted into the baffle opening are respectively arranged on both sides of the baffle bottom surface, and baffle movable plate adjustment components for adjusting the position of the baffle movable plates so as to adjust the shielding area of the baffle movable plates on both sides are respectively arranged between the baffle and the baffle movable plates.
[0007] A mass production device for the discharge area of an excimer laser as described above is characterized in that: the fixed seat includes a left fixed seat body and a right fixed seat body, a left fixed seat body recess is provided on the top surface of the left fixed seat body close to the right fixed seat body, and a right fixed seat body recess is provided on the top surface of the right fixed seat body close to the left fixed seat body, and the left fixed seat body recess and the right fixed seat body recess form a fixed seat groove.
[0008] The mass production device of the discharge area of the excimer laser as described above is characterized in that movable plate grooves arranged along the length direction are respectively provided on the opposite sides of the movable plates of the baffle plates, and ventilation holes connected to the movable plate grooves are provided on the sides of the movable plates of the baffle plates.
[0009] The mass production device for the discharge area of an excimer laser as described above is characterized in that baffle positioning notches matching the top surface of the electrode are respectively provided at the front and rear ends of the baffle groove.
[0010] The mass production device for the discharge area of an excimer laser as described above is characterized in that the bottom surfaces of the baffle movable plates on both sides are respectively provided with baffle movable plate arc surfaces that match the top surfaces of the electrodes.
[0011] The mass production device of the discharge area of the excimer laser as described above is characterized in that the baffle movable plate adjustment component includes a baffle through hole arranged on the side of the baffle, and the baffle through hole is provided with a baffle movable plate adjustment member for driving the baffle movable plate to move horizontally.
[0012] A mass production device for the discharge area of an excimer laser as described above is characterized in that: a baffle movable plate adjustment component includes a baffle positioning plate arranged on the bottom surface of the baffle along the length direction, two baffle movable plates are respectively arranged on both sides of the baffle positioning plate, a baffle movable plate through hole is provided on the side of the baffle movable plate, and a baffle movable plate adjustment member connected to the baffle positioning plate and capable of driving the baffle movable plate to move horizontally is provided on the baffle movable plate through hole.
[0013] The mass production device for the discharge area of an excimer laser as described above is characterized in that the lower side surfaces of the baffle movable plates on both sides are respectively provided with arc-shaped baffle movable plate surfaces that match the top surfaces of the electrodes.
[0014] The mass production device for the discharge area of an excimer laser as described above is characterized in that the fixing seat and the baffle are connected by screws, and the baffle and the baffle bar are connected by screws.
[0015] A method for producing a mass production device using the above-mentioned excimer laser discharge region is characterized by:
[0016] S1. Fix the electrode in the fixing seat groove of the fixing seat, and cover the baffle on the fixing seat;
[0017] S2. Adjust the position of the baffle movable plate in the baffle groove by means of the baffle movable plate adjustment assembly to adjust the size of the baffle opening;
[0018] S3, performing a first round of surface treatment by hitting the upper surface area of the electrode exposed by the opening of the baffle plate with high-speed sand particles;
[0019] S4. After the first round of surface treatment, the opening of the baffle plate is enlarged by the baffle plate movable plate adjustment assembly, the baffle cover is closed on the baffle plate, the baffle plate movable plate is extended into the baffle plate opening, and the positions of the baffle plate movable plates on both sides are adjusted by the baffle plate movable plate adjustment assembly so that the baffle plate movable plates on both sides and the baffle plate cover the first round of surface treatment area of the electrode;
[0020] S5, performing a second round of surface treatment by hitting the upper surface area of the electrode exposed by the opening of the baffle plate with high-speed sand particles;
[0021] S6. Enlarging the opening of the baffle plate opening by means of the baffle plate movable plate adjusting assembly, and adjusting the positions of the baffle movable plates on both sides by means of the baffle movable plate adjusting assembly to shield the surface treated area of the electrode, and striking the exposed area of the upper surface of the electrode with high-speed sand particles until the surface treatment of the upper surface of the electrode and the area corresponding to the baffle plate opening is completed.
[0022] The beneficial effects of the present invention are:
[0023] The present invention is provided with a fixed seat, a baffle and a baffle bar. The positions of the baffle movable plates on both sides are adjusted by a baffle movable plate adjusting component, so as to adjust the opening size of the baffle opening and perform a first round of treatment on the electrode surface. Subsequently, the baffle bar is fixed on the fixed seat, and the positions of the baffle movable plates on both sides are adjusted by the baffle movable plate adjusting component to protect the first round of treatment area on the electrode surface, and perform a second round of surface treatment on the electrode, and this is repeated until the treatment area on the upper surface of the electrode is completed. The surface morphology of the discharge electrode is adjusted to change the emission density of the secondary electrons of the electrode, thereby changing the energy density of the laser, and further realizing the free adjustment of the uniformity of the light spot of the excimer laser controlled by human, thereby improving the utilization rate of the light spot. The structure is simple, the use is convenient, and standard modular mass production is convenient, and the production cost is reduced. [Drawings]
[0024] Figure 1 It is a schematic diagram of the structure of the present invention;
[0025] Figure 2 This is one of the exploded views of the present invention;
[0026] Figure 3 This is the second exploded view of the present invention;
[0027] Figure 4 This is the third exploded view of the present invention;
[0028] Figure 5 This is the fourth exploded view of the present invention;
[0029] Figure 6 This is the fifth exploded view of the present invention. [Specific implementation method]
[0030] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the accompanying drawings.
[0031] It should be noted that all directional indications (such as up, down, left, right, front, back...) in the embodiments of the present invention are only used to explain the relative position relationship, movement status, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly. In addition, the descriptions of "preferred", "sub-preferred", etc. in the present invention are only used for descriptive purposes, and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined as "preferred" or "sub-preferred" may explicitly or implicitly include at least one such feature.
[0032] like Figure 1-6 As shown, a mass production device for the discharge area of an excimer laser comprises a fixing seat 1, a baffle plate 2 and a baffle bar 3, wherein the baffle plate 2 is arranged on the top surface of the fixing seat 1, a fixing seat groove 11 for fixing an electrode is arranged on the top surface of the fixing seat 1, a baffle groove 21 is arranged on the bottom surface of the baffle plate 2, the fixing seat groove 11 and the baffle groove 21 form a receiving cavity for accommodating the electrode, a baffle opening 22 connected to the baffle groove 21 is arranged on the top surface of the baffle groove 21, baffle movable plates 4 which can move laterally are arranged on both sides of the baffle groove 21, a baffle movable plate adjustment component for adjusting the position of the baffle movable plate 4 so as to adjust the opening size of the baffle opening 22 is arranged between the baffle plate 2 and the baffle movable plate 4, the baffle bar 3 is arranged on the top surface of the baffle 2, baffle movable plates 5 which are arranged along the length direction and inserted into the opening of the baffle opening 22 are arranged on both sides of the bottom surface of the baffle bar 3, and baffle movable plate adjustment components for adjusting the position of the baffle movable plate 5 so as to adjust the shielding area of the baffle movable plates 5 on both sides are arranged between the baffle bar 3 and the baffle movable plate 5.
[0033] The control method of the mass production device of the excimer laser discharge area includes:
[0034] S1, fix the electrode in the fixing seat groove 11 of the fixing seat 1, and cover the baffle 2 on the fixing seat 1, so that the electrode is arranged in the accommodating cavity formed by the fixing seat groove 11 and the baffle groove 21;
[0035] S2. Adjust the position of the baffle movable plate 4 in the baffle groove 21 through the baffle movable plate adjustment assembly, adjust the opening size of the baffle opening 22, and thus adjust the size of the electrode exposed area in the opening 22.
[0036] S3, performing a first round of surface treatment by hitting the upper surface area of the electrode exposed by the opening 22 of the baffle plate with high-speed sand particles;
[0037] S4, after the first round of surface treatment, the opening of the baffle opening 22 is enlarged by adjusting the baffle movable plate assembly, thereby enlarging the exposed area of the electrode in the opening 22,
[0038] The baffle 3 is covered on the baffle plate 2, so that the baffle movable plate 5 extends into the baffle plate opening 22, and the positions of the baffle movable plates 5 on both sides are adjusted by the baffle movable plate adjustment assembly, so that the baffle movable plates 5 on both sides and the baffle plate 2 shield the first round of surface treatment area of the electrode, thereby protecting the first round of surface treatment area of the electrode;
[0039] S5, performing a second round of surface treatment by hitting the upper surface area of the electrode exposed by the opening 22 of the baffle plate with high-speed sand particles;
[0040] S6. Enlarging the opening of the baffle opening 22 by means of the baffle movable plate adjusting assembly, and adjusting the positions of the baffle movable plates 5 on both sides by means of the baffle movable plate adjusting assembly to shield the surface treated area of the electrode, and striking the exposed area of the upper surface of the electrode with high-speed sand particles, until the surface treatment of the area corresponding to the baffle opening 22 is completed.
[0041] By adjusting the surface morphology of the discharge electrode, the density of the secondary electrons emitted by the electrode is changed, thereby changing the energy density of the laser, and then realizing the free adjustment of the uniformity of the excimer laser spot. In this case, the number of electrode surface treatments can be set according to design requirements.
[0042] like Figure 1-4 As shown, movable plate grooves 41 are respectively provided along the length direction on the opposite sides of the movable plates 4 of the baffle plates, and vent holes 42 are provided on the sides of the movable plates 4 of the baffle plates to communicate with the movable plate grooves 41. When the electrode is subjected to surface treatment, high-purity nitrogen can be introduced into the vent holes 42, so that the high-purity nitrogen is discharged from the movable plate grooves 41 to purge impurities on the electrode surface and improve the uniformity of the surface treatment.
[0043] like Figure 1-4 As shown, the fixing seat 1 includes a left fixing seat body 12 and a right fixing seat body 13. A left fixing seat body recess 121 is provided on the top surface of the left fixing seat body 12 close to the right fixing seat body 13, and a right fixing seat body recess 131 is provided on the top surface of the right fixing seat body 13 close to the left fixing seat body 12. The left fixing seat body recess 121 and the right fixing seat body recess 131 form a fixing seat groove 11. This structure can be applicable to electrodes of various models and sizes.
[0044] like Figure 5-6As shown, baffle plate positioning recesses 23 cooperating with the top surface of the electrode are respectively provided at the front and rear ends of the baffle plate recess 21 , and the top of the electrode is positioned in the baffle plate recess 21 of the baffle plate 2 through the baffle plate positioning recesses 23 .
[0045] like Figure 5-6 As shown, the bottom surfaces of the baffle movable plates 4 on both sides are respectively provided with baffle movable plate arc surfaces 43 that match the top surface of the electrode, so that the baffle movable plates 4 can move laterally on the electrode to adjust the position, thereby adjusting the opening size of the baffle opening 22.
[0046] like Figure 1-6 As shown, the baffle movable plate adjustment assembly includes a baffle through hole 24 arranged on the side of the baffle 2, and a baffle movable plate adjustment member is provided on the baffle through hole 24 to drive the baffle movable plate 4 to move horizontally. Among them, the baffle movable plate adjustment member can be a connecting rod that passes through the baffle through hole 24 and is connected to the baffle movable plate 4. The baffle movable plate adjustment member cooperates with the baffle through hole 24 to push the baffle movable plate 4 to move inward to adjust the opening size of the baffle opening 22.
[0047] like Figure 1-6 As shown, the baffle movable plate adjustment assembly includes a baffle positioning plate 31 arranged on the bottom surface of the baffle 3 along the length direction, two baffle movable plates 5 are respectively arranged on both sides of the baffle positioning plate 31, and baffle movable plate through holes 52 are arranged on the sides of the baffle movable plates 5. The baffle movable plate through holes 52 are provided with baffle movable plate adjustment members connected to the baffle positioning plate 31 and capable of driving the baffle movable plates 5 to move laterally. The baffle movable plate adjustment members can be connecting rods that pass through the baffle movable plate through holes 52 and are connected to the baffle movable plates 5. The positions of the baffle movable plates 5 on both sides are adjusted by the baffle movable plate adjustment members, thereby protecting the first round of surface treatment area of the electrode.
[0048] like Figure 5-6 As shown, the lower side surfaces of the baffle movable plates 5 on both sides are respectively provided with baffle movable plate arc surfaces 51 that match the top surface of the electrode, so that the baffle movable plates 5 can move laterally on the electrode to adjust their positions.
[0049] The above are only preferred embodiments of the present invention, and are not intended to limit the patent scope of the present invention. All equivalent structural changes made using the contents of the present invention's specification and drawings under the inventive concept of the present invention, or directly or indirectly applied in other related technical fields, are included in the patent protection scope of the present invention.
Claims
1. A mass production device for the discharge area of an excimer laser, characterized in that: The invention comprises a fixed seat (1), a baffle (2) and a baffle bar (3); the baffle (2) is arranged on the top surface of the fixed seat (1); a fixed seat groove (11) for fixing an electrode is arranged on the top surface of the fixed seat (1); a baffle groove (21) is arranged on the bottom surface of the baffle (2); the fixed seat groove (11) and the baffle groove (21) form a receiving cavity for accommodating the electrode; a baffle opening (22) communicating with the baffle groove (21) is arranged on the top surface of the baffle groove (21); baffle movable plates (4) capable of transverse movement are respectively arranged on both sides of the baffle groove (21); A baffle movable plate adjustment component for adjusting the position of the baffle movable plate (4) and thereby adjusting the size of the baffle opening (22) is provided between the baffle (2) and the baffle movable plate (4); a baffle bar (3) is arranged on the top surface of the baffle (2); baffle movable plates (5) are respectively provided on both sides of the bottom surface of the baffle bar (3) and are arranged along the length direction and inserted into the opening of the baffle opening (22); and baffle movable plate adjustment components for adjusting the position of the baffle movable plates (5) and thereby adjusting the shielding areas of the baffle movable plates (5) on both sides are respectively provided between the baffle bar (3) and the baffle movable plates (5).
2. The mass production device for the discharge region of an excimer laser according to claim 1, characterized in that: The fixing seat (1) comprises a left fixing seat body (12) and a right fixing seat body (13); a left fixing seat body recess (121) is provided on the top surface of the left fixing seat body (12) close to the side of the right fixing seat body (13); a right fixing seat body recess (131) is provided on the top surface of the right fixing seat body (13) close to the side of the left fixing seat body (12); the left fixing seat body recess (121) and the right fixing seat body recess (131) form a fixing seat groove (11).
3. The mass production device for the discharge region of an excimer laser according to claim 1, characterized in that: On the opposite sides of the baffle movable plates (4) on both sides, movable plate grooves (41) are respectively provided along the length direction, and on the side of the baffle movable plates (4) there are vent holes (42) in communication with the movable plate grooves (41).
4. The mass production device for the discharge region of an excimer laser according to claim 1, characterized in that: Baffle plate positioning notches (23) matching with the top surface of the electrode are respectively provided at the front and rear ends of the baffle plate groove (21).
5. The mass production device for the discharge region of an excimer laser according to claim 1, characterized in that: The bottom surfaces of the baffle movable plates (4) on both sides are respectively provided with baffle movable plate arc surfaces (43) that match the top surfaces of the electrodes.
6. The mass production device for the discharge region of an excimer laser according to claim 1, characterized in that: The baffle movable plate adjustment component comprises a baffle through hole (24) arranged on the side of the baffle (2), and a baffle movable plate adjustment member for driving the baffle movable plate (4) to move horizontally is arranged on the baffle through hole (24).
7. The mass production device for the discharge region of an excimer laser according to claim 1, characterized in that: The baffle movable plate adjustment assembly comprises a baffle positioning plate (31) arranged on the bottom surface of the baffle (3) along the length direction, two baffle movable plates (5) are respectively arranged on both sides of the baffle positioning plate (31), baffle movable plate through holes (52) are arranged on the side surfaces of the baffle movable plates (5), and baffle movable plate adjustment parts connected to the baffle positioning plate (31) and capable of driving the baffle movable plates (5) to move horizontally are arranged on the baffle movable plate through holes (52).
8. The mass production device for the discharge region of an excimer laser according to claim 1, characterized in that: The lower side surfaces of the baffle movable plates (5) on both sides are respectively provided with baffle movable plate arc surfaces (51) that match the top surfaces of the electrodes.
9. The mass production device for the discharge region of an excimer laser according to claim 1, characterized in that: The fixing seat (1) and the baffle plate (2) are connected via screws, and the baffle plate (2) and the baffle bar (3) are connected via screws.
10. A control method for a mass production device for an excimer laser discharge region using any one of 1 to 9, characterized in that: S1, fixing the electrode in the fixing seat groove (11) of the fixing seat (1), and covering the baffle (2) on the fixing seat (1); S2, adjusting the position of the baffle movable plate (4) in the baffle groove (21) by means of the baffle movable plate adjustment assembly, and adjusting the opening size of the baffle opening (22); S3, performing a first round of surface treatment by striking the upper surface area of the electrode exposed by the opening of the baffle opening (22) with high-speed sand particles; S4. After the first round of surface treatment, the opening of the baffle opening (22) is enlarged by using the baffle movable plate adjustment component, the baffle (3) is covered on the baffle (2), the baffle movable plate (5) is extended into the baffle opening (22), and the positions of the baffle movable plates (5) on both sides are adjusted by using the baffle movable plate adjustment component, so that the baffle movable plates (5) on both sides and the baffle (2) shield the first round of surface treatment area of the electrode; S5, performing a second round of surface treatment by hitting the upper surface area of the electrode exposed by the opening of the baffle opening (22) with high-speed sand particles; S6, expanding the opening of the baffle opening (22) by means of the baffle movable plate adjustment assembly, and adjusting the positions of the baffle movable plates (5) on both sides by means of the baffle movable plate adjustment assembly to shield the surface-treated area of the electrode, and using high-speed sand particles to strike the exposed area of the upper surface of the electrode, until the surface treatment of the area of the upper surface of the electrode corresponding to the baffle opening (22) is completed.