Integrated device for multifunctional coating preparation technology

Abstract

The invention discloses an integrated device of a multifunctional coating preparation technology. The integrated device comprises a furnace body, and a vacuum cavity is formed in the furnace body; a first magnetic sputtering power supply module, a second magnetic sputtering power supply module, a third magnetic sputtering power supply module and a third magnetic sputtering power supply module are arranged outside the furnace body; a working gas guide pipe is arranged on one side of the bottom of the furnace body, and a vacuum sucking pump is arranged on one side of the top of the furnace body. A first multi-arc ion power source and a second multi-arc ion power source are arranged on one side of the top and one side of the bottom of the furnace body respectively and distributed diagonally. A rotatable turntable is arranged in the furnace body, a plurality of sample tables are arranged on the front surface of the turntable, and a bias power supply is arranged at the edge of the turntable. According to the multifunctional coating preparation technology and the integrated device, ion nitriding / carburizing can be achieved, then high-efficiency preparation of the coating is achieved, and the multifunctional coating preparation technology and the integrated device have the advantages of being short in process time, flexible in process, low in cost and suitable for research and development and batch production.

Description

Technical Field

[0001] The present invention relates to the technical field of coating preparation, and particularly relates to an integrated device for a multifunctional coating preparation technology. Background Art

[0002] The surface treatment of metal parts mainly relies on traditional heat treatment. Heat treatment refers to a metal hot working process in which materials, in the solid state, obtain the expected structure and properties through means of heating, holding, and cooling. It mainly has low efficiency and poor surface treatment performance, and it is difficult to meet the requirements of harsh working conditions.

[0003] At present, with the innovation of technology, the treatment of metal surfaces also includes common electroplating: plating a layer of other metals or alloys on the metal surface through electrolysis to improve corrosion resistance, wear resistance, electrical conductivity, reflectivity, etc.; electrophoretic coating: immersing the metal surface in an electrolytic bath containing paint and forming a uniform coating under the action of an applied voltage; thermal spraying: spraying molten metal or non-metal materials onto the metal surface at high temperature to form a coating with special properties; etching: removing the material surface through chemical reactions or physical impacts to form concave-convex patterns or hollow effects; vacuum methods: such as physical vapor deposition (PVD), ion implantation, chemical vapor deposition (CVD), for surface treatment under vacuum conditions; and other surface treatment processes for metals.

[0004] For example, in CN201810159747.X, an apparatus for preparing a diamond-like carbon coating with a composite magnetic field and its application, the diamond-like carbon coating is mainly prepared by using a central anode or a longitudinal electromagnetic coil equipped with a rotatable magnetic core, and a closed magnetic field formed by eight groups of process components assembled on a regular octagon machine. The plasma under the formed composite magnetic field is used to prepare the diamond-like carbon coating. The eight groups of process components with magnetic field control form a closed ring magnetic field. Eight magnetic shoes are assembled on the rotatable magnetic core of the central anode, which can form a transverse magnetic field with the corresponding process components. After the longitudinal coil is energized, a longitudinal magnetic field can be formed in the vacuum chamber. The interaction of two or three magnetic fields can form a complex composite magnetic field in the vacuum cavity, which can increase the free path of electrons, improve the ionization rate of particles, thereby increasing the activity of carbon particles and obtaining a high-quality diamond-like carbon coating.

[0005] The above-mentioned coating technologies for metal surface treatment using vacuum methods in the prior art all show single functions, and can only achieve the preparation of a single coating on the metal surface, without a process of compounding multiple functions, resulting in the disadvantages of long processing time, poor flexibility, and high cost in the preparation of coatings on the metal surface. Therefore, there is an urgent need to design an integrated device for a multifunctional coating preparation technology to solve the above problems. Summary of the Invention

[0006] The object of the present invention is to provide an integrated device for a multifunctional coating preparation technology to solve the above-mentioned deficiencies in the prior art.

[0007] To achieve the above object, the present invention provides the following technical solution: An integrated device for a multifunctional coating preparation technology, comprising a furnace body, wherein a vacuum chamber is arranged inside the furnace body; A magnetron sputtering power supply module one, a magnetron sputtering power supply module two, a magnetron sputtering power supply module three and a magnetron sputtering power supply are arranged outside the furnace body, and the magnetron sputtering power supply module one, the magnetron sputtering power supply module two, the magnetron sputtering power supply module three and the magnetron sputtering power supply are distributed in a cross structure; A working gas conduit is arranged on one side of the bottom of the furnace body, and a vacuum pump is arranged on one side of the top of the furnace body; A multi-arc ion power supply one and a multi-arc ion power supply two are respectively arranged on one side of the top and one side of the bottom of the furnace body, and the multi-arc ion power supply one and the multi-arc ion power supply two are diagonally distributed; An ion power supply is arranged on one side of the bottom of the furnace body; A rotatable turntable is arranged inside the furnace body, a plurality of sample stages are arranged on the front surface of the turntable, and a bias power supply is arranged on the edge of the turntable.

[0008] In a further preferred embodiment, a door panel is arranged on the front surface of the furnace body, and a rotating member for rotating the door panel is arranged on one side of the furnace body; A transparent window is arranged on the front surface of the door panel, and a handle is arranged on one side of the front surface of the door panel.

[0009] In a further preferred embodiment, a rear cover is arranged on the back surface of the furnace body, and molecular pump interfaces are arranged on both sides of the rear cover.

[0010] In a further preferred embodiment, the furnace body is of a regular octahedron structure, and observation windows are arranged on the outer walls on both sides of the bottom of the furnace body.

[0011] In a further preferred embodiment, a hot wire heating source is arranged on one side of the top of the furnace body, and the hot wire heating source is inserted into the furnace body.

[0012] In a further preferred embodiment, a plurality of heaters are arranged on the inner wall of the furnace body at equal distances in a circular distribution.

[0013] In a further preferred embodiment, the ion power supply is at least used for nitriding or carburizing or cleaning of the product. The ion power supply uses a gas ion source to clean the surface of the sample. The working gas is argon at 120 - 200 sccm, the working pressure is 1 - 3 Pa, the power of the ion source power supply is set at 2 - 5 kW, the negative bias voltage is -100 - -300 V, and the time is 10 - 30 min to remove surface oil stains and oxides; The ion power supply adopts gas ion source nitriding or carburizing technology, with working gas argon at 80 - 150 sccm and nitrogen or acetylene at 15 - 60 sccm, working pressure at 1 - 3 Pa, ion source power set at 5 - 8 kW, negative bias voltage at -100 - -300 V, time at 60 - 120 min, and the thickness of the hardened layer prepared is 5 - 15 mm.

[0014] In a further preferred embodiment, the multi - arc ion power supply one and the multi - arc ion power supply two are at least used for ion plating of products; For the ion plating of products by the multi - arc ion power supply one and the multi - arc ion power supply two, the working gas is argon at 100 - 200 sccm and nitrogen at 15 - 80 sccm, the working pressure is 0.5 - 3 Pa, the arc current is set at 30 - 100 A, the negative bias voltage is -100 - -300 V, the time is 60 - 120 min, and the thickness of the hardened layer prepared is 5 - 50 mm.

[0015] In a further preferred embodiment, the magnetron sputtering power supply module one, the magnetron sputtering power supply module two, the magnetron sputtering power supply module three and the magnetron sputtering power supply all include deep oscillation magnetron sputtering ion enhancement technology (DOMS), high - power pulsed magnetron sputtering technology (HIPIMS), pulsed direct - current magnetron sputtering technology (PDCMS) and radio - frequency magnetron sputtering technology (RF).

[0016] In a further preferred embodiment, according to process requirements, the four targets can be used in combination: 2HIPIMS / DOMS + 2PDCMS or 2HIPIMS / DOMS + 2RF or HIPIMS / DOMS + 2PDCMS + RF or 2HIPIMS / DOMS + PDCMS + RF; The working gas is argon at 50 - 130 sccm and nitrogen at 20 - 80 sccm, the working pressure is 0.5 - 2 Pa, the sputtering power is set at 100 - 8000 W, the negative bias voltage is -30 - -300 V, the time is 10 - 120 min, and the thickness of the hardened layer prepared is 10 nm - 50 mm.

[0017] In the above technical solution, an integrated device for a multifunctional coating preparation technology provided by the present invention can flexibly combine and compound technical processes according to the surface modification technology requirements of metal parts, and achieve high - efficiency preparation of high - performance nano - coatings.

[0018] 1) First, adopt ion source technology to clean the sample with a gas ion source, and then use gas ion source nitriding or carburizing technology to prepare a 5 - 20 mm nitrided hardened layer on the surface of metal parts.

[0019] 2) Adopt multi - arc ion plating technology to prepare a 5 - 50 mm nano - coating.

[0020] 3) Use the composite magnetron sputtering technology to prepare a surface coating with a thickness of 2 - 10 mm. Description of the Drawings

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings.

[0022] Figure 1 A perspective structural view provided for an embodiment of an integrated device for a multifunctional coating preparation technology of the present invention.

[0023] Figure 2 Another perspective structural view provided for an embodiment of an integrated device for a multifunctional coating preparation technology of the present invention.

[0024] Figure 3 A main structural view provided for an embodiment of an integrated device for a multifunctional coating preparation technology of the present invention.

[0025] Figure 4 An SEM photograph of the TiAlSiN coating provided for Embodiment 1 of an integrated device for a multifunctional coating preparation technology of the present invention.

[0026] Figure 5 A curve showing the variation of the surface nano-hardness of the TiAlSiN coating with depth provided for Embodiment 1 of an integrated device for a multifunctional coating preparation technology of the present invention.

[0027] Figure 6 The Rockwell hardness indentation adhesion force level of the TiAlSiN coating provided for Embodiment 1 of an integrated device for a multifunctional coating preparation technology of the present invention is higher than HF1.

[0028] Figure 7 An SEM photograph of the TiAlSiN coating provided for Embodiment 2 of an integrated device for a multifunctional coating preparation technology of the present invention.

[0029] Figure 8 A curve showing the variation of the surface nano-hardness of the TiAlSiN coating with depth provided for Embodiment 2 of an integrated device for a multifunctional coating preparation technology of the present invention.

[0030] Figure 9 The Rockwell hardness indentation adhesion force level of the TiAlSiN coating provided for Embodiment 2 of an integrated device for a multifunctional coating preparation technology of the present invention is higher than HF1.

[0031] Description of the reference numerals: 1. Furnace body; 2. Door panel; 21. Transparent window; 22. Rotating part; 23. Handle; 3. Rear cover; 31. Molecular pump interface; 4. Vacuum chamber; 5. Magnetron sputtering power supply module one; 6. Magnetron sputtering power supply module two; 7. Magnetron sputtering power supply module three; 8. Magnetron sputtering power supply module four; 9. Working gas conduit; 10. Vacuum extraction pipe; 11. Multi-arc ion power supply one; 12. Hot wire heating source; 13. Multi-arc ion power supply two; 14. Ion power supply; 15. Heater; 16. Observation window; 17. Bias power supply; 18. Turntable; 19. Sample stage. Detailed implementation manners

[0032] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further introduced in detail below with reference to the accompanying drawings.

[0033] As Figures 1 - 3 shown, an integrated device for a multifunctional coating preparation technology provided by an embodiment of the present invention includes a furnace body 1, and a vacuum chamber 4 is arranged inside the furnace body 1; outside the furnace body 1, there are arranged a magnetron sputtering power supply module one 5, a magnetron sputtering power supply module two 6, a magnetron sputtering power supply module three 7 and a magnetron sputtering power supply module 8, and the magnetron sputtering power supply module one 5, the magnetron sputtering power supply module two 6, the magnetron sputtering power supply module three 7 and the magnetron sputtering power supply module 8 are distributed in a cross structure; on one side of the bottom of the furnace body 1, there is arranged a working gas conduit 9, and on one side of the top of the furnace body 1, there is arranged a vacuum extraction pump 10; on one side of the top and one side of the bottom of the furnace body 1, there are respectively arranged a multi-arc ion power supply one 11 and a multi-arc ion power supply two 13, and the multi-arc ion power supply one 11 and the multi-arc ion power supply two 13 are distributed diagonally; on one side of the bottom of the furnace body 1, there is arranged an ion power supply 14; inside the furnace body 1, there is arranged a rotatable turntable 18, on the front of the turntable 18, there are arranged a plurality of sample stages 19, and on the edge of the turntable 18, there is arranged a bias power supply 17.

[0034] In this embodiment, it includes a furnace body 1; a vacuum chamber 4 is arranged inside the furnace body 1; Specifically, a door panel 2 is arranged on the front of the furnace body 1, and on one side of the furnace body 1, there is arranged a rotating part 22 for the rotation of the door panel 2; Specifically, a transparent window 21 is arranged on the front of the door panel 2, which is convenient for observing the coating preparation situation on the surface of the metal components inside the furnace body 1. On one side of the front of the door panel 2, there is arranged a handle 23, which is convenient for opening the door panel 2, so that the door panel 2 can rotate on the rotating part 22 to realize the opening and closing of the door panel 2; Specifically, a rear cover 3 is arranged on the back of the furnace body 1, and molecular pump interfaces 31 are arranged on both sides of the rear cover 3, which are connected to the molecular pump. The molecular pump is a vacuum pump that uses a high-speed rotating rotor to transfer momentum to gas molecules, so that they obtain a directional velocity, and thus are compressed and driven towards the exhaust port and then pumped away by the fore pump; Specifically, the furnace body 1 has a regular octahedron structure, and observation windows 16 are provided on the outer walls on both sides of the bottom of the furnace body 1.

[0035] In this embodiment, a magnetron sputtering power supply module 1 5, a magnetron sputtering power supply module 2 6, a magnetron sputtering power supply module 3 7, and a magnetron sputtering power supply module 8 are provided outside the furnace body 1, and the magnetron sputtering power supply module 1 5, the magnetron sputtering power supply module 2 6, the magnetron sputtering power supply module 3 7, and the magnetron sputtering power supply module 8 are distributed in a cross structure; Specifically, the magnetron sputtering power supply module 1 5, the magnetron sputtering power supply module 2 6, the magnetron sputtering power supply module 3 7, and the magnetron sputtering power supply module 8 all include deep oscillation magnetron sputtering ion enhancement technology (DOMS), high power pulsed magnetron sputtering technology (HIPIMS), pulsed DC magnetron sputtering technology (PDCMS), and radio frequency magnetron sputtering technology (RF).

[0036] Specifically, according to process requirements, the four targets can be used in combination: 2HIPIMS / DOMS + 2PDCMS or 2HIPIMS / DOMS + 2RF or HIPIMS / DOMS + 2PDCMS + RF or 2HIPIMS / DOMS + PDCMS + RF; Specifically, the working gas argon is 50 - 130 sccm and nitrogen is 20 - 80 sccm, the working gas pressure is 0.5 - 2 Pa, the sputtering power is set to 100 - 8000 W, the negative bias voltage is -30 - -300 V, the time is 10 - 120 min, and the thickness of the hardened layer prepared is 10 nm - 50 mm.

[0037] In this embodiment, a working gas conduit 9 is provided on one side of the bottom of the furnace body 1, and a vacuum pump 10 is provided on one side of the top of the furnace body 1; In this embodiment, a multi-arc ion power supply 1 11 and a multi-arc ion power supply 2 13 are respectively provided on one side of the top and one side of the bottom of the furnace body 1, and the multi-arc ion power supply 1 11 and the multi-arc ion power supply 2 13 are diagonally distributed; Specifically, the multi-arc ion power supply 1 11 and the multi-arc ion power supply 2 13 are at least used for ion plating of products (metal parts); Specifically, for the ion plating of products by the multi-arc ion power supply 1 11 and the multi-arc ion power supply 2 13, the working gas argon is 100 - 200 sccm and nitrogen is 15 - 80 sccm, the working gas pressure is 0.5 - 3 Pa, the arc current is set to 30 - 100 A, the negative bias voltage is -100 - -300 V, the time is 60 - 120 min, and the thickness of the hardened layer prepared is 5 - 50 mm.

[0038] In this embodiment, an ion power supply 14 is provided on one side of the bottom of the furnace body 1; Specifically, the ion power supply 14 is at least used for nitriding, carburizing or cleaning of the product. The ion power supply 14 uses a gas ion source to clean the surface of the sample. The working gas argon is 120 - 200 sccm, the working pressure is 1 - 3 Pa, the power of the ion source power supply is set to 2 - 5 kW, the negative bias voltage is -100 - -300 V, and the time is 10 - 30 min to remove surface oil stains and oxides; Specifically, the ion power supply 14 uses a gas ion source nitriding or carburizing technology. The working gas argon is 80 - 150 sccm and nitrogen or acetylene is 15 - 60 sccm, the working pressure is 1 - 3 Pa, the power of the ion source power supply is set to 5 - 8 kW, the negative bias voltage is -100 - -300 V, and the time is 60 - 120 min to prepare a hardened layer with a thickness of 5 - 15 mm.

[0039] In this embodiment, a rotatable turntable 18 is provided inside the furnace body 1. A plurality of sample stages 19 are provided on the front surface of the turntable 18, and a bias power supply 17 is provided at the edge of the turntable 18.

[0040] In this embodiment, a hot wire heating source 12 is provided on one side of the top of the furnace body 1, and the hot wire heating source 12 is inserted inside the furnace body 1.

[0041] In this embodiment, a plurality of heaters 15 are provided on the inner wall of the furnace body 1 and are evenly distributed in a ring at equal distances.

[0042] Embodiment 1 As Figures 4 - 6 shown, an integrated device using a multi-functional coating preparation technology prepares a TiAlSiN coating on the surface of metal parts: 1) After the surface of the metal parts is pretreated, it is installed in the vacuum chamber 4, and the metal parts are fixed on the sample stage 19 of the turntable 18, and the vacuum is pumped to a base vacuum of 3×10 -4 Pa.

[0043] 2) Adopt the gas ion source technology to clean and nitride the surface: Set the argon flow rate to 120 sccm, the working pressure to 1.2 Pa, the power to 3.6 kW, and the ion cleaning time of the sample to 20 min; Set the nitrogen flow rate to 120 sccm, the heating temperature to 400 °C, the working pressure to 1.2 Pa, the ion source power to 6 kW, the negative bias voltage to -100 V, and the time to 80 min, and the nitrided hardened layer is 10 mm.

[0044] 3) The multi-arc ion plating technology is adopted. The working gas argon is 120 sccm, the working pressure is 1.2 Pa, the arc current is set to 50 A, the negative bias voltage is -100 V, and the time is 10 min to prepare a Ti bonding layer with a thickness of 300 nm; the working gas argon is set to 120 sccm, nitrogen is 30 sccm, the working pressure is 1.2 Pa, the arc current is set to 50 A, the negative bias voltage is -100 V, and the time is 60 min to prepare a TiN nano-coating with a thickness of 15 mm.

[0045] 4) The four-target closed-field unbalanced composite magnetron sputtering technology is adopted, and the 2HIPIMS / DOMS + 2PDCMS composite technology is used in combination. The working gases are argon 80 sccm and nitrogen 25 sccm, the working pressure is 0.8 Pa, the sputtering power is set to 3 kW, the negative bias voltage is -60 V, and the time is 60 min to prepare a TiAlSiN nano-coating with a thickness of about 6 mm.

[0046] 5) Turn off the sputtering power supply, stop the gas, and restore the vacuum to the base vacuum. Sampling is carried out after 1 hour.

[0047] After testing, the prepared TiAlSiN nano-coating has a dense structure and a smooth surface; the nano-hardness is 41.6 GPa, and the Rockwell hardness indentation adhesion grade is higher than HF1.

[0048] Example 2 As Figures 7 - 9 shown, a TiAlSiCN coating is prepared on the surface of metal parts by using an integrated device of the multi-functional coating preparation technology: 1) After the surface of the metal parts is pretreated, it is installed in the vacuum chamber 4, and the metal parts are fixed on the sample stage 19 of the turntable 18, and the vacuum is pumped to the base vacuum of 3×10 -4 Pa.

[0049] 2) The gas ion source technology is adopted for cleaning and surface nitriding: Set the argon flow rate to 120 sccm, the working pressure to 1.2 Pa, the power to 3.6 kW, and the ion cleaning sample time to 20 min; Set the nitrogen flow rate to 120 sccm, the heating temperature to 400 °C, the working pressure to 1.2 Pa, the ion source power to 6 kW, the negative bias voltage to -100 V, and the time to 80 min, and the nitriding hardened layer is 10 mm.

[0050] 3) The multi-arc ion plating technique is adopted. The working gas argon is 120 sccm, the working pressure is 1.2 Pa, the arc current is set at 50 A, the negative bias voltage is -100 V, and the time is 10 min to prepare a Ti bonding layer with a thickness of 300 nm. The working gas argon is set at 120 sccm, nitrogen is 30 sccm, the working pressure is 1.2 Pa, the arc current is set at 50 A, the negative bias voltage is -100 V, and the time is 50 min to prepare a TiN nano-coating with a thickness of 5 mm.

[0051] 4) The four-target closed-field unbalanced composite magnetron sputtering technique is adopted, and the 2HIPIMS / DOMS + 2PDCMS composite technique is used in combination. The connection methods of the four target materials to the sputtering power supply are as follows: The HIPIMS and PDCMS sputtering target materials are TiAlSi (sputtering power 4 kW), the HIPIMS sputtering C target material (sputtering power 2 kW), the PDCMS sputtering Ti target material (sputtering power 4 kW), the working gases are argon 80 sccm and nitrogen 25 sccm, the working pressure is 0.8 Pa, the negative bias voltage is set at -60 V, and the time is 90 min to prepare a TiAlSiCN nano-coating with a thickness of about 15 mm.

[0052] 5) Turn off the sputtering power supply, stop the gas, and restore the vacuum to the base vacuum degree. Take samples after 1 hour.

[0053] 6) After testing, the prepared TiAlSiCN nano-coating has a dense structure and a smooth surface; the nano-hardness is 40.2 GPa, and the Rockwell hardness indentation adhesion level is higher than HF1.

[0054] Only some exemplary embodiments of the present invention are described above by way of illustration. Undoubtedly, for those of ordinary skill in the art, the described embodiments can be modified in various different ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. An integrated device for multifunctional coating preparation technology, comprising a furnace body (1), characterized in that: A magnetic sputtering power module 1 (5), a magnetic sputtering power module 2 (6), a magnetic sputtering power module 3 (7) and a magnetic sputtering power module (8) are arranged outside the furnace body (1); the magnetic sputtering power module 1 (5), the magnetic sputtering power module 2 (6), the magnetic sputtering power module 3 (7) and the magnetic sputtering power module (8) are arranged in a cross structure; The magnetic sputtering power module 1 (5), magnetic sputtering power module 2 (6), magnetic sputtering power module 3 (7) and magnetic sputtering power module (8) all include deep oscillation magnetron sputtering ion enhancement technology (DOMS), high power pulsed magnetron sputtering technology (HIPIMS), pulsed direct current magnetron sputtering technology (PDCMS) and radio frequency magnetron sputtering technology (RF); According to the process requirements, four targets can be used in combination: 2HIPIMS / DOMS+2PDCMS or 2HIPIMS / DOMS+2RF or HIPIMS / DOMS+2PDCMS+RF or 2HIPIMS / DOMS+PDCMS+RF; The working gas is argon 50-130sccm and nitrogen 20-80sccm, the working pressure is 0.5-2Pa, the sputtering power is set to 100-8000W, the negative bias voltage is -30--300V, the time is 10-120min, and the prepared hardened layer thickness is 10nm-50mm; A multi-arc ion power source 1 (11) and a multi-arc ion power source 2 (13) are respectively arranged on the top side and the bottom side of the furnace body (1), and the multi-arc ion power source 1 (11) and the multi-arc ion power source 2 (13) are diagonally distributed; The multi-arc ion power source 1 (11) and the multi-arc ion power source 2 (13) are at least used for ion plating of the product; The multi-arc ion power source 1 (11) and the multi-arc ion power source 2 (13) use argon gas 100-200 sccm and nitrogen 15-80 sccm for ion plating of the product, a working gas pressure of 0.5-3 Pa, an arc current of 30-100 A, a negative bias voltage of -100--300 V, a time of 60-120 min, and a hardened layer thickness of 5-50 mm. An ion power supply (14) is provided on one side of the bottom of the furnace body (1); The ion power supply (14) is at least used for nitriding or carburizing or cleaning of the product. The ion power supply (14) uses a gas ion source to clean the sample surface, with a working gas of argon gas of 120 to 200 sccm, a working gas pressure of 1 to 3 Pa, an ion source power of 2 to 5 kW, a negative bias voltage of -100 to -300 V, and a time of 10 to 30 minutes to remove surface oil and oxides; The ion power supply (14) adopts gas ion source nitriding or carburizing technology, with working gas argon 80-150sccm and nitrogen or acetylene 15-60sccm, working gas pressure 1-3Pa, ion source power 5-8kW, negative bias voltage -100--300V, time 60-120min, and prepared hardened layer thickness 5-15mm.

2. The integrated device of a multifunctional coating preparation technology according to claim 1, characterized in that: A door panel (2) is arranged on the front of the furnace body (1), and a rotating member (22) for rotating the door panel (2) is arranged on one side of the furnace body (1); A transparent window (21) is provided on the front of the door panel (2), and a handle (23) is provided on one side of the front of the door panel (2).

3. The integrated device of a multifunctional coating preparation technology according to claim 1, characterized in that: A rear cover (3) is provided on the back of the furnace body (1), and molecular pump interfaces (31) are provided on both sides of the rear cover (3).

4. The integrated device of a multifunctional coating preparation technology according to claim 1, characterized in that: The furnace body (1) is a regular octahedral structure, and observation windows (16) are provided on the outer walls on both sides of the bottom of the furnace body (1).

5. The integrated device of a multifunctional coating preparation technology according to claim 1, characterized in that: A hot wire heating source (12) is provided on one side of the top of the furnace body (1), and the hot wire heating source (12) is inserted into the interior of the furnace body (1).

6. The integrated device of a multifunctional coating preparation technology according to claim 1, characterized in that: A plurality of heaters (15) are arranged on the inner wall of the furnace body (1) and are distributed in a ring shape at equal distances.

7. The integrated device of a multifunctional coating preparation technology according to claim 1, characterized in that: A rotatable turntable (18) is arranged inside the furnace body (1), a plurality of sample stages (19) are arranged on the front of the turntable (18), and a bias power supply (17) is arranged on the edge of the turntable (18).

8. The integrated device of the multifunctional coating preparation technology according to claim 1 is characterized in that: A working gas conduit (9) is provided on one side of the bottom of the furnace body (1), and a vacuum pump (10) is provided on one side of the top of the furnace body (1).

9. The integrated device of a multifunctional coating preparation technology according to claim 1, characterized in that: A vacuum chamber (4) is provided inside the furnace body (1).

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