Maintenance cleaning system for liquid-cooled rack-mounted processing assembly

Abstract

A cleaning system and method are provided for a liquid-cooled rack-mounted process assembly, the cleaning system comprising a cleaning unit comprising: a first tank containing a first liquid and coupled to a first fluid control structure, the first liquid comprising an acidic cleaning agent; a second tank containing a second liquid and fluidly coupled to the second fluid control structure, the second liquid comprising softened water; a third tank containing a third liquid and fluidly coupled to a third fluid control structure, the third liquid comprising treated permeate water; and a control module configured to select one of the first, second, or third liquids and define corresponding first, second, and third cleaning cycles and durations. The forward fluid coupling portion supplies a selected liquid to the processing assembly and the return fluid coupling portion receives a return liquid from the processing assembly. A fourth operable cycle is defined and performed if the quality level of the return liquid from the processing assembly does not meet the requirement.

Description

[0001] Related Cross - References

[0002] This application claims priority to European Patent Application No. 23307234.7, filed on December 15, 2023, and entitled "A MAINTENANCE CLEANSING SYSTEM FOR LIQUID - COOLED RACK - MOUNTED PROCESSING ASSEMBLIES", the entire content of which is incorporated herein by reference. Field of the Technology

[0003] This technology generally relates to the field of liquid cooling devices for data centers, and in particular, to the cleaning of existing liquids that serve the liquid cooling needs of rack - mounted processing assemblies. Background Art

[0004] Data centers and many computer processing facilities house many rack - mounted electronic processing components. In operation, such electronic processing components generate a large amount of heat, which must be dissipated to avoid electronic component failures and thus ensure continuous and efficient processing operations.

[0005] To this end, various liquid cooling measures have been implemented to facilitate the dissipation of heat generated by electronic processing components. One such measure employs immersion liquid cooling technology, in which electronic components are fully immersed in a rack housing containing a non - conducting cooling liquid (such as, for example, a dielectric cooling liquid). Immersion of the electronic components in the dielectric cooling liquid enables sufficient thermal contact between the electronic components to dissipate a significant amount of the generated heat.

[0006] However, certain electronic components, such as, for example, high - performance processing units, tend to generate more heat than other electronic components (such as, for example, memory boards), and the dielectric liquid immersion measure may not adequately cool these high - heat - generating components. To address the cooling of these high - heat - generating components, direct liquid cooling block measures have been implemented, in which a liquid cooling block having internal channels for circulating cold water therethrough is provided in direct thermal contact with the high - heat - generating components.

[0007] The inventors of the present application have found evidence of the generation of undesirable contaminants over time due to the circulation of channeled water throughout the liquid cooling block and the corresponding distribution channels and coupling elements. This evidence of undesirable contaminants includes the accumulation of mineral deposits, corrosion, algae, bacteria, etc., all of which can affect the quality of the water and the effective flow of the channeled water.

[0008] Accordingly, there is interest in eliminating the accumulation of such undesirable contaminants and reducing the recurrence of such undesirable contaminants in the implementation of direct liquid cooling blocks.

[0009] The subject matter discussed in the background section should not be considered prior art merely because it is mentioned in the background section. Similarly, problems mentioned in the background section or problems associated with the subject matter of the background section should not be considered to have been previously recognized in the prior art. The subject matter in the background section merely represents different approaches. Summary of the Invention

[0010] Embodiments of the present technology are developed based on certain deficiencies associated with the accumulation of various contaminants in technologies and implementations related to mineral deposits, corrosion, algae, bacteria, etc.

[0011] In one aspect of the present inventive concept, the present technology provides a maintenance cleaning system for a liquid-cooled rack-mounted data processing component. The cleaning system includes: a cleaning unit that includes: a first tank that houses a volume of a first liquid that includes a cleaning agent having an acidic pH level, and the first tank is fluidly coupled to a first fluid control structure; a second tank that houses a volume of a second liquid that includes softened water or pure water, and the second tank is fluidly coupled to a second fluid control structure; and a third tank that houses a volume of a third liquid that includes osmosed water treated with a corrosion inhibitor having an alkaline pH level, and the third tank is fluidly coupled to a third fluid control structure. The system further includes: a control module that is operably coupled to the first fluid control structure, the second fluid control structure, and the third fluid control structure, and the control module is configured to select one of the first liquid, the second liquid, or the third liquid and define a corresponding first operable cleaning cycle and cycle duration, a second operable cleaning cycle and cycle duration, and a third operable cleaning cycle and cycle duration; a forward fluid coupling portion that is configured to supply the selected liquid to the rack-mounted processing component; and a return fluid coupling portion that is configured to receive the selected liquid from the rack-mounted processing component; a rack unit fluid inlet that is configured to receive the selected fluid from the forward fluid coupling portion and distribute the selected liquid to each rack-mounted processing component within the entire rack-mounted processing component for a corresponding cleaning cycle; and a rack unit fluid outlet that is configured to receive the distributed selected liquid from each rack-mounted processing component during the corresponding cleaning cycle and return the distributed selected liquid to the corresponding tank.

[0012] The features of the maintenance cleaning system include a fourth tank that houses a certain volume of a fourth liquid, the fourth liquid including a certain volume of corrosion inhibitor-treated permeated water having an alkaline pH level, and the fourth tank being fluidly coupled to a fourth fluid control structure for the control module to select to establish a corresponding fourth cleaning cycle and cycle duration.

[0013] Another feature of the maintenance cleaning system provides that each of the first fluid control structure, the second fluid control structure, the third fluid control structure, and the fourth fluid control structure includes a corresponding supply liquid passage that contains at least one pump and at least one solenoid valve, the at least one pump and the at least one solenoid valve being for providing appropriate pressure and liquid flow to the selected liquid entering the data center rack unit.

[0014] An additional feature of the maintenance cleaning system provides that each of the first fluid control structure, the second fluid control structure, the third fluid control structure, and the fourth fluid control structure includes a corresponding return liquid passage that includes at least one filter and at least one heat exchanger, the at least one filter and the at least one heat exchanger being for re-cleaning and re-cooling the returned selected liquid.

[0015] Another characteristic of the maintenance cleaning system is that the cleaning unit performs the first cleaning cycle, the second cleaning cycle, the third cleaning cycle, and the fourth cleaning cycle while the data processing components remain in operation.

[0016] In addition, the maintenance cleaning system is characterized in that the cleaning unit further includes a wheel assembly for transportation throughout the data center.

[0017] In another aspect of the present invention concept, the technology provides a maintenance cleaning method for a liquid-cooled rack-mounted data processing component, the maintenance cleaning method including: defining operable cleaning cycles and durations for a first liquid, a second liquid, and a third cleaning liquid, the first liquid including a cleaning agent having an acidic pH level, the second liquid including a water softener, and the third cleaning liquid including treated permeated water having an alkaline pH level; selecting the first liquid and performing a first operable cleaning cycle for a first duration to inject a first liquid flow into the entire processing component and circulate the first liquid flow through the entire processing component; at the termination of the first operable cleaning cycle, selecting the second liquid and performing a second operable cleaning cycle for a second duration to inject a second liquid flow into the entire processing component and circulate the second liquid flow through the entire processing component; and at the termination of the second operable cleaning cycle, selecting the third liquid and performing a third operable cleaning cycle for a third duration to inject a third liquid flow into the entire processing component and circulate the third liquid flow through the entire processing component.

[0018] Additional features of the maintenance cleaning method include: defining an operable cleaning cycle and duration for a fourth liquid, which includes treated permeate water having an alkaline pH level, wherein after detecting remaining contaminants and / or a significant drop in the pH level, the fourth liquid is selected and the fourth operable cleaning cycle is performed for a fourth duration to flow the fourth liquid through the entire processing assembly and circulate the fourth liquid flow through the entire processing assembly.

[0019] In the context of this specification, unless otherwise expressly specified, a computer system may refer to but is not limited to "electronic device", "operating system", "system", "computer-based system", "controller unit", "monitoring device", "control device", and / or any combination thereof suitable for the related tasks described.

[0020] In the context of this specification, unless otherwise expressly specified, the expressions "computer-readable medium" and "memory" are intended to include any medium of any nature and type, non-limiting examples of which include RAM, ROM, disks (CD-ROM, DVD, floppy disk, hard disk drive, etc.), USB keys, flash memory cards, solid-state drives, and tape drives. Still in the context of this specification, "a" computer-readable medium and "the" computer-readable medium should not be construed as the same computer-readable medium. Instead, and where appropriate, "a" computer-readable medium and "the" computer-readable medium may also be construed as a first computer-readable medium and a second computer-readable medium.

[0021] In the context of this specification, unless otherwise expressly specified, words such as "first", "second", "third", etc. are used as adjectives solely for the purpose of allowing the nouns they modify to be distinguished from each other, and not for the purpose of describing any particular relationship between these nouns.

[0022] Implementations of the present technology each have at least one of the objects and / or aspects described above, but not necessarily all of them. It should be understood that some aspects of the present technology resulting from attempting to achieve the above-mentioned objects may not meet that object and / or may meet other objects not specifically recited herein.

[0023] Additional and / or alternative features, aspects, and advantages of implementations of the present technology will become apparent from the following description, drawings, and appended claims. Description of the Drawings

[0024] To better understand the present technology and its other aspects and additional features, reference is made to the following description taken in conjunction with the drawings, in which:

[0025] Figure 1 Shows a high - level functional block diagram of a maintenance cleaning system for a liquid - cooled rack - mounted data processing component according to a non - limiting embodiment of the present technology;

[0026] Figure 2 Shows a high - level block diagram of an operable configuration for a fluid control structure according to a non - limiting embodiment of the present technology;

[0027] Figure 3 Shows a high - level flowchart of a maintenance cleaning method for a liquid - cooled rack - mounted data processing component according to a non - limiting embodiment of the present technology; and

[0028] Figure 4 Shows a schematic block diagram of a control module according to a non - limiting embodiment of the present technology.

[0029] It should be understood that, unless otherwise explicitly stated herein, the drawings are not drawn to scale. Detailed Description

[0030] The examples and conditional language recited herein are primarily intended to assist the reader in understanding the principles of the present technology and are not intended to limit its scope to such specifically recited examples and conditions. It will be understood that those skilled in the art can design various arrangements that, although not explicitly described or shown herein, still embody the principles of the present technology.

[0031] In addition, for the sake of understanding, the following description may describe a relatively simplified implementation of the present technology. Those skilled in the art will understand that various implementations of the present technology may have greater complexity.

[0032] In some cases, examples that are considered helpful for modifying the present technology may also be set forth. This is done solely for the purpose of assisting understanding and is not intended to limit the scope of the present technology or to delineate its boundaries. These modifications are not an exhaustive listing, and those skilled in the art can make other modifications while still remaining within the scope of the present technology. Moreover, if examples of modifications are not set forth, it should not be construed that modifications are not possible and / or that the described content is the only way to implement this element of the present technology.

[0033] In addition, all statements in this document that describe the principles, aspects, and implementations of the technology and their specific examples are intended to cover both structural and functional equivalents thereof, whether currently known or developed in the future. Thus, for example, those skilled in the art will understand that any block diagrams herein represent conceptual views of exemplary circuits embodying the principles of the technology. Similarly, it will be understood that any flowcharts, operation diagrams, state transition diagrams, pseudocode, etc. represent various processes that can be substantially represented in a non-transitory computer-readable medium and are thus executed by a computer or processor, whether or not such a computer or processor is explicitly shown.

[0034] The functions of the various elements shown in the figures (including any functional blocks labeled "processor") can be provided by using dedicated hardware as well as hardware capable of executing software in conjunction with appropriate software. When these functions are provided by a processor, they can be provided by a single dedicated processor, a single shared processor, or some number of individual processors that are shareable. In some embodiments of the technology, the processor can be a general-purpose processor (such as a central processing unit (CPU)) or a processor dedicated to a specific purpose (such as a digital signal processor (DSP)). In addition, the term "processor" as explicitly used should not be construed to refer exclusively to hardware capable of executing software and may implicitly include, but is not limited to, application specific integrated circuits (ASICs), field programmable gate arrays (FPGAs), read-only memories (ROMs) for storing software, random access memories (RAMs), and non-volatile memories. Other conventional and / or custom hardware may also be included.

[0035] Software modules, or simply modules implied to be software, can be represented herein as any combination of flowchart elements or other elements indicating the execution of process steps and / or text descriptions. These modules can be executed by hardware that is explicitly or implicitly shown. In addition, it should be understood that a module can include, for example but not limited to, computer program logic, computer program instructions, software, stacks, firmware, hardware circuits, or combinations thereof that provide the required capabilities.

[0036] In view of this basic understanding, the disclosed embodiments are directed to a cleaning system for a liquid-cooled rack-mounted processing component that is configured to eliminate the accumulation of undesirable contaminants and reduce the recurrence of undesirable contaminants in a direct liquid-cooling block implementation. The cleaning system is capable of performing a cleaning cycle while the processing component is operating without downtime.

[0037] Figure 1FIG. 0 shows a high-level functional block diagram of a maintenance cleaning system 100 for a liquid-cooled rack-mounted data processing component according to a non-limiting embodiment of the present technology. As depicted, the maintenance cleaning system 100 generally includes a cleaning unit 110 that communicates with and contacts a data center rack unit 120 in a fluid manner.

[0038] Starting the description from the data center rack unit 120, the rack unit 120 may house a single rack or may house multiple racks 120A to 120M, where each rack includes one or more rack-mounted data processing components. Each of the rack-mounted data processing components in the rack-mounted data processing components includes a heat-generating processing component (not shown), such as a server, and the heat-generating processing component is cooled by a liquid cooling block (not shown) (also referred to as a "water block") that is arranged to be in direct thermal contact with the heat-generating component.

[0039] Each of the liquid cooling blocks in turn employs an internal channel that is fluidly connected to a rack liquid cooling circuit 123 that conveys a cooling liquid (e.g., water) and circulates the channelized cold cooling liquid throughout the interior of the liquid cooling block, and the rack liquid cooling circuit 123 conveys the warm cooling liquid heated by the heat-generating component for further cooling processing. The server rack liquid cooling circuit 123 may be composed of a flexible material (e.g., rubber, plastic, etc.), a rigid material (e.g., metal, PVC piping, etc.), or any combination thereof that is capable of safely conveying and circulating the cold cooling liquid.

[0040] The data center rack unit 120 also implements a rack unit liquid inlet 122 and a rack unit liquid outlet 124. The liquid inlet 122 is fluidly coupled to the input side of the server rack liquid cooling circuit 123 to supply cold cooling liquid to the liquid cooling blocks, and the liquid inlet 122 incorporates a pressure sensor P1 and a temperature sensor T1 to monitor the pressure and temperature values of the liquid entering the rack unit 120 via the rack liquid cooling circuit 123. The pressure sensor P1 and the temperature sensor T1 respectively provide pressure values and temperature values to determine whether the appropriate liquid flow pressure and temperature entering the rack unit 120 can maintain the continuous operation of the data processing components of the racks 120A - 120M.

[0041] The rack unit liquid outlet 124 is fluidly coupled to the output side of the liquid cooling loop 123 to receive warm cooling liquid from the liquid cooling block heated by the heat-generating components, and the rack unit liquid outlet 124 is incorporated with a pressure sensor P2 and a temperature sensor T2 to monitor the pressure value and temperature value of the liquid leaving the rack unit 120 via the rack liquid cooling loop 123. The pressure sensor P2 and the temperature sensor T2 respectively provide the pressure value and temperature value to determine whether the appropriate liquid flow pressure and temperature leaving the rack unit 120 maintain the continuous operation of the data processing components of the rack 120A - 120M.

[0042] For cleaning purposes, the present technology utilizes the infrastructure provided by the liquid inlet 122, the liquid cooling loop 123, and the liquid outlet 124 to distribute various cleaning liquids from the cleaning unit 110 to the entire liquid cooling loop 123 according to a specified cleaning cycle, and return the cleaning liquid containing contaminant residues (i.e., "dirty liquid") to the cleaning unit 110.

[0043] Turn to Figure 1 the cleaning unit 110, which includes a plurality of liquid tanks 110A - 110D, a controller or "control module" 110X, fluid control structures 110A1 - 110D1 corresponding to each of the liquid tanks, a forward fluid coupling portion 112, a return fluid coupling portion 114, a water quality inspection (WQC) bench 110Z, and an electric three-way valve 110Y.

[0044] Each of the plurality of liquid tanks 110A - 110D contains a certain volume of liquid having specific cleaning / processing properties. In some embodiments, the first tank 110A may include a first volume of liquid that includes a cleaning agent having an acidic pH level. The cleaning agent may include a citric acid-based additive that is used to effectively and environmentally remove various mineral deposits and contaminants. The second tank 110B may include a second volume of liquid that includes a water softening additive or pure water for ionically removing mineral deposits. The third tank 110C may include a third volume of liquid that includes permeated water with a corrosion inhibitor having an alkaline pH level to provide a cooling fluid substantially free of contaminants.

[0045] In some implementations, the mobile cleaning unit 110 may include a fourth tank 110D that includes a fourth volume of liquid that also includes permeated water with a corrosion inhibitor having an alkaline pH level to provide a cooling fluid free of contaminants.

[0046] As noted above, the mobile cleaning unit 110 also includes a forward fluid connection portion 112, a return fluid connection portion 114, a water quality check (WQC) workbench 110Z, and an electric three-way valve 110Y. The forward fluid connection portion 112 is operative to fluidly transport liquid from a selected tank 110A-110D to the frame unit 120, while the return fluid connection portion 114 is operative to return fluid distributed throughout the frame unit 120 to the mobile cleaning unit 110.

[0047] The WQC workbench 110Z is connected to the return fluid connection portion 114, which includes a pump (not shown) and a water quality sensor (not shown) for measuring certain liquid quality levels such as, for example, the pH level, conductivity, aluminum content, copper content, zinc content, aerobic microbial content, etc. of the existing liquid circulating within the frame unit 120. In certain implementations, satisfactory liquid quality levels can include a pH balance of approximately between 8 and 10, a conductivity of approximately less than 170 (μS / cm), an aluminum content, copper content, zinc content of approximately less than 0.6 ppm, and an aerobic microbial content of approximately less than 1000 cfu / ml.

[0048] With this WQC 110Z configuration, when the liquid from the frame unit 120 is connected to the mobile cleaning unit 110 via the return fluid connection portion 114, the WQC 110Z can perform a pre-test to determine whether the returned liquid needs to be cleaned based on the quality levels measured by the sensors. If so, the WQC 110Z instructs the electric three-way valve 110Y to open the fluid control structures 110A1-110D1 (discussed below) of the corresponding liquid tanks 110A-110D. Additionally, at the end of a predetermined cleaning cycle duration t, the WQC 110Z tests the returned liquid again to determine whether the quality levels meet the requirements or whether the cleaning cycle should be repeated for one or more stages.

[0049] As Figure 1 shown, each of the liquid tanks 110A-110D is operatively connected to a corresponding fluid control structure 110A1-110D1. As will be described in more detail below, the fluid control structures 110A1-110D1 actuate and control the circulation of the liquid based on corresponding operative cleaning cycles and durations while still keeping the data processing components 120A-120M operable throughout the cleaning process.

[0050] The control module 110X is configured to establish corresponding operable cleaning cycles and cycle durations for each liquid based on the cleaning / purifying properties of the various liquids. The control module 110X is further configured to communicatively couple to each of the fluid control structures 110A1-110D1 to provide instructions regarding the actuation and control of the liquid circulation during the respective operable cleaning cycles and durations.

[0051] Figure 2 A high-level block diagram of an operable configuration 200 for the fluid control structures 110A1-110D1 in accordance with a non-limiting embodiment of the present technology is shown. As shown, the configuration 200 shows the fluid interconnections between each of the liquid tanks 110A-110D and the corresponding structure control / monitoring components, and the configuration 200 shows the liquid circulation channels serving to supply liquids from the liquid tanks 110A-110D to the data processing components 120A-120M of the data center rack unit 120 and to return the contaminated liquid (i.e., "dirty liquid") from the rack unit 120 back to the respective tanks 110A-110D.

[0052] Specifically, the fluid control structure 110A1 corresponding to the first liquid tank 110A includes: a first supply liquid channel 210A1 for advancing a first liquid containing an acidic cleaning agent to the data center rack unit 120; and a first return liquid channel 210A2 for receiving the "dirty" cleaning agent liquid from the data center rack unit 120. As shown, the first supply liquid channel 210A1 includes: a pump PA for providing appropriate pressure for the first liquid to flow into the data center rack unit 120; and a solenoid valve V1 that operates to enable the forward flow injection of the first liquid. The actuation, control, and duration of the pump PA and valve V1 for the injection flow for advancing the first liquid are determined by the first liquid operable cleaning cycle and duration established by the control module 110X.

[0053] The first return liquid channel 210A2 includes a solenoid valve V2, a filter FA, and an air-to-liquid heat exchanger FHEXA. The valve V2 enables the first "dirty" cleaning agent liquid to flow back from the data center rack unit 120, the filter FA is used to re-clean the "dirty" cleaning agent liquid by substantially removing contaminants therefrom, and the air-to-liquid heat exchanger FHEXA is used to re-cool the re-cleaned cleaning agent liquid and return it to the first liquid cleaning agent tank 110A for recirculation until the corresponding cleaning cycle duration expires.

[0054] The remaining fluid control structures 110B1 - 110D1 of the corresponding liquid tanks 110A - 110D have similar structures. That is, the fluid control structure 110B1 corresponding to the second liquid tank 110B includes: a second supply liquid passage 210B1 for injecting a second liquid containing a water softener forward into the data center rack unit 120; and a second return liquid passage 210B2 for receiving a second "dirty liquid" from the data center rack unit 120.

[0055] The second supply liquid passage 210B1 includes: a pump PB for providing appropriate pressure for the second liquid to flow into the data center rack unit 120; and a solenoid valve V3 for enabling the second water - softened liquid to flow forward for injection. The second return liquid passage 210B2 includes a solenoid valve V4, a filter FB, and an air - liquid heat exchanger FHEXB. The valve V4 enables the second "dirty" water - softened liquid flow to return from the data center rack unit 120, the filter FB is used to re - clean the "dirty" water - softened liquid by substantially removing contaminants therein, and the air - liquid heat exchanger FHEXB is used to re - cool the re - cleaned water - softened liquid and return it to the second liquid cleaner tank 110B for recirculation until the corresponding cleaning cycle duration expires. The actuation, control, and duration of the pump PB, valve V3, valve V4, and air - liquid heat exchanger FHEXB are determined by a second - liquid - operable cleaning cycle and duration established by the control module 110X.

[0056] The fluid control structure 110C1 corresponding to the third liquid tank 110C includes: a third supply liquid passage 210C1 for injecting a third liquid containing osmotic water treated with an additive forward into the data center rack unit 120; and a third return liquid passage 210C2 for receiving a third "dirty" treated osmotic water from the data center rack unit 120.

[0057] The third supply liquid channel 210C1 includes: a pump PC for providing appropriate pressure for the third liquid to flow into the data center rack unit 120; and a solenoid valve V5 for enabling the third liquid to flow forward and be injected into the data center rack unit 120. The third return liquid channel 210C2 includes a solenoid valve V6, a filter FC, and an air-liquid heat exchanger FHEXC. The filter FC is used to re-clean the "dirty" permeated water by substantially removing contaminants from the "dirty" permeated water, and the air-liquid heat exchanger FHEXC is used to re-cool the re-cleaned water and return it to the third liquid cleaner tank 110B for recirculation until the corresponding cleaning cycle duration expires.

[0058] The actuation, control, and duration of the pump PC, valve V5, valve V6, and air-liquid heat exchanger FHEXC are determined by the third liquid-operable cleaning cycle and duration established by the control module 110X.

[0059] In the same manner, the fluid control structure 110D1 corresponding to the fourth liquid tank 110D includes: a fourth supply liquid channel 210D1 for injecting the fourth liquid containing permeated water treated with an additive forward into the data center rack unit 120; and a fourth return liquid channel 210D2 for receiving the fourth "dirty" treated permeated water from the data center rack unit 120.

[0060] The fourth supply liquid channel 210D1 includes: a pump PD for providing appropriate pressure for the third liquid to flow into the data center rack unit 120; and a solenoid valve V7 for enabling the fourth liquid to flow forward and be injected into the data center rack unit 120. The fourth return liquid channel 210D2 includes a solenoid valve V8, a filter FD, and an air-liquid heat exchanger FHEXD. The filter FD is used to re-clean the "dirty" treated permeated water by substantially removing contaminants from the "dirty" treated permeated water, and the air-liquid heat exchanger FHEXD is used to re-cool the re-cleaned water and return it to the fourth liquid cleaner tank 110B for recirculation until the corresponding cleaning cycle duration expires.

[0061] The actuation, control, and duration of the pump PD, valve V7, valve V8, and air-liquid heat exchanger FHEXD are determined by the fourth liquid-operable cleaning cycle and duration established by the control module 110X.

[0062] In view of the disclosed configuration, each of the fluid control structures 110A1 - 110D1 connected to the liquid tanks 110A - 110D is designed to inject an appropriate cleaning liquid into the data - processing components 120A - 120M of the data - center rack unit 120 and return the "dirty" liquid to the corresponding liquid tanks 110A - 110D according to a specific operable cleaning cycle and cycle duration established by the control module 110X. Thus, the cleaning cycle can be executed while keeping the data - processing components 120A - 120M operable throughout the cleaning process.

[0063] Figure 3 A high - level flowchart for a maintenance cleaning method 300 according to a non - restrictive implementation of the present technology is shown. In the disclosed implementation, for ease of handling, the maintenance cleaning method 300 or portions thereof are described as being executed by the control module 110X. However, the exact one or more entities that execute the maintenance cleaning method 300 should not be construed as a limitation on the concepts provided by this disclosure.

[0064] With that said, the maintenance cleaning method 300 starts at task block 302, where a first operable cleaning cycle and a corresponding cycle duration t1, a second operable cleaning cycle and a corresponding cycle duration t2, a third operable cleaning cycle and a corresponding cycle duration t3, and a fourth operable cleaning cycle and a corresponding cycle duration t4 are defined based on the cleaning properties of the corresponding first liquid, second liquid, and third liquid / fourth liquid. As noted above, the first liquid includes a cleaning agent having an acidic pH level, the second liquid includes a water - softening additive, and the third liquid and fourth liquid include permeated water with an anti - corrosion additive having an alkaline pH level.

[0065] At task block 304, the cleaning method 300 performs a pre - test to measure the liquid - quality level of the liquid returned from the server rack as detected by the sensors of the WQC 110Z. At decision block 306, the method 300 determines whether the quality level of the returned liquid meets the requirements. If it meets the requirements, the method 300 terminates at block 308. If it does not meet the requirements, the method 300 moves to task block 310, where a first cleaning cycle is executed to inject a first liquid stream containing an acidic cleaning agent from the first tank 110A into the data - processing components 120A - 120M of the entire data - center rack unit 120 via the liquid - cooling circuit 123 and return the "dirty" first liquid to the first tank 110A for a defined first - cycle duration t1. As noted above, task block 310 requires timely actuation and control of the pump PA, valves V1, V2, and the heat exchanger FHEXA throughout the duration of the first cycle.

[0066] At the termination of the first cycle, method 300 performs a second cleaning cycle at task block 312. This second cleaning cycle involves injecting a second liquid stream containing a water softener into the data processing components 120A - 120M of the entire data center rack unit 120 via the liquid cooling loop 123 and returning the "dirty" second liquid to the second tank 110B for a defined second cycle duration. As noted above, task block 312 requires timely actuation and control of pump PB, valve V3, valve V4, and heat exchanger FHEXB throughout the duration of the second cycle.

[0067] At task block 314, after the termination of the second cleaning cycle, method 300 performs a third cleaning cycle. This third cleaning cycle involves injecting a third liquid stream containing treated permeate water into the data processing components 120A - 120M of the entire data center rack unit 120 via the liquid cooling loop 123 and returning the "dirty" third liquid to the second tank 110A for a defined third cycle duration. As noted above, task block 314 requires timely actuation and control of pump PC, valve V5, valve V6, and heat exchanger FHEXC throughout the duration of the third cycle.

[0068] At task block 316, when the quality level of the returned liquid, as measured by the sensor of WQC 110Z, does not meet the requirements, at task block 316, method 300 performs a fourth operable cycle to again inject the treated permeate water stream into the entire processing components for a defined fourth cycle duration to address any such issues.

[0069] In addition, in cases where the quality level of the returned liquid still does not meet the requirements, in some implementations, method 300 may return to task block 310 through task block 316 to repeat the first cleaning cycle through the fourth cleaning cycle.

[0070] In this way, the maintenance cleaning system 100 and the maintenance cleaning method 300 effectively eliminate the accumulation of undesirable contaminants and reduce the recurrence of undesirable contaminants in the liquid cooling configuration of the entire rack - mounted data processing components. In addition, the cleaning system and method are capable of performing the cleaning cycle while the data processing components are still operating without requiring a shutdown.

[0071] Although the implementations of the cleaning method described above have been described and illustrated with reference to specific steps performed in a specific order, it will be understood that these steps can be combined, subdivided, or reordered without departing from the teachings of the present technology. At least some steps can be performed in parallel or serially. Thus, the order and grouping of the steps are not limitations of the present technology.

[0072] It will be understood that at least some of the operations in the operation of method 300 may also be performed by a computer program, which may exist in various forms, both active and passive. For example, the computer program may exist as a software program, which consists of program instructions in source code, object code, executable code, or other formats. Any of the foregoing may be embodied in a computer-readable medium in compressed or uncompressed form, which includes storage devices and signals. Representative computer-readable storage devices include conventional computer system RAM (Random Access Memory), ROM (Read Only Memory), EPROM (Erasable Programmable ROM), EEPROM (Electrically Erasable Programmable ROM), and magnetic disks or optical disks or tapes. Representative computer-readable signals, whether modulated by a carrier or not, are signals that a computer system hosting or running the computer program can be configured to access, including signals downloaded via the Internet or other networks. Specific examples of the foregoing include the distribution of programs on a CD ROM or downloaded via the Internet. In a sense, the Internet itself, as an abstract entity, is a computer-readable medium. Generally speaking, the same is true for computer networks.

[0073] As an example, Figure 4 is a schematic block diagram of control module 110X according to an embodiment of the present technology. Control module 110X includes: a processor or multiple cooperative processors (represented as processor 410 for simplicity), one or more storage devices (represented as storage device 430 for simplicity), and an input / output interface 420, which allows control module 110X to communicate with other components of mobile cleaning unit 110 and / or other components that communicate remotely with mobile cleaning unit 110. Processor 410 is operably connected to storage device 430 and input / output interface 420. Storage device 430 includes a memory for storing parameters 434. Storage device 430 may include a non-transitory computer-readable medium for storing code instructions 432 executable by processor 410 to allow control module 110X to perform various tasks assigned to control module 110X in method 300.

[0074] Control module 110X is operably connected via input / output interface 420 to fluid control structures 110A1, 110B1, 110C1, and 110D1, pumps PA, PB, PC, and PD, valves V1 to V8, and other components of mobile cleaning unit 110. Control module 110X executes code instructions 432 stored in storage device 430 to implement the various functions described above that may exist in a specific embodiment. As shown Figure 4Illustrates a non-limiting embodiment, in which the control module 110X coordinates the operation of the mobile cleaning unit 110. This particular embodiment is not intended to limit the present disclosure, but is for illustrative purposes only.

[0075] Modifications and improvements to the embodiments of the present technology described above will be apparent to those skilled in the art. The foregoing description is intended to be exemplary only and not limiting. Accordingly, the scope of the present technology is intended to be limited only by the scope of the appended claims.

Claims

1. A maintenance cleaning system (100) for a server rack (120), the server rack (120) comprising liquid-cooled rack-mounted data processing components (120A-120M), the maintenance cleaning system (100) comprising: A cleaning unit (110), the cleaning unit (110) comprising: a first tank (110A), the first tank (110A) containing a volume of a first liquid, the first liquid comprising a cleaning agent having an acidic pH level, and the first tank (110A) being fluidly coupled to a first fluid control structure (110A1), a second tank (110B), the second tank (110B) containing a volume of a second liquid, the second liquid comprising demineralized water or pure water, and the second tank (110B) being fluidly coupled to a second fluid control structure (110B1), and a third tank (110C) containing a volume of a third liquid, the third liquid comprising permeate water treated with a corrosion inhibitor having an alkaline pH level, and the third tank (110C) being fluidly coupled to a third fluid control structure (110C1); a control module (110X), the control module (110X) being operably connected to the first fluid control structure (110A1), the second fluid control structure (110B1), and the third fluid control structure (110C1), the control module (110X) being configured to select one of the first liquid, the second liquid, or the third liquid, and to define a corresponding first operable cleaning cycle and a first cycle duration, a second operable cleaning cycle and a second cycle duration, and a third operable cleaning cycle and a third cycle duration; a forward fluid coupling portion (112) configured to supply a selected fluid to the rack-mounted processing components (120A-120M), and a return fluid coupling portion (114) configured to receive the selected fluid from the rack-mounted processing components (120A-120M); a rack unit (120) fluid inlet (122) configured to: receive the selected fluid from the forward fluid coupling portion (112) and distribute the selected fluid throughout each of the rack-mounted processing assemblies (120A-120M) for a corresponding cleaning cycle; and A rack unit (120) fluid outlet (124) is configured to receive the dispensed selected liquid from each of the rack-mounted processing components (120A-120M) during a corresponding cleaning cycle and return the dispensed selected liquid to a corresponding tank.

2. The maintenance cleaning system (100) according to claim 1, further comprising a fourth tank (110D), the fourth tank containing a certain volume of a fourth liquid, the fourth liquid comprising a certain volume of permeate water treated with a corrosion inhibitor having an alkaline pH level, and the fourth tank is fluidly connected to a fourth fluid control structure (110D1) for selection by the control module to establish a corresponding fourth cleaning cycle and a fourth cycle duration.

3. The maintenance cleaning system (100) according to claim 1 or 2, wherein: The cleaning unit (110) further comprises a pump and a water quality check (WQS) station (110Z), wherein the water quality check (WQS) station (110Z) comprises a water quality sensor to measure the liquid quality level.

4. The maintenance cleaning system (100) according to any one of claims 1 to 3, wherein: Each of the first fluid control structure (110A1), the second fluid control structure (110B1), the third fluid control structure (110C1) and the fourth fluid control structure (110D1) includes a corresponding supply liquid channel (210A1-201D1), and the supply liquid channel (210A1-201D1) includes at least one pump (PA-PD) and at least one solenoid valve (V1, V3, V5, V7), and the at least one pump (PA-PD) and at least one solenoid valve (V1, V3, V5, V7) are used to provide appropriate pressure and liquid flow to the selected liquid entering the data center rack unit (120).

5. The maintenance cleaning system (100) according to any one of claims 1 to 4, wherein: Each of the first fluid control structure (110A1), the second fluid control structure (110B1), the third fluid control structure (110C1) and the fourth fluid control structure (110D1) includes a corresponding return liquid channel (210A2-201D2), and the return liquid channel (210A2-201D2) includes at least one filter (FA-FD) and at least one heat exchanger (FHEXA-FHEXD), and the at least one filter (FA-FD) and the at least one heat exchanger (FHEXA-FHEXD) are used to re-clean and re-cool the returned selected liquid.

6. The maintenance cleaning system (100) according to any one of claims 1 to 5, wherein: The cleaning unit (110) performs a first cleaning cycle, a second cleaning cycle, a third cleaning cycle, and a fourth cleaning cycle while the data processing components (120A-120M) remain in operation.

7. The maintenance cleaning system (100) according to any one of claims 1 to 6, wherein: The cleaning unit (110) also includes a wheel assembly (102) for transportation throughout a data center.

8. The maintenance cleaning system (100) according to any one of claims 1 to 7, wherein: The control module (110X) defines a first operable cycle, the first operable cycle being configured to: selecting a cleaning agent from said first tank (110A); activating the pump (PA) of the first control structure (110A1); Opening the solenoid flow valve (V1) of the first control structure (110A1) to start the flow of cleaning agent to distribute the flow of cleaning agent throughout the rack-mounted processing components (120A-120M); allowing the dispensing flow of the acidic cleaning agent to continue for a first cycle duration t1; as well as When the first cycle duration t1 expires and / or when the WQS (110Z) determines that the return liquid from the processing components (120A-120M) meets the liquid quality level, the solenoid valve (V1) is closed and the pump (PA) of the first control structure (110A1) is deactivated to terminate the dispensing flow of the acidic cleaner.

9. The maintenance cleaning system (100) according to any one of claims 1 to 8, wherein: The control module (110X) defines a second operable cycle, the second operable cycle being configured to: selecting softened water from the second tank (110B); activating the pump (PB) of the second control structure (110B1); Opening the electromagnetic flow valve (V3) of the second control structure (110B1) to start the softened water flow to distribute the softened water flow to the entire rack-mounted processing components (120A-120M); allowing the dispensing flow of demineralized water to continue for a second cycle duration t2; as well as When the second cycle duration t2 expires and / or when the WQS (110Z) determines that the return liquid from the treatment components (120A-120M) meets the liquid quality level, the solenoid valve (V3) is closed and the pump (PB) of the second control structure (110B1) is deactivated to terminate the distribution flow of the softened water.

10. The maintenance cleaning system (100) according to any one of claims 1 to 9, wherein: The control module (110X) defines a third operable cycle, the third operable cycle being configured to: selecting the treated permeate water from the third tank (110C); activating the pump (PC) of the third control structure (110C1); Opening the electromagnetic flow valve (V5) of the third control structure (110C1) to start the treated permeate water flow to distribute the treated permeate water flow throughout the rack-mounted treatment components (120A-120M); allowing the dispensing flow of treated permeate water to continue for a third cycle duration t3; and When the third cycle duration t3 expires and / or when the WQS (110Z) determines that the return liquid from the treatment components (120A-120M) meets the liquid quality level, the solenoid valve (V5) is closed and the pump (PC) of the third control structure (110C1) is deactivated to terminate the distribution flow of the treated permeate water.

11. The maintenance cleaning system (100) according to any one of claims 1 to 10, wherein: The control module (110X) defines a fourth operational cycle, the fourth operational cycle being configured to: selecting the treated permeate water from the fourth tank (110D); activating a pump (PD) of said fourth control structure (110D1); Opening the electromagnetic flow valve (V7) of the fourth control structure (110D1) to start the treated permeate water flow to distribute the treated permeate water flow throughout the rack-mounted treatment components (120A-120M); allowing the dispensing flow of treated permeate water to continue for a fourth cycle duration t4; as well as When the fourth cycle duration t4 expires and / or when the WQS (110Z) determines that the return liquid from the treatment components (120A-120M) meets the liquid quality level, the solenoid valve (V7) is closed and the pump (PD) of the fourth control structure (110C1) is deactivated to terminate the distribution flow of the treated permeate water.

12. A maintenance method (300) for cleaning a server rack (120), the server rack (120) comprising liquid-cooled rack-mounted data processing components (120A-120M), the maintenance method (300) comprising: defining operable cleaning cycles and durations for a first liquid, a second liquid, and a third cleaning liquid, respectively, the first liquid comprising a cleaning agent having an acidic pH level, the second liquid comprising a water softener, and the third cleaning liquid comprising treated permeate water having an alkaline pH level; Conducting a preliminary test to measure the quality level of liquid returning from the server rack as detected by a water quality sensor; When it is determined that the quality level of the returned liquid does not meet the requirements, perform the following actions: selecting the first liquid and executing a first operable cleaning cycle for a first duration t1 to inject and circulate a first liquid flow throughout the treatment assembly; selecting the second liquid and executing a second operable cleaning cycle for a second duration t2 to inject and circulate a second liquid flow throughout the treatment assembly upon termination of the first operable cleaning cycle; as well as At the termination of the second operable cleaning cycle, the third liquid is selected and a third operable cleaning cycle is performed for a third duration t3 to inject and circulate a third liquid flow throughout the treatment assembly.

13. The maintenance method (300) according to claim 12, further comprising: An operable cleaning cycle and duration t4 are defined for a fourth liquid, the fourth liquid comprising treated permeate water having an alkaline pH level, and the maintenance method performs the fourth cleaning cycle upon determining that the return liquid from the server rack exhibits a quality level detected by the water quality sensor that does not meet requirements.

14. The maintenance method (300) according to claim 13, wherein: When it is determined that after the fourth cleaning cycle, the return liquid from the server rack continues to exhibit an unsatisfactory quality level detected by the water quality sensor, the first operable cleaning cycle is resumed to a fourth operable cleaning cycle.

15. The maintenance method (300) according to any one of claims 12 to 14, wherein: The liquid quality levels include: pH level, conductivity, aluminum content, copper content, zinc content, and / or aerobic microbial content.

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