A heat dissipation water pipe structure for an outlet of a remote plasma source

Abstract

The present invention discloses a heat dissipation water pipe structure for the outlet of a remote plasma source in the field of remote plasma sources. The structure comprises a multi-section variable diameter pipe, wherein the pipe is composed of at least three sections of pipes of different diameters connected in sequence, wherein the diameter of the pipe section near the outlet is larger than the diameter of the distal pipe section, and the inner diameter of the water channel of the pipe section near the outlet is smaller than the inner diameter of the water channel of the distal pipe section; the length, diameter and inner diameter of the pipe section are calculated and determined based on the plasma source input power, gas flow rate and coolant temperature rise parameters. The heat dissipation water pipe structure at the outlet balances heat dissipation efficiency and flow resistance through a variable diameter design, ensuring that heat dissipation requirements match flow pressure drop, solving the problem of free radical recombination caused by excessively high local temperature at the outlet, improving the measurement accuracy of dissociation rate, and improving heat dissipation efficiency.

Description

Technical Field

[0001] The present invention relates to the technical field of remote plasma sources, in particular to a heat dissipation water pipe structure at an air outlet of a remote plasma source. Background Art

[0002] A remote plasma source (RPS), also known as a remote high-density plasma generator, is an advanced plasma generation device commonly used in process chamber cleaning and etching processes during integrated circuit manufacturing. Its core function is to efficiently and stably ionize cleaning gases (NF3) or process gases (NH3, O2), significantly enhancing the activity of the reactant gases and process consistency. Compared to traditional plasma sources, a remote plasma source physically separates the plasma generation region and the processing area. After plasma generation, it is transported to the processing area, where active species (such as free radicals, ions, and neutral particles) diffuse during transport. This design enables the plasma to more uniformly and efficiently affect the surface of the material being processed.

[0003] The dissociation rate is a key parameter characterizing the reaction efficiency of a remote plasma source (RPS). It refers to the proportion of reactive gases that dissociate into active species (such as free radicals, mononuclear ions, polynuclear ions, and neutral atoms) in a strong electric field. A higher and more stable dissociation rate means a higher plasma density can be achieved at the same input power, thereby reducing process chamber cleaning time and improving processing efficiency and quality. Therefore, measuring the dissociation rate and its stability is crucial. As integrated circuit manufacturing advances to nodes below 3nm, plasma processes place increasingly stringent demands on the control precision of the reactive gas dissociation rate. Therefore, a complete set of equipment is required to achieve reliable control of gas flow and pressure to complete RPS dissociation rate performance testing.

[0004] However, when RPS dissociates NF3, the outlet temperature is high, and the temperature of the outlet heat dissipation pipe is uneven, resulting in unstable free radicals and affecting the accuracy of the dissociation rate test. It can be seen that the design of the outlet heat dissipation water pipe directly affects the stability and service life of the system. In remote plasma equipment, the traditional outlet heat dissipation water pipe design of traditional remote plasma has certain defects. This design is often oversimplified and fails to fully consider the huge amount of heat generated by the plasma generator under high-intensity working conditions. Traditional heat dissipation water pipes usually only dissipate heat from the outlet through a single cooling water channel. When faced with a continuously high-temperature working environment, this design often has insufficient heat dissipation efficiency, which can easily cause the plasma generator to overheat, thereby affecting its performance and life. In addition, the structural layout of traditional heat dissipation water pipes may also be unreasonable. For example, the design of the cooling water channel may fail to maximize the use of the heat dissipation area, resulting in limited heat transfer efficiency. Summary of the Invention

[0005] The present application solves the problems in the prior art of uneven temperature of the heat dissipation water pipe at the air outlet affecting the accuracy of the dissociation rate test and low heat dissipation efficiency of the heat dissipation water pipe by providing a heat dissipation water pipe structure for the air outlet of a remote plasma source, thereby improving the temperature balance and heat dissipation efficiency of the heat dissipation water pipe.

[0006] An embodiment of the present application provides a heat dissipation water pipe structure for the outlet of a remote plasma source, including a multi-section variable-diameter pipe, wherein the pipe is composed of at least three pipe sections of different diameters connected in sequence, wherein the diameter of the pipe section close to the outlet is larger than the diameter of the distal pipe section, and the inner diameter of the water channel of the pipe section close to the outlet is smaller than the inner diameter of the water channel of the distal pipe section; the length, diameter and inner diameter of the pipe section are determined by thermodynamic formula calculation based on the plasma source input power, gas flow rate and coolant temperature rise parameters.

[0007] The beneficial effects of the above embodiment are as follows: the outlet heat dissipation water pipe structure balances heat dissipation efficiency and flow resistance through a variable diameter design, ensuring that heat dissipation requirements match flow pressure drop, avoiding local boiling or insufficient cooling, and maintaining temperature stability during the plasma dissociation reaction. This outlet heat dissipation water pipe structure solves the problem of free radical recombination caused by excessively high local outlet temperatures, improves the accuracy of dissociation rate measurement, and enhances heat dissipation efficiency.

[0008] Based on the above embodiments, the present application can be further improved as follows:

[0009] In one embodiment of the present application, the length of the pipe section in section i is ,diameter And the inner diameter of the waterway l i The optimization method is:

[0010] ;

[0011] ;

[0012] ;

[0013] Among them, n is the total number of segments, L i 、D i is the current length and diameter of the i-th pipe segment, ∆P i is the pressure drop in the i-th pipe section, ρ is the coolant density, v is the cooling water flow rate, and f is the friction coefficient. Based on thermodynamic and fluid mechanics formulas, the parameters of each pipe section are precisely matched to ensure that the coolant temperature rise ΔT is ≤ 5°C, maintaining the stability of the plasma dissociation temperature and reducing the dissociation rate measurement error.

[0014] In one embodiment of the present application, the water flow rate in the multi-stage variable diameter pipe is controlled within a range of 1 to 3 m / s, and the coolant temperature rise ΔT is ≤ 5°C. By optimizing the flow rate and temperature rise limits, turbulent pressure loss and laminar heat inefficiency are prevented, ensuring heat dissipation uniformity and equipment life.

[0015] In one embodiment of the present application, an infrared thermal imager is integrated into the outer wall of the pipe section near the outlet to monitor local temperature anomalies in real time. This allows for rapid identification of local high-temperature spots caused by scaling or blockage (with an alarm when ΔT > 10°C), preventing equipment failures caused by heat dissipation failure.

[0016] In one embodiment of the present application, differential pressure sensors are installed at the water pipe inlet and outlet to monitor the flow resistance pressure drop ΔP. When ΔP exceeds a threshold, an alarm is triggered. This allows for real-time detection of abnormal pressure drops caused by scaling or blockage, allowing for timely maintenance to prevent a decrease in heat dissipation efficiency.

[0017] In one embodiment of the present application, a capacitive humidity sensor is placed near the air outlet to detect sudden changes in ambient humidity caused by micro-leaks. This allows rapid location of leaks based on humidity anomalies (e.g., a sudden RH increase >20%), preventing production safety accidents caused by coolant leaks.

[0018] One embodiment of this application also includes an intelligent monitoring module that uses a Kalman filter algorithm to predict pipeline scaling, blockage, or leakage by fusing pressure differential, flow rate, temperature, and humidity data. This multi-source data fusion eliminates noise interference and provides early warning of scaling, blockage, or micro-leakage with high accuracy.

[0019] In one embodiment of the present application, the multi-section variable diameter pipe is made of a corrosion-resistant alloy, and the inner wall is polished to a roughness of Ra ≤ 0.8 μm, thereby reducing scale adhesion and flow friction loss, thereby extending the service life of the water pipe. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following briefly describes the drawings required for the specific embodiments or the description of the prior art. Similar elements or parts are generally identified by similar reference numerals throughout the drawings. Elements or parts in the drawings are not necessarily drawn to scale.

[0021] Figure 1 This is a front view schematic diagram of a dissociation rate testing device for a remote plasma source according to an embodiment of the present application;

[0022] Figure 2 This is a schematic diagram of the three-dimensional structure of a remote plasma source dissociation rate testing device in an embodiment of the present application;

[0023] Figure 3Schematic diagram of the relationship between the components of the dissociation rate acquisition process in the embodiment of the present application;

[0024] Figure 4 This is a functional diagram of the RPS control test platform display screen in an embodiment of the present application;

[0025] Figure 5 This is a flow chart of the method for obtaining the dissociation rate in the embodiments of the present application;

[0026] Figure 6 This is a schematic structural diagram of the tail gas treatment equipment in the embodiment of the present application;

[0027] Figure 7 This is a connection diagram of the control module of the exhaust gas treatment equipment in the embodiment of the present application;

[0028] Figure 8 This is a working diagram of the exhaust gas treatment device in the embodiment of the present application;

[0029] Figure 9 Schematic diagram of the traditional structure of the outlet water cooling pipe, where 9 (a) is the internal structure diagram and 9 (b) is the external structure diagram;

[0030] Figure 10 10(a) is a schematic diagram of the internal structure of the water-cooling pipe in the embodiment of the present application, and 10(b) is a schematic diagram of the external structure;

[0031] Figure 11 This is a flowchart of a method for diagnosing a fault in a water pipe at an outlet of a remote plasma source according to an embodiment of the present application;

[0032] Figure 12 Flowchart for evaluating the importance of scaling, clogging and micro-leakage in relation to process parameters;

[0033] Figure 13 Flowchart constructed for decision tree evaluation of importance relationships;

[0034] Figure 14 Schematic diagram of the ranking of the importance of scaling, blockage and micro leakage to process parameters.

[0035] Among them, 100-remote plasma source; 101-air inlet; 102-equipment status display screen; 103-water cooling pipe; 1031-cooling water channel; 104-etching test platform; 105-etching observation window; 106-RPS water inlet and outlet; 107-gas pressure gauge; 108-sampling gas pressure gauge; 200-gas ionization detection device; 201-Fourier transform infrared spectrometer; 202-ionized gas sample collection pipeline; 203-spectrometer exhaust gas output pipeline; 300-RPS control test platform; 301-test platform display screen; 302-test platform status operation indicator light; 400-host computer system; 500-vacuum pump; 501-exhaust gas transmission pipeline; 600-exhaust gas treatment equipment; 601-exhaust gas treatment equipment air inlet; 602-exhaust gas treatment equipment outlet. DETAILED DESCRIPTION

[0036] The present invention will be further explained below in conjunction with specific embodiments. It should be understood that these embodiments are only used to illustrate the present invention and are not used to limit the scope of the present invention. After reading the present invention, modifications of various equivalent forms of the present invention made by those skilled in the art all fall within the scope defined by the claims attached to this application.

[0037] It should be noted that similar numbers and letters represent similar items in the following figures. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. In the description of the present invention, it should also be noted that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be a communication between the two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0038] Example 1 of the present application solves the problem of inconvenience in testing the dissociation rate of RPS in the prior art by providing a remote plasma source dissociation rate testing device, thereby conveniently and accurately testing the dissociation rate of RPS.

[0039] Example 2 of the present application solves the problem of inconvenient exhaust gas treatment after RPS dissociation rate test in the prior art by providing an electrothermal adsorption exhaust gas treatment device for RPS dissociation rate test, thereby efficiently treating the remaining gas after the RPS dissociation rate test.

[0040] Example 3 of the present application solves the problem in the prior art that the accuracy of the dissociation rate test is affected by the uneven temperature of the heat dissipation water pipe at the air outlet and the heat dissipation efficiency of the heat dissipation water pipe is low by providing a heat dissipation water pipe structure for the air outlet of a remote plasma source, thereby improving the temperature balance and heat dissipation efficiency of the heat dissipation water pipe.

[0041] Example 4 of the present application solves the problem of lack of fault monitoring of the outlet heat dissipation water pipe in the prior art by providing a method for diagnosing the outlet water pipe fault of a remote plasma source, thereby achieving accurate identification of scaling, blockage and leakage faults.

[0042] Example 1:

[0043] like Figure 1-3 As shown, a remote plasma source dissociation rate test device includes a remote plasma source 100, a gas ionization detection device 200, a Fourier transform infrared spectrometer 201, an RPS control test station 300, a host computer system 400, and an exhaust gas treatment device 600 ( Figure 2 (omitted in the middle);

[0044] The remote plasma source 100 is used to dissociate process gases and perform processes such as thin film deposition and cleaning under vacuum conditions; the remote plasma source 100 includes a dissociation chamber, an air inlet 101, an air outlet, and an RPS water inlet and outlet 106; the air outlet is connected to the etching test platform 104 through an air outlet water cooling pipe 103; the etching test platform 104 is provided with an etching observation window 105, and the etching test platform 104 is provided with a gas pressure gauge 107; the RPS water inlet and outlet 106 is controlled by the RPS control test platform 300 to control the water flow of cooling water; the etching test platform 104 is used to perform thin film etching on materials such as silicon wafers and wafers; the gas pressure gauge 107 is used to monitor the internal pressure of the etching test platform 104, and the RPS test platform is regulated; the remote plasma source 100 is also provided with a device status display screen 102, which is used to observe the set operating status, such as power, voltage, current and other information.

[0045] The gas ionization detection device 200 includes a gas dissociation circuit control device (maintaining gas input control module) for maintaining gas input, which is connected to the dissociation chamber of the remote plasma source 100 and is used to control the amount of maintaining gas input into the dissociation chamber; the gas ionization detection device 200 is also provided with a sampling gas pressure gauge 108 to ensure an ultra-low pressure test environment of 100 mTorr and ensure the accuracy of the residual gas amount collection; the gas ionization detection device 200 also includes an output detection unit, which is connected to the dissociation chamber through an ionized gas sample collection pipeline 202 and is used to detect the amount of maintaining gas remaining in the gas of the dissociation chamber; the gas ionization detection device 200 also includes an output calculation unit, which is connected to the gas dissociation circuit control device for maintaining gas input and the output detection unit, and is used to calculate the ionization rate based on the amount of maintaining gas input into the dissociation chamber and the amount of maintaining gas remaining in the gas output from the dissociation chamber.

[0046] The gas ionization detection device 200 detects the amount M of residual gas in the gas of the dissociation chamber and the amount N of input maintenance gas respectively, and the dissociation rate is 1-M / N. In the remote plasma engineering process, nitrogen trifluoride NF3 is used as a process gas and decomposes into nitrogen and fluorine atoms when it is ionized by plasma. The fluorine atoms etch the thin film of the silicon wafer. When the amount M of the residual NF3 gas is less than the residual gas threshold, it means that the NF3 waste gas is sufficiently small, and NF3 is toxic. Only then can the etching test table 104 be opened to remove the silicon wafer, and the heating furnace of the exhaust gas treatment device also stops working at this time to increase power application efficiency. When the amount M of the residual NF3 gas is greater than or equal to the residual gas threshold, it means that the process gas ionization process has not yet ended and the silicon wafer continues to be etched. The heating furnace of the exhaust gas treatment device also needs to be kept working.

[0047] The Fourier transform infrared spectrometer 201 is used to collect infrared spectrum data of the remaining maintenance gas. The spectrometer is connected to the etching test table 104 through the ionized gas sample collection pipeline 202 to sample the spectrum data of the remaining maintenance gas in the dissociation chamber; it is connected to the exhaust gas transmission pipeline through the spectrometer exhaust output pipeline 203, and is output to the exhaust gas treatment device by the vacuum pump 500.

[0048] The RPS control test station 300 is equipped with a gas flow meter, a pressure gauge, a water flow meter, a test station display screen 301, and a test station status indicator 302. The gas flow meter, pressure gauge, and water flow meter are used to detect the inlet gas flow rate, chamber pressure, and cooling water flow rate of the remote plasma source 100. The RPS control test station 300 is used to control the process gas flow rate, vacuum pressure, water cooling system, etc. of the remote plasma source 100, including displaying parameters such as the equipment's operating status, power, voltage and current, as well as recording fault information and modifying process parameters. The gas flow meter controls the gas flow entering the RPS and cooperates with the vacuum pump 500 to achieve different RPS power outputs, simulating actual operating conditions.

[0049] Among them, the function diagram on the RPS test station display screen 301 is as follows Figure 4 As shown, the test platform control module includes a process gas module, a vacuum pressure module, a water cooling module, a parameter display module, a fault information recording module and a process parameter module; the process gas module can control the flow of input gas and read it in real time, and cooperate with the vacuum pump 500 to achieve different power outputs of the RPS to simulate actual operating conditions; the vacuum pressure module can control the pressure in the RPS cavity and the Fourier infrared spectrometer 201 by setting the pressure value and read it in real time; the water cooling module provides water cooling for the plasma source, and can control the inlet and outlet water flow and read it in real time;

[0050] The parameter display module can read the actual power value, bus current and voltage in the RPS, and the operating status of the equipment. First, turn on the power switch, introduce process gas, and set the power value. Then determine whether the "Initialization Status (Ready)" and "Power Input (AC OK)" signal lights are permanently on. "Initialization Status (Ready)" indicates that the equipment is in the normal initialization state; "Power Input (AC OK)" indicates that the power input is within the allowable range. Then, press the ignition switch. "Ignition Status (Plasma ON)" indicates that the equipment has successfully ignited or the equipment is processing process gas. Otherwise, it means that the equipment has not ignited or the ignition has failed. "Equipment Alarm (Fault)" is permanently on when the equipment is in alarm. Otherwise, the equipment is in alarm.

[0051] The fault information record module allows users to view faults reported by the device, including the time the fault occurred, the type of fault, and the number of times the current fault type has occurred. Fault types include overtemperature alarm (OT), overpower alarm (OP), abnormal input voltage (ACV), output current drop (LC), output current limit exceeded (OC), and water leak alarm (Water Leak). The process parameter module allows users to select the ignition process or the burn-in process to test the RPS.

[0052] The detection device is also designed with a real-time monitoring function, which provides instant feedback on the plasma dissociation state. This real-time monitoring allows for timely adjustments to the plasma source operating conditions to ensure the stability and consistency of the production process.

[0053] The host computer system 400 is used to perform dissociation rate detection steps such as preprocessing, feature extraction, and pattern recognition on Fourier transform infrared spectroscopy data.

[0054] The tail gas treatment equipment 600 is a system for treating various process waste gases on site. It is provided with a tail gas treatment equipment air inlet 601 and a tail gas treatment equipment air inlet 602. The tail gas treatment equipment air inlet 601 is connected to the outlet of the vacuum pump 500 through a pipeline, and the inlet of the vacuum pump 500 is connected to the dissociation chamber through the tail gas transmission pipeline 501. The vacuum pump 500 ensures a low-pressure environment in the reaction chamber. Under low pressure, the collision between gas molecules is reduced, so that the gas molecules can be more effectively excited during the plasma treatment process; it also promotes the stable generation and maintenance of plasma, and removes waste gas pollutants and enters the tail gas treatment equipment 600.

[0055] Among them, such as Figure 5 As shown, the dissociation rate detection method in this embodiment adopts the traditional method, such as

[0056] S1, using the Fourier infrared spectrometer 201 to collect near-infrared spectra of the remote plasma source 100 at different dissociation rates; the gas ionization detection device 200 respectively detects the amount M of the remaining gas in the dissociation chamber and the amount N of the input maintenance gas, and the dissociation rate is 1-M / N;

[0057] S2. Using near-infrared spectral data of different dissociation rates to establish a remote plasma source 100 ionization rate dataset;

[0058] S3. Using the same near-infrared spectrum acquisition conditions, sample the near-infrared spectrum of the plasma source to be tested, compare the measured characteristic spectrum peak with the ionization data set, and determine the current residual gas (NF3) concentration. The dissociation rate is 1-residual gas (NF3) concentration.

[0059] This device utilizes infrared mass spectrometry technology to achieve high-precision and high-sensitivity measurements of various active particles in the plasma, accurately calculating dissociation rates and providing reliable data for plasma source performance evaluation. By applying near-infrared spectral data of different dissociation rates at different pressures, flow rates, and temperatures, an ionization rate dataset is established. Characteristic spectral peaks are identified based on the amount of residual NF3 gas detected and compared with the ionization rate dataset, enabling real-time monitoring of gas dissociation rates at varying pressures, flow rates, and temperatures.

[0060] This test device integrates an automated control system, infrared mass spectrometry, and an RPS exhaust treatment system. By coordinating the operation of various functional modules through the automated control system, it can automatically complete the testing of RPS-related technical indicators. This device enables reliable testing of the RPS dissociation rate while also simulating actual RPS operating conditions, eliminating the need for RPS testing on actual integrated circuit production terminal equipment. This reduces costs and shortens the cycle time. This test device enables full-process monitoring and closed-loop control of the plasma source's operating status, improving dissociation rate detection accuracy and process stability.

[0061] Example 2:

[0062] like Figure 6-7 The device, shown in Figure 1, uses an electrothermal adsorption-type exhaust gas treatment system for a remote plasma source dissociation rate test device. The device includes a control system and a gas content detection system, followed by a heating system, a water vapor injection system, a cooling system, and an adsorption system (neutralization tower). A particle collection tank is located at the outlet of the water vapor injection system to collect solid particles (such as CaF2 precipitates) generated during the reaction, preventing pipe blockage and extending the device's service life. A heat exchanger is located between the outlet of the water vapor injection system and the inlet of the heating system to recover exhaust waste heat to preheat the intake gas. This waste heat recovery raises the intake temperature to 300°C, reducing heating system energy consumption. The inlet of the heating system is connected to the vacuum pump of the remote plasma source dissociation rate test device.

[0063] The heating system utilizes three coaxial, nested nickel-based alloy reaction tubes (Inconel 600), with each section length ratio at a 1:2:1 ratio (corresponding to the preheating section, main decomposition section, and deep cracking section). The temperature gradient is 500°C (preheating section) → 800°C (main decomposition section) → 1000°C (deep cracking section). The inner wall is sprayed with a 200 μm-thick Al2O3 ceramic layer (purity ≥ 99.5%) to resist fluorine gas corrosion. Each section is wrapped with a high-frequency induction coil (8 mm copper tube diameter, 5 mm turn spacing). The output power (0-20 kW) is controlled by an independent variable-frequency power supply (50-100 kHz), enabling precise regulation of the temperature gradient.

[0064] High-frequency induction heating technology is used: electromagnetic eddy current effect is used to directly heat the reaction tube wall, with a heating rate of 50°C / s, which saves 30% energy compared to traditional electric heating.

[0065] The steam injection system consists of a steam injection ring (316L stainless steel, 0.5 mm orifice) installed at the outlet of the deep pyrolysis section. The injection rate of ultrapure water vapor is controlled by a mass flow meter (MFC), dynamically matching the molar ratio of water vapor to NF3 (ranging from 0.8:1 to 1.2:1). This dynamic adjustment of the water vapor to NF3 molar ratio (0.8:1 to 1.2:1) ensures sufficient conversion of F2 to HF and reduces the risk of secondary contamination from byproducts. NF3 decomposition requires high-temperature pyrolysis or catalytic hydrolysis, the chemical equation of which is generally: 2NF3 + 3H2O → 6HF + NO + NO2. Water vapor acts as a hydrolysis medium in this reaction, providing hydroxyl groups (-OH groups) to accelerate the cleavage of NF3 bonds. Insufficient water vapor, meaning a molar ratio below 0.8:1, may prevent complete NF3 decomposition, with residual NF3 being emitted as toxic gases. Excessive water vapor, exceeding 1.2:1, can dilute the reaction system, reducing reaction efficiency and even inhibiting the decomposition reaction due to a localized temperature drop.

[0066] The cooling system is used to cool the mixed gas. The temperature drop is determined by the pipe length and water flow rate, and is generally reduced to 500±50℃.

[0067] The adsorption system is a two-stage series neutralization absorption tower. The first tower is filled with Ca(OH)2 particles (particle size 3-5mm) for initial HF adsorption. The second tower is equipped with a circulating spray system with pH feedback (Ca(OH)2 solution concentration 10 wt%) and a spray rate of 5 L / min. The Ca(OH)2 solution is circulated and sprayed to fix the HF as a CaF2 precipitate, achieving a fluorine content in the tail gas of less than 1ppm.

[0068] The gas content detection system includes several NF3 detectors and electrochemical HF sensors. The control system controls these systems according to a set program. By monitoring NF3 and HF concentrations in real time, the heating power and steam flow rate are dynamically adjusted to ensure that the exhaust gas treatment meets the standards (NF3 decomposition rate >99%, HF <1 ppm) and adapts to high-concentration shock load conditions.

[0069] The exhaust gas treatment equipment in Example 1 utilizes the aforementioned electrothermal adsorption exhaust gas treatment equipment, including thermal oxidation decomposition and chemical adsorption processes. The exhaust gas generated by the process is subjected to high-temperature decomposition in a heating system, followed by dry adsorption treatment before being discharged to the facility's exhaust system. The high-temperature system (400-1200°C) generated by the heating furnace decomposes and oxidizes the undissociated NF3 gas from the preceding equipment, converting the toxic gas into harmless reactants. After cooling through a cooling system, the active chemical adsorption system then undergoes active chemical adsorption or reaction to form deposited substances, achieving complete absorption of the toxic and corrosive gases. The treated harmless gas then enters the facility's exhaust system.

[0070] like Figure 8 As shown, this embodiment also provides a work flow chart of an electrothermal adsorption tail gas treatment device, the main process is as follows:

[0071] S1. Heating system: It uses three sections of independently temperature-controlled nickel-based alloy reaction tubes (lined with ALO and ceramic coating to prevent oxidation of fluorine atoms F and reduce their service life). The temperature gradient is 500℃ (preheating section) → 800℃ (main decomposition section) → 1000℃ (deep cracking section), ensuring that NF is decomposed into NF3 and F2 step by step, thereby improving the decomposition efficiency of NF3.

[0072] Among them, the three independent temperature control sections are equipped with NF3 detectors, and the input gas NF3 concentration n vol%, flow rate lm is detected during the preheating stage. 3 / h, if the concentration n is less than the first concentration threshold N1, and the flow rate l is less than the flow rate threshold L, the preheating section sets the heating furnace temperature to 500℃ (heating rate 30℃ / s, power 8 kW). (2) Main decomposition section: 800℃ (constant temperature accuracy ±5℃, power 15 kW), when the NF3 concentration is less than the second concentration threshold N2, it enters the deep cracking stage, otherwise it continues heating. (3) Deep cracking section: 1000℃ (power 18 kW, residence time ≥2 s), when the NF3 concentration is less than the third concentration threshold N3, it enters the water vapor injection system;

[0073] When the input gas NF3 concentration n vol% is detected during the preheating phase, the flow rate lm 3 / h, if the concentration n is greater than or equal to the first concentration threshold N1, that is, the heating system detects an increase in concentration within 0.5 s, the system automatically adjusts, raising the temperature of the main decomposition section to 850℃ and increasing the power to 20 kW. And when the NF3 gas flow rate l is greater than or equal to the flow threshold L, the inlet gas valve reduces the inlet flow rate by 15%, extending the residence time in the preheating stage; when the NF3 concentration is less than the second concentration threshold N2, it enters the deep cracking stage, otherwise it continues heating. Deep cracking stage: 1000℃ (power 18 kW, residence time ≥2 s), when the NF3 concentration is less than the third concentration threshold N3, it enters the water vapor injection system; and the water vapor flow rate is simultaneously increased to km 3 / h (molar ratio 1.05:1).

[0074] S2, in-situ neutralization system:

[0075] When the input gas NF3 concentration n vol% is detected during the preheating phase, the flow rate is l km 3 / h, if the concentration n is greater than or equal to the first concentration threshold N1 or when the NF3 gas flow rate 1 is greater than or equal to the flow threshold L, the water vapor injection system needs to synchronously increase the water vapor flow rate km 3 / h.

[0076] Water vapor injection system: Ultrapure water vapor (flow rate to NF3 molar ratio 1:1) is injected at the end of the reactor to convert F2 into HF gas. The reaction formula is: 2F2+2H2O→4HF+O2.

[0077] The multi-stage alkaline adsorption system utilizes a two-stage cascade neutralization absorption tower design. The first tower is filled with Ca(OH)2 granules (particle size 3-5 mm) for initial HF adsorption. The second tower is equipped with a circulating spray system (Ca(OH)2 solution concentration 10 wt%) with pH feedback and a spray rate of 5 L / min. The spray liquid pH is monitored in real time and the Ca(OH)2 solution concentration (10 wt%) is adjusted to ensure HF neutralization efficiency (HF concentration in the exhaust gas <1 ppm) while preventing adsorption tower fouling. The Ca(OH)2 solution is circulated and sprayed to fix the HF as a CaF2 precipitate, achieving an exhaust fluorine content of <1 ppm. When the NF3 concentration in the adsorption system is monitored by an NF3 detector and falls below the fourth concentration threshold, N4, it is discharged into the plant service system. Otherwise, an air pump recirculates the NF3 into the multi-stage alkaline adsorption system. Since when NO and NO# are mixed in a 1:1 ratio, they can be absorbed by calcium hydroxide solution to generate calcium nitrite and water, and nitrogen dioxide can directly react with calcium hydroxide to generate calcium nitrate and calcium nitrite, the nitrogen oxides in the exhaust gas can be treated together with the Ca(OH)2 solution.

[0078] S3. Waste heat recovery and intelligent control:

[0079] The heat exchanger conducts countercurrent heat exchange between the 1000°C tail gas and the intake air, raising the NF3 intake temperature from 25°C to 300±10°C. Recovering the waste heat from the 1000°C tail gas through the heat exchanger and preheating the intake air to 300°C can reduce energy consumption.

[0080] Dynamic control is performed using gas sensors (NF3 detector + electrochemical HF sensor): The NF3 concentration is monitored in real time by the gas sensor, and the heating power and intake gas flow rate are adaptively adjusted to ensure a stable decomposition rate.

[0081] Example 1 of the working scenario of the above-mentioned electric adsorption exhaust gas treatment equipment: Standard working condition treatment:

[0082] A. Operating parameters: Input gas: NF3 concentration 10 vol%, flow rate 12 m 3 / h, O2 as carrier gas (accounting for 90%).

[0083] Temperature control: (1) Preheating section: 500°C (heating rate 30°C / s, power 8 kW). (2) Main decomposition section: 800°C (constant temperature accuracy ±5°C, power 15 kW). (3) Deep cracking section: 1000°C (power 18 kW, residence time ≥ 2 s).

[0084] B. Neutralization system: water vapor flow rate 6 m 3 / h, and the spraying rate of Ca(OH)2 solution is 8 L / min.

[0085] C. Performance results: (1) Decomposition efficiency: NF3 decomposition rate 99.7% (residual NF3 concentration <50ppm by FTIR spectroscopy analysis). (2) By-product control: F2 conversion rate >99.9%, HF concentration in tail gas <0.5ppm (in compliance with GB16297-1996 standard). (3) The purity of CaF2 precipitate at the outlet of the secondary absorption tower is ≥98%, which can be directly recycled as industrial raw material. (4) Energy consumption index: comprehensive power consumption 1.2 kWh / m 3 NF3 saves 52% energy compared to traditional incineration methods.

[0086] Working scenario example 2 of the above-mentioned electric adsorption tail gas treatment equipment: high concentration NF3 shock load treatment:

[0087] A. Operation parameters: Input gas: NF3 concentration 30vol%, flow rate suddenly increased to 20m 3 / h (simulating abnormal process conditions).

[0088] B. Dynamic response: The heating system detects the concentration increase within 0.5s and automatically adjusts: the main decomposition section temperature is increased to 850℃, the power is increased to 20kW, and the steam flow rate is increased to 10m 3 / h (molar ratio 1.05:1). Reduce the inlet flow rate by 15% and extend the residence time to 3s.

[0089] C. Performance Results: (1) Decomposition Efficiency: NF3 decomposition rate 99.6%, no F2 leakage (sensor alarm threshold 0.1 ppm). (2) System Stability: Temperature fluctuation <±10℃, neutralization tower pH value maintained at 8.5-9.0 (avoiding Ca(OH)2 scaling).

[0090] The key process verification data of Examples 1 and 2 of the above working scenarios are shown in Table 1 below:

[0091]

[0092] Special situation handling:

[0093] The electrothermal adsorption exhaust gas treatment equipment also includes an emergency pressure relief valve located between the heating system's air inlet and the adsorption system's inlet. When the air inlet pressure increases, the emergency pressure relief valve opens, allowing the exhaust gas to bypass the adsorption tank to prevent back-end pressure buildup.

[0094] The tail gas treatment device achieves the step-by-step decomposition of NF3 through segmented heating, and combines a multi-stage adsorption system to efficiently neutralize harmful gases (such as HF), effectively removing harmful substances in the tail gas and reducing environmental pollution. Its principle is as follows:

[0095] Preheating: Gradually raises the exhaust gas temperature to the initial reaction temperature to prevent uneven reaction or partial incomplete decomposition due to sudden high temperatures. Preheating also reduces damage to equipment caused by thermal stress.

[0096] The main decomposition stage: The temperature rises to the optimal decomposition temperature of 800°C. At this temperature, the chemical bonds of NF3, namely NF bonds, are more easily broken, and N2 and F2 are generated through thermal decomposition or catalytic reactions, or further converted into stable products such as HF. This stage ensures that most NF3 is quickly decomposed.

[0097] Deep cracking section: maintain or slightly exceed the temperature of the main reaction zone at 1000℃, extend the residence time to completely decompose the residual NF3, prevent the by-products from recombining, and inhibit the reverse reaction of F2.

[0098] NF3 decomposition is an endothermic reaction, and high temperature is conducive to the thermodynamic equilibrium moving towards the product direction. However, maintaining high temperature throughout the process will significantly increase energy consumption. And a single high temperature may lead to side reactions, such as the generation of NO x or other fluorides. Staged temperature control optimizes the reaction path, ensuring that NF3 decomposes preferentially into target products, such as N2 and F2 / HF, while minimizing harmful byproducts. Through three-stage temperature gradient control, the furnace achieves precise control of the NF3 decomposition process, balancing reaction rate, thoroughness, and energy efficiency. Ultimately, the NF3 decomposition rate is increased to over 99.5%, effectively reducing emissions of this potent greenhouse gas.

[0099] Example 3:

[0100] Figure 9 The traditional structure diagram of the air outlet water cooling pipe is shown. Figure 9 Where L is the water pipe length, l is the inner diameter of the cooling water channel, d is the inner diameter of the water pipe, and D is the outer diameter of the water pipe. Increasing the length of the cooling water pipe may mean longer cooling time, resulting in lower temperatures in the plasma region. If the temperature is too low, the dissociation reaction may be hindered, and the dissociation rate may drop by 20%-30%, because the gas dissociation process requires high temperatures with sufficient energy. Conversely, if the water pipe is too short, insufficient cooling, or the temperature is too high, it may cause equipment damage or reaction runaway, interfering with the stability of the dissociation reaction.

[0101] Larger diameter water pipes allow for greater water flow, improving cooling efficiency and removing heat more quickly to lower temperatures. However, an excessively large diameter can reduce flow velocity, impacting turbulence and, consequently, reducing heat transfer efficiency. Conversely, a smaller diameter, while increasing flow velocity, can result in excessive pressure drop, increasing pump load, and even potentially resulting in poor cooling performance due to insufficient flow.

[0102] In remote plasma testing systems, the design of the outlet water cooling pipe directly affects the stability of the plasma temperature and free radical distribution, which in turn affects the accuracy of dissociation rate measurements. Too short a pipe can lead to insufficient heat dissipation, resulting in increased outlet temperature, accelerated free radical recombination, and low dissociation rate measurements. Too long a pipe increases the flow resistance pressure drop ΔP, requiring higher pump power. It can also cause localized boiling due to excessive coolant temperature rise, disrupting temperature uniformity.

[0103] Figure 10 The optimized structure of the outlet water-cooling pipe 103 of a remote plasma source dissociation rate test device provided in this embodiment is shown. The outlet water-cooling pipe structure is improved and divided into multiple sections with gradually decreasing diameters. Each section has its own pipe length L, pipe diameter D, and inner diameter l of the cooling water channel 1031. Specifically,

[0104] S1: Determine the heat dissipation requirements of the water-cooling pipes through thermodynamic calculations to avoid interference of local temperature fluctuations on the plasma dissociation state.

[0105] Calculate the heat load at the plasma outlet based on the plasma source power, gas flow rate, and gas type (e.g., NF3 / Ar mixture). Q . Heat load formula: Q = P · η ,in P is the input power, η is the energy conversion efficiency. Temperature change It can be further calculated from the gas parameters: ; Where m is the mass flow rate of gas flow, C m The constant pressure specific heat capacity of the mixed gas is determined by the gas type and mixing ratio. Select deionized water or ethylene glycol solution as the coolant and set the flow rate. V (L / min) and cooling water temperature rise T in , usually control the water outlet and water inlet temperature rise between 10 ~ 20 ℃ to avoid vaporization or affect the heat dissipation efficiency; ensure the coolant temperature rise Δ T Controlled within a reasonable range, where Δ T ≤5℃. Flow rate can be expressed as ,in ρ is the coolant density, where C p is the specific heat capacity of water (about 4186 J / (kg·℃)).

[0106] S2: By controlling the length of the pipe, the heat dissipation efficiency and flow resistance are balanced to avoid the interference of temperature gradient on the dissociation rate measurement.

[0107] Pipe length L 、k is the thermal conductivity of the pipe material, K is the proportional coefficient, K is an empirical constant, usually 0.8-1.2, then the outlet cooling pipe length can be expressed as:

[0108] (1);

[0109] The length L of the air outlet cooling pipe can be obtained by calculating the lengths L1, L2, L3 of the first, second and nth sections of the water pipe. n Indicates that:

[0110] (2);

[0111] S3: Optimize the design by adjusting the length L or diameter D within the allowable ΔP range. If the pressure loss is too high, increase the pipe diameter or shorten the length.

[0112] The target water flow velocity v is controlled between 1 and 3 m / s to avoid excessive turbulence that causes high pressure loss or laminar flow that causes poor heat dissipation in the water pipe. , the water pipe diameter is preliminarily deduced:

[0113] (3);

[0114] Among them, D1, D2, D n Represents the diameter of the first, second, and nth sections of the water pipe; Q1, Q2, Q n represents the heat load of the plasma outlet in the first, second, and nth sections of the water pipe;

[0115] The relationship between the water pipe length L and the pressure drop ΔP can be used to optimize the calculation of the length of each section of the water pipe. According to the Darcy-Weisbach formula:

[0116] (4);

[0117] in, f is the friction coefficient, f It is related to the Reynolds number Re and the roughness of the pipe wall. When water is at 20°C, the relationship is .

[0118] If the relationship Re<2000Re<2000 exists in laminar flow, then f =64 / Re; the inner diameter of the i-th waterway can be expressed as:

[0119] (5);

[0120] If P is greater than the first pressure drop threshold P1 for setting the flow resistance, that is, the pressure loss ΔP at this time is too high, it is necessary to increase the pipe diameter or shorten the length to optimize the current i-th section of the water pipe; the following formula can be derived from formula (4):

[0121] (6);

[0122] Then, the diameter and length of the water pipe after optimization design are expressed as formula (7) and formula (8):

[0123] (7);

[0124] (8);

[0125] Based on thermodynamics and fluid mechanics formulas, the parameters of each section of the pipeline are accurately matched to ensure that the coolant temperature rise ΔT is ≤ 5°C, maintain the stability of the plasma dissociation temperature, and reduce the dissociation rate measurement error.

[0126] The temperature of the remote plasma outlet is the highest, and the temperature decreases as it moves away from the outlet. After the design, the water pipe is designed to increase the water pipe diameter D and reduce the water channel inner diameter l near the outlet to increase the water channel density to solve the problem of excessively high outlet temperature; Figure 9 Compared with the traditional water pipe design, this embodiment adopts the water cooling temperature gradient adjustment method, designs the appropriate length L, diameter D and water channel inner diameter l according to different water pipe sections, and improves the heat dissipation efficiency of remote plasma water cooling.

[0127] The outlet heat dissipation water pipe structure balances heat dissipation efficiency and flow resistance through a variable diameter design, ensuring that heat dissipation requirements match flow pressure drop, avoiding local boiling or insufficient cooling, and maintaining temperature stability in the plasma dissociation reaction. This outlet heat dissipation water pipe structure solves the problem of free radical recombination caused by localized excessive temperature at the outlet, improving the accuracy of dissociation rate measurements and enhancing heat dissipation efficiency.

[0128] To verify the heat dissipation efficiency of the remote plasma source cooling system design, multiple sets of control experiments are needed to quantify the effect of different water channel parameters on temperature gradient control;

[0129] Example 1 is a three-section cooling water pipe design. The variable parameters are set as follows: the inner diameter of the cooling water pipe is 4.2 cm, the total length of the cooling water pipe is L 20.0cm; outlet diameter D 1 is 12.3cm, length L 1=8.2cm, inner diameter of the first section of water channel l 1 is 1.5cm; the diameter of the middle part D 2 is 8.3cm, length L 2=6.7cm, inner diameter of the second water channel l 2 is 2.0cm; the diameter of the end section D 3 is 6.0cm, length L 3=5.1cm, inner diameter of the third water channell 3 is 2.5cm;

[0130] Example 2 is a 5-section cooling water pipe design. The variable parameters are set as follows: the inner diameter of the cooling water pipe is 4.2 cm, the total length of the cooling water pipe is L 20cm; outlet diameter D 1 is 15.2cm, length L 1=6.0cm, inner diameter of the first water channel l 1 is 1.0cm; the diameter of the second section of the water pipe D 2 is 12.1cm, length L 2=5.0cm, inner diameter of the second water channel l 2 is 1.2cm; the diameter of the middle part D 3 is 10.0cm, length L 3=4.0cm, inner diameter of the third water channel l 3 is 1.5cm; the diameter of the fourth section of the water pipe D 4 is 8.1cm, length L 4=3.0cm, inner diameter of the fourth waterway l 4 is 1.7cm; the diameter of the end section D 5 is 6.0cm, length L 5=2.0cm, inner diameter of the fifth waterway l 5 is 2.0cm;

[0131] The control group is a traditional cooling water pipe, and its variable parameters are: inner diameter of cooling water pipe d 4.2cm outer diameter D is 6.1cm, and the total length of the cooling water pipe L is 20.0 cm, and the inner diameter l of the cooling water channel is 2.5 cm;

[0132] The remote plasma source was preheated to a steady state at full power and maintained for 10 minutes before the ignition was turned off. The cooling water circulation was started and the water flow rate was maintained at 5 L / min. After 30 seconds, the remote plasma source outlet temperature, mid-section temperature, and cooling water outlet temperature were recorded using an infrared thermal imager. The experiment was repeated three times and the average values were taken, as shown in Table 2 below.

[0133]

[0134] Compared with Example 1, Example 2 shows that the five-segment gradient water channel, through its refined segmented design, outperforms the three-segment gradient water channel in temperature control at the outlet, midsection, and end. The addition of two high-density water channels at the outlet reduces local thermal resistance, resulting in a significant temperature drop. The segmented refinement of the five-segment water channel gradient cooling structure results in a flatter temperature gradient in the midsection. At the end of the water channel, the five-segment water channel gradient cooling structure uses a longer cooling section, reducing residual heat accumulation and achieving higher cooling efficiency.

[0135] Compared with the traditional water pipe structure, the water pipe gradient cooling structure reduces the highest temperature zone of the outlet from 525℃ to 384℃, meeting the requirements of semiconductor process for heat load control; the water channel parameters are adjusted by gradient D 、 L 、 l , which increased the temperature drop rate from the outlet to the end by 40%, verifying the effectiveness of the temperature gradient design.

[0136] Example 4:

[0137] In a remote plasma system, scaling, blockage or micro-leakage of the outlet water pipe will directly affect the heat dissipation efficiency, the stability of gas dissociation and even cause safety accidents. This embodiment provides a method for diagnosing faults in the outlet water pipe of a remote plasma source by combining multi-physics field sensing technology, data analysis and intelligent algorithms to achieve real-time perception and early warning. Figure 11 As shown, the following steps are included:

[0138] S1: A pressure difference sensor installed at the inlet and outlet of the outlet water pipe monitors the flow resistance pressure drop ΔP in real time, and an infrared thermal imager on the outside of the outlet water pipe collects local temperature distribution data ΔT. A capacitive humidity sensor is placed near the outlet water pipe to monitor the ambient humidity change ΔR.

[0139] S2: Based on the Kalman filter algorithm, the ΔP, ΔT, and ΔR data are fused to eliminate noise interference and obtain the state estimation values ΔP(k), T(k), and R(k) of the pressure drop, temperature, and humidity;

[0140] S3: Constructing the fouling / clogging objective function M and the leakage objective function N;

[0141] The predicted mean of all decision trees is used as the final output to fit the scaling, blockage and microleakage caused by each process parameter combination, and the importance relationship between scaling, blockage and microleakage and each process parameter is evaluated;

[0142] S4: Assign the importance of each process parameter to the weighted proportions of pressure difference, flow rate, temperature, and humidity in the scaling, clogging, and microleakage objective functions M and N, respectively. When M exceeds the first threshold M1, scaling is determined; when it exceeds the second threshold M2, clogging is determined; when N exceeds the leakage threshold N1, microleakage is determined. M1 / M2 / N1 are all set values and are adjusted based on actual conditions.

[0143] The following are the key steps and technical solutions for functional design:

[0144] The water pipe scaling and blockage detection is as follows:

[0145] Scale is formed when minerals in hard water adhere to the inner wall of the water pipe under the action of high temperature and long time. Blockage is caused by the continuous accumulation of scale, which gradually reduces the flow area of the water pipe.

[0146] Install high-precision differential pressure sensors at the inlet and outlet of the water pipe with an accuracy of ±0.1% FS. Scaling or blockage will cause the local flow resistance to increase, and the pressure difference Δ P Set the initial pressure difference to P 0kPa, if Δ P Continue to rise to the first pressure difference threshold P 1kPa, it will trigger the alarm of excessive flow resistance pressure drop. It uses non-invasive flow velocity measurement to calculate water flow rate by the difference in sound wave propagation time. v , the water flow rate drops abnormally to the flow threshold v 1. If the flow rate drops from 10 L / min to 7 L / min, an abnormal flow alarm will be prompted. Install an infrared thermal imager outside the pipe wall. The scaling area will form a local high temperature point due to poor thermal conductivity. When Δ T Temperature difference >10°C can be identified when the local high temperature point is greater than the temperature threshold T 1, the over-temperature alarm is triggered.

[0147] The water pipe micro-leakage detection is as follows:

[0148] A capacitive humidity sensor is placed near the air outlet to detect abnormally high ambient humidity. The initial humidity is R 0RH, if the humidity suddenly rises to the humidity threshold R If the humidity level in the pipe exceeds 1RH, an abnormal humidity alarm is triggered. Furthermore, the pressure differential and flow rate decay rate within the pipe can also indicate, to a certain extent, whether there are micro-leakages. After shutting off the pump, a differential pressure sensor is used to monitor the pressure decay rate within the pipe. For example, a normal value is <0.1 bar / min, while a leak indicates >0.5 bar / min. Similarly, the flow rate will also decay appropriately in the event of a micro-leak, allowing for non-invasive flow rate measurement.

[0149] In order to achieve real-time perception and early warning, this embodiment integrates multi-source data such as pressure difference, flow, temperature, and humidity based on the Kalman filter algorithm to eliminate noise interference, and infers the status of the water pipe through observation data.

[0150] Kalman filtering is a two-part prediction update. It adjusts the weights of the predicted value and the observed value by updating the Kalman gain to make the result closer to the true value. The steps are as follows:

[0151] S1: System state equation:

[0152] Establish the state equation of the system, that is, describe how the current state of the system is determined by the previous state and external input. Usually this can be expressed in the form of a linear dynamic system: x ( k ) = Ax ( k- 1) + Bu ( k ) + w ( k ),in x ( k ) indicates that the system is at time k Status;

[0153] A yes n * n State transition matrix, B is the input control matrix, u ( k ) is the time k Input, w ( k ) is the system process noise. x ( k ) is the data value at the current moment, x ( k- 1) is the data value at the previous moment, which includes multi-source data such as pressure difference, flow, temperature, and humidity.

[0154] S2: Observation equation:

[0155] Establish an observation equation to describe how to obtain observation values by measuring the system, which is usually a linear relationship: y ( k ) = Hx ( k ) + v ( k ),in y ( k ) indicates the time k The observed value of H is the observation matrix, v ( k ) is the observation noise.

[0156] S3: Prediction step:

[0157] In Kalman filtering, the prediction step is first performed, using the system state equation and prior information to estimate the current state and state uncertainty of the system. The uncertainty equation is as follows:

[0158] (9);

[0159] (10);

[0160] Where, P - ( k )for k A priori estimate of the covariance matrix at time t; P - ( k -1) k Prior estimate of the covariance matrix at time -1; Q is the covariance matrix of the forecast errors.

[0161] S4: Update step:

[0162] Then, the update step is performed to compare the state predicted in the previous step with the actual observed value, and the predicted value is corrected by the Kalman gain to obtain an estimated value that is closer to the actual state.

[0163] The three update equations are as follows:

[0164] (11);

[0165] Where, R is the covariance matrix of the observation errors; K ( k )for k Kalman gain at time t;

[0166] (12);

[0167] (13);

[0168] In the formula P ( k )for k The covariance matrix of the time instant; I is the identity matrix.

[0169] S5: Continuous iteration:

[0170] Finally, the prediction and update steps are repeated continuously, and the estimation of the system state is gradually optimized over time, and finally the state estimation value Δ of pressure difference, flow, temperature, and humidity with high accuracy is obtained. P ( k ), v ( k ), T ( k ), R ( k ).

[0171] S6: Fault type judgment:

[0172] First, determine whether the system has triggered an alarm for excessive flow resistance pressure drop, abnormal flow rate, overtemperature, or abnormal humidity. If an alarm command occurs, the system needs to be shut down for inspection and fault type determination.

[0173] Establish objective functions for scaling and clogging respectively M and the objective function of leakage fault N :

[0174] The relationship between the importance of scaling and clogging fault characteristics and various process parameters is as follows:

[0175] 1) Pressure differential (λ1): Scaling or blockage can cause mineral accumulation on the inner wall of the pipe, increasing flow resistance and thus increasing the pressure differential of the system. Since the pressure differential reflects the resistance to gas flow in the system, the increase in flow resistance caused by scaling will directly increase the pressure differential;

[0176] 2) Flow rate (λ2): Scaling or blockage affects the flow path, reducing the effective flow area of the pipeline, resulting in a decrease in gas flow rate;

[0177] 3) Temperature (λ3): Reduced flow due to scaling or blockage can lead to poor heat dissipation and cause local temperature increases;

[0178] 4) Humidity (λ4): The humidity sensor is installed at the RPS outlet and does not reflect the effects of scaling and clogging; then:

[0179] (14);

[0180] The relationship between the importance of micro-leakage fault characteristics and various process parameters is as follows:

[0181] 1) Pressure difference (λ1): When a small leak occurs in a water pipe, the leak will cause the pressure difference before and after the leak point to increase;

[0182] 2) Flow rate (λ2): Micro-leakage will reduce the flow rate in the water pipe, resulting in a decrease in downstream flow rate;

[0183] 3) Humidity (λ4): The humidity sensor is installed at the RPS outlet and can accurately sense the degree of water pipe leakage; then:

[0184] (15);

[0185] In formula (14 / 15), t ( k ) is the current moment, t ( k- 1) is the previous moment, Δ P ( k ), v ( k), T ( k ), R ( k ) is the estimated value of the current state of pressure difference, flow, temperature, and humidity, Δ P ( k- 1) v ( k -1) T ( k -1) R ( k -1) is the estimated value of pressure difference, flow, temperature and humidity at the previous moment, λ 1. λ 2. λ 3 represents the weighted ratios for pressure differential, flow rate, and temperature, respectively; λ4 represents the weighted ratio for humidity, where λ4 > λ1 and λ2. Weight coefficients λ1 to λ4 are trained based on historical fault data and dynamically adjusted based on pipeline age.

[0186] when M Greater than the first fault threshold M 1, it is judged that scaling and deposition occur in the water pipe at this time; when M Greater than the second fault threshold M 2 o'clock, of which M 2> M 1, it is judged that the water pipe is partially blocked at this time;

[0187] when N Greater than the leakage fault threshold N At 1 o'clock, it is judged that there is a slight leak in the water pipe.

[0188] This exhaust pipe fault diagnosis method achieves accurate identification of scaling, blockage and leakage (accuracy ≥ 95%) through multi-sensor collaborative monitoring (pressure difference, temperature, humidity) and Kalman filter data fusion, reducing the false alarm rate to below 5%.

[0189] Regarding the weight ratio of pressure difference, flow rate, temperature and humidity λ 1-4 The importance relationship assessment is further explained as follows:

[0190] like Figure 12-13 As shown, the random forest regression algorithm evaluates the importance of scaling, blockage and micro-leakage with process parameters: the steps are as follows:

[0191] Step P1: Bootstrap sampling:

[0192] The linear regression model can be used to fit the approximate linear relationship between scaling, blockage and micro leakage and each process parameter. T subsample sets {D1, D2, ..., D T}, the sample size of each subset is N. The probability P(N) of each sample being selected in a single sampling is:

[0193] (16);

[0194] Then, the samples that are not selected constitute the out-of-bag dataset OOB, which is used for error estimation and feature importance analysis.

[0195] Step P2: Decision tree construction:

[0196] Features are randomly selected, and the total number of features is M t , for each subset D t , build a regression decision tree h t (x), randomly select m features (m≤M t ).

[0197] The goal of node splitting in a regression tree is to minimize the mean square error (MSE). For feature j and splitting threshold and R R (j,s), select the optimal split pair (j∗,s∗):

[0198] (17);

[0199] Among them, the actual threshold value of scaling and blockage fault y i The actual threshold value y for micro leakage fault is represented by the objective function M. i Represented by the objective function N; R L With R R are the left and right child node sample sets after splitting, c L and c R are the predicted values of the left and right child nodes respectively. That is, the target mean of the subset samples:

[0200] (18);

[0201] Step P3: Prediction result integration:

[0202] The prediction mean of all decision trees is used as the final output, and ensemble learning is used to reduce the uncertainty of single tree prediction. The final output is as follows:

[0203] (19);

[0204] in, is the average result; h t(x) is the prediction result of a single decision tree; T is the number of decision trees.

[0205] Step P4: Model performance evaluation indicators:

[0206] The root mean square error (RMSE) indicator is used to quantify the accuracy of predicting scaling, blockage and micro-leakage respectively:

[0207] (20);

[0208] Determine whether the root mean square error of scaling, blockage and micro-leakage and process parameters meets the error accuracy requirement, with the error accuracy being 0.1; otherwise, return to step P1 and continue iterating until the maximum number of iterations is reached;

[0209] Step P5: Feature Importance Evaluation Analysis

[0210] Feature importance is measured by the change in out-of-bag (OOB) error after permuting the feature value. After randomly permuting feature Xj, its importance is measured by the change in out-of-bag error. If the error increases significantly after permutation, it indicates that the feature has a significant impact on the model prediction. Importance is calculated as follows:

[0211] (twenty one);

[0212] Among them, MSE t is the OOB error of the t-th tree.

[0213] Based on this, the scores for evaluating the importance of scaling, clogging and micro-leakage to process parameters are ranked as follows: Figure 14 As shown in the figure, the importance relationship between scaling and blockage faults and pressure difference, flow rate and temperature are 0.51, 0.30 and 0.19 respectively, and the weights of the objective functions Mpressure difference, flow rate and temperature for scaling and blockage are assigned; similarly, the importance relationship between micro leakage and humidity, flow rate and pressure difference are 0.83, 0.10 and 0.07 respectively, so the weights of the objective functions Mhumidity, flow rate and pressure difference for micro leakage can be obtained.

[0214] The technical solutions in the above embodiments of the present application have at least the following technical effects or advantages:

[0215] 1. The detection device is integrated with an advanced automatic control system and can automatically complete the detection process.

[0216] 2. The device uses infrared mass spectrometry detection technology, which can achieve high-precision and high-sensitivity measurement of various active particles in the plasma, thereby accurately calculating the dissociation rate and providing reliable data for the performance evaluation of the plasma source.

[0217] 3. The device is designed with a real-time monitoring function that can provide instant feedback on the dissociation state of the plasma. Through real-time monitoring, the working conditions of the plasma source can be adjusted in a timely manner to ensure the stability and consistency of the production process.

[0218] 4. The RPS device is designed with a variable cycle heat dissipation device at the air outlet to solve the impact of temperature imbalance on the measurement reliability of the dissociation rate.

[0219] 5. The detection device is designed with an exhaust gas treatment device that can effectively remove harmful substances in the exhaust gas and reduce environmental pollution.

[0220] 6. The remote plasma source dissociation rate evaluation does not require testing on actual integrated circuit production equipment, which is low-cost and short-cycle.

[0221] Although the embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative and are not to be construed as limitations on the present invention. A person skilled in the art may change, modify, replace and modify the above embodiments within the scope of the present invention.

Claims

1. A heat dissipation water pipe structure for an outlet of a remote plasma source, characterized in that: The invention comprises a multi-section variable diameter pipeline, wherein the pipeline is composed of at least three sections of pipes of different diameters connected in sequence, wherein the diameter of the pipe section near the gas outlet is larger than the diameter of the distal pipe section, and the inner diameter of the water channel of the pipe section near the gas outlet is smaller than the inner diameter of the water channel of the distal pipe section; the length, diameter and inner diameter of the water channel of the pipe section are calculated and determined based on the plasma source input power, gas flow rate and coolant temperature rise parameters, wherein the optimization method of the length, diameter and inner diameter of the water channel of the i-th section is: ； ； ； Among them, n is the total number of segments, l i is the inner diameter of the waterway in the i-th pipe section; 、 is the optimized length and diameter of the i-th pipe segment; L i 、D i is the current length and diameter of the i-th pipe segment, ∆P i is the pressure drop of the i-th pipe section, ρ is the water density, v is the cooling water flow rate, and f is the friction coefficient.

2. The air outlet heat dissipation water pipe structure according to claim 1, characterized in that: The water flow rate of the multi-section variable diameter pipeline is controlled within the range of 1-3 m / s, and the temperature rise of the coolant ΔT is ≤ 5°C.

3. The air outlet heat dissipation water pipe structure according to claim 1, characterized in that: An infrared thermal imager is integrated on the outer wall of the pipe section near the air outlet to monitor local temperature anomalies in real time.

4. The air outlet heat dissipation water pipe structure according to claim 1, characterized in that: The water pipe inlet and outlet are provided with differential pressure sensors for monitoring the flow resistance pressure drop ΔP, and triggering an alarm when ΔP exceeds a threshold.

5. The air outlet heat dissipation water pipe structure according to claim 1, characterized in that: A capacitive humidity sensor is arranged near the air outlet to detect sudden changes in ambient humidity caused by micro-leakage.

6. The air outlet heat dissipation water pipe structure according to claim 1, characterized in that: It also includes an intelligent monitoring module that integrates pressure difference, flow, temperature and humidity data to predict pipeline scaling, blockage or leakage based on the Kalman filter algorithm.

7. The air outlet heat dissipation water pipe structure according to claim 1, characterized in that: The multi-section variable diameter pipe is made of corrosion-resistant alloy material and has a polished inner wall.

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