Device for preparing nano silicon dispersion liquid in polyimide film

Abstract

The invention provides a preparation device for a nano silicon dispersion liquid in a polyimide film, and relates to the field of nano material preparation, the preparation device comprises a tank body, an extrusion assembly is arranged above the inner wall of the tank body, and the extrusion assembly comprises a plurality of elastic hinges circumferentially and uniformly distributed on the inner wall of the tank body; an arc-shaped plate is movably mounted at the other end of the elastic hinge, a fixed annular plate is arranged below the inner wall of the tank body, an inner cylinder is movably connected to the inner wall of the fixed annular plate, and outer arc-shaped plates are fixedly connected to the outer wall of the inner cylinder in a circumferentially and uniformly distributed mode. Nano silicon dioxide particles distributed among the four arc-shaped plates are extruded through the rotating arc shifting plate, after the inner cylinder rotates to a certain angle, the through holes of the inner cylinder are staggered from the auxiliary plate, the nano silicon dioxide particles are extruded and guided out, and the two rows of through holes are oppositely distributed, so that the extruded and sprayed particles collide with one another at a certain speed to be dispersed.

Description

Technical Field

[0001] The present invention relates to the field of preparation of nanomaterials, and more particularly to an apparatus for preparing a nano-silicon dispersion for use in a polyimide film. Background Art

[0002] A nano-silicon dispersion is a stable colloidal system in which nano-scale silicon particles are uniformly dispersed in a specific medium (such as water or an organic solvent), and a dispersant is added to prevent agglomeration. Due to its small particle size, uniform dispersion, and excellent properties, it is widely used in many fields such as coatings, textiles, and inks, and can significantly improve the weather resistance, water resistance, wear resistance, and other properties of products.

[0003] During the process of preparing the nano-silicon dispersion, when the nano-silicon particles are directly introduced, due to the lack of effective guiding force, these particles are easily driven by the rotational force during the stirring process. Under this action, the nano-silicon particles may be pulled or precipitated, and then adhered to each other. This phenomenon will lead to particle accumulation and polymerization, resulting in secondary growth, and ultimately seriously affecting the quality of the dispersion.

[0004] For example: in the "Preparation Method and Apparatus for a Nano-scale Dispersion" disclosed in the Chinese invention patent (application number: 201810694837.9), its specification discloses that after the nano-dispersion flows out of the mixer, it needs to be secondarily diluted and mixed with an aqueous phase. During the secondary dilution process, the hydrophobic compound molecules will further aggregate on the surface of the nano-particles, resulting in secondary growth of the nano-particles. The secondary growth of the nano-particles may increase the particle size of the nano-particles, broaden the distribution, and decrease the stability. At the same time, the secondary mixing is a stirring mixing, resulting in a non-continuous whole preparation process, making it difficult to ensure the consistency between batches of products, and the preparation amount per time is limited; the above patent can prove the defects existing in the prior art.

[0005] Therefore, we make improvements and propose an apparatus for preparing a nano-silicon dispersion for use in a polyimide film. Summary of the Invention

[0006] The object of the present invention is to address the current lack of guiding force during the introduction of nano-silicon particles, which affects the easy accumulation and polymerization of nano-silicon particles in the dispersion and thus affects its quality.

[0007] To achieve the above object of the invention, the present invention provides an apparatus for preparing a nano-silicon dispersion for use in a polyimide film to improve the above problems.

[0008] Specifically, this application is as follows: An apparatus for preparing a nano-silicon dispersion for use in a polyimide film, comprising a tank body, an extrusion assembly is provided above the inner wall of the tank body, and an auxiliary assembly is provided on the inner wall of the tank body; The extrusion assembly includes a plurality of elastic hinges uniformly distributed in a circle on the inner wall of the tank. The other end of the elastic hinge is movably installed with an arc-shaped plate. A fixed ring plate is provided below the inner wall of the tank. The inner wall of the fixed ring plate is movably connected with an inner cylinder. The outer wall of the inner cylinder is fixedly connected with outer arc plates uniformly distributed in a circle. The inner arc surface of the outer arc plate is movably connected with arc-shaped shifting plates. On both sides of the outer wall of the inner cylinder, a plurality of through holes are uniformly distributed in a straight line.

[0009] As a preferred technical solution of the present application, a support ring plate is fixedly connected above the inner wall of the tank. Two feed pipes are symmetrically and uniformly distributed on the upper surface of the support ring plate. A scraping assembly is provided above the support ring plate.

[0010] As a preferred technical solution of the present application, a filter screen plate is provided in the middle of two opposite arc-shaped plates. Limit angle plates are fixedly connected to the inner side wall of the tank uniformly distributed in a circle. The limit angle plates are movably connected with the arc-shaped plates.

[0011] As a preferred technical solution of the present application, the auxiliary assembly includes a protective ring plate fixedly installed above the inner cylinder. An auxiliary ring is fixedly connected above the protective ring plate. A square rod shaft is provided above the arc-shaped shifting plate. A plurality of square grooves are uniformly distributed on the surface of the protective ring plate. The square rod shaft is movably connected with the square grooves. A round hole groove is provided at one end of the square groove away from the auxiliary ring and is arranged on the surface of the protective ring plate.

[0012] As a preferred technical solution of the present application, elastic telescopic rods are fixedly connected to the inner wall of the auxiliary ring uniformly distributed in a circle. The end of the elastic telescopic rod away from the auxiliary ring is fixedly connected with a cylinder. The square rod shaft penetrates through the square groove above and is movably connected with the cylinder.

[0013] As a preferred technical solution of the present application, the lower end of the inner cylinder is movably connected with a ring plate, and the ring plate is fixedly installed on the lower inner wall of the tank.

[0014] As a preferred technical solution of the present application, a toothed ring plate is fixedly connected to the lower part of the outer wall of the inner cylinder. An auxiliary gear is meshed with the outer wall of the toothed ring plate. A motor is provided below the auxiliary gear, and the motor is fixedly installed on the lower inner wall of the tank.

[0015] As a preferred technical solution of the present application, the scraping assembly includes an upper cover plate movably installed on the upper surface of the support ring plate. A plurality of auxiliary plates are fixedly connected to the lower part of the upper cover plate uniformly distributed in a circle. A plurality of stirring rods are fixedly connected to the opposite surfaces of the plurality of auxiliary plates uniformly distributed in a straight line. Angle arc plates are fixedly connected to both sides of the auxiliary plates. The angle arc plates are movably connected with the inner wall of the inner cylinder.

[0016] As a preferred technical solution of the present application, a guide hole is opened inside the stirring rod, and the guide hole passes through the stirring rod and the auxiliary plate.

[0017] As a preferred technical solution of the present application, a material guide valve tube is provided on the upper surface of the upper cover plate, and a material discharge valve tube is provided under the tank body.

[0018] Compared with the prior art, the present invention has the following beneficial effects: In the scheme of this application: 1. In order to solve the problem that the nano silicon particles lack effective guiding force in the prior art and are easily driven by the rotation force during the stirring process, under which the nano silicon particles may be pulled or precipitated and then bonded together, which will lead to particle accumulation and aggregation, forming secondary growth, and finally seriously affecting the quality of the dispersion, the nano silicon dioxide particles distributed between the four arc plates are squeezed by a rotating arc plate, and after the inner cylinder rotates to a certain angle, its through holes are staggered with the auxiliary plate, and the nano silicon dioxide particles are squeezed out, and the two rows of through holes are relatively distributed, so that the particles ejected by the extrusion collide with each other at a certain speed and disperse, so that in the process of making the dispersion, the nano particles can be ejected with impact force during the mixing process and collide with each other and disperse, so that they will not gather and adhere to each other, reducing the stability of the dispersion; 2. The rotating arc plate and the arc plate move relative to each other, squeezing the four chambers divided by the four arc plates, so that it can have the effect of squeezing and filtering at the same time as the squeezing and exporting function, so that the squeezing and exporting and squeezing and filtering can be performed during the dispersion production process, thereby improving the efficiency of dispersion production; 3. The dispersion in the production process is stirred and mixed by the cooperation of the rotating inner cylinder and the stirring rod connected to the auxiliary plate. During the rotation, the arc plates on both sides of the auxiliary plate scrape the inner wall of the inner cylinder, so that the dispersion can be stirred and mixed. During the mixing process, the inner wall is scraped to prevent it from adhering to the inner wall and reducing the quality of the dispersion. 4. During the material guiding process, the inner cylinder rotating in the forward direction drives the arc plate to move the arc plate, and rotates and squeezes the nanoparticles between the arc plate and the arc plate, so that they are impacted and guided out. During the filtering process, the arc plate rotating in the forward direction squeezes the nanoparticles entering the tank body, so that they pass through the filter screen in the arc plate, and are filtered. During the cleaning process, the arc plate rotating in the reverse direction moves the arc plate to make it contact with the inner wall of the tank body, and the arc plate that continues to rotate scrapes the filter screen provided on the arc plate to clean it, so that it can be flexibly switched between the guiding structure, the filtering structure and the cleaning structure, so as to improve the efficiency of its dispersion preparation; 5. During the feeding process, when the guiding hole of the auxiliary plate aligns with the through hole of the inner cylinder, the introduction of nanoparticles is initiated, and the opening and closing of the material are controlled. During the mixing process, the rotating inner cylinder drives the material inside to rotate, and the auxiliary plate and the stirring rod cooperate with each other to stir and mix the dispersion liquid, enabling it to flexibly switch between the feeding structure and the mixing structure, thereby ensuring the quality of the dispersion liquid production. Description of the Drawings

[0019] Figure 1 Figure 1 is a schematic diagram of the overall structure of the nano-silicon dispersion liquid preparation device for polyimide films provided by the present application; Figure 2 Figure 2 is a schematic diagram of a partial structure of the nano-silicon dispersion liquid preparation device for polyimide films provided by the present application Figure 1 ; Figure 3 Figure 3 is a schematic diagram of a partial structure of the nano-silicon dispersion liquid preparation device for polyimide films provided by the present application Figure 2 ; Figure 4 is Figure 3 the enlarged structure diagram at A in Figure 2; Figure 5 Figure 4 is a schematic diagram of a partial structure of the nano-silicon dispersion liquid preparation device for polyimide films provided by the present application Figure 3 ; Figure 6 Figure 5 is a schematic diagram of a partial structure of the nano-silicon dispersion liquid preparation device for polyimide films provided by the present application Figure 4 ; Figure 7 Figure 6 is a schematic diagram of a partial structure of the nano-silicon dispersion liquid preparation device for polyimide films provided by the present application Figure 5 ; Figure 8 Figure 7 is a schematic diagram of a semi-sectional structure of the nano-silicon dispersion liquid preparation device for polyimide films provided by the present application.

[0020] Labels in the figures: 1. Tank body; 2. Extrusion assembly; 201. Support ring plate; 202. Feed pipe; 203. Fixed ring plate; 204. Elastic hinge; 205. Limit angle plate; 206. Arc plate; 207. Filter mesh plate; 3. Auxiliary assembly; 301. Auxiliary ring; 302. Protective ring plate; 303. Elastic telescopic rod; 304. Cylinder; 305. Square rod shaft; 306. Square groove; 307. Round hole groove; 308. Arc-shaped dialing plate; 309. Through hole; 310. Inner cylinder; 311. Tooth ring plate; 312. Ring plate; 313. Auxiliary gear; 314. Motor; 315. Outer arc plate; 4. Positioning ring; 5. Inclined bracket; 6. Scraping assembly; 601. Upper cover plate; 602. Auxiliary plate; 603. Stirring rod; 604. Guide hole; 605. Angular arc plate; 606. Material guiding valve pipe; 7. Discharge valve pipe. Detailed implementation manners

[0021] In order to enable those skilled in the art to better understand the solution of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0022] As described in the background art, due to the lack of effective guiding force of nano-silicon particles, they are easily driven by the rotational force during the stirring process. Under this action, the nano-silicon particles may be attracted or precipitated, and then adhered to each other. This phenomenon will lead to particle accumulation and polymerization, forming secondary growth, and ultimately seriously affecting the quality of the dispersion liquid.

[0023] To solve this technical problem, the present invention provides a preparation device for nano-silicon dispersion liquid in a polyimide film, which is applied to the field of nano-material preparation.

[0024] In order to enable those skilled in the art to better understand the solution of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings.

[0025] It should be noted that, without conflict, the embodiments in the present invention and the features and technical solutions in the embodiments may be combined with each other.

[0026] It should be noted that similar reference numerals and letters denote similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0027] Example 1, please refer to Figure 1 、 Figure 2 、 Figure 7 And Figure 8A device for preparing nano-silicon dispersion in polyimide film comprises a tank body 1, an extrusion assembly 2 is arranged above the inner wall of the tank body 1, an auxiliary assembly 3 is arranged on the inner wall of the tank body 1, the extrusion assembly 2 comprises a plurality of elastic hinges 204 evenly distributed on the inner wall of the tank body 1, an arc plate 206 is movably installed on the other end of the elastic hinge 204, a fixed ring plate 203 is arranged below the inner wall of the tank body 1, an inner cylinder 310 is movably connected to the inner wall of the fixed ring plate 203, an outer arc plate 315 is evenly distributed on the outer wall of the inner cylinder 310, and an outer arc plate 315 is evenly distributed on the outer wall of the inner cylinder 310. The inner arc surface of the plate 315 is movably connected with an arc plate 308, and both sides of the outer wall of the inner cylinder 310 are evenly distributed with a plurality of through holes 309. The inner cylinder 310 is driven to rotate, and the arc plate 308 is driven to rotate in the tank body 1 under the support of the outer arc plate 315, so as to squeeze the nano-silicon dioxide particles between the arc plate 206 and the arc plate 308, so that the nano-silicon dioxide particles are introduced into the inner cylinder 310 through the through holes 309 on the outer wall of the inner cylinder 310, and are introduced into the inner cylinder 310 with relative impact, so as to prevent them from sticking to each other and aggregating with each other to reduce stability.

[0028] The rotating arc plate 308 squeezes the nano-silicon dioxide particles distributed between the four arc plates 206. After the inner cylinder 310 rotates to a certain angle, its through holes 309 are staggered with the auxiliary plate 602, and the nano-silicon dioxide particles are squeezed out. The two rows of through holes 309 are relatively distributed, so that the particles ejected by the extrusion collide with each other at a certain speed and disperse. In this way, in the process of making the dispersion liquid, the nano-particles can be ejected with impact force during the mixing process and collide with each other to disperse, so that they will not gather and stick to each other, thereby reducing the stability of the dispersion liquid.

[0029] Further, such as Figure 1 and Figure 2 As shown, a support ring plate 201 is fixedly connected to the upper inner wall of the tank body 1, and two feed pipes 202 are symmetrically and evenly distributed on the upper surface of the support ring plate 201. A scraper assembly 6 is provided above the support ring plate 201, and the nanoparticles required to make the dispersion are introduced into the space between the inner cylinder 310 and the tank body 1 through the feed pipe 202.

[0030] Further, such as Figure 2 and Figure 7 As shown, a filter screen plate 207 is provided in the middle of two arc plates 206, and the four arc plates 206 divide the space between the inner cylinder 310 and the tank body 1 into four cavities. The filter screen plate 207 is provided on the surface of the two arc plates 206. The inner wall of the tank body 1 is evenly distributed in a circle and fixedly connected with the limiting angle plate 205. The limiting angle plate 205 is movably connected to the arc plate 206. The nanoparticles between the two arc plates 206 are filtered through the filter screen plate 207 in the arc plate 206, and the limiting angle plate 205 supports the arc plate 206 to ensure its stability during the filtering process.

[0031] Example 2 further optimizes the preparation device for the nano-silicon dispersion liquid used in the polyimide film provided in Example 1. Specifically, as Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 6 , Figure 7 and Figure 8 shown, the auxiliary component 3 includes a protective ring plate 302 fixedly installed above the inner cylinder 310. An auxiliary ring 301 is fixedly connected above the protective ring plate 302. A square rod shaft 305 is provided above the arc-shaped dial plate 308. The surface of the protective ring plate 302 is circumferentially and uniformly provided with a plurality of square grooves 306. The square rod shaft 305 is movably connected with the square grooves 306. One end of the square groove 306 away from the auxiliary ring 301 is provided with a round hole groove 307 and is arranged on the surface of the protective ring plate 302. Its inner cylinder 310 continues to rotate. With the cooperation of the square rod shaft 305, the arc-shaped dial plate 308 is driven to approach the arc-shaped plate 206, and the nano-particles between the arc-shaped plate 206 and the arc-shaped dial plate 308 are extruded. The arc-shaped dial plate 308 hits the arc-shaped plate 206 and continues to move, driving the square rod shaft 305 to slide in the square groove 306, stretching the elastic telescopic rod 303 into the round hole groove 307. The arc-shaped dial plate 308 continues to contact the arc-shaped plate 206, so that the arc-shaped dial plate 308 rotates around the square rod shaft 305 and fits with the inner wall of the inner cylinder 310. After passing through the arc-shaped dial plate 308 and passing by the arc-shaped plate 206, it loses its limit, and the elastic telescopic rod 303 extends, driving the square rod shaft 305 connected to the arc-shaped dial plate 308 to enter the square groove 306 for limiting. In this way, it enters another chamber. The arc-shaped dial plate 308 continues to rotate, and the nano-particles in this chamber are extruded through the filter screen plate 207 and enter the next chamber for particle diameter filtration.

[0032] Through the relative movement of the rotating arc-shaped dial plate 308 and the arc-shaped plate 206, the four chambers divided by the four arc-shaped plates 206 are extruded, so that it can have the effect of extrusion and filtration while having the extrusion and export function, so that extrusion and export and extrusion filtration can be carried out during the production process of the dispersion liquid, thereby improving the production efficiency of the dispersion liquid.

[0033] Furthermore, as Figure 4 shown, the inner wall of the auxiliary ring 301 is circumferentially and uniformly fixedly connected with elastic telescopic rods 303. One end of the elastic telescopic rod 303 away from the auxiliary ring 301 is fixedly connected with a cylinder 304. The square rod shaft 305 passes through the square groove 306 above and is movably connected with the cylinder 304. The cylinder 304 is driven to displace through the elastic telescopic rod 303, and the angle of the square rod shaft 305 is changed.

[0034] Furthermore, as Figure 6 and Figure 7As shown, a circular ring plate 312 is movably connected to the lower end of the inner cylinder 310. The circular ring plate 312 is fixedly installed below the inner wall of the tank body 1. Through the mutual cooperation of the circular ring plate 312, the support ring plate 201 and the four arc-shaped plates 206, the material guiding space is divided into four spaces.

[0035] Furthermore, as Figure 6 , Figure 7 and Figure 8 shown, a toothed ring plate 311 is fixedly connected to the lower part of the outer wall of the inner cylinder 310. An auxiliary gear 313 is meshed with the outer wall of the toothed ring plate 311. A motor 314 is arranged below the auxiliary gear 313. The motor 314 is fixedly installed below the inner wall of the tank body 1. The motor 314 drives the auxiliary gear 313 to rotate, driving the toothed ring plate 311 meshed therewith, so that the inner cylinder 310 in the middle of the toothed ring plate 311 rotates.

[0036] Example 3 further optimizes the preparation device for the nano-silicon dispersion liquid used in Examples 1 and 2. Specifically, as Figure 5 and Figure 8 shown, the scraping assembly 6 includes an upper cover plate 601 movably installed on the upper surface of the support ring plate 201. A plurality of auxiliary plates 602 are fixedly connected in a circumferentially uniform distribution below the upper cover plate 601. A plurality of stirring rods 603 are fixedly connected in a straight line and uniform distribution on the opposite sides of the plurality of auxiliary plates 602. Angle arc plates 605 are fixedly connected to both sides of the auxiliary plate 602. The angle arc plates 605 are movably connected to the inner wall of the inner cylinder 310. The inner cylinder 310 rotates continuously, while the auxiliary plate 602 in the inner cylinder 310 remains stationary. Driven by the rotation of the inner cylinder 310, the dispersion liquid follows the rotation and cooperates with the stirring rods 603 to stir the mixed liquid therein to form the required dispersion liquid. Moreover, during the rotation of the inner cylinder 310, the angle arc plates 605 on both sides of the auxiliary plate 602 scrape the nano-particles attached to the inner wall of the inner cylinder 310.

[0037] Through the mutual cooperation of the rotating inner cylinder 310 and the stirring rods 603 connected to the auxiliary plate 602, the dispersion liquid in the production process is stirred and mixed. Moreover, during the rotation, the angle arc plates 605 on both sides of the auxiliary plate 602 scrape the inner wall of the inner cylinder 310, so that the dispersion liquid can be stirred and mixed, and the inner wall is scraped during the mixing process to prevent it from adhering to the inner wall and reducing the quality of the dispersion liquid.

[0038] Furthermore, as Figure 5 shown, a guide hole 604 is opened inside the stirring rod 603, and the guide hole 604 penetrates through the stirring rod 603 and the auxiliary plate 602. The nano-particles led out from the through hole 309 are guided through the guide hole 604 in the stirring rod 603, so that they impact each other relatively and will not adhere to each other.

[0039] Furthermore, as Figure 8 shown, a material guiding valve pipe 606 is provided on the upper surface of the upper cover plate 601, and a discharge valve pipe 7 is provided below the tank body 1. The material guiding valve pipe 606 and the discharge valve pipe 7 cooperate with each other to control the export and import of materials.

[0040] Furthermore, as Figure 1 shown in Figure 2 shown, a positioning ring 4 is fixedly connected to the lower part of the outer wall of the tank body 1, and a plurality of inclined brackets 5 are fixedly connected to the outer wall of the positioning ring 4 in a circumferentially uniform distribution. The positioning ring 4 and the inclined brackets 5 cooperate with each other to stably support the tank body 1.

[0041] Example 4 further optimizes the preparation device for the nano-silicon dispersion liquid used in Examples 1, 2, and 3. Specifically, a method for the nano-silicon dispersion liquid used in the polyimide film: S1. Select nano-silica particles with a particle size of 8 - 15 nm, and the decomposition liquid medium is dimethylacetamide; S2. Select 8 - 15 nm silica sol and add it to dimethylacetamide, add Hd to it, and adjust its pH value to 5 - 6; S3. Add methyltrimethoxy and silane to it for hydrolysis; S4. After the hydrolysis is completed, add n-butanol; S5. Remove the moisture and n-butanol in it by rectification.

[0042] The usage process of the preparation device for the nano-silicon dispersion liquid provided by the present invention is as follows: Working principle: The staff imports the required dimethylacetamide into the inner cylinder 310 through the material guiding valve pipe 606, and the selected nano-oxide particles are imported into the inner cylinder 310 and the tank body 1 through the feed pipe 202 and are in the cavity between the relatively two groups of arc-shaped plates 206; Filtration: Start the motor 314 to drive the auxiliary gear 313 to rotate, and the toothed ring plate 311 engaged with it will follow the rotation, and drive the inner cylinder 310 in the toothed ring plate 311 to rotate. Driven by the outer arc plate 315, its arc-shaped baffle 308 will rotate towards the arc-shaped plate 206. The surface of the next arc-shaped plate 206 in the positive rotation direction is provided with a filter mesh plate 207, so that the arc-shaped baffle 308 squeezes the nano-particles to make them pass through the filter mesh plate 207, and filters the nano-particles; Fitting displacement: The inner cylinder 310 continues to rotate. Under the cooperation of the square rod shaft 305, it drives the arc deflector 308 to approach the arc-shaped plate 206, squeezing the nanoparticles between the arc-shaped plate 206 and the arc deflector 308. The arc deflector 308 hits the arc-shaped plate 206 and continues to move, driving the square rod shaft 305 to slide in the square groove 306, stretching the elastic telescopic rod 303 into the circular hole groove 307. The arc deflector 308 continues to contact the arc-shaped plate 206, causing the arc deflector 308 to rotate around the square rod shaft 305 and fit with the inner wall of the inner cylinder 310. After passing over the arc-shaped plate 206 through the arc deflector 308, the limit is lost, and the elastic telescopic rod 303 extends, driving the square rod shaft 305 connected to the arc deflector 308 into the square groove 306 for limiting, and thus entering another chamber; Import: Driven by the outer arc plate 315, the arc deflector 308 is driven to rotate in the tank body 1, squeezing the nano-silica particles between the arc-shaped plate 206 and the arc deflector 308, and guiding them into the inner cylinder 310 through the through hole 309 on the outer wall of the inner cylinder 310. And when the guide holes 604 in the auxiliary plate 602 and the stirring rod 603 are aligned with the through hole 309, they are poured into the inner cylinder 310 in a relatively impactful manner to prevent them from sticking to each other; Stirring: The inner cylinder 310 rotates, while the auxiliary plate 602 in the inner cylinder 310 remains stationary. Driven by the rotation of the inner cylinder 310, the dispersion liquid follows the rotation, cooperates with the stirring rod 603, stirs the mixed liquid therein to form the required dispersion liquid. And during the rotation of the inner cylinder 310, the corner arc plates 605 on both sides of the auxiliary plate 602 scrape the nanoparticles attached to the inner wall of the inner cylinder 310; Cleaning: After the dispersion liquid is made, the motor 314 rotates in the reverse direction, driving the inner cylinder 310 to rotate, causing its arc deflector 308 to reverse the arc-shaped plate 206, and making the arc-shaped plate 206 rotate along the elastic hinge 204 and contact the inner wall of the tank body 1. The arc deflector 308 continues to be rotated in the reverse direction by the inner cylinder 310, and the filter screen plate 207 on the surface of the arc-shaped plate 206 is scraped and cleaned by the arc deflector 308.

[0043] In the present invention, unless otherwise clearly specified and defined, the terms "installation", "connection", "connection", "fixation" and other terms shall be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection, an electrical connection or communication with each other; it can be directly connected, or indirectly connected through an intermediate medium, and can be the communication inside two components or the interaction relationship between two components, unless otherwise clearly defined. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0044] Obviously, the embodiments described above are only a part of the embodiments of the present invention, rather than all embodiments. The preferred embodiments of the present invention are shown in the accompanying drawings, but do not limit the patent scope of the present invention. The present invention can be implemented in many different forms. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosed content of the present invention more thorough and comprehensive. Although the present invention has been described in detail with reference to the foregoing embodiments, for those skilled in the art, they can still modify the technical solutions described in the foregoing specific embodiments, or perform equivalent replacements on some of the technical features. Any equivalent structure made by using the content of the specification and drawings of the present invention, directly or indirectly applied in other related technical fields, is similarly within the scope of the patent protection of the present invention.

Claims

1. A device for preparing nano-silicon dispersion in polyimide film, characterized in that: It comprises a tank body (1), an extrusion component (2) is provided above the inner wall of the tank body (1), and an auxiliary component (3) is provided on the inner wall of the tank body (1); The extrusion assembly (2) comprises a plurality of elastic hinges (204) evenly distributed in a circumference and arranged on the inner wall of the tank body (1); an arc plate (206) is movably mounted on the other end of the elastic hinge (204); a fixed ring plate (203) is provided below the inner wall of the tank body (1); an inner cylinder (310) is movably connected to the inner wall of the fixed ring plate (203); an outer arc plate (315) is evenly distributed in a circumference and fixedly connected to the outer wall of the inner cylinder (310); an arc plate (308) is movably connected to the inner arc surface of the outer arc plate (315); and a plurality of through holes (309) are evenly distributed in a straight line on both sides of the outer wall of the inner cylinder (310).

2. The device for preparing nano-silicon dispersion in polyimide film according to claim 1, characterized in that: A support ring plate (201) is fixedly connected to the upper inner wall of the tank body (1); two feed pipes (202) are symmetrically and evenly distributed on the upper surface of the support ring plate (201); and a scraping assembly (6) is provided above the support ring plate (201).

3. The device for preparing nano-silicon dispersion in polyimide film according to claim 2, characterized in that: A filter screen plate (207) is provided in the middle of the two arc-shaped plates (206), and the inner wall of the tank body (1) is evenly distributed in a circumference and fixedly connected to the limiting angle plate (205), and the limiting angle plate (205) is movably connected to the arc-shaped plates (206).

4. The device for preparing nano-silicon dispersion in polyimide film according to claim 3, characterized in that: The auxiliary component (3) comprises a protective ring plate (302) fixedly mounted above the inner cylinder (310); an auxiliary ring (301) is fixedly connected above the protective ring plate (302); a square rod shaft (305) is provided above the arc plate (308); a plurality of square grooves (306) are evenly distributed in a circumferential manner on the surface of the protective ring plate (302); the square rod shaft (305) is movably connected to the square grooves (306); and a circular hole groove (307) is provided at one end of the square groove (306) away from the auxiliary ring (301) and is provided on the surface of the protective ring plate (302).

5. The device for preparing nano-silicon dispersion in polyimide film according to claim 4, characterized in that: The inner wall of the auxiliary ring (301) is evenly distributed in a circumference and fixedly connected with elastic telescopic rods (303); one end of the elastic telescopic rod (303) away from the auxiliary ring (301) is fixedly connected with a cylinder (304); and a square groove (306) passes through the top of the square rod shaft (305) and is movably connected to the cylinder (304).

6. The device for preparing nano-silicon dispersion in polyimide film according to claim 4, characterized in that: The lower end of the inner cylinder (310) is movably connected to a circular ring plate (312), and the circular ring plate (312) is fixedly mounted below the inner wall of the tank body (1).

7. The device for preparing nano-silicon dispersion in polyimide film according to claim 4, characterized in that: A gear ring plate (311) is fixedly connected to the lower part of the outer wall of the inner cylinder (310), an auxiliary gear (313) is meshedly connected to the outer wall of the gear ring plate (311), a motor (314) is arranged below the auxiliary gear (313), and the lower part of the motor (314) is fixedly mounted below the inner wall of the tank body (1).

8. The device for preparing nano-silicon dispersion in polyimide film according to claim 2, characterized in that: The scraping assembly (6) comprises an upper cover plate (601) movably mounted on the upper surface of the supporting ring plate (201); a plurality of auxiliary plates (602) are evenly distributed in a circle and fixedly connected below the upper cover plate (601); a plurality of stirring rods (603) are evenly distributed in a straight line and fixedly connected to the opposite sides of the auxiliary plates (602); angle arc plates (605) are fixedly connected to both sides of the auxiliary plates (602); and the angle arc plates (605) are movably connected to the inner wall of the inner cylinder (310).

9. The device for preparing nano-silicon dispersion in polyimide film according to claim 8, characterized in that: A guide hole (604) is provided inside the stirring rod (603), and the guide hole (604) passes through the stirring rod (603) and the auxiliary plate (602).

10. The device for preparing nano-silicon dispersion in polyimide film according to claim 8, characterized in that: A material guide valve tube (606) is provided on the upper surface of the upper cover plate (601), and a material discharge valve tube (7) is provided below the tank body (1).

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