Plasma resistant o-ring evaluation unit and apparatus

Abstract

The invention relates to a plasma-resistant O-ring evaluation unit and a plasma-resistant O-ring evaluation device, and discloses a technology capable of quickly and accurately ascertaining plasma-resistant characteristics of a plurality of O-rings and different O-rings by installing a plurality of O-rings in the O-ring evaluation unit and selectively exposing the O-rings to plasma in a plasma environment. The plasma-resistant O-ring evaluation unit includes: a main body having an O-ring mounting groove in an upper surface thereof corresponding to a shape of an O-ring to be evaluated; and a cover body which is installed above the main body and forms a plasma gas permeation path through which plasma gas permeates into the installed O-shaped ring to be evaluated according to the combination of the main body and the cover body.

Description

Technical Field

[0001] The present invention relates to a plasma-resistant O-ring evaluation unit and apparatus, and more particularly to a technique capable of mounting various multiple O-rings in an O-ring evaluation unit and selectively exposing the O-rings to plasma in a plasma environment to quickly and accurately grasp the plasma resistance characteristics of the multiple O-rings and the various different O-rings. Background Art

[0002] A plasma substrate processing apparatus combines multiple components to form a single apparatus. In the substrate processing apparatus, an O-ring is installed in such a way that internal components are not exposed to plasma gas and sealed to block the penetration of plasma gas.

[0003] When the O-ring that seals the plasma gas does not have appropriate plasma resistance characteristics, plasma gas penetrates into the internal components of the substrate processing apparatus and causes damage to the internal components. Therefore, there is a problem that the maintenance cycle of the substrate processing apparatus is shortened and the process yield is decreased.

[0004] Therefore, it is necessary to apply an O-ring having plasma resistance characteristics suitable for its installation location.

[0005] In the past, in order to evaluate the plasma resistance characteristics of an O-ring, the O-ring to be evaluated was directly exposed to a plasma environment to evaluate the plasma resistance characteristics.

[0006] However, when the O-ring is directly exposed to a plasma environment for evaluation, since it is different from the environment in which the O-ring is actually installed in the substrate processing apparatus, there is a problem that the results of the plasma resistance characteristics of the O-ring in the actual process environment are different.

[0007] Alternatively, the O-ring to be evaluated is installed in the substrate processing apparatus and the substrate processing apparatus is actually operated to indirectly expose the O-ring to be evaluated to a plasma environment to evaluate the plasma resistance characteristics.

[0008] Such an evaluation method can reflect the actual process environment and can accurately evaluate the plasma resistance characteristics of the O-ring to be evaluated, but there is a problem that the evaluation time becomes longer accordingly for evaluating various O-rings. Summary of the Invention

[0009] The present invention is proposed to solve the problems of the above prior art, and its purpose is to disclose a solution capable of quickly and accurately performing the plasma resistance evaluation of various types of multiple O-rings through a single plasma resistance evaluation process.

[0010] In particular, the purpose is to solve the problem that when the O-ring is directly exposed to a plasma environment for evaluation, it is different from the environment where the O-ring is actually installed in the substrate processing apparatus, resulting in different results from the plasma resistance characteristics of the O-ring in the actual process environment.

[0011] In addition, the purpose is to solve the problem that when the O-ring to be evaluated is installed in the substrate processing apparatus and the substrate processing apparatus is actually operated to indirectly expose the O-ring to be evaluated to a plasma environment for evaluating the plasma resistance characteristics, the evaluation time becomes longer in order to evaluate various O-rings accordingly.

[0012] The purpose of the present invention is not limited to the foregoing, and other purposes and advantages of the present invention not mentioned can be understood from the following description.

[0013] One embodiment of a plasma-resistant O-ring evaluation unit according to the present invention for solving the above problems may include: a main body having an O-ring mounting groove corresponding to the shape of the O-ring to be evaluated provided thereon; and a cover mounted above the main body, and with the combination of the main body and the cover, a plasma gas penetration path for plasma gas to penetrate into the mounted O-ring to be evaluated is formed.

[0014] Preferably, the cover may be provided with a cover internal penetration through-hole for supporting the internal penetration of plasma gas, and the plasma gas penetration path may include: an internal penetration path formed by an internal contact surface gap where the main body and the cover abut with the combination of the main body and the cover, and the plasma gas flowing in through the cover internal penetration through-hole penetrates through the internal contact surface gap; and a peripheral penetration path formed by a peripheral contact surface gap where the main body and the cover abut with the combination of the main body and the cover, and the plasma gas penetrates from the outside through the peripheral contact surface gap.

[0015] Furthermore, the cover may be provided with a cover internal penetration through-hole for supporting the internal penetration of plasma gas at a central portion, and the main body may include: an internal penetration O-ring mounting groove provided at a central portion; a sealing O-ring mounting groove provided at an intermediate portion; and an external penetration O-ring mounting groove provided at a peripheral portion.

[0016] Among them, the flow of plasma gas penetrating through the internal penetration path and the peripheral penetration path may be cut off by an O-ring installed in the sealing O-ring mounting groove.

[0017] As an example, the main body may be provided with a main body internal penetration through-hole connected to the cover internal penetration through-hole.

[0018] Furthermore, it is possible that a fastener through-hole for engaging with the main body is provided in the lid body, and a fastener fastening groove corresponding to the fastener through-hole of the lid body is provided in the main body. The plasma-resistant O-ring evaluation unit further includes: a coupling fastener that is inserted into the fastener through-hole of the lid body and fastened to the fastener fastening groove of the main body.

[0019] Further, it is possible that the plasma-resistant O-ring evaluation unit further includes: a clearance adjustment ring that is fastened by the coupling fastener between the lid body and the main body.

[0020] As an example, it is possible to adjust the internal contact surface clearance and the peripheral contact surface clearance by changing the number of the clearance adjustment rings.

[0021] As an example, it is possible to adjust the internal contact surface clearance and the peripheral contact surface clearance by changing the thickness of the clearance adjustment rings.

[0022] Furthermore, it is possible that the main body includes: an upper main body on which the lid body is mounted above; and a lower main body on which the upper main body is mounted above.

[0023] In addition, it is possible that the main body includes a plurality of main bodies sequentially mounted below the lid body.

[0024] Preferably, it is possible that the upper main body is provided with a main body internal penetration through-hole connected to the internal penetration through-hole of the lid body.

[0025] As an example, it is possible that a fastener through-hole for engaging with the upper main body is provided in the lid body, and a fastener fastening groove corresponding to the fastener through-hole of the lid body and a fastener through-hole for engaging with the lower main body are provided in the lower main body. The plasma-resistant O-ring evaluation unit further includes: a first coupling fastener that is inserted into the fastener through-hole of the lid body and fastened to the fastener fastening groove of the upper main body; and a second coupling fastener that is inserted into the fastener through-hole of the upper main body and fastened to the fastener fastening groove of the lower main body.

[0026] As an example, it is possible that the plasma-resistant O-ring evaluation unit further includes: a clearance adjustment ring that is selectively fastened by the coupling fastener between the lid body and the upper main body or between the upper main body and the lower main body.

[0027] As an example, it is possible that a fastener through-hole for engaging with the upper main body is provided in the lid body, a fastener fastening groove corresponding to the fastener through-hole of the lid body and a fastener through-hole for engaging with the lower main body are provided in the upper main body. The plasma-resistant O-ring evaluation unit further includes: a first coupling fastener that is inserted into the fastener through-hole of the lid body and fastened to the fastener fastening groove of the upper main body; and a second coupling fastener that is inserted into the fastener through-hole of the upper main body and fastened to the fastener fastening groove of the lower main body.

[0028] As an example, it may be that the plasma-resistant O-ring evaluation unit further includes a gap adjustment ring, which is fastened between the cover body and the upper main body by the first coupling fastener or between the upper main body and the lower main body by the second coupling fastener.

[0029] In addition, an embodiment of the plasma-resistant O-ring evaluation device according to the present invention may include: a chamber provided with an O-ring evaluation space for providing a plasma environment; the above-mentioned plasma-resistant O-ring evaluation unit disposed in the O-ring evaluation space; and a plasma environment construction unit for constructing a plasma environment in the O-ring evaluation space of the chamber.

[0030] As an example, it may be that the plasma environment construction unit constructs a plasma environment in the O-ring evaluation space of the chamber by the CCP method.

[0031] As an example, it may be that the plasma environment construction unit constructs a plasma environment in the O-ring evaluation space of the chamber by the ICP method.

[0032] Preferably, an embodiment of the plasma-resistant O-ring evaluation device according to the present invention may include: a cover body provided with a cover body internal penetration through-hole for supporting the internal penetration of plasma gas at the central portion and installed above the main body; a plurality of main bodies successively installed below the cover body, the main body being provided with a main body internal penetration through-hole connected to the cover body internal penetration through-hole, and including an internal penetration O-ring installation groove provided at the central portion on the upper surface corresponding to the shapes of different evaluation object O-rings, a sealing O-ring installation groove provided at the middle portion on the upper surface, and an external penetration O-ring installation groove provided at the peripheral portion on the upper surface; and a plasma-resistant O-ring evaluation unit including a plasma gas penetration path, the plasma gas penetration path including: an internal penetration path formed by an internal contact surface gap where the main body and the cover body and between the main bodies abut against each other as the main body and the cover body are combined and between the main bodies are combined, and the plasma gas flowing in through the cover body internal penetration through-hole or the main body internal penetration through-hole penetrates through the internal contact surface gap; and a peripheral penetration path formed by a peripheral contact surface gap where the main body and the cover body and between the main bodies abut against each other as the main body and the cover body are combined and between the main bodies are combined, and the plasma gas penetrates from the outside through the peripheral contact surface gap; a chamber provided with an O-ring evaluation space for providing a plasma environment, the plasma-resistant O-ring evaluation unit being disposed in the O-ring evaluation space; and a plasma environment construction unit for constructing a plasma environment in the O-ring evaluation space of the chamber.

[0033] According to such a present invention, it is possible to quickly and accurately perform the plasma resistance evaluation of various types of multiple O-rings through a single plasma resistance evaluation process.

[0034] Furthermore, it is possible to simultaneously perform the plasma resistance evaluation of the internal penetration of the O-ring to the plasma gas and the plasma resistance evaluation of the external penetration of the O-ring to the plasma gas.

[0035] Furthermore still, by adjusting the penetration amount of the plasma gas differently, it is possible to perform the plasma resistance evaluation of the O-ring to various plasma environments.

[0036] The effects of the present invention are not limited to those mentioned above, and other effects not mentioned can be clearly understood by those with ordinary knowledge in the technical field to which the present invention pertains from the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] Figure 1 Shows an embodiment of a plasma-resistant O-ring evaluation unit according to the present invention.

[0038] Figure 2 Shows a separated cross-sectional view of an embodiment of a plasma-resistant O-ring evaluation unit according to the present invention.

[0039] Figure 3 Shows a cross-sectional view of an embodiment of a plasma-resistant O-ring evaluation unit according to the present invention.

[0040] Figure 4 And Figure 5 Shows an embodiment of adjusting the gap of the plasma gas penetration path in a plasma-resistant O-ring evaluation unit according to the present invention.

[0041] Figure 6 Shows an embodiment of a plasma-resistant O-ring evaluation device according to the present invention.

[0042] Figures 7 to 9 Shows another embodiment of a plasma-resistant O-ring evaluation unit according to the present invention.

[0043] Figure 10 Shows another embodiment of adjusting the gap of the plasma gas penetration path in a plasma-resistant O-ring evaluation unit according to the present invention.

[0044] Figure 11 And Figure 12 Shows yet another embodiment of a plasma-resistant O-ring evaluation unit according to the present invention.

[0045] (Description of Reference Numerals)

[0046] 10: Plasma-resistant O-ring evaluation device,

[0047] 20: Chamber,

[0048] 100, 200, 300: Plasma-resistant O-ring evaluation units,

[0049] 110, 210, 310: Covers,

[0050] 150, 250, 260, 270, 350, 360, 370: Bodies. Detailed implementation manners

[0051] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings, but the present invention is not limited or restricted to the embodiments.

[0052] To illustrate the present invention and the advantages in its operation and the purposes achieved through the implementation of the present invention, preferred embodiments of the present invention are exemplified below and viewed with reference thereto.

[0053] First, the terms used in this application are only used to describe specific embodiments and do not limit the present invention. Singular expressions may include plural expressions as long as it is not clearly indicated in the context. Additionally, in this application, terms such as "including" or "having" should be understood to mean the presence of the features, numbers, steps, operations, components, parts, or combinations thereof described in the specification, and do not preclude the existence or additional possibility of one or more other features, numbers, steps, operations, components, parts, or combinations thereof.

[0054] In the description of the present invention, when it is determined that a detailed description of a relevant well-known structure or function may obscure the key points of the present invention, its detailed description is omitted.

[0055] The present invention discloses a technology capable of installing various multiple O-rings in an O-ring evaluation unit and selectively exposing the O-rings to plasma in a plasma environment to quickly and accurately grasp the plasma resistance characteristics of the multiple O-rings and the different O-rings.

[0056] Figure 1 An embodiment of a plasma-resistant O-ring evaluation unit according to the present invention is shown, Figure 2 A separated cross-sectional view of an embodiment of a plasma-resistant O-ring evaluation unit according to the present invention is shown, Figure 3 A cross-sectional view of an embodiment of a plasma-resistant O-ring evaluation unit according to the present invention is shown.

[0057] The plasma-resistant O-ring evaluation unit 100 may include a cover 110, a body 150, a coupling fastener 120, etc.

[0058] The cover 110, the main body 150, the coupling fastener 120, etc. can be made of materials that are robust against plasma gas.

[0059] In the main body 150, a plurality of O-ring mounting grooves 153-1, 153-2, 153-3 corresponding to the shapes of the O-rings OR1, OR2, OR3 to be evaluated can be provided on the upper surface.

[0060] The O-ring mounting grooves 153-1, 153-2, 153-3 can be grooves that are recessed into the interior of the main body 150 with the upper surface formed to correspond to the shapes of the O-rings OR1, OR2, OR3 to be evaluated. As an example, the O-ring mounting grooves 153-1, 153-2, 153-3 can be formed in such a way that all or at least a part of the O-rings OR1, OR2, OR3 to be evaluated can be inserted.

[0061] In the main body 150, an internal penetration O-ring mounting groove 153-1 can be provided at the central part corresponding to the diameters of the O-rings OR1, OR2, OR3 to be evaluated with the center point as a reference, a sealing O-ring mounting groove 153-2 can be provided at the middle part, and an external penetration O-ring mounting groove 153-3 can be provided at the peripheral part.

[0062] The O-rings OR1, OR2, OR3 to be evaluated can be inserted and mounted in the O-ring mounting grooves 153-1, 153-2, 153-3 of the main body 150. The plurality of O-rings OR1, OR2, OR3 to be evaluated can be selected as O-rings with different sizes or different materials as objects for evaluating the plasma resistance characteristics. Alternatively, O-rings with different sizes but the same material can also be selected.

[0063] The cover 110 can be mounted above the main body 150. The cover 110 can press the O-rings OR1, OR2, OR3 to be evaluated against the upper surface of the main body 150. A cover internal penetration through-hole 111 for allowing plasma gas to penetrate into the interior can be provided at the central part of the cover 110. The cover internal penetration through-hole 111 can be formed by a hole that penetrates from the upper surface to the lower surface of the cover 110.

[0064] A main body internal penetration through-hole 151 connected to the cover internal penetration through-hole 111 can also be provided in the main body 150. Whether or not to provide the main body internal penetration through-hole 151 of the main body 150 can be selective.

[0065] Fastener through-holes 115 for coupling with the main body 150 can be provided along the circumference at the peripheral part of the cover 110, and fastener fastening grooves 156 can be provided in the main body 150 corresponding to the fastener through-holes 115 of the cover 110.

[0066] The coupling fastener 120 can be inserted into the fastener through-hole 115 of the cover body 110 and fastened to the fastener fastening groove 156 of the main body 150.

[0067] The main body 150 and the cover body 110 can be coupled by fastening the coupling fastener 120 in a state where the evaluation target O-rings OR1, OR2, and OR3 are installed in the O-ring installation grooves 153-1, 153-2, and 153-3 of the main body 150.

[0068] With the coupling of the main body 150 and the cover body 110, a plasma gas penetration path through which the plasma gas penetrates into the installed evaluation target O-rings OR1, OR2, and OR3 can be formed.

[0069] The plasma gas penetration path may include an internal penetration path and a peripheral penetration path.

[0070] Referring to the above Figure 3 With the coupling of the main body 150 and the cover body 110, a gap D1 is formed at the internal contact surface where the main body 150 and the cover body 110 abut. The internal contact surface of the gap D1 functions as an internal penetration path, and the plasma gas flowing in through the internal penetration through-hole 111 of the cover body penetrates through the internal penetration path.

[0071] In addition, with the coupling of the main body 150 and the cover body 110, a gap D1 is also formed at the peripheral contact surface where the main body 150 and the cover body 110 abut. The peripheral contact surface of the gap D1 functions as a peripheral penetration path, and the plasma gas penetrates from the outside through the peripheral penetration path.

[0072] The plasma gas penetrating through the internal penetration path contacts the evaluation target O-ring OR1 installed in the internal penetration O-ring installation groove 153-1, whereby the plasma resistance characteristics of the evaluation target O-ring OR1 can be grasped.

[0073] In addition, the plasma gas penetrating through the peripheral penetration path contacts the evaluation target O-ring OR3 installed in the external penetration O-ring installation groove 153-3, whereby the plasma resistance characteristics of the evaluation target O-ring OR3 can be grasped.

[0074] Furthermore, the plasma gas penetrating through the internal penetration path can contact the evaluation target O-ring OR1 installed in the internal penetration O-ring installation groove 153-1 and continue to penetrate partially at the same time. The evaluation target O-ring OR2 installed in the sealing O-ring installation groove 153-2 can perform a sealing function to cut off the plasma gas penetrating through the internal penetration path from further diffusing.

[0075] In addition, the plasma gas can come into contact with the O-ring OR3 to be evaluated installed in the external penetration O-ring installation groove 153-3 through the peripheral penetration path, and at the same time, a part of the plasma gas continues to penetrate. The O-ring OR2 to be evaluated installed in the sealing O-ring installation groove 153-2 can perform a sealing function to cut off the further diffusion of the plasma gas penetrating through the peripheral penetration path.

[0076] That is, due to the sealing function of the O-ring OR2 to be evaluated installed in the sealing O-ring installation groove 153-2, the plasma gas penetrating through the internal penetration path cannot further diffuse outward, and the plasma gas penetrating through the peripheral penetration path cannot further diffuse inward.

[0077] Thus, for the O-ring OR1 to be evaluated installed in the internal penetration O-ring installation groove 153-1, the plasma resistance characteristics based on the internal penetration of the plasma gas can be evaluated, and for the O-ring OR3 to be evaluated installed in the external penetration O-ring installation groove 153-3, the plasma resistance characteristics based on the external penetration of the plasma gas can be evaluated.

[0078] Furthermore, the plasma-resistant O-ring evaluation unit according to the present invention can adjust the penetration amount of the plasma gas to evaluate the plasma resistance characteristics of the O-ring to be evaluated based thereon. Regarding this, Figure 4 and Figure 5 FIG. shows an embodiment of adjusting the gap of the plasma gas penetration path in the plasma-resistant O-ring evaluation unit according to the present invention.

[0079] In the description of this embodiment, the description of the same or similar structures as those in the above Figures 1 to 3 embodiment described above is omitted or briefly described.

[0080] A gap adjustment ring 130 can be provided between the cover 110 and the main body 150, and the gap adjustment ring 130 can be fixedly fastened by a fastening member 120.

[0081] As described above Figure 5 shown, the gap adjustment ring 130 is disposed between the cover 110 and the main body 150, so that the contact between the main body 150 and the cover 110 can expand the gap of the internal contact surface to D2, thereby correspondingly expanding the internal penetration path. In addition, the contact between the main body 150 and the cover 110 can also expand the gap of the peripheral contact surface to D2, thereby correspondingly expanding the peripheral penetration path.

[0082] By expanding the internal penetration path, the internal penetration amount of the plasma gas can be increased. In addition, by expanding the peripheral penetration, the external penetration amount of the plasma gas can be increased.

[0083] Furthermore, the number of configured clearance adjustment rings 130 or the thickness of the clearance adjustment rings 130 can be changed to adjust the internal contact surface clearance and the peripheral contact surface clearance, whereby the permeation amount of the plasma gas can be adjusted.

[0084] By disposing the plasma-resistant O-ring evaluation unit according to the present invention, which has been described above, in a plasma-resistant evaluation apparatus, it is possible to perform a plasma resistance evaluation of various types and multiple O-rings all at once.

[0085] The plasma-resistant O-ring evaluation apparatus according to the present invention may include a chamber provided with an O-ring evaluation space for providing a plasma environment, a plasma-resistant O-ring evaluation unit disposed in the O-ring evaluation space, and a plasma environment construction unit for constructing a plasma environment in the O-ring evaluation space of the chamber.

[0086] The plasma environment construction unit may construct a plasma environment in the O-ring evaluation space of the chamber by a CCP (capacitive coupled plasma) method. Alternatively, the plasma environment construction unit may construct a plasma environment in the O-ring evaluation space of the chamber by an ICP (inductively coupled plasma) method.

[0087] Figure 6 An embodiment of the plasma-resistant O-ring evaluation apparatus according to the present invention is shown.

[0088] It may be that the chamber 20 of the plasma-resistant O-ring evaluation apparatus 10 has an O-ring evaluation space 25 provided therein, and the plasma-resistant O-ring evaluation unit 100 described above is disposed in the O-ring evaluation space 25.

[0089] As an example, the plasma-resistant O-ring evaluation unit 100 may be placed on a support table 30.

[0090] The plasma environment construction unit may include a gas supply member 70 for supplying gas to the O-ring evaluation space 25 of the chamber 20 and an RF power supply member for constructing a plasma environment in the O-ring evaluation space 25 by arc discharge.

[0091] The RF power supply member may include an upper power supply member 50 and a lower power supply member 60. The upper power supply member 50 may include a wire 51 and a power supply unit 55. The lower power supply member 60 may include an electrode 61 and a power supply unit 65.

[0092] Furthermore, an exhaust line 81 for exhausting the gas in the chamber 20 and an exhaust pump 80 may be provided.

[0093] In the above Figure 6Among them, the plasma-resistant O-ring evaluation device can be deformed in various ways. In addition, in the above Figure 6 Among them, the plasma-resistant O-ring evaluation device is described in the ICP method, but the CCP method can also be applied.

[0094] Through such a plasma-resistant O-ring evaluation device, the plasma-resistant characteristics of various types of O-rings can be evaluated quickly and accurately.

[0095] The plasma-resistant O-ring evaluation unit according to the present invention can be deformed in various ways. Next, let's look at another embodiment of the plasma-resistant O-ring evaluation unit according to the present invention.

[0096] Figures 7 to 9 Another embodiment of the plasma-resistant O-ring evaluation unit according to the present invention is shown.

[0097] In the description of this embodiment, the description of the same or similar structures as those in the previous embodiments is omitted or briefly described.

[0098] The plasma-resistant O-ring evaluation unit 200 can be composed of sequentially installing a plurality of main bodies 250, 260, and 270 below the cover body 210. For example, as described above Figure 7 The first main body 250, the second main body 260, and the third main body 270 can be sequentially installed below the cover body 210.

[0099] In the above Figure 7 Among them, the main body is composed of three main bodies, namely the first main body 250, the second main body 260, and the third main body 270, but it can also be composed of two main bodies according to the situation, or it can be composed of four or more main bodies.

[0100] Taking the first main body 250 as a reference, the cover body 210 can be installed above the first main body 250 as the upper main body, and the second main body 260 can be installed below it as the lower main body.

[0101] O-ring installation grooves can be provided in each of the main bodies 250, 260, and 270. As an example, in each of the main bodies 250, 260, and 270, an internal penetration O-ring installation groove 253-1, 263-1, 273-1 can be provided at the central part, a sealing O-ring installation groove 253-2, 263-2, 273-2 can be provided at the middle part, and an external penetration O-ring installation groove 253-3, 263-3, 273-3 can be provided at the outer peripheral part.

[0102] According to the situation, the number and shape of the O-ring installation grooves of each main body can also be deformed differently.

[0103] Evaluation object O-rings can be installed in the O-ring installation grooves of each of the main bodies 250, 260, and 270.

[0104] The O - ring of the evaluation object can be installed in the O - ring installation grooves of each main body 250, 260, 270, and then the cover 210 can be successively combined with each main body 250, 260, 270.

[0105] It can be that a fastener through - hole 215 is provided in the cover 210, and fastener through - holes 255, 265, 275 are also provided in each main body 250, 260, 270. Moreover, fastener fastening grooves 256, 266, 276 can be provided in each main body 250, 260, 270.

[0106] It can be that when combining the cover 210 and each main body 250, 260, 270, the first main body 250 and the second main body 260 are arranged in such a way that the fastener through - holes 215 of the cover 210 correspond to the fastener through - holes 255, 265 of the first main body 250 and the second main body 260, and the third main body 270 is arranged below in such a way that it corresponds to the fastener fastening groove 276 of the third main body 270.

[0107] In this way, in the state where the cover 210, the first main body 250, the second main body 260, and the third main body 270 are provided, the combined fastener 220 is inserted from the fastener through - hole 215 of the cover 210 into the fastener through - holes 255, 265 of the first main body 250 and the second main body 260 and fastened to the fastener fastening groove 276 of the third main body 270, so that the cover 210, the first main body 250, the second main body 260, and the third main body 270 can be combined.

[0108] It can be that the cover 210, the first main body 250, the second main body 260, and the third main body 270 are combined, and the internal penetration through - hole 211 of the cover 210 and the main - body internal penetration through - holes 251, 261, 271 of each main body 250, 260, 270 are connected to each other, whereby internal penetration of the plasma gas can be formed.

[0109] Furthermore, the contact surface gaps between the cover 210, the first main body 250, the second main body 260, and the third main body 270 can be adjusted differently. Regarding this, Figure 10 Another embodiment of adjusting the gap of the plasma gas penetration path in the plasma - resistant O - ring evaluation unit according to the present invention is shown.

[0110] It can be that a first gap - adjusting ring 231 is installed between the cover 210 and the first main body 250 through the combined fastener 220, and a second gap - adjusting ring 235 is installed between the first main body 250 and the second main body 260 through the combined fastener 220. Moreover, no gap - adjusting ring is installed between the second main body 260 and the third main body 270.

[0111] As viewed in the above Figure 10 As shown, the contact surface gap between the cover body 210 and the first main body 250 can be relatively greatly widened to D13 by the first gap adjusting ring 231, and accordingly, the internal penetration path and the peripheral penetration path are expanded. Thereby, the penetration amount of the plasma gas can be greatly increased compared to the plasma gas penetration path between the second main body 260 and the third main body 270 where the gap adjusting ring is not applied.

[0112] In addition, the contact surface gap between the cover body 210 and the first main body 250 can be relatively slightly widened to D12 by the second gap adjusting ring 235, and accordingly, the internal penetration path and the peripheral penetration path are expanded. The penetration amount of the plasma gas is slightly increased compared to the plasma gas penetration path between the second main body 260 and the third main body 270 where the gap adjusting ring is not applied.

[0113] The contact surface gap between the second main body and the third main body is D11, and the plasma gas penetration path is relatively narrow, so the plasma gas can penetrate correspondingly less.

[0114] In this way, the penetration amount of the plasma gas can be adjusted in various ways to quickly and accurately evaluate the plasma resistance characteristics of the O-ring under various conditions.

[0115] Figure 11 And Figure 12 Another embodiment of the plasma-resistant O-ring evaluation unit according to the present invention is shown.

[0116] In the description of this embodiment, the description of the same or similar structures as those in the previous embodiments is omitted or briefly described.

[0117] The plasma-resistant O-ring evaluation unit 300 can be formed by combining a cover body 310 and a plurality of main bodies 350, 360, 370.

[0118] The fastener fastening groove 376 of the third main body 370 can be set corresponding to the fastener through hole 365 of the second main body 360 to arrange the second main body 360 and the third main body 370, and the second main body 360 and the third main body 370 are combined by the third combining fastener 325.

[0119] And the fastener fastening groove 366 of the second main body 360 can be set corresponding to the fastener through hole 355 of the first main body 350 to arrange the first main body 350 and the second main body 360, and the first main body 350 and the second main body 360 are combined by the second combining fastener 323.

[0120] Finally, the fastening groove 356 of the first body 350 can be set corresponding to the fastening through-hole 315 of the cover body 310, and the cover body 310 and the first body 350 can be combined by the first coupling fastener 321.

[0121] In this way, the cover body and the plurality of bodies can be combined in various ways to form a plasma-resistant O-ring evaluation unit.

[0122] The above description only illustratively describes the technical concept of the present invention. Those with ordinary knowledge in the technical field to which the present invention pertains can make various modifications and deformations without departing from the substantial features of the present invention. Therefore, the embodiments described in the present invention are used to illustrate the technical concept of the present invention rather than to limit the technical concept of the present invention. The technical concept of the present invention is not limited to such embodiments. The protection scope of the present invention should be interpreted by the appended claims and should be interpreted to include all technical concepts within the scope equivalent thereto in the scope of the claims of the present invention.

Claims

1. A plasma resistant O-ring evaluation unit, characterized in that: include: a main body, on which an O-ring mounting groove corresponding to the shape of the O-ring to be evaluated is provided; as well as A cover body is installed above the main body. As the main body and the cover are combined, a plasma gas permeation path is formed for the plasma gas to permeate toward the mounted evaluation object O-ring.

2. The plasma resistant O-ring evaluation unit according to claim 1, characterized in that: The cover body is provided with a cover body internal penetration through hole supporting the internal penetration of plasma gas, The plasma gas permeation path comprises: an internal permeation path formed by an internal contact surface gap where the main body and the cover body abut against each other as the main body and the cover body are combined, and the plasma gas flowing in through the internal permeation through hole of the cover body permeates through the internal contact surface gap; and The peripheral infiltration path is formed by a peripheral contact surface gap where the main body and the cover body abut against each other as the main body and the cover body are combined, and the plasma gas infiltrates from the outside through the peripheral contact surface gap.

3. The plasma resistant O-ring evaluation unit according to claim 2, characterized in that: The cover body is provided with a cover body internal penetration through hole in the central part to support the internal penetration of plasma gas. The subject includes: Internal permeable O-ring installation groove, set in the center; A sealing O-ring mounting groove is provided in the middle portion; and Externally penetrated O-ring mounting grooves are provided at the peripheral portion.

4. The plasma resistant O-ring evaluation unit according to claim 3, characterized in that: The flow of the plasma gas permeated through the inner permeation path and the outer peripheral permeation path is blocked by the O-ring installed in the sealing O-ring installation groove.

5. The plasma resistant O-ring evaluation unit according to claim 2, characterized in that: The main body is provided with a main body internal penetration through hole connected to the internal penetration through hole of the cover body.

6. The plasma resistant O-ring evaluation unit according to claim 2, characterized in that: The cover body is provided with a fastener through hole for connecting with the main body, The main body is provided with a fastener fastening groove corresponding to the fastener through hole of the cover body, The plasma resistant O-ring evaluation unit also includes: The fastener is inserted into the fastener through hole of the cover body and fastened to the fastener fastening groove of the main body.

7. The plasma resistant O-ring evaluation unit according to claim 6, characterized in that: The plasma resistant O-ring evaluation unit also includes: A gap adjustment ring is fastened by the combining fastener between the cover body and the main body.

8. The plasma resistant O-ring evaluation unit according to claim 7, characterized in that: The inner contact surface gap and the outer contact surface gap are adjusted by changing the number of the gap adjustment rings.

9. The plasma resistant O-ring evaluation unit according to claim 7, characterized in that: The inner contact surface gap and the outer contact surface gap are adjusted by changing the thickness of the gap adjustment ring.

10. The plasma resistant O-ring evaluation unit according to claim 3, characterized in that: The subject includes: an upper body, on which the cover is mounted; and The upper body is installed on the lower body.

11. The plasma resistant O-ring evaluation unit according to claim 3, characterized in that: The main body includes a plurality of main bodies which are sequentially installed below the cover body.

12. The plasma resistant O-ring evaluation unit according to claim 10, characterized in that: The upper body is provided with a body internal penetration through hole connected to the cover body internal penetration through hole.

13. The plasma resistant O-ring evaluation unit according to claim 10, characterized in that: The cover body and the upper body are provided with fastener through holes, The lower body is provided with a fastener fastening groove corresponding to the fastener through hole, The plasma resistant O-ring evaluation unit also includes: The coupling fastener is inserted into the fastener through-hole and fastened to the fastener fastening groove.

14. The plasma resistant O-ring evaluation unit according to claim 13, characterized in that: The plasma resistant O-ring evaluation unit also includes: A gap adjustment ring is selectively fastened by the combining fastener between the cover body and the upper body or between the upper body and the lower body.

15. The plasma resistant O-ring evaluation unit according to claim 10, characterized in that: The cover body is provided with a fastener through hole for connecting with the upper body, The upper body is provided with a fastener fastening groove corresponding to the fastener through hole of the cover body and a fastener through hole for connecting with the lower body, The plasma resistant O-ring evaluation unit also includes: A first coupling fastener inserted into the fastener through hole of the cover body and fastened to the fastener fastening groove of the upper body; and The second coupling fastener is inserted into the fastener through hole of the upper body and fastened to the fastener fastening groove of the lower body.

16. The plasma resistant O-ring evaluation unit according to claim 15, characterized in that: The plasma resistant O-ring evaluation unit also includes: A gap adjustment ring is fastened between the cover body and the upper body by the first fastener or between the upper body and the lower body by the second fastener.

17. A plasma resistant O-ring evaluation device, characterized in that: include: A chamber is provided with an O-ring evaluation space for providing a plasma environment; The plasma-resistant O-ring evaluation unit according to claim 1, arranged in the O-ring evaluation space; and The plasma environment construction unit constructs a plasma environment in the O-ring evaluation space of the chamber.

18. The plasma-resistant O-ring evaluation device according to claim 17, characterized in that: The plasma environment construction unit constructs a plasma environment in the O-ring evaluation space of the chamber by a CCP method.

19. The plasma-resistant O-ring evaluation device according to claim 17, characterized in that: The plasma environment construction unit constructs a plasma environment in the O-ring evaluation space of the chamber by an ICP method.

20. A plasma resistant O-ring evaluation device, characterized in that: include: The cover body is provided with an internal penetration through hole of the cover body in the central part to support the internal penetration of the plasma gas, and is installed above the main body; A plurality of main bodies, the plurality of main bodies are sequentially installed under the cover body, the main body is provided with a main body internal penetration through hole connected to the internal penetration through hole of the cover body, and includes an internal penetration O-ring installation groove provided at the center portion of the upper surface corresponding to the shape of each different evaluation object O-ring, a sealing O-ring installation groove provided at the middle portion of the upper surface, and an external penetration O-ring installation groove provided at the peripheral portion of the upper surface; as well as A plasma-resistant O-ring evaluation unit, comprising a plasma gas permeation path, wherein the plasma gas permeation path comprises: an internal permeation path formed by an internal contact surface gap where the main body, the cover body, and the main body abut with each other as the main body and the cover body are combined and the main bodies are combined, and plasma gas flowing in through the internal permeation through hole of the cover body or the internal permeation through hole of the main body permeates through the internal contact surface gap; and a peripheral permeation path formed by a peripheral contact surface gap where the main body, the cover body, and the main body abut with each other as the main body and the cover body are combined and the main bodies are combined, and plasma gas permeates from the outside through the peripheral contact surface gap; a chamber provided with an O-ring evaluation space providing a plasma environment, wherein the plasma-resistant O-ring evaluation unit is arranged in the O-ring evaluation space; and The plasma environment construction unit constructs a plasma environment in the O-ring evaluation space of the chamber.

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