Alkali-resistant substance composite film layer, preparation method, product and equipment

Abstract

The invention relates to a composite film layer of an alkali-resistant substance, a preparation method, a product and equipment, the composite film layer comprises a base material layer, a bottom layer arranged on the base material layer and a fluorine-containing compound layer arranged on the bottom layer, the material of the bottom layer contains a metal oxide, and the metal oxide is chemically bonded with the material of the fluorine-containing compound layer. The alkali resistance of the composite film layer can be improved, and the method is applied to the technical field of material protection.

Description

Technical Field

[0001] The present invention relates to the technical field of material protection, and particularly relates to a composite film layer resistant to alkaline substances, a preparation method, an article and a device. Background Art

[0002] In the existing solution, silica is used as an underlayer. The end - group structures of this underlayer, the glass + hard film structure, and the anti - fingerprint layer are similar. Although it can play a certain connecting role, the bonding force between the anti - fingerprint layer and the underlayer is poor, and it does not have the ability to resist the corrosion of alkaline substances (such as alkaline liquids). Summary of the Invention

[0003] In view of this, the purpose of the present invention is to provide a composite film layer resistant to alkaline substances, a preparation method, an article and a device, which can improve the alkali resistance of the composite film layer.

[0004] On the one hand, the present invention provides a composite film layer resistant to alkaline substances. The composite film layer includes a substrate layer, an underlayer disposed on the substrate layer, and a fluorine - containing compound layer disposed on the underlayer;

[0005] The material of the underlayer contains metal oxides, and the metal oxides are chemically bonded to the material of the fluorine - containing compound layer.

[0006] Optionally, the material of the underlayer includes a mixture of silicon oxide and the metal oxide.

[0007] Optionally, the molar mass proportion of the metal oxide in the mixture includes 0.0001 - 20.1%.

[0008] Optionally, the thickness range of the underlayer is 4.9 - 20.1 nm.

[0009] Optionally, the material of the fluorine - containing compound layer includes a fluorosiloxane compound, and the metal oxides are chemically bonded to the fluorosiloxane compound.

[0010] On the other hand, the present invention provides a preparation process of a composite film layer, including the following steps:

[0011] Pretreat the substrate layer;

[0012] Evaporate at least one underlayer containing metal oxides on the pretreated substrate layer;

[0013] Deposit at least one fluorine - containing compound layer that chemically bonds with the metal oxides on the underlayer, and let it stand for a preset time to obtain a composite film layer resistant to alkaline substances.

[0014] Optionally, evaporating at least one underlayer containing metal oxides on the pretreated substrate layer specifically includes:

[0015] The mixture containing silicon oxide and the metal oxide is evaporated by an electron beam, oxygen is filled into the evaporated mixture, and the mixture filled with oxygen is deposited on the substrate layer to form the underlayer.

[0016] Optionally, at least one fluorine-containing compound layer that chemically bonds with the metal oxide is deposited on the underlayer, and left standing for a preset time to obtain a composite film layer resistant to alkaline substances, specifically including:

[0017] The fluorosiloxane compound capable of chemically bonding with the metal oxide is vapor-deposited in a vacuum environment, and the vapor-deposited fluorosiloxane compound is deposited on the underlayer in the vacuum environment for 6.5 - 8.5 minutes and left standing for a preset time to obtain a composite film layer resistant to alkaline substances.

[0018] On the other hand, the present invention provides a glass product, and the glass of the glass product includes at least one of the above-mentioned composite film layers.

[0019] On the other hand, the present invention provides an electronic device, and the electronic device includes a screen, and the screen includes at least one of the above-mentioned composite film layers.

[0020] Implementing the present invention includes the following beneficial effects: The present invention adds a metal oxide to the underlayer of the composite film layer, enabling the metal oxide to form chemical bonds with substances in the fluorine-containing compound layer, such as Si-O-M bonds, where M is a metal. The relatively stable chemical bonds make the structure between the underlayer and the fluorine-containing compound layer more dense, and it is difficult for alkaline liquids, etc. to break the chemical bonds between the fluorine-containing compound layer and the underlayer, increasing the corrosion resistance time and improving the alkali resistance of the composite film layer. Description of the Drawings

[0021] Wherein, 1 - substrate layer, 2 - underlayer, 3 - fluorine-containing compound layer, 4 - chemical bond.

[0022] Figure 1 is a schematic structural diagram of a composite film layer resistant to alkaline substances provided by the present invention;

[0023] Figure 2 is a flowchart of the steps of a preparation process of a composite film layer provided by the present invention. Detailed Embodiments

[0024] The following further elaborates the present invention in detail with reference to the drawings and specific embodiments. For the step numbers in the following embodiments, they are only set for the convenience of elaboration and illustration, and no limitation is imposed on the order between the steps. The execution order of each step in the embodiments can be adaptively adjusted according to the understanding of those skilled in the art.

[0025] The terms used in the embodiments of the present application are for the purpose of describing specific embodiments only and are not intended to limit the embodiments of the present application. The singular forms "a" and "the" used in the embodiments of the present application and the appended claims are also intended to include the plural forms unless the context clearly dictates otherwise.

[0026] When the following description refers to the accompanying drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present application. On the contrary, they are merely examples of devices and methods consistent with some aspects of the present application as detailed in the appended claims.

[0027] In some embodiments, as Figure 1 shown, Figure 1 is a schematic structural view of a composite film layer of an alkali-resistant substance. The present invention provides a composite film layer of an alkali-resistant substance. The composite film layer includes a substrate layer, an underlayer disposed on the substrate layer, and a fluorine-containing compound layer disposed on the underlayer; the material of the underlayer contains metal oxide, and the metal oxide is chemically bonded to the material of the fluorine-containing compound layer.

[0028] Specifically, the fluorine-containing compound layer has the characteristics of anti-fingerprint and hydrophobicity, and it can be, but is not limited to, an anti-fingerprint (AF) layer. The substrate layer can be, but is not limited to, a glass substrate or a glass + hard film substrate. The chemical bonding can be, but is not limited to, forming a covalent bond or a coordination bond.

[0029] In some embodiments, the material of the underlayer includes a mixture of silicon oxide and metal oxide; specifically, the metal oxide can be, but is not limited to, one or more of indium tin oxide, zinc oxide, tin dioxide, titanium oxide, antimony tin oxide, tin oxide, and aluminum oxide, and indium tin oxide is preferred.

[0030] Among them, after indium tin oxide, antimony tin oxide (ATO), tin dioxide (SnO2), aluminum oxide (Al2O3), titanium oxide (TiO2) are combined with SIO2 and then combined with the AF layer, the water contact angle is between 100 and 120, and the alkali resistance test is good.

[0031] In some embodiments, the molar mass ratio of the metal oxide in the mixture includes 0.0001 - 20.1%. For example, the molar mass ratio of the metal oxide in the mixture can be 1%, 5%, 10%, 15% or 20%.

[0032] In some embodiments, the thickness range of the underlayer is 4.9 - 20.1 nm. Specifically, the thickness range of the underlayer can be 5 - 20 nm, such as 10 nm, 11 nm, 13 nm, 15 nm, 16 nm, 18 nm or 19 nm.

[0033] In some embodiments, the material of the fluorine-containing compound layer includes a fluorosiloxane compound, and a metal oxide is chemically bonded to the fluorosiloxane compound; chemical bonding means forming a chemical bond, such as a Si-O-M bond, where Si represents silicon, O represents an oxygen atom, and M is a metal. Specifically, the fluorosiloxane compound can be but is not limited to perfluoropolyether siloxane, and the material of the fluorine-containing compound layer can also include fluorinated oil, etc.

[0034] In some embodiments, as Figure 2 shown, Figure 2 is a flowchart of the steps of a preparation process of a composite film layer. The present invention provides a preparation process of a composite film layer, which can be applied to prepare the composite film layer described above, and includes the following steps:

[0035] S1. Pretreat the substrate layer.

[0036] Specifically, put the substrate into deionized water or a solvent pool for ultrasonic cleaning to remove impurities on the surface of the substrate, and then dry it to obtain the substrate layer.

[0037] S2. Evaporate at least one primer layer containing a metal oxide on the pretreated substrate layer.

[0038] Specifically, use an electron beam to evaporate a mixture containing silicon oxide and a metal oxide, fill oxygen into the evaporated mixture, and deposit the mixture filled with oxygen on the substrate layer to form a primer layer.

[0039] Among them, the explanations of the metal oxide and the primer layer are the same as those described above. The relevant explanations of the mixture are the same as those described above. The deposition time can be but is not limited to more than 1.5 minutes, such as 2 minutes.

[0040] S3. Deposit at least one fluorine-containing compound layer that chemically bonds with the metal oxide on the primer layer, and let it stand for a preset time to obtain a composite film layer of an alkali-resistant substance.

[0041] Specifically, evaporate the fluorosiloxane compound that can chemically bond with the metal oxide in a vacuum environment, and deposit the evaporated fluorosiloxane compound on the primer layer for 6.5 - 8.5 minutes in the vacuum environment, and let it stand for a preset time to obtain a composite film layer of an alkali-resistant substance.

[0042] Among them, the explanations of the fluorosiloxane compound and the fluorine-containing compound layer are the same as those described above. The environmental parameters of the vacuum environment can be but are not limited to a vacuum degree of 10 -3 Pa - 10 -5Pa, at a temperature of 30 - 200 °C and an environmental humidity of ≤ 70%. The deposition time can also be 7 - 8 minutes. The preset time can be but is not limited to 7.5 - 12.5 hours, for example, 8 - 12 hours.

[0043] On the other hand, the present invention provides a glass product, and the glass of the glass product includes at least one layer of the front composite film layer.

[0044] Among them, the glass product can be but is not limited to window glass, the screen of electronic products, glassware, glass cups, etc.

[0045] On the other hand, the present invention provides an electronic device, and the electronic device includes a screen, and the screen includes at least one layer of the front composite film layer.

[0046] Among them, the electronic device can be but is not limited to mobile phones, tablets, computers, scanners, printers, electronic watches, etc.

[0047] The present invention also has the following beneficial effects:

[0048] In the present invention, metal oxides are added to the underlayer of the composite film layer, so that the metal oxides and the siloxane in the fingerprint-proof layer form a stable network structure through the Si-O-M bond, hindering the penetration of alkaline substances. Among them, M represents a metal, and the relatively stable chemical bond makes the structure between the underlayer and the fluorinated compound layer more dense. It is difficult for alkaline liquids and the like to break the chemical bond between the fluorinated compound layer and the underlayer, increasing the corrosion resistance time and improving the alkali resistance of the composite film layer.

[0049] In addition, in the preparation process, the present invention fills oxygen into the mixture, which can increase the conductivity of the metal oxides, so that the metal oxides are more easily chemically bonded with the negatively charged perfluoropolyether siloxane, and with sufficient oxygen, the chemical bond is not easily broken, enhancing the alkali resistance of the underlayer and the fluorinated compound layer.

[0050] As shown in Table 1, the data of the alkaline test results of an example and a control group. Among them, the example is the technical solution of the present application, and the control group is the technical solution of the prior art. Five sample test points are selected for each group of examples and each group of control groups. As can be seen from Table 1, the water contact angle of each sample test point is ≥ 110° before the alkaline test. After the alkaline test, the water contact angles of the five examples of the present solution are still ≥ 110°, and the film layer does not fall off, while the water contact angles of the five control groups of the prior art are < 110°. And the film layer falls off. It can be seen that the technical solution of the present application is superior to the technical solution of the prior art.

[0051] Table 1

[0052]

[0053]

[0054] It is understood that the technical features in the foregoing embodiments can be combined with each other. For example, the above has specifically described the preferred embodiments of the present invention, but the present invention is not limited to the described embodiments. Those skilled in the art can also make various equivalent deformations or substitutions without departing from the spirit of the present invention, and these equivalent deformations or substitutions are all included within the scope defined by the claims of this application.

Claims

1. A composite film layer for alkaline-resistant substances, characterized in that, The composite film layer includes a substrate layer, a primer layer provided on the substrate layer, and a fluorine-containing compound layer provided on the primer layer; The material of the primer layer contains metal oxides, and the metal oxides are chemically bonded to the material of the fluorine-containing compound layer.

2. The composite film layer according to claim 1, wherein The material of the primer layer includes a mixture of silicon oxide and the metal oxides.

3. The composite film layer according to claim 2, wherein The molar mass ratio of the metal oxides in the mixture is 0.0001 - 20.1%.

4. The composite film layer according to claim 1, wherein, The thickness range of the primer layer is 4.9 - 20.1 nm.

5. The composite film layer according to claim 1, wherein The material of the fluorine-containing compound layer includes a fluorosiloxane compound, and the metal oxides are chemically bonded to the fluorosiloxane compound.

6. A preparation process of a composite film layer, characterized in that, It includes the following steps: Pre-treat the substrate layer; Evaporate at least one primer layer containing metal oxides on the pre-treated substrate layer; Deposit at least one fluorine-containing compound layer that chemically bonds with the metal oxides on the primer layer, and let it stand for a preset time to obtain a composite film layer resistant to alkaline substances.

7. The preparation process according to claim 6, characterized in that, Evaporating at least one primer layer containing metal oxides on the pre-treated substrate layer specifically includes: Using an electron beam to evaporate a mixture containing silicon oxide and the metal oxides, filling oxygen into the evaporated mixture, and depositing the mixture filled with oxygen on the substrate layer to form the primer layer.

8. The preparation process according to claim 6, characterized in that, Depositing at least one fluorine-containing compound layer that chemically bonds with the metal oxides on the primer layer, and letting it stand for a preset time to obtain a composite film layer resistant to alkaline substances, specifically includes: Evaporating and plating a fluorosiloxane compound that can chemically bond with the metal oxides in a vacuum environment, depositing the evaporated fluorosiloxane compound on the primer layer for 6.5 - 8.5 minutes in the vacuum environment, and letting it stand for a preset time to obtain a composite film layer resistant to alkaline substances.

9. A glass product, characterized in that, The glass of the glass product includes at least one composite film layer according to any one of claims 1 - 5.

10. An electronic device, characterized in that, The electronic device includes a screen, and the screen includes at least one composite film layer according to any one of claims 1 - 5.

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