High-frequency high-low voltage composite pulse plasma power supply device

Abstract

The invention provides a high-frequency high-low-voltage composite pulse plasma power supply device, which adopts a composite pulse control mode of high-voltage ignition and low-voltage holding current, and comprises a high-voltage direct-current circuit for providing voltage for enabling a plasma reactor to react; the first all-solid-state switch is used for outputting the high-voltage direct-current circuit in a pulse form to form high-voltage and high-frequency pulse electricity; the first one-way conduction circuit is used for conducting the high-voltage and high-frequency pulse electricity in a one-way mode and blocking current injection of the low-voltage side at the same time; the low-voltage direct-current circuit is used for providing voltage for maintaining arc in the plasma reactor for a period of time; the second all-solid-state switch is used for outputting the low-voltage direct-current circuit in a pulse form to form low-voltage high-frequency pulse electricity; the second one-way conduction circuit is used for conducting the low-voltage high-frequency pulse electricity in a one-way manner and blocking the current injection of the high-voltage side at the same time; and the plasma reactor is used for performing plasma reaction through high-voltage high-frequency pulse electric ignition and low-voltage high-frequency pulse electric maintenance arc state.

Description

Technical Field

[0001] The present invention relates to the technical field of plasma power supplies, and more particularly, to a high-frequency high-low voltage composite pulse plasma power supply device. Background Art

[0002] Plasma is a highly ionized gas state, which is widely used in fields such as material processing, surface treatment, environmental governance, and medical treatment. The generation of plasma usually requires applying a high voltage between electrodes to ionize gas molecules, forming a large number of free electrons and positive ions, thereby generating plasma. The plasma power supply is a key device to achieve this process, and its performance directly affects the generation efficiency and quality of plasma.

[0003] Currently, plasma power supplies mainly use DC power supplies, AC power supplies, or high-frequency pulse power supplies. These power supplies ionize gas molecules by applying a high voltage between electrodes to form plasma. The high-frequency high-voltage pulse power supply is one of the commonly used technologies. By applying high voltage to break down the electrodes, a high-energy arc is formed between the electrodes to generate plasma. When this power supply generates high voltage, it usually needs to increase the number of series-connected power tubes to increase the voltage, but this method will cause an increase in current, thereby leading to conduction loss problems.

[0004] Although the existing high-frequency high-voltage pulse power supplies have certain advantages in the generation of plasma, when generating high voltage, they need to increase the number of series-connected power tubes, which not only increases the complexity and cost of the equipment, but also causes an increase in current, leading to conduction loss problems. In addition, the high voltage continuously works for a period of time to maintain the arc channel, further increasing the energy consumption. These problems limit the popularization and use of plasma power supplies in large-scale industrial applications. Therefore, it is of great practical significance to develop a plasma power supply technology that can effectively reduce energy consumption and reduce losses. Summary of the Invention

[0005] According to the above-mentioned technical problems, a high-frequency high-low voltage composite pulse plasma power supply device is provided. The present invention adopts a high-frequency composite pulse circuit design scheme of high-voltage ignition and low-voltage current maintenance. This scheme can effectively regulate the discharge energy and reduce the discharge loss, showing obvious advantages compared with the traditional DC-AC pulse scheme.

[0006] The technical means adopted by the present invention are as follows:

[0007] A high-frequency high-low voltage composite pulse plasma power supply device, comprising:

[0008] A high-voltage DC circuit for providing a voltage that can cause the plasma reactor to react;

[0009] The first all-solid-state switch is used to output a high-voltage DC circuit in the form of pulses to form a high-voltage high-frequency pulse current;

[0010] The first unidirectional conduction circuit is used to unidirectionally conduct the high-voltage high-frequency pulse current and block the current injection from the low-voltage side at the same time;

[0011] The low-voltage DC circuit is used to provide a voltage for maintaining the arc in the plasma reactor for a period of time;

[0012] The second all-solid-state switch is used to output the low-voltage DC circuit in the form of pulses to form a low-voltage high-frequency pulse current;

[0013] The second unidirectional conduction circuit is used to unidirectionally conduct the low-voltage high-frequency pulse current and block the current injection from the high-voltage side at the same time;

[0014] The plasma reactor is used to ignite through the high-voltage high-frequency pulse current and maintain the arc state through the low-voltage high-frequency pulse current to cause a plasma reaction.

[0015] Further, the high-voltage DC circuit includes: a first AC power supply, a first rectification circuit, a first filter capacitor, a full-bridge inverter circuit, a resonance circuit, a transformer, a voltage multiplier circuit, and a second filter capacitor, where:

[0016] The first AC power supply is a power supply of 220V mains electricity and is used to supply power to the high-voltage DC circuit;

[0017] The first rectification circuit includes four diodes. Among them, two series-connected diodes form a group, which is connected in parallel with another group of two series-connected diodes, and the middle of the two groups of series-connected diodes is respectively connected to the positive and negative poles of the first AC power supply, and is used to convert alternating current into unidirectional pulsating direct current;

[0018] The first filter capacitor is connected in parallel with the first rectification circuit and is used to filter the unidirectional pulsating direct current output by the first rectification circuit, reduce the AC pulsation ripple coefficient, and output smooth direct current;

[0019] The full-bridge inverter circuit includes four MOS tubes. Among them, two series-connected MOS tubes form a group, which is connected in parallel with another group of two series-connected MOS tubes, and the two groups of MOS tubes are connected in parallel with the first filter capacitor, and are used to invert the smooth direct current output by the first filter capacitor into positive and negative pulse currents;

[0020] The resonance circuit is connected to the output end of the full-bridge inverter circuit and includes a resonance circuit inductor and a resonance circuit capacitor, and serves as an absorption circuit to filter out interference signals;

[0021] The transformer has its primary side connected to the full-bridge inverter circuit and is used to transform the output on the primary side of the full-bridge inverter circuit into high-voltage alternating current;

[0022] The voltage doubling circuit includes two capacitors and two diodes, which are connected to the secondary terminal of the transformer and are used to double the voltage of the high-voltage alternating current transformed by the transformer and rectify it into direct current, and the voltage doubling parameter is two times.

[0023] The second filter capacitor is connected in parallel with the voltage doubling circuit and is used to filter the direct current output by the voltage doubling circuit, reduce the AC pulsation ripple coefficient, and store electrical energy at the same time.

[0024] Further, the first unidirectional conduction circuit is a high-voltage high-frequency pulse current unidirectional conduction diode; the second unidirectional conduction circuit is a low-voltage high-frequency pulse current unidirectional conduction diode.

[0025] Further, the plasma reactor is connected in parallel at both ends of the high-voltage high-frequency pulse current unidirectional conduction diode and the low-voltage high-frequency pulse current unidirectional conduction diode. When a high-voltage high-frequency pulse current is applied at both ends, a strong electric field is formed between the electrodes inside the plasma reactor, causing gas molecules to ionize and releasing a large number of free electrons and positive ions, thereby forming a plasma.

[0026] Further, the low-voltage DC circuit includes: a second AC power supply, a second rectifier circuit, a third filter capacitor, and a BUCK step-down circuit, where:

[0027] The second AC power supply is a 220V mains power supply and is used to supply power to the low-voltage DC circuit;

[0028] The second rectifier circuit includes four diodes. Among them, two series-connected diodes form a group and are connected in parallel with another group of two series-connected diodes, and the positive and negative poles of the second AC power supply are respectively connected between the two groups of series-connected diodes, and are used to convert alternating current into unidirectional pulsating direct current;

[0029] The third filter capacitor is connected in parallel with the second rectifier circuit and is used to filter the unidirectional pulsating direct current output by the second rectifier circuit, reduce the AC pulsation ripple coefficient, and output smooth direct current;

[0030] The BUCK step-down circuit is connected in parallel with the third filter capacitor and includes a switching tube, a storage inductor, a capacitor, a freewheeling diode, and a resistor. When the drive of the switching tube is at a high level, the switching tube conducts, the storage inductor is magnetized, the current flowing through the inductor increases linearly, and at the same time, the capacitor is charged to provide energy for the load; when the drive of the switching tube is at a low level, the switching tube turns off, the storage inductor discharges through the freewheeling diode, the inductor current decreases linearly, and the output voltage is maintained by the discharge of the output filter capacitor and the decreasing inductor current.

[0031] Further, the high-frequency high-voltage composite pulse plasma power supply device further includes: a consumption resistor, one end of the consumption resistor is connected to the high-voltage DC circuit, and the other end is connected to the first all-solid-state switch, for consuming the excessive electric energy of the high-frequency high-voltage pulse electricity.

[0032] Further, the high-frequency high-voltage composite pulse plasma power supply device further includes: a driving circuit for the full bridge, a first high-frequency driving circuit, a second high-frequency driving circuit, and a driving circuit for the BUCK, where:

[0033] The driving circuit for the full bridge is connected to the full-bridge inverter circuit, and is used to control the switching frequency and duty cycle of the 4 MOS transistors in the full-bridge inverter circuit, so that the full-bridge inverter circuit outputs pulsed electricity;

[0034] The first high-frequency driving circuit is connected to the first all-solid-state switch, and is used to control the switching frequency and duty cycle of the first all-solid-state switch;

[0035] The second high-frequency driving circuit is connected to the second all-solid-state switch, and is used to control the switching frequency and duty cycle of the second all-solid-state switch;

[0036] The driving circuit for the BUCK is connected to the BUCK step-down circuit, and is used to control the switching frequency and duty cycle of the switching transistor in the BUCK step-down circuit.

[0037] Further, the high-frequency high-voltage composite pulse plasma power supply device further includes: a controller, connected to the driving circuit for the full bridge, the first high-frequency driving circuit, the second high-frequency driving circuit, and the driving circuit for the BUCK, for controlling the switching frequency and duty cycle of the full-bridge inverter circuit, the first all-solid-state switch, the second all-solid-state switch, and the BUCK step-down circuit, and optimizing the working state of the plasma reactor.

[0038] Compared with the prior art, the present invention has the following advantages:

[0039] 1. A high-frequency high-voltage composite pulse plasma power supply device provided by the present invention reduces the high voltage required for the plasma power supply to maintain the arc by switching to low-voltage maintenance after high-voltage ignition, thereby reducing the overall power consumption. Compared with traditional DC or AC pulse power supplies, the power required for the present invention to maintain the plasma reaction is significantly reduced, effectively reducing energy waste and improving energy utilization efficiency.

[0040] 2. A high-frequency high-low voltage composite pulse plasma power supply device provided by the present invention uses all-solid-state switches to control the pulse output of high-voltage and low-voltage direct currents, avoiding the problem of increased current caused by increasing the number of power transistors in series in traditional power supplies, reducing the conduction loss caused by increased current, improving the conversion efficiency of the power supply, and extending the service life of the equipment.

[0041] 3. A high-frequency high-low voltage composite pulse plasma power supply device provided by the present invention prevents the mutual injection of high- and low-voltage side currents through a unidirectional conduction circuit (such as a diode) to ensure the stability of circuit operation; at the same time, PID control technology is used to adjust the switching frequencies and duty cycles of the full-bridge inverter circuit, all-solid-state switches, and BUCK bucking circuit, effectively avoiding circuit failures caused by the mutual injection of high- and low-voltage side currents, improving the stability and reliability of the system, and ensuring that the plasma reactor can operate stably under various working conditions.

[0042] 4. A high-frequency high-low voltage composite pulse plasma power supply device provided by the present invention uses a controller to monitor the working state of the plasma reactor in real time and adjusts the control strategy according to the feedback to ensure that the plasma reactor always operates at the best energy efficiency ratio state, improving the energy efficiency ratio of the plasma reactor, making it more efficient when generating plasma, further reducing energy consumption, and enhancing the overall performance.

[0043] 5. A high-frequency high-low voltage composite pulse plasma power supply device provided by the present invention uses a dual protection mechanism of a unidirectional conduction circuit and a controller to ensure that the circuit will not cause failures due to mutual current injection or overload during operation, improving the safety of the equipment, reducing safety accidents caused by circuit failures, and ensuring the safety of operators and equipment.

[0044] Through the above technical means, the present invention not only solves the deficiencies of existing plasma power supplies in terms of energy consumption, loss, and stability, but also significantly improves the energy efficiency ratio and safety of the plasma reactor, having broad application prospects and remarkable economic benefits. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or in the prior art, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0046] Figure 1 It is the circuit diagram of the high-frequency high-low voltage composite pulse plasma power supply device of the present invention.

[0047] Figure 2This is the structural block diagram of the high-frequency high-low voltage composite pulse plasma power supply device of the present invention.

[0048] In the figure: 1. High-voltage DC circuit; 101. First AC power supply; 102. First rectifier circuit; 103. First filter capacitor; 104. Full-bridge inverter circuit; 105. Resonant circuit inductor; 106. Resonant circuit capacitor; 107. Transformer; 108. Voltage multiplier circuit; 109. Second filter capacitor; 2. First all-solid-state switch; 3. First unidirectional conduction circuit; 4. Low-voltage DC circuit; 401. Second AC power supply; 402. Second rectifier circuit; 403. Third filter capacitor; 404. BUCK bucking circuit; 5. Second all-solid-state switch; 6. Second unidirectional conduction circuit; 7. Plasma reactor; 8. Consumption resistor; 9. Driving circuit of the full bridge; 10. First high-frequency driving circuit; 11. Second high-frequency driving circuit; 12. Driving circuit of BUCK; 13. Controller. Specific embodiments

[0049] In order to enable those skilled in the art to better understand the solution of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.

[0050] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and do not necessarily need to be used to describe a specific order or sequence. It should be understood that such data can be interchanged under appropriate circumstances so that the embodiments of the present invention described here can be implemented in an order other than those illustrated or described here. In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units does not necessarily have to be limited to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0051] As Figure 1 shown, the present invention provides a high-frequency high-low voltage composite pulse plasma power supply device, comprising:

[0052] A high-voltage DC circuit 1 for providing a voltage capable of causing the plasma reactor to react; in this embodiment, it is used to generate 10KV of high-voltage direct current.

[0053] The first all-solid-state switch 2 is used to output a high-voltage DC circuit in the form of pulses to form a high-voltage high-frequency pulse current;

[0054] The first unidirectional conduction circuit 3 is used to unidirectionally conduct the high-voltage high-frequency pulse current and block the current injection from the low-voltage side at the same time;

[0055] The low-voltage DC circuit 4 is used to provide a voltage for maintaining the arc in the plasma reactor for a period of time; in this embodiment, it is used to generate a low-voltage direct current of 100V.

[0056] The second all-solid-state switch 5 is used to output the low-voltage DC circuit in the form of pulses to form a low-voltage high-frequency pulse current;

[0057] The second unidirectional conduction circuit 6 is used to unidirectionally conduct the low-voltage high-frequency pulse current and block the current injection from the high-voltage side at the same time;

[0058] The plasma reactor 7 is used to ignite through the high-voltage high-frequency pulse current and maintain the arc state through the low-voltage high-frequency pulse current to cause a plasma reaction.

[0059] During specific implementation, as a preferred implementation mode of the present invention, as Figure 2 shown, the high-voltage DC circuit 1 includes: a first AC power supply 101, a first rectifier circuit 102, a first filter capacitor 103, a full-bridge inverter circuit 104, a resonance circuit, a transformer 107, a voltage multiplier circuit 108, and a second filter capacitor 109, where:

[0060] The first AC power supply 101 is a power supply of 220V mains electricity and is used to supply power to the high-voltage DC circuit;

[0061] The first rectifier circuit 102 includes four diodes. Among them, two series-connected diodes are a group, which are connected in parallel with another group of two series-connected diodes, and the middle of the two groups of series-connected diodes are respectively connected to the positive and negative poles of the first AC power supply 101, and are used to convert the relatively low-voltage alternating current output by the AC step-down circuit into a unidirectional pulsating direct current;

[0062] The filter capacitor 103 is connected in parallel with the first rectifier circuit 102 and is used to filter the unidirectional pulsating direct current output by the first rectifier circuit 102, reduce the AC pulsation ripple coefficient, and output a smooth direct current;

[0063] The full-bridge inverter circuit 104 includes four MOS transistors. Among them, two series-connected MOS transistors are a group, which are connected in parallel with another group of two series-connected MOS transistors, and the two groups of MOS transistors are connected in parallel with the filter capacitor 103, and are used to invert the smooth direct current output by the filter capacitor into positive and negative pulse currents;

[0064] The resonant circuit is connected to the output terminal of the full-bridge inverter circuit 104 and includes a resonant circuit inductor 105 and a resonant circuit capacitor 106, serving as an absorption circuit to filter out interference signals;

[0065] The primary side of the transformer 107 is connected to the full-bridge inverter circuit 104 and is used to convert the output of the full-bridge inverter circuit 104 on its primary side into high-voltage alternating current;

[0066] The voltage-doubling circuit 108 includes two capacitors and two diodes, is connected to the secondary side of the transformer 107, and is used to perform voltage-doubling rectification on the high-voltage alternating current transformed by the transformer 107 into direct current, with a voltage-doubling parameter of two times.

[0067] The second filter capacitor 109 is connected in parallel with the voltage-doubling circuit 108 and is used to filter the direct current output by the voltage-doubling circuit 108, reduce the alternating current ripple coefficient, and store electrical energy at the same time.

[0068] In specific implementation, as a preferred implementation manner of the present invention, as Figure 2 shown, the first unidirectional conduction circuit 3 is a high-voltage high-frequency pulse electricity unidirectional conduction diode; the second unidirectional conduction circuit 6 is a low-voltage high-frequency pulse electricity unidirectional conduction diode. In this embodiment, the diode used in this circuit is resistant to ultra-high voltage to prevent the voltage on the high-voltage side from breaking down the diode and causing the high-voltage side current to pour into the low-voltage side, resulting in circuit damage.

[0069] In specific implementation, as a preferred implementation manner of the present invention, as Figure 2 shown, the plasma reactor 7 is connected in parallel at both ends of the high-voltage high-frequency pulse electricity unidirectional conduction diode and the low-voltage high-frequency pulse electricity unidirectional conduction diode. When a high-voltage high-frequency pulse electricity is applied at both ends, a strong electric field is formed between the electrodes inside the plasma reactor 7, causing gas molecules to ionize and releasing a large number of free electrons and positive ions, thereby forming a plasma.

[0070] In specific implementation, as a preferred implementation manner of the present invention, as Figure 2 shown, the low-voltage DC circuit 4 includes: a second AC power supply 401, a second rectification circuit 402, a third filter capacitor 403, and a BUCK bucking circuit 404, where:

[0071] The second AC power supply 401 is a power supply of 220V of the commercial power and is used to supply power to the low-voltage DC circuit;

[0072] The second rectifying circuit 402 includes four diodes. Among them, two series-connected diodes form a group, which is connected in parallel with another group of two series-connected diodes. And the middle of the two groups of series-connected diodes are respectively connected to the positive and negative electrodes of the second AC power supply 401, and is used to convert the relatively low-voltage alternating current output by the AC step-down circuit into unidirectional pulsating direct current;

[0073] The third filter capacitor 403 is connected in parallel with the second rectifying circuit 402, and is used to filter the unidirectional pulsating direct current output by the second rectifying circuit 402, reduce the AC pulsation ripple coefficient, and output smooth direct current;

[0074] The BUCK step-down circuit 404 is connected in parallel with the third filter capacitor 403 and includes a switching tube, a storage inductor, a capacitor, a freewheeling diode, and a resistor. When the drive of the switching tube is at a high level, the switching tube conducts, the storage inductor is magnetized, the current flowing through the inductor increases linearly, and at the same time, the capacitor is charged to provide energy for the load. When the drive of the switching tube is at a low level, the switching tube turns off, the storage inductor discharges through the freewheeling diode, the inductor current decreases linearly, and the output voltage is maintained by the discharge of the output filter capacitor and the decreasing inductor current.

[0075] In specific implementation, as a preferred implementation manner of the present invention, as Figure 2 shown, the high-frequency high-voltage composite pulse plasma power supply device further includes: a consumption resistor 8. One end of the consumption resistor 8 is connected to the high-voltage DC circuit, and the other end is connected to the first all-solid-state switch 2, and is used to consume the excessive electric energy of the high-frequency high-voltage pulse electricity.

[0076] In specific implementation, as a preferred implementation manner of the present invention, as Figure 1 shown, the high-frequency high-voltage composite pulse plasma power supply device further includes: a full-bridge drive circuit 9, a first high-frequency drive circuit 10, a second high-frequency drive circuit 11, and a BUCK drive circuit 12, where:

[0077] The full-bridge drive circuit 9 is connected to the full-bridge inverter circuit 104, and is used to control the switching frequency and duty cycle of the 4 MOS tubes in the full-bridge inverter circuit 104, so that the full-bridge inverter circuit 104 outputs pulsed electricity;

[0078] The first high-frequency drive circuit 10 is connected to the first all-solid-state switch 2, and is used to control the switching frequency and duty cycle of the first all-solid-state switch 2;

[0079] The second high-frequency drive circuit 11 is connected to the second all-solid-state switch 5, and is used to control the switching frequency and duty cycle of the second all-solid-state switch 5;

[0080] The driving circuit 12 of the BUCK is connected to the BUCK step-down circuit 404 and is used to control the switching frequency and duty cycle of the switching tube in the BUCK step-down circuit 404.

[0081] During specific implementation, as a preferred implementation manner of the present invention, as Figure 1 shown, the high-frequency high-voltage composite pulse plasma power supply device further includes: a controller 13, which is connected to the driving circuit 9 of the full bridge, the first high-frequency driving circuit 10, the second high-frequency driving circuit 11, and the driving circuit 12 of the BUCK, and is used to control the switching frequency and duty cycle of the full-bridge inverter circuit 104, the first all-solid-state switch, the second all-solid-state switch, and the BUCK step-down circuit, so as to optimize the working state of the plasma reactor.

[0082] The principle of a high-frequency high-voltage composite pulse plasma power supply device provided by the present invention is as follows:

[0083] The plasma reactor generates an electric breakdown through high-voltage electricity in an extremely short time to form an arc (high-voltage ignition). After ignition, the resistance of the plasma is very small, and high-voltage electricity is not required to maintain the arc state for the plasma reaction. At this time, the high-voltage electricity is turned off and the low-voltage electricity is turned on. The plasma reaction occurs by using the low-voltage electricity to maintain the arc state. In a switching cycle, the duty ratio time of the high-voltage electricity is short, and the duty ratio time of the low-voltage electricity is long. The present invention reduces the power by means of the average voltage of the step-down voltage, thereby reducing the power of the entire plasma power supply.

[0084] The operation mode of a high-frequency high-voltage composite pulse plasma power supply device provided by the present invention is as follows:

[0085] The 220V alternating current enters the first rectifying circuit 102 for AC-to-DC conversion, and then passes through the first filter capacitor 103 to make the voltage smoother and reduce the AC ripple coefficient; then it passes through the full-bridge inverter circuit 104 to invert the direct current into alternating current. A series resonance circuit is used for absorption at the output end of the full-bridge inverter circuit 104 to filter out interference signals; then it passes through the high-frequency high-voltage transformer 107 to increase the voltage amplitude; then it passes through the voltage doubling circuit 108 to rectify and double the alternating current output by the high-frequency high-voltage transformer 107 into 10KV direct current; then it passes through the second filter capacitor 109 to filter the direct current output by the voltage doubling circuit 108, reduce the AC ripple coefficient, and store electrical energy at the same time; finally, the high-voltage direct current is changed into high-frequency high-voltage pulse electricity through the first all-solid-state switch 2, and is output through the first unidirectional conduction circuit 3 for ignition on the plasma reactor 7.

[0086] After successful ignition, a low voltage is required to maintain the arc. The low voltage is provided by high-frequency low-voltage pulses. The implementation principle is as follows: 220V alternating current enters the second rectifier circuit 402 for AC-DC conversion, and then passes through the third filter capacitor 403 to make the voltage smoother and reduce the AC ripple coefficient; then it passes through the BUCK bucking circuit 404 to step down the rectified DC voltage, and after stepping down, it passes through the second all-solid-state switch 5 to generate low-voltage high-frequency pulsed electricity; finally, it is output through the second unidirectional conduction circuit 6 to the plasma reactor 7 for arc maintenance work. In order to prevent the current on both the high-voltage and low-voltage sides from flowing into each other, a symmetrical diode circuit is set up to avoid interference. By controlling the conduction time of the two all-solid-state switches, the working state with the highest optimal energy efficiency ratio of the plasma is adjusted to achieve the purpose of reducing energy consumption.

[0087] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some or all of the technical features; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A high-frequency high-low voltage composite pulse plasma power supply device, characterized in that Comprising: A high-voltage DC circuit (1) for providing a voltage that enables a plasma reactor to react; A first all-solid-state switch (2) for outputting the high-voltage DC circuit in the form of pulses to form a high-voltage high-frequency pulse current; A first unidirectional conduction circuit (3) for unidirectionally conducting the high-voltage high-frequency pulse current and blocking the current injection from the low-voltage side at the same time; A low-voltage DC circuit (4) for providing a voltage to maintain the arc in the plasma reactor for a period of time; A second all-solid-state switch (5) for outputting the low-voltage DC circuit in the form of pulses to form a low-voltage high-frequency pulse current; A second unidirectional conduction circuit (6) for unidirectionally conducting the low-voltage high-frequency pulse current and blocking the current injection from the high-voltage side at the same time; A plasma reactor (7) for igniting by the high-voltage high-frequency pulse current and maintaining the arc state by the low-voltage high-frequency pulse current to cause a plasma reaction.

2. The high-frequency high-low voltage composite pulse plasma power supply device according to claim 1, wherein The high-voltage DC circuit (1) includes: a first AC power supply (101), a first rectification circuit (102), a first filter capacitor (103), a full-bridge inverter circuit (104), a resonant circuit, a transformer (107), a voltage multiplier circuit (108), and a second filter capacitor (109), where: The first AC power supply (101), which is a power supply of 220V mains electricity, is used to supply power to the high-voltage DC circuit; The first rectification circuit (102) includes four diodes. Among them, two series-connected diodes are in a group, which is connected in parallel with another group of two series-connected diodes, and the positive and negative poles of the first AC power supply (101) are respectively connected between the two groups of series-connected diodes, and are used to convert alternating current into unidirectional pulsating direct current; The first filter capacitor (103) is connected in parallel with the first rectification circuit (102) and is used to filter the unidirectional pulsating direct current output by the first rectification circuit (102), reduce the AC pulsation ripple coefficient, and output smooth direct current; The full-bridge inverter circuit (104) includes four MOS tubes. Among them, two series-connected MOS tubes are in a group, which is connected in parallel with another group of two series-connected MOS tubes, and the two groups of MOS tubes are connected in parallel with the first filter capacitor (103), and are used to invert the smooth direct current output by the filter capacitor into positive and negative pulse currents; The resonant circuit is connected to the output end of the full-bridge inverter circuit (104) and includes a resonant circuit inductor (105) and a resonant circuit capacitor (106) for filtering out interference signals; The transformer (107), whose primary side is connected to the full-bridge inverter circuit (104), is used to transform the output of the full-bridge inverter circuit (104) on its primary side into high-voltage alternating current; The voltage multiplier circuit (108) includes two capacitors and two diodes, is connected to the secondary side of the transformer (107), and is used to perform voltage multiplication rectification on the high-voltage alternating current transformed by the transformer (107) into direct current, and the voltage multiplication parameter is two times; The second filter capacitor (109) is connected in parallel with the voltage multiplier circuit (108) and is used to filter the direct current output by the voltage multiplier circuit (108), reduce the AC pulsation ripple coefficient, and store electrical energy at the same time.

3. A high-frequency high-low voltage composite pulse plasma power supply device according to claim 1, characterized in that, The first one-way conduction circuit (3) is a high-voltage high-frequency pulsed current one-way conduction diode; the second one-way conduction circuit (6) is a low-voltage high-frequency pulsed current one-way conduction diode.

4. A high-frequency high-low voltage composite pulse plasma power supply device according to claim 3, characterized in that The plasma reactor (7) is connected in parallel across the two ends of the high-voltage high-frequency pulsed current one-way conduction diode and the low-voltage high-frequency pulsed current one-way conduction diode. When a high-voltage high-frequency pulsed current is applied across the two ends, a strong electric field is formed between the electrodes inside the plasma reactor (7), causing gas molecules to ionize and releasing a large number of free electrons and positive ions, thereby forming a plasma.

5. A high-frequency high-low voltage composite pulse plasma power supply device according to claim 1, characterized in that The low-voltage DC circuit (4) includes: a second AC power supply (401), a second rectifier circuit (402), a third filter capacitor (403), and a BUCK step-down circuit (404), where: The second AC power supply (401) is a power supply of 220V of the commercial power, used to supply power to the low-voltage DC circuit. The second rectifier circuit (402) includes four diodes. Among them, two series-connected diodes form a group, which is connected in parallel with another group of two series-connected diodes, and the positive and negative poles of the second AC power supply (401) are respectively connected between the two groups of series-connected diodes, used to convert alternating current into unidirectional pulsating direct current. The third filter capacitor (403) is connected in parallel with the second rectifier circuit (402), used to filter the unidirectional pulsating direct current output by the second rectifier circuit (402), reduce the AC pulsation ripple coefficient, and output smooth direct current. The BUCK step-down circuit (404) is connected in parallel with the third filter capacitor (403), and includes a switching tube, a storage inductor, a capacitor, a freewheeling diode, and a resistor. When the drive of the switching tube is at a high level, the switching tube conducts, the storage inductor is magnetized, the current flowing through the inductor increases linearly, and at the same time, the capacitor is charged to provide energy for the load. When the drive of the switching tube is at a low level, the switching tube turns off, the storage inductor discharges through the freewheeling diode, the inductor current decreases linearly, and the output voltage is maintained by the discharge of the output filter capacitor and the decreasing inductor current.

6. The high-frequency high-low voltage composite pulse plasma power supply device according to claim 1, characterized in that, The high-frequency high-low voltage composite pulse plasma power supply device further includes: a consumption resistor (8). One end of the consumption resistor (8) is connected to the high-voltage DC circuit, and the other end is connected to the first all-solid-state switch 2, used to consume the excess electrical energy of the high-frequency high-voltage pulsed current.

7. A high-frequency high-low voltage composite pulse plasma power supply device according to claim 1, characterized in that The high-frequency high-low voltage composite pulse plasma power supply device further includes: a full-bridge drive circuit (9), a first high-frequency drive circuit (10), a second high-frequency drive circuit (11), and a BUCK drive circuit (12), where: The full-bridge drive circuit (9) is connected to the full-bridge inverter circuit (104), used to control the switching frequency and duty cycle of the 4 MOS tubes in the full-bridge inverter circuit (104), so that the full-bridge inverter circuit (104) outputs pulsed current. The first high-frequency drive circuit (10) is connected to the first all-solid-state switch (2), used to control the switching frequency and duty cycle of the first all-solid-state switch (2). The second high-frequency driving circuit (11) is connected to the second all-solid-state switch (5) and is used to control the switching frequency and duty cycle of the second all-solid-state switch (5). The driving circuit (12) of the BUCK is connected to the BUCK step-down circuit (404) and is used to control the switching frequency and duty cycle of the switching tube in the BUCK step-down circuit (404).

8. A high-frequency high-low voltage composite pulse plasma power supply device according to claim 7, characterized in that The high-frequency high-voltage composite pulse plasma power supply device further includes: a controller (13), which is connected to the driving circuit (9) of the full bridge, the first high-frequency driving circuit (10), the second high-frequency driving circuit (11), and the driving circuit (12) of the BUCK, and is used to control the switching frequency and duty cycle of the full-bridge inverter circuit (104), the first all-solid-state switch (2), the second all-solid-state switch (5), and the BUCK step-down circuit (404), so as to optimize the working state of the plasma reactor.

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