Silicon material cleaning device

Abstract

The invention discloses a silicon material cleaning device, and belongs to the technical field of silicon material cleaning, the silicon material cleaning device comprises a charging basket, a plurality of cleaning pools, a plurality of flushing pools and a transfer mechanism, a plurality of uniformly spaced partition plates are arranged in the charging basket, and two parallel carrier rollers penetrating through the partition plates are rotatably mounted at the bottom of the charging basket; silicon wafers to be cleaned are sequentially placed between the partition plates, the bottoms of the silicon wafers abut against the two carrier rollers, and positioning blocks are fixed to the outer walls of the two ends of the charging basket. A drainage structure is arranged at the bottom of the flushing tank, and a plurality of nozzles for flushing the charging basket and the silicon wafers are arranged in the flushing tank; the transferring mechanism is used for moving the charging basket. The two carrier rollers are rotatably mounted in the charging basket, when the carrier rollers rotate, the carrier rollers can drive the silicon wafers on the carrier rollers to rotate, so that dust particles on the surfaces of the silicon wafers are easier to fall off, the silicon wafers continuously rotate in the washing process, the surfaces of the silicon wafers which are originally shielded on the lower portion can be sprayed by the spray heads when rotating to the upper portion, and therefore the dust particles on the surfaces of the silicon wafers can be removed. Therefore, residual cleaning fluid and impurities on the silicon wafer are washed away.

Description

Technical Field

[0001] The present invention relates to the technical field of silicon material cleaning, and particularly relates to a silicon material cleaning device. Background Art

[0002] During the production process of silicon materials, various pollutants may be introduced, such as grease and lubricants in production equipment, as well as dust and microorganisms in the production environment. These pollutants will adhere to the surface of the silicon material. If not cleaned, it will affect the performance and quality of the silicon material. Cleaning the silicon material can effectively remove these pollutants and ensure the purity and quality of the silicon material. Existing cleaning equipment uses a basket to load multiple silicon wafers, and then uses a transfer mechanism to move the basket. First, the basket is moved to the first cleaning pool. After cleaning, the basket is moved to the rinsing pool to wash off the first cleaning liquid. Then, the basket is moved to the second cleaning pool. After cleaning, the basket is moved to the second rinsing pool to wash off the second cleaning liquid. There are multiple cleaning pools and rinsing pools.

[0003] The above equipment has the following problems: Multiple silicon wafers are placed in parallel in the basket, and the spacing between adjacent silicon wafers is relatively narrow, which results in the area between the silicon wafers not being easily washed clean by the sprayed water flow during rinsing. Summary of the Invention

[0004] In view of the above technical deficiencies, the purpose of the present invention is to provide a silicon material cleaning device. By arranging idlers in the basket, the silicon wafers can be rotated during the cleaning and rinsing of the silicon wafers, making the rinsing more thorough.

[0005] To solve the above technical problems, the present invention adopts the following technical solutions: The present invention provides a silicon material cleaning device, including: A basket, in which a plurality of evenly spaced partitions are arranged. Two parallel idlers passing through the partitions are rotatably installed at the bottom of the basket. The silicon wafers to be cleaned are sequentially placed between adjacent two partitions and the bottom abuts against the two idlers. Positioning blocks are fixed on the outer walls at both ends of the basket; Multiple cleaning pools, in which cleaning liquid is contained; Multiple rinsing pools, at the bottom of which a drainage structure is arranged, and a plurality of spray heads for flushing the basket and the silicon wafers are arranged in the rinsing pools; A transfer mechanism for moving the basket. The transfer mechanism includes a driving mechanism for driving the idlers to rotate and two hook arms. A hook claw cooperating with the positioning block is arranged at the bottom of the hook arm, and the hook arm has degrees of freedom of horizontal movement and lifting movement.

[0006] Preferably, the driving mechanism is arranged on one of the hook arms, and the driving mechanism includes: Two rotating shafts, which are rotatably installed on the hook arm. A first bevel gear is fixed to the bottom of the rotating shaft, and a second bevel gear that mates with the first bevel gear is fixed to the end of the roller. A first motor, which is fixed on the hook arm. A driving pulley is fixed to the output shaft of the first motor. Driven pulleys are fixed to the ends of the two rotating shafts, and a synchronous belt is wound around the driving pulley and the two driven pulleys.

[0007] Preferably, a limiting step is fixed on the positioning block. When the hook claw is sleeved on the positioning block and abuts against the limiting step, the first bevel gear meshes with the second bevel gear.

[0008] Preferably, a dial groove is provided on the roller between two adjacent partition plates. The lower edge of the silicon wafer abuts in the dial groove. When the roller rotates, the silicon wafer rotates and sways under the action of the dial groove.

[0009] Preferably, a protruding part is provided on the partition plate. The protruding part is hemispherical. The two side edges of the middle part of the silicon wafer respectively abut against the protruding parts of two adjacent partition plates. When the dial groove drives the silicon wafer to sway, the middle edge of the partition plate swings with the protruding part as the fulcrum.

[0010] Preferably, the spray heads are divided into two groups and are respectively arranged on both sides of the flushing pool; swing mechanisms for swinging the two groups of spray heads are respectively arranged on both sides of the flushing pool.

[0011] Preferably, the swing mechanism includes: A fixed strip, which is fixed on the flushing pool. The spray head is hinged to the fixed strip; A movable strip, which is parallel to the fixed strip. The movable strip is slidably installed on the flushing pool; A plurality of sliding sleeves, which are hinged to the movable strip. The plurality of spray heads are respectively inserted into the plurality of sliding sleeves. When the movable strip reciprocally slides on the flushing pool, the spray heads swing repeatedly.

[0012] Preferably, a second motor is fixed on the outer wall of the flushing pool. A rocker is fixed to the output shaft of the second motor. A connecting rod is hinged to the end of the rocker. The movable strips in the two swing mechanisms are both fixedly connected to a connecting plate, and the connecting rod is hinged to the connecting plate. Preferably, the transfer mechanism further includes a base. An opening and closing assembly for controlling the relative movement of the two hook arms is provided on the base. The opening and closing assembly includes: Two racks, which are respectively fixed on the two hook arms. The two hook arms are L-shaped, and the upper parts of the hook arms are slidably installed on the base; A third motor, which is fixed on the base. A spur gear that meshes with the two racks is fixed to the output shaft of the third motor.

[0013] Preferably, four positioning grooves adapted to the bottom corners of the material basket are provided in both the cleaning pool and the rinsing pool, and ultrasonic vibrators are provided on the pool walls of the cleaning pool.

[0014] The beneficial effects of the present invention are as follows: In the material basket designed by the present invention, two idler rollers are rotatably installed, and the silicon wafers to be cleaned are placed on the idler rollers between two partition plates. Therefore, when the idler rollers rotate, the silicon wafers above can be driven to rotate, so that the dust particles on the surface of the silicon wafers are more likely to fall off. During the rinsing process, the silicon wafers rotate continuously, which enables the surface of the silicon wafers originally blocked below to be sprayed by the nozzles when rotating to the upper part. This allows the nozzles to spray and wash the silicon wafers more fully, washing away the residual cleaning liquid and impurities on the silicon wafers; the driving mechanism further designed by the present invention can actively drive the idler rollers to rotate. The first motor installed on the hook arm drives the rotating shaft to rotate through the synchronous belt transmission mechanism, and then through the meshing of the first bevel gear and the second bevel gear, the idler rollers rotate, thereby driving the silicon wafers to rotate; in order to better wash the silicon wafers, the idler rollers are also provided with dial grooves. When the idler rollers rotate, the dial grooves can dial the bottom of the silicon wafers, causing the silicon wafers to shake between the two partition plates, thereby reducing the dead corners where the silicon wafers cannot be rinsed. The protruding parts provided on the partition plates can serve as the fulcrums when the silicon wafers shake, so that the silicon wafers swing repeatedly around the protruding parts, making the swing of the silicon wafers more regular. When the silicon wafers rotate and swing, the gaps between adjacent silicon wafers change, and the direction and range of the sputtering and flushing water flow of the silicon wafers are more variable, making it easier to wash the parts between the silicon wafers; by providing the movable strip and the fixed strip, when the second motor drives the rocker to rotate, the connecting rod drives the connecting plate to reciprocate, and then drives the movable strip to reciprocate, thereby making the nozzle swing reciprocally, expanding the spraying range of the nozzle, and changing the spraying angle, so that the water flow is more likely to wash into the gaps between the silicon wafers. Description of the Drawings

[0015] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following drawings are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0016] Figure 1 It is a three-dimensional view of the overall structure of a silicon material cleaning device provided by an embodiment of the present invention.

[0017] Figure 2 It is a three-dimensional view from a top-down perspective of a silicon material cleaning device provided by an embodiment of the present invention.

[0018] Figure 3 It is a three-dimensional view of a rinsing pool in a silicon material cleaning device provided by an embodiment of the present invention.

[0019] Figure 4 Schematic diagram of the cooperation between the material basket and the hook arm in a silicon material cleaning device provided by an embodiment of the present invention.

[0020] Figure 5 Schematic diagram of the structure of the hook arm in a silicon material cleaning device provided by an embodiment of the present invention.

[0021] Figure 6 is Figure 5 Partial enlarged view of A in

[0022] Figure 7 Stereogram of the material basket in a silicon material cleaning device provided by an embodiment of the present invention.

[0023] Figure 8 Top view of the material basket in a silicon material cleaning device provided by an embodiment of the present invention.

[0024] Figure 9 Schematic diagram of the structure of the idler roller in a silicon material cleaning device provided by an embodiment of the present invention.

[0025] Explanation of reference numerals: 1. Material basket, 2. Partition board, 3. Idler roller, 4. Positioning block, 5. Cleaning pool, 6. Flushing pool, 7. Sprinkler head, 8. Hook arm, 9. Hook claw, 10. Rotating shaft, 11. First bevel gear, 12. Second bevel gear, 13. First motor, 14. Driving pulley, 15. Driven pulley, 16. Synchronous belt, 17. Limiting step, 18. Dial groove, 19. Protruding part, 20. Fixed strip, 21. Movable strip, 22. Sliding sleeve, 23. Second motor, 24. Rocker, 25. Connecting rod, 26. Connecting plate, 27. Base, 28. Rack, 29. Third motor, 30. Straight gear, 31. Positioning groove. Detailed implementation manners

[0026] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0027] Embodiment 1: As Figures 1 to 9As shown in the figure, Embodiment 1 of the present invention provides a silicon material cleaning device for batch cleaning of silicon wafers. Since multiple different cleaning liquids are usually required for cleaning the silicon wafers multiple times during the cleaning process, the present invention is provided with multiple cleaning pools 5 and multiple rinsing pools 6 on the frame, specifically three cleaning pools 5 and three rinsing pools 6. The function of the rinsing pool 6 is to flush the silicon wafers to avoid the solution in the previous cleaning pool 5 remaining on the silicon wafers and causing contamination between different cleaning liquids.

[0028] First, the operator sequentially places the silicon wafers to be cleaned between adjacent partitions 2 in the basket 1. These evenly spaced partitions 2 serve to separate the silicon wafers, preventing the silicon wafers from colliding and stacking with each other, enabling the silicon wafers to fully contact the cleaning liquid. As Figure 7 shown, two roller supports 3 are rotatably installed in the basket 1. The roller supports 3 pass through all the partitions 2, and these two roller supports 3 are parallel. The bottom of the silicon wafers can rest on the two roller supports 3. The roller supports 3 play a load-bearing role, while the partitions 2 play a separating role.

[0029] To move the basket 1 between the cleaning pool 5 and the rinsing pool 6, the transfer mechanism designed by the present invention not only has degrees of freedom of horizontal movement and lifting movement, but also the two hook arms 8 in the transfer mechanism can open and close. As Figures 4 to 6 shown, the transfer mechanism includes a base 27 and two hook arms 8. A third motor 29 is fixedly installed on the base 27. A spur gear 30 is installed on the output shaft of the third motor 29. Both hook arms 8 are L-shaped, with the upper part of the hook arm 8 being horizontal and the lower part being vertical. Two racks 28 are respectively fixed on the two hook arms 8, and these two racks 28 are respectively engaged with both sides of the spur gear 30. Therefore, when the third motor 29 drives the spur gear 30 to rotate, the two racks 28 respectively drive the two hook arms 8 to move relative to each other on the base 27, adjusting the distance between the two hook arms 8.

[0030] As Figure 1 and Figure 2 shown, a guide rail is fixed on the top of the frame. A walking platform is installed on the guide rail. An electric lifting rod is fixed below the walking platform. The base 27 is fixed to the movable end of the electric lifting rod, so that the base 27 can achieve lifting and horizontal movement. Hook claws 9 are fixed to the bottom of the hook arms 8, and positioning blocks 4 are fixed to the outer walls at both ends of the basket 1. When the hook arms 8 descend, the hook claws 9 at the bottoms of the two hook arms 8 are in an open state. The third motor 29 drives the two hook arms 8 to reduce the distance between them, so that the two hook claws 9 are sleeved on the positioning blocks 4 and abut against the limiting steps 17 on the positioning blocks 4, realizing the connection between the hook arms 8 and the basket 1.

[0031] Subsequently, the transfer mechanism utilizes its degrees of freedom of horizontal movement and lifting movement, and uses the hook arm 8 to smoothly move the basket 1 above the cleaning tank 5, and then descends to place the basket 1 into the cleaning tank 5. Four positioning grooves 31 provided in the cleaning tank 5 and adapted to the bottom corners of the basket 1 can limit the bottom of the basket 1, ensuring that the basket 1 is accurately positioned in the cleaning tank 5 and guaranteeing the stability of the cleaning process. The cleaning tank 5 is filled with a cleaning liquid, and the ultrasonic vibrators provided on the pool wall of the cleaning tank 5 start to work. The working principle of the ultrasonic vibrator is to utilize the cavitation effect generated when ultrasonic waves propagate in the cleaning liquid, that is, ultrasonic waves form tiny bubbles in the liquid, and these bubbles will generate a powerful impact force during the process of formation and rupture, which can effectively peel off the impurities on the surface of the silicon wafer and enhance the cleaning effect of the cleaning liquid. During the cleaning process, the rotation of the roller 3 can break the relative static state on the surface of the silicon wafer, so that the dust particles on the surface of the silicon wafer are more likely to break away from the surface of the silicon wafer due to centrifugal force and relative movement with the cleaning liquid during the rotation process.

[0032] After the cleaning is completed in the cleaning tank 5, the transfer mechanism moves the basket 1 into the rinsing tank 6, and the rinsing tank 6 is also provided with positioning grooves 31 to fix the bottom of the basket 1. When using the nozzle 7 to rinse the silicon wafer, the roller 3 rotates, driving the silicon wafer to rotate, so that the multiple nozzles 7 provided on both sides of the rinsing tank 6 can spray more comprehensively on the surface of the silicon wafer, enabling the parts blocked below the silicon wafer to rotate to the upper part, allowing the nozzle 7 to wash, and thus washing the silicon wafer clean.

[0033] Embodiment 2: On the basis of Embodiment 1, the present invention further designs a driving mechanism for driving the rotation of the roller 3. As Figure 4 and Figure 5 shown, the driving mechanism includes a first motor 13, a belt transmission mechanism and two rotating shafts 10. The first motor 13 is fixed on the upper part of one of the hook arms 8, and the two rotating shafts 10 are symmetrically rotatably installed on both sides of the hook arm 8. The first bevel gear 11 fixedly installed at the bottom of the rotating shaft 10 can be engaged with the second bevel gear 12 fixedly installed at the end of the roller 3.

[0034] As Figure 4 shown, when the third motor 29 is started and the two hook claws 9 are sleeved on the positioning block 4 and abutted against the limiting step 17, the second bevel gear 12 just meshes with the first bevel gear 11. When the first motor 13 is started, the driving pulley 14 on its output shaft starts to rotate. The first motor 13 drives the two rotating shafts 10 to rotate synchronously through the synchronous belt 16 wound around the driving pulley 14 and the driven pulleys 15 at the ends of the two rotating shafts 10, and then drives the second bevel gear 12 and the roller 3 to rotate through the first bevel gear 11 at the bottom of the rotating shaft 10.

[0035] As Figure 8 and Figure 9As shown, there are grooves 18 on the rollers 3 between two adjacent partitions 2, and the grooves 18 surround the rollers 3. The bottom of the silicon wafer is stuck in the grooves 18, so that when the rollers 3 rotate, the grooves 18 will move the lower edge of the silicon wafer, causing the silicon wafer to shake when it rotates between the two partitions 2. A hemispherical protrusion 19 is also fixed on the partition 2, and the edges on both sides of the middle of the silicon wafer respectively rest on the protrusions 19 of the two adjacent partitions 2, and the protrusions 19 provide a fulcrum for the shaking of the silicon wafer. When the grooves 18 drive the silicon wafer to shake, the silicon wafer repeatedly swings around the protrusions 19 as the center. The movement mode of the silicon wafer combined with the rotation and swinging makes the gap between adjacent silicon wafers constantly change, reducing the dead corners that the silicon wafer cannot be washed, and the direction and range of the water flow of the silicon wafer sputtering and washing are more variable, which is more conducive to washing away the residual cleaning liquid and impurities on the silicon wafer.

[0036] Through the above arrangement, the movement forms of the silicon wafer are increased, the relative position and angle between the silicon wafer and the flushing water flow are changed, the flushing effect of the water flow on the surface of the silicon wafer is improved, and the comprehensiveness of the cleaning is enhanced.

[0037] Embodiment three: On the basis of the first and second embodiments, Figure 3 As shown, the present invention is provided with two rows of nozzles 7 in the washing tank 6, which are respectively arranged on both sides of the washing tank 6. A drainage groove is provided at the bottom of the washing tank 6, and a solenoid valve is provided at the drainage port of the drainage groove. By controlling the opening and closing of the solenoid valve, the water storage and drainage of the washing tank 6 can be controlled. When the washing tank 6 is filled with water, the cleaned silicon wafers can be soaked in the water of the washing tank 6 to dissolve the residual cleaning liquid in the water, and then the solenoid valve is opened to discharge the waste water through the drainage groove.

[0038] In order to further improve the flushing effect, the present invention also symmetrically arranges a swing mechanism on both sides of the flushing pool 6. The swing mechanism includes a fixed bar 20 and a movable bar 21. The fixed bar 20 is fixed on the flushing pool 6 through a bracket, and the movable bar 21 is slidably installed on the bracket, and the fixed bar 20 is parallel to the movable bar 21. A plurality of nozzles 7 are hinged on the fixed bar 20, and a plurality of sliding sleeves 22 are hinged on the movable bar 21, and the plurality of nozzles 7 are respectively inserted into these sliding sleeves 22. In this way, when the movable bar 21 slides back and forth, the sliding sleeve 22 can drive the nozzle 7 to swing repeatedly around the hinge axis of the nozzle 7 and the fixed bar 20, so that the flushing water flow sprayed by the nozzle 7 swings. In this way, the spray range of the nozzle 7 is significantly expanded, and the spray angle is constantly changed. This makes it easier for the water flow to flush into the gap between adjacent silicon wafers, further improving the flushing quality of the silicon wafers.

[0039] Meanwhile, the present invention also fixedly installs a second motor 23 on the outer wall of the flushing tank 6, and a rocker 24 is fixed on the output shaft of the second motor 23. The connecting rod 25 hinged at the end of the rocker 24 moves as the rocker 24 rotates. The connecting plates 26 are fixedly connected to the movable bars 21 in both swinging mechanisms, and the connecting plates 26 are hinged to the ends of the connecting rods 25. Therefore, the second motor 23 can drive the connecting plates 26 to reciprocate. Since the movable bars 21 are parallel to the fixed bars 20 and are slidably installed on the flushing tank 6, the movable bars 21 reciprocally slide on the flushing tank 6 driven by the connecting plates 26, realizing the reciprocating swing of the two rows of nozzles 7.

[0040] During use, first load the silicon wafers between the partitions 2 of the basket 1, with the bottom of the silicon wafers resting in the dial grooves 18 of the supporting rollers 3. Then start the transfer mechanism to move the two hook arms 8 to both sides of the basket 1, start the third motor 29 to make the two hook arms 8 approach each other, the hook claws 9 are sleeved on the positioning blocks 4, and the first bevel gear 11 meshes with the second bevel gear 12. Then the transfer mechanism lifts the basket 1 with the hook arms 8 and places the basket 1 into the cleaning tank 5 for soaking. The ultrasonic vibrator in the cleaning tank 5 enables the cleaning liquid to efficiently clean the silicon wafers. Then the transfer mechanism lifts the basket 1 and places it into the flushing tank. The nozzles 7 spray the basket 1 and the silicon wafers to wash away the remaining cleaning liquid and stains. And so on. After the basket 1 with the silicon wafers passes through multiple cleaning tanks 5 and flushing tanks 6 for cleaning, the cleaning of the silicon wafers is finally completed.

[0041] Obviously, those skilled in the art can make various modifications and variations to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and its equivalent technologies, the present invention is also intended to include these modifications and variations.

Claims

1. A silicon material cleaning device, characterized in that, Comprising: A material basket, wherein a plurality of evenly spaced partitions are arranged inside the material basket, two parallel idlers passing through the partitions are rotatably installed at the bottom of the material basket, the silicon wafers to be cleaned are sequentially placed between two adjacent partitions and the bottom abuts against the two idlers, and positioning blocks are fixed on the outer walls at both ends of the material basket; A plurality of cleaning pools, wherein cleaning liquid is contained in the cleaning pools; A plurality of rinsing pools, wherein a drainage structure is arranged at the bottom of the rinsing pools, and a plurality of spray heads for flushing the material basket and the silicon wafers are arranged inside the rinsing pools; A transfer mechanism for moving the material basket, the transfer mechanism comprising a driving mechanism for driving the idlers to rotate and two hook arms, a hook claw cooperating with the positioning block is arranged at the bottom of the hook arm, and the hook arm has degrees of freedom of horizontal movement and lifting movement.

2. The silicon material cleaning device according to claim 1, characterized in that, The driving mechanism is arranged on one of the hook arms, and the driving mechanism comprises: Two rotating shafts, the rotating shafts are rotatably installed on the hook arm, a first bevel gear is fixed to the bottom of the rotating shaft, and a second bevel gear cooperating with the first bevel gear is fixed to the end of the idler; A first motor, fixed on the hook arm, a driving pulley is fixed to the output shaft of the first motor, driven pulleys are fixed to the ends of the two rotating shafts, and a synchronous belt is wound around the driving pulley and the two driven pulleys.

3. The silicon material cleaning device according to claim 2, characterized in that, A limiting step is fixed on the positioning block, and when the hook claw is sleeved on the positioning block and abuts against the limiting step, the first bevel gear meshes with the second bevel gear.

4. A silicon material cleaning device according to claim 1, characterized in that, A dial groove is arranged on the idler between two adjacent partitions, the lower edge of the silicon wafer abuts in the dial groove, and when the idler rotates, the silicon wafer rotates and sways under the action of the dial groove.

5. The silicon material cleaning device according to claim 4, characterized in that, A protruding part is arranged on the partition, the protruding part is hemispherical, the two sides of the middle part of the silicon wafer respectively abut against the protruding parts of two adjacent partitions, and when the dial groove drives the silicon wafer to sway, the middle edge of the partition swings with the protruding part as a fulcrum.

6. The silicon material cleaning device according to claim 1, wherein, The spray heads are divided into two groups and are respectively arranged on both sides of the rinsing pool; swing mechanisms for swinging the two groups of spray heads are arranged on both sides of the rinsing pool.

7. The silicon material cleaning device according to claim 6, wherein, The swing mechanism comprises: A fixed strip, the fixed strip is fixed on the rinsing pool, and the spray head is hinged on the fixed strip; A movable strip, the movable strip is parallel to the fixed strip, and the movable strip is slidably installed on the rinsing pool; A plurality of sliding sleeves, the sliding sleeves are hinged on the movable strip, and the plurality of spray heads are respectively inserted into the plurality of sliding sleeves. When the movable strip reciprocally slides on the rinsing pool, the spray heads repeatedly swing.

8. The silicon material cleaning device according to claim 7, wherein, A second motor is fixed on the outer wall of the rinsing pool, a rocker is fixed to the output shaft of the second motor, a connecting rod is hinged to the end of the rocker, and the movable strips in the two swing mechanisms are both fixedly connected to a connecting plate, and the connecting rod is hinged to the connecting plate.

9. The silicon material cleaning device according to claim 1, wherein, The transfer mechanism further comprises a base, and an opening and closing assembly for controlling the relative movement of the two hook arms is arranged on the base. The opening and closing assembly comprises: Two racks, the two racks are respectively fixed on the two hook arms, the two hook arms are L-shaped, and the upper parts of the hook arms are slidably installed on the base; A third motor, the third motor is fixed on the base, and a spur gear meshing with the two racks is fixed to the output shaft of the third motor.

10. A silicon material cleaning device as described in claim 1, characterized in that, Four positioning grooves adapted to the bottom corners of the material basket are provided in both the cleaning tank and the rinsing tank, and ultrasonic vibrators are provided on the pool wall of the cleaning tank.

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