Manufacturing process for forming and processing graphene

Abstract

The invention discloses a manufacturing process for graphene forming processing, and particularly relates to the field of graphene forming, and the process comprises the following steps: step 1, placing a substrate on an unwinding roller in an unwinding mechanism, pulling the end part of the substrate to enable the end part of the substrate to extend into a pipeline hearth in a forming mechanism, the end part of the base is fixed on a winding roller in the winding mechanism; and 2, the temperature of a local substrate in the pipeline hearth is increased through a heat preservation cover in the temperature regulation and control mechanism and a first temperature rising station, and then carbon-containing gas is introduced into the pipeline hearth through a first electromagnetic valve. The used substrate is made of the coiled material, after the graphene film is generated on the surface of the substrate located in the pipeline hearth, the to-be-processed substrate is unwound through rotation of the unwinding roller, and the substrate containing the graphene film is wound through rotation of the winding roller, so that frequent replacement of the substrate in the reactor is avoided, and the processing and forming efficiency of the graphene film is improved; and large-scale continuous production is facilitated.

Description

Technical Field

[0001] The present invention relates to the technical field of graphene forming, and more specifically, to a manufacturing process for graphene forming and processing. Background Art

[0002] Graphene film is a two-dimensional honeycomb lattice structure material formed by monolayer or few-layer carbon atoms with sp² hybrid orbitals. With its unique properties such as high strength, excellent visible light transmittance, flexibility, and chemical stability, it is widely used in many fields such as manufacturing flexible display screens, foldable devices, and transparent conductive electrodes. In order to be compatible with industrial production and reduce the preparation cost of graphene films, chemical vapor deposition (CVD) method is commonly used to prepare graphene films at present.

[0003] In the prior art, when preparing graphene films by chemical vapor deposition (CVD) method, a substrate is placed in a reactor, a carbon-containing gas (such as methane or ethylene) is introduced into the reactor and the temperature of the metal substrate (such as copper or nickel) in the reactor is raised. At high temperature, the carbon source gas cracks, releasing free carbon atoms. These carbon atoms migrate on the substrate surface and gradually aggregate, finally forming a monolayer or multi-layer graphene structure. The whole process depends on the self-assembly behavior of carbon atoms on the substrate and the catalytic effect of the substrate on carbon atoms. By cooling the substrate, the graphene film will adhere to the substrate surface. After taking out the substrate, the substrate is removed by chemical etching method to obtain an independent graphene film.

[0004] However, the above prior art still has deficiencies. Each time only one substrate can be processed in the reactor. After the graphene film is formed on the substrate, the substrate needs to be taken out and a new substrate needs to be put into the reactor, resulting in low production efficiency and being not conducive to large-scale continuous production. Summary of the Invention

[0005] A manufacturing process for graphene forming and processing provided by the present invention aims to solve the problem that in the existing manufacturing process for graphene forming and processing, each time only one substrate can be processed in the reactor. After the graphene film is formed on the substrate, the substrate needs to be taken out and a new substrate needs to be put into the reactor, resulting in low production efficiency and being not conducive to large-scale continuous production.

[0006] To achieve the above object, the present invention provides the following technical solution: A manufacturing process for graphene forming and processing, comprising the following steps: Step 1: Place the substrate on the unwinding roller in the unwinding mechanism, pull the end of the substrate, so that the end of the substrate extends into the pipe furnace in the forming mechanism, and fix the end of the substrate on the winding roller in the winding mechanism; Step 2: Raise the temperature of the local substrate in the pipe furnace through the heat preservation cover in the temperature control mechanism and the heating station 1, and then introduce carbon-containing gas into the pipe furnace through solenoid valve 1; Step 3: The carbon-containing gas cracks at high temperature, releasing free carbon atoms to form a graphene film structure on the surface of the substrate; Step 4: Drive the unwinding roller and the winding roller to rotate synchronously, so that the substrate moves in the pipe furnace along the length direction of the pipe furnace. The rotation of the unwinding roller realizes the unwinding of the substrate, and the rotation of the winding roller realizes the winding of the substrate; Step 5: When the substrate passes through the cooling station, it is cooled, and the winding roller 2 pastes the protective film layer 1 on the side of the substrate without the graphene film, and the rotation of the winding roller 2 unwinds the protective film layer 1; Step 6: When the winding roller winds up the substrate, the side of the substrate with the graphene film is always attached to the protective film layer 1. Repeat steps 1 to 6 to complete the forming process of the graphene film.

[0007] In a preferred embodiment, the temperature control mechanism includes a base, on which a heat preservation cover is hingedly arranged, and the heating station 1, the heating station 2 and the cooling station are all arranged between the base and the heat preservation cover.

[0008] In a preferred embodiment, the pipe furnace is fixedly arranged on the base, solenoid valve 1 is fixedly communicated with the pipe furnace, and solenoid valve 2 is also fixedly communicated with the pipe furnace.

[0009] In a preferred embodiment, the winding mechanism includes a storage housing 2, which is fixedly communicated with the pipe furnace. The winding roller and the winding roller 2 are both rotatably arranged in the storage housing 2. The protective film layer 1 is wound around the winding roller 2, and an adhesion layer is arranged below the protective film layer 1. The adhesion layer of the winding roller 2 is attached to the side of the substrate away from the graphene film.

[0010] In a preferred embodiment, the unwinding mechanism includes a storage housing 1, which is fixedly communicated with the pipe furnace. The unwinding roller is rotatably arranged in the storage housing 1. A protective film layer 2 is arranged at the bottom of the storage housing 1, and a winding roller 1 is rotatably arranged in the storage housing 1. The winding roller 1 winds up the protective film layer 2 by rotation.

[0011] In a preferred embodiment, an auxiliary positioning mechanism is arranged on the pipe furnace. The auxiliary positioning mechanism includes a linear driver 1, which is fixedly arranged on the pipe furnace. A linear driver 2 is fixedly arranged on the output end of the linear driver 1, and a suction nozzle is fixedly arranged on the output end of the linear driver 2. The suction nozzle is used to adsorb the bottom of the protective film layer 2.

[0012] In a preferred embodiment, connecting pipes are fixedly arranged at both ends of the pipeline furnace chamber. A shielding seat is fixedly arranged inside the connecting pipe, and two driving rollers are rotatably arranged inside the connecting pipe. The two driving rollers drive the second protective film layer through reverse rotation.

[0013] In a preferred embodiment, a plurality of third guiding rollers are rotatably arranged inside the input end of the second storage housing. A fourth guiding roller is slidably arranged inside the second storage housing. The fourth guiding roller is in rolling contact with the non-adhesive surface of the first protective film layer. A fifth guiding roller is slidably arranged inside the second storage housing. The fifth guiding roller is in rolling contact with the base on the winding roller.

[0014] In a preferred embodiment, a first guiding roller is slidably arranged inside the first storage housing. A second guiding roller is rotatably arranged inside the first storage housing. The second guiding roller is used to guide the second protective film layer. A fixed seat is fixedly arranged inside the first storage housing, and the fixed seat is located between the base and the second protective film layer.

[0015] In a preferred embodiment, the base, the first storage housing, and the second storage housing are all fixedly arranged on the frame, and the first storage housing and the second storage housing are respectively located on both sides of the base.

[0016] The beneficial effects of the present invention are as follows: 1. In the present invention, the used base is set as a coil. After the graphene film is formed on the surface of the base located inside the pipeline furnace chamber, the base to be processed is unrolled by the rotation of the unrolling roller, and the base containing the graphene film is wound by the rotation of the winding roller, avoiding frequent replacement of the base inside the reactor, improving the processing and forming efficiency of the graphene film, and being conducive to large-scale continuous production.

[0017] 2. By arranging the unrolling mechanism and the winding mechanism, when the winding roller winds the base, the first protective film layer is automatically pasted on the bottom of the base, avoiding scratches on the graphene film when winding the base and playing a good role in protecting the graphene film. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic flow chart of the manufacturing process of the present invention.

[0019] Figure 2 It is a schematic three-dimensional structure diagram of the frame of the present invention.

[0020] Figure 3 It is a schematic three-dimensional structure diagram of the base of the present invention.

[0021] Figure 4 It is a schematic three-dimensional structure diagram of the pipeline furnace chamber of the present invention.

[0022] Figure 5 It is a schematic cross-sectional structure diagram of the front view of the pipeline furnace chamber of the present invention.

[0023] Figure 6For the present invention Figure 5 Schematic cross-sectional view of the main view of the storage housing one in the present invention.

[0024] Figure 7 For the present invention Figure 5 Schematic cross-sectional view of the main view of the storage housing two in the present invention.

[0025] Figure 8 For the present invention Figure 5 Schematic cross-sectional view of the main view of the connecting pipe in the present invention.

[0026] Figure 9 Schematic diagram of the moving track structure of the suction nozzle of the present invention.

[0027] Reference numerals are: 1, frame; 2, temperature control mechanism; 21, base; 22, heat preservation cover; 23, heating station one; 24, heating station two; 25, cooling station; 3, forming mechanism; 31, pipeline furnace chamber; 311, connecting pipe; 312, shielding seat; 313, driving roller; 32, solenoid valve one; 33, solenoid valve two; 4, unwinding mechanism; 41, storage housing one; 42, unwinding roller; 43, guiding roller one; 44, winding roller one; 45, guiding roller two; 46, fixing seat; 5, winding mechanism; 51, storage housing two; 511, guiding roller three; 52, winding roller; 53, winding roller two; 54, protective film layer one; 55, guiding roller four; 56, guiding roller five; 6, auxiliary positioning mechanism; 61, linear driver one; 62, linear driver two; 63, suction nozzle; 631, flexible pipe; 7, base; 8, protective film layer two. Detailed implementation manners

[0028] The following further describes the present application in detail with reference to the accompanying drawings. It is necessary to point out here that the following specific implementation manners are only used to further illustrate the present application and cannot be understood as limiting the protection scope of the present application. Those skilled in the art can make some non-essential improvements and adjustments to the present application according to the above application content.

[0029] Referring to the attached description Figures 1 to 9 , a manufacturing process for graphene forming and processing includes the following steps: Step 1: Place the base 7 on the unwinding roller 42 in the unwinding mechanism 4, pull the end of the base 7, so that the end of the base 7 extends into the pipeline furnace chamber 31 in the forming mechanism 3, and fix the end of the base 7 on the winding roller 52 in the winding mechanism 5; Step 2: Raise the temperature of the local base 7 in the pipeline furnace chamber 31 through the heat preservation cover 22 and the heating station one 23 in the temperature control mechanism 2, and then introduce a carbon-containing gas into the pipeline furnace chamber 31 through the solenoid valve one 32; Step 3: The carbon-containing gas cracks at high temperature, releasing free carbon atoms, and forming a graphene film structure on the surface of the substrate 7; Step 4: Drive the unwinding roller 42 and the winding roller 52 to rotate synchronously, so that the substrate 7 moves in the pipe furnace 31 along the length direction of the pipe furnace 31. The rotation of the unwinding roller 42 realizes the unwinding of the substrate 7, and the rotation of the winding roller 52 realizes the winding of the substrate 7; Step 5: When the substrate 7 passes through the cooling station 25, it is cooled, and the winding roller II 53 pastes the protective film layer I 54 on the surface of the substrate 7 without the graphene film. The rotation of the winding roller II 53 unwinds the protective film layer I 54; Step 6: When the winding roller 52 winds the substrate 7, the side of the substrate 7 with the graphene film is always attached to the protective film layer I 54. Repeat Steps 1 to 6 to complete the forming process of the graphene film.

[0030] It should be noted that the substrate 7 is set as a copper foil. The copper foil has good electrical conductivity and thermal conductivity. During the preparation process, the carbon source gas can be evenly cracked on the surface of the copper foil, thereby promoting the uniform growth of graphene. The surface quality of the copper foil is high, and the high-quality copper foil can provide a more uniform growth environment. The substrate 7 is set as a long coil. The coil enters the pipe furnace 31 from one end and then exits the pipe furnace 31 through the other end of the pipe furnace 31, so as to realize the continuous processing of the graphene film.

[0031] It also should be noted that the copper foil is usually fixed in a specific manner in the reactor. Only the exposed side directly contacts the high-temperature carbon source gas and reducing gas. At the same time, this side is pretreated such as pickling and annealing to eliminate the oxide layer and optimize the catalytic activity, while the other side is blocked or cannot meet the growth conditions due to the difference in crystal plane orientation. Coupled with the local uniformity limitation of the temperature and gas distribution in the reactor, ultimately graphene is only efficiently generated on the single side with the best catalytic activity and environmental conditions, which is convenient for subsequent transfer and application. Therefore, when preparing graphene by chemical vapor deposition (CVD) method, graphene films are only formed on one side of the copper foil.

[0032] Furthermore, place the substrate 7 in the pipe furnace 31, introduce a carbon-containing gas such as methane or ethylene into the pipe furnace 31 through the solenoid valve I 32, raise the temperature of the substrate 7 in the pipe furnace 31. At high temperature, the carbon source gas cracks, releasing free carbon atoms. These carbon atoms migrate and gradually aggregate on the surface of the substrate 7, and finally form a single-layer or multi-layer graphene structure. The whole process depends on the self-assembly behavior of carbon atoms on the substrate 7 and the catalytic effect of the substrate 7 on carbon atoms. By cooling the substrate 7, the graphene film will adhere to the surface of the substrate 7. After taking out the substrate 7, the substrate 7 is removed by chemical etching to obtain an independent graphene film. The preparation of graphene film by chemical vapor deposition (CVD) method, as a mature existing technology, will not be elaborated here too much.

[0033] Compared with the prior art, the substrate 7 used is set as a coil. After the graphene film is formed on the surface of the substrate 7 located in the pipe furnace 31, the substrate 7 to be processed is unrolled by the rotation of the unrolling roller 42, and the substrate 7 containing the graphene film is wound up by the rotation of the winding roller 52, avoiding frequent replacement of the substrate 7 in the reactor, improving the processing efficiency of the graphene film, and facilitating large-scale continuous production.

[0034] Refer to the attached drawings of the specification Figures 1 to 5 Figures 1 to 5

[0035] It should be noted that heat preservation covers are fixedly arranged in the first heating station 23, the second heating station 24 and the cooling station 25. The heat preservation covers in the first heating station 23, the second heating station 24 and the cooling station 25 are independently arranged, that is, the first heating station 23, the second heating station 24 and the cooling station 25 are arranged on the outer side of the pipe furnace 31 along the length direction of the pipe furnace 31. Electric heating wires are fixedly arranged in both the first heating station 23 and the second heating station 24. When an electric current passes through the high-resistance electric heating wires, electrical energy is converted into heat energy due to resistance heating. The electric heating wires are mature prior art and will not be elaborated here. A heat exchanger is fixedly arranged in the cooling station 25. The heat exchange is used to cool the pipe furnace 31 and the substrate 7 in the cooling station 25. The independent areas of the first heating station 23, the second heating station 24 and the cooling station 25 work independently without interference, that is, the first heating station 23 and the second heating station 24 are used to heat the substrate 7 to form a graphene film on the surface of the substrate 7, and the cooling station 25 cools the substrate 7 containing the graphene film.

[0036] It should also be noted that communication pipes 311 are arranged at both ends of the pipe furnace 31, and a shielding seat 312 is arranged in the communication pipes 311. The shielding seat 312 can reduce the aperture of the communication pipes 311, thereby ensuring that the carbon-containing gas introduced into the pipe furnace 31 is always located within the pipe furnace 31.

[0037] Further, two motors are fixedly arranged in the connecting pipe 311, and the driving rollers 313 are fixedly arranged on the output shafts of the motors. The two driving rollers 313 rotate in opposite directions to assist in driving the substrate 7. Especially in the initial stage when the substrate 7 is fixed on the unwinding roller 42, the two driving rollers 313 on the left rotate in opposite directions to assist in conveying the substrate 7 into the pipeline furnace chamber 31. At the same time, the two driving rollers 313 on the right rotate synchronously in opposite directions to assist in conveying the substrate 7 onto the winding roller 52, reducing the workload of the staff. Two cylinders are also arranged in the connecting pipe 311. The output ends of the cylinders are fixedly arranged with the motors. The movement of the output ends of the cylinders can adjust the distance between the two driving rollers 313 on the same side. Adjusting the distance between the two driving rollers 313 can drive the substrate 7 according to the substrate 7 with different thicknesses.

[0038] Refer to the attached drawings of the specification Figures 1 to 5 With Figure 7 , since the substrate 7 is a single-sided prepared graphene film, when the substrate 7 with the prepared graphene film is wound up, the side of the substrate 7 containing the graphene film will contact and fit with the side without the graphene film. During the contact and fitting process, friction will be generated. Especially when the tension is large during the winding process, scratches or abrasions will appear on the surface of the graphene film, and even the graphene film will be broken. In order to avoid the above situation, specifically, the winding mechanism 5 includes a storage housing two 51. The storage housing two 51 is fixedly communicated with the pipeline furnace chamber 31. The winding roller 52 and the winding roller two 53 are both rotatably arranged in the storage housing two 51. The protective film layer one 54 is wound around the winding roller two 53, and an adhesive layer is arranged below the protective film layer one 54. The adhesive layer of the winding roller two 53 is attached to the side of the substrate 7 away from the graphene film. A plurality of guide rollers three 511 are rotatably arranged in the input end of the storage housing two 51. A guide roller four 55 is slidably arranged in the storage housing two 51. The guide roller four 55 is in rolling contact with the non-adhesive surface of the protective film layer one 54. A guide roller five 56 is slidably arranged in the storage housing two 51. The guide roller five 56 is in rolling contact with the substrate 7 on the winding roller 52.

[0039] It should be noted that the raw materials of the protective film layer one 54 include but are not limited to being set as a polyimide film. An adhesive layer is arranged at the bottom of the polyimide film. The adhesive layer is arranged below the polyimide film. The winding roller two 53 of the coil containing the adhesive layer is similar to a tape coil. When tearing the tape along the center of the tape coil, the adhesive layer on the tape coil will not affect the non-adhesive side of the tape. The adhesive layer of the protective film layer one 54 is similar to the adhesive layer of the tape.

[0040] It should also be noted that refer to Figure 7 , the guide roller three 511 is arranged at the input end of the storage housing two 51 in the Figure 7 state, and the winding roller two 53 and the protective film layer one 54 are in the Figure 7The state in [description] is set in the second storage housing 51. A first support seat is fixedly arranged in the second storage housing 51. A first sliding seat is slidably arranged in the first support seat. A fourth guide roller 55 is rotatably arranged on the first sliding seat. A first spring is fixedly arranged between the first support seat and the first sliding seat. An auxiliary wheel is rotatably arranged in the second storage housing 51. The auxiliary wheel and the fourth guide roller 55 cooperate to tightly attach the first protective film layer 54 to the side of the substrate 7 without the graphene film. A second support seat is fixedly arranged in the second storage housing 51. A second sliding seat is slidably arranged in the second support seat. A fifth guide roller 56 is rotatably arranged on the second sliding seat. A second spring is fixedly arranged between the second support seat and the second sliding seat. The fifth guide roller 56 contacts the side of the substrate 7 with the graphene film wound around the winding roller 52. Flexible materials are provided on the surfaces of both the auxiliary wheel and the fifth guide roller 56. The flexible materials include, but are not limited to, being set as rubber. Although both the auxiliary wheel and the fifth guide roller 56 contact the side with the graphene film, they will not cause damage to the graphene film. The rotation of both the winding roller 52 and the second winding roller 53 is driven by different motors, that is, the rotation of the output shaft of the motor drives the rotation of the winding roller 52 and the second winding roller 53.

[0041] Further, in the initial state, the substrate 7 enters the input end of the second storage housing 51 through the end of the pipeline furnace chamber 31. The substrate 7 is fixed on the winding roller 52, and the first protective film layer 54 is fixed on the side of the substrate 7 without the graphene film through the adhesive layer. As the graphene film is formed on the surface of the substrate 7 in the pipeline furnace chamber 31, the winding roller 52 rotates to wind the substrate 7 with the graphene film. The second winding roller 53 rotates synchronously with the winding roller 52. That is, the first protective film layer 54 is attached to the side of the substrate 7 without the graphene film. When the winding roller 52 winds the substrate 7, the side of the substrate 7 with the graphene film contacts and adheres to the non - adhesive side of the first protective film layer 54, avoiding friction on the graphene film and preventing scratches or abrasions on the surface of the graphene film, thus providing good protection for the graphene film.

[0042] Refer to the attached instructions Figure 5 And Figure 6, before the graphene film is generated on the surface of the substrate 7, in order to ensure that the graphite film can grow uniformly on the substrate 7, reduce the defects of the film on the substrate 7, and at the same time improve the bonding force between the film and the substrate 7, it is necessary to ensure that the surface of the substrate 7 where the graphene film to be processed is located is in a smooth state. Therefore, for the coil installed on the unwinding roller 42, it also needs to have a protective layer. When unwinding the substrate 7 to be processed, the protective layer needs to be removed. Specifically, the unwinding mechanism 4 includes a storage housing 41. The storage housing 41 is fixedly communicated with the pipeline furnace chamber 31. The unwinding roller 42 is rotatably arranged in the storage housing 41. A protective film layer 8 is arranged at the bottom of the storage housing 41. A winding roller 44 is rotatably arranged in the storage housing 41. The winding roller 44 winds up the protective film layer 8 by rotation. A guide roller 43 is slidably arranged in the storage housing 41. A guide roller 45 is rotatably arranged in the storage housing 41. The guide roller 45 is used to guide the protective film layer 8. A fixed seat 46 is fixedly arranged in the storage housing 41. The fixed seat 46 is located between the substrate 7 and the protective film layer 8.

[0043] It should be noted that a support seat 3 is fixedly arranged in the storage housing 41. A sliding seat 3 is slidably arranged in the support seat 3. A pressing wheel is rotatably arranged on the sliding seat 3. The same spring 1 is fixedly arranged between the support seat 3 and the sliding seat 3. Two air cylinders are fixedly arranged in the storage housing 41. The number of the guide rollers 43 is also set to two. The guide rollers 43 are rotatably arranged on the output ends of the air cylinders. Refer to Figure 6 , the guide rollers 43 and the guide rollers 45 are arranged in the state shown in the figure. The rotations of the unwinding roller 42 and the winding roller 44 are both driven by the output ends of the motors.

[0044] It should also be noted that the protective film layer 8 is made of the same material as the protective film layer 54. The protective film layer 8 also has an adhesive layer. The adhesive layer of the protective film layer 8 is adhered to the bottom of the substrate 7. The protective film layer 8 is used to protect the surface of the substrate 7 to be processed.

[0045] Furthermore, in the initial stage, the coil of the substrate 7 is arranged on the unwinding roller 42. The substrate 7 is wound between the guide rollers 43 and the guide rollers 45 in a Figure 6 state. Then the substrate 7 is extended into the left end of the pipeline furnace chamber 31, and the protective film layer 8 is fixed on the winding roller 44. When the unwinding roller 42 rotates to unwind the substrate 7, the winding roller 44 rotates synchronously to wind up the protective film layer 8. The fixed seat 46 assists in peeling off the protective film layer 8 on the substrate 7 between the substrate 7 and the protective film layer 8.

[0046] Refer to the attached drawings of the specification Figure 5 、 Figure 8 And Figure 9, since the base 7 is a flexible sheet, after the base 7 enters the pipeline furnace 31 through the left end of the pipeline furnace 31 in the initial stage, when it is necessary for the base 7 to enter the input end of the storage housing two 51 from the right end of the pipeline furnace 31, it is impossible to place the base 7 between the corresponding two driving rollers 313, and the pipeline furnace 31 is in a closed state, making it inconvenient to adjust the position of the base 7. To solve this problem, specifically, an auxiliary positioning mechanism 6 is provided on the pipeline furnace 31. The auxiliary positioning mechanism 6 includes a linear drive one 61, which is fixedly arranged on the pipeline furnace 31. A linear drive two 62 is fixedly arranged on the output end of the linear drive one 61, and a suction nozzle 63 is fixedly arranged on the output end of the linear drive two 62. The suction nozzle 63 is used to adsorb the bottom of the protective film layer two 8.

[0047] It should be noted that a flexible pipe 631 is fixedly connected to the suction nozzle 63. One end of the flexible pipe 631 away from the suction nozzle 63 is fixedly provided with a negative pressure pump. The linear drive one 61 and the linear drive two 62 include but are not limited to being set as cylinders. The linear drive two 62 is fixedly arranged on the output end of the linear drive one 61, and the linear drive one 61 is fixedly arranged on the base 21.

[0048] It also should be noted that in the initial state, after the base 7 enters the pipeline furnace 31 through the left end of the pipeline furnace 31, as the two driving rollers 313 on the left continuously convey the base 7, due to the flexibility of the base 7, when the base 7 in the pipeline furnace 31 increases, the base 7 will be conveyed along the bottom side of the pipeline furnace 31 in the length direction of the pipeline furnace 31. When the base 7 moves to the top of the suction nozzle 63, start the pump. The pump causes a negative pressure to be generated in the flexible pipe 631 and the suction nozzle 63, and the suction nozzle 63 adsorbs and positions the bottom of the base 7. Then start the linear drive one 61 and the linear drive two 62. With the cooperation of the output shafts of the linear drive one 61 and the linear drive two 62, the height of the end of the base 7 is lifted. Then, with the rotation of the two driving rollers 313 on the right, the end of the base 7 can be discharged from the pipeline furnace 31, and then the base 7 can be fixed on the winding roller 52.

[0049] Compared with the prior art, when a graphene film needs to be prepared on the surface of the coiled material base 7 and a new coiled material base 7 needs to be prepared, the suction nozzle 63 pulls the base 7 to cooperate and introduce the base 7 into the storage housing two 51, thus reducing the workload of the staff. The suction nozzle 63 pulls the base 7 through the bottom surface of the base 7, avoiding contamination of the top surface of the base 7.

[0050] The shapes of the second storage housing 51 and the first storage housing 41 include, but are not limited to, using a cylinder or a cuboid. It should be noted that both the second storage housing 51 and the first storage housing 41 are used to store the substrate 7, so that the end of the pipeline furnace chamber 31 is in a closed state to prevent gas leakage in the pipeline furnace chamber 31. The second solenoid valve 33 is used to cooperate with the first solenoid valve 32 to supply gas to the pipeline furnace chamber 31 or discharge gas from the pipeline furnace chamber 31.

[0051] Refer to the attached drawings of the specification Figures 1 to 5 Specifically, the base 21, the first storage housing 41, and the second storage housing 51 are all fixedly arranged on the frame 1, and the first storage housing 41 and the second storage housing 51 are respectively located on both sides of the base 21.

[0052] It should be noted that the frame 1 is used to stably support the first storage housing 41, the base 21, and the second storage housing 51.

[0053] The above embodiments only represent several implementation manners of the present invention, and the description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the patent of the present invention. It should be pointed out that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can still be made, and these all belong to the protection scope of the present invention.

Claims

1. A manufacturing process for graphene forming and processing, characterized in that, It includes the following steps: Step 1: Place the substrate (7) on the unwinding roller (42) in the unwinding mechanism (4), pull the end of the substrate (7), so that the end of the substrate (7) extends into the pipe furnace chamber (31) in the forming mechanism (3), and fix the end of the substrate (7) on the winding roller (52) in the winding mechanism (5); Step 2: Raise the temperature of the local substrate (7) in the pipe furnace chamber (31) through the heat preservation cover (22) and the first heating station (23) in the temperature control mechanism (2), and then introduce carbon-containing gas into the pipe furnace chamber (31) through the first solenoid valve (32); Step 3: The carbon-containing gas cracks at high temperature, releasing free carbon atoms, and forming a graphene thin film structure on the surface of the substrate (7); Step 4: Drive the unwinding roller (42) and the winding roller (52) to rotate synchronously, so that the substrate (7) moves in the pipe furnace chamber (31) along the length direction of the pipe furnace chamber (31). The rotation of the unwinding roller (42) realizes the unwinding of the substrate (7), and the rotation of the winding roller (52) realizes the winding of the substrate (7); Step 5: When the substrate (7) passes through the cooling station (25), it is cooled, and the second winding roller (53) pastes the first protective film layer (54) on the side of the substrate (7) without the graphene thin film, and the rotation of the second winding roller (53) unwinds the first protective film layer (54); Step 6: When the winding roller (52) winds the substrate (7), the side of the substrate (7) with the graphene thin film is always attached to the first protective film layer (54). Repeat Steps 1 to 6 to complete the forming process of the graphene thin film.

2. The manufacturing process for graphene forming and processing according to claim 1, characterized in that: The temperature control mechanism (2) includes a base (21), on which a heat preservation cover (22) is hingedly arranged, and the first heating station (23), the second heating station (24) and the cooling station (25) are all arranged between the base (21) and the heat preservation cover (22).

3. A manufacturing process for graphene forming and processing according to claim 2, characterized in that: The pipe furnace chamber (31) is fixedly arranged on the base (21), the first solenoid valve (32) is fixedly communicated with the pipe furnace chamber (31), and a second solenoid valve (33) is also fixedly communicated with the pipe furnace chamber (31).

4. The manufacturing process for graphene forming and processing according to claim 3, characterized in that: The winding mechanism (5) includes a second storage housing (51), the second storage housing (51) is fixedly communicated with the pipe furnace chamber (31), the winding roller (52) and the second winding roller (53) are both rotatably arranged in the second storage housing (51), the first protective film layer (54) is wound around the second winding roller (53), and an adhesive layer is arranged below the first protective film layer (54), and the adhesive layer of the second winding roller (53) is attached to the side of the substrate (7) away from the graphene thin film.

5. A manufacturing process for graphene forming and processing according to claim 4, characterized in that: The unwinding mechanism (4) includes a first storage housing (41), the first storage housing (41) is fixedly communicated with the pipe furnace chamber (31), the unwinding roller (42) is rotatably arranged in the first storage housing (41), a second protective film layer (8) is arranged at the bottom of the first storage housing (41), and a first winding roller (44) is rotatably arranged in the first storage housing (41), and the first winding roller (44) winds the second protective film layer (8) by rotation.

6. The manufacturing process for graphene forming and processing according to claim 5, characterized in that: An auxiliary positioning mechanism (6) is provided on the pipeline furnace chamber (31). The auxiliary positioning mechanism (6) includes a first linear driver (61). The first linear driver (61) is fixedly arranged on the pipeline furnace chamber (31). A second linear driver (62) is fixedly arranged on the output end of the first linear driver (61). A suction nozzle (63) is fixedly arranged on the output end of the second linear driver (62). The suction nozzle (63) is used for adsorbing the bottom of the second protective film layer (8).

7. A manufacturing process for graphene forming and processing according to claim 6, characterized in that: Communication pipes (311) are fixedly arranged at both ends of the pipeline furnace chamber (31). A shielding seat (312) is fixedly arranged in the communication pipe (311). Two transmission rollers (313) are rotatably arranged in the communication pipe (311). The two transmission rollers (313) drive the second protective film layer (8) through reverse rotation.

8. A manufacturing process for graphene forming and processing according to claim 7, characterized in that: A plurality of third guide rollers (511) are rotatably arranged in the input end of the second storage housing (51). A fourth guide roller (55) is slidably arranged in the second storage housing (51). The fourth guide roller (55) is in rolling contact with the non-adhesive surface of the first protective film layer (54). A fifth guide roller (56) is slidably arranged in the second storage housing (51). The fifth guide roller (56) is in rolling contact with the base (7) on the winding roller (52).

9. A manufacturing process for graphene forming and processing according to claim 8, characterized in that: A first guide roller (43) is slidably arranged in the first storage housing (41). A second guide roller (45) is rotatably arranged in the first storage housing (41). The second guide roller (45) is used for guiding the second protective film layer (8). A fixed seat (46) is fixedly arranged in the first storage housing (41). The fixed seat (46) is located between the base (7) and the second protective film layer (8).

10. A manufacturing process for graphene forming and processing according to claim 9, characterized in that: The base (21), the first storage housing (41) and the second storage housing (51) are all fixedly arranged on the frame (1). The first storage housing (41) and the second storage housing (51) are respectively located on both sides of the base (21).

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