Exposure apparatus measurement system calibration method, system, device, and storage medium

Abstract

The present application relates to the field of measurement, and discloses a kind of exposure equipment measurement system calibration method, system, equipment and storage medium;Exposure equipment measurement system calibration method includes the following steps: obtaining reference data from interferometer lens group, workpiece table, mask table, first plane mirror group and second plane mirror group;Error solving model is established according to reference data;Workpiece table and mask table are moved multiple times, and after each movement, corresponding redundant measurement data is obtained from interferometer lens group;All redundant measurement values are substituted into error solving model to obtain overdetermined equation group;Overdetermined equation group is solved to obtain error calibration result;The present application realizes the organic combination of interferometer group self-calibration and total error compensation by multi-position moving strategy and nonlinear overdetermined equation group solving, provides low-cost, high-precision exposure equipment measurement system calibration scheme for panel exposure machine and other precision equipment.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of measurement, in particular to an exposure equipment measurement system calibration method, system, device and storage medium. BACKGROUND

[0002] As a core device of semiconductor manufacturing, the positioning accuracy of the motion platform of the panel exposure machine directly affects the exposure quality of the panel. In order to realize the motion control of nanometer level precision, the existing technology adopts a laser interferometer as a measuring device, and a double workpiece table measurement system is formed by a mirror group and an interferometer mirror group to realize real-time feedback of the workpiece table displacement. However, during the actual installation process, the laser light source, the interferometer mirror group and the mirror group all have installation errors, which causes an angle deviation between the interferometer measurement beam and the actual motion direction of the workpiece table, thereby introducing systematic measurement errors. The traditional calibration method relies on a standard measuring instrument with higher precision as a reference, but since the interferometer itself has reached nanometer level measurement accuracy, there is currently a lack of reference tools with higher accuracy than it, which makes it difficult to implement calibration. SUMMARY

[0003] In order to overcome the shortcomings of the prior art, the purpose of the present application is to provide an exposure equipment measurement system calibration method, system, device and storage medium, which realizes the organic combination of interferometer group self-calibration and full error compensation through a multi-position moving strategy and nonlinear overdetermined equation solving, and provides a low-cost, high-precision exposure equipment measurement system calibration scheme for precision equipment such as panel exposure machines.

[0004] The first aspect of the present application provides an exposure equipment measurement system calibration method applied to a panel exposure machine motion platform measurement system, wherein the panel exposure machine motion platform measurement system comprises a control device and a laser, an interferometer mirror group, a workpiece table and a mask table electrically connected with the control device; a first plane mirror group is arranged on the workpiece table, and a second plane mirror group is arranged on the mask table; the laser is connected with the interferometer mirror group through an optical fiber, and the interferometer mirror group respectively constitutes a double workpiece table measurement system with the first plane mirror group and the second plane mirror group; the exposure equipment measurement system calibration method comprises the steps of: obtaining reference data from the interferometer mirror group, the workpiece table, the mask table, the first plane mirror group and the second plane mirror group; establishing an error solving model according to the reference data; obtaining redundant measurement data corresponding to the multiple movements of the interferometer mirror group on the workpiece table and the mask table; substituting all the redundant measurement values into the error solving model to obtain an overdetermined equation group; and solving the overdetermined equation group to obtain an error calibration result.

[0005] Optionally, in the first implementation manner of the first aspect, the obtaining reference data from the interferometer mirror group, the workpiece table, the mask table, the first plane mirror group and the second plane mirror group comprises: obtaining initial measurement values of the interferometer mirror group; obtaining initial positions of the interferometer mirror group; obtaining size information of the workpiece table and the mask table; obtaining installation positions of the first plane mirror group and the second plane mirror group; and performing data integration on the initial measurement values, the initial positions, the size information and the installation positions to obtain the reference data.

[0006] Optionally, in the second implementation manner of the first aspect, the establishing an error solving model according to the reference data comprises: constructing a basic equation according to the reference data; performing error analysis on the interferometer mirror group, the first plane mirror group and the second plane mirror group to obtain error parameters; and introducing the error parameters into the basic equation to obtain the error solving model.

[0007] Optionally, in the third implementation manner of the first aspect, the performing error analysis on the interferometer mirror group, the first plane mirror group and the second plane mirror group to obtain error parameters comprises: performing error analysis on the interferometer mirror group to obtain X-direction horizontal deflection angle error of a measurement beam, X-direction vertical deflection angle error of the measurement beam, Y-direction horizontal deflection angle error of the measurement beam and Y-direction vertical deflection angle error of the measurement beam; performing error analysis on the first plane mirror group and the second plane mirror group to obtain X-direction horizontal installation error of a plane mirror, X-direction vertical installation error of the plane mirror, Y-direction horizontal installation error of the plane mirror and Y-direction vertical installation error of the plane mirror; and performing data integration on the X-direction horizontal deflection angle error of the measurement beam, the X-direction vertical deflection angle error of the measurement beam, the Y-direction horizontal deflection angle error of the measurement beam, the Y-direction vertical deflection angle error of the measurement beam, the X-direction horizontal installation error of the plane mirror, the X-direction vertical installation error of the plane mirror, the Y-direction horizontal installation error of the plane mirror and the Y-direction vertical installation error of the plane mirror to obtain the error parameters.

[0008] The second aspect of the present application provides a panel exposure machine motion platform measurement system, which comprises a control device and a laser, an interferometer mirror group, a workpiece table and a mask table electrically connected to the control device; the workpiece table is provided with a first plane mirror group, and the mask table is provided with a second plane mirror group; the control device is used for executing the exposure equipment measurement system calibration method as described above.

[0009] Optionally, in the first implementation of the second aspect of the present application, the first plane mirror set comprises a first X-direction mirror and a first Y-direction mirror; the first X-direction mirror is fixed in the X-axis movement direction of the workpiece table, and the first Y-direction mirror is fixed in the Y-axis movement direction of the workpiece table; the second plane mirror set comprises a second X-direction mirror and a second Y-direction mirror; the second X-direction mirror is fixed in the X-axis movement direction of the mask table, and the second Y-direction mirror is fixed in the Y-axis movement direction of the mask table; the interferometer mirror set respectively forms a double workpiece table measurement system with the first X-direction mirror, the first Y-direction mirror, the second X-direction mirror and the second Y-direction mirror.

[0010] Optionally, in the second implementation of the second aspect of the present application, the interferometer mirror set comprises a first beam splitter, a second beam splitter, a third beam splitter, a fourth beam splitter, a fifth beam splitter, a sixth beam splitter, a seventh beam splitter, an eighth beam splitter, a ninth beam splitter, a tenth beam splitter, an eleventh beam splitter, a twelfth beam splitter, a thirteenth beam splitter, a fourteenth beam splitter, a fifteenth beam splitter, a first interferometer, a second interferometer, a third interferometer, a fourth interferometer, a fifth interferometer, a sixth interferometer, a seventh interferometer, an eighth interferometer, a ninth interferometer, a tenth interferometer, an eleventh interferometer, a twelfth interferometer, a thirteenth interferometer, a fourteenth interferometer, a fifteenth interferometer, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror and a sixth mirror.

[0011] The incident end of the first beam splitter is connected with the laser, a first mirror is arranged on the first beam splitting path of the first beam splitter, and a second beam splitter is arranged on the second beam splitting path of the first beam splitter; a third beam splitter is arranged on the first beam splitting path of the second beam splitter, and a first interferometer is arranged on the second beam splitting path of the second beam splitter; a fourth beam splitter is arranged on the first beam splitting path of the third beam splitter, and a fifth beam splitter is arranged on the second beam splitting path of the third beam splitter; a second interferometer is arranged on the beam splitting path of the fourth beam splitter; a third interferometer is arranged on the first beam splitting path of the fifth beam splitter; a second mirror is arranged on the second beam splitting path of the fifth beam splitter, and a fourth interferometer is arranged on the beam splitting path of the second mirror.

[0012] The first light splitting path of the first mirror is provided with a sixth beam splitter, and the second light splitting path of the first mirror is provided with a fourth mirror; the first light splitting path of the sixth beam splitter is provided with a seventh beam splitter, and the second light splitting path of the sixth beam splitter is provided with a fifth interferometer; the first light splitting path of the seventh beam splitter is provided with an eighth beam splitter, and the second light splitting path of the seventh beam splitter is provided with a ninth beam splitter; the light splitting path of the eighth beam splitter is provided with a sixth interferometer; the first light splitting path of the ninth beam splitter is provided with a seventh interferometer; the second light splitting path of the ninth beam splitter is provided with a third mirror, and the light splitting path of the third mirror is provided with an eighth interferometer;

[0013] The light splitting path of the fourth mirror is provided with a tenth beam splitter; the first light splitting path of the tenth beam splitter is provided with an eleventh beam splitter, and the second light splitting path of the tenth beam splitter is provided with a thirteenth beam splitter; the first light splitting path of the eleventh beam splitter is provided with a ninth interferometer; the second light splitting path of the eleventh beam splitter is provided with a fifth mirror, and the light splitting path of the fifth mirror is provided with a tenth interferometer; the third light splitting path of the eleventh beam splitter is provided with a twelfth beam splitter, and the light splitting path of the twelfth beam splitter is provided with an eleventh interferometer;

[0014] The first light splitting path of the thirteenth beam splitter is provided with a fourteenth beam splitter, and the second light splitting path of the thirteenth beam splitter is provided with a twelfth interferometer; the first light splitting path of the fourteenth beam splitter is provided with a thirteenth interferometer; the second light splitting path of the fourteenth beam splitter is provided with a fifteenth beam splitter, and the light splitting path of the fifteenth beam splitter is provided with a fourteenth interferometer; the third light splitting path of the fourteenth beam splitter is provided with a sixth mirror, and the light splitting path of the sixth mirror is provided with a fifteenth interferometer;

[0015] The first interferometer, the second interferometer, the third interferometer and the fourth interferometer respectively constitute an interference light path with the first X-direction mirror; the fifth interferometer, the sixth interferometer, the seventh interferometer and the eighth interferometer respectively constitute an interference light path with the first Y-direction mirror; the ninth interferometer, the tenth interferometer and the eleventh interferometer respectively constitute an interference light path with the second X-direction mirror; the twelfth interferometer, the thirteenth interferometer, the fourteenth interferometer and the fifteenth interferometer respectively constitute an interference light path with the second Y-direction mirror.

[0016] Optionally, in a third implementation form of the second aspect of the present application, the interferometer mirror group further comprises a sixteenth beam splitter, a seventh mirror and a wavelength compensator; the sixteenth beam splitter is arranged between the first beam splitter and the second beam splitter, the seventh mirror is arranged on the beam splitting path of the sixteenth beam splitter, and the wavelength compensator is arranged on the beam splitting path of the seventh mirror.

[0017] The third aspect of the present application provides an exposure apparatus measurement system calibration device, comprising a memory and at least one processor, wherein the memory stores instructions; and at least one processor invokes the instructions in the memory to enable the exposure apparatus measurement system calibration device to perform the steps of any of the exposure apparatus measurement system calibration methods described above.

[0018] The fourth aspect of the present application provides a computer readable storage medium, wherein the computer readable storage medium stores instructions, and the instructions are executed by a processor to implement the steps of any of the exposure apparatus measurement system calibration methods described above.

[0019] In the technical solution of the present application, multi-dimensional data such as original signals of an interferometer mirror group, positions of a workpiece table encoder, and installation angles of mirrors are synchronously collected to establish an error solving model containing installation errors of the interferometer, installation errors of the mirrors, and six-degree-of-freedom errors of the workpiece table; then the workpiece table and a mask table are controlled to move to multiple discrete positions to obtain multiple redundant measurement data, and the redundant measurement data are substituted into the error solving model to establish an over-determined equation set, and finally the over-determined equation set is solved to complete error calibration; the present application realizes the organic combination of interferometer group self-calibration and full error compensation through redundant measurement of the internal optical path of the interferometer group and a multi-position moving strategy, and provides a low-cost, high-precision exposure apparatus measurement system calibration scheme for precision equipment such as a panel exposure machine. BRIEF DESCRIPTION OF DRAWINGS

[0020] The above and / or additional aspects and advantages of the present application will become apparent and be readily understood from the following description, taken in conjunction with the following drawings, in which:

[0021] Figure 1 A first flowchart of an exposure apparatus measurement system calibration method provided by an embodiment of the present application;

[0022] Figure 2 A second flowchart of an exposure apparatus measurement system calibration method provided by an embodiment of the present application;

[0023] Figure 3 A third flowchart of an exposure apparatus measurement system calibration method provided by an embodiment of the present application;

[0024] Figure 4A fourth flowchart of the method for calibrating the measuring system of the exposure apparatus provided by the embodiment of the present application is shown in FIG. 4.

[0025] Figure 5 A structural schematic diagram of the system provided by the embodiment of the present application is shown in FIG. 2.

[0026] Figure 6 Another structural schematic diagram of the system provided by the embodiment of the present application is shown in FIG. 3.

[0027] Figure 7 A structural schematic diagram of the device provided by the embodiment of the present application is shown in FIG. 4.

[0028] In the drawings:

[0029] 500 - control device; 501 - laser; 502 - interferometer mirror group; 503 - workpiece table; 504 - mask table; 505 - first plane mirror group; 506 - second plane mirror group;

[0030] 1 - first beam splitter; 2 - second beam splitter; 3 - third beam splitter; 4 - fourth beam splitter; 5 - fifth beam splitter; 6 - sixth beam splitter; 7 - seventh beam splitter; 8 - eighth beam splitter; 9 - ninth beam splitter; 10 - tenth beam splitter; 11 - eleventh beam splitter; 12 - twelfth beam splitter; 13 - thirteenth beam splitter; 14 - fourteenth beam splitter; 15 - fifteenth beam splitter; 16 - sixteenth beam splitter;

[0031] G1 - first interferometer; G2 - second interferometer; G3 - third interferometer; G4 - fourth interferometer; G5 - fifth interferometer; G6 - sixth interferometer; G7 - seventh interferometer; G8 - eighth interferometer; G9 - ninth interferometer; G10 - tenth interferometer; G11 - eleventh interferometer; G12 - twelfth interferometer; G13 - thirteenth interferometer; G14 - fourteenth interferometer; G15 - fifteenth interferometer;

[0032] F1 - first mirror; F2 - second mirror; F3 - third mirror; F4 - fourth mirror; F5 - fifth mirror; F6 - sixth mirror; F7 - seventh mirror;

[0033] P1 - first X-direction mirror; P2 - first Y-direction mirror; P3 - second X-direction mirror; P4 - second Y-direction mirror. DETAILED DESCRIPTION

[0034] The application provides an exposure equipment measurement system calibration method, system, device and storage medium, which synchronously collects multi-dimensional data such as interferometer lens group original signals, workpiece table encoder positions, mirror mounting angles, establishes an error solving model containing interferometer installation errors, mirror installation errors and workpiece table six-degree-of-freedom errors, then moves the workpiece table and the mask table to multiple discrete positions through control, obtains multiple redundant measurement data, and substitutes the redundant measurement data into the error solving model to establish an over-determined equation set, and finally solves the over-determined equation set to complete error calibration; the application realizes the organic combination of interferometer group self-calibration and full error compensation through redundant measurement of the internal optical path of the interferometer group and a multi-position moving strategy, and provides a low-cost, high-precision exposure equipment measurement system calibration scheme for panel exposure machines and other precision equipment.

[0035] The terms "first", "second", "third", "fourth" and the like in the description and claims of the application and the above figure are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the use of data so designated is not meant to limit the scope of the embodiments described herein, which are open to use elements other than those illustrated or otherwise described herein. Furthermore, the terms "comprise" or "to comprise" and any variations thereof are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of steps or elements does not include only those steps or elements but can include other not expressly listed steps or elements.

[0036] For the sake of understanding, the specific flow of the embodiments of the application is described below, please refer to Figure 1 One embodiment of the exposure equipment measurement system calibration method in the embodiments of the application includes:

[0037] The panel exposure machine motion platform measurement system includes a control device and a laser, an interferometer lens group, a workpiece table and a mask table electrically connected with the control device; the workpiece table is provided with a first plane mirror group, and the mask table is provided with a second plane mirror group; the laser is connected with the interferometer lens group through an optical fiber, and the interferometer lens group respectively constitutes a double workpiece table measurement system with the first plane mirror group and the second plane mirror group.

[0038] In one embodiment, the core goal of the panel exposure machine motion platform measurement system is to accurately measure the positions of the workpiece table and the mask table to provide accurate feedback information for high-precision motion control of the panel exposure machine; in actual application, due to installation errors of the interferometer mirror group and the mirror group and the influence of environmental factors, the measurement system may have certain measurement errors, which will affect the positioning accuracy of the workpiece table and the mask table, thereby reducing the exposure quality of the panel exposure machine, therefore, the measurement system needs to be calibrated to eliminate these errors and improve the measurement accuracy;

[0039] The present application determines the error parameters by using the redundant information of the measurement system. By moving the workpiece table and the mask table multiple times and measuring at different positions, multiple different measurement results can be obtained; then, the error solving model and the over-determined equation set are established by using these measurement results, and the error information is extracted, so that the self-calibration of the measurement system is realized;

[0040] The laser serves as the light source of the system to generate a stable laser beam, and the laser has the characteristics of high monochromaticity, high directivity and high coherence, which is suitable for high-precision measurement; the laser transmits the laser to the interferometer mirror group through an optical fiber to provide a stable light source for interference measurement;

[0041] The interferometer mirror group receives the laser beam from the laser and divides it into 15 light paths, which are respectively incident into the first plane mirror group and the second plane mirror group installed on the workpiece table and the mask table, the first plane mirror group and the second plane mirror group reflect the laser beam emitted by the interferometer mirror group to form a double workpiece table measurement system; the interferometer mirror group measures the optical path difference by detecting the change of the interference fringes, and then obtains the displacement information of the workpiece table and the mask table; the principle of interference measurement is based on the wave nature of light, when two coherent lights meet, interference phenomenon will occur, and the change of the interference fringes is proportional to the optical path difference;

[0042] The workpiece table and the mask table are key components of the panel exposure machine, which need to be accurately moved and positioned during the exposure process. The workpiece table is used to carry the panel, and the mask table is used to carry the mask. By accurately controlling the relative position and motion trajectory of the workpiece table and the mask table, high-precision exposure of the panel can be realized.

[0043] The exposure equipment measurement system calibration method comprises the following steps:

[0044] 101、Obtain reference data from the interferometer mirror group, the workpiece table, the mask table, the first plane mirror group and the second plane mirror group;

[0045] In this embodiment, after the motion platform measurement system of the panel exposure machine is built, the original measurement values are obtained from the interferometer mirror group, the initial position and size information of the workpiece table and the mask table are obtained, and the initial installation position information of the first planar mirror group and the second planar mirror group is obtained; the above information is summarized as the reference data.

[0046] 102. Establishing an error solving model according to the reference data;

[0047] In this embodiment, according to the reference data, a relationship between the interferometer measurement values and the workpiece table displacement is constructed, and then the installation error of the interferometer, the installation angle error of the first planar mirror group and the second planar mirror, and the motion error of the workpiece table and the mask table are added as error terms to the relationship between the interferometer measurement values and the workpiece table / mask table displacement, so as to construct the error solving model.

[0048] Specifically, the error solving model, i.e. the relationship between the interferometer measurement values and the workpiece table / mask table position, can be expressed as:

[0049]

[0050] Among them, 、 、 、 、 is expressed as:

[0051]

[0052]

[0053] 、 、 、 、 are conversion coefficients between the interferometer measurement values and the workpiece table displacement, respectively;

[0054] is used to represent the alignment error of the interferometer measurement beam and the motion direction, which includes the angle error of the interferometer itself, the installation error of the measurement plane mirror, and the attitude error of the workpiece table;

[0055] is used to reflect the cross-influence of the interferometer angle error and the mirror installation error, which includes the quadratic error term 、 and ;

[0056] and are used to reflect the coupling term of the attitude error and the installation error;

[0057] is the geometric position compensation term of the interferometer coordinate system and the worktable coordinate system;

[0058] wherein:

[0059] , is the X-direction measurement plane mirror horizontal and vertical direction installation error;

[0060] x, is the Y-direction measurement plane mirror horizontal and vertical direction installation error;

[0061] RXyi, RXzi are the X-direction measurement beam horizontal and vertical angle of the laser interferometer;

[0062] RYxi, RYzi are the Y-direction measurement beam horizontal and vertical angle of the laser interferometer;

[0063] , , , X, Y, Z are different displacement amounts of the worktable (or mask table);

[0064] , and are the coordinates of the laser interferometer in the measurement coordinate system; the measurement coordinate system is a reference coordinate system defined for realizing positioning of the worktable (or mask table);

[0065] i represents the number of interferometers;

[0066] m, n respectively represent the distance between the measurement plane mirror and the X-direction edge and Y-direction edge of the worktable (or mask table), for indicating the installation position of the measurement plane mirror on the worktable (or mask table);

[0067] l, k represent the length and width of the worktable / mask table;

[0068] In the above formula, the interferometer measurement value and , the interferometer coordinate , and are known quantities (the interference measurement value can be obtained from the reading on the interferometer, and the interferometer coordinate value can be directly measured), , , x, , RXyi, RXzi, RYxi, RYzi are eight error unknown quantities (four installation errors of the X-direction and Y-direction of the laser interferometer, four installation errors of the X-direction and Y-direction of the measurement horizontal mirror, and a total of eight installation errors), 、 、 X, Y, Z are six unknowns (in actual work, the worktable or the mask table will be moved for many times, and the six unknowns correspond to the coordinate and angle deviation of the worktable or the mask table after each movement); therefore, the formula has 8 equations and 14 unknowns.

[0069] 103. Redundant measurement data corresponding to the movement of the worktable and the mask table is obtained.

[0070] 104. All the redundant measurement values are substituted into the error solving model to obtain an over-determined equation set;

[0071] In this embodiment, because the error solving model has only 8 equations but has 14 unknowns, the equation set has no solution;

[0072] Therefore, the worktable (or the mask table) needs to be moved to at least 4 characteristic positions, because the installation error of the interferometer and the plane mirror is irrelevant to the movement of the worktable, therefore 8 equations and 6 unknowns are generated each time of movement, 4 times of movement obtain 32 equations and 24 unknowns, plus the original 8 installation error unknowns, that is, 32 equations and 32 unknowns, the equation set has a solution;

[0073] At this time, the equation set can be expressed as:

[0074]

[0075] wherein, 、 、 、 、 is expressed as:

[0076]

[0077]

[0078] wherein, j represents the number of movements.

[0079] 105. The over-determined equation set is solved to obtain the error calibration result;

[0080] In this embodiment, the least square method is used to solve the over-determined equation set, and finally the error calibration result and the worktable displacement are obtained, and the error calibration of the measurement system is completed; and because the worktable and the mask table are in the same measurement system, the error calibration method of the worktable and the mask table is the same.

[0081] In the embodiment of the present application, the original signal of the interferometer lens group, the position of the workpiece table encoder, the mounting angle of the mirror and other multi-dimensional data are synchronously collected to establish an error solving model containing the installation error of the interferometer, the installation error of the mirror and the six-degree-of-freedom error of the workpiece table; then the workpiece table and the mask table are moved to a plurality of discrete positions to obtain a plurality of redundant measurement data, and the redundant measurement data are substituted into the error solving model to establish an over-determined equation set, and finally the over-determined equation set is solved to complete error calibration; through the redundant measurement of the internal optical path of the interferometer group and the multi-position moving strategy, the organic combination of the self-calibration and the full error compensation of the interferometer group is realized, and a low-cost, high-precision exposure equipment measurement system calibration scheme is provided for precision equipment such as panel exposure machines.

[0082] Referring to Figure 2 The two embodiments of the exposure equipment measurement system calibration method in the embodiment of the present application include:

[0083] 201, obtaining an initial measurement value of the interferometer lens group;

[0084] In this embodiment, the initial measurement value of the interferometer lens group is the measurement value of the interferometer when the workpiece table and the mask table are at the initial position.

[0085] 202, obtaining an initial position of the interferometer lens group;

[0086] In this embodiment, the initial position of the interferometer lens group is the coordinate of the interferometer lens group in the panel exposure machine motion platform measurement system.

[0087] 203, obtaining size information of the workpiece table and the mask table;

[0088] In this embodiment, the size information of the workpiece table and the mask table is the length and width of the workpiece table and the mask table.

[0089] 204, obtaining mounting position information of the first plane mirror group and the second plane mirror group;

[0090] In this embodiment, the mounting position of the first plane mirror group and the second plane mirror group is the position of the first plane mirror group and the second plane mirror group mounted on the workpiece table and the mask table.

[0091] 205, data integration of the initial measurement value, the initial position, the size information and the mounting position to obtain reference data.

[0092] Referring to Figure 3 The three embodiments of the exposure equipment measurement system calibration method in the embodiment of the present application include:

[0093] 301, constructing a basic equation according to the reference data;

[0094] In this embodiment, based on the principle of laser interferometry, there is a mathematical relationship between the displacement measured by the interferometer mirror group and the actual displacement of the worktable and the mask table, so that through the reference data, the relationship equation between the ideal interferometer mirror group measurement and the displacement of the worktable and the mask table, i.e. the basic equation, can be constructed.

[0095] 302, error analysis is performed on the interferometer mirror group, the first plane mirror group and the second plane mirror group to obtain error parameters;

[0096] In this embodiment, in actual measurement, the interferometer mirror group, the first plane mirror group and the second plane mirror group have angle installation errors, which will cause the measurement light of the interferometer to be inconsistent with the movement direction of the worktable, thereby causing measurement errors; in addition, due to the manufacturing and processing errors of the guide rail, the worktable and the mask table also have six-degree-of-freedom errors during movement; these errors will affect the accuracy of the basic equation, and therefore need to be introduced into the basic equation as error terms.

[0097] 303, the error parameters are introduced into the basic equation to obtain an error solving model.

[0098] Please refer to Figure 4 The four embodiments of the exposure apparatus measurement system calibration method in the embodiment of the application include:

[0099] 401, error analysis is performed on the interferometer mirror group to obtain horizontal angle error of the measurement light beam X, vertical angle error of the measurement light beam X, horizontal angle error of the measurement light beam Y and vertical angle error of the measurement light beam Y;

[0100] In this embodiment, during actual installation, the interferometer has three angle installation errors. However, the angle error along the optical axis will not affect the measurement result, because the angle change along the optical axis direction will not change the projection of the measurement light beam on the plane perpendicular to the optical axis, and therefore will not affect the displacement and other physical quantities measured by the interferometer. Therefore, the other two angles, which correspond to the horizontal and vertical angle errors of the measurement light beam in the X direction and the Y direction, actually affect the measurement accuracy of the interferometer.

[0101] 402, error analysis is performed on the first plane mirror group and the second plane mirror group to obtain horizontal installation error of the plane mirror X, vertical installation error of the plane mirror X, horizontal installation error of the plane mirror Y and vertical installation error of the plane mirror Y;

[0102] In this embodiment, in the panel exposure machine movement platform measurement system, the first plane mirror group and the second plane mirror group play an important role in changing the propagation direction of the measurement light beam. If there is an installation error of the plane mirror, the direction of the reflected light beam will change, thereby affecting the formation of the interference fringes and the accuracy of the measurement result, and therefore the installation error of the plane mirror needs to be considered.

[0103] 403、data integration is performed on the measurement beam X horizontal angle error, the measurement beam X vertical angle error, the measurement beam Y horizontal angle error, the measurement beam Y vertical angle error, the plane mirror X horizontal installation error, the plane mirror X vertical installation error, the plane mirror Y horizontal installation error and the plane mirror Y vertical installation error to obtain the error parameters.

[0104] The exposure apparatus measurement system calibration method in the embodiment of the application is described above, and the exposure apparatus measurement system calibration system in the embodiment of the application is described below, please refer to Figure 5 The exposure apparatus measurement system calibration system in the embodiment of the application includes:

[0105] The control device 500 and the laser 501, the interferometer mirror group 502, the workpiece table 503 and the mask table 504 electrically connected with the control device 500; the first plane mirror group 505 is arranged on the workpiece table 503, and the second plane mirror group 506 is arranged on the mask table 504;

[0106] Refer to Figure 6 In one embodiment, the first plane mirror group 505 includes a first X-direction mirror P1 and a first Y-direction mirror P2; the first X-direction mirror P1 is fixed in the X-axis movement direction of the workpiece table 503, and the first Y-direction mirror P2 is fixed in the Y-axis movement direction of the workpiece table 503;

[0107] The second plane mirror group 506 includes a second X-direction mirror P3 and a second Y-direction mirror P4; the second X-direction mirror P3 is fixed in the X-axis movement direction of the mask table 504, and the second Y-direction mirror P4 is fixed in the Y-axis movement direction of the mask table 504;

[0108] The interferometer mirror group 502 includes a first beam splitter 1, a second beam splitter 2, a third beam splitter 3, a fourth beam splitter 4, a fifth beam splitter 5, a sixth beam splitter 6, a seventh beam splitter 7, an eighth beam splitter 8, a ninth beam splitter 9, a tenth beam splitter 10, an eleventh beam splitter 11, a twelfth beam splitter 12, a thirteenth beam splitter 13, a fourteenth beam splitter 14, a fifteenth beam splitter 15, a first interferometer G1, a second interferometer G2, a third interferometer G3, a fourth interferometer G4, a fifth interferometer G5, a sixth interferometer G6, a seventh interferometer G7, an eighth interferometer G8, a ninth interferometer G9, a tenth interferometer G10, an eleventh interferometer G11, a twelfth interferometer G12, a thirteenth interferometer G13, a fourteenth interferometer G14, a fifteenth interferometer G15, a first mirror F1, a second mirror F2, a third mirror F3, a fourth mirror F4, a fifth mirror F5 and a sixth mirror F6.

[0109] The incident end of the first beam splitter 1 is connected with the laser 501, a first mirror F1 is arranged on the first beam path of the first beam splitter 1, and a second beam splitter 2 is arranged on the second beam path of the first beam splitter 1; a third beam splitter 3 is arranged on the first beam path of the second beam splitter 2, and a first interferometer G1 is arranged on the second beam path of the second beam splitter 2; a fourth beam splitter 4 is arranged on the first beam path of the third beam splitter 3, and a fifth beam splitter 5 is arranged on the second beam path of the third beam splitter 3; a second interferometer G2 is arranged on the beam path of the fourth beam splitter 4; a third interferometer G3 is arranged on the first beam path of the fifth beam splitter 5; a second mirror F2 is arranged on the second beam path of the fifth beam splitter 5, and a fourth interferometer G4 is arranged on the beam path of the second mirror F2;

[0110] A sixth beam splitter 6 is arranged on the first beam path of the first mirror F1, and a fourth mirror F4 is arranged on the second beam path of the first mirror F1; a seventh beam splitter 7 is arranged on the first beam path of the sixth beam splitter 6, and a fifth interferometer G5 is arranged on the second beam path of the sixth beam splitter 6; an eighth beam splitter 8 is arranged on the first beam path of the seventh beam splitter 7, and a ninth beam splitter 9 is arranged on the second beam path of the seventh beam splitter 7; a sixth interferometer G6 is arranged on the beam path of the eighth beam splitter 8; a seventh interferometer G7 is arranged on the first beam path of the ninth beam splitter 9; a third mirror F3 is arranged on the second beam path of the ninth beam splitter 9, and an eighth interferometer G8 is arranged on the beam path of the third mirror F3;

[0111] A tenth beam splitter 10 is arranged on the beam path of the fourth mirror F4; an eleventh beam splitter 11 is arranged on the first beam path of the tenth beam splitter 10, and a thirteenth beam splitter 13 is arranged on the second beam path of the tenth beam splitter 10; a ninth interferometer G9 is arranged on the first beam path of the eleventh beam splitter 11; a fifth mirror F5 is arranged on the second beam path of the eleventh beam splitter 11, and a tenth interferometer G10 is arranged on the beam path of the fifth mirror F5; a twelfth beam splitter 12 is arranged on the third beam path of the eleventh beam splitter 11, and an eleventh interferometer G11 is arranged on the beam path of the twelfth beam splitter 12;

[0112] The first splitting path of the thirteenth beam splitter 13 is provided with a fourteenth beam splitter 14, and the second splitting path of the thirteenth beam splitter 13 is provided with a twelfth interferometer G12; the first splitting path of the fourteenth beam splitter 14 is provided with a thirteenth interferometer G13; the second splitting path of the fourteenth beam splitter 14 is provided with a fifteenth beam splitter 15, and the splitting path of the fifteenth beam splitter 15 is provided with a fourteenth interferometer G14; the third splitting path of the fourteenth beam splitter 14 is provided with a sixth mirror F6, and the splitting path of the sixth mirror F6 is provided with a fifteenth interferometer G15;

[0113] The first interferometer G1, the second interferometer G2, the third interferometer G3 and the fourth interferometer G4 respectively form an interference light path with the first X-direction mirror P1; the fifth interferometer G5, the sixth interferometer G6, the seventh interferometer G7 and the eighth interferometer G8 respectively form an interference light path with the first Y-direction mirror P2; the ninth interferometer G9, the tenth interferometer G10 and the eleventh interferometer G11 respectively form an interference light path with the second X-direction mirror P3; the twelfth interferometer G12, the thirteenth interferometer G13, the fourteenth interferometer G14 and the fifteenth interferometer G15 respectively form an interference light path with the second Y-direction mirror P4;

[0114] In the embodiment, the worktable 503 and the mask table 504 of the panel exposure machine motion platform need to be accurately positioned and moved in the X and Y directions during the working process; in order to realize the full-dimensional motion monitoring of the panel exposure machine motion platform in the XY plane, the displacement information in the X and Y directions needs to be obtained at the same time. Therefore, the interferometer mirror group 502 needs to be arranged to form an interference loop with the X-direction and Y-direction mirrors; for example, the first beam splitter 1, the second beam splitter 2, the first interferometer G1 and the first X-direction mirror P1 form a complete light path, and the first interferometer G1 and the first X-direction mirror P1 form an interference light path;

[0115] When the worktable 503 or the mask table 504 is displaced, the first plane mirror group 505 and the second plane mirror group 506 mounted thereon will also move, thereby changing the optical path of the laser in the interference loop; the interferometer mirror group 502 measures the optical path difference by detecting the change of the interference fringes, and then obtains the displacement information of the worktable 503 and the mask table 504 in the X and Y directions;

[0116] However, the installation errors of the interferometer mirror group 502 and the installation errors of the first plane mirror group 505 and the second plane mirror group 506 will simultaneously affect the measurement results of the X / Y direction; therefore, the interferometer mirror group 502 needs to construct multiple interference loops to simultaneously measure the displacement of the X and Y directions, and comprehensively consider the installation errors of the interferometer mirror group 502, the first plane mirror group 505 and the second plane mirror group 506 and the cross-coupling errors therebetween.

[0117] The interferometer mirror group 502 further comprises a sixteenth beam splitter 16, a seventh mirror F7 and a wavelength compensator 507; the sixteenth beam splitter 16 is arranged between the first beam splitter 1 and the second beam splitter 2, the seventh mirror F7 is arranged on the beam splitting path of the sixteenth beam splitter 16, and the wavelength compensator 507 is arranged on the beam splitting path of the seventh mirror F7;

[0118] In the embodiment, since the laser wavelength is highly sensitive to environmental factors such as temperature and air pressure, wavelength changes are caused, and uncompensated wavelength drift will directly superimpose into the interferometer measurement value, forming a composite error with the installation error and the motion error, and affecting the measurement precision; the wavelength compensator 507 is arranged to detect the wavelength change caused by the environment, compensate the wavelength change into the interferometer mirror group 502, and thus improve the measurement precision of the interferometer mirror group 502.

[0119] Figure 7 is a structural schematic diagram of an exposure apparatus measurement system calibration device provided by an embodiment of the present application. The exposure apparatus measurement system calibration device 900 can have relatively large differences due to different configurations or performances, and can include one or more processors 910 and memories 920, and one or more storage media 930 storing application programs 933 or data 932. The memories 920 and the storage media 930 can be temporary storage or persistent storage. The programs stored in the storage media 930 can include one or more modules, and each module can include a series of instruction operations in the exposure apparatus measurement system calibration device 900. Further, the processor 910 can be configured to communicate with the storage media 930 and execute the series of instruction operations in the storage media 930 on the exposure apparatus measurement system calibration device 900 to implement the steps of the exposure apparatus measurement system calibration method provided by each method embodiment.

[0120] The exposure apparatus measurement system calibration device 900 can further include one or more power supplies 940, one or more wired or wireless network interfaces 950, one or more input / output interfaces 960, and / or one or more operating systems 931, such as Windows Server, Mac OS X, Unix, Linux, FreeBSD, etc. Those skilled in the art can understand that the exposure apparatus measurement system calibration device 900 can further include other components, which will not be described herein. Figure 7The exposure apparatus measurement system calibration apparatus structure shown does not constitute a limitation on the exposure apparatus measurement system calibration apparatus, and can include more or fewer components than shown, or combine certain components, or have a different arrangement of components.

[0121] The present application also provides a computer readable storage medium, which can be a non-volatile computer readable storage medium, or a volatile computer readable storage medium. The computer readable storage medium stores instructions, which, when executed on a computer, cause the computer to perform the steps of the exposure apparatus measurement system calibration method.

[0122] Those skilled in the art can clearly understand that, for the convenience and brevity of description, the specific working process of the system or device, unit described above can refer to the corresponding process in the foregoing method embodiments, which will not be repeated here.

[0123] The integrated unit, if implemented in the form of a software functional unit and sold or used as an independent product, can be stored in a computer readable storage medium. Based on such understanding, the technical solutions of the present application essentially or the part that contributes to the prior art, or the whole or part of the technical solutions can be embodied in the form of a software product. The computer software product is stored in a storage medium and includes several instructions for causing a computer device to execute all or part of the steps of the methods described in the various embodiments of the present application. The foregoing storage medium includes: a U disk, a mobile hard disk, a read-only memory, a random access memory, a magnetic disk or an optical disk, and various program code storage media.

[0124] Finally, it should be noted that: the above only for the preferred examples of the present application, and not for limiting the present application, although the present application has been described in detail with reference to the foregoing embodiments, for those skilled in the art, it still can modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement for part of the technical features. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A calibration method for an exposure equipment measurement system, characterized in that, The application is applied to a panel exposure machine motion platform measurement system, and the panel exposure machine motion platform measurement system comprises a control device, a laser, an interferometer mirror group, a workpiece table and a mask table which are electrically connected with the control device; the workpiece table is provided with a first plane mirror group, and the mask table is provided with a second plane mirror group; the laser is connected with the interferometer mirror group through an optical fiber; the interferometer mirror group is connected with the first plane mirror group and the second plane mirror group to form a double workpiece table measurement system; the exposure equipment measurement system calibration method comprises the following steps: obtaining reference data from the interferometer mirror group, the workpiece table, the mask table, the first plane mirror group and the second plane mirror group; the reference data is obtained from the interferometer mirror group, the workpiece table, the mask table, the first plane mirror group and the second plane mirror group, and comprises the following steps: obtaining an initial measurement value of the interferometer mirror group; obtaining an initial position of the interferometer mirror group; obtaining size information of the workpiece table and the mask table; obtaining installation positions of the first plane mirror group and the second plane mirror group; and integrating the initial measurement value, the initial position, the size information and the installation positions to obtain the reference data; establishing an error solving model according to the reference data; the error solving model is established according to the reference data, and comprises the following steps: constructing a basic equation according to the reference data; performing error analysis on the interferometer mirror group, the first plane mirror group and the second plane mirror group to obtain error parameters; and introducing the error parameters into the basic equation to obtain the error solving model; obtaining redundant measurement data corresponding to the interferometer mirror group when the workpiece table and the mask table are moved multiple times; substituting all the redundant measurement values into the error solving model to obtain an over-determined equation set; solving the over-determined equation set to obtain error calibration results.

2. The exposure apparatus measurement system calibration method according to claim 1, wherein the error analysis on the interferometer mirror group, the first plane mirror group and the second plane mirror group to obtain the error parameters comprises the following steps: performing error analysis on the interferometer mirror group to obtain horizontal angle error of a measurement beam X, vertical angle error of the measurement beam X, horizontal angle error of a measurement beam Y and vertical angle error of the measurement beam Y; performing error analysis on the first plane mirror group and the second plane mirror group to obtain horizontal installation error of a plane mirror X, vertical installation error of the plane mirror X, horizontal installation error of a plane mirror Y and vertical installation error of the plane mirror Y; integrating the horizontal angle error of the measurement beam X, the vertical angle error of the measurement beam X, the horizontal angle error of the measurement beam Y, the vertical angle error of the measurement beam Y, the horizontal installation error of the plane mirror X, the vertical installation error of the plane mirror X, the horizontal installation error of the plane mirror Y and the vertical installation error of the plane mirror Y to obtain the error parameters.

3. A panel exposure machine motion stage measurement system, characterized by, The panel exposure machine motion platform measurement system comprises a control device, a laser, an interferometer mirror group, a workpiece table and a mask table which are electrically connected with the control device; the workpiece table is provided with a first plane mirror group, and the mask table is provided with a second plane mirror group; the control device is used for executing the exposure equipment measurement system calibration method according to any one of claims 1-2.

4. The panel exposure machine motion platform measurement system of claim 3, wherein: the first set of plane mirrors comprises a first X-direction mirror and a first Y-direction mirror, the first X-direction mirror is fixed in the X-axis movement direction of the workpiece table, and the first Y-direction mirror is fixed in the Y-axis movement direction of the workpiece table; the second set of plane mirrors comprises a second X-direction mirror and a second Y-direction mirror, the second X-direction mirror is fixed in the X-axis movement direction of the mask table, and the second Y-direction mirror is fixed in the Y-axis movement direction of the mask table; the interferometer mirror group respectively forms a double workpiece table measurement system with the first X-direction mirror, the first Y-direction mirror, the second X-direction mirror, and the second Y-direction mirror.

5. The reticle stepper motion stage measurement system of claim 4, wherein: the interferometer mirror group comprises a first beam splitter, a second beam splitter, a third beam splitter, a fourth beam splitter, a fifth beam splitter, a sixth beam splitter, a seventh beam splitter, an eighth beam splitter, a ninth beam splitter, a tenth beam splitter, an eleventh beam splitter, a twelfth beam splitter, a thirteenth beam splitter, a fourteenth beam splitter, a fifteenth beam splitter, a first interferometer, a second interferometer, a third interferometer, a fourth interferometer, a fifth interferometer, a sixth interferometer, a seventh interferometer, an eighth interferometer, a ninth interferometer, a tenth interferometer, an eleventh interferometer, a twelfth interferometer, a thirteenth interferometer, a fourteenth interferometer, a fifteenth interferometer, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror; the incident end of the first beam splitter is connected with the laser, the first beam splitter is provided with the first mirror on a first beam splitting path, and the first beam splitter is provided with the second beam splitter on a second beam splitting path; the second beam splitter is provided with the third beam splitter on a first beam splitting path, and the second beam splitter is provided with the first interferometer on a second beam splitting path; the third beam splitter is provided with the fourth beam splitter on a first beam splitting path, and the third beam splitter is provided with the fifth beam splitter on a second beam splitting path; the fourth beam splitter is provided with the second interferometer on a beam splitting path; the fifth beam splitter is provided with the third interferometer on a first beam splitting path; the fifth beam splitter is provided with the second mirror on a second beam splitting path, and the second mirror is provided with the fourth interferometer on a beam splitting path; the first mirror is provided with the sixth beam splitter on a first beam splitting path, and the first mirror is provided with the fourth mirror on a second beam splitting path; the sixth beam splitter is provided with the seventh beam splitter on a first beam splitting path, and the sixth beam splitter is provided with the fifth interferometer on a second beam splitting path; the seventh beam splitter is provided with the eighth beam splitter on a first beam splitting path, and the seventh beam splitter is provided with the ninth beam splitter on a second beam splitting path; the eighth beam splitter is provided with the sixth interferometer on a beam splitting path; the ninth beam splitter is provided with the seventh interferometer on a first beam splitting path; the ninth beam splitter is provided with the third mirror on a second beam splitting path, and the third mirror is provided with the eighth interferometer on a beam splitting path; The fourth mirror is provided with a tenth beam splitter on the beam splitting path; the tenth beam splitter is provided with an eleventh beam splitter on the first beam splitting path, and the tenth beam splitter is provided with a thirteenth beam splitter on the second beam splitting path; the eleventh beam splitter is provided with a ninth interferometer on the first beam splitting path; the eleventh beam splitter is provided with a fifth mirror on the second beam splitting path, and the fifth mirror is provided with a tenth interferometer on the beam splitting path; the eleventh beam splitter is provided with a twelfth beam splitter on the third beam splitting path, and the twelfth beam splitter is provided with an eleventh interferometer on the beam splitting path; The thirteenth beam splitter is provided with a fourteenth beam splitter on the first beam splitting path, and the thirteenth beam splitter is provided with a twelfth interferometer on the second beam splitting path; the fourteenth beam splitter is provided with a thirteenth interferometer on the first beam splitting path; the fourteenth beam splitter is provided with a fifteenth beam splitter on the second beam splitting path, and the fifteenth beam splitter is provided with a fourteenth interferometer on the beam splitting path; the fourteenth beam splitter is provided with a sixth mirror on the third beam splitting path, and the sixth mirror is provided with a fifteenth interferometer on the beam splitting path; The first interferometer, the second interferometer, the third interferometer and the fourth interferometer respectively constitute an interference light path with the first X-direction mirror; the fifth interferometer, the sixth interferometer, the seventh interferometer and the eighth interferometer respectively constitute an interference light path with the first Y-direction mirror; the ninth interferometer, the tenth interferometer and the eleventh interferometer respectively constitute an interference light path with the second X-direction mirror; the twelfth interferometer, the thirteenth interferometer, the fourteenth interferometer and the fifteenth interferometer respectively constitute an interference light path with the second Y-direction mirror.

6. The reticle stepper motion stage measurement system of claim 5, wherein: The interferometer mirror group further comprises a sixteenth beam splitter, a seventh mirror and a wavelength compensator; the sixteenth beam splitter is arranged between the first beam splitter and the second beam splitter, the sixteenth beam splitter is provided with the seventh mirror on the beam splitting path, and the seventh mirror is provided with the wavelength compensator on the beam splitting path.

7. A calibration device for an exposure equipment measurement system, characterized in that, The exposure apparatus measurement system calibration apparatus comprises a memory and at least one processor, and the memory stores instructions; The at least one processor invokes the instructions in the memory, so that the exposure apparatus measurement system calibration apparatus performs the steps of the exposure apparatus measurement system calibration method according to any one of claims 1-2.

8. A computer-readable storage medium having stored thereon instructions, the computer-readable storage medium comprising: The instructions are executed by the processor to implement the steps of the exposure apparatus measurement system calibration method according to any one of claims 1-2.

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